JP2866760B2 - Photosensitive lithographic printing plate automatic developing machine - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an image was baked photosensitive lithographic printing plate related to the development processing to that sense light sensitive planographic printing plate automatic developing machine.

[0002]

2. Description of the Related Art In a photosensitive lithographic printing plate automatic developing machine for processing a photosensitive lithographic printing plate, which is a photosensitive material, generally, the developing, rinsing,
Perform processing such as desensitization processing.

[0003] In many cases, a developing process using a developer in an automatic photosensitive lithographic printing plate developing machine involves immersing the photosensitive lithographic printing plate in a developing solution stored in a developing tank in the photosensitive lithographic printing plate automatic developing machine. It is carried in a state where it is set. At this time, in the initial stage of development, the photosensitive lithographic printing plate is simply immersed in the developing solution, and the developing solution penetrates into the unexposed portion of the photosensitive layer until the photosensitive lithographic printing plate is transported in the middle of the developing tank. Like that. Thereafter, from the middle to the downstream side of the developing tank, the photosensitive layer, waste and the like eluted by the developer from the surface of the photosensitive lithographic printing plate are removed by a developing brush or the like while stirring the developer.

Various developing solutions containing a development inhibitor have been proposed as developing solutions for developing the photosensitive lithographic printing plates.
The development inhibitor adheres to the surface of the photosensitive layer of the photosensitive lithographic printing plate to form an insoluble film, and suppresses the elution of the photosensitive layer to enhance development stability.

When developing a photosensitive lithographic printing plate, it is preferable to always supply a fresh developing solution to the surface of the photosensitive lithographic printing plate. When a fresh developing solution is supplied to the surface of the photosensitive lithographic printing plate by spraying a developing solution on the surface of the photosensitive lithographic printing plate, uneven development and the like occur, which is not preferable. For this reason, in a conventional automatic developing machine, in the upstream part of the developing tank, fresh developer is retained near the conveying path of the photosensitive lithographic printing plate, and a developing solution spray or a developing brush is provided from the middle stream to the downstream part. The photosensitive layer eluted by the developer is removed from the surface of the photosensitive lithographic printing plate.

Further, in an automatic photosensitive lithographic printing plate developing machine, after the developed photosensitive lithographic printing plate is washed in a rinsing tank or a washing tank, a finisher solution is applied to desensitize the plate and protect the plate surface. We are dried.

[0007]

However, in such a photosensitive lithographic printing plate automatic developing machine, the edge of the halftone dot of the finished photosensitive lithographic printing plate is poor and the photosensitive lithographic printing plate is poor unless used considerably. Insufficient vacuum adhesion during exposure to light, or only a halftone image such as baking blur generated when dust adheres may be obtained, and the resulting photosensitive lithographic printing plate is a high quality printing plate. Was not enough.

The present invention has been made in consideration of the above-mentioned facts, and is intended to obtain a printing plate having a sharp dot edge .
And to provide a sensitive optical lithographic printing plate automatic developing machine.

[0009]

Means for Solving the Problems] This onset bright, the image on the photosensitive layer
Developing solution for developing photosensitive lithographic printing plate exposed
And a photosensitive lithographic printing plate in the developing tank.
Transport means for transporting while immersing,
In the width direction on the photosensitive layer of the photosensitive lithographic printing plate
Exposes photosensitive layer by exerting physical action almost uniformly along
Uniform removal on the photosensitive layer by forming a removal means that removes according to the image
A photosensitive lithographic plate provided with a spray means for discharging a developer
A printing plate automatic developing machine, wherein
Developing for communication and supply to said spray means
An auxiliary tank for accommodating a liquid;
Temperature control means for maintaining the developing solution at a predetermined temperature.
Characterized in that was.

[0010]

[0011]

[0012]

[0013]

[0014]

The photosensitive lithographic printing plate automatic developing machine of the present invention has a
Photosensitive while immersed in the developer in the developing tank
The lithographic printing plate is transported and processed. In the developer tank,
Facing the photosensitive lithographic printing plate transported by the transport means
Spray means such as a spray pipe is provided.
In the photosensitive lithographic printing plate automatic developing machine of the present invention,
An auxiliary tank is provided separately from the tank.
Is supplied to the spraying means. This
As a result, the surface of the photosensitive lithographic printing plate
A large amount of developer with a uniform temperature is sprayed continuously from the step
Process unevenness due to uneven developer temperature.
And not.

In the present invention, the photosensitive liquid is added to the developer.
Initial stage of immersing and transporting the printing plate (2 from the start of immersion)
６6 seconds) soak the developer into the photosensitive layer and then immediately
To, 1~10ml / sec · cm ^2, preferably 2~5ml / sec ·
It is possible to supply a large amount of developing solution Amount of cm ² to the photosensitive layer
More preferred. As a result, the photosensitive
The layer accelerates dissolution and is sprayed towards the photosensitive layer
With a large amount of developing solution or a developing brush provided as a removing means
Abolished photosensitive layer dissolved and eluted by rubbing
The object is removed from near the surface of the photosensitive lithographic printing plate. On the surface of the photosensitive layer that is not dissolved in the developing solution, a large amount of the developing solution is supplied or rubbed with a developing brush, so that the adsorption of the development inhibitor contained in the developing solution on the surface of the photosensitive layer is promoted, and the insoluble film is formed. Is formed. For this reason, the image portion and the non-image portion become clear at the early stage of development.

