JP3037511B2 - Manufacturing method of color filter - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a color filter, and more particularly to a method for producing a color filter, which comprises optimizing an equilibrium concentration of a micelle dispersion or a micelle solubilizing solution comprising a dye and transparent particles. The present invention relates to a method for producing a (multi-gap) color filter in which the thickness of each color having excellent spectral characteristics of the three primary colors of red, green, and blue which does not cause color separation and peeling and has uniform or controlled film thickness.

[0002]

2. Description of the Related Art Conventionally, a method for producing a thin film or a color filter by a micellar electrolysis method (Japanese Patent Application Laid-Open Nos. 63-243298 and 63-5053).
No. 84) is known, but in a color filter using only a simple pigment, a dye (RG) having three primary colors of red, green, and blue in order to make the spectral characteristics appropriate.
B), and a smooth film cannot be obtained. On the other hand, in the printing method, a method of adding inorganic particles to a pigment in a color filter is described in JP-A-63-254403, but this is only a method of adding transparent particles to ink, It cannot be adapted to micellar electrolysis. Japanese Patent Application Laid-Open No. 2-101193 describes that a mixed material of an organic material and an inorganic material is deposited on an electrode by a micelle electrolysis method in a micelle electrolysis method. However, since the equilibrium concentration of is not adjusted, there is a problem that coarse particles are generated, the thin film is peeled off, or the transmittance is reduced. The purpose of the present invention is to increase the adhesion between the electrode and the dye film by reducing the particle size of the inorganic material, and does not actually mention mixing with an organic material at all. Japanese Patent Application Laid-Open Nos. 2-101195 and 2-267 disclose a method for forming a film by hydrophobic micelles of inorganic particles.
No. 298, JP-A-2-1011.
No. 95 does not specify the mixture composition ratio, and the method of hydrophobization is unclear. JP-A-2-267298 discloses that
Although there is a description about eutectoids of silane-treated inorganic particles and organic dyes, since the purpose is to add conductivity, a method for preparing a dispersion for micellar electrolysis to uniform or control the film thickness is described. Not listed. A micelle electrolysis method in which a resin is added to an organic material for the purpose of uniforming or controlling the film thickness is described in JP-A-4-401, but there is only an example of polypropylene, and there is a problem in heat resistance and other physical properties. was there.

Further, when two types of hydrophobic substances are dispersed in an aqueous solution and micelle electrolysis is performed, a method of simply mixing two types of dispersions (Japanese Patent Laid-Open No. 2-129602) and a method of mixing two types of hydrophobic substances Two methods of dispersing the powder are conceivable. However, in the case of controlling fine characteristics (surface smoothness, color uniformity, uniformity of a micro-sized thin film structure) such as a color filter, the above two methods also cause inconvenience. In the case of, in general, the optimal equilibrium concentration of a dispersion of a single hydrophobic substance differs for each hydrophobic substance, so when mixing two types of dispersions, one of the surfactants will become hydrophobic due to the difference in the equilibrium concentration. It departs from the substance and is adsorbed by the other hydrophobic substance, so that the equilibrium concentration of the two liquids tends to be constant. At this time, the dispersion of the one hydrophobic substance becomes unstable due to the detachment of the surfactant, and aggregation of the dispersed particles occurs according to the thin film forming function formed by the energization treatment without the energization treatment. When such agglomeration occurs in the solution, the dispersed particles become coarse, and the thin film formed by the electrolytic treatment using the dispersion liquid is made of coarse particles, so that uniformity cannot be obtained. Specifically, coarse particles of several μm to several tens μm are deposited on a thin film of several μm, which causes problems in transmittance, flatness, uniformity and reproducibility. Also, according to the embodiment of
When a mixture of different dispersion compositions is mixed, one of the hydrophobic substances causes a problem such as precipitation or aggregation,
Problems such as generation of coarse particles, color separation, and peeling of a thin film occur during the film formation by micellar electrolysis. If, 2
It is not possible to uniformly disperse a mixture of different types of hydrophobic substances. Specifically, the dispersion is performed by an ultrasonic homogenizer or a sand mill.However, unless the particle size and the surface physical properties of the hydrophobic substance are equal, the condition for dispersing all the plurality of hydrophobic substances under the same condition cannot be satisfied. . Such problems not only cause inconveniences such as color unevenness, color shift, white spots or loss of smoothness when manufacturing a color filter, but also cause inability to adjust to a desired chromaticity. Further, in a pigment-based thin film, the transmittance and the film thickness are in a proportional relationship, and the film thickness for obtaining sufficient spectral characteristics causes a difference in the film thickness of each color, which causes a problem when driving the liquid crystal.

On the other hand, after forming an RGB dye film by a micellar electrolysis method, an electrochemical treatment (two-step film formation by an electrodeposition method) is performed to form a protective film to make the film thickness uniform (Japanese Patent Laid-Open No. No. 3-293634), but does not disclose a method for performing two-step micellar electrolysis. In the case of manufacturing a color filter, when a resist containing an ultraviolet-sensitive black pigment is used at the time of forming a black matrix by back exposure, the light-shielding property at the pattern edge is poor and the boundary tends to be unclear. On the other hand, a method of adding an organic transparent ultraviolet absorber (Japanese Patent Application Laid-Open No. 2-77014) is disclosed. However, in the micelle electrolysis method, the above organic transparent ultraviolet absorber can be used because it is aqueous. Did not. Therefore, the present inventors, generation of coarse particles during film formation,
Intensive research was conducted to develop a method capable of forming a color filter with freely controlled film thickness without causing color separation and thin film peeling.

[0005]

As a result, it has been found that the object can be achieved by the following two methods. That is, a method of adjusting the equilibrium concentration of a micelle dispersion or micelle solubilization solution in an aqueous medium to a specific range when mixing a transparent particle and a dye to form a thin film by micellar electrolysis, It has been found that the above object can be achieved by a method of forming a thin film by micellar electrolysis alone in two steps. The present invention has been completed based on such findings.

