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JP3038361B2 - Manufacturing method of electrical connection member - Google Patents

Manufacturing method of electrical connection member

Info

Publication number
JP3038361B2
JP3038361B2 JP5389891A JP5389891A JP3038361B2 JP 3038361 B2 JP3038361 B2 JP 3038361B2 JP 5389891 A JP5389891 A JP 5389891A JP 5389891 A JP5389891 A JP 5389891A JP 3038361 B2 JP3038361 B2 JP 3038361B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
conductive
hole
resin film
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5389891A
Other languages
Japanese (ja)
Other versions
JPH04269484A (en
Inventor
浩史 近藤
徹夫 吉沢
豊秀 宮崎
隆 ▲榊▼
芳実 寺山
洋一 田村
高弘 岡林
和夫 近藤
康雄 中塚
祐一 池上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Nippon Steel Corp
Original Assignee
Canon Inc
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP5389891A priority Critical patent/JP3038361B2/en
Application filed by Canon Inc, Sumitomo Metal Industries Ltd filed Critical Canon Inc
Priority to EP92102974A priority patent/EP0504614B1/en
Priority to DE69233232T priority patent/DE69233232T2/en
Priority to DE69233684T priority patent/DE69233684D1/en
Priority to EP97111202A priority patent/EP0805493B1/en
Publication of JPH04269484A publication Critical patent/JPH04269484A/en
Priority to US08/221,970 priority patent/US5860818A/en
Priority to US09/099,928 priority patent/US6511607B1/en
Application granted granted Critical
Publication of JP3038361B2 publication Critical patent/JP3038361B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/831Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
    • H01L2224/83101Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus as prepeg comprising a layer connector, e.g. provided in an insulating plate member

Landscapes

  • Manufacturing Of Electrical Connectors (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、電気回路部品同士を電
気的に接続するために用いられる電気的接続部材の製造
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electric connection member used for electrically connecting electric circuit components.

【0002】[0002]

【従来の技術】電気回路部品同士を電気的に接続する方
法としては、従来ワイヤボンディング方法、TAB(Tape A
uto-mated Bonding)法等が知られている。しかしこれら
の方法はいずれもコストが高く、しかも両電気回路部品
間の接続点数が増加し、接続点密度が高くなると対応で
きない等の難点があった。このような難点を解決すべ
く、絶縁性の保持体中に複数の導電部材を互いに絶縁状
態に備えた電気的接続部材を用いて、電気回路部品同士
を電気的に接続する技術が知られている。このような電
気的接続部材の製造方法としては、従来特開平2-49385
号公報に提案されたものがある。以下、この製造方法に
ついて図4に基づき説明する。
2. Description of the Related Art As a method of electrically connecting electric circuit components to each other, a conventional wire bonding method, TAB (Tape A
The uto-mated bonding method and the like are known. However, all of these methods have the disadvantage that the cost is high, the number of connection points between the two electric circuit components is increased, and if the connection point density is increased, it cannot be handled. In order to solve such difficulties, there is known a technique of electrically connecting electric circuit components to each other by using an electric connection member provided with a plurality of conductive members in an insulating state in an insulating holder. I have. As a method of manufacturing such an electrical connection member, a conventional method is disclosed in Japanese Patent Application Laid-Open No. 2-49385.
There has been proposed in Japanese Patent Publication No. Hereinafter, this manufacturing method will be described with reference to FIG.

【0003】図4は従来の電気的接続部材の製造方法の
主要工程を示す模式的断面図であり、まず基体となる金
属シート51を用意し(図4(a))、この金属シート51上に
スピンナにより感光性樹脂52を塗布し、プリベイクを行
う(図4(b))。所定パターンをなすフォトマスク(図示
せず)を介して光を感光性樹脂52に照射して露光し、現
像を行う(図4(c))。これによって露光された部分には
感光性樹脂52が残存し、露光されない部分は現像処理に
より感光性樹脂52が除去され、底部に金属シート51の表
面が露出する穴53が形成される。温度を上げて感光性樹
脂52の硬化を行った後、これらをエッチング液中に浸漬
させて穴53内に露出する金属シート51の表面をエッチン
グし、ここに凹部54を形成する(図4(d))。次いで穴5
3, 凹部54内に金55が充填され、且つ感光性樹脂52の表
面上に所定高さに盛り上がらせるよう金メッキを施して
バンプを形成する(図4(e))。最後に金属シート51をエ
ッチング除去して、金55が導電部材を、また感光性樹脂
52が保持体を夫々構成する電気的接続部材61を製造する
(図4(f))。
FIG. 4 is a schematic cross-sectional view showing the main steps of a conventional method for manufacturing an electrical connection member. First, a metal sheet 51 serving as a base is prepared (FIG. 4 (a)). Then, a photosensitive resin 52 is applied by a spinner and prebaked (FIG. 4B). The photosensitive resin 52 is irradiated with light through a photomask (not shown) having a predetermined pattern, exposed to light, and developed (FIG. 4C). As a result, the photosensitive resin 52 remains in the exposed portion, and the photosensitive resin 52 is removed by a developing process in the unexposed portion, and a hole 53 is formed at the bottom where the surface of the metal sheet 51 is exposed. After the temperature is raised to cure the photosensitive resin 52, these are immersed in an etchant to etch the surface of the metal sheet 51 exposed in the hole 53, thereby forming a concave portion 54 (FIG. 4 ( d)). Then hole 5
3. Gold 55 is filled in the concave portion 54 and gold plating is performed so as to swell to a predetermined height on the surface of the photosensitive resin 52 to form a bump (FIG. 4E). Finally, the metal sheet 51 is removed by etching, and the gold 55 serves as a conductive member and a photosensitive resin.
The electrical connection members 61 each comprising the holder 52 are manufactured (FIG. 4 (f)).

