JP2545558B2 - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JP2545558B2 JP2545558B2 JP62291221A JP29122187A JP2545558B2 JP 2545558 B2 JP2545558 B2 JP 2545558B2 JP 62291221 A JP62291221 A JP 62291221A JP 29122187 A JP29122187 A JP 29122187A JP 2545558 B2 JP2545558 B2 JP 2545558B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituted
- atom
- parts
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 15
- -1 phthalocyanine compound Chemical group 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000004429 atom Chemical group 0.000 claims description 4
- 125000001624 naphthyl group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000005577 anthracene group Chemical group 0.000 claims description 3
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 10
- 150000002825 nitriles Chemical class 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 239000012043 crude product Substances 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000012264 purified product Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 239000004431 polycarbonate resin Substances 0.000 description 3
- 229920005596 polymer binder Polymers 0.000 description 3
- 239000002491 polymer binding agent Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- VWVZFHRDLPHBEG-UHFFFAOYSA-N 1-(chloromethyl)-4-methylsulfanylbenzene Chemical group CSC1=CC=C(CCl)C=C1 VWVZFHRDLPHBEG-UHFFFAOYSA-N 0.000 description 1
- JTPNRXUCIXHOKM-UHFFFAOYSA-N 1-chloronaphthalene Chemical compound C1=CC=C2C(Cl)=CC=CC2=C1 JTPNRXUCIXHOKM-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- IHCCLXNEEPMSIO-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 IHCCLXNEEPMSIO-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical group O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 125000004987 dibenzofuryl group Chemical group C1(=CC=CC=2OC3=C(C21)C=CC=C3)* 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
- G11B7/248—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes porphines; azaporphines, e.g. phthalocyanines
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は,レーザー光線によって情報を書き込んだ
り,読取ったりすることが可能な光学記録媒体に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Field of Industrial Application) The present invention relates to an optical recording medium capable of writing and reading information by a laser beam.
(従来の技術) 従来,レーザー光線を用いて情報を記録する媒体には
種々のものがあるが,その一つにレーザー光線を基板上
の記録層に照射することによって,照射部分を局部的に
加熱し,融解,蒸発または分解等の物理的変化を起させ
情報を記録するものがある。(Prior Art) Conventionally, there are various media for recording information by using a laser beam, and one of them is to irradiate a laser beam to a recording layer on a substrate to locally heat the irradiated portion. , Records information by causing physical changes such as melting, evaporation or decomposition.
これまで基板上の記録層として,As,Te,Se,Ti等の金属
や合金の薄膜層が使用されてきた。このような記録層を
有する光学記録媒体は,一般に比較的書き込み感度が高
く,また記録再生の光学系が小型にできる半導体レーザ
ーにも適用することができるが,熱伝導率が大きい,反
射率が小さい等の理由で記録時にレーザー光線のエネル
ギーを効率よく利用できず,高速走査で記録するには大
出力のレーザー光線が必要となる場合がある。また,こ
れらの記録層は化学的に不安定であり,空気中で劣化さ
れることがある。Until now, thin film layers of metals and alloys such as As, Te, Se and Ti have been used as recording layers on substrates. An optical recording medium having such a recording layer generally has a relatively high writing sensitivity and can be applied to a semiconductor laser which can be downsized in a recording / reproducing optical system, but has a large thermal conductivity and a high reflectance. Due to the small size, the energy of the laser beam cannot be used efficiently during recording, and a high-power laser beam may be required for high-speed scanning recording. Further, these recording layers are chemically unstable and may be deteriorated in the air.
この様なことから,近年比較的長波長(例えば780nm
以上)のレーザー光線を用いて,基板上の有機薄膜層に
情報を書き込んだり読み取ったりする光記録媒体の研究
がなされている。Because of this, in recent years relatively long wavelengths (eg 780 nm
Studies have been made on optical recording media in which information is written in and read from the organic thin film layer on the substrate using the above laser beam.
この様な有機薄膜層は,半導体レーザーを用いて融
解,蒸発または分解等によって容易に小さな凹部(ピッ
ト)を形成できる利点を持っている。Such an organic thin film layer has the advantage that small recesses (pits) can be easily formed by melting, evaporation or decomposition using a semiconductor laser.
