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JP2872158B2 - Wire bonding method and apparatus - Google Patents

Wire bonding method and apparatus

Info

Publication number
JP2872158B2
JP2872158B2 JP30808096A JP30808096A JP2872158B2 JP 2872158 B2 JP2872158 B2 JP 2872158B2 JP 30808096 A JP30808096 A JP 30808096A JP 30808096 A JP30808096 A JP 30808096A JP 2872158 B2 JP2872158 B2 JP 2872158B2
Authority
JP
Japan
Prior art keywords
metal wire
lead
wire
semiconductor chip
thin metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP30808096A
Other languages
Japanese (ja)
Other versions
JPH10150067A (en
Inventor
賢二 綿屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YAMAGUCHI NIPPON DENKI KK
Original Assignee
YAMAGUCHI NIPPON DENKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YAMAGUCHI NIPPON DENKI KK filed Critical YAMAGUCHI NIPPON DENKI KK
Priority to JP30808096A priority Critical patent/JP2872158B2/en
Publication of JPH10150067A publication Critical patent/JPH10150067A/en
Application granted granted Critical
Publication of JP2872158B2 publication Critical patent/JP2872158B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/7825Means for applying energy, e.g. heating means
    • H01L2224/783Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301Capillary
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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    • H01L2924/01005Boron [B]
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    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01L2924/01013Aluminum [Al]
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    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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    • H01L2924/01033Arsenic [As]
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2924/01082Lead [Pb]

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、リードフレームに
搭載される方形状の半導体チップの周辺に形成された電
極パッドとこの半導体チップの周囲を囲んで配置され半
導体チップに対応するリードフレームのリードとをフー
プ状に金属細線で接続するワイヤボンディング方法およ
びその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode pad formed around a rectangular semiconductor chip mounted on a lead frame, and a lead of a lead frame corresponding to the semiconductor chip and arranged around the semiconductor chip. And a wire bonding method for connecting a wire to a hoop by a thin metal wire.

【0002】[0002]

【従来の技術】通常、半導体装置の製造工程にて表面に
半導体素子や配線が形成された半導体チップをリードフ
レームに搭載するマウント工程以後は、搭載された半導
体チップの電極パッドとリードフレームのリードとを金
属細線で接続するワイヤボンディング工程がある。この
ワイヤボンディング工程では、前工程での半導体チップ
の搭載位置ずれによる金属細線の半導体チップへの短絡
や隣接する金属細線同志の接触など種々の問題を起して
いた。
2. Description of the Related Art Usually, in a semiconductor device manufacturing process, after a mounting process of mounting a semiconductor chip having a semiconductor element or wiring formed on a surface thereof on a lead frame, an electrode pad of the mounted semiconductor chip and a lead of the lead frame are mounted. And a wire bonding step of connecting the above with a thin metal wire. In this wire bonding step, various problems such as short-circuiting of the thin metal wire to the semiconductor chip due to the mounting position shift of the semiconductor chip in the previous process and contact between adjacent thin metal wires have occurred.

【0003】このような搭載される半導体チップの位置
ずれによるワイヤリング上の問題を解消する技術として
特開平2一18195号公報に開示されている。このワ
イヤボンディング装置は、リードと半導体チップとの相
対位置を撮像するITVカメラと、ITVカメラの撮像
信号から半導体チップの接続位置とリードの接続位置を
認識する認識装置と、認識されたリードの接続位置と半
導体チップの電極パッドの接続位置との距離を演算し金
属細線の長さを求めるとともに二つの値が許容値の範囲
内に前記接続位置を補正する演算処理手段及びシーケン
ス制御コントローラとを備えている。
[0003] Japanese Patent Application Laid-Open No. 218195/1990 discloses a technique for solving the problem of wiring due to the displacement of the mounted semiconductor chip. The wire bonding apparatus includes an ITV camera for imaging a relative position between a lead and a semiconductor chip, a recognition device for recognizing a connection position of a semiconductor chip and a connection position of a lead from an imaging signal of the ITV camera, and a connection of the recognized lead. A calculating means for calculating the distance between the position and the connection position of the electrode pad of the semiconductor chip to determine the length of the thin metal wire and correcting the connection position so that the two values are within an allowable value range; and a sequence controller. ing.