That is, the present invention relates to a micelle dispersion or micelle obtained by independently dispersing a dye having three primary colors of red, green and blue and transparent particles in an aqueous medium using a ferrocene derivative surfactant. The solubilizing solution was mixed, a color filter manufacturing substrate having a transparent conductive thin film patterned into the mixed dispersion or micellar solubilizing solution was inserted, the substrate was subjected to an electric current treatment, and the film thickness was adjusted on the electrode. In producing a color filter for forming a dye film, the equilibrium concentration of the micelle dispersion or the micelle solubilizing solution of each of the dye and the transparent particles is 0.1.
Provided is a method for producing a color filter, which comprises using a micelle dispersion of transparent particles or a mixture of a micelle solubilization solution of a dye and a micelle dispersion or micelle solubilization solution of a dye having a concentration of about 2.8 mmol / l. In addition, the present invention provides an equilibrium concentration of 0.1 to 2.8 mmol obtained by independently dispersing a dye having spectral characteristics of three primary colors of red, green and blue in an aqueous medium using a ferrocene derivative surfactant.
/ Liter of a micelle dispersion or micelle solubilization solution, or a mixed dispersion of a plurality of dye micelle dispersions or a color filter manufacturing substrate having a transparent conductive thin film patterned into a solution, and applying an electric current to the substrate. In order to manufacture a color filter for forming a dye film having an adjusted film thickness on an electrode, after forming each of the dye films , titania, silica, aluminum , and the like having a heat-resistant temperature of 230 ° C. or more are used.
A micellar dispersion having an equilibrium concentration of 0.1 to 2.8 mmol / l obtained by using a ferrocene derivative surfactant in an aqueous medium by using transparent particles selected from quinone and polysiloxane. Another object of the present invention is to provide a method for producing a color filter, which comprises inserting the obtained dye film-forming substrate into a micelle solubilizing solution, applying an electric current thereto, and laminating transparent particles on the dye film-forming substrate. Furthermore, the present invention is resistant
Titania, silica, alumina,
The selected transparent particles than in the fine polysiloxane, obtained using the ferrocene derivative surfactant in an aqueous medium equilibrium
A substrate for producing a color filter having a patterned transparent conductive thin film is inserted into a micelle dispersion or micelle solubilization solution having a concentration of 0.1 to 2.8 mmol / L, and the substrate is subjected to a current-passing process. After forming a thin film of transparent particles thereon, dyes having spectral characteristics of red, green and blue are each independently dispersed in an aqueous medium using a ferrocene derivative surfactant to obtain an equilibrium concentration of 0.1. ~ 2.8
A substrate having a transparent particle thin film is inserted into a micellar dispersion or a micelle solubilization solution of millimoles / liter , or a mixed dispersion obtained by mixing micelle dispersions of a plurality of dyes. Provided is a method for manufacturing a color filter, wherein a dye film is formed on the color filter.
Is what you do. Also, the present invention relates to a red, green, blue
Dyes and transparent particles having spectral characteristics of color in aqueous medium
Independently dispersed using a ferrocene derivative surfactant
Micelle dispersion or micellar solubilization solution
Mix and pattern the mixed dispersion or micelle solubilization solution.
Made of color filter with transparent conductive thin film
Insert the substrate for fabrication, apply electric current to the substrate, and
A color filter that forms a dye film with an adjusted thickness
In manufacturing, each of the dyes and transparent particles
The equilibrium concentration of the aqueous dispersion or micelle solubilizing solution is 0.1 to 0.1.
Micellar dispersion of transparent particles of 2.8 mmol / l
Alternatively, a micelle solubilization solution and a dye micelle dispersion or
After forming a dye film using a mixture of micelle solubilizing solution ,
In a method of manufacturing a color filter for forming a black matrix by applying a negative type black resist and exposing from the back, an average particle size is 300 nm or less,
The transmittance in the visible wavelength region of 380 to 780 nm is 6
0% or more, the transmittance at a wavelength of 450 nm or more is 70% or more, the transmittance at a wavelength of 350 nm or less is 65% or less, and the heat shielding property is 230 ° C. or more. By using this as a light-shielding film, a method of manufacturing a color filter, characterized in that the negative black resist is formed only in the gap between the dye films.

[0007] RGB constituting the color filter of the present invention
(R: red pigment, G: green pigment, B: blue pigment)
In order to form a dye film, for example, the three primary color dyes are dispersed or solubilized using a ferrocene derivative surfactant to prepare respective dye-containing micelle dispersion solutions or micelle solubilization solutions.

The dyes having the spectral characteristics of RGB used herein, that is, the hydrophobic dyes of RGB include the following. Examples of the red pigment include perylene pigments, lake pigments, azo pigments, dianthraquinone, quinacridone pigments, anthraquinone pigments, and anthracene pigments. For example, perylene pigments, lake pigments (Ca, Ba, Sr, Mn), Examples include quinacridone, naphthol AS, shicomin pigment, anthraquinone, disazo (Sudan I, II, III, R), benzopyran, cadmium sulfide pigment, and Fe (III) oxide pigment, of which perylene pigment and lake pigment are preferred. Examples of the green pigment include halogen-substituted phthalocyanine pigments, halogen-substituted copper phthalocyanine pigments, and triphenylmethane-based basic dyes.
There are triphenylmethane dyes and the like, and blue pigments include copper phthalocyanine pigments, indanthrone pigments,
There are indophenol pigments or cyanine pigments, for example, phthalocyanine metal complexes such as chlorocopper phthalocyanine, chloroaluminum phthalocyanine, vanadate phthalocyanine, magnesium phthalocyanine, zinc phthalocyanine, iron phthalocyanine, cobalt phthalocyanine, phthalocyanine, merocyanine, and indophenol blue. There is. Further, as a yellow pigment for adjusting chromaticity, a disazo pigment, an isoindolinone pigment or the like, and as a violet pigment, a dioxazine pigment can be used. The shape and size of the hydrophobic organic substance are not particularly limited.
A powder of 0 μm or less is used.

In order to form an RGB hydrophobic dye thin film constituting a color filter, one of R, G and B hydrophobic dyes is added to an aqueous medium, and a thin film having a desired color tone is formed by the above-described operation. The above operation may be repeated by forming a desired pattern and then changing the type of the hydrophobic dye. Here, a desired pigment-containing micelle dispersion or micelle solubilization solution may be prepared using two or more micelle dispersions or micelle solubilization solutions. For example, R and Y
A dye-containing micelle dispersion or micellar solubilizing solution of (yellow-based dye) may be prepared, and a normal mixing method may be used at the time of producing a thin film using the two or more micellar dispersions or micelle solubilizing solutions.

The transparent particles include various types.
For example, titania (IT-UD, manufactured by Idemitsu Kosan Co., Ltd.), silica, alumina, polysiloxane, zinc oxide, hydrophobic titania, and the like are preferable, and titania, silica, alumina, and polysiloxane are particularly preferable, and titania is particularly preferable. Titania may be fine particles of 300 nm or less, but the primary particle diameter of hydrophobic particles added with silane alkoxide during production of ultrafine particle titania produced by vapor phase hydrolysis and thermal decomposition of titanium alkoxide is 20 nm or less. May be used. Thus, particles produced by adding a silane alkoxide during the production of ultrafine metal oxide particles by gas-phase hydrolysis / pyrolysis method have a higher transparency and transparency than fine particles produced by other methods. Excellent dispersibility. When commercially available titania, silica, or alumina is used, the average particle size is measured from an electron micrograph, and preferably 300 nm or less, particularly preferably 190 nm or less. Table 2 shows the measurement results. The visible light transmittance (measured by Hitachi UV-3100) of the transparent particles is
Those having a wavelength of 380 to 780 nm were all 60% or more, preferably 70% or more, 450 nm or more, 70% or more, preferably 80% or more, and 350 nm or less, 65% or less. The reason why the wavelength of 350 nm or less is cut is that 365 nm ultraviolet light exposure is performed to shield light by back exposure of the black matrix. Further, the heat resistant temperature is preferably 230 ° C. or higher.

