JP2023122118A - Exposure method and exposure device - Google Patents

Abstract

An object of the present invention is to compensate for exposure without reducing positional accuracy even if there is an exposure head that cannot perform exposure due to a malfunction or the like. The exposure method includes a step of irradiating light from a first exposure head toward a first exposure area in a first exposure pattern, and a step of irradiating light from the first exposure head toward a second exposure area. a step of irradiating light with a second exposure pattern, a step of irradiating light with a third exposure pattern from the second exposure head toward a third exposure area, and a step of irradiating light with a third exposure pattern from the second exposure head to the fourth exposure area. and a step of irradiating light with a fourth exposure pattern toward. [Selection diagram] Figure 14

Description

The technology disclosed in this specification relates to exposure of a substrate. Substrates to be processed include, for example, semiconductor wafers, glass substrates for liquid crystal display devices, flat panel display (FPD) substrates such as organic EL (electroluminescence) display devices, optical disk substrates, magnetic disk substrates, and magneto-optical disks. substrates for photomasks, glass substrates for photomasks, ceramic substrates, substrates for field emission displays (ie, FEDs), substrates for solar cells, and the like.

2. Description of the Related Art Conventionally, there has been known an exposure apparatus that exposes an exposure area on a substrate using a plurality of exposure heads (see, for example, Japanese Unexamined Patent Application Publication No. 2002-100002).

In such an exposure apparatus, each of exposure areas handled by a plurality of exposure heads is exposed. If any one of the exposure heads fails to expose the exposure area for which it is responsible due to a defect, additional exposure is performed by another exposure head for compensation.

JP 2008-116646 A

In the prior art, when there is an exposure area that cannot be exposed, additional exposure is performed for supplementation, but the additional exposure causes the exposure head to perform an operation different from the normal exposure operation. Therefore, the operation control becomes complicated, and the positional accuracy of exposure can be lowered.

The technology disclosed in the specification of the present application has been made in view of the problems described above. It is a technology to compensate for

An exposure method that is a first aspect of the technology disclosed in this specification is an exposure method that uses an exposure device that includes a first exposure head and a second exposure head, the exposure device having a plurality of exposure regions. is provided on the substrate, and the first exposure head exposes a first exposure pattern corresponding to a first exposure area among the plurality of exposure areas, and a first exposure pattern among the plurality of exposure areas. and a second exposure pattern corresponding to a second exposure region, wherein the second exposure head performs a third exposure corresponding to a third exposure region among the plurality of exposure regions. A pattern and a fourth exposure pattern corresponding to a fourth exposure region among the plurality of exposure regions can be irradiated with light, and the plurality of exposure regions are irradiated with the first exposure head and the second exposure region. and moving the first exposure head from the first exposure head toward the first exposure area while the first exposure area is positioned at the exposure position of the first exposure head. a step of irradiating light with the first exposure pattern using the first exposure head; and performing the second exposure from the first exposure head while the second exposure region is positioned at the exposure position of the first exposure head. irradiating a region with light in the second exposure pattern; and in a state in which the third exposure region is positioned at the exposure position of the second exposure head, the second a step of irradiating light in the third exposure pattern toward exposure regions of No. 3; and irradiating light in the fourth exposure pattern toward the fourth exposure region from the above.

The exposure method, which is a second aspect of the technique disclosed in this specification, relates to the exposure method, which is a first aspect, and includes light emitted from the first exposure head to the first exposure region; Light emitted from the first exposure head to the second exposure region, light emitted from the second exposure head to the third exposure region, and light emitted from the second exposure head to the fourth exposure region. does not expose the corresponding exposure area.

The exposure method, which is a third aspect of the technique disclosed in this specification, relates to the exposure method, which is the first or second aspect, and irradiates the first exposure region from the first exposure head. light, light emitted from the first exposure head to the second exposure region, light emitted from the second exposure head to the third exposure region, and light emitted from the second exposure head to the Any of the light that irradiates the fourth exposure area is blocked.

An exposure method that is a fourth aspect of the technique disclosed in this specification relates to the exposure method that is any one of the first to third aspects, and includes the first exposure head and the second exposure head. An exposure head is arranged in a first direction, each of the plurality of exposure regions is arranged in the first direction, and the step of relatively moving the plurality of exposure regions comprises moving the plurality of exposure regions to the This is the step of moving along the first direction.

An exposure method that is a fifth aspect of the technique disclosed in this specification relates to the exposure method that is any one of the first to fourth aspects, wherein the first exposure region and the second exposure region are An exposure region is provided adjacent to the exposure region, and the third exposure region and the fourth exposure region are provided adjacent to each other.

An exposure method that is a sixth aspect of the technique disclosed in this specification relates to the exposure method that is any one aspect of the first to fifth aspects, wherein the first exposure region and the third exposure region are The exposure area is the same exposure area.

An exposure method that is a seventh aspect of the technology disclosed in this specification relates to the exposure method that is a fourth aspect, wherein the first exposure head and the second exposure head are arranged adjacent to each other in a direction, the second exposure area and the third exposure area are the same area, and the first exposure area, the second exposure area, and the fourth exposure area; are arranged adjacent to each other in the first direction in order, and the light irradiated from the first exposure head to the second exposure region and the light irradiated from the second exposure head to the third exposure region any light is blocked.

An exposure apparatus according to an eighth aspect of the technology disclosed in this specification comprises a first exposure head and a second exposure head for exposing a substrate, wherein the substrate is subjected to a plurality of exposures. regions are provided, and the first exposure head applies a first exposure pattern corresponding to a first exposure region out of the plurality of exposure regions and a second exposure region out of the plurality of exposure regions. and a corresponding second exposure pattern, wherein the second exposure head irradiates a third exposure pattern corresponding to a third exposure region among the plurality of exposure regions; and a fourth exposure pattern corresponding to a fourth exposure area of the exposure areas, and the plurality of exposure areas are arranged relative to the first exposure head and the second exposure head. and a control unit for controlling exposure operations of the first exposure head and the second exposure head, wherein the control unit controls the movement of the first exposure area to the first exposure area. in the exposure position of the exposure head, after the first exposure head irradiates light in the first exposure pattern toward the first exposure area, the second exposure area is the In a state where the first exposure head is located at the exposure position, the first exposure head emits light in the second exposure pattern toward the second exposure area, and the control unit controls the second exposure pattern. After irradiating light in the third exposure pattern from the second exposure head toward the third exposure area in a state where the exposure area 3 is positioned at the exposure position of the second exposure head; and irradiating light in the fourth exposure pattern from the second exposure head toward the fourth exposure area while the fourth exposure area is positioned at the exposure position of the second exposure head. Let

The exposure apparatus according to the ninth aspect of the technology disclosed in this specification relates to the exposure apparatus according to the eighth aspect, and controls the first exposure head and the second exposure head under the control of the control unit. Further comprising a light shielding section capable of selectively blocking light emitted by the exposure head, and a sensor configured to detect states of the first exposure head and the second exposure head, wherein the moving section comprises: configured to move the plurality of exposure regions in a first direction with respect to the first exposure head and the second exposure head, wherein the first exposure head and the second exposure head are arranged adjacent to each other in one direction, the second exposure region and the third exposure region are the same region, and the first exposure region, the second exposure region, and the fourth exposure region are arranged adjacent to each other in the first direction in the order of the exposure areas, and the controller detects whether or not there is a defect in the first exposure head and the second exposure head based on information from the sensor. wherein the controller controls the light emitted from the first exposure head to the second exposure area when a defect of the first exposure head and the second exposure head is not detected; and one of the light beams emitted from the second exposure head to the third exposure area is blocked by the light shielding section, and when a defect of the first exposure head is detected, at least When the light irradiating the third exposure area from the second exposure head by the light shielding part is not blocked by the light shielding part and a failure of the second exposure head is detected, at least the light shielding is performed. The light irradiating the second exposure area from the first exposure head is not blocked by the light shielding part.

