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JP2017209607A - Method of treating polarizer production waste liquid - Google Patents

Method of treating polarizer production waste liquid Download PDF

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JP2017209607A
JP2017209607A JP2016103022A JP2016103022A JP2017209607A JP 2017209607 A JP2017209607 A JP 2017209607A JP 2016103022 A JP2016103022 A JP 2016103022A JP 2016103022 A JP2016103022 A JP 2016103022A JP 2017209607 A JP2017209607 A JP 2017209607A
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waste liquid
polarizing plate
production waste
concentration
treating
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JP6841481B2 (en
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濱村　秀樹
Hideki Hamamura
秀樹 濱村
和郎 吉井
Kazuo Yoshii
和郎 吉井
向田　民人
Tamito Mukoda
民人 向田
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Sasakura Engineering Co Ltd
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Sasakura Engineering Co Ltd
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Priority to TW106109972A priority patent/TWI750158B/en
Priority to KR1020170057953A priority patent/KR102354481B1/en
Priority to CN201710371923.1A priority patent/CN107416866A/en
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
    • C01D3/00—Halides of sodium, potassium or alkali metals in general
    • C01D3/12—Iodides
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/048—Purification of waste water by evaporation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/22—Treatment of water, waste water, or sewage by freezing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00—Treatment of sludge; Devices therefor
    • C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
    • C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
    • C02F11/122—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering using filter presses
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00—Treatment of sludge; Devices therefor
    • C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
    • C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
    • C02F11/127—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering by centrifugation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/40—Valorisation of by-products of wastewater, sewage or sludge processing

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Polarising Elements (AREA)
  • Treating Waste Gases (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method of treating polarizer production waste liquid that can recover efficiently and easily potassium iodide solution from polarizer production waste liquid.SOLUTION: The present invention provides a method of treating polarizer production waste liquid that recovers potassium iodide solution from polarizer production waste liquid, the method including a concentration step 1 for subjecting polarizer production waste liquid to an evaporative concentration treatment while maintaining the pH of it in 3.5-8.0, to produce a deposit containing boric acid and polyvinyl alcohol, and a solid-liquid separation step 3 for recovering a filtrate resulting from the solid-liquid separation of the deposit, from the polarizer production waste liquid.SELECTED DRAWING: Figure 1

Description

本発明は、偏光板製造廃液の処理方法に関し、より詳しくは、偏光板の製造工程で生じる廃液からヨウ化カリウム溶液を回収する偏光板製造廃液の処理方法に関する。   The present invention relates to a method for treating a polarizing plate production waste liquid, and more particularly to a method for treating a polarizing plate production waste liquid for recovering a potassium iodide solution from the waste liquid produced in the production process of a polarizing plate.

偏光板の製造工程で生じる廃液には、ヨウ素やホウ素、カリウム等の無機物成分や、ポリビニルアルコール（ＰＶＡ）等の有機物成分が含まれており、このような偏光板製造廃液の処理方法が従来から検討されている。   The waste liquid produced in the manufacturing process of the polarizing plate contains inorganic components such as iodine, boron, and potassium, and organic components such as polyvinyl alcohol (PVA). It is being considered.

従来の偏光板製造廃液の処理方法としては、水酸化ナトリウム等のアルカリを添加して濃縮することが一般的であるが、ヨウ素の回収が煩雑になり易いことから、特許文献１には、廃液を電気透析することにより有機物成分を含む脱塩液と無機物成分を含む濃縮液とを分離し、濃縮液を更に処理することでヨウ素分等を回収することが開示されている。   As a conventional method for treating a polarizing plate production waste liquid, it is common to add and concentrate an alkali such as sodium hydroxide. However, since the recovery of iodine tends to be complicated, Patent Document 1 discloses a waste liquid. Is separated from a desalted solution containing an organic component and a concentrated solution containing an inorganic component by electrodialysis, and iodine is recovered by further processing the concentrated solution.

