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JP2017098526A - Wiring board - Google Patents

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Publication number
JP2017098526A
JP2017098526A JP2016158411A JP2016158411A JP2017098526A JP 2017098526 A JP2017098526 A JP 2017098526A JP 2016158411 A JP2016158411 A JP 2016158411A JP 2016158411 A JP2016158411 A JP 2016158411A JP 2017098526 A JP2017098526 A JP 2017098526A
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Japan
Prior art keywords
substrate body
heat sink
hole
stress relaxation
wiring board
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JP2016158411A
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JP6881913B2 (en
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憲助 松橋
Kensuke Matsuhashi
憲助 松橋
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Priority to US15/350,262 priority Critical patent/US10039179B2/en
Priority to CN201611012462.0A priority patent/CN106879163B/en
Priority to EP16199390.2A priority patent/EP3171402B1/en
Publication of JP2017098526A publication Critical patent/JP2017098526A/en
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0201Thermal arrangements, e.g. for cooling, heating or preventing overheating
    • H05K1/0203Cooling of mounted components
    • H05K1/021Components thermally connected to metal substrates or heat-sinks by insert mounting
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10227Other objects, e.g. metallic pieces
    • H05K2201/10416Metallic blocks or heatsinks completely inserted in a PCB

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Structure Of Printed Boards (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a wiring board in which the size and the total number of elements to be mounted later are less likely to be restricted by the surface of a metallic heatsink inserted into a through hole penetrating between the front surface and the rear surface of a substrate body made from ceramic, and cracks and the like are less likely to occur in the vicinity of the joining part of the ceramic of the substrate body when the heatsink is brazed.SOLUTION: A wiring board 1 includes: a substrate body 2 made from ceramic c1-c4, having a front surface 3 and a rear surface 4, and having a through hole 6 penetrating between the front surface 3 and the rear surface 4; and a heatsink 11 inserted into the through hole 6. A step portion 7 protruding in a direction perpendicular to an axial direction of the through hole 6, is formed over an entire periphery on inner wall surfaces 8, 9 of the through hole 6 of the substrate body 2. A flange 12 opposed to the step portion 7 is provided so as to protrude, over an entire periphery on a side surface of the heatsink 11. A stress relaxing ring 16 is arranged over an entire periphery between the step portion 7 and a joining surface 15 opposed to the step portion 7. A brazing material 27 is provided between the ring 16, and the joining surface 15 and the step portion 7.SELECTED DRAWING: Figure 3

Description

本発明は、セラミックからなる基板本体の表面と裏面との間を貫通する貫通孔内に発熱量の比較的大きな素子を表面に実装するための金属からなるヒートシンクを挿入した配線基板に関する。   The present invention relates to a wiring board in which a heat sink made of metal for mounting an element having a relatively large amount of heat generation on the surface thereof is inserted into a through hole penetrating between the front and back surfaces of a substrate body made of ceramic.

例えば、セラミックパッケージとヒートシンクとの間に、Cu系金属からなり且つ外周にPt、Pd、Rh、Ni、Coのうち1種あるいは2種以上の合金からなる皮膜を形成した応力緩和材を介在させ、かかる応力緩和材を介して上記セラミックパッケージとヒートシンクとを銀ロウなどにより接合してなるヒートシンク付きセラミックパッケージが提案されている(例えば、特許文献1参照)。   For example, between a ceramic package and a heat sink, a stress relaxation material made of a Cu-based metal and having a coating made of one or more alloys of Pt, Pd, Rh, Ni, and Co on the outer periphery is interposed. There has been proposed a ceramic package with a heat sink formed by joining the ceramic package and the heat sink with silver brazing or the like through such a stress relieving material (see, for example, Patent Document 1).