According to at least the first and eighth aspects of the technology disclosed in the specification of the present application, a plurality of exposure heads are used to irradiate light a plurality of times, so that various variations can be obtained using a plurality of exposure heads. An exposure operation can be realized. Therefore, even if one of the plurality of exposure heads is unable to perform exposure due to a defect or the like, light irradiation by the other exposure heads scheduled in advance can be performed a plurality of times without lowering the positional accuracy of exposure. Can compensate for exposure.

Also, the objects, features, aspects, and advantages associated with the technology disclosed herein will become more apparent from the detailed description and accompanying drawings presented below.

1 is a side view showing the configuration of an exposure apparatus relating to this embodiment; FIG. 1 is a plan view showing the configuration of an exposure apparatus relating to this embodiment; FIG. FIG. 4 is a diagram showing an example of the relationship between an exposure area on a substrate and a plurality of exposure heads during normal operation; FIG. 2 is a diagram conceptually showing the configuration of a plurality of exposure heads; FIG. 2 is a diagram conceptually showing a connection configuration between respective driving units and control units of the exposure apparatus; FIG. 2 is a diagram showing the configuration of an exposure apparatus centering on a control section for each function; 4 is a flow chart showing an example of the flow of operations of an exposure apparatus; 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG. 4 is a plan view showing how the exposure apparatus operates; FIG.

Embodiments will be described below with reference to the attached drawings. In the following embodiments, detailed features and the like are also shown for technical explanation, but they are examples, and not all of them are necessarily essential features for enabling the embodiments.

It should be noted that the drawings are shown schematically, and for the convenience of explanation, some omissions or simplifications of the configuration may be made in the drawings as appropriate. In addition, the mutual relationship of sizes and positions of configurations shown in different drawings is not necessarily described accurately and can be changed as appropriate. In addition, even in drawings such as plan views that are not cross-sectional views, hatching may be added to facilitate understanding of the contents of the embodiments.

In addition, in the description given below, the same components are denoted by the same reference numerals, and their names and functions are also the same. Therefore, a detailed description thereof may be omitted to avoid duplication.

Also, in the descriptions in this specification, when a component is described as “comprising,” “including,” or “having,” unless otherwise specified, it is an exclusive term that excludes other components. not an expression.

In addition, even if ordinal numbers such as “first” or “second” are used in the description given in this specification, these terms are used to understand the content of the embodiments. They are used for the sake of convenience, and the subject matter of the embodiments is not limited to the order or the like that can occur with these ordinal numbers.

In addition, in the descriptions given in the specification of the present application, expressions such as “… positive direction of axis” or “… negative direction of axis” refer to the direction along the arrow of the illustrated , the direction opposite to the arrow is the negative direction.

Also, in the descriptions provided herein, specific positions or orientations such as "top", "bottom", "left", "right", "side", "bottom", "front" or "back" are used for convenience in order to facilitate understanding of the content of the embodiments, and may be used when the embodiments are actually implemented. is independent of the position or orientation of

<Embodiment>
An exposure apparatus and an exposure method according to this embodiment will be described below.

<Regarding the structure of the exposure device>
FIG. 1 is a side view showing the configuration of an exposure apparatus 1 according to this embodiment. Also, FIG. 2 is a plan view showing the configuration of the exposure apparatus 1 according to this embodiment. The exposure device 1 is, for example, a device for drawing a predetermined pattern on the upper surface of a glass substrate for a color filter (hereinafter also simply referred to as "substrate") in a process of manufacturing a color filter for a liquid crystal display device.

As shown in FIGS. 1 and 2, the exposure apparatus 1 includes a stage 10 for holding a substrate 9, a stage driving unit 20 connected to the stage 10, and a plurality of substrates arranged in the X-axis direction. A head unit 30 having exposure heads (exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d and exposure head 32e) and a control unit 50 for controlling the operation of each driving unit in the apparatus. there is Further, the exposure apparatus 1 can further include an irradiation light photographing section 40 for photographing light (irradiation light) emitted from each exposure head.

The stage 10 has a flat plate-like outer shape, and is a holding portion for holding the substrate 9 in a horizontal posture on its upper surface. A plurality of suction holes (not shown here) are formed in the upper surface of the stage 10 . Therefore, when the substrate 9 is placed on the stage 10, the substrate 9 is fixed on the upper surface of the stage 10 by the suction pressure of the suction holes. A layer of a photosensitive material such as a color resist is formed on the surface of the substrate 9 held on the stage 10 .

The stage drive unit 20 is a mechanism for moving the stage 10 in the main scanning direction (Y-axis direction), sub-scanning direction (X-axis direction), and rotational direction (rotational direction around the Z-axis). The stage drive unit 20 includes a rotation mechanism 21 that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. and a main scanning mechanism 25 for moving the base plate 24 in the main scanning direction.

The rotation mechanism 21 includes a linear motor 21a including a mover attached to the end of the stage 10 on the Y-axis negative direction side and a stator laid on the upper surface of the support plate 22 . A rotating shaft 21 b is provided between the lower surface side of the central portion of the stage 10 and the support plate 22 . Therefore, when the linear motor 21a is operated, the mover moves in the X-axis direction along the stator, and the stage 10 rotates about the rotating shaft 21b on the support plate 22 within a predetermined angle range.

The sub-scanning mechanism 23 includes a linear motor 23a composed of a mover attached to the bottom surface of the support plate 22 and a stator laid on the top surface of the base plate 24 . A pair of guide portions 23b extending in the sub-scanning direction are provided between the support plate 22 and the base plate 24. As shown in FIG. Therefore, when the linear motor 23a is operated, the support plate 22 moves along the guide portion 23b on the base plate 24 in the sub-scanning direction.

The main scanning mechanism 25 includes a linear motor 25 a composed of a mover attached to the lower surface of the base plate 24 and a stator laid on the base 60 of the exposure apparatus 1 . A pair of guide portions 25b extending in the main scanning direction are provided between the base plate 24 and the base 60. As shown in FIG. Therefore, when the linear motor 25a is operated, the base plate 24 moves along the guide portion 25b on the base 60 in the main scanning direction.