特開２００１−３１４８６４号公報JP 2001-314864 A

ところが、上記のように廃液を電気透析によって処理する方法は、メンテナンス上の問題が生じ易いと共に、装置コストが高くなるという問題があった。   However, the method of treating the waste liquid by electrodialysis as described above has a problem that maintenance problems are likely to occur and the cost of the apparatus is increased.

そこで、本発明は、偏光板製造廃液からヨウ化カリウム溶液を容易に効率良く回収することができる偏光板製造廃液の処理方法の提供を目的とする。   Then, this invention aims at provision of the processing method of the polarizing plate manufacturing waste liquid which can collect | recover potassium iodide solution easily from a polarizing plate manufacturing waste liquid efficiently.

本発明の前記目的は、偏光板製造廃液からヨウ化カリウム溶液を回収する偏光板製造廃液の処理方法であって、偏光板製造廃液のｐＨを３．５〜８．０に維持しながら蒸発濃縮し、ホウ酸およびポリビニルアルコールを含む析出物を生成する濃縮工程と、偏光板製造廃液から前記析出物を固液分離したろ液を回収する固液分離工程とを備える偏光板製造廃液の処理方法により達成される。   The object of the present invention is a method of treating a polarizing plate manufacturing waste liquid for recovering a potassium iodide solution from the polarizing plate manufacturing waste liquid, and evaporating and concentrating while maintaining the pH of the polarizing plate manufacturing waste liquid at 3.5 to 8.0. And a method for treating a polarizing plate manufacturing waste liquid comprising: a concentration step for producing a precipitate containing boric acid and polyvinyl alcohol; and a solid-liquid separation step for recovering a filtrate obtained by solid-liquid separation of the precipitate from the polarizing plate manufacturing waste liquid. Is achieved.

この偏光板製造廃液の処理方法は、前記濃縮工程と前記固液分離工程との間に、蒸発濃縮後の偏光板製造廃液を冷却晶析する冷却晶析工程を備えることが好ましい。   It is preferable that the processing method of this polarizing plate manufacturing waste liquid is equipped with the cooling crystallization process which cools and crystallizes the polarizing plate manufacturing waste liquid after evaporation concentration between the said concentration process and the said solid-liquid separation process.

また、前記濃縮工程で生成された蒸気をヨウ素ガスの回収後に凝縮させる凝縮工程を更に備えることが好ましい。   Moreover, it is preferable to further comprise a condensing step for condensing the vapor generated in the concentrating step after recovering iodine gas.

本発明によれば、偏光板製造廃液からヨウ化カリウム溶液を容易に効率良く回収することができる偏光板製造廃液の処理方法を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the processing method of the polarizing plate manufacturing waste liquid which can collect | recover potassium iodide solution from a polarizing plate manufacturing waste liquid easily and efficiently can be provided.

本発明の一実施形態に係る偏光板製造廃液の処理方法の概略工程図である。It is a schematic process drawing of the processing method of the polarizing plate manufacture waste liquid concerning one embodiment of the present invention. ヨウ化カリウムおよびホウ酸の相互溶解度を示すグラフを用いて、図１に示す偏光板製造廃液の処理方法を説明した図である。It is the figure explaining the processing method of the polarizing plate manufacture waste liquid shown in FIG. 1 using the graph which shows the mutual solubility of potassium iodide and boric acid. 本発明の他の実施形態に係る偏光板製造廃液の処理方法の概略工程図である。It is a schematic process drawing of the processing method of the polarizing plate manufacture waste liquid concerning other embodiments of the present invention. ヨウ化カリウムおよびホウ酸の相互溶解度を示すグラフを用いて、図２に示す偏光板製造廃液の処理方法を説明した図である。It is the figure explaining the processing method of the polarizing plate manufacture waste liquid shown in FIG. 2 using the graph which shows the mutual solubility of potassium iodide and boric acid.

以下、本発明の一実施形態について添付図面を参照して説明する。図１は、本発明の一実施形態に係る偏光板製造廃液の処理方法の概略工程図である。図１に示すように、偏光板製造廃液の処理方法は、まず偏光板製造廃液を濃縮工程１において蒸発濃縮する。   Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a schematic process diagram of a polarizing plate production waste liquid treatment method according to an embodiment of the present invention. As shown in FIG. 1, in the method for treating a polarizing plate production waste liquid, first, the polarizing plate production waste liquid is evaporated and concentrated in a concentration step 1.

