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JP3121449B2 - Polyester-based manufacturing method - Google Patents

Polyester-based manufacturing method

Info

Publication number
JP3121449B2
JP3121449B2 JP23828592A JP23828592A JP3121449B2 JP 3121449 B2 JP3121449 B2 JP 3121449B2 JP 23828592 A JP23828592 A JP 23828592A JP 23828592 A JP23828592 A JP 23828592A JP 3121449 B2 JP3121449 B2 JP 3121449B2
Authority
JP
Japan
Prior art keywords
silica
polyester
particle
general formula
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP23828592A
Other languages
Japanese (ja)
Other versions
JPH0687952A (en
Inventor
隆則 佐藤
俊光 奥津
文行 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP23828592A priority Critical patent/JP3121449B2/en
Publication of JPH0687952A publication Critical patent/JPH0687952A/en
Application granted granted Critical
Publication of JP3121449B2 publication Critical patent/JP3121449B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyesters Or Polycarbonates (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は均一で粗大粒子が少なく
平滑で透明性がよく、かつ滑り性が改良されたシリカ粒
子を含有するポリエチレンテレフタレートを主な構成単
位とするポリエステルベースの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a polyester base containing polyethylene terephthalate as a main constituent unit containing silica particles containing silica particles having uniform, less coarse particles, smoothness, good transparency and improved slipperiness. .

【0002】[0002]

【従来の技術】ポリエステル、特にポリエチレンテレフ
タレート(以下PETという)を主成分とするポリエス
テルはその優れた特性から繊維、フィルム、シート等の
成形用材料として広く使用されている。
2. Description of the Related Art Polyesters, particularly polyesters containing polyethylene terephthalate (hereinafter referred to as PET) as a main component, are widely used as molding materials for fibers, films, sheets and the like because of their excellent properties.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、ポリエ
ステルのベースやシートはそのままでは滑り性に欠ける
ため、従来より種々の粉体をポリエステルチップの製造
時または製膜時に混入させる提案がなされているが粉体
同士の凝集による粗大粒子の発生、静電印加性に劣るこ
とによる表面性の悪いフィルムとなる等、必ずしも満足
できるものではない。本発明は、透明でかつ滑り性がよ
く、更に製膜時の静電印加性に優れたポリエステルベー
スの製造方法を提供するものである。
However, since the base or sheet of the polyester lacks slipperiness as it is, it has been proposed to mix various powders at the time of producing polyester chips or at the time of film formation. It is not always satisfactory, for example, generation of coarse particles due to aggregation of bodies, and a film having poor surface properties due to poor electrostatic application properties. The present invention provides a method for producing a polyester base that is transparent, has good slipperiness, and has excellent electrostatic application properties during film formation.

【0004】[0004]

【課題を解決するための手段】本発明は、主たるジカル
ボン酸であるテレフタル酸と主たるアルキレングリコー
ルであるエチレングリコールとからポリエステルを製造
するにあたり、エステル化反応の間に(a) Mg、Mn及
びZnのなかより選ばれた原子を含むエチレングリコー
ル可溶性の化合物を添加し、エステル化反応が実質的に
終了した段階で(b) 燐酸もしくは亜燐酸もしくはこれら
のエステル化合物及び(c) 下記一般式(1) で示されるイ
ミダゾール化合物を添加し、エステル化反応の前から重
縮合反応を開始するまでの間に(d) 粒径が0.1μmな
いし4μmの微粒子シリカをエチレングリコールスラリ
ーとして連続的または間欠的に添加し、得られたポリエ
ステルを製膜することを特徴とするポリエステルベース
の製造方法。 一般式(1)
The present invention relates to a process for producing a polyester from terephthalic acid, which is a main dicarboxylic acid, and ethylene glycol, which is a main alkylene glycol, during the esterification reaction. An ethylene glycol-soluble compound containing an atom selected from the above is added, and at the stage when the esterification reaction is substantially completed, (b) phosphoric acid or phosphorous acid or an ester compound thereof and (c) a compound represented by the following general formula (1) (D) between the time before the esterification reaction and the start of the polycondensation reaction, and (d) continuous or intermittent use of fine particle silica having a particle size of 0.1 μm to 4 μm as an ethylene glycol slurry. And forming the resulting polyester into a film. General formula (1)

