JP2024139857A - Plasma irradiation equipment - Google Patents

Abstract

To provide a plasma radiation device which can stabilize a plasma radiation direction.SOLUTION: A plasma radiation device 10 includes: a dielectric body 73 forming a gas guide passage 73A having an introduction port 73B for introducing gas, a discharge port 51B for discharging the gas, and a passage 73C provided between the introduction port 73B and the discharge port 51B; and a pair of electrodes 71, 72 which cause plasma discharge in the gas guide passage 73A. The introduction port 73B and the discharge port 51B are respectively formed at a rear end surface 73G and a front end surface 73H which are different from each other of the dielectric body 73. The plasma radiation device 10 includes a pair of protruding parts 81 which protrude to the opposite side of the passage 73C and are disposed sandwiching the introduction port 73B.SELECTED DRAWING: Figure 6

Description

This disclosure relates to a plasma irradiation device.

The plasma irradiation device disclosed in Patent Document 1 includes a gas guide path and a surface discharge unit. The surface discharge unit generates a surface discharge within the flow path in response to a periodically changing voltage being applied to the discharge electrode while the discharge electrode faces the flow path. The gas guide path is configured as a flow path that releases gas from the discharge port toward the action part (the part that acts on the living tissue), and functions to release low-temperature plasma from the discharge port toward the action part together with the gas.

JP 2020-198238 A

In a plasma irradiation device such as that disclosed in Patent Document 1, there is a demand for a configuration that can stabilize the direction of plasma irradiation so that the plasma is irradiated in the direction intended by the user.

This disclosure has been made in consideration of the above-mentioned circumstances, and one of its objectives is to provide a plasma irradiation device that can stabilize the direction of plasma irradiation.

The plasma irradiation device of the present disclosure is
a cylindrical member constituting a gas guide path having an inlet for introducing a gas, an outlet for discharging the gas, and a flow path provided between the inlet and the outlet;
A pair of electrodes for generating a plasma discharge within the gas guide path;
A plasma irradiation device comprising:
The inlet and the outlet are formed on different end surfaces of the cylindrical member,
At least one of the end face on which the inlet is formed and the end face on which the outlet is formed is provided with a pair of protrusions that protrude opposite the flow path and are positioned on either side of the inlet or the outlet.

The disclosed invention can stabilize the direction of plasma irradiation.

1 is a diagram illustrating a schematic configuration of a plasma irradiation system according to a first embodiment. 1 is a side view of a portion of the plasma irradiation device in a state in which the detachable part is separated from the base part. FIG. 2 is a side cross-sectional view of a portion of the plasma irradiation device. 1 is a side cross-sectional view of a portion of the plasma irradiation device in a state in which the detachable part is separated from the base part. FIG. 2 is a block diagram showing the electrical configuration of the plasma irradiation system. FIG. FIG. FIG. 4 is a rear view showing a part of the inlet side of the discharge unit. FIG. 4 is a plan view showing a part of the inlet side of the discharge unit. FIG. 4 is a cross-sectional plan view showing a part of the inlet side of the discharge unit. FIG. 4 is a rear view showing a part of the discharge unit on the outlet side. 4 is a plan view showing a part of the discharge port side of the discharge unit. FIG. FIG. 4 is a cross-sectional plan view showing a part of the discharge port side of the discharge unit. FIG. 11 is a perspective view showing a part of the inlet side of the discharge unit of the second embodiment.

In the following, embodiments of the present disclosure are listed and illustrated.
[1] A cylindrical member constituting a gas guide path having an inlet for introducing a gas, an outlet for discharging the gas, and a flow path provided between the inlet and the outlet;
A pair of electrodes for generating a plasma discharge within the gas guide path;
A plasma irradiation device comprising:
The inlet and the outlet are formed on different end surfaces of the cylindrical member,
At least one of the end surface on which the inlet is formed and the end surface on which the outlet is formed is provided with a pair of protruding portions protruding toward an opposite side to the flow path and disposed with the inlet or the outlet sandwiched between them.
Plasma irradiation device.

According to this configuration, in a configuration in which a pair of protrusions are provided on the end face on the inlet side, gas can be smoothly introduced into the flow path. In a configuration in which a pair of protrusions are provided on the end face on the outlet side, outside air is less likely to be drawn in, making it easier to guide the gas discharged from the outlet in the desired direction. Therefore, with this plasma irradiation device, the plasma irradiation direction can be stabilized.

[2] In the openings of the inlet and the outlet where the pair of protrusions are provided, the ends furthest from each other in each of the pair of protrusions are in contact with the outer circumferential surface of the cylindrical member.
The plasma irradiation device according to [1].