[0011] Ferrocene derivative surfactants (hereinafter also referred to as micellizing agents or surfactants) are surfactants containing a ferrocene derivative as an active ingredient and include various surfactants such as nonionic, cationic and anionic. There are things. Specifically, ammonium-type ferrocene derivatives as described in JP-A-63-243298,
Ether-type ferrocene derivatives and ester-type ferrocene derivatives as described in International Publication WO 89/01939, pyridinium-type ferrocene derivatives as described in JP-A-1-226894, and further JP-A-2-88387. Gazette, JP-A-1-45370,
Various ferrocene derivatives as disclosed in JP-A-2-96585 and JP-A-2-250892 can be exemplified.

Next, examples of the aqueous medium include various media such as water, a mixed liquid of water and alcohol, and a mixed liquid of water and acetone. In the present invention, the dye or the transparent particles and the ferrocene derivative surfactant are dispersed in the aqueous medium to prepare a micelle dispersion or a micelle solubilization solution. In addition, you may use a supporting salt as needed.

As a method for preparing the micelle dispersion or micelle solubilizing solution of the present invention, for example, the dye and / or the transparent particles, the ferrocene derivative surfactant and, if necessary, the supporting salt are added to the aqueous medium. In a medium, sufficient stirring can be performed by a mechanical homogenizer, an ultrasonic homogenizer, a pearl mill, a sand mill, a stirrer, a three-roll mill, or the like. By this operation, the coloring matter and the transparent particles are uniformly dispersed or solubilized in the aqueous medium by the action of the surfactant to form a micelle dispersion or a micelle solubilized solution. Here, the total concentration of the micellizing agent is preferably selected in the range of 0.1 mmol / L to 1 mol / L. The concentration of the pigment or the transparent particles is preferably in the range of 1 to 500 g / liter.

In preparing the micelle dispersion or micelle solubilizing solution of the present invention, a supporting salt (supporting electrolyte) may be used as necessary. This supporting salt is added to adjust the electric conductivity of the aqueous medium. The amount of the supporting salt to be added may be within a range that does not prevent precipitation of the solubilized or dispersed dye or transparent particles, and is usually about 0 to 300 times the concentration of the above micelle agent, preferably 50 to 200 times. The standard concentration is used as a guide. The electrolysis can be carried out without adding the supporting salt, but in this case, a thin film having a high purity containing no supporting salt can be obtained. When a supporting salt is used, the type of the supporting salt is not particularly limited as long as the electric conductivity of the aqueous medium can be adjusted without hindering formation of micelles and precipitation of a dye or transparent particles on an electrode. Absent.

More specifically, sulfates (lithium, potassium, sodium,
Salts such as rubidium and aluminum), acetates (lithium, potassium, sodium, rubidium, beryllium,
Salts of magnesium, calcium, strontium, barium, aluminum, etc., and halide salts (lithium, potassium, sodium, rubidium, calcium,
Salts such as magnesium and aluminum) and water-soluble oxide salts (salts such as lithium, potassium, sodium, rubidium, calcium, magnesium, and aluminum) are preferred.

The most important factor in the composition of the micelle dispersion or the micelle solubilizing solution is the relationship between the dye or the transparent particles and the micellizing agent (surfactant). Usually, when a dye or transparent particles are put into a surfactant solution, the surfactant is adsorbed on the surface of the dye or transparent particles. This adsorption lowers the surfactant concentration in the solution. After a sufficient time, the adsorption reaches equilibrium and the concentration of this surfactant in the aqueous solution becomes constant. The concentration of the surfactant in the aqueous solution in this state is called an equilibrium concentration. To measure the equilibrium concentration, the dye or transparent particles are completely separated by centrifugation (1,000 rpm or more), and the concentration of the surfactant remaining in the aqueous solution is determined by elemental analysis such as plasma emission spectrometry (ICP). Required by The ferrocene derivative surfactant of the present invention may be analyzed for iron.

By adjusting the equilibrium concentration of the micelle dispersion or the micelle solubilizing solution to 0.1 to 2.8 mmol / liter, the dye or the transparent particles can be stably and easily dispersed. According to the principle of micellar electrolysis, the surfactant is electrochemically oxidized, and as a result, the surfactant adsorbed on the dye or the transparent particles is desorbed. When this operation is repeated, finally, the dye or the transparent particles cannot be dispersed only by the adsorbed surfactant, and some of the dyes or the transparent particles aggregate to reduce the surface area. However, finally, the pigment or transparent particles cannot be completely dispersed, and the dye or the transparent particles are deposited. Therefore, in order for this principle to work, on the contrary, if the concentration of the surfactant, that is, the equilibrium concentration, is too high, sufficient surfactant exists even if oxidized by electrolysis, and the aggregation of the dye or transparent particles Will not occur, and the purpose will not be achieved. In the present invention, the optimum value of the equilibrium concentration is 0.10 to 2.8 mmol / L.

In the present invention, the micelle dispersion obtained above
Alternatively, a thin film is manufactured using a micelle solubilizing solution. Book
In the invention, the thin film is a micelle dispersion or micelle-soluble
Add the above supporting salt to the
Uses a conductive substrate (transparent electrode) while adding a little stirring
And electrolytic treatment. In addition, electrolytic treatment
The above dye or transparent particles are in micelle dispersion
Or may be supplemented to the micelle solubilization solution.
Remove micelle dispersion or micellar solubilization solution in the vicinity
Can be extracted and micelle dispersion or micelle can be extracted
Add dye or transparent particles to the solubilization solution and mix thoroughly.
A circulation circuit for stirring and then returning this liquid to the vicinity of the cathode was added.
May be provided. The electrolysis conditions at this time depend on various situations.
The temperature of the solution is usually 0 to 90 ° C.
20-70 ° C, and the voltage condition is a micellizing agent.
Potential higher than the redox potential of a ferrocene derivative surfactant
At a voltage lower than the hydrogen generation potential, specifically 0.1 to 1.5.
V, preferably 0.3 to 1.0 V, and a current density of 10 mA
/ Cm^TwoBelow, preferably 50 to 300 μA / cm^TwoWhen
I do. When this electrolytic treatment is performed, the principle of micellar electrolytic method
The reaction proceeds. This is the ferrocene derivative
Focusing on the behavior of Fe ions, at the anode, ferrocene
Fe ²⁺Is Fe³⁺The micelles collapse and the pigment or
The transparent particles are deposited on the anode (transparent electrode). one
On the other hand, at the cathode, Fe oxidized at the anode³⁺Is Fe²⁺Reduced to
To return to the original micelles.
Can do the work. The thin film thus formed
Baking (baking), pure water washing, electrolytic washing as required
Purification is preferred. In addition, micelle dispersion or
If a supporting salt was used when preparing the micelle solubilization solution,
It is not necessary to add a supporting salt. Such micellar electricity
By the dissolution treatment, the dye or the transparent material
A desired thin film containing bright particles is formed.

As the conductive substrate used here, ITO, platinum, graphite, Nesa film, chromium, nickel, antimony oxide or the like is added as a thin film to a plate of aluminum or the like or an insulating substrate of glass, polymer, ceramic or the like. It is preferable to use a transparent electrode. The material of the transparent electrode is the oxidation potential of the ferrocene derivative (+0.15 to 0.3).
Any metal or conductor that is nobler than 0 V versus a saturated sweet potato electrode may be used. Specific examples include ITO, tin dioxide, and conductive polymer films.

