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JP2019011238A - Tool material for firing - Google Patents

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JP2019011238A
JP2019011238A JP2018124288A JP2018124288A JP2019011238A JP 2019011238 A JP2019011238 A JP 2019011238A JP 2018124288 A JP2018124288 A JP 2018124288A JP 2018124288 A JP2018124288 A JP 2018124288A JP 2019011238 A JP2019011238 A JP 2019011238A
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firing
silicon carbide
tool material
setter
sintered body
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JP7220527B2 (en
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裕 岡田
Hiroshi Okada
裕 岡田
啓祐 小林
Keisuke Kobayashi
啓祐 小林
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Coorstek KK
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Abstract

To provide a tool material for firing achieving weight saving and low heat capacity, and moderate surface roughness.SOLUTION: A tool material for firing 1 is a tool material for firing which mounts an article to be fired thereon and is accommodated in a firing furnace together with the article to be fired, the tool material for firing is composed of a silicon carbide body, and at least the thickness of a part 3 for mounting the article to be fired thereon is 0.2 mm or more and 1 mm or less and the porosity is 15% or more and 60% or less.SELECTED DRAWING: Figure 1

Description

本発明は焼成用道具材に関し、セラミック電子部品等の焼成、熱処理用に使用される焼成用道具材に関する。   The present invention relates to a firing tool material, and relates to a firing tool material used for firing and heat treatment of ceramic electronic components and the like.

例えば、セッター、サヤ、匣鉢等のセラミック電子部品等の焼成、熱処理用に使用される焼成用道具材には、炭化珪素質焼結体が用いられている。これら焼成用道具材については、炉詰め効率の向上、焼成コスト低減の観点からますます薄肉化が要求され、特許文献1,2に示す炭化珪素質高温構造材料、薄板状炭化珪素焼結体が提案されている。   For example, silicon carbide-based sintered bodies are used for firing tool materials used for firing and heat treatment of ceramic electronic parts such as setters, sheaths, and mortars. These firing tool materials are required to be thinner from the standpoint of improving the furnace packing efficiency and reducing the firing cost, and the silicon carbide high-temperature structural materials and thin plate-like silicon carbide sintered bodies disclosed in Patent Documents 1 and 2 are used. Proposed.

具体的に説明すると、特許文献1では、厚さが0.5〜3mmで100cm 以上の面積を有する相対密度90%以上の板状炭化珪素質焼結体からなり、ドクターブレード法により成形したグリーンシートを積層、焼成して形成され、焼成後未加工の状態で表面粗さ(Ra)が1.0μm以下、反り(C)が0.1%以下である炭化珪素質高温構造材料が提案されている。
更に、この特許文献1では、炭化珪素粉末からなるスラリーからドクターブレード法により形成したグリーンシートを積層し、積層されたグリーンシートの表面のうち所定部分を表面粗さ(Ra)5μm以上に粗面化したのち焼成し、ついで粗面化された表面部分に溶射によりジルコニアを含有する被覆層を形成する炭化珪素質高温構造材料の製造方法が提案されている。
Specifically, in Patent Document 1, it is composed of a plate-like silicon carbide sintered body having a thickness of 0.5 to 3 mm and a relative density of 90% or more having an area of 100 cm 2 or more, and is molded by a doctor blade method. Proposed silicon carbide-based high-temperature structural material that is formed by laminating and firing green sheets, and has an unprocessed surface roughness (Ra) of 1.0 μm or less and warpage (C) of 0.1% or less after firing. Has been.
Further, in Patent Document 1, green sheets formed by a doctor blade method from a slurry made of silicon carbide powder are laminated, and a predetermined portion of the surface of the laminated green sheets is roughened to a surface roughness (Ra) of 5 μm or more. A method of manufacturing a silicon carbide-based high-temperature structural material is proposed in which a coating layer containing zirconia is formed on the roughened surface portion by thermal spraying.

また、特許文献2では、平均粒径1μm以下の炭化珪素微粉末に焼結助剤、分散剤、有機バインダ、可塑剤、および有機溶剤を混合したスラリーからドクターブレード法によってグリーンシートを作成し、これを脱脂後、焼成する製造工程において、炭化珪素粉末100重量部に対して有機バインダを10〜20重量部、可塑剤を8〜15重量部添加することを特徴とする相対密度が90%以上の薄板状炭化珪素焼結体の製造方法が提案されている。   Further, in Patent Document 2, a green sheet is prepared by a doctor blade method from a slurry in which a sintering aid, a dispersant, an organic binder, a plasticizer, and an organic solvent are mixed with silicon carbide fine powder having an average particle size of 1 μm or less, In the manufacturing process of degreasing and firing this, 10 to 20 parts by weight of an organic binder and 8 to 15 parts by weight of a plasticizer are added to 100 parts by weight of silicon carbide powder, and the relative density is 90% or more. A method for producing a thin plate-like silicon carbide sintered body has been proposed.

特開2002−316874JP 2002-316874 A 特開平10−297971JP 10-297971 A

ところで、セラミック電子部品の焼成には、例えば、ローラーハースキルンに代表される連続炉が用いられ、年々焼成速度(昇温速度、降温速度)の高速化が進められている。
しかしながら、被焼成物が積載されるセッターなどの焼成用道具材の熱容量が大きい場合、焼成用道具材の温度は、炉内温度の昇降に追従するのが困難になり、意図したヒートカーブ(焼成速度特性)での焼成ができないという技術的課題があった。
By the way, for firing ceramic electronic components, for example, a continuous furnace represented by roller hearth kiln is used, and the firing rate (temperature increase rate, temperature decrease rate) is increasing year by year.
However, when the heat capacity of a baking tool material such as a setter on which the object to be fired is loaded is large, it becomes difficult for the temperature of the baking tool material to follow the rise and fall of the furnace temperature, and the intended heat curve (firing) There was a technical problem that firing with speed characteristics was not possible.

この焼成用道具材の温度が炉内温度に迅速に追従し、意図したヒートカーブ(焼成速度特性)での焼成を実行するためには、上記特許文献1、2に示された炭化珪素質焼結体よりも、さらに薄く、軽量化、低熱容量化を図る必要があった。   In order to quickly follow the temperature of the firing tool material to the furnace temperature and perform firing at the intended heat curve (firing rate characteristics), the silicon carbide firing described in Patent Documents 1 and 2 above is performed. It was necessary to achieve a thinner, lighter, and lower heat capacity than the bonded body.

また、この焼成用道具材の被焼成物が載置される表面には、焼成用道具材と被焼成物の付着を防止するための難反応性のジルコニア層が必要である。特許文献1では、密着力を向上させるために表面を粗面化加工し、粗面化された表面部分に溶射によりジルコニアを含有する被覆層を形成することが示されている。
この特許文献1に示されたジルコニアを含有する被覆層の形成には、粗面化加工が必要不可欠であり、生産コストが嵩むという課題があった。
Further, a hardly reactive zirconia layer for preventing adhesion of the firing tool material and the material to be fired is required on the surface of the firing tool material to be fired. Patent Document 1 discloses that the surface is roughened in order to improve adhesion, and a coating layer containing zirconia is formed on the roughened surface portion by thermal spraying.
In the formation of the coating layer containing zirconia shown in Patent Document 1, roughening is indispensable, and there is a problem that production costs increase.

