JP2020163278A - Liquid atomization device and liquid atomization method - Google Patents

Abstract

To provide a liquid atomization device and a liquid atomization method capable of continuously obtaining liquid mist with a simple constitution.SOLUTION: A liquid atomization device 1 has: an atomization body member 11 composed of a porous body having a micro-pore 11P connected to a three-dimentional mesh shape; a liquid supply part 30 for continuously supplying liquid LQ made to soak into the micro-pore, to a liquid-supplied surface 11c of the atomization body member; and a gas supply part 20 for supplying the gas AR to a gas pressure surface 11b of the atomization body member to press the gas AR into the micro-pore, and discharging mist LQM of the liquid soaked in the micro-pore together with pressed-in gas, from a gas discharge surface 11a.SELECTED DRAWING: Figure 1

Description

The present invention relates to a liquid atomizer and a liquid atomization method for atomizing and discharging a liquid such as water.

Air conditioners such as humidifiers, beauty and health promotion devices such as facial equipment and saunas, chemical spraying devices such as pesticide sprayers, medical devices such as chemical inhalers, coating devices that apply mist-like paint, cleaning of semiconductor wafers, etc. Many devices, such as devices, that atomize and use liquids are used.
As a method of atomizing a liquid, for example, a method of injecting a pressurized liquid from a nozzle to atomize it, or a method of using a rotating body to disperse water in contact with the rotating body by centrifugal force (Patent Documents). 1), a method of causing cavitation in the liquid by an ultrasonic vibrator to atomize the liquid is known.

Japanese Patent No. 5032389

However, in the method described in Patent Document 1, a device such as a mechanism for rotating a rotating body has to be complicated. Further, the method using the ultrasonic oscillator also requires an electric circuit for driving the ultrasonic oscillator. When a nozzle is used, the particle size of the atomized droplets tends to vary.

The present invention has been made in view of the above problems, and is a liquid atomizer capable of continuously obtaining a liquid mist and a liquid capable of continuously obtaining a liquid mist with a simple configuration. Provides a method of atomization.

One aspect of the present invention for solving the above problems is an atomizing main body member made of a porous body having fine pores connected in a three-dimensional network, and a part of the surface thereof is a gas press-fitting surface. The atomized main body member in which the other part of the surface is the gas release surface and the other part of the surface is the liquid supplied surface, and the liquid to be impregnated into the fine pores of the atomized main body member. A gas is supplied to the liquid supply unit that continuously supplies the liquid supply surface and the gas press-fitting surface of the atomization main body member, and the gas is press-fitted into the fine pores, and the gas is press-fitted from the gas release surface. It is a liquid atomizer including a gas supply unit that continuously releases a mist of the liquid that has permeated into the fine pores together with the gas that has been press-fitted.

In the liquid atomization apparatus of the present invention, the liquid is continuously supplied from the liquid supply unit to the liquid-supplied surface of the atomization main body member made of a porous body to continuously permeate into the fine pores. On the other hand, by supplying the gas from the gas supply unit to the gas press-fitting surface of the atomizing main body member, it is possible to continuously release the liquid mist together with the gas from the gas release surface. Thus, the liquid mist can be obtained easily and continuously.

As the material of the porous body forming the atomized main body member, the porous material is made of oxide ceramics such as alumina, titania, zirconia, mulite and silica, nitride ceramics such as silicon nitride, and carbide ceramics such as silicon carbide. Examples include quality ceramics and porous glass. In addition, porous metals made of stainless steel, titanium, titanium alloys, nickel, nickel alloys, copper, copper alloys, aluminum, etc., fluororesins such as PTFE, and porous resins made of resins such as polyethylene, polypropylene, and polymethylmethacrylate are also mentioned. Be done.

A part of the surface of the atomized main body member is a gas press-fitting surface, another part is a gas discharge surface, and another part is a liquid supply surface. As a form of the atomized main body member, for example, one of the main surfaces of the plate-shaped (flat plate-shaped, intaglio-shaped, convex plate-shaped, hemispherical shell-shaped, spherical shell-shaped) atomized main body member is gas. The press-fitting surface is a part of the other main surface facing the main surface (gas press-fitting surface) in the thickness direction as a gas release surface, and the other part of the other main surface is a liquid supply surface. The form is mentioned. In addition, it is in the form of a cylinder (square cylinder, cylinder) or a bottomed cylinder (bottomed square cylinder, bottomed cylinder) in which one end is closed with a porous body or a dense member. Atomized body members can also be mentioned. In such a tubular or bottomed tubular atomizing main body member, for example, the inner surface is a gas press-fitting surface, a part of the outer surface is a gas release surface, and the other part of the outer surface is a liquid supply surface. May be. On the contrary, the outer surface may be a gas press-fitting surface, a part of the inner surface may be a gas release surface, and the other part of the inner surface may be a liquid supply surface.

Regarding which of the surfaces of the atomized main body member is selected as the liquid supply surface, the path through which the gas flows through the fine pores from the gas press-fitting surface to the gas discharge surface is taken into consideration, and the liquid coating is selected in the path. It is preferable to select the portion to be the liquid supply surface so that the liquid that has penetrated from the supply surface and expanded in the fine pores intervenes, and the gas moves along the above-mentioned path and the liquid moves and reaches the gas discharge surface. For example, among the surfaces of the atomized main body member, a portion adjacent to the gas release surface, a portion adjacent to the gas injection surface, or a surface connecting the gas emission surface and the gas injection surface (side surface connecting the upper and lower surfaces). Etc. can be selected as the liquid supply surface.

Further, the liquid supply unit that supplies the liquid to the liquid supply surface of the atomization main body member is composed of, for example, a liquid container for storing the liquid, gauze, a non-woven fabric, or the like, and one end is immersed in the stored liquid. While taking in the liquid, the liquid to be supplied surface of the atomized main body member is covered with the other end, and the liquid is transferred from one end to the other end by the capillary phenomenon in the intermediate part connecting one end with the other end. A transfer body that continuously supplies the liquid from the other end to the liquid-supplied surface of the atomized main body member can be mentioned. In addition, a constant flow rate of liquid is made into a columnar shape and dropped from the liquid storage tank or the discharge port of the liquid supply pipe (water pipe, etc.) toward the liquid supply surface of the atomized main body member, and the liquid of the atomized main body member is dropped. There is also one that continuously supplies the liquid to the surface to be supplied. Alternatively, a constant flow rate of liquid may be continuously supplied to the liquid supply surface from the discharge port arranged close to the liquid supply surface of the atomized main body member.

Examples of the liquid to be atomized by the liquid atomizer include water (drinking water, tap water, distilled water, ion-exchanged water, pure water, etc.) and alcohols such as methanol, ethanol, and IPA. In addition, alcohols such as methanol, acids such as hydrochloric acid and acetic acid, sodium hydroxide, potassium hydroxide, sodium hydrogen carbonate (baking soda), alkalis such as ammonia, fragrances, aqueous solutions containing various water-soluble components, various culture solutions, etc. Can be mentioned. Examples thereof include organic solvents such as toluene and xylene, and oils such as gasoline and kerosene.

Examples of the gas to be press-fitted into the atomizing main body member from the gas press-fitting surface include various gases such as air, hydrogen, nitrogen, oxygen, carbon dioxide, carbon monoxide, methane, propane, and a mixed gas of nitrogen and oxygen.

In the above-mentioned liquid atomizer, the liquid supply unit is attached to an intake unit that comes into contact with the liquid and takes in the liquid, a transfer unit that transfers the liquid taken in by the intake unit, and the liquid supply surface. A liquid atomizer having a liquid transfer body including a supply unit that continuously supplies the transferred liquid to the liquid supply surface in close proximity or in contact with the liquid may be used.

In this liquid atomizer, a liquid transfer body is used, and the liquid taken in at the intake section is transferred to the supply section at the transfer section, so that the liquid is easily and continuously supplied to the liquid supply surface of the atomizing main body member. Thus, the liquid mist can be continuously obtained.

Further, in the above-mentioned liquid atomization device, the transfer section of the liquid transfer body may be a liquid atomizer which is a capillary transfer section that transfers the liquid from the intake section to the supply section by a capillary phenomenon. ..

In this liquid atomizer, since the capillary phenomenon is used for the transfer of the liquid in the transfer part of the liquid transfer body of the liquid supply part, the liquid is atomized with an energy-saving and simple structure without using the power of a pump or the like. The liquid mist can be continuously and continuously supplied to the liquid-supplied surface of the above.

The capillary transfer portion of the liquid transfer body that transfers the liquid using the capillary phenomenon is, for example, a fiber (cotton thread, polyester fiber, etc.) having a property of getting wet with the liquid (hydrophilic when the liquid is water). Or resin (PVA, cellulose, etc.), gauze, non-woven fabric, felt, woven fabric such as towel, fiber bundle, twisted yarn, sponge, etc. can be used. Further, not only the capillary transfer section, but also the intake section, the supply section, and the entire liquid transfer body including these may be composed of gauze, a non-woven fabric, or the like that causes a capillary phenomenon.

Further, in the liquid atomizer according to any one of the above, the liquid is water, and the atomizing main body member comprises the porous body having an average pore diameter of 0.5 to 10 μm, and the gas. When the critical pressure of the porous body is Pc, the supply unit uses the gas having a pressure within the pressure range of 1.7 Pc-4.9 [kPa] to 2.2 Pc + 41.0 [kPa] as the gas. It is preferable to use a liquid atomizer that supplies the press-fit surface.

In this liquid atomizer, the atomizing body member is made of a porous body having fine pores having an average pore diameter of 0.5 to 10 μm, and the gas supply unit is described above according to the magnitude of the critical pressure Pc. Supply a gas with a pressure within the pressure range. As a result, a mist of water having a small particle size of D50 of 6.0 μm or less and D10 of 1.0 μm or less can be released from the gas release surface.

The critical pressure Pc of the porous body refers to the minimum pressure (atmospheric pressure) at which the liquid permeated into the fine pores can be pushed out by the pressure of the injected gas in the atomized main body member made of the porous body. .. The critical pressure Pc is given by Pc = 4γcosθ / AD. Here, γ is the surface tension of the liquid, θ is the contact angle of the liquid, and AD is the average pore diameter of the porous body forming the atomizing main body member.

Alternatively, in the liquid atomizer according to any one of the above, the liquid is water, and the atomizing main body member comprises the porous body having an average pore diameter of 0.5 to 3.4 μm. When the critical pressure of the porous body is Pc, the gas supply unit uses the gas having a pressure within the pressure range of 1.8 Pc-5.2 [kPa] to 2.2 Pc + 24.3 [kPa]. It is preferable to use a liquid atomizer that supplies the gas press-fitting surface.

