JP2020132947A - Member with film and method for producing the same - Google Patents

Abstract

To provide a member with a film that can suppress contamination caused by essential metal components.SOLUTION: A member with a film 10 has a base material 1 that is composed of aluminum or an aluminum alloy having aluminum as the main component and contains an essential metal component, and a first film 2 that coats a surface 1a of the base material 1 and is composed of amorphous aluminum oxide. It is used in a plasma environment where the temperature of the base material 1 is 250°C or higher and 500°C or lower.SELECTED DRAWING: Figure 1

Description

The present invention relates to a member with a film and a method for manufacturing the same.

When manufacturing semiconductor devices, liquid crystal devices, etc., there are steps such as dry etching in which a predetermined film formed on a silicon wafer or a glass substrate is treated with a halogen-based corrosive gas such as CF _{4 in a} plasma environment. .. Therefore, in recent years, in order to prevent corrosion of a base material made of a metal material such as aluminum or an aluminum alloy constituting a chamber or various members exposed to corrosive gas in a plasma environment in manufacturing equipment such as semiconductor devices and liquid crystal devices. In addition, a sprayed film made of Al ₂ O ₃ or Y ₂ O ₃ having corrosion resistance may be formed on the surface of the base material.

In addition, Patent Document 1 discloses that an amorphous alumina oxide film is used as a protective film for a metal material or the like.

Japanese Patent No. 3634461

However, there have been insufficient measures to stain the substrate on which the essential metal component contained in the base material is placed on the surface of the sprayed film.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide a member with a film capable of suppressing contamination by essential metal components and a method for producing the same.

The member with a film of the present invention is made of aluminum or an aluminum alloy containing aluminum as a main component, and is made of a first base material containing an essential metal component and an amorphous aluminum oxide that covers the surface of the base material. It is characterized in that it is provided with a film and is used in a plasma environment in which the temperature of the base material is 250 ° C. or higher and 500 ° C. or lower.

According to the member with a film of the present invention, by providing the first film made of amorphous aluminum oxide, the essential metal component contained in the base material made of aluminum or an aluminum alloy containing aluminum as a main component is first. It is possible to prevent the substrate and the like placed on the surface of the aluminum film from being contaminated.

In addition, amorphous aluminum oxide is dense and does not deform at 500 ° C. or lower, so that it can be suitably used in a plasma process process of a semiconductor manufacturing apparatus or the like.

In addition, since the temperature of the base material is 500 ° C. or lower, the amorphous first film crystallizes and the essential metal component contaminates the substrate or the like placed on the surface of the first film. It becomes possible to suppress it. Further, since the temperature of the base material is 500 ° C. or lower, it is possible to suppress the deformation of the base material.

In the member with a film of the present invention, it is preferable to cover the surface of the first film and include a second film made of yttrium oxide or gadolinium oxide.

In this case, it is possible to provide a second film having a function different from that of the first film, which makes it possible to further improve the plasma resistance.

The first method for producing a member with a film of the present invention comprises a step of preparing a base material containing aluminum or an aluminum alloy containing aluminum as a main component and containing an essential metal component, and a first method containing a first metal salt. A step of preparing a solution, a step of immersing the base material in the first solution, and a step of immersing the base material in the first solution by heating at 300 ° C. or higher and 500 ° C. or lower to obtain the base material. The first film-attached member produced includes a step of forming a first film made of an amorphous first metal oxide on the surface, and the temperature of the base material is 250 ° C. or higher and 500 ° C. or lower. It is characterized in that it is used in a plasma environment.

According to the method for producing a first film-attached member of the present invention, a first film made of amorphous metal oxide is formed on the surface of a base material made of aluminum or an aluminum alloy containing aluminum as a main component. .. This makes it possible to easily manufacture the member with a film of the present invention provided with the first film. Further, since it is not necessary to heat to a high temperature exceeding 500 ° C. as in the conventional case, it is possible to suppress the deformation of the base material. It is also possible to increase the adhesion strength between the base material and the first film.