本願発明者らは、このような状況下で鋭意研究し、従来の厚さよりも厚さが薄い、0.2mm〜1mmとし、気孔率を15%〜60%とすることで低密度とした炭化珪素質焼結体を用いた焼成用道具材を想到するに至り、本発明を完成した。
また、気孔率を15%〜60%とすることで、焼成用道具材の炭化珪素質焼結体の表面粗さを、適度な表面粗さとすることができ、この表面にプラズマ溶射でコーティングすることで密着性の良い被膜が得られることを知見し、本発明を完成した。
The inventors of the present application have conducted intensive research under such circumstances, and have made the carbonization low density by making the thickness thinner than the conventional thickness, 0.2 mm to 1 mm, and the porosity of 15% to 60%. The inventors came up with a firing tool material using a silicon-based sintered body and completed the present invention.
Moreover, by setting the porosity to 15% to 60%, the surface roughness of the silicon carbide sintered body of the firing tool material can be set to an appropriate surface roughness, and this surface is coated by plasma spraying. As a result, it was found that a film having good adhesion could be obtained, and the present invention was completed.

本発明は、上記状況のもとなされたものであり、軽量化、低熱容量化を実現すると共に、適度な表面粗さを実現した焼成用道具材を提供することを目的とする。   The present invention has been made under the above circumstances, and an object of the present invention is to provide a baking tool material that realizes light weight and low heat capacity, and realizes an appropriate surface roughness.

上記目的を達成するためになされた、本発明にかかる焼成用道具材は、被焼成物を載置し、前記被焼成物と共に焼成炉内に収容される焼成用道具材であって、前記焼成用道具材は炭化珪素焼結体からなり、かつ、少なくとも被焼成物を載置する部分の厚みが0.2mm以上1mm以下、かつ気孔率が15%以上60%以下であることを特徴としている。
このように、少なくとも被焼成物を載置する部分の厚みが0.2mm以上1mm以下、かつ気孔率が15%以上60%以下である焼成用道具材は、軽量化、低熱容量化を図ることができ、焼成用道具材の温度を炉内温度に迅速に追従させることができ、意図したヒートカーブ(焼成速度特性)での焼成を行うことができる。
The firing tool material according to the present invention made to achieve the above object is a firing tool material on which a material to be fired is placed and accommodated in a firing furnace together with the material to be fired. The tool material is made of a silicon carbide sintered body, and is characterized in that the thickness of at least the portion on which the object is placed is 0.2 mm or more and 1 mm or less and the porosity is 15% or more and 60% or less. .
As described above, the firing tool material having a thickness of at least 0.2 mm to 1 mm and a porosity of 15% to 60% at least on the part on which the object to be fired is placed should be reduced in weight and heat capacity. Thus, the temperature of the firing tool material can be made to quickly follow the furnace temperature, and firing can be performed with the intended heat curve (firing rate characteristics).

ここで、少なくとも被焼成物を載置する部分の炭化珪素焼結体の表面に、SiO層を有することが望ましい。
炭化珪素焼結体(SiC)は、酸素が存在する高温域(おおよそ700℃以上)で酸化が進む。この酸化によって焼成炉内の酸素濃度が変化する。特に、被焼成物を載置する部分を含む近傍の酸素濃度が変化するという問題が生じる。
上記したように少なくとも被焼成物を載置する部分の炭化珪素焼結体の表面に、SiO層を形成することで、炭化珪素焼結体(SiC)の酸化を抑制でき、焼成炉内の酸素濃度をコントロールすることができる。
Here, it is desirable to have an SiO 2 layer on at least the surface of the silicon carbide sintered body where the object to be fired is placed.
The silicon carbide sintered body (SiC) undergoes oxidation in a high temperature region (approximately 700 ° C. or higher) where oxygen is present. This oxidation changes the oxygen concentration in the firing furnace. In particular, there arises a problem that the oxygen concentration in the vicinity including the portion where the object to be fired is placed changes.
As described above, by forming the SiO 2 layer on at least the surface of the silicon carbide sintered body where the object to be fired is placed, the oxidation of the silicon carbide sintered body (SiC) can be suppressed, The oxygen concentration can be controlled.

また、前記炭化珪素焼結体に対し、酸化重量増加率が5%以上10%以下であることが望ましい。
このように、酸化重量増加率が5%以上10%以下の範囲内で、炭化珪素焼結体の表面にSiO層を形成することで、焼成用道具材として十分な強度を得ることができ、また表面に溶射膜を形成した場合でも剥離することのない焼成用道具材を得ることができる。
Moreover, it is desirable that the rate of increase in the oxidized weight is 5% or more and 10% or less with respect to the silicon carbide sintered body.
As described above, by forming the SiO 2 layer on the surface of the silicon carbide sintered body within the range where the increase rate of the oxidized weight is 5% or more and 10% or less, sufficient strength as a firing tool material can be obtained. In addition, it is possible to obtain a firing tool material that does not peel even when a sprayed film is formed on the surface.

また、前記炭化珪素焼結体に対し、酸化重量増加率が5%以上10%以下である場合には、曲げ強度が100MPa以上200MPa以下の焼成用道具材を得ることができる。
前記曲げ強度が100MPa未満の場合には、耐久性が劣り、走行中に割れ等の破損が生じるおそれがある。
Moreover, when the oxidation weight increase rate is 5% or more and 10% or less with respect to the silicon carbide sintered body, a tool material for firing having a bending strength of 100 MPa or more and 200 MPa or less can be obtained.
When the bending strength is less than 100 MPa, the durability is inferior and breakage such as cracks may occur during traveling.

また、前記SiO層の表面に、さらにムライト、アルミナ、ジルコニアの少なくとも1種のプラズマ溶射膜を有することが望ましい。
前記したように気孔率が15%〜60%であるため、表面の表面粗さを適度な表面粗さとすることができ、表面にプラズマ溶射でコーティングした際、密着性の良いプラズマ溶射膜を形成することができる。
Moreover, it is desirable to further have at least one plasma sprayed film of mullite, alumina, or zirconia on the surface of the SiO 2 layer.
As described above, since the porosity is 15% to 60%, the surface roughness of the surface can be set to an appropriate surface roughness, and when the surface is coated with plasma spraying, a plasma sprayed film having good adhesion is formed. can do.

本発明によれば、軽量化、低熱容量化を実現すると共に、適度な表面粗さを実現した焼成用道具材を得ることができる。   According to the present invention, it is possible to obtain a baking tool material that realizes a light weight and a low heat capacity, and also realizes an appropriate surface roughness.

図1は、本発明にかかる実施形態を示す図であって、(a)は平面図、(b)は側面図である。FIG. 1 is a diagram showing an embodiment according to the present invention, in which (a) is a plan view and (b) is a side view. 図2は、本発明にかかる実施形態の表面状態を示す図である。FIG. 2 is a diagram showing a surface state of the embodiment according to the present invention.