【0004】また、このワイヤボンディング装置の動作
は、まず、リードフレームに基準位置からずれてマウン
トされた半導体チップの接続位置とリードの接続位置を
ITVカメラと認識装置で読み込み、マウントされた半
導体チップの電極パッドの接続点と電極パッドに対応す
るリードの接続点の隔たり寸法が許容値を満足するか否
かを判定し、許容値の範囲以内であれば、ズレ量を補正
するようにXYステージを移動させボンディングツール
を下降し半導体チップの電極パッドとこれに対応するリ
ードとを金属細線で接続する。
The operation of this wire bonding apparatus is as follows. First, the connection position of a semiconductor chip mounted on a lead frame deviated from a reference position and the connection position of the lead are read by an ITV camera and a recognition device, and the mounted semiconductor chip is read. The XY stage determines whether the gap between the connection point of the electrode pad and the connection point of the lead corresponding to the electrode pad satisfies the allowable value, and if the distance is within the allowable value, corrects the deviation amount. Is moved to lower the bonding tool to connect the electrode pads of the semiconductor chip and the corresponding leads with thin metal wires.

【0005】このように電極パッドとリード毎にズレ量
を補正し、電極パッドの接続点とリードの接続点の距離
に対応する金属細線の長さを決め、求められたの長さの
金属細線を供給することによって、余分に送られる金属
細線の弛みによって金属細線同志の短絡や、送り不足に
よる低いループによる金属細線の半導体チップへの短絡
を防止していた。
As described above, the amount of displacement is corrected for each electrode pad and each lead, the length of the thin metal wire corresponding to the distance between the connection point of the electrode pad and the connection point of the lead is determined, and the length of the thin metal wire having the obtained length is determined. The short circuit between the fine metal wires due to the slack of the fine metal wire sent excessively and the short circuit of the fine metal wire to the semiconductor chip due to a low loop due to insufficient feeding are prevented.

【0006】[0006]

【発明が解決しようとする課題】上述した従来のワイヤ
ボンディング装置では、二次元的距離に対応して送り込
む金属細線の長さを予じめ決めているものの、ワイヤ供
給部から金属細線を送るのに、センサで金属細線を検知
する毎にステッピングモータの一定角度に回転させステ
ップ状に金属細線を送り所望の長さを供給しているで、
ボンディングツール上昇と下降とセンサのタイミングに
よりステップ状に送られる金属細線の長さの範囲内でば
らつきを生じさせ、金属細線同志の短絡や半導体チップ
への金属細線の接触を起さないまでも、フープ状に形成
される金属細線の高さにばらつきが生ずる。この金属細
線のフープ高さが高いと、この後の樹脂封止工程におい
て半導体チップを包むパッケージ体から金属細線が露出
するという品質の重大な欠陥をもたらす。特に、近年、
半導体装置のパッケージ体の厚さが益々薄くなり、この
問題が深刻な問題となっている。
In the above-described conventional wire bonding apparatus, although the length of the thin metal wire to be fed is determined in advance in accordance with the two-dimensional distance, the length of the thin metal wire fed from the wire supply unit is reduced. Each time a thin metal wire is detected by the sensor, the stepping motor is rotated at a fixed angle and the thin metal wire is sent in a step shape to supply a desired length.
Due to the timing of the bonding tool ascending and descending and the timing of the sensor, variations occur within the length of the thin metal wire sent in a step-like manner, even if short-circuiting of the thin metal wires and contact of the thin metal wire to the semiconductor chip do not occur. The height of the thin metal wire formed in a hoop shape varies. If the hoop height of the fine metal wire is high, there is a serious defect in quality that the fine metal wire is exposed from a package body surrounding the semiconductor chip in a resin sealing step. Especially in recent years,
The thickness of the package of the semiconductor device is becoming increasingly thinner, and this problem has become a serious problem.

