JP2911192B2 - Method for producing epoxy group-containing compound - Google Patents
Method for producing epoxy group-containing compoundInfo
- Publication number
- JP2911192B2 JP2911192B2 JP2212459A JP21245990A JP2911192B2 JP 2911192 B2 JP2911192 B2 JP 2911192B2 JP 2212459 A JP2212459 A JP 2212459A JP 21245990 A JP21245990 A JP 21245990A JP 2911192 B2 JP2911192 B2 JP 2911192B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- containing compound
- general formula
- reaction
- epoxy group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000001875 compounds Chemical class 0.000 title claims description 35
- 125000003700 epoxy group Chemical group 0.000 title description 23
- 238000004519 manufacturing process Methods 0.000 title description 10
- -1 aldehyde compound Chemical class 0.000 claims description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 239000003054 catalyst Substances 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 125000001424 substituent group Chemical group 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 5
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 claims description 4
- 229940078494 nickel acetate Drugs 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 description 28
- 238000000034 method Methods 0.000 description 21
- 239000002904 solvent Substances 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 150000002816 nickel compounds Chemical class 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 4
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 4
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- FJJYHTVHBVXEEQ-UHFFFAOYSA-N 2,2-dimethylpropanal Chemical compound CC(C)(C)C=O FJJYHTVHBVXEEQ-UHFFFAOYSA-N 0.000 description 2
- FTZILAQGHINQQR-UHFFFAOYSA-N 2-Methylpentanal Chemical compound CCCC(C)C=O FTZILAQGHINQQR-UHFFFAOYSA-N 0.000 description 2
- BYGQBDHUGHBGMD-UHFFFAOYSA-N 2-methylbutanal Chemical compound CCC(C)C=O BYGQBDHUGHBGMD-UHFFFAOYSA-N 0.000 description 2
- FAVBVYLIENPQLG-UHFFFAOYSA-N 2-methyldec-2-ene Chemical compound CCCCCCCC=C(C)C FAVBVYLIENPQLG-UHFFFAOYSA-N 0.000 description 2
- YGHRJJRRZDOVPD-UHFFFAOYSA-N 3-methylbutanal Chemical compound CC(C)CC=O YGHRJJRRZDOVPD-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- KVFDZFBHBWTVID-UHFFFAOYSA-N cyclohexanecarbaldehyde Chemical compound O=CC1CCCCC1 KVFDZFBHBWTVID-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- KSMVZQYAVGTKIV-UHFFFAOYSA-N decanal Chemical compound CCCCCCCCCC=O KSMVZQYAVGTKIV-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- HFJRKMMYBMWEAD-UHFFFAOYSA-N dodecanal Chemical compound CCCCCCCCCCCC=O HFJRKMMYBMWEAD-UHFFFAOYSA-N 0.000 description 2
- 150000003944 halohydrins Chemical class 0.000 description 2
- FXHGMKSSBGDXIY-UHFFFAOYSA-N heptanal Chemical compound CCCCCCC=O FXHGMKSSBGDXIY-UHFFFAOYSA-N 0.000 description 2
- JARKCYVAAOWBJS-UHFFFAOYSA-N hexanal Chemical compound CCCCCC=O JARKCYVAAOWBJS-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- AFFLGGQVNFXPEV-UHFFFAOYSA-N n-decene Natural products CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002815 nickel Chemical class 0.000 description 2
