JP2021113683A - 原子力プラントの炭素鋼部材への貴金属付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法 - Google Patents
原子力プラントの炭素鋼部材への貴金属付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法 Download PDFInfo
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- JP2021113683A JP2021113683A JP2020005023A JP2020005023A JP2021113683A JP 2021113683 A JP2021113683 A JP 2021113683A JP 2020005023 A JP2020005023 A JP 2020005023A JP 2020005023 A JP2020005023 A JP 2020005023A JP 2021113683 A JP2021113683 A JP 2021113683A
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- aqueous solution
- pipe
- film
- carbon steel
- nickel
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- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims abstract description 350
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- VEPSWGHMGZQCIN-UHFFFAOYSA-H ferric oxalate Chemical class [Fe+3].[Fe+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O VEPSWGHMGZQCIN-UHFFFAOYSA-H 0.000 description 4
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Images
Classifications
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- G—PHYSICS
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- G21C—NUCLEAR REACTORS
- G21C17/00—Monitoring; Testing ; Maintaining
- G21C17/02—Devices or arrangements for monitoring coolant or moderator
- G21C17/022—Devices or arrangements for monitoring coolant or moderator for monitoring liquid coolants or moderators
- G21C17/0225—Chemical surface treatment, e.g. corrosion
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1619—Apparatus for electroless plating
- C23C18/1632—Features specific for the apparatus, e.g. layout of cells and of its equipment, multiple cells
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1637—Composition of the substrate metallic substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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Abstract
Description
2Fe[(COO)2]2−+2H2O+2H+ …(1)
浄化系配管18の内面に形成されたシュウ酸鉄(II)が溶解され、シュウ酸水溶液に注入した過酸化水素が式(1)の反応によって消失したことが確認された後、循環配管31の弁66を通過したシュウ酸水溶液の一部を、配管71を通してカチオン交換樹脂塔53に供給する。このシュウ酸水溶液に含まれる放射性核種等の金属陽イオンが、カチオン交換樹脂塔53内の陽イオン交換樹脂に吸着されて除去される。なお、シュウ酸水溶液内の過酸化水素の消失は、例えば、循環配管31からサンプリングしたシュウ酸水溶液に過酸化水素に反応する試験紙を浸漬し、試験紙に現れる色を見ることによって確認できる。
N2H4+2H2O2 → N2+4H2O ……(3)
シュウ酸及びヒドラジンの分解装置55内での分解は、シュウ酸水溶液を循環配管31及び浄化系配管18を含む閉ループ内を循環させながら行われる。供給した過酸化水素がシュウ酸及びヒドラジンの分解のために分解装置55で完全に消費されて分解装置55から流出しないように、薬液タンク57から分解装置55への過酸化水素の供給量を、供給ポンプ58の回転速度を制御して調節する。
ニッケルイオン水溶液を注入する(ステップS4)。ニッケルイオン注入装置36の弁40を開いて注入ポンプ38を駆動することにより、薬液タンク37内のギ酸ニッケル水溶液を、循環配管31内を流れる鉄溶出促進剤水溶液に注入する。鉄溶出促進剤水溶液にギ酸ニッケル水溶液を注入した結果、循環配管31内で皮膜形成水溶液93が生成される。この皮膜形成水溶液93は、3800ppmのギ酸及び1500ppmの過酸化水素を含む90℃の皮膜形成水溶液である。このとき、ギ酸ニッケル水溶液の注入された循環配管31内を流れる循環水のニッケルイオン濃度が、例えば、500ppmになるように薬液タンク37内のギ酸ニッケル水溶液の濃度と注入量を調整する。このときのギ酸ニッケル水溶液を注入された循環配管31内を流れる循環水のpHは、前述したように、2.5〜4.0(2.5以上4.0以下)の範囲になるように調整する。
Claims (15)
- 鉄溶出剤及び過酸化水素を含む鉄溶出促進剤、及びニッケルイオンを含む皮膜形成水溶液を原子力プラントの炭素鋼部材の、炉水と接する第1表面に接触させて、この第1表面にニッケル金属皮膜を形成し、
形成された前記ニッケル金属皮膜の第2表面に貴金属を付着させ、
