JP2018182217A - Substrate transfer apparatus, substrate processing apparatus with the same and teaching method of substrate transfer apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus which can stably and accurately perform teaching at a low cost, a substrate processing apparatus with the same, and a teaching method of the substrate transfer apparatus.SOLUTION: A camera is mounted on a hand of a substrate transfer apparatus. A control section 530 of the substrate transfer apparatus operates on a teaching mode. In this case, the hand moves to a tentative delivery position on the basis of positional information stored in a positional information storage section 56. Reference image data to be obtained by the camera in a state where the hand is at a regular delivery position, is stored in a reference image storage section 51. A hand position is adjusted on the basis of real image data indicating an image of a substrate support section to be actually photographed by the camera and the reference image data, and the hand moves from the tentative delivery position to the regular delivery position. The positional information stored in the positional information storage section 56 is updated on the basis of a hand position obtained by a position acquisition section 58 after adjustment of the hand position.SELECTED DRAWING: Figure 8

Description

  The present invention relates to a substrate transfer apparatus for transferring a substrate, a substrate processing apparatus including the substrate transfer apparatus, and a teaching method of the substrate transfer apparatus.

  Substrate processing equipment is used to perform various processes on various substrates such as semiconductor substrates, substrates for liquid crystal displays, substrates for plasma displays, substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, and substrates for photomasks. It is used.

  In such a substrate processing apparatus, processing is generally performed continuously on a single substrate in a plurality of processing units. Therefore, the substrate processing apparatus is provided with a substrate transfer apparatus for transferring the substrate between the plurality of processing units. In the substrate transfer apparatus, in order to accurately transfer and load a substrate into a predetermined processing unit, an operation (teaching) for adjusting the operation state is performed.

  Patent Document 1 describes a processing system including a plurality of processing chambers, and a vision system for calibrating the position of an end effector (substrate holding unit) of a robot (substrate transfer apparatus). In a vision system, a camera assembly including a camera, a power supply, a transmitter and a placement plate is transported by an end effector (substrate holder) of the robot. The position of the end effector of the robot is calibrated based on the image acquired by the camera of the camera assembly.

Japanese Patent Application Publication No. 2006-522476

  The above camera assembly is made lightweight and compact so that the end effector does not deform while the camera assembly is held by the end effector. As such, the camera assembly is expensive. Further, in the above-mentioned vision system, the camera assembly is held by the end effector for each teaching. Therefore, if the positional relationship between the camera assembly and the end effector is deviated every teaching, the teaching accuracy will vary.

  An object of the present invention is to provide a substrate transfer apparatus capable of stably performing accurate teaching at low cost, a substrate processing apparatus including the substrate transfer apparatus, and a teaching method of the substrate transfer apparatus.

  (1) A substrate transfer apparatus according to the present invention is a substrate transfer apparatus for transferring a substrate to be transferred to a substrate support unit or a substrate received from the substrate support unit, and a holding unit configured to hold a substrate; A position acquisition unit that includes a drive unit that moves the holding unit, an imaging unit that is attached to the holding unit, and a control unit that is configured to be operable in the transport mode and the teaching mode. And the position information indicating the delivery position to which the holding portion should move to transfer the substrate to the substrate supporting portion or the holding portion receives the substrate from the substrate supporting portion, and the holding portion is a regular delivery position Storage unit storing reference image data representing an image of the substrate support unit to be obtained by the imaging unit in the above state, and based on the position information stored in the storage unit in the teaching mode A movement control unit that moves the holding unit to a temporary delivery position by controlling the driving unit, and an image of the substrate support unit obtained by the imaging unit after the holding unit moves to the temporary delivery position in the teaching mode By controlling the drive unit based on the actual image data acquired by the image data acquisition unit and the reference image data stored in the storage unit in the teaching data mode, the image data acquisition unit acquiring the actual image data indicating A position adjustment unit that adjusts the position of the holding unit so that the holding unit moves from the provisional delivery position to the regular delivery position, and the position acquisition unit after adjusting the position of the holding unit by the position adjustment unit in the teaching mode A position information updating unit for updating the position information stored in the storage unit based on the acquired position; In the transport mode, to move the holding unit in the transfer position of the normal by controlling the driving unit based on the position information after being stored and updated in the storage unit.

  In the substrate transfer apparatus, while the control unit is in the teaching mode, the holding unit is moved to the temporary delivery position based on the position information stored in the storage unit. Thereafter, the position of the holding unit is adjusted based on the actual image data acquired by the image data acquisition unit and the reference image data, whereby the holding unit is moved from the provisional delivery position to the regular delivery position. The position information stored in the storage unit is updated based on the position of the holding unit acquired by the position acquisition unit after adjustment of the position of the holding unit. While the control unit is in the transport mode, the holding unit is moved to the regular delivery position based on the updated position information stored in the storage unit.

  According to the above configuration, by attaching the imaging unit to the holding unit, teaching of the holding unit is performed based on the actual image data and the reference image data acquired by the imaging unit with a simple configuration. Therefore, it is not necessary to prepare a configuration for holding the imaging unit by the holding unit every teaching. Moreover, since it is not necessary to hold the imaging unit by the holding unit every teaching, there is no variation in the positional relationship between the holding unit and the field of view of the imaging unit. As a result, accurate teaching can be stably performed at low cost.

  (2) In the teaching mode, in the teaching mode, the matching based on the image based on the actual image data acquired by the image data acquiring unit and the image based on the reference image data stored in the storage unit is a predetermined match. The position of the holder may be adjusted to be larger than the threshold value. Thus, the teaching of the holding unit can be performed accurately by simple processing.

  (3) The reference image data stored in the storage unit may be image data representing an image of the substrate supporting unit obtained by the imaging unit in a state where the holding unit is at the normal delivery position. In this case, accurate reference image data can be easily acquired using the imaging unit.

  (4) In the teaching mode, the control unit calculates a deviation between the temporary delivery position and the regular delivery position and stores the calculated deviation, and in the teaching mode, the deviation storage. When a new deviation amount is stored, the difference between the new deviation amount and the deviation amount stored in the deviation amount storage unit at the previous teaching is calculated, and the calculated difference is a predetermined difference threshold. And an alarm output unit that outputs an alarm when the value is larger than the value. With such a configuration, the user can easily know the abnormality of the substrate transfer apparatus at the time of teaching the holding unit.

  (5) The substrate transfer apparatus further includes a display unit, and the control unit controls the display control unit to control the display unit to display an image based on actual image data acquired by the image data acquisition unit in the teaching mode. It may further include.

  In this case, when teaching the holding unit, an image of the substrate supporting unit obtained by the imaging unit is displayed on the display unit. Thereby, the user can confirm the movement state of the holding unit during teaching.

  (6) In the teaching mode, the display control unit may control the display unit to superimpose and display information related to the image based on the reference image data on the image displayed on the display unit.

  Thereby, the user can confirm the movement state of the holding unit during teaching while referring to the information on the image based on the reference image data.

  (7) The substrate transfer apparatus further includes an operation unit operable by the user to correct the position of the holding unit, and the control unit is adjusted by the position adjustment unit in response to the operation of the operation unit in the teaching mode The position information updating unit further includes a position correction unit that corrects the position of the holding unit, and the position information updating unit corrects the position when the position of the holding unit adjusted by the position adjusting unit is corrected by the position correction unit in the teaching mode. After correction by the unit, the position information stored in the storage unit may be updated based on the position acquired by the position acquisition unit.

  In this case, the user can easily correct the position of the holding unit adjusted by the position adjustment unit by operating the operation unit.

  (8) A substrate processing apparatus according to the present invention is a substrate processing apparatus for processing a substrate, the processing unit having a substrate support and configured to process a substrate supported by the substrate support. The control unit of the substrate transfer apparatus transfers the substrate to be transferred to the processing unit or the substrate received from the processing unit by controlling the drive unit in the transfer mode.

  Since the substrate processing apparatus includes the above-described substrate transfer apparatus, accurate teaching of the holding unit for transferring the substrate can be stably performed at low cost. Therefore, while the increase in the cost required for the maintenance of a substrate processing apparatus is suppressed, generation | occurrence | production of the process defect of the board | substrate resulting from the conveyance defect of a board | substrate is prevented.