- GYHFUZHODSMOHU-UHFFFAOYSA-N nonanal Chemical compound CCCCCCCCC=O GYHFUZHODSMOHU-UHFFFAOYSA-N 0.000 description 2
- NUJGJRNETVAIRJ-UHFFFAOYSA-N octanal Chemical compound CCCCCCCC=O NUJGJRNETVAIRJ-UHFFFAOYSA-N 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 150000004965 peroxy acids Chemical class 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- KMPQYAYAQWNLME-UHFFFAOYSA-N undecanal Chemical compound CCCCCCCCCCC=O KMPQYAYAQWNLME-UHFFFAOYSA-N 0.000 description 2
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 2
- 239000001893 (2R)-2-methylbutanal Substances 0.000 description 1
- ILPBINAXDRFYPL-HWKANZROSA-N (E)-2-octene Chemical compound CCCCC\C=C\C ILPBINAXDRFYPL-HWKANZROSA-N 0.000 description 1
- ILPBINAXDRFYPL-HYXAFXHYSA-N (Z)-2-octene Chemical compound CCCCC\C=C/C ILPBINAXDRFYPL-HYXAFXHYSA-N 0.000 description 1
- XYPISWUKQGWYGX-UHFFFAOYSA-N 2,2,2-trifluoroethaneperoxoic acid Chemical compound OOC(=O)C(F)(F)F XYPISWUKQGWYGX-UHFFFAOYSA-N 0.000 description 1
- UNNGUFMVYQJGTD-UHFFFAOYSA-N 2-Ethylbutanal Chemical compound CCC(CC)C=O UNNGUFMVYQJGTD-UHFFFAOYSA-N 0.000 description 1
- GLVYLTSKTCWWJR-UHFFFAOYSA-N 2-carbonoperoxoylbenzoic acid Chemical compound OOC(=O)C1=CC=CC=C1C(O)=O GLVYLTSKTCWWJR-UHFFFAOYSA-N 0.000 description 1
- HLMACKQLXSEXIY-UHFFFAOYSA-N 2-methyldec-1-ene Chemical compound CCCCCCCCC(C)=C HLMACKQLXSEXIY-UHFFFAOYSA-N 0.000 description 1
- IQVAERDLDAZARL-UHFFFAOYSA-N 2-phenylpropanal Chemical compound O=CC(C)C1=CC=CC=C1 IQVAERDLDAZARL-UHFFFAOYSA-N 0.000 description 1
- YNJSNEKCXVFDKW-UHFFFAOYSA-N 3-(5-amino-1h-indol-3-yl)-2-azaniumylpropanoate Chemical compound C1=C(N)C=C2C(CC(N)C(O)=O)=CNC2=C1 YNJSNEKCXVFDKW-UHFFFAOYSA-N 0.000 description 1
- SJPDIYSLQXNOQB-UHFFFAOYSA-N 3-phenylpropanal Chemical compound O=C[CH]CC1=CC=CC=C1 SJPDIYSLQXNOQB-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- YGCZTXZTJXYWCO-UHFFFAOYSA-N beta-phenylpropionaldehyde Natural products O=CCCC1=CC=CC=C1 YGCZTXZTJXYWCO-UHFFFAOYSA-N 0.000 description 1
- LBAYFEDWGHXMSM-UHFFFAOYSA-N butaneperoxoic acid Chemical compound CCCC(=O)OO LBAYFEDWGHXMSM-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- ILPBINAXDRFYPL-UHFFFAOYSA-N cis-octene-2 Natural products CCCCCC=CC ILPBINAXDRFYPL-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- GPKUICFDWYEPTK-UHFFFAOYSA-N methoxycyclohexatriene Chemical group COC1=CC=C=C[CH]1 GPKUICFDWYEPTK-UHFFFAOYSA-N 0.000 description 1
- BGEHHAVMRVXCGR-UHFFFAOYSA-N methylundecylketone Natural products CCCCCCCCCCCCC=O BGEHHAVMRVXCGR-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- CZPZWMPYEINMCF-UHFFFAOYSA-N propaneperoxoic acid Chemical compound CCC(=O)OO CZPZWMPYEINMCF-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Epoxy Compounds (AREA)
- Catalysts (AREA)
Description
【発明の詳細な説明】 <産業上の利用分野> 本発明はエポキシ基含有化合物の製造方法に関し、特
にニッケル化合物とアルデヒド化合物の併存下に行なう
新規な反応により、エポキシ基含有化合物を得ることが
できる方法に関する。The present invention relates to a method for producing an epoxy group-containing compound, and more particularly to a method for producing an epoxy group-containing compound by a novel reaction carried out in the presence of a nickel compound and an aldehyde compound. On how you can do it.