【0004】なお電気的接続部材61における各部分の寸
法は、(図4(f))に示す如く感光性樹脂52の厚さが約10
μm、穴53(金55の柱状部)の直径が約20μm, ピッチ
が約40μm、金55の突出高さが表裏とも数μm程度であ
る。図5は、このような電気的接続部材を用いた電気回
路部品間の電気的接続態様を示す模式図であり、図5
(a) 中61は電気的接続部材、62, 63は接続すべき電気回
路部品を示す。電気的接続部材61は、金属または合金か
らなる複数の導電部材である金55同士を、電気的に絶縁
して電気的絶縁材料からなる保持体である感光性樹脂膜
52中に設けられており、金55の一端55a が露出する側に
対向させて一方の電気回路部品62を、また金55の他端55
b が露出する側に対向させて他方の電気回路部品63を臨
ませる(図5(a))。そして、一方の電気回路部品62の接
続部66と金55の一端55a とを合金化し、他方の電気回路
部品63の接続部67と金55の他端55b とを合金化すること
により夫々両者を接続する(図5(b))。
The dimensions of each part of the electrical connection member 61 are such that the thickness of the photosensitive resin 52 is about 10 as shown in FIG.
μm, the diameter of the hole 53 (columnar portion of the gold 55) is about 20 μm, the pitch is about 40 μm, and the protrusion height of the gold 55 is about several μm on both sides. FIG. 5 is a schematic diagram showing an electrical connection mode between electrical circuit components using such an electrical connection member.
(a) In the figure, 61 indicates an electrical connection member, and 62 and 63 indicate electrical circuit components to be connected. The electrical connection member 61 is a photosensitive resin film that is a holder made of an electrically insulating material by electrically insulating a plurality of conductive members 55 made of metal or alloy from each other.
52, one of the electric circuit components 62 facing the side where one end 55a of the gold 55 is exposed, and the other end 55
The other electric circuit component 63 faces the side where b is exposed (FIG. 5 (a)). Then, the connecting portion 66 of the one electric circuit component 62 and one end 55a of the gold 55 are alloyed, and the connecting portion 67 of the other electric circuit component 63 and the other end 55b of the gold 55 are alloyed, so that both are alloyed. Connect (FIG. 5 (b)).

【0005】[0005]

【発明が解決しようとする課題】ところでこのような従
来方法にあっては、保持体である感光性樹脂52の金55の
部分である、所謂バンプの突出高さは図5(b) に示す如
く電気回路部品62,63 の接続部66,67 との接合性を確実
とするための変形加工代として必須のものであるが、従
来方法では図4(d) に示すエッチング工程での金属シー
ト51表面に対するエッチング深さ、即ち凹部54の深さ
と、図4(e) に示す金メッキ工程での盛り上げ高さとに
よって決まる。しかしエッチング深さを大きく、また盛
り上げ高さを大きくするには長い時間を要し、しかもば
らつきが大きくなり、その上深さ,高さを大きくするに
伴って横方向への広がりが大きくなって相隣するバンプ
同士が接触する虞れがあり、バンプの突出高さを大きく
するにはエッチング条件、金メッキ条件の変更のみでは
限界があった。
In such a conventional method, the so-called bump protruding height, which is a portion of the gold 55 of the photosensitive resin 52 as a holder, is shown in FIG. 5 (b). As described above, it is indispensable as a deformation allowance for ensuring the bondability between the electric circuit components 62 and 63 and the connecting portions 66 and 67, but in the conventional method, the metal sheet in the etching step shown in FIG. The depth is determined by the etching depth with respect to the surface 51, that is, the depth of the concave portion 54, and the height of the raised portion in the gold plating step shown in FIG. However, it takes a long time to increase the etching depth and the height of the swelling, and furthermore, the variability increases, and as the depth and height increase, the lateral spread increases. There is a risk that adjacent bumps may come into contact with each other, and there is a limit to increasing the protruding height of the bumps only by changing the etching conditions and the gold plating conditions.