In the method for producing a member with a film of the present invention, a step of preparing a second solution containing a second metal salt and the base material having the first film formed on the surface thereof are used as the second solution. The step of immersing the base material in the second solution and the base material immersed in the second solution are heated at 300 ° C. or higher and 500 ° C. or lower to form an amorphous oxide of the second metal on the surface of the first film. It is preferable to include a step of forming a second film made of.

In this case, the film-attached member of the present invention provided with the second film can be easily manufactured.

The second method for producing a member with a film of the present invention comprises a step of preparing a base material containing aluminum or an aluminum alloy containing aluminum as a main component and containing an essential metal component, and a first method containing a first metal salt. 2. The step of preparing an aqueous solution, and the base material is housed in a container in a state of being immersed in the first aqueous solution, and the temperature in the container is 180 ° C. or higher and 250 ° C. or lower, and the gauge pressure is 0.9 MPa or higher. Manufactured by comprising a step of forming a first film made of an amorphous oxide of the first metal on the surface of the base material by hydrothermal synthesis by heating and pressurizing so as to be 9 MPa or less. The second member with a film is characterized in that it is used in a plasma environment in which the temperature of the base material is 250 ° C. or higher and 500 ° C. or lower.

According to the method for producing a second film-attached member of the present invention, a first film made of amorphous metal oxide is formed on the surface of a base material made of aluminum or an aluminum alloy containing aluminum as a main component. .. This makes it possible to easily manufacture the member with a film of the present invention provided with the first film. Further, since it is not necessary to heat to a high temperature exceeding 500 ° C. as in the conventional case, it is possible to suppress the deformation of the base material. It is also possible to increase the adhesion strength between the base material and the first film.

In the method for producing a second film-attached member of the present invention, it is preferable to include a step of heating the base material on which the first film is formed on the surface at 300 ° C. or higher and 500 ° C. or lower.

In this case, it is possible to densify the first film and improve the adhesion strength between the first film and the base material.

Further, in the method for producing a second film-attached member of the present invention, the step of preparing a second aqueous solution containing a second metal salt and the base material on which the first film is formed on the surface are used as the first. It is housed in a container while being immersed in the aqueous solution of No. 2, and the inside of the container is heated and pressurized so that the temperature is 180 ° C. or higher and 250 ° C. or lower and the gauge pressure is 0.9 MPa or higher and 3.9 Pa or lower. It is preferable to include a step of forming a second film made of an amorphous oxide of the second metal on the surface of the film 1 by hydrothermal synthesis.

In this case, the film-attached member of the present invention provided with the second film can be easily manufactured.

Further, in the method for manufacturing a member with a second film of the present invention, the step of heating the base material in which the second film is formed on the surface of the first film at 300 ° C. or higher and 500 ° C. or lower is provided. Is preferable.

In this case, it is possible to densify the second film and improve the adhesion strength between the first film and the second film.

In the method for producing a first or second filmed member of the present invention, the first metal is preferably aluminum.

In this case, since the first metal oxide is aluminum oxide, the first film has excellent plasma resistance, and the member with a film can be suitably used in a plasma process process of a semiconductor manufacturing apparatus or the like. It becomes.

In the method for producing a first or second filmed member of the present invention, the second metal is preferably yttrium or gadolinium.

In this case, since the second metal oxide is yttrium oxide or gadolinium oxide, the second film has excellent plasma resistance, and the member with a film is suitable for a plasma process process of a semiconductor manufacturing apparatus or the like. It becomes possible to use.

The schematic cross-sectional view which shows the member with a film which concerns on embodiment of this invention. The flowchart which shows the manufacturing method of the member 10 with a film which concerns on 1st Embodiment of this invention. The flowchart which shows the manufacturing method of the member 10 with a film which concerns on 2nd Embodiment of this invention.

The film-attached member 10 according to the embodiment of the present invention will be described with reference to FIG. Note that FIG. 1 is deformed in order to clarify the film-attached member 10 and its components, and does not represent an actual ratio, and the directions such as up and down are merely examples.

