JP2806317B2 - Permanent magnet film and magnetoresistive head using the same - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a permanent magnet film and a magnetoresistive head using the same. More specifically, the present invention relates to a magnetoresistive head which reads information from a magnetic recording medium by a magnetoresistive effect.

[0002]

2. Description of the Related Art When reading information from a magnetic recording medium using a magnetic head utilizing the magnetoresistance effect (magnetoresistive head), a reproduction output waveform is generated due to the instability of the magnetic domain or domain wall of the magnetoresistance effect film of the magnetic head. (Barkhausen noise) occurs in Therefore, as one method for preventing this noise, a method of generating a longitudinal bias using a permanent magnet film is disclosed in Japanese Patent Application Laid-Open No. 3-125311.

[0003]

However, in the manufacturing process of the magnetoresistive head, an organic solvent, a stripper,
Developers, etching solutions and the like are used, but the chemical resistance of the permanent magnet film against them has not been sufficient.
Further, the corrosion resistance was not satisfactory. Poor chemical or corrosion resistance causes a change in magnetic properties, which increases the possibility of fluctuations in the longitudinal bias magnetic field on the magnetoresistive film and, consequently, Barkhausen noise. Good and good reproduction waveforms cannot be obtained. Also, there is a problem in reliability.

Accordingly, an object of the present invention is to have excellent chemical resistance to an organic solvent, a stripping solution, a developing solution, an etching solution and the like used for manufacturing a magnetoresistive effect head, and excellent corrosion resistance. As a result, an object is to provide a permanent magnet film exhibiting good and stable magnetic properties. Also, by using this permanent magnet film, the longitudinal bias magnetic field to the magnetoresistive effect film is stable, there is no Barkhausen noise, the symmetry of the reproduced waveform is good, and the corrosion resistance is high and the magnetoresistive effect is highly reliable. Is to provide a head.

[0005]

Means for Solving the Problems The present inventor has made various studies in order to achieve the above object, and as a result, completed the present invention.

According to a first aspect of the present invention, a chromium composition is 9 to 12 atomic% and a platinum composition is 8 having at least a hexagonal close-packed structure and a crystal orientation of at least <1,0,3> orientation.
The present invention relates to a permanent magnet film comprising a cobalt-chromium-platinum alloy film of about 25 atomic%.

A second invention is a ratio of the (1,0,3) plane diffraction peak intensity to the (1,1,2) plane diffraction peak intensity measured by X-ray diffraction using a diffractometer method. Is a cobalt-chromium-platinum alloy film having a value of 0.3 or more.

[0008]

According to a third aspect of the present invention, a soft magnetic film, a non-magnetic spacer film, and a magnetoresistive film are laminated on a substrate in this order,
A sensor operation region is provided on the magnetoresistive film, and the soft magnetic film, the non-magnetic spacer film, and the magnetoresistive film that form the sensor operation region are cut off at one end and the other end thereof. And a magnetoresistive head in which a permanent magnet film and an electrode film are sequentially laminated so as to cover the cut surface so as to have electrical and magnetic continuity . Alternatively, the present invention relates to a magnetoresistive head comprising the permanent magnet film of the second invention.

According to a fourth aspect of the present invention, a magneto-resistance effect film, a non-magnetic spacer film, and a soft magnetic film are laminated on a substrate in this order,
A sensor operation area is provided on the magnetoresistive film, and one side and the other end of the magnetoresistive film, the non-magnetic spacer film, and the soft magnetic film forming the sensor operation area are cut off to obtain a cut surface. And a magnetoresistive head in which a permanent magnet film and an electrode film are sequentially laminated so as to cover the cut surface so as to have electrical and magnetic continuity . Alternatively, the present invention relates to a magnetoresistive head comprising the permanent magnet film of the second invention.

A fifth invention relates to the magnetoresistive head according to the third or fourth invention, wherein a chromium film is laminated as a base film of the permanent magnet film between at least each cut surface and the permanent magnet film.

[0012]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to embodiments.