【0005】[0005]

【化2】 Embedded image

【0006】ここで、R1 とR2 は炭素数1〜8個のア
ルキル基もしくは芳香族残基で、同一であっても異なっ
ていてもよい。さらに特に、本発明により得られるポリ
エステルベース中のシリカ粒子は、平均粒径が0.8μ
mで、かつ粒径1〜4μm(粒子A)と粒径0.1〜1
μmの(粒子B)を下記一般式(2) の比に分布したもの
で、ポリエステルベース中のシリカの含量は(粒子A)
と(粒子B)を合わせて0.001ないし1.0重量
%、好ましくは0.005ないし1.0重量%であるこ
とが好ましい。 一般式(2) 1/4≦(粒子A)/(粒子B)≦3/5
Here, R 1 and R 2 are an alkyl group having 1 to 8 carbon atoms or an aromatic residue, which may be the same or different. More particularly, the silica particles in the polyester base obtained according to the present invention have an average particle size of 0.8 μm.
m and a particle size of 1 to 4 μm (particle A) and a particle size of 0.1 to 1
μm (particle B) is distributed in the ratio of the following general formula (2), and the content of silica in the polyester base is (particle A)
And (particle B) are preferably 0.001 to 1.0% by weight, preferably 0.005 to 1.0% by weight. General formula (2) 1/4 ≦ (particle A) / (particle B) ≦ 3/5

【0007】Mg、Mn及びZnより選ばれた原子を含
むエチレングリコール可溶性の化合物と燐酸もしくは亜
燐酸もしくはこれらのエステル化合物は、実質的にポリ
エステル中に存在する量として2.5≦M/P≦6(こ
こでMはMg、Mn、Znのなかより選ばれた原子を含
む化合物の金属元素を示し、Pは燐酸もしくは亜燐酸も
しくはこれらのエステル化合物のP元素を示し、数値は
元素/元素のモル数である)であり、かつMは20ない
し150ppm 、好ましくは40ないし120ppm であ
り、更に5ないし100ppm の一般式(1) に示されるイ
ミダゾール化合物を共存させることが好ましい。本発明
によって透明性に優れ、滑り性がよく且つ静電印加性に
優れたポリエステル及びポリエステルベースが得られ
る。
[0007] The ethylene glycol-soluble compound containing an atom selected from Mg, Mn and Zn and phosphoric acid or phosphorous acid or an ester compound thereof are substantially present in the polyester in an amount of 2.5 ≦ M / P ≦ 6 (where M represents a metal element of a compound containing an atom selected from Mg, Mn and Zn, P represents a P element of phosphoric acid or phosphorous acid or an ester compound of these compounds, And M is 20 to 150 ppm, preferably 40 to 120 ppm, and more preferably 5 to 100 ppm of an imidazole compound represented by the general formula (1). According to the present invention, it is possible to obtain a polyester and a polyester base having excellent transparency, good slipperiness, and excellent electrostatic applicability.

【0008】また、ポリエステルベースの製膜には、シ
リカ含有ペレットのみを用いて製膜できるが、更に、い
わゆるマスターバッチ方式を用いることもできる。すな
わち、シリカ含有ペレットとシリカを含まないペレット
を混合し、製膜することにより目的のシリカ含有ベース
を得ることができる。
For the polyester-based film formation, it is possible to form a film using only silica-containing pellets, but it is also possible to use a so-called master batch method. That is, the desired silica-containing base can be obtained by mixing silica-containing pellets and pellets containing no silica and forming a film.