偏光板製造廃液は、液晶ディスプレイ等に使用される偏光板の製造工程で生じる廃液である。偏光板の製造工程においては、一般に、ポリビニルアルコール（ＰＶＡ）からなるフィルムをヨウ化カリウム（ＫＩ）溶液に浸漬させた後、ホウ酸（Ｈ３ＢＯ３）水溶液中で延伸させ、水洗および乾燥を経て偏光板が製造される。このため、偏光板製造廃液には、ＰＶＡが含まれており、更に、ＫＩやＨ３ＢＯ３等が主にイオンの状態で含まれている。偏光板製造廃液のｐＨは、３．５〜８．０の範囲にあり、ホウ酸溶液を含むため通常は酸性であるが、中性付近の偏光板製造廃液であってもよい。 The polarizing plate production waste liquid is a waste liquid produced in the production process of a polarizing plate used for a liquid crystal display or the like. In the manufacturing process of a polarizing plate, generally, after a film made of polyvinyl alcohol (PVA) is immersed in a potassium iodide (KI) solution, it is stretched in an aqueous solution of boric acid (H 3 BO 3 ), washed with water and dried. After that, a polarizing plate is manufactured. For this reason, the polarizing plate production waste liquid contains PVA, and further contains KI, H 3 BO 3 and the like mainly in an ionic state. The pH of the polarizing plate production waste liquid is in the range of 3.5 to 8.0 and is usually acidic because it contains a boric acid solution, but it may be a neutral polarizing plate production waste liquid.

濃縮工程１は、従来のように水酸化ナトリウム等のアルカリを添加することなく、酸性から中性を維持しながら蒸発濃縮することにより行われる。濃縮工程１における蒸発濃縮方法は特に限定されないが、例えば、蒸発缶に供給した偏光板製造廃液を、蒸発缶内に配置された伝熱管群の表面に散布して蒸発させる方法や、偏光板製造廃液を加熱した後にフラッシュ缶に導入してフラッシュ蒸発させる方法等を挙げることができる。   The concentration step 1 is performed by evaporating and concentrating while maintaining neutrality from acidity without adding an alkali such as sodium hydroxide as in the prior art. The evaporation concentration method in the concentration step 1 is not particularly limited. For example, the polarizing plate manufacturing waste liquid supplied to the evaporator can be sprayed on the surface of the heat transfer tube group arranged in the evaporator and evaporated. An example is a method in which the waste liquid is heated and then introduced into a flash can for flash evaporation.

偏光板製造廃液が酸性の状態で濃縮される場合、蒸発缶やフラッシュ缶の接液部や接ガス部には、耐食性の高い樹脂材料等を使用することが好ましい。   When the polarizing plate production waste liquid is concentrated in an acidic state, it is preferable to use a highly corrosion-resistant resin material or the like for the liquid contact part or gas contact part of the evaporator or flash can.