FIG. 7 shows a permanent magnet film made of a cobalt-chromium-platinum alloy film (CoCrPt film) in which the ratio of dimethyl sulfoxide to N-methyl-2-pyrrolidone is 6: 4 by weight. FIG. 3 shows the change in film thickness with respect to the immersion time for various platinum compositions when immersed in a stripping solution (104 stripping solution manufactured by Tokyo Ohka Kogyo Co., Ltd.). A sample having a platinum composition of 8.7 atom% has a chromium composition of 11.3 atom%, and a sample having a platinum composition of 10.5 atom% has a chromium composition of 10.6 atom% and a platinum composition of 1
Those with 1.2 atomic% have a chromium composition of 11.0%, those with 13.1 atomic% of platinum have a chromium composition of 10.2 atomic%,
Those with a platinum composition of 15.0 at.% Have a chromium composition of 10.
Those with 7 atomic% and platinum composition of 15.9 atomic% have a chromium composition of 11.0 atomic% and those with a platinum composition of 17.4 atomic% have a chromium composition of 10.5 atomic%. These composition ratios are the same in the film thickness change shown in FIGS. 8 and 9 described later.

The film thickness decreases with increasing immersion time, but the rate of decrease depends on the platinum composition. When the platinum composition is 8.7 atomic% (at%), the reduction rate of the film thickness is relatively large, and when the platinum composition is 10.5 atomic%, the reduction rate of the film thickness is the smallest. When the platinum composition is larger than 10.5 atomic%, the reduction rate of the film thickness is increased again, but when the platinum composition is further increased to 17.4 atomic%, the reduction rate of the film thickness is reduced.

FIG. 8 shows an alkaline inorganic developer containing a phosphate (NanH ₃ -nPO ₄ ) (Microposit Developer, manufactured by Shipley Far East Co., Ltd.).
3 shows the change of the film thickness with respect to the immersion time when immersed in various platinum compositions.

In FIG. 8, as in FIG. 7, the reduction rate of the film thickness is relatively large when the platinum composition is 8.7 atomic% (at%), and the film thickness reduction rate is 10.5 atomic% when the platinum composition is 10.5 atomic%. The smallest rate. When the platinum composition is larger than 10.5 atomic%, the reduction rate of the film thickness is increased again, but when the platinum composition is further increased to 17.4 atomic%, the reduction rate of the film thickness is reduced.

FIG. 9 shows various changes in film thickness with respect to immersion time when immersed in an etching solution in which the weight ratio of iodine, potassium iodide, and water was 1: 2: 200. It shows the platinum composition.

In the results of FIG. 9, as in FIGS. 7 and 8, when the platinum composition is 8.7 atomic% (at%), the reduction rate of the film thickness is relatively large, and when the platinum composition is 10.5%.
At atomic%, the decrease rate of the film thickness is the smallest. When the platinum composition is larger than 10.5 atomic%, the reduction rate of the film thickness is increased again, but when the platinum composition is further increased to 17.4 atomic%, the reduction rate of the film thickness is reduced.

FIGS. 10 and 11 show X-ray diffraction patterns of various compositions of the cobalt-chromium-platinum alloy film measured by the diffractometer method.

FIG. 10A shows a chromium composition of 11.3 at% and a platinum composition of 8.7 at%, and FIG. 10B shows a chromium composition of 10.6 at% and a platinum composition of 10.5 at.
FIG. 10 (c) shows a chromium composition of 11.0 atom% / a platinum composition of 11.2 atom%, and FIG. 11 (a) shows a chromium composition of 10.7 atom% / a platinum composition of 15.0 atom%. FIG. 11B is a diffraction pattern when the chromium composition is 10.5 at% and the platinum composition is 17.4 at%.

The diffraction peaks appearing at around 41 degrees and 44 degrees of the diffraction angle 2θ are the peaks for the (1,0,3) plane and the (1,1,2) plane of the hexagonal close-packed structure, respectively. The peak corresponding to this (1,0,3) plane is
It increases when the platinum composition increases from 8.7 atomic% to 10.5 atomic%, and further decreases when the platinum composition increases from 10.5 atomic% to 17.4 atomic%.

From the above results, it is considered that not only the platinum composition but also the crystal orientation greatly affect the chemical resistance and corrosion resistance. That is, chemical resistance and corrosion resistance are improved in the range where the platinum composition is large, but even in the range where the platinum composition is relatively small, it has a hexagonal close-packed structure and its crystal orientation is <1,0,3> oriented. It can be seen that the chemical resistance and corrosion resistance are improved. In particular, (1,1) for the (1,1,2) plane of the hexagonal close-packed structure
The case where the diffraction peak intensity ratio of the 0,3) plane is 0.3 or more is an effective degree of orientation and is preferable. The chemical resistance and corrosion resistance of the permanent magnet film are the same as those of the hexagonal close-packed structure (1,1).
It is preferable that the platinum composition is large while satisfying the orientation of the (0, 3) plane. However, since the magnetization decreases as the platinum composition increases, the upper limit is set.

