JP2019123808A - Resin composition for electronic components and resin sheet for electronic components - Google Patents
Resin composition for electronic components and resin sheet for electronic components Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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Abstract
【課題】マイクロカプセル型硬化剤を用いずにエポキシ樹脂の反応性の向上と室温での保存安定性を両立させた電子部品用樹脂組成物およびこれを用いた電子部品用樹脂シートを提供する。【解決手段】(a)アクリル系共重合体、(b)エポキシ樹脂、(c)無機充填材、(d)硬化剤および(e)硬化促進剤を含有する電子部品用樹脂シートであって、該電子部品用樹脂シート中の(a)アクリル系共重合体の含有率が50質量%以上であり、かつ(e)硬化促進剤がトリアジン骨格を有するイミダゾール化合物であることを特徴とする電子部品用樹脂組成物。【選択図】 なしPROBLEM TO BE SOLVED: To provide a resin composition for electronic parts, which has both improved reactivity of an epoxy resin and storage stability at room temperature without using a microcapsule type curing agent, and a resin sheet for electronic parts using the same. A resin sheet for electronic parts, comprising (a) an acrylic copolymer, (b) an epoxy resin, (c) an inorganic filler, (d) a curing agent, and (e) a curing accelerator, The electronic component, wherein the content of the (a) acrylic copolymer in the resin sheet for electronic components is 50% by mass or more, and (e) the curing accelerator is an imidazole compound having a triazine skeleton. Resin composition. [Selection diagram] None
Description
本発明は、電子部品用樹脂組成物およびこれを用いた電子部品用樹脂シートに関する。 The present invention relates to a resin composition for electronic components and a resin sheet for electronic components using the same.
近年、電子部品の基板の貼り合せや放熱板の貼り合せ、回路基板の貼り合せ用途にてシート状接着剤が多く用いられている。シート状接着剤は液状接着剤に比較して特殊な塗工機器を用意しなくても、ラミネーターやプレス機などの汎用機器で加工することが可能であるため生産性に優れている。また、シート状接着剤であれば、貼り合せ前に打ち抜き加工などの形状加工が可能である点から使用用途が広く様々な電子部品への適用が期待できる材料である。また、シート状接着剤は凹凸のあるような基材でも厚みを均一に覆うように加工することができるため、液状接着剤よりも使用用途を広げることができる。 BACKGROUND ART In recent years, sheet-like adhesives are often used for bonding of substrates of electronic components, bonding of heat sinks, and bonding of circuit boards. The sheet adhesive is excellent in productivity because it can be processed by a general-purpose device such as a laminator or a press without preparing a special coating device as compared with the liquid adhesive. Moreover, if it is a sheet-like adhesive agent, it is a material which can be expected to be applied to various electronic parts which can be widely used and used since shape processing such as punching can be performed before bonding. Moreover, since the sheet-like adhesive can be processed so as to uniformly cover the thickness even on a base having unevenness, it can be used more widely than liquid adhesive.
シート状の接着剤は、一般的にエポキシ樹脂などの熱硬化性樹脂を含有し、被着体へ貼り合せた後に加熱、もしくは加熱加圧を負荷して、熱硬化性樹脂を硬化させる。この際、接着剤シートの膜弾性の向上、被着体への貼りつきが生じて、被着体と接着シートとの接着力が向上する。接着工程の短縮化のために、熱硬化性樹脂の硬化時間は短い方が生産タクトの面で望ましい。硬化時間を短くするためにはエポキシ樹脂などの樹脂とその硬化剤との反応性を上げるのが最も一般的であるが、このような処置を行うと室温での反応性も向上するため、接着剤としてのポットライフを維持することが困難になる。一般的な液状接着剤では、エポキシ樹脂等と硬化剤を2つに分け、使用する直前に混合する2液化によって速硬化性とポットライフを維持する手法がとられている(特許文献1)。 The sheet-like adhesive generally contains a thermosetting resin such as an epoxy resin, and after bonding to an adherend, heat or heat and pressure are applied to cure the thermosetting resin. At this time, the film elasticity of the adhesive sheet is improved and the adhesion to the adherend occurs, and the adhesion between the adherend and the adhesive sheet is improved. In order to shorten the bonding process, it is desirable in terms of production tact that the curing time of the thermosetting resin be short. In order to shorten the curing time, it is most common to increase the reactivity between the resin such as epoxy resin and its curing agent, but such a treatment also improves the reactivity at room temperature, so adhesion It becomes difficult to maintain the pot life as an agent. In a general liquid adhesive, an epoxy resin etc. and a curing agent are divided into two, and the method of maintaining quick curability and pot life by 2 liquefaction mixed immediately before use is taken (patent document 1).
しかし、シート状接着剤はその製品形状から、2液化や2層化にすることが難しい。このため、これまで速硬化性とポットライフ性を両立させるために硬化剤をウレタン樹脂などでできたマイクロカプセルに閉じ込めて低温での反応性を抑制しつつ、加熱、加圧等のエネルギーを加えた際にマイクロカプセルを破壊することで硬化樹脂とエポキシ樹脂を接触させて反応させるという手法がとられてきた。しかし、マイクロカプセル型硬化剤は非常に高価であること、またマイクロカプセルの被覆層を破壊できる加熱、加圧条件にしなければ反応が進まず速硬化性が低くなりやすいという課題があった(先行特許文献2)。 However, it is difficult to make a sheet-like adhesive into two liquefaction or two-layer due to its product shape. For this reason, in order to achieve both quick curing and pot life, the curing agent is enclosed in microcapsules made of urethane resin or the like to suppress the reactivity at low temperature while adding energy such as heating and pressing. By breaking the microcapsules at the time, a method has been adopted in which the cured resin and the epoxy resin are brought into contact and reacted. However, microcapsule-type curing agents are very expensive, and there is a problem that the reaction does not proceed unless the heating and pressure conditions that can break the coating layer of the microcapsules cause rapid curing to easily occur (precedence) Patent Document 2).
そこで、本発明の目的は、マイクロカプセル型硬化剤を用いずにエポキシ樹脂の反応性の向上と室温での保存安定性を両立させた接着剤シートを提供することにある。 Then, the objective of this invention is providing the adhesive agent sheet which made the improvement of the reactivity of an epoxy resin, and the storage stability in room temperature make compatible, without using a microcapsule-type hardening | curing agent.
