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JP2658838B2 - Vacuum exhaust valve - Google Patents

Vacuum exhaust valve

Info

Publication number
JP2658838B2
JP2658838B2 JP5293251A JP29325193A JP2658838B2 JP 2658838 B2 JP2658838 B2 JP 2658838B2 JP 5293251 A JP5293251 A JP 5293251A JP 29325193 A JP29325193 A JP 29325193A JP 2658838 B2 JP2658838 B2 JP 2658838B2
Authority
JP
Japan
Prior art keywords
vacuum
exhaust
vacuum exhaust
exhaust valve
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5293251A
Other languages
Japanese (ja)
Other versions
JPH07145872A (en
Inventor
義裕 柿本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP5293251A priority Critical patent/JP2658838B2/en
Publication of JPH07145872A publication Critical patent/JPH07145872A/en
Application granted granted Critical
Publication of JP2658838B2 publication Critical patent/JP2658838B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は真空排気バルブに関し、
特に真空室内の気体を真空排気する際に使用するバルブ
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum exhaust valve,
In particular, the present invention relates to a valve used for evacuating gas in a vacuum chamber.

【0002】[0002]

【従来の技術】一般に、例えば、半導体製品を製造する
場合には、その製造過程における各処理プロセスにおい
て、各種の真空室、例えば、成膜処理等を行う処理室あ
るいはこれらの処理室等の前段に配置されるロードロッ
ク室等が存在する。ところで半導体製造においては、い
かにして歩留りを向上させるかが大きな問題となってお
り、その対策の一つとして、不良品発生の原因となるパ
ーティクルが各種の処理プロセスにおいて介在すること
を極力避けるようになされている。例えば、上記ロード
ロック室を例にとれば、この真空室の従来の真空排気構
造は、図6に示すように、真空室101は、メイン排気
配管104を経て真空排気ポンプ103により真空排気
されるが、このメイン排気配管104と並列して菅経を
小さくし、有効断面積を絞ったあるいは積極的に有効断
面積を絞る絞りバルブ106とバイパス排気バルブ10
7を持つバイパス排気配管107を設けていた。また特
開平4−358531号公報では、図7に示すように、
真空室101を真空排気ポンプ103にて真空排気する
初期時において速度制御手段108を用いて真空排気ポ
ンプ103の排気速度を低くし、次第に速度を増加させ
る手段を取っている。いづれの技術も、真空室を真空排
気ポンプで、初期から最大排気速度で真空排気すること
はせず、菅路抵抗やポンプ能力を用いてスロー排気機構
を用いている。これは、真空室を真空排気する場合に、
過度に気体の排気速度が速いと、真空室の中で急速な乱
気流が発生し、真空室内壁に付着しているパーティクル
を巻き上げてしまうからである。この巻き上がったパー
ティクルはいずれ真空室内壁面等に再付着することにな
るが、半導体ウェーハに付着すれば、先に述べたとお
り、不良品の発生となってしまうことになる。
2. Description of the Related Art In general, for example, when a semiconductor product is manufactured, various vacuum chambers, for example, a processing chamber for performing a film forming process or the like, or a stage preceding these processing chambers in each processing process in the manufacturing process. There is a load lock chamber and the like arranged in the. By the way, in semiconductor manufacturing, how to improve the yield is a major problem. One of the countermeasures is to minimize the presence of particles that cause defective products in various processing processes. Has been made. For example, taking the above-mentioned load lock chamber as an example, in a conventional vacuum exhaust structure of this vacuum chamber, the vacuum chamber 101 is evacuated by a vacuum exhaust pump 103 via a main exhaust pipe 104 as shown in FIG. However, the throttle valve 106 and the bypass exhaust valve 10 which reduce the pipe diameter in parallel with the main exhaust pipe 104 and reduce the effective area or actively reduce the effective area are provided.
7 is provided. Also, in Japanese Patent Application Laid-Open No. 4-358531, as shown in FIG.
At the initial stage of evacuation of the vacuum chamber 101 by the evacuation pump 103, the speed control means 108 is used to lower the evacuation speed of the evacuation pump 103 and gradually increase the speed. In both technologies, the vacuum chamber is not evacuated at the maximum evacuation speed from the beginning with a vacuum evacuation pump, but a slow evacuation mechanism is used by using the shunt path resistance and the pumping ability. This is when evacuating the vacuum chamber,
If the exhaust speed of the gas is excessively high, a rapid turbulence is generated in the vacuum chamber, and the particles adhering to the inner wall of the vacuum chamber are wound up. The rolled-up particles will eventually re-attach to the wall surface of the vacuum chamber or the like, but if they adhere to the semiconductor wafer, defective products will be generated as described above.