For the photosensitive lithographic printing plate automatic developing machine of the present invention .
As the developer to be used, those containing a development inhibitor described in JP-B-1-57895, JP-A-58-75152, JP-A-61-215554 and the like are preferable. An insoluble film can be formed on the surface of the photosensitive layer by the development inhibitor in the developer.

[0017]

[0018]

[0019]

The developer used in the automatic photosensitive lithographic printing plate developing machine of the present invention preferably contains a development inhibitor effectively. The development inhibitor in the developer discharged from the spray pipe forms an insoluble film on the surface of the photosensitive layer where the developer has not permeated, and promotes elution of only a predetermined portion of the photosensitive layer.

Meanwhile, if the spray or the developing brush of the developer from the start of immersion of the photosensitive lithographic printing plate of the developer after a long time of 7-30 seconds is to act, developer photosensitive layer before action The photosensitive layer is deeply penetrated deeply, and the photosensitive layer is excessively removed even in a part where the active exposure light near the halftone dot edge is small,
The so-called shoulder portion of the edge may become smooth, and the halftone dot may be poorly cut . In contrast, photosensitive lithographic printing
After soaking 2-6 seconds function the plate in a developer, that is, to the non-image portion is removed by bleeding narrowing optimum conditions of the developer to the shoulder portion of the halftone dot edge is immediately adsorb the development inhibitor
Thereby , a halftone dot with sharp edges can be formed. Moreover, baked blur are often active exposure light occurs slightly irradiated portion, likewise development inhibitor adsorption and shoulder portions of the halftone
It becomes difficult to develop and remains as an image ,
It will not be burnt.

The position where the spray pipes in the developer tank may vary depending on the length and the conveying speed of the conveying path of the photosensitive lithographic printing plate by the transfer means in the developing tank, preferably,
This is the position where the photosensitive lithographic printing plate acts on the photosensitive layer of the photosensitive lithographic printing plate 2 to 6 seconds after the start of immersion in the developer.

[0023]

[0024]

1 and 2 show a photosensitive lithographic printing plate automatic developing machine (hereinafter referred to as "PS plate processor") 10 according to this embodiment. PS version processor 10,
The photosensitive lithographic printing plate (hereinafter, referred to as “PS plate”) 12 on which an image has been printed by a printing device (not shown) is developed and dried. Note that a PS for which a development process is performed by the PS plate processor 10 according to the present embodiment.
The plate 12 has a positive photosensitive layer containing, for example, an o-quinonediazide compound on one surface.

As shown in FIG. 1, the PS plate processor 10 is configured by connecting a casing 14 and a casing 16 which cover an internal processing unit. In the casing 14 on the upstream side, an insertion table 18 is provided near the insertion port of the PS plate 12.
Is attached. The PS plate 12 is placed on the insertion table 18 with the photosensitive layer facing upward, and inserted into the casing 14 from the insertion port.

As shown in FIG.
Inside the PS plate 12, a developing unit 24 having a developing tank 20 for developing the PS plate 12 and an overflow tank 22 for collecting a developing solution overflowing from the developing tank 20 is provided. A rinsing section 26 is provided for rinsing the developer by washing it with water. The rinsing section 26 is provided with a rinsing tank 28.

A pair of transport rollers 30 is disposed on the side of the developing section 24 where the PS plate 12 is inserted into the developing tank 20.
The PS plate 12 is inserted between the pair of transport rollers 30. The pair of transport rollers 30 feeds the PS plate 12 toward the bottom of the developing tank 20 at an angle of about 15 ° with respect to the horizontal direction. However, when it is desired to avoid pressure fogging of the PS plate 12 before the completion of the developing process, for example, when processing the PS plate 12 having a high sensitivity, the PS plate 12 is set at 15 ° from the horizontal.
Send out at an angle between. When the length of the developing tank 20 is to be shortened and downsized, the PS plate 12 is
The transport roller 30 may be arranged at an angle of from 20 ° to 20 °.

As shown in FIG. 2, the developing tank 20 has a substantially inverted mountain shape in which the upper part is opened and the bottom center part is projected downward. The developing tank 20 contains a developing solution. The developer used in the present embodiment contains a development inhibitor (for example, Japanese Patent Publication No. 1-57895, Japanese Patent Application Laid-Open No. 58-75152, and Japanese Patent Application Laid-Open No. 61-215554). Etc.).

In the developing tank 20, a conveying means for conveying the PS plate 12 while immersing the PS plate 12 in a developing solution is provided.
A number of guide rollers 32 and 33 having the same diameter are provided along the transport path. These guide rollers 32 and 33 are skewers and are rotatably stretched between a pair of side plates of the developing tank 20. A guide roller 34 having a larger diameter than the guide roller 32 is provided above the guide roller 32 on the upstream side, and a rotating brush roller 36 and a guide roller 38 are provided above the guide roller 32 on the downstream side. The tank 20 is rotatably supported between a pair of side plates.

A pair of squeezing rollers 40 having a function of squeezing the surface of the PS plate 12 are provided at a central portion in the developing tank 20.
Are arranged. The material of the squeezing roller 40 is EPT, and its Vickers hardness is 40 to 50 degrees. The roller nip force of the pair of squeezing rollers 40 is 1 to 10 kg / cm ² ,
This pressure is applied by a roller nip torsion coil spring (not shown) applied to the bearing of the squeezing roller 40. A driving force of a driving unit (not shown) is transmitted to these guide rollers 32, 34, and 38, the rotating brush 36, and the squeezing roller 40 to rotate them, and convey the PS plate 12 at a constant speed.

