JP2628589B2 - Anti-reflection coating for polyurethane lens - Google Patents
Anti-reflection coating for polyurethane lensInfo
- Publication number
- JP2628589B2 JP2628589B2 JP2023926A JP2392690A JP2628589B2 JP 2628589 B2 JP2628589 B2 JP 2628589B2 JP 2023926 A JP2023926 A JP 2023926A JP 2392690 A JP2392690 A JP 2392690A JP 2628589 B2 JP2628589 B2 JP 2628589B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- lens
- refractive index
- optical
- antireflection film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- 229920002635 polyurethane Polymers 0.000 title claims description 24
- 238000000576 coating method Methods 0.000 title description 9
- 239000011248 coating agent Substances 0.000 title description 6
- 239000010408 film Substances 0.000 claims description 107
- 230000003287 optical effect Effects 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 11
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- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000002994 raw material Substances 0.000 claims description 6
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 6
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- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
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- GBQYMXVQHATSCC-UHFFFAOYSA-N 3-triethoxysilylpropanenitrile Chemical compound CCO[Si](OCC)(OCC)CCC#N GBQYMXVQHATSCC-UHFFFAOYSA-N 0.000 description 1
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- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical class [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
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- 229920000298 Cellophane Polymers 0.000 description 1
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical compound CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
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- 206010040925 Skin striae Diseases 0.000 description 1
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- 210000002268 wool Anatomy 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、光学素子の表面反射を防止する反射防止膜
に係り、特に、ポリウレタンレンズに有用な低屈折率膜
と高屈折率膜とを交互に積層してなる多層反射防止膜に
関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film for preventing surface reflection of an optical element, and more particularly to a low refractive index film and a high refractive index film useful for a polyurethane lens. The present invention relates to a multilayer antireflection film which is alternately stacked.
[従来の技術] 光学レンズ、フイルター、偏光子、半透鏡等の光学素
子は、従来より主として無機ガラスを材料としてきた
が、近年では、軽量である点、耐衝撃性に優れる点等か
ら、プラスチツクが多用されるようになってきている。
プラスチックレンズとしては、ポリエチレングリコール
ビスアリルカーボネート(CR−39)やポリメチルメタク
リレート(PMMA)が一般に用いられている。しかし、こ
のプラスチック材料の屈折率は1.50以下であり例えばレ
ンズ材料に用いた場合度数が強くなるとレンズの肉厚を
厚くしなければならなくなり、軽量といったプラスチッ
クの優位性が失われるばかりでなく、眼鏡用レンズとし
た場合は審美性が悪くなるので好ましくなかった。また
特に、凹レンズの場合はレンズの周囲の厚さが厚くなり
複屈折や色収差が生じ、好ましくなかった。そのため、
比重の低いプラスチックの特徴を生かしつつ、レンズの
厚さを薄くでき、かつ色収差が少ない高屈折率、低分散
プラスチック材料が望まれている。そのための材料とし
ては、ポリオールまたはポリチオールとポリイソシアネ
ートとの反応により得られたポリウレタンからなるレン
ズが知られている。[Prior art] Optical elements such as optical lenses, filters, polarizers, and semi-transparent mirrors have been mainly made of inorganic glass, but in recent years plastics have been used because of their light weight and excellent impact resistance. Is increasingly used.
As the plastic lens, polyethylene glycol bisallyl carbonate (CR-39) or polymethyl methacrylate (PMMA) is generally used. However, the refractive index of this plastic material is 1.50 or less.For example, when used as a lens material, if the power becomes strong, the thickness of the lens must be increased, and not only the advantage of plastic such as light weight is lost, but also the eyeglasses In the case of a lens for use, aesthetics are deteriorated, which is not preferable. In particular, in the case of a concave lens, the thickness around the lens is increased, and birefringence and chromatic aberration occur, which is not preferable. for that reason,
A high-refractive-index, low-dispersion plastic material capable of reducing the thickness of a lens and having little chromatic aberration while utilizing the characteristics of plastic having a low specific gravity is desired. As a material therefor, a lens made of polyurethane obtained by reacting a polyol or polythiol with a polyisocyanate is known.
このような光学素子において、表面反射は光学系の透
過率を低下させるとともに、結像に寄与しない光の増加
をもたらして、像のコントラストを低下させる原因とな
る。このため、無機ガラスからなる光学素子およびプラ
スチツクからなる光学素子ともに、多くの光学素子では
その表面に反射防止膜を設けて、表面反射が減少させて
いる。In such an optical element, surface reflection lowers the transmittance of the optical system and causes an increase in light that does not contribute to image formation, thereby causing a reduction in image contrast. For this reason, both the optical element made of inorganic glass and the optical element made of plastic are provided with an antireflection film on the surface of many optical elements to reduce surface reflection.
反射防止膜は、一般には金属または金属酸化物を原料
とする蒸着膜として形成され、蒸着膜が一層の単層反射
防止膜と、低屈折率膜と高屈折率膜とを交互に積層した
多層反射防止膜とに大別される。そして、単層反射防止
膜と多層反射防止膜のいずれについても、所望の屈折率
を有すること、光学的に均質であること、透明性に優れ
ていること等の光学的特性は勿論、耐擦傷性に優れてい
ること、密着性に優れていること等の機械的特性や、耐
酸性に優れていること、耐熱性に優れていること等の化
学的特性が要求される。The anti-reflection film is generally formed as a vapor-deposited film using a metal or metal oxide as a raw material, and the vapor-deposited film is a multilayer in which a single-layer anti-reflection film and a low-refractive-index film and a high-refractive-index film are alternately laminated. They are roughly classified into antireflection films. In addition, both the single-layer antireflection film and the multilayer antireflection film have desired refractive index, optical homogeneity, excellent transparency and other optical characteristics, as well as scratch resistance. Mechanical properties such as excellent heat resistance and excellent adhesion, and chemical properties such as excellent acid resistance and excellent heat resistance are required.