上記課題を解決するため、本発明は、以下の構成からなる。
(1)(a)アクリル系共重合体、(b)エポキシ樹脂、(c)無機充填材、(d)硬化剤および(e)硬化促進剤を含有する電子部品用樹脂組成物であって、該電子部品用樹脂組成物中の(a)アクリル系共重合体の含有率が50質量%以上であり、かつ(e)硬化促進剤がトリアジン骨格を有するイミダゾール化合物であることを特徴とする電子部品用樹脂組成物。
(2)電子部品用樹脂組成物の前記(d)硬化剤がノボラック型フェノール樹脂であることを特徴とする(1)に記載の電子部品用樹脂組成物。
(3)電子部品用樹脂組成物の前記(c)無機充填剤の含有率が5〜25質量%であることを特徴とする(1)または(2)に記載の電子部品用樹脂組成物。
(4)電子部品用樹脂組成物の200℃、5分加熱後の引張破断伸度が100%以上であることを特徴とする(1)〜(3)のいずれかに記載の電子部品用樹脂組成物。
(5)硬化前の前記電子部品用樹脂組成物の破断強度S1と、200℃、5分加熱後の電子部品用樹脂組成物の破断強度S2の比(S2/S1)が1.5以上であることを特徴とする(1)〜(4)のいずれかに記載の電子部品用樹脂組成物。
(6)フィルムの少なくとも片側の面に(1)〜(5)に記載の電子部品用樹脂組成物が積層されてなる電子部品用樹脂シート。
(7)(6)記載の電子部品用樹脂シートを用いて、基板上に搭載された複数個の電子部品を封止してなる電子部品装置集合体。
(8)(7)記載の電子部品装置集合体をダイシングして得られる電子部品装置。
In order to solve the above-mentioned subject, the present invention consists of the following composition.
(1) A resin composition for electronic parts comprising (a) an acrylic copolymer, (b) an epoxy resin, (c) an inorganic filler, (d) a curing agent and (e) a curing accelerator, The electron is characterized in that the content of the (a) acrylic copolymer in the resin composition for electronic parts is 50 mass% or more, and (e) the curing accelerator is an imidazole compound having a triazine skeleton. Resin composition for parts.
(2) The resin composition for an electronic component according to (1), wherein the (d) curing agent of the resin composition for an electronic component is a novolac type phenolic resin.
(3) The resin composition for an electronic component according to (1) or (2), wherein the content of the (c) inorganic filler in the resin composition for an electronic component is 5 to 25% by mass.
(4) The resin for electronic parts according to any one of (1) to (3), wherein the tensile elongation at break after heating at 200 ° C. for 5 minutes of the resin composition for electronic parts is 100% or more. Composition.
(5) The ratio (S2 / S1) of breaking strength S1 of the resin composition for electronic parts before curing to breaking strength S2 of the resin composition for electronic parts after heating at 200 ° C. for 5 minutes is 1.5 or more The resin composition for electronic parts according to any one of (1) to (4), which is characterized in that
(6) The resin sheet for electronic components by which the resin composition for electronic components as described in (1)-(5) is laminated | stacked on the surface of the at least one side of a film.
(7) An electronic component device assembly formed by sealing a plurality of electronic components mounted on a substrate using the resin sheet for electronic components according to (6).
(8) An electronic component device obtained by dicing the electronic component device assembly according to (7).
本発明の電子部品用樹脂組成物は、マイクロカプセル型硬化剤を用いずにエポキシ樹脂の反応性の向上と室温での保存安定性を両立させ、高接着力性を長く維持できる電子部品用樹脂シートを提供するものである。 The resin composition for electronic parts of the present invention is a resin for electronic parts which can maintain high adhesiveness for a long time while achieving both improvement in reactivity of epoxy resin and storage stability at room temperature without using a microcapsule type curing agent. It provides a sheet.
本発明の電子部品用樹脂組成物は、(a)アクリル系共重合体、(b)エポキシ樹脂、(c)無機充填材、(d)硬化剤および(e)硬化促進剤を含有する電子部品用樹脂組成物であって、該電子部品用樹脂組成物中の(a)アクリル系共重合体の含有率が50質量%以上であり、かつ(e)硬化促進剤がトリアジン骨格を有するイミダゾール化合物であることを特徴とする電子部品用樹脂組成物である。 The resin composition for electronic parts of the present invention comprises (a) an acrylic copolymer, (b) an epoxy resin, (c) an inorganic filler, (d) a curing agent and (e) a curing accelerator. An imidazole compound having a content of 50% by mass or more of (a) an acrylic copolymer in the resin composition for electronic parts, and (e) a curing accelerator having a triazine skeleton. It is a resin composition for electronic parts characterized by being.
本発明における(a)アクリル系共重合体は、樹脂シートの可撓性、熱応力の緩和、低吸水性による絶縁性の向上等の機能を有する。(a)アクリル系共重合体中のアクリロニトリル以外の構成単位の種類については特に限定されない。アクリル酸エステル、メタクリル酸エステルの例としては、アクリル酸メチル、メタクリル酸メチル、アクリル酸エチル、メタクリル酸エチル、アクリル酸プロピル、メタクリル酸プロピル、アクリル酸ブチル、メタクリル酸ブチル、アクリル酸ペンチル、メタクリル酸ペンチル、アクリル酸ヘキシル、メタクリル酸ヘキシル、アクリル酸−2−エチルヘキシル、メタクリル酸−2−エチルヘキシル、アクリル酸オクチル、メタクリル酸オクチルのようなアクリル酸アルキルエステル、メタクリル酸アルキルエステル等が挙げられる。またアクリル酸シクロヘキシルのようなアクリル酸の脂環属アルコールとのエステル等が挙げられる。 The (a) acrylic copolymer in the present invention has functions such as flexibility of the resin sheet, relaxation of thermal stress, and improvement of insulation due to low water absorption. There are no particular limitations on the type of structural unit other than acrylonitrile in the (a) acrylic copolymer. Examples of acrylic acid esters and methacrylic acid esters include methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, propyl acrylate, propyl methacrylate, butyl acrylate, butyl methacrylate, pentyl acrylate, methacrylic acid Examples thereof include alkyl acrylates such as pentyl, hexyl acrylate, hexyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, octyl acrylate and octyl methacrylate, and methacrylate alkyl esters. Further, esters of acrylic acid with alicyclic alcohols such as cyclohexyl acrylate and the like can be mentioned.
また、上記アクリル酸エステル、メタクリル酸エステル以外の構成単位が含まれていてもよい。例えば、酢酸ビニル、スチレン、メチルスチレン、クロルスチレン、ビニリデンクロライド、エチルα―アセトキシアクリレート等が挙げられる。 Moreover, structural units other than the said acrylic ester and methacrylic ester may be contained. For example, vinyl acetate, styrene, methylstyrene, chlorostyrene, vinylidene chloride, ethyl α-acetoxy acrylate and the like can be mentioned.
