JP2948591B2 - Static electricity, electromagnetic wave shielding material - Google Patents
Static electricity, electromagnetic wave shielding materialInfo
- Publication number
- JP2948591B2 JP2948591B2 JP63109330A JP10933088A JP2948591B2 JP 2948591 B2 JP2948591 B2 JP 2948591B2 JP 63109330 A JP63109330 A JP 63109330A JP 10933088 A JP10933088 A JP 10933088A JP 2948591 B2 JP2948591 B2 JP 2948591B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- transparent
- film layer
- substrate
- metal thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title claims description 45
- 230000005611 electricity Effects 0.000 title claims description 22
- 230000003068 static effect Effects 0.000 title claims description 22
- 239000010410 layer Substances 0.000 claims description 78
- 239000010409 thin film Substances 0.000 claims description 77
- 239000010408 film Substances 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 49
- 239000002184 metal Substances 0.000 claims description 44
- 229910052751 metal Inorganic materials 0.000 claims description 44
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 12
- 230000000694 effects Effects 0.000 description 12
- 239000012790 adhesive layer Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
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- 239000004417 polycarbonate Substances 0.000 description 3
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- 238000009751 slip forming Methods 0.000 description 3
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- 238000007740 vapor deposition Methods 0.000 description 3
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- 239000004696 Poly ether ether ketone Substances 0.000 description 2
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- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
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- 238000007733 ion plating Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
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- 239000011241 protective layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 208000019695 Migraine disease Diseases 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 208000003464 asthenopia Diseases 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
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- 238000007667 floating Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 201000005111 ocular hyperemia Diseases 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Elimination Of Static Electricity (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Laminated Bodies (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、各種電子、通信装置、たとえばデイスプ
レイデバイスなどを備えた装置に取付けられる静電気、
電磁波シールド材に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to various kinds of electronic and communication devices, for example, static electricity attached to a device having a display device and the like.
It relates to an electromagnetic wave shielding material.
〔従来の技術〕 近年、上記電子、通信装置は、業務用だけでなく、一
般家庭にも導入されるようになつてきている。そして、
これらの装置は、その有用な機能などにより各種業務や
家事などを効率よく処理し社会を発展あるいは生活向上
に役立つものとして評価されている。[Related Art] In recent years, the electronic and communication devices have been introduced not only for business use but also for ordinary households. And
These devices have been evaluated as useful for efficiently processing various tasks and housework by their useful functions, etc., and contributing to the development of society or improvement of life.
しかし、その反面、これらの装置から発生する静電気
や電磁波ノイズなどにより、人体あるいは他の備品など
が影響を受け故障をきたすという問題が起こる。たとえ
ば、デイスプレイなどを備えた上記装置を操作する作業
員などが経験する目精疲労、目の充血、肩こり、偏頭痛
などの障害や、家庭におけるテレビやラジオの画像の乱
れやノイズの発生といつた障害が現れる。However, on the other hand, there arises a problem that a human body or other equipment is affected by static electricity or electromagnetic noise generated from these devices and causes a failure. For example, problems such as eyestrain, redness of eyes, stiff shoulders, and migraines experienced by workers operating the above devices equipped with displays, etc. Trouble appears.
このため、従来より上記静電気や電磁波ノイズをシー
ルドするシールド材を各種装置内に組込んで該装置類か
ら発生する静電気や電磁波ノイズをシールドするとが行
われている。For this reason, conventionally, a shielding material for shielding the above-mentioned static electricity and electromagnetic wave noise is incorporated in various devices to shield static electricity and electromagnetic wave noise generated from the devices.
このシールド材、たとえば上記デイスプレイデバイス
などを備えた装置における窓材などとして用いられるシ
ールド材としては、外部からデイスプレイ内部を目視で
きるような高い可視光線透過能、つまりすぐれた透明性
（視認性）を有しているとともに、デイスプレイデバイ
スなどから発生する静電気（高電圧）または電磁波など
を長期間持続してシールドしうる良好なシールド特性を
有していることが要求される。As this shielding material, for example, a shielding material used as a window material in an apparatus provided with the above-mentioned display device or the like, has a high visible light transmittance so that the inside of the display can be seen from the outside, that is, excellent transparency (visibility). It is required to have good shielding characteristics capable of continuously shielding static electricity (high voltage) or electromagnetic waves generated from a display device or the like for a long period of time.
従来のこの種シールド材としては、一般にガラス基板
やポリカーボネート基板などの透明プラスチツク基板上
にメツシユタイプのカーボン繊維や金属コーテイング繊
維を貼り合わせたものや、上記透明基板上につ金属薄膜
を直接的に形成させたものなどが汎用されている。Conventional shielding materials of this type are generally formed by bonding a mesh type carbon fiber or metal coating fiber on a transparent plastic substrate such as a glass substrate or a polycarbonate substrate, or by directly forming a metal thin film on the transparent substrate. Those that have been used are widely used.
しかるに、上記従来のシールド材のうち、メツシユタ
イプのカーボン繊維や金属コーテイング繊維を用いたも
のは、基板を透過する像や物体が該メツシユ部で切断さ
れたり、光の反射による散乱によりゆらぎを生じ視認性
を悪くさせるといつた問題があり、またメツシユタイプ
のため静電気、電磁波シールド効果が低い。However, among the above-mentioned conventional shield materials, those using a mesh type carbon fiber or a metal coating fiber may cause an image or an object passing through the substrate to be cut off at the mesh portion, or to fluctuate due to scattering due to light reflection. There is a problem when it is made worse, and the static electricity and electromagnetic wave shielding effects are low due to the mesh type.