有機薄膜層を基板の上に形成させ,レーザー光線を用
いて情報を記録,再生する光ディスクとして特開昭57-8
2093,特開昭58-56892,特開昭60-89842,特開昭60-150243
等の各号公報がすでに公知である。しかしながら,半導
体レーザー光線に対して吸収係数が大きい,記録感度の
高い光記録媒体として完全に満足できるものは開発され
ていないのが実情である。An optical disk in which an organic thin film layer is formed on a substrate and information is recorded and reproduced by using a laser beam.
2093, JP 58-56892, JP 60-89842, JP 60-150243
Each of the above publications is already known. However, as a matter of fact, as an optical recording medium having a large absorption coefficient for a semiconductor laser beam and a high recording sensitivity, a completely satisfactory one has not been developed.
(発明が解決しようとする問題点) 本発明は,化学的,物理的に安定でレーザー光線で高
感度で記録再生できる安価な特定のフタロシアニン系化
合物を用いた光記録媒体を提供するものである。(Problems to be Solved by the Invention) The present invention provides an optical recording medium using an inexpensive specific phthalocyanine compound that is chemically and physically stable and can be recorded and reproduced with high sensitivity by a laser beam.
(問題を解決するための手段) 本発明者等は鋭意研究を行った結果,基板上に特定の
構造を有するフタロシアニン系化合物を含有する記録層
を有する光記録媒体が優れた種々の特性を有することを
見出し,本発明を完成するに到った。(Means for Solving the Problem) As a result of intensive studies by the present inventors, an optical recording medium having a recording layer containing a phthalocyanine compound having a specific structure on a substrate has various excellent characteristics. The inventors have found that and completed the present invention.
即ち本発明は基板上に下記一般式〔I〕で示される特
定のフタロシアニン系化合物の少なくとも一種以上を含
有する記録層を形成させることを特徴とする。That is, the present invention is characterized in that a recording layer containing at least one specific phthalocyanine compound represented by the following general formula [I] is formed on a substrate.
式中,A1,A2,A3,A4は,それぞれ独立にベンゼン環,ナ
フタレン環,アントラセン環または下記式で示される含
窒素複素環を表す, 但し,A1,A2,A3またはA4のうち1〜3つは上記含窒素
複素環のうちの1つである。 In the formula, A 1 , A 2 , A 3 , and A 4 each independently represent a benzene ring, a naphthalene ring, an anthracene ring, or a nitrogen-containing heterocycle represented by the following formula, However, 1 to 3 of A 1 , A 2 , A 3 or A 4 is one of the above nitrogen-containing heterocycles.
X1,X2,X3,X4は,それぞれ独立に,水素原子,ハロゲ
ン原子,シアノ基,ニトロ基,カルボン酸基,スルホン
酸基,置換もしくは未置換の脂肪族炭化水素基,置換も
しくは未置換の芳香族炭化水素基,置換もしくは未置換
の芳香族複素環基,−OR1,−SR2, −NHCOR9,−CO2R10,−N=N−R11(ここで,R1ないしR
11は水素原子,置換もしくは未置換の脂肪族炭化水素基
または置換もしくは未置換の芳香族複素環基を表す。) Mは水素原子,またはハロゲン,酸素原子を有しても
よい金属原子または(OR12)p,(OSiR13R14R15)qを有
してもよい金属原子を表す。(ここでR12,R13,R14,R15
はR1ないしR11と同様。p,qは0ないし2の整数を表
す。) k,l,mおよびnはそれぞれ独立に0ないし4の整数を
表す。X 1 , X 2 , X 3 and X 4 are each independently a hydrogen atom, halogen atom, cyano group, nitro group, carboxylic acid group, sulfonic acid group, substituted or unsubstituted aliphatic hydrocarbon group, substituted or Unsubstituted aromatic hydrocarbon group, substituted or unsubstituted aromatic heterocyclic group, -OR 1 , -SR 2 , -NHCOR 9 , -CO 2 R 10 , -N = N-R 11 (where R 1 to R
11 represents a hydrogen atom, a substituted or unsubstituted aliphatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group. ) M represents a hydrogen atom, a metal atom which may have a halogen atom or an oxygen atom, or a metal atom which may have (OR 12 ) p, (OSiR 13 R 14 R 15 ) q. (Where R 12 , R 13 , R 14 , R 15
Is the same as R 1 to R 11 . p and q represent an integer of 0 to 2. ) K, l, m and n each independently represent an integer of 0 to 4.