The head unit 30 is a mechanism for irradiating the upper surface of the substrate 9 held on the stage 10 with a predetermined pattern of pulsed light. The head unit 30 includes a frame 31 mounted on a base 60 across the stage 10 and the stage driving unit 20, and five exposure heads (exposure heads) attached to the frame 31 at regular intervals along the sub-scanning direction. head 32a, exposure head 32b, exposure head 32c, exposure head 32d and exposure head 32e). One laser oscillator 34 is connected to each exposure head via an illumination optical system 33 . A laser driver 35 is connected to the laser oscillator 34 .

Therefore, when the laser drive unit 35 is operated, pulsed light is oscillated from the laser oscillator 34 and the oscillated pulsed light is introduced into each exposure head via the illumination optical system 33 .

Inside each exposure head are an emission unit 36 for emitting downward the pulsed light introduced from the illumination optical system 33, an aperture unit 37 for partially shielding the pulsed light, and a pulsed light. A projection optical system 38 is provided for imaging the on the upper surface of the substrate 9 . An aperture AP, which is a glass plate on which a predetermined light shielding pattern is formed, is set in the aperture unit 37 . The pulsed light emitted from the emission unit 36 is partially blocked when passing through the aperture AP set in the aperture unit 37, and enters the projection optical system 38 as a light beam having a predetermined pattern. A predetermined pattern is drawn on the photosensitive material on the substrate 9 by irradiating the upper surface of the substrate 9 with the pulsed light that has passed through the projection optical system 38 .

Further, as conceptually shown in FIG. 1, each exposure head is provided with an aperture driver 39 for adjusting the position of the aperture AP set in the aperture unit 37 . The aperture driver 39 can select a pattern to be projected onto the substrate 9 and adjust the projection position of the pattern by adjusting the horizontal position (including the tilt in the horizontal plane) of the aperture AP. In addition, the aperture driving section 39 can also prohibit the irradiation of the pulsed light by shielding the entire irradiation area of the pulsed light with the light shielding section of the aperture AP. Aperture drive unit 39 can be configured, for example, by combining a plurality of linear motors.

FIG. 3 is a diagram showing an example of the relationship between the exposure area on the substrate 9 and the plurality of exposure heads during normal operation. As an example is shown in FIG. 3, the plurality of exposure heads are arranged at equal intervals (for example, at intervals of 200 mm) along the sub-scanning direction (X-axis direction). When performing exposure processing (drawing processing), the stage 10 is moved in the main scanning direction, and pulsed light is emitted from each exposure head. As a result, a plurality of patterns are drawn in the main scanning direction on the upper surface of the substrate 9 with a predetermined exposure width W (for example, 50 mm width).

When the drawing in the main scanning direction is completed once, the exposure apparatus 1 moves the stage 10 in the sub-scanning direction by the exposure width W, and while moving the stage 10 again in the main scanning direction, each exposure head Irradiate with pulsed light. In this manner, the exposure apparatus 1 repeats drawing in the main scanning direction a predetermined number of times (for example, four times) while shifting the substrate 9 in the sub-scanning direction by the exposure width W of the exposure head. Form a pattern for the filter.

In this way, the exposure area on the substrate 9 includes five strip-shaped exposure areas Aa corresponding to the respective exposure heads (exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e). It is divided into an area Ab, an exposure area Ac, an exposure area Ad and an exposure area Ae and arranged in the X-axis direction. It should be noted that the number of exposure heads and the number of exposure areas do not necessarily match, and either number may be greater.

Each exposure head can expose a plurality of exposure areas. For example, the exposure head 32a can expose the exposure area Aa and the exposure area Ab, the exposure head 32b can expose the exposure area Aa, the exposure area Ab and the exposure area Ac, and the exposure head 32c can expose the exposure area Ab and the exposure area Ac and exposure area Ad can be exposed, exposure head 32d can expose exposure area Ac, exposure area Ad, and exposure area Ae, and exposure head 32e can expose exposure area Ad and exposure area Ae. Note that the exposure regions that can be exposed are not limited to the exposure regions at the positions corresponding to the respective exposure heads and the exposure regions adjacent thereto as described above. In the case shown in FIG. 3, among the above, the exposure areas at the positions corresponding to the respective exposure heads (that is, the exposure area Aa for the exposure head 32a, the exposure area Ab for the exposure head 32b, and the exposure area for the exposure head 32c Ac, an exposure area Ad for the exposure head 32d, and an exposure area Ae for the exposure head 32e) are exposed.

FIG. 4 is a diagram conceptually showing the configuration of a plurality of exposure heads. As shown in FIG. 4, the exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e are controlled by a large number of component parts such as an aperture AP, an aperture driver 39, and a projection optical system 38. It is configured. When all these element parts operate normally, the substrate 9 is irradiated with normal pulsed light.

Returning to FIGS. 1 and 2, the irradiation light photographing unit 40 is a mechanism for photographing pulsed light emitted from each exposure head. The irradiation light photographing unit 40 includes a CCD camera 41, a guide rail 42, and a camera driving mechanism 43 configured by a linear motor or the like. The CCD camera 41 is arranged with its photographing direction facing upward. When the camera driving mechanism 43 is operated, the CCD camera 41 moves in the sub-scanning direction along the guide rails 42 attached to the side of the base plate 24 in the positive Y-axis direction.

When using the CCD camera 41, first, the main scanning mechanism 25 is operated, and the base plate 24 is positioned so that the CCD camera 41 is positioned below the head section 30 (state shown in FIGS. 1 and 2). Then, while the camera drive mechanism 43 is operated to move the CCD camera 41 in the sub-scanning direction, the pulsed light emitted from each exposure head is photographed by the CCD camera 41 . Image data acquired by photographing is transferred from the CCD camera 41 to the control unit 50 . The transferred image data is used, for example, to determine whether or not there is a defect in the corresponding exposure head.

The control section 50 is a processing section for controlling the operation of each driving section in the exposure apparatus 1 . FIG. 5 is a diagram conceptually showing a connection configuration between each driving section and the control section 50 of the exposure apparatus 1. As shown in FIG.

As shown in FIG. 5, the controller 50 includes a rotating mechanism 21, a sub-scanning mechanism 23, a main scanning mechanism 25, a laser driver 35, an illumination optical system 33, a projection optical system 38, an aperture driver 39, a CCD It is electrically connected to the camera 41 and the camera driving mechanism 43 and controls their operations. Note that the control unit 50 is configured by, for example, a computer having a CPU or a memory, and performs the above control by the computer operating according to a program installed in the computer.

<Functions of the exposure device>
FIG. 6 is a diagram showing the configuration of the exposure apparatus 1 centering on the control unit 50 for each function. As shown in FIG. 6, the control unit 50 includes a stage position adjustment unit 53, an irradiation control unit (irradiation control unit 54a, an irradiation control unit 54b) as processing units realized by the operation of a CPU or a memory. , an irradiation control unit 54c, an irradiation control unit 54d and an irradiation control unit 54e) and a control switching determination unit 55 are provided.