一方、金属薄膜を用いたものは、基板上に金属薄膜が
外部に露出された状態で形成されるため、長期使用中に
はこの表面が酸化されたシールド能が低下するので、シ
ールド効果の持続性、つまり耐久性の悪いものとなる。On the other hand, in the case of using a metal thin film, since the metal thin film is formed on the substrate in a state where the metal thin film is exposed to the outside, the shielding ability of the oxidized surface is reduced during long-term use, so that the shielding effect is maintained. Sex, that is, durability is poor.
このため、上記金属薄膜を基板上に厚膜として形成さ
せ、シールド能を持続させることも試みられたが、この
場合には厚膜によつて金属層の透明性が低下するのでシ
ールド材として不適となるなどの問題があり、したがつ
て、シールド性あるいは透明性のどちらも同時に満足さ
せるものができないものとなつていた。For this reason, it has been attempted to form the metal thin film as a thick film on a substrate to maintain the shielding ability. However, in this case, the transparency of the metal layer is reduced by the thick film, so that the metal film is not suitable as a shielding material. Therefore, there has been a problem that neither the shielding property nor the transparency can be satisfied at the same time.
また、上述のように、金属薄膜を透明基板上に直接的
に形成させ、かつこの金属薄膜が外部に露出しているた
め、このようなシールド材を用いて上記装置などへ取付
けあるいは取はずし時には該金属薄膜が損傷され易く、
耐擦傷性が悪いものとなつていた。In addition, as described above, since the metal thin film is formed directly on the transparent substrate, and since the metal thin film is exposed to the outside, when attaching or detaching to or from the above device using such a shielding material, The metal thin film is easily damaged,
The scratch resistance was poor.
したがつて、この発明は、上記従来の問題点の解消の
ため、高い可視光線透過能を有するとともに、上記装置
のデイスプレイデバイスなどから発生する静電気や電磁
波などを長期にわたりシールドしうるすぐれたシールド
能を有し、かつその作製時の作業性および耐擦傷性な良
好な静電気、電磁波シールド材を提供することを目的と
する。Therefore, the present invention has a high visible light transmitting ability and an excellent shielding ability capable of shielding static electricity and electromagnetic waves generated from the display device of the above-mentioned apparatus for a long period of time in order to solve the above-mentioned conventional problems. It is an object of the present invention to provide a good static electricity and electromagnetic wave shielding material having good workability and abrasion resistance during production.
この発明者らは、上記の目的を達成するために鋭意検
討した結果、透明なフイルム基材の一方の面に透明な金
属薄膜層を設け、この金属薄膜層上にさらに透明な誘電
体薄膜層を設けて、誘電体で保護された透明導電フイル
ムを構成さけ、この透明導電フイルムの金属薄膜層、誘
電体薄膜層を有しない開放面に粘着剤層を設けるととも
に、他の透明基板をこの粘着剤層を介して貼り合わせる
ことにより、可視光線透過能、耐久性、静電気および電
磁波に対するシールド能のいずれの機能をも兼ね備えた
部材が得られて、しかもその作製時の作業性および耐擦
傷性が良好なものであることを知り、この発明を完成さ
せるに至つた。The present inventors have conducted intensive studies to achieve the above object, and as a result, provided a transparent metal thin film layer on one surface of a transparent film substrate, and further provided a transparent dielectric thin film layer on this metal thin film layer. To form a transparent conductive film protected by a dielectric, and a pressure-sensitive adhesive layer provided on an open surface of the transparent conductive film that does not have a metal thin film layer and a dielectric thin film layer, and another transparent substrate is adhered to the adhesive layer. By laminating through the agent layer, a member having both functions of visible light transmission ability, durability, shielding ability against static electricity and electromagnetic waves can be obtained, and workability and abrasion resistance at the time of its production are improved. We knew that it was a good thing, and completed this invention.
すなわち、この発明は、透明なフイルム基材と、この
フイルム基材の一方の面に設けられた透明な金属薄膜層
と、さらにこの金属薄膜層上に設けられた透明な誘電体
薄膜層と、上記フイルム基材の他面に設けられた弾性係
数が105〜107dyn/cmの範囲、厚さが５〜500μｍの範囲
にある透明な粘着剤層と、この粘着剤層を介して上記フ
イルム基材と貼り合わされた透明基板とからなることを
特徴とする静電気、電磁波シールド材に係るものであ
る。That is, the present invention provides a transparent film substrate, a transparent metal thin film layer provided on one surface of the film substrate, and a transparent dielectric thin film layer further provided on the metal thin film layer, A transparent pressure-sensitive adhesive layer having an elastic modulus of 10 5 to 10 7 dyn / cm and a thickness of 5 to 500 μm provided on the other surface of the film substrate, and the pressure-sensitive adhesive layer The present invention relates to a static electricity and electromagnetic wave shielding material comprising a film substrate and a transparent substrate bonded together.