無機ガラスからなる光学素子に設ける多層反射防止膜
の高屈折率膜としては、上記特性を満足するものとして
従来より酸化ジルコニウム(ZrO2)を原料とする蒸着膜
が広く用いられており、プラスチツクからなる光学素子
に設ける多層反射防止膜の高屈折率膜についても、透明
性に優れる点、高屈折率である点等から、例えば特開昭
56−116003号公報に開示されているように、ZrO2を原料
とする蒸着膜が用いられている。As a high-refractive-index film of a multilayer antireflection film provided on an optical element made of inorganic glass, a vapor-deposited film made of zirconium oxide (ZrO 2 ) has been widely used as a material satisfying the above-mentioned properties. The high-refractive-index film of the multilayer antireflection film provided in the optical element is also excellent in transparency, high refractive index, and the like.
As disclosed in Japanese Patent Application No. 56-116003, an evaporated film using ZrO 2 as a raw material is used.
[発明が解決しようとする課題] しかしながら、無機レンズに比べプラスチックレンズ
は一般に耐熱性が劣り、プラスチックレンズの中でもポ
リウレタンレンズは特に耐熱性が劣るので、ポリウレタ
ンレンズ基板上にZrO2蒸着膜を成膜する場合、成膜時の
基板温度を十分に高くすることができない。その結果、
ポリウレタンレンズ基板上に仮温で成膜されたZrO2蒸着
膜は、高温で成膜されたZrO2蒸着膜に比べ、光学的特
性、機械的特性および化学的特性に劣り、かつこれらの
特性の耐久性も劣るという欠点があった。[Problems to be Solved by the Invention] However, compared to inorganic lenses, plastic lenses generally have poor heat resistance, and among plastic lenses, polyurethane lenses have particularly poor heat resistance. Therefore, a ZrO 2 deposited film is formed on a polyurethane lens substrate. In this case, the substrate temperature during film formation cannot be sufficiently increased. as a result,
ZrO 2 deposited film formed by the temporary temperature polyurethane lens substrate, compared with ZrO 2 deposited film formed at high temperatures, optical properties, poor mechanical properties and chemical properties, and these properties There was a drawback that durability was poor.
一方、近年、プラスチツクレンズの光学性能の改良及
びレンズ厚を薄くするための、レンズ設計からの改良と
して、レンズの屈折面のカーブを浅くした、非球面レン
ズの設計が用いられるようになっている。しかしながら
レンズ設計上、屈折面のカーブを浅くすることは、例え
ば、眼鏡レンズの場合、裏面反射の問題、即ち凹面側
(眼側)からの入射光の反射を受け易いという課題があ
る。そこで、低反射の反射防止膜が求められていたが、
前述のZrO2からなる蒸着膜の屈折率は、1.90前後であ
り、屈折率に限界があるため、高屈折率を要求される多
反射防止膜の高屈折率層の膜設計にも影響を及ぼし、例
えば、反射率を1%以下に押えるような、高性能の反射
防止膜をうることができなかった。On the other hand, in recent years, as an improvement from the lens design in order to improve the optical performance of the plastic lens and to reduce the lens thickness, an aspherical lens design in which the curve of the refractive surface of the lens is made shallow has been used. . However, in the lens design, making the curve of the refraction surface shallow, for example, in the case of a spectacle lens, has a problem of backside reflection, that is, a problem of being easily reflected by incident light from the concave side (eye side). Therefore, a low-reflection anti-reflection film was required,
The refractive index of the above-mentioned vapor deposited film made of ZrO 2 is around 1.90, which has a limit on the refractive index, which also affects the film design of the high refractive index layer of the multi-reflection film requiring a high refractive index. For example, a high-performance antireflection film that can suppress the reflectance to 1% or less could not be obtained.
したがって本発明の第1の目的とするところは、上記
課題を解決して、ポリウレタンレンズ基板上に低温で蒸
着させた場合でも、光学的特性、機械的特性および化学
的特性に優れ、かつこれら特性の耐久性が向上された多
層反射防止膜を提供することにあり、さらに、第2の目
的は、低反射の多層反射防止膜を提供することにある。Accordingly, a first object of the present invention is to solve the above-mentioned problems and to provide excellent optical, mechanical and chemical properties even when vapor-deposited on a polyurethane lens substrate at a low temperature, and to achieve these properties. It is another object of the present invention to provide a multilayer antireflection film having improved durability, and a second object is to provide a multilayer antireflection film having low reflection.
[課題を解決するための手段] 本発明は、上記目的を解決するためになされたもの
で、低屈折率膜と高屈折率膜とを交互に積層してなるポ
リウレタンレンズ用多層反射防止膜において、基板側か
ら数えて、第1層が、光学的膜厚が0.09λ〜0.14λでか
つ、タンタル、ジルコニウムおよびイツトリウムを含む
金属酸化物膜と、光学的膜厚が0.04λ〜0.07λでかつ、
硅素酸化物膜とからなる低屈折率のコンポジツト膜とか
ら構成され、第2層が、光学的膜厚が0.24λ〜0.28λで
かつ、タンタル、ジルコニウムおよびイツトリウムを含
む金属酸化物膜からなる高屈折率膜から構成され、第3
層が、光学的膜厚0.24λ〜0.26λでかつ硅素酸化物膜か
らなる低屈折率膜から構成されることを特徴とするポリ
ウレタンレンズ用多層反射防止膜を提供することにあ
る。Means for Solving the Problems The present invention has been made in order to solve the above-mentioned object, and a multilayer antireflection film for a polyurethane lens in which a low refractive index film and a high refractive index film are alternately laminated. Counting from the substrate side, the first layer has an optical thickness of 0.09λ to 0.14λ and a metal oxide film containing tantalum, zirconium and yttrium, and an optical thickness of 0.04λ to 0.07λ; ,
A second layer composed of a metal oxide film having an optical film thickness of 0.24λ to 0.28λ and containing tantalum, zirconium and yttrium. A third refractive index film
An object of the present invention is to provide a multilayer antireflection film for a polyurethane lens, wherein the layer has an optical thickness of 0.24λ to 0.26λ and is formed of a low refractive index film made of a silicon oxide film.