In this liquid atomizer, the atomizing body member is composed of a porous body having smaller fine pores with an average pore diameter of 0.5 to 3.4 μm, and the gas supply part has a critical pressure Pc magnitude. A corresponding gas having a pressure within the pressure range described above is supplied. As a result, a mist of water having a D50 of 2.0 μm or less and a D10 of 1.0 μm or less can be released from the gas release surface.

Alternatively, the liquid atomizer according to any one of the above, wherein the liquid is water, and the atomizing main body member comprises the porous body having an average pore diameter of 0.5 to 1.3 μm. When the critical pressure of the porous body is Pc, the gas supply unit uses the gas having a pressure within the pressure range of 1.8 Pc-29.9 [kPa] to 2.0 Pc + 65.8 [kPa]. It is preferable to use a liquid atomizer that supplies the gas press-fitting surface.

In this liquid atomizer, the atomizing body member is composed of a porous body having an average pore diameter of 0.5 to 1.3 μm and having smaller fine pores, and the gas supply portion has a critical pressure Pc. A corresponding gas having a pressure within the pressure range described above is supplied. As a result, a mist of water having a D50 of 1.0 μm or less and a smaller particle size can be released from the gas release surface.

Another solution consists of a porous body with fine pores connected in a three-dimensional network, one part of which is a gas press-fitting surface and the other part of the surface is a gas release surface, which is the surface. The liquid is continuously supplied from the liquid supply unit to the liquid supply surface of the atomizing main body member, which is the liquid supply surface of the other part, and the liquid is impregnated into the fine pores. A gas is supplied from the gas supply unit to the gas press-fitting surface of the atomization main body member, the gas is press-fitted into the fine pores, and the gas is press-fitted into the fine pores together with the gas being press-fitted from the gas release surface. This is a method for atomizing a liquid that releases a mist of the soaked liquid.

According to this atomization method, the liquid is continuously supplied to the liquid-supplied surface of the atomizing main body member made of a porous body, and the gas is supplied to the gas press-fitting surface of the atomizing main body member to release the gas. Therefore, the mist of the liquid that has permeated into the fine pores together with the gas can be continuously released. Thus, the liquid mist can be obtained easily and continuously.

Further, in the above-mentioned liquid atomization method, the liquid supply unit includes an intake unit that comes into contact with the liquid and takes in the liquid, a transfer unit that transfers the liquid taken in by the intake unit, and a liquid supply unit. It is preferable to use a liquid atomization method having a liquid transfer body including a supply unit that continuously supplies the transferred liquid to or in contact with the surface to be supplied with the liquid.

In this liquid atomization method, a liquid transfer body is used, and the liquid taken in at the intake section is transferred to the supply section at the transfer section, so that the liquid can be easily and continuously transferred to the liquid supply surface of the atomization main body member. Can be supplied.

Further, in the above-mentioned liquid atomization method, the transfer portion of the liquid transfer body is a liquid atomization method which is a capillary transfer portion that transfers the liquid from the intake portion to the supply portion by a capillary phenomenon. Then it is good.

In this liquid atomization method, since the capillary phenomenon is used for the transfer of the liquid in the transfer part of the liquid transfer body of the liquid supply part, the liquid is atomized with an energy-saving and simple structure without using the power of a pump or the like. It can be easily and continuously supplied to the liquid-supplied surface of the member.

The method for atomizing a liquid according to any one of the above, wherein the liquid is water, and the atomizing main body member comprises the porous body having an average pore diameter of 0.5 to 10 μm. From the gas supply unit, when the critical pressure of the porous body is Pc, the gas having a pressure within the pressure range of 1.7 Pc-4.9 [kPa] to 2.2 Pc + 41.0 [kPa] is released. The method of atomizing the liquid supplied to the gas press-fitting surface is preferable.

In this liquid atomization method, the atomizing main body member is made of a porous body having fine pores having an average pore diameter of 0.5 to 10 μm, and the gas supply unit is a gas having an atmospheric pressure within the above pressure range. Supply. As a result, a mist of water having a small particle size of D50 of 6.0 μm or less and D10 of 1.0 μm or less can be released from the gas release surface.

Alternatively, in the method for atomizing a liquid according to any one of the above, the liquid is water, and the atomizing main body member is the porous body having an average pore diameter of 0.5 to 3.4 μm. The gas supply unit has a pressure within a pressure range of 1.8 Pc-5.2 [kPa] to 2.2 Pc + 24.3 [kPa], where Pc is the critical pressure of the porous body. This is a method for atomizing a liquid that supplies a gas to the gas press-fitting surface.

In this liquid atomization method, the atomizing body member is composed of a porous body having smaller fine pores with an average pore diameter of 0.5 to 3.4 μm, and the gas supply portion is within the above pressure range. Supply a gas with atmospheric pressure. As a result, a mist of water having a D50 of 2.0 μm or less and a D10 of 1.0 μm or less can be released from the gas release surface.

Alternatively, the method for atomizing a liquid according to any one of the above, wherein the liquid is water, and the atomizing main body member is the porous body having an average pore diameter of 0.5 to 1.3 μm. The gas supply unit has a pressure within a pressure range of 1.8 Pc-29.9 [kPa] to 2.0 Pc + 65.8 [kPa], where Pc is the critical pressure of the porous body. This is a method for atomizing a liquid that supplies a gas to the gas press-fitting surface.

In this liquid atomization method, the atomizing body member is composed of a porous body having an average pore diameter of 0.5 to 1.3 μm and having smaller fine pores, and the gas supply portion is within the above-mentioned pressure range. Supply a gas with atmospheric pressure. As a result, a mist of water having a D50 of 1.0 μm or less and a smaller particle size can be released from the gas release surface.

It is explanatory drawing which shows the structure of the liquid atomization apparatus which concerns on Embodiment 1. FIG. It is explanatory drawing which shows the structure of the liquid atomizing apparatus which concerns on Embodiment 1, and is the cross-sectional view taken along the arrow AA of FIG. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P is generated when the atomizing main body member of Example 1 composed of a porous body having an average pore diameter AD = 10 μm and a critical pressure Pc = 20 kPa is used. It is a graph which shows the relationship with the ratio R (1 μm) of the mist of φ1 μm or less in the mist. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P is generated when the atomizing main body member of Example 1 composed of a porous body having an average pore diameter AD = 10 μm and a critical pressure Pc = 20 kPa is used. It is a graph which shows the relationship between the average volume mist diameter D50 [μm] and the 10% volume mist diameter D10 [μm]. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 2 made of a porous body having an average pore diameter AD = 3.4 μm and a critical pressure Pc = 60 kPa is used. It is a graph which shows the relationship with the ratio R (1 μm) of the mist of φ1 μm or less in the generated mist. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 2 composed of a porous body having an average pore diameter AD = 3.4 μm and a critical pressure Pc = 60 kPa is used. It is a graph which shows the relationship between the generated average volume mist diameter D50 [μm], and 10% volume mist diameter D10 [μm]. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 3 composed of a porous body having an average pore diameter AD = 1.3 μm and a critical pressure Pc = 160 kPa is used. It is a graph which shows the relationship with the ratio R (1 μm) of the mist of φ1 μm or less in the generated mist. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 3 composed of a porous body having an average pore diameter AD = 1.3 μm and a critical pressure Pc = 160 kPa is used. It is a graph which shows the relationship between the generated average volume mist diameter D50 [μm], and 10% volume mist diameter D10 [μm]. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 4 made of a porous body having an average pore diameter AD = 0.8 μm and a critical pressure Pc = 280 kPa is used. It is a graph which shows the relationship with the ratio R (1 μm) of the mist of φ1 μm or less in the generated mist. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 4 composed of a porous body having an average pore diameter AD = 0.8 μm and a critical pressure Pc = 280 kPa is used. It is a graph which shows the relationship between the generated average volume mist diameter D50 [μm], and 10% volume mist diameter D10 [μm]. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 5 made of a porous body having an average pore diameter AD = 0.5 μm and a critical pressure Pc = 370 kPa is used. It is a graph which shows the relationship with the ratio R (1 μm) of the mist of φ1 μm or less in the generated mist. In the liquid atomizing apparatus according to the first embodiment, the applied gas pressure P when the atomizing main body member of Example 5 made of a porous body having an average pore diameter AD = 0.5 μm and a critical pressure Pc = 370 kPa is used. It is a graph which shows the relationship between the generated average volume mist diameter D50 [μm], and 10% volume mist diameter D10 [μm]. It is a graph which shows the range of the critical pressure Pc of the atomization main body member, and the applied gas pressure P where the mist is D50 = 6.0 μm or less and D10 = 1.0 μm or less in the liquid atomization apparatus which concerns on Embodiment 1. FIG. It is a graph which shows the range of the critical pressure Pc of the atomization main body member, and the applied gas pressure P where the mist is D50 = 2.0 μm or less and D10 = 1.0 μm or less in the liquid atomization apparatus which concerns on Embodiment 1. FIG. It is a graph which shows the range of the critical pressure Pc of the atomization main body member, and the applied gas pressure P where the mist is D50 = 1.0 μm or less in the liquid atomization apparatus which concerns on Embodiment 1. FIG. It is explanatory drawing which shows the structure of the liquid atomizing apparatus which concerns on Embodiment 2, and is the cross-sectional view taken along the arrow BB of FIG. It is explanatory drawing which shows the structure of the liquid atomizing apparatus which concerns on Embodiment 2. (A) and (b) are explanatory views which show the example of the form of the nonwoven fabric strip used for the liquid atomizing apparatus which concerns on Embodiments 2 and 3. It is explanatory drawing which shows the structure of the liquid atomizing apparatus which concerns on Embodiment 3. It is explanatory drawing which shows the structure of the liquid atomizing apparatus which concerns on Embodiment 4.

(Embodiment 1)
The liquid atomizer 1 according to the first embodiment will be described with reference to FIGS. 1 to 15. FIG. 1A is an explanatory view schematically showing the configuration of the liquid atomizer 1 according to the first embodiment, and FIG. 1B is a cross-sectional view taken along the line AA in FIG. 1A.

The liquid atomizing device 1 of the first embodiment includes an atomizing unit 10 that generates a mist LQM of a liquid LQ, a gas supply unit 20 that supplies a gas AR to the atomizing unit 10, and an atomizing main body of the atomizing unit 10. A liquid supply unit 30 for supplying the liquid LQ to the member 11 is provided.