  (9) The teaching method of a substrate transfer apparatus according to the present invention is a teaching method of a substrate transfer apparatus for transferring a substrate to be transferred to a substrate support unit or a substrate received from a substrate support unit. The teaching method includes the steps of attaching the imaging unit to the holder, and the holder handing over the substrate to the substrate support or the holder including the holder configured to hold and the drive unit for moving the holder. Stores position information indicating the delivery position at which the holding unit should move to receive the substrate from the substrate support unit, and the image of the substrate support unit to be obtained by the imaging unit with the holding unit at the proper delivery position Provisional passing position by controlling the drive unit based on the step of storing the reference image data shown and the position information stored in the step of storing Moving the holding unit to the holding unit, acquiring the actual image data indicating the image of the substrate supporting unit obtained by the imaging unit after the holding unit has moved to the temporary delivery position, and acquiring the actual image data By controlling the drive unit based on the actual image data acquired by the control unit and the reference image data stored by the storing step, the storage unit moves from the provisional delivery position to the regular delivery position. Adjusting the position, and after adjusting the position of the holder by the adjusting step, acquiring the position of the holder and storing based on the acquired position, updating the stored position information. .

  In the teaching method of the substrate transfer apparatus, the holding unit is moved to the provisional delivery position based on the stored position information. Thereafter, the position of the holding unit is adjusted based on the acquired actual image data and the reference image data, whereby the holding unit is moved from the provisional delivery position to the regular delivery position. The stored position information is updated based on the position of the holder acquired after the adjustment of the position of the holder. In this case, when the substrate is transported using the above-described substrate transport apparatus, the drive unit is controlled based on the stored updated position information to move the holding unit accurately and easily to the proper delivery position. It will be possible to

  According to the above method, by attaching the imaging unit to the holding unit, teaching of the holding unit is performed based on the actual image data and the reference image data acquired by the imaging unit with a simple configuration. Therefore, it is not necessary to prepare a configuration for holding the imaging unit by the holding unit every teaching. Moreover, since it is not necessary to hold the imaging unit by the holding unit every teaching, there is no variation in the positional relationship between the holding unit and the field of view of the imaging unit. As a result, accurate teaching can be stably performed at low cost.

  According to the present invention, accurate teaching of the substrate transfer apparatus can be stably performed at low cost.

(A) is a plan view of a substrate transfer apparatus according to an embodiment of the present invention, (b) is a side view of the substrate transfer apparatus according to an embodiment of the present invention, (c) is the present invention 1 is a front view of a substrate transfer apparatus according to an embodiment of the present invention. (A) is a top view which shows the visual field of the camera attached to the hand of FIG. 1, (b) is a side view which shows the visual field of the camera attached to the hand of FIG. It is a block diagram which shows the structure of the control system of a board | substrate conveyance apparatus. It is a figure which shows the specific example which the board | substrate conveyance apparatus in teaching mode updates the reception position of a hand. It is a figure which shows the specific example which the board | substrate conveyance apparatus in teaching mode updates the reception position of a hand. It is a figure which shows the specific example which the board | substrate conveyance apparatus in teaching mode updates the reception position of a hand. It is a figure which shows the specific example which the board | substrate conveyance apparatus in teaching mode updates the reception position of a hand. It is a block diagram which shows the functional structure of a control part. It is a flowchart which shows operation | movement of the board | substrate conveyance apparatus in teaching mode. It is a flowchart which shows operation | movement of the board | substrate conveyance apparatus in teaching mode. 1 is a schematic plan view of a substrate processing apparatus provided with a substrate transfer apparatus according to an embodiment of the present invention. It is a side view which mainly shows the conveyance part of FIG. FIG. 12 is a schematic side view of the substrate processing apparatus mainly showing a coating processing unit, a coating development processing unit, and a cleaning and drying processing unit of FIG. 11; It is a schematic side view of the substrate processing apparatus which mainly shows the heat processing part and washing | cleaning drying process part of FIG.

  Hereinafter, a substrate transfer apparatus according to an embodiment of the present invention, a substrate processing apparatus including the same, and a teaching method of the substrate transfer apparatus will be described with reference to the drawings. In the following description, the substrate means a semiconductor substrate, a substrate for liquid crystal display device, a substrate for plasma display, a glass substrate for photomask, a substrate for optical disk, a substrate for magnetic disk, a substrate for magneto-optical disk or a substrate for photomask Say etc.

[1] Configuration of Substrate Transfer Device FIGS. 1A, 1 B, and 1 C are a plan view, a side view, and a front view of a substrate transfer device 500 according to an embodiment of the present invention. The substrate transfer apparatus 500 of FIG. 1 includes a moving member 510 (FIGS. 1B and 1C), a rotating member 520, two hands H1 and H2, and two cameras C1 and C2. The moving member 510 is configured to be horizontally movable along a guide rail (not shown).

  On the moving member 510, a substantially rectangular solid rotating member 520 is provided rotatably about an axis in the vertical direction. The hands H1 and H2 are supported by the support members 521 and 522 on the rotation member 520, respectively. The hands H1 and H2 are configured to be able to advance and retract in the longitudinal direction of the rotating member 520. In the present embodiment, the hand H2 is located above the upper surface of the rotating member 520, and the hand H1 is located above the hand H2.

  Each of the hands H1 and H2 includes a guide portion Ha and an arm portion Hb. The guide portion Ha has a substantially arc shape, and the arm portion Hb has a rectangular shape. A plurality of (three in this example) protrusions pr are formed on the inner peripheral portion of the guide portion Ha so as to be directed to the inside of the guide portion Ha. A suction portion sm is provided at the tip of each protrusion pr. The adsorption unit sm is connected to an intake system (not shown). The substrate W is placed on the plurality of suction portions sm of the plurality of protruding portions pr. In this state, a plurality of locations of the substrate W on the plurality of suction units sm are suctioned by the suction system to the plurality of suction units sm, respectively.

  Each of the cameras C1 and C2 is, for example, a CCD (charge coupled device) image sensor including an imaging device and a lens. Each of the cameras C1 and C2 may be a CMOS (complementary metal oxide semiconductor) image sensor. The cameras C1 and C2 are mounted on the hands H1 and H2, respectively. The cameras C1 and C2 are located on the guide portions Ha of the hands H1 and H2 and on the central axes CL (FIG. 1A) of the hands H1 and H2 extending in the longitudinal direction of the rotating member 520.

  In each of the hands H1 and H2, a reference position (hereinafter referred to as a reference position) r1 and r2 in which the center of the substrate W to be held is to be located is predetermined. The reference positions r1 and r2 of the hands H1 and H2 are, for example, center positions of circles formed along the inner peripheral portion of the guide portion Ha. The reference positions r1 and r2 of the hands H1 and H2 may be center positions of the plurality of suction units sm.

[2] View of Camera C1, C2 FIGS. 2A and 2B are a plan view and a side view showing the view of the camera C1 attached to the hand H1 of FIG. In FIGS. 2A and 2B, a visual field vf of the camera C1 is indicated by a two-dot chain line.

  The field of view vf of the camera C1 is determined, for example, by the magnification of the lens of the camera C1, the angle of view, the direction of the optical axis, and the like. The field of view vf of the camera C1 is set to include at least the reference position r1 of the hand H1. In this example, the field of view vf of the camera C1 is set such that the reference position r1 is located at the center of the field of view vf.

  As for the camera C2 attached to the hand H2 in FIG. 1, the field of view vf of the camera C2 is set to include at least the reference position r2 of the hand H2, as with the camera C1 attached to the hand H1. In this example, the visual field vf of the camera C2 is set so that the reference position r2 is located at the center of the visual field vf.

[3] Configuration of Control System of Substrate Transfer Apparatus 500 FIG. 3 is a block diagram showing the configuration of the control system of the substrate transfer apparatus 500. As shown in FIG. As shown in FIG. 3, the substrate transfer apparatus 500 includes a vertical drive motor 511, a vertical encoder 512, a horizontal drive motor 513, a horizontal encoder 514, a rotational drive motor 515, a rotational encoder 516, and an upper hand advancing and retracting. It includes a drive motor 525, an upper hand encoder 526, a lower hand drive motor 527, a lower hand encoder 528, cameras C1 and C2, a control unit 530, an operation unit 550, and a display unit 590.