With this configuration, the pair of protrusions can sandwich the opening over a wider area. This makes it easier to guide gas more stably between the pair of protrusions.

[3] The inner surfaces of the pair of protrusions are flush with the inner surface of the gas guide path.
The plasma irradiation device according to [1] or [2].

With this configuration, there is no step between the inner surface of the pair of protrusions and the inner surface of the gas guide path, making it difficult for turbulence to occur in the gas guide path or between the pair of protrusions.

[4] The inner surfaces of the pair of protrusions are flat surfaces along the extension direction.
The plasma irradiation device according to any one of [1] to [3].

This configuration makes it easier to guide gas more stably along the inner surfaces of the pair of protrusions compared to a configuration in which the inner surfaces of the protrusions are uneven.

First Embodiment
1. Configuration of the plasma irradiation system 100 FIG. 1 shows a plasma irradiation system 100 according to an example of the present disclosure. The plasma irradiation system 100 in FIG. 1 irradiates, for example, a minimally invasive low-energy plasma. The plasma irradiation system 100 is configured as a surgical device capable of performing hemostasis or the like on a biological tissue of a surgical target. The plasma irradiation system 100 includes a plasma irradiation device 10 and a control device 20. The control device 20 supplies power to the plasma irradiation device 10.

2. Configuration of the plasma irradiation device 10 The plasma irradiation device 10 is, for example, an instrument that is held and used by an operator performing surgery. As shown in Fig. 2, the plasma irradiation device 10 has a base 11, a detachable part 13, a first connector part 15 (see Fig. 1), and a cable 17. The base 11 functions as a gripping part. The detachable part 13 is provided with a discharge port 51B described later, and is detachably attached to the base 11.

The plasma irradiation device 10 has a longitudinal shape. The longitudinal direction of the plasma irradiation device 10 (the X-axis direction in FIG. 2) is defined as the front-rear direction. The positive direction of the X-axis in FIG. 2 is defined as the front, and the negative direction of the X-axis is defined as the rear. Also, in FIG. 2, the direction perpendicular to the longitudinal direction of the plasma irradiation device 10 (the Y-axis direction in FIG. 2) is defined as the up-down direction. The positive direction of the Y-axis in FIG. 2 is defined as the up direction, and the negative direction of the Y-axis is defined as the down direction. Also, in FIG. 6, the Z-axis direction, which is perpendicular to the X-axis and Y-axis directions, is defined as the left-right direction.

As shown in FIG. 2, the base 11 is elongated in the front-rear direction. The base 11 has a first case 31. The first case 31 forms the outer shell of the base 11. The first case 31 has insulating properties and is made of, for example, a resin material. The first case 31 is tubular and elongated in the front-rear direction. The detachable part 13 is detachably attached to the tip of the base 11.

As shown in FIG. 2, the detachable part 13 has a second case 41. The second case 41 forms the outer shell of the detachable part 13. The second case 41 has insulating properties and is made of, for example, a resin material. The second case 41 has a cylindrical shape. The front end of the second case 41 is provided with a discharge port 51B, which will be described later. The discharge port 51B is open toward the front.

The first connector portion 15 is connected to the control device 20. One end of the cable 17 is connected to the first connector portion 15. The other end of the cable 17 is connected to the base portion 11. The cable 17 is flexible. The cable 17 has, for example, a relay wiring, a relay flow path, and a sheath that collectively covers the outer periphery of the relay wiring and the relay flow path. The relay wiring is connected to one end (rear end) of the first conductive path 55C described later and one end (rear end) of the third conductive path 55E. The relay flow path is connected to the inlet 51A of the first flow path 51D described later.

As shown in FIG. 3, the plasma irradiation device 10 has a gas passage 51 that guides gas toward the front end, and a discharge unit 70 that generates plasma in the gas passage 51. The gas passage 51 guides gas supplied from a gas supply unit 25 (described later) through a relay flow path of the cable 17 toward the front end of the gas passage 51.

3, the gas passage 51 has an inlet 51A for introducing a gas (e.g., a rare gas), an outlet 51B for discharging the gas, and a flow path 51C provided between the inlet 51A and the outlet 51B. The gas passage 51 serves as a guide path for introducing gas supplied from the gas supply unit 25 (described later) through the inlet 51A and guiding the gas introduced from the inlet 51A side to the outlet 51B through the space in the flow path 51C. The gas passage 51 discharges the flowing gas through the outlet 51B.