<従来の技術> 従来、エポキシ基含有化合物を製造する方法として、
二重結合を有する化合物を、ベンゼン、クロロホルムあ
るいは四塩化炭素などの不活性溶媒中で、過安息香酸、
過ギ酸、過フタル酸、過プロピオン酸、過酪酸あるいは
トリフルオロ過酢酸などの有機過酸化物で酸化する方法
が知られている。特に、工業的には、過酸化物を生じさ
せる物質、例えば氷酢酸と不飽和化合物との混合物に、
強酸触媒を加えて60〜70℃に加熱しながら過酸化水素を
加えて過酢酸を生成させ、この過酢酸を利用してエポキ
シ基含有化合物を製造する方法が行われている。<Conventional technology> Conventionally, as a method for producing an epoxy group-containing compound,
Compound having a double bond in an inert solvent such as benzene, chloroform or carbon tetrachloride, perbenzoic acid,
A method of oxidizing with an organic peroxide such as formic acid, perphthalic acid, perpropionic acid, perbutyric acid or trifluoroperacetic acid is known. In particular, industrially, peroxide-generating substances, such as mixtures of glacial acetic acid and unsaturated compounds,
A method is known in which a strong acid catalyst is added, hydrogen peroxide is added while heating to 60 to 70 ° C. to generate peracetic acid, and an epoxy group-containing compound is produced using the peracetic acid.
<発明が解決しようとする課題> しかしながら、前記方法における反応は、過敏な反応
であるため、選択的にエポキシ化反応を行うことが困難
であり、しかもエポキシ基含有化合物の生成に伴って、
生成したエポキシ基含有化合物の一部が重合することが
ある。また、この反応は、反応温度が50℃以上の厳しい
反応条件下で行なわれるため、副反応が生起し易く、エ
ポキシ基含有化合物を高収率で得ることができない。ま
た酸化剤として使用する過酸類は高価かつ取扱いが危険
なものであるため、工業的に高コストになるという不利
がある。<Problems to be Solved by the Invention> However, the reaction in the above method is a hypersensitive reaction, so that it is difficult to selectively perform an epoxidation reaction, and with the production of an epoxy group-containing compound,
Some of the generated epoxy group-containing compounds may be polymerized. In addition, since this reaction is performed under severe reaction conditions at a reaction temperature of 50 ° C. or higher, side reactions easily occur, and an epoxy group-containing compound cannot be obtained in high yield. In addition, peracids used as oxidizing agents are expensive and dangerous to handle, and thus have the disadvantage of high industrial cost.
さらに、有機過酸化物を使用いないエポキシ基含有化
合物の製造方法として、不飽和化合物に次亜ハロゲン酸
を使用いてハロヒドリンを生成させ、次いでこのハロヒ
ドリンをアルカリ処理し、エポキシ基を生成する方法も
知られているが、この方法は、構造の複雑なオレフィン
類には適用できない。Furthermore, as a method for producing an epoxy group-containing compound without using an organic peroxide, there is also known a method of generating a halohydrin by using hypohalous acid as an unsaturated compound and then treating the halohydrin with an alkali to generate an epoxy group. However, this method is not applicable to olefins having a complicated structure.
そこで本発明の目的は、従来この種のエポキシ基含有
化合物の製造に用いられてきた反応に比して温和な反応
条件で行なうことができ、過酸類等の高価な酸化剤を使
用しないため工業的に低コストで行なうことができ、ま
た良好な触媒効率で、エポキシ基含有化合物を得ること
ができる新規な方法を提供することにある。Accordingly, an object of the present invention is to carry out the reaction under milder reaction conditions than the reaction conventionally used in the production of this type of epoxy group-containing compound, and to use an industrial method because expensive oxidizing agents such as peracids are not used. It is an object of the present invention to provide a novel method which can be carried out at low cost and can obtain an epoxy group-containing compound with good catalytic efficiency.