しかし、前記特許文献1の第1図に示されたように、平面視の中央側に貫通孔を有する複数のセラミック層を階段状に積層してセラミックパッケージを構成し、前記貫通孔の開口幅が最も狭い最下層のセラミック層の底面側に前記応力緩和材を介してヒートシンクをロウ付けした場合、該ヒートシンクの表面の実装面積が上記最下層のセラミック層における貫通孔の開口幅によって狭くならざるを得ない。その結果、追って実装すべき電子部品などの素子のサイズが制約されたり、実装すべき素子の総数が制限される、という問題点があった。
更に、前記ロウ付け後の熱収縮に伴って前記ヒートシンク内に生じる収縮応力が、該ヒートシンクの外周側の周辺部における全厚みを介して、隣接する前記セラミック層に伝わるため、かかるロウ付けされた該セラミック層の接合部付近にクラックや剥離が生じ易くなる、という問題点もあった。
However, as shown in FIG. 1 of Patent Document 1, a ceramic package is formed by laminating a plurality of ceramic layers having a through hole on the center side in a plan view, and an opening width of the through hole. When the heat sink is brazed to the bottom surface side of the lowermost ceramic layer having the narrowest through the stress relaxation material, the mounting area of the surface of the heat sink does not have to be narrowed by the opening width of the through hole in the lowermost ceramic layer. I do not get. As a result, there is a problem that the size of an element such as an electronic component to be mounted later is restricted or the total number of elements to be mounted is limited.
Further, since the shrinkage stress generated in the heat sink due to the heat shrinkage after the brazing is transmitted to the adjacent ceramic layer through the entire thickness at the outer peripheral side of the heat sink, the brazing is performed. There was also a problem that cracks and peeling easily occur in the vicinity of the joint portion of the ceramic layer.

特公平7−77988号公報(第1〜3頁、第1図)Japanese Examined Patent Publication No. 7-77788 (pages 1 to 3, Fig. 1)

本発明は、背景技術で説明した問題点を解決し、セラミックからなる基板本体の表面と裏面との間を貫通する貫通孔内に挿入する金属製のヒートシンクの表面が、追って実装すべき素子のサイズや総数の制約になりにくく、且つ上記ヒートシンクをロウ付けした際において上記基板本体のセラミックの接合部付近にクラックなどが生じ難い配線基板を提供する、ことを課題とする。   The present invention solves the problems described in the background art, and the surface of a metal heat sink inserted into a through-hole penetrating between the front surface and the back surface of a substrate body made of ceramic is used for an element to be mounted later. It is an object of the present invention to provide a wiring board that is less likely to be limited in size and total number and that is less likely to cause cracks or the like near the ceramic joint of the substrate body when the heat sink is brazed.

課題を解決するための手段および発明の効果Means for Solving the Problems and Effects of the Invention

本発明は、前記課題を解決するため、セラミックからなる基板本体の表面と裏面との間を貫通する貫通孔を形成する基板本体の内壁面に設けた段部と、且つ前記貫通孔内に挿入されるヒートシンクの側面の全周から外側向きに突設したフランジとを対向させ、かかる両者の間にロウ付けを施す、をことに着想して成されたものである。
即ち、本発明の配線基板(請求項1)は、セラミックからなり、表面および裏面を有し、且つ該表面と裏面との間を貫通する貫通孔を有する基板本体と、かかる基板本体の前記貫通孔に挿入されたヒートシンクと、を備えた配線基板であって、上記基板本体の貫通孔を形成する内壁面の全周には、該貫通孔の軸方向と直交する方向に突出する段部、あるいは平面視で周辺側よりも中央側が上記裏面に近付くように傾斜した段部が形成され、上記ヒートシンクの側面の全周には、前記段部に対向するフランジが突設されていると共に、上記段部と上記フランジにおいて該段部と対向する接合面との間の全周には、応力緩和リングが配置され、少なくとも、かかる応力緩和リングと上記フランジの接合面との間、および応力緩和リングと上記段部との間に前記ロウ材が配設されている、沿ってロウ材が配設されている、ことを特徴とする。
In order to solve the above-mentioned problems, the present invention provides a step provided on the inner wall surface of the substrate body that forms a through-hole penetrating between the front and back surfaces of the substrate body made of ceramic, and is inserted into the through-hole. It is conceived that the flange projecting outward from the entire circumference of the side surface of the heat sink to be opposed to each other and brazed between the two.
That is, the wiring board of the present invention (Claim 1) is made of ceramic, has a front surface and a back surface, and has a substrate body having a through-hole penetrating between the front surface and the back surface, and the penetration of the substrate body. A wiring board provided with a heat sink inserted into the hole, on the entire circumference of the inner wall surface forming the through hole of the substrate body, a stepped portion protruding in a direction perpendicular to the axial direction of the through hole, Alternatively, a stepped portion that is inclined so that the center side is closer to the back surface than the peripheral side in plan view is formed, and a flange facing the stepped portion is provided on the entire circumference of the side surface of the heat sink, and A stress relaxation ring is arranged on the entire circumference between the step portion and the joint surface facing the step portion in the flange, and at least between the stress relaxation ring and the joint surface of the flange, and the stress relaxation ring. And the above step The brazing material between is disposed, the brazing material along are disposed, it is characterized.

