JP2796905B2 - Method for producing transparent microwave dielectric - Google Patents
Method for producing transparent microwave dielectricInfo
- Publication number
- JP2796905B2 JP2796905B2 JP3203471A JP20347191A JP2796905B2 JP 2796905 B2 JP2796905 B2 JP 2796905B2 JP 3203471 A JP3203471 A JP 3203471A JP 20347191 A JP20347191 A JP 20347191A JP 2796905 B2 JP2796905 B2 JP 2796905B2
- Authority
- JP
- Japan
- Prior art keywords
- dielectric
- oxygen gas
- transparent
- hours
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 18
- 229910001882 dioxygen Inorganic materials 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 18
- 238000001513 hot isostatic pressing Methods 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 11
- 239000002994 raw material Substances 0.000 claims description 7
- 239000007789 gas Substances 0.000 claims description 6
- 239000003989 dielectric material Substances 0.000 claims description 4
- 238000007731 hot pressing Methods 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims 1
- 238000005245 sintering Methods 0.000 description 16
- 230000000694 effects Effects 0.000 description 10
- 238000000280 densification Methods 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 229910052573 porcelain Inorganic materials 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 238000001354 calcination Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Insulating Materials (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、移動体通信の無線機
器用や衛星放送、衛星通信等のマイクロ波を用いた通信
機器の用途、あるいは装飾用から各種産業用まで広範囲
の分野に用いられる透明マイクロ波用誘電体に係り、工
業生産上、容易にかつ安定して製造することができる透
明マイクロ波用誘電体の製造方法に関する。The present invention is used in a wide range of fields, from radio equipment for mobile communication, to communication equipment using microwaves such as satellite broadcasting and satellite communication, or from decoration to various industries. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent microwave dielectric which can be easily and stably manufactured in industrial production.
【0002】[0002]
【従来の技術】磁器組成物の特性が低損失で、温度特性
の良好なることを利用する各種電子デバイス用誘電体磁
器組成物には、温度補償用コンデンサを初め、SHF帯
で低損失であることを利用する衛星放送直接受信用、ダ
ウンコンバーター用等の誘電体共振器、マイクロ波スト
リップライン基板等に用いられる種々の誘電体磁器組成
物がある。2. Description of the Related Art Dielectric ceramic compositions for various electronic devices that make use of the fact that the properties of ceramic compositions are low loss and have good temperature characteristics are low loss in the SHF band, including capacitors for temperature compensation. There are various dielectric porcelain compositions used for dielectric resonators for direct reception of satellite broadcasts, down converters, etc., microwave strip line substrates and the like.
【0003】一般に、SHF帯用として用いられる誘電
体磁器組成物としては、従来、複合ペロブスカイト型化
合物が広く利用されている。また、従来、εr(比誘電
率)が5以上で、透明な誘電体(有機物を含む)でマイ
クロ波帯で使用できるほどの低損失の誘電体材料は存在
せず、一般に透明な誘電体としては透明アクリル板が用
いられていた。In general, composite perovskite compounds have been widely used as dielectric ceramic compositions used for SHF bands. Conventionally, there is no dielectric material having an εr (relative dielectric constant) of 5 or more and a transparent dielectric (including an organic substance) having a low loss enough to be used in a microwave band. Used a transparent acrylic plate.
【0004】[0004]
【発明が解決しようとする課題】透明アクリル板の誘電
特性は、εrが2.5程度、Qは3000〜5000
(1GHzにおいて)と小さく、また温度による誘電率
の変化率(τf)は数百ppm/℃と大きく、今後の通
信周波数の高周波化を考えると、透明アクリル板の使用
は不可能である。The dielectric properties of the transparent acrylic plate are as follows: εr is about 2.5, and Q is 3000 to 5000.
(At 1 GHz) and the rate of change (τf) of the dielectric constant with temperature is as large as several hundred ppm / ° C., and considering the future increase in communication frequency, it is impossible to use a transparent acrylic plate.