【0009】本発明でいうポリエステルは、テレフタル
酸(以下PTAという)とエチレングリコール(以下E
Gという)を重縮合して得られるPETを主成分とする
が、PETの特性を損なわない範囲で他の共重合成分を
含むことができる。即ち、例えばジカルボン酸としては
イソフタル酸、フタル酸、ナトリウムスルホイソフタル
酸、ナフタレンジカルボン酸のような芳香族ジカルボン
酸、アジピン酸、セバチン酸、アゼライン酸のような脂
肪族ジカルボン酸、シクロヘキサンジカルボン酸のよう
な脂環族ジカルボン酸等があげられる。同様にグリコー
ルとしては例えばプロピレングリコール、ジエチレング
リコール、ブタンジオールのような脂肪族グリコール、
シクロヘキサンジメタノールやキシリレングリコールの
ような脂環族または芳香族系グリコールをあげることが
できる。また必要に応じ、酸化防止剤、帯電防止剤、紫
外線防止剤、着色剤(染料等)も添加することができ
る。
The polyester referred to in the present invention comprises terephthalic acid (hereinafter referred to as PTA) and ethylene glycol (hereinafter referred to as E).
G) is a main component of PET obtained by polycondensation, but may contain other copolymer components as long as the properties of PET are not impaired. That is, for example, dicarboxylic acids such as isophthalic acid, phthalic acid, sodium sulfoisophthalic acid, aromatic dicarboxylic acids such as naphthalenedicarboxylic acid, adipic acid, sebacic acid, aliphatic dicarboxylic acids such as azelaic acid, and cyclohexanedicarboxylic acid. Alicyclic dicarboxylic acids and the like. Similarly, glycols such as propylene glycol, diethylene glycol, aliphatic glycols such as butanediol,
Alicyclic or aromatic glycols such as cyclohexanedimethanol and xylylene glycol can be mentioned. If necessary, an antioxidant, an antistatic agent, an ultraviolet inhibitor, and a coloring agent (dye, etc.) can be added.

【0010】本発明でいうシリカ粒子は、平均粒径が
0.8μmで、かつ粒径が1/4μmのシリカ(粒子
A)と粒径が0.1〜1μのシリカ(粒子B)を前記一
般式(2)の比に分布した粒子で、EGスラリーとしてP
ET合成時に、特に重縮合反応を開始するまでの任意の
段階で添加する。シリカの粒径が4μ以上と大きくなる
と製膜後のベースは、シリカ粒子の周りに生ずるボイド
(空隙)によりヘイズの大きい、また、突起の大きな平
面性の悪いベースとなる。更に、0.1μ以下の小粒径
のシリカでは、ベースとしたときの滑り性を確保するた
めに必要な粒子量を添加すると、ヘイズの大きい透明性
に欠けたベースとなってしまう。本発明の一般式(2) に
提示したような比に粒子Aと粒子Bが存在することによ
り透明性に優れかつ滑り性のよいベースを得ることがで
きることが判った。シリカを含有するPETベースを得
るには、製膜時にシリカ粒子をPETペレットと混合し
て製膜することによっても可能であるが、凝集粗粒子の
ない平面性のよい、かつヘイズの少ないベースを得るに
はPETの合成時、特に重縮合反応を開始するまでの任
意の段階で反応系にEGスラリーの状態で添加、混合す
ることが最も好ましい。
The silica particles referred to in the present invention include silica (particle A) having an average particle diameter of 0.8 μm and a particle diameter of 1/4 μm and silica (particle B) having a particle diameter of 0.1 to 1 μm. Particles distributed in the ratio of the general formula (2).
During the ET synthesis, it is added at an arbitrary stage until the polycondensation reaction is started. If the silica particle size is as large as 4 μm or more, the base after film formation becomes a base having a large haze due to voids (voids) generated around the silica particles and a large flatness of projections. Furthermore, in the case of silica having a small particle diameter of 0.1 μ or less, if a particle amount necessary for ensuring the slipperiness of the base is added, the base becomes large in haze and lacks in transparency. It has been found that the presence of the particles A and B in the ratio as shown in the general formula (2) of the present invention makes it possible to obtain a base having excellent transparency and good slipperiness. In order to obtain a PET base containing silica, it is possible to form a film by mixing silica particles with PET pellets at the time of film formation, but a base having good flatness and no haze without agglomerated coarse particles is required. In order to obtain it, it is most preferable to add and mix the EG slurry to the reaction system at an arbitrary stage during the synthesis of PET, particularly before the start of the polycondensation reaction.