As shown in FIG. 1, the film-attached member 10 according to the embodiment of the present invention comprises the base material 1, the first film 2 covering the surface 1a of the base material 1, and the surface 2a of the first film 2. It includes a second film 3 to cover. However, a film in which the second film 3 does not exist and is composed of the base material 1 and the first film 2 is also included in the scope of the present invention.

The base material 1 is made of aluminum or an aluminum alloy containing aluminum as a main component, and contains an essential metal component. The essential metal component is a trace amount of metal component that is inevitably present when the base material 1 is produced, and in the present invention, at least one of Si, Fe, Cu, Mn, Mg, Cr, Zn, and Ti. Includes more than seeds.

The first film 2 covers the surface 1a of the base material 1 and is made of amorphous aluminum oxide (Al ₂ O ₃ ). The average thickness of the first film 2 is, for example, 200 nm or more and 3000 nm or less, preferably 500 nm or more and 1000 nm or less.

The film-attached member 10 is preferably used in a plasma environment where the temperature of the base material 1 is 250 ° C. or higher and 500 ° C. or lower.

The member 10 with a film is suitably used, for example, in a plasma process process of a semiconductor manufacturing apparatus. In this case, the temperature of the base material 1 is about 350 ° C., and the temperature of the substrate (wafer), that is, the process temperature is about 600 ° C.

Since the first film 2 is made of amorphous aluminum oxide and is dense, it does not change even in a plasma environment at 500 ° C. or lower, and can be suitably used in such a plasma environment.

By providing the film-attached member 10 with the first film 2 made of amorphous aluminum oxide, it is possible to prevent the essential metal component contained in the base material 1 from contaminating the substrate. In amorphous aluminum oxide, the bond distance between Al and O becomes irregular and becomes narrower than the bond length between Al and O having good crystallinity, and as a result, the metal component is transferred to the surface 2a of the first film 2. It is also considered that it is possible to suppress the contamination of the mounted substrate and the like.

If the temperature of the base material 1 exceeds 500 ° C., the base material 1 is deformed significantly, which may cause difficulty in use, which is not preferable.

The second film 3 is made of yttrium oxide or gadolinium oxide. By providing the second film 3 made of yttrium oxide or gadolinium oxide in this way, it is possible to further improve the plasma resistance of the base material 1. The average thickness of the second film 3 is, for example, 200 nm or more and 3000 nm or less, preferably 500 nm or more and 1000 nm or less.

Hereinafter, a method for manufacturing the film-attached member 10 according to the first embodiment of the present invention will be described.

In this production method, referring to FIG. 2, the base material preparation step STEP1, the first solution preparation step STEP2, the first solution immersion step STEP3, the first film forming step STEP4, the second solution preparation step STEP5, The second solution dipping step STEP6 and the second film forming step STEP7 are provided.

The base material preparation step STEP1 is a step of preparing the above-mentioned base material 1.

The first solution preparation step STEP2 is a step of preparing a first solution containing a first metal salt. If the first metal is aluminum or an aluminum alloy, the first metal oxide is aluminum oxide or one containing the same. Therefore, the above-mentioned film is provided with the first film 2 having excellent plasma resistance. It becomes possible to obtain the member 10. However, in the method for producing a member with a film of the present invention, the first metal is not limited to aluminum or an aluminum alloy, and may be, for example, Si, Fe, Cu, Mn, Mg, Cr, Zn, Ti.

The first metal salt may be, for example, a nitrate, a chloride, an acetate, or a carbonate of the first metal. When the first metal is aluminum, the first solution may be, for example, an aqueous solution of aluminum nitrate.

The first solution immersion step STEP3 is a step of immersing the base material 1 in the first solution. For example, the base material 1 and the first solution may be put into a non-sealed container made of stainless steel or the like.