本発明にかかる焼成用道具材の実施の形態について説明する。この実施形態では焼成用道具材として、セッターを例にとって説明する。
セッター1は、図1に示すように、上面2と、下面3とから構成されている。
そして、このセッター1の上面2に、セラミック電子部品等の被焼成物が載置され、例えば、ローラーハースキルンに代表される連続炉(焼成炉)で、被焼成物が焼成される。
An embodiment of a baking tool material according to the present invention will be described. In this embodiment, a setter will be described as an example of a baking tool material.
As shown in FIG. 1, the setter 1 includes an upper surface 2 and a lower surface 3.
And to-be-fired materials, such as a ceramic electronic component, are mounted in the upper surface 2 of this setter 1, for example, a to-be-fired material is baked by the continuous furnace (baking furnace) represented by the roller hearth kiln.

このセッター1は、炭化珪素焼結体で構成されている。
そして、上面2における少なくとも被焼成物を載置する部分の厚みtが、0.2mm以上1mm以下、かつ気孔率が15%以上60%以下に構成されている。この被焼成物を載置する部分とは、被焼成物を載置する領域を含む上面2の一部を意味するが、上面2の一部に限定されるものではなく、底板部全体の厚さを0.2mm以上1mm以下、かつ気孔率を15%以上60%以下としても良い。
This setter 1 is comprised with the silicon carbide sintered compact.
And the thickness t of the part which mounts a to-be-fired material in the upper surface 2 is 0.2 mm or more and 1 mm or less, and the porosity is 15% or more and 60% or less. The portion on which the object to be fired is placed means a part of the upper surface 2 including the region on which the object to be fired is placed, but is not limited to a part of the upper surface 2, and the thickness of the entire bottom plate portion. The thickness may be 0.2 mm to 1 mm, and the porosity may be 15% to 60%.

ここで、厚みtを0.2mm以上1mm以下としたのは、セッター1(焼成用道具材)の軽量化、低熱容量化のためである。
このように、セッター1の低熱容量化が望まれるのは、セッター1の熱容量が大きいと被焼成物の加熱に要する熱量に比べ、セッター1の加熱に要する熱量割合が大きくなり、要求される焼成速度が得られない(高速化ができない)ためである。
セッター1(焼成用道具材)の熱容量は、セッター(焼成用道具材)材質の比熱[J/(K・g)]×セッター(焼成用道具材)重量[g]で算出され、熱容量を低減するにはセッター(焼成用道具材)重量をより小さくしなければならない。一方、厚さが厚さ0.2mm未満ではハンドリングが難しく、破損する虞がある。
したがって、前記厚みは0.2mm以上1mm以下であるのが好ましい。
Here, the reason why the thickness t is set to 0.2 mm or more and 1 mm or less is to reduce the weight and the heat capacity of the setter 1 (baking tool material).
Thus, a reduction in the heat capacity of the setter 1 is desired because if the heat capacity of the setter 1 is large, the amount of heat required for heating the setter 1 is larger than the amount of heat required for heating the object to be fired, and the required baking is required. This is because the speed cannot be obtained (the speed cannot be increased).
The heat capacity of setter 1 (baking tool material) is calculated by the specific heat [J / (K · g)] of the setter (baking tool material) x setter (baking tool material) weight [g], reducing the heat capacity. To do this, the setter (baking tool material) weight must be reduced. On the other hand, if the thickness is less than 0.2 mm, handling is difficult and there is a risk of breakage.
Therefore, the thickness is preferably 0.2 mm or more and 1 mm or less.

また、気孔率を15%以上60%以下とするのは、セッター1(焼成用道具材)の軽量化、低熱容量化、量産性のためである。また、セッター1(焼成用道具材)に形成されるジルコニア層の密着性の向上のためである。セッター1(焼成用道具材)の表面にジルコニア層を設ける場合は、前記セッターの上下面に形成するのが好ましい。   The reason why the porosity is 15% or more and 60% or less is to reduce the weight, lower heat capacity, and mass productivity of the setter 1 (baking tool material). Moreover, it is for the improvement of the adhesiveness of the zirconia layer formed in the setter 1 (tool material for baking). When a zirconia layer is provided on the surface of the setter 1 (baking tool material), it is preferably formed on the upper and lower surfaces of the setter.

セッター1は大量に使用されるため、量産性の高いプレス成形、ドクターブレード等のシート成形での製造が好ましいが、これらの製法では60%以上の気孔率を有するセッターの製造は難しい。またスラリーを発砲させキャスティングする等の方法は高気孔率化することができるが、製造コストが高くなる。また、厚みを0.2mm以上1mm以下とした場合、気孔率が60%を超える場合には、機械的強度が弱くなり、製造時の歩留低下、使用時の割れ発生が頻繁になる等のデメリットがある。
したがって、前記気孔率は60%以下とするのが好ましい。
Since the setter 1 is used in a large amount, it is preferable to produce it by press molding with high mass productivity and sheet molding such as a doctor blade. However, it is difficult to produce a setter having a porosity of 60% or more by these production methods. In addition, the method of firing the slurry and casting can increase the porosity, but the manufacturing cost becomes high. In addition, when the thickness is 0.2 mm or more and 1 mm or less, when the porosity exceeds 60%, the mechanical strength is weakened, the yield decreases during production, and cracks occur frequently during use. There are disadvantages.
Therefore, the porosity is preferably 60% or less.

一方、気孔率を15%未満の場合には、セッター(焼成用道具材)の重量が大きり、また熱容量が大きくなる。そのため、セッターの加熱に要する熱量割合が大きくなり、要求される焼成速度が得られず(高速化ができない)、好ましくない。
また、気孔率を15%未満の場合には、表面粗さが小さく、セッターに形成されるジルコニア層が剥離する虞がある。
したがって、前記気孔率は15%以下とするのが好ましい。
On the other hand, if the porosity is less than 15%, the weight of the setter (baking tool material) is large and the heat capacity is large. For this reason, the ratio of the amount of heat required for heating the setter is increased, and the required firing rate cannot be obtained (the speed cannot be increased).
Moreover, when the porosity is less than 15%, the surface roughness is small, and the zirconia layer formed on the setter may be peeled off.
Therefore, the porosity is preferably 15% or less.

このセッター1の気孔Vの状態を図2に示す。この図2は、セッター1(炭化珪素焼結体)の表面(SiO層を形成した状態(プラズマ溶射膜を形成していない状態))を、電子顕微鏡を用いて、1000倍に拡大した組織図である。
セッター1は気孔Vと粒子Pとから形成されている。前記粒子Pは、平均粒径5〜25μmであり、互いに連結していることが好ましい。気孔Vは、連通気孔であり通気性を有している。
The state of the pores V of the setter 1 is shown in FIG. FIG. 2 shows a structure in which the surface of the setter 1 (silicon carbide sintered body) (the state in which the SiO 2 layer is formed (the state in which the plasma sprayed film is not formed)) is enlarged 1000 times using an electron microscope. FIG.
The setter 1 is formed of pores V and particles P. The particles P preferably have an average particle diameter of 5 to 25 μm and are connected to each other. The air holes V are continuous air holes and have air permeability.