本発明の多層反射防止膜は、nd=1.54以上の高屈折率
ポリウレタンレンズに好ましく用いられ、特に、ndが1.
57〜1.61の高屈折率ポリウレタンに好ましく用いられ
る。The multilayer antireflection film of the present invention is preferably used for a high refractive index polyurethane lens having nd = 1.54 or more.
It is preferably used for polyurethane having a high refractive index of 57 to 1.61.
ポリウレタン製光学素子に本発明の多層反射防止膜を
設ける場合には、光学素子表面に有機硅素重合体を含む
ハードコート層をデイツピング法、スピンコート法等の
塗布法により成膜し、このハードコート膜上に本発明の
多層反射防止膜を設けることが好ましい。When the multilayer antireflection film of the present invention is provided on a polyurethane optical element, a hard coat layer containing an organosilicon polymer is formed on the optical element surface by a coating method such as a dipping method or a spin coating method. It is preferable to provide the multilayer antireflection film of the present invention on the film.
ポリウレタンレンズ基板上に形成される、有機ケイ素
重合体を含むハードコート膜は、下記の一般式を有する
化合物群および/またはこれらの加水分解物からなる群
より選ばれた化合物からなる層を、デイツプ法、塗布法
等によりポリウレタンレンズ基板上に形成したのち硬化
させることにより得ることができる。The hard coat film containing an organosilicon polymer formed on the polyurethane lens substrate includes a layer made of a compound selected from the group consisting of a compound having the following general formula and / or a hydrolyzate thereof. It can be obtained by forming and curing on a polyurethane lens substrate by a method, a coating method or the like.
一般式 (R1)a(R2)bSi(OR3)4-(a+b) (ここで、R1、R2は、炭素数1〜10のアルキル基、アリ
ール基、ハロゲン化アルキル、ハロゲン化アリール、ア
ルケニル、またはエポキシ基、(メタ)アクリルオキシ
基、メルカプト基、もしくはシアノ基を有する有機基で
Si−C結合によりケイ基と結合されるものであり、R
3は、炭素数1〜6のアルキル基、アルコキシアルキル
基またはアシル基であり、aおよびbは0、1または2
であり、a+bが1または2である。) これらの化合物の例としては、メチルトリメトキシシ
ラン、メチルトリエトキシシラン、メチルトリメトキシ
エトキシシラン、メチルトリアセトキシシラン、メチル
トリプロポキシシラン、メチルトリブトキシシラン、エ
チルトリメトキシシラン、エチルトリエトキシシラン、
ビニルトリメトキシシラン、ビニルトリエトキシシラ
ン、ビニルトリアセトキシシラン、ビニルトリメトキシ
エトキシシラン、フエニルトリメトキシシラン、フエニ
ルトリエトキシシラン、フエニルトリアセトキシシラ
ン、λ−クロロプロピルトリメトキシシラン、λ−クロ
ロプロピルトリエトキシシラン、λ−クロロプロピルト
リプロポキシシラン、3,3,3−トリフロロプロピルトリ
メトキシシラン、λ−グリシドキシプロピルトリメトキ
シシラン、λ−グリシドキシプロピルトリエトキシシラ
ン、λ−(β−グリシドキシエトキシ)プロピルトリメ
トキシシラン、β−(3,4−エポキシシクロヘキシル)
エチルトリメトキシシラン、β−(3,4−エポキシシク
ロヘキシル)エチルトリエトキシシラン、γ−メタクリ
ルオキシプロピルトリメトキシシラン、γ−アミノプロ
ピルトリメトキシシラン、γ−アミノプロピルトリエト
キシシラン、γ−メルカプトプロピルトリメトキシシラ
ン、γ−メルカプトプロピルトリエトキシシラン、N−
β(アミノエチル)−γ−アミノプロピルトリメトキシ
シラン、β−シアノエチルトリエトキシシラン等のトリ
アルコキシまたはトリアシルオキシシラン類、およびジ
メチルジメトキシシラン、フエニルメチルジメトキシシ
ラン、ジメチルジエトキシシラン、フエニルメチルジエ
トキシシラン、γ−グリシドキシプロピルメチルジメト
キシシラン、γ−グリシドキシプロピルメチルジエトキ
シシラン、γ−グリシドキシプロピルフエニルジメトキ
シシラン、γ−グリシドキシプロピルフエニルジエトキ
シシラン、γ−クロロプロピルメチルジメトキシシラ
ン、γ−クロロプロピルメチルジエトキシシラン、ジメ
チルジアセトキシシラン、γ−メタクリルオキシプロピ
ルメチルジメトキシシラン、γ−メタクリルオキシプロ
ピルメチルジエトキシシラン、γ−メルカプトプロピル
メチルジメトキシシラン、γ−メルカプトプロピルメチ
ルジエトキシシラン、γ−アミノプロピルメチルジメト
キシシラン、γ−アミノプロピルメチルジエトキシシラ
ン、メチルビニルジメトキシシラン、メチルビニルジエ
トキシシラン等のジアルコキシシランまたはジアシルオ
キシシラン類が挙げられる。Formula (R 1 ) a (R 2 ) b Si (OR 3 ) 4- (a + b) (where R 1 and R 2 are an alkyl group having 1 to 10 carbon atoms, an aryl group, an alkyl halide, , An organic group having an aryl, alkenyl, or epoxy group, a (meth) acryloxy group, a mercapto group, or a cyano group
Bonded to a silicon group by a Si-C bond,
3 is an alkyl group having 1 to 6 carbon atoms, an alkoxyalkyl group or an acyl group, and a and b are 0, 1 or 2
And a + b is 1 or 2. Examples of these compounds include methyltrimethoxysilane, methyltriethoxysilane, methyltrimethoxyethoxysilane, methyltriacetoxysilane, methyltripropoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane,
Vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriacetoxysilane, vinyltrimethoxyethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriacetoxysilane, λ-chloropropyltrimethoxysilane, λ-chloro Propyltriethoxysilane, λ-chloropropyltripropoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, λ-glycidoxypropyltrimethoxysilane, λ-glycidoxypropyltriethoxysilane, λ- (β -Glycidoxyethoxy) propyltrimethoxysilane, β- (3,4-epoxycyclohexyl)
Ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-mercaptopropyltri Methoxysilane, γ-mercaptopropyltriethoxysilane, N-
trialkoxy or triacyloxysilanes such as β (aminoethyl) -γ-aminopropyltrimethoxysilane, β-cyanoethyltriethoxysilane, and dimethyldimethoxysilane, phenylmethyldimethoxysilane, dimethyldiethoxysilane, phenylmethyldisilane Ethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropylphenyldimethoxysilane, γ-glycidoxypropylphenyldiethoxysilane, γ-chloro Propylmethyldimethoxysilane, γ-chloropropylmethyldiethoxysilane, dimethyldiacetoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane Dialkoxysilanes such as γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-aminopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane, methylvinyldimethoxysilane and methylvinyldiethoxysilane Or diacyloxysilanes.
これらの有機ケイ素化合物は、単独または2種以上組
合わせることも可能である。These organosilicon compounds can be used alone or in combination of two or more.
さらに、単独では用いられないが、上記の有機ケイ素
化合物と併用できるものとして、各種のテトラアルコキ
シシラン類もしくはその加水分解物がある。Furthermore, various tetraalkoxysilanes or hydrolysates thereof can be used in combination with the above-mentioned organosilicon compound, although they are not used alone.
このようなテトラアルコキシシラン類の例としては、
メチルシリケート、エチルシリケート、n−プロピルシ
リケート、イソプロピルシリケート、n−ブチルシリケ
ート、sec−ブチルシリケートおよびt−ブチルシリケ
ート等が挙げられる。Examples of such tetraalkoxysilanes include:
Examples include methyl silicate, ethyl silicate, n-propyl silicate, isopropyl silicate, n-butyl silicate, sec-butyl silicate and t-butyl silicate.
またこれらの有機ケイ素化合物は、触媒が存在しなく
ても硬化が可能であるが、さらに硬化を促進するため
に、各種の触媒を用いることが可能である。Further, these organosilicon compounds can be cured without a catalyst, but various catalysts can be used to further promote the curing.
このような触媒としては、ルイス酸、ルイス酸塩を含
む各種酸もしくは塩基、あるいは有機カルボン酸、クロ
ム酸、次亜塩素酸、ホウ素、臭素酸、亜セレン酸、チオ
硫酸、オルトケイ酸、チオシアン酸、亜硝酸、アルミン
酸、炭酸等の金属塩とくにアルカリ金属塩またはアンモ
ニウム塩、さらにはアルミニウム、ジルコニウムあるい
はチタニウムのアルコキシドまたはこれらの錯化合物等
を使用することができる。Such catalysts include Lewis acids, various acids or bases including Lewis acid salts, or organic carboxylic acids, chromic acid, hypochlorous acid, boron, bromic acid, selenous acid, thiosulfuric acid, orthosilicic acid, thiocyanic acid And metal salts such as nitrous acid, aluminate and carbonic acid, particularly alkali metal salts or ammonium salts, and alkoxides of aluminum, zirconium or titanium, or complex compounds thereof.
さらに、前述した有機ケイ素重合体と他の有機物との
併用も可能であり、併用する他の有機物としては、エポ
キシ樹脂、アクリル系共重合体、あるいはポリビニルア
ルコール等の水酸基含有重合体等が挙げられる。Furthermore, it is also possible to use the above-mentioned organosilicon polymer and another organic substance in combination.Examples of the other organic substance to be used in combination include an epoxy resin, an acrylic copolymer, and a hydroxyl group-containing polymer such as polyvinyl alcohol. .
また、その他の賦形成分として、オプテイカアクタ
(1962年7月発行、251頁)に開示されているような、S
i、Al、Ti、Sb等の無機酸化物のコロイドゾルを使用す
ることができる。Further, as other excipients, there are S as disclosed in Optica Actor (issued in July, 1962, p. 251).
Colloid sols of inorganic oxides such as i, Al, Ti, Sb, etc. can be used.
さらに、コーテイング作業を容易にするために保存状
態を良好に保つ溶剤類、および各種添加剤を使用するこ
とも可能である。Furthermore, in order to facilitate the coating operation, it is also possible to use solvents that maintain a good storage state and various additives.