【0005】この発明は、εrが5以上でマイクロ波帯
域で低損失かつ温度変化に対する特性の変化が小さな透
明マイクロ波用誘電体の提供を目的とし、透明度の高い
誘電体を安定して製造することができる透明マイクロ波
用誘電体の製造方法の提供を目的としている。SUMMARY OF THE INVENTION An object of the present invention is to provide a transparent microwave dielectric having a low εr of 5 or more and a low loss in a microwave band and a small change in characteristics with respect to a temperature change, and stably produce a highly transparent dielectric. It is an object of the present invention to provide a method for manufacturing a transparent microwave dielectric that can be used.
【0006】[0006]
【課題を解決するための手段】この発明は、(Bax・
Sry)(Ga1/2・Ta1/2)O3 (但しx=0.2〜
0.3、y=0.7〜0.8)の組成領域の原料粉末か
らなる成形体を、酸素ガスまたはArガスの単独あるい
は混合雰囲気中で熱間静水圧プレス処理、または酸素ガ
ス雰囲気中でホットプレス処理、あるいは酸素ガス雰囲
気中で焼結することを特徴とする透明マイクロ波用誘電
体の製造方法である。According to the present invention, (Ba x
Sr y) (Ga 1/2 · Ta 1/2) O 3 ( but x = 0.2~
0.3, y = 0.7-0.8) hot isostatic pressing in a single or mixed atmosphere of oxygen gas or Ar gas, or in an oxygen gas atmosphere And hot-pressing or sintering in an oxygen gas atmosphere.
【0007】詳述すれば、この発明は、(Bax・S
ry)(Ga1/2・Ta1/2)O3 (但しx=0.2〜
0.3、y=0.7〜0.8)の組成領域の原料粉末か
らなる成形体を、一次焼結して焼結体の理論密度を93
%以上となした後、酸素ガスまたはArガスの単独ある
いは混合雰囲気中で、温度1350〜1600℃、加圧
力500kg/cm2〜2000kg/cm2、0.5〜
20時間の熱間静水圧プレス処理(以下HIPという)
して、焼結体の理論密度を99%以上となすことを特徴
とする。More specifically, the present invention relates to (Ba x · S
r y) (Ga 1/2 · Ta 1/2) O 3 ( but x = 0.2~
(0.3, y = 0.7-0.8) The compact formed from the raw material powder in the composition range of primary sintering is subjected to primary sintering to obtain a theoretical density of 93
% Or more, in an atmosphere of oxygen gas or Ar gas alone or in a mixed atmosphere, at a temperature of 1350 to 1600 ° C., a pressure of 500 kg / cm 2 to 2000 kg / cm 2 , 0.5 to
Hot isostatic pressing for 20 hours (HIP)
Thus, the theoretical density of the sintered body is 99% or more.
【0008】また、この発明は、(Bax・Sry)(G
a1/2・Ta1/2)O3 (但しx=0.2〜0.3、y
=0.7〜0.8)の組成領域の原料粉末からなる成形
体を、酸素ガス雰囲気中で温度1350〜1600℃、
加圧力500kg/cm2〜5000kg/cm2、2〜
20時間のホットプレス処理(以下HPという)して、
焼結体の理論密度を99%以上となすことを特徴とす
る。[0008] In addition, the present invention is, (Ba x · Sr y) (G
a 1/2 · Ta 1/2 ) O 3 (where x = 0.2 to 0.3, y
= 0.7 to 0.8) in an oxygen gas atmosphere at a temperature of 1350 to 1600 ° C.
Pressure 500kg / cm 2 ~5000kg / cm 2 , 2~
After hot pressing for 20 hours (hereinafter referred to as HP)
The theoretical density of the sintered body is 99% or more.
【0009】さらに、この発明は、(Bax・Sry)
(Ga1/2・Ta1/2)O3 (但しx=0.2〜0.
3、y=0.7〜0.8)の組成領域の原料粉末からな
る成形体を、酸素ガス雰囲気中で温度1450〜170
0℃、10〜100時間の条件で焼結して、焼結体の理
論密度を99%以上となすことを特徴とする。[0009] In addition, the present invention is, (Ba x · Sr y)
(Ga 1/2 · Ta 1/2 ) O 3 (where x = 0.2-0.