In the present invention, a thin film can be produced by using two or more kinds of micellar dispersions or micelle solubilizing solutions. This production method may be based on the case where one kind of the micelle dispersion or the micelle solubilization solution is used. However, the equilibrium concentration of at least one or more of the micelle dispersion or the micelle solubilizing solution is adjusted to be 0.1 to 2.8 mmol / L, and the difference between the respective equilibrium concentrations is adjusted to 1.2 mmol / L or less. Is preferred. The mixing method for mixing the micelle dispersion or the micelle solubilizing solution is ultrasonic dispersion (5 to 1000 at 100 to 10 kW).
Minutes), stirrer stirring (1 to 500 at 5-200 rpm)
Min), mechanical homogenizer (1 to 30,000 rp)
m is 1 to 1000 minutes).

Here, a procedure for manufacturing a color filter will be described. As a method for producing the color filter of the present invention, various methods can be cited, and a method using mixed film formation and a two-step film formation are exemplified. Here, a procedure for manufacturing a color filter will be described. There are various methods for producing the color filter of the present invention, and specific examples here include a protective layer / dye film / ITO film / silica film / black matrix (B
M) / glass substrates. First, in order to form a BM, Cr is formed on a glass substrate by a sputtering method or the like, and a UV curable resist agent is formed thereon and then appropriately prebaked after forming the film. Exposure is performed on the resist surface of the obtained resist / Cr / glass substrate using an appropriate mask.
After the exposure, the uncured resist is washed away with a developing solution, and the exposed Cr is etched. After etching,
The BM can be formed by removing unnecessary resist. Next, after spin-coating, for example, silica as an insulating layer on the obtained BM, ITO is sputtered thereon so as to have an appropriate surface resistance. IT created
A UV curable resist is formed on the O film / silica film / BM / glass substrate ITO surface and then prebaked appropriately. Exposure is performed on the resist surface of the obtained resist / ITO film / silica film / BM / glass substrate using an appropriate mask. After exposure, wash the uncured resist with a developer,
The exposed ITO is etched. After the etching, an unnecessary resist is peeled off, whereby a substrate with an ITO patterned BM can be formed. Next, a UV curable resist is formed on the obtained substrate with the ITO patterning BM and then appropriately prebaked after forming the film. Exposure is performed on the resist surface of the obtained resist / ITO film / silica film / BM / glass substrate using an appropriate mask corresponding to a portion corresponding to an electrode. After the exposure, the uncured resist is washed away with a developing solution to form an electrode take-out site. Then, the respective color-containing micelle dispersions or the micelle solubilizing solution and the dispersion of the transparent particles are mixed to form a mixed dispersion, and the same micellar electrolysis operation as described above is performed to produce a color filter thin film on the substrate. be able to. At this time, the equilibrium concentration of each dispersion and solution is 0.1 mmol / L or more, and the difference in equilibrium concentration is within 1.2 mmol / L. Thereafter, it is preferable to form a protective film on the color filter by spin-coating the color filter thin film substrate with a structural reinforcing resin. Thereby, the structural reinforcing resin particles are introduced into the pores of the hydrophobic dye thin film of the color filter, and the film strength of the hydrophobic dye thin film is improved. Examples of the structural reinforcing resin used here include acrylic, ester, polyimide, cyclized rubber, siloxane, and epoxy polymers or copolymers. Further, the obtained color filter is preferably subjected to baking (baking), pure water washing, and electrolytic washing as necessary. In particular, if baking is performed, a more stable color filter can be obtained. This is because heat treatment causes sintering of the aforementioned particles,
It is thought that a denser film having a stronger bonding force between the particles is obtained, and the stability of the film is increased. This heat treatment is performed, for example, in an electric furnace, but is not particularly limited as long as the thin film can be heated. The heating temperature and the heating time are different depending on the kind of the hydrophobic substance, but may be within a range in which the membrane formed by the micellar electrolysis method is not closed and the bonding strength is strong, preferably 80 to 200 ° C, more preferably. At 80 to 150 ° C., preferably for 5 minutes to 10
Time, more preferably in the range of 30 minutes to 2 hours.

In the two-step film formation, a micelle dispersion or a micelle solubilization solution composed of RGB dyes is used without using a dispersion of transparent particles.
By performing the same micellar electrolysis operation as described above, a color filter thin film substrate can be obtained. Furthermore, a transparent particle thin film can be manufactured on a color filter thin film substrate by performing a micellar electrolysis operation using a dispersion of transparent particles. As a post-process, formation of a protective film and baking can be performed in the same manner as described above. In this two-step film formation, a color filter thin film may be formed after forming a transparent particle thin film first.

[0023]

Now, the present invention will be described in further detail with reference to Production Examples, Examples and Comparative Examples. Production Example 1 Preparation of Dispersion Solution Determination of Adsorption Amount of Surfactant Ferrocene derivative micellizing agent represented by the following formula (I) was added to 15.65 g of perylene red in an aqueous solution, with the amount of perylene red added being 15.65 g. To determine the adsorption amount of FPEG (manufactured by Dojindo Co., Ltd.), 15.65 g of perylene red and the concentration of FPEG in 500 ml of pure water were used.
2.0 mmol and 10.4 g (0.1 mol) of LiBr were added, respectively, and pure water was further added to make 1 liter.
Stir with a stirrer for 3 days to achieve a sufficient equilibrium.
It was left still for a day. Then, centrifuge at 50,000 rpm,
Only the pigment was separated. The supernatant was subjected to metal iron elemental analysis using ICP, and the amount of adsorption was measured.

[0024]

Embedded image

Determination of the amount of surfactant added As a result, the amount of FPEG adsorbed on 15.65 g of perylene red was 1.05 mmol, and the equilibrium concentration of the ferrocene derivative micellizing agent FPEG was 0.46 mmol / liter. To this end, a total of 1.51 mmol / L of FPEG was added. Preparation of micelle dispersion or micelle solubilization solution with adjusted equilibrium concentration Next, 1.51 mmol (1.416 g) of FPEG (manufactured by Dojindo) as a ferrocene derivative micellizing agent was actually added to 1 liter of pure water. 0.1 mol (10.4 g) of LiBr (manufactured by Wako Pure Chemical Industries) as a salt and 15.65 g of perylene red as a hydrophobic dye were added to form a micellar dispersion, which was dispersed with an ultrasonic homogenizer for 30 minutes. Alternatively, a micelle solubilization solution was used.