また、少なくとも被焼成物を載置する部分の炭化珪素焼結体の表面に、SiO層が形成されている。
このSiO層の形成方法は、下記化学式に示すように、大気、酸素、酸素を含む混合ガス雰囲気で800℃〜1600℃で加熱し、SiC表面を酸化することにより、SiO層を形成する(酸化処理)。
SiC+3/2O→ SiO+CO
Further, the surface of the silicon carbide sintered body of the portion for mounting at least the baked product, SiO 2 layer is formed.
As shown in the following chemical formula, this SiO 2 layer is formed by heating at 800 ° C. to 1600 ° C. in a mixed gas atmosphere containing air, oxygen, and oxygen to oxidize the SiC surface to form the SiO 2 layer. (Oxidation treatment).
SiC + 3 / 2O 2 → SiO 2 + CO

このように、セッター1(炭化珪素焼結体)の表面に、SiO層を形成することで、炭化珪素焼結体(SiC)の酸化を抑制でき、焼成炉内の酸素濃度変化を抑制できる。
尚、被焼成物を載置する部分とは、被焼成物を載置する領域を含む上面2の一部を意味するが、上面2の一部に限定されるものではなく、上面全体に形成しても良い。特に、セッター1全体に、SiO層を形成するのがより好ましい。
Thus, by forming the SiO 2 layer on the surface of the setter 1 (silicon carbide sintered body), the oxidation of the silicon carbide sintered body (SiC) can be suppressed, and the oxygen concentration change in the firing furnace can be suppressed. .
The portion on which the object to be fired is placed means a part of the upper surface 2 including the region on which the object to be fired is placed, but is not limited to a part of the upper surface 2 and is formed on the entire upper surface. You may do it. In particular, it is more preferable to form a SiO 2 layer on the entire setter 1.

少なくとも被焼成物を載置する部分の炭化珪素焼結体の表面のSiO層に、更にムライト、アルミナ、ジルコニアの少なくともいずれかまたは複数がプラズマ溶射法等でプラズマ溶射膜が形成されていることが好ましい。
SiC(SiO)上に直接積載して焼成できないセラミック電子部品(たとえば誘電体のBaTiO等)用の焼成用道具材の表面には、ジルコニアやアルミナ等の層を設ける必要がある。
At least one or more of mullite, alumina, zirconia or a plasma sprayed film is formed by a plasma spraying method or the like on the SiO 2 layer on the surface of the silicon carbide sintered body at least on the part on which the object to be fired is placed. Is preferred.
It is necessary to provide a layer of zirconia, alumina or the like on the surface of a firing tool material for ceramic electronic parts (for example, dielectric BaTiO 2 or the like) that cannot be fired by being directly loaded on SiC (SiO 2 ).

このプラズマ溶射膜は、ムライト、アルミナ、ジルコニアのいずれかの一つの溶射膜でも良いが、ムライト、アルミナ、ジルコニアから選択される複数の溶射膜であっても良い。
特に、SiCに比較してジルコニア膜は熱膨張が大きいため、両層の間に中間の熱膨張を有するムライト膜、アルミナ膜を順に形成すると、夫々の溶射膜は剥離し難く、優れた耐剥離性を有する。
The plasma sprayed film may be one of mullite, alumina, or zirconia, or may be a plurality of sprayed films selected from mullite, alumina, and zirconia.
In particular, since the zirconia film has a larger thermal expansion than SiC, when a mullite film having an intermediate thermal expansion and an alumina film are formed in order between the two layers, each sprayed film is difficult to peel off and has excellent peeling resistance. Have sex.

前記プラズマ溶射膜の厚さは、より薄い方が熱膨張の影響が小さくなるため極力薄くすることが好ましく、20μm〜160μm程度が好ましい。
また、このプラズマ溶射膜の形成は、公知の方法、例えば、プラズマ溶射、スラリー塗布焼き付け、コールドスプレー、エアロゾルデポジションなどの方法が適用できる。
The thickness of the plasma sprayed film is preferably as thin as possible because the influence of thermal expansion is smaller as the thickness is thinner, and is preferably about 20 μm to 160 μm.
The plasma sprayed film can be formed by a known method such as plasma spraying, slurry coating and baking, cold spraying, aerosol deposition, or the like.

次に、このセッターの製造方法について説明する。   Next, a method for manufacturing the setter will be described.

まず、セッターの成形には、ドクターブレード法によるシート成形、プレス成形法によるシート成形が好ましい。そして、ドクターブレード法で得られたグリーンシート、プレス法で得られた成形体を非酸化雰囲気で脱脂(400℃〜800℃)、焼成(2100℃以上)し焼結体を得る。   First, for the molding of the setter, sheet molding by a doctor blade method or sheet molding by a press molding method is preferable. Then, the green sheet obtained by the doctor blade method and the compact obtained by the press method are degreased (400 ° C. to 800 ° C.) and fired (2100 ° C. or higher) in a non-oxidizing atmosphere to obtain a sintered body.

具体的に一例を挙げれば、炭化珪素原料と有機溶剤、分散剤、バインダ、可塑剤を混合したスラリーから、ドクターブレード法によってグリーンシートを作製し、脱バインダ後、焼成することにより行われる。   To give a specific example, a green sheet is produced by a doctor blade method from a slurry in which a silicon carbide raw material and an organic solvent, a dispersant, a binder and a plasticizer are mixed.

前記炭化珪素原料は、特に限定されるものではなく、市販されているものを使用できる。
溶媒としては、例えば、プロパノール、ベンゼン、トルエン、ヘキサン、水等を用いることができる。
The silicon carbide raw material is not particularly limited, and commercially available products can be used.
As the solvent, for example, propanol, benzene, toluene, hexane, water and the like can be used.

また、バインダとしては、PVB(ポリビニルブチラール)、メチルセルロース、PVA(ポリビニルアルコール)、アクリル等を用いることができる。また、可塑剤としては、DBP(フタル酸ジブチル)、DEHP(フタル酸ビス(2−エチルヘキシル))、BBP(フタル酸ブチルベンジル)等を用いることができる。   As the binder, PVB (polyvinyl butyral), methyl cellulose, PVA (polyvinyl alcohol), acrylic, or the like can be used. As the plasticizer, DBP (dibutyl phthalate), DEHP (bis (2-ethylhexyl) phthalate), BBP (butyl benzyl phthalate), or the like can be used.

前記焼成後、SiO層の形成がなされる。
このSiO層は、大気、酸素、酸素を含む混合ガス雰囲気で800℃〜1600℃で加熱し、SiC表面を酸化することによって形成される。
After the firing, a SiO 2 layer is formed.
The SiO 2 layer is formed by heating at 800 ° C. to 1600 ° C. in a mixed gas atmosphere containing air, oxygen, and oxygen to oxidize the SiC surface.