The discharge unit 70 generates a plasma discharge in the gas passage 51. As shown in FIG. 3, the discharge unit 70 is provided in the detachable part 13. The discharge unit 70 is disposed on the front end side of the detachable part 13. The discharge unit 70 includes a first electrode 71 (discharge electrode), a second electrode 72 (reference electrode), and a dielectric 73. The discharge unit 70 is cylindrical and constitutes at least a part of the gas passage 51. The discharge unit 70 has an elongated shape that runs along the longitudinal direction (front-rear direction) of the detachable part 13.

The first electrode 71 and the second electrode 72 each extend along the longitudinal direction (front-rear direction) of the detachable portion 13. The first electrode 71 and the second electrode 72 are provided integrally with the dielectric 73. The first electrode 71 and the second electrode 72 are disposed apart from each other and are disposed facing each other in the up-down direction with the dielectric 73 interposed therebetween. The first electrode 71 faces the inside of the gas passage 51. The second electrode 72 is provided inside the dielectric 73.

The dielectric 73 corresponds to the "cylindrical member" of the present invention. The dielectric 73 is cylindrical and constitutes at least a part of the gas passage 51. The dielectric 73 is elongated in the longitudinal direction (front-to-rear direction) of the base 11. The dielectric 73 can be made of a ceramic material such as alumina, a glass material, a resin material, or the like. The tip of the dielectric 73 is located further forward than both the first electrode 71 and the second electrode 72.

The discharge unit 70 generates plasma in the gas passage 51 in response to the application of a voltage between the first electrode 71 and the second electrode 72. The discharge unit 70 generates a plasma discharge when a drive voltage of a predetermined voltage value is applied. More specifically, the discharge unit 70 functions to generate an electric field based on the potential difference between the first electrode 71 and the second electrode 72 in the gas passage 51, and generate plasma (more specifically, low-temperature plasma) by discharge (more specifically, creeping discharge) in the gas passage 51. The discharge unit 70 generates plasma (more specifically, low-temperature plasma) by creeping discharge in the gas passage 51 in response to the application of a periodically changing voltage to the first electrode 71 while maintaining the potential of the second electrode 72 at a constant reference potential (e.g., ground potential of 0 V).

The flow path 51C of the gas passage 51 described above has a first flow path 51D provided in the base 11, a second flow path 51E provided in the detachable part 13, and a gas guide path 73A (described later) provided in the detachable part 13. The first flow path 51D is arranged inside the first case 31. The first flow path 51D is arranged closer to the gas supply unit 25 (described later) than the second flow path 51E. Gas supplied from the gas supply unit 25 side is introduced into the first flow path 51D. The first flow path 51D flows the gas supplied from the gas supply unit 25 side to the second flow path 51E side. The second flow path 51E guides the gas supplied from the first flow path 51D side to the gas guide path 73A (described later) and releases it from the discharge port 51B. The discharge unit 70 generates plasma in the second flow path 51E.

The plasma irradiation device 10 has a first wiring 55A electrically connected to a first electrode 71 and a second wiring 55B electrically connected to a second electrode 72. A voltage based on a power supply unit 26 described later is applied between the first wiring 55A and the second wiring 55B. The voltage applied between the first wiring 55A and the second wiring 55B is applied between the first electrode 71 and the second electrode 72.

The first wiring 55A has a first conductive path 55C provided in the base 11 and a second conductive path 55D provided in the detachable portion 13. The second wiring 55B has a third conductive path 55E provided in the base 11 and a fourth conductive path 55F provided in the detachable portion 13. The first conductive path 55C and the third conductive path 55E are disposed in the first case 31. The second conductive path 55D and the fourth conductive path 55F are disposed in the second case 41.

One end (rear end) of the first conductive path 55C and one end (rear end) of the third conductive path 55E are electrically connected to the power supply unit 26 via a cable 17 (specifically, a relay wiring).

The base 11 has a second connector portion 57A. The second connector portion 57A is provided on the front end side of the first case 31. The detachable portion 13 has a third connector portion 57B. The third connector portion 57B is provided on the rear end of the second case 41. The second connector portion 57A and the third connector portion 57B are connected to each other in the front-to-rear direction.

One end (front end) of the first flow path 51D is provided in the second connector portion 57A. The other end (rear end) of the first flow path 51D is provided with an inlet 51A. The other end (front end) of the first conductive path 55C and the other end (front end) of the third conductive path 55E are provided in the second connector portion 57A.

One end (rear end) of the second flow path 51E is provided in the third connector portion 57B. The other end (front end) of the second flow path 51E is connected to one end (mouth end) of the gas guide path 73A described later. One end (rear end) of the second conductive path 55D and one end (rear end) of the fourth conductive path 55F are each provided in the third connector portion 57B. The other end (front end) of the second conductive path 55D is electrically connected to the first electrode 71. The other end (front end) of the fourth conductive path 55F is electrically connected to the second electrode 72.