【0011】またベースの濁度(ヘイズ)や他の特性を
損なわない範囲でCaCO3 、TiO2、Al 2O3 のような粉体を
添加することもできる。またこれらの添加剤類はPET
合成時に添加できるが、製膜時にペレットと混合するこ
ともできる。本発明の一般式(1) で示されるイミダゾー
ル化合物とMg、Mn及びZn化合物から選ばれた原子
を含む金属化合物を共存させることにより、製膜時の静
電印加性に優れたペレットが得られることから、高速製
膜が可能となりかつ冷却ロールとの接着がよくなること
から平面性のよいベースとすることができる。
The turbidity (haze) and other characteristics of the base
CaCO within the range that does not impairThree, TiOTwo, Al TwoOThreePowder like
It can also be added. These additives are PET
It can be added during synthesis, but must be mixed with pellets during film formation.
Can also be. The imidazo represented by the general formula (1) of the present invention
Compounds and atoms selected from Mg, Mn and Zn compounds
The coexistence of metal compounds containing
Since pellets with excellent chargeability can be obtained,
A film can be formed and adhesion with the cooling roll is improved.
Therefore, a base having good flatness can be obtained.

【0012】本発明のPETの合成と製膜は通常の方法
で行なうことができるが以下に一例を挙げて説明する。
PETの合成は、バッチ式でも連続式でもよく、またエ
ステル交換方式でも直接エステル化方式でもよいが、こ
こではバッチ式の直接エステル化方式の例を示す。攪拌
機、精留塔、N2導入管を備えたエステル化反応釜にPT
AとEGを投入し、攪拌しながらN2で1ないし4kg/cm
2 に加圧し、加熱する。反応によって留出する水を精留
塔から抜き出しつつ、最終的には反応液温度を250℃
まで上昇させる。反応の終点は留出水の留出量で判定す
るが、通常この反応は3ないし6時間を要する。シリカ
粒子はEGスラリーとして、重縮合反応開始までの任意
の段階で添加される。
The synthesis and film formation of the PET of the present invention can be carried out by a usual method, which will be described below with reference to an example.
The synthesis of PET may be a batch system or a continuous system, and may be a transesterification system or a direct esterification system. Here, an example of a batch direct esterification system will be described. Stirrer, rectification column, the esterification reaction kettle equipped with N 2 inlet PT
Charge A and EG, and stir with N 2 to 1-4 kg / cm.
Press to 2 and heat. While extracting the water distilled by the reaction from the rectification column, the temperature of the reaction solution is finally raised to 250 ° C.
Up to The end point of the reaction is determined by the amount of distillate distilled out, and this reaction usually requires 3 to 6 hours. The silica particles are added as an EG slurry at any stage before the start of the polycondensation reaction.

【0013】こうして得られたエステル化反応終了後
(オリゴマー)は、攪拌機、留出管、N2導入管、真空配
管を備え、280℃に加熱された重縮合反応釜に移され
る。重縮合反応触媒として300ppm の三酸化アンチモ
ンを添加し、反応系内を真空にする。真空度を徐々に高
め最終的には1.0mmHgとした。約3.5時間で所定の
粘度に達した。ポリマーは釜底よりストランド状で取り
出し、水中で冷却してから3ないし5mmの長さに切断さ
れペレットを得られる。こうして得たシリカ含有ペレッ
トを、別途合成したシリカを含有しないクリアーなPE
Tとペレットと混合し乾燥し、溶融押し出しにより非晶
質のベースを得た。このベースを縦方向に3.5倍、次
いで横方向に3.5倍延伸し、熱固定し50μの厚みの
延伸されたベースを得た。このベースはさらにTg以下
の温度でアニーリングすることにより熱収縮を改良する
こともできる。
After the completion of the esterification reaction (oligomer) thus obtained, it is transferred to a polycondensation reactor equipped with a stirrer, a distilling tube, an N 2 introducing tube and a vacuum pipe and heated to 280 ° C. 300 ppm of antimony trioxide is added as a polycondensation reaction catalyst, and the inside of the reaction system is evacuated. The degree of vacuum was gradually increased to 1.0 mmHg. The desired viscosity was reached in about 3.5 hours. The polymer is taken out in a strand form from the bottom of the kettle, cooled in water and then cut into a length of 3 to 5 mm to obtain a pellet. The silica-containing pellets thus obtained are synthesized with a silica-free clear PE
T and the pellets were mixed, dried, and melt-extruded to obtain an amorphous base. This base was stretched 3.5 times in the longitudinal direction and then 3.5 times in the transverse direction, and heat-set to obtain a stretched base having a thickness of 50 μm. The base can also have improved heat shrinkage by annealing at temperatures below Tg.