  The vertical drive motor 511 moves the moving member 510 of FIG. 1 in the vertical direction (in the present example, the vertical direction) under the control of the control unit 530. The vertical encoder 512 outputs a signal indicating the rotation angle of the vertical drive motor 511 to the control unit 530. Thus, the control unit 530 can detect the vertical position of the moving member 510.

  The horizontal drive motor 513 moves the moving member 510 in FIG. 1 in the horizontal direction under the control of the control unit 530. The horizontal encoder 514 outputs a signal indicating the rotation angle of the horizontal drive motor 513 to the control unit 530. Thus, the control unit 530 can detect the horizontal position of the moving member 510.

  The rotation direction drive motor 515 causes the rotation member 520 in FIG. 1 to rotate about an axis in the vertical direction (in the present example, the vertical direction) under the control of the control unit 530. The rotation direction encoder 516 outputs a signal indicating the rotation angle of the rotation direction drive motor 515 to the control unit 530. Thus, the control unit 530 can detect the orientation of the rotating member 520 in the horizontal plane.

  The upper hand advancing / retracting drive motor 525 advances / retracts the hand H1 of FIG. 1 in the horizontal direction on the rotating member 520 under the control of the control unit 530. The upper hand encoder 526 outputs a signal indicating the rotation angle of the upper hand advancing / retracting drive motor 525 to the control unit 530. Thus, the control unit 530 can detect the position of the hand H1 on the rotating member 520.

  The lower hand advancing / retracting drive motor 527 advances / retracts the hand H2 of FIG. 1 in the horizontal direction on the rotating member 520 under the control of the control unit 530. The lower hand encoder 528 outputs a signal indicating the rotation angle of the lower hand drive motor 527 to the control unit 530. Thus, the control unit 530 can detect the position of the hand H2 on the rotating member 520.

  Under control of the control unit 530, each pixel of the cameras C1 and C2 outputs an electric signal corresponding to the light reception amount as a light reception signal. The output light reception signal is provided to control unit 530. Control unit 530 generates image data indicating an image within field of view vf of each of cameras C1 and C2 based on light reception signals supplied from each of cameras C1 and C2. The display unit 590 is connected to the control unit 530. Control unit 530 causes display unit 590 to display an image based on the generated image data.

  Further, an operation unit 550 is connected to the control unit 530. The user can give various commands and information to the control unit 530 by operating the operation unit 550.

[4] Transfer Mode and Teaching Mode The substrate transfer apparatus 500 according to the present embodiment is configured to be operable in the transfer mode and the teaching mode. In the transfer mode, the substrate transfer apparatus 500 receives, for example, a substrate on a predetermined substrate support of one processing unit by one of the hands H1 and H2 and transfers the substrate to the predetermined substrate support of the other processing unit. Pass (place). The substrate support unit may be, for example, a spin chuck for holding the back surface (bottom surface) of the substrate W by suction, a spin chuck for holding the outer peripheral end of the substrate W, a plurality of support pins for supporting a plurality of portions of the back surface of the substrate W It is a plate on which the substrate W can be mounted.

  The receiving position for receiving the substrate W on the predetermined substrate supporting unit by the hands H1 and H2 in the transfer mode is a unique three-dimensional coordinate system defined in the substrate transfer apparatus 500 (hereinafter referred to as a transfer apparatus coordinate system). And is stored in the control unit 530 of FIG. Further, the placement positions at which the hands H1 and H2 hand over the substrate W to the predetermined substrate support unit in the transport mode are also represented by the transport device coordinate system, and are stored in the control unit 530 of FIG.

  The receiving position stored in the control unit 530 may be deviated from the normal receiving position due to an influence of an assembly error of parts in the substrate transfer apparatus 500 or wear of parts of the substrate transfer apparatus 500. Further, the placement position stored in the control unit 530 may be deviated from the regular placement position for the same reason as the receiving position.

  Therefore, in the teaching mode, the substrate transfer apparatus 500 updates the receiving position so that the receiving position stored in the control unit 530 indicates the correct receiving position. Further, the substrate transfer apparatus 500 updates the placement position so that the placement position stored in the control unit 530 indicates the correct placement position. The substrate transport apparatus 500 operates in the transport mode based on the regular receiving position and the regular mounting position updated in the teaching mode, whereby the transport failure of the substrate W is prevented.

  A specific example of the operation when the substrate transport apparatus 500 in the teaching mode updates the receiving position of the hand H1 with respect to one spin chuck will be described. In the initial state, a provisional reception position (coordinates of the reception position in the carrier coordinate system) of the hand H1 with respect to the spin chuck is stored in the control unit 530. Also, in the initial state, reference image data indicating an image of the spin chuck (hereinafter referred to as a reference image) to be obtained by the camera C1 with the hand H1 in the normal receiving position is stored in the control unit 530 There is. In the present embodiment, the reference image data is image data indicating an image obtained by the camera C1 in a state where the hand H1 is at the normal receiving position.

  4 to 7 are diagrams showing a specific example in which the substrate transport apparatus 500 in the teaching mode updates the receiving position of the hand H1. 4 (a), 5 (a), 6 (a) and 7 (a) show plan views of the spin chuck 1 and the hand H1. 4 (b), 5 (b), 6 (b) and 7 (b) show side views of the spin chuck 1 and the hand H1. In FIGS. 4 (c), 5 (c), 6 (c) and 7 (c), an image obtained by the camera C1 (hereinafter referred to as a real image) is shown by a solid line and a reference image The image of the spin chuck at is shown in dotted lines. In the real and reference images of FIGS. 4C, 5C, 6C and 7C, the lateral direction corresponds to the horizontal direction within the field of view vf of the camera C1.

  First, the vertical drive motor 511, the horizontal drive motor 513, the rotational drive motor 515, and the upper hand drive motor 525 are controlled based on the stored provisional receiving position. As a result, as shown in FIGS. 4A and 4B, the hand H1 moves to the provisional receiving position. In this state, the spin chuck 1 is imaged by the camera C1.

  The spin chuck 1 of this example has a disk shape, and is configured to be capable of adsorbing the lower surface central portion of the substrate W. In addition, the spin chuck 1 is provided at the upper end portion of the rotating shaft 3 extending in the vertical direction. A vertical hole 2 having a minute inner diameter is formed at the center of the upper surface of the spin chuck 1.

  When the hand H1 is at the normal receiving position, the reference position r1 of the hand H1 coincides with the position of the vertical hole 2 of the spin chuck 1 and the real image and the reference image coincide. In the example of FIGS. 4A and 4B, the reference position r1 of the hand H1 is largely deviated from the position of the vertical hole 2 of the spin chuck 1. Further, as shown in FIG. 4C, the actual image is also largely deviated from the reference image.

  Therefore, in this example, in order to first adjust the advancing / retracting direction of the hand H1, that is, the horizontal direction of the hand H1, as shown by the outlined arrow ar0 in FIG. It rises by a predetermined height from.

  As shown in FIGS. 5 (a) and 5 (b), when the hand H1 is positioned above the provisional receiving position by a predetermined height, as shown in FIG. 5 (c), the spin in the real image is generated. The image of the upper surface of the chuck 1 is larger than the image of the upper surface of the spin chuck 1 shown in FIG. 4C. Thereby, it is possible to clearly identify the image of the vertical hole 2 of the spin chuck 1 in the actual image (hereinafter referred to as the hole image 2a).

  The field of view vf of the camera C1 is set such that the reference position r1 is located at the center of the field of view vf. Therefore, when the direction of the hand H1 is aligned with the central axis of the spin chuck 1, the hole image 2a is positioned at the lateral center of the entire real image.

  Therefore, as shown by the white arrow ar1 in FIG. 5A, the hand H1 rotates until the hole image 2a reaches the center in the lateral direction of the entire real image. Thereby, the horizontal direction of the hand H1 is adjusted such that the central axis CL of the hand H1 overlaps the vertical hole 2 of the spin chuck 1 in a plan view. Thereafter, as shown by the white arrow ar2 in FIG. 5B, the hand H1 is lowered to the height in the initial state.

  In the state shown in FIGS. 6A and 6B, the reference position r1 of the hand H1 is vertically displaced from the vertical hole 2 of the spin chuck 1 and is deviated in the advancing / retracting direction of the hand H1. Therefore, as shown in FIG. 6C, the hole image 2a does not exist at the center of the entire image. Also, the size of the image of the spin chuck 1 in the actual image (hereinafter referred to as the chuck image 1a) does not match the size of the image of the spin chuck 1 in the reference image (hereinafter referred to as the chuck image 1b).