Production Examples 2 to 16 In the same manner as in Production Example 1, the pigment particles or transparent particles shown in Table 1 were operated under the conditions shown in Table 1, and the R, G, B pigment dispersions of Production Examples 2 to 8 were dispersed. Liquids and dispersions of the transparent particles of Production Examples 9 to 16 were prepared. The supporting salt is LiBr
(Manufactured by Wako Pure Chemical Industries). The average particle size of the used transparent particles was measured from an electron micrograph, and as a result of Production Examples 9-1.
All of the transparent particles of No. 6 had an average particle size of 0.3 μm or less. Table 2 shows the obtained results. Visible light transmittance (measured by Hitachi UV-3100) was measured at a wavelength of 380 to 780 n.
m was 60% or more, especially at 450 nm was 70% or more. The heat resistance temperature is determined by adding ITO to the dispersion of each transparent particle.
A substrate (50 mm × 25 mm × 1.1 t) is inserted, a film is formed at a potential of 0.5 V for 10 minutes using a SUS plate as a counter electrode, and then the obtained thin film is formed at 180, 200, 230 and 250 ° C.
Is the temperature at which the transmittance decreases by 5% or more after heating for 60 minutes each. Table 2 shows the obtained results.

[0027]

[Table 1]

[0028]

[Table 2]

Example 1 (1) Patterning of ITO A glass substrate (blue glass polished and immersed in silica: manufactured by Matsuzaki Vacuum) having a sheet resistance of 20 Ω / □ as an ITO film was coated with an ultraviolet-curable resist agent (FH2030M). : Manufactured by Fuji Hunt Electronics Technology Co., Ltd.) was spin-coated at a rotation speed of 1,000 rpm with a solution diluted twice with xylene. After spin coating, prebaking was performed at 80 ° C. for 15 minutes, and then the resist / ITO substrate was set in an exposure machine. The mask used at this time has a line width of 1
00 μm, gap 20 μm, line length 230 mm, 192
A 0 kW high-pressure mercury lamp was used as the light source (exposure ability: 10 mW / (cm ² ·
Seconds)). With a proximity gap of 70 μm, 60
After exposure for 2 seconds and development, the substrate was rinsed with pure water and baked at 180 ° C. Next, 1 mol F as an etchant
eCl ₃ · 6 defined HCl · 0.1 defines HNO ₃ · 0.1 defines Ce (NO ₃₎ was prepared a mixed aqueous solution of _4, the substrate I
The TO was etched. The end point of the etching was measured by electric resistance. The etching required about 20 minutes. After the etching, the resist was rinsed with pure water, and the resist was peeled off with 1N NaOH.

(2) Preparation of Black Matrix (BM) As a BM forming resist, CR and C were used in a color mosaic CK manufactured by Fuji Hunt Electronics Technology.
A mixture of G and CB in a ratio of 3: 1: 1: 1 parts by weight was used. The ITO patterned crow substrate manufactured in Example 1 (1) was rotated at 10 rpm, and 30 cc of the resist agent was sprayed thereon, and the number of rotations of spin coating was 2,5.
At 00 rpm, a film was uniformly formed on the substrate. Next, the substrate was pre-baked at 80 ° C. for 15 minutes. Then, the BM design (90 × 310 μm square-
Exposure was performed using a (20 μm line width) mask. Light source is 2kW
High-pressure mercury lamp (exposure ability: 100 mJ / cm ² ). After taking a proximity gap of 70 cm and exposing for 200 seconds, the film was developed with an alkali developing solution. Thereafter, Fuji Hunt CD (developing solution) was diluted 4 times with pure water and developed for 30 seconds. Further, the substrate was washed with pure water and post-baked at 200 ° C. for 100 minutes.

(3) Mixed Dispersion As a mixed micellar dispersion or micelle solubilizing solution of R, the dispersion obtained in Example 1 and the dispersion obtained in Preparation Example 5 were each subjected to ultrasonic wave. 3 with a homogenizer
After dispersing for 0 minutes, the respective liquids were mixed at a ratio of 9: 1 (volume ratio), and the mixed liquid was further dispersed for 30 minutes using an ultrasonic homogenizer. As a mixed micellar dispersion or micelle solubilizing solution of G, the dispersion obtained in Preparation Example 3 and the dispersion obtained in Preparation Example 5 were each dispersed by an ultrasonic homogenizer for 30 minutes. , 6: 4
The respective liquids were mixed at a ratio of (volume ratio), and the mixed liquid and the dispersion liquid obtained in Production Example 12 were mixed in a ratio of 1:
The mixed solution mixed at a ratio of 1 (weight ratio) was dispersed with an ultrasonic homogenizer for 30 minutes. As a mixed dispersion of B,
After each of the dispersion prepared in Production Example 7 and the dispersion prepared in Production Example 8 were dispersed with an ultrasonic homogenizer for 30 minutes, the respective liquids were mixed at a ratio of 7: 3 (volume ratio). Were mixed, and the mixture obtained by mixing this mixture with the dispersion obtained in Production Example 12 at a ratio of 1: 1 (weight ratio) was dispersed with an ultrasonic homogenizer for 30 minutes. As a result, a mixed micelle dispersion of RGB or a micelle solubilized solution was obtained.

(4) Production of Dye Film The ITO patterned substrate was inserted into the micelle solution of R, and a potentiostat was brought into contact with the R row of the stripe. Electrostatic potential electrolysis was performed at a voltage of 0.8 V for 15 minutes to obtain a color filter R thin film. Then, after washing with pure water, it was prebaked (at 120 ° C. for 10 minutes) in an oven. Next, the substrate was inserted into the micelle solution of G, and
Electrostatic potential electrolysis was performed at 0.4 V for 18 minutes to obtain a thin film of the color filter RG. After film formation, post-treatment was performed under the same conditions as for the film formation of R. Finally, the substrate was inserted into the micelle solution of B, and subjected to constant potential electrolysis at a voltage of 0.7 V for 10 minutes to obtain a color filter RGB thin film. After film formation, post-processing was performed under the same conditions as for the film formation of R, and an RGB color filter dye thin film was obtained.

(5) Production of Protective Film The dye thin film substrate was set on a spin coater, and OS-808 (manufactured by Nagase Sangyo) was applied as a flat film-forming agent using a dispenser. At this time, the substrate was slowly rotated at a rotation speed of 10 rpm, and the entire substrate was applied without gaps. It was further rotated at 800 rpm for 2 minutes to obtain a uniform thin film. Thereafter, the film was baked and cured at 260 ° C. for 2 hours to form a protective film.

(6) Evaluation of Obtained Color Filter The obtained RGB color filters were evaluated as follows. The maximum step (concavo-convex difference) between each of the RGB dye films is determined by a scanning distance of 10 using a Dick Tack (contact type contact film thickness meter).
mm (10mm scan), 0.06μ
m unevenness difference was confirmed. Otsuka Electronics MC
As a result of measurement using a PD spectrophotometer, the transmittance of R (top peak) was 88%, the transmittance of G (top peak) was 73%, and the transmittance of B (top peak) was 60%. As can be seen from the measurement results, a color filter having excellent transmittance and a uniform film thickness was obtained. Further, as a result of the visual inspection, it was possible to obtain a good color filter having no problems such as generation of coarse particles, color separation, and thin film peeling.