更に置換基について説明するとX1,X2,X3X4は水素原子
または塩素原子,臭素原子,ヨウ素原子等のハロゲン原
子,シアノ基,ニトロ基,カルボン酸基,スルホン酸基
またはメチル基,エチル基,t−ブチル基,n−ステアリル
基,トリクロルメチル基,アミノメチル基,ヒドロキシ
メチル基等の置換もしくは未置換の脂肪族炭化水素基,
フェニル基,ナフチル基,アントリル基,2−メチルフェ
ニル基,4−クロルメチル基,4−ジメチルアミノナフチル
基等の置換もしくは未置換の脂肪族炭化水素基,または
ピリジル基,カルバゾリル基,ジベンゾフリル基,ベン
ゾチアゾリル基,4−メチルピリジル基等の置換もしくは
未置換の芳香族複素環基,メトキシ基,エトキシ基,ス
テアリルオキシ基,フェノキシ基,ヘキシルチオ基,t−
ブチルチオ基,フェニルチオ基,アミノ基,n−ブチルア
ミノ基,ジエチルアミノ基,ジフェニルアミノ基,ジベ
ンジルアミノ基,−SO2NHnC4H9,−SO2N(CH3)2, 等であるが,これらの置換基に限定されるものではな
い。Further explaining the substituents, X 1 , X 2 , X 3 X 4 are a hydrogen atom or a halogen atom such as a chlorine atom, a bromine atom, an iodine atom, a cyano group, a nitro group, a carboxylic acid group, a sulfonic acid group or a methyl group, Substituted or unsubstituted aliphatic hydrocarbon groups such as ethyl group, t-butyl group, n-stearyl group, trichloromethyl group, aminomethyl group, hydroxymethyl group,
Substituted or unsubstituted aliphatic hydrocarbon groups such as phenyl group, naphthyl group, anthryl group, 2-methylphenyl group, 4-chloromethyl group, 4-dimethylaminonaphthyl group, or pyridyl group, carbazolyl group, dibenzofuryl group, Substituted or unsubstituted aromatic heterocyclic group such as benzothiazolyl group, 4-methylpyridyl group, methoxy group, ethoxy group, stearyloxy group, phenoxy group, hexylthio group, t-
Butylthio group, a phenylthio group, an amino group, n- butyl group, diethylamino group, diphenylamino group, dibenzylamino group, -SO 2 NHnC 4 H 9, -SO 2 N (CH 3) 2, Etc., but is not limited to these substituents.
Mは,H,Na,Li,Cu,Fe,Co,Ni,Zn,Mn,Pb,Si,Mg,Al−Cl,I
n−Cl,Ti=0,V=0,SiOC2H5)2,Al−OnC5H11,SiOSi
(CH3)3〕2等を表すが,これらに限定されるもので
はない。M is H, Na, Li, Cu, Fe, Co, Ni, Zn, Mn, Pb, Si, Mg, Al-Cl, I
n-Cl, Ti = 0, V = 0, SiOC 2 H 5 ) 2 , Al-OnC 5 H 11 , SiOSi
(CH 3 ) 3 ] 2 etc., but is not limited thereto.
k,l,mおよびnはそれぞれ独立に0ないし4の整数を
表すが好ましくは1ないし2である。k, l, m and n each independently represent an integer of 0 to 4, preferably 1 to 2.
上記一般式〔I〕で表されるフタロシアニン系化合物
は,可視から近赤外領域に大きな吸収を有し,レーザー
光線による記録再生に好適である。The phthalocyanine-based compound represented by the above general formula [I] has a large absorption in the visible to near-infrared region and is suitable for recording / reproducing with a laser beam.
本発明で使用する上記一般式〔I〕で表されるフタロ
シアニン系化合物は,一般には下記一般式〔II〕および
〔III〕で示されるニトリル類を適当なモル比で混合
し,各種金属塩(無金属フタロシアニン系化合物の場合
は使用しない。)とを好ましくは有機溶媒中で加熱,す
ることにより製造することができる。The phthalocyanine compound represented by the above general formula [I] used in the present invention is generally prepared by mixing nitriles represented by the following general formulas [II] and [III] at an appropriate molar ratio to obtain various metal salts ( It is not used in the case of a metal-free phthalocyanine compound) and is preferably heated in an organic solvent.