【0003】[0003]

【発明が解決しようとする課題】この従来のバイパス方
式による真空排気機構においては、図6に示すように、
真空室101内を大気圧から真空排気する場合には、有
効断面積を絞ったバイパス排気配管107を用いること
により排気速度を落とし、真空室101内の圧力がある
程度まで低下したならば、バイパス排気配管107から
有効断面積の大きなメイン排気配管104に切り替えて
真空排気していた。しかしながら、バイパス排気配管1
07の有効断面積は真空室101を最初に大気圧から真
空排気する瞬間の最大気体流速に合わせる。すなわち、
パーティクルを巻き上げない流速にしている。ここで最
適有効断面積は真空室101内の圧力と真空排気ポンプ
103の排気能力とで決まるものであり、一般に真空排
気ポンプ103の排気能力が一定であれば真空室101
の圧力に比例する。真空室101を大気圧から真空排気
する場合には、最初の瞬間と、それ以降しかも時々一刻
と最適有効断面積が変化することになり、最初の瞬間の
最適有効断面積が最も小さいことになる。従ってバイパ
ス排気配管107にて真空室101を真空排気する際に
は、随時最適スロー排気をしているわけではなく、論理
的最適値と比べて所要時間がかかることになる。これは
生産性の低下、スループットの低下に起こすことにな
る。またメイン排気配管104とは別にバイパス排気配
管107を組み付けることになり、機械設計上の繁雑
さ、バイパス排気バルブ105の開閉タイミング調整等
の電気ソフトウェア上の繁雑さを加えるという欠点があ
った。
In this conventional evacuation mechanism of the bypass type, as shown in FIG.
When the inside of the vacuum chamber 101 is evacuated from the atmospheric pressure, the evacuation speed is reduced by using the bypass exhaust pipe 107 having a narrowed effective cross-sectional area. The vacuum exhaust was performed by switching from the pipe 107 to the main exhaust pipe 104 having a large effective area. However, the bypass exhaust pipe 1
The effective area of 07 is adjusted to the maximum gas flow velocity at the moment when the vacuum chamber 101 is first evacuated from the atmospheric pressure. That is,
The flow velocity is set so as not to wind up the particles. Here, the optimum effective area is determined by the pressure in the vacuum chamber 101 and the exhaust capacity of the vacuum exhaust pump 103. Generally, if the exhaust capacity of the vacuum exhaust pump 103 is constant, the vacuum chamber 101
Is proportional to the pressure of When the vacuum chamber 101 is evacuated from the atmospheric pressure, the optimum effective area changes at the first moment and thereafter, and every moment, and the optimum effective area at the first moment becomes the smallest. . Therefore, when the vacuum chamber 101 is evacuated by the bypass exhaust pipe 107, the slow exhaust is not always performed at any time, but it takes a longer time than the logically optimum value. This causes a decrease in productivity and a decrease in throughput. In addition, the bypass exhaust pipe 107 is assembled separately from the main exhaust pipe 104, and there is a drawback that complexity in mechanical design and complexity in electric software such as adjustment of opening / closing timing of the bypass exhaust valve 105 are added.

【0004】また特開平4−358531号公報で示さ
れる真空排気ポンプの排気能力の可変化による対応で
は、真空排気ポンプの回転モータの周波数変調が考えら
れるが、その設計上の繁雑さと、比較的高価な変調器を
取り付けなければならず、また真空排気ポンプの機械的
回転系の固有振動数による異常振動の問題で、実用化さ
れていないのが現実である。
In order to cope with the problem described in Japanese Patent Application Laid-Open No. 4-358531 by varying the evacuation capacity of the evacuation pump, frequency modulation of a rotary motor of the evacuation pump can be considered. An expensive modulator has to be installed, and it is not practically used due to a problem of abnormal vibration due to a natural frequency of a mechanical rotation system of a vacuum pump.