In the first film forming step STEP4, the base material 1 immersed in the first solution is heated at 300 ° C. or higher and 500 ° C. or lower, and an amorphous first metal oxide is formed on the surface 1a of the base material 1. This is a step of forming the first film 2 made of. For example, the non-sealed container containing the base material 1 and the first solution may be placed in an oven or a heating furnace and heated. The heating conditions are preferably such that the temperature is raised at a speed of 100 ° C. per hour. Further, the heating atmosphere may be an atmospheric atmosphere. The average thickness of the first film 2 formed is, for example, 200 nm or more and 3000 nm or less, preferably 500 nm or more and 1000 nm or less.

The second solution preparation step STEP5 is a step of preparing a second solution containing the second metal salt. If the second metal is yttrium or gadolinium, the second metal oxide is yttrium oxide or gadolinium oxide. Therefore, the above-mentioned film-attached member is provided with the second film 3 having excellent plasma resistance. It is possible to obtain 10. However, in the method for producing a member with a film of the present invention, the second metal is not limited to yttrium or gadolinium.

The second solution immersion step STEP6 is a step of immersing the base material 1 having the first film 2 formed on the surface 1a in the second solution. For example, the above-mentioned base materials 1 and 2 solutions may be put into a non-sealed container made of stainless steel or the like.

When the second metal is gadolinium, the second solution may be, for example, an aqueous solution of gadolinium nitrate.

In the second film forming step STEP7, the base material 1 immersed in the second solution is heated at 300 ° C. or higher and 500 ° C. or lower, and the surface 2a of the first film 2 is made of an amorphous second metal. This is a step of forming a second film 3 made of an oxide. For example, the non-sealed container containing the base material 1 and the second solution may be placed in an oven or a heating furnace to heat the container. The heating time is preferably 12 hours or more and 24 hours or less. Further, the heating atmosphere may be an atmospheric atmosphere. The average thickness of the second film 3 formed is, for example, 200 nm or more and 3000 nm or less, preferably 500 nm or more and 1000 nm or less.

This makes it possible to easily form a first film 2 made of an amorphous metal oxide and a second film 3 having a function different from that of the first film 2 on the surface of the base material 1. .. Since it is not necessary to heat the base material 1 to a high temperature exceeding 500 ° C. as in the conventional case, it is possible to suppress the deformation of the base material 1. It is also possible to increase the adhesion strength between the base material 1 and the first film 2.

Further, in the present production method, it is further preferable to further include a heating step STEP8 for heating the base material 1 on which the first film 2 is formed on the surface 1a at 300 ° C. or higher and 500 ° C. or lower. This makes it possible to densify the first film 2 and improve the adhesion strength between the first film 2 and the base material 1. The heating conditions are preferably such that the temperature is raised at a rate of 100 ° C. per hour to 500 ° C. Further, the heating atmosphere may be an atmospheric atmosphere.

As described above, the second film 3 does not have to be present. In this case, the second solution preparation step STEP5, the second solution immersion step STEP6, and the second film forming step STEP7 may be omitted.

Hereinafter, a method for manufacturing the film-attached member 10 according to the second embodiment of the present invention will be described.

In this production method, referring to FIG. 3, the base material preparation step STEP1, the first aqueous solution preparation step STEP11, the first aqueous solution immersion step STEP12, the first film hydrothermal synthesis step STEP13, and the second aqueous solution preparation step It includes STEP14, a second aqueous solution dipping step STEP15, and a second film hydrothermal synthesis step STEP16.

The base material preparation step STEP1 is the same as the base material preparation step STEP1 described in the method for manufacturing the film-attached member 10 according to the first embodiment described above.

The first aqueous solution preparation step STEP11 and the second aqueous solution preparation step STEP14 are the first solution preparation step STEP2 and the second solution preparation described in the method for producing the film-attached member 10 according to the first embodiment described above, respectively. The process is the same as STEP5. However, the first aqueous solution is an aqueous solution, and may be, for example, an aqueous solution of a first metal such as nitrate, chloride, acetate, or carbonate. When the first metal is aluminum, the first solution may be, for example, an aqueous solution of aluminum nitrate. The second aqueous solution is an aqueous solution, and may be, for example, an aqueous solution of yttrium or gadolinium nitrate, chloride, acetate, carbonate or the like.