When the detachable portion 13 is attached to the base 11, the third connector portion 57B is connected to the second connector portion 57A. When the third connector portion 57B is connected to the second connector portion 57A, gas can be supplied from the first flow path 51D to the second flow path 51E. When the third connector portion 57B is connected to the second connector portion 57A, the second conductive path 55D is electrically connected to the first conductive path 55C, and the fourth conductive path 55F is electrically connected to the third conductive path 55E.

For example, the first pipe section constituting the first flow path 51D and the second pipe section constituting the second flow path 51E are connected in a state in which gas leakage is prevented. For example, the first conductive path 55C and the second conductive path 55D are electrically connected to each other by being provided with a female terminal on one side and a male terminal on the other side, and the female terminal and the male terminal are connected. The third conductive path 55E and the fourth conductive path 55F are also electrically connected to each other by being provided with a female terminal on one side and a male terminal on the other side, and the female terminal and the male terminal are connected.

As shown in FIG. 3, the base 11 is provided with a transformer 63 and a switch 65. The transformer 63 and the switch 65 are mounted on a circuit board (not shown) provided in the first case 31, for example. The transformer 63 is configured as a step-up transformer that steps up the voltage output from the control device 20 and outputs it to the discharge unit 70 side. The transformer 63 has a first winding section on the primary side and a second winding section on the secondary side. When an AC voltage is applied to both ends of the first winding section, the transformer 63 transforms the AC voltage applied to both ends of the first winding section so that the AC voltage is boosted and applied to both ends of the second winding section. The transformer 63 boosts the input voltage based on the power supply section 26 described later, and applies the boosted voltage between the first conductive path 55C and the third conductive path 55E. As a result, the transformer 63 applies a desired voltage between the first electrode 71 and the second electrode 72.

The transformer 63 functions as a high-frequency voltage generating circuit. The transformer 63 applies an AC voltage of a predetermined frequency between the first electrode 71 and the second electrode 72 while keeping the second electrode 72 at a reference potential. The transformer 63 may be any known circuit capable of generating a high voltage (e.g., a high voltage with an amplitude of 0.5 kV to 10 kV) at a high frequency (e.g., about 20 kHz to 300 kHz). The frequency of the high voltage generated by the transformer 63 may be a fixed frequency or may vary. The voltage applied by the transformer 63 between the first electrode 71 and the second electrode 72 may be a periodically changing voltage, and may be a sine wave AC voltage or a non-sine wave AC voltage (e.g., a rectangular wave, a triangular wave, etc.).

The switch 65 is exposed on the upper surface side of the second case 41. The switch 65 is an operation unit that switches between a state in which the plasma irradiation device 10 irradiates plasma and a state in which the plasma irradiation is stopped. For example, the switch 65 is a push-type switch that irradiates plasma when pressed and stops plasma irradiation when released. Note that although the peripheral configuration of the switch 65 (such as a circuit that controls the discharge of the discharge unit 70 based on the operation of the switch 65) is omitted in Figures 3 and 4, a general control circuit or the like can be used. The operation result of the switch 65 is transmitted to the control device 20, for example, via a communication line (not shown) arranged in the cable 17.

3. Configuration of the Control Device 20 As shown in FIG. 5 , the control device 20 has a control unit 21, an input unit 22, an output unit 23, a storage unit 24, a gas supply unit 25, and a power supply unit 26.

The control unit 21 controls the operation of the power supply unit 26. The control unit 21 includes, for example, an MCU (Micro Controller Unit). The control unit 21 executes control such as inputting an input voltage to the plasma irradiation device 10 based on, for example, a program stored in the memory unit 24.

The input unit 22 is configured using, for example, a known input device. Known input devices include, for example, a keyboard, a mouse, and a touch panel. Information input by the input unit 22 is input to the control unit 21.

The output unit 23 is configured using, for example, a known output device. Known output devices include, for example, a display unit (e.g., a liquid crystal display unit) and an audio output unit (e.g., a speaker).

The memory unit 24 is configured, for example, with a known semiconductor memory. The memory unit 24 stores programs executed by the control unit 21.

The gas supply unit 25 is controlled by the control unit 21. The gas supply unit 25 is a device that supplies an inert gas (hereinafter also simply referred to as gas) such as helium gas. The gas supply unit 25 supplies the inert gas to the gas passage 51, for example, via a flexible pipe (a relay flow path in the cable 17) interposed between the plasma irradiation device 10 and the gas supply unit 25. The gas supply unit 25 includes, for example, a regulator that reduces the pressure of high-pressure gas supplied from a cylinder or the like, a controller that controls the flow rate, and the like.