The transport speed of the PS plate 12 in the PS plate processor 10 according to the present embodiment is, for example, 3 cm / s.
ec, the conveyance path length is 45 cm, that is, the development time is 15 seconds. In the vicinity of the center of the transport path in the developing tank 20, the pair of squeezing rollers 40 and the plurality of guide rollers 32 and 33 adjacent thereto are configured to transport the PS plate 12 upward with a radius of curvature of 300 to 350 mm. Are located. Therefore, the PS plate 12 that is nipped and transported by the pair of transport rollers 30 and inserted into the developing tank 20 is guided by the guide rollers 32, 3
The paper is passed diagonally downward by a plurality of guide rollers 32 and passes between the squeeze rollers 40. The squeezing roller 40 removes wastes eluted into the developer from the photosensitive layer side of the PS plate 12 (upper side in FIG. 2) from the surface, and the wastes are not conveyed to the downstream side as the PS plate 12 moves. To isolate.

The PS plate 1 sent out from the squeeze roller 40
2 is directed obliquely upward by guide rollers 32 and 33, is guided by a rotating brush 36 and guide rollers 38, and is discharged from the developing tank 20. By this, PS
The plate 12 is conveyed smoothly and reliably immersed in the developer without applying excessive force.

Guide roller 3 on the downstream side of squeeze roller 40
Reference numeral 3 denotes a skewer-type roller in which a plurality of elastic rotating members are pivotally supported about the rotation axis, and a hollow pipe is fixed at the position of the rotation axis. The hollow pipe is provided with a plurality of discharge holes opened between the elastic rotating members along the axial direction. A spray pipe 46 is provided on the opposite side of the PS plate 12 via the transport path. The spray pipe 46 has a plurality of discharge ports (not shown) communicating with the inside along the axial direction on the outer peripheral surface of the hollow pipe along the axial direction (the width direction of the transport path). The spray pipe 46 and the spray pipe 4 of the guide roller 33
2 has an inner diameter of 15.5 mm, an outer diameter of 16.5 mm, and a length of 1350
25mm diameter discharge port in a hollow pipe with one end closed
The developer is supplied in a row at mm intervals, and discharges a developing solution supplied by a developing solution supply unit described later toward both surfaces of the PS plate 12 being conveyed.

A spray pipe 44 characteristic of the present invention is provided upstream of the squeezing roller 40. In this method, the developer is discharged toward the photosensitive layer side of the PS plate 12 in a place where the PS plate 12 is immersed in the developer and does not take much time. Reject and supply fresh developer. Here, the spray pipe 44 will be described in detail.

As shown in FIG. 3, the spray pipe 4
Reference numeral 4 denotes a hollow pipe having an inner diameter of 15.5 mm, an outer diameter of 16.5 mm, a length A along the longitudinal direction of 1350 mm, and one end of which is closed. In the outer peripheral portion of the spray pipe 44, discharge ports 45 are bored in a line along the central axis, and communicate the outer peripheral edge with the hollow interior. The discharge port 45 has a diameter of 2 mm and a length B between the adjacent discharge ports 45 of 5 mm.

The spray pipe 44 discharges the developer supplied from the opening 44A (supplied from the direction of arrow C in FIG. 3) from each discharge port 45 in the direction of arrow D. This spray pipe 44, the width of P S plate 12 can be processed until a length of the 1300 mm.

As shown in FIG. 4, the spray pipe 4
4 is a PS plate 1 whose discharge port 45 is conveyed in the developing tank 20.
2 are disposed so as to be substantially opposed to each other. In the upstream part of the developing tank 20, the PS plate 12 is conveyed downward at an angle θ1 (about 15 °) with respect to the horizontal direction as described above, and the direction of the discharge port 45 is 45 ° downward and forward. Since the spray pipe 44 is fixed to the developing layer 20 such that
It is designed to be sprayed from obliquely upward at an angle θ2 (about 60 °) to the upstream side with respect to the transport direction.

The position E at which the developing solution discharged from the spray pipe 44 reaches the surface of the PS plate 12 is, for example, 1/3 of 15 cm of the path length of 45 cm in the developing tank 20 (when the PS plate 12 is immersed in the developing solution). The discharge angle of the developer and the position of the spray pipe 44 are set so that the discharge flow from the spray pipe 44 acts on the PS plate 12 after 5 seconds from the start. In addition, this position E and the discharge port 4 of the spray pipe 44
The distance F from the distance 5 is set between 3 and 15 mm. In the present embodiment, a developer is supplied to the spray pipe 44 at a rate of 70 l / min by a developer supply means described later. Therefore, about 3 ml / sec · cm ² is discharged to the PS plate 12 having a width of 130 cm conveyed at 3 cm / sec.

As shown in FIG. 2, an overflow tank 22 is provided downstream of the developing tank 20 in the transport direction, and the PS plate 12 sent out from the developing tank 20 is provided above the overflow tank 22. Is transported. The wall surface on the downstream side in the transport direction of the developing tank 20 is bent outward and the tip is located above the overflow tank 22. Therefore, when the developing solution in the developing tank 20 is full and overflows, the developing solution overflows and flows into the overflow tank 22.