【0014】[0014]

【実施例】以下に実施例をあげて本発明を説明する。実
施例中「部」とあるのは特に断らない限り重量部を示
す。本発明において粒子粒度分布、透明性(ヘイズ)、
表面性、摩擦係数及び静電印加性は以下のように測定す
る。 (粒子粒度分布)超音波処理によりシリカ粒子をエチレ
ングリコール中に均一分散させ、その分散液を堀場超遠
心式自動粒度分布測定装置(CAPA-700) を用いて粒子粒
度分布を求めた。 (透明性(ヘイズ))フィルムベースの透明性(ヘイ
ズ)をASTM-D1003-52 に従って測定した。 (表面性)表面性は触針式三次元表面粗さ計(小坂研究
所)を用い、針径2μm、荷重30mg、カットオフ0.
25mmの条件で中心線平均粗さ(Ra) を測定した。 (摩擦係数)ベースを二枚重ねとし、一定の荷重をかけ
ベース面同士の摩擦係数を測定した。この時、ベースの
動き出す瞬間の摩擦係数を静摩擦係数、動きだし安定に
なったところの摩擦係数を動摩擦係数として規定した。 (静電印加性)押出機の口金部と冷却ドラムとの間に細
線の電極を設け、この細線と冷却ドラムとの間に5kVの
直流電圧を印加し50m/分の製膜速度で良好に製膜できる
か(○)、否か(×)で判定した。
The present invention will be described below with reference to examples. In the examples, “parts” means “parts by weight” unless otherwise specified. In the present invention, particle size distribution, transparency (haze),
The surface properties, the coefficient of friction, and the applicability of static electricity are measured as follows. (Particle particle size distribution) Silica particles were uniformly dispersed in ethylene glycol by ultrasonic treatment, and the particle size distribution of the dispersion was determined using a Horiba ultracentrifugal automatic particle size distribution analyzer (CAPA-700). (Transparency (Haze)) The transparency (haze) of the film base was measured according to ASTM-D1003-52. (Surface properties) The surface properties were measured using a stylus type three-dimensional surface roughness meter (Kosaka Laboratory), needle diameter 2 μm, load 30 mg, cut-off 0.
The center line average roughness (Ra) was measured under the condition of 25 mm. (Friction Coefficient) Two bases were stacked and a constant load was applied to measure the friction coefficient between the base surfaces. At this time, the friction coefficient at the moment when the base started to move was defined as the static friction coefficient, and the friction coefficient at the time when the movement was stabilized was defined as the dynamic friction coefficient. (Electrostatic application property) A thin wire electrode is provided between the die of the extruder and the cooling drum, and a DC voltage of 5 kV is applied between the thin wire and the cooling drum, and a film forming speed of 50 m / min is excellent. It was determined whether the film could be formed (膜) or not (×).