【0006】バンプの突出高さが低いと、バンプを図5
(a),図5(b) に示す如く他の接続部66,67 等と接触させ
る際のバンプ変形加工代が小さくなり、例えば接続部6
6,67 を保護するためのパッシベーション膜が設けられ
ている場合にはパッシベーション膜表面と接続部66,67
表面との間に形成される段差のため未接触状態が発生
し、これを防止するにはバンプと接続部66,67 との接触
圧力を大きくせねばならず、しかも十分な信頼性を確保
することが難しいという問題が生じる。本発明はかかる
事情に鑑みなされたものであって、その目的とするとこ
ろはバンプのみかけ上の突出高さを大きく出来て、十分
なバンプ変形加工代を確保し得るようにした電気的接続
部材の製造方法を提供するにある。
If the height of the bumps is low, the bumps can be removed as shown in FIG.
(a), as shown in FIG. 5 (b), the amount of bump deformation at the time of contact with other connecting parts 66, 67, etc. is reduced,
If a passivation film is provided to protect the passivation film,
A non-contact state occurs due to a step formed between the bumps and the surface. To prevent this, the contact pressure between the bumps and the connection portions 66 and 67 must be increased, and sufficient reliability is secured. The problem that it is difficult arises. SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object thereof is to provide an electrical connection member capable of increasing the apparent protrusion height of a bump and securing a sufficient bump deformation allowance. To provide a method for manufacturing the same.

【0007】[0007]

【課題を解決するための手段】第1の本発明に係る電気
的接続部材の製造方法は、電気的絶縁材からなる保持体
と、該保持体中に互いに絶縁状態に備えられた複数の導
電部材とを有し、前記各導電部材の一端は前記保持体の
一方の面に露出し、前記各導電部材の他端は前記保持体
の他方の面に露出している電気的接続部材を製造する方
法において、基体の導電性を備えた面に保持体を構成す
る第1の感光性樹脂膜と、第2の感光性樹脂膜とをこの
順序又は逆の順序で積層形成する工程と、前記第1,第
2の感光性樹脂膜を露光し、現像して底部に前記基体の
導電性面が露出する複数の穴を形成する工程と、前記穴
内に露出する基体の面をエッチングして凹孔を形成する
工程と、前記凹孔及び穴内に導電部材を充填すると共
に、前記穴上に導電部材を盛り上げるように堆積する工
程と、前記基体及び第2の感光性樹脂膜を除去する工程
とを含むことを特徴とする。
According to a first aspect of the present invention, there is provided a method for manufacturing an electrical connection member, comprising: a holder made of an electrically insulating material; and a plurality of conductive members provided in the holder in a state of being insulated from each other. Producing an electrical connection member having one end of each conductive member exposed on one surface of the holder and the other end of each conductive member exposed on the other surface of the holder. A method of laminating a first photosensitive resin film and a second photosensitive resin film constituting a holding body on the conductive surface of the base in this order or in the reverse order; Exposing and developing the first and second photosensitive resin films to form a plurality of holes at the bottom where the conductive surface of the substrate is exposed; and etching the surface of the substrate exposed in the holes to form a recess. Forming a hole, filling a conductive member in the recess and the hole, and forming a conductive material on the hole. Characterized in that it comprises depositing to enliven wood, and removing the substrate and the second photosensitive resin layer.

【0008】第2の本発明に係る電気的接続部材の製造
方法は、電気的絶縁材からなる保持体と、該保持体中に
互いに絶縁状態に備えられた複数の導電部材とを有し、
前記各導電部材の一端は前記保持体の一方の面に露出
し、前記各導電部材の他端は前記保持体の他方の面に露
出している電気的接続部材を製造する方法において、基
体の導電性を備えた面に保持体を構成する第1の感光性
樹脂膜と、この第1の感光性樹脂膜を挟む第2,第3の
感光性樹脂膜とを積層形成する工程と、前記第1,第
2,第3の感光性樹脂膜を露光し、現像して底部に前記
基体の導電性面が露出する複数の穴を形成する工程と、
穴内に露出する基体の面をエッチングして凹孔を形成す
る工程と、前記穴及び凹孔に導電部材を充填すると共
に、前記穴上に導電部材を盛り上げるように堆積する工
程と、前記基体及び第2,第3の感光性樹脂膜を除去す
る工程とを含むことを特徴とする。
According to a second aspect of the present invention, there is provided a method for manufacturing an electrical connection member, comprising: a holder made of an electrically insulating material; and a plurality of conductive members provided in the holder in an insulated state from each other.
One end of each of the conductive members is exposed on one surface of the holder, and the other end of each of the conductive members is exposed on the other surface of the holder. A step of laminating a first photosensitive resin film constituting a holding body on a surface having conductivity, and second and third photosensitive resin films sandwiching the first photosensitive resin film; Exposing and developing the first, second, and third photosensitive resin films to form a plurality of holes at the bottom where the conductive surface of the base is exposed;
Etching a surface of the base exposed in the hole to form a concave hole, filling the hole and the concave with a conductive member, depositing the conductive member on the hole so as to swell the conductive member, Removing the second and third photosensitive resin films.