In the permanent magnet films used in the tests shown in FIGS. 7 to 9, there are cases where the diffraction peak of the (1, 0, 3) plane of the hexagonal close-packed structure is small or absent. 10, FIG. 11), the diffraction peak of the (1, 0, 3) plane can be increased or generated by changing the manufacturing conditions within the range of the present invention.

Regarding the composition of the permanent magnet film, generally, the chemical resistance and corrosion resistance improve as the platinum composition increases. However, if the platinum composition is too large, the magnetization decreases, and desired magnetic characteristics cannot be obtained. Similarly, with respect to the chromium composition, chemical resistance and corrosion resistance are improved by the increase. However, the chromium composition more easily affects the magnetism than the platinum composition, and when the chromium composition is too large, the magnetization is remarkably reduced, the perpendicular magnetic anisotropy is increased, and adverse effects such as the formation of a perpendicular magnetic film are caused.

Therefore, the permanent magnet film of the present invention has at least a hexagonal close-packed structure, the crystal orientation of which is at least <1,0,3> oriented, a chromium composition of 9 to 12 atomic%, and a platinum composition. Of a cobalt-chromium-platinum alloy film of 8 to 25 atomic%, and furthermore, a diffraction peak of the (1,1,2) plane by X-ray diffraction measured using a diffractometer method. It is preferable to use a cobalt-chromium-platinum alloy film in which the ratio of the (1,0,3) plane diffraction peak intensity to the intensity is 0.3 or more. More preferably, the platinum composition is 10 to 25 atomic%.

The permanent magnet film of the present invention (cobalt-chromium-
Hexagonal close-packed structure (platinum alloy film)
3) As a method for improving the orientation of the surface, it is effective to increase the film forming power density or to perform the film formation at a low gas pressure when forming the film by sputtering. Has been confirmed in experiments.

Further, even if the permanent magnet film of the present invention does not have a hexagonal close-packed structure as described above, it is composed of a cobalt-chromium-platinum alloy film having a chromium composition of 9 to 12 atomic% and a platinum composition. Is in the range of 17 to 25 atomic%, a permanent magnet film having good chemical resistance and corrosion resistance is obtained. More preferably, the platinum composition is 19 to 25 atomic%.
Range.

Next, a magnetoresistive head using the permanent magnet film of the present invention will be described.

FIG. 1 is a schematic partial sectional view of a magnetoresistive head using a permanent magnet film according to the present invention. Substrate (1)
An insulating film (2), a soft magnetic film (3), a non-magnetic spacer film (4), and a magnetoresistive film (5) are sequentially laminated thereon, and the soft magnetic film, non-magnetic spacer film, and magnetoresistive film are laminated. One side and the other side are cut off to form a cut surface, which is tapered. The permanent magnet films (6a, 6b) and the electrode films (7a, 7b) are sequentially laminated so as to cover the deleted surface so as to have electrical and magnetic continuity, respectively. They are formed separated by only the region (Tw).

Here, as shown in FIG. 2, a chromium film (9a, 9b) may be laminated as a base film at least between each cut surface and the permanent magnet film.

As the substrate (1), ceramic or the like can be used. Ceramic are preferable Al ₂ O ₃ -TiC based, thickness 0.15μm about Al as an insulating film (2)
It is desirable to provide ₂ O ₃ or the like.

The soft magnetic film (3) has a thickness of about 300 angstroms and is made of a cobalt-zirconium-molybdenum amorphous alloy or the like.

The nonmagnetic spacer film (4) has a thickness of 200
It is about angstrom and is made of tantalum or the like.

The magnetoresistive film (5) has a thickness of about 250 Å and is made of a nickel-iron alloy or the like.

The electrode films (7a, 7b) have a thickness of 0.15
It is on the order of microns and is made of gold or the like.

The above film is formed by a sputtering method or the like.

Next, a method of manufacturing the magnetoresistive head according to the present invention will be briefly described with reference to FIG. 3 taking the above-described magnetoresistive effect head as an example.