式中A5はベンゼン環,ナフタレン環またはアントラゼ
ン環を表し,X5は一般式〔I〕中のX1,X2,X3またはX4と
同様である。rは0ないし4の整数を表す。 In the formula, A 5 represents a benzene ring, a naphthalene ring or an anthracene ring, and X 5 is the same as X 1 , X 2 , X 3 or X 4 in the general formula [I]. r represents an integer of 0 to 4.
式中,A6は下記式で示される含窒素複素環を表す。 In the formula, A 6 represents a nitrogen-containing heterocycle represented by the following formula.
X6は一般式〔I〕中のX1,X2,X3またはX4と同様であ
る。Sは0ないし4の整数を表す。 X 6 is the same as X 1 , X 2 , X 3 or X 4 in the formula [I]. S represents an integer of 0 to 4.
これらのフタロシアニン系化合物の製造にはアルコー
ル類,グリコール類,キシレン,キノリン,α−クロル
ナフタレン,ニトロベンゼン,スルホラン,N−Nジメチ
ルホルムアミド等の一般の有機溶媒を広く使用すること
ができるが,無溶媒でも得られる。General organic solvents such as alcohols, glycols, xylene, quinoline, α-chlornaphthalene, nitrobenzene, sulfolane and N-N dimethylformamide can be widely used for the production of these phthalocyanine compounds, but no solvent is used. But you can get it.
また,触媒としてアルカリやジアザビシクロウンデセ
ン(DBU),シクロヘキシルアミン等の有機アミンを使
用した方が好ましい場合がある。Further, it may be preferable to use an alkali or an organic amine such as diazabicycloundecene (DBU) or cyclohexylamine as a catalyst.
また,原料となる金属塩は種々の金属塩が使用でき
る。Various metal salts can be used as the metal salt as a raw material.
本発明で使用す一般式〔I〕で表されるフタロシアニ
ン系化合物の代表例を更に具体的に次表に示した。Representative examples of the phthalocyanine compound represented by the general formula [I] used in the present invention are shown in more detail in the following table.
式中 は一般式〔I〕中のものと同様である。In the formula Are the same as those in the general formula [I].
本発明において,記録層を設ける基板材料としては,
ガラス,プラスチック,紙,金属板等種々の材料を使用
することができる。 In the present invention, as the substrate material for providing the recording layer,
Various materials such as glass, plastic, paper and metal plate can be used.
プラスチックとしては,塩化ビニル樹脂,,アクリル酸
樹脂,ポリエステル樹脂,ポリエチレン樹脂,ポリアミ
ド樹脂,ポリカーボネート樹脂,エポキシ樹脂,メタク
リル酸樹脂,酢酸ビニル樹脂,ニトロセルロース,ポリ
プロピレン樹脂,ポリエチレンテレフタレート樹脂,フ
ェノール樹脂,およびこれらの共重合体などがあげられ
る。Plastics include vinyl chloride resin, acrylic acid resin, polyester resin, polyethylene resin, polyamide resin, polycarbonate resin, epoxy resin, methacrylic acid resin, vinyl acetate resin, nitrocellulose, polypropylene resin, polyethylene terephthalate resin, phenol resin, and These copolymers etc. are mentioned.
本発明の特定のナフタロシアニン化合物を含有する記
録層を基板上に形成する方法としては,真空蒸着法,ス
パッタリング法,イオンプレート法,キャスト法,スピ
ナー法,スプレーコート法,ブレードコーティング法,L
B法等の化学的,機械的方法がある。The method for forming the recording layer containing the specific naphthalocyanine compound of the present invention on the substrate includes vacuum deposition method, sputtering method, ion plate method, casting method, spinner method, spray coating method, blade coating method, L
There are chemical and mechanical methods such as method B.
本発明ではスピナー法が最も好ましい。また必要に応
じて高分子バインダーと混合することもできる。高分子
バインダーとしては,上記基板材料に使用するプラスチ
ック類を使用することができる。In the present invention, the spinner method is most preferable. Further, if necessary, it may be mixed with a polymer binder. As the polymer binder, plastics used for the above substrate material can be used.