<課題を解決するための手段> 本発明は、前記課題を解決するために、一般式
(I): [式中、R1は直鎖または分岐状のアルキル基であり、
置換基を有していてもよく、R2およびR3は同一でも異な
ってもよく、水素原子、置換あるいは非置換のアルキル
基であり、相互に結合して環を形成していてもよく、ま
たR1とR3は、相互に結合して環を形成していてもよく、
さらにR1、R2およびR3は、同時に結合して縮合環を形成
していてもよい] で表される二重結合含有化合物を、酢酸ニッケルおよび
/または下記式(IVA): で表されるニッケル錯体からなる触媒と、下記一般式
(II): R7CHO (II) [ここで、R7は直鎖または分岐状のアルキル基、もし
くはアリール基であり、置換基を有していてもよい] で表わされるアルデヒド化合物との存在下に、酸素含有
ガスと反応させる工程を含む、 一般式(III): [R1、R2およびR3は前記一般式(I)において定義し
たとおりである] で表されるエポキシ基含有化合物の製造方法を提供する
ものである。<Means for Solving the Problems> The present invention provides a compound represented by the general formula (I): Wherein R 1 is a linear or branched alkyl group;
May have a substituent, R 2 and R 3 may be the same or different, a hydrogen atom, a substituted or unsubstituted alkyl group, may be mutually bonded to form a ring, R 1 and R 3 may be bonded to each other to form a ring,
Further, R 1 , R 2 and R 3 may be simultaneously bonded to form a condensed ring.] A nickel compound and / or a compound represented by the following formula (IVA): And a catalyst comprising a nickel complex represented by the following general formula (II): R 7 CHO (II) wherein R 7 is a linear or branched alkyl group or an aryl group, and has a substituent. A step of reacting with an oxygen-containing gas in the presence of an aldehyde compound represented by the following general formula (III): [Wherein R 1 , R 2 and R 3 are as defined in the above general formula (I)].
以下、本発明のエポキシ基含有化合物の製造方法につ
いて詳細に説明する。Hereinafter, the method for producing the epoxy group-containing compound of the present invention will be described in detail.
本発明の出発物質である二重結合含有化合物を表わす
一般式(I)において、R1は直鎖または分岐状のアルキ
ル基であり、置換基を有していてもよい。R1の直鎖また
は分岐状のアルキル基としては、例えば、エチル基、n
−プロピル基、n−ブチル基、sec−ブチル基、tert−
ブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプ
チル基、n−オクチル基、n−ノニル基、n−デシル
基、n−ウンデシル基、n−ドデシル基等が挙げられ
る。In the general formula (I) representing the double bond-containing compound as a starting material of the present invention, R 1 is a linear or branched alkyl group, which may have a substituent. Examples of the linear or branched alkyl group for R 1 include an ethyl group, n
-Propyl group, n-butyl group, sec-butyl group, tert-
Butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl and the like.
R2およびR3は同一でも異なってもよく、水素原子、置
換もしくは非置換のアルキル基である。この置換もしく
は非置換のアルキル基としては、例えば、メチル基、エ
チル基、n−プロピル基、フェニルメチル基等が挙げら
れる。また、R2とR3は相互に結合して環を形成していて
もよく、例えば、相互に結合してシクロペンチル基、シ
クロヘキシル基、シクロヘプチル基、シクロオクチル基
等の環を形成していてもよい。R 2 and R 3 may be the same or different and are a hydrogen atom or a substituted or unsubstituted alkyl group. Examples of the substituted or unsubstituted alkyl group include a methyl group, an ethyl group, an n-propyl group, and a phenylmethyl group. Further, R 2 and R 3 may be bonded to each other to form a ring.For example, R 2 and R 3 may be bonded to each other to form a ring such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Is also good.
また、R1とR3は相互に結合して環を形成していてもよ
く、例えば、相互に結合して、ノルボニル基などの基を
形成していてもよい。R 1 and R 3 may be bonded to each other to form a ring, for example, R 1 and R 3 may be bonded to each other to form a group such as a norbornyl group.
さらに、R1、R2およびR3は、同時に結合して縮合環を
形成していてもよく、例えば、 下記式: で表わされる縮合環を形成していてもよい。Further, R 1 , R 2 and R 3 may be simultaneously bonded to form a condensed ring, for example, the following formula: May form a condensed ring represented by
前記一般式(I)で表わされる二重結合含有化合物の
代表例として、2−メチル−2−デセン、cis−2−オ
クテン、trans−2−オクテン、2−メチル−1−デセ
ン、1−デセン等のオレフィン類;2−ノルボルネン等の
脂環式不飽和炭化水素類;スチレン等の芳香族不飽和炭
化水素、あるいは下記式(I−A)〜(I−I)で表わ
されるものが挙げられる。Representative examples of the double bond-containing compound represented by the general formula (I) include 2-methyl-2-decene, cis-2-octene, trans-2-octene, 2-methyl-1-decene, and 1-decene Olefins such as 2-norbornene; aromatic unsaturated hydrocarbons such as styrene; and those represented by the following formulas (IA) to (II). .
