JP3052230B2 - Method of forming inorganic paint film - Google Patents
Method of forming inorganic paint filmInfo
- Publication number
- JP3052230B2 JP3052230B2 JP6293185A JP29318594A JP3052230B2 JP 3052230 B2 JP3052230 B2 JP 3052230B2 JP 6293185 A JP6293185 A JP 6293185A JP 29318594 A JP29318594 A JP 29318594A JP 3052230 B2 JP3052230 B2 JP 3052230B2
- Authority
- JP
- Japan
- Prior art keywords
- inorganic
- general formula
- inorganic paint
- weight
- photocatalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003973 paint Substances 0.000 title claims description 54
- 238000000034 method Methods 0.000 title claims description 20
- 238000000576 coating method Methods 0.000 claims description 53
- 239000011248 coating agent Substances 0.000 claims description 48
- 239000011941 photocatalyst Substances 0.000 claims description 34
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 14
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 12
- 239000008119 colloidal silica Substances 0.000 claims description 12
- 239000002994 raw material Substances 0.000 claims description 12
- 150000003377 silicon compounds Chemical class 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 239000004094 surface-active agent Substances 0.000 claims description 10
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 claims description 8
- 239000004793 Polystyrene Substances 0.000 claims description 8
- 229920002223 polystyrene Polymers 0.000 claims description 8
- 238000006068 polycondensation reaction Methods 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 5
- 238000006460 hydrolysis reaction Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 150000001875 compounds Chemical group 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 150000002430 hydrocarbons Chemical group 0.000 claims 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 31
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 230000001699 photocatalysis Effects 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 8
- 125000001183 hydrocarbyl group Chemical group 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- -1 γ-chloropropyl group Chemical group 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 230000000844 anti-bacterial effect Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 4
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003242 anti bacterial agent Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012445 acidic reagent Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000004332 deodorization Methods 0.000 description 2
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 2
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000007146 photocatalysis Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical class CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000000845 anti-microbial effect Effects 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 1
- VICYBMUVWHJEFT-UHFFFAOYSA-N dodecyltrimethylammonium ion Chemical class CCCCCCCCCCCC[N+](C)(C)C VICYBMUVWHJEFT-UHFFFAOYSA-N 0.000 description 1
- 238000006253 efflorescence Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- UIJMUCVCCQKMPZ-UHFFFAOYSA-N methoxy-dimethyl-(2-methylpropyl)silane Chemical compound CO[Si](C)(C)CC(C)C UIJMUCVCCQKMPZ-UHFFFAOYSA-N 0.000 description 1
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 239000011356 non-aqueous organic solvent Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 206010037844 rash Diseases 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- NNLPAMPVXAPWKG-UHFFFAOYSA-N trimethyl(1-methylethoxy)silane Chemical compound CC(C)O[Si](C)(C)C NNLPAMPVXAPWKG-UHFFFAOYSA-N 0.000 description 1
- PDSVZUAJOIQXRK-UHFFFAOYSA-N trimethyl(octadecyl)azanium Chemical class CCCCCCCCCCCCCCCCCC[N+](C)(C)C PDSVZUAJOIQXRK-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Catalysts (AREA)
- Paints Or Removers (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は無機塗料塗膜の形成方法
に関する。The present invention relates to a method for forming an inorganic paint film.
【0002】[0002]
【従来の技術】有機の樹脂に抗菌剤を含有した抗菌性有
機塗料にあっては、長期間使用すると樹脂が劣化し、特
に屋外で使用した場合には、表面に汚れが付着したり、
紫外線による劣化から、塗膜の抗菌性能が低下し易い欠
点があった。そこで、ケイ酸塩系、リン酸塩系、ジルコ
ニウム系の無機組成物に抗菌剤を含有した無機塗料が知
られているが、上記無機塗料は有機塗料より耐久性は良
好となるが、いずれも200℃以上の高温で焼き付けを
する必要があるため使用できる範囲が限られ、建材やプ
ラスチックへに直接塗布するのに不適切であった。な
お、ケイ酸塩系の無機塗料は長期間使用するとアルカリ
が表面に溶出して白華現象を起こしやすい欠点があっ
た。また、特開昭62−57470号公報に、金属アル
コキシドを含有した無機塗料が開示されているが、この
無機塗料は200℃以下で硬化するものの、塗膜に柔軟
性がなく、クラックが入りやすい問題があった。近年、
多種多様な材料に塗料を用いる必要性から、長期間使用
しても抗菌性能を持続し、且つ、クラックがない、20
0℃以下の温度で焼き付けできる塗料が求められてい
た。2. Description of the Related Art In an antibacterial organic paint containing an antibacterial agent in an organic resin, the resin deteriorates when used for a long period of time. Especially when used outdoors, dirt adheres to the surface,
There was a disadvantage that the antimicrobial performance of the coating film was apt to decrease due to the deterioration due to ultraviolet rays. Therefore, inorganic coatings containing an antibacterial agent in a silicate-based, phosphate-based, zirconium-based inorganic composition are known, but the above-mentioned inorganic coatings have better durability than organic coatings. Since it is necessary to bake at a high temperature of 200 ° C. or more, the usable range is limited, and it is not suitable for directly applying to building materials and plastics. In addition, when used for a long period of time, silicate-based inorganic coatings have a disadvantage that alkali elutes to the surface and the efflorescence tends to occur. JP-A-62-57470 discloses an inorganic coating containing a metal alkoxide. Although this inorganic coating cures at 200 ° C. or lower, the coating has no flexibility and easily cracks. There was a problem. recent years,
Due to the necessity of using paints for a wide variety of materials, antibacterial performance is maintained even after long-term use, and there is no crack.
There has been a demand for a paint that can be baked at a temperature of 0 ° C. or less.