First, as shown in FIG. 3A, an insulating film (2), a soft magnetic film (3), a nonmagnetic spacer film (4) and a magnetoresistive film (5) are formed on a substrate (1). Are sequentially laminated by a sputtering method, and a photoresist (8) having a thickness of about 1.5 μm is applied thereon by a known technique, and then exposed and developed under appropriate conditions to form a stencil pattern. Form.

Next, as shown in FIG. 3B, the left and right regions of the soft magnetic film, the non-magnetic spacer film and the magnetoresistive film in FIG. 2A are uniformly tapered by ion milling. After processing, the permanent magnet film (6a, 6a
b, 6c) to a thickness of about 250 angstroms, and further thereon, electrode films (7a, 7b,
7c) is formed into a stacked film.

Thereafter, the remaining photoresist (8) and the permanent magnet film (6)
c) and the electrode film (7c) are removed using a stripper,
As shown in FIG. 3C, a magnetoresistive head element having a sensor operation region (Tw) at the center of the upper surface is formed.
At this time, in order to completely and promptly remove the photoresist and the permanent magnet film and the electrode film laminated thereon, ultrasonic waves are applied or the liquid temperature is heated to a temperature equal to or higher than room temperature to perform peeling. Is also good.

The magnetoresistive head element manufactured as described above is subjected to slider processing by a known technique, and is also provided with a pressure spring, a support arm, etc., wiring to electrodes, and the like. Complete the magnetoresistive head.

The magnetoresistive head of the present invention is not limited to the above manufacturing method, but can be manufactured by the following method shown in FIGS.

First, as shown in FIG. 4A, an insulating film (2) made of Al ₂ O ₃ or the like having a thickness of about 0.12 μm and a cobalt film having a thickness of about 230 Å were formed on a substrate (1). Soft magnetic film (3) made of zirconium-molybdenum amorphous alloy or the like, nonmagnetic spacer film (4) made of tantalum or the like having a thickness of about 100 Å, and film thickness of 2
A magnetoresistive film (5) made of a nickel-iron alloy or the like having a thickness of about 00 angstroms is sequentially laminated by sputtering, and a gold film (10) having a thickness of about 2500 angstroms is formed thereon. A photoresist (11) having a thickness of about 1 μm is applied.

Thereafter, as shown in FIG. 4B, the photoresist (11) is exposed and developed under appropriate conditions to form a pattern.

Further, using an ion milling method and an etching solution, as shown in FIG. 4C, the gold film (10) is patterned so that its width is smaller than the width of the photoresist previously patterned. .

Next, the ion milling method shown in FIG.
As shown in (d), the soft magnetic film (3), the nonmagnetic spacer film (4) and the magnetoresistive film (5) are tapered.

Thereafter, as shown in FIG. 5E, a permanent magnet film (6a, 6b, 6c) is formed to a thickness of about 250 angstroms by a sputtering method. An electrode film (7a, 7) made of gold of about 5 microns
b, 7c) are deposited. Finally, the gold film (1) remaining in the region (Tw) that operates as the magnetoresistive effect sensor
0), the photoresist (11), and the permanent magnet film (6c) and the electrode film (7c) laminated thereon are removed using an etching solution as shown in FIG. A head element is formed.

The magnetoresistive head element manufactured in this manner is subjected to slider processing by a known technique, and is also provided with a pressure spring, a support arm, etc., wiring to electrodes, and the like. Complete the resistance effect head.

The embodiment of the magnetoresistive head of the present invention other than those shown in FIGS. 1 and 2 may have the structure shown in FIG. 6C, for example. In FIG. 6C, the order of lamination of the magnetoresistive film, the non-magnetic spacer film, and the soft magnetic film is different from that of the above-described head. Although the chromium films (9a, 9b) are provided in FIG. 6C, the configuration may not be provided.

A method of manufacturing such a magnetoresistive head will be briefly described with reference to FIG.

First, as shown in FIG. 6 (a), an insulating film (2) made of Al ₂ O ₃ or the like having a thickness of about 0.12 μm and a nickel film having a thickness of about 200 Å were formed on a substrate (1). A magnetoresistive film (5) made of an iron alloy or the like, a nonmagnetic spacer film (4) made of tantalum or the like having a thickness of about 200 Å, and a soft material made of a cobalt-zirconium-molybdenum amorphous alloy having a thickness of about 250 Å. The magnetic film (3) is sequentially formed into a laminated film by a sputtering method, and a thickness of 1.5 μm is further formed thereon by a known technique.
After applying about m of the photoresist (8), a stencil pattern is formed by exposing and developing under appropriate conditions.