また、光学素子と多層反射防止膜との密着性、耐擦傷
性等の向上を図るうえで、光学素子と多層反射防止膜と
の間、あるいは光学素子表面に成膜したハードコート膜
と多層反射防止膜との間に下地層を介在させることは好
ましく、このような下地層としては、例えば硅素酸化物
等の蒸着膜を使用することができ、その場合、光学的膜
厚は0.4λ〜0.6λが好ましく用いられる。In addition, in order to improve the adhesion between the optical element and the multilayer anti-reflection film and the abrasion resistance, etc., a hard coat film formed between the optical element and the multilayer anti-reflection film or on the surface of the optical element and the multilayer reflection film are used. It is preferable that an underlayer is interposed between the anti-reflection film and the underlayer, and as such an underlayer, for example, a deposited film of silicon oxide or the like can be used, and in this case, the optical film thickness is 0.4λ to 0.6. λ is preferably used.
なお、本発明の多層反射防止膜を成膜するにあたって
は、真空蒸着法の他、同様の焼結体をターゲット材料と
するスパツタリング法や、イオンプレーテイング法等の
方法を用いることもできる。In forming the multilayer antireflection film of the present invention, a sputtering method using a similar sintered body as a target material, an ion plating method, or the like can be used in addition to the vacuum evaporation method.
本発明において、タンタル、ジルコニウムおよびイツ
トリウムを含む金属酸化物の蒸着膜は、酸化ジルコニウ
ム(ZrO2)粉末、酸化タンタル(Ta2O5)粉末および酸
化イツトリウム(Y2O3)粉末を混合し、加圧プレス、焼
結によりペレツト状にしたものを電子ビーム加熱法にて
蒸着させたものが好適である。各粉末を混合してなる混
合原料の組成比は、モル比において、ZrO2が1.0に対
し、Ta2O5が0.8〜1.8、Y2O3が0.05〜0.3であることが好
ましい。In the present invention, a deposited film of a metal oxide containing tantalum, zirconium and yttrium is obtained by mixing zirconium oxide (ZrO 2 ) powder, tantalum oxide (Ta 2 O 5 ) powder and yttrium oxide (Y 2 O 3 ) powder, Pellets formed by pressing and sintering are preferably deposited by electron beam heating. The composition ratio of the mixed raw material obtained by mixing the respective powders is preferably such that the molar ratio of ZrO 2 is 1.0, Ta 2 O 5 is 0.8 to 1.8, and Y 2 O 3 is 0.05 to 0.3.
このようにして得られる蒸着膜(以下、3成分蒸着膜
と称す)は、Ta2O5膜と同様に、ZrO2膜に比べ化学的に
極めて安定であり、かつZrO2膜に匹敵する透明性を有し
ている。さらに屈折率において、例えば2.00〜2.10の高
い数値を示し、膜設計上からも有効である。Thus deposited film obtained (hereinafter referred to as 3-component vapor-deposited film), as well as the the Ta 2 O 5 film is chemically extremely stable compared to the ZrO 2 film, and a transparent comparable to the ZrO 2 film It has nature. Further, the refractive index shows a high value of, for example, 2.00 to 2.10, which is effective from the viewpoint of film design.
なお、1モルのZrO2に対して、Ta2O5が0.8モル未満の
場合や1.8モルを超える場合には、得られる3成分蒸着
膜に吸収が生じ易く、Y2O3が0.3モルを超えると、蒸着
速度が速くなり、得られる3成分蒸着膜に吸収が生じ易
くなるとともに、蒸着原料の飛散が生じ易くその制御が
難しい。When Ta 2 O 5 is less than 0.8 mol or more than 1.8 mol with respect to 1 mol of ZrO 2 , absorption tends to occur in the obtained three-component vapor-deposited film, and 0.3 mol of Y 2 O 3 is used. If it exceeds, the vapor deposition rate increases, and the resulting three-component vapor-deposited film is easily absorbed, and the vapor deposition raw material is easily scattered, which is difficult to control.
[実施例] 以下、本発明の実施例について説明する。EXAMPLES Examples of the present invention will be described below.
(高屈折率ポリウレタンレンズの作製) m−キシリレンジイソシアネート100重量部と、ペン
タエリスリトールテトラキス−3−メルカプトプロピオ
ネート142重量部と、リン酸ジ−n−ブチル6重量部
と、ジブチルスズジラウレート0.25重量部と、紫外線吸
収剤として2−(2′−ヒドロキシ−5′−t−オクチ
ルフエニル)ベンゾトリアゾール0.5重量部とを混合
し、十分に撹拌したのち1mmHgの真空下で60分脱気を行
った。(Production of high refractive index polyurethane lens) 100 parts by weight of m-xylylene diisocyanate, 142 parts by weight of pentaerythritol tetrakis-3-mercaptopropionate, 6 parts by weight of di-n-butyl phosphate, and 0.25 parts by weight of dibutyltin dilaurate And 0.5 parts by weight of 2- (2'-hydroxy-5'-t-octylphenyl) benzotriazole as an ultraviolet absorber, and after sufficiently stirring, degassed under a vacuum of 1 mmHg for 60 minutes. Was.
次いで、ガラス製レンズ成形用型と樹脂製ガスケット
とからなる鋳型中に前記混合液を注入し、25℃から120
ま℃で連続的に20時間かけて昇温し、次いで120℃で2
時間保持して重合を行なった。重合後ガスケットを除去
し、レンズ成形型とレンズを分離して高屈折率ポリウレ
タンレンズを得た。Next, the mixed solution was poured into a mold composed of a glass lens molding die and a resin gasket, and was heated from 25 ° C to 120 ° C.
The temperature was raised continuously at 20 ° C for 20 hours, then at 120 ° C for 2 hours.
The polymerization was carried out while maintaining the time. After the polymerization, the gasket was removed, and the lens mold and the lens were separated to obtain a high refractive index polyurethane lens.