【0005】[0005]

【課題を解決するための手段】本発明の真空排気バルブ
は、真空室側と真空排気ポンプ側との真空排気配管に接
続するフランジをもち、内部に真空排気ポンプ側の一端
を固定し、他方に遮蔽板を保持するバネと、バネが縮む
に従いバルブ内部空洞部と遮蔽板との間隙が次第に小さ
くなるような内壁を有する。
A vacuum exhaust valve according to the present invention has a flange connected to a vacuum exhaust pipe on a vacuum chamber side and a vacuum exhaust pump side, and has one end on the vacuum exhaust pump side fixed inside the other. The spring that holds the shield plate and the spring shrinks
The gap between the valve internal cavity and the shielding plate
Has an inner wall that makes

【0006】[0006]

【実施例】次に本発明について図面を参照して説明す
る。図1は本発明の一実施例の真空排気バルブの縦断面
図である。真空室と真空排気ポンプとを結管する真空排
気配管の取り付け用の真空配管フランジ2を両端に備
え、真空排気バルブ筐体1,内には遮蔽板4があり、遮
蔽板4は、バネ3を介して、真空排気バルブ筐体1内に
固定されている。また図2(a)は本実施例の遮蔽板4
の平面図であり、遮蔽板4の面内にスロー排気用穴5を
備えている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings. FIG. 1 is a longitudinal sectional view of a vacuum exhaust valve according to one embodiment of the present invention. A vacuum pipe flange 2 for mounting a vacuum exhaust pipe for connecting the vacuum chamber and the vacuum exhaust pump is provided at both ends. A shield plate 4 is provided in the vacuum exhaust valve housing 1, and the shield plate 4 includes a spring 3. , Is fixed in the vacuum exhaust valve housing 1. FIG. 2A shows the shielding plate 4 of this embodiment.
FIG. 3 is a plan view of FIG.

【0007】図4は実際に本発明の真空排気バルブ4を
真空室101の真空排気機構に適用した実施例のブロッ
ク図である。真空排気ポンプ103は真空排気バルブ
1、メイン排気バルブ102を介して真空室101をメ
イン排気配管104にて結管している。
FIG. 4 is a block diagram of an embodiment in which the vacuum exhaust valve 4 of the present invention is actually applied to a vacuum exhaust mechanism of a vacuum chamber 101. The vacuum pump 103 connects the vacuum chamber 101 with a main exhaust pipe 104 via the vacuum exhaust valve 1 and the main exhaust valve 102.

