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JP2017134370A5 - - Google Patents

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Publication number
JP2017134370A5
JP2017134370A5 JP2016016527A JP2016016527A JP2017134370A5 JP 2017134370 A5 JP2017134370 A5 JP 2017134370A5 JP 2016016527 A JP2016016527 A JP 2016016527A JP 2016016527 A JP2016016527 A JP 2016016527A JP 2017134370 A5 JP2017134370 A5 JP 2017134370A5
Authority
JP
Japan
Prior art keywords
optical laminate
subjected
except
results
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016016527A
Other languages
Japanese (ja)
Other versions
JP6945965B2 (en
JP2017134370A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2016016527A priority Critical patent/JP6945965B2/en
Priority claimed from JP2016016527A external-priority patent/JP6945965B2/en
Priority to KR1020187021638A priority patent/KR20180107116A/en
Priority to CN201780008717.2A priority patent/CN108603965A/en
Priority to PCT/JP2017/003049 priority patent/WO2017131200A1/en
Publication of JP2017134370A publication Critical patent/JP2017134370A/en
Publication of JP2017134370A5 publication Critical patent/JP2017134370A5/ja
Application granted granted Critical
Publication of JP6945965B2 publication Critical patent/JP6945965B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

<比較例1>
応力緩和層の厚みをμmとしたこと以外は実施例1と同様にして光学積層体を作製した。得られた光学積層体を実施例1と同様の評価に供した。結果を表1に示す。
<Comparative Example 1>
An optical laminate was produced in the same manner as in Example 1 except that the thickness of the stress relaxation layer was 8 μm. The obtained optical laminate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

<比較例2>
応力緩和層の厚みを10μmとしたこと以外は実施例1と同様にして光学積層体を作製した。得られた光学積層体を実施例1と同様の評価に供した。結果を表1に示す。

<Comparative example 2>
An optical laminate was prepared in the same manner as in Example 1 except that the thickness of the stress relaxation layer was 10 μm. The obtained optical laminate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

JP2016016527A 2016-01-29 2016-01-29 Optical laminate Expired - Fee Related JP6945965B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016016527A JP6945965B2 (en) 2016-01-29 2016-01-29 Optical laminate
KR1020187021638A KR20180107116A (en) 2016-01-29 2017-01-27 The optical laminate
CN201780008717.2A CN108603965A (en) 2016-01-29 2017-01-27 Optical laminate
PCT/JP2017/003049 WO2017131200A1 (en) 2016-01-29 2017-01-27 Optical laminate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016016527A JP6945965B2 (en) 2016-01-29 2016-01-29 Optical laminate

Publications (3)

Publication Number Publication Date
JP2017134370A JP2017134370A (en) 2017-08-03
JP2017134370A5 true JP2017134370A5 (en) 2019-02-21
JP6945965B2 JP6945965B2 (en) 2021-10-06

Family

ID=59398349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016016527A Expired - Fee Related JP6945965B2 (en) 2016-01-29 2016-01-29 Optical laminate

Country Status (4)

Country Link
JP (1) JP6945965B2 (en)
KR (1) KR20180107116A (en)
CN (1) CN108603965A (en)
WO (1) WO2017131200A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111093972B (en) * 2017-09-15 2022-10-28 住友化学株式会社 Laminates and Equipment
JP7369536B2 (en) * 2019-03-27 2023-10-26 リンテック株式会社 Laminated sheet roll
CN115857133A (en) * 2022-11-17 2023-03-28 业成科技(成都)有限公司 Laminating structure of curved surface optical lens and optical module applying same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001311062A (en) * 2001-03-07 2001-11-09 Lintec Corp Tacky sheet
TW564471B (en) * 2001-07-16 2003-12-01 Semiconductor Energy Lab Semiconductor device and peeling off method and method of manufacturing semiconductor device
JP4742787B2 (en) * 2005-09-29 2011-08-10 大日本印刷株式会社 Barrier substrate for organic electroluminescence device
KR101392004B1 (en) * 2006-11-16 2014-05-07 미쓰비시 쥬시 가부시끼가이샤 gas barrier film laminate
JP2008143931A (en) * 2006-12-06 2008-06-26 Nitto Denko Corp Impact-absorbing adhesive sheet and polarizing plate having impact-absorbing adhesive layer
JP2009090632A (en) * 2007-09-19 2009-04-30 Fujifilm Corp LAMINATED FILM AND LIGHT EMITTING ELEMENT OR DISPLAY ELEMENT USING THE SAME
JP2010191158A (en) * 2009-02-18 2010-09-02 Sony Corp Method of manufacturing polarizing film and polarizer, polarizing film manufactured by the same, polarizer using the polarizing film and liquid crystal display device
CN103380229B (en) * 2011-02-25 2016-05-04 三菱综合材料株式会社 Transparent oxide film and manufacture method thereof
WO2013161894A1 (en) * 2012-04-25 2013-10-31 コニカミノルタ株式会社 Gas barrier film, substrate for electronic device, and electronic device
CN105934338B (en) * 2014-01-27 2017-11-17 东丽株式会社 Gas barrier film
JP6340843B2 (en) * 2014-03-14 2018-06-13 東レ株式会社 Gas barrier film
JP6368678B2 (en) * 2014-04-16 2018-08-01 富士フイルム株式会社 Polarizing plate, image display device, and liquid crystal display device

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