Example 2 (1) Preparation of Black Matrix Alkali-free glass substrate (NA45 / 300 square-1.1 m
m; HOYA) was sputtered with a Cr thin film at a rate of about 2,000 ° (using SDP-550VT manufactured by Alpac). An ultraviolet curable resist agent (HPR; manufactured by Fuji Hunt Electronics Technology Co., Ltd.)
After spin coating at a rotation speed of 0 rpm, prebaking was performed at 80 ° C. for 15 minutes. Then, the resist / Cr /
The glass substrate is set on a stepper exposure machine, and exposed (10 mW / cm ² · sec, scan speed) using a mask (a mask in which a grid pattern having a pigment size of 90 μm × 310 μm, a line width of 20 μm and an effective area of 160 mm × 155 mm is divided into four). 5 mm / sec). After the exposure, the film was developed with a dedicated developer, rinsed with pure water, and post-baked at 150 ° C. Next, 1N HCl · 0.
1N HNO ₃ · 0.1 defines Ce (NO ₃₎ was prepared a mixed aqueous solution of _4, was etched Cr of said substrate. The end point of the etching was measured by electric resistance. The etching required about 20 minutes. After etching, the resist was rinsed with pure water, the resist was peeled off with 1N NaOH, washed sufficiently with pure water, and the black matrix (BM: FIG.
Ref.) And extraction electrodes.

(2) Preparation of Insulating Film and ITO Thin Film Electrode Next, OCDTYE-7 (silica; manufactured by Tokyo Ohka) is spin-coated as an insulating film on the BM at a rotation speed of 1,000 rpm, and then heated at 250 ° C. After baking for 60 minutes, it is cooled to room temperature, and further, Alpac: SDP-550VT
Set the substrate on the substrate and apply about 1,300Å of ITO on the substrate.
Sputtered. At this time, the work was set to 200 ° C and the ITO
Was adjusted to 20Ω / □. An ultraviolet-curing resist (FH2) is applied to the obtained ITO film / Cr / glass substrate.
030M; manufactured by Fuji Hunt Electronics Technology Co., Ltd.) at a rotation speed of 1,000 rpm.
Prebaking was performed at 80 ° C. for 15 minutes. Next, this resist / ITO / Cr / glass substrate was set in a contact exposure machine (exposure ability: 10 mW / cm ² · second) to perform patterning. The mask used was a vertical stripe pattern having a line width of 92 μm, a gap of 18 μm, and a line length of 155 mm. As a light source, a 2 kW high-pressure mercury lamp was used. After the alignment, a proximity gap of 50 cm was taken, exposure was performed for 15 seconds, and development was performed with an alkali developing solution. After development, the substrate was rinsed with pure water and post-baked at 150 ° C. Next, 1 mol of FeCl was used as an etchant.
_3-6N HCl, 0.1 defines HNO ₃ · 0.1 defines Ce
A mixed aqueous solution of (NO ₃ ) ₄ was prepared, and ITO
Was etched. The end point of the etching was measured by electric resistance. The etching required about 20 minutes. After the etching, the resist was rinsed with pure water, the resist was peeled off with 1N NaOH, and further washed with pure water to confirm that there was no electric leak between adjacent ITO electrodes.
A substrate with a TO patterning BM was prepared.

(3) Preparation of Electrode Extraction Zone An acrylic resist (CT; manufactured by Fuji Hunt Electronics Technology) was used for electrode extraction. The ITO patterning BM created in the above embodiment 2 (2)
The coated substrate was rotated at 10 rpm, and the resist agent was sprayed thereon at a rate of 30 cc.
The film was uniformly formed on the substrate at 500 rpm. The substrate was pre-baked at 80 ° C. for 15 minutes, and a high-pressure mercury lamp of 2 kW was used.
Exposure was performed using a mask designed to create only the portion of the electrode extraction band (FIG. 2: a portion to which light does not strike) while performing alignment using a contact exposure device having an alignment function. Then, after developing with a developing solution for 90 seconds, it was washed with pure water and post-baked at 180 ° C. for 100 minutes. Thus, an electrode extraction zone was obtained. The extracted electrode rows are given conductivity by silver paste, and are used for R, G, B in the production of the dye film.
Columns.

(4) Preparation of Dispersion As the mixed micelle dispersion of R or the micelle solubilizing solution, the dispersion prepared in Production Example 2 was dispersed with an ultrasonic homogenizer for 30 minutes. As a mixed micellar dispersion or micelle solubilizing solution of G, the dispersion prepared in Production Example 3 and the dispersion prepared in Production Example 6 were each dispersed with an ultrasonic homogenizer for 30 minutes, and then mixed at 6: 4 (volume ratio). ), The respective micelle dispersions or micelle solubilization solutions were mixed, and the mixture was further dispersed with an ultrasonic homogenizer for 30 minutes. B as a mixed micellar dispersion or micelle solubilization solution of B
Each of the dispersion prepared in the above with an ultrasonic homogenizer for 30 minutes.
After dispersion for 1 minute, the respective liquids were mixed at a ratio of 7: 3 (volume ratio), and the mixed liquid and the dispersion obtained in Production Example 12 were mixed at a ratio of 1: 1 (weight ratio). The mixed solution was dispersed with an ultrasonic homogenizer for 30 minutes to obtain a mixed micelle dispersion of RGB or a micelle solubilized solution.

(5) Production of Color Filter The substrate with the ITO patterning BM was inserted into the mixed micellar dispersion or micelle solubilizing solution of R, and a potentiostat was connected to the R row of the stripe. Voltage 0.8V
For 15 minutes to obtain a color filter R thin film. Thereafter, after washing with pure water, prebaking was performed in an oven (at 120 ° C. for 10 minutes). Next, this substrate was inserted into the mixed micellar dispersion or micelle solubilizing solution of G, and subjected to constant potential electrolysis at 0.4 V for 18 minutes to obtain a thin film of the color filter RG. After film formation, post-treatment was performed under the same conditions as for the film formation of R. Finally, this substrate was inserted into the micelle solution of B, and subjected to constant potential electrolysis at 0.7 V for 10 minutes to obtain a color filter RGB thin film. After film formation, post-treatment was performed under the same conditions as for the film formation of R. Thus, RGB color filters were obtained.

(6) Production of protective film Next, the produced RGB color filter substrate was
Then, 30 cc of a JSS7265 topcoat agent (manufactured by Nippon Synthetic Rubber Co., Ltd.) was sprayed thereon, the spin coating rotation speed was set to 1,000 rpm, and a uniform film was formed on a substrate (RGB color filter). This substrate was post-baked at 180 ° C. for 50 minutes. In this way, an RGB color filter having a difference in roughness of 0.1 μm or less between the RGB dye films was obtained.

(7) Evaluation of the obtained color filters The obtained RGB color filters were evaluated as follows. The unevenness difference between each of the RGB dye films was measured using a Dick Tack (contact type contact film thickness meter) with a scanning distance of 10 mm (10 mm).
(mm scan), a difference of 0.07 μm was confirmed. The transmittance of the thin film was measured using an Otsuka Electronics MCPD spectrophotometer. The transmittance of R (top peak) was 73%, the transmittance of G (top peak) was 70%, and the transmittance of B was 70%.
(Top peak) transmittance was 58%. As can be seen from the measurement results, a color filter having excellent transmittance and a uniform film thickness was obtained. Further, as a result of the visual inspection, it was possible to obtain a good color filter having no problems such as generation of coarse particles, color separation, and thin film peeling.