The power supply unit 26 includes a known control circuit and functions to apply a desired voltage between the first electrode 71 and the second electrode 72 of the discharge unit 70. The power supply unit 26 includes, for example, a DC-DC converter, an inverter, and the like. The power supply unit 26 applies an AC voltage of a predetermined frequency between the first electrode 71 and the second electrode 72. The frequency of the high voltage generated by the power supply unit 26 may be a frequency fixed to a constant value, or may vary. The voltage applied by the power supply unit 26 between the first electrode 71 and the second electrode 72 may be any voltage that changes periodically, and may be a sine wave AC voltage or a non-sine wave (e.g., a rectangular wave, a triangular wave, etc.) AC voltage.

4. Detailed Configuration of Discharge Unit 70 Next, the detailed configuration of the discharge unit 70 will be described.
[Configuration of dielectric]
As shown in Figs. 6 and 7, the dielectric 73 has a gas guide path 73A which constitutes a part of the gas passage 51 (second passage 51E). The gas guide path 73A constitutes the front end side part of the gas passage 51. Specifically, as shown in Fig. 3, the gas guide path 73A is connected to the other end (front end) of the second passage 51E. As shown in Fig. 7, the gas guide path 73A has an inlet 73B, a discharge port 51B, and a passage 73C. The inlet 73B introduces gas into the passage 73C. The discharge port 51B discharges gas from the passage 73C.

An inlet 73B is provided at the rear end of the flow path 73C. A discharge port 51B is provided at the front end of the flow path 73C. As shown in FIG. 10, the other end (front end) of the second flow path 51E is connected to the inlet 73B. The flow path 73C has a rectangular cross section. The cross section of the flow path 73C (cross section perpendicular to the front-to-rear direction) is a rectangular shape of the same size throughout the entire front-to-rear direction.

The cross-sectional shape of the flow path 73C (cross-sectional shape perpendicular to the front-rear direction) is specifically a rectangle that is long in the left-right direction. That is, the shape of the inlet 73B (see FIG. 8) and the shape of the outlet 51B (see FIG. 11) are also rectangular that are long in the left-right direction.

As shown in FIG. 6, the dielectric 73 has a main body 73D, a rear component 73E, and a front component 73F. The main body 73D is a rectangular tube that is long in the front-rear direction. The rear component 73E is a rectangular tube that protrudes rearward from the rear end of the main body 73D. The front component 73F is a rectangular tube that protrudes forward from the front end of the main body 73D. The protruding length of the rear component 73E is approximately the same as the protruding length of the front component 73F. In the left-right direction (Z-axis direction), the width of the rear component 73E and the width of the front component 73F are smaller than the width of the main body 73D.

As shown in Figures 7 to 10, a rear end face 73G is provided at the rear end of the dielectric 73 (rear component 73E). The rear end face 73G corresponds to the "end face" of the present invention. The rear end face 73G is a surface perpendicular to the front-to-rear direction. The introduction port 73B is formed in the center of the rear end face 73G. The opening area of the introduction port 73B is on the same plane as the rear end face 73G.

As shown in Figures 6, 7, and 11 to 13, a front end face 73H is provided at the front end of the dielectric 73 (front component 73F). The front end face 73H corresponds to the "end face" of the present invention. The front end face 73H is a surface that is perpendicular to the front-to-rear direction. The emission port 51B is formed in the center of the front end face 73H. The opening area of the emission port 51B is on the same plane as the front end face 73H.

[Configuration of the first electrode and the second electrode]
7, the first electrode 71 is provided on the lower surface of the flow path 73C. The first electrode 71 may be covered with a thin film or the like. The first electrode 71 is disposed in the center of the flow path 73C. The first electrode 71 is electrically connected to the other end (front end) of the second conductive path 55D via a via (not shown) or the like provided in the dielectric 73, for example.

As shown in FIG. 7, the second electrode 72 is embedded below the flow path 73C in the dielectric 73. The second electrode 72 is disposed in the center of the dielectric 73 in the front-to-rear direction. In other words, the second electrode 72 is not exposed in the flow path 73C, and is not exposed to the outside of the dielectric 73. The second electrode 72 is electrically connected to the other end (front end) of the fourth conductive path 55F, for example, via a via (not shown) or the like provided in the dielectric 73.