  Therefore, the hand H1 moves in the forward / backward direction as shown by the white arrow ar3 in FIG. 6A (in this example, it moves forward), and the hand H1 as shown by the white arrow ar4 in FIG. Moves up and down (in this example, down).

  At this time, the amount of movement of the hand H1 in the forward and backward direction and the vertical direction is calculated based on the dimensions of each part of the chuck image 1a on the actual image and the dimensions of each part of the chuck image 1b on the reference image. The comparison between the dimensions of each part of the chuck image 1a on the actual image and the dimensions of each part of the chuck image 1b on the reference image can be realized by using an image processing technique such as pattern matching, for example. In the example of FIG. 6C, the hand H1 is set such that the horizontal dimension D1a and the vertical dimension D2a of the chuck image 1a match the horizontal dimension D1b and the vertical dimension D2b of the chuck image 1b, respectively. The amount of movement in the forward and backward direction and the vertical direction of each is calculated.

  As described above, by adjusting the position of the hand H1, as shown in FIGS. 7 (a) and 7 (b), the reference position r1 of the hand H1 coincides with the vertical hole 2 of the spin chuck 1, As shown in 7 (c), the real image and the reference image match.

  In the substrate transfer apparatus 500, the position of the adjusted hand H1 is adjusted on the transfer apparatus coordinate system based on the outputs from the vertical encoder 512, the horizontal encoder 514, the rotational encoder 516, and the upper hand encoder 526 in FIG. It is possible to acquire as coordinate data. Therefore, the position of the adjusted hand H1 is acquired as the normal reception position, and the provisional reception position stored in the initial state is updated by the acquired normal reception position.

  In the above example, after the hand H1 moves to the temporary receiving position, the hand H1 is temporarily raised by a predetermined height to adjust the direction of the hand H1, but at the temporary receiving position When the hole image 2a can be clearly identified in the actual image to be acquired, it is not necessary to raise the hand H1.

  Further, in the above specific example, the direction of the hand H1 is adjusted such that the hole image 2a on the real image is located at the lateral center of the whole real image, but the direction of the hand H1 is on the real image The adjustment may be made based on the chuck image 1 a or the image of the rotation axis 3. For example, the orientation of the hand H1 may be adjusted such that the lateral center of the chuck image 1a is located at the lateral center of the entire real image, or the lateral center of the image of the rotation axis 3 is the entire real image. The orientation of the hand H1 may be adjusted so as to be located at the lateral center in.

  Furthermore, in the above specific example, the position of the hand H1 is adjusted so that the chuck image 1a on the real image matches the chuck image 1b on the reference image, but the position of the hand H1 is rotated on the real image The image of axis 3 may be adjusted to coincide with the image of axis of rotation 3 on the reference image.

  Furthermore, in the above-described specific example, after the direction of the hand H1 is adjusted based only on the real image, the positions of the hand H1 in the vertical direction and the advancing / retracting direction are adjusted based on the real image and the reference image. The orientation of the hand H1 and the positions of the hand H1 in the vertical direction and the advancing and retreating direction may be adjusted based on the image and the reference image. That is, the orientation of the hand H1 and the positions of the hand H1 in the vertical direction and the advancing and retreating direction may be adjusted simultaneously or sequentially so that the chuck images 1a and 1b coincide with each other.

[5] Functional Configuration of Control Unit 530 FIG. 8 is a block diagram showing a functional configuration of the control unit 530. As shown in FIG. The control unit 530 includes an operation mode switching unit 50, a reference image storage unit 51, a display control unit 52, an image data generation unit 53, a position adjustment unit 54, a position correction unit 55, a position information storage unit 56, a movement control unit 57, and a position. An acquisition unit 58, a position information update unit 59, a shift amount storage unit 60, and an alarm output unit 61 are included.

  The control unit 530 includes a CPU (central processing unit), a RAM (random access memory), and a ROM (read only memory). The function of each component of the control unit 530 is realized by the CPU executing a computer program stored in the ROM or other storage medium. Note that part or all of the components of the control unit 530 may be realized by hardware such as an electronic circuit.

  In the following description, the receiving position and the mounting position of each hand H1 and H2 with respect to a predetermined substrate support portion will be collectively referred to as a delivery position as appropriate.

  The operation mode switching unit 50 switches the operation mode of the substrate transfer apparatus 500 to the transfer mode or the teaching mode, for example, based on an operation of the operation unit 550 of FIG. 3 by the user. The position information storage unit 56 stores, as position information, a substrate support unit where the substrate transfer apparatus 500 receives the substrate W, and a delivery position for each of the substrate support units where the substrate transfer apparatus 500 passes the substrate W.

  The reference image storage unit 51 is a reference image showing an image (reference image) of the substrate support to be obtained by imaging of the cameras C1 and C2 with the hands H1 and H2 at the regular delivery position for each substrate support. Store data

  The movement control unit 57 controls the vertical drive motor 511, the horizontal drive motor 513, and the rotational drive motor 515 of FIG. 3 based on the position information stored in the position information storage unit 56 in the teaching mode. The upper hand advancing / retracting drive motor 525 or the lower hand advancing / retracting drive motor 527 is controlled. Thereby, the hand H1 or the hand H2 moves to the provisional delivery position.

  In the teaching mode, the image data generation unit 53 captures an image of the substrate supporting unit with the cameras C1 and C2 of the hands H1 and H2, and generates image data indicating an actual image as actual image data.

  The display control unit 52 displays an actual image based on the actual image data generated by the image data generation unit 53 on the display unit 590 in FIG. 3 in the teaching mode. At this time, as shown in FIG. 4C, FIG. 5C, FIG. 6C and FIG. 7C, the display control unit 52 stores the reference stored in the reference image storage unit 51 together with the actual image. A reference image based on image data may be displayed on the display unit 590. In this case, the reference image is preferably displayed, for example, in a semitransparent state so as to be distinguishable from the real image.

  The position adjustment unit 54 performs the vertical drive motor shown in FIG. 3 so that the actual image of the substrate support matches or almost matches the reference image of the substrate support stored in the reference image storage unit 51 in the teaching mode. 511 controls the horizontal drive motor 513 and the rotational drive motor 515, and controls the upper hand advancing / retracting drive motor 525 or the lower hand advancing / retracting drive motor 527 to adjust the positions of the hands H1 and H2.

  The position correction unit 55 controls the vertical drive motor 511, the horizontal drive motor 513, and the rotational drive motor 515 of FIG. 3 in the teaching mode, for example, based on an operation of the operation unit 550 of FIG. The upper hand drive motor 525 or the lower hand drive motor 527 is controlled to correct the positions of the hands H1 and H2.

  The position acquisition unit 58 is a movement control unit based on a signal output from at least one of the vertical encoder 512, the horizontal encoder 514, the rotational encoder 516, the upper hand encoder 526, and the lower hand encoder 528 in FIG. 57. The position adjustment unit 54 and the position correction unit 55 obtain the position of the hand H1 or the hand H2 after movement.

  The position information updating unit 59 uses the positions of the hands H1 and H2 adjusted by the position adjusting unit 54 in the teaching mode or the positions of the hands H1 and H2 corrected by the position correcting unit 55 as position information. The position information stored in the storage unit 56 is updated.

  The displacement amount storage unit 60 calculates the displacement amount between the provisional delivery position in the initial state and the updated regular delivery position every time the position information is updated in the teaching mode, and stores the calculated displacement amount. Do. When a new deviation amount is stored in the deviation amount storage unit 60 for one delivery position, the alarm output unit 61 compares the new deviation amount with the deviation amount stored in the deviation amount storage unit 60 at the previous teaching. Calculate the difference. Further, the alarm output unit 61 outputs an alarm when the calculated difference is larger than a predetermined difference threshold. In this case, the user can easily know the abnormality of the substrate transfer apparatus 500 when teaching the hands H1 and H2.

  As described above, the regular delivery position is stored in the position information storage unit 56 in the teaching mode. In this state, in the transport mode, the movement control unit 57 uses the vertical drive motor 511, the horizontal drive motor 513, and the rotational drive motor 515 of FIG. 3 based on the position information stored in the position information storage unit 56. It controls and controls the upper hand advancing / retracting drive motor 525 or the lower hand advancing / retracting drive motor 527. Thereby, the hand H1 or the hand H2 moves to the regular delivery position, and the substrate W is accurately transported among the plurality of substrate supports.