【0009】[0009]

【作用】本発明にあってはこれによって、除去した第2
又は第3の感光性樹脂膜の厚さに相当する分だけ導電部
材が保持体表面から突出することとなり、十分な加工代
を得ることが可能となる。
According to the present invention, the second material removed by this method
Alternatively, the conductive member protrudes from the surface of the holder by an amount corresponding to the thickness of the third photosensitive resin film, and a sufficient processing allowance can be obtained.

【0010】[0010]

【実施例】以下本発明をその実施例を示す図面に基づき
具体的に説明する。 〔実施例1〕図1は本発明の実施例1の主要製造工程を
示す模式的断面図である。先ず基体として、例えば表面
にタングステン(W)膜を積層形成した銅板1を用意し
(図1(a))、この銅板1上に保持体を構成する第1の感
光性樹脂膜を構成するポリイミド樹脂膜2を均一な厚さ
に塗布し、プリベイクし更にその表面に第2の感光性樹
脂膜を構成するレジスト3を塗布し、プリベイクした
後、ポリイミド樹脂膜2,レジスト3を露光し、現像し
て底部に銅板1の表面のW膜が露出する穴5を形成し、
ポリイミド樹脂膜2とレジスト3をハードベイクする
(図1(b))。この状態でエッチング液中に浸積させて穴
5内に露出する銅板1の表面をエッチングし、ここに凹
孔6を形成する(図1(c))。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below with reference to the drawings showing the embodiments. [Embodiment 1] FIG. 1 is a schematic sectional view showing main manufacturing steps of Embodiment 1 of the present invention. First, as a substrate, for example, a copper plate 1 having a tungsten (W) film laminated on its surface is prepared (FIG. 1A), and a polyimide constituting a first photosensitive resin film constituting a holder is formed on the copper plate 1. A resin film 2 is applied to a uniform thickness, prebaked, and a resist 3 constituting a second photosensitive resin film is applied to the surface thereof. After prebaking, the polyimide resin film 2 and the resist 3 are exposed and developed. To form a hole 5 at the bottom where the W film on the surface of the copper plate 1 is exposed,
The polyimide resin film 2 and the resist 3 are hard baked (FIG. 1B). In this state, the surface of the copper plate 1 exposed in the hole 5 by being immersed in an etching solution is etched to form a concave hole 6 therein (FIG. 1C).

【0011】銅板1を電極としたメッキ法により金等の
導電部材7を各穴5及び凹孔6内に充填し、且つ穴5の
上方で導電部材7がレジスト3の表面から盛り上げる
(図1(d))。その後、ハードベイクしてあるレジスト3
をO2プラズマを用いたアッシングによって除去するか
(図1(e))、または銅板1を選択エッチングしてこれを
除去し(図1(f))、導電部材7が電気的導電材料を構成
し、第1の感光性樹脂膜であるポリイミド樹脂膜2が保
持体を構成し、導電部材7の一部分が保持体の上方に大
きく突き出した電気的接続部材を製造する(図1(g))。
このような実施例1にあっては第2の感光性樹脂膜であ
るレジスト3の厚さを適宜に設定することによってバン
プの突出高さを任意に設定することが可能となる。
A conductive member 7 such as gold is filled in each of the holes 5 and the concave holes 6 by plating using the copper plate 1 as an electrode, and the conductive member 7 rises from the surface of the resist 3 above the holes 5 (FIG. 1). (d)). Then, hard baked resist 3
Is removed by ashing using O 2 plasma (FIG. 1 (e)) or by selectively etching the copper plate 1 (FIG. 1 (f)), and the conductive member 7 constitutes an electrically conductive material. Then, the polyimide resin film 2 serving as the first photosensitive resin film constitutes a holder, and an electrical connection member in which a part of the conductive member 7 protrudes greatly above the holder is manufactured (FIG. 1 (g)). .
In the first embodiment, by appropriately setting the thickness of the resist 3, which is the second photosensitive resin film, it is possible to arbitrarily set the bump height.

【0012】〔実施例2〕この実施例2にあっては表面
にタングステン膜を形成した銅板1の表面側に対する保
持体を構成するための第1の感光性樹脂であるポリイミ
ド樹脂膜2と第2の感光性樹脂であるレジスト3との積
層順序を実施例1の場合と逆、即ち銅板1上に先ずレジ
スト3を、次いでポリイミド樹脂膜2をこの順序で積層
形成してある。他の工程は実施例1の場合と実質的に同
じである。先ず表面にタングステン(W)膜を積層形成
した銅板1上にレジスト3を塗布し、プリベイクした
後、ポリイミド樹脂を塗布してポリイミド樹脂膜2を積
層形成する。
[Embodiment 2] In this embodiment 2, a polyimide resin film 2 which is a first photosensitive resin for forming a holder for the surface side of a copper plate 1 having a tungsten film formed on the surface is formed. The order of lamination with the resist 3 which is the photosensitive resin of No. 2 is reverse to that of the embodiment 1, that is, the resist 3 is first formed on the copper plate 1 and then the polyimide resin film 2 is formed in this order. Other steps are substantially the same as those in the first embodiment. First, a resist 3 is applied to a copper plate 1 having a tungsten (W) film formed on the surface thereof, and after prebaking, a polyimide resin is applied to form a polyimide resin film 2.