【0003】[0003]
【発明が解決しようとする課題】そこで、本発明者等
は、特願平6−205835で抗菌剤として、光触媒機
能を有する成分である光触媒を含有した抗菌性無機塗料
を提案した。ところが、光触媒を基材に担持する場合、
基材の制約や密着性に難点があり、塗料を用いて、光触
媒を塗膜化した場合、有機系塗料では、光触媒の持つ酸
化作用で塗膜自身が劣化してしまい性能が低下し易く、
無機塗料を用いた場合、無機塗料中に光触媒が、沈降し
てしまい、光触媒の性能が発揮され難いという傾向があ
った。Accordingly, the present inventors have proposed, in Japanese Patent Application No. 6-205835, an antibacterial inorganic paint containing a photocatalyst which is a component having a photocatalytic function as an antibacterial agent. However, when a photocatalyst is supported on a substrate,
There are difficulties in the restriction and adhesion of the base material, and when a photocatalyst is formed into a coating film using a paint, in the case of an organic paint, the coating film itself is deteriorated due to the oxidizing action of the photocatalyst, and the performance is easily reduced,
When an inorganic paint is used, the photocatalyst tends to settle in the inorganic paint, and the performance of the photocatalyst tends to be hardly exhibited.
【0004】本発明は上述の事実に鑑みてなされたもの
で、その目的とするところは、光触媒を表面に担持し、
高い光触媒性能を有する無機塗料塗膜の形成方法を提供
することにある。The present invention has been made in view of the above-mentioned facts, and has as its object to carry a photocatalyst on the surface,
An object of the present invention is to provide a method for forming an inorganic coating film having high photocatalytic performance.
【0005】[0005]
【課題を解決するための手段】本発明の請求項1に係る
無機塗料塗膜の形成方法は、下記組成(A)、(B)及
び(C)を原料とし、これらの原料を混合し、この混合
物を加水分解、及び、重縮合反応を行ない調整された重
量平均分子量がポリスチレン換算で900以上である第
一の無機塗料を基材に塗布後、溶媒に分散した光触媒を
塗布し、さらに、これらの上に、下記組成(A)、
(B)及び(C)を原料とし、これらの原料を混合し、
この混合物を加水分解、及び、重縮合反応を行ない調整
された重量平均分子量がポリスチレン換算で900以上
である第二の無機塗料を塗布して、光触媒含有塗膜を形
成することを特徴とする。 (A)下記の一般式で表されるケイ素化合物及び/又
はコロイド状シリカを20〜200重量部、 Si(OR1 )4 −−−−−− (B)下記の一般式で表されるケイ素化合物を100
重量部、 R2 Si(OR1 )3 −−−−−− (C)下記の一般式で表されるケイ素化合物を0〜6
0重量部、 R2 2Si(OR1 )2 −−−−−− 〔上記の一般式〜一般式中、R1 、R2 は1価の炭
化水素基を示す。〕本発明の請求項2に係る無機塗料塗
膜の形成方法は、請求項1記載の無機塗料塗膜の形成方
法において、前記第二の無機塗料は、第一の無機塗料の
濃度を薄めたものであることを特徴とする。According to a first aspect of the present invention, there is provided a method for forming an inorganic coating film, comprising the following compositions (A), (B) and (C) as raw materials, and mixing these raw materials: Hydrolysis of this mixture, and, after applying a first inorganic coating having a weight average molecular weight of 900 or more in terms of polystyrene adjusted by performing a polycondensation reaction on a substrate, applying a photocatalyst dispersed in a solvent, On these, the following composition (A),
Using (B) and (C) as raw materials, mixing these raw materials,
This mixture is subjected to hydrolysis and polycondensation reaction, and a second inorganic paint having a weight-average molecular weight of 900 or more in terms of polystyrene is applied to form a photocatalyst-containing coating film. (A) a silicon compound represented by the following general formula and / or colloidal silica 20 to 200 parts by weight, Si (OR 1) 4 ------ (B) silicon represented by the following general formula 100 compounds
Parts by weight, R 2 Si (OR 1 ) 3- (C) A silicon compound represented by the following general formula,
0 parts by weight, R 2 2 Si (OR 1 ) 2 ------ [In the general formula ~ general formula, R 1, R 2 represents a monovalent hydrocarbon group. The method for forming an inorganic paint film according to claim 2 of the present invention is the method for forming an inorganic paint film according to claim 1, wherein the second inorganic paint has a reduced concentration of the first inorganic paint. Characterized in that:
【0006】本発明の請求項3に係る無機塗料塗膜の形
成方法は、請求項1又は請求項2記載の無機塗料塗膜の
形成方法において、前記溶媒に界面活性剤及び/又は沸
点が100〜250℃の溶剤(乾燥制御剤)を含有する
ことを特徴とする。According to a third aspect of the present invention, there is provided a method for forming an inorganic coating film according to the first or second aspect, wherein the solvent has a surfactant and / or a boiling point of 100. It is characterized by containing a solvent (drying control agent) of up to 250 ° C.
【0007】本発明の請求項4に係る無機塗料塗膜の形
成方法は、請求項1乃至3いずれかに記載の無機塗料塗
膜の形成方法において、前記乾燥制御剤が、ホルムアミ
ド、ジメチルホルムアミド、アセトニトリル、ジオキサ
ン及びノルマルヘプタンからなる群より選ばれる少なく
とも1種であることを特徴とする。According to a fourth aspect of the present invention, there is provided a method for forming an inorganic coating film according to any one of the first to third aspects, wherein the drying control agent comprises formamide, dimethylformamide, It is at least one selected from the group consisting of acetonitrile, dioxane and normal heptane.
【0008】以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.
【0009】本発明に係る無機塗料塗膜の形成方法は、
第一の無機塗料を基材に塗布後、溶媒に分散した光触媒
を塗布し、さらに、これらの上に、第二の無機塗料を塗
布して、光触媒含有塗膜を形成する方法である。溶媒
は、メタノール、アセトン、エタノール、プロパノー
ル、イソプロピルアルコール等いずれでもよいが、使用
する無機塗料中のアルコキシドの炭化水素基(R)の交
換反応を考えると無機塗料中のRに合わせることが望ま
しい。The method for forming an inorganic coating film according to the present invention comprises:
This is a method in which a photocatalyst dispersed in a solvent is applied after applying the first inorganic coating to a substrate, and a second inorganic coating is applied thereon to form a photocatalyst-containing coating film. The solvent may be any of methanol, acetone, ethanol, propanol, isopropyl alcohol and the like. However, considering the exchange reaction of the hydrocarbon group (R) of the alkoxide in the inorganic paint to be used, it is desirable to match with R in the inorganic paint.