(3, y = 0.7-0.8) The molded body made of the raw material powder in the composition range of 1450-170 was prepared in an oxygen gas atmosphere.
It is characterized by sintering at 0 ° C. for 10 to 100 hours so that the theoretical density of the sintered body is 99% or more.
【0010】[0010]
【作用】この発明は、透明マイクロ波用誘電体を得るた
めに、その組成及び製造条件について種々検討した結
果、特定組成のBaO−SrO−Ga2O3−Ta2O系
磁器組成物を特定の製造条件で焼結することにより、ε
rが5以上でマイクロ波帯域で低損失かつ温度変化に対
する特性の変化が10ppm/℃以下と小さな透明な誘
電体が得られることを知見し完成したものである。[Action] The present invention, in order to obtain a transparent microwave dielectric, a result of various studies on the composition and manufacturing conditions, identify BaO-SrO-Ga 2 O 3 -Ta 2 O -based ceramic composition having a specific composition By sintering under the manufacturing conditions of
The present invention has been completed by finding that a transparent dielectric material having a small loss of 10 ppm / ° C. or less in a microwave band with low loss and a temperature change of 10 ppm / ° C. or less when r is 5 or more can be obtained.
【0011】この発明による誘電体は、透明かつ透光性
がありかつ低損失であるため、Xバンド帯以上の高周波
帯域で使用することができ、また、温度変化に対する特
性の変化が小さく、εrが5以上の特性を有するため、
誘電体厚みを薄くすることができ、これを組み込む製品
の小型化を図ることができる。The dielectric according to the present invention is transparent, translucent, and has low loss, so that it can be used in a high frequency band equal to or higher than the X band, and has a small characteristic change with temperature change. Has 5 or more properties,
The thickness of the dielectric can be reduced, and the size of a product incorporating the dielectric can be reduced.
【0012】組成の限定理由 この発明において、誘電体の原料粉末組成を(Bax・
Sry)(Ga1/2・Ta1/2)O3 (但しx=0.2〜
0.3、y=0.7〜0.8)に限定した理由は、Ba
のxが0.2未満、0.3を超えると透明な磁器が得ら
れず、また、Srのyが0.7未満、0.8を超えると
透明な磁器が得られず、また、Gaのモル比が1/2、
Taのモル比が1/2である理由は、A(1/2B’3+
・1/2B”5+)O3型ペロブスカイト化合物組成から
外れてQ値が低下し、また共振周波数の温度係数が大き
くなり好ましくないためである。Reasons for Limiting Composition In the present invention, the composition of the raw material powder of the dielectric is set to (Ba x
Sr y) (Ga 1/2 · Ta 1/2) O 3 ( but x = 0.2~
0.3, y = 0.7-0.8)
When x of less than 0.2 or more than 0.3, a transparent porcelain cannot be obtained, and when y of Sr is less than 0.7 or more than 0.8, a transparent porcelain cannot be obtained. The molar ratio of 、,
The reason that the molar ratio of Ta is 1/2 is that A (1 / 2B ' 3+
[1 / 2B " 5+ ) O 3 type perovskite compound composition deviates from the Q value, and the temperature coefficient of the resonance frequency increases, which is not preferable.
【0013】製造条件 この発明による誘電体を得るには、例えば、前述した特
定組成範囲の原料粉末を配合し混合したのち、1100
〜1300℃で2〜10時間の仮焼し、粉砕造粒し、そ
の後所要形状に成形して脱バインダー処理して、さらに
この成形体をHIP処理、HP処理あるいは焼結する。
HIP処理の場合で処理に先駆けて一次焼結する場合、
焼結条件としては、大気中、温度1400〜1700
℃、1〜100時間の条件で一次焼結して、焼結体の理
論密度を93%以上となした後、酸素ガスまたはArガ
スの単独あるいは混合雰囲気中で、温度1350〜16
00℃、加圧力500kg/cm2〜2000kg/c
m2、0.5〜20時間の熱間静水圧プレス処理(以下
HIPという)して、焼結体の理論密度を99%以上と
緻密化する。Manufacturing Conditions In order to obtain the dielectric according to the present invention, for example, after mixing and mixing the raw material powders in the above-described specific composition range, 1100
The calcined product is calcined at ℃ 1300 ° C. for 2 to 10 hours, pulverized and granulated, then formed into a required shape and debindered, and the formed product is subjected to HIP treatment, HP treatment or sintering.