The stage position adjusting section 53 is a processing section for adjusting the position of the stage 10 . By transmitting a control signal to the stage driving section 20, the stage position adjusting section 53 moves the stage 10 so that it is positioned above the exposure area for which each exposure head is in charge.

The irradiation control unit (the irradiation control unit 54a, the irradiation control unit 54b, the irradiation control unit 54c, the irradiation control unit 54d, and the irradiation control unit 54e) controls the operation of irradiating a plurality of exposure regions to be exposed with pulsed light. processing unit.

In addition, the control switching determination unit 55 outputs an irradiation control signal Sa, an irradiation control signal Sb, and an irradiation control signal output from each of the irradiation control unit 54a, the irradiation control unit 54b, the irradiation control unit 54c, the irradiation control unit 54d, and the irradiation control unit 54e. A processing unit for allocating the signal Sc, the irradiation control signal Sd, and the irradiation control signal Se to the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head 32e, respectively. The control switching determination unit 55 outputs at least two signals (signals indicating exposure patterns) out of the irradiation control signal Sa, the irradiation control signal Sb, the irradiation control signal Sc, the irradiation control signal Sd, and the irradiation control signal Se to the exposure head. assign to Thereby, each exposure head can expose a plurality of exposure areas by a plurality of exposure operations.

<About operation of the exposure device>
Next, operations of the exposure apparatus 1 will be described. FIG. 7 is a flow chart showing an example of the operation flow of the exposure apparatus 1. As shown in FIG. 8, 9 and 10 are plan views showing how the exposure apparatus 1 operates. A series of operations to be described below are performed by the control unit 50 using the rotation mechanism 21, the sub-scanning mechanism 23, the main scanning mechanism 25, the laser driving unit 35, the illumination optical system 33, the projection optical system 38, the aperture driving unit 39, and the CCD. It is realized by controlling the operations of the camera 41, the camera driving mechanism 43, and the like.

With the substrate 9 set on the stage 10, the exposure apparatus 1 uses the exposure heads 32a, 32b, 32c, 32d, and 32e to cover a plurality of exposure areas respectively. Light is applied to (exposure area Aa, exposure area Ab, exposure area Ac, exposure area Ad, and exposure area Ae) (step ST1). That is, while controlling the stage driving unit 20 to move the substrate 9 in the main scanning direction and the sub-scanning direction, the exposure start positions of the exposure regions in charge are positioned below the respective exposure heads. Then, a plurality of exposure heads (all exposure heads in the present embodiment) emit pulsed light of corresponding exposure patterns.

Specifically, as shown in FIG. 8, the exposure head 32a emits light with a pattern that does not contribute to exposure, such as a dummy pattern, because the exposure region is not located at the corresponding exposure position. The exposure head 32b exposes the exposure area Aa located at the exposure position with an exposure pattern based on the irradiation control signal Sa, the exposure head 32c exposes the exposure area Ab located at the exposure position with the exposure pattern based on the irradiation control signal Sb, The exposure head 32d exposes the exposure area Ac located at the exposure position with the exposure pattern based on the irradiation control signal Sc, and the exposure head 32e exposes the exposure area Ad located at the exposure position with the exposure pattern based on the irradiation control signal Sd. conduct. At this time, since the exposure area Ae is not positioned at the exposure position of any exposure head, the exposure area Ae is not exposed. Note that the exposure position is a position where the light emitted from the exposure head reaches and where appropriate exposure can be performed, and corresponds to, for example, a position directly below each exposure head. Note that irradiating light in a pattern that does not contribute to exposure means irradiating light in such a manner that an exposure pattern is not formed on an exposure region. The mode in which the exposure pattern is not formed on the exposure area may be, for example, a state in which the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP. Further, when the illumination optical system 33 is configured to include a spatial light modulator (DMD, GLV, etc.), the spatial light modulator may transmit pulsed light to the exposure region in such a manner that the exposure pattern is not formed on the exposure region. A state in which the spatial light modulator is controlled to a non-reflecting state may also be used.

Next, while moving by one exposure area along the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the second time with the corresponding exposure pattern. (step ST2). Irradiation control signals (signals indicating exposure patterns) corresponding to different exposure regions are input to the respective exposure heads so that different exposure regions can be exposed in each of the exposure operations scheduled for a plurality of times. be. Therefore, in step ST2, the exposure regions located at the exposure positions of the respective exposure heads are different from the exposure regions in step ST1, but the respective exposure heads appropriately irradiate the light of the corresponding exposure patterns.

Specifically, as shown in an example in FIG. 9, the exposure head 32a exposes the exposure area Aa located at the exposure position with an exposure pattern based on the irradiation control signal Sa, and the exposure head 32b performs exposure according to the irradiation control signal Sb. The exposure area Ab located at the exposure position is exposed with the exposure pattern based on the exposure head 32c, and the exposure head 32c exposes the exposure area Ac located at the exposure position with the exposure pattern based on the irradiation control signal Sc. The exposure area Ad located at the exposure position is exposed with the exposure pattern based on Sd, and the exposure head 32e exposes the exposure area Ae located at the exposure position with the exposure pattern based on the irradiation control signal Se.

Further, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the third time with the corresponding exposure pattern ( step ST3). As described above, each exposure head has an irradiation control signal (a signal indicating an exposure pattern) corresponding to a different exposure area so that a different exposure area can be exposed in each exposure operation scheduled for a plurality of times. Since the light is input, the light of the corresponding exposure pattern is appropriately emitted from each exposure head.

Specifically, as shown in an example in FIG. 10, the exposure head 32a exposes the exposure area Ab located at the exposure position with an exposure pattern based on the irradiation control signal Sb, and the exposure head 32b performs exposure according to the irradiation control signal Sc. The exposure area Ac located at the exposure position is exposed with the exposure pattern based on the exposure control signal Sd. The exposure area Ae located at the exposure position is exposed with the exposure pattern based on Se, and the exposure head 32e irradiates light with a pattern that does not contribute to exposure, such as a dummy pattern, because the exposure area is not located at the corresponding exposure position. do. At this time, since the exposure area Aa is not positioned at the exposure position of any exposure head, the exposure area Aa is not exposed.

In this way, the exposure areas Aa and Ae can be exposed twice, and the exposure areas Ab, Ac, and Ad can be exposed three times.

Here, since each exposure head receives an irradiation control signal indicating an exposure pattern so that exposure can be performed on a plurality of exposure regions, the exposure pattern corresponding to the exposure region positioned at the exposure position is irradiated. If , it is not necessary to have the correspondence relationship as described above. That is, not only when irradiation control signals (signals indicating exposure patterns) corresponding to a plurality of mutually adjacent exposure regions are input to one exposure head, but also when irradiation control signals corresponding to a plurality of non-adjacent exposure regions are input. , may be input to one exposure head. However, when irradiation control signals corresponding to a plurality of mutually adjacent exposure regions are input to a single exposure head, there is a need for exposing the plurality of exposure regions between the exposure head and the corresponding exposure regions. relative movement can be minimized. Therefore, since the amount of movement of the exposure head can be reduced, the time required for exposure can be reduced, and high positional accuracy of exposure can be maintained.