Of these, the atomizing portion 10 includes a cylindrical atomizing main body member 11 and a holding member 12 that holds the atomizing main body member 11. The atomizing main body member 11 is made of an alumina-based ceramic porous body having fine pores 11P connected in a three-dimensional network. Of the surface 11s of the cylindrical atomizing main body member 11, the inner side surface 11s1 is designated as the gas press-fitting surface 11b. On the other hand, of the outer surface 11s2 that faces the gas press-fitting surface 11b in the radial direction, the semi-cylindrical surface of the upper UD is the gas release surface 11a, and the semi-cylindrical surface of the lower DD is the liquid supply surface 11c. The atomized main body member 11 has an inner diameter of 9 mm, an outer diameter of 12 mm, a wall thickness of 1.5 mm, and a length of 50 mm (mist effective generation length of 40 mm).

On the other hand, the holding member 12 is composed of a pair of the first holding member 12A and the second holding member 12B. Of these, the first holding member 12A has a holding hole 12AH for accommodating the end portion 11F on one side (right side of FIG. 1) of the cylindrical atomizing main body member 11, and has a tubular shape communicating with the atomizing main body member 11. The gas introduction unit 12I for introducing the gas AR into the atomization main body member 11 is provided. Further, the second holding member 12B has a holding hole 12BH for accommodating the end portion 11G on the other side (left side in FIG. 1) of the atomizing main body member 11, and closes the end portion 11G of the atomizing main body member 11. .. Further, in the first embodiment, the atomizing unit 10 is held in a form in which the atomizing main body member 11 extends in the horizontal direction (left-right direction in FIG. 1).

The gas AR introduced into the atomization main body member 11 from the gas supply unit 20 through the gas introduction unit 12I has a gas press-fitting surface 11b and a gas release surface 11a of the atomization main body member 11 as shown by arrows in FIG. Due to the applied gas pressure P (gauge pressure when the gas release surface 11a is in contact with the atmosphere) applied between the two, the gas press-in surface 11b of the atomization main body member 11 becomes a fine pore 11P of the atomization main body member 11. It is press-fitted and is discharged radially outward from the gas release surface 11a through the fine pores 11P.
In the atomizing main body member 11, the critical pressure Pc (atmospheric pressure difference) that pushes out the liquid LQ that has permeated into the fine pores 11P with the applied gas pressure P of the gas AR is given by Pc = 4γcosθ / AD. Here, γ is the surface tension of the liquid LQ, θ is the contact angle of the liquid LQ, and AD is the average pore diameter of the porous body. For example, in Example 3 described later in the first embodiment, a porous body having an average pore diameter AD = 1.3 μm was used, and the critical pressure Pc = 160 kPa. In the first embodiment, water is used as the liquid LQ.

The gas supply unit 20 supplies the gas AR to the gas introduction unit 12I of the atomization unit 10, and has a cylinder 21 for storing the gas AR, a gas pipe 22 for delivering the gas AR from the cylinder 21, and a gas. It has a valve 23 that opens and closes the flow of AR, and a pressure gauge 24 that is located on the downstream side of the valve 23 and detects the pressure of the gas AR (applied gas pressure P) supplied to the atomizing unit 10. The valve 23 may be a manual valve, but an electrically controllable valve such as an electromagnetic valve may be used. Further, in the first embodiment, compressed air is used as the gas AR. Therefore, instead of the cylinder 21, compressed air may be generated by a compressor or the like and sent to the gas pipe 22.

The liquid supply unit 30 supplies the liquid LQ to the atomization main body member 11 (liquid supply surface 11c) of the atomization unit 10, and is arranged on the sponge body 32 and the lower DD of the atomization main body member 11. It has a lower portion (intake portion 32a) of the sponge body 32 and a liquid container 31 for accommodating the containing liquid LQS (liquid LQ). The sponge body 32 is made of PVA having good water absorption and is composed of a sponge having a substantially rectangular parallelepiped shape, and the lower intake portion 32a is immersed in the contained liquid LQS in the liquid container 31. Therefore, the liquid LQ can be sucked up by the capillary phenomenon to the supply portion 32c at the upper end portion through the capillary transfer portion 32b located above the intake portion 32a. Further, the supply unit 32c has a semi-cylindrical groove shape, and is in close contact with the semi-cylindrical liquid supply surface 11c of the lower DD of the atomizing main body member 11. Therefore, the liquid LQ sucked up to the supply unit 32c is continuously supplied to the liquid supply surface 11c of the atomization main body member 11 through the supply unit 32c, and permeates into the fine pores 11P of the atomization main body member 11. ..

That is, in the liquid atomization device 1 of the first embodiment, the liquid LQ is supplied from the liquid container 31 to the liquid supply surface 11c of the atomization main body member 11 through the sponge body 32. Then, the liquid LQ permeates into the fine pores 11P of the atomizing main body member 11 from the liquid supply surface 11c. In this state, the valve 23 of the gas supply unit 20 is opened, and the gas AR in which the applied gas pressure P indicated by the pressure gauge 24 is equal to or higher than the above-mentioned critical pressure Pc (P ≧ Pc) is supplied to the atomization unit 10. The gas AR is released from the gas release surface 11a of the atomization main body member 11.

Then, the liquid LQ that has permeated into the fine pores 11P is discharged from the gas discharge surface 11a as a mist LQM together with the gas AR indicated by the arrow in the broken line in FIG. Therefore, by continuously supplying the liquid LQ from the liquid container 31 to the liquid-supplied surface 11c of the atomizing main body member 11 through the sponge body 32, the mist LQM of the liquid LQ can be continuously generated. That is, in the liquid atomizing device 1, the atomizing main body member 11 made of a porous body is continuously permeated into the fine pores 11P of the atomizing main body member (porous body) 11 through the liquid supplied surface 11c. On the other hand, the gas AR is press-fitted from the gas press-fitting surface 11b of the atomization main body member 11, the gas AR is discharged from the gas discharge surface 11a, and the mist LQM of the liquid LQ is continuously discharged. Thus, a mist LQM of liquid LQ is continuously obtained.

Although not shown in FIG. 1, even if the amount of the contained liquid LQS decreases due to the generation of mist LQM, the liquid level height (accommodation amount) of the contained liquid LQS contained in the liquid container 31 becomes constant. In addition, it is preferable to separately control the supply of the liquid LQ to the liquid container 31.

In this liquid atomizer 1, the sponge body 32 is used, and the liquid LQ taken in by the intake portion 32a is transferred to the supply portion 32c by the capillary transfer portion 32b. Therefore, the liquid LQ can be easily and continuously supplied to the liquid-supplied surface 11c of the atomizing main body member 11.
Moreover, in this liquid atomizer 1, since the capillary phenomenon is used for the transfer of the liquid LQ in the capillary transfer unit 32b of the sponge body 32 of the liquid supply unit 30, energy saving and a simple structure can be achieved without using the power of a pump or the like. The liquid LQ can be easily supplied to the liquid-supplied surface 11c of the atomizing main body member 11.

Further, according to the atomization method of the first embodiment, the liquid LQ is continuously supplied to the liquid-supplied surface 1c of the atomizing main body member 11 made of a porous body, and is supplied to the gas press-fitting surface 11b of the atomizing main body member 11. By supplying the gas AR, the mist LQM of the liquid LQ impregnated into the fine pores 11P together with the gas AR can be continuously released from the gas release surface 11a. Thus, the mist LQM of the liquid LQ can be easily and continuously obtained.
Moreover, since the sponge body 32 is used as the liquid transfer body and the liquid LQ taken in by the intake section 32a is transferred to the supply section 32c by the capillary transfer section 32b, the liquid LQ is transferred to the liquid supply surface 11c of the atomizing main body member 11. Can be easily and continuously supplied.
In particular, in the first embodiment, since the capillary phenomenon is used for transferring the liquid LQ in the capillary transfer portion 32b of the sponge body 32, the liquid LQ is atomized with an energy-saving and simple structure without using power such as a pump. It can be easily and continuously supplied to the liquid-supplied surface 11c of 11.

(Examples 1 to 5)
Next, in the liquid atomizing apparatus 1 of the first embodiment, when the size of the average pore diameter AD [μm] of the porous body forming the atomizing main body member 11 is changed (Examples 1 to 5), the pressure is increased. The relationship between the applied gas pressure P [kPa] of the gas AR applied to the atomizing main body member 11 measured by a total of 24 and the particle size of the generated mist LQM was investigated. That is, the atomizing main body members 11 of Examples 1 to 5 having an average pore diameter AD of 10 μm, 3.4 μm, 1.3 μm, 0.8 μm, and 0.5 μm were produced, and the liquid atomizing apparatus 1 of the first embodiment was produced. Manufactured. Then, the applied gas pressure P [kPa] of the gas AR applied to the atomizing main body member 11 is changed, and the ratio R (1 μm) [%] of the mist of φ1 μm or less is obtained with respect to the mist LQM generated at each applied gas pressure P. The average volume mist diameter (50% volume mist diameter) D50 [μm] and the 10% volume mist diameter D10 [μm] were measured.

In Examples 1 to 5, air was used as the gas AR and water (tap water) was used as the liquid LQ. The average pore diameter AD of the atomized main body member 11 was measured by a mercury intrusion method using a mercury porosimeter (AutoPore IV 9500 manufactured by Micrometrics).
Further, the critical pressure Pc of the atomizing main body member 11 was measured by the following measuring method. First, of the atomized main body member 11 which is a cylindrical porous body, one end is sealed with a stainless steel jig, and gas is circulated in the atomized main body 11 at the other end ( Attach a stainless steel jig with a nozzle that enables (blowing). In this state, it is immersed in the liquid LQ (for example, in water) and left to stand until the inside of the fine pores 11P of the atomized main body member 11 (porous body) is filled with the liquid LQ (for example, 10 minutes). A gas supply pipe is attached to the nozzle of the stainless steel jig on the other side so that the gas AR can be supplied to the inside of the atomizing main body member 11. The applied gas pressure P of the gas AR was gradually increased, and the lowest pressure at which bubbles of the gas AR were observed to be released from the outer surface of the atomizing main body member 11 was defined as the critical pressure Pc. In each embodiment, since the critical pressure Pc is different, the range of the applied gas pressure P is different from each other.

Further, the particle size of the mist LQM and its distribution were measured by a laser diffraction type particle size distribution measuring device Spray Tech manufactured by Malvern (measurement range: φ0.117 to 1000 μm). As the analysis conditions, a detector "10" was used on the low angle side and a detector "Last" was used on the high angle side as the detectors used. The detection threshold was set to 4 (to mitigate the influence of noise caused by external light such as lighting). The number of measured samples was 20 (measurement interval was every 1 second), and in each example and the like, the average value of 20 measured values was described.

(Example 1)
An atomized main body member 11 made of a porous body having an average pore diameter AD = 10 μm was produced. The critical pressure Pc of the atomizing main body member 11 having an average pore diameter AD = 10 μm was Pc = 20 kPa. Regarding the liquid atomizer 1 of the first embodiment using the atomizing main body member 11, the applied gas pressure P is changed in the range of applied gas pressure P = 30 to 300 kPa to generate mist LQM, and each applied gas pressure P is generated. The relationship between [kPa] and the ratio R (1 μm) [%] of mist of φ1 μm or less in the generated mist LQM, and each applied gas pressure P [kPa] and “average volume mist diameter D50” and “10%”. The relationship with "volume mist diameter D10" was investigated. The results are shown in the graphs of FIGS. 3 and 4.