On the insertion side of the pair of transport rollers 30, PS
A plate detection sensor 50 connected to the control unit 48 of the plate processor 10 is provided. With this plate detection sensor 50, P
The control unit 48 detects the transit time of the PS plate 12 at the insertion slot of the S-plate processor 10 and matches the processing speed (transport speed) of the PS plate 12 and the width dimension of the PS plate 12 set in the control unit 48 in advance. Is used to calculate the area of the PS plate 12 inserted into the PS plate processor 10. by this. The processing area of the inserted PS plate 12 can be known. The control unit 4 of the PS plate processor 10
At 8, the developer replenishing means described later is operated in accordance with the area of the PS plate 12 to be inserted.

The PS plate 12 of the pair of transport rollers 30
The insertion sheet presence / absence detection sensor 52 is arranged on the insertion side of the. The slip sheet presence / absence detection sensor 52 is connected to the control unit 48, and when slip sheet is attached to the back surface of the PS plate 12, the presence of the slip sheet is transmitted to the control unit 48 by an electric signal. It has become. As the slip sheet presence detection sensor 52, a contact type detection sensor or a non-contact type detection sensor can be used. As a contact-type detection sensor, for example, when the PS plate 12 is inserted, a contact is brought into contact with the back surface of the PS plate 12, and the resistance (impedance) value between the terminals is measured by a resistance measuring instrument. The presence of the slip sheet can be detected by utilizing the fact that the resistance value greatly differs depending on whether or not the slip sheet exists. Further, as a non-contact type, for example, there is a type in which light is emitted from the light projecting unit to the back surface of the PS plate 12, the reflected light is received by the light receiving unit, and the intensity of the reflected light is detected. May be used to detect the presence of the slip sheet.

A warning means 54 such as a buzzer or a warning light is connected to the control unit 48. When the control unit 48 detects that the slip sheet is attached to the back surface of the PS plate 12, When activated, a warning is issued to notify the operator that slip sheets are being deposited.

The liquid level of the developing solution in the developing tank 20 is covered with a floating lid 56. The floating lid 56 prevents deterioration of the developing solution due to the fact that the developing solution absorbs carbon dioxide in the air and neutralizes the alkali component in the developing solution. Since the floating lid 56 is made of foamed nylon, it floats on the liquid surface of the developer in the developing tank 20 and follows the vertical movement of the liquid surface.

On the other hand, as shown in FIG. 1, an auxiliary device 60 is provided adjacent to the PS plate processor 10. The auxiliary device 60 is internally covered by a casing 62, and a lid 64 is provided on an upper surface of the casing 62.

As shown in FIG. 2, this auxiliary device 60
An auxiliary tank 66 is housed inside a casing 62 (not shown in FIG. 2). This auxiliary tank 66
A larger amount of developing solution can be stored than the developing solution stored in the developing tank 20 of the PS plate processor 10. The developer is supplied from above the lid 64 shown in FIG. Note that the PS plate processor 10 according to the present embodiment is
The capacity of the developing tank 20 is about 45 liters (“l” is liter), and the capacity of the auxiliary tank 66 is capable of storing 180 liters or more of the developing solution. 180 liters of the charged liquid (developer) is stored four times as much as 45 liters of the charged liquid (developer initially stored). The capacities of the developing tank 20 and the auxiliary tank 66 are not limited to these.

As shown in FIG. 2, a floating lid 68 is provided on the level of the developing solution in the auxiliary tank 66, and the floating lid 68 is provided in the auxiliary tank 66 similarly to the floating lid 56 of the developing tank 20. Is prevented from contacting with outside air.

As shown in FIG. 1, the auxiliary device 60 is mounted on a gantry 72 supported from the floor by a plurality of legs 70. The height of each of these legs 70 is adjustable, and the auxiliary device 60 is supported at a predetermined height. As shown in FIG. 2, the bottom of the developing tank 20 of the PS plate processor 10 and the auxiliary tank 66 are connected by a pipe 74. Valves 76 and 78 are provided near the auxiliary tank 66 and the developing tank 20 in the middle of the pipe 74, respectively.
Is provided. Therefore, the liquid level of the developing tank 20 can be adjusted to a predetermined level by adjusting the height of the auxiliary device 60.

The side wall of the auxiliary tank 66 has a pipe 8
0 is connected to one end via a valve 82. This pipe 80 is connected to the PS plate processor 10 through a valve 84.
The valve 86 extends in the vicinity of the developing tank 20.
Branched into branch pipes 86 and 88 via A and 88A. The pipe 80 includes a valve 84 and branch pipes 86 and 8.
A filter 90, a flow meter 92, a pump 94, and an electric conductivity sensor 96 are provided between the branch unit 8 and the branch unit 8, and these are connected to the control unit 48 of the PS plate processor 10.

The branch pipes 86 and 88 communicate the pipe 80 with the spray pipe 44 and the spray pipes 42 and 46, respectively. Therefore, the pump 94 is controlled by the control unit 48.
Is driven, the developer in the auxiliary tank 66 is supplied to the spray pipes 42, 44, 46. The developer supplied to these spray pipes 42, 44, 46 is discharged onto the surface of the PS plate 12 transported in the developing tank 20. The volumes of the pipes 80, 86, 88 and the pump 94 are set so that the developer supplied to the spray pipe 44 is 70 l / min as described above.

The control unit 48 uses a flow meter 92 to
The flow rate of the developer in the pipe 80 is measured to detect the clogged state of the filter 90. When the flow rate in the pipe 80 decreases, the warning means 56 is operated to notify the worker. ing.