In the case of primary sintering prior to HIP processing,
The sintering conditions are as follows: air, temperature 1400-1700
After primary sintering at 1 ° C. for 1 to 100 hours to make the theoretical density of the sintered body 93% or more, the temperature is set to 1350 to 16 in an atmosphere of oxygen gas or Ar gas alone or in a mixed atmosphere.
00 ° C, pressure 500kg / cm 2 -2000kg / c
The sintered body is densified to a theoretical density of 99% or more by hot isostatic pressing (HIP) for 0.5 to 20 hours at m 2 .
【0014】この発明において、HIP処理前の一次焼
結で、焼結温度が1400℃未満では93%以上の相対
理論密度を有する成形体が得られず、1700℃を超え
ると設備が大型化し製造コスト上好ましくなく、また焼
結時間が1時間未満では93%以上の相対理論密度を有
する成形体が得られず、100時間を超えると緻密化の
効果が飽和して製造コスト上好ましくない。In the present invention, in the primary sintering before the HIP treatment, if the sintering temperature is lower than 1400 ° C., a compact having a relative theoretical density of 93% or more cannot be obtained. If the sintering time is less than 1 hour, a molded article having a relative theoretical density of 93% or more cannot be obtained. If the sintering time exceeds 100 hours, the effect of densification is saturated and the production cost is not preferred.
【0015】HIP処理において、透明誘電体を得るた
めに酸素ガスまたはArガスの単独あるいは混合雰囲気
中が必要である。また、HIP処理において、加熱温度
が1350℃未満では99%以上の相対理論密度を有す
る成形体が得られず、1600℃を超えると緻密化の効
果が飽和し、設備が大型化し製造コスト上好ましくな
く、また加圧力が500kg/cm2未満では99%以
上の相対理論密度を有する成形体が得られず、2000
kg/cm2を超えると緻密化の効果が飽和し、設備が
大型化し製造コスト上好ましくなく、さらに処理時間が
0.5時間未満では99%以上の相対理論密度を有する
成形体が得られず、20時間を超えると緻密化の効果が
飽和して製造コスト上好ましくない。In the HIP process, in order to obtain a transparent dielectric, it is necessary to use oxygen gas or Ar gas alone or in a mixed atmosphere. Further, in the HIP treatment, if the heating temperature is lower than 1350 ° C., a molded article having a relative theoretical density of 99% or more cannot be obtained. If the heating temperature exceeds 1600 ° C., the effect of densification is saturated, the equipment becomes large, and the production cost is preferable. When the pressing force is less than 500 kg / cm 2 , a molded article having a relative theoretical density of 99% or more cannot be obtained.
If it exceeds kg / cm 2 , the effect of densification will be saturated, the equipment will become large and the production cost will be unfavorable, and if the treatment time is less than 0.5 hour, a molded article having a relative theoretical density of 99% or more will not be obtained. If the time exceeds 20 hours, the effect of densification is saturated, which is not preferable in terms of production cost.