[Configuration of protrusion on inlet side]
As shown in Figures 6 and 8 to 10, a pair of protrusions 81 is provided on the rear end surface 73G. The pair of protrusions 81 is provided on the left and right edges of the rear end surface 73G, respectively. The pair of protrusions 81 protrude from the rear end surface 73G to the side opposite the flow path 73C (the rear side). As shown in Figures 8 and 10, the pair of protrusions 81 are disposed to sandwich the inlet 73B from each other in the left-right direction. In other words, the distance between the pair of protrusions 81 is the same as the width of the inlet 73B in the left-right direction.

For example, the width of the inlet 73B in the left-right direction is greater than the width of the second flow path 51E in the left-right direction. For example, the width of the inlet 73B in the up-down direction is the same as the width of the second flow path 51E in the up-down direction.

By providing a pair of protrusions 81 on either side of the inlet 73B, outside air is less likely to be drawn into the inlet 73B, and gas can be smoothly introduced into the flow path 73C. For example, outside air is less likely to be drawn into the gap between the inlet 73B and the second flow path 51E. This makes it possible to suppress scattering of the gas ejected from the outlet 51B, making it easier to irradiate the plasma in the intended direction (for example, forward). This makes it possible to stabilize the direction of plasma irradiation.

The protrusions 81 are rectangular parallelepiped shaped. The pair of protrusions 81 each protrude rearward by the same amount. The protrusion amount of the pair of protrusions 81 is preferably, for example, 0.2 mm or more and 0.7 mm or less, and 0.5 mm is particularly preferred.

As shown in Figures 6 and 9, the ends 81A furthest from each other of the pair of protrusions 81 on the inlet 73B side are in contact with the outer circumferential surface of the dielectric 73 (rear component 73E). Note that only the upper end 81A is shown in Figures 6 and 9. The ends 81A are provided at both the top and bottom ends of the protrusion 81. The upper end 81A is flush with the upper surface 73J of the rear component 73E. The lower end 81A is flush with the lower surface 73K (see Figure 6) of the rear component 73E.

As shown in FIG. 10, the inner surface 81B of the pair of protrusions 81 is flush with the inner surface 73L of the gas guide path 73A (rear component 73E). In other words, the inner surface 81B of the pair of protrusions 81 and the inner surface 73L of the rear component 73E are smoothly connected without any steps.

As shown in FIG. 9, the inner surfaces 81B of the pair of protrusions 81 are flat surfaces along the extension direction (front-rear direction) and the up-down direction. In other words, the inner surfaces 81B of the pair of protrusions 81 do not have an uneven shape. The inner surfaces 81B of the pair of protrusions 81 are parallel to each other.

As shown in FIG. 9, the outer surface 81C of the pair of protrusions 81 is flush with the outer surface 73M of the gas guide path 73A (rear component 73E). In other words, the outer surface 81C of the pair of protrusions 81 and the outer surface 73M of the rear component 73E are smoothly connected without any steps.

[Configuration of protrusion on discharge port side]
The shapes of the front component 73F and the pair of protrusions 82 are similar to the shapes of the rear component 73E and the pair of protrusions 81. That is, the dielectric 73 is symmetrical in the front-rear direction, the left-right direction, and the up-down direction. The dielectric 73 is, for example, a single component.

As shown in Figures 6, 11 and 12, a pair of protrusions 82 is provided on the front end surface 73H. The pair of protrusions 82 is provided on the left and right edges of the front end surface 73H, respectively. The pair of protrusions 82 protrude from the front end surface 73H to the side opposite the flow path 73C (the forward side). As shown in Figures 11 and 13, the pair of protrusions 82 are arranged to sandwich the discharge port 51B from each other in the left-right direction. In other words, the distance between the pair of protrusions 82 is the same as the left-right width of the discharge port 51B.

In this way, by providing a pair of protrusions 82 on either side of the outlet 51B, atmospheric components are less likely to be mixed into the gas when it is ejected from the outlet 51B. This makes it possible to suppress loss of plasma energy, making it easier to maintain the plasma irradiation distance, and allowing the plasma to be irradiated efficiently. In addition, by providing a pair of protrusions 82 on either side of the outlet 51B, it becomes easier to guide the gas emitted from the outlet 51B in a desired direction (for example, forward). This makes it possible to stabilize the plasma irradiation direction.

The protrusions 82 are rectangular parallelepiped shaped. The forward protrusion amount of each of the pair of protrusions 82 is the same. The protrusion amount of the pair of protrusions 81 is preferably, for example, 0.2 mm or more and 0.7 mm or less, and 0.5 mm is particularly preferable.

As shown in Figures 6 and 12, the ends 82A furthest from each other of the pair of protrusions 82 on the emission port 51B side are in contact with the outer peripheral surface of the dielectric 73 (front component 73F). Note that only the upper end 82A is shown in Figures 6 and 12. The ends 82A are provided at both the upper and lower ends of the protrusion 82. The upper end 82A is flush with the upper surface 73P of the front component 73F. The lower end 82A is flush with the lower surface 73Q of the front component 73F (see Figure 6). This allows the pair of protrusions 82 to sandwich the emission port 51B over a wider area.