Moreover, the positional relationship between the exposure head and the exposure area may be changed by relatively moving the head section 30 and the substrate 9 . That is, the head section 30 may move, or both may move.

Also, the number of times of light irradiation from each exposure head is not limited to the above three times, and may be any number of times.

Exposure including double exposure and triple exposure can be realized by the above multiple light irradiations. Further, by blocking the irradiation of light from at least a part of the exposure heads, various exposures different from those described above can be realized. That is, even if one of the plurality of exposure heads is in a state where exposure cannot be performed due to a defect or the like, the operation of the light shielding portion of the aperture AP is simply changed from the normal operation shown in FIGS. , the exposure can be supplemented by multiple irradiations of light from other exposure heads. Therefore, it is possible to improve the degree of freedom of the exposure operation while maintaining high positional accuracy as compared with the case where the exposure operation for supplementation is performed separately.

Next, a modification of the operation of the exposure apparatus 1 will be described. 11, 12 and 13 are plan views showing how the exposure apparatus 1 operates.

With the substrate 9 set on the stage 10, the exposure apparatus 1 uses the exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e to cover the respective exposure areas (exposure areas). Light is applied to the area Aa, the exposure area Ab, the exposure area Ac, the exposure area Ad, and the exposure area Ae).

Specifically, as shown in FIG. 11, the exposure head 32a irradiates light with a pattern that does not contribute to exposure, such as a dummy pattern, and the exposure head 32b irradiates the exposure area Aa based on the irradiation control signal Sa. The exposure head 32c emits light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32d emits light toward the exposure area Ac based on the irradiation control signal Sc. , the exposure head 32e emits light toward the exposure area Ad based on the irradiation control signal Sd. At this time, since the exposure area Ae is not located at the exposure position of any exposure head, no light is directed toward the exposure area Ae.

Here, in each exposure head, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39 . That is, light irradiation is blocked from each exposure head. As a result, in the operation illustrated in FIG. 11, no exposure is performed for the respective exposure area. In addition, as shown in FIG. 11, the light shielding portion may prevent the exposure, or the light may be irradiated with a pattern that does not contribute to the exposure, such as a dummy pattern, without blocking the light with the light shielding portion. may prevent exposure from being performed.

Next, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the second time with the corresponding exposure pattern. .

Specifically, as shown in FIG. 12, the exposure head 32a exposes the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32b exposes the exposure area Ab based on the irradiation control signal Sb. , the exposure head 32c performs exposure on the exposure area Ac based on the irradiation control signal Sc, the exposure head 32d performs exposure on the exposure area Ad based on the irradiation control signal Sd, and the exposure head 32e performs exposure on the irradiation control signal Se. Based on this, the exposure area Ae is exposed.

Further, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the third time with the corresponding exposure pattern.

Specifically, as shown in FIG. 13, the exposure head 32a emits light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32b emits light toward the exposure area Ab based on the irradiation control signal Sc. The exposure head 32c emits light toward the exposure area Ad based on the irradiation control signal Sd, and the exposure head 32d emits light toward the exposure area Ae based on the irradiation control signal Se. The exposure head 32e irradiates light with a pattern that does not contribute to exposure, such as a dummy pattern. At this time, since the exposure area Aa is not positioned at the exposure position of any exposure head, no light is directed toward the exposure area Aa.

Here, in each exposure head, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39 . That is, light irradiation is blocked from each exposure head. As a result, in the operation illustrated in FIG. 13, no exposure is performed for the respective exposure area. In addition, as shown in FIG. 13, the light shielding portion may prevent the exposure, or the light may be irradiated with a pattern that does not contribute to the exposure, such as a dummy pattern, without blocking the light with the light shielding portion. may prevent exposure from being performed.

In this way, one exposure can be performed for all exposure regions.

Next, another modified example of the operation of the exposure apparatus 1 will be described. 14, 15 and 16 are plan views showing how the exposure apparatus 1 operates.

With the substrate 9 set on the stage 10, the exposure apparatus 1 uses the exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e to cover the respective exposure areas (exposure areas). Light is applied to the area Aa, the exposure area Ab, the exposure area Ac, the exposure area Ad, and the exposure area Ae).

Specifically, as shown in an example in FIG. 14, the exposure head 32a irradiates light with a pattern that does not contribute to exposure, such as a dummy pattern, and the exposure head 32b irradiates the exposure area Aa based on the irradiation control signal Sa. The exposure head 32c emits light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32d emits light toward the exposure area Ac based on the irradiation control signal Sc. , the exposure head 32e emits light toward the exposure area Ad based on the irradiation control signal Sd. At this time, since the exposure area Ae is not located at the exposure position of any exposure head, no light is directed toward the exposure area Ae.

Here, in the exposure heads 32a and 32c, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39. FIG. That is, light irradiation is blocked from the exposure heads 32a and 32c. As a result, in the operation whose example is shown in FIG. 14, the exposure area Ab is not exposed. By blocking the irradiation of light from the exposure head 32a, excess light to the outside of the substrate 9 can be suppressed.

Next, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the second time with the corresponding exposure pattern. .

Specifically, as shown in an example in FIG. 15, the exposure head 32a emits light toward the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32b emits light toward the exposure area Aa based on the irradiation control signal Sb. Ab, the exposure head 32c emits light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32d emits light toward the exposure area Ad based on the irradiation control signal Sd. The exposure head 32e irradiates the exposure area Ae with light based on the irradiation control signal Se.

Here, in the exposure head 32c, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39. FIG. That is, light irradiation from the exposure head 32c is blocked. As a result, in the operation exemplified in FIG. 15, the exposure area Ac is not exposed.

Further, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the third time with the corresponding exposure pattern.

Specifically, as shown in FIG. 16, the exposure head 32a emits light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32b emits light toward the exposure area Ab based on the irradiation control signal Sc. The exposure head 32c emits light toward the exposure area Ad based on the irradiation control signal Sd, and the exposure head 32d emits light toward the exposure area Ae based on the irradiation control signal Se. The exposure head 32e irradiates light with a pattern that does not contribute to exposure, such as a dummy pattern. At this time, since the exposure area Aa is not positioned at the exposure position of any exposure head, no light is directed toward the exposure area Aa.

Here, in the exposure heads 32c and 32e, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39. FIG. That is, light irradiation is blocked from the exposure head 32c and the exposure head 32e. As a result, in the operation illustrated in FIG. 16, the exposure area Ad is not exposed. By blocking the irradiation of light from the exposure head 32e, excess light to the outside of the substrate 9 can be suppressed.

By doing so, it is possible to perform two exposures for all the exposure regions. In addition, since the exposure positions of the different arranged exposure heads are sequentially positioned in one exposure area and the double exposure is performed, when the same exposure head is used for the double exposure, the necessary start of exposure is required. The operation of returning the exposure head to the position, that is, the driving operation in the positive direction of the X-axis becomes unnecessary. Therefore, the amount of movement of the exposure head can be reduced, the time required for exposure can be reduced, and high positional accuracy of exposure can be maintained.