本発明の方法においては、所望の構造を有するエポキ
シ基含有化合物が得られるように、前記一般式(I)で
表わされる二重結合含有化合物を選択すればよい。 In the method of the present invention, the double bond-containing compound represented by the general formula (I) may be selected so as to obtain an epoxy group-containing compound having a desired structure.
本発明の方法で用いられる触媒は、酢酸ニッケルおよ
び/またはニッケル錯体からなるものである。触媒とし
て用いられるニッケル錯体の代表例としては、例えば、
下記一般式(IVA)、(IVB)および(IVC): で表わされるニッケル化合物が挙げられる。The catalyst used in the method of the present invention comprises nickel acetate and / or a nickel complex. Representative examples of nickel complexes used as catalysts include, for example,
The following general formulas (IVA), (IVB) and (IVC): And a nickel compound represented by the following formula:
本発明の方法において、酢酸ニッケルまたはニッケル
錯体は、1種単独でも2種以上を組合せて用いてもよ
い。In the method of the present invention, nickel acetate or a nickel complex may be used alone or in combination of two or more.
また、このニッケル錯体は、いずれの方法によって得
られたものでもよく、特に限定されない。また、市販品
を用いてもよい。The nickel complex may be obtained by any method, and is not particularly limited. Moreover, you may use a commercial item.
このニッケル錯体は、例えば、所望のニッケル錯体に
対応するジケトン化合物と、NiSO4、NiCl2またはNi(OA
c)2とを用いて、脱塩法で製造することができる。この
ようにして得られる生成物は、反応溶媒等を除去した
後、乾燥してそのまま使用してもよい。さらに有機溶媒
で抽出した精製物として使用してもよいし、減圧下に、
昇華精製して使用してもよく、またこれらの精製法を組
合わせて精製し使用に供してもよい。This nickel complex can be prepared, for example, by mixing a diketone compound corresponding to a desired nickel complex with NiSO 4 , NiCl 2 or Ni (OA
c) It can be produced by a desalting method using 2 . The product thus obtained may be dried and used as it is after removing the reaction solvent and the like. Further, it may be used as a purified product extracted with an organic solvent, or under reduced pressure,
It may be used after sublimation purification, or a combination of these purification methods may be used after purification.
本発明の方法において、酢酸ニッケルおよび/または
ニッケル錯体からなる触媒の使用量は、通常、出発原料
である前記一般式(I)で表される二重結合含有化合物
1モルに対して0.005〜10モル%の割合であり、特に、
エポキシ基含有化合物の収率が高い点で、0.0096〜4モ
ル%の割合が一般的である。In the method of the present invention, the amount of the catalyst comprising nickel acetate and / or the nickel complex is usually 0.005 to 10 mol per mol of the double bond-containing compound represented by the general formula (I) as a starting material. Mole%, especially
The ratio of 0.0096 to 4 mol% is generally used in that the yield of the epoxy group-containing compound is high.
本発明の方法においては、前記の触媒とともに、前記
一般式(II)で表わされるアルデヒド化合物が用いられ
る。一般式(II)において、R7は直鎖または分岐状のア
ルキル基、もしくはシクロアルキル基またはアリール基
である。直鎖または分岐状のアルキル基の代表例として
は、メチル基、エチル基、n−プロピル基、iso−プロ
ピル基、n−ブチル基、sec−ブチル基、tert−ブチル
基、iso−ブチル基、n−ペンチル基、n−ヘキシル
基、n−ヘプチル基、n−オクチル基、n−ノニル基、
n−デシル基、n−ウンデシル基、n−ドデシル基等が
挙げられ、シクロアルキル基の代表例としては、シクロ
ヘキシル基、シクロペンチル基、シクロヘプチル基、シ
クロオクチル基等が挙げられる。アリール基の代表例と
しては、フェニル基、P−メトキシフェニル基等が挙げ
られる。また、これらの直鎖または分岐状のアルキル
基、もしくはシクロアルキル基またはアリール基は、置
換基を有していてもよく、例えば、塩素、フッ素等のハ
ロゲン原子、メトキシ基などの置換基を有していてもよ
い。In the method of the present invention, an aldehyde compound represented by the general formula (II) is used together with the catalyst. In the general formula (II), R 7 is a linear or branched alkyl group, or a cycloalkyl group or an aryl group. Representative examples of linear or branched alkyl groups include methyl, ethyl, n-propyl, iso-propyl, n-butyl, sec-butyl, tert-butyl, iso-butyl, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, n-nonyl group,
Examples thereof include an n-decyl group, an n-undecyl group, and an n-dodecyl group. Representative examples of the cycloalkyl group include a cyclohexyl group, a cyclopentyl group, a cycloheptyl group, and a cyclooctyl group. Representative examples of the aryl group include a phenyl group and a P-methoxyphenyl group. Further, these linear or branched alkyl groups, or cycloalkyl groups or aryl groups may have a substituent, for example, a halogen atom such as chlorine or fluorine, or a substituent such as a methoxy group. It may be.