The first aqueous solution dipping step STEP12 and the second aqueous solution dipping step STEP15 are the first solution dipping step STEP3 and the second solution dipping described in the method for producing the film-attached member 10 according to the first embodiment described above, respectively. The process is the same as STEP6. However, in the first aqueous solution dipping step STEP12 and the second aqueous solution dipping step STEP15, a container that can be sealed is used.

In the first membrane hydrothermal synthesis step STEP13, the temperature is 180 ° C. or higher and 250 ° C. or lower, and the gauge pressure is 0.9 MPa or higher and 3.9 MPa or lower in a sealed container in which the base material 1 is immersed in the first aqueous solution. This is a step of forming a first film 2 made of an amorphous first metal oxide on the surface 1a of the base material 1 by hydrothermal synthesis.

For example, the base material 1 and the first solution are put into a sealable pressure-resistant container made of polytetrafluoroethylene (Teflon (registered trademark)) or the like, and the container is sealed in a pressure-resistant stainless steel outer cylinder. , This container may be placed in an oven or a heating furnace to heat it. The heating time is preferably 12 hours or more and 24 hours or less. The average thickness of the first film 2 formed is, for example, 200 nm or more and 3000 nm or less, preferably 500 nm or more and 1000 nm or less.

In the second membrane hydrothermal synthesis step STEP16, the temperature is 180 ° C. or higher and 250 ° C. or lower in a sealed container in which the base material 1 having the first membrane 2 formed on the surface is immersed in the second aqueous solution. Hydrothermal synthesis of a second film 3 made of an amorphous second metal oxide on the surface of the first film 2 by heating and pressurizing so that the gauge pressure is 0.9 MPa or more and 3.9 MPa or less. It is a process of forming by.

For example, the above-mentioned base materials 1 and 2 solutions are put into a sealable pressure-resistant container made of polytetrafluoroethylene or the like, and the container is sealed in a pressure-resistant stainless steel outer cylinder, and the container is placed in an oven or an oven. It may be put in a heating furnace and heated. The heating time is preferably 12 hours or more and 24 hours or less. The average thickness of the second film 3 formed is, for example, 200 nm or more and 3000 nm or less, preferably 500 nm or more and 1000 nm or less.

As a result, similarly to the method for manufacturing the film-attached member 10 according to the first embodiment described above, the first film 2 made of an amorphous metal oxide is applied to the surface 1a of the base material 1 and the first film 2 is applied. It is possible to easily form the second film 3 having a function different from that of the first film 2 on the surface 2a of the first film 2.

Then, it is not necessary to heat to a high temperature exceeding 500 ° C. as in the conventional case, and the first and second membrane hydrothermal synthesis steps STEP13, STEP16 are higher than the heating temperature in the method for manufacturing the membrane-attached member 10 according to the first embodiment. Since the heating temperature in the base material 1 is low, it is possible to further suppress the deformation of the base material 1. It is also possible to increase the adhesion strength between the base material 1 and the first film 2.

Further, also in this manufacturing method, it is preferable to further include the above-mentioned heating step STEP8. If the second membrane 3 does not have to be present, the second aqueous solution preparation step STEP14, the second aqueous solution dipping step STEP15, and the second membrane hydrothermal synthesis step STEP16 may be omitted.

Further, in the method for manufacturing the membrane-attached member 10 according to the first embodiment, the second membrane hydrothermal synthesis step STEP12 may be performed instead of the second membrane forming step STEP7. In the method for manufacturing the membrane-attached member 10 according to the second embodiment, the second film forming step STEP7 may be performed instead of the second membrane hydrothermal synthesis step STEP12.

Hereinafter, the present invention will be described with reference to specific examples and comparative examples of the present invention.

(Example 1)
In Example 1, first, as a base material preparation step STEP1, a base material 1 made of an aluminum alloy (A6061) was prepared.