【0007】従って、本発明の目的は、半導体チップの
電極パットと電極パットと対応するリードとを接続する
金属細線のフープ高さを揃えて金属細線を接合するワイ
ヤーボンディングを提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a wire bonding method for joining metal fine wires by aligning the hoop heights of the metal wires connecting the electrode pads of the semiconductor chip and the leads corresponding to the electrode pads.

【0008】[0008]

【課題を解決するための手段】本発明の特徴は、リード
フレームに搭載される方形状の半導体チップの周辺に形
成された電極パッドとこの半導体チップに対応する前記
リードフレームのリードとをフープ状に金属細線で接続
するワイヤボンディング方法において、前記金属細線に
おける前記リードの接続点と前記電極パッドの接続点と
の相対距離と前記金属細線のフープ高さで形成される軌
跡曲線を近似の二次函数曲線に換算して前記金属細線の
長さを求め、求められた長さの前記金属細線で前記電極
パッドと前記リードを接合するワイヤボンディング方法
である。
The feature of the present invention is that an electrode pad formed around a rectangular semiconductor chip mounted on a lead frame and a lead of the lead frame corresponding to the semiconductor chip are formed in a hoop shape. A wire bonding method of connecting a lead line and a connection point of the electrode pad in the thin metal wire and an approximate quadratic trajectory curve formed by a hoop height of the thin metal wire. in terms of function curve calculated the length of the thin metal wire, Ru wire bonding method der for joining the leads and the electrode pads by the length of the thin metal wires obtained.

【0009】本発明の他の特徴は、載置台に載置され
ードフレームと該リードフレームに載置された半導体
チップを撮像するITVカメラと、このITVカメラの
撮像信号を入力し前記半導体チップおよびリードならび
に電極パッドの位置を認識する認識装置と、この認識装
置からの情報データにより得られる前記リードの接続点
と前記電極パッドの接続点との相対距離と予じめ決めら
た金属細線のフープ高さで形成される前記金属細線の
軌跡曲線を近似の二次函数曲線に換算して前記金属細線
の長さを求める演算処理部と、求められた長さの前記
属細線をボンディングツールに送り込むワイヤ供給部
と、ボンディングヘッドの前記ボンディングツールの上
下動作および前記ボンディングヘッドをXY方向に移動
させるステージの移動動作ならびに前記ワイヤ供給部を
制御するとともに前記認識装置および前記演算処理部の
シーケンス動作を制御する制御部とを備えるワイヤボン
ディング装置である。
[0009] Other features of the invention, Ru is mounted on the mounting table
And ITV camera for imaging a semiconductor chip mounted on rie de frame and the lead frame, and recognizing device the position of the input to the semiconductor chip and the lead and the electrode pad an imaging signal of the ITV camera, from the recognition device second information and the connection point of the lead obtained by the data of the approximate trajectory curve of the thin metal wires formed by hoop height relative distance and pre Ji because-determined metallic thin wire and a connection point of the electrode pads an arithmetic processing unit in terms of the following function curve determining the length of the thin metal wire, and the wire feed unit for feeding the gold <br/> genus fine line lengths determined by the bonding tool, the bonding tool of the bonding head Up and down movement, the movement of the stage for moving the bonding head in the XY directions, and the control of the wire supply unit. A wire bonding apparatus and a control unit for controlling the sequence operation of the recognition unit and the arithmetic processing unit.

【0010】[0010]

【発明の実施の形態】次に、本発明について図面を参照
して説明する。
Next, the present invention will be described with reference to the drawings.