Next, another modified example of the operation of the exposure apparatus 1 will be described. In this modified example, it is assumed that the exposure head 32a cannot irradiate light due to a problem. Regarding the determination of the defect of the exposure head 32a, for example, information such as the position, line width, or light amount of the pulsed light emitted from each exposure head photographed by the CCD camera 41 (sensor) is processed by the control unit 50 into an image. Get from data. Then, by comparing this information with the information on the ideal irradiation pattern, it is possible to determine whether the appropriate pulsed light is being irradiated from the exposure head. 17, 18 and 19 are plan views showing how the exposure apparatus 1 operates.

With the substrate 9 set on the stage 10, the exposure apparatus 1 uses the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head 32e to cover the respective exposure areas (exposure areas Aa, exposure Light is applied to the area Ab, the exposure area Ac, the exposure area Ad, and the exposure area Ae).

Specifically, as shown in FIG. 17, the exposure head 32b emits light toward the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32c emits light toward the exposure area Aa based on the irradiation control signal Sb. Ab, the exposure head 32d emits light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32e emits light toward the exposure area Ad based on the irradiation control signal Sd. Irradiate. At this time, since the exposure area Ae is not located at the exposure position of any exposure head, no light is directed toward the exposure area Ae.

It is assumed that light is not emitted from the exposure head 32a due to a defect, but in the exposure head 32a, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39. That is, light irradiation from the exposure head 32a is blocked.

Next, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the second time with the corresponding exposure pattern. .

Specifically, as shown in FIG. 18, the exposure head 32b emits light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32c emits light toward the exposure area Ab based on the irradiation control signal Sc. The exposure head 32d emits light toward the exposure area Ad based on the irradiation control signal Sd, and the exposure head 32e emits light toward the exposure area Ae based on the irradiation control signal Se. Irradiate.

Here, in the exposure heads 32a, 32b, 32c, and 32d, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39. FIG. That is, light irradiation is blocked from the exposure head 32a, the exposure head 32b, the exposure head 32c, and the exposure head 32d. As a result, in the operation whose example is shown in FIG. 18, no exposure is performed on the exposure area Aa, the exposure area Ab, the exposure area Ac, and the exposure area Ad.

Further, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the third time with the corresponding exposure pattern.

Specifically, as shown in an example in FIG. 19, the exposure head 32b emits light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32c emits light toward the exposure area Ac based on the irradiation control signal Sd. The exposure head 32d irradiates light toward the exposure area Ae based on the irradiation control signal Se, and the exposure head 32e irradiates light with a pattern that does not contribute to exposure, such as a dummy pattern. . At this time, since the exposure area Aa is not positioned at the exposure position of any exposure head, no light is directed toward the exposure area Aa.

Here, in each exposure head, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39 . That is, light irradiation is blocked from each exposure head. As a result, in the operation illustrated in FIG. 19, not all exposure areas are exposed.

In this manner, even if the exposure head 32a cannot irradiate light due to a problem, the operation of the light shielding portion of the aperture AP is changed from the normal operation shown in FIGS. 8 to 16. One exposure can be performed for all exposure areas by simply

Next, another modified example of the operation of the exposure apparatus 1 will be described. In this modified example, it is assumed that the exposure head 32a, the exposure head 32c, and the exposure head 32e cannot irradiate light due to a problem. 20, 21 and 22 are plan views showing how the exposure apparatus 1 operates.

With the substrate 9 set on the stage 10, the exposure apparatus 1 uses the exposure head 32b and the exposure head 32d to cover the respective exposure areas (exposure area Aa, exposure area Ab, exposure area Ac, exposure area Ac, exposure The area Ad and the exposure area Ae) are irradiated with light.

Specifically, as shown in an example in FIG. 20, the exposure head 32b emits light toward the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32d emits light toward the exposure area Aa based on the irradiation control signal Sc. Light is directed toward Ac. At this time, since the exposure area Ae is not located at the exposure position of any exposure head, no light is directed toward the exposure area Ae.

It is assumed that light is not emitted from the exposure heads 32a, 32c, and 32e due to defects. is blocked by the light blocking portion of the aperture AP. That is, light irradiation is blocked from the exposure head 32a, the exposure head 32c, and the exposure head 32e. As a result, in the operation whose example is shown in FIG. 20, no exposure is performed on the exposure area Ab and the exposure area Ad.

Next, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the second time with the corresponding exposure pattern. .

Specifically, as shown in FIG. 21, the exposure head 32b emits light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32d emits light toward the exposure area Ab based on the irradiation control signal Sd. Light is directed toward Ad.

Here, in the exposure heads 32a, 32c, and 32e, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39. FIG. That is, light irradiation is blocked from the exposure head 32a, the exposure head 32c, and the exposure head 32e. As a result, in the operation exemplified in FIG. 21, no exposure is performed on exposure area Aa, exposure area Ac, and exposure area Ae.

Further, while moving by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area positioned at the exposure position of each exposure head is irradiated with light for the third time with the corresponding exposure pattern.

Specifically, as shown in an example in FIG. 22, the exposure head 32b emits light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32d emits light toward the exposure area Ac based on the irradiation control signal Se. Ae is irradiated with light. At this time, since the exposure area Aa is not positioned at the exposure position of any exposure head, no light is directed toward the exposure area Aa.

Here, in the exposure heads 32a, 32b, 32c, and 32e, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driving portion 39. FIG. That is, light irradiation is blocked from the exposure head 32a, the exposure head 32b, the exposure head 32c, and the exposure head 32e. As a result, in the operation whose example is shown in FIG. 22, no exposure is performed on the exposure area Ab, the exposure area Ac, and the exposure area Ad.

In this manner, even if exposure head 32a, exposure head 32c, and exposure head 32e cannot irradiate light due to a problem, normal operation as shown in FIGS. All exposure regions can be exposed once by simply changing the operation of the light shielding portion of the AP.

<About the effect produced by the embodiment described above>
Next, examples of effects produced by the embodiments described above are shown. In the following description, the effect will be described based on the specific configuration exemplified in the embodiment described above. may be substituted with other specific configurations shown. That is, hereinafter, for convenience, only one of the specific configurations to be associated may be described as a representative, but other specific configurations to which the specific configurations described as representative are associated may be replaced with a similar configuration.