【0015】実施例1 17.3kgのPTAと8.4kgのEG及び14.0gの
酢酸マグネシウム・4水和物をエステル化反応釜に投入
し、攪拌しながらN2で3kg/cm2 に加圧し、加熱する。
反応によって生成する留出水を精留塔から抜き出しつつ
最終的に反応液の温度を250℃に上昇させた。留出水
量からエステル化反応が90%に達したときに20%E
Gスラリーとした平均粒径0.8μmであり、表1に示
す分布比をもつシリカ粒子を200 g添加し、さらにエス
テル化反応を続けて完了させた。反応液を280℃に加
熱された重縮合反応釜に移し、攪拌しながら4.0gの
燐酸トリメチル、1.0gの2−エチル−4−メチルイ
ミダゾール(以下、EMIという)及び6.0gの三酸
化アンチモンを添加し、真空にする。徐々に真空度をあ
げ、最終的には1.2mmHgとした。所定の溶融粘度に達
したところで反応を終了した。フェノール/ テトラクロ
ルエタン;50/50混合溶液中、25℃でのI.V は
0.665であった。得られたシリカ混入ポリマー40
部をシリカ混入しないクリアーなPET960部とよく
混合し、真空下、140℃で5時間乾燥した。300℃
で溶融押し出し後、95℃で縦方向にさらに100℃で
横方向に延伸後熱固定して50μのベースを得た。表1
に合成処方、表2に特性を示す。
Example 1 17.3 kg of PTA, 8.4 kg of EG and 14.0 g of magnesium acetate tetrahydrate were charged into an esterification reactor and added with N 2 to 3 kg / cm 2 with stirring. Press and heat.
The temperature of the reaction solution was finally raised to 250 ° C. while extracting the distillate produced by the reaction from the rectification column. When the esterification reaction reaches 90% from the amount of distillate, 20% E
200 g of silica particles having an average particle size of 0.8 μm as a G slurry and having a distribution ratio shown in Table 1 were added, and the esterification reaction was continued to complete. The reaction solution was transferred to a polycondensation reactor heated to 280 ° C., and 4.0 g of trimethyl phosphate, 1.0 g of 2-ethyl-4-methylimidazole (hereinafter referred to as EMI) and 6.0 g of trimethyl phosphate were stirred. Add antimony oxide and apply vacuum. The degree of vacuum was gradually increased to 1.2 mmHg. The reaction was terminated when a predetermined melt viscosity was reached. The phenol / tetrachloroethane; IV in a 50/50 mixed solution at 25 ° C. was 0.665. Obtained silica-mixed polymer 40
The mixture was thoroughly mixed with 960 parts of clear PET containing no silica, and dried under vacuum at 140 ° C. for 5 hours. 300 ℃
After being melt-extruded at 95 ° C., stretched in the vertical direction at 95 ° C. and further in the horizontal direction at 100 ° C., and then heat-set to obtain a 50 μm base. Table 1
Table 2 shows the synthetic formula, and Table 2 shows the properties.

【0016】実施例2 実施例1で得られたシリカ混入ペレット20部をクリア
ーなPET980部と混合、乾燥し、実施例1と同様な
操作により50μmのベースを得た。表1に処方、表2
に特性を示す。
Example 2 20 parts of the silica-containing pellet obtained in Example 1 was mixed with 980 parts of clear PET and dried, and a 50 μm base was obtained in the same manner as in Example 1. Table 1 formulas, Table 2
Shows the characteristics.

【0017】実施例3 実施例1で得られたシリカ混入ペレット60部をクリア
ーなPET900部と混合、乾燥し、実施例1と同様な
操作により50μmのベースを得た。表1に処方、表2
に特性を示す。
Example 3 60 parts of the silica-containing pellet obtained in Example 1 was mixed with 900 parts of clear PET and dried, and a 50 μm base was obtained in the same manner as in Example 1. Table 1 formulas, Table 2
Shows the characteristics.

【0018】比較例1 実施例1で使用したシリカの代わりに同様な方法でシリ
カ粒子のみ平均粒径2.8μmのシリカを用い50μm
の比較例1のベースを得た。表1に処方、表2に特性を
示すが実施例1のベースに比較し透明性、摩擦係数で劣
る。
COMPARATIVE EXAMPLE 1 In place of the silica used in Example 1, silica particles having an average particle size of 2.8 μm were used in the same manner as in Example 1 except that the silica particles were 50 μm.
Of Comparative Example 1 was obtained. The formulation is shown in Table 1 and the properties are shown in Table 2, but are inferior in transparency and coefficient of friction as compared with the base of Example 1.