Next, as the first solution preparation step STEP2, a first metal salt composed of Al (NO ₃ ) and 9H ₂ O was prepared. Further, NH ₃ aq (aqueous solution of ammonium hydroxide) and CH ₃ COOH (acetic acid) were mixed to prepare a sol. Further, 750 g of the first metal salt and 20 L (liter) of the sol were placed in a stainless steel container having an open top surface to obtain a first solution.

Next, as the first solution immersion step STEP3, the base material 1 was put into the container, and the base material 1 was immersed in the first solution.

Next, as the first film forming step STEP4, the container containing the base material 1 immersed in the first solution was placed in an oven and heated in an air atmosphere at a temperature of 350 ° C. for 12 hours. ..

As a result, a film-attached member 10 in which the first film 2 was formed on the surface 1a of the base material 1 was obtained. The thickness of the first film 2 was 500 nm on average.

X-ray diffraction was performed on the first membrane 2. For X-ray diffraction, an X-ray diffraction spectrum was measured using a fully automatic multipurpose X-ray diffractometer (SmartLab, manufactured by Rigaku). As a result, no clear peak was observed. As a result, it was found that the first film 2 was an amorphous oxide layer of Al containing Al (OH ₃ ).

(Example 2)
In Example 2, first, the same base material 1 as in Example 1 and the same solution as in Example 1 were prepared as the base material preparation step STEP1 and the first aqueous solution preparation step STEP11. Then, 750 g of the first metal salt and 20 L of the sol were placed in a hermetically sealed container made of polytetrafluoroethylene to obtain a first aqueous solution.

Next, as the first aqueous solution dipping step STEP12, the base material 1 was put into the container and the base material 1 was immersed in the first aqueous solution.

Next, as the first membrane hydrothermal synthesis step STEP13, the container was sealed with the base material 1 immersed in the first aqueous solution. Then, this closed container was placed in an oven in a state of being placed in a heat-resistant stainless steel outer cylinder, and heated in an air atmosphere with a temperature in the oven of 200 ° C. and a gauge pressure in the container of 1.4 MPa.

As a result, a film-attached member 10 in which the first film 2 was formed on the surface 1a of the base material 1 was obtained. The thickness of the first film 2 was 500 nm on average.

The first membrane 2 was subjected to X-ray diffraction in the same manner as in Example 1. As a result, no clear peak was observed. As a result, it was found that the first film 2 was an amorphous oxide layer of Al containing Al (OH ₃ ).

(Example 3)
In Example 3, first, as in Example 2, the base material preparation step STEP1, the first aqueous solution preparation step STEP11, the first aqueous solution dipping step STEP12, and the first membrane hydrothermal synthesis step STEP13 are performed. As a result, the first film 2 was formed on the surface 1a of the base material 1.

Next, as the second aqueous solution preparation step STEP14, a second metal salt composed of Gd (NO ₃ ) and 6H ₂ O was prepared. Further, NH ₃ aq and CH ₃ COOH were mixed to prepare a solution of ph10. Further, 900 g of the second metal salt and 20 L of the above solution were placed in a sealable container made of polytetrafluoroethylene to obtain a second aqueous solution.

Next, as the second aqueous solution dipping step STEP15, the base material 1 having the first film 2 formed on the surface 1a was put into the container, and the base material 1 was immersed in the second aqueous solution.

Next, as the second membrane hydrothermal synthesis step STEP16, the container was sealed with the base material 1 immersed in the second aqueous solution. Then, this closed container was placed in an oven in a state of being placed in a heat-resistant stainless steel outer cylinder, and heated in an air atmosphere with a temperature in the oven of 200 ° C. and a gauge pressure in the container of 1.4 MPa.

As a result, a film-attached member 10 in which the second film 3 is formed on the surface 2a of the first film 2 is obtained. The thickness of the second film 3 was 500 nm on average.