Next, as shown in FIG. 6B, a magnetoresistive film, a non-magnetic spacer film,
After the left and right regions of the soft magnetic film in FIG. 6A are uniformly cut into a taper shape, the chromium films (9a, 9b,
9c) is deposited to a thickness of about 100 Å, and a permanent magnet film (6a, 6b, 6c) is deposited thereon by sputtering to a thickness of about 250 Å,
Further, an electrode film (7a, 7b, 7c) made of gold or the like having a thickness of about 1.2 microns is formed thereon. afterwards,
The remaining photoresist (8) and the chromium film (9c), the permanent magnet film (6c), and the electrode film (7c) laminated thereon are removed using a stripper, and FIG.
As shown in (1), a magnetoresistive head element having a sensor operation region (Tw) at the center of the upper surface is formed. At this time, in order to completely and quickly remove the photoresist (8) and the chromium film, the permanent magnet film, and the electrode film laminated thereon, ultrasonic waves are applied or the liquid temperature is increased to a temperature higher than room temperature. And peeling may be performed.

The magnetoresistive head element thus manufactured is subjected to slider processing and mounting of a pressure spring, a support arm and the like, wiring to electrodes, etc., by a well-known technique. Complete the effect head.

[0054]

EXAMPLES The present invention will be further described below with reference to examples, but the present invention is not limited to these examples.

Example 1 As shown in FIG. 1, an insulating layer (2), a soft magnetic film (3), a nonmagnetic spacer film (4) and a magnetic opposing effect film (5) were formed on a ceramic substrate (1). These soft magnetic films
The nonmagnetic spacer film and the magnetoresistive effect film are cut off in a tapered shape, and the permanent magnet films (6a, 6b) and the electrode film ( 7a, 7b) to the sensor operating area (T
w) to form a magnetoresistive head.

As the ceramic substrate (1), Al ₂ O ₃
-A TiC-based ceramic was used. The insulating film (2) is made of Al ₂ O ₃ having a thickness of 0.15 μm, the soft magnetic film (3) is made of a 300-Å thick cobalt-zirconium-molybdenum amorphous alloy, and a non-magnetic spacer film (4). Is made of tantalum having a thickness of 200 angstroms, the magnetoresistive film (5) is made of a nickel-iron alloy having a thickness of 250 angstroms, and electrode films (7a, 7b) are formed.
Is made of gold having a thickness of 0.15 μm, and these are formed by a sputtering method.

Next, a method of manufacturing the magnetoresistive head of this embodiment will be described with reference to FIG.

First, as shown in FIG. 3A, an insulating film (2), a soft magnetic film (3), a nonmagnetic spacer film (4) and a magnetoresistive film (5) are formed on a ceramic substrate (1). Are sequentially laminated by sputtering, and a photoresist (8) having a thickness of 1.5 μm is coated thereon by a known technique, and then exposed and developed under appropriate conditions to form a stencil pattern. did.

Next, the left and right regions of the soft magnetic film (3), the non-magnetic spacer film (4) and the magnetoresistive film (5) in FIG. 2A are shown in FIG. 3B by the ion milling method. After each of them is cut into a uniform taper shape,
The permanent magnet films (6a, 6b, 6c) were formed as follows.

Using a sputtering method, a chromium composition of 10.6 atomic% (a) was obtained in an argon atmosphere at a power density of 1.1 watts / cm 2 and a pressure of 0.2 pascal.
t%), the platinum composition is 10.5 at%, and the hexagonal close-packed structure has a diffraction peak intensity on the (1,1,2) plane by X-ray diffraction measured using a diffractometer method. A cobalt-chromium-platinum alloy film having a diffraction peak intensity ratio of the (1, 0, 3) plane of about 0.7 is formed to a film thickness of 25.
The film was formed at 0 angstrom.

On this permanent magnet film, an electrode film (7
a, 7b, 7c) were deposited. Then, FIG.
As shown in (1), the remaining photoresist (8) and the permanent magnet film (6c) and the electrode film (7c) laminated thereon were formed using a stripping solution containing dimethyl sulfoxide and 2-pyrrolidone as main components. Then, a magnetoresistive head element having a sensor operation area (Tw) in the center was formed.