As can be seen from FIGS. 3 and 4, in the liquid atomizing apparatus 1 of the first embodiment using the atomizing main body member 11 having an average pore diameter AD = 10 μm, the applied gas pressure P = exceeding the critical pressure Pc = 20 kPa. Mist LQM can be generated in the entire range of 30 to 300 kPa. Moreover, it can be seen that in the range of the applied gas pressure P = 30 to 260 kPa, a mist having a size of φ1 μm or less (hereinafter referred to as “nano mist”) can be generated.

In the first embodiment, the ratio of "nano mist" can be maximized (to about 21%) at the applied gas pressure P = 100 kPa. Further, in the range of applied gas pressure P = 40 to 200 kPa, the ratio R of mist of φ1 μm or less can be set to 10% or more. That is, the "10% volume mist diameter D10" can be set to 1.0 μm or less. On the other hand, it can be seen that as the applied gas pressure P increases at 40 kPa or more, the "average volume mist diameter D50" increases, that is, the mist LQM having a large diameter increases.

Further, it can be seen that in order for the "average volume mist diameter D50" to be 6.0 μm or less, the applied gas pressure P must be in the range of 30 to 70 kPa. Therefore, in order to set the "average volume mist diameter D50" to 6.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 40 to 70 kPa. There will be.
However, in the porous body (atomization body member 11) having an average pore diameter AD of 10 μm in Example 1, the “average volume mist diameter D50” is 2.0 μm or less, even if the applied gas pressure P is changed. It can also be seen that can not be 1.0 μm or less.

(Example 2)
Next, an atomized main body member 11 made of a porous body having an average pore diameter AD = 3.4 μm was manufactured. The critical pressure Pc of the atomizing main body member 11 having an average pore diameter AD = 3.4 μm was Pc = 60 kPa. Regarding the liquid atomizer 1 of the first embodiment using the atomizing main body member 11, the applied gas pressure P is changed in the range of applied gas pressure P = 80 to 240 kPa to generate mist LQM, and the same as in Example 1. , The relationship between each applied gas pressure P and "ratio R (1 μm) of mist of φ1 μm or less", and the relationship between each applied gas pressure P and "average volume mist diameter D50" and "10% volume mist diameter D10". investigated. The results are shown in the graphs of FIGS. 5 and 6.

As can be seen from FIGS. 5 and 6, in the liquid atomizing apparatus 1 of the second embodiment using the atomizing main body member 11 having an average pore diameter AD = 3.4 μm, the applied gas pressure exceeding the critical pressure Pc = 60 kPa. Mist LQM can be generated in the entire range of P = 80 to 240 kPa. Above all, it can be seen that "nano mist" can be generated in the range of applied gas pressure P = 80 to 190 kPa.

In the second embodiment, the ratio of "nano mist" can be maximized (to about 34%) at the applied gas pressure P = 140 kPa. Further, in the range of the applied gas pressure P = 90 to 190 kPa, the ratio R of the mist having a diameter of 1 μm or less can be set to 10% or more. That is, the "10% volume mist diameter D10" can be set to 1.0 μm or less. On the other hand, in the range of applied gas pressure P = 200 kPa or more (200 to 240 kPa), it can be seen that "nano mist" is not generated and mist LQM having a large diameter is generated. On the other hand, it can be seen that as the applied gas pressure P increases at 130 kPa or more, the "average volume mist diameter D50" increases, that is, the mist LQM having a large diameter increases.

Further, it can be seen that in order for the "average volume mist diameter D50" to be 6.0 μm or less, the applied gas pressure P must be in the range of 80 to 180 kPa. Therefore, in order to set the "average volume mist diameter D50" to 6.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 90 to 180 kPa. There will be.
In addition, it can be seen that in order for the "average volume mist diameter D50" to be 2.0 μm or less, the applied gas pressure P must be in the range of 100 to 140 kPa. Therefore, in order to set the "average volume mist diameter D50" to 2.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 100 to 140 kPa. There will be.
However, in the porous body (atomization body member 11) having an average pore diameter AD = 3.4 μm in Example 2, the “average volume mist diameter D50” is 1.0 μm or less even if the applied gas pressure P is changed. It also turns out that it cannot be done.

(Example 3)
Next, an atomized main body member 11 made of a porous body having an average pore diameter AD = 1.3 μm was manufactured. The critical pressure Pc of the atomizing main body member 11 having an average pore diameter AD = 1.3 μm was Pc = 160 kPa. Regarding the liquid atomizer 1 of the first embodiment using the atomizing main body member 11, the applied gas pressure P is changed in the range of the applied gas pressure P = 210 to 430 kPa to generate mist LQM, and the mist LQM is generated. Similar to the above, the relationship between each applied gas pressure P and "ratio R (1 μm) of mist of φ1 μm or less", and each applied gas pressure P and "average volume mist diameter D50" and "10% volume mist diameter D10". I investigated the relationship. The results are shown in the graphs of FIGS. 7 and 8.

As can be seen from FIGS. 7 and 8, in the liquid atomizing apparatus 1 of the third embodiment using the atomizing main body member 11 having an average pore diameter AD = 1.3 μm, the applied gas pressure exceeding the critical pressure Pc = 160 kPa. Mist LQM can be generated in the entire range of P = 210-430 kPa. Above all, it can be seen that "nano mist" can be generated in the range of applied gas pressure P = 240 to 430 kPa.

In the third embodiment, the ratio of "nano mist" can be maximized (to about 60%) at the applied gas pressure P = 350 kPa. Further, in the range of applied gas pressure P = 270 to 410 kPa, the ratio R of mist of φ1 μm or less can be set to 10% or more. That is, the "10% volume mist diameter D10" can be set to 1.0 μm or less. On the other hand, in the range of the applied gas pressure P = 230 kPa or less (200 to 230 kPa), it can be seen that "nano mist" is not generated and mist LQM having a large diameter is generated. On the other hand, it can be seen that as the applied gas pressure P increases at 380 kPa or more, the "average volume mist diameter D50" increases, that is, the mist LQM having a large diameter increases.

Further, it can be seen that in order for the "average volume mist diameter D50" to be 6.0 μm or less, the applied gas pressure P must be in the range of 210 to 400 kPa. Therefore, in order to set the "average volume mist diameter D50" to 6.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 270 to 400 kPa. There will be.
In addition, it can be seen that in order for the "average volume mist diameter D50" to be 2.0 μm or less, the applied gas pressure P must be in the range of 280 to 400 kPa. Therefore, in order to set the "average volume mist diameter D50" to 2.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 280 to 400 kPa. There will be.
Further, it can be seen that in order for the "average volume mist diameter D50" to be 1.0 μm or less, the applied gas pressure P must be in the range of 310 to 390 kPa.

(Example 4)
Next, an atomized main body member 11 made of a porous body having an average pore diameter AD = 0.8 μm was manufactured. The critical pressure Pc of the atomizing main body member 11 having an average pore diameter AD = 0.8 μm was Pc = 280 kPa. Regarding the liquid atomizer 1 of the first embodiment using the atomizing main body member 11, the applied gas pressure P is changed in the range of applied gas pressure P = 310 to 700 kPa to generate mist LQM, and Examples 1 to 3 Similar to the above, the relationship between each applied gas pressure P and "ratio R (1 μm) of mist of φ1 μm or less", and each applied gas pressure P and "average volume mist diameter D50" and "10% volume mist diameter D10". I investigated the relationship. The results are shown in the graphs of FIGS. 9 and 10.

As can be seen from FIGS. 9 and 10, in the liquid atomizing apparatus 1 of the fourth embodiment using the atomizing main body member 11 having an average pore diameter AD = 0.8 μm, the applied gas pressure exceeding the critical pressure Pc = 280 kPa. Mist LQM can be generated in the entire range of P = 310-700 kPa. Above all, it can be seen that "nano mist" can be generated in the range of applied gas pressure P = 430 to 690 kPa or more.

In the fourth embodiment, the ratio of "nano mist" can be maximized (to about 58%) at the applied gas pressure P = 580 kPa. Further, in the range of applied gas pressure P = 490 to 660 kPa, the ratio R of mist of φ1 μm or less can be set to 10% or more. That is, the "10% volume mist diameter D10" can be set to 1.0 μm or less. On the other hand, in the range where the applied gas pressure P = 420 kPa or less (310 to 420 kPa) and 700 kPa or more, it can be seen that "nano mist" is not generated and mist LQM having a large diameter is generated. Further, it can be seen that as the applied gas pressure P increases at 600 kPa or more, the "average volume mist diameter D50" increases, that is, the mist LQM having a large diameter increases.

Further, it can be seen that in order for the "average volume mist diameter D50" to be 6.0 μm or less, the applied gas pressure P must be in the range of 310 to 640 kPa. Therefore, in order for the "average volume mist diameter D50" to be 6.0 μm or less and the "10% volume mist diameter D10" to be 1.0 μm or less, the applied gas pressure P must be in the range of 490 to 640 kPa. There will be.
In addition, it can be seen that in order for the "average volume mist diameter D50" to be 2.0 μm or less, the applied gas pressure P must be in the range of 500 to 630 kPa. Therefore, in order to set the "average volume mist diameter D50" to 2.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 500 to 630 kPa. There will be.
Further, it can be seen that in order for the "average volume mist diameter D50" to be 1.0 μm or less, the applied gas pressure P must be in the range of 530 to 610 kPa.

(Example 5)
Next, an atomized main body member 11 made of a porous body having an average pore diameter AD = 0.5 μm was manufactured. The critical pressure Pc of the atomizing main body member 11 having an average pore diameter AD = 0.5 μm was Pc = 370 kPa. Regarding the liquid atomizing device 1 of the first embodiment using the atomizing main body member 11, the applied gas pressure P is changed in the range of applied gas pressure P = 440 to 950 kPa to generate mist LQM, and Examples 1 to 4 Similar to the above, the relationship between each applied gas pressure P and "ratio R (1 μm) of mist of φ1 μm or less", and each applied gas pressure P and "average volume mist diameter D50" and "10% volume mist diameter D10". I investigated the relationship. The results are shown in the graphs of FIGS. 11 and 12.