【0011】図1は本発明の一実施の形態のワイヤボン
ディング方法を説明するための半導体チップの電極パッ
ドとリードとの相対位置を示す平面図およびAA断面図
ならびにBB断面図である。この発明に至るまでの経過
を説明すると、まず、図1(a)に示すように、半導体
チップ14の電極パッド16a,16bと接続すべきリ
ード15a,15bは対応するように配置されている。
そして、2次元的に相対距離を見ると、電極パッド16
aの接続点とリード15aの接続点との距離と比べ、電
極パッド16bの接続点とリード15bとの接続点の距
離の方が長い。また、図1(b)および(c)に示すよ
うに、ボンディングツール18の上昇限点をhとする
と、2次元的に距離が短い金属細線17aと長い金属細
線17bの軌跡曲線を見ると、金属細線17aと金属細
線17bの長さの差異によるなだらかさが異なるものの
金属細線17a,17bのなす軌跡曲線は概ね二次函数
曲線に近似している。
FIG. 1 is a plan view, an AA sectional view, and a BB sectional view showing a relative position between an electrode pad and a lead of a semiconductor chip for explaining a wire bonding method according to an embodiment of the present invention. To explain the process leading to the present invention, first, as shown in FIG. 1A, the leads 15a and 15b to be connected to the electrode pads 16a and 16b of the semiconductor chip 14 are arranged so as to correspond to each other.
Then, looking at the relative distance in two dimensions, the electrode pad 16
The distance between the connection point of the electrode pad 16b and the connection point of the lead 15b is longer than the distance between the connection point of a and the connection point of the lead 15a. Further, as shown in FIGS. 1B and 1C, if the ascending limit point of the bonding tool 18 is h, the trajectory curves of the short metal wire 17a and the long metal wire 17b having a short distance in two dimensions are as follows. Although the smoothness is different due to the difference in the length of the thin metal wires 17a and 17b, the locus curves formed by the thin metal wires 17a and 17b are almost similar to quadratic function curves.

【0012】そこで、金属細線17a,17bが半導体
チップ14に接触しない程度の金属細線17aおよび1
7bのフープの最小の高さhとし、2次元的の接続点の
相対距離の長さに応じて軌跡曲線を描く金属細線の長さ
を設定して送れば、送られる金属細線の過不足による前
述の課題を解決することになる。
Therefore, the thin metal wires 17a and 17b are so small that the thin metal wires 17a and 17b do not contact the semiconductor chip 14.
If the minimum height h of the hoop of 7b is set and the length of the thin metal wire that draws the trajectory curve is set according to the length of the relative distance between the two-dimensional connection points and sent, the excess or deficiency of the sent thin metal wire results. The above-mentioned problem will be solved.

【0013】ここで、金属細線の軌跡曲線の長さを求め
るのに、金属細線の軌跡曲線を、例えば、二次函数曲線
をY=−K(X+R)2 とすると、この式のK値はなだ
らかさを決める値であり、電極パッド16a,16bの
接続点とリード15a,15bの接続点との2次元的距
離Lの比で決められる。例えば、リード15aと電極パ
ッド16aのように相対距離が短い場合を、例えば、K
=1とすると、hを一定にする限り、相対距離の長いリ
ード15bと電極パッドの金属細線の軌跡は、例えば、
K=1/1.3というように、ややなだらかな軌跡曲線
となる。
In order to determine the length of the locus curve of the thin metal wire, if the locus curve of the thin metal wire is Y = -K (X + R) 2 , for example, the quadratic function curve is given by the following equation. This is a value that determines smoothness, and is determined by a ratio of a two-dimensional distance L between a connection point between the electrode pads 16a and 16b and a connection point between the leads 15a and 15b. For example, when the relative distance is short such as the lead 15a and the electrode pad 16a, for example, K
Assuming that h is constant, the trajectory of the lead 15b having a long relative distance and the thin metal wire of the electrode pad is, for example, as follows:
A slightly gentle locus curve is obtained, such as K = 1 / 1.3.