この発明において使用する透明なフイルム基材として
は、透明性を有するフイルムであれば広く適用でき、た
とえばポリエチレンテレフタレート（PET）、ポリイミ
ド（PI）、ポリエーテルサルフオン（PES）、ポリエー
テルエーテルケトン（PEEK）、ポリカーボネート（P
C）、ポリプロピレン（PP）、ポリアミド、アクリル、
セルロースプロピオーヌ（CP）などのフイルムが挙げら
れ、この厚みはフレキシブル性と機械的強度とを保持し
うる５〜300μｍ程度のものが好ましく用いられる。As the transparent film substrate used in the present invention, any film having transparency can be widely applied, for example, polyethylene terephthalate (PET), polyimide (PI), polyethersulfone (PES), polyetheretherketone ( PEEK), polycarbonate (P
C), polypropylene (PP), polyamide, acrylic,
A film such as cellulose propione (CP) can be used, and a film having a thickness of about 5 to 300 μm which can maintain flexibility and mechanical strength is preferably used.
上記フイルムの厚みが薄くなりくぎると、フイルムの
機械的強度が不足し、また厚くなりすぎるとフイルムの
フレキシブル性が欠如し、たとえば、ロール状として連
続的に該フイルム表面に上記透明金属薄膜層、透明誘電
体薄膜層あるいは粘着剤層を形成させることが難しくな
る。また、フレキシブル性がないために、上記透明基板
を貼り合わせる際、両者間に浮き現像や気泡が生じ易く
なり密着性を阻害するので好ましくない。When the thickness of the film becomes thin and thin, the mechanical strength of the film becomes insufficient, and when it becomes too thick, the film lacks flexibility, for example, the transparent metal thin film layer is continuously formed on the film surface as a roll, It becomes difficult to form a transparent dielectric thin film layer or an adhesive layer. In addition, since there is no flexibility, when the transparent substrate is bonded, floating development or air bubbles easily occur between the two, which hinders the adhesion, which is not preferable.
この発明においては上述のように透明なフイルム基材
をロール状として、このフイルム基材上に連続して金属
薄膜層、誘電体薄膜層あるいは粘着剤層を形成させるこ
とができ、またこの状態において上記透明基板と貼り合
わせることができるので、従来のように遂一透明基板上
に金属薄膜層を形成させる単一操作を繰り返して行うと
いつた手数を擁することもなく、作業容易性と生産性の
向上が実現できる。In the present invention, the transparent film substrate is formed into a roll as described above, and a metal thin film layer, a dielectric thin film layer or an adhesive layer can be continuously formed on the film substrate. Since it can be bonded to the above transparent substrate, there is no need to repeat the single operation of forming a metal thin film layer on a transparent substrate as before, and it is easy to work and productivity Can be improved.
この発明において上記フイルム基材の一方の面に設け
られる透明の金属薄膜層は、静電気および電磁波シール
ド能を備えてなるもので、その材料としてはAg、Au、C
u、Al、Pd、Pt、Sn、In、Zn、Ti、Cd、Fe、Co、Cr、Ni
などの金属または合金などが挙げられる。In the present invention, the transparent metal thin film layer provided on one surface of the film substrate is provided with an electrostatic and electromagnetic wave shielding function, and is made of Ag, Au, C
u, Al, Pd, Pt, Sn, In, Zn, Ti, Cd, Fe, Co, Cr, Ni
And metal or alloy.
このような金属薄膜層は、たとえば真空蒸着法、スパ
ツタリング法、イオンプレーテイング法、化学蒸着法、
スプレー熱分解法、化学メツキ法、電気メツキ法または
これらの組み合わせ法などの公知の薄膜形成技術により
容易に形成することができるが、このうち折出薄膜の均
一性、膜形成速度および作業性の面からみて真空蒸着法
がもつとも好ましい。Such a metal thin film layer is formed, for example, by a vacuum evaporation method, a sputtering method, an ion plating method, a chemical vapor deposition method,
It can be easily formed by a known thin film forming technique such as a spray pyrolysis method, a chemical plating method, an electric plating method or a combination thereof, among which uniformity of a deposited thin film, a film forming speed and workability. It is also preferable that the vacuum deposition method is used in view of the surface.
この金属薄膜層の厚みは、目的により適宜設定できる
が、この発明の用途などから勘案して一般に30〜600Å
程度とするのがよく、これより薄すぎると膜構造上の欠
陥により静電気や電磁波シールド能が低下し、かつ膜の
安定性に欠け、逆に厚くなりすぎると可視光線透過能が
低下するため、いずれの場合もシールド材として適さな
くなる。The thickness of the metal thin film layer can be appropriately set according to the purpose, but is generally 30 to 600 mm in consideration of the use of the present invention.
If it is too thin, the electrostatic or electromagnetic shielding ability is reduced due to defects in the film structure, and the film lacks stability.On the other hand, if it is too thick, the visible light transmission ability is reduced. In either case, it is not suitable as a shielding material.
上記金属薄膜層の表面抵抗は、特に静電シールド用と
して用いる場合は、109Ω／□以下、また電磁波シール
ド用として用いる場合は、103Ω／□以下が好ましい。
なお、透明性を保持させる必要から、上記表面抵抗は１
Ω／□以上であることが好ましく、一般には１〜103Ω
／□の範囲にあるものが特に好ましく用いられる。The surface resistance of the metal thin film layer is preferably 10 9 Ω / □ or less when used for electrostatic shielding, and 10 3 Ω / □ or less when used for electromagnetic wave shielding.
In addition, since the transparency is required to be maintained, the surface resistance is 1
Ω / □ or more, generally 1 to 10 3 Ω
Those in the range of // are particularly preferably used.