得られたレンズはnd=1.592、νd=36という良好な
光学物性を有していた。The obtained lens had good optical physical properties of n d = 1.592 and v d = 36.
(コーティング液の調整) γ−グリシドキシプロピルトリメトキシシラン212重
量部に、0.06規定温酸水溶液54重量部を撹拌しながら滴
下した。滴下終了後、24時間撹拌を行ない加水分解物を
得た。(Preparation of Coating Solution) 54 parts by weight of a 0.06 N hot acid aqueous solution was added dropwise to 212 parts by weight of γ-glycidoxypropyltrimethoxysilane while stirring. After completion of the dropwise addition, the mixture was stirred for 24 hours to obtain a hydrolyzate.
次いで、五酸化アンチモンゾル(メタノール分散状ゾ
ル、平均粒子径10nm、固定分30%)424重量部と、エポ
キシ化合物としてデナコールEX−521(ナガセ化成株式
会社製、ポリグリセロールポリグリシジルエーテル)34
重量部とを添加し、5時間撹拌した後、硬化触媒として
ジブチルスズラウレートを6.8重量部添加して、更に100
時間熟成することによりコーテイング液を得た。Then, 424 parts by weight of antimony pentoxide sol (methanol-dispersed sol, average particle diameter 10 nm, fixed content 30%) and Denacol EX-521 (Nagase Kasei Co., Ltd., polyglycerol polyglycidyl ether) 34 as an epoxy compound
After stirring for 5 hours, 6.8 parts by weight of dibutyltin laurate was added as a curing catalyst, and further 100 parts by weight.
After aging for a time, a coating solution was obtained.
(ハードコート膜の成形) 前述の方法で作製した高屈折率ポリウレタンレンズを
50℃の10%NaOH水溶液に5分間浸漬し、十分に洗浄を行
なった後、上記の方法で調整されてコーティング液を用
いて、デイツプ法(引き上げ速度12cm/分)コーテイン
グを行ない、120℃で1時間加熱して硬化させたのち徐
冷してハードコート付プラスチツクレンズを得た。(Formation of a hard coat film) The high refractive index polyurethane lens produced by the above-described method was used.
After being immersed in a 10% NaOH aqueous solution at 50 ° C. for 5 minutes and sufficiently washed, a coating method is applied using the coating solution prepared by the above method, and a dipping method (pulling speed: 12 cm / min) is performed. After heating and curing for 1 hour, the mixture was gradually cooled to obtain a plastic lens with a hard coat.
(多層反射防止膜の成形) 次に、このハードコート付プラスチツクレンズに設け
る下地層および低屈折率膜の蒸着原料として、SiO2の焼
結体を、また高屈折率膜の蒸着原料としてZrO2粉末、Ta
2O5粉末およびY2O3粉末をモル比で1:1.3:0.2の割合で混
合し、プレス成形したのち1200℃で焼結してペレツト状
にしたものを用い、前述のプラスチツクレンズを蒸着槽
に入れ、排気しながら85℃に加熱し、2×10-5Torrまで
排気した後、電子ビーム加熱法にて上記蒸着原料をプラ
スチツクレンズ表面に蒸着させて、表−1に示すよう
に、硅素酸化物膜からなる下地層、3成分蒸着膜と硅素
酸化物膜とのコンポジツト等価膜からなる第1層の低屈
折率膜、3成分蒸着膜からなる第2層の高屈折率膜およ
び硅素酸化物膜からなる第3層の低屈折率膜を順次成膜
してなる膜構成の多層反射防止膜を成膜した。なお、下
地層は、注目的として基板との密着性を向上させるもの
として使用した。(Formation of Multilayer Antireflection Film) Next, a sintered material of SiO 2 was used as a deposition material for an underlayer and a low-refractive-index film provided on the plastic lens with a hard coat, and ZrO 2 was used as a deposition material for a high-refractive-index film. Powder, Ta
2 O 5 powder and Y 2 O 3 powder were mixed at a molar ratio of 1: 1.3: 0.2, press-molded, sintered at 1200 ° C and pelletized, and the plastic lens described above was deposited. After placing in a tank and heating to 85 ° C. while evacuating, and evacuating to 2 × 10 −5 Torr, the above-mentioned vapor deposition raw material was vapor-deposited on the plastic lens surface by an electron beam heating method, and as shown in Table 1, An underlayer composed of a silicon oxide film, a first low-refractive-index film composed of a composite equivalent film of a three-component vapor-deposited film and a silicon oxide film, a second high-refractive-index film composed of a three-component vapor-deposited film, and silicon A multilayer antireflection film having a film configuration in which a third layer of a low refractive index film made of an oxide film was sequentially formed was formed. Note that the underlayer was noticeably used to improve the adhesion to the substrate.
また、このようにして成膜した多層反射防止膜および
この多層反射防止膜を有するプラスチツクレンズの、機
械的特性、化学的特性およびこれら特性の耐久性を評価
するにあたり、レンズの外観、耐擦傷生、密着性、耐熱
性、耐アルカリ性、耐酸性および耐候性を下記の要領で
評価、測定した。 In evaluating the mechanical properties, chemical properties, and durability of these properties of the multilayer antireflection film formed as described above and the plastic lens having the multilayer antireflection film, the appearance of the lens, the scratch resistance , Adhesion, heat resistance, alkali resistance, acid resistance and weather resistance were evaluated and measured in the following manner.
・外 観 蛍光灯を光源とする照明装置を用い、目視にて下記
1)〜4)を満足するか否か観察した。-Appearance Using a lighting device using a fluorescent lamp as a light source, it was visually observed whether or not the following 1) to 4) were satisfied.
1)透明であること。1) Be transparent.
2)表面に不規則性がないこと。2) The surface has no irregularities.