【0013】その後、ポリイミド樹脂膜2の表面側から
露光し、現像を行って底部に銅板1の表面のW膜が露出
する穴5を形成し、ポリイミド樹脂膜2とレジスト3を
ハードベイクする(図2(b))。プラズマエッチングによ
り銅板1に凹孔6を形成した後(図2(c))、銅板1を電
極とするメッキ法により金等の導電部材7を各穴5及び
凹孔6内に充填し、且つ穴5の上方に導電部材7をポリ
イミド樹脂膜2の表面から盛り上がらせる。その後は図
2(d),図2(e) に示す如く銅板1,レジスト3を順次除
去し、図2(f) に示す如き導電部材7の他端部が保持体
の下方に大きく突き出した電気的接続部材を製造する。
この実施例2においてもレジスト3の厚さを適宜設定す
ることによってバンプの突出高さを任意に設定すること
が可能となる。
Thereafter, exposure is performed from the surface side of the polyimide resin film 2 and development is performed to form a hole 5 at the bottom where the W film on the surface of the copper plate 1 is exposed, and the polyimide resin film 2 and the resist 3 are hard baked ( FIG. 2 (b). After the recesses 6 are formed in the copper plate 1 by plasma etching (FIG. 2C), the conductive members 7 such as gold are filled in the holes 5 and the recesses 6 by plating using the copper plate 1 as electrodes, and The conductive member 7 is raised above the hole 5 from the surface of the polyimide resin film 2. Thereafter, the copper plate 1 and the resist 3 are sequentially removed as shown in FIGS. 2 (d) and 2 (e), and the other end of the conductive member 7 as shown in FIG. 2 (f) projects greatly below the holder. Manufacture electrical connection members.
Also in the second embodiment, it is possible to arbitrarily set the bump height by appropriately setting the thickness of the resist 3.

【0014】〔実施例3〕図3は本発明の実施例3の主
要工程を示す模式的断面図である。この実施例3にあっ
ては、表面にタングステン膜を形成した銅板1上に、先
ず第2の感光性樹脂膜を構成するレジスト3を塗布して
これをプリベイクした後、第1の感光性樹脂膜を構成す
るポリイミド樹脂膜2を塗布し、更にこの上に第3の感
光性樹脂膜を構成するレジスト4を塗布してこれをプリ
ベイクし、感光性樹脂膜を3層構造とした状態(図3
(a))でレジスト4の表面側から露光し、現像を行うこと
としている。他の工程は実施例1,2と実質的に同じで
ある。即ちレジスト4の表面側から露光し、現像して底
部に銅板1表面のW膜が露出する穴5を形成した後(図
3(b))、プラズマエッチングにより銅板1の表面部分に
球殻状の凹孔6を形成する(図3(c))。
[Embodiment 3] FIG. 3 is a schematic sectional view showing main steps of Embodiment 3 of the present invention. In the third embodiment, a resist 3 constituting a second photosensitive resin film is first applied on a copper plate 1 having a tungsten film formed on a surface thereof, and the resist 3 is prebaked. A polyimide resin film 2 constituting a film is applied, and a resist 4 constituting a third photosensitive resin film is further applied thereon and prebaked to form a three-layer structure of the photosensitive resin film (FIG. 3
In (a)), exposure is performed from the front side of the resist 4 and development is performed. Other steps are substantially the same as those of the first and second embodiments. That is, after exposing from the surface side of the resist 4 and developing to form a hole 5 at the bottom where the W film on the surface of the copper plate 1 is exposed (FIG. 3 (b)), a spherical shell is formed on the surface of the copper plate 1 by plasma etching. Is formed (FIG. 3 (c)).

【0015】次に銅板1を電極とするメッキ法により凹
孔6及び穴5内に金等の導電部材7を充填し、更に穴5
の上方に導電部材7をレジスト4の表面から盛り上がら
せ(図3(d))、その後は銅板1,レジスト3,4を順次
エッチング除去し、更にプリベイクしたレジスト3,4
をO2 プラズマを用いたアッシングによって除去し、図
3(e) に示す如き金等の導電部材7が電気的導電材料を
構成し、ポリイミド樹脂膜2が保持体を構成する電気的
接続部材を製造する。
Next, a conductive member 7 such as gold is filled in the concave hole 6 and the hole 5 by plating using the copper plate 1 as an electrode.
The conductive member 7 is raised from the surface of the resist 4 (FIG. 3 (d)). Thereafter, the copper plates 1, the resists 3 and 4 are sequentially removed by etching, and the prebaked resists 3 and 4 are further removed.
Is removed by ashing using O 2 plasma, a conductive member 7 such as gold as shown in FIG. 3 (e) forms an electrically conductive material, and the polyimide resin film 2 forms an electrical connection member which forms a holder. To manufacture.