When the magnetic field dependence of the resistance of the magnetoresistive head element thus manufactured was measured, it showed a change of one half of the change in magnetoresistance at zero magnetic field, which was the designed value. The disturbance called was not observed.

Then, the magneto-resistance effect head element is subjected to slider processing by a known technique,
Attachment of a support arm and the like, wiring to electrodes, and the like were performed to complete the magnetoresistive head of the present invention.

When the reproduction characteristics were examined using this magnetoresistive head, there was no Barkhausen noise, a longitudinal bias magnetic field was applied to the magnetoresistive film as designed, and a reproduced waveform with good symmetry was obtained. Was.

Embodiment 2 FIG. 2 is a schematic partial sectional view of a magnetoresistive head according to this embodiment. As the base film of the permanent magnet film, the cut surface of one end and the other end of the soft magnetic film, the non-magnetic spacer film, and the magnetoresistive film formed in the tapered shape of the first embodiment and the permanent magnet film (6a, 6b) ), Except that a chromium film (9a, 9b) was laminated between them.

When the dependence of the resistance of the magnetoresistive head element thus manufactured on the magnetic field was measured, it showed a change of one half of the change of the magnetoresistance at zero magnetic field, which was the designed value. No disturbance called a jump was observed.

When the reproduction characteristics were examined using this magnetoresistive head, there was no Barkhausen noise.
A longitudinal bias magnetic field was applied to the magnetoresistive film as designed, and a reproduced waveform with good symmetry was obtained.

Example 3 A magnetoresistive head shown in FIG. 1 was manufactured as follows.

[0069] First, as shown in FIG. _{4 (a), Al 2 O} 3
A film thickness of 0.12 μm on a TiC-based ceramic substrate (1);
insulating film made of Al ₂ O ₃ of m (2), cobalt thickness 230 Å - zirconium - soft magnetic film (3) made of molybdenum amorphous alloy, nonmagnetic spacer layer made of a thickness of 100 Å tantalum ( 4) and a magnetoresistive film (5) made of a nickel-iron alloy having a thickness of 200 angstroms is sequentially laminated by sputtering, and a gold film (10) having a thickness of 2500 angstroms is formed thereon. Then, a photoresist (11) having a thickness of 1 μm was applied.

Thereafter, as shown in FIG. 4B, the photoresist (11) was exposed and developed under appropriate conditions to form a pattern.

Further, using an ion milling method and an etching solution in which the weight ratio of iodine, potassium iodide, and water was "1: 2: 200", as shown in FIG. (10) was patterned such that its width was smaller than the width of the photoresist (11) previously patterned.

Next, the ion milling method shown in FIG.
As shown in (d), the soft magnetic film (3), the non-magnetic spacer film (4), and the magnetoresistive film (5) were cut off in a tapered shape.

Thereafter, as shown in FIG. 5E, permanent magnet films (6a, 6b, 6c) were formed as follows.
Using a sputtering method, in an argon atmosphere with a power density of 1.3 watts / cm 2 and a pressure of 0.2 Pascal, the chromium composition is 10.2 atomic% (at%), the platinum composition is 18.5 atomic%, and The ratio of the (1,0,3) plane diffraction peak intensity to the (1,1,2) plane diffraction peak intensity by X-ray diffraction measured using a diffractometer method and having a hexagonal close-packed structure is about A cobalt-chromium-platinum alloy film of 0.6 was formed at a thickness of 250 Å.

An electrode film (7a, 7b, 7c) made of gold having a thickness of 1.5 μm was formed on the permanent magnet film.

Thereafter, the gold film (10) and the photoresist (11) remaining in the sensor operation area (Tw) and the permanent magnet film (6c) and the electrode film (7c) laminated thereon are replaced with iodine. As shown in FIG. 5F, an etching solution in which the weight ratio of potassium, potassium iodide, and water was mixed at “1: 2: 200” was removed to form a magnetoresistive head element.

When the magnetic field dependence of the resistance of the magnetoresistive head element manufactured as described above was measured, it showed a change amount of one half of the change amount of the magnetoresistance at zero magnetic field, which was the designed value. No disturbance called a jump was observed.