3)脈理がないこと。3) No striae.
4)表面に異物、傷がないこと。4) No foreign matter or scratches on the surface.
・視感反射率 日立製作所製340型自記分光光度計を用い、380〜780n
m波長域の反射率を測定し、この反射率と視感度曲線と
から視感率を換算した。-Luminous reflectance 380-780n using Hitachi 340 type self-recording spectrophotometer
The reflectance in the m wavelength region was measured, and the luminous efficiency was converted from the reflectance and the visibility curve.
・耐擦傷性 スチールウール#0000で多層反射防止膜表面を擦っ
て、傷のつきにくさを目視で判断した。判断基準は以下
のようにした。Scratch resistance The surface of the multilayer antireflection film was rubbed with steel wool # 0000, and the scratch resistance was visually determined. The criteria were as follows.
A…強く擦ってもほとんど傷がつかない。A: Hardly scratched even if strongly rubbed.
B…強く擦るとかなり傷がつく。B: If you rub it hard, it will be quite scratched.
C…レンズ基板と同等の傷がつく。C: The same damage as the lens substrate is made.
・耐衝撃性 反射防止性高屈折率プラスチツクレンズの中心に127c
mの高さから16gの鋼球を落下させ、レンズの破損の有無
を調べた。・ Shock resistance Anti-reflective property High refractive index 127c at the center of plastic lens
A 16 g steel ball was dropped from a height of m, and the lens was examined for damage.
・密着性 多層反射防止膜を設けたレンズ表面を1mm間隔で100目
クロスカツトし、セロファンテープを強く貼り付けた
後、急速に剥がして、多層反射防止膜、下地層および硬
化膜の剥離の有無を調べた。・ Adhesiveness Cross-cut the lens surface with the multilayer anti-reflective coating at 100mm intervals at 1mm intervals, apply strong cellophane tape, peel off rapidly, and check whether the multilayer anti-reflective coating, underlayer and cured film have peeled off. Examined.
・耐熱性 多層反射防止膜を設けたレンズをオーブンに1時間入
れて加熱し、クラツクの発生の有無を調べた。加熱温度
は、70℃より始め、5℃づつ上げて、クラツクが発生す
る温度により優劣を判定した。Heat resistance The lens provided with the multilayer anti-reflection film was placed in an oven for one hour and heated to check for cracks. The heating temperature was started from 70 ° C., increased by 5 ° C. in increments of 5 ° C., and the superiority was determined by the temperature at which cracks occurred.
・耐アルカリ性 10wt%NaOH水溶液に、多層反射防止膜を設けたレンズ
を24時間浸漬し、多層反射防止膜表面の浸食状態を観察
した。-Alkali resistance A lens provided with a multilayer antireflection film was immersed in a 10 wt% NaOH aqueous solution for 24 hours, and the erosion state of the surface of the multilayer antireflection film was observed.
・耐酸性 10wt%HC1水溶液および10wt%H2SO4水溶液に、多層反
射防止膜を設けたレンズを3時間浸漬し、多層反射防止
膜表面の侵食状態を観察した。A lens provided with a multilayer anti-reflection film was immersed in an acid-resistant 10 wt% HC1 aqueous solution and a 10 wt% H 2 SO 4 aqueous solution for 3 hours, and the erosion state of the multilayer anti-reflection film surface was observed.
・耐候性 耐久性を調べるために多層反射防止膜を設けたレンズ
を1箇月屋外暴露し、この後、外観、耐擦傷性、密着
性、耐熱性、耐アルカリ性および耐酸性を上記の要領で
評価、測定した。・ Weather resistance In order to examine durability, a lens provided with a multilayer anti-reflective coating was exposed outdoors for one month, and then the appearance, scratch resistance, adhesion, heat resistance, alkali resistance and acid resistance were evaluated as described above. ,It was measured.
この結果、本実施例の多層反射防止膜およびこの多層
反射防止膜を有するプラスチツクレンズにおいては、い
ずれの項目についても良好な評価、測定結果が得られ、
機械的特性、化学的特性に優れるとともに、これら特性
が耐久性に優れていることが確認された。As a result, in the multilayer antireflection film of the present example and the plastic lens having the multilayer antireflection film, favorable evaluation and measurement results were obtained for all items,
It was confirmed that the mechanical properties and chemical properties were excellent, and that these properties were excellent in durability.
なおこれらの評価、測定結果のうち、外観、視感反射
率、耐擦傷性、耐衝撃性、密着性、耐熱性、耐アルカリ
性および耐酸性の8項目の評価、測定結果を表−2に、
耐候性すなわち屋外暴露1箇月後の上記8項目の評価結
果を表−3に示す。Of these evaluation and measurement results, Table 2 shows the evaluation and measurement results of the eight items of appearance, luminous reflectance, scratch resistance, impact resistance, adhesion, heat resistance, alkali resistance and acid resistance.
Table 3 shows the weather resistance, that is, the evaluation results of the above eight items one month after outdoor exposure.
本実施例で得られた多層反射防止膜を有するポリウレ
タンレンズの、380〜780nm波長域におけるレンズ両面で
の反射率を、日立製作所製340型自記分光光度計を用い
て測定したところ、第1図にその分光反射率曲線を示す
ように、本実施例で得られた多層反射防止膜を有するプ
ラスチツクレンズは、視感反射率1%以下の優れた反射
防止特性を有していることが確認された。FIG. 1 shows the reflectance of the polyurethane lens having a multilayer anti-reflection coating obtained in this example, measured on both surfaces of the lens in the wavelength range of 380 to 780 nm using a Hitachi 340 type recording spectrophotometer. As shown in the spectral reflectance curve, it is confirmed that the plastic lens having the multilayer antireflection film obtained in this example has excellent antireflection characteristics with a luminous reflectance of 1% or less. Was.