【0019】比較例2 実施例1で使用したシリカを用いたが、ポリマー合成時
に酢酸マグネシウムEMIを使用せずポリマーを作り、
さらに50μmの比較例2のベースを得た。表1に処
方、表2に特性を示すが実施例1に比較し製膜時の静電
印加性に劣る。
Comparative Example 2 The silica used in Example 1 was used, but a polymer was prepared without using magnesium acetate EMI during the synthesis of the polymer.
Further, a base of Comparative Example 2 having a thickness of 50 μm was obtained. The formulation is shown in Table 1 and the characteristics are shown in Table 2. However, compared with Example 1, the electrostatic applicability at the time of film formation is inferior.

【0020】比較例3 シリカ粒子を使用しないほかは実施例1と全く同様にし
て50μmの比較例4のベースを得た。表1に処方、表
2に特性を示すが実施例1に比較し摩擦係数が劣る。
Comparative Example 3 A base of Comparative Example 4 having a thickness of 50 μm was obtained in exactly the same manner as in Example 1 except that no silica particles were used. The formulation is shown in Table 1 and the properties are shown in Table 2, but the friction coefficient is inferior to that of Example 1.

【0021】[0021]

【表1】 [Table 1]

【0022】[0022]

【表2】 [Table 2]

【0023】表1と表2からわかる通り本発明で得られ
るポリエステルベースは滑り性に優れ、透明性がよくか
つ製膜時の静電印加性に優れるため経済的な製膜速度を
得ることができる。
As can be seen from Tables 1 and 2, the polyester base obtained by the present invention has excellent slipperiness, good transparency, and excellent electrostatic applicability during film formation, so that an economical film formation speed can be obtained. it can.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI C08K 5/51 C08K 5/51 C08L 67/02 C08L 67/02 // B29K 67:00 (56)参考文献 特開 平3−292323(JP,A) 特開 平4−1224(JP,A) 特開 平3−269016(JP,A) 特開 平3−234735(JP,A)──────────────────────────────────────────────────続 き Continuation of the front page (51) Int.Cl. 7 Identification symbol FI C08K 5/51 C08K 5/51 C08L 67/02 C08L 67/02 // B29K 67:00 (56) References JP-A-3-3 292323 (JP, A) JP-A-4-1224 (JP, A) JP-A-3-269016 (JP, A) JP-A-3-234735 (JP, A)