スピナー法で塗工する場合には,フタロシアニン化合
物をアルコール類,ケトン類,アミド類,スルホキシド
類,エーテル類,エステル類,脂肪族ハロゲン化炭化水
素類,芳香族炭化水素類等の一般の有機溶媒に分散また
は溶解して塗布する。この時場合によっては高分子バイ
ンダーを加える。基板上に形成するナフタロシアニンを
含む記録層を,10μm以下で,好ましくは500Å〜2μm
以下である。塗布した後,クロロホルム,テトラヒドロ
フラン,トルエン等の有機溶媒の蒸気にさらすことによ
って,薄膜の吸収波長を長波長にシフトして,レーザー
光に対する感度を著しく向上することができる場合もあ
る。When the spinner method is used, the phthalocyanine compound is a general organic solvent such as alcohols, ketones, amides, sulfoxides, ethers, esters, aliphatic halogenated hydrocarbons and aromatic hydrocarbons. Disperse or dissolve in and apply. At this time, a polymer binder is added depending on the case. The recording layer containing naphthalocyanine formed on the substrate is 10 μm or less, preferably 500 Å to 2 μm
It is the following. In some cases, the absorption wavelength of the thin film can be shifted to a long wavelength and the sensitivity to laser light can be remarkably improved by exposing it to vapor of an organic solvent such as chloroform, tetrahydrofuran, or toluene after coating.
また,これらの記録層を保護するために,Al2O3,SiO2,
SiO,SnO2等の無機化合物を蒸着して保護層を設けてもよ
い。保護層として基板材料に用いるポリマーを塗布して
もよい。In addition, in order to protect these recording layers, Al 2 O 3 , SiO 2 ,
A protective layer may be provided by vapor-depositing an inorganic compound such as SiO or SnO 2 . A polymer used as a substrate material may be applied as a protective layer.
本発明で得られる光記録媒体は,He−Neレーザー光線
は勿論,ルビー,Ar,半導体レーザー光線等の各種レーザ
ー光線によって書込み,読み出しの記録再生ができる。The optical recording medium obtained by the present invention is capable of writing / reading / reading by not only He—Ne laser beam but also various laser beams such as ruby, Ar and semiconductor laser beam.
次に,本発明を実施例により,更に具体的に説明する
が,本発明は,以下の実施例に限定されるものではな
い。例中部は重量部である。Next, the present invention will be described more specifically by way of examples, but the present invention is not limited to the following examples. The middle part is part by weight.
(実施例) 〔合成例1 化合物No.1の合成〕 ニトロベンゼン35重量部に上式で示されるニトリル
(IV)2.3部,(V)1.3部,塩化第一銅0.5部を加え180
〜200℃で6時間加熱,撹拌後,冷却,メタノール500部
で希釈,生成物をロ別し,メタノールで洗浄後乾燥して
化合物No.1粗製物2.4部が得られる。粗製物をアルミナ
カラムで分離精製して化合物No.1精製物1.2部が得られ
る。(Example) [Synthesis example 1 Synthesis of compound No. 1] To 35 parts by weight of nitrobenzene, 2.3 parts of nitrile (IV) represented by the above formula, 1.3 parts of (V) and 0.5 part of cuprous chloride are added, and 180
After heating at ~ 200 ° C for 6 hours, stirring, cooling, dilution with 500 parts of methanol, filtration of the product, washing with methanol and drying to obtain 2.4 parts of compound No. 1 crude product. The crude product is separated and purified by an alumina column to obtain 1.2 parts of a purified product of Compound No. 1.
〔合成例2 化合物No.6の合成〕 n−アミルアルコール90部に上式で示されるニトリル
(VI)3.6部,(VII)2.5部,三塩化バナジウム0.8部,D
BU3.0部を加え8時間還流した後,冷却,メタノール500
部で希釈,生成物をロ別し,メタノールで洗浄,乾燥す
ると化合物No.6粗製物4.4部が得られる。粗製物をアル
ミナカラムで分離精製して化合物No.6精製物2.9部が得
られる。[Synthesis Example 2 Synthesis of Compound No. 6] In 90 parts of n-amyl alcohol, 3.6 parts of nitrile (VI) represented by the above formula, 2.5 parts of (VII), 0.8 part of vanadium trichloride, D
Add 3.0 parts BU and reflux for 8 hours, then cool, methanol 500
After diluting with 1 part, separating the product by filtration, washing with methanol and drying, 4.4 parts of Compound No. 6 crude product is obtained. The crude product is separated and purified with an alumina column to obtain 2.9 parts of a purified product of Compound No. 6.