As can be seen from FIGS. 11 and 12, in the liquid atomizing apparatus 1 of the fifth embodiment using the atomizing main body member 11 having an average pore diameter AD = 0.5 μm, the applied gas pressure exceeding the critical pressure Pc = 370 kPa. Mist LQM can be generated in the entire range of P = 440 to 950 kPa. Above all, it can be seen that "nano mist" can be generated in the range of applied gas pressure P = 500 kPa or more. In particular, it can be seen that "nano mist" can be generated in the range of applied gas pressure P = 520 to 910 kPa.

In the fifth embodiment, the ratio of "nano mist" can be maximized (to about 63%) at the applied gas pressure P = 730 kPa. Further, in the range of applied gas pressure P = 640 to 890 kPa, the ratio R of mist of φ1 μm or less can be set to 10% or more. That is, the "10% volume mist diameter D10" can be set to 1.0 μm or less. On the other hand, in the range of applied gas pressure P = 510 kPa or less (440-510 kPa) and 920 kPa or more (920-950 kPa), it can be seen that "nano mist" is not generated and mist LQM having a large diameter is generated. On the other hand, it can be seen that as the applied gas pressure P increases at 800 kPa or more, the "average volume mist diameter D50" increases, that is, the mist LQM having a large diameter increases.

Further, it can be seen that in order for the "average volume mist diameter D50" to be 6.0 μm or less, the applied gas pressure P must be in the range of 440 to 840 kPa. Therefore, in order to set the "average volume mist diameter D50" to 6.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 640 to 840 kPa. There will be.
In addition, it can be seen that in order for the "average volume mist diameter D50" to be 2.0 μm or less, the applied gas pressure P must be in the range of 650 to 830 kPa. Therefore, in order to set the "average volume mist diameter D50" to 2.0 μm or less and the "10% volume mist diameter D10" to 1.0 μm or less, it is necessary to set the applied gas pressure P = 650 to 830 kPa. There will be.
Further, it can be seen that in order for the "average volume mist diameter D50" to be 1.0 μm or less, the applied gas pressure P must be in the range of 680 to 810 kPa.

(Examination of Examples 1 to 5)
As described above, since the atomizing main body member 11 made of a porous body is used, the gas AR (air in each embodiment) of the applied gas pressure P is press-fitted from the gas press-fitting surface 11b to be pressed from the gas release surface 11a. Along with releasing the gas AR, a mist LQM of liquid LQ (water in each embodiment) can be generated.

Further, from the results of Examples 1 to 5, the critical pressure Pc of the atomizing main body member 11 made of a porous body and the "average volume mist diameter D50" are set to 6.0 μm or less, and the "10% volume mist diameter D10" is set. When the relationship with the range of the applied gas pressure P, which is 1.0 μm or less, shows an extremely high correlation, the result shown in FIG. 13 is obtained. That is, the applied gas pressure P of the gas AR supplied from the gas supply unit 20 is set in the range where the average pore diameter AD of the fine pores 11P of the porous body forming the atomized main body member 11 is AD = 0.5 to 10 μm. By setting the pressure within the pressure range between the straight line of P = 1.7Pc-4.9 [kPa] indicating the lower limit and the straight line of 2.2Pc + 41.0 [kPa] indicating the upper limit, the "average volume mist diameter" is set. It can be seen that a mist LQM of water (liquid) LQ having a "D50" of 6.0 μm or less and a “10% volume mist diameter D10” of 1.0 μm or less can be generated. That is, more than half of the mist LQM has a particle size of φ6.0 μm or less, and 10% or more of the mist LQM can generate a mist LQM of water (liquid) LQ which is a “nano mist” of φ1.0 μm or less. It turns out.

Therefore, in the liquid atomizing device (water atomizing device) 1 of the present embodiment using water as the liquid LQ, the atomizing main body member 11 is a porous body having fine pores 11P having an average pore diameter AD of 0.5 to 10 μm. The gas supply unit 20 is composed of a fetal body, and by supplying a gas having a pressure within the above-mentioned pressure range according to the magnitude of the critical pressure Pc, the “average volume mist diameter D50” can be obtained from the gas release surface 11a. It is possible to release a mist of water having a small particle size of 6.0 μm or less and a “10% volume mist diameter D10” of 1.0 μm or less.
Further, in the water atomization method of the present embodiment, the atomization main body member 11 is made of a porous body having fine pores 11P having an average pore diameter AD of 0.5 to 10 μm, and the gas supply unit is described above. Supply a gas having an atmospheric pressure within the pressure range of. As a result, it is possible to release a mist of water having a small particle size having an "average volume mist diameter D50" of 6.0 μm or less and a “10% volume mist diameter D10” of 1.0 μm or less from the gas release surface.

Further, the critical pressure Pc of the atomizing main body member 11 made of a porous body, the "average volume mist diameter D50" is 2.0 μm or less, and the “10% volume mist diameter D10” is 1.0 μm or less. Even when the relationship with the range of the applied gas pressure P is examined, an extremely high correlation is shown, and the result shown in FIG. 14 is obtained. That is, the applied gas pressure of the gas AR supplied from the gas supply unit 20 has an average pore diameter AD of the fine pores 11P of the porous body forming the atomized main body member 11 in the range of AD = 0.5 to 3.4 μm. By setting P within the pressure range between the straight line of P = 1.8Pc-5.2 [kPa] indicating the lower limit and the straight line of 2.2Pc + 24.3 [kPa] indicating the upper limit, "average volume" is set. It can be seen that a mist LQM of water (liquid) LQ having a "mist diameter D50" of 2.0 μm or less and a “10% volume mist diameter D10” of 1.0 μm or less can be generated. That is, more than half of the mist LQM has a particle size of φ2.0 μm or less, and 10% or more of the mist LQM can generate a mist LQM of water (liquid) LQ which is a “nano mist” of φ1.0 μm or less. It turns out.

Thus, in the liquid atomizer (water atomizer) 1 of the present embodiment using water as the liquid LQ, the atomizing main body member 11 has smaller fine pores having an average pore diameter AD of 0.5 to 3.4 μm. The gas supply unit 20 is made of a porous body having 11P, and supplies a gas having a pressure within the above-mentioned pressure range according to the magnitude of the critical pressure Pc, thereby causing an “average volume mist” from the gas release surface 11a. A mist of water having a small particle size of 2.0 μm or less and a 10% volume mist diameter D10 of 1.0 μm or less can be released.
Further, in the water atomization method of the present embodiment, the atomization main body member 11 is composed of a porous body having smaller fine pores 11P having an average pore diameter AD of 0.5 to 3.4 μm, and supplies a gas. The unit supplies a gas having a pressure within the pressure range described above. As a result, it is possible to release a mist of water having a small particle size having an "average volume mist diameter D50" of 2.0 μm or less and a “10% volume mist diameter D10” of 1.0 μm or less from the gas release surface.

Further, when the relationship between the critical pressure Pc of the atomizing main body member 11 made of a porous body and the range of the applied gas pressure P such that the "average volume mist diameter D50" is 1.0 μm or less is examined, it is extremely. It shows a high correlation, and the result shown in FIG. 15 is obtained. That is, the applied gas pressure of the gas AR supplied from the gas supply unit 20 in the range where the average pore diameter AD of the fine pores 11P of the porous body forming the atomized main body member 11 is AD = 0.5 to 1.3 μm. By setting P within the pressure range between the straight line of P = 1.8Pc-29.9 [kPa] indicating the lower limit and the straight line of 2.0Pc + 65.8 [kPa] indicating the upper limit, "average volume" is set. It can be seen that a mist LQM of water (liquid) LQ having a mist diameter D50 of 1.0 μm or less can be generated. That is, it can be seen that more than half of the mist LQM can generate a mist LQM of water (liquid) LQ which is a "nano mist" having a diameter of 1.0 μm or less.

As described above, in the liquid atomizing device (water atomizing device) 1 of the present embodiment using water as the liquid LQ, the atomizing main body member 11 has smaller fine pores having an average pore diameter AD of 0.5 to 13 μm. The gas supply unit 20 is made of a porous body having 11P, and supplies a gas having an atmospheric pressure within the above-mentioned pressure range according to the magnitude of the critical pressure Pc, thereby causing an “average volume mist” from the gas release surface 11a. It is possible to release a mist of water having a diameter D50 of 1.0 μm or less and having a smaller particle size.
Further, in the water atomization method of the present embodiment, the atomization main body member 11 is made of a porous body having finer pores 11P having an average pore diameter AD of 0.5 to 10 μm, and the gas supply unit is , Supply a gas having a pressure within the pressure range described above. As a result, a mist of water having a smaller particle size having an "average volume mist diameter D50" of 1.0 μm or less can be discharged from the gas release surface.

(Embodiment 2)
The liquid atomizer 101 according to the second embodiment will be described with reference to FIGS. 16 to 18. 16 and 17 are explanatory views schematically showing the configuration of the liquid atomizer 101 according to the second embodiment. 18 (a) and 18 (b) show morphological examples of the non-woven fabric strip 132 used in the liquid atomizer 101, respectively. In the liquid atomization apparatus 1 of the above-described first embodiment, a sponge body 32 (liquid transfer body) made of a sponge is used on the semi-cylindrical liquid supply surface 11c of the lower DD of the cylindrical atomization main body member 11. , Liquid LQ was supplied. On the other hand, the liquid atomizing apparatus 101 of the second embodiment is different in that the liquid LQ is supplied to the liquid supplied surface 111c of the cylindrical atomizing main body member 111 by using the non-woven fabric strip 132 made of the non-woven fabric. .. Therefore, in the following, different parts will be mainly described, and similar parts will have the same reference numerals, and the description will be omitted or simplified.

The liquid atomization device 101 of the second embodiment includes an atomization unit 110 that generates a mist LQM of liquid LQ, a gas supply unit 120 that supplies gas AR to the atomization unit 110, and an atomization main body of the atomization unit 110. A liquid supply unit 130 that supplies the liquid LQ to the member 111 is provided. Since the gas supply unit 20 is the same as that of the first embodiment, the description thereof will be omitted.

Of these, the atomizing portion 110 includes a cylindrical atomizing main body member 111 and a holding member 112 that holds the atomizing main body member 111. The atomizing main body member 111 is made of an alumina-based ceramic porous body having fine pores 111P connected in a three-dimensional network like the atomizing main body member 11 of the first embodiment. Of the surface 111s of the cylindrical atomizing main body member 111, the inner side surface 111s1 is designated as the gas press-fitting surface 111b. On the other hand, of the outer surface 111s2 facing the gas press-fitting surface 111b in the radial direction, the portion covered by the supply portion 132c of the non-woven fabric band 132 described below is designated as the liquid supply surface 111c, and the portion not covered by the supply portion 132c. Is the gas release surface 111a. The atomized main body member 111 also has an inner diameter of 9 mm, an outer diameter of 12 mm, a wall thickness of 1.5 mm, and a length of 50 mm (mist effective generation length of 40 mm), as in the first embodiment.