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 主たるジカルボン酸であるテレフタル酸
と主たるアルキレングリコールであるエチレングリコー
ルとからポリエステルを製造するにあたり、エステル化
反応の間に(a) Mg、Mn及びZnのなかより選ばれた
原子を含むエチレングリコール可溶性の化合物を添加
し、エステル化反応が実質的に終了した段階で(b) 燐酸
もしくは亜燐酸もしくはこれらのエステル化合物及び
(c) 下記一般式(1) で示されるイミダゾール化合物を添
加し、エステル化反応の前から重縮合反応を開始するま
での間に(d) 粒径が0.1μmないし4μmの微粒子シ
リカをエチレングリコールスラリーとして連続的または
間欠的に添加し、得られたポリエステルを製膜すること
を特徴とするポリエステルベースの製造方法。 一般式(1) 【化1】 ここで、R1 とR2 は炭素数1〜8個のアルキル基もし
くは芳香族基残基で、同一であっても異なっていても良
い。
(1) In producing a polyester from terephthalic acid, which is a main dicarboxylic acid, and ethylene glycol, which is a main alkylene glycol, (a) an atom selected from Mg, Mn and Zn during an esterification reaction. The ethylene glycol-soluble compound containing is added, and at the stage when the esterification reaction is substantially completed, (b) phosphoric acid or phosphorous acid or an ester compound thereof and
(c) An imidazole compound represented by the following general formula (1) is added, and between the time before the esterification reaction and the start of the polycondensation reaction, (d) the fine particle silica having a particle size of 0.1 μm to 4 μm is ethylene A method for producing a polyester base, comprising continuously or intermittently adding a glycol slurry to form a film of the obtained polyester. General formula (1) Here, R 1 and R 2 are an alkyl group or an aromatic group residue having 1 to 8 carbon atoms, which may be the same or different.
【請求項2】 シリカ粒子が平均粒径が0.8μmで、
かつ粒径1〜4μmのシリカ(粒子A)と粒径0.1〜
1μmのシリカ(粒子B)を下記一般式(2)に示す比に
分布した粒子であり、ポリエステルベース中のシリカの
含有量が0.001ないし1.0重量%である請求項1
に記載のポリエステルベースの製造方法。 一般式(2) 1/4≦(粒子A)/(粒子B)≦3/5
2. The silica particles have an average particle size of 0.8 μm,
And silica (particle A) having a particle diameter of 1 to 4 μm and a particle diameter of 0.1 to
2. A particle in which 1 μm silica (particle B) is distributed in a ratio represented by the following general formula (2), and the content of silica in the polyester base is 0.001 to 1.0% by weight.
The method for producing a polyester base according to the above. General formula (2) 1/4 ≦ (particle A) / (particle B) ≦ 3/5
【請求項3】 Mg、Mn及びZnのなかより選ばれた
原子を含むエチレングリコール可溶性の化合物と燐酸も
しくは亜燐酸もしくはこれらのエステル化合物は、実質
的にポリエステル中に存在する量として2.5≦M/P
≦6(ここでMはMg,Mn及びZnのなかより選ばれ
た原子を含む化合物の金属元素を示し、Pは燐酸もしく
は亜燐酸もしくはそれらのエステル化合物の燐元素を示
し、数値は元素/元素のモル数である)でありかつMは
20ないし150ppm 、さらに5ないし100ppm の一
般式(1) に示されるイミダゾール化合物を共存させるこ
とを特徴とする請求項1に記載のポリエステルベースの
製造方法。
3. An ethylene glycol-soluble compound containing an atom selected from Mg, Mn and Zn and a phosphoric acid or a phosphorous acid or an ester compound of these compounds are present in the polyester in an amount of 2.5 ≦ M / P
≦ 6 (where M represents a metal element of a compound containing an atom selected from Mg, Mn and Zn, P represents a phosphorus element of phosphoric acid or phosphorous acid or an ester compound thereof, and the numerical value is element / element 2. The process according to claim 1, wherein the imidazole compound represented by the general formula (1) is present in an amount of 20 to 150 ppm, and 5 to 100 ppm.
【請求項4】 請求項1に記載のシリカ混入ポリエステ
ルとシリカの混入していないポリエステルと混合し、溶
融製膜してポリエステルベースとする請求項1に記載の
ポリエステルベースの製造方法。
4. The process for producing a polyester base according to claim 1, wherein the polyester containing silica and the polyester containing no silica are mixed and melt-formed to form a polyester base.
JP23828592A 1992-09-07 1992-09-07 Polyester-based manufacturing method Expired - Fee Related JP3121449B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23828592A JP3121449B2 (en) 1992-09-07 1992-09-07 Polyester-based manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23828592A JP3121449B2 (en) 1992-09-07 1992-09-07 Polyester-based manufacturing method

Publications (2)

Publication Number Publication Date
JPH0687952A JPH0687952A (en) 1994-03-29
JP3121449B2 true JP3121449B2 (en) 2000-12-25

Family

ID=17027923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23828592A Expired - Fee Related JP3121449B2 (en) 1992-09-07 1992-09-07 Polyester-based manufacturing method

Country Status (1)

Country Link
JP (1) JP3121449B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI295298B (en) * 2000-08-29 2008-04-01 Sumitomo Chemical Co Liquid crystalline polyester and method for producing the same

Also Published As

Publication number Publication date
JPH0687952A (en) 1994-03-29

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