〔合成例3 化合物No.2の合成〕 合成例2において,ニトリル(IV),(VII)をそれ
ぞれ上式で示されるニトリル(VIII)2.9部,(IX)1.3
部に変え,同様に合成すると化合物No.2粗製物3.0部が
得られる。粗製物をアルミナカラムで分離精製して化合
物No.2精製物1.6部が得られる。[Synthesis Example 3 Synthesis of Compound No. 2] In Synthesis Example 2, nitriles (IV) and (VII) were replaced with 2.9 parts of nitriles (VIII) and (IX) 1.3 represented by the above formulas, respectively.
Part of compound No. 2 crude product was obtained by the same synthesis. The crude product is separated and purified on an alumina column to obtain 1.6 parts of a purified product of Compound No. 2.
〔合成例4 化合物No.9の合成〕 キノリン80部に上式で示されるニトリル(X)2.9
部,(XI)2.0部,塩化ニッケル0.7部を加え180℃で6
時間加熱,撹拌した後,冷却,メタノール500部で希
釈,生成物をロ別し,メタノールで洗浄,乾燥すると化
合物No.9粗製物4.1部が得られる。粗製物をアルミナカ
ラムで分離精製すると化合物No.9精製物2.5部が得られ
る。[Synthesis Example 4 Synthesis of Compound No. 9] Nitrile (X) 2.9 represented by the above formula in 80 parts of quinoline
Part, (XI) 2.0 parts, nickel chloride 0.7 parts, and added at 180 ℃
After heating and stirring for an hour, cooling, diluting with 500 parts of methanol, separating the product by filtration, washing with methanol and drying, 4.1 parts of crude compound No. 9 is obtained. The crude product is separated and purified with an alumina column to obtain 2.5 parts of a purified product of Compound No. 9.
実施例1 メチルセロソルブ100部に化合物No.1 3重量部を溶解
し,この溶液をポリカーボネート樹脂基板上に500rpmス
ピナーコーティング法で塗布した後,90〜100℃で1時間
乾燥して約700Åの記録層を得た。Example 1 3 parts by weight of Compound No. 1 was dissolved in 100 parts of methyl cellosolve, and this solution was applied onto a polycarbonate resin substrate by a 500 rpm spinner coating method, and then dried at 90 to 100 ° C. for 1 hour and recorded at about 700 Å. Layers were obtained.
この様にして制作した光学記録媒体をターンテーブル
に取りつけターンテーブルを1600rpmで回転しながら,
スポットサイズ0.6μに集束した5mWおよび8MHzのガリウ
ム−アルミニウム−ヒ素半導体レーザー光線(830nm)
を記録層にトラック状に照射して記録を行った。記録を
完了した記録層は,鮮明なピットが電子顕微鏡で観察さ
れた。またこの光記録媒体を低出力ガリウム−アルミニ
ウム−ヒ素半導体レーザー光線を入射し,反射光の検知
を行ったところ実用に十分なS/N比を有する波形を示し
た。While attaching the optical recording medium produced in this way to the turntable and rotating the turntable at 1600 rpm,
5mW and 8MHz gallium-aluminum-arsenic semiconductor laser beam (830nm) focused to a spot size of 0.6μ
Recording was performed by irradiating the recording layer with a track shape. Clear pits were observed with an electron microscope on the recording layer where recording was completed. When a low power gallium-aluminum-arsenic semiconductor laser beam was incident on this optical recording medium and the reflected light was detected, a waveform having an S / N ratio sufficient for practical use was shown.
実施例2 市販のニトロセルロース樹脂3重量部をメチルエチル
ケトン10重量部に溶解し,化合物No.6 5.0重量部,およ
びエチルセロソルブ200重量部を上記の樹脂溶液と混
合,溶解した。この溶液をパイレックス基板上に500rpm
スピナーコーティング法により塗布し,120℃の温度で2
時間乾燥し,約800Åの記録層を得た。Example 2 3 parts by weight of a commercially available nitrocellulose resin was dissolved in 10 parts by weight of methyl ethyl ketone, 5.0 parts by weight of compound No. 6 and 200 parts by weight of ethyl cellosolve were mixed and dissolved with the above resin solution. Add this solution to a Pyrex substrate at 500 rpm
It is applied by the spinner coating method, and at the temperature of 120 ℃, 2
After drying for about an hour, a recording layer of about 800Å was obtained.