The controller 48 measures the electric conductivity of the developing solution by the electric conductivity sensor 96 to determine the concentration of the developing solution. When the concentration of the developing solution exceeds a predetermined range, the developing solution replenishing means replenishes the stock solution or water so as to maintain the concentration of the developing solution in the developing tank 20 and the auxiliary tank 66 within the predetermined range. Has become.

The PS plate processor 10 is provided with a developer replenisher stock solution tank 98 and a water tank 100 as a developer replenisher. Development replenisher stock tank 98
Is connected to one end of a pipe 102, and the water tank 100 is connected to one end of a pipe 104. These pipes 1
The other end of each of the pumps 108 and 104 is connected to an upper opening of a replenishing cylinder 106 provided above the developing tank 20, and the pumps 108 and 1 connected to the control unit 48 are provided in the middle.
10 are provided. Therefore, when the pumps 108 and 110 are driven by the control unit 48, the replenishing stock solution in the replenishing stock solution tank 98 and the water in the water tank 100 are supplied into the replenishing cylinder 106. In the present embodiment, as an example, the replenishment solution of 45 ml per m ² is replenished per 1 m ^{2 in} the processing area of the PS plate 12, but the replenishment method of the developer according to the processing amount of the PS plate 12 is not limited to this. is not.

At the bottom of the refill cylinder 106, a pipe 112
Are connected and opened. The other end of the pipe 112 is connected to the side wall of the auxiliary tank 66 and opened. Further, a pump 114 connected to the control unit 48 is provided at an intermediate portion of the pipe 112, and valves 116, 11
8 are interposed. The development replenisher (stock solution and water) supplied to the replenishing cylinder 106 is supplied to the auxiliary tank 66 by driving the pump 114. The refill cylinder 106 has a pipe 196 communicating with the bottom of the overflow tank 22. This pipe 19
6 is provided with a pump 198 connected to the control unit 48.
Is provided, and when this pump 198 is driven,
The developing solution in the overflow tank 22 is supplied to the auxiliary tank 66 via the replenishing cylinder 106.

One end of a pipe 120 is connected to the pipe 112 on the suction port side of the pump 114. The other end of the pipe 120 is connected to the bottom of the developing tank 20 and opened, and when the pump 114 is driven, the developing tank 2
The developer in the chamber 0 is supplied to the auxiliary tank 66.

The developing solution stored in the developing tank 20 of the PS plate processor 10 and the developing solution stored in the auxiliary tank 66 are circulated through these pipes, and the developing solution is replenished. ing.

The auxiliary tank 66 is provided with nozzles 122 and 124 at the upper part and the lower part. These nozzles 122 and 124 are provided with a large number of communication holes (not shown) communicating with the inside of the outer periphery of the hollow pipe, and are communicated by pipes 126 connected to their ends.
A pump 128 is provided at an intermediate portion of the pipe 126. The pump 128 is connected to the control unit 13 of the auxiliary device 60.
Connected to 0. Therefore, when the control unit 130 drives the pump 128, the developing solution is sucked in from the upper nozzle 122, discharged from the lower nozzle 124, and the developing solution in the auxiliary tank 66 is circulated.

The auxiliary tank 66 is provided with a heater 132 and a cooler 134 as temperature control means .
The heater 132 is provided near the bottom of the auxiliary tank 66 and connected to the control unit 130. This heater 132
Warms the developer in the auxiliary tank 66 quickly to a predetermined temperature. The cooler 134 is constituted by a cooler 136 operated by the control unit 130 and a cooling water pipe 138 disposed in the auxiliary tank 66, and between the cooler 136 and the cooling water pipe 138. For example, cooling water is circulated. When the cooling water cooled by the cooler 136 is sent to the cooling water pipe 138, the heat of the developer near the cooling water pipe 138 is removed, and the developer is cooled. The cooling water from which the heat of the developer has been removed is returned to the cooler 136 and cooled again.

The auxiliary tank 66 is provided with a temperature sensor 140 for detecting the temperature of the developing solution therein, and is connected to the control unit 130. The control unit 130 controls the temperature of the developing solution by the temperature sensor 140. The heater 132 and the cooler 134 are operated while detecting the temperature of the PS plate 12, and the temperature is maintained at the optimum temperature for performing the PS plate 12 which has been set in advance.
Further, a liquid level detection sensor 142 is provided in the auxiliary tank 66 and is connected to the control unit 130. The liquid level of the developer in the auxiliary tank 66 is detected by the liquid level detection sensor 142. If the liquid level is out of a predetermined range, a warning means (not shown) provided to the auxiliary device 60 warns the worker. It is supposed to.

On the other hand, as shown in FIG. 2, the PS plate processor 10
A rinsing tank 28 of the rinsing section 26 is disposed downstream of the rinsing section 26. Above the rinsing tank 28, a pair of upper and lower transport rollers 1 are provided near the upstream side wall, near the center and near the downstream side wall, respectively.
44, 146, and 148 are provided. These transport rollers 144, 146, and 148 are rotatably supported by side plates (not shown), rotate by receiving a driving force of a driving unit (not shown), and rotate, so that the PS plate 1 sent from the developing unit 24.
2 are conveyed. The transport roller 144 is
The developer adhering to the surface of the PS plate 12 above the boundary between the overflow tank 22 and the rinsing tank 28
It has a function of squeezing the developer from the surface of the PS plate 12 in order to prevent the developer from entering.