この一般式(II)で表わされるアルデヒド化合物の代
表例として、アセトアルデヒド、プロピオンアルデヒ
ド、ブチルアルデヒド、バレルアルデヒド、ヘキシルア
ルデヒド、ヘプチルアルデヒド、オクチルアルデヒド、
ノニルアルデヒド、デシルアルデヒド、ウンデシルアル
デヒド、ドデシルアルデヒド、イソブチルアルデヒド、
2−メチルブチルアルデヒド、2−エチルブチルアルデ
ヒド、2−メチルバレルアルデヒド、イソバレルアルデ
ヒド、ピバルアルデヒド、2−フェニルプロピオンアル
デヒド、3−フェニルプロパナール、シクロヘキサンカ
ルバルデヒド等が挙げられる。Representative examples of the aldehyde compound represented by the general formula (II) include acetaldehyde, propionaldehyde, butyraldehyde, valeraldehyde, hexylaldehyde, heptylaldehyde, octylaldehyde,
Nonylaldehyde, decylaldehyde, undecylaldehyde, dodecylaldehyde, isobutyraldehyde,
Examples include 2-methylbutyraldehyde, 2-ethylbutyraldehyde, 2-methylvaleraldehyde, isovaleraldehyde, pivalaldehyde, 2-phenylpropionaldehyde, 3-phenylpropanal, and cyclohexanecarbaldehyde.
本発明において、前記一般式(II)で表わされるアル
デヒド化合物は、1種単独でも2種以上を組合せても用
いられる。In the present invention, the aldehyde compound represented by the general formula (II) may be used alone or in combination of two or more.
この一般式(II)で表わされるアルデヒド化合物の使
用量は、出発物質である前記一般式(I)で表される二
重結合含有化合物1モルに対して、通常、1モル以上、
好ましくは1〜10モルが一般的である。また、この反応
は、溶媒を用いて行うこともでき、この場合には、通常
は、上記の触媒1モルに対して、1〜10モルの上記アル
デヒド化合物を、溶媒で希釈して使用することもでき
る。用いられる溶媒としては、反応に対して不活性な溶
媒を使用することができ、このような溶媒の具体的な例
としては、ベンゼン、トルエン、o−、m−またはp−
キシレン、メシチレン等の芳香族炭化水素系溶媒;クロ
ロホルム、ジクロロメタン、ジクロロエタンのようなハ
ロゲン化炭化水素系溶媒;酢酸エチル、酢酸プロピル、
酢酸ブチル等のエステル系溶媒;アセトニトリル、アセ
トン、ジエチルケトン、THFなどを挙げることができ
る。これらの溶媒は単独であるいは組み合わせて使用す
ることができる。特に、ジクロロエタンが、エポキシ基
含有化合物の収率が高い点で、好ましい。The amount of the aldehyde compound represented by the general formula (II) is usually 1 mol or more per 1 mol of the double bond-containing compound represented by the general formula (I) as a starting material.
Preferably, 1 to 10 mol is generally used. This reaction can also be carried out using a solvent. In this case, usually, 1 to 10 mol of the aldehyde compound is used after diluting with a solvent with respect to 1 mol of the above catalyst. Can also. As the solvent used, a solvent inert to the reaction can be used. Specific examples of such a solvent include benzene, toluene, o-, m- or p-.
Aromatic hydrocarbon solvents such as xylene and mesitylene; halogenated hydrocarbon solvents such as chloroform, dichloromethane and dichloroethane; ethyl acetate, propyl acetate;
Ester solvents such as butyl acetate; acetonitrile, acetone, diethyl ketone, THF and the like. These solvents can be used alone or in combination. In particular, dichloroethane is preferable in that the yield of the epoxy group-containing compound is high.