【0014】次に、金属細線の長さを求めるには、図1
(b)および図1(c)の断面線AAあるいはBBを含
む垂直な面をXY座標面とし、このXY座標面での軌跡
曲線をもつ金属細線17aおよび17bの長さを求め
る。これには上述した式を利用して、Rはボンディング
ツール18の位置座標、Kは定数、半導体チップ14の
電極パッド16a,16bの接続点とリード15a,1
5bの接続点の座標値を演算処理装置に入れ、変換すべ
き二次函数曲線を求める。そして、この二次函数曲線か
ら各点における接線を求め、この接線を斜線とする小さ
い直角三角形から斜線の長さを求め、リード15a,1
5bから電極パッド16a,16bまでの細かく分割し
た各点における斜線の長さを合計し金属細線17a,1
7bの長さを求める。
Next, in order to determine the length of the thin metal wire, FIG.
A vertical plane including the cross section line AA or BB in FIG. 1B and FIG. 1C is defined as an XY coordinate plane, and the lengths of the thin metal wires 17a and 17b having the locus curves on the XY coordinate plane are determined. For this, R is the position coordinate of the bonding tool 18, K is a constant, the connection point between the electrode pads 16 a and 16 b of the semiconductor chip 14 and the leads 15 a and 1
The coordinate value of the connection point 5b is input to the arithmetic processing unit, and a quadratic function curve to be converted is obtained. Then, a tangent at each point is obtained from the quadratic function curve, and a length of the oblique line is obtained from a small right triangle having the tangent as an oblique line.
5b to the electrode pads 16a and 16b, the sum of the lengths of the oblique lines at each of the finely divided points is calculated.
Find the length of 7b.

【0015】また、この金属細線の軌跡曲線を二次函数
曲線だけでなく、フープ状に曲る部分のみ二次函数曲線
とし、残りの半導体チップの電極パッドとリードの接続
点は一次直線に変換してもよい。どちらかを選択するに
は、金属細線の材質を金にするかアルミニュームにする
かで決められる。
Further, the locus curve of the thin metal wire is not only a quadratic function curve but also a hoop-shaped curved portion is a quadratic function curve, and the connection points between the electrode pads and the leads of the remaining semiconductor chip are converted into a linear line. May be. The choice between them is determined by whether the material of the thin metal wire is gold or aluminum.

【0016】図2は本発明の一実施の形態におけるワイ
ヤボンディング装置を説明するためのブロック図であ
る。このワイヤボンデイング装置は、図1に示すよう
に、載置台11に載置されるリードフレームとリードフ
レームに載置された半導体チップ12を撮像するITV
カメラ5と、ITVカメラ5の撮像信号により撮像画像
を表示するモニタテレビ4と、ITVカメラの撮像信号
を入力し半導体チップ12およびリードならびに電極パ
ッドの接続位置を認識する認識装置2と、リードの接続
すべき位置と電極パットの接続すべき位置およびこれら
リードと電極パッドとを繋ぎ形成されるフープ状の金属
細線の軌跡曲線に近似の二次函数曲線の波形を定める定
数を予じめ設定する設定部3aと、認識装置2から位置
情報と設定部3aから取り込む軌跡曲線と波形定数とか
ら金属細線の長さを演算する演算処理部3と、演算処理
部3からの信号で決められた長さの金属細線を送り込む
ように金属細線供給部に指令するワイヤ供給制御部1
と、ボンディングヘッド7のボンディングツールの上下
動作およびXYステージ9の移動動作を制御するととも
に装置のシーケンス動作を制御する制御部6とを備えて
いる。
FIG. 2 is a block diagram for explaining a wire bonding apparatus according to one embodiment of the present invention. As shown in FIG. 1, this wire bonding apparatus includes an ITV for imaging a lead frame mounted on a mounting table 11 and a semiconductor chip 12 mounted on the lead frame.
A camera 5, a monitor television 4 for displaying a captured image based on an image signal of the ITV camera 5, a recognition device 2 for inputting an image signal of the ITV camera and recognizing connection positions of the semiconductor chip 12, the leads, and the electrode pads; Set in advance the constants that determine the waveforms of the quadratic function curves that approximate the locus curves of the hoop-shaped metal wires formed by connecting the positions to be connected and the electrode pads, and the leads and electrode pads that connect these leads and electrode pads. A setting unit 3a, an arithmetic processing unit 3 for calculating the length of the thin metal wire from the position information from the recognition device 2, a trajectory curve and a waveform constant taken from the setting unit 3a, and a length determined by a signal from the arithmetic processing unit 3 Supply control unit 1 for instructing the thin metal wire supply unit to feed the thin metal wire
And a control unit 6 for controlling the vertical movement of the bonding tool of the bonding head 7 and the movement of the XY stage 9 and for controlling the sequence operation of the apparatus.