The rinsing tank 28 stores a rinsing liquid for washing off the developing solution from the PS plate 12 sent out from the developing tank 20. A pair of guide rollers 150 is disposed vertically between the transport rollers 144 and 146 with the transport path of the PS plate 12 interposed therebetween. These guide rollers 150 are skew-shaped rollers, and the shaft center is formed of a hollow pipe. The outer periphery of the hollow pipe constitutes a spray pipe 152 provided with a large number of discharge ports communicating with the inside. A pipe 154 having one end connected to the bottom of the rinsing tank 28 and opened is connected to these spray pipes 152. A pump 15 connected to the control unit 48 of the PS plate processor 10 is provided at an intermediate portion of the pipe 154.
6 and a filter 157 for filtering the rinsing liquid. Therefore, when the controller 48 drives the pump 156, the rinsing liquid stored in the rinsing tank 28 is supplied to the spray pipe 152. The rinsing liquid is discharged from the spray pipe 152 onto the surface of the PS plate 12, and the PS plate 1
The surface of No. 2 is cleaned by the rinsing liquid. The transported PS plate 12 is guided to the downstream transport roller 146 by the guide roller 150.

A blade 158 is disposed in contact with the upper roller of the upstream transport roller 144 on the rinse tank 28 side. The blade 158 scrapes the rinsing liquid attached to the transport roller 144 and returns the rinsing liquid to the rinsing tank 28. In this embodiment, the blade is used. However, the material may be changed to another material, for example, a rubber roller or a metal roller.

A collection roller 160 is disposed in contact with the lower roller of the conveyance roller 144. Below the collection roller 160, a tray 162 is provided. The recovery roller 160 recovers the rinsing liquid attached to the transport roller 144 to the rinsing tank 28 and also stores a part of the rinsing liquid in the receiving tray 162. Collection roller 160
Is partially immersed in the rinsing liquid stored in the receiving tray 162, and the recovery roller 160 and the pair of transport rollers 144
In addition, the surface of the blade 158 is cleaned with a rinsing liquid and drying of the blade 158 is suppressed.

A guide roller 164 formed as a skewer roller is provided below the transport path between the transport roller 146 at the center and the transport roller 148 on the downstream side. PS plate 12 nipped and delivered by transport rollers 146
Are transport rollers 148 by the guide rollers 164.
Is to be guided to.

The guide roller 164 and the transport roller 1
A spray pipe 166 is provided between the upper and lower sides of the conveying path. These spray pipes 16
6 also has a discharge port on the outer periphery of the hollow pipe communicating with the inside. These spray pipes 166 include the pipe 1
One end of 68 is connected. The other end of the pipe 168 includes a flow meter 170, a valve 172, and a strainer 17
4 is connected to an external water supply. Therefore, tap water is supplied to the spray pipe 166 from an external tap. The tap water is discharged from the spray pipe 166 to the surface of the PS plate 12 near the transport roller 148.

The flow meter 170 is connected to the control unit 48, and measures the flow rate of tap water passing through the pipe 168 to detect the clogged state of the strainer 174. When the flow rate of the tap water in the pipe 168 decreases, the control unit 48 activates an alarm unit to notify that the strainer 174 needs to be replaced or cleaned.

The transport roller 148 sandwiches and transports the PS plate 12, and squeezes water adhering to the surface of the PS plate 12. The water squeezed from the surface of the PS plate 12 is collected in a rinsing tank 28 as a rinsing liquid.

A tray 176 is provided below the lower roller of the transport roller 148, and a part of the water squeezed by the transport roller 148 is stored. A part of the lower roller of the transport roller 148 is immersed in the water stored in the receiving tray 176, and the surface of the transport roller 148 is cleaned and the drying is suppressed. Is not deposited.

One end of each of overflow pipes 178 and 180 is opened near the liquid surface of the overflow tank 22 and the rinsing tank 28.
The other end of 180 is connected to a waste liquid tank (not shown) and opened. Therefore, the developer overflowing from the overflow tank 22 and the rinsing liquid overflowing from the rinsing tank 28 are collected in a waste liquid tank (not shown).
In addition, the liquid level in the rinsing tank 28 does not exceed a certain level.

Further, drains 186 and 188 are provided at the bottom of the overflow tank 22 and the bottom of the rinsing tank 28 via valves 182 and 184, respectively. In addition, a drain 192 is provided at the bottom of the auxiliary tank 66 of the auxiliary device 60 via a valve 190. Therefore,
The developing solution in the auxiliary tank 66, the developing solution in the overflow tank 22 and the rinsing liquid in the rinsing tank 28 are supplied to the valves 182, 18
4, 190 by opening drains 186, 1 1 respectively.
88 and 192.

As shown in FIG. 1, the PS plate processor 10 is provided with a drying unit 194 in the casing 16. The drying unit 194 is connected to the PS plate 12 sent out of the rinsing unit 26 by a number of rollers (not shown).
While conveying, the surface of the PS plate 12 is dried by blowing hot air. The dried PS plate 12 is discharged from the PS plate processor 10 and discharged, for example, to a stocker or the like that stores the PS plate 12 against the plate (not shown).