As shown in FIG. 13, the inner surface 82B of the pair of protrusions 82 is flush with the inner surface 73R of the gas guide path 73A (front component 73F). In other words, the inner surface 82B of the pair of protrusions 82 and the inner surface 73R of the front component 73F are smoothly connected without any steps. This makes it difficult for turbulence to occur within the gas guide path 73A or between the pair of protrusions 82.

As shown in FIG. 12, the inner surface 82B of the pair of protrusions 82 is a flat surface along the extension direction (front-rear direction) and the up-down direction. In other words, the inner surface 82B of the pair of protrusions 82 does not have an uneven shape. The inner surfaces 82B of the pair of protrusions 82 are parallel. This makes it easier to guide gas more stably along the inner surfaces 82B of the pair of protrusions 82.

As shown in FIG. 12, the outer surface 82C of the pair of protrusions 82 is flush with the outer surface 73S of the gas guide path 73A (front component 73F). In other words, the outer surface 82C of the pair of protrusions 81 and the outer surface 73S of the front component 73F are smoothly connected without any steps.

5. Example of Effects In the plasma irradiation device 10 of the present disclosure, a pair of protrusions 81 are provided on the rear end surface 73G on the inlet 73B side, so that gas can be smoothly introduced into the flow path 73C. In addition, in a configuration in which a pair of protrusions 82 are provided on the front end surface 73H on the outlet 51B side, outside air is less likely to be drawn in, and the gas discharged from the outlet 51B can be easily guided in a desired direction. Therefore, in this plasma irradiation device 10, the irradiation direction of the plasma can be stabilized.

Furthermore, in the plasma irradiation device 10 of the present disclosure, in the opening (inlet 73B) where the pair of protrusions 81 are provided, both ends 81A of each of the pair of protrusions 81 that are furthest from each other are in contact with the outer circumferential surface (upper surface 73J and lower surface 73K of the rear component 73E) of the dielectric 73 (cylindrical member). With this configuration, the pair of protrusions 81 can sandwich the opening (inlet 73B) over a wider range. This makes it easier to guide the gas between the pair of protrusions 81 more stably.

In addition, in the opening (discharge port 51B) where the pair of protrusions 82 are provided, the ends 82A of each of the pair of protrusions 82 that are furthest from each other are in contact with the outer circumferential surface (upper surface 73P and lower surface 73Q of front component 73F) of dielectric 73 (cylindrical member). With this configuration, the pair of protrusions 82 can sandwich the opening (discharge port 51B) over a wider range. This makes it easier to guide gas more stably between the pair of protrusions 82.

Furthermore, in the plasma irradiation device 10 of the present disclosure, the inner surface 81B of the pair of protrusions 81 is flush with the inner surface 73L of the gas guide path 73A (rear component 73E). With this configuration, there is no step between the inner surface 81B of the pair of protrusions 81 and the inner surface 73L of the rear component 73E, making it difficult for turbulence to occur within the gas guide path 73A or between the pair of protrusions 81.

In addition, the inner surface 82B of the pair of protrusions 82 is flush with the inner surface 73R of the gas guide path 73A (front component 73F). With this configuration, there is no step between the inner surface 82B of the pair of protrusions 82 and the inner surface 73R of the front component 73F, making it difficult for turbulence to occur in the gas guide path 73A or between the pair of protrusions 82.

Furthermore, in the plasma irradiation device 10 of the present disclosure, the inner surface 81B of the pair of protrusions 81 is a flat surface along the extension direction. With this configuration, it becomes easier to guide gas more stably along the inner surface 81B of the pair of protrusions 81 compared to a configuration in which the inner surface 81B of the protrusions 81 has unevenness.

In addition, the inner surfaces 82B of the pair of protrusions 82 are flat surfaces along the extension direction. With this configuration, it becomes easier to guide gas more stably along the inner surfaces 82B of the pair of protrusions 82 compared to a configuration in which the inner surfaces 82B of the protrusions 82 are uneven.

Second Embodiment
In the first embodiment, the pair of protrusions 82 are provided on the left and right edges of the front end face 73H, but may be provided at other positions on the front end face 73H. In the description of the second embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

[Configuration of protrusion on discharge port side]
In the second embodiment, as shown in Fig. 14, a pair of protrusions 282 is provided on the front end surface 73H. The pair of protrusions 282 is provided on the left and right edges of the front end surface 73H, respectively. That is, the pair of protrusions 282 is provided at a position away from the discharge port 51B on the front end surface 73H. With this configuration, it is difficult for atmospheric components to be mixed into the gas when the gas is ejected from the discharge port 51B. In addition, it is easy to guide the gas emitted from the discharge port 51B in a desired direction (for example, forward).