この発明においては上記の金属薄膜層上にさらに透明
な誘電体薄膜層を設けることにより、金属薄膜層を単独
で設ける場合に比し可視光線透過可能を著しく向上させ
ることができる。また、この誘電体薄膜層は、金属薄膜
層の保護層としての機能をも有し、長期間使用による金
属薄膜層の酸化を防止し、金属薄膜層の静電気シールド
能や電磁波シールド能を長期的に持続させるための耐久
性の向上にも寄与するものである。In the present invention, by providing a transparent dielectric thin film layer on the above-mentioned metal thin film layer, visible light transmission can be remarkably improved as compared with the case where the metal thin film layer is provided alone. In addition, this dielectric thin film layer also has a function as a protective layer of the metal thin film layer, prevents oxidation of the metal thin film layer due to long-term use, and protects the metal thin film layer from electrostatic or electromagnetic shielding for a long time. It also contributes to the improvement of durability for maintaining the durability.
このような誘電体薄膜層としては、誘電体としての機
能を有する公知の金属酸化物、金属硫化物、金属弗化物
などが広く適用できる。この発明においては、特に可視
光に対して1.3〜2.3の屈折率を有し、かつ可変光線透過
率が50％以上、好適には70％以上であるものが選択使用
される。この代表的な誘電体材料としてはMgF2、SiO
x（０＜ｘ≦２）、SnOx（０＜ｘ≦２）、ZnSなどがあ
り、その他Si2O3、Al2O3、TiO2、TiO、Bi2O3、In2O
１〜３、ZrO2なども使用できる。これらは１種であつて
も２種以上を併用してもよい。As such a dielectric thin film layer, known metal oxides, metal sulfides, metal fluorides, and the like having a function as a dielectric can be widely applied. In the present invention, those having a refractive index of 1.3 to 2.3 with respect to visible light and having a variable light transmittance of 50% or more, preferably 70% or more are selectively used. Typical dielectric materials include MgF 2 , SiO
x (0 <x ≦ 2) , S n O x (0 <x ≦ 2), include ZnS, other Si 2 O 3, Al 2 O 3, TiO 2, TiO, Bi 2 O 3, In 2 O
1-3, such as ZrO 2 can be used. These may be used alone or in combination of two or more.
これら誘電体薄膜層の形成に際しては、真空蒸着法、
スパツタリング法、イオンプレーテイング法などの公知
の薄膜形成技術を採用できる。この薄膜層の厚みは、通
常100Å以上とするのがよく、薄すぎると連続被膜とな
りにくいため、透明性の向上および下地となる金属薄膜
層の保護を確実に図れない。一方、上限としては60,000
Å以下、特に好ましくは10,000Å以下とするのがよい。
この理由は、誘電体薄膜層が厚くなりすぎるとフイルム
基材と誘電体薄膜層との線膨張率の差異によつてこの誘
電体薄膜層自体に汲クラツク、はがれなどが発生しやす
くなるからである。In forming these dielectric thin film layers, a vacuum evaporation method,
Known thin film forming techniques such as a sputtering method and an ion plating method can be employed. The thickness of the thin film layer is usually preferably 100 mm or more, and if it is too thin, it is difficult to form a continuous film, so that it is not possible to reliably improve the transparency and protect the metal thin film layer as a base. On the other hand, the upper limit is 60,000
Å, particularly preferably 10,000 Å or less.
The reason for this is that if the dielectric thin film layer is too thick, the dielectric thin film layer itself tends to generate pumping cracks and peeling due to the difference in linear expansion coefficient between the film base material and the dielectric thin film layer. is there.
なお、誘電体薄膜層の厚さの最適範囲は、使用する誘
電体薄膜層の材質や透明フイルム基材の種類、あるいは
金属薄膜層の材質などにより、また用途上望まれる透明
性、耐久性などの特性に応じて適宜決められるものであ
る。The optimum range of the thickness of the dielectric thin film layer depends on the material of the dielectric thin film layer to be used, the type of the transparent film substrate, the material of the metal thin film layer, and the transparency and durability desired for the application. Can be appropriately determined according to the characteristics of.
この発明において、透明フイルム基材の金属薄膜層お
よび誘電体薄膜層を有しない、片面に設けられる粘着材
層としては、透明性を有するものであれば特に限定なく
使用できるが、たとえばアクリル系粘着材、シリコン系
粘着剤、ゴム系粘着剤などが好ましく用いられる。この
粘着剤層の弾性係数および厚さは、この発明のシールド
材においてかなり重要な要素となるもので、弾性係数と
しては105〜107dyn/cmの範囲、厚さとしては５〜500μ
ｍの範囲とするのが好ましい。In the present invention, the adhesive layer provided on one side, which does not have the metal thin film layer and the dielectric thin film layer of the transparent film substrate, can be used without particular limitation as long as it has transparency. Materials, silicone-based adhesives, rubber-based adhesives, and the like are preferably used. The elastic modulus and thickness of the pressure-sensitive adhesive layer are considerably important factors in the shielding material of the present invention, and the elastic modulus is in the range of 10 5 to 10 7 dyn / cm, and the thickness is 5 to 500 μm.
It is preferred to be within the range of m.