さらに、上記(a)アクリル系共重合体はエポキシ基、水酸基、アミノ基、ヒドロキシアルキル基、ビニル基、シラノール基およびイソシアネート基から選ばれた少なくとも1種の官能基を有することが好ましい。これにより、後述の(b)熱硬化性樹脂との結合が強固になり、電子機器の信頼性が向上する。特にエポキシ基はエポキシ樹脂との相溶性の観点からより好ましい。 Furthermore, it is preferable that the (a) acrylic copolymer has at least one functional group selected from an epoxy group, a hydroxyl group, an amino group, a hydroxyalkyl group, a vinyl group, a silanol group and an isocyanate group. As a result, the bond with the thermosetting resin (b) described later becomes strong, and the reliability of the electronic device is improved. In particular, the epoxy group is more preferable from the viewpoint of compatibility with the epoxy resin.
本発明における(a)アクリル系共重合体の含有率は電子部品用樹脂シート全体に対し50質量%以上であることが好ましく、さらに好ましくは55質量%以上である。(a)アクリル系共重合体の含有率を50質量%以上にすることで硬化前の接着剤シートの可撓性が向上し凹凸のある基板への追従性を高めることができるため、様々な加工に適用することができる。また、硬化後の接着剤シートの可撓性も向上できるため、電子部品の貼り合せ用途に適用した際に、温度変化による接着剤自体へのクラックが入りにくく、基材からの剥離を抑制することができる。 The content of the (a) acrylic copolymer in the present invention is preferably 50% by mass or more, more preferably 55% by mass or more, based on the entire resin sheet for electronic parts. (A) By setting the content of the acrylic copolymer to 50% by mass or more, the flexibility of the adhesive sheet before curing can be improved, and the followability to the substrate having irregularities can be enhanced, so It can be applied to processing. In addition, since the flexibility of the adhesive sheet after curing can also be improved, when applied to bonding applications of electronic components, the adhesive is not easily cracked due to temperature change, and peeling from the substrate is suppressed. be able to.
本発明における(b)エポキシ樹脂は1分子中に2個以上のエポキシ基を有するものが好ましく、これらの具体例としては、たとえばクレゾールノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、ビフェニル型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ナフタレン型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、線状脂肪族エポキシ樹脂、脂環式エポキシ樹脂、複素環式エポキシ樹脂、スピロ環含有エポキシ樹脂などが挙げられる。これらのエポキシ樹脂の中で、本発明において好ましく用いられるものは、含有塩素量が少なく、低軟化点であり柔軟性のある2官能成分の多いエポキシ樹脂であるビフェニル型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ナフタレン型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂である。もちろんこれらエポキシ樹脂を混合して用いてもよい。 The epoxy resin (b) in the present invention preferably has two or more epoxy groups in one molecule, and specific examples thereof include cresol novolak epoxy resin, phenol novolac epoxy resin, biphenyl epoxy resin, Bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene type epoxy resin, linear aliphatic epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin, spiro ring-containing epoxy resin, etc. It can be mentioned. Among these epoxy resins, those preferably used in the present invention are biphenyl type epoxy resins having a low content of chlorine, a low softening point, and a flexible bifunctional epoxy resin, bisphenol A type epoxy resin Resin, bisphenol F type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene type epoxy resin. Of course, these epoxy resins may be mixed and used.
本発明における(c)無機充填材としては、溶融シリカ、結晶性シリカ、炭酸カルシウム、炭酸マグネシウム、アルミナ、窒化珪素、酸化チタンなどが挙げられるが、その低透湿性から溶融シリカが好ましく用いられる。ここでいう溶融シリカとは、真比重が2.3以下の非晶性シリカを意味する。この溶融シリカの製造方法においては必ずしも溶融状態を経る必要はなく、任意の製造方法を用いることができ、たとえば結晶性シリカを溶融する方法および各種原料から合成する方法などで製造することができる。本発明に用いる溶融シリカの粒径は、接着剤厚みや搭載される部品間距離に影響を与えるサイズのものでなければ特に限定されないが、通常、その平均粒径が1μm以下のものが用いられる。なお、ここでいう平均粒径、最大粒径は堀場LA500レーザー回折式粒度分布計で測定したものをいう。また、粒子の純度は99%を超え、好ましくは99.8%を超え、さらに好ましくは99.9%を超えることが好ましい。特に、不純物イオンのNaイオンは0.1ppm以下、Clイオンは0.2ppm以下であることが好ましい。
また、本発明において(c)無機充填剤の含有率は接着剤シート100質量%に対して5〜25質量%含まれていることが好ましい。無機充填剤を5質量%以上にすることで膜弾性を適切に向上させ、高接着力を発揮することができる。また、無機充填剤を25質量%以下にすることで、硬化後の接着剤シートの伸び性を損なうことがない。
Examples of the inorganic filler (c) in the present invention include fused silica, crystalline silica, calcium carbonate, magnesium carbonate, alumina, silicon nitride and titanium oxide, and fused silica is preferably used in view of its low moisture permeability. The term "fused silica" as used herein means amorphous silica having a true specific gravity of 2.3 or less. It is not necessary to necessarily go through the molten state in the method for producing fused silica, and any producing method can be used, and for example, it can be produced by a method of melting crystalline silica and a method of synthesizing from various raw materials. The particle size of the fused silica used in the present invention is not particularly limited as long as it does not affect the thickness of the adhesive and the distance between the components to be mounted, but usually, those having an average particle size of 1 μm or less are used . The average particle size and the maximum particle size referred to herein are those measured by a Horiba LA 500 laser diffraction particle size distribution analyzer. In addition, the purity of the particles is preferably more than 99%, preferably more than 99.8%, and more preferably more than 99.9%. In particular, it is preferable that Na ion of impurity ion is 0.1 ppm or less and Cl ion is 0.2 ppm or less.
In the present invention, the content of (c) the inorganic filler is preferably 5 to 25% by mass with respect to 100% by mass of the adhesive sheet. By setting the amount of the inorganic filler to 5% by mass or more, the membrane elasticity can be appropriately improved and high adhesion can be exhibited. Moreover, the extensibility of the adhesive agent sheet | seat after hardening is not impaired by an inorganic filler being 25 mass% or less.