更に、前記SiO層の形成後、セラミックコンデンサ、サーミスタ、フェライトコア、LTCCのような電子部品を焼成する場合、セッターとこれら電子部品とが反応しないよう、電子部品との反応が最も少ないジルコニアを電子部品との接触個所に被覆することが行われる。ジルコニア膜の膜厚は、10μm〜200μm程度である。 Furthermore, after firing the SiO 2 layer, when firing electronic components such as ceramic capacitors, thermistors, ferrite cores, LTCC, zirconia that has the least reaction with the electronic components is selected so that the setter does not react with these electronic components. Covering the contact points with the electronic component is performed. The film thickness of the zirconia film is about 10 μm to 200 μm.

また、SiCに比較してジルコニア膜は熱膨張が大きいため、両層の間に中間の熱膨張を有するムライト膜、アルミナ膜を順に形成するのが好ましく、優れた耐剥離性を有する。
このときのムライト膜の膜厚は、10μm〜200μm程度である。また、アルミナ膜の膜厚は、10μm〜200μm程度である。
Moreover, since the zirconia film has a larger thermal expansion than SiC, it is preferable to sequentially form a mullite film having an intermediate thermal expansion and an alumina film between the two layers, and has excellent peeling resistance.
The film thickness of the mullite film at this time is about 10 μm to 200 μm. The film thickness of the alumina film is about 10 μm to 200 μm.

以下、本発明を実施例に基づいてさらに具体的に説明するが、本発明は、下記実施例により限定解釈されるものではない。下記実施例及び比較例では、薄い平板状のセッターを用いた。   EXAMPLES Hereinafter, although this invention is demonstrated further more concretely based on an Example, this invention is not limitedly interpreted by the following Example. In the following examples and comparative examples, a thin flat setter was used.

(実験1)
以下の実施例1乃至6及び比較例1,2に示すように、多孔質炭化珪素焼結体の気孔率を変化させ、被膜の剥離の状況を検証した。
(実施例1)
平均粒径4.5μmの炭化珪素原料に、溶媒としてエタノール、バインダとしてポリビニルブチラール(PVB)、可塑剤としてフタル酸ジブチル(DBP)をボールミルにて混合しスラリーを作製した。
このスラリーを用いてドクターブレード法にて、シート厚さが0.5mmになるようにスラリー厚さを調整してグリーンシートを作製した。
そして、このグリーンシートをアルゴン雰囲気中で、2300℃で焼結(再結晶)させ、縦150mm、横150mm、厚さ0.5mmの多孔質の薄板状の炭化珪素焼結体を得た。
(Experiment 1)
As shown in Examples 1 to 6 and Comparative Examples 1 and 2 below, the porosity of the porous silicon carbide sintered body was changed, and the state of peeling of the film was verified.
Example 1
A silicon carbide raw material having an average particle diameter of 4.5 μm was mixed with ethanol as a solvent, polyvinyl butyral (PVB) as a binder, and dibutyl phthalate (DBP) as a plasticizer by a ball mill to prepare a slurry.
Using this slurry, a green sheet was prepared by adjusting the slurry thickness so that the sheet thickness was 0.5 mm by a doctor blade method.
The green sheet was sintered (recrystallized) at 2300 ° C. in an argon atmosphere to obtain a porous thin plate-like silicon carbide sintered body having a length of 150 mm, a width of 150 mm, and a thickness of 0.5 mm.

この炭化珪素焼結体を大気中1400℃で加熱し、SiC表面にSiO層を形成した。
この炭化珪素焼結体の重量は23g、見掛け気孔率は39%であった。この見掛け気孔率は、JIS R 2205に基づいて測定した。
更に、その表面にプラズマ溶射にて、ムライト溶射層を30μmの厚さで形成し、さらにその表面にジルコニア溶射層を30μm形成した。
This silicon carbide sintered body was heated in the atmosphere at 1400 ° C. to form a SiO 2 layer on the SiC surface.
This silicon carbide sintered body had a weight of 23 g and an apparent porosity of 39%. This apparent porosity was measured based on JIS R 2205.
Further, a mullite sprayed layer having a thickness of 30 μm was formed on the surface by plasma spraying, and a zirconia sprayed layer was further formed on the surface by 30 μm.

そして、得られた薄板状のセッターを、ローラーハースキルンにて通炉試験(最高昇温速度(℃/H)=100,000)を行った。
その結果、表1に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。
The obtained thin plate-like setter was subjected to a furnace test (maximum heating rate (° C./H)=100,000) using a roller hearth kiln.
As a result, as shown in Table 1, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film.

(実施例2)
実施例1と同様の方法で、厚さ0.25mmのグリーンシートを作製し、実施例1と同様の焼成、酸化処理、溶射を行い、セッターを作製した。この溶射前の炭化珪素焼結体の重量は11g、見掛け気孔率は39%であった。
その結果、表1に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。
(Example 2)
A green sheet having a thickness of 0.25 mm was produced in the same manner as in Example 1, and the same firing, oxidation treatment and thermal spraying as in Example 1 were performed to produce a setter. The silicon carbide sintered body before spraying had a weight of 11 g and an apparent porosity of 39%.
As a result, as shown in Table 1, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film.

(実施例3)
平均粒径5.3μmの炭化珪素原料に、有機バインダとしてメチルセルロ―ス、水を添加し、プレス成形用の造粒粉を作製した。この造粒粉を1軸プレスにて成形圧力100MPaで成形し、縦150mm、横150mm、厚さ0.8mmのSiC成形体を得た。以降、実施例1と同様の焼成、酸化処理、溶射を行い、セッターを作製した。
溶射前の炭化珪素焼結体の重量は43g、見掛け気孔率は21%であった。
その結果、表1に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。
(Example 3)
Methyl cellulose and water were added as an organic binder to a silicon carbide raw material having an average particle size of 5.3 μm to produce granulated powder for press molding. The granulated powder was molded by a uniaxial press at a molding pressure of 100 MPa to obtain a SiC molded body having a length of 150 mm, a width of 150 mm, and a thickness of 0.8 mm. Thereafter, firing, oxidation treatment, and thermal spraying were performed in the same manner as in Example 1 to produce a setter.
The weight of the silicon carbide sintered body before spraying was 43 g, and the apparent porosity was 21%.
As a result, as shown in Table 1, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film.

(実施例4)
平均粒径2.0μmの炭化珪素原料を用いて、見掛け気孔率、厚さを変えた炭化珪素焼結体を得た。具体的には、平均粒径2.0μmの炭化珪素原料を用いた以外は実施例1と同様の方法で、厚さ0.4mmのグリーンシートを作製し、実施例1と同様の焼成、酸化処理、溶射を行い、セッターを作製した。この溶射前の炭化珪素焼結体の重量は11g、見掛け気孔率は60%であった。
その結果、表1に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。
(Example 4)
Using a silicon carbide raw material having an average particle size of 2.0 μm, a silicon carbide sintered body having different apparent porosity and thickness was obtained. Specifically, a green sheet having a thickness of 0.4 mm was produced in the same manner as in Example 1 except that a silicon carbide raw material having an average particle diameter of 2.0 μm was used, and the same firing and oxidation as in Example 1 were performed. Treatment and thermal spraying were performed to prepare a setter. The silicon carbide sintered body before spraying had a weight of 11 g and an apparent porosity of 60%.
As a result, as shown in Table 1, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film.