すなわち、上記粘着剤層の弾性係数が105dyn/cm未満
の場合には、上記２種の薄膜層を有する透明フイルム基
材と後述する透明基板との貼り合わせ後において、この
粘着剤層が側面にはみ出てくるおそれがあり、一方107d
yn/cmを超えると、粘着剤層自体の硬度が増大しクシツ
ヨン作用が小さくなるので、上記の透明フイルム基材と
透明基板との貼り合わせ時あるいはデイスプレイデバイ
スなどを備えた装置へこのシールド材を取り付けると
き、または取りはずし作業時などに、該シールド材の誘
電体薄膜層や金属薄膜層を損傷させ易くなるといつた弊
害がでるため、いずれも好ましくない。In other words, when the elastic modulus of the pressure-sensitive adhesive layer is less than 10 5 dyn / cm, after the transparent film substrate having the two types of thin film layers and a transparent substrate described below are bonded, the pressure-sensitive adhesive layer May protrude to the side, while 10 7 d
If it exceeds yn / cm, the hardness of the pressure-sensitive adhesive layer itself increases and the cushioning action decreases, so this shielding material is used for bonding the transparent film substrate and the transparent substrate or to an apparatus equipped with a display device or the like. At the time of attachment or removal work, if the dielectric thin film layer or the metal thin film layer of the shield material is easily damaged, adverse effects will occur, and neither is preferable.
また、上記粘着剤層の厚みを５μｍ未満とすると、デ
イスプレイデバイスなどを備えた装置への取付けなどの
際、該シールド材における粘着剤層のクツシヨン作用が
期待できないため、透明フイルム基材上の金属薄膜層、
誘電体薄膜層が押圧操作にどにより容易に損傷されると
いつた弊害につながり、一方500μｍを超えると、クツ
シヨン効果は保有するものの、可視光線透過性や作業性
あるいはコストの面で好ましくないといつた問題があ
る。Further, when the thickness of the pressure-sensitive adhesive layer is less than 5 μm, the cushioning action of the pressure-sensitive adhesive layer in the shield material cannot be expected at the time of attachment to a device having a display device or the like, and therefore, the metal material on the transparent film substrate is not expected. Thin film layer,
If the dielectric thin film layer is easily damaged by the pressing operation, it may cause adverse effects.If the thickness exceeds 500 μm, the cushioning effect is retained, but it is not preferable in terms of visible light transmittance, workability or cost. I have a problem.
この発明における上記の金属薄膜層、誘電体薄膜層を
設けたフイルム基材の担体となる透明基板は、その形状
が平板状または曲形状などのものが採用され、たとえば
厚みが通常１〜10mm程度のガラス板や、ポリカーボネー
ト（PC）、セルロースプロピオーネ（CP）、アクリルな
どの透明なプラスチツク板などが用いられる。In the present invention, the metal thin film layer, the transparent substrate serving as a carrier of the film base material provided with the dielectric thin film layer, the shape is adopted such as a flat plate or a curved shape, for example, the thickness is usually about 1 to 10 mm And a transparent plastic plate such as polycarbonate (PC), cellulose propione (CP), and acrylic.
なお、上記ガラス板とプラスチック板とを積層させて
透明基板を構成させてもよく、この場合には比較的脆く
破損され易いガラス板の破損時の飛散防止効果が付加さ
れる。Note that the transparent substrate may be formed by laminating the glass plate and the plastic plate. In this case, an effect of preventing the glass plate, which is relatively brittle and easily damaged, from being scattered when it is damaged is added.
第１図は、この発明の静電気、電磁波シールド材の構
成を示すもので、図中１は透明なフイルム基材、２はこ
のフイルム基材１の一方の面に設けられた透明な金属薄
膜層、３はこの金属薄膜層２上に設けられた透明な誘電
体薄膜層であり、４は上記フイルム基材２の他面に設け
られた透明な粘着剤層である。そして、５は上記粘着剤
層４を介してフイルム基材１に貼り合わされた透明基板
である。FIG. 1 shows the structure of a static electricity and electromagnetic wave shielding material of the present invention. In FIG. 1, reference numeral 1 denotes a transparent film substrate, and 2 denotes a transparent metal thin film layer provided on one surface of the film substrate 1. Reference numeral 3 denotes a transparent dielectric thin film layer provided on the metal thin film layer 2, and reference numeral 4 denotes a transparent adhesive layer provided on the other surface of the film substrate 2. Reference numeral 5 denotes a transparent substrate bonded to the film substrate 1 via the pressure-sensitive adhesive layer 4.
このようなシールド材においてたとえば上記した透明
基板５の表面にアンチグレア−処理、すなわち成形、サ
ンドマツト、塗工法などにより基板５表面を凹凸形状に
し、光の表面散乱および吸収を増加させることにより表
面反射を少なくさせ、まぶしさをなくするようにして該
基板５の視認性をさらに向上させるようにしてもよい。In such a shield material, for example, the surface of the transparent substrate 5 described above is made to have an uneven shape by anti-glare treatment, that is, molding, sand matting, coating, or the like, and surface scattering and absorption of light are increased to reduce surface reflection. The visibility of the substrate 5 may be further improved by reducing the number of glare and eliminating glare.