According to the embodiments described above, in the exposure method, the first exposure head has the first exposure pattern corresponding to the first exposure area of the plurality of exposure areas, and the exposure pattern of the plurality of exposure areas. It is possible to irradiate light with the second exposure pattern corresponding to the second exposure region. Here, the first exposure head corresponds to, for example, one of exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d and exposure head 32e. Also, the first exposure area and the second exposure area correspond to, for example, different two of exposure area Aa, exposure area Ab, exposure area Ac, exposure area Ad, and exposure area Ae. The first exposure pattern and the second exposure pattern are, for example, an exposure pattern based on the irradiation control signal Sa, an exposure pattern based on the irradiation control signal Sb, an exposure pattern based on the irradiation control signal Sc, and an exposure pattern based on the irradiation control signal Sd. They correspond to two different ones of the exposure pattern and the exposure pattern based on the irradiation control signal Se, respectively. The second exposure head has a third exposure pattern corresponding to a third exposure area of the plurality of exposure areas and a fourth exposure pattern corresponding to a fourth exposure area of the plurality of exposure areas. It is possible to irradiate light with Here, the second exposure head corresponds to, for example, one of exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e, which is different from the first exposure head. . Also, the third exposure area and the fourth exposure area correspond to, for example, different two of exposure area Aa, exposure area Ab, exposure area Ac, exposure area Ad, and exposure area Ae. The third exposure pattern and the fourth exposure pattern are, for example, an exposure pattern based on the irradiation control signal Sa, an exposure pattern based on the irradiation control signal Sb, an exposure pattern based on the irradiation control signal Sc, and an exposure pattern based on the irradiation control signal Sd. They correspond to two different ones of the exposure pattern and the exposure pattern based on the irradiation control signal Se, respectively. Then, the plurality of exposure areas are moved relative to the exposure heads 32a and 32b. Then, in a state where the exposure area Aa is located at the exposure position of the exposure head 32a, the exposure head 32a irradiates the exposure area Aa with an exposure pattern based on the irradiation control signal Sa, and the exposure area Ab 32a, the exposure head 32a irradiates the exposure area Ab with light in an exposure pattern based on the irradiation control signal Sb. Then, in a state where the exposure area Ac is positioned at the exposure position of the exposure head 32b, the exposure head 32b irradiates the exposure area Ac with light in an exposure pattern based on the irradiation control signal Sc, and the exposure area Ad is the exposure head 32b. 32b, the exposure head 32b irradiates the exposure area Ad with light in an exposure pattern based on the irradiation control signal Sd.

According to such a configuration, it is possible to realize various variations of exposure operations using a plurality of exposure heads by using the plurality of exposure heads to irradiate light a plurality of times. Therefore, even if one of the plurality of exposure heads cannot be exposed due to a defect, the operation of the light shielding portion of the aperture AP is simply changed from the normal operation shown in FIGS. 8 to 16. , the exposure can be supplemented by a plurality of predetermined light irradiations from other exposure heads, so that the degree of freedom of the exposure operation can be improved while maintaining high exposure positional accuracy.

In addition, when other configurations whose examples are shown in this specification are added to the above configurations as appropriate, that is, when other configurations in this specification that are not mentioned as the above configurations are added as appropriate can produce a similar effect.

Further, according to the embodiments described above, either the light emitted from the exposure head 32a to the different exposure regions or the light emitted to the different exposure regions from the exposure head 32b. However, the corresponding exposure area is not exposed. According to such a configuration, one of the light beams emitted multiple times from each of the plurality of exposure heads is not used for exposure (for example, a dummy pattern). Various variations of exposure operations (for example, when normal exposure (single exposure) is performed for all exposure regions, or when double exposure is performed for all exposure regions) can be realized. . In addition, by changing the pattern of the light emitted from the exposure head to prevent exposure without turning off the power of the exposure head, a state in which exposure can be performed again (for example, the intensity of the emitted light can save time until it reaches a stable state).

Further, according to the embodiments described above, either the light emitted from the exposure head 32a to the different exposure regions or the light emitted to the different exposure regions from the exposure head 32b. is blocked. According to such a configuration, various variations of exposure operations (for example, all exposure operations) can be performed using a plurality of exposure heads by blocking one of the light beams emitted from each of the plurality of exposure heads a plurality of times. It is possible to realize normal exposure (single exposure) for an area, double exposure for all exposure areas, or the like. That is, even if one of the plurality of exposure heads cannot perform exposure due to a defect or the like, various variations of the exposure operation can be realized. Also, until the light emitted from the exposure head is cut off without turning off the power of the exposure head, until a state (for example, a state in which the intensity of the irradiated light is stabilized) is reached where exposure can be performed again. time can be saved.

Also, according to the embodiments described above, the exposure heads 32a and 32b are arranged in the first direction. Here, the first direction corresponds to, for example, the X-axis direction. Each of the multiple exposure regions is arranged in the X-axis direction. The step of relatively moving the plurality of exposure regions is the step of moving the plurality of exposure regions along the X-axis direction. According to such a configuration, a plurality of exposure heads are arranged along the direction in which the exposure regions are arranged, and by moving the exposure heads along the direction in which the exposure regions are arranged, one The exposure position of the exposure head can be efficiently located in a plurality of exposure areas. Therefore, it is possible to reduce the amount of movement by limiting the movement direction of the exposure head to one direction, so that the time required for exposure can be reduced and high positional accuracy of exposure can be maintained.

Moreover, according to the embodiment described above, the exposure area Aa and the exposure area Ab are provided adjacent to each other. Also, an exposure area Ac and an exposure area Ad are provided adjacent to each other. According to such a configuration, it is possible to minimize the relative movement between the exposure head and the corresponding exposure areas for exposing the plurality of exposure areas. Therefore, since the amount of movement of the exposure head can be reduced, the time required for exposure can be reduced, and high positional accuracy of exposure can be maintained.

Further, according to the embodiments described above, the first exposure area and the third exposure area are the same exposure area. According to such a configuration, it is possible to perform double exposure using different exposure heads for one exposure area. Therefore, for example, if the exposure positions of two arrayed exposure heads are sequentially positioned in one exposure area and double exposure is performed, the exposure required when performing double exposure using the same exposure head The drive operation for returning the exposure head to the start position, that is, the drive operation on the opposite side of the drive operation in the sub-scanning direction for exposure (driving operation in the negative direction of the X-axis) becomes unnecessary. Therefore, since the amount of movement of the exposure head can be reduced, the time required for exposure can be reduced, and high positional accuracy of exposure can be maintained.

According to the embodiment described above, the exposure apparatus includes the exposure heads 32a and 32b for exposing the substrate 9, and a plurality of exposure areas for the exposure heads 32a and 32b. It includes a moving unit for relatively moving, and a control unit 50 for controlling exposure operations of the exposure heads 32a and 32b. Here, the moving section corresponds to, for example, the stage driving section 20 or the like. Here, the substrate 9 is provided with a plurality of exposure regions. Further, the exposure head 32a performs an exposure pattern based on the irradiation control signal Sa corresponding to the exposure area Aa among the plurality of exposure areas, and an exposure pattern based on the irradiation control signal Sb corresponding to the exposure area Ab among the plurality of exposure areas. It is possible to irradiate light with a pattern. Further, the exposure head 32b performs an exposure pattern based on the irradiation control signal Sc corresponding to the exposure area Ac of the plurality of exposure areas, and an exposure pattern based on the irradiation control signal Sd corresponding to the exposure area Ad of the plurality of exposure areas. It is possible to irradiate light with a pattern. Then, the control unit 50 causes the exposure head 32a to irradiate the exposure area Aa with light in an exposure pattern based on the irradiation control signal Sa in a state where the exposure area Aa is positioned at the exposure position of the exposure head 32a. With the area Ab positioned at the exposure position of the exposure head 32a, the exposure head 32a irradiates the exposure area Ab with light in an exposure pattern based on the irradiation control signal Sb. Further, the control unit 50 irradiates light from the exposure head 32b toward the exposure area Ac in an exposure pattern based on the irradiation control signal Sc while the exposure area Ac is positioned at the exposure position of the exposure head 32b, and performs exposure. With the area Ad positioned at the exposure position of the exposure head 32b, light is emitted from the exposure head 32b toward the exposure area Ad in an exposure pattern based on the irradiation control signal Sd.