(実施例5)
平均粒径5.0μmの炭化珪素原料を用いて、見掛け気孔率、厚さを変えた炭化珪素焼結体を得た。具体的には、平均粒径5.0μmの炭化珪素原料を用いた以外は実施例1と同様の方法で、厚さ0.2mmのグリーンシートを作製し、実施例1と同様の焼成、酸化処理、溶射を行い、セッターを作製した。この溶射前の炭化珪素焼結体の重量は12g、見掛け気孔率は15%であった。
その結果、表1に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。
(Example 5)
Using a silicon carbide raw material having an average particle size of 5.0 μm, a silicon carbide sintered body having different apparent porosity and thickness was obtained. Specifically, a green sheet having a thickness of 0.2 mm was produced in the same manner as in Example 1 except that a silicon carbide raw material having an average particle diameter of 5.0 μm was used. Treatment and thermal spraying were performed to prepare a setter. The silicon carbide sintered body before spraying had a weight of 12 g and an apparent porosity of 15%.
As a result, as shown in Table 1, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film.

(実施例6)
平均粒径4.0μmの炭化珪素原料を用いて、見掛け気孔率、厚さを変えた炭化珪素焼結体を得た。具体的には、平均粒径4.0μmの炭化珪素原料を用いた以外は実施例3と同様の方法で、厚さ1mmのグリーンシートを作製し、実施例3と同様の焼成、酸化処理、溶射を行い、セッターを作製した。この溶射前の炭化珪素焼結体の重量は38g、見掛け気孔率は45%であった。
その結果、表1に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。
(Example 6)
Using a silicon carbide raw material having an average particle size of 4.0 μm, a silicon carbide sintered body having different apparent porosity and thickness was obtained. Specifically, a green sheet having a thickness of 1 mm was produced in the same manner as in Example 3 except that a silicon carbide raw material having an average particle size of 4.0 μm was used, and the same firing and oxidation treatment as in Example 3 were performed. Thermal spraying was performed to prepare a setter. The weight of the silicon carbide sintered body before spraying was 38 g, and the apparent porosity was 45%.
As a result, as shown in Table 1, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film.

(比較例1)
平均粒径サブミクロンオーダーの炭化珪素原料に、焼結助剤としてホウ素とカーボンを加え、有機溶剤としてエタノール、分散剤としてマレイン系ポリアニオン、バインダとしてポリビニルブチラール(PVB)、可塑剤としてフタル酸ジブチル(DBP)をボールミルにて混合しスラリーを作製した。
このスラリーを用いてドクターブレード法にてシート厚さ1mmのグリーンシートを作製した。
このグリーンシートを4層重ね、圧着し、得られたシートをアルゴン雰囲気中2150℃で加熱し、多孔質の薄板状の炭化珪素焼結体を得た。薄板状の炭化珪素焼結体の重量は70gで気孔率は0%であった。この炭化珪素焼結体にプラズマ溶射を行ったが、剥離が発生し、溶射層を形成することはできなかった。その結果を表1に示す。
(Comparative Example 1)
Add boron and carbon as sintering aids to silicon carbide raw material of average particle size submicron order, ethanol as organic solvent, maleic polyanion as dispersant, polyvinyl butyral (PVB) as binder, dibutyl phthalate as plasticizer ( DBP) was mixed with a ball mill to prepare a slurry.
Using this slurry, a green sheet having a sheet thickness of 1 mm was prepared by a doctor blade method.
Four layers of this green sheet were stacked and pressure-bonded, and the resulting sheet was heated at 2150 ° C. in an argon atmosphere to obtain a porous thin plate-like silicon carbide sintered body. The weight of the thin plate-like silicon carbide sintered body was 70 g, and the porosity was 0%. Plasma spraying was performed on this silicon carbide sintered body, but peeling occurred and a sprayed layer could not be formed. The results are shown in Table 1.

(比較例2)
平均粒径サブミクロンオーダーの炭化珪素原料に、焼結助剤としてホウ素とカーボンを加え、有機バインダとしてメチルセルロ―ス、水を添加し、プレス成形用の造粒粉を作製した。
この造粒粉を1軸プレスにて成形圧力100MPaで成形し、縦150mm、横150mm、厚さ2mmのSiC成形体を得た。
この成形体を比較例1と同様の方法で焼成し、多孔質の薄板状の炭化珪素焼結体を得た。この炭化珪素焼結体の重量は140g、気孔率は0%であった。この炭化珪素焼結体にプラズマ溶射を行ったが、被膜の剥離が発生し、溶射層を形成することはできなかった。その結果を表1に示す。
(Comparative Example 2)
Boron and carbon were added as a sintering aid to silicon carbide raw material with an average particle size of submicron order, and methyl cellulose and water were added as organic binders to produce granulated powder for press molding.
The granulated powder was molded by a uniaxial press at a molding pressure of 100 MPa to obtain a SiC molded body having a length of 150 mm, a width of 150 mm, and a thickness of 2 mm.
This molded body was fired in the same manner as in Comparative Example 1 to obtain a porous thin plate-like silicon carbide sintered body. This silicon carbide sintered body had a weight of 140 g and a porosity of 0%. Plasma spraying was performed on this silicon carbide sintered body, but peeling of the coating occurred and a sprayed layer could not be formed. The results are shown in Table 1.

上記実施例1〜6から分かるように、多孔質炭化珪素焼結体(気孔率15%〜60%)で肉薄成形したセッター重量(溶射前)は11g〜43gと、比較例1、2の緻密質炭化珪素焼結体(気孔率0%)の70g〜140gに比較して半分以下に軽量化され、重量に比例する熱容量も低減される。   As can be seen from Examples 1 to 6, the setter weight (before thermal spraying) thinly molded with a porous silicon carbide sintered body (porosity 15% to 60%) was 11 g to 43 g, which is the denseness of Comparative Examples 1 and 2. Compared to 70 g to 140 g of the sintered silicon carbide (porosity 0%), the weight is reduced to half or less, and the heat capacity proportional to the weight is also reduced.

また、上記実施例1〜6では、連続炉(ローラーハースキルン)を高速で通炉させても割れ等の不具合はなく、また被膜の剥離も生じなかった。
一方、比較例1、2の緻密質炭化珪素焼結体では表面が滑らかなため、プラズマ溶射での被膜形成が剥離し、好ましいものではなかった。この剥離を防止するためには、表面を粗面化加工する必要がある。
即ち、本発明にかかる焼成用道具材にあっては、表面の気孔に溶射膜が食い込み、アンカー効果が働き、良好な密着性が得られる。
Moreover, in the said Examples 1-6, even if it let the continuous furnace (roller hearth kiln) pass at high speed, there were no malfunctions, such as a crack, and peeling of the film did not arise.
On the other hand, in the dense silicon carbide sintered bodies of Comparative Examples 1 and 2, since the surface was smooth, film formation by plasma spraying was peeled off, which was not preferable. In order to prevent this peeling, it is necessary to roughen the surface.
That is, in the firing tool material according to the present invention, the sprayed film bites into the pores on the surface, the anchor effect works, and good adhesion is obtained.