これによれば、前記貫通孔を形成する基板本体の段部と、ヒートシンクの側面の全周から該段部に対向して突設されたフランジとの間をロウ付けすることにより、基板本体と上記ヒートシンクとを接合しているので、以下の効果(1)〜(3)を奏することが可能となる。
(1)前記ヒートシンクの表面を、追って実装すべき素子の実装エリアに活用できる。即ち、前記基板本体に設ける貫通孔の大きさによって、追って実装すべき素子の実装エリアが制限を受け難くなる。従って、前記素子のサイズを比較的自由に選択でき、あるいは該素子の総数の制約を低減することが可能となる。
(2)前記ロウ付け後の熱収縮に伴って前記ヒートシンク内に生じる収縮応力は、該ヒートシンクの側面の全周から突設した比較的薄肉のフランジのみを介して、隣接する前記段部を形成している基板本体のセラミックに伝わるため、かかるロウ付けがされた該セラミックの接合部付近にクラックや剥離が生じにくくなる。
(3)前記ロウ付け後の熱収縮に伴って、前記ヒートシンク内に生じる収縮応力の一部が、上記応力緩和リングに吸収されるため、前記接合部付近にクラックや剥離が更に生じにくなるので、前記効果(2)を一層顕著に奏することができる。
According to this, by brazing between the stepped portion of the substrate body forming the through hole and the flange projecting from the entire circumference of the side surface of the heat sink so as to face the stepped portion, Since the heat sink is joined, the following effects (1) to (3) can be achieved.
(1) The surface of the heat sink can be used as a mounting area for elements to be mounted later. That is, depending on the size of the through hole provided in the substrate body, the mounting area of the element to be mounted later is not easily limited. Therefore, the size of the element can be selected relatively freely, or the restriction on the total number of the elements can be reduced.
(2) The shrinkage stress generated in the heat sink as the heat shrinks after brazing forms the adjacent stepped portion only through a relatively thin flange projecting from the entire circumference of the side surface of the heat sink. Since it is transmitted to the ceramic of the substrate main body, cracks and peeling are less likely to occur in the vicinity of the joint portion of the brazed ceramic.
(3) A part of the shrinkage stress generated in the heat sink with the thermal shrinkage after the brazing is absorbed by the stress relaxation ring, so that cracks and peeling further occur in the vicinity of the joint. Therefore, the effect (2) can be achieved more remarkably.

尚、前記セラミックは、アルミナ、ムライト、窒化アルミニウムなどの高温焼成セラミック、あるいは、ガラス−セラミックなどの低温焼成セラミックである。
また、前記基板本体は、単層のセラミック層からなる形態、あるいは、複数のセラミック層を積層した形態の何れでも良い。上記単層のセラミック層からなる場合には、表面にパッドが形成され、且つ裏面に接続端子が形成されると共に、これらの間を導通するビア導体が当該基板本体の厚み方向に沿って形成されている。一方、上記複数のセラミック層を積層した形態の場合には、上記パッド、接続端子、およびビア導体に加え、更にセラミック層間に配線層が形成されている。
更に、前記ヒートシンクは、例えば、W−Cu系合金、あるいはMo−Cu系合金からなる。
The ceramic is a high-temperature fired ceramic such as alumina, mullite, or aluminum nitride, or a low-temperature fired ceramic such as glass-ceramic.
Further, the substrate main body may be in a form composed of a single ceramic layer or a form in which a plurality of ceramic layers are laminated. When the single-layer ceramic layer is used, a pad is formed on the front surface, a connection terminal is formed on the back surface, and a via conductor is formed along the thickness direction of the substrate body. ing. On the other hand, in the case where the plurality of ceramic layers are laminated, a wiring layer is formed between the ceramic layers in addition to the pads, connection terminals, and via conductors.
Furthermore, the heat sink is made of, for example, a W—Cu alloy or a Mo—Cu alloy.