Next, the operation of this embodiment will be described. When the PS plate processor 10 starts up, the heater 132 of the auxiliary device 60 operates to heat the temperature of the developer in the auxiliary tank 66 to a predetermined temperature. The heater 132 is connected to the auxiliary tank 66
Is rapidly heated to shorten the startup time of the PS plate processor 10. At this time, the developer in the auxiliary tank 66 is circulated by the pump 128 to a constant temperature. By operating the pump 94 of the PS plate processor 10, the developing solution in the developing tank 20 and the auxiliary tank 66 is circulated, and the developing solution in the developing tank 20 also has a constant temperature. When the temperature of the developer rises above the set temperature, the cooler 134 operates to lower the temperature of the developer.

The PS plate 12 on which an image has been printed by a printing device (not shown) is inserted into the developing section of the PS plate processor 10 from the insertion table 18. PS version processor 10
When the PS plate 12 is inserted, the transport roller 30 pulls the PS plate 12 into the developing tank 20 at a speed of 3 cm / sec. At this time, the PS plate 12 detects whether or not the slip sheet is attached to the back surface by the slip sheet presence / absence detection sensor 52.

When the slip sheet is not adhered, the PS plate 12 is sent out at an angle of 15 ° with respect to the horizontal by the conveying roller 30, and is conveyed in the developing tank 20 by the guide roller 32 and the like. At this time, the PS plate 12 is conveyed while being sprayed with the developing solution by the spray pipes 42, 44, 46, and is subjected to the developing process.

The developer adheres to the photosensitive layer of the PS plate 12 until it reaches the position E after being immersed in the developer, and the developer permeates the exposed portion of the photosensitive layer. Further, the developing solution adheres to the surface of the unexposed photosensitive layer, and an insoluble film is gradually formed by the action of the development inhibitor. This PS version 12
Reaches a position E, a large amount of developer is sprayed from the spray pipe 44. When the capacity of the developing solution in the developing tank 20 is small, a large amount of the developing solution in the auxiliary tank 66 is suitable for supplying a large amount of the developing solution constantly.

In the spray pipe 44, discharge ports 45 having a diameter of 2 mm are provided at equal intervals with a length B, and the interval with a position E is set as a length F. This spray pipe 44
Is supplied from one end of the developing solution. Therefore, at the position E, the developer of 3 ml / sec · cm ² is sprayed substantially uniformly along the width direction of the PS plate 12.

The developer promotes the elution of the exposed photosensitive layer of the PS plate 12 and removes the components of the photosensitive layer dissolved in the developer from the surface of the PS plate 12. In the unexposed portion of the photosensitive layer, wastes on the surface are removed by the developer discharged from the spray pipe 44, and the formation of an insoluble film is promoted by a large amount of the development inhibitor in the developer. . Therefore, PS after passing position E
In the plate 12, unexposed portions and exposed portions become clear. For this reason, the halftone dots of the PS plate 12 have short legs and sharp edges.

The PS plate 12 that has passed through the position E is cleaned of waste by the squeezing roller 40, and is further sprayed with a developing solution by the spray pipes 42 and 46.
The developer containing wastes in the vicinity of the surface is removed. After that, the photosensitive layer side surface of the PS plate 12 is
And the exposed portion (non-image portion) of the photosensitive layer is
It is removed from the surface of the plate 12. Developed PS plate 1
2 is sent to the rinsing unit 26, and the conveying rollers 144, 14
6, 148. At this time, PS version 1
2 is rinsed with a rinsing liquid discharged from the spray pipe 152 and further rinsed with water discharged from the spray pipe 166. The PS plate 12 discharged from the rinsing unit 26 is dried in the drying unit 194 and discharged from the PS plate processor 10.

In the control unit 48, when the PS plate 12 is inserted, the plate detection sensor 50 measures the length of the inserted PS plate 12, calculates the processing area, and calculates the pump area.
10 is operated for a predetermined time, and the replenishing stock solution and water are supplied to the replenishing cylinder 106 as a replenishing solution. Further, the control unit 48 operates the pump 114 to supply the developing replenisher supplied to the replenishing cylinder 106 to the auxiliary tank 66. At this time, the developer in the overflow tank 22 is also supplied to the auxiliary tank 66.

The developing solution in the auxiliary tank 66 is supplied to a pump 94 operated by the control unit 48 of the PS plate processor 10.
To the spray pipes 42, 44, 46. The auxiliary tank 66 and the developing tank 20 are communicated with each other by a pipe 74.
When the liquid level in the auxiliary tank 66 is about to be lowered by the operation of the developing tank 28, the developing solution flows from the developing tank 20. Thus, the developer in the developing tank 20 and the developer in the auxiliary tank 66 are circulated, and the liquid level in the developing tank 20 and the liquid level in the auxiliary tank 66 are kept constant.

In this embodiment, the developing tank 20 and the auxiliary tank 6
6, when only the developing tank 20 is used (45 liters)
5 times (225 liters) of the charged liquid (developer stored first) is stored. For this reason, the cycle of exchange of the developer can be lengthened, the change in the development state of the PS plate 12 can be suppressed, and the development processing can be performed to a substantially constant state. Also, a lot of PS version 1
2 can maintain a substantially constant processing capacity, and the developed state of the processed PS plate 12 does not change rapidly. Further, the spray pipes 42, 4
It is possible to supply a large amount of the developing solution to 4, 46 in a short time.

Therefore, the PS plate processor 10 according to the present embodiment can continuously perform development processing of a large number of PS plates 12 and form halftone dots with sharp edges on the PS plate 12. And a high quality printing plate can be produced.