【0017】なお、送り込む金属細線の長さが決定した
ら、ボンディングツールが下降する寸前クランパが金属
細線を保持固定すると同時にワイヤ供給部8のステッピ
ングモータを回転させ金属細線の供給を開始する。そし
て、最初のリードもしくは電極パッドに金属細線を接合
し、次の電極パッドもしくはリードに金属細線を接合し
たら丁度金属細線の供給する長さが終了する程度にワイ
ヤ供給部8の送り速度とボンディングツールおよびXY
ステージの移動速度とがマッチングするように設定する
ことが望ましい。
When the length of the metal wire to be fed is determined, the clamper immediately before the lowering of the bonding tool holds and fixes the metal wire, and at the same time, rotates the stepping motor of the wire supply unit 8 to start supplying the metal wire. Then, the metal wire is bonded to the first lead or the electrode pad, and the metal wire is bonded to the next electrode pad or the lead. And XY
It is desirable to set so that the moving speed of the stage matches.

【0018】図3は図2のワイヤボンディング装置の動
作を説明するためのフローチャートである。まず、図3
のステップAで、これからワイヤリングしようとする半
導体チップを搭載したリードフレームの各リードと各リ
ードに対応する電極パッドの位置座標と軌跡曲線と前述
の乗数Kを図2の設定部3aに登録する。
FIG. 3 is a flowchart for explaining the operation of the wire bonding apparatus of FIG. First, FIG.
In step A, the coordinates of the leads of the lead frame on which the semiconductor chip to be wired is to be mounted, the electrode pads corresponding to the leads, the locus curve, and the multiplier K are registered in the setting unit 3a of FIG.

【0019】次に、ステップBで、半導体チップを搭載
したリードフレームを図2の載置台11に位置決め載置
する。次に、ステップCで、図2のITVカメラ5で半
導体チップのワイヤリングしようとする電極パッドと電
極パッドに対応するリードを撮像し、図2の認識装置2
でその電極パッドとリードの位置座標を認識する。次
に、ステップDで、図2の制御部6内の比較部により設
定部3aに記憶された位置座標と認識装置2で認識され
た位置座標と比較し、位置ズレが許容範囲にあるか否か
を判定する。
Next, in step B, the lead frame on which the semiconductor chip is mounted is positioned and mounted on the mounting table 11 of FIG. Next, in step C, the ITV camera 5 of FIG. 2 images the electrode pads to be wired to the semiconductor chip and the leads corresponding to the electrode pads, and the recognition device 2 of FIG.
Then, the position coordinates of the electrode pad and the lead are recognized. Next, in step D, the comparison unit in the control unit 6 of FIG. 2 compares the position coordinates stored in the setting unit 3a with the position coordinates recognized by the recognition device 2 to determine whether the position deviation is within an allowable range. Is determined.

【0020】もし、位置ズレが許容範囲を越えていた
ら、ステップIで、そのリードフレームを載置台11か
ら外し、ステップBに戻り新なリードフレームを搭載す
る。また、位置ズレが許容範囲内であれば、ステップE
に進み、位置ズレを補正する必要があるか否かを判定す
る。ここで、補正するか否かの判定値は図2のXYステ
ージの移動し得る分解能力による。
If the positional deviation exceeds the allowable range, the lead frame is removed from the mounting table 11 in step I, and the process returns to step B to mount a new lead frame. If the positional deviation is within the allowable range, step E
To determine whether it is necessary to correct the positional deviation. Here, the determination value of whether or not to perform the correction depends on the movable resolution of the XY stage in FIG.