【0008】次に真空室101が大気圧であり、この真
空室101を真空排気するシーケンスを説明する。真空
排気ポンプ103は真空排気中でメイン排気バルブ10
2は閉じている。この状態においては、真空排気バルブ
1は図1で示すとおり、真空排気バルブ1内に気体の流
れがないため、バネ3が自然状態にある。なお、真空排
気バルブ1は図1で示す上方側に真空室101を配し、
下方に真空排気ポンプ103を配する。次にメイン排気
バルブ102を開く。真空室101内に充満している気
体は、瞬間最大速度にてメイン排気配管104に突入す
る。やがて突入した気体は真空排気バルブ1へ到達す
る。真空排気バルブ1内にある遮蔽板4に垂直に衝突す
ることにより、垂直応力が働く。遮蔽板4を保持してい
るバネ3は弾性変形により、縮み、真空排気バルブ筐体
1内の低部に面当たりし、遮蔽板4の外周部と真空排気
バルブ筐体1内面との間隙は最小となる(図3参照)。
この状態においては、真空排気バルブ1を通過する気体
は遮蔽板4によって制限され、わずかにスロー排気用貫
通穴5のみにより通過することになる。そして、真空室
101内の気体量すなわち圧力が減少すると、当然メイ
ン排気配管104、更には真空排気バルブ1を通過する
気体量は減少し、遮蔽板4に衝突し、発生する応力も減
少していくことになる。やがて遮蔽板4を押す応力はバ
ネ3の復元力より小さくなり、バネ3は復元を開始す
る。内部空洞部の内径は排気ポンプ側へ近づくにつれ減
少しているので遮蔽板4の外周部と真空排気バルブ筐体
1内壁面との間隙が増加し、真空排気している気体は、
この間隙を通過できるようになる。すなわち真空排気す
る有効断面積が徐々に増加することになる。
Next, a sequence in which the vacuum chamber 101 is at atmospheric pressure and the vacuum chamber 101 is evacuated will be described. The evacuation pump 103 is a main evacuation valve 10 during evacuation.
2 is closed. In this state, as shown in FIG. 1, the spring 3 is in a natural state because there is no gas flow in the vacuum exhaust valve 1 as shown in FIG. The vacuum exhaust valve 1 is provided with a vacuum chamber 101 on the upper side shown in FIG.
The evacuation pump 103 is disposed below. Next, the main exhaust valve 102 is opened. The gas filling the vacuum chamber 101 enters the main exhaust pipe 104 at the maximum instantaneous speed. Eventually, the entered gas reaches the vacuum exhaust valve 1. By colliding perpendicularly with the shielding plate 4 in the evacuation valve 1, a vertical stress acts. The spring 3 holding the shielding plate 4 contracts due to elastic deformation, and comes into contact with the lower part in the vacuum exhaust valve housing 1. The gap between the outer peripheral portion of the shielding plate 4 and the inner surface of the vacuum exhaust valve housing 1 is It is minimized (see FIG. 3).
In this state, gas passing through the vacuum exhaust valve 1 is restricted by the shielding plate 4 and slightly passes through only the slow exhaust through hole 5. When the amount of gas, that is, the pressure in the vacuum chamber 101 decreases, the amount of gas passing through the main exhaust pipe 104 and further through the vacuum exhaust valve 1 naturally decreases, collides with the shielding plate 4, and the generated stress also decreases. Will go. Eventually, the stress pressing the shielding plate 4 becomes smaller than the restoring force of the spring 3, and the spring 3 starts restoring. Since the inner diameter of the internal cavity decreases as approaching the exhaust pump side, the gap between the outer peripheral portion of the shielding plate 4 and the inner wall surface of the vacuum exhaust valve housing 1 increases, and the gas being evacuated is:
It can pass through this gap. That is, the effective sectional area for evacuation gradually increases.

【0009】図5(a)〜(c)は以上説明した本発明
の真空排気バルブの時間に対する遮蔽板高さ等の変化を
表すグラフである。
FIGS. 5A to 5C are graphs showing changes in the height of the shield plate and the like with respect to time of the above-described vacuum exhaust valve of the present invention.

【0010】また、遮蔽板4は、図2(b)で示すよう
に、多数個のスロー排気用穴5を設けるものや、図2
(c)で示すように、スロー排気調整板6によってスロ
ー排気穴の面積を調整できるものも考えられる。
As shown in FIG. 2B, the shielding plate 4 is provided with a large number of slow exhaust holes 5,
As shown in (c), a slow exhaust adjusting plate 6 can be used to adjust the area of the slow exhaust hole.

【0011】[0011]

【発明の効果】以上説明したように本発明は、真空排気
バルブ内を通過する気体の流量(速度)に応じて有効断
面積をバネの弾性力を用いて自動調整する機構を有して
いるので、真空室を大気圧下より真空排気する場合に、
パーティクルを巻き上げることなくスロー排気でき、そ
のスロー排気は最適有効断面積の真空排気口径を保ちな
がら排気できる。これにより、バイパス方式や真空排気
ポンプの排気能力可変方式と比較し、安価でしかも容易
に最適スロー排気機構が実現できる。また、本発明の真
空排気バルブの遮蔽板に、スロー排気用穴すなわち最小
有効断面積の調整機能を取り付けることにより、真空室
内のパーティクルの推積状況に応じて容易に簡便にスロ
ー排気速度を調整できる。
As described above, the present invention has a mechanism for automatically adjusting the effective sectional area using the elastic force of the spring in accordance with the flow rate (speed) of the gas passing through the vacuum exhaust valve. So, when evacuating the vacuum chamber from under atmospheric pressure,
Slow exhaust can be performed without winding up particles, and the slow exhaust can be exhausted while maintaining the vacuum exhaust diameter of the optimum effective area. As a result, an optimal slow exhaust mechanism can be realized at low cost and easily as compared with the bypass method and the variable exhaust capacity method of the vacuum exhaust pump. In addition, the slow exhaust speed can be easily and simply adjusted according to the state of particles accumulated in the vacuum chamber by attaching a slow exhaust hole, that is, a function of adjusting the minimum effective area to the shield plate of the vacuum exhaust valve of the present invention. it can.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例による真空排気バルブの縦断
面図。
FIG. 1 is a longitudinal sectional view of an evacuation valve according to an embodiment of the present invention.