The second membrane 3 was subjected to X-ray diffraction in the same manner as in Example 1. From this, it was found that the second film 3 was an amorphous oxide layer of Gd.

(Example 4)
In Example 4, the heating step STEP8 was performed on each of the film-attached members 10 formed in Examples 1 to 3.

In the heating step STEP8, the member 10 with a film was placed in an oven and heated in an air atmosphere at a temperature of 200 ° C. for 12 hours.

Then, the first film 2 of the film-attached member 10 formed in Examples 1 and 2 and the second film 3 formed in Example 3 are X-rayed in the same manner as in Example 1. Diffraction was performed. As a result, it was found that the first film 2 or the second film 3 was partially crystallized, and amorphous and crystalline were mixed.

1 ... base material, 1a ... surface of base material, 2 ... first film, 2a ... surface of first film, 3 ... second film, 10 ... member with film.

Claims (10)

The base material is composed of aluminum or an aluminum alloy containing aluminum as a main component, and includes a base material containing an essential metal component and a first film which covers the surface of the base material and is made of amorphous aluminum oxide. A member with a film, which is used in a plasma environment where the temperature of aluminum is 250 ° C. or higher and 500 ° C. or lower. The film-attached member according to claim 1, wherein the surface of the first film is covered with a second film made of yttrium oxide or gadolinium oxide. The process of preparing a base material containing aluminum or an aluminum alloy containing aluminum as a main component and containing essential metal components, and
The step of preparing the first solution containing the first metal salt, and
The step of immersing the base material in the first solution and
The base material immersed in the first solution is heated at 300 ° C. or higher and 500 ° C. or lower to form a first film made of an amorphous oxide of the first metal on the surface of the base material. A method for manufacturing a member with a film, which comprises a step of making the substrate and is used in a plasma environment in which the temperature of the base material is 250 ° C. or higher and 500 ° C. or lower. The step of preparing a second solution containing the second metal salt, and
A step of immersing the base material having the first film formed on the surface in the second solution, and
The base material immersed in the second solution is heated at 300 ° C. or higher and 500 ° C. or lower, and a second film made of an amorphous second metal oxide is formed on the surface of the first film. The method for manufacturing a member with a film according to claim 3, further comprising a step of forming the film. The process of preparing a base material containing aluminum or an aluminum alloy containing aluminum as a main component and containing essential metal components, and
The step of preparing the first aqueous solution containing the first metal salt, and
The base material is placed in a container while being immersed in the first aqueous solution, and the inside of the container is heated so that the temperature is 180 ° C. or higher and 250 ° C. or lower and the gauge pressure is 0.9 MPa or higher and 3.9 MPa or lower. It comprises a step of forming a first film made of an amorphous oxide of the first metal on the surface of the base material by hydrothermal synthesis by applying pressure, and the temperature of the base material is 250 ° C. or higher and 500. A method for manufacturing a member with a film, which is characterized in that it is used in a plasma environment where the temperature is below ° C. The method for producing a member with a film according to claim 5, further comprising a step of heating the base material having the first film formed on the surface at 300 ° C. or higher and 500 ° C. or lower. A step of preparing a second aqueous solution containing a second metal salt, and
The base material having the first film formed on its surface is housed in a container while being immersed in the second aqueous solution, and the temperature inside the container is 180 ° C. or higher and 250 ° C. or lower, and the gauge pressure is 0. A step of forming a second film made of an amorphous second metal oxide on the surface of the first film by hydrothermal synthesis by heating and pressurizing so as to be 9 MPa or more and 3.9 MPa or less. The method for manufacturing a member with a film according to claim 5 or 6, wherein the member is provided with a film. The method for producing a member with a film according to claim 7, wherein the second film comprises a step of heating the base material formed on the surface of the first film at 300 ° C. or higher and 500 ° C. or lower. .. The method for manufacturing a member with a film according to any one of claims 3 to 8, wherein the first metal is aluminum. The method for producing a member with a film according to any one of claims 4, 7 or 8, wherein the second metal is yttrium or gadolinium.