[6] Operation of Substrate Transfer Device 500 in Teaching Mode FIGS. 9 and 10 are flowcharts showing the operation of the substrate transfer device 500 in the teaching mode. Here, teaching of the hand H1 to one substrate support portion will be described. In the operation described below, one of the hands H1 and H2 to be subjected to teaching is designated by the user operating the operation unit 550 after the substrate transfer apparatus 500 is switched to the teaching mode. Is started by specifying the substrate support of

  In the initial state, it is assumed that the operation mode of the substrate transfer apparatus 500 is set to the teaching mode by the operation mode switching unit 50 of FIG. Further, in the position information storage unit 56 of FIG. 8, it is assumed that a provisional delivery position for one substrate support unit is stored in advance as position information.

  When teaching the delivery position of the hand H1 to one substrate support unit, the movement control unit 57 in FIG. 8 first uses the hand H1 as one substrate based on the position information stored in the position information storage unit 56. It moves to the temporary delivery position corresponding to a support part (step S11).

  Next, the image data generation unit 53 in FIG. 8 captures an image of the substrate supporting unit with the camera C1 in a state where the hand H1 is at the provisional delivery position, and generates actual image data (step S12). Further, the display control unit 52 of FIG. 8 displays an actual image on the display unit 590 of FIG. 3 based on the generated actual image data, and the reference image data stored in the reference image storage unit 51 of FIG. The semi-transparent reference image is superimposed and displayed on the real image based on (step S13). The image data generation unit 53 may repeat the imaging of the substrate support unit and the generation of actual image data at a constant cycle in the teaching mode. In this case, the display control unit 52 may display an actual image based on the repeatedly generated actual image data on the display unit 590.

  Next, the position adjustment unit 54 in FIG. 8 calculates the degree of coincidence between the actual image and the reference image (step S14). Here, the degree of coincidence refers to the degree to which the real image is similar to the reference image. The higher the degree of coincidence, the closer the actual image to the reference image, and the lower the degree of coincidence, the more the actual image deviates from the reference image. Therefore, the position adjustment unit 54 determines whether the calculated degree of coincidence is higher than a predetermined degree of coincidence threshold. When the calculated degree of coincidence is equal to or less than the degree of coincidence threshold, the position adjustment unit 54 adjusts the position of the hand H1 based on the actual image data and the reference image data so that the degree of coincidence becomes high (step S16). , And return to the process of step S15.

  If the degree of coincidence calculated in step S15 is higher than the degree of coincidence threshold, the position adjustment unit 54 may receive a correction command from the user via the operation unit 550 of FIG. 3 for adjusting the position of the hand H1 again. It is determined whether or not it is (step S17). When there is a correction command, the position correction unit 55 of FIG. 8 adjusts the position of the hand H1 based on the correction command (step S18), and returns to the process of step S17.

  When there is no correction command in step S17, the position information updating unit 59 of FIG. 8 takes the current position of the hand H1 acquired by the position acquiring unit 58 of FIG. The position information of the hand H1 stored in is updated (step S19).

  Next, the shift amount storage unit 60 of FIG. 8 calculates the shift amount between the provisional delivery position in the initial state of step S11 and the normal delivery position updated in step S19, and stores the calculated shift amount. (Step S20).

  Next, the alarm output unit 61 of FIG. 8 compares the displacement amount calculated in step S20 at the previous teaching with respect to one substrate support portion with the displacement amount calculated in step S20 at the current teaching. It calculates (step S21). Further, the alarm output unit 61 determines whether the calculation result is larger than a predetermined difference threshold (step S22).

  When the calculation result is equal to or less than the predetermined difference threshold value, a series of teaching operations for the delivery position of the hand H1 is completed. On the other hand, when the calculation result is larger than the predetermined difference threshold value, the alarm output unit 61 outputs an alarm (step S23). Thereafter, the series of teaching operations is completed.

[7] Effects on Substrate Transfer Device 500 (a) In the substrate transfer device 500 according to the present embodiment, the cameras C1 and C2 are attached to the hands H1 and H2, respectively. Thus, teaching of each hand H1, H2 can be performed based on actual image data and reference image data acquired by the cameras C1, C2 with a simple configuration. Therefore, it is not necessary to prepare a configuration for holding the cameras C1 and C2 by the hands H1 and H2 for each teaching. Further, since it is not necessary to hold the cameras C1 and C2 by the hands H1 and H2 for each teaching, there is no variation in the positional relationship between the hands H1 and H2 and the field of view vf of the cameras C1 and C2. As a result, accurate teaching can be stably performed at low cost.

  (B) In the present embodiment, image data representing an image obtained by each of the cameras C1 and C2 is used as reference image data in a state where the hands H1 and H2 are at the normal receiving position. In this case, accurate reference image data can be easily obtained.

  (C) As described above, in the teaching mode, the actual image based on the actual image data is displayed on the display unit 590 and the reference image is displayed on the display unit 590. When real image data is periodically generated and real images based on the generated real image data are sequentially displayed as a moving image on display unit 590, the user views the real image while referring to the reference image. The movement states of the hands H1 and H2 during teaching can be easily confirmed. Thereby, the user operates the operation unit 550 while referring to the real image displayed on the display unit 590 after, for example, adjusting the position of the hand H1 (hand H2) by the position adjustment unit 54, the hand H1 (hand It is possible to further correct the position of H2).

[8] Configuration and Operation of Substrate Processing Apparatus FIG. 11 is a schematic plan view of a substrate processing apparatus provided with a substrate transfer apparatus according to an embodiment of the present invention. In the drawings after FIG. 11, in order to clarify the positional relationship, arrows indicating the U direction, the V direction, and the W direction orthogonal to one another are attached. The U direction and the V direction are orthogonal to each other in the horizontal plane, and the W direction corresponds to the vertical direction.

  As shown in FIG. 11, the substrate processing apparatus 100 includes an indexer block 11, a first processing block 12, a second processing block 13, a cleaning / drying processing block 14A, and a loading / unloading block 14B. The interface block 14 is configured by the washing and drying processing block 14A and the loading and unloading block 14B. The exposure device 15 is disposed adjacent to the loading / unloading block 14B. In the exposure device 15, the exposure processing is performed on the substrate W by the liquid immersion method.

  The indexer block 11 includes a plurality of carrier placement units 111 and a transport unit 112. On each carrier mounting portion 111, a carrier 113 for storing a plurality of substrates W in multiple stages is mounted. The transport unit 112 is provided with a main control unit 114 and a substrate transport apparatus (indexer robot) 500 e. The main control unit 114 controls various components of the substrate processing apparatus 100.

  The first processing block 12 includes a coating processing unit 121, a conveyance unit 122, and a heat treatment unit 123. The coating processing unit 121 and the thermal processing unit 123 are provided to face each other with the transport unit 122 interposed therebetween. The second processing block 13 includes a coating and developing processing unit 131, a conveyance unit 132, and a heat treatment unit 133. The coating and developing processing unit 131 and the heat treatment unit 133 are provided to face each other with the conveyance unit 132 interposed therebetween.

  The washing and drying processing block 14 A includes washing and drying processing units 161 and 162 and a transport unit 163. The cleaning and drying processing units 161 and 162 are provided to face each other with the transport unit 163 interposed therebetween. The transfer unit 163 is provided with substrate transfer devices (transfer robots) 500 f and 500 g. A substrate transfer device 500h is provided in the loading / unloading block 14B. The substrate transfer apparatus 500 h carries in and out the substrate W to and from the exposure device 15. The exposure device 15 is provided with a substrate loading unit 15 a for loading the substrate W and a substrate unloading unit 15 b for unloading the substrate W.

  FIG. 12 is a side view mainly showing the transport sections 122, 132, 163 of FIG. As shown in FIG. 12, the transport unit 122 has an upper transfer chamber 125 and a lower transfer chamber 126. The transfer unit 132 has an upper transfer chamber 135 and a lower transfer chamber 136. A substrate transfer device (transfer robot) 500 a is provided in the upper transfer chamber 125, and a substrate transfer device 500 c is provided in the lower transfer chamber 126. The upper transfer chamber 135 is provided with a substrate transfer device 500 b, and the lower transfer chamber 136 is provided with a substrate transfer device 500 d.