本発明の(d)硬化剤は、エポキシ樹脂と反応するものであれば特に限定されるものではなく、これらの具体例としては、例えばフェノールノボラック樹脂、クレゾールノボラック樹脂、ビスフェノールAやレゾルシンから合成される各種ノボラック樹脂、無水マレイン酸、無水ピロメリット酸などの酸無水物およびジアミノジフェニルスルホンなどの芳香族アミンが挙げられる。これら硬化剤の中で、好ましく用いられるものは、耐熱性、耐湿性の点から、ノボラック型フェノール樹脂、クレゾールノボラック樹脂、ビスフェノールA、ジアミノジフェニルスルホンであり、エポキシ樹脂との反応性や相溶性の点から特にノボラック型フェノール樹脂がさらに好ましく用いられる。熱硬化樹脂の添加量としては、エポキシ樹脂100重量部に対して1〜20重量部が好ましい。硬化剤をこの範囲で混合することで、反応性を高めつつ室温での反応を抑制した接着剤シートを得られる。 The curing agent (d) of the present invention is not particularly limited as long as it reacts with an epoxy resin, and specific examples thereof include, for example, a phenol novolac resin, cresol novolac resin, bisphenol A and resorcinol And various acid anhydrides such as maleic anhydride and pyromellitic anhydride and aromatic amines such as diaminodiphenyl sulfone. Among these curing agents, those which are preferably used are novolac type phenol resin, cresol novolac resin, bisphenol A, diaminodiphenyl sulfone from the viewpoint of heat resistance and moisture resistance, and the reactivity and compatibility with epoxy resin are preferable. From the point of view, novolac type phenol resin is particularly preferably used. The addition amount of the thermosetting resin is preferably 1 to 20 parts by weight with respect to 100 parts by weight of the epoxy resin. By mixing the curing agent in this range, it is possible to obtain an adhesive sheet in which the reaction at room temperature is suppressed while the reactivity is enhanced.
本発明の(e)硬化促進剤は、イミダゾール化合物であることが好ましく、特にトリアジン骨格を有するイミダゾール化合物が好ましく用いられる。具体例としては、2,4−ジアミノ−6−[2’−メチルイミダゾリル(1’)]−エチル−s−トリアジン、2,4−ジアミノ−6−[2’−ウンデシルイミダゾリル(1’)]−エチル−s−トリアジン、2,4−ジアミノ−6−[2’−エチル−4−メチルイミダゾリル(1’)]−エチル−s−トリアジン、2,4−ジアミノ−6−[2’−メチルイミダゾリ
ル(1’)]−エチル−s−トリアジンのイソシアヌル酸付加物、2−フェニルイミダゾ
ールのイソシアヌル酸付加物、2−メチルイミダゾールのイソシアヌル酸付加物等が挙げられる。トリアジン骨格を有するイミダゾールを使用することにより接着剤シートの反応性を向上することができる。また、トリアジン骨格を有するイミダゾールはエポキシ樹脂との相溶性が低いため、室温でのエポキシ樹脂との反応性を抑制することができ、加熱・加圧時のみエポキシ樹脂との反応性を促進させることができる。また、トリアジン骨格を有するイミダゾールを硬化促進剤として用いることで、エポキシ樹脂の架橋反応が網目状に広がり、硬化後の接着剤シートの弾性率を向上させることができる。
The (e) curing accelerator of the present invention is preferably an imidazole compound, and in particular, an imidazole compound having a triazine skeleton is preferably used. As a specific example, 2,4-diamino-6- [2'-methylimidazolyl (1 ')]-ethyl-s-triazine, 2,4-diamino-6- [2'-undecylimidazolyl (1') ] -Ethyl-s-triazine, 2,4-diamino-6- [2′-ethyl-4-methylimidazolyl (1 ′)]-ethyl-s-triazine, 2,4-diamino-6- [2′- Examples thereof include isocyanuric acid adducts of methylimidazolyl (1 ′)]-ethyl-s-triazine, isocyanuric acid adducts of 2-phenylimidazole, isocyanuric acid adducts of 2-methylimidazole, and the like. The reactivity of the adhesive sheet can be improved by using an imidazole having a triazine skeleton. In addition, since the imidazole having a triazine skeleton has low compatibility with the epoxy resin, it can suppress the reactivity with the epoxy resin at room temperature, and promotes the reactivity with the epoxy resin only at the time of heating and pressing. Can. In addition, by using imidazole having a triazine skeleton as a curing accelerator, the crosslinking reaction of the epoxy resin can spread in a network, and the elastic modulus of the adhesive sheet after curing can be improved.
また、本発明の(e)硬化促進剤は、(b)エポキシ樹脂100質量%に対して0.01〜0.1質量%含有することが好ましい。硬化促進剤をこの範囲添加することで、エポキシ樹脂の反応を効果的に向上させることができるだけでなく、室温保管性を維持することができる。また、硬化促進剤の含有量を0.1質量%以下にすることにより、硬化後の接着剤シートの膜伸び性を損なうことがなく、高接着でかつ凹凸追従加工が可能な接着剤シートを提供することができる。 Moreover, it is preferable to contain 0.01-0.1 mass% with respect to 100 mass% of (e) epoxy resin of (e) hardening accelerator of this invention. By adding a curing accelerator in this range, it is possible not only to effectively improve the reaction of the epoxy resin but also to maintain the room temperature storage stability. In addition, by setting the content of the curing accelerator to 0.1% by mass or less, an adhesive sheet which can be highly adhered and which can follow unevenness can be obtained without impairing the film extensibility of the adhesive sheet after curing. Can be provided.
本発明の電子部品用樹脂シートは200℃、5分加熱後の引張破断伸度が100%以上であることが好ましく、さらに好ましくは150%以上である。引張破断伸度が100%以上であることにより、電子部品実装により形成された凹凸形状でも破れ等なく、かつ接着剤層の厚みを均一にして被覆することができる。また、基材との90°接着力測定においても接着剤自体が伸びることにより界面剥離しにくく、接着強度が向上しやすい。 The resin sheet for electronic parts of the present invention preferably has a tensile elongation at break of 100% or more, more preferably 150% or more after heating at 200 ° C. for 5 minutes. When the tensile elongation at break is 100% or more, even the uneven shape formed by the mounting of the electronic component can be covered without causing a break or the like and making the thickness of the adhesive layer uniform. In addition, even in the case of measurement of 90 ° adhesion to a substrate, the adhesive itself is stretched so that interfacial peeling hardly occurs and adhesion strength is likely to be improved.