The present embodiment shows an example of the shape and the mounting position of the spray pipe 44, and does not limit the present invention. That is, the spray pipe 4
Reference numeral 4 may be any as long as it can supply a large amount of developer uniformly to a predetermined position of the PS plate 12 transport path along the width direction of the PS plate 12. And the angle θ2 of the developer sprayed from the spray pipe 44 onto the surface of the PS plate 12 are not limited.

That is, the spray pipe 4 is
The position at which a large amount of the developer is sprayed by 4 may be after the developer has permeated the exposed portion of the photosensitive layer of the PS plate 12 immersed in the developer, and varies depending on the transport speed of the PS plate 12. In this embodiment, it is set to 30 mm / sec.
The transport speed of the PS plate 12 can be set to 20 to 50 mm / sec, whereby the developing time can be set to 7 to 20 sec, depending on the path length.
The position at which the developer is sprayed onto the PS plate 12 by the spray pipe 44 may be set during the period in which the PS plate 12 is immersed in the developer and then transported between １ ／ and パ ス of the path length. it can.

At this time, the spray pipe 44 is attached to the PS plate 12.
Even if the time until the PS plate 12 is discharged from the developer after the developer is sprayed from the developer becomes longer, the development stability is improved by the development inhibitor. The finish of the halftone dot image of the PS plate 12 due to the collapse of the dots is not impaired.

Further, the PS plate 12 is
In the present embodiment, the amount of the developer discharged to the spray pipe 44 is 70 l / min .
For the PS plate 12, it is about 3.0 ml / sec · cm ² ,
A range of 10 ml / sec · cm ² is possible, but preferably
It is ^{2 to 5} ml / sec · cm ² .

Although these differ depending on the transport speed of the PS plate 12 and the position E where the developer is sprayed by the spray pipe 44, these can be set in combination, and the design of the PS plate processor 10 can be set. The degree of freedom is expanded.

In this embodiment, the control units 48 and 130 provided with the PS plate processor 10 and the auxiliary device 60 are provided.
However, it is needless to say that they may be controlled collectively by the same control unit. In this embodiment, the drying unit 194 is connected to the PS plate processor 10, but the drying unit 194 may be separately provided. Further, in the present embodiment, the developed PS plate 12 is cleaned by the rinsing part and the surface is rinsed. However, the present invention is not limited to this, and the surface of the PS plate 12 is subjected to desensitization treatment. May be adopted. That is, the configuration of each processing tank in the PS plate processor 10 is not limited.

In this embodiment, an example in which the auxiliary device 60 is connected to the PS plate processor 10 has been described.
The auxiliary device 60 is preferable for application of the present invention, but the present invention is also applicable to a PS plate processor 10 in which the auxiliary device 60 is not provided.

[0089]

As described above, the photosensitive lithographic printing plate automatic developing machine according to the present invention uses a photosensitive lithographic printing plate at a uniform temperature.
By supplying a large amount to the surface of the printing plate,
The printing plate can be subjected to development processing without unevenness. Therefore, it is possible to form a good halftone dot of cutting, has the excellent effect say can be obtained hardly generated high-quality printing plate baked blur.

[0090]

[Brief description of the drawings]

FIG. 1 is a perspective view showing a PS plate processor according to the present embodiment.

FIG. 2 is a schematic configuration diagram of a main part of a PS plate processor according to the embodiment.

FIG. 3 is a perspective view showing a spray pipe according to the embodiment.

FIG. 4 is a schematic side view showing a relative position between a spray pipe and a PS plate.

[Explanation of symbols]

Reference Signs List 10 PS plate processor (photosensitive lithographic printing plate automatic developing machine) 12 PS plate (photosensitive lithographic printing plate) 20 Developing tank 66 Auxiliary tank 32 Guide roller (conveying means) 44 Spray pipe 80, 86 Piping 94 Pump E Spraying position

──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shuzo Nago 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo Inside Dai Nippon Printing Co., Ltd. (72) Inventor Hiroaki Ikukawa, Ichigaya-machi, Shinjuku-ku, Tokyo No. 1-1, Dai Nippon Printing Co., Ltd. (72) Inventor Hiroshi Shimoda 1250 Takematsu, Minamiashigara-shi, Kanagawa Fuji Machinery Co., Ltd. (56) References JP-A-2-32357 (JP, A) JP-A-2-2570 (JP, A) JP-A-2-250056 (JP, A) JP-A-58-102937 (JP, A) JP-A-57-64237 (JP, A) JP-A-63-78949 (JP, A) , U) (58) Field surveyed (Int. Cl. ⁶ , DB name) G03F 7/30, 7/00

Claims (1)

(57) [Claims] 1. A developing tank developing liquid is stored for the image in the photosensitive layer of developing the exposed photosensitive lithographic printing plate, conveying means for conveying while the developing tank and immersing the photosensitive lithographic printing plate And removing means for physically acting substantially uniformly along the width direction on the photosensitive layer of the photosensitive lithographic printing plate carried by the carrying means to remove the photosensitive layer according to the exposed image. Spraying means for uniformly discharging the developing solution to the photosensitive layer, comprising: a developer for communicating with the developing tank and piping and supplying the spraying means to the developing means. An automatic tank for developing a photosensitive lithographic printing plate, comprising: an auxiliary tank for storing a developing solution; and a temperature controller for maintaining a developing solution stored in the auxiliary tank at a predetermined temperature.