【0010】上記第一及び第二の無機塗料の原料である
ケイ素化合物は下記の一般式で表される。The silicon compound as a raw material of the first and second inorganic coatings is represented by the following general formula.
【0011】 R2 n Si(OR1 )4-n −−−−−− 〔上記の一般式中、nは0〜3の整数、R1 、R2 は
1価の炭化水素基を示す。〕上記の一般式中のR1 、
R2 は1価の炭化水素基を示す限り限定はされないが、
R2 として炭素数1〜8の置換または非置換の炭化水素
基を示す、例えば、メチル基、エチル基、プロピル基、
ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オク
チル基等のアルキル基、シクロペンチル基、シクロヘキ
シル基等のシクロアルキル基、2−フェニルエチル基、
3−フェニルプロピル基等のアラルキル基、フェニル
基、トリル基等のアリール基、ビニル基、アリル基等の
アニケニル基、クロロメチル基、γ−クロロプロピル
基、3,3,3-トリフルオロプロピル基等のハロゲン置換炭
化水素基、及び、γ−メタクリロキシプロピル基、γ−
グリシドキシプロピル基、3,4−エポキシシクロヘキ
シルエチル基、γ−メルカプトプロピル基等の置換炭化
水素基が挙げられる。なかでも合成の容易さ、または、
入手の容易さから炭素数1〜4のアルキル基、及び、フ
ェニル基が好ましい。[0011] In R 2 n Si (OR 1) 4-n ------ [In the general formula, n an integer of 0~3, R 1, R 2 represents a monovalent hydrocarbon group. R 1 in the above general formula,
R 2 is not limited as long as it represents a monovalent hydrocarbon group,
R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, for example, a methyl group, an ethyl group, a propyl group,
Butyl group, pentyl group, hexyl group, heptyl group, alkyl group such as octyl group, cyclopentyl group, cycloalkyl group such as cyclohexyl group, 2-phenylethyl group,
Aralkyl groups such as 3-phenylpropyl group, aryl groups such as phenyl group and tolyl group, anenyl groups such as vinyl group and allyl group, chloromethyl group, γ-chloropropyl group, and 3,3,3-trifluoropropyl group Such as a halogen-substituted hydrocarbon group, and a γ-methacryloxypropyl group, γ-
And substituted hydrocarbon groups such as a glycidoxypropyl group, a 3,4-epoxycyclohexylethyl group, and a γ-mercaptopropyl group. Above all, ease of synthesis, or
An alkyl group having 1 to 4 carbon atoms and a phenyl group are preferable in terms of availability.
【0012】上記の一般式中のR1 には炭素数1〜4
のアルキル基を主原料にするものが用いられる。特に、
n=0のテトラアルコキシシランとしては、テトラメト
キシシラン、テトラエトキシシラン等が例示され、n=
1のオルガノトリアルコキシシランとしては、メチルト
リメトキシシラン、メチルトリエトキシシラン、メチル
トリイソプロポキシシラン、フェニルトリメトキシシラ
ン、フェニルトリエトキシシラン、3,3,3-トリフルオロ
プロピルトリメトキシシラン等が例示される。さらに、
n=2のジオルガノジアルコキシシランとしては、ジメ
チルジメトキシシラン、ジメチルジエトキシシラン、ジ
フェニルジメトキシシラン、ジフェニルジエトキシシラ
ン、メチルフェニルジメトキシシラン等が例示され、n
=3のトリオルガノアルコキシシランとしては、トリメ
チルメトキシシラン、トリメチルエトキシシラン、トリ
メチルイソプロポキシシラン、ジメチルイソブチルメト
キシシラン等が例示される。In the above general formula, R 1 has 1 to 4 carbon atoms.
Those having an alkyl group as a main raw material are used. In particular,
Examples of the tetraalkoxysilane with n = 0 include tetramethoxysilane, tetraethoxysilane, and the like.
Examples of the organotrialkoxysilane 1 include methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, and 3,3,3-trifluoropropyltrimethoxysilane. Is done. further,
Examples of the diorganodialkoxysilane of n = 2 include dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, and methylphenyldimethoxysilane.
Examples of the triorganoalkoxysilane of = 3 include trimethylmethoxysilane, trimethylethoxysilane, trimethylisopropoxysilane, and dimethylisobutylmethoxysilane.
【0013】上記の一般式〜一般式中のR1 、R2
は、同一の炭化水素基でもよいし、異なっていてもよ
い。上記無機塗料の作製は、例えば、上記の一般式、
上記の一般式、上記の一般式で表されるケイ素化合
物を溶剤で希釈し、硬化剤として水または触媒を添加
し、加水分解、及び、重縮合反応を行い調製される。こ
れらケイ素化合物の重量平均分子量(Mw)はポリスチ
レン換算で算出される。この調製の際に、無機塗料の重
量平均分子量(Mw)をポリスチレン換算で900以上
にする。重量平均分子量(Mw)がポリスチレン換算で
900未満であると、重縮合反応の際に硬化収縮が大き
くなり、焼き付けした無機塗料の塗膜にクラックが発生
し易くなる。R 1 and R 2 in the above general formulas
May be the same hydrocarbon group or different. The production of the inorganic paint is, for example, the above general formula,
It is prepared by diluting a silicon compound represented by the above general formula or the above general formula with a solvent, adding water or a catalyst as a curing agent, and performing hydrolysis and polycondensation reactions. The weight average molecular weight (Mw) of these silicon compounds is calculated in terms of polystyrene. In this preparation, the weight average molecular weight (Mw) of the inorganic coating is adjusted to 900 or more in terms of polystyrene. When the weight average molecular weight (Mw) is less than 900 in terms of polystyrene, the curing shrinkage becomes large during the polycondensation reaction, and cracks are easily generated in the baked inorganic paint film.