According to such a configuration, it is possible to realize various variations of exposure operations using a plurality of exposure heads by using the plurality of exposure heads to irradiate light a plurality of times. Therefore, even if one of the plurality of exposure heads cannot be exposed due to a defect, the operation of the light shielding portion of the aperture AP is simply changed from the normal operation shown in FIGS. 8 to 16. Therefore, exposure can be supplemented by a plurality of predetermined light irradiations from other exposure heads, so that the degree of freedom of exposure operation can be improved while maintaining high exposure position accuracy.

It should be noted that when other configurations exemplified in the present specification are appropriately added to the above configurations, that is, when other configurations in the present specification that are not mentioned as the above configurations are added as appropriate can produce a similar effect.

<Regarding Modifications of the Embodiments Described Above>
In the embodiments described above, the dimensions, shapes, relative positional relationships, and implementation conditions of each component may also be described, but these are all examples in all aspects, shall not be limiting.

Reference Signs List 1 exposure device 9 substrate 32a exposure head 32b exposure head 32c exposure head 32d exposure head 32e exposure head 50 control unit Aa exposure area Ab exposure area Ac exposure area Ad exposure area Ae exposure area

Claims (9)

An exposure method using an exposure device comprising a first exposure head and a second exposure head,
The exposure device exposes a substrate provided with a plurality of exposure regions,
The first exposure head has a first exposure pattern corresponding to a first exposure region among the plurality of exposure regions and a second exposure pattern corresponding to a second exposure region among the plurality of exposure regions. It is possible to irradiate light with an exposure pattern,
The second exposure head has a third exposure pattern corresponding to a third exposure region of the plurality of exposure regions, and a fourth exposure pattern corresponding to a fourth exposure region of the plurality of exposure regions. It is possible to irradiate light with an exposure pattern,
moving the plurality of exposure areas relative to the first exposure head and the second exposure head;
irradiating light in the first exposure pattern from the first exposure head toward the first exposure area while the first exposure area is positioned at the exposure position of the first exposure head; and,
With the second exposure region positioned at the exposure position of the first exposure head, light is irradiated from the first exposure head toward the second exposure region in the second exposure pattern. process and
In a state where the third exposure region is positioned at the exposure position of the second exposure head, light is irradiated from the second exposure head toward the third exposure region in the third exposure pattern. process and
In a state where the fourth exposure region is positioned at the exposure position of the second exposure head, light is irradiated from the second exposure head toward the fourth exposure region in the fourth exposure pattern. and
exposure method. The exposure method according to claim 1,
light irradiated from the first exposure head to the first exposure region, light irradiated from the first exposure head to the second exposure region, and third exposure from the second exposure head either the light irradiated to the region or the light irradiated from the second exposure head to the fourth exposure region does not expose the corresponding exposure region;
exposure method. The exposure method according to claim 1 or 2,
light irradiated from the first exposure head to the first exposure region, light irradiated from the first exposure head to the second exposure region, and third exposure from the second exposure head either the light irradiated to the region or the light irradiated from the second exposure head to the fourth exposure region is blocked;
exposure method. An exposure method according to any one of claims 1 to 3,
the first exposure head and the second exposure head are arranged in a first direction;
each of the plurality of exposure regions is arranged in the first direction;
The step of relatively moving the plurality of exposure regions is a step of moving the plurality of exposure regions along the first direction.
exposure method. An exposure method according to any one of claims 1 to 4,
The first exposure region and the second exposure region are provided adjacent to each other,
The third exposure region and the fourth exposure region are provided adjacent to each other,
exposure method. An exposure method according to any one of claims 1 to 5,
wherein the first exposure region and the third exposure region are the same exposure region,
exposure method. An exposure method according to claim 4,
the first exposure head and the second exposure head are arranged adjacent to each other in the first direction;
The second exposure area and the third exposure area are the same area, and the first exposure area, the second exposure area, and the fourth exposure area are arranged in the first direction in this order. are arranged adjacent to the
either the light irradiated from the first exposure head to the second exposure region or the light irradiated from the second exposure head to the third exposure region is blocked;
exposure method. A first exposure head and a second exposure head for exposing the substrate,
The substrate is provided with a plurality of exposure regions,
The first exposure head has a first exposure pattern corresponding to a first exposure region among the plurality of exposure regions and a second exposure pattern corresponding to a second exposure region among the plurality of exposure regions. It is possible to irradiate light with an exposure pattern,
The second exposure head has a third exposure pattern corresponding to a third exposure region of the plurality of exposure regions, and a fourth exposure pattern corresponding to a fourth exposure region of the plurality of exposure regions. It is possible to irradiate light with an exposure pattern,
a moving unit that relatively moves the plurality of exposure regions with respect to the first exposure head and the second exposure head;
a control unit for controlling exposure operations of the first exposure head and the second exposure head;
The control section directs the first exposure pattern from the first exposure head toward the first exposure area while the first exposure area is positioned at the exposure position of the first exposure head. After irradiating light, the second exposure area is directed from the first exposure head toward the second exposure area while the second exposure area is positioned at the exposure position of the first exposure head. irradiate light with an exposure pattern,
The control unit directs the third exposure pattern from the second exposure head toward the third exposure area while the third exposure area is positioned at the exposure position of the second exposure head. , the fourth exposure head is directed toward the fourth exposure area from the second exposure head while the fourth exposure area is positioned at the exposure position of the second exposure head. irradiate light with an exposure pattern of
Exposure equipment. An exposure apparatus according to claim 8,
a light blocking unit capable of selectively blocking light emitted by the first exposure head and the second exposure head under the control of the control unit;
a sensor configured to detect the state of the first exposure head and the second exposure head;
the moving unit is configured to move the plurality of exposure regions in a first direction with respect to the first exposure head and the second exposure head;
the first exposure head and the second exposure head are arranged adjacent to each other in the first direction;
The second exposure area and the third exposure area are the same area, and the first exposure area, the second exposure area, and the fourth exposure area are arranged in the first direction in this order. are arranged adjacent to the
The control unit is configured to detect the presence or absence of defects in the first exposure head and the second exposure head based on information from the sensor,
The control unit
When no defect of the first exposure head and the second exposure head is detected, the light emitted from the first exposure head to the second exposure area and the light emitted from the second exposure head The light shielding part is configured to block one of the lights irradiated to the third exposure area, and
When the failure of the first exposure head is detected, at least the light shielding unit does not block the light emitted from the second exposure head to the third exposure area by the light shielding unit. When a defect of the second exposure head is detected, at least the light shielding unit does not block the light emitted from the first exposure head to the second exposure area by the light shielding unit.
Exposure equipment.

Images