On the other hand, the holding member 112 is composed of a pair of the first holding member 112A and the second holding member 112B, similarly to the holding member 12 of the first embodiment. Of these, the first holding member 112A has a holding hole 112AH for accommodating the end 111F on one side (right side of FIG. 17) of the cylindrical atomizing main body member 111, and is a cylinder communicating with the atomizing main body member 111. It has a shape and is provided with a gas introduction unit 112I for introducing a gas AR. Further, the second holding member 112B has a holding hole 112BH for accommodating the end portion 111G on the other side (left side in FIG. 17) of the atomizing main body member 111, and closes the atomizing main body member 111 from the other side. .. Further, also in the second embodiment, the atomizing unit 110 is held in a form in which the atomizing main body member 111 extends horizontally (left and right in FIG. 17).

The gas AR introduced into the atomization main body member 111 from the gas supply unit 20 through the gas introduction unit 112I has a gas press-fitting surface 111b and a gas discharge surface of the atomization main body member 111 as shown by the broken arrow in FIG. Due to the pressure difference with 111a, the gas is press-fitted from the gas press-fitting surface 111b of the atomizing main body member 111 into the fine pores 111P of the atomizing main body member 111. Then, the gas is discharged outward from the gas discharge surface 111a through the fine pores 111P. Also in this atomized main body member 111, the liquid LQ permeated into the fine pores 111P by setting the applied gas pressure P (atmospheric pressure difference) of the gas AR introduced into the atomized main body member 111 to be equal to or higher than the critical pressure Pc. Can be extruded with the pressure of the gas AR.

The liquid supply unit 130 supplies the liquid LQ (water in the second embodiment) to the atomizing main body member 111 (liquid supplied surface 111c) of the atomizing unit 110, and the non-woven strip 132 and the atomizing main body. It is located below the DD of the member 111 and has one end (incorporation portion 132a) of the non-woven strip 132 and a liquid container 131 for accommodating the containing liquid LQS (liquid LQ). The non-woven fabric strip 132 (see FIG. 18A) is entirely composed of a generally strip-shaped non-woven fabric made of hydrophilic fibers (polyester fibers). Of the non-woven fabric strip 132, one end (the lower end of FIG. 18A) is the intake portion 132a, and the other end (the upper end of FIG. 18A) is the overlapping portion 132d. Further, among these, the intake portion 132a side is the capillary transfer portion 132b, and the overlapping portion 132d side is the supply portion 132c. Of the non-woven fabric strip 132, the portions (intake portion 132a, capillary transfer portion 132b, overlapping portion 132d) other than the supply portion 132c are composed of the non-woven fabric as it is. On the other hand, the supply unit 132c is provided with a large number of rectangular holes 132h arranged in a staggered pattern.

As the non-woven fabric band 132, in addition to the pattern shown in FIG. 18A described above, the form of the hole portion 132h constituting the supply portion 132c may be another form. For example, as shown in FIG. 18B, the shape of a large number of holes 132h provided in the supply portion 132c may be circular. Further, the large number of holes 132h constituting the supply portion 132c can be made into other forms.

In the second embodiment, of the non-woven fabric strip 132, the supply portion 132c is wound around the cylindrical atomizing main body member 111 over a little less than one circumference, and is the lower DD of the atomizing main body member 111, which is the other end portion. The overlapping portion 132d is overlapped with the capillary transfer portion 132b. Therefore, the outer surface 111s2 of the atomized main body member 111 overlaps the liquid supplied surface 111c in which the supply portion 132c of the non-woven fabric strip 132 is in contact with the liquid supplied surface 111c and the rectangular hole portion 132h and is not in contact with the supply portion 132c. There will be a large number of exposed gas release surfaces 111a. Further, the intake portion 132a, which is one end portion, is immersed in the contained liquid LQS in the liquid container 131.

Therefore, the liquid LQ in contact with the intake portion 132a is sucked up to the supply portion 132c wound around the atomizing main body member 111 through the capillary transfer portion 132b located above the intake portion 132a by the capillary phenomenon. The liquid LQ is delivered from the middle of the capillary transfer section 132b to the supply section 132c even via the overlapping section 132d that overlaps the capillary transfer section 132b. The liquid LQ sucked up to the supply unit 132c is continuously supplied to the liquid supply surface 111c of the atomization main body member 111 through the supply unit 132c, and permeates into the fine pores 111P of the atomization main body member 111.

The liquid LQ that has permeated into the fine pores 111P is discharged from the gas discharge surface 111a as a mist LQM together with the gas AR indicated by the broken line arrow in FIGS. 16 and 17. Therefore, by continuously supplying the liquid LQ from the liquid container 131 to the liquid-supplied surface 111c of the atomizing main body member 111 through the non-woven fabric strip 132, the mist LQM of the liquid LQ can be continuously generated. That is, even in this liquid atomizing device 101, the liquid LQ is continuously supplied to the liquid supplied surface 111c of the atomizing main body member 111 made of a porous body, and the fine pores 111P of the atomizing main body member (porous body) 111 Let it soak continuously inside. On the other hand, by supplying the gas AR from the gas supply unit 20 to the gas press-fitting surface 111b of the atomization main body member 111, the gas AR and the mist LQM of the liquid LQ are continuously released from the gas release surface 111a. Can be done. Thus, the mist LQM of the liquid LQ can be easily and continuously obtained.
Further, as the atomization method of the second embodiment, the liquid LQ is continuously supplied to the liquid supply surface 111c and the gas AR is supplied to the gas press-fitting surface 111b, so that the gas AR is combined with the gas discharge surface 111a. The mist LQM of the liquid LQ impregnated into the fine pores 111P can be continuously released. Thus, the mist LQM of the liquid LQ can be easily and continuously obtained.

In this liquid atomizer 101, the non-woven fabric strip 132 is used, and the liquid LQ taken in by the intake portion 132a is transferred to the supply portion 132c by the capillary transfer portion 132b. Therefore, the liquid LQ can be easily and continuously supplied to the liquid-supplied surface 111c of the atomizing main body member 111, and the mist LQM of the liquid LQ can be continuously obtained.
Moreover, even in this liquid atomizer 101, since the capillary phenomenon is used for the transfer of the liquid LQ in the capillary transfer portion 132b of the non-woven strip 132 of the liquid supply portion 130, the structure is energy-saving and simple without using the power of a pump or the like. Therefore, the liquid LQ can be easily and continuously supplied to the liquid-supplied surface 111c of the atomized main body member 111.
Further, as the liquid atomization method of the second embodiment, the non-woven fabric strip 132 is used, and the liquid LQ taken in by the intake portion 132a is transferred to the supply portion 132c by the capillary transfer portion 132b, so that the liquid LQ is liquid. It can be easily and continuously supplied to the surface to be supplied 111c. Moreover, since the capillary phenomenon is used for transferring the liquid LQ in the capillary transfer unit 132b, the liquid LQ is easily and continuously supplied to the liquid supply surface 111c with an energy-saving and simple structure without using power such as a pump. be able to.

Further, similarly to the liquid atomizing device 1 of the first embodiment, in the liquid atomizing device 101 of the second embodiment, when the atomizing main body members 111 having different average pore diameter AD sizes are used, the respective critical pressures Pc or more. By introducing the applied gas pressure P of No. 1 into the atomization main body member 111, a mist LQM of liquid LQ can be obtained.

(Embodiment 3)
Next, the liquid atomizer 201 according to the third embodiment will be described with reference to FIG. FIG. 19 is an explanatory diagram schematically showing the configuration of the liquid atomizer 101 according to the second embodiment.
In the liquid atomizing apparatus 101 of the second embodiment described above, a liquid is used by using a non-woven fabric strip 132 (liquid transfer body) made of a non-woven fabric in which a supply unit 132c is wound around an outer surface 111s2 of a cylindrical atomizing main body member 111. The liquid LQ was supplied to the surface to be supplied 111c. On the other hand, in the liquid atomizing apparatus 201 of the third embodiment, the non-woven fabric band 232 having a form similar to that of the second embodiment is used, but the liquid LQ is supplied to the outer surface 211s2 of the flat plate-shaped atomizing main body member 211. It differs in that. Therefore, in the following, different parts will be mainly described, and similar parts will have the same reference numerals, and the description will be omitted or simplified.

The liquid atomizing device 201 of the third embodiment includes an atomizing unit 210 that generates a mist LQM of liquid LQ, a gas supply unit 220 that supplies gas AR to the atomizing unit 210, and an atomizing main body of the atomizing unit 210. A liquid supply unit 230 that supplies the liquid LQ to the member 211 is provided. Since the gas supply unit 20 is the same as that of the first and second embodiments, the description thereof will be omitted. Further, in the non-woven fabric strip 232 used in the present embodiment 2, as shown by the broken lines in FIGS. 18 (a) and 18 (b), the overlapping portion 132d of the non-woven fabric strip 132 used in the present embodiment 1 is eliminated. It has an intake portion 232a, a capillary transfer portion 232b, and a supply portion 232c similar to the intake portion 132a, the capillary transfer portion 132b, and the supply portion 132c of the non-woven fabric strip 132.

In the liquid atomizing device 201, the atomizing portion 210 includes a rectangular flat plate-shaped atomizing main body member 211 and a holding member 212 that surrounds and holds the atomizing main body member 211. The atomized main body member 211 is also made of an alumina-based ceramic porous body having fine pores 211P connected in a three-dimensional network like the atomized main body member 11 of the first embodiment, and has a wall thickness (plate thickness) of 1.5 mm. Is. Of the surface 211s of the rectangular flat plate-shaped atomizing main body member 211, the inner side surface 211s1 which is the main surface of the lower DD is designated as the gas press-fitting surface 211b. On the other hand, of the outer surface 211s2 which faces the gas press-fitting surface 211b in the thickness direction and is the main surface of the upper UD, the portion covered by the supply portion 232c of the non-woven fabric band 232 becomes the liquid supply surface 211c and the supply portion 232c. The portion not covered by is the gas release surface 211a.

On the other hand, the holding member 212 has a bottomed square cylinder shape in which an upper UD having a prismatic recess 212H is opened, and the holding opening 212M located above the recess 212H is a side surface of the surface 211s of the atomizing main body member 211. Holds 211e. Further, a gas introduction portion 212I for introducing the gas AR is provided on the side portion of the holding member 212. In the third embodiment, the atomizing unit 210 is held so that the outer surface 211s2 of the atomizing main body member 211 is horizontal.