【図2】図1に示した遮蔽板の平面図。FIG. 2 is a plan view of the shielding plate shown in FIG.

【図3】図1に示す真空排気バルブの動作時における縦
断面図。
FIG. 3 is a longitudinal sectional view of the vacuum exhaust valve shown in FIG. 1 during operation.

【図4】本発明における真空室排気系のブロック図。FIG. 4 is a block diagram of a vacuum chamber exhaust system according to the present invention.

【図5】本発明における一実施例の動作グラフ。FIG. 5 is an operation graph of one embodiment of the present invention.

【図6】従来技術における真空室排気系ブロック図。FIG. 6 is a block diagram of a vacuum chamber exhaust system according to the related art.

【図7】従来技術における真空室排気系ブロック図。FIG. 7 is a block diagram of a vacuum chamber exhaust system according to the related art.

【符号の説明】[Explanation of symbols]

1 真空排気バルブ(筐体) 2 真空配管フランジ 3 バネ 4 遮蔽板 5 スロー排気用貫通穴 6 スロー排気調整板 101 真空室 102 メイン排気バルブ 103 真空排気ポンプ 104 メイン排気配管 105 バイパス排気バルブ 106 絞りバルブ 107 バイパス排気配管 108 速度制御手段 DESCRIPTION OF SYMBOLS 1 Vacuum exhaust valve (housing) 2 Vacuum piping flange 3 Spring 4 Shield plate 5 Slow exhaust through hole 6 Slow exhaust adjustment plate 101 Vacuum chamber 102 Main exhaust valve 103 Vacuum pump 104 Main exhaust pipe 105 Bypass exhaust valve 106 Throttle valve 107 bypass exhaust pipe 108 speed control means

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 真空室と真空排気ポンプとを連結する真
空排気配管経路に取り付けられる真空排気バルブにおい
て、前記バルブ内に前記真空排気配管内を流れる気体流
量に応じて管路抵抗を徐々に可変する手段を備え、前記
可変する手段は貫通穴を有する可動な遮蔽板と前記遮蔽
板を保持するバネとを有し、前記バルブ内部空洞部は、
前記遮蔽板を保持するバネが縮むに従い、前記内部空洞
部と遮蔽板との間隙が次第に小さくなるような内壁を有
することを特徴とする真空排気バルブ。
1. A vacuum exhaust valve attached to a vacuum exhaust pipe connecting a vacuum chamber and a vacuum exhaust pump, wherein a gas flow flowing through the vacuum exhaust pipe inside the valve.
Means for gradually varying the pipeline resistance according to the amount,
The variable means is a movable shielding plate having a through hole and the shielding.
A spring for holding the plate, wherein the internal cavity of the valve comprises:
As the spring holding the shield contracts, the internal cavity
Has an inner wall that gradually reduces the gap between the
A vacuum exhaust valve.
JP5293251A 1993-11-24 1993-11-24 Vacuum exhaust valve Expired - Fee Related JP2658838B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5293251A JP2658838B2 (en) 1993-11-24 1993-11-24 Vacuum exhaust valve

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5293251A JP2658838B2 (en) 1993-11-24 1993-11-24 Vacuum exhaust valve

Publications (2)

Publication Number Publication Date
JPH07145872A JPH07145872A (en) 1995-06-06
JP2658838B2 true JP2658838B2 (en) 1997-09-30

Family

ID=17792407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5293251A Expired - Fee Related JP2658838B2 (en) 1993-11-24 1993-11-24 Vacuum exhaust valve

Country Status (1)

Country Link
JP (1) JP2658838B2 (en)

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JPS5238645A (en) * 1975-09-22 1977-03-25 Hitachi Ltd Opening and closing valve of vacuum sorption device
JPH06213345A (en) * 1992-02-17 1994-08-02 Tadashi Kamimura Rate-of-flow adjusting device
JP3006175U (en) * 1994-07-05 1995-01-17 日本写真印刷株式会社 Mouse pad

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