本発明の方法で用いられる酸素含有ガスは、酸素ガス
(純酸素)でもよいし、酸素含有窒素ガス(例えば空
気)、酸素含有アルゴンガス等の酸素含有不活性ガスで
もよい。The oxygen-containing gas used in the method of the present invention may be an oxygen gas (pure oxygen) or an oxygen-containing inert gas such as an oxygen-containing nitrogen gas (for example, air) and an oxygen-containing argon gas.
酸素含有ガス中の酸素の分圧は、好ましくは0.1atm〜
10kg/cm2程度、より好ましくは0.2〜1.0atm程度であ
る。酸素の分圧がこの範囲内にあると、反応速度が速
く、反応収率もよい。The partial pressure of oxygen in the oxygen-containing gas is preferably 0.1 atm or more.
It is about 10 kg / cm 2 , more preferably about 0.2 to 1.0 atm. When the partial pressure of oxygen is within this range, the reaction rate is high and the reaction yield is good.
また、本発明の方法においては、反応を合成ゼオライ
トの存在下に行うと、より高い収率で前記一般式(II
I)で表されるエポキシ基含有化合物を得ることができ
るため、好ましい。In the method of the present invention, when the reaction is carried out in the presence of a synthetic zeolite, a higher yield of the compound represented by the general formula (II)
It is preferable because the epoxy group-containing compound represented by I) can be obtained.
反応温度は、通常、0〜100℃程度であり、さらに20
〜50℃が、エポキシ基含有化合物の収率が高くなる点
で、好ましい。The reaction temperature is usually about 0 to 100 ° C.,
-50 ° C is preferred in that the yield of the epoxy group-containing compound is increased.
反応圧力は、特に制限されず、常圧で十分である。 The reaction pressure is not particularly limited, and normal pressure is sufficient.
本発明の方法における反応は、液相中で連続的に行っ
てもよいし、回分的に行ってもよい。The reaction in the method of the present invention may be performed continuously in the liquid phase or may be performed batchwise.
以上の反応によって得られる反応混合物は、通常、副
生物、未反応の出発原料、触媒等を含有するため、本発
明の目的物であるエポキシ基含有化合物は、この反応混
合物中から分離、精製してい得ることができる。用いら
れる分離方法は、特に制限されず、例えば、蒸留、吸着
による方法、抽出、再結晶等公知の分離方法によればよ
い。Since the reaction mixture obtained by the above reaction usually contains by-products, unreacted starting materials, catalysts, and the like, the epoxy group-containing compound, which is the object of the present invention, is separated and purified from the reaction mixture. You can get it. The separation method used is not particularly limited, and may be, for example, a known separation method such as a method by distillation and adsorption, extraction, and recrystallization.
本発明の方法で得られる前記一般式(III)で表わさ
れるエポキシ基含有化合物の代表的なものとしては、下
記式で表されるものが挙げられる。Representative examples of the epoxy group-containing compound represented by the general formula (III) obtained by the method of the present invention include those represented by the following formula.
本発明の方法によって得られるエポキシ基含有化合物
は、例えば、合成中間体、ポリマー原料等の用途に有用
である。 The epoxy group-containing compound obtained by the method of the present invention is useful for applications such as synthetic intermediates and polymer raw materials.
<実施例> 以下、実施例および比較例により本発明を具体的に説
明するが、本発明は、これらの実施例に限定されるもの
ではない。<Examples> Hereinafter, the present invention will be described specifically with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples.
(実施例1〜4) 各例において、反応容器に、2−メチル−2−デセン
3.0mmol、イソブチルアルデヒド6.0mmolおよびジクロロ
エタン2ml、並びに触媒として表1に示すニッケル化合
物0.06mmolを仕込んだ。次いで、反応容器内に、1atmの
酸素ガスを充填し、室温で13時間反応させた。(Examples 1 to 4) In each example, 2-methyl-2-decene was added to the reaction vessel.