【0014】上記無機塗料は、上記の一般式で表され
るケイ素化合物と併用、または、代わりにコロイド状シ
リカを成分とすることができる。上記コロイド状シリカ
は、水に分散した水分散性のコロイダルシリカ、又は、
アルコール等の非水系の有機溶媒に分散した有機溶媒分
散性のコロイダルシリカである。上記コロイダルシリカ
は固形分としてのシリカを20〜50重量%含有してい
る。無機塗料の調製の際に、上記水分散性のコロイダル
シリカは、固形分外の成分として存在する水を硬化剤と
して用いることができる。また、有機溶媒分散性のコロ
イダルシリカは有機溶媒を水と置換することで容易に調
製できる。上記コロイダルシリカが分散している有機溶
媒としては、例えば、メタノール、エタノール、イソプ
ロパノール、n−ブタノール、イソブタノール等の低級
脂肪族アルコール類、エチレングリコール、エチレング
リコールモノブチルエーテル、酢酸エチレングリコール
モノエチルエーテル等のエチレングリコール誘導体、ジ
エチレングリコール、ジエチレングリコールモノブチル
エーテル等のジエチレングリコールの誘導体、及び、ジ
アセトンアルコール等が挙げられ、これらの1種、もし
くは2種以上が用いられる。さらに、親水性の有機溶媒
と併用してトルエン、キシレン、酢酸エチル、酢酸ブチ
ル、メチルエチルケトン、メチルイソブチルケトン、メ
チルエチルケトオキシム等も用いることができる。な
お、上記コロイダルシリカの上記配合量は、分散媒も含
んだ重量である。The above-mentioned inorganic paint can be used in combination with the silicon compound represented by the above general formula, or can contain colloidal silica instead. The colloidal silica is water-dispersible colloidal silica dispersed in water, or
Organic solvent-dispersible colloidal silica dispersed in a non-aqueous organic solvent such as alcohol. The colloidal silica contains 20 to 50% by weight of silica as a solid content. In preparing the inorganic coating, the water-dispersible colloidal silica can use water existing as a component other than the solid content as a curing agent. Further, colloidal silica dispersible in an organic solvent can be easily prepared by replacing the organic solvent with water. Examples of the organic solvent in which the colloidal silica is dispersed include lower aliphatic alcohols such as methanol, ethanol, isopropanol, n-butanol and isobutanol, ethylene glycol, ethylene glycol monobutyl ether, and ethylene glycol monoethyl ether acetate. And derivatives of diethylene glycol such as diethylene glycol and diethylene glycol monobutyl ether, and diacetone alcohol. One or more of these are used. Further, toluene, xylene, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, methyl ethyl ketoxime and the like can be used in combination with a hydrophilic organic solvent. The amount of the colloidal silica is a weight including the dispersion medium.
【0015】無機塗料を作製する際に硬化剤として水が
汎用されるが、この水の量は、無機塗料中に45%以下
が好ましく、25%以下がより好ましい。Water is generally used as a curing agent when preparing an inorganic paint, and the amount of water is preferably 45% or less, more preferably 25% or less in the inorganic paint.
【0016】無機塗料を作製する際に用いられる有機溶
剤は、例えば、メタノール、エタノール、イソプロパノ
ール、n−ブタノール、イソブタノール等の低級脂肪族
アルコール類、エチレングリコール、エチレングリコー
ルモノブチルエーテル、酢酸エチレングリコールモノエ
チルエーテル等のエチレングリコール誘導体、ジエチレ
ングリコール、ジエチレングリコールモノブチルエーテ
ル等のジエチレングリコールの誘導体、及び、ジアセト
ンアルコール等が挙げられ、これらの1種、もしくは2
種以上が用いられる。さらに、親水性の有機溶媒と併用
してトルエン、キシレン、酢酸エチル、酢酸ブチル、メ
チルエチルケトン、メチルイソブチルケトン、メチルエ
チルケトオキシム等も用いることができる。The organic solvent used for preparing the inorganic coating includes, for example, lower aliphatic alcohols such as methanol, ethanol, isopropanol, n-butanol and isobutanol, ethylene glycol, ethylene glycol monobutyl ether, and ethylene glycol monoacetate. Ethylene glycol derivatives such as ethyl ether; diethylene glycol derivatives such as diethylene glycol and diethylene glycol monobutyl ether; and diacetone alcohol.
More than one species is used. Further, toluene, xylene, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, methyl ethyl ketoxime and the like can be used in combination with a hydrophilic organic solvent.
【0017】上記無機塗料の調製の際は、無機塗料のp
Hを3.8〜6とすることが望ましい。このpH範囲で
あると無機塗料の保存性が良く、このpH範囲外である
と調製期間から塗布できる期間が限られてしまう。この
pHの調整方法は限定しないが、例えば、材料を混合し
た際にpHが3.8未満となった場合、アンモニア等の
塩基性試薬を添加して調整すればよく、pHが6を超え
た場合、塩酸等の酸性試薬を添加して調整すればよい。
また、pHによっては分子量が小さい状態で反応の進行
が遅くなった場合、加熱して反応を促進してもよいし、
酸性試薬でpHを下げて反応を進めた後に、塩基性試薬
を添加して所定のpHとしてもよい。In the preparation of the above inorganic coating, the p of the inorganic coating is
It is desirable for H to be 3.8-6. When the pH is within this range, the preservability of the inorganic coating is good, and when the pH is outside the pH range, the application period from the preparation period is limited. The method of adjusting the pH is not limited. For example, when the pH is less than 3.8 when the materials are mixed, the pH may be adjusted by adding a basic reagent such as ammonia, and the pH exceeds 6. In this case, it may be adjusted by adding an acidic reagent such as hydrochloric acid.
In addition, depending on the pH, when the reaction progresses slowly in a state where the molecular weight is small, heating may be used to accelerate the reaction,
After the reaction is advanced by lowering the pH with an acidic reagent, a basic reagent may be added to adjust the pH to a predetermined value.