  The substrate transfer apparatus 500a includes guide rails 501, 502, 503, a moving member 510, a rotating member 520, and hands H1, H2. The guide rails 501 and 502 are provided so as to extend in the vertical direction. The guide rail 503 is provided to extend in the horizontal direction (U direction) between the guide rail 501 and the guide rail 502, and is attached to the guide rails 501 and 502 so as to be vertically movable. The moving member 510 is attached to the guide rail 503 so as to be movable in the horizontal direction (U direction). The configurations of the substrate transfer devices 500b to 500d are the same as the configuration of the substrate transfer device 500a.

  The substrate transfer device 500e of the transfer unit 112 has a hand H1 for holding the substrate W, and each of the substrate transfer devices 500f and 500g of the transfer unit 163 of FIG. 11 and the substrate transfer device 500h of FIG. It has hands H1 and H2 for holding. The substrate transfer apparatus 500 described above is used as the substrate transfer apparatus 500a to 500h in the substrate processing apparatus 100 of FIGS. 11 and 12. The control unit 530 (FIG. 3) of the substrate transfer apparatuses 500a to 500h is integrally controlled by the main control unit 114 at the time of substrate transfer operation in the transfer mode and at the time of teaching operation in the teaching mode. The operation unit 550 (FIG. 3) and the display unit 590 (FIG. 3) of the substrate transfer devices 500 a to 500 h may be a common operation panel provided in the substrate transfer device 500.

  The substrate platform PASS 1, PASS 2 is provided between the transport unit 112 and the upper transfer chamber 125, and the substrate platform PASS 3, PASS 4 is provided between the transport unit 112 and the lower transfer chamber 126. The substrate platform PASS5 and PASS6 are provided between the upper transfer chamber 125 and the upper transfer chamber 135, and the substrate platforms PASS7 and PASS8 are provided between the lower transfer chamber 126 and the lower transfer chamber 136. Be

  A placement / buffer unit P-BF1 is provided between the upper transfer chamber 135 and the transport unit 163, and a placement / buffer unit P-BF2 is provided between the lower transport chamber 136 and the transport unit 163. . A substrate platform PASS 9 and a plurality of placement / cooling units P-CP are provided adjacent to the loading / unloading block 14 B in the transport unit 163.

  FIG. 13 is a schematic side view of the substrate processing apparatus 100 mainly showing the coating processing unit 121, the coating development processing unit 131, and the cleaning and drying processing unit 161 in FIG.

  As shown in FIG. 13, in the coating processing unit 121, coating processing chambers 21, 22, 23, 24 are provided hierarchically. A coating processing unit (spin coater) 129 is provided in each of the coating processing chambers 21 to 24. In the coating and developing processing unit 131, development processing chambers 31, 33 and coating processing chambers 32, 34 are provided hierarchically. A development processing unit (spin developer) 139 is provided in each of the development processing chambers 31 and 33, and a coating processing unit 129 is provided in each of the coating processing chambers 32 and 34.

  Each coating processing unit 129 includes a spin chuck 25 for holding the substrate W and a cup 27 provided to cover the periphery of the spin chuck 25. In the present embodiment, each coating processing unit 129 is provided with two sets of spin chucks 25 and cups 27.

  In the coating processing unit 129, the spin chuck 25 is rotated by a driving device (not shown), and any one of the processing liquid nozzles 28 of the plurality of processing liquid nozzles 28 (FIG. 11) The processing liquid is moved upward, and the processing liquid is discharged from the processing liquid nozzle 28. Thus, the processing liquid is applied onto the substrate W. Further, the rinse liquid is discharged to the peripheral portion of the substrate W from an edge rinse nozzle (not shown). Thereby, the processing liquid adhering to the peripheral portion of the substrate W is removed.

  In the coating processing unit 129 of the coating processing chambers 22 and 24, the processing liquid for the antireflective film is supplied to the substrate W from the processing liquid nozzle 28. Thereby, an antireflective film is formed on the substrate W. In the coating processing unit 129 of the coating processing chambers 21 and 23, the processing liquid for the resist film is supplied to the substrate W from the processing liquid nozzle 28. Thereby, a resist film is formed on the substrate W. In the coating processing unit 129 of the coating processing chambers 32 and 34, the processing liquid for the resist cover film is supplied to the substrate W from the processing liquid nozzle 28. Thereby, a resist cover film is formed on the substrate W.

  The development processing unit 139 includes the spin chuck 35 and the cup 37 as in the coating processing unit 129. Further, as shown in FIG. 11, the development processing unit 139 includes two developing nozzles 38 for discharging the developer and a moving mechanism 39 for moving the developing nozzles 38 in the X direction.

  In the development processing unit 139, the spin chuck 35 is rotated by a driving device (not shown), and one developing nozzle 38 moves in the U direction to supply the developing solution to each substrate W, and then the other developing nozzle 38 Supplies the developer to each substrate W while moving. In this case, the developing solution is supplied to the substrate W, whereby the development processing of the substrate W is performed.

  In the cleaning and drying processing unit 161, cleaning and drying processing chambers 81, 82, 83, 84 are provided hierarchically. A cleaning and drying processing unit SD1 is provided in each of the cleaning and drying processing chambers 81 to 84. In the cleaning / drying processing unit SD1, cleaning and drying processing of the substrate W before the exposure processing is performed using a spin chuck (not shown).

  FIG. 14 is a schematic side view of the substrate processing apparatus 100 mainly showing the thermal processing units 123 and 133 and the cleaning / drying processing unit 162 of FIG. As shown in FIG. 14, the heat treatment unit 123 includes an upper heat treatment unit 301 and a lower heat treatment unit 302. The upper thermal processing unit 301 and the lower thermal processing unit 302 are provided with a plurality of heating units PHP, a plurality of adhesion strengthening processing units PAHP, and a plurality of cooling units CP. In the heating unit PHP, heat treatment of the substrate W is performed. In the adhesion reinforcement processing unit PAHP, adhesion reinforcement processing is performed to improve the adhesion between the substrate W and the antireflective film. In the cooling unit CP, a cooling process of the substrate W is performed.

  The heat treatment unit 133 includes an upper heat treatment unit 303 and a lower heat treatment unit 304. The upper heat processing unit 303 and the lower heat processing unit 304 are provided with a cooling unit CP, a plurality of heating units PHP, and an edge exposure unit EEW. In the edge exposure unit EEW, exposure processing (edge exposure processing) is performed on a region of a fixed width of the peripheral portion of the resist film formed on the substrate W. In the upper thermal processing unit 303 and the lower thermal processing unit 304, the heating unit PHP provided adjacent to the cleaning / drying processing block 14A is configured to be able to carry in the substrate W from the cleaning / drying processing block 14A.

  In the washing and drying processing unit 162, washing and drying processing chambers 91, 92, 93, 94, and 95 are provided hierarchically. Each of the cleaning and drying processing chambers 91 to 95 is provided with a cleaning and drying processing unit SD2. In the cleaning / drying processing unit SD2, the substrate W after the exposure processing is cleaned and dried using a spin chuck (not shown).

  The operation of the substrate processing apparatus 100 will be described with reference to FIGS. 11 to 14. When the substrate processing apparatus 100 is in operation, a substrate transfer operation is performed by the substrate transfer devices 500a to 500h.

  Here, the substrate platforms PASS1 to PASS9, the placement and cooling unit P-CP, the coating processing unit 129, the development processing unit 139, the adhesion strengthening processing unit PAHP, the cooling unit CP, the heating unit PHP, the edge exposure unit EEW and the cleaning Each of the drying processing units SD1 and SD2 corresponds to the one processing unit and the other processing unit. Each processing unit has a substrate support. In the substrate support portion of each processing unit, the receiving position and the mounting position are set by any of the substrate transfer devices 500a to 500h. For example, in each of the coating processing unit 129, the development processing unit 139, the edge exposure unit EEW, and the cleaning / drying processing units SD1 and SD2, the spin chuck is a substrate support unit, and the normal receiving position and the normal mounting position are spin chucks. Center of rotation. In the substrate platforms PASS1 to PASS9, the three support pins are substrate support portions, and the normal receiving position and the regular mounting position are the center positions of the upper end portions of the three support pins. In each of the placement / cooling unit P-CP, the adhesion strengthening processing unit PAHP, the cooling unit CP, and the heating unit PHP, the cooling plate or the heating plate is the substrate support, and the normal receiving position and the normal mounting position are cooling It is located a fixed distance above the center of the top surface of the plate or heating plate.