3.0 mmol, 6.0 mmol of isobutyraldehyde and 2 ml of dichloroethane, and 0.06 mmol of a nickel compound shown in Table 1 as a catalyst were charged. Next, 1 atm of oxygen gas was charged into the reaction vessel and reacted at room temperature for 13 hours.
反応終了後、得られた反応混合物をガスクロマトグラ
フィーにかけて分析し、出発原料である2−メチル−2
−デセンの転化率、および生成物であるエポキシド(2,
2−ジメチル−3−ヘプチルオキシラン)の収率を求め
た。結果を表1に示す。After completion of the reaction, the obtained reaction mixture was analyzed by gas chromatography, and the starting material 2-methyl-2
The conversion of decene and the product epoxide (2,
The yield of 2-dimethyl-3-heptyloxirane) was determined. Table 1 shows the results.
<発明の効果> 本発明の方法によれば、特定の構造のニッケル化合物
を触媒として用いる新規な反応により、エポキシ基含有
化合物を得ることができる。この反応は、従来のこの種
のエポキシ基含有化合物の製造に適用されてきた反応に
比して、反応温度および反応圧力等において穏やかな反
応条件で行なうことができ、また、使用するニッケル化
合物も少量でよく、工業的に有利である。 <Effect of the Invention> According to the method of the present invention, an epoxy group-containing compound can be obtained by a novel reaction using a nickel compound having a specific structure as a catalyst. This reaction can be carried out under mild reaction conditions such as a reaction temperature and a reaction pressure as compared with a reaction conventionally applied to the production of this type of epoxy group-containing compound. A small amount is sufficient, which is industrially advantageous.
フロントページの続き (58)調査した分野(Int.Cl.6,DB名) C07D 301/06 Continuation of front page (58) Field surveyed (Int.Cl. 6 , DB name) C07D 301/06
Claims (1)
換基を有していてもよく、R2およびR3は同一でも異なっ
てもよく、水素原子、置換あるいは非置換のアルキル基
であり、相互に結合して環を形成していてもよく、また
R1とR3は、相互に結合して環を形成していてもよく、さ
らにR1、R2およびR3は、同時に結合して縮合環を形成し
ていてもよい] で表される二重結合含有化合物を、酢酸ニッケルおよび
/または下記式(IVA): で表されるニッケル錯体からなる触媒と、下記一般式
(II): R7CHO (II) [ここで、R7は直鎖または分岐状のアルキル基、もしく
はアリール基であり、置換基を有していてもよい] で表わされるアルデヒド化合物との存在下に、酸素含有
ガスと反応させる工程を含む、 一般式(III): [R1、R2およびR3は前記一般式(I)において定義した
とおりである] で表されるエポキシ基含有化合物の製造方法。1. A compound of the general formula (I): [Wherein, R 1 is a linear or branched alkyl group, which may have a substituent, R 2 and R 3 may be the same or different, and include a hydrogen atom, a substituted or unsubstituted alkyl And may be mutually bonded to form a ring;
R 1 and R 3 may be bonded to each other to form a ring, and R 1 , R 2 and R 3 may be simultaneously bonded to form a condensed ring. The compound containing a double bond is converted to nickel acetate and / or the following formula (IVA): And a catalyst comprising a nickel complex represented by the following general formula (II): R 7 CHO (II) wherein R 7 is a linear or branched alkyl group or an aryl group, and has a substituent. A step of reacting with an oxygen-containing gas in the presence of an aldehyde compound represented by the following general formula (III): [Wherein R 1 , R 2 and R 3 are as defined in the above general formula (I)].
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2212459A JP2911192B2 (en) | 1990-08-09 | 1990-08-09 | Method for producing epoxy group-containing compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2212459A JP2911192B2 (en) | 1990-08-09 | 1990-08-09 | Method for producing epoxy group-containing compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0495079A JPH0495079A (en) | 1992-03-27 |
JP2911192B2 true JP2911192B2 (en) | 1999-06-23 |
Family
ID=16622984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2212459A Expired - Fee Related JP2911192B2 (en) | 1990-08-09 | 1990-08-09 | Method for producing epoxy group-containing compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2911192B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2081507C (en) * | 1991-10-30 | 2004-04-06 | Shun-Ichi Murahashi | Process for producing epoxide |
-
1990
- 1990-08-09 JP JP2212459A patent/JP2911192B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0495079A (en) | 1992-03-27 |
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