[発明の効果] 以上説明したように、本発明の多層反射防止膜は、比
較的低温で蒸着させた場合でも、光学的特性、機械的特
性および化学的特性に優れているとともに、これら特性
が耐久性に優れている。 [Effects of the Invention] As described above, the multilayer antireflection film of the present invention has excellent optical, mechanical, and chemical properties even when deposited at a relatively low temperature, and has these properties. Has excellent durability.
したがって本発明を実施することにより、ポリウレタ
ン製光学素子のように、反射防止膜の成膜時における基
板温度を高くすることができない光学素子についても、
光学的特性、機械的特性および化学的特性に優れ、かつ
これら特性が耐久性に優れている多層反射防止膜を設け
て、光学素子の光学的特性を長期に亘って高いレベルに
維持させることが可能となる。Therefore, by implementing the present invention, even for an optical element such as a polyurethane optical element that cannot raise the substrate temperature during the formation of the antireflection film,
By providing a multilayer anti-reflection film having excellent optical properties, mechanical properties and chemical properties, and excellent in these properties, it is possible to maintain the optical properties of the optical element at a high level for a long time. It becomes possible.
さらに、本発明の膜設計により、時に高屈折率のポリ
ウレタンレンズに有用な、低反射防止膜をうることがで
きる。Further, the film design of the present invention can provide a low antireflection film, which is sometimes useful for polyurethane lenses having a high refractive index.
第1図は実施例で得られた多層反射防止膜を有するポリ
ウレタンレンズの分光反射率曲線である。FIG. 1 is a spectral reflectance curve of a polyurethane lens having a multilayer antireflection film obtained in an example.
Claims (2)
てなるポリウレタンレンズ用多層反射防止膜において、
基板側から数えて、第1層が、光学的膜厚が0.09λ〜0.
14λでかつ、タンタル、ジルコニウムおよびイツトリウ
ムを含む金属酸化物膜と、光学的膜厚が0.04λ〜0.07λ
でかつ、硅素酸化物膜とからなる低屈折率のコンポジツ
ト膜とから構成され、第2層が、光学的膜厚が0.24λ〜
0.28λでかつ、タンタル、ジルコニウムおよびイツトリ
ウムを含む金属酸化膜からなる高屈折率膜から構成さ
れ、第3層が、光学的膜厚0.24λ〜0.26λでかつ硅素酸
化物膜からなる低屈折率膜から構成されることを特徴と
するポリウレタンレンズ用反射防止膜。1. A multilayer antireflection film for a polyurethane lens comprising a low refractive index film and a high refractive index film alternately laminated,
Counting from the substrate side, the first layer has an optical thickness of 0.09λ to 0.
14λ, and a metal oxide film containing tantalum, zirconium and yttrium, and an optical film thickness of 0.04λ to 0.07λ
And a low refractive index composite film composed of a silicon oxide film, and the second layer has an optical thickness of 0.24λ or more.
0.23λ, a high refractive index film composed of a metal oxide film containing tantalum, zirconium and yttrium, and a third layer having an optical thickness of 0.24λ to 0.26λ and a low refractive index composed of a silicon oxide film An antireflection film for a polyurethane lens, comprising a film.
リウムを含む金属酸化物膜がZrO21モルに対してTa2O5を
0.8〜1.8モル、Y2O3を0.05〜0.3モル含む混合原料を蒸
着して得られたものである、特許請求の範囲第1項に記
載のポリウレタンレンズ用多層反射防止膜。2. The method according to claim 1, wherein the metal oxide film containing tantalum, zirconium and yttrium contains Ta 2 O 5 per 1 mol of ZrO 2.
0.8 to 1.8 mol, Y 2 O 3 and is obtained by depositing 0.05-0.3 molar comprises mixing raw materials, polyurethane lens multilayer antireflection film according to paragraph 1 the claims.
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JP2023926A JP2628589B2 (en) | 1990-02-02 | 1990-02-02 | Anti-reflection coating for polyurethane lens |
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JP2023926A JP2628589B2 (en) | 1990-02-02 | 1990-02-02 | Anti-reflection coating for polyurethane lens |
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JP2628589B2 true JP2628589B2 (en) | 1997-07-09 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP3179191B2 (en) * | 1992-05-29 | 2001-06-25 | ホーヤ株式会社 | Optical member having antireflection film, method for forming vapor deposition film, and vapor deposition composition |
KR102318427B1 (en) * | 2018-03-29 | 2021-10-29 | 호야 렌즈 타일랜드 리미티드 | Coating compositions, spectacle lenses and methods of making spectacle lenses |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6029701A (en) * | 1983-07-26 | 1985-02-15 | Asahi Glass Co Ltd | Reflection preventing film having five layered structure |
JPS6250701A (en) * | 1985-08-29 | 1987-03-05 | Seiko Epson Corp | anti-reflection film |
JPS62178901A (en) * | 1986-02-03 | 1987-08-06 | Toray Ind Inc | Optical parts having multi-layered antireflection film |
-
1990
- 1990-02-02 JP JP2023926A patent/JP2628589B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6029701A (en) * | 1983-07-26 | 1985-02-15 | Asahi Glass Co Ltd | Reflection preventing film having five layered structure |
JPS6250701A (en) * | 1985-08-29 | 1987-03-05 | Seiko Epson Corp | anti-reflection film |
JPS62178901A (en) * | 1986-02-03 | 1987-08-06 | Toray Ind Inc | Optical parts having multi-layered antireflection film |
Also Published As
Publication number | Publication date |
---|---|
JPH03229202A (en) | 1991-10-11 |
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