【0016】この発明において、成形体をHP処理する
場合、酸素ガス雰囲気中で温度1350〜1600℃、
加圧力500kg/cm2〜5000kg/cm2、2〜
20時間の条件で処理を行うが、酸素ガス濃度は50%
以上が必要であり、好ましくは80〜100%であり、
加熱温度が1350℃未満では99%以上の相対理論密
度を有する成形体が得られず、1600℃を超えると緻
密化の効果が飽和し、設備が大型化し製造コスト上好ま
しくなく、また加圧力が500kg/cm2未満では9
9%以上の相対理論密度を有する成形体が得られず、5
000kg/cm2を超えると緻密化の効果が飽和し、
設備が大型化し製造コスト上好ましくなく、さらに処理
時間が2時間未満では99%以上の相対理論密度を有す
る成形体が得られず、20時間を超えると緻密化の効果
が飽和して製造コスト上好ましくない。In the present invention, when the molded body is subjected to the HP treatment, the temperature is 1350 to 1600 ° C. in an oxygen gas atmosphere.
Pressure 500kg / cm 2 ~5000kg / cm 2 , 2~
The treatment is performed under the condition of 20 hours, but the oxygen gas concentration is 50%.
The above is necessary, preferably 80 to 100%,
If the heating temperature is lower than 1350 ° C., a molded article having a relative theoretical density of 99% or more cannot be obtained. If the heating temperature exceeds 1600 ° C., the effect of densification is saturated, the equipment becomes large, and the production cost is not preferable. 9 for less than 500 kg / cm 2
A molded article having a relative theoretical density of 9% or more was not obtained.
If it exceeds 000 kg / cm 2 , the effect of densification is saturated,
If the equipment is large, the production cost is not preferable. If the treatment time is less than 2 hours, a molded article having a relative theoretical density of 99% or more cannot be obtained. If the treatment time exceeds 20 hours, the effect of densification is saturated and the production cost is reduced. Not preferred.
【0017】この発明において、成形体を焼結する場
合、酸素ガス雰囲気中で温度1450〜1700℃、1
0〜100時間の条件で処理を行うが、酸素ガス濃度は
50%以上が必要であり、好ましくは80〜100%で
あり、加熱温度が1450℃未満では99%以上の相対
理論密度を有する成形体が得られず、1700℃を超え
ると緻密化の効果が飽和し、設備が大型化し製造コスト
上好ましくなく、また処理時間が10時間未満では99
%以上の相対理論密度を有する成形体が得られず、10
0時間を超えると緻密化の効果が飽和して製造コスト上
好ましくない。In the present invention, when sintering a compact, the temperature is 1450-1700 ° C. in an oxygen gas atmosphere.
The treatment is performed under the conditions of 0 to 100 hours, and the oxygen gas concentration needs to be 50% or more, preferably 80 to 100%, and the molding having a relative theoretical density of 99% or more when the heating temperature is less than 1450 ° C. When the temperature exceeds 1700 ° C., the effect of densification is saturated, the equipment becomes large, which is not preferable in terms of manufacturing cost.
%, A molded article having a relative theoretical density of 10% or more cannot be obtained.
If the time exceeds 0 hours, the effect of densification is saturated, which is not preferable in terms of manufacturing cost.
【0018】[0018]
実施例1 原料粉末を(Bax・Sry)(Ga1/2・Ta1/2)O3
但しx=0.3、y=0.7の組成に配合、混合後、
大気中で1200℃で2時間、仮焼したのち粉砕造粒し
た。その後、造粒粉を外径12mm×高さ20mm寸法
に成型し、脱バインダー処理し、さらに大気中で155
0℃に2時間の一次焼結を施し、焼結体の相対理論密度
を94%にした。Example 1 raw material powder (Ba x · Sr y) ( Ga 1/2 · Ta 1/2) O 3
However, after blending and mixing into a composition of x = 0.3 and y = 0.7,
After calcining at 1200 ° C. for 2 hours in the air, pulverized and granulated. Thereafter, the granulated powder is molded into an outer diameter of 12 mm × height of 20 mm, debindered, and further 155 in air.
Primary sintering was performed at 0 ° C. for 2 hours to make the relative theoretical density of the sintered body 94%.
【0019】上記の焼結体を表1に示す条件でHIP処
理し、得られた透明磁器の誘電特性並びに透明度(波長
1〜4μmの透過率で示す)を測定し、測定値を表2に
示す。The sintered body was subjected to HIP treatment under the conditions shown in Table 1, and the dielectric properties and the transparency (shown by the transmittance at a wavelength of 1 to 4 μm) of the obtained transparent porcelain were measured. Show.