硬化前の上記電子部品用樹脂シートの破断強度S1と200℃5分加熱後の上記電子部品用樹脂シートの破断強度S2の比(S2/S1)が1.5以上であることが好ましく、さらに好ましくは1.8以上である。200℃5分で接着剤シートの破断強度が向上することにより、短時間の接着加工工程のみで接着剤としての機能を付与することができ、生産タクトを短縮することができる。
本発明の電子部品用接着シートは、その片面、もしくは両面に保護フィルムを有していてもよい。本発明で言う保護フィルムとは、電子部品用樹脂シートの表面を保護し、また電子部品用樹脂シートから剥離できれば特に限定されないが、例えばシリコーン、フッ素化合物、アルキド化合物などをコーティングしたポリエステルフィルム、ポリオレフィンフィルムなどが挙げられる。保護フィルムの厚みは特に限定されないが、10〜100μmが一般的である
次に、本発明の電子部品用樹脂組成物の製造方法の例について説明する。
本発明の電子部品用樹脂組成物の製造方法としては溶融混練、例えばバンバリーミキサー、ニーダーロール、単軸もしくは二軸の押し出し機およびコニーダーなどの公知の混練方法を用いて溶融混練した後にシート状に成型する方法や、原材料を有機溶剤、例えば、トルエン、キシレン、クロルベンゼンなどの芳香族系、メチルエチルケトン、メチルケトン、メチルイソブチルケトンなどのケトン系、ジメチルホルムアミド、ジメチルアセトアミド、Nメチルピロリドンなどの非プロトン系極性溶剤単独あるいは混合物に溶解・分散した後に、基材層、例えばシリコーン、フッ素、アルキド化合物などを処理したポリエステルフィルムに、塗布し乾燥することによって作製することができる。特に溶剤に溶解・分散させてから基材層に塗布し乾燥させる方法はより薄い膜を形成することができることから好ましい。
The ratio (S2 / S1) of the breaking strength S1 of the resin sheet for electronic parts before curing to the breaking strength S2 of the resin sheet for electronic parts after heating at 200 ° C. for 5 minutes is preferably 1.5 or more, and more preferably Preferably it is 1.8 or more. By improving the breaking strength of the adhesive sheet at 200 ° C. for 5 minutes, the function as the adhesive can be imparted only by the bonding process in a short time, and the production tact can be shortened.
The adhesive sheet for electronic components of the present invention may have a protective film on one side or both sides. The protective film referred to in the present invention is not particularly limited as long as it protects the surface of the resin sheet for electronic parts and can be peeled off from the resin sheet for electronic parts, but polyester films coated with silicone, fluorine compound, alkyd compound etc., polyolefin A film etc. are mentioned. Although the thickness of a protective film is not specifically limited, 10-100 micrometers is common Next, the example of the manufacturing method of the resin composition for electronic components of this invention is demonstrated.
The resin composition for electronic parts of the present invention can be prepared by melt-kneading, for example, into a sheet after melt-kneading using a known kneading method such as Banbury mixer, kneader roll, uniaxial or biaxial extruder and co-kneader. A method of molding, an organic solvent, for example, an aromatic solvent such as toluene, xylene, chlorobenzene, etc., a ketone system such as methyl ethyl ketone, methyl ketone, methyl isobutyl ketone, a non-proton such as dimethyl formamide, dimethyl acetamide, N methyl pyrrolidone etc. After dissolving / dispersing in a polar solvent alone or in a mixture, it can be prepared by coating and drying on a substrate layer, for example, a polyester film treated with silicone, fluorine, an alkyd compound or the like. In particular, a method of dissolving and dispersing in a solvent, and then applying and drying on a substrate layer is preferable because a thinner film can be formed.
本発明の電子部品用樹脂組成物を用いた電子部品用樹脂シートの使用方法は特に限定されるものではないが、基材と基材の間に配置し加熱硬化して使用することができる。また、特に、基板上に実装された複数の電子部品を覆うように上述の電子部品用樹脂シートを配置し加熱成形して、前記複数の電子部品および前記基板の表面に圧着させ硬化させて電子部品装置集合体を作製することができる。 Although the usage method of the resin sheet for electronic components using the resin composition for electronic components of this invention is not specifically limited, It arrange | positions between a base material and a base material, and it can be heat-hardened and used. Further, in particular, the above-mentioned resin sheet for electronic parts is disposed so as to cover a plurality of electronic parts mounted on a substrate, and is heat-formed to be crimped and cured on the surfaces of the plurality of electronic parts and the substrate. Component device assemblies can be made.
上記のような、基板上に実装された複数の電子部品により形成された凹凸に本発明の電子部品用樹脂シートを追従させるには、低硬度のゴム材料を用いて上述の電子部品用樹脂シートに圧力を加えて前記複数の電子部品および前記基板の表面に密着させることが好ましい。 In order to make the resin sheet for electronic parts of the present invention follow the irregularities formed by the plurality of electronic parts mounted on the substrate as described above, the resin sheet for electronic parts described above using a rubber material of low hardness Preferably, pressure is applied to the plurality of electronic components and the surface of the substrate.
低硬度のゴム材料は公知のものが使用できるが、加工温度での加工をする際の耐熱性の点からシリコーンゴムが好ましく、凹凸追従性の点からアスカー硬度50未満のものが好ましい。このとき、ゴム材料に付着した異物が電子部品用樹脂シートに転写することを防止するため、離型性が高く、かつ電子部品実装により形成された凹凸に追従するフィルム材料をゴム材料と電子部品用樹脂シートの間に介することが好ましい。離型製が高く、電子部品実装により形成された凹凸に追従するフィルム材料の一例として、スミライトCELシリーズ(住友ベークライト株式会社製)、オピュランシリーズ(三井化学東セロ株式会社製)などが挙げられるがこれに限定されるものではない。 Known low-hardness rubber materials can be used, but silicone rubber is preferable from the viewpoint of heat resistance when processing at processing temperature, and one having an Asker hardness of less than 50 is preferable from the viewpoint of unevenness followability. At this time, in order to prevent transfer of foreign substances attached to the rubber material to the resin sheet for electronic parts, the film material having high releasability and following the unevenness formed by mounting the electronic parts is rubber material and electronic parts It is preferable to intervene between the resin sheets. As an example of a film material that is high in mold release and follows irregularities formed by electronic component mounting, the Sumilight CEL series (made by Sumitomo Bakelite Co., Ltd.), the Opyuran series (made by Mitsui Chemicals Tosoh Co., Ltd.), etc. Is not limited to this.
加工の際に圧力を加える方式は特に限定されないが、内部に気泡が残留しないよう、公知の真空ラミネータを使用することが好ましい。真空ラミネータの一例として株式会社名機製作所製真空加圧ラミネータMVLPなどが挙げられるがこれに限定されるものではない。加工圧力は電子部品用樹脂シートが電子部品実装により形成された凹凸に追従できる範囲であれば特に限定されるものではないが、電子部品にかかる圧力を低くすることがより好ましい。 The method of applying pressure during processing is not particularly limited, but it is preferable to use a known vacuum laminator so that air bubbles do not remain inside. As an example of a vacuum laminator, a vacuum pressure laminator MVLP manufactured by Meiki Co., Ltd. may be mentioned, but the invention is not limited thereto. The processing pressure is not particularly limited as long as the resin sheet for electronic components can follow the unevenness formed by mounting the electronic components, but it is more preferable to lower the pressure applied to the electronic components.