以上のように、この発明の静電気、電磁波シールド材
は、すぐれた可視光線透過能、耐久性、静電気および電
磁波シールド能のいずれの機能をも兼ね備えたものであ
るため、たとえばデイスプレイデバイスなどを備えた装
置の窓材として適用されれば、その透明性により装置内
部の目視が容易となるとともに、保護層を有する耐久性
のよい金属薄膜層の作用により装置内部から発生する静
電気あるいは電磁波を好適にシールドするという格別の
効果が奏し得られるものとなる。As described above, the static electricity and electromagnetic wave shielding material of the present invention have excellent visible light transmission ability, durability, and both functions of static electricity and electromagnetic wave shielding ability. When applied as a window material for a device, its transparency makes it easier to see inside the device, and it also shields static electricity or electromagnetic waves generated from inside the device by the action of a durable metal thin film layer having a protective layer. The special effect of doing so can be obtained.
また、上記シールド材は、上述のように透明フイルム
基材を用いて構成しているため、たとえばロール状とな
した透明フイルム基材を使用し連続的に該フイルム基材
上に金属薄膜層、誘電体薄膜層あるいは粘着剤層を形成
させることができ、かつ該金属薄膜層、誘電体薄膜層と
粘着剤層を形成したフイルム基材と、透明基材とを連続
して貼り合わせることも可能となる。Further, since the shielding material is configured using a transparent film substrate as described above, for example, a metal thin film layer is continuously formed on the film substrate using a roll-shaped transparent film substrate, A dielectric thin film layer or an adhesive layer can be formed, and the metal thin film layer, the film substrate on which the dielectric thin film layer and the adhesive layer are formed, and the transparent substrate can be continuously bonded. Becomes
したがって、作業能率と、生産性の飛躍的な向上を期
待できるし、また作製されたシールド材は上記すぐれた
性能とともに、既述した粘着剤層のクツシヨン効果によ
り金属薄膜層、誘電体薄膜層の耐擦傷性が良好なものと
なり、従来にない静電気、電磁波シールド材として広い
用途に適用され得るものとなる。Therefore, the work efficiency and the productivity can be expected to be dramatically improved.In addition, the produced shielding material has the above-described excellent performance and the metal thin film layer and the dielectric thin film layer due to the cushioning effect of the adhesive layer described above. The abrasion resistance is good, and it can be applied to a wide range of uses as an unprecedented electrostatic and electromagnetic wave shielding material.
以下に、この発明の実施例を記載してより具体的に説
明する。なお、以下の特性試験は、づきの方法にて行つ
たものである。Hereinafter, embodiments of the present invention will be described in more detail. In addition, the following characteristic test was performed by the following method.
＜表面抵抗＞ ４端子法にて測定した。<Surface resistance> It was measured by a four-terminal method.
＜可視光線透過率＞ 島津製作所製の分光分析装置UV−240を用いて波長550
mmにおける透過率を測定した。<Visible light transmittance> Wavelength 550 using spectrophotometer UV-240 manufactured by Shimadzu Corporation
The transmittance in mm was measured.
＜静電気シールド特性＞ 春日電気社製の集電式電位測定器KS−325を用いて、
テレビのブラウン管（CRT）表面にシールド材を設置
（アース付き）し、シールド材表面の静電気量（テレビ
ON時）を測定した。なお、シールド材を設置しない場合
は、40〜50kVの静電気電位を持つ。<Electrostatic shielding characteristics> Using a current collector potential measuring instrument KS-325 manufactured by Kasuga Electric Co., Ltd.
Install a shielding material (with ground) on the surface of the CRT (CRT) of the TV, and set the amount of static electricity (TV
At ON) was measured. When no shielding material is installed, the static electricity potential is 40 to 50 kV.
＜電磁波シールド特性＞ アドバンデスト社製の電磁波シールド効果測定装置TR
−17301を用いて周波数107、108、109Hzの電界シールド
効果（dB）を測定した。<Electromagnetic wave shielding characteristics> Electromagnetic wave shielding effect measuring device TR manufactured by Advandes
The electric field shielding effect (dB) at frequencies of 10 7 , 10 8 , and 10 9 Hz was measured using −17301.
＜耐久性＞ シールド材を85℃,95％RHの条件下で50時間放置する
耐湿性試験を行い、この試験を行う前の初期の表面抵抗
値（R0）に対する試験後の表面抵抗値（Ｒ）の変化（R/
R0）を測定した。この変化（R/R0）が小さいほど酸化劣
化が低くて耐久性にすぐれていることを意味している。<Durability> The shield material was subjected to a moisture resistance test in which it was left for 50 hours under the conditions of 85 ° C. and 95% RH, and the surface resistance value (R 0 ) before the test was compared with the surface resistance value after the test (R 0 ). R) change (R /
R 0 ) was measured. The smaller the change (R / R 0 ), the lower the oxidative deterioration and the higher the durability.
＜耐擦傷性＞ シールド材の薄膜表面をガーゼで強くこすり、この操
作によつて傷が著しくつくものを×、僅かにつくものを
△、ほとんどつかないものを○、操作前と全く変わらな
いものを◎として評価した。<Abrasion resistance> The thin film surface of the shielding material is strongly rubbed with gauze, and x indicates that the scratch is marked by this operation, x indicates that it is slightly scratched by this operation, o indicates that it scarcely scratches, and the same as before the operation Was evaluated as ◎.
実施例１ 真空蒸着装置のベルジャ内を真空度１〜２×10-4Torr
となるように排気したのち、タングステンボード内にAg
を蒸着材料として収容し、この蒸着源から20cmの距離に
透明フイルム基材としての厚さ100μｍのポリエステル
フイルムをセツトして抵抗加熱法によりこのフイルム上
に蒸着速度数＋Å／秒にて厚さ120ÅのAg薄膜層を形成
した。Example 1 The inside of a bell jar of a vacuum evaporation apparatus was set to a degree of vacuum of 1 to 2 × 10 −4 Torr.