濃縮工程１で生成された蒸気は、凝縮工程２において凝縮されて凝縮水が生成される。凝縮工程２は、例えば、濃縮工程１で使用した蒸発缶やフラッシュ缶から蒸気配管を介して凝縮器に蒸気を導入し、冷却水で冷却することにより行われる。蒸気に含まれるヨウ素ガス（Ｉ２ガス）は、還元剤の添加により発生を抑制することも可能であるが、還元剤を添加することなくＩ２ガスを回収することが好ましい。すなわち、蒸発缶またはフラッシュ缶と凝縮器との間にスクラバーを設置し、蒸気に同伴されるヨウ素を、スクラバー内でＫＯＨ等のアルカリ溶液に吸収させて回収することができる。ＫＯＨスクラバーの内部は、ｐＨが１１〜１３となるように制御することが好ましい。Ｉ２ガスを吸収除去した後の蒸気は、凝縮器において凝縮することができるが、一部または全部を、蒸気圧縮機により昇温して濃縮工程１の加熱源として利用することもできる。ＫＯＨスクラバーにおいてＩ２ガスとの反応により生成されたＫＩは、濃縮工程１において偏光板製造廃液と共に更に濃縮してもよい。 The vapor generated in the concentration step 1 is condensed in the condensation step 2 to generate condensed water. The condensation process 2 is performed, for example, by introducing steam from the evaporator or flash can used in the concentration process 1 into the condenser via a steam pipe and cooling with cooling water. Although generation of iodine gas (I 2 gas) contained in the vapor can be suppressed by adding a reducing agent, it is preferable to recover the I 2 gas without adding a reducing agent. That is, a scrubber is installed between the evaporator or flash can and the condenser, and iodine accompanying the vapor can be recovered by being absorbed in an alkaline solution such as KOH in the scrubber. The inside of the KOH scrubber is preferably controlled so that the pH is 11-13. The vapor after absorbing and removing the I 2 gas can be condensed in the condenser, but a part or all of the vapor can be used as a heating source in the concentration step 1 by raising the temperature with a vapor compressor. The KI produced by the reaction with I 2 gas in the KOH scrubber may be further concentrated together with the polarizing plate production waste liquid in the concentration step 1.

一方、濃縮工程１で廃液が濃縮されると、廃液に含まれているホウ酸が析出する。図２は、ヨウ化カリウム（ＫＩ）およびホウ酸（Ｈ３ＢＯ３）の相互溶解度を溶液に対する重量％で示す図である。濃縮工程１を行う前の偏光板製造廃液に含まれるＫＩおよびＨ３ＢＯ３の濃度がＡ点で表される場合に、濃縮工程１において偏光板製造廃液を７０℃で蒸発濃縮すると、ＫＩおよびＨ３ＢＯ３の濃度はＢ点に移動する。ＫＩおよびＨ３ＢＯ３は、Ａ点からＢ点まで移動する間、偏光板製造廃液中に溶解された状態が維持される。 On the other hand, when the waste liquid is concentrated in the concentration step 1, boric acid contained in the waste liquid is precipitated. FIG. 2 is a graph showing the mutual solubility of potassium iodide (KI) and boric acid (H 3 BO 3 ) in weight% with respect to the solution. When the concentration of KI and H 3 BO 3 contained in the polarizing plate manufacturing waste liquid before concentration step 1 is represented by point A, when the polarizing plate manufacturing waste liquid is evaporated and concentrated at 70 ° C. in concentration step 1, KI and The concentration of H 3 BO 3 moves to point B. While KI and H 3 BO 3 move from point A to point B, the state of being dissolved in the polarizing plate production waste liquid is maintained.

この後、７０℃に維持しながら偏光板製造廃液を更に蒸発濃縮するとＨ３ＢＯ３の析出が開始され、Ｈ３ＢＯ３の結晶を発生しながら、偏光板製造廃液中のＫＩおよびＨ３ＢＯ３の濃度が、溶解度線に沿ってＢ点からＣ点まで移動する。Ｃ点における濃縮後の偏光板製造廃液は、ＫＩが高濃度（例えば２０％以上）である一方、Ｈ３ＢＯ３は低濃度である。 Thereafter, when the polarizing plate manufacturing waste liquid is further evaporated and concentrated while maintaining at 70 ° C., precipitation of H 3 BO 3 starts, and crystals of H 3 BO 3 are generated, while KI and H 3 BO in the polarizing plate manufacturing waste liquid are generated. The concentration of 3 moves from point B to point C along the solubility line. The polarizing plate production waste liquid after concentration at point C has a high concentration (for example, 20% or more) of KI, while H 3 BO 3 has a low concentration.

また、偏光板製造廃液にはＰＶＡが含まれていることから、上記のように偏光板製造廃液を高温で蒸発濃縮することにより、ＰＶＡが重合してコロイド状になる。一例として、濃縮工程１を行う前の偏光板製造廃液中にＰＶＡが０．３重量％含まれている場合に、濃縮工程１を５０℃以上で行うことにより、ＰＶＡの６０％以上を分離可能にすることができる。   Moreover, since the polarizing plate production waste liquid contains PVA, the PVA is polymerized into a colloid by evaporating and concentrating the polarizing plate production waste liquid at a high temperature as described above. As an example, when 0.3% by weight of PVA is contained in the polarizing plate manufacturing waste liquid before performing concentration step 1, it is possible to separate 60% or more of PVA by performing concentration step 1 at 50 ° C. or higher. Can be.