この様にして制作した光学記録媒体を実施例1と同様
に記録を行ったところ,この記録層は鮮明なピットが電
子顕微鏡で観察され,また,実施例1と同様な入射レー
ザー光線の反射光の検知を行ったところ実用に十分なS/
N比を有する波形を示した。Recording was performed on the optical recording medium thus produced in the same manner as in Example 1. As a result, clear pits were observed in this recording layer with an electron microscope, and the same reflected laser light of the incident laser beam as in Example 1 was observed. When the detection is performed, S /
The waveform with N ratio is shown.
実施例3 真空度10-7Torrで,厚さ1mmのアクリル基板上に基板
温度を室温にし,化合物No.2を蒸着し膜厚を600Åとし
た。Example 3 At a vacuum degree of 10 -7 Torr, the substrate temperature was set to room temperature on an acrylic substrate having a thickness of 1 mm, and Compound No. 2 was vapor-deposited to a film thickness of 600 Å.
この様にして制作した光記録媒体を実施例1と同様に
記録を行ったところ,この記録層は鮮明なピットが電子
顕微鏡で観察され,また,実施例1と同様な入射レーザ
ー光線の反射光の検知を行ったところ実用に十分なS/N
比を有する波形を示した。Recording was performed on the optical recording medium thus produced in the same manner as in Example 1. As a result, clear pits were observed in this recording layer with an electron microscope, and reflected light of an incident laser beam similar to that in Example 1 was observed. S / N sufficient for practical use when detected
A waveform with a ratio is shown.
実施例4 エチルセロソルブ100重量部に化合物No.9 3重量部を
溶解し,この溶液をポリカーボネート樹脂基板上に500r
pmスピナーコーティング法で塗布した後,100〜110℃で
2時間乾燥して約700Åの記録層を得た。実施例1と同
様に記録を行ったところ鮮明なピットが電子顕微鏡で観
察され,実用に十分なS/N比が得られた。Example 4 3 parts by weight of Compound No. 9 was dissolved in 100 parts by weight of ethyl cellosolve, and this solution was placed on a polycarbonate resin substrate in an amount of 500 r.
After applying by the pm spinner coating method, it was dried at 100-110 ° C. for 2 hours to obtain a recording layer of about 700Å. When recording was performed in the same manner as in Example 1, clear pits were observed with an electron microscope, and an S / N ratio sufficient for practical use was obtained.
本発明は以上のような構成によりなり,化学的,物理
的に安定でレーザー光線で高感度で記録再生できる特徴
を有する。The present invention is configured as described above, and is characterized by being chemically and physically stable and capable of recording / reproducing with high sensitivity by a laser beam.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C09B 47/12 C09B 47/12 47/18 47/18 47/20 47/20 47/22 47/22 47/24 47/24 47/26 47/26 47/30 47/30 G11B 7/24 516 8721−5D G11B 7/24 516 (56)参考文献 特開 昭62−121939(JP,A) 特開 昭62−222893(JP,A) 特開 昭62−233287(JP,A) 特開 昭62−233288(JP,A) 特開 平1−103495(JP,A) 特開 昭64−34791(JP,A)─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location C09B 47/12 C09B 47/12 47/18 47/18 47/20 47/20 47/22 47 / 22 47/24 47/24 47/26 47/26 47/30 47/30 G11B 7/24 516 8721-5D G11B 7/24 516 (56) Reference JP 62-121939 (JP, A) JP JP 62-222893 (JP, A) JP 62-233287 (JP, A) JP 62-233288 (JP, A) JP 1-103495 (JP, A) JP 64-34791 (JP , A)
Claims (1)
ロシアニン系化合物の少なくとも一種以上を含有する有
機薄膜層を有することを特徴とする光学記録媒体。 式中,A1,A2,A3,A4は,それぞれ独立にベンゼン環,ナフ
タレン環,アントラセン環または下記式で示される含窒
素複素環を表す, 但し,A1,A2,A3またはA4のうち1〜3つは上記含窒素複
素環のうちの1つである。 X1,X2,X3,X4は,それぞれ独立に,水素原子,ハロゲン
原子,シアノ基,ニトロ基,カルボン酸基,スルホン酸
基,置換もしくは未置換の脂肪族炭化水素基,置換もし
くは未置換の芳香族炭化水素基,置換もしくは未置換の
芳香族複素環基,−OR1,−SR2, −NHCOR9,−CO2R10,−N=N−R11(ここで,R1ないしR
11は水素原子,置換もしくは未置換の脂肪族炭化水素基
または置換もしくは未置換の芳香族複素環基を表す。) Mは水素原子,またはハロゲン,酸素原子を有してもよ
い金属原子または(OR12)p,(OSiR13R14R15)qを有し
てもよい金属原子を表す。(ここでR12,R13,R14,R15はR