After exhausting so that it becomes
Is stored as a vapor deposition material, a 100 μm-thick polyester film as a transparent film substrate is set at a distance of 20 cm from the vapor deposition source, and a 120 mm thick film is formed on the film by a resistance heating method at a vapor deposition rate of + Å / sec. An Ag thin film layer was formed.
次いで、上記真空度に保持された装置内で上記Ag薄膜
層上に抵抗加熱法によりSiOを蒸着速度数＋Å／秒にて
真空蒸着し厚さ500ÅのSiO誘電体薄膜層を形成した。ま
た、上記ポリエステルフイルムの他面側に弾性係数１×
106dyn/cmに調整したアクリル系の粘着剤を塗布し、約2
0μｍ厚の粘着剤層を形成した。Next, SiO was vacuum-deposited on the Ag thin film layer at a deposition rate of + Å / sec by a resistance heating method in the apparatus maintained at the above-mentioned degree of vacuum to form a 500-mm-thick SiO dielectric thin film layer. The other side of the polyester film has an elastic coefficient of 1 ×.
Apply an acrylic adhesive adjusted to 10 6 dyn / cm,
An adhesive layer having a thickness of 0 μm was formed.
さらに、このフイルムに上記の粘着剤層を介して厚さ
2mmのアクリル板を貼り合わせ、この発明の静電気、電
磁波シールド材とした。Further, the thickness of this film is
A 2 mm acrylic plate was attached to form an electrostatic and electromagnetic wave shielding material of the present invention.
比較例１ SiO誘電体薄膜層を形成しなかつた以外は、実施例１
と同様にして比較用の静電気、電磁波シールド材を作製
した。Comparative Example 1 Example 1 was repeated except that no SiO dielectric thin film layer was formed.
In the same manner as above, a static electricity and electromagnetic wave shielding material for comparison was produced.
比較例２ 厚さ2mmのアクリル板上に実施例１と同様の方法で厚
さ120ÅのAg薄膜を形成して、比較用の静電気、電磁波
シールド材とした。Comparative Example 2 An Ag thin film having a thickness of 120 mm was formed on an acrylic plate having a thickness of 2 mm in the same manner as in Example 1 to provide a static electricity and electromagnetic wave shielding material for comparison.
上記実施例１と比較例1,2の係る各シールド材の特性
を調べた結果は、つぎの第１表に示されるとおりであつ
た。The results of examining the properties of the respective shield materials according to Example 1 and Comparative Examples 1 and 2 are as shown in Table 1 below.
実施例２ 実施例１と同様の手法にてAg薄膜層に代えて厚さ120
ÅのAlの薄膜層を形成し、他は実施例１と全く同様にし
てこの発明の静電気、電磁波シールド材を作製した。 Example 2 In the same manner as in Example 1, the thickness was changed to 120 instead of the Ag thin film layer.
A thin film layer of Al was formed, and an electrostatic / electromagnetic wave shielding material of the present invention was produced in exactly the same manner as in Example 1 except for the above.
このシールド材の表面抵抗は15Ω／□、可視光線透過
率は50％、静電気シールド特性は0.2KV以下、電磁波シ
ールド特性は周波数107Hzで20dB、同108Hzで40dB、同10
9Hzで13dB、耐久性（R/R0）は20以下、耐擦傷性は◎で
あつた。The surface resistance of the shielding material is 15 [Omega] / □, the visible light transmittance of 50%, electrostatic shielding characteristics 0.2KV less, electromagnetic wave shielding property is 20dB at a frequency 10 7 Hz, 40 dB at the same 10 8 Hz, the 10
13 dB at 9 Hz, durability (R / R 0 ) of 20 or less, and abrasion resistance of ◎.
つぎに、上記の実施例１および実施例２に係る静電
気、電磁波シールド材を、CRT、LCDなどのデイスプレイ
前面に取付けて実用テストを行つたところ、良好な視認
性が得られるとともに、耐久性がよいので静電気および
電磁波に対するすぐれたシールド効果が長期間発揮され
ることが確認された。さらに、上記デイスプレイ前面へ
の取付け時において、傷などの発生はなく、耐擦傷性も
良好であることが証明された。Next, when the static electricity and electromagnetic wave shielding materials according to the above-mentioned Examples 1 and 2 were attached to the front surface of a display such as a CRT or an LCD, a practical test was performed. As a result, good visibility was obtained and durability was improved. It was confirmed that a good shielding effect against static electricity and electromagnetic waves was exhibited for a long period of time. Further, it has been proved that no scratches or the like occur at the time of attachment to the front surface of the display, and that the scratch resistance is good.