【0018】上記の光触媒としては、例えば、酸化チタ
ン、酸化亜鉛、酸化錫、酸化ジルコニウム、酸化タング
ステン、酸化クロム、酸化モリブデン、酸化鉄、酸化ニ
ッケル、酸化ルテニウム、酸化コバルト、酸化銅及び酸
化マンガンからなる群から選択される少なくとも1種を
用いる。上記の光触媒を、無機塗料の機能耐候性を損な
わない範囲で無機塗料に添加する。またこれらの光触媒
に金属を担持してもよい。この金属として、例えば、
金、銀、銅、鉄、亜鉛、ニッケル、コバルト、白金、ル
テニウム、パラジウム、ロジウムからなる群から選択さ
れる少なくとも1種を用いる。これらの金属の担持によ
り、光触媒の電荷分離が促進され、光触媒作用が発揮さ
れる。すなわち、光の存在下で酸化性能を有し、この酸
化性能によって脱臭、抗菌等の効果を奏する。さらに、
光触媒を層間に担持した粘土架橋体を用いてもよい。こ
れらの光触媒を層間に導入することで、酸化物が微粒子
に担持され光触媒性能が向上する。Examples of the photocatalyst include titanium oxide, zinc oxide, tin oxide, zirconium oxide, tungsten oxide, chromium oxide, molybdenum oxide, iron oxide, nickel oxide, ruthenium oxide, cobalt oxide, copper oxide and manganese oxide. At least one selected from the group consisting of: The above photocatalyst is added to the inorganic paint as long as the functional weather resistance of the inorganic paint is not impaired. A metal may be supported on these photocatalysts. As this metal, for example,
At least one selected from the group consisting of gold, silver, copper, iron, zinc, nickel, cobalt, platinum, ruthenium, palladium, and rhodium is used. By carrying these metals, the charge separation of the photocatalyst is promoted, and the photocatalysis is exhibited. In other words, it has an oxidizing performance in the presence of light, and this oxidizing performance provides effects such as deodorization and antibacterial effects. further,
A clay crosslinked body having a photocatalyst supported between layers may be used. By introducing these photocatalysts between the layers, the oxide is supported on the fine particles, and the photocatalytic performance is improved.
【0019】上記無機塗料塗膜は、光触媒の上にさらに
第二の塗料を塗布する。すなわち、第二の無機塗料を薄
く塗布するため、光触媒が無機塗料塗膜に固着されるの
で、脱落せず、無機塗料塗膜の表面性状が向上する。な
お、本発明で用いる第一の無機塗料の濃度を薄めて第二
の無機塗料とし、より薄い塗膜を形成することが、より
好ましい。In the inorganic coating film, a second coating material is further applied on the photocatalyst. That is, since the second inorganic paint is applied thinly, the photocatalyst is fixed to the inorganic paint film, so that the photocatalyst does not fall off, and the surface properties of the inorganic paint film are improved. It is more preferable that the concentration of the first inorganic coating used in the present invention is reduced to form a second inorganic coating to form a thinner coating film.
【0020】前記無機塗料塗膜を酸又はアルカリでエッ
チングすることにより、無機塗料のみを溶かし、光触媒
の触媒効果が向上する。前記酸又はアルカリは光触媒を
溶かしたり、光触媒と反応したりするものでなければよ
く、例えば、0.1〜1重量%程度の水酸化ナトリウム
等が挙げられる。By etching the inorganic coating film with an acid or an alkali, only the inorganic coating is dissolved, and the catalytic effect of the photocatalyst is improved. The acid or alkali need not dissolve the photocatalyst or react with the photocatalyst, and examples thereof include sodium hydroxide of about 0.1 to 1% by weight.
【0021】界面活性剤及び/又は沸点が100〜25
0℃の溶剤である乾燥制御剤(DCCA)を溶媒に添加
することで、光触媒の分散性を高めるとともに、乾燥の
工程で多孔質な塗膜が得られる。すなわち、無機塗料塗
膜を例えば、100℃以上で乾燥することにより、界面
活性剤、乾燥制御剤等の添加剤が分解し、多孔質な無機
塗料塗膜が得られる。前記乾燥制御剤としては、例え
ば、ホルムアミド、ジメチルホルムアミド、アセトニト
リル、ジオキサン及びノルマルヘプタンからなる群より
選ばれる少なくとも1種が挙げられる。また、界面活性
剤としては、例えば、オクタデシルアミン塩等のアミン
系、オクタデシルトリメチルアンモニウム塩、ドデシル
トリメチルアンモニウム塩等のメチル系、ドデシルベン
ゼンスルホン酸塩等が挙げられる。これらの乾燥制御剤
及び/又は界面活性剤を例えば、メタノール等の溶媒に
均一に混合する。前記乾燥制御剤、界面活性剤等の添加
剤は無機塗料と親和性がよく、高分散化ができ、均質な
多孔質な無機塗料塗膜が得られ、塗膜性が向上する。Surfactants and / or having a boiling point of 100 to 25
By adding a drying control agent (DCCA), which is a solvent at 0 ° C., to the solvent, the dispersibility of the photocatalyst is increased, and a porous coating film is obtained in the drying step. That is, by drying the inorganic paint film at, for example, 100 ° C. or more, additives such as a surfactant and a drying control agent are decomposed, and a porous inorganic paint film is obtained. Examples of the drying control agent include at least one selected from the group consisting of formamide, dimethylformamide, acetonitrile, dioxane, and normal heptane. Examples of the surfactant include amines such as octadecylamine salt, methyls such as octadecyltrimethylammonium salt and dodecyltrimethylammonium salt, and dodecylbenzenesulfonate. These drying control agents and / or surfactants are uniformly mixed in a solvent such as methanol. Additives such as the drying control agent and the surfactant have good affinity with the inorganic paint, can be highly dispersed, and can provide a uniform porous inorganic paint film, thereby improving the coatability.