  At the time of substrate transport operation, in FIG. 12, the carrier 113 in which the unprocessed substrate W is accommodated is placed on the carrier placement portion 111 (FIG. 11) of the indexer block 11. The substrate transfer apparatus 500 e transfers the unprocessed substrate W from the carrier 113 to the substrate platform PASS 1, PASS 3. Further, the substrate transfer apparatus 500 e transfers the processed substrate W placed on the substrate platform PASS 2, PASS 4 to the carrier 113.

  In the first processing block 12, the substrate transfer apparatus 500a is configured to bond the substrate W placed on the substrate platform PASS1 to the adhesion strengthening processing unit PAHP (FIG. 14), the cooling unit CP (FIG. 14) and the coating processing chamber 22 (FIG. 14). Transport in order to FIG. Next, the substrate transfer apparatus 500a sequentially arranges the substrate W on which the anti-reflection film is formed by the coating processing chamber 22 into the heating unit PHP (FIG. 14), the cooling unit CP (FIG. 14) and the coating processing chamber 21 (FIG. 13). Transport Subsequently, the substrate transfer apparatus 500a sequentially transfers the substrate W on which the resist film is formed by the coating processing chamber 21 to the heating unit PHP (FIG. 14) and the substrate platform PASS5. Further, the substrate transfer apparatus 500a transfers the substrate W after development processing placed on the substrate platform PASS6 to the substrate platform PASS2.

  The substrate transfer apparatus 500c sequentially transfers the substrate W placed on the substrate platform PASS3 to the adhesion strengthening processing unit PAHP (FIG. 14), the cooling unit CP (FIG. 14) and the coating processing chamber 24 (FIG. 13). Next, the substrate transfer apparatus 500c sequentially arranges the substrate W on which the antireflective film is formed by the coating processing chamber 24 into the heating unit PHP (FIG. 14), the cooling unit CP (FIG. 14) and the coating processing chamber 23 (FIG. 13). Transport Subsequently, the substrate transfer apparatus 500 c sequentially transfers the substrate W on which the resist film is formed by the coating processing chamber 23 to the heating unit PHP (FIG. 14) and the substrate platform PASS 7. The substrate transfer apparatus 500 c transfers the substrate W after development processing placed on the substrate platform PASS 8 to the substrate platform PASS 4.

  In the second processing block 13, the substrate transfer apparatus 500b applies the substrate W after the resist film formation placed on the substrate platform PASS5 to the coating processing chamber 32 (FIG. 13), the heating unit PHP (FIG. 14), the edge It conveys in order to exposure part EEW (FIG. 14) and placement / buffer part P-BF1. Further, the substrate transfer apparatus 500b takes out the substrate W after the exposure processing by the exposure device 15 and after the heat treatment from the heating unit PHP (FIG. 14) adjacent to the cleaning / drying processing block 14A. The substrate transfer apparatus 500b sequentially transfers the substrate W to the cooling unit CP (FIG. 14), the development processing chamber 31 (FIG. 13), the heating unit PHP (FIG. 14) and the substrate platform PASS6.

  The substrate transfer apparatus 500d applies the substrate W after the resist film formation placed on the substrate platform PASS7 to the coating processing chamber 34 (FIG. 13), the heating unit PHP (FIG. 14), the edge exposure unit EEW (FIG. 14) and The sheet is conveyed to the placement / buffer section P-BF2 in order. Further, the substrate transfer apparatus 500d takes out the substrate W after the exposure processing by the exposure device 15 and after the heat treatment from the heating unit PHP (FIG. 14) adjacent to the cleaning / drying processing block 14A. The substrate transfer apparatus 500d sequentially transfers the substrate W to the cooling unit CP (FIG. 14), the development processing chamber 33 (FIG. 13), the heating unit PHP (FIG. 14) and the substrate platform PASS8.

  In the cleaning / drying processing block 14A of FIG. 11, the substrate transfer apparatus 500f is a cleaning / drying processing unit of the cleaning / drying processing unit 161 for the substrate W mounted on the mounting / buffering units P-BF1 and P-BF2 (FIG. 12). Transport to SD1 (FIG. 13). Subsequently, the substrate transfer apparatus 500f transfers the substrate W from the cleaning / drying processing unit SD1 to the placement / cooling unit P-CP (FIG. 12). The substrate transfer apparatus 500g of FIG. 11 transfers the substrate W after exposure processing placed on the substrate platform PASS9 (FIG. 11) to the cleaning / drying processing unit SD2 (FIG. 14) of the cleaning / drying processing unit 162. The substrate transfer apparatus 500 g transfers the substrate W after the cleaning and drying processing from the cleaning and drying processing unit SD 2 to the heating unit PHP (FIG. 14) of the upper thermal processing unit 303 or the heating unit PHP (FIG. 14) of the lower thermal processing unit 304. Do.

  In the loading / unloading block 14B of FIG. 12, the substrate transfer apparatus 500h transfers the substrate W placed on the loading / cooling unit P-CP before exposure processing to the substrate loading unit 15a (FIG. 11) of the exposure device 15. . Further, the substrate transfer apparatus 500h takes out the substrate W after the exposure processing from the substrate output unit 15b (FIG. 11) of the exposure apparatus 15, and transfers the substrate W to the substrate platform PASS9.

  In the substrate processing apparatus 100 described above, accurate teaching of the hands H1 and H2 provided in each of the substrate transfer apparatuses 500a to 500h can be stably performed at low cost. Therefore, while the increase in the cost required for the maintenance of the substrate processing apparatus 100 is suppressed, generation | occurrence | production of the process defect of the board | substrate W resulting from the conveyance defect of the board | substrate W is prevented.

  Further, in the substrate processing apparatus 100, teaching of the reception position and the placement position of the hands H1 and H2 of the substrate transfer apparatuses 500a to 500h can be performed in parallel. Thus, the time required for teaching the substrate transfer devices 500a to 500h in the substrate processing apparatus 100 can be shortened.

[9] Other Embodiments (a) In the above embodiment, the cameras C1 and C2 are mounted on the upper surfaces of the hands H1 and H2, respectively, while the cameras C1 and C2 are mounted on the lower surfaces of the hands H1 and H2, respectively. It may be attached. The cameras C1 and C2 may not be located on the central axis CL of the hands H1 and H2, respectively.

  (B) In the above embodiment, the visual fields vf of the cameras C1 and C2 are set such that the reference positions r1 and r2 of the hands H1 and H2 are positioned at the centers of the visual fields vf of the hands H1 and H2, respectively. However, the present invention is not limited to this. The field of view vf of the cameras C1 and C2 may be set such that the reference positions r1 and r2 of the hands H1 and H2 deviate from the center of the field of view vf of the hands H1 and H2.

  (C) In the above embodiment, the reference image data is actual image data representing an image obtained by each of the cameras C1 and C2 when the hands H1 and H2 are at the normal receiving position. It is not limited to this. When three-dimensional CAD (Computer-Aided Design) data of a figure represented by the transfer device coordinate system of the substrate transfer device 500 exists, image data indicating a reference image is generated based on the CAD data, and Image data may be used as reference image data.

  (D) In the above embodiment, when the substrate transfer apparatus 500 is in the teaching mode, the reference image is displayed on the display unit 590 in a semitransparent state together with the real image, but the present invention is not limited to this. When the substrate transfer apparatus 500 is in the teaching mode, the display unit 590 may display an outline, a dimension line, or the like indicating the outer shape of the substrate support as information on the reference image together with the actual image.

  (E) In the above embodiment, the operation mode switching unit 50 of FIG. 8 switches the operation mode of the substrate transfer device 500 to the teaching mode based on the operation of the operation unit 550 of FIG. 3 by the user. , H2, but the present invention is not limited thereto. The operation mode switching unit 50 may automatically switch the operation mode of the substrate transfer apparatus 500 to the teaching mode every predetermined period or a predetermined number of lots, regardless of the operation of the operation unit 550.