Then, the magnetoresistive head element is subjected to slider processing by a well-known technique,
Attachment of a support arm and the like, wiring to electrodes, and the like were performed to complete the magnetoresistive head of the present invention.

When the reproduction characteristics were examined using this magnetoresistive head, there was no Barkhausen noise, a longitudinal bias magnetic field was applied to the magnetoresistive film as designed, and a reproduced waveform with good symmetry was obtained. Was.

Embodiment 4 A magnetoresistive head in which the order of lamination of the soft magnetic film (3), the nonmagnetic spacer film (4) and the magnetoresistive film (5) is opposite to that of the embodiment 2 shown in FIG. did.

First, as shown in FIG. 6A, Al ₂ O ₃
A thickness of 0.12 on a TiC-based ceramic substrate (1);
an insulating film (2) made of Al ₂ O _{3 having} a thickness of 200 μm; a magnetoresistive film (5) made of a nickel-iron alloy having a thickness of 200 Å; a nonmagnetic spacer film (4) made of tantalum having a thickness of 200 Å; A soft magnetic film (3) having a thickness of 250 Å made of a cobalt-zirconium-molybdenum amorphous alloy is successively formed by sputtering using a sputtering method.
After applying a photoresist (8) of 5 μm, exposure and development were performed under appropriate conditions to form a stencil pattern.

Next, a magnetoresistive film (5), a nonmagnetic spacer film (4), and a soft magnetic film (3) are formed by ion milling.
6A, the left and right regions in FIG. 6A are uniformly cut into a tapered shape as shown in FIG. 6B, and then a chromium film (9a, 9b, 9c) is formed with a thickness of 100 Å. And a permanent magnet film (6a, 6b, 6c)
Was formed as follows. Using a sputtering method, a power density of 1.1 watts / square centimeter and a pressure of 0.3
In the argon atmosphere of Pascal, the chromium composition is 1
0.2 atomic%, the platinum composition is 15.4 atomic%,
And the ratio of the diffraction peak intensity of the (1,0,3) plane to the diffraction peak intensity of the (1,1,2) plane by X-ray diffraction measured by the diffractometer method with a hexagonal close-packed structure. 0.4 cobalt-chromium-platinum alloy film
A laminated film was formed at 50 Å.

On this permanent magnet film, an electrode film (7a, 7b, 7c) made of gold having a thickness of 1.2 μm was laminated.

Thereafter, as shown in FIG. 6 (c), the remaining photoresist (8) and the permanent magnet film (6c) and electrode film (7c) laminated thereon are replaced with dimethyl sulfoxide and 2- The removal was performed using a stripping solution containing pyrrolidone as a main component, thereby forming a magnetoresistive head element having a sensor operation region (Tw) in the center.

When the magnetic field dependence of the resistance of the magnetoresistive head element thus manufactured was measured, it showed a change amount of one half of the change amount of the magnetoresistance at zero magnetic field, which was the designed value. No disturbance called a jump was observed.

The magnetoresistive head element is subjected to slider processing by a well-known technique,
Attachment of a support arm and the like, wiring to electrodes, and the like were performed to complete the magnetoresistive head of the present invention.

When the reproduction characteristics were examined using this magnetoresistive head, there was no Barkhausen noise, a longitudinal bias magnetic field was applied to the magnetoresistive film as designed, and a reproduced waveform with good symmetry was obtained. Was.

Comparative Example 1 For comparison with the characteristics of the magnetoresistive head of Example 1, a magnetoresistive head was manufactured in the same manner as in Example 1 except that only the permanent magnet film was changed as follows.

The permanent magnet film of this comparative example was formed by sputtering with a power density of 1.1 watts / cm 2,
In an argon atmosphere at a pressure of 1.0 Pa, the chromium composition is 10.5 at% and the platinum composition is 15.0 at%.
And the (1,0,3) plane diffraction peak intensity relative to the (1,1,2) plane diffraction peak intensity by X-ray diffraction measured using a diffractometer method and having a hexagonal close-packed structure Was formed at a thickness of 250 Å with a cobalt-chromium-platinum alloy film having a ratio of 0.1 or less.

When the magnetic field dependence of the resistance of the magnetoresistive head element thus manufactured was measured, it showed a change of about two-thirds of the change in magnetoresistance at zero magnetic field, which was about 17% larger than the designed value. In addition, Barkhausen jump was observed.