本発明の電子部品用樹脂シートは、上述の通りフリップチップ実装された半導体素子を基板上に複数有する電子部材に好ましく用いることができ、さらには上記電子部品用樹脂シートを密着、硬化した後の電子部品の前記基板と前記半導体素子との間に空間が存在するような電子部品装置集合体の製造に好ましく用いることができる。 The resin sheet for electronic parts of the present invention can be preferably used for an electronic member having a plurality of semiconductor elements flip-chip mounted as described above on a substrate, and further, after the resin sheet for electronic parts is adhered and cured. It can be preferably used in the manufacture of an electronic component device assembly in which a space exists between the substrate of the electronic component and the semiconductor element.
前記電子部品装置集合体はダイシングにより個片化し、電子部品装置としてもちいることができる。 The electronic component device assembly can be singulated by dicing and used as an electronic component device.
以下に、本発明を実施例に基づいて具体的に説明するが、本発明はこれに限定されるものではない。なお、各実施例において略号で示した原料の詳細を以下に示す。 Hereinafter, the present invention will be specifically described based on examples, but the present invention is not limited thereto. In addition, the detail of the raw material shown with the symbol in each Example is shown below.
<アクリル系共重合体1>
混合機及び冷却器を備えた反応器に窒素雰囲気下にて、アクリロニトリル(和光純薬社製、特級)106g(2.00モル)、ブチルアクリレート(和光純薬社製、特級)231g(1.80モル)、グリシジルメタクリレート(和光純薬社製、特級)28g(0.20モル)、溶媒としてメチルエチルケトン(和光純薬社製、一級)を2900g入れ、大気圧(1013hPa)下、85℃に加熱し、さらに連鎖移動剤として2―エチルヘキシルメルカプトアセテート(和光純薬社製)を0.001g、重合開始剤としてアゾビスイソブチロニトリル(和光純薬社製、V−60)を0.002g加えし、重量平均分子量が70万となるまで重合した。重量平均分子量は、GPC(ゲルパーミエーションクロマトグラフィー)法(装置:東ソー社製GELPERMEATION CHROMATOGRAPH、カラム:東ソー社製TSK−GEL GMHXL7.8×300mm)により測定し、ポリスチレン換算で算出した。
これにより、モル比がアクリロニトリル:ブチルアクリレート:グリシジルメタクリレート=50:45:5(重量平均分子量70万)のアクリル系共重合体1を得た。
<
Acrylonitrile (Wako Pure Chemical Industries, Ltd., special grade) 106 g (2.00 mol) and butyl acrylate (Wako Pure Chemical Industries, special grade) 231 g (1. 80 mol), 28 g (0.20 mol) of glycidyl methacrylate (manufactured by Wako Pure Chemical Industries, Ltd., special grade), 2900 g of methyl ethyl ketone (manufactured by Wako Pure Chemical Industries, Ltd., first grade) as a solvent are added and heated to 85 ° C. under atmospheric pressure (1013 hPa) And 0.001 g of 2-ethylhexyl mercaptoacetate (manufactured by Wako Pure Chemical Industries, Ltd.) as a chain transfer agent, and 0.002 g of azobisisobutyronitrile (V-60 manufactured by Wako Pure Chemical Industries, Ltd.) as a polymerization initiator. It polymerized until the weight average molecular weight became 700,000. The weight average molecular weight was measured by GPC (gel permeation chromatography) method (apparatus: GELPERMEATION CHROMATOGRAPH manufactured by Tosoh Corp., column: TSK-GEL GMHXL 7.8 × 300 mm manufactured by Tosoh Corp.), and calculated in terms of polystyrene.
Thus, an
<アクリル系共重合体2>
混合機及び冷却器を備えた反応器に窒素雰囲気下にて、エチルアクリレート(和光純薬社製、特級)200g(2.00モル)、ブチルアクリレート(和光純薬社製、特級)118g(0.920モル)、グリシジルメタクリレート(和光純薬社製、特級)22g(0.155モル)、溶媒としてメチルエチルケトン(和光純薬社製、一級)を3000g入れ、大気圧(1013hPa)下、85℃に加熱し、さらに連鎖移動剤として2―エチルヘキシルメルカプトアセテート(和光純薬社製)を0.001g、重合開始剤としてアゾビスイソブチロニトリル(和光純薬社製、V−60)を0.001g加え、重量平均分子量が120万となるまで重合した。重量平均分子量の測定方法は上記アクリル系共重合体1と同様の方法で行った。
<
In a reactor equipped with a mixer and a condenser, under a nitrogen atmosphere, 200 g (2.00 moles) of ethyl acrylate (manufactured by Wako Pure Chemical Industries, Ltd., special grade), 118 g (0 grade of butyl acrylate (manufactured by Wako Pure Chemical Industries, Ltd., special grade) 920 g), 22 g (0.155 mol) of glycidyl methacrylate (manufactured by Wako Pure Chemical Industries, Ltd., special grade), 3000 g of methyl ethyl ketone (manufactured by Wako Pure Chemical Industries, Ltd., first grade) as a solvent is added to 85 ° C. under atmospheric pressure (1013 hPa) The mixture is heated, and 0.001 g of 2-ethylhexyl mercaptoacetate (manufactured by Wako Pure Chemical Industries, Ltd.) as a chain transfer agent, and 0.001 g of azobisisobutyronitrile (manufactured by Wako Pure Chemical Industries, V-60) as a polymerization initiator In addition, polymerization was performed until the weight average molecular weight reached 1.2 million. The measurement method of the weight average molecular weight was performed by the same method as that of the above-mentioned
<エポキシ樹脂>
ビスフェノールA型エポキシ樹脂(“EPICLON”1050、エポキシ当量:450−500、DIC株式会社、常温で固形、軟化点:64−74)
<無機充填剤>
球状シリカ(SO−E1、平均粒径0.25μm(株)アドマテックス製)
<硬化剤1>
ノボラック型フェノール樹脂(H−1、明和化成株式会社製)
<硬化剤2>
レゾール型フェノール樹脂(PS−2655,群栄化学工業株式会社製)
<硬化剤3>
4,4’−ジアミノジフェニルスルホン(“セイカキュア”S、アミン当量62、株式会社セイカ製)
<硬化促進剤1>
2,4−ジアミノ−6−[2‘−ウンデシルイミダゾリル−(1’)]−エチルーs−トリアジン(C11Z−A、四国化成工業株式会社製)
<硬化促進剤2>
2,4−ジアミノ−6−[2‘−メチルイミダゾリル―(1’)]−エチル−s−トリアジンイソシアヌル酸付加物(2MAOK−PW、四国化成工業株式会社製)
<硬化促進剤3>
2−ウンデシルイミダゾール(C11Z、四国化成工業株式会社製)。
<Epoxy resin>
Bisphenol A type epoxy resin ("EPIC LON" 1050, epoxy equivalent: 450-500, DIC Corporation, solid at normal temperature, softening point: 64-74)
<Inorganic filler>
Spherical silica (SO-E1, average particle size 0.25 μm (manufactured by Admatex Co., Ltd.))