The gas AR is introduced from the gas supply unit 20 through the gas introduction unit 212I into the surrounding space 210S surrounded by the recess 212H of the atomizing main body member 211 and the holding member 212. Then, as shown by the broken line arrow in FIG. 19, the gas injection surface 211b of the atomization main member 211 is atomized due to the pressure difference between the gas injection surface 211b and the gas discharge surface 211a. It is press-fitted into the fine pores 211P of the main body member 211, and is discharged to the outside (upper UD) from the gas discharge surface 211a through the fine pores 211P. Also in this atomized main body member 211, the liquid LQ permeated into the fine pores 211P by setting the applied gas pressure P (atmospheric pressure difference) of the gas AR introduced into the atomized main body member 211 to be equal to or higher than the critical pressure Pc. Can be extruded with the pressure of the gas AR.

The liquid supply unit 230 supplies the liquid LQ (tap water in the third embodiment) to the atomization main body member 211 (liquid supply surface 211c) of the atomization unit 210, and is the same non-woven fabric band as in the second embodiment. It has a body 232 and a liquid container 231 located below the atomized main body member 211 and accommodating one end (incorporation portion 232a) of the non-woven fabric strip 232 and the containing liquid LQS (liquid LQ). Since the non-woven fabric band 232 (see FIGS. 18A and 18B) is the same as that of the second embodiment, the description thereof will be omitted.

In the third embodiment, the supply portion 232c of the non-woven fabric strip 232 is overlapped so as to cover the outer surface 211s2 of the rectangular flat plate-shaped atomizing main body member 211. Therefore, the outer surface 211s2 of the atomized main body member 211 overlaps the liquid supplied surface 211c with which the supply portion 232c of the non-woven fabric strip 232 is in contact with the rectangular hole portion 232h, so that the outer surface 211s2 does not contact the supply portion 232c. There will be a large number of gas emission surfaces 211a exposed to the surface. On the other hand, in FIG. 19, a capillary transfer section 232b extends to the lower left of the supply section 232c, and the intake section 232a, which is one end, is immersed in the contained liquid LQS in the liquid container 231.

Therefore, the liquid LQ in contact with the intake portion 232a is sucked up through the capillary transfer portion 232b to the supply portion 232c stacked on the atomizing main body member 211 due to the capillary phenomenon. The liquid LQ sucked up to the supply unit 232c is continuously supplied to the liquid supply surface 211c of the atomization main body member 211 through the supply unit 232c, and permeates into the fine pores 211P of the atomization main body member 211.

The liquid LQ that has soaked into the fine pores 211P is discharged from the gas discharge surface 211a as a mist LQM together with the gas AR indicated by the broken line arrow in FIG. That is, also in this liquid atomization device 201, the gas AR is press-fitted from the gas press-fitting surface 211b of the atomization main body member 211 made of a porous body, the gas AR is discharged from the gas discharge surface 211a, and the liquid is discharged from the liquid supply unit 230. By releasing the mist LQM of the liquid LQ continuously impregnated into the fine pores 211P of the atomized main body member (porous body) 211 through the surface to be supplied 211c, the mist LQM of the liquid LQ is easily and continuously released. Obtainable.
Further, as the atomization method of the third embodiment, the liquid LQ is continuously supplied to the liquid supply surface 211c and the gas is supplied to the gas press-fitting surface 211b, so that the gas discharge surface 211a is finely divided together with the gas AR. The mist LQM of the liquid LQ impregnated into the pores 211P can be easily and continuously released.

In this liquid atomization device 201, the non-woven fabric band 232 is also used, and the liquid LQ taken in by the intake portion 232a is transferred to the supply portion 232c by the capillary transfer portion 232b, so that the liquid supply surface 211c of the atomization main body member 211 In addition, the liquid LQ can be easily and continuously supplied.
Moreover, in this liquid atomizer 201, since the capillary phenomenon is used for the transfer of the liquid LQ in the capillary transfer portion 232b of the non-woven strip 232 of the liquid supply portion 230, the structure is energy-saving and simple without using the power of a pump or the like. Therefore, the liquid LQ can be easily supplied to the liquid-supplied surface 211c of the atomization main body member 211.
Further, since the non-woven fabric band 232 is also used as the liquid atomization method of the third embodiment, the liquid LQ can be easily and continuously supplied to the liquid supply surface 111c. Moreover, since the capillary phenomenon is used for transferring the liquid in the capillary transfer portion 332b, the liquid LQ can be easily and continuously supplied to the liquid supply surface 211c with an energy-saving and simple structure without using power such as a pump. Can be done.

Further, similarly to the liquid atomizing apparatus 1 of the first and second embodiments, even when the atomizing main body member 211 having a different average pore diameter AD is used in the liquid atomizing apparatus 201 of the third embodiment, the respective critical pressures Pc By introducing the above applied gas pressure P into the atomization main body member 211, a mist LQM of liquid LQ can be obtained.

(Embodiment 4)
The liquid atomizer 301 according to the fourth embodiment will be described with reference to FIG. FIG. 20 is an explanatory diagram schematically showing the configuration of the liquid atomizer 301 according to the fourth embodiment.
In the liquid atomizing devices 1, 101, 201 of the first to third embodiments, the liquid LQ is atomized by using the liquid transfer body of the sponge body 32 or the non-woven fabric strips 132, 232, and the liquid supplied surface 11c of the main body member 11 or the like. Etc. were supplied. On the other hand, in the liquid atomizing device 301 of the fourth embodiment, the flat plate-shaped atomizing main body member 311 is held obliquely, and a constant flow rate of liquid LQ is columnar toward the liquid supplied surface 311c of the surface 311s. The difference is that the liquid LQ is dropped as the liquid column LQC of the above, the liquid LQ is formed on the liquid supply surface 311c, and the liquid LQ is impregnated into the atomizing main body member 311. Therefore, in the following, different parts will be mainly described, and similar parts will have the same reference numerals, and the description will be omitted or simplified.

The liquid atomizing device 301 of the fourth embodiment has an atomizing unit 310 that generates a mist LQM of liquid LQ, a gas supply unit 20 that supplies gas AR to the atomizing unit 310, and an atomizing main body of the atomizing unit 310. A liquid supply unit 330 that supplies the liquid LQ to the member 311 is provided. Since the gas supply unit 20 is the same as that of the first embodiment, the description thereof will be omitted.

The atomizing portion 310 of the liquid atomizing device 301 includes a rectangular flat plate-shaped atomizing main body member 311 and a holding member 312 holding the atomizing main body member 311. The atomized main body member 311 is made of an alumina-based ceramic porous body having fine pores 311P connected in a three-dimensional network like the atomized main body member 11 of the first embodiment. Of the surface 311s of the rectangular flat plate-shaped atomizing main body member 311, the inner side surface 311s1 facing the inside (in the diagonally lower right direction in the drawing) is designated as the gas press-fitting surface 311b. On the other hand, the outer surface 311s2 facing the outside (in the diagonally upper left direction in the figure) is composed of the liquid supply surface 311c extending in a substantially elliptical shape in the central portion and the gas release surface 311a located around the liquid supply surface 311c. Become.

On the other hand, the holding member 312 has an L-shaped cross section surrounding the concave portion 312H having a triangular cross section, and the holding opening 312M located diagonally to the upper left side in the drawing of the concave portion 312H is a side surface of the surface 311s of the atomizing main body member 311. Holds 311e. Further, a gas introduction unit 312I for introducing the gas AR from the gas supply unit 20 is provided on the side portion of the holding member 312. In the fourth embodiment, the atomizing portion 310 is held so that the outer surface 311s2 of the atomizing main body member 311 faces diagonally to the upper left in the drawing.

Similar to the first to third embodiments, in the atomization unit 310 of the fourth embodiment, the gas AR is surrounded by the atomization main body member 311 and the recess 312H of the holding member 312 from the gas supply unit 20 through the gas introduction unit 312I. It is introduced into the surrounding space 310S. Then, as shown by an arrow in FIG. 20, due to the pressure difference (applied gas pressure P) between the gas press-in surface 311b (inner side surface 311s1) and the gas release surface 311a (outer surface 311s2) of the atomizing main body member 311. It is press-fitted into the fine pores 311P of the atomized main body member 311 from the gas press-fitting surface 311b of the atomized main body member 311 and discharged to the outside from the gas discharge surface 311a through the three-dimensional network-like fine pores 311P.

The liquid supply unit 330 supplies the liquid LQ to the atomization main body member 311 of the atomization unit 310, and is a liquid container 331 for accommodating the contained liquid LQS (liquid LQ) and a liquid pipe 332 for delivering the liquid LQ. In addition, it is arranged above the liquid supplied surface 311c of the atomized main body member 311, and a constant flow rate of liquid LQ is discharged toward the liquid supplied surface 311c of the atomized main body member 311 as a form of a liquid column LQC. It has a liquid column generation unit 333 (discharge port) for dropping.
Also in the fourth embodiment, tap water is used as the liquid LQ.

The valve 23 of the gas supply unit 20 is opened, the gas AR of the pressure (applied gas pressure) P in the pressure gauge 24 is supplied to the atomization unit 310, and the gas AR is discharged from the gas release surface 311a of the atomization main body member 311. In this state, the liquid LQ having an appropriate constant flow rate is supplied in the form of the liquid column LQC from the liquid column generation unit 333 toward the liquid supplied surface 311c of the atomizing main body member 311. Then, the liquid LQ once becomes a liquid film LQF on the liquid supply surface 311c, spreads on the liquid supply surface 311c, and then permeates into the fine pores 311P of the atomizing main body member 311. At the same time, the mist LQM of the liquid LQ is discharged together with the gas AR from the gas release surface 311a around the liquid supply surface 311c.

In the fourth embodiment, the outer surface 311s2, and therefore the liquid supply surface 311c, faces diagonally to the upper left in the drawing. Specifically, the atomized main body member has a steeply inclined shape in which the normal 311cn of the liquid supply surface 311c forms an elevation angle of 45 degrees or less, and an elevation angle of 30 degrees (θg = 30 degrees) in the fourth embodiment. 311 is arranged. Therefore, the liquid LQ supplied as the liquid column LQC to the gas discharge surface 311a becomes an elliptical liquid film LQF extending downward on the liquid supply surface 311c, which is compared with the case where the liquid supply surface is horizontal. Then, it quickly and spreads over a wide range (liquid supply surface 311c). Therefore, in the fourth embodiment, the liquid LQ can be impregnated into the fine pores 311P over a wide area of the atomizing main body member 311.

The supply amount (flow rate) of the liquid LQ supplied from the liquid column generation unit 333 toward the liquid supply surface 311c per unit time is balanced with the amount that the supplied liquid LQ can be discharged from the gas discharge surface 311a as a mist LQM. You should choose the amount. As a result, it is possible to prevent a part of the supplied liquid LQ from seeping into the fine pores 311P of the atomizing main body member 311 and spilling out of the atomizing main body member 311.