Further, when the reproduction characteristics of the magnetoresistive effect head were examined, it was found that Barkhausen noise was present, and an asymmetric reproduced waveform generated when the longitudinal bias magnetic field was applied to the magnetoresistive effect film at a value smaller than the designed value was obtained. Was.

[0091]

As apparent from the above description, according to the present invention, it has chemical resistance to organic solvents, stripping solutions, developing solutions and etching solutions, and is excellent in corrosion resistance. A permanent magnet film exhibiting stable magnetic characteristics can be provided.

Further, by using this permanent magnet film, the longitudinal bias magnetic field applied to the magnetoresistive film is stable, there is no Barkhausen noise, the symmetry of the reproduced waveform is good, and the reliability is excellent in corrosion resistance. A high magnetoresistance effect head can be provided.

[Brief description of the drawings]

FIG. 1 is a schematic partial sectional view of a magnetoresistive head according to the present invention.

FIG. 2 is a schematic partial sectional view of a magnetoresistive head according to the present invention.

FIG. 3 is a manufacturing process diagram of the magnetoresistive effect head of the present invention.

FIG. 4 is a manufacturing process diagram of the magnetoresistive head of the present invention.

FIG. 5 is a manufacturing process diagram of the magnetoresistive effect head of the present invention.

FIG. 6 is a manufacturing process diagram of the magnetoresistive head of the present invention.

FIG. 7 is a diagram showing a change in film thickness with respect to immersion time when a cobalt-chromium-platinum alloy film is immersed in a stripping solution.

FIG. 8 is a diagram showing a change in film thickness with respect to immersion time when a cobalt-chromium-platinum alloy film is immersed in a developer.

FIG. 9 is a diagram showing a change in film thickness with respect to immersion time when a cobalt-chromium-platinum alloy film is immersed in an etching solution.

FIG. 10 is a view showing an X-ray diffraction pattern of a cobalt-chromium-platinum alloy film.

FIG. 11 is a view showing an X-ray diffraction pattern of a cobalt-chromium-platinum alloy film.

[Explanation of symbols]

 Reference Signs List 1 substrate 2 insulating film 3 soft magnetic film 4 nonmagnetic spacer film 5 magnetoresistive effect film 6a, 6b, 6c permanent magnet film 7a, 7b, 7c electrode film 8, 11 photoresist 9a, 9b, 9c chrome film 10 gold film Tw Sensor operating area

Claims (5)

(57) [Claims] 1. A chromium composition of 9 to 12 atomic% and a platinum composition of 8 to 25 atomic% having at least a hexagonal close-packed structure and a crystal orientation of at least <1,0,3> orientation.
A permanent magnet film comprising a cobalt-chromium-platinum alloy film as described above. 2. The ratio of the (1,0,3) plane diffraction peak intensity to the (1,1,2) plane diffraction peak intensity by X-ray diffraction measured using a diffractometer method is 0.3.
2. The permanent magnet film according to claim 1, comprising a cobalt-chromium-platinum alloy film as described above. 3. A soft magnetic film, a non-magnetic spacer film, and a magnetoresistive film are laminated in this order on a substrate, a sensor operation region is provided on the magnetoresistive film, and the sensor operation region is formed. One side and the other side of the soft magnetic film, the non-magnetic spacer film and the magnetoresistive film are cut off to form a cut surface, and the cut surface is electrically and magnetically connected. 3. A magnetoresistive head in which a permanent magnet film and an electrode film are sequentially laminated so as to cover the permanent magnet film, wherein the permanent magnet film is the permanent magnet film according to claim 1 or 2 . 4. A magnetoresistive film, a non-magnetic spacer film, and a soft magnetic film are laminated on a substrate in this order, a sensor operation region is provided on the magnetoresistive film, and the sensor operation region is formed. One side and the other side of the magnetoresistive film, the non-magnetic spacer film, and the soft magnetic film are cut to form a cut surface, and the cut surface is electrically and magnetically connected. 3. A magnetoresistive head in which a permanent magnet film and an electrode film are sequentially laminated so as to cover the permanent magnet film, wherein the permanent magnet film is the permanent magnet film according to claim 1 or 2 . 5. The magnetoresistive head according to claim 3, wherein a chromium film is laminated at least between each cut surface and the permanent magnet film as a base film of the permanent magnet film.