こうして、濃縮工程１により濃縮された偏光板製造廃液は、この偏光板製造廃液に含まれていたホウ酸およびＰＶＡの多くがスラッジとなる。このスラッジを含む偏光板製造廃液は、固液分離工程３において、ＫＩ溶液と析出物とに固液分離される。固液分離の方法は、特に限定されるものではないが、例えば、加圧ろ過（フィルタープレス）、真空ろ過、遠心ろ過などの各種ろ過や、デカンター型などの遠心分離など、公知の方法を使用することができる。   Thus, in the polarizing plate manufacturing waste liquid concentrated in the concentration step 1, most of boric acid and PVA contained in the polarizing plate manufacturing waste liquid becomes sludge. In the solid-liquid separation step 3, the polarizing plate manufacturing waste liquid containing the sludge is solid-liquid separated into a KI solution and a precipitate. The method of solid-liquid separation is not particularly limited, but for example, known methods such as various types of filtration such as pressure filtration (filter press), vacuum filtration, centrifugal filtration, and decanter type centrifugation are used. can do.

固液分離工程３により得られたＫＩ溶液のろ液は、上記のように高濃度であることから偏光板の製造工程において再利用可能である。このろ液は、ＫＩの純度を高めるために更に濃縮することにより、ＫＩ結晶を取得してもよい。一方、ホウ酸やＰＶＡ等の析出物は、適宜回収するか廃棄物処理される。   Since the filtrate of the KI solution obtained by the solid-liquid separation process 3 has a high concentration as described above, it can be reused in the manufacturing process of the polarizing plate. This filtrate may be further concentrated to increase the purity of KI to obtain KI crystals. On the other hand, precipitates such as boric acid and PVA are appropriately recovered or disposed of as waste.

本実施形態の偏光板製造廃液の処理方法は、偏光板製造廃液に対してアルカリを添加することなく蒸発濃縮した後、ホウ酸やＰＶＡなどの不純物の大部分を固液分離して除去することにより、偏光板の製造工程で再利用可能なレベルのＫＩ溶液をオンサイトで容易に回収することができるので、偏光板の製造工程におけるＫＩの継ぎ足し量を削減することができる。   The processing method of the polarizing plate manufacturing waste liquid of this embodiment is to remove most of impurities such as boric acid and PVA by solid-liquid separation after evaporating and concentrating the polarizing plate manufacturing waste liquid without adding alkali. Thus, the KI solution at a level that can be reused in the manufacturing process of the polarizing plate can be easily collected on-site, so that the amount of KI added in the manufacturing process of the polarizing plate can be reduced.

以上、本発明の一実施形態について詳述したが、本発明の具体的な態様は上記実施形態に限定されない。例えば、図１に示す偏光板製造廃液の処理方法における濃縮工程１と固液分離工程３との間に、図３に示すように冷却晶析工程４を追加してもよい。冷却晶析工程４は、例えば、晶析槽の内部または外壁に沿って熱交換器を配置し、晶析槽に供給した偏光板製造廃液を撹拌翼により撹拌しながら冷却する装置を用いて行うことができる。熱交換器に供給する冷媒としては、冷却塔により冷却された冷却水を用いることが好ましいが、工業用水や海水等を冷媒として使用してもよい。冷却晶析工程４においては、偏光板製造廃液を、４５℃以下、好ましくは４０〜４５℃、さらに好ましくは常温（具体例としては３０℃以下）まで冷却することが好ましい。   As mentioned above, although one Embodiment of this invention was explained in full detail, the specific aspect of this invention is not limited to the said embodiment. For example, a cooling crystallization step 4 may be added as shown in FIG. 3 between the concentration step 1 and the solid-liquid separation step 3 in the method for treating a polarizing plate production waste liquid shown in FIG. The cooling crystallization step 4 is performed using, for example, an apparatus in which a heat exchanger is disposed along the inside or the outer wall of the crystallization tank, and the polarizing plate production waste liquid supplied to the crystallization tank is cooled while being stirred by a stirring blade. be able to. As the refrigerant supplied to the heat exchanger, it is preferable to use cooling water cooled by a cooling tower, but industrial water, seawater, or the like may be used as the refrigerant. In the cooling and crystallization step 4, it is preferable to cool the polarizing plate production waste liquid to 45 ° C. or lower, preferably 40 to 45 ° C., more preferably room temperature (specifically 30 ° C. or lower).