【0020】[0020]
【表1】 [Table 1]
【0021】[0021]
【表2】 [Table 2]
【0022】実施例2 原料粉末を(Bax・Sry)(Ga1/2・Ta1/2)O3
但しx=0.3、y=0.7の組成に配合、混合後、
大気中で1200℃で2時間、仮焼したのち粉砕造粒し
た。その後、造粒粉を外径12mm×高さ20mm寸法
に成型し、脱バインダー処理し、さらに成形体を表3に
示す条件でHP処理し、得られた透明磁器の誘電特性並
びに透明度を測定し、測定値を表4に示す。[0022] Example 2 material powder (Ba x · Sr y) ( Ga 1/2 · Ta 1/2) O 3
However, after blending and mixing into a composition of x = 0.3 and y = 0.7,
After calcining at 1200 ° C. for 2 hours in the air, pulverized and granulated. Thereafter, the granulated powder was molded into an outer diameter of 12 mm × height of 20 mm, debindered, and the molded body was subjected to HP treatment under the conditions shown in Table 3, and the dielectric properties and transparency of the obtained transparent porcelain were measured. Table 4 shows the measured values.
【0023】[0023]
【表3】 [Table 3]
【0024】[0024]
【表4】 [Table 4]
【0025】実施例3 原料粉末を(Bax・Sry)(Ga1/2・Ta1/2)O3
但しx=0.3、y=0.7の組成に配合、混合後、
大気中で1200℃で2時間、仮焼したのち粉砕造粒し
た。その後、造粒粉を外径12mm×高さ20mm寸法
に成型し、脱バインダー処理し、さらに成形体を表5に
示す条件で焼結し、得られた透明磁器の誘電特性並びに
透明度を測定し、測定値を表6に示す。[0025] EXAMPLE 3 raw material powder (Ba x · Sr y) ( Ga 1/2 · Ta 1/2) O 3
However, after blending and mixing into a composition of x = 0.3 and y = 0.7,
After calcining at 1200 ° C. for 2 hours in the air, pulverized and granulated. Thereafter, the granulated powder was molded into an outer diameter of 12 mm × height of 20 mm, debindered, and the compact was sintered under the conditions shown in Table 5, and the dielectric properties and transparency of the obtained transparent porcelain were measured. Table 6 shows the measured values.
【0026】[0026]
【表5】 [Table 5]
【0027】[0027]
【表6】 [Table 6]
【0028】[0028]
【発明の効果】この発明は、(Bax・Sry)(Ga
1/2・Ta1/2)O3 (但しx=0.2〜0.3、y=
0.7〜0.8)の組成からなる成形体を、酸素ガスま
たはArガスの単独あるいは混合雰囲気中でHIP処
理、または酸素ガス雰囲気中でHP処理、あるいは酸素
ガス雰囲気中で焼結することにより、理論密度99%以
上の高密度でかつ高透明度を有し、εrが5以上、Qは
9000以上(9GHzにおいて)と大きく、また温度
による誘電率の変化率(τf)は数ppm/℃と小さ
く、今後の通信周波数の高周波化に最適の透明マイクロ
波用誘電体を安定して得ることができる。[Effect of the Invention] The present invention, (Ba x · Sr y) (Ga
1/2・ Ta 1/2 ) O 3 (where x = 0.2-0.3, y =
A molded article having a composition of 0.7 to 0.8) is subjected to HIP treatment in an atmosphere of oxygen gas or Ar gas alone or in a mixed atmosphere, HP treatment in an oxygen gas atmosphere, or sintering in an oxygen gas atmosphere. Has a high density of at least 99% of theoretical density and high transparency, εr is 5 or more, Q is as large as 9000 or more (at 9 GHz), and the rate of change of dielectric constant (τf) with temperature is several ppm / ° C. Therefore, it is possible to stably obtain a transparent microwave dielectric material which is optimal for a higher communication frequency in the future.