(実験2)
以下の実施例7乃至9及び比較例3、4に示すように、多孔質炭化珪素焼結体の酸化重量増加率を変化させ、被膜の剥離の状況、焼成用道具材の状況を検証した。
(実施例7)
実施例1と同様に、平均粒径4.5μmの炭化珪素原料に、溶媒としてエタノール、バインダとしてポリビニルブチラール(PVB)、可塑剤としてフタル酸ジブチル(DBP)をボールミルにて混合しスラリーを作製した。
このスラリーを用いてドクターブレード法にて、シート厚さが0.25mmになるようにスラリー厚さを調整してグリーンシートを作製した。
そして、このグリーンシートをアルゴン雰囲気中で、2300℃で焼結(再結晶)させ、縦150mm、横150mm、厚さ0.25mmの多孔質の薄板状の炭化珪素焼結体を得た。
(Experiment 2)
As shown in Examples 7 to 9 and Comparative Examples 3 and 4 below, the rate of increase in the oxidized weight of the porous silicon carbide sintered body was changed, and the state of peeling of the film and the state of the tool material for firing were verified.
(Example 7)
As in Example 1, a silicon carbide raw material having an average particle size of 4.5 μm was mixed with ethanol as a solvent, polyvinyl butyral (PVB) as a binder, and dibutyl phthalate (DBP) as a plasticizer in a ball mill to prepare a slurry. .
Using this slurry, a green sheet was prepared by adjusting the slurry thickness so that the sheet thickness was 0.25 mm by the doctor blade method.
The green sheet was sintered (recrystallized) at 2300 ° C. in an argon atmosphere to obtain a porous thin plate-like silicon carbide sintered body having a length of 150 mm, a width of 150 mm, and a thickness of 0.25 mm.

この炭化珪素焼結体を大気中1350℃で加熱し、SiC表面にSiO層を形成した。この溶射前の炭化珪素焼結体の重量は10.9g、見掛け気孔率は39%であった。
このときの酸化重量増加率は、5.8%であった。この酸化重量増加率は、酸化処理前の重量をW0、酸化処理後の重量をW1とし、(W1−W0)/W0 ×100(%)によって求めた。
また、曲げ強度は、103MPaであった。
この曲げ強度は、75mm×30mm×T(厚さ)mmを試料とし、スパン30mmでの3点曲げ試験によって求めた。
This silicon carbide sintered body was heated in air at 1350 ° C. to form a SiO 2 layer on the SiC surface. The weight of the silicon carbide sintered body before spraying was 10.9 g, and the apparent porosity was 39%.
At this time, the rate of increase in oxidized weight was 5.8%. The rate of increase in oxidation weight was determined by (W1−W0) / W0 × 100 (%), where W0 represents the weight before the oxidation treatment and W1 represents the weight after the oxidation treatment.
The bending strength was 103 MPa.
The bending strength was obtained by a three-point bending test with a span of 30 mm using 75 mm × 30 mm × T (thickness) mm as a sample.

更に、その表面にプラズマ溶射にて、ムライト溶射層を30μmの厚さで形成し、さらにその表面にジルコニア溶射層を30μm形成した。   Further, a mullite sprayed layer having a thickness of 30 μm was formed on the surface by plasma spraying, and a zirconia sprayed layer was further formed on the surface by 30 μm.

そして、得られた薄板状のセッターを、ローラーハースキルンにて通炉試験(最高昇温速度(℃/H)=100,000)を行った。
その結果、表2に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。また、セッターの割れ、破損等がなく、良好であることが判明した。
The obtained thin plate-like setter was subjected to a furnace test (maximum heating rate (° C./H)=100,000) using a roller hearth kiln.
As a result, as shown in Table 2, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film. Further, it was found that the setter was satisfactory without cracking or breakage.

(実施例8)
炭化珪素焼結体のSiC表面にSiO層を形成する温度を1450℃とし、他の条件は実施例7と同一とした。
(Example 8)
The temperature for forming the SiO 2 layer on the SiC surface of the silicon carbide sintered body was 1450 ° C., and the other conditions were the same as those in Example 7.

この溶射前の炭化珪素焼結体の重量は11.1g、見掛け気孔率は38%であった。
このときの酸化重量増加率は、7.9%であった。また、曲げ強度は、140MPaであった。
更に、その表面にプラズマ溶射にて、ムライト溶射層を30μmの厚さで形成し、さらにその表面にジルコニア溶射層を30μm形成した。
The silicon carbide sintered body before spraying had a weight of 11.1 g and an apparent porosity of 38%.
At this time, the rate of increase in oxidized weight was 7.9%. The bending strength was 140 MPa.
Further, a mullite sprayed layer having a thickness of 30 μm was formed on the surface by plasma spraying, and a zirconia sprayed layer was further formed on the surface by 30 μm.

そして、得られた薄板状のセッターを、ローラーハースキルンにて通炉試験(最高昇温速度(℃/H)=100,000)を行った。
その結果、表2に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。また、セッターの割れ、破損等がなく、良好であることが判明した。
The obtained thin plate-like setter was subjected to a furnace test (maximum heating rate (° C./H)=100,000) using a roller hearth kiln.
As a result, as shown in Table 2, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film. Further, it was found that the setter was satisfactory without cracking or breakage.

(実施例9)
炭化珪素焼結体のSiC表面にSiO層を形成する温度を1550℃とし、他の条件は実施例7と同一とした。
Example 9
The temperature for forming the SiO 2 layer on the SiC surface of the silicon carbide sintered body was 1550 ° C., and the other conditions were the same as those in Example 7.

この溶射前の炭化珪素焼結体の重量は11.3g、見掛け気孔率は36%であった。
このときの酸化重量増加率は、9.4%であった。また、曲げ強度は、189MPaであった。
更に、その表面にプラズマ溶射にて、ムライト溶射層を30μmの厚さで形成し、さらにその表面にジルコニア溶射層を30μm形成した。
The weight of the silicon carbide sintered body before spraying was 11.3 g, and the apparent porosity was 36%.
At this time, the rate of increase in oxidized weight was 9.4%. The bending strength was 189 MPa.
Further, a mullite sprayed layer having a thickness of 30 μm was formed on the surface by plasma spraying, and a zirconia sprayed layer was further formed on the surface by 30 μm.

そして、得られた薄板状のセッターを、ローラーハースキルンにて通炉試験(最高昇温速度(℃/H)=100,000)を行った。
その結果、表2に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であることが確認された。また、セッターの割れ、破損等がなく、良好であることが判明した。
The obtained thin plate-like setter was subjected to a furnace test (maximum heating rate (° C./H)=100,000) using a roller hearth kiln.
As a result, as shown in Table 2, the furnace was passed five times, but the setter film was not peeled off, and it was confirmed that the film was a good film. Further, it was found that the setter was satisfactory without cracking or breakage.