<
Novolak-type phenolic resin (H-1, manufactured by Meiwa Kasei Co., Ltd.)
<
Resol type phenolic resin (PS-2655, manufactured by Gunei Chemical Industry Co., Ltd.)
<
4,4'-Diaminodiphenyl sulfone ("Seikacure" S, amine equivalent 62, manufactured by Seika Co., Ltd.)
<
2,4-Diamino-6- [2′-undecylimidazolyl- (1 ′)]-ethyl-s-triazine (C11Z-A, manufactured by Shikoku Kasei Kogyo Co., Ltd.)
<
2,4-Diamino-6- [2'-methylimidazolyl- (1 ')]-ethyl-s-triazine isocyanuric acid adduct (2MAOK-PW, manufactured by Shikoku Kasei Kogyo Co., Ltd.)
<
2-undecylimidazole (C11Z, manufactured by Shikoku Kasei Kogyo Co., Ltd.).
<破断伸度測定>
各実施例および比較例で作製した厚さ12μmのポリプロピレンフィルム(東レ株式会社製トレファン)、本発明の接着シートおよびシリコーン離型剤付き厚さ38μmのポリエチレンテレフタレートフィルム(リンテック株式会社製PET38X)がこの順に積層された積層体から、ポリプロピレンフィルムおよびポリエチレンテレフタレートフィルムを剥離して接着シートのみのフィルムとし、これをチャック間サンプル長40mm、幅5mmの条件で引張試験器(UCT100型、(株)オリエンテック製)にて50mm/分の速度、25℃で引張り試験を行ない、破断に至るまでの応力ひずみ曲線を記録し、破断伸度を求めた。
また、室温で1週間放置した後の破断伸度測定を実施し、接着剤シートのポットライフを評価した。
<Breaking elongation measurement>
The 12 μm-thick polypropylene film (Torefan manufactured by Toray Industries, Inc.), the adhesive sheet of the present invention, and the 38 μm-thick polyethylene terephthalate film (PET38X manufactured by Lintec Co., Ltd.) with a silicone mold A polypropylene film and a polyethylene terephthalate film are peeled off from the laminate laminated in this order to make a film of only an adhesive sheet, and this is used as a tensile tester (UCT 100 type, Inc. Co., Ltd.) under the conditions of a sample length of 40 mm and a width of 5 mm. Tensile test at a speed of 50 mm / min at 25 ° C., and the stress-strain curve up to breakage was recorded, and the elongation at break was determined.
Moreover, the breaking elongation measurement after leaving it to stand at room temperature for 1 week was implemented, and the pot life of an adhesive agent sheet was evaluated.
<破断強度測定>
各実施例および比較例で作製した厚さ12μmのポリプロピレンフィルム(東レ株式会社製トレファン)、本発明の接着シートおよびシリコーン離型剤付き厚さ38μmのポリエチレンテレフタレートフィルム(リンテック株式会社製PET38X)がこの順に積層された積層体から、ポリプロピレンフィルムおよびポリエチレンテレフタレートフィルムを剥離して接着シートのみのフィルムとし、これをチャック間サンプル長40mm、幅5mmの条件で引張試験器(UCT100型、(株)オリエンテック製)にて50mm/分の速度、25℃で引張り試験を行ない、破断に至るまでの応力ひずみ曲線を記録し、破断強度S1を求めた。また、200℃5分の加熱処理を実施したサンプルについても同様に試験を実施し、加熱後の破断強度S2を求めた。
<Break strength measurement>
The 12 μm-thick polypropylene film (Torefan manufactured by Toray Industries, Inc.), the adhesive sheet of the present invention, and the 38 μm-thick polyethylene terephthalate film (PET38X manufactured by Lintec Co., Ltd.) with a silicone mold A polypropylene film and a polyethylene terephthalate film are peeled off from the laminate laminated in this order to make a film of only an adhesive sheet, and this is used as a tensile tester (UCT 100 type, Inc. Co., Ltd.) under the conditions of a sample length of 40 mm and a width of 5 mm. A tensile test was carried out at a speed of 50 mm / min at 25 ° C., and a stress-strain curve up to breakage was recorded, and a breaking strength S1 was determined. Moreover, the test was similarly implemented also with respect to the sample which implemented heat processing for 5 minutes at 200 degreeC, and breaking strength S2 after heating was calculated | required.
<被覆性評価>
複数の電子部品が実装された基板の表面を電子部品被覆用熱硬化性接着剤組成物で被覆する際の被覆性につき、以下の手順で評価した。
複数の電子部品が実装された基板として、アルミナ基板上に幅0.9mm×長さ1.1mm×高さ0.5mmの評価用Siチップを高さ0.06mmの半田バンプを介してフリップチップ実装した基板を用いた。Siチップは10cm×10cmのアルミナ基板上の中心部分に5行×5列実装され、実装されたSiチップの間隔につき1.0mm、0.5mm、0.3mm、0.2mmの4種を準備した。
<Coverability evaluation>
The coatability when the surface of a substrate on which a plurality of electronic components are mounted is coated with a thermosetting adhesive composition for electronic component coating was evaluated in the following procedure.
As a substrate on which a plurality of electronic components are mounted, an evaluation Si chip of width 0.9 mm × length 1.1 mm × height 0.5 mm is flip-chiped on an alumina substrate via solder bumps of height 0.06 mm. The mounted substrate was used. The Si chips are mounted 5 rows x 5 columns in the center on a 10cm x 10cm alumina substrate, and four types of 1.0mm, 0.5mm, 0.3mm and 0.2mm are prepared for the spacing of the mounted Si chips. did.
アスカー硬度20のシリコーンゴム上に上記の複数の電子部品が実装された基板をSiチップが上になる様に置き、更にその上に離型フィルムを剥離した接着剤シートを置き、更に耐熱性離型フィルム“オピュラン”(三井化学東セロ(株)製)CR1031(厚み150μm)を置き、更にアスカー硬度20の厚さ2.5mmのシリコーンゴムを置き、これを真空引き時間30秒、温度100℃、真空加圧0.5MPaの条件で株式会社名機製作所製MVLPを用いて真空ラミネートを実施した。
接着剤による被覆後の外観につき接着剤シートがアルミナ基板上にSiチップ実装により形成された凹凸に追従しているかを顕微鏡観察により判定した。接着剤シートが破れず、かつ凹部まで十分に追従しているものを◎と判定し、接着剤シートが破れているものや、凹部まで十分に追従していない箇所が2カ所以上のものは×と判定し、接着剤シートが破れてはおらず、かつ、凹部まで十分に追従していない箇所が1カ所のみのものは○とした(図1参照)。
上記試験を室温で一週間放置したサンプルでも同様に行い、ポットライフ性を確認した。
The substrate with the above electronic components mounted on a silicone rubber with Asker hardness 20 is placed with the Si chip on top, and then an adhesive sheet with the release film peeled off is placed on the substrate, and heat resistance separation is further performed. Film “Opyuran” (made by Mitsui Chemicals Tosoh Co., Ltd.) CR1031 (thickness 150 μm) and further silicone rubber with a thickness of 2.5 mm with an Asker hardness of 20, and this is evacuated for 30 seconds at a temperature of 100 ° C. Vacuum lamination was carried out using MVLP manufactured by Meiki Engineering Co., Ltd. under the conditions of vacuum pressurization of 0.5 MPa.