【0022】[0022]
【作用】本発明の請求項1に係る無機塗料塗膜の形成方
法では、光触媒が無機塗料塗膜に固着されるので、脱落
しない。また、第二の無機塗料は、組成(A)、(B)
及び(C)を原料とし、これらの原料を混合し、この混
合物を加水分解、及び、重縮合反応を行ない調整された
重量平均分子量がポリスチレン換算で900以上である
ので、クラックが発生しにくく表面性状に優れる塗膜が
得られる。According to the method for forming an inorganic coating film according to the first aspect of the present invention, the photocatalyst is fixed to the inorganic coating film and does not fall off. In addition, the second inorganic coating composition (A), (B)
And (C) are used as raw materials, and these raw materials are mixed, and the resulting mixture is subjected to hydrolysis and polycondensation reaction, and the adjusted weight average molecular weight is 900 or more in terms of polystyrene, so that cracks are less likely to occur. A coating film having excellent properties can be obtained.
【0023】本発明の請求項3及び請求項4に係る無機
塗料塗膜の形成方法では、前記溶媒に界面活性剤及び/
又は沸点が100〜250℃の溶剤である乾燥制御剤、
例えば、ホルムアミド、ジメチルホルムアミド、アセト
ニトリル、ジオキサン、ノルマルヘプタン等を含有する
ため、無機塗料と親和性がよく、高分散化ができ、10
0℃以上で乾燥する際に、界面活性剤及び乾燥制御剤が
分解するので、均質な多孔質な無機塗料塗膜が得られ
る。In the method for forming an inorganic coating film according to the third and fourth aspects of the present invention, the solvent may contain a surfactant and / or a surfactant.
Or a drying control agent which is a solvent having a boiling point of 100 to 250 ° C,
For example, since it contains formamide, dimethylformamide, acetonitrile, dioxane, normal heptane, etc., it has a good affinity for inorganic paints and can be highly dispersed.
When drying at 0 ° C. or more, the surfactant and the drying control agent are decomposed, so that a homogeneous porous inorganic coating film can be obtained.
【0024】[0024]
【実施例】以下、本発明を実施例及び比較例によって、
具体的に説明する。The present invention will now be described by way of Examples and Comparative Examples.
This will be specifically described.
【0025】(実施例1) 前記の一般式で表されるケイ素化合物としてテトラエ
トキシシラン、コロイド状シリカとしてIPAオルガノ
シリカゾル(触媒化成社製:商品名OSCAL143
2)、前記の一般式で表されるケイ素化合物としてメ
チルトリメトキシシラン、前記の一般式で表されるケ
イ素化合物としてジメチルジメトキシシランを用いた。
メチルトリメトキシシラン100重量部(以下部と記
す)に、テトラエトキシシランを10部、IPAオルガ
ノシリカゾルを90部、ジメチルジメトキシシランを3
0部、イソプロピルアルコール(以下IPAと記す)を
100部混合した後に、水90部を添加し、撹拌した。
これを、60℃の恒温槽中で重量平均分子量(以下Mw
と記す)を1500に調製し、無機塗料を得た。また、
光触媒としてTiO2 (日本アエロジル社製:商品名P
−25)をメタノールに分散させて光触媒溶液を調整し
た。この光触媒溶液全量に対するTiO2 の含有量を5
重量%にした。前記の得られた無機塗料を、アセトンで
洗浄したアルミナ基板に塗布し、次いで光触媒溶液を塗
布した後、温度100℃で1時間乾燥して無機塗料塗膜
を得た。さらにIPAで実施例1で得られた第一の無機
塗料を10倍に希釈した第二の無機塗料を塗布した。Example 1 Tetraethoxysilane as a silicon compound represented by the above general formula and IPA organosilica sol as colloidal silica (trade name: OSCAL143, manufactured by Catalyst Chemicals, Inc.)
2) Methyltrimethoxysilane was used as the silicon compound represented by the general formula, and dimethyldimethoxysilane was used as the silicon compound represented by the general formula.
100 parts by weight of methyltrimethoxysilane (hereinafter referred to as "part"), 10 parts of tetraethoxysilane, 90 parts of IPA organosilica sol, and 3 parts of dimethyldimethoxysilane
After mixing 0 parts and 100 parts of isopropyl alcohol (hereinafter referred to as IPA), 90 parts of water was added and stirred.
This is placed in a thermostat at 60 ° C. to obtain a weight average molecular weight (hereinafter referred to as Mw).
Was adjusted to 1500 to obtain an inorganic paint. Also,
As a photocatalyst, TiO 2 (manufactured by Nippon Aerosil Co., Ltd .: trade name P)
-25) was dispersed in methanol to prepare a photocatalyst solution. The content of TiO 2 with respect to the total amount of the photocatalyst solution is 5
% By weight. The obtained inorganic paint was applied to an alumina substrate washed with acetone, then a photocatalyst solution was applied, and then dried at 100 ° C. for 1 hour to obtain an inorganic paint film. Further, a second inorganic paint obtained by diluting the first inorganic paint obtained in Example 1 ten times with IPA was applied.
【0026】この無機塗料塗膜の光触媒作用を評価する
ために、アセトアルデヒド除去率を測定し、表1に示し
た。ここで、アセトアルデヒド除去率が大きいほど、光
触媒作用が大きいことを示している。なお、アセトアル
デヒド除去率は、無機塗料塗膜を形成した容器中に50
ppmのアセトアルデヒドを注入し、10Wのブラック
ライトを30分間照射し、ガスクロマトグラフィーを用
いて測定した。In order to evaluate the photocatalytic action of this inorganic paint film, the acetaldehyde removal rate was measured and the results are shown in Table 1. Here, the higher the acetaldehyde removal rate, the greater the photocatalytic action. The acetaldehyde removal rate was 50% in the container on which the inorganic paint film was formed.
ppm acetaldehyde was injected, irradiated with 10 W black light for 30 minutes, and measured using gas chromatography.
【0027】(実施例2) 実施例1で得られた無機塗料塗膜を、さらに0.1%水
酸化ナトリウム水溶液に24時間浸漬、エッチングして
無機塗料塗膜を得て、アセトアルデヒド除去率を測定
し、表1に示した。(Example 2) The inorganic coating film obtained in Example 1 was further immersed in a 0.1% aqueous sodium hydroxide solution for 24 hours and etched to obtain an inorganic coating film, and the acetaldehyde removal rate was reduced. The measured values are shown in Table 1.