Examples 3 to 8 Films were formed in the same manner as in Example 2, except that the mixed dispersion of RGB was changed to the solution shown in Table 3. Table 4 shows the obtained results. Thus, in each case, since the particles are fine, the spectral characteristics are very excellent, and a good color filter free from problems such as generation of coarse particles, color separation, and peeling of a thin film was obtained.

[0043]

[Table 3]

[0044]

[Table 4]

Examples 9 to 13 Films were formed in the same manner as in Example 2, except that the mixed dispersion of RGB was changed to the solution shown in Table 5. Table 6 shows the obtained results. Thus, in each case, since the particles are fine, the spectral characteristics are very excellent, and a good color filter free from problems such as generation of coarse particles, color separation, and peeling of a thin film was obtained.

[0046]

[Table 5]

[0047]

[Table 6]

Comparative Example 1 The procedure of Example 1 was repeated except that the dispersion of Production Example 12 was not used. As a result, the unevenness difference between the respective RGB dye films was measured at a scanning distance of 10 mm (10 mm scan) using a Dick Tack (contact type contact film thickness meter). As a result, an unevenness difference of 0.58 μm was confirmed. The transmittance of the thin film was measured using an Otsuka Electronics MCPD spectrophotometer.
The transmittance of (top peak) was 88%, the transmittance of G (top peak) was 75%, and the transmittance of B (top peak) was 65%. Further, as a result of the visual inspection, there were no problems such as generation of coarse particles, color separation, and thin film peeling.

Comparative Example 2 The procedure of Example 2 was repeated except that the dispersion of Production Example 12 was not used. As a result, the unevenness of each of the RGB dye films was measured at a scanning distance of 10 mm (10 mm scan) using a Dick Tack (contact type contact film thickness meter). As a result, an unevenness of 0.67 μm was confirmed. The transmittance of the thin film was measured using an Otsuka Electronics MCPD spectrophotometer.
The transmittance of (top peak) was 73%, the transmittance of G (top peak) was 73%, and the transmittance of B (top peak) was 61%. Further, as a result of the visual inspection, there were no problems such as generation of coarse particles, color separation, and thin film peeling.

Example 14 The operation was performed in the same manner as in Example 1 except that the BM was formed after the formation of the protective film under the BM forming conditions of Example 1. As the BM-forming resist agent, a mixture of CR, CG, and CB, each in 3: 1: 1: 1 parts by weight, was used in a color mosaic CK manufactured by Fuji Hunt Electronics Technology.
The ITO patterned crow substrate produced in Example 1 (1) was rotated at 10 rpm, and the resist agent 3 was placed thereon.
Spray 0cc and spin coat at 2,500rpm,
A film was uniformly formed on the substrate. Next, the substrate was pre-baked at 80 ° C. for 15 minutes. Then, exposure was performed from the back of the color filter with an exposure machine. The light source used was a 2 kW high-pressure mercury lamp (exposure ability: 100 mJ / cm ² ). After exposure for 200 seconds, development was performed with an alkali developer, and then Fuji Hunt CD (developer) was diluted 4 times with pure water and developed for 30 seconds. Further, the substrate was washed with pure water and post-baked at 200 ° C. for 100 minutes. Thus, the black matrix of the black resin could be formed in the gap (ITO gap) of the color filter. As a result of measuring the thickness of each dye by Dick Tack, the thickness of each dye was 1.21 μm in R.
m and G were 1.19 μm and B were 1.16 μm, and the maximum value of the unevenness (RB film thickness difference) of each dye after forming the top coat (protective film) was 0.05 μm. No displacement was observed.

Comparative Example 3 The procedure of Example 19 was repeated except that the dispersion of Production Example 12 was not used. As a result of measuring the thickness of each dye by Dick Tack, the thickness of each dye was 1.20 μm in R.
m and G are 0.92 μm and B are 0.53 μm, and the maximum value of the unevenness difference (RB film thickness difference) after forming the top coat is 0.67.
μm.

Example 15 The procedure of Example 13 was repeated except that the dispersion of Production Example 12 was not used. After that, the color filter substrate was inserted into the dispersion liquid of Production Example 12, and I of the G thin film portion was removed.
TO was subjected to constant potential electrolysis at 0.5 V for 2 minutes to form a laminated film of titania on the G thin film. After film formation, 100 ° C
For 15 minutes. Next, the ITO of the thin film portion of B
Was subjected to a constant potential electrolysis at 0.5 V for 6 minutes to form a titania laminated film on the B thin film. After film formation, 100 ° C
Dry for 5 minutes. After washing, the thickness of each dye was measured by Dick Tack. As a result, the thickness of each dye was 1.20 μm in R,
G is 1.21 μm and B is 1.23 μm, and the maximum value of the unevenness difference (RB film thickness difference) after forming the top coat is 0.04 μm.
Met.

Embodiment 16 (1) Patterning of ITO and creation of BM are described in Embodiment 1.
Was performed in the same manner as described above. (2) Mixed dispersion As a mixed micellar dispersion or micelle solubilizing solution of R, the dispersion obtained in Example 1 and the dispersion obtained in Production Example 5 were each mixed with an ultrasonic homogenizer.
After dispersing for 0 minutes, the respective liquids were mixed at a ratio of 9: 1 (volume ratio), and the mixed liquid was further dispersed for 30 minutes using an ultrasonic homogenizer. As a mixed micellar dispersion or micellar solubilization solution of G, the dispersion obtained in Preparation Example 3 and the dispersion prepared in Preparation Example 5 were each dispersed for 30 minutes by an ultrasonic homogenizer. After
The mixture obtained by mixing the respective liquids at a ratio of 6: 4 (volume ratio) was dispersed for 30 minutes by an ultrasonic homogenizer. As a mixed dispersion liquid of B, each of the dispersion liquid prepared in Production Example 7 and the dispersion liquid prepared in Production Example 8 was dispersed with an ultrasonic homogenizer for 30 minutes, and then mixed at a ratio of 7: 3 (volume ratio). ) Was mixed for 30 minutes with an ultrasonic homogenizer. As a result, a mixed micelle dispersion of RGB or a micelle solubilized solution was obtained.