第１図はこの発明の静電気、電磁波シールド材の一例を
示す断面図である。 １……透明なフイルム基材、２……透明な金属薄膜層、
３……透明な誘電体薄膜層、４……透明な粘着剤層、５
……透明基板FIG. 1 is a cross-sectional view showing an example of the electrostatic and electromagnetic wave shielding material of the present invention. 1 ... Transparent film substrate, 2 ... Transparent metal thin film layer,
3 ... Transparent dielectric thin film layer, 4 ... Transparent adhesive layer, 5
...... Transparent substrate
フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｈ０５Ｆ 1/00 Ｈ０５Ｆ 1/00 Ｋ (56)参考文献 特開 昭57−174240（ＪＰ，Ａ) 特開 昭57−110443（ＪＰ，Ａ) 特開 昭62−215202（ＪＰ，Ａ) 実開 昭60−183497（ＪＰ，Ｕ) 実開 昭62−199999（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.6，ＤＢ名) H05K 9/00 H05F 1/00 G09F 9/00 309 B32B 7/02 103 - 104 B32B 9/00 Continuation of the front page (51) Int.Cl. 6 Identification symbol FI H05F 1/00 H05F 1/00 K (56) References JP-A-57-174240 (JP, A) JP-A-57-110443 (JP, A JP-A-62-215202 (JP, A) JP-A-60-183497 (JP, U) JP-A-62-1199999 (JP, U) (58) Fields investigated (Int. Cl. 6 , DB name) H05K 9/00 H05F 1/00 G09F 9/00 309 B32B 7/02 103-104 B32B 9/00
Claims (1)
の一方の面に設けられた透明な金属薄膜層と、さらにこ
の金属薄膜層上に設けられた透明な誘電体薄膜層と、上
記フイルム基材の他面に設けられた弾性係数が105〜107
dyn/cmの範囲、厚さが５〜500μｍの範囲にある透明な
粘着剤層と、この粘着剤層を介して上記フイルム基材と
貼り合わされた透明基板とからなることを特徴とする静
電気、電磁波シールド材。A transparent film base material, a transparent metal thin film layer provided on one surface of the film base material, a transparent dielectric thin film layer provided on the metal thin film layer, The elastic modulus provided on the other surface of the film substrate is 10 5 to 10 7
dyn / cm range, a transparent pressure-sensitive adhesive layer having a thickness in the range of 5 to 500 μm, and a static electricity characterized by comprising a transparent substrate bonded to the film substrate through the pressure-sensitive adhesive layer, Electromagnetic wave shielding material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63109330A JP2948591B2 (en) | 1988-05-02 | 1988-05-02 | Static electricity, electromagnetic wave shielding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63109330A JP2948591B2 (en) | 1988-05-02 | 1988-05-02 | Static electricity, electromagnetic wave shielding material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01278800A JPH01278800A (en) | 1989-11-09 |
| JP2948591B2 true JP2948591B2 (en) | 1999-09-13 |
Family
ID=14507488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63109330A Expired - Lifetime JP2948591B2 (en) | 1988-05-02 | 1988-05-02 | Static electricity, electromagnetic wave shielding material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2948591B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100913307B1 (en) * | 2002-12-12 | 2009-08-26 | 삼성전자주식회사 | Backlight assembly and liquid crystal display having the same |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2847003B2 (en) * | 1992-10-20 | 1999-01-13 | 三菱電機株式会社 | CRT with functional film |
| US6188174B1 (en) * | 1996-10-01 | 2001-02-13 | Nisshinbo Insustries, Inc. | Electromagnetic radiation shield panel and method of producing the same |
| EP0883156B9 (en) | 1997-06-03 | 2005-09-21 | Hitachi Chemical Co., Ltd. | Electromagnetically shielding bonding film |
| US6086979A (en) * | 1997-11-11 | 2000-07-11 | Hitachi Chemical Company, Ltd. | Electromagnetically shielding bonding film, and shielding assembly and display device using such film |
| JPH11233991A (en) * | 1998-02-09 | 1999-08-27 | Hitachi Chem Co Ltd | Strippable and removable electromagnetic wave shielding adhesive film and electromagnetic wave shielding component and display using the same |
| JP4390885B2 (en) * | 1999-01-08 | 2009-12-24 | 帝人株式会社 | Transparent field wave shielding structure and manufacturing method thereof |
| TW583688B (en) | 2002-02-21 | 2004-04-11 | Dainippon Printing Co Ltd | Electromagnetic shielding sheet and method of producing the same |
| AU2003254832A1 (en) * | 2002-08-08 | 2004-02-25 | Dai Nippon Printing Co., Ltd. | Electromagnetic shielding sheet and method for manufacturing same |
| KR100959751B1 (en) | 2003-05-13 | 2010-05-25 | 삼성전자주식회사 | Metal pattern formation method and electromagnetic shielding filter using the same |
| US7732038B2 (en) | 2004-07-12 | 2010-06-08 | Dai Nippon Printing Co., Ltd. | Electromagnetic wave shielding filter |
| EP2292421A4 (en) | 2008-06-10 | 2013-12-25 | Daicel Chem | MULTILAYER PRODUCT WITH POROUS LAYER AND FUNCTIONAL MULTILAYER PRODUCT MANUFACTURED THEREOF |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60183497U (en) * | 1984-05-15 | 1985-12-05 | 池島 清美 | Transparent sound insulation electromagnetic shielding panel |
| JPH0746570B2 (en) * | 1986-03-17 | 1995-05-17 | 東レ株式会社 | Light transmission plate having electromagnetic wave shielding property |
-
1988
- 1988-05-02 JP JP63109330A patent/JP2948591B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100913307B1 (en) * | 2002-12-12 | 2009-08-26 | 삼성전자주식회사 | Backlight assembly and liquid crystal display having the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01278800A (en) | 1989-11-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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| EXPY | Cancellation because of completion of term |