【0016】このような実施例3にあっては、絶縁性の
保持体の両面から夫々レジスト3,4の厚さに相当する
長さだけバンプが突出して形成され、バンプの突き出し
高さが見掛け上大きくなり、バンプ変形加工代が大きく
なる効果がある。
In the third embodiment, the bumps are formed so as to protrude from both sides of the insulating holder by a length corresponding to the thicknesses of the resists 3 and 4, respectively. This has the effect of increasing the margin for bump deformation.

【0017】また前述した実施例1〜3においては基体
として表面にW膜を形成した銅板1を用いた構成につい
て説明したが、特にこれにのみ限定するものではなく、
Wに代えてMo, Ni等、導電部材と加熱処理を行っても合
金化せず、また導電部材である金と金属間化合物を生成
しない高融点金属を用いてもよい。また、基体自体をこ
れらによって構成してもよく、保持体、導電部材をエッ
チングすることなく除去出来る材料であればよい。
In Embodiments 1 to 3 described above, the configuration using the copper plate 1 having a W film formed on the surface as the substrate has been described. However, the present invention is not particularly limited thereto.
Instead of W, a high melting point metal such as Mo or Ni which does not alloy even when subjected to heat treatment with a conductive member and which does not generate an intermetallic compound with gold which is a conductive member may be used. Further, the base itself may be composed of these materials, and any material may be used as long as it can remove the holder and the conductive member without etching.

【0018】また電気的絶縁材である保持体としては感
光性ポリイミド樹脂の外、感光性エポキシ樹脂を用いて
もよい。またこれらの樹脂中に、粉体, 繊維, 板状体,
棒状体, 球状体等の所望の形状をなした、無機材料, 金
属材料, 合金材料の一種または複数種を分散して含有せ
しめてもよい。含有される金属材料, 合金材料として
は、Au, Ag, Cu, Al, Be, Ca, Mg, Mo, Fe, Ni, Co, M
n, W,Cr, Nb, Zr, Ti,Ta, Zn, Sn, Pb-Sn 等があげら
れ、含有される無機材料として、SiO2 , B2 3 , Al
2 3 ,Na2 O,K2 O,CaO, ZnO,BaO,PbO,Sb
23 , As2 3 ,La2 3 ,ZrO2 ,P2 5 ,TiO
2 ,MgO,SiC,BeO,BP, BN, AlN,B4 C, TaC,Ti
2 ,CrB2 , TiN, Si3 4 ,Ta2 5 等のセラミッ
ク, ダイヤモンド, ガラス, カーボン, ボロン等があ
げられる。
[0018] In addition to the photosensitive polyimide resin, a photosensitive epoxy resin may be used as the holder as an electrical insulating material. In these resins, powder, fiber, plate,
One or more of inorganic materials, metal materials, and alloy materials having a desired shape such as a rod-like body and a spherical body may be dispersed and contained. Au, Ag, Cu, Al, Be, Ca, Mg, Mo, Fe, Ni, Co, M
n, W, Cr, Nb, Zr, Ti, Ta, Zn, Sn, Pb-Sn, etc., and the inorganic materials contained are SiO 2 , B 2 O 3 , Al
2 O 3 , Na 2 O, K 2 O, CaO, ZnO, BaO, PbO, Sb
2 O 3 , As 2 O 3 , La 2 O 3 , ZrO 2 , P 2 O 5 , TiO
2, MgO, SiC, BeO, BP, BN, AlN, B 4 C, TaC, Ti
Ceramics such as B 2 , CrB 2 , TiN, Si 3 N 4 and Ta 2 O 5 , diamond, glass, carbon, boron and the like can be mentioned.

【0019】更に導電部材の材料として金を使用した
が、これに代えてCu,Ag, Be, Ca, Mg, Mo, Ni, W,Fe,
Ti, In, Ta, Zn, Al, Sn, Pb-Sn 等の金属単体又はこ
れらの合金を用いてもよい。なお導電部材の断面形状
は、円形, 四角形その他の形状とすることができるが、
応力の過度の集中を避けるためには角がない形状が望ま
しい。
Further, gold was used as the material of the conductive member, but instead of Cu, Ag, Be, Ca, Mg, Mo, Ni, W, Fe,
Simple metals such as Ti, In, Ta, Zn, Al, Sn, and Pb-Sn or alloys thereof may be used. The cross-sectional shape of the conductive member can be circular, square or any other shape.
A shape without corners is desirable to avoid excessive concentration of stress.