この偏光板製造廃液の処理方法によれば、図１に示す偏光板製造廃液の処理方法と同様に、濃縮工程１によりホウ酸およびＰＶＡをＫＩ溶液から分離可能なスラッジにした後、冷却晶析工程４によりホウ酸を更に晶析することで、より純度の高いＫＩ溶液を得ることができる。すなわち、図４に示すＫＩおよびＨ３ＢＯ３の相互溶解度を示す図において、濃縮工程１によりＡ点からＢ点を経てＣ点まで移動したＫＩおよびＨ３ＢＯ３の濃度が、冷却晶析工程４によりＤ点まで移動するため、濃縮後の偏光板製造廃液に含まれるＨ３ＢＯ３の濃度が更に低減される。 According to this polarizing plate manufacturing waste liquid treatment method, as with the polarizing plate manufacturing waste liquid processing method shown in FIG. By further crystallizing boric acid in step 4, a more pure KI solution can be obtained. That is, in the diagram showing the mutual solubility of KI and H 3 BO 3 shown in FIG. 4, the concentrations of KI and H 3 BO 3 that have moved from point A through point B to point C in concentration step 1 are the cooling crystallization step. 4 moves to point D, so that the concentration of H 3 BO 3 contained in the concentrated polarizing plate manufacturing waste liquid is further reduced.

１ 濃縮工程
２ 凝縮工程
３ 固液分離工程
４ 冷却晶析工程 DESCRIPTION OF SYMBOLS 1 Concentration process 2 Condensation process 3 Solid-liquid separation process 4 Cooling crystallization process

Claims (3)

偏光板製造廃液からヨウ化カリウム溶液を回収する偏光板製造廃液の処理方法であって、
偏光板製造廃液のｐＨを３．５〜８．０に維持しながら蒸発濃縮し、ホウ酸およびポリビニルアルコールを含む析出物を生成する濃縮工程と、
偏光板製造廃液から前記析出物を固液分離したろ液を回収する固液分離工程とを備える偏光板製造廃液の処理方法。 A method for treating a polarizing plate manufacturing waste liquid for recovering a potassium iodide solution from a polarizing plate manufacturing waste liquid,
A concentration step of evaporating and concentrating while maintaining the pH of the polarizing plate production waste liquid at 3.5 to 8.0 to produce a precipitate containing boric acid and polyvinyl alcohol;
A method for treating a polarizing plate production waste liquid, comprising: a solid-liquid separation step of recovering a filtrate obtained by solid-liquid separation of the precipitate from the polarizing plate production waste liquid. 前記濃縮工程と前記固液分離工程との間に、蒸発濃縮後の偏光板製造廃液を冷却晶析する冷却晶析工程を備える請求項１に記載の偏光板製造廃液の処理方法。   The processing method of the polarizing plate manufacturing waste liquid of Claim 1 provided with the cooling crystallization process of cooling and crystallizing the polarizing plate manufacturing waste liquid after evaporation concentration between the said concentration process and the said solid-liquid separation process. 前記濃縮工程で生成された蒸気をヨウ素ガスの回収後に凝縮させる凝縮工程を更に備える請求項１または２に記載の偏光板製造廃液の処理方法。   The processing method of the polarizing plate manufacture waste liquid of Claim 1 or 2 further equipped with the condensation process which condenses the vapor | steam produced | generated at the said concentration process after collection | recovery of iodine gas.
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