Also in the liquid atomizing apparatus 301 of the fourth embodiment, the gas AR is press-fitted from the gas press-fitting surface 311b of the atomizing main body member 311 made of a porous body to discharge the gas AR from the gas discharging surface 311a, and the atomizing main body is also used. The liquid LQ can be atomized by releasing the mist LQM of the liquid LQ impregnated into the member 311. That is, with a simple configuration, the liquid LQ can be continuously atomized in the gas AR.
Further, as the atomization method of the fourth embodiment, the liquid LQ is continuously supplied to the liquid supply surface 311c and the gas AR is supplied to the gas press-fitting surface 311b, so that the gas AR is combined with the gas release surface 311a. The mist LQM of the liquid LQ impregnated into the fine pores 311P can be easily and continuously released.
Moreover, in the liquid atomizer 301 of the fourth embodiment, the liquid supply unit 330 (liquid column generation unit 333) supplies the liquid LQ to the liquid supply surface 311c. That is, the liquid LQ to be atomized is only flowed down to the gas discharge surface 311a facing diagonally upward in the atomization main body member 311, and the liquid atomizer 301 has a particularly simple structure.

In the liquid atomizer 301 of the fourth embodiment, the gas discharge surface 311a and the outer surface 311s2 forming the liquid supply surface 311c form an upward slope. Therefore, the liquid film LQF of the supplied liquid LQ spreads quickly and over a wide range on the liquid supplied surface 311c as compared with the case where the outer surface 311s2 is made a horizontal plane, and mist is formed from the liquid supplied surface 311c. The liquid LQ can be quickly impregnated into the fine pores 311P of the main body member 311. Thus, it is possible to prevent the liquid LQ from accumulating on the liquid supply surface 311c or flowing down from the outer surface 311s2 to the outside of the atomized main body member 311 to waste the liquid LQ, and appropriately generate the mist LQM of the liquid LQ. Can be done.

In particular, in this liquid atomizer 301, the normal 311cn of the liquid supply surface 311c, which is an upward slope, has an elevation angle θg of 45 degrees or less, specifically, an elevation angle θg = 30 degrees. That is, the liquid supply surface 311c forms a steep slope. Therefore, the liquid LQ supplied by the liquid supply unit 30 flows and spreads to a particularly wide liquid supply surface 311c, so that the liquid LQ is quickly swept into the fine pores 311P of the atomizing main body member 311 from the liquid supply surface 311c. It can be impregnated into the liquid LQ and can be surely turned into a mist.

Although the present invention has been described above in accordance with the first to fourth embodiments, the present invention is not limited to the first to fourth embodiments, and can be appropriately modified and applied without departing from the gist thereof. Needless to say.
Also in the liquid atomizing devices 101, 201, 301 of the second to fourth embodiments, the average pore diameter of the porous body forming the atomizing main body member is the same as that of the liquid atomizing device 1 of the first embodiment (Examples 1 to 5). By selecting the applied gas pressure P according to AD (critical pressure Pc), the "average volume mist diameter D50" is 6.0 μm or less and the “10% volume mist diameter D10” is 1.0 μm from the gas discharge surface. The following small particle size water mist can be released. Alternatively, it is possible to release a mist of water having a small particle size having an "average volume mist diameter D50" of 2.0 μm or less and a “10% volume mist diameter D10” of 1.0 μm or less. Furthermore, it is also possible to release a mist of water having a smaller particle size of "average volume mist diameter D50" of 1.0 μm or less.

Further, as the liquid transfer body, the sponge body 32 made of a sponge was used in the first embodiment, and the non-woven fabric strips 132 and 232 made of a non-woven fabric were used in the second and third embodiments. However, as the liquid transfer body, a body such as gauze or a fiber bundle that can transfer a liquid LQ such as water from the intake section to the supply section by using a capillary phenomenon or the like may be used.
Further, in the fourth embodiment, the liquid LQ (water) is allowed to flow down into a liquid column from the liquid column generating unit 333 separated from the atomizing main body member 311 without using a liquid transfer body made of a non-woven fabric or the like, and directly atomized. An example of supplying the liquid to the liquid-supplied surface 311c of the main body member 311 is shown. However, the liquid column generation unit 333 may be sufficiently close to the atomization main body member 311 and the liquid LQ (water) may be directly supplied from the liquid column generation unit 333 to the liquid supply surface 311c of the atomization main body member 311.

1,101,201,301 Liquid atomizer 10,110,210,310 Atomizer 11,111,211,311 Atomization body member 11s, 111s, 211s, 311s (of atomization body member) Surface 11s1,111s1 , 211s1,311s1 Inner side surface 11s2,111s2,211s2,311s2 Outer side surface 11a, 111a, 211a, 311a Gas release surface 11b, 111b, 211b, 311b Gas press-fit surface 11c, 111c, 211c, 311c Liquid supply surface 311cn (liquid cover) Normal line θg (of the supply surface) Elevation angles 211e, 311e (made by the normal line of the liquid supplied surface) Side surfaces 11F, 11G, 111F, 111G (of the atomized body member) Ends 11P, 111P, 211P, 311P Fine pores 20 Gas supply unit 30, 130, 230, 330 Liquid supply unit 31, 131,231,331 Liquid container 32 Sponge body (liquid transfer body)
132,232 Non-woven fabric band (liquid transfer body)
32a, 132a, 232a Intake section 32b, 132b, 232b Capillary transfer section (transfer section)
32c, 132c, 232c Supply part 132d Overlapping part 132h, 232h Hole part 332 Liquid piping 333 Liquid column generation part UD Upper DD Lower AR Gas LQ Liquid LQC Liquid column LQM (liquid) mist AD Average pore diameter Pc Critical pressure P Applied gas Pressure (atmospheric pressure)
R (1 μm) Percentage of mist of φ1 um or less in mist D50 Average volume mist diameter D10 10% Volume mist diameter

Claims (12)

It is an atomized main body member made of a porous body having fine pores connected in a three-dimensional network.
Part of the surface is a gas press-fitting surface,
The other part of the above surface is the gas emission surface,
Yet another part of the surface is the liquid supply surface,
Atomized body member and
A liquid supply unit that continuously supplies the liquid to be impregnated into the fine pores to the liquid supply surface of the atomizing main body member,
By supplying gas to the gas press-fitting surface of the atomizing main body member,
The gas is press-fitted into the fine pores,
A liquid atomizer comprising a gas supply unit that continuously releases a mist of the liquid that has permeated into the fine pores together with the gas that has been press-fitted from the gas release surface. The liquid atomizer according to claim 1.
The liquid supply unit
Intake section, which comes into contact with the liquid and takes in the liquid,
A transfer unit that transfers the liquid taken in by the intake unit, and a transfer unit that transfers the liquid.
A liquid atomizer having a liquid transfer body including a supply unit that continuously supplies the transferred liquid to or in contact with the liquid supply surface. The liquid atomizer according to claim 2.
The transfer portion of the liquid transfer body is
A liquid atomizer that is a capillary transfer unit that transfers the liquid from the intake unit to the supply unit by a capillary phenomenon. The liquid atomizer according to any one of claims 1 to 3.
The liquid is water
The atomized body member is
It is composed of the porous body having an average pore diameter of 0.5 to 10 μm.
The gas supply unit
When the critical pressure of the porous body is Pc, the gas having a pressure within the pressure range of 1.7 Pc-4.9 [kPa] to 2.2 Pc + 41.0 [kPa] is supplied to the gas press-fitting surface. Liquid atomizer. The liquid atomizer according to any one of claims 1 to 3.
The liquid is water
The atomized body member is
It is composed of the porous body having an average pore diameter of 0.5 to 3.4 μm.
The gas supply unit
When the critical pressure of the porous body is Pc, the gas having a pressure within the pressure range of 1.8 Pc-5.2 [kPa] to 2.2 Pc + 24.3 [kPa] is supplied to the gas press-fitting surface. Liquid atomizer. The liquid atomizer according to any one of claims 1 to 3.
The liquid is water
The atomized body member is
It is composed of the porous body having an average pore diameter of 0.5 to 1.3 μm.
The gas supply unit
When the critical pressure of the porous body is Pc, the gas having a pressure within the pressure range of 1.8 Pc-29.9 [kPa] to 2.0 Pc + 65.8 [kPa] is supplied to the gas press-fitting surface. Liquid atomizer. It consists of a porous body with fine pores connected in a three-dimensional network.
Part of the surface is a gas press-fitting surface,
The other part of the above surface is the gas emission surface,
Yet another part of the surface is the liquid supply surface,
The liquid is continuously supplied from the liquid supply unit to the liquid supply surface of the atomization main body member, and the liquid is impregnated into the fine pores.
A gas is supplied from the gas supply unit to the gas press-fitting surface of the atomization main body member, the gas is press-fitted into the micropores, and the gas is press-fitted into the micropores together with the gas being press-fitted from the gas release surface. A method for atomizing a liquid that releases a mist of the soaked liquid. The method for atomizing a liquid according to claim 7.
The liquid supply unit
Intake section, which comes into contact with the liquid and takes in the liquid,
A transfer unit that transfers the liquid taken in by the intake unit, and a transfer unit that transfers the liquid.
A method for atomizing a liquid having a liquid transfer body including a supply unit that continuously supplies the transferred liquid to or in contact with the liquid supply surface. The method for atomizing a liquid according to claim 8.
The transfer portion of the liquid transfer body is
A method for atomizing a liquid, which is a capillary transfer unit that transfers the liquid from the intake unit to the supply unit by a capillary phenomenon. The method for atomizing a liquid according to any one of claims 7 to 9.
The liquid is water
The atomized body member is
It is composed of the porous body having an average pore diameter of 0.5 to 10 μm.
From the gas supply unit, when the critical pressure of the porous body is Pc, the gas having a pressure within the pressure range of 1.7 Pc-4.9 [kPa] to 2.2 Pc + 41.0 [kPa] is released. A method for atomizing a liquid supplied to the gas press-fitting surface. The method for atomizing a liquid according to any one of claims 7 to 9.
The liquid is water
The atomized body member is
It is composed of the porous body having an average pore diameter of 0.5 to 3.4 μm.
From the gas supply unit, when the critical pressure of the porous body is Pc, the gas having a pressure within the pressure range of 1.8 Pc-5.2 [kPa] to 2.2 Pc + 24.3 [kPa] is released. A method for atomizing a liquid supplied to the gas press-fitting surface. The method for atomizing a liquid according to any one of claims 7 to 9.
The liquid is water
The atomized body member is
It is composed of the porous body having an average pore diameter of 0.5 to 1.3 μm.
From the gas supply unit, when the critical pressure of the porous body is Pc, the gas having a pressure within the pressure range of 1.8 Pc-29.9 [kPa] to 2.0 Pc + 65.8 [kPa] is released. A method for atomizing a liquid supplied to the gas press-fitting surface.

Images