Regarding the appearance after the coating with the adhesive, it was judged by microscopic observation whether the adhesive sheet follows the unevenness formed by mounting the Si chip on the alumina substrate. The adhesive sheet is not torn, and it is determined that the adhesive sheet follows sufficiently to the concave as 凹 部, and the adhesive sheet is torn, or the position which does not sufficiently follow to the concave is two or more places It was judged that the adhesive sheet was not torn, and the adhesive sheet was ○ (see FIG. 1) if there was only one place which did not sufficiently follow the recess.
The above-described test was similarly performed on a sample left at room temperature for one week to confirm the pot life.
<剥離強度測定>
厚み30μmの接着剤層を、厚さ0.5mmの純銅板表面に130℃、0.5MPaの条件で積層した。この接着剤付きの純銅板に、ポリイミドフィルム(宇部興産(株)製、”ユーピレックス”75S)を130℃、0.5MPaの条件で、接着剤層側に貼り合わせた。作成したサンプルを200℃、5分、0.3MPaで加熱加圧キュア処理を行った。得られたサンプルのポリイミドフィルムと接着剤層を幅5mmになるようにカッターで切断し、90°方向に50mm/minの速度で接着剤層とポリイミドフィルム界面、あるいは接着剤層と純銅板界面で剥離し、そのときにかかった力を剥離強度とした。加工性やハンドリング性、モールド性、および半導体装置の信頼性の観点より、硬化状態での接着力は6N/cm以上であることが望ましい。剥離強度の測定はTOYOBALDWIN社製TENSILON/UTM−4−100で行った。
<Peeling strength measurement>
An adhesive layer having a thickness of 30 μm was laminated on the surface of a pure copper plate having a thickness of 0.5 mm at 130 ° C. and 0.5 MPa. A polyimide film ("UPILEX" 75S, manufactured by Ube Industries, Ltd., "UPILEX" 75S) was bonded to the adhesive layer side at 130 ° C. and 0.5 MPa to the pure copper plate with the adhesive. The prepared sample was subjected to heat and pressure curing treatment at 200 ° C., 5 minutes, and 0.3 MPa. The polyimide film and adhesive layer of the obtained sample are cut by a cutter so that the width becomes 5 mm, and the interface between the adhesive layer and the polyimide film or the interface between the adhesive layer and the pure copper plate at a speed of 50 mm / min in 90 ° direction. It peeled, and the force applied at that time was made into peeling strength. The adhesive strength in the cured state is preferably 6 N / cm or more from the viewpoints of processability, handleability, moldability, and reliability of the semiconductor device. The peel strength was measured with TENSILON / UTM-4-100 manufactured by TOYOBALDWIN.
実施例1
表1に示した組成になるようにエラストマー、エポキシ樹脂、無機充填剤、硬化促進剤、硬化剤を混合した。続いて固形分濃度が25質量%になるようにメチルエチルケトンを加えて、30℃で5時間撹拌し、樹脂組成物用の塗料を作製した。なお、表中の各成分の数値は質量部を表す。
Example 1
The elastomer, the epoxy resin, the inorganic filler, the curing accelerator, and the curing agent were mixed so as to have the composition shown in Table 1. Then, methyl ethyl ketone was added so that solid content concentration might be 25 mass%, and it stirred at 30 degreeC for 5 hours, and prepared the coating material for resin compositions. In addition, the numerical value of each component in a table represents a mass part.
この樹脂組成物溶液をバーコータで、シリコーン離型剤付き厚さ38μmのポリエチレンテレフタレートフィルム(リンテック株式会社製PET38C)に乾燥後の厚みが30μmになるように塗布し、110℃で5分間乾燥し、厚さ12μmのポリプロピレンフィルム(東レ株式会社製トレファン)を貼り合わせて、シリコーン離型剤付き厚さ38μmのポリエチレンテレフタレートフィルム(リンテック株式会社製PET38)、電子部品用接着シートおよび厚さ12μmのポリプロピレンフィルム(東レ株式会社製トレファン)がこの順に積層された電子部品用樹脂シートを作製し、評価した。 The resin composition solution is applied by a bar coater to a 38 μm thick polyethylene terephthalate film (PET 38C manufactured by Lintec Corporation) with a silicone release agent so that the thickness after drying is 30 μm, and dried at 110 ° C. for 5 minutes. A 12 μm thick polypropylene film (Torayan made by Toray Industries, Inc.) is bonded together, and a 38 μm thick polyethylene terephthalate film (Lintech Co., Ltd. PET38) with a silicone release agent, an adhesive sheet for electronic parts and a 12 μm thick polypropylene A resin sheet for electronic parts in which a film (Torefan made by Toray Industries, Inc.) was laminated in this order was produced and evaluated.
実施例2〜8、比較例1〜3
各組成の種類、配合量を表1に記載のとおり変更した以外は実施例1と同様にして、シリコーン離型剤付き厚さ38μmのポリエチレンテレフタレートフィルム(リンテック株式会社製PET38C)、電子部品用樹脂シートおよび厚さ12μmのポリプロピレンフィルム(東レ株式会社製トレファン)がこの順に積層された積層体(電子部品用樹脂シート厚み30μm)を作製し、評価した。
Examples 2-8, Comparative Examples 1-3
A polyethylene terephthalate film (PET 38C manufactured by Lintec Corp.) having a thickness of 38 μm with a silicone mold release agent was used in the same manner as in Example 1 except that the type and blending amount of each composition were changed as described in Table 1 A sheet (a resin sheet for electronic parts having a thickness of 30 μm) in which a sheet and a polypropylene film having a thickness of 12 μm (Torefan made by Toray Industries, Inc.) were laminated in this order was produced and evaluated.
1 パッケージ基板
2 素子
3 シート状材料
4 バンプ
5 配線
6 基板内部配線
7 外部電極
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JP2020164655A (en) * | 2019-03-29 | 2020-10-08 | 東レ株式会社 | Resin composition for electronic components and resin sheet for electronic components |
JP2021123626A (en) * | 2020-02-03 | 2021-08-30 | 三菱ケミカル株式会社 | Adhesive Compositions, Adhesives, Adhesive Sheets, and Laminates |
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