【0020】[0020]

【発明の効果】以上の如く本発明方法にあっては、導電
部材が保持体の片面側又は両面側から第2及び/又は第
3の感光樹脂膜の厚さ分に相当する長さだけ見掛け上突
出した状態となり、それだけ導電部材の変形加工代が大
きく、他の電極等との接合に際して低加圧力接合が可能
となり、過度な力が電極等に付与されるのを防止出来、
また電極等に反り,曲り,凹凸等が存在しても確実に接
合出来、接合性に対する信頼性が高められる等本発明は
優れた効果を奏するものである。
As described above, in the method of the present invention, the conductive member has an apparent length corresponding to the thickness of the second and / or third photosensitive resin films from one or both sides of the holder. It becomes an upper protruding state, the deformation allowance of the conductive member is large accordingly, low pressure bonding can be performed at the time of bonding with other electrodes and the like, and an excessive force can be prevented from being applied to the electrodes and the like,
In addition, the present invention has excellent effects such as reliable joining even if the electrodes and the like have warpage, bending, irregularities, etc., and the reliability of the joining property is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例1の主要製造工程を示す模式的
断面図である。
FIG. 1 is a schematic cross-sectional view showing main manufacturing steps of a first embodiment of the present invention.

【図2】本発明の実施例2の主要製造工程を示す模式的
断面図である。
FIG. 2 is a schematic cross-sectional view illustrating main manufacturing steps of a second embodiment of the present invention.

【図3】本発明の実施例3の主要製造工程を示す模式的
断面図である。
FIG. 3 is a schematic cross-sectional view showing main manufacturing steps of a third embodiment of the present invention.

【図4】従来方法の主要製造工程を示す模式的断面図で
ある。
FIG. 4 is a schematic cross-sectional view showing main manufacturing steps of a conventional method.

【図5】電気的接続部材の接続態様を示す模式的断面図
である。
FIG. 5 is a schematic sectional view showing a connection mode of an electrical connection member.

【符号の説明】[Explanation of symbols]

1 銅板 2 ポリイミド樹脂膜 3,4 レジスト 5 穴 6 凹孔 7 導電部材 DESCRIPTION OF SYMBOLS 1 Copper plate 2 Polyimide resin film 3,4 Resist 5 Hole 6 Concave hole 7 Conductive member