[10] Correspondence of each component of the claim and each element of the embodiment Hereinafter, an example of the correspondence between each component of the claim and each element of the embodiment will be described. It is not limited to.

  In the above embodiment, each of the substrate transfer devices 500 and 500a to 500h is an example of the substrate transfer device, and the hands H1 and H2 are examples of the holding portions, and the guide rails 501, 502, 503, the moving member 510, The rotation member 520, the support members 521 and 522, the vertical drive motor 511, the horizontal drive motor 513, the rotational drive motor 515, the upper hand advancing / retracting drive motor 525, and the lower hand advancing / retracting drive motor 527 are examples of drive units. .

  The cameras C1 and C2 are an example of an imaging unit, the control unit 530 is an example of a control unit, the position acquisition unit 58 is an example of a position acquisition unit, and the reference image storage unit 51 and the position information storage unit 56 are The movement control unit 57 is an example of a movement control unit, the image data generation unit 53 is an example of an image data generation unit, and the position adjustment unit 54 is an example of a position adjustment unit. The update unit 59 is an example of a position information update unit.

  The shift amount storage unit 60 is an example of the shift amount storage unit, the alarm output unit 61 is an example of the alarm output unit, the display unit 590 is an example of the display unit, and the operation unit 550 is an example of the operation unit. The position correction unit 55 is an example of a position correction unit, and the substrate processing apparatus 100 is an example of a substrate processing apparatus.

  Also, substrate platform PASS1 to PASS9, placement / cooling unit P-CP, coating processing unit 129, development processing unit 139, adhesion strengthening processing unit PAHP, cooling unit CP, heating unit PHP, edge exposure unit EEW and cleaning and drying Each of the processing units SD1 and SD2 is an example of a processing unit.

  As each component of a claim, other various elements having the configuration or function described in the claim can also be used.

1, 25 and 35: spin chuck, 1a, 1b: chuck image, 2: vertical hole, 2a: hole image, 3: rotary shaft, 50: operation mode switching unit, 51: reference image storage unit, 52: display control unit , 53: image data generation unit, 54: position adjustment unit, 55: position correction unit, 56: position information storage unit, 57: movement control unit, 58: position acquisition unit, 59: position information update unit, 60: shift amount Memory unit 61 Alarm output unit 100 Substrate processing apparatus 129 Coating processing unit 139 Development processing unit 500, 500a to 500h Substrate transporting apparatus 501, 502, 503 Guide rail 510 Moving member , 511 ... vertical direction drive motor, 512 ... vertical direction encoder, 513 ... horizontal direction drive motor, 514 ... horizontal direction encoder, 515 ... rotation direction drive motor, 516 ... rotation direction d Coder, 520: rotating member, 521, 522: support member, 525: upper hand advancing / retracting drive motor, 526 ... upper hand encoder, 527 ... lower hand advancing / retracting drive motor, 528 ... lower hand encoder, 530 ... control unit, 550 ... Operation unit, 590 ... Display unit, C1, C2 ... Camera, CP ... Cooling unit, EEW ... Edge exposure unit, H1, H2 ... Hand, P-BF1, P-BF2 ... Placement and buffer unit, P-CP ... Mounting and cooling unit, PAHP: adhesion strengthening processing unit, PASS1 to PASS9: substrate mounting portion, PHP: heating unit, r1, r2: reference position, SD1, SD2: cleaning and drying processing unit, W: substrate

Claims (9)

A substrate transfer apparatus for transferring a substrate to be transferred to a substrate support unit or a substrate received from the substrate support unit, comprising:
A holder configured to hold a substrate;
A drive unit for moving the holding unit;
An imaging unit attached to the holding unit;
A control unit configured to be operable in the transport mode and the teaching mode;
The control unit
A position acquisition unit that acquires the position of the holding unit;
The holding unit stores positional information indicating a delivery position to which the holding unit should move in order to pass the substrate to the substrate supporting unit or the holding unit receives the substrate from the substrate supporting unit, and the holding unit A storage unit that stores reference image data indicating an image of the substrate support unit to be obtained by the imaging unit in a state of being in a normal delivery position;
A movement control unit for moving the holding unit to a provisional delivery position by controlling the drive unit based on the position information stored in the storage unit in the teaching mode;
An image data acquisition unit that acquires actual image data indicating an image of the substrate support unit obtained by the imaging unit after the holding unit has moved to the temporary delivery position in the teaching mode;
In the teaching mode, the holding unit controls the provisional transfer position by controlling the drive unit based on the actual image data acquired by the image data acquisition unit and the reference image data stored in the storage unit. A position adjustment unit that adjusts the position of the holding unit so as to move to the normal delivery position from the
And a position information updating unit for updating the position information stored in the storage unit based on the position acquired by the position acquiring unit after the position adjusting unit adjusts the position of the holding unit in the teaching mode. ,
The substrate transfer apparatus, wherein the movement control unit moves the holding unit to the regular delivery position by controlling the drive unit based on the updated position information stored in the storage unit in the conveyance mode. . In the teaching mode, the position adjustment unit has a predetermined degree of coincidence between an image based on actual image data acquired by the image data acquisition unit and an image based on reference image data stored in the storage unit. The substrate transfer apparatus according to claim 1, wherein the position of the holding unit is adjusted to be larger than a coincidence degree threshold value. The reference image data stored in the storage unit is image data representing an image of the substrate support unit obtained by the imaging unit when the holding unit is at the normal delivery position. Substrate transport equipment. The control unit, in the teaching mode, calculating a shift amount between the provisional delivery position and the normal delivery position and storing the calculated shift amount, and
In the teaching mode, when a new deviation amount is stored in the deviation amount storage unit, a difference between the new deviation amount and the deviation amount stored in the deviation amount storage unit at the previous teaching is calculated. The substrate transfer apparatus according to any one of claims 1 to 3, further comprising: an alarm output unit that outputs an alarm when the calculated difference is larger than a predetermined difference threshold. Further comprising a display unit,
5. The display device according to claim 1, wherein the control unit further includes a display control unit configured to control the display unit to display an image based on actual image data acquired by the image data acquisition unit in the teaching mode. The substrate transfer apparatus according to any one of the preceding claims. The substrate according to claim 5, wherein the display control unit controls the display unit to superimpose and display information related to an image based on the reference image data on the image displayed on the display unit in the teaching mode. Transport device. It further comprises an operation unit operable by the user to correct the position of the holding unit,
The control unit further includes a position correction unit that corrects the position of the holding unit adjusted by the position adjustment unit in response to an operation of the operation unit in the teaching mode.
The position information updating unit, when the position correcting unit corrects the position of the holding unit adjusted by the position adjusting unit in the teaching mode, the position acquiring unit after the correction by the position correcting unit The substrate transfer apparatus according to any one of claims 1 to 6, wherein the position information stored in the storage unit is updated based on the acquired position. A substrate processing apparatus for processing a substrate, wherein
A processing unit having the substrate support and configured to process a substrate supported by the substrate support;
And the substrate transfer apparatus according to any one of claims 1 to 7.
The control unit of the substrate transport apparatus transports a substrate to be transferred to the processing unit or a substrate received from the processing unit by controlling the drive unit in the transport mode. A teaching method of a substrate transfer apparatus for transferring a substrate to be transferred to a substrate support unit or a substrate received from the substrate support unit, comprising:
The substrate transfer apparatus is
A holder configured to hold a substrate;
And a drive unit for moving the holding unit,
The teaching method is
Attaching an imaging unit to the holding unit;
The holding unit stores positional information indicating a delivery position to which the holding unit should move in order to pass the substrate to the substrate supporting unit or the holding unit receives the substrate from the substrate supporting unit, and the holding unit Storing reference image data indicating an image of the substrate support to be obtained by the imaging unit in a normal delivery position;
Moving the holding unit to a provisional delivery position by controlling the drive unit based on the position information stored in the storing step;
Acquiring real image data indicating an image of the substrate support unit obtained by the imaging unit after the holding unit has moved to the provisional delivery position;
By controlling the drive unit based on the actual image data acquired in the step of acquiring the actual image data and the reference image data stored in the storing step, the holding unit starts from the provisional delivery position. Adjusting the position of the holding unit to move to the regular delivery position;
Substrate transfer including: after adjustment of the position of the holding unit by the adjusting step, acquiring the position of the holding unit and updating the position information stored in the storing step based on the acquired position Device teaching method.

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