【0028】(実施例3) 実施例1で得られた光触媒溶液99重量部に対して、ド
デシルトリメチルアンモニウムクロライド(日本油脂社
製:商品名ニッサンカチオン)1重量部の割合になるよ
うに添加して光触媒溶液を用いた以外は、実施例1と同
様にして、無機塗料塗膜を得て、アセトアルデヒド除去
率を測定し、表1に示した。Example 3 To 99 parts by weight of the photocatalyst solution obtained in Example 1, dodecyltrimethylammonium chloride (manufactured by NOF CORPORATION, trade name: Nissan Cation) was added at a ratio of 1 part by weight. An inorganic coating film was obtained and the acetaldehyde removal rate was measured in the same manner as in Example 1 except that the photocatalyst solution was used.
【0029】(比較例1) メチルトリメトキシシラン100部に、テトラエトキシ
シランを10部、IPAオルガノシリカゾルを90部、
ジメチルジメトキシシランを30部、イソプロピルアル
コール(IPA)を100部混合した後に、水90部を
添加し、撹拌した。これを、60℃の恒温槽中で重量平
均分子量(以下Mwと記す)を1500に調製し、この
溶液に光触媒であるTiO2 (日本アエロジル社製:商
品名P−25)を20部添加して無機塗料を得た。この
無機塗料を、アセトンで洗浄したアルミナ基板に塗布
し、温度100℃で1時間乾燥した。硬化後の無機塗料
塗膜をさらに0.1%水酸化ナトリウム水溶液に24時
間浸漬、エッチングして無機塗料塗膜を得て、アセトア
ルデヒド除去率を測定し、表1に示した。Comparative Example 1 To 100 parts of methyltrimethoxysilane, 10 parts of tetraethoxysilane, 90 parts of IPA organosilica sol,
After mixing 30 parts of dimethyldimethoxysilane and 100 parts of isopropyl alcohol (IPA), 90 parts of water was added and stirred. This was adjusted to a weight average molecular weight (hereinafter referred to as Mw) of 1500 in a thermostat at 60 ° C., and 20 parts of TiO 2 (manufactured by Nippon Aerosil Co., Ltd., trade name: P-25) was added to this solution. Thus, an inorganic paint was obtained. This inorganic paint was applied to an alumina substrate washed with acetone, and dried at a temperature of 100 ° C. for 1 hour. The cured inorganic paint film was further immersed in a 0.1% aqueous sodium hydroxide solution for 24 hours and etched to obtain an inorganic paint film, and the acetaldehyde removal rate was measured.
【0030】[0030]
【表1】 [Table 1]
【0031】表1に示すように、実施例は、比較例に比
べて無機塗料塗膜のアセトアルデヒド除去率が大きく、
光触媒作用による酸化性能に優れ、脱臭、抗菌等の効果
が大きいことが確認できた。また、実施例1の無機塗料
塗膜については、光沢度が大きく、無機塗料塗膜の表面
性状が良好であった。As shown in Table 1, in the examples, the acetaldehyde removal rate of the inorganic paint film was larger than that in the comparative example.
It was confirmed that the oxidizing performance by photocatalysis was excellent, and the effects of deodorization, antibacterial and the like were great. In addition, the inorganic paint film of Example 1 had a high glossiness, and the inorganic paint film had good surface properties.
【0032】[0032]
【発明の効果】本発明の請求項1及び請求項2に係る無
機塗料塗膜の形成方法によると、光触媒が無機塗料塗膜
に固着されるので、脱落しないため、高い酸化性能等の
光触媒性能を有するとともに、無機塗料塗膜の表面性状
に優れた無機塗料塗膜が得られる。According to the method for forming an inorganic paint film according to the first and second aspects of the present invention, since the photocatalyst is fixed to the inorganic paint film and does not fall off, the photocatalytic performance such as high oxidation performance is obtained. And an inorganic coating film having excellent surface properties of the inorganic coating film.
【0033】本発明の請求項3及び請求項4に係る無機
塗料塗膜の形成方法によると、無機塗料と親和性がよ
く、高分散化ができ、100℃以上で乾燥する際に、界
面活性剤及び乾燥制御剤が分解するので、均質な多孔質
な無機塗料塗膜が得られるため、より高い酸化性能等の
光触媒性能を有した無機塗料塗膜が得られる。According to the method for forming a coating film of an inorganic paint according to the third and fourth aspects of the present invention, it has good affinity with the inorganic paint, can be highly dispersed, and has a surface activity when dried at 100 ° C. or more. Since the agent and the drying control agent are decomposed, a homogeneous porous inorganic coating film can be obtained, so that an inorganic coating film having higher photocatalytic performance such as oxidation performance can be obtained.