Claims (1)
O3 (但しx=0.2〜0.3、y=0.7〜0.
8)の組成領域の原料粉末からなる成形体を、酸素ガス
またはArガスの単独あるいは混合雰囲気中で熱間静水
圧プレス処理、または酸素ガス雰囲気中でホットプレス
処理、あるいは酸素ガス雰囲気中で焼結することを特徴
とする透明マイクロ波用誘電体の製造方法。[Claim 1] (Ba x · Sr y) ( Ga 1/2 · Ta 1/2)
O 3 (however, x = 0.2 to 0.3, y = 0.7 to 0.
The molded body made of the raw material powder in the composition region of 8) is subjected to hot isostatic pressing in an atmosphere of oxygen gas or Ar gas alone or in a mixed atmosphere, hot pressing in an oxygen gas atmosphere, or firing in an oxygen gas atmosphere. A method for producing a dielectric material for transparent microwaves, comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3203471A JP2796905B2 (en) | 1991-07-18 | 1991-07-18 | Method for producing transparent microwave dielectric |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3203471A JP2796905B2 (en) | 1991-07-18 | 1991-07-18 | Method for producing transparent microwave dielectric |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0528832A JPH0528832A (en) | 1993-02-05 |
JP2796905B2 true JP2796905B2 (en) | 1998-09-10 |
Family
ID=16474693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3203471A Expired - Fee Related JP2796905B2 (en) | 1991-07-18 | 1991-07-18 | Method for producing transparent microwave dielectric |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2796905B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006080173A1 (en) * | 2005-01-26 | 2006-08-03 | Murata Manufacturing Co., Ltd. | Translucent ceramic, process for producing the same, optical part and optical apparatus |
-
1991
- 1991-07-18 JP JP3203471A patent/JP2796905B2/en not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
---|
技報堂出版株式会社、「セラミック工学ハンドブック」 (1989年4月10日)、P.1977〜P.1982、P.1979右欄第16行〜P.1980左欄第2行 |
Also Published As
Publication number | Publication date |
---|---|
JPH0528832A (en) | 1993-02-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100203515B1 (en) | Ceramic dielectric composition for high frequency | |
JP4524411B2 (en) | Dielectric porcelain composition | |
JPH1072258A (en) | Dielectric ceramic composition | |
JP2796905B2 (en) | Method for producing transparent microwave dielectric | |
CA2010558C (en) | Dielectric ceramic material and method of producing same | |
JPS62170102A (en) | Dielectric ceramic and making thereof | |
CN113800908A (en) | Medium dielectric constant double perovskite microwave dielectric ceramic material and preparation method thereof | |
JPS61198505A (en) | Dielectric magnetism | |
JPH04215204A (en) | Dielectric ceramic composition and its manufacturing method | |
JPH09221355A (en) | Alumina sintered body for high frequency | |
US5248465A (en) | Preparation process of high-permittivity material | |
JPH0261762B2 (en) | ||
JPH04254463A (en) | Dielectric porcelain composition | |
JPH06275126A (en) | Dielectric porcelain composition | |
KR100609383B1 (en) | High dielectric constant microwave dielectric ceramic composition for low temperature sintering and its manufacturing method | |
JPH0580764B2 (en) | ||
JPH0459267B2 (en) | ||
JPH07335024A (en) | Dielectric ceramics and manufacture thereof | |
JP3024300B2 (en) | High frequency dielectric ceramic composition | |
CN115594489A (en) | Microwave ceramic material Ca 3-x Li x B 2 O 6 And method for preparing the same | |
JPS6337507A (en) | Dielectric ceramics | |
JP2004189589A (en) | Dielectric ceramic composition and dielectric resonator using the same | |
JPH03261653A (en) | Dielectric porcelain composition and production thereof | |
JPH02223103A (en) | Dielectric ceramic composition and its manufacturing method | |
JPS6337508A (en) | Dielectric ceramics |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080703 Year of fee payment: 10 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090703 Year of fee payment: 11 |
|
LAPS | Cancellation because of no payment of annual fees |