前記ニッケル金属皮膜の形成、及び前記貴金属の付着は、前記原子力プラントの運転停止後で前記原子力プラントの起動前に行われることを特徴とする原子力プラントの炭素鋼部材への貴金属付着方法。 - 前記皮膜形成水溶液を前記炭素鋼部材の第1表面に接触させる前に、前記鉄溶出剤及び前記過酸化水素を含む前記鉄溶出促進剤を含有する鉄溶出促進剤水溶液を前記炭素鋼部材の第1表面に接触させる請求項1に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記鉄溶出促進剤水溶液に前記鉄溶出剤及び前記過酸化水素を別々に注入する請求項2に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記鉄溶出剤及び前記過酸化水素を混合した状態で前記鉄溶出促進剤水溶液に注入する請求項2に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記鉄溶出剤としてギ酸、マロン酸及びアスコルビン酸のいずれかが用いられる請求項1ないし4のいずれか1項に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記ニッケル金属皮膜の形成は、前記鉄溶出剤、及び前記過酸化水素から生成されるヒドロキシラジカルの作用により前記炭素鋼部材から鉄イオンが溶出する際に発生する電子が、前記炭素鋼部材の第1表面に取り込まれた前記ニッケルイオンを還元することによって行われる請求項1ないし5のいずれか1項に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記ニッケルイオン及び前記鉄溶出促進剤を含む前記皮膜形成水溶液のpHが2.5以上4.0以下の範囲内のpHである請求項1に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記ニッケル金属皮膜の形成は、前記炭素鋼部材の第1表面に対して還元除染が実施された後に行われる請求項1に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記炭素鋼部材の第1表面への前記ニッケル金属皮膜の形成後で前記ニッケル金属皮膜の第2表面への前記貴金属の付着前に、前記皮膜形成水溶液に含まれる前記鉄溶出剤を分解する請求項1ないし8のいずれか1項に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 原子炉圧力容器に連絡される、炭素鋼部材である第1配管にこの第1配管とは別の第2配管を接続し、
鉄溶出剤及び過酸化水素を含む鉄溶出促進剤、及びニッケルイオンを含む皮膜形成水溶液を、前記第2配管を通して、前記第1配管に供給し、
前記皮膜形成水溶液を前記第1配管の内面に接触させて前記第1配管の内面にニッケル金属皮膜を形成し、
貴金属を含む貴金属水溶液を、前記第2配管から前記第1配管に供給して前記第1配管の内面に形成された前記ニッケル金属皮膜の表面に接触させ、前記貴金属を前記ニッケル金属皮膜の表面に付着させることを特徴とする原子力プラントの炭素鋼部材への貴金属付着方法。 - 前記皮膜形成水溶液を前記第1配管の内面に接触させる前に、前記鉄溶出剤及び前記過酸化水素を含む前記鉄溶出促進剤を含有する鉄溶出促進剤水溶液を、前記第2配管を通して前記第1配管内に供給し、前記鉄溶出促進剤水溶液を前記炭素鋼部材の第1表面に接触させる請求項10に記載の原子力プラントの炭素鋼部材への貴金属付着方法。
- 前記鉄溶出剤は前記第2配管に接続された鉄溶出剤注入装置から前記第2配管に注入され、前記過酸化水素は前記第2配管に接続された過酸化水素注入装置から前記第2配管に注入され、前記ニッケルイオンは前記第2配管に接続されたニッケルイオン注入装置から前記第2配管に注入され、
前記第1配管に供給される皮膜形成水溶液は、前記第2配管に注入された前記鉄溶出剤、前記過酸化水素及び前記ニッケルイオンによって前記第2配管内で生成される請求項11に記載の原子力プラントの炭素鋼部材への貴金属付着方法。 - 前記鉄溶出剤及び前記過酸化水素を含む鉄溶出促進剤は前記第2配管に接続された鉄溶出促進剤注入装置から前記第2配管に注入され、前記ニッケルイオンは前記第2配管に接続されたニッケルイオン注入装置から前記第2配管に注入され、
前記第1配管に供給される皮膜形成水溶液は、前記第2配管に注入された前記鉄溶出促進剤及び前記ニッケルイオンによって前記第2配管内で生成される請求項11に記載の原子力プラントの炭素鋼部材への貴金属付着方法。 - 請求項1ないし13のいずれか1項に記載された原子力プラントの炭素鋼部材への貴金属付着方法を実施し、
酸素を含む130℃以上330℃以下の温度範囲内の温度の水を前記貴金属が付着した前記ニッケル金属皮膜の第2表面に接触させることを特徴とする原子力プラントの炭素鋼部材への放射性核種の付着抑制方法。 - 前記ニッケル金属皮膜の第2表面に前記貴金属が付着された後、前記原子力プラントが起動され、
酸素を含む130℃以上330℃以下の温度範囲内の温度の水として、炉水が用いられる請求項14に記載の原子力プラントの炭素鋼部材への放射性核種の付着抑制方法。
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JP2002333498A (ja) * | 2001-05-10 | 2002-11-22 | Toshiba Corp | 放射性物質の除染方法 |
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JP2011247651A (ja) * | 2010-05-25 | 2011-12-08 | Hitachi-Ge Nuclear Energy Ltd | プラント構成部材へのフェライト皮膜形成方法 |
JP2019158808A (ja) * | 2018-03-16 | 2019-09-19 | 日立Geニュークリア・エナジー株式会社 | 原子力プラントの炭素鋼部材への貴金属の付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法 |
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JP6620081B2 (ja) * | 2016-09-20 | 2019-12-11 | 日立Geニュークリア・エナジー株式会社 | 原子力プラントの炭素鋼部材への貴金属の付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法 |
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JP2002333498A (ja) * | 2001-05-10 | 2002-11-22 | Toshiba Corp | 放射性物質の除染方法 |
JP2008036591A (ja) * | 2006-08-10 | 2008-02-21 | Toshiba Corp | 廃液中の有機酸の分解方法及びその分解装置 |
JP2010229543A (ja) * | 2009-03-06 | 2010-10-14 | Hitachi-Ge Nuclear Energy Ltd | 炭素鋼部材へのニッケルフェライト皮膜形成方法 |
US20110030850A1 (en) * | 2009-08-04 | 2011-02-10 | Hitachi-Ge Nuclear Energy, Ltd. | Suppression Method for Corrosion of Carbon Steel Member |
JP2011032551A (ja) * | 2009-08-04 | 2011-02-17 | Hitachi-Ge Nuclear Energy Ltd | 炭素鋼部材の防食方法 |
JP2011247651A (ja) * | 2010-05-25 | 2011-12-08 | Hitachi-Ge Nuclear Energy Ltd | プラント構成部材へのフェライト皮膜形成方法 |
JP2019158808A (ja) * | 2018-03-16 | 2019-09-19 | 日立Geニュークリア・エナジー株式会社 | 原子力プラントの炭素鋼部材への貴金属の付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法 |
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