───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮崎 豊秀 東京都大田区下丸子3丁目30番2号 キ ヤノン株式会社内 (72)発明者 ▲榊▼ 隆 東京都大田区下丸子3丁目30番2号 キ ヤノン株式会社内 (72)発明者 寺山 芳実 東京都大田区下丸子3丁目30番2号 キ ヤノン株式会社内 (72)発明者 田村 洋一 東京都千代田区大手町一丁目1番3号 住友金属工業株式会社内 (72)発明者 岡林 高弘 東京都千代田区大手町一丁目1番3号 住友金属工業株式会社内 (72)発明者 近藤 和夫 東京都千代田区大手町一丁目1番3号 住友金属工業株式会社内 (72)発明者 中塚 康雄 東京都千代田区大手町一丁目1番3号 住友金属工業株式会社内 (72)発明者 池上 祐一 大阪市中央区北浜4丁目5番33号 住友 金属工業株式会社内 (56)参考文献 特開 昭63−224235(JP,A) 特開 平2−49385(JP,A) 特開 平3−182080(JP,A) 特開 平3−192666(JP,A) 特開 平3−269976(JP,A) 特開 平3−269977(JP,A) 特開 平3−283373(JP,A) 特開 平3−283374(JP,A) 特開 平3−283375(JP,A) 特開 平3−283379(JP,A) 特開 平4−2071(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01R 11/01 H01R 43/00 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Toyohide Miyazaki 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. (72) Inventor ▲ Takashi Sakaki ▼ 3-30-2 Shimomaruko, Ota-ku, Tokyo Within Canon Inc. (72) Inventor Yoshimi Terayama 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Yoichi Tamura 1-3-1, Otemachi, Chiyoda-ku, Tokyo Sumitomo Metal Industries (72) Inventor Takahiro Okabayashi 1-3-1 Otemachi, Chiyoda-ku, Tokyo Sumitomo Metal Industries, Ltd. (72) Inventor Kazuo Kondo 1-3-1, Otemachi, Chiyoda-ku, Tokyo Sumitomo Metal Industries (72) Inventor Yasuo Nakatsuka 1-3-1 Otemachi, Chiyoda-ku, Tokyo Sumitomo Metal Industries, Ltd. (72) Inventor Yuichi Ikegami Osaka 4-5-33 Kitahama, Chuo-ku Sumitomo Metal Industries, Ltd. (56) References JP-A-63-224235 (JP, A) JP-A-2-49385 (JP, A) JP-A-3-182080 (JP) JP-A-3-192666 (JP, A) JP-A-3-269976 (JP, A) JP-A-3-269977 (JP, A) JP-A-3-283373 (JP, A) JP-A-3-283374 (JP, A) JP-A-3-283375 (JP, A) JP-A-3-283379 (JP, A) JP-A-4-2071 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01R 11/01 H01R 43/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 電気的絶縁材からなる保持体と、該保持
体中に互いに絶縁状態に備えられた複数の導電部材とを
有し、前記各導電部材の一端は前記保持体の一方の面に
露出し、前記各導電部材の他端は前記保持体の他方の面
に露出している電気的接続部材を製造する方法におい
て、基体の導電性を備えた面に保持体を構成する第1の
感光性樹脂膜と、第2の感光性樹脂膜とをこの順序又は
逆の順序で積層形成する工程と、前記第1,第2の感光
性樹脂膜を露光し、現像して底部に前記基体の導電性面
が露出する複数の穴を形成する工程と、前記穴内に露出
する基体の面をエッチングして凹孔を形成する工程と、
前記凹孔及び穴内に導電部材を充填すると共に、前記穴
上に導電部材を盛り上げるように堆積する工程と、前記
基体及び第2の感光性樹脂膜を除去する工程とを含むこ
とを特徴とする電気的接続部材の製造方法。
1. A holder comprising an electrically insulating material, and a plurality of conductive members provided in the holder in a state of being insulated from each other, one end of each of the conductive members being one surface of the holder. Wherein the other end of each of the conductive members is exposed to the other surface of the holding member, and wherein the holding member is formed on the conductive surface of the base. A step of laminating a photosensitive resin film and a second photosensitive resin film in this order or in the reverse order, exposing and developing the first and second photosensitive resin films, and Forming a plurality of holes in which the conductive surface of the base is exposed, and forming a recess by etching the surface of the base exposed in the holes;
A step of filling the recess and the hole with a conductive member, depositing the conductive member on the hole so as to rise, and removing the base and the second photosensitive resin film. A method for manufacturing an electrical connection member.
【請求項2】 電気的絶縁材からなる保持体と、該保持
体中に互いに絶縁状態に備えられた複数の導電部材とを
有し、前記各導電部材の一端は前記保持体の一方の面に
露出し、前記各導電部材の他端は前記保持体の他方の面
に露出している電気的接続部材を製造する方法におい
て、基体の導電性を備えた面に保持体を構成する第1の
感光性樹脂膜と、この第1の感光性樹脂膜を挟む第2,
第3の感光性樹脂膜とを積層形成する工程と、前記第
1,第2,第3の感光性樹脂膜を露光し、現像して底部
に前記基体の導電性面が露出する複数の穴を形成する工
程と、穴内に露出する基体の面をエッチングして凹孔を
形成する工程と、前記穴及び凹孔に導電部材を充填する
と共に、前記穴上に導電部材を盛り上げるように堆積す
る工程と、前記基体及び第2,第3の感光性樹脂膜を除
去する工程とを含むことを特徴とする電気的接続部材の
製造方法。
2. A holding body made of an electrically insulating material, and a plurality of conductive members provided in the holding body so as to be insulated from each other, one end of each of the conductive members being one surface of the holding body. Wherein the other end of each of the conductive members is exposed to the other surface of the holding member, and wherein the holding member is formed on the conductive surface of the base. And the second and second photosensitive resin films sandwiching the first photosensitive resin film.
A step of laminating and forming a third photosensitive resin film, and exposing and developing the first, second, and third photosensitive resin films to expose a conductive surface of the base at the bottom. Forming a hole by etching the surface of the substrate exposed in the hole, filling the hole and the recess with a conductive member, and depositing the conductive member on the hole so as to rise. And a step of removing the base and the second and third photosensitive resin films.
JP5389891A 1991-02-22 1991-02-22 Manufacturing method of electrical connection member Expired - Fee Related JP3038361B2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP5389891A JP3038361B2 (en) 1991-02-22 1991-02-22 Manufacturing method of electrical connection member
DE69233232T DE69233232T2 (en) 1991-02-22 1992-02-21 Electrical connector body and manufacturing method therefor
DE69233684T DE69233684D1 (en) 1991-02-22 1992-02-21 Electrical connection body and manufacturing method therefor
EP97111202A EP0805493B1 (en) 1991-02-22 1992-02-21 Electrical connecting member and manufacturing method therefor
EP92102974A EP0504614B1 (en) 1991-02-22 1992-02-21 Electrical connecting member and manufacturing method therefor
US08/221,970 US5860818A (en) 1991-02-22 1994-04-04 Electrical connecting member
US09/099,928 US6511607B1 (en) 1991-02-22 1998-06-19 Method of making an electrical connecting member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5389891A JP3038361B2 (en) 1991-02-22 1991-02-22 Manufacturing method of electrical connection member

Publications (2)

Publication Number Publication Date
JPH04269484A JPH04269484A (en) 1992-09-25
JP3038361B2 true JP3038361B2 (en) 2000-05-08

Family

ID=12955543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5389891A Expired - Fee Related JP3038361B2 (en) 1991-02-22 1991-02-22 Manufacturing method of electrical connection member

Country Status (1)

Country Link
JP (1) JP3038361B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6376761B2 (en) * 2014-01-31 2018-08-22 日本航空電子工業株式会社 Relay member and method of manufacturing relay member

Also Published As

Publication number Publication date
JPH04269484A (en) 1992-09-25

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