[Configuration of protrusion on inlet side]
In the second embodiment, the protrusion on the inlet 73B side is not shown, but has the same configuration as the protrusion 282 on the outlet 51B side (see FIG. 14). With such a configuration, the gas passage can be made smaller in stages, and turbulence is less likely to occur in the gas guide path 73A.

<Other embodiments>
The present disclosure is not limited to the embodiments described above and in the drawings. For example, the features of the above or later described embodiments can be combined in any combination without contradiction. Furthermore, any feature of the above or later described embodiments can be omitted unless it is clearly stated as essential. Furthermore, the above-mentioned embodiment may be modified as follows.

In the first embodiment, a pair of protrusions is provided on both the rear end surface 73G and the front end surface 73H of the dielectric 73, but a pair of protrusions may be provided on only one end surface.

In the first embodiment, the ends 81A of the protrusion 81 that are furthest from each other are in contact with the outer peripheral surface of the dielectric 73 (the upper surface 73J and the lower surface 73K of the rear component 73E), but the configuration may be such that both or only one of the ends 81A are not in contact with the outer peripheral surface of the dielectric 73. In other words, the end 81A of the protrusion 81 may be located inward (inward in the Y direction) from the outer peripheral surface of the dielectric 73. The protrusion 82 may also be configured in a similar manner.

In the first embodiment, the pair of protruding portions 81 have the same shape, but they may be different. For example, the amount of rearward protrusion of each of the pair of protruding portions 81 may be different. The pair of protruding portions 82 may also be configured in a similar manner.

In the first embodiment, the inlet 73B and the other end (front end) of the second flow path 51E are connected, but the other end (front end) of the second flow path 51E may be configured to enter the flow path 73C (located forward of the inlet 73B).

It should be noted that the embodiments disclosed herein are illustrative in all respects and should not be considered restrictive. The scope of the present invention is not limited to the embodiments disclosed herein, but is intended to include all modifications within the scope of the claims or within the scope equivalent to the claims.

Description of the Reference Number 10: Plasma irradiation device 11: Base 13: Detachable section 15: First connector section 17: Cable 20: Control device 21: Control section 22: Input section 23: Output section 24: Memory section 25: Gas supply section 26: Power supply section 31: First case 41: Second case 51: Gas passage 51A: Inlet 51B: Outlet 51C: Flow path 51D: First flow path 51E: Second flow path 55A: First wiring 55B: Second wiring 55C: First conductive path 55D: Second conductive path 55E: Third conductive path 55F: Fourth conductive path 57A: Second connector section 57B: Third connector section 63: Transformer 65: Switch 70: Discharge section 71: First electrode 72: Second electrode 73: Dielectric 73A: Gas guide path 73B: Inlet 73C: Flow path 73D: Main body 73E: Rear component 73F: Front component 73G: Rear end surface 73H: Front end surface 73J: Upper surface 73K: Lower surface 73L: Inner surface 73M: Outer surface 73P: Upper surface 73Q: Lower surface 73R: Inner surface 73S: Outer surface 81: Projection 81A: End 81B: Inner surface 81C: Outer surface 82: Protrusion 82A: End 82B: Inner surface 82C: Outer surface 100: Plasma irradiation system 282: Protrusion

Claims (4)

a cylindrical member constituting a gas guide path having an inlet for introducing a gas, an outlet for discharging the gas, and a flow path provided between the inlet and the outlet;
A pair of electrodes for generating a plasma discharge within the gas guide path;
A plasma irradiation device comprising:
The inlet and the outlet are formed on different end surfaces of the cylindrical member,
At least one of the end surface on which the inlet is formed and the end surface on which the outlet is formed is provided with a pair of protruding portions protruding toward an opposite side to the flow path and disposed with the inlet or the outlet sandwiched between them.
Plasma irradiation device. In the inlet and the outlet, at the openings where the pair of protrusions are provided, the ends of the pair of protrusions that are furthest from each other are in contact with the outer circumferential surface of the cylindrical member.
The plasma irradiation device according to claim 1 . The inner surfaces of the pair of protrusions are flush with the inner surface of the gas guide path.
The plasma irradiation device according to claim 1 or 2. The inner surfaces of the pair of protrusions are flat surfaces along the extension direction.
The plasma irradiation device according to claim 1 or 2.

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