また、前記ヒートシンクの裏面は、前記基板本体の裏面よりも外側に位置していても良い。つまり、ヒートシンクの裏面が基板本体よりも突出していても良い。かかる構造とすることにより、ヒートシンクの裏面を、他の部材(例えば、マザーボード)に接触させることが容易となるので、放熱性を確保し易くなる。該ヒートシンクの裏面には、本配線基板を搭載するプリント基板などのマザーボードに固定するために用いる複数の雌ネジ孔を形成しても良い。
更に、前記「対向する」とは、前記フランジの接合面が前記段部と間隔を置いてほぼ平行であることを意味している。
また、前記「貫通孔の軸方向と直交する方向に突出する段部」には、かかる軸方向と直角である段部の形態の他、該軸方向に対して側面(断面)視で外辺側よりも中央側が基板本体の裏面に近付くように傾斜した形態も含まれている。
更に、前記ロウ材は、例えば、銀ロウ(Ag−Cu系合金)からなり、例えば、予め、平面視で矩形枠状や円環形状に成形されたプリフォーム材が用いられる。
また、前記応力緩和リングは、純銅あるいは銅合金などからなり、例えば、これらの平板をエッチング加工などを施すことにより、予め、平面視がリング形状(矩形枠状、五角形以上の正多角形を呈する枠形状、円環形状など)に成形されている。
加えて、前記ヒートシンクの表面には、追って、半導体素子、光−電気変換素子、あるいはLED素子などの発熱量の比較的大きな素子が実装される。
Moreover, the back surface of the heat sink may be located outside the back surface of the substrate body. That is, the back surface of the heat sink may protrude from the substrate body. By adopting such a structure, it becomes easy to bring the back surface of the heat sink into contact with another member (for example, a mother board), so that it is easy to ensure heat dissipation. On the back surface of the heat sink, a plurality of female screw holes used for fixing to a mother board such as a printed board on which the wiring board is mounted may be formed.
Furthermore, the “facing” means that the joint surface of the flange is substantially parallel to the stepped portion.
The “step portion protruding in the direction orthogonal to the axial direction of the through-hole” includes a shape of a step portion perpendicular to the axial direction and an outer side in a side view (cross section) with respect to the axial direction. An inclined form is also included so that the center side is closer to the back surface of the substrate body than the side.
Furthermore, the brazing material is made of, for example, silver brazing (Ag—Cu-based alloy), and for example, a preform material previously formed into a rectangular frame shape or an annular shape in plan view is used.
The stress relaxation ring is made of pure copper, copper alloy, or the like. For example, by performing etching or the like on these flat plates, the plan view previously exhibits a ring shape (rectangular frame shape, pentagonal or more regular polygon). Frame shape, ring shape, etc.).
In addition, on the surface of the heat sink, an element having a relatively large calorific value such as a semiconductor element, a photoelectric conversion element, or an LED element is mounted.

付言すれば、本発明には、前記ヒートシンクにおいて、前記フランジのロウ材が配置される接合面とは反対側の表面は、該ヒートシンクの表面と面一である、配線基板も含まれ得る。
これによる場合、上記フランジのロウ材が配置される接合面とは反対側の表面を含めた該ヒートシンクの表面全体に素子を実装することが可能となるので、前記効果(1)を一層顕著に奏することが可能となる。
In other words, the present invention may include a wiring board in which the surface of the heat sink opposite to the joint surface on which the brazing material of the flange is disposed is flush with the surface of the heat sink.
In this case, since the element can be mounted on the entire surface of the heat sink including the surface opposite to the joint surface on which the brazing material of the flange is disposed, the effect (1) is more remarkably achieved. It becomes possible to play.