【0021】次に、補正の必要があれば、図2の演算処
理部3でリードと電極パッドの位置座標のズレを演算補
正し、図2の設定部3aに記憶された位置座標を修正す
る。次に、ステップGで、位置ズレが補正された場合お
よび補正しない場合でも、図2の設定部3aから位置座
標情報および軌跡曲線データを取り出し図2の演算処理
部3に取り入れ、金属細線の長さを算出し図2のワイヤ
供給制御部1のバッファメモリに長さデータ情報を設定
する。
Next, if correction is necessary, the arithmetic processing unit 3 in FIG. 2 calculates and corrects the deviation between the position coordinates of the lead and the electrode pad, and corrects the position coordinates stored in the setting unit 3a in FIG. . Next, in step G, even when the positional deviation is corrected or not corrected, the position coordinate information and the locus curve data are taken out from the setting unit 3a in FIG. 2 and taken into the arithmetic processing unit 3 in FIG. Then, the length data information is set in the buffer memory of the wire supply control unit 1 shown in FIG.

【0022】次に、ステップHで、制御部6が設定部3
aのデータを取り込み図2のXYステージ9およびボン
ディングヘッド10の動作を制御すると同時にワイヤ供
給制御部1がワイヤ供給部8を動作させ電極パッドと電
極パッドに対応するリードとを金属細線で接続する。そ
して、ステップCに戻り、次の電極パッドとこの電極パ
ッドに対応するリードの位置座標を認識する。このよう
な動作を繰返して半導体チップの各電極パッドとそれぞ
れの電極パッドに対応するリードとの金属細線による接
続を完了する。
Next, in step H, the control unit 6
The data of “a” is taken in, and at the same time the operations of the XY stage 9 and the bonding head 10 in FIG. 2 are controlled, the wire supply control unit 1 operates the wire supply unit 8 to connect the electrode pads and the leads corresponding to the electrode pads with thin metal wires. . Then, returning to step C, the position coordinates of the next electrode pad and the lead corresponding to this electrode pad are recognized. By repeating such an operation, the connection of each electrode pad of the semiconductor chip and the lead corresponding to each electrode pad by the thin metal wire is completed.

【0023】[0023]

【発明の効果】上述したように本発明は、電極パッドと
リードで位置ズレが生じても、その都度、電極パッドと
電極パッドと対応するリードとの相対距離と接続する金
属配線のフープ高さを含む長さを算出し、算出された長
さの金属細線を供給することによって、金属細線のフー
プ高さが一定にワイヤリングできるので、金属細線同志
あるいは半導体チップの接触は皆無となると同時に後工
程の樹脂封止によるパッケージ体に金属細線が露出させ
ることなく安定したパッケージ体の品質が得られるとい
う効果がある。
As described above, according to the present invention, even when a positional shift occurs between the electrode pad and the lead, the relative distance between the electrode pad and the corresponding lead and the height of the hoop of the metal wiring to be connected each time the position shift occurs. By calculating the length including the metal wire and supplying the calculated length of the metal wire, the hoop height of the metal wire can be made constant, so that there is no contact between the metal wire or the semiconductor chip and the post-process. There is an effect that a stable quality of the package body can be obtained without exposing the fine metal wires to the package body by the resin sealing.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態のワイヤボンディング方
法を説明するための半導体チップの電極パッドとリード
との相対位置を示す平面図およびAA断面図ならびにB
B断面図である。
FIG. 1 is a plan view showing a relative position between an electrode pad and a lead of a semiconductor chip for explaining a wire bonding method according to an embodiment of the present invention; FIG.
It is B sectional drawing.

【図2】本発明の一実施の形態におけるワイヤボンディ
ング装置を説明するためのブロック図である。
FIG. 2 is a block diagram illustrating a wire bonding apparatus according to one embodiment of the present invention.