1ないしR11と同様。p,qは0ないし2の整数を表す。) k,l,mおよびnはそれぞれ独立に0ないし4の整数を表
す。1. An optical recording medium comprising an organic thin film layer containing at least one phthalocyanine compound represented by the following general formula [I] on a substrate. In the formula, A 1 , A 2 , A 3 , and A 4 each independently represent a benzene ring, a naphthalene ring, an anthracene ring, or a nitrogen-containing heterocycle represented by the following formula, However, 1 to 3 of A 1 , A 2 , A 3 or A 4 is one of the above nitrogen-containing heterocycles. X 1 , X 2 , X 3 and X 4 are each independently a hydrogen atom, halogen atom, cyano group, nitro group, carboxylic acid group, sulfonic acid group, substituted or unsubstituted aliphatic hydrocarbon group, substituted or Unsubstituted aromatic hydrocarbon group, substituted or unsubstituted aromatic heterocyclic group, -OR 1 , -SR 2 , -NHCOR 9 , -CO 2 R 10 , -N = N-R 11 (where R 1 to R
11 represents a hydrogen atom, a substituted or unsubstituted aliphatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group. ) M represents a hydrogen atom, a metal atom which may have a halogen atom or an oxygen atom, or a metal atom which may have (OR 12 ) p, (OSiR 13 R 14 R 15 ) q. (Where R 12 , R 13 , R 14 , R 15 is R
Same as 1 through R 11 . p and q represent an integer of 0 to 2. ) K, l, m and n each independently represent an integer of 0 to 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62291221A JP2545558B2 (en) | 1987-11-18 | 1987-11-18 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62291221A JP2545558B2 (en) | 1987-11-18 | 1987-11-18 | Optical recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01130983A JPH01130983A (en) | 1989-05-23 |
JP2545558B2 true JP2545558B2 (en) | 1996-10-23 |
Family
ID=17766039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62291221A Expired - Fee Related JP2545558B2 (en) | 1987-11-18 | 1987-11-18 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2545558B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1337194C (en) * | 1988-04-07 | 1995-10-03 | Koichi Kamijima | Tetraazaporphin, process for producing the same, as well as optical recording media using the same and production processes thereof |
US5281512A (en) * | 1989-08-30 | 1994-01-25 | Hitachi, Ltd. | Optical information recording medium |
JP5824386B2 (en) * | 2012-02-29 | 2015-11-25 | 富士フイルム株式会社 | Infrared absorbing composition and infrared cut filter |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62121939A (en) * | 1985-07-04 | 1987-06-03 | Olympus Optical Co Ltd | Optical information recording medium |
JPS62222893A (en) * | 1985-12-13 | 1987-09-30 | Kanegafuchi Chem Ind Co Ltd | Optical information recording medium and its manufacture |
JPS62233288A (en) * | 1986-04-02 | 1987-10-13 | Kao Corp | Optical information recording medium |
JPS62233287A (en) * | 1986-04-02 | 1987-10-13 | Kao Corp | Optical information recording medium |
JP2514677B2 (en) * | 1987-04-10 | 1996-07-10 | 東洋インキ製造株式会社 | Optical recording medium |
JP2507759B2 (en) * | 1987-10-16 | 1996-06-19 | 東洋インキ製造株式会社 | Optical recording medium |
-
1987
- 1987-11-18 JP JP62291221A patent/JP2545558B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH01130983A (en) | 1989-05-23 |
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