フロントページの続き (56)参考文献 特開 平1−306476(JP,A) 特開 昭63−117074(JP,A) 特開 平2−264074(JP,A) 特開 平5−117590(JP,A) 特開 平4−33843(JP,A) 特開 平1−259076(JP,A) 特開 平6−65012(JP,A) 特開 平6−126244(JP,A) 特開 平6−293879(JP,A) 特開 平6−182299(JP,A) 特開 平6−65527(JP,A) 特開 平6−128533(JP,A) 特開 平3−157125(JP,A) (58)調査した分野(Int.Cl.7,DB名) B05D 1/36,1/38,5/00 B05D 7/24 C09D 5/14,5/16 C09D 183/04 Continuation of front page (56) References JP-A-1-306476 (JP, A) JP-A-63-117074 (JP, A) JP-A-2-264074 (JP, A) JP-A-5-117590 (JP, A) JP-A-4-33843 (JP, A) JP-A-1-259076 (JP, A) JP-A-6-65012 (JP, A) JP-A-6-126244 (JP, A) JP-A-6-293879 (JP, A) JP-A-6-182299 (JP, A) JP-A-6-65527 (JP, A) JP-A-6-128533 (JP, A) JP-A-3-157125 (JP, A A) (58) Field surveyed (Int. Cl. 7 , DB name) B05D 1 / 36,1 / 38,5 / 00 B05D 7/24 C09D 5 / 14,5 / 16 C09D 183/04
Claims (4)
料とし、これらの原料を混合し、この混合物を加水分
解、及び、重縮合反応を行ない調整された重量平均分子
量がポリスチレン換算で900以上である第一の無機塗
料を基材に塗布後、溶媒に分散した光触媒を塗布し、さ
らに、これらの上に、下記組成(A)、(B)及び
(C)を原料とし、これらの原料を混合し、この混合物
を加水分解、及び、重縮合反応を行ない調整された重量
平均分子量がポリスチレン換算で900以上である第二
の無機塗料を塗布して、光触媒含有塗膜を形成すること
を特徴とする無機塗料塗膜の形成方法。 (A)下記の一般式で表されるケイ素化合物及び/又
はコロイド状シリカを20〜200重量部、 Si(OR1 )4 −−−−−− (B)下記の一般式で表されるケイ素化合物を100
重量部、 R2 Si(OR1 )3 −−−−−− (C)下記の一般式で表されるケイ素化合物を0〜6
0重量部、 R2 2Si(OR1 )2 −−−−−− 〔上記の一般式〜一般式中、R1 、R2 は1価の炭
化水素基を示す。〕1. The following compositions (A), (B) and (C) are used as raw materials, these raw materials are mixed, and the mixture is subjected to hydrolysis and polycondensation reaction to adjust the weight average molecular weight to polystyrene. After applying the first inorganic paint having a conversion of 900 or more to the base material, a photocatalyst dispersed in a solvent is applied, and the following compositions (A), (B) and (C) are used as raw materials. The raw materials are mixed, the mixture is hydrolyzed, and a weight-average molecular weight adjusted by performing a polycondensation reaction is applied with a second inorganic paint having a polystyrene equivalent of 900 or more, and a photocatalyst-containing coating film is formed. A method for forming a coating film of an inorganic paint, which is characterized by being formed. (A) a silicon compound represented by the following general formula and / or colloidal silica 20 to 200 parts by weight, Si (OR 1) 4 ------ (B) silicon represented by the following general formula 100 compounds
Parts by weight, R 2 Si (OR 1 ) 3- (C) A silicon compound represented by the following general formula,
0 parts by weight, R 2 2 Si (OR 1 ) 2 ------ [In the general formula ~ general formula, R 1, R 2 represents a monovalent hydrocarbon group. ]
の濃度を薄めたものであることを特徴とする請求項1記
載の無機塗料塗膜の形成方法。2. The method according to claim 1, wherein the second inorganic coating is obtained by reducing the concentration of the first inorganic coating.
100〜250℃の溶剤(乾燥制御剤)を含有すること
を特徴とする請求項1又は請求項2記載の無機塗料塗膜
の形成方法。3. The formation of an inorganic coating film according to claim 1, wherein the solvent contains a surfactant and / or a solvent having a boiling point of 100 to 250 ° C. (drying control agent). Method.
チルホルムアミド、アセトニトリル、ジオキサン及びノ
ルマルヘプタンからなる群より選ばれる少なくとも1種
であることを特徴とする請求項1乃至請求項3いずれか
に記載の無機塗料塗膜の形成方法。4. The method according to claim 1, wherein the drying control agent is at least one selected from the group consisting of formamide, dimethylformamide, acetonitrile, dioxane and normal heptane. A method for forming an inorganic paint film.
Priority Applications (1)
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JP6293185A JP3052230B2 (en) | 1994-11-28 | 1994-11-28 | Method of forming inorganic paint film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6293185A JP3052230B2 (en) | 1994-11-28 | 1994-11-28 | Method of forming inorganic paint film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08141503A JPH08141503A (en) | 1996-06-04 |
JP3052230B2 true JP3052230B2 (en) | 2000-06-12 |
Family
ID=17791523
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JP6293185A Expired - Fee Related JP3052230B2 (en) | 1994-11-28 | 1994-11-28 | Method of forming inorganic paint film |
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JPH09220519A (en) * | 1996-02-16 | 1997-08-26 | Mitsubishi Paper Mills Ltd | Method for producing titanium oxide-containing laminated sheet |
CN1171966C (en) * | 1996-05-31 | 2004-10-20 | 东陶机器株式会社 | Antifouling member and coating composition |
JPH1081840A (en) * | 1996-07-19 | 1998-03-31 | Toto Ltd | Photocatalitic hydrophilic coating composition |
US6165256A (en) * | 1996-07-19 | 2000-12-26 | Toto Ltd. | Photocatalytically hydrophilifiable coating composition |
WO1998003607A1 (en) * | 1996-07-19 | 1998-01-29 | Toto Ltd. | Photocatalytic hydrophilic coating composition |
JPH10137329A (en) * | 1996-11-15 | 1998-05-26 | Sharp Corp | Air purifying film and its manufacture |
US6337129B1 (en) | 1997-06-02 | 2002-01-08 | Toto Ltd. | Antifouling member and antifouling coating composition |
JPH11152447A (en) * | 1997-11-21 | 1999-06-08 | Toto Ltd | Surface-treating agent for forming photocatalyzing coating film, and formation of photocatalyzing coating film using the surface-treating agent |
JPH11290698A (en) * | 1998-04-15 | 1999-10-26 | Seiwa Electric Mfg Co Ltd | Photocatalytic coating, photocatalyst coated thereby, photopermeable base material coated with photocatalytic coating film, and lighting unit using photopermeable base material |
JP4576811B2 (en) * | 2003-08-19 | 2010-11-10 | パナソニック電工株式会社 | Method for manufacturing functional building materials |
JP2005314616A (en) * | 2004-04-30 | 2005-11-10 | Shin Etsu Chem Co Ltd | Silicone coating composition and article to be coated |
JP5236882B2 (en) * | 2007-02-02 | 2013-07-17 | ニチハ株式会社 | Functional building board |
-
1994
- 1994-11-28 JP JP6293185A patent/JP3052230B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH08141503A (en) | 1996-06-04 |
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