(実施例10)
炭化珪素焼結体のSiC表面にSiO層を形成する温度を1200℃とし、他の条件は実施例7と同一とした。
(Example 10)
The temperature for forming the SiO 2 layer on the SiC surface of the silicon carbide sintered body was 1200 ° C., and other conditions were the same as those in Example 7.

この溶射前の炭化珪素焼結体の重量は10.7g、見掛け気孔率は43%であった。
このときの酸化重量増加率は、4.1%であった。また、曲げ強度は70MPaであった。
更に、その表面にプラズマ溶射にて、ムライト溶射層を30μmの厚さで形成し、さらにその表面にジルコニア溶射層を30μm形成した。
The weight of the silicon carbide sintered body before spraying was 10.7 g, and the apparent porosity was 43%.
At this time, the rate of increase in oxidized weight was 4.1%. The bending strength was 70 MPa.
Further, a mullite sprayed layer having a thickness of 30 μm was formed on the surface by plasma spraying, and a zirconia sprayed layer was further formed on the surface by 30 μm.

そして、得られた薄板状のセッターを、ローラーハースキルンにて通炉試験(最高昇温速度(℃/H)=100,000)を行った。
その結果、表2に示すように、5回通炉させたが、セッターの膜の剥離はなく、良好な被膜であったが、4回目のローラーハースキルン走行中(通炉中)にセッターの割れが生じた。
The obtained thin plate-like setter was subjected to a furnace test (maximum heating rate (° C./H)=100,000) using a roller hearth kiln.
As a result, as shown in Table 2, the furnace was passed through 5 times, but the setter film was not peeled off and was a good coating, but during the fourth roller hearth travel (while passing through the furnace) Cracking occurred.

(実施例11)
炭化珪素焼結体のSiC表面にSiO層を形成する温度を1650℃とし、他の条件は実施例7と同一とした。
(Example 11)
The temperature at which the SiO 2 layer was formed on the SiC surface of the silicon carbide sintered body was 1650 ° C., and other conditions were the same as in Example 7.

この溶射前の炭化珪素焼結体の重量は11.4g、見掛け気孔率は34%であった。
このときの酸化重量増加率は、10.8%であった。また、曲げ強度は220MPaであった。
更に、その表面にプラズマ溶射にて、ムライト溶射層を30μmの厚さで形成し、さらにその表面にジルコニア溶射層を30μm形成した。
The weight of the silicon carbide sintered body before spraying was 11.4 g, and the apparent porosity was 34%.
At this time, the rate of increase in oxidized weight was 10.8%. The bending strength was 220 MPa.
Further, a mullite sprayed layer having a thickness of 30 μm was formed on the surface by plasma spraying, and a zirconia sprayed layer was further formed on the surface by 30 μm.

そして、得られた薄板状のセッターを、ローラーハースキルンにて通炉試験(最高昇温速度(℃/H)=100,000)を行った。   The obtained thin plate-like setter was subjected to a furnace test (maximum heating rate (° C./H)=100,000) using a roller hearth kiln.

実施例7乃至11から分かるように、酸化重量増加率が5%未満の場合には、焼成用道具材として十分な強度を得ることができず、割れ等の破損が生じる虞がある。一方、酸化重量増加率が10%を越える場合、酸化処理時に高温になるため、変形する虞れや溶射膜の剥離の虞れがある。また、高温での酸化処理のため、エネルギーコスト、炉材コストが高くなり現実的ではない。したがって、酸化重量増加率が5%以上10%以下の範囲内で、炭化珪素焼結体の表面にSiO層を形成することで、焼成用道具材として十分な強度を得ることができる。 また、前記炭化珪素焼結体に対し、酸化重量増加率が5%以上10%以下である場合には、曲げ強度が100MPa以上200MPa以下の焼成用道具材を得ることができ、割れ等の破損が生じるおそれがなく、焼成用道具材としては好適に用いることができる。 As can be seen from Examples 7 to 11, when the rate of increase in oxidized weight is less than 5%, sufficient strength as a firing tool material cannot be obtained, and breakage such as cracking may occur. On the other hand, when the rate of increase in the oxidized weight exceeds 10%, the temperature becomes high during the oxidation treatment, so that there is a risk of deformation or peeling of the sprayed film. Moreover, because of the oxidation treatment at a high temperature, the energy cost and the furnace material cost increase, which is not realistic. Therefore, by forming the SiO 2 layer on the surface of the silicon carbide sintered body within the range where the increase in the oxidized weight is 5% or more and 10% or less, sufficient strength as a firing tool material can be obtained. Moreover, when the rate of increase in the oxidized weight is 5% or more and 10% or less with respect to the silicon carbide sintered body, it is possible to obtain a firing tool material having a bending strength of 100 MPa or more and 200 MPa or less, and breakage such as cracks. Can be suitably used as a baking tool material.

1 セッター
2 上面
3 下面
t 厚み
1 Setter 2 Upper surface 3 Lower surface t Thickness

Claims (5)

被焼成物を載置し、前記被焼成物と共に焼成炉内に収容される焼成用道具材であって、
前記焼成用道具材は炭化珪素焼結体からなり、
かつ、少なくとも被焼成物を載置する部分の厚みが0.2mm以上1mm以下、かつ気孔率が15%以上60%以下であることを特徴とする焼成用道具材。
A firing tool material placed on a firing object and housed in a firing furnace together with the firing object,
The firing tool material comprises a silicon carbide sintered body,
And the tool material for baking characterized by having a thickness of at least 0.2 mm or more and 1 mm or less and a porosity of 15% or more and 60% or less.
少なくとも被焼成物を載置する部分の炭化珪素焼結体の表面に、SiO層を有することを特徴とする請求項1に記載の焼成用道具材。 The firing tool material according to claim 1, further comprising an SiO 2 layer on the surface of at least a portion of the silicon carbide sintered body on which the object to be fired is placed. 前記炭化珪素焼結体に対し、酸化重量増加率が5%以上10%以下であることを特徴とする請求項2に記載の焼成用道具材。   The firing tool material according to claim 2, wherein the rate of increase in oxidized weight is 5% or more and 10% or less with respect to the silicon carbide sintered body. 曲げ強度が100MPa以上200MPa以下であることを特徴とする請求項1乃至請求項3のいずれかに記載の焼成用道具材。   The baking tool material according to any one of claims 1 to 3, wherein the bending strength is 100 MPa or more and 200 MPa or less. 前記SiO層の表面に、さらにムライト、アルミナ、ジルコニアの少なくとも1種のプラズマ溶射膜を有することを特徴とする請求項1乃至4のいずれかに記載の焼成用道具材。 The firing tool material according to any one of claims 1 to 4, further comprising at least one plasma sprayed film of mullite, alumina, or zirconia on the surface of the SiO 2 layer.
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