(3) Production of Dye Film The above-mentioned ITO patterning substrate was inserted into the titania dispersion liquid of Production Example 12, and a portion of the ITO where a thin film of G was to be formed was applied.
Electrostatic potential electrolysis was performed at 0.5 V for 2 minutes to form a titania thin film on ITO. After completion of the film formation, the film was dried at 100 ° C. for 15 minutes. Further, the above-mentioned titania film-formed substrate was again inserted into the titania dispersion liquid of Production Example 12, and constant potential electrolysis was performed at 0.5 V for 6 minutes on the ITO where a thin film of B was to be formed. A thin film of titania was formed on the portion of the ITO where the film was to be formed. After completion of the film formation, the film was dried at 100 ° C. for 15 minutes. The titania film-formed substrate of the GB portion is inserted into the R dispersion solution, and a potentiostat is connected to the R row of the stripe. Next, constant potential electrolysis was performed at 0.8 V for 15 minutes to obtain a thin film of the color filter R. Then, after washing with pure water, it was prebaked in an oven (at 120 ° C. for 10 minutes). Next, the substrate was inserted into the micelle solution of G, and similarly, constant potential electrolysis was performed at a voltage of 0.4 V for 18 minutes.
A thin film of the color filter RG was obtained. After film formation, post-treatment was performed under the same conditions as for the film formation of R. Finally, the substrate was inserted into the micelle solution of B, and subjected to constant potential electrolysis at a voltage of 0.7 V for 10 minutes to obtain a color filter RGB thin film. After film formation, post-processing was performed under the same conditions as for the film formation of R, and an RGB color filter dye thin film was obtained.

(4) Production of Protective Film The dye thin film substrate was set on a spin coater, and JSS-7265 (Nippon Synthetic Rubber) was applied as a flattening agent using a dispenser. At this time, the substrate is set at 10 rpm.
The substrate was slowly rotated at the rotation speed of, and the entire substrate was painted without gaps.
It was further rotated at 800 rpm for 2 minutes to obtain a uniform thin film. Thereafter, the film was baked and cured at 260 ° C. for 2 hours to form a protective film.

(5) Evaluation of the obtained color filters The obtained RGB color filters were evaluated as follows. After washing, the thickness of each dye was measured by Dick Tack. As a result, the thickness of each dye was 1.20 μm for R and 1.22 for G.
μm and B were 1.25 μm, and the maximum value of the unevenness difference after the top coating (the difference in RB film thickness) was 0.05 μm.

[0057]

According to the present invention, by optimizing the equilibrium concentration, it is possible to obtain a safe micellar dispersion or micellar solubilization solution capable of suppressing generation of coarse particles. As a result, it is possible to form a color filter having a uniform film thickness, no color separation, and no thin film peeling. Therefore, according to the present invention, it can be effectively used for a laptop personal computer, a word processor, a workstation, an aurora vision, a liquid crystal projector, a liquid crystal TV, an OHP, a vehicle-mounted instrument panel, a device monitor, and the like.

[Brief description of the drawings]

FIG. 1 is a diagram showing a part of a cross-sectional view of a color filter.

FIG. 2 is a front view showing a mask for forming an ITO thin film electrode.

[Explanation of symbols]

 1: Black matrix 2: Glass substrate 3: Dye film 4: Protective film 5: R row 6: G row 7: B row

────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-4-122902 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) G02B 5/20-5/28

Claims (6)

(57) [Claims] 1. A micelle dispersion or micellar solubilization solution obtained by independently dispersing a dye and transparent particles having spectral characteristics of red, green and blue primary colors in an aqueous medium using a ferrocene derivative surfactant. Mixing, inserting a color filter manufacturing substrate having a transparent conductive thin film patterned into the mixed dispersion or micellar solubilizing solution, conducting a current to the substrate, and forming a dye film having a controlled thickness on the electrode When producing a color filter, the micelle dispersion or micelle solubilization of transparent particles having an equilibrium concentration of the micelle dispersion or micelle solubilizing solution of each of the dye and the transparent particles of 0.1 to 2.8 mmol / L. A method for producing a color filter, comprising using a micelle dispersion of a solution and a dye or a mixture of a micelle solubilizing solution. 2. The method for producing a color filter according to claim 1, wherein the difference between the equilibrium concentrations of the micelle dispersion or the micelle solubilizing solution of the dye and the transparent particles is 1.2 mmol / liter or less. . 3. An equilibrium concentration obtained by independently dispersing dyes having spectral characteristics of three primary colors of red, green and blue in an aqueous medium using a ferrocene derivative surfactant is from 0.1 to 0.1.
A substrate for producing a color filter having a transparent conductive thin film patterned into a micelle dispersion or a micelle solubilizing solution having a concentration of 2.8 mmol / L or a mixed dispersion or a solution of a micelle dispersion of a plurality of dyes is inserted into the substrate. In producing a color filter for forming a dye film having an adjusted film thickness on an electrode by applying a current to the electrode, after forming each of the dye films , titania and silicon having a heat-resistant temperature of 230 ° C. or higher are used.
The equilibrium concentration obtained by using a ferrocene derivative surfactant in an aqueous medium is 0.1 to 2.8 mmol / L.
A method for producing a color filter, comprising inserting the obtained dye film-forming substrate into a micelle dispersion or micelle solubilizing solution, and applying an electric current to laminate the transparent particles on the dye film-forming substrate. 4. Titania and silicon having a heat-resistant temperature of 230 ° C. or higher.
Permeability selected from mosquito, alumina and polysiloxane
Bright particles were obtained using a ferrocene derivative surfactant in an aqueous medium and having an equilibrium concentration of 0.1 to 2.8 mmol / l.
Into a micelle dispersion or micellar solubilization solution, a substrate for color filter production having a patterned transparent conductive thin film is inserted, a current is applied to the substrate to form a thin film of transparent particles on the electrodes, and then red. Equilibrium obtained by independently dispersing dyes having three primary colors, green and blue, in an aqueous medium using a ferrocene derivative surfactant
A substrate having a transparent particle thin film is inserted into a micelle dispersion having a concentration of 0.1 to 2.8 mmol / L, a micelle solubilization solution, or a mixed dispersion obtained by mixing micelle dispersions of a plurality of dyes. A method for producing a color filter, comprising applying a current to each dye to form a dye film on an electrode. 5. An average particle diameter of 300 nm or less, and a transmittance in a visible wavelength range of 380 to 780 nm of 60% or more,
The transparent particles having a transmittance of 70% or more at a wavelength of 450 nm or more and a transmittance of 65% or less at a wavelength of 350 nm or less are used. Method for manufacturing a color filter. 6. A device having spectral characteristics of three primary colors of red, green and blue.
-Induced ferrocene in aqueous media
Micelles obtained by independently dispersing
Mixed solution or micelle solubilizing solution.
Permeability patterned in liquid or micellar solubilizing solution
Insert a substrate for manufacturing color filters with a light conductive thin film
Then, the substrate is subjected to an energization process, and the film thickness is adjusted on the electrode.
To manufacture a color filter that forms a dye film
A micelle dispersion of each of the dye and the transparent particles.
Or the equilibrium concentration of the micelle solubilization solution is 0.1 to 2.8 mmol
Micelle dispersion or micelle of transparent particles
Micelle dispersion or micelle-soluble dye
A method for producing a color filter, in which a dye film is formed using a liquid mixture of a sensitizing solution, and a black matrix is formed by applying a negative black resist and exposing from the back side, the average particle size is 300 nm or less, and the visible wavelength The transmittance in the region of 380 to 780 nm is 60% or more, the transmittance in the wavelength of 450 nm or more is 70% or more, and the wavelength is 3%.
The transmittance at 50 nm or less is 65% or less, and the heat resistance is 230 ° C. or more.
A method for manufacturing a color filter, wherein the light-shielding film is used to form the negative black resist only in the gap between the dye films.