【図3】図2のワイヤボンディング装置の動作を説明す
るためのフローチャートである。
FIG. 3 is a flowchart illustrating an operation of the wire bonding apparatus of FIG. 2;

【符号の説明】[Explanation of symbols]

1 ワイヤ供給制御部 2 認識装置 3 演算処理部 3a 設定部 4 モニタテレビ 5 ITVカメラ 6 制御部 7 ボンディングヘッド 8 ワイヤ供給部 9 XYステージ 10 ボンディングツール 11 積載台 12 半導体チップ DESCRIPTION OF SYMBOLS 1 Wire supply control part 2 Recognition device 3 Arithmetic processing part 3a Setting part 4 Monitor television 5 ITV camera 6 Control part 7 Bonding head 8 Wire supply part 9 XY stage 10 Bonding tool 11 Loading table 12 Semiconductor chip

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 リードフレームに搭載される方形状の半
導体チップの周辺に形成された電極パッドとこの半導体
チップに対応する前記リードフレームのリードとをフー
プ状に金属細線で接続するワイヤボンディング方法にお
いて、前記金属細線における前記リードの接続点と前記
電極パッドの接続点との相対距離と前記金属細線のフー
プ高さで形成される軌跡曲線を近似の二次函数曲線に換
算して前記金属細線の長さを求め、求められた長さの前
記金属細線で前記電極パッドと前記リードを接合するこ
とを特徴とするワイヤボンディング方法。
1. A wire bonding method for connecting an electrode pad formed around a square semiconductor chip mounted on a lead frame and a lead of the lead frame corresponding to the semiconductor chip by a thin metal wire in a hoop shape. The locus curve formed by the relative distance between the connection point of the lead and the connection point of the electrode pad in the thin metal wire and the hoop height of the thin metal wire is converted into an approximate quadratic function curve, and the A wire bonding method comprising: determining a length; and bonding the electrode pad and the lead with the metal wire having the determined length.
【請求項2】 載置台に載置されるリードフレームと該
リードフレームに載置された半導体チップを撮像するI
TVカメラと、このITVカメラの撮像信号を入力し前
記半導体チップおよびリードならびに電極パッドの位置
を認識する認識装置と、この認識装置からの情報データ
により得られる前記リードの接続点と前記電極パッドの
接続点との相対距離と予じめ決められた金属細線のフー
プ高さで形成される前記金属細線の軌跡曲線を近似の二
次函数曲線に換算して前記金属細線の長さを求める演算
処理部と、求められた長さの前記金属細線をボンディン
グツールに送り込むワイヤ供給部と、ボンディングヘッ
ドの前記ボンディングツールの上下動作および前記ボン
ディングヘッドをXY方向に移動させるステージの移動
動作ならびに前記ワイヤ供給部を制御するとともに前記
認識装置および前記演算処理部のシーケンス動作を制御
する制御部とを備えることを特徴とするワイヤボンディ
ング装置。
A lead frame mounted on a mounting table;
I for imaging a semiconductor chip mounted on a lead frame
Before inputting the TV camera and the imaging signal of this ITV camera
Position of semiconductor chip and lead and electrode pad
Recognition device that recognizes and information data from the recognition device
Of the electrode pad and the connection point of the lead obtained by
The relative distance to the connection point and the
The trajectory curve of the thin metal wire formed at the
Calculation to calculate the length of the metal wire by converting to the following function curve
Processing part and bondin the metal wire of the required length
Wire feeding section for feeding
Up and down movement of the bonding tool and
Stage movement to move the loading head in the X and Y directions
Controls the operation and the wire feeder and
Controls the sequence operation of the recognition device and the arithmetic processing unit
A wire bonder, comprising:
Device.
JP30808096A 1996-11-19 1996-11-19 Wire bonding method and apparatus Expired - Fee Related JP2872158B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30808096A JP2872158B2 (en) 1996-11-19 1996-11-19 Wire bonding method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30808096A JP2872158B2 (en) 1996-11-19 1996-11-19 Wire bonding method and apparatus

Publications (2)

Publication Number Publication Date
JPH10150067A JPH10150067A (en) 1998-06-02
JP2872158B2 true JP2872158B2 (en) 1999-03-17

Family

ID=17976641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30808096A Expired - Fee Related JP2872158B2 (en) 1996-11-19 1996-11-19 Wire bonding method and apparatus

Country Status (1)

Country Link
JP (1) JP2872158B2 (en)

Also Published As

Publication number Publication date
JPH10150067A (en) 1998-06-02

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