また、本発明には、前記応力緩和リングは、平面視における前記ヒートシンクのフランジの接合面と前記基板本体の段部との重複部の全体、または、該重複部の外周側、あるいは、該重複部の内周側の何れかに配置されている、配線基板(請求項2)も含まれる。
上記のうち、平面視で上記重複部の全体に応力緩和リングを配置する形態によれば、前記効果(1)〜(3)を奏しつつ、前記基板本体とヒートシンクとを強固に接合させることができる。
また、上記重複部の外周側に応力緩和リングを配置する形態によれば、前記効果(1)〜(3)を奏しつつ、製造時において、前記貫通孔内における上記応力緩和リングを配置すべき位置を一層正確に設定することができる(効果(4))。
更に、上記重複部の内周側に応力緩和リングを配置する形態によれば、前記効果(1)〜(3)を奏しつつ、製造時において、後述する前記ロウ材の表面に被覆される金皮膜などの検査を、前記基板本体およびヒートシンクの裏面側からの視覚によって容易に行うことが可能となる(効果(5))。
しかも、上記重複部の内周側に応力緩和リングを配置する形態によれば、応力緩和リングの内周側のロウ材と段部との間に囲まれる空間が生じ難いので、上記金被膜を電解メッキにより形成する際に、メッキ液の液溜まりが生じず、健全な金被膜などを形成し易くなる(効果(6))。
Further, according to the present invention, the stress relaxation ring includes the entire overlapping portion of the joint surface of the flange of the heat sink and the stepped portion of the substrate body in a plan view, the outer peripheral side of the overlapping portion, or the overlapping. A wiring board (Claim 2) disposed on any of the inner peripheral sides of the part is also included.
Among the above, according to the embodiment in which the stress relaxation ring is disposed over the entire overlapping portion in plan view, the substrate body and the heat sink can be firmly bonded while exhibiting the effects (1) to (3). it can.
Moreover, according to the form which arrange | positions a stress relaxation ring in the outer peripheral side of the said duplication part, the said stress relaxation ring in the said through-hole should be arrange | positioned at the time of manufacture, producing said effect (1)-(3). The position can be set more accurately (effect (4)).
Furthermore, according to the embodiment in which the stress relaxation ring is arranged on the inner peripheral side of the overlapping portion, the gold coated on the surface of the brazing material to be described later at the time of production while exhibiting the effects (1) to (3). Inspection of the film and the like can be easily performed by visual inspection from the back side of the substrate body and the heat sink (effect (5)).
In addition, according to the embodiment in which the stress relaxation ring is arranged on the inner peripheral side of the overlapping portion, a space surrounded by the brazing material and the stepped portion on the inner peripheral side of the stress relaxation ring is unlikely to occur. When forming by electrolytic plating, the plating liquid does not accumulate, and it becomes easy to form a healthy gold film or the like (effect (6)).

更に、本発明には、平面視において、前記応力緩和リングの内周側と、前記ヒートシンクにおけるフランジの接合面の内周側との間に前記ロウ材が配設されていると共に、該ロウ材および上記ヒートシンクにおいて外部に露出する表面には、少なくとも金皮膜が被覆されている、配線基板(請求項3)も含まれる。
これによれば、前記ロウ材やヒートシンクにおいて外部に露出する表面の不用意な腐蝕を未然に防ぐことができる(効果(7))。
尚、上記金皮膜の下地としてニッケル皮膜が、予め、被覆されている。
また、前記応力緩和リングの全表面には、予め、ニッケル皮膜を形成しておくことによって、前記ロウ材を構成する銀ロウとの接触を遮断し、該銀ロウの加熱時に生じる銀の不用意な溶融拡散を予防している。
Further, in the present invention, the brazing material is disposed between the inner peripheral side of the stress relaxation ring and the inner peripheral side of the joint surface of the flange in the heat sink in a plan view. In addition, the surface exposed to the outside of the heat sink includes at least a wiring board (Claim 3) covered with a gold film.
According to this, inadvertent corrosion of the surface exposed to the outside in the brazing material or the heat sink can be prevented in advance (effect (7)).
Incidentally, a nickel film is coated in advance as a base for the gold film.
Further, by forming a nickel film in advance on the entire surface of the stress relaxation ring, contact with the silver brazing constituting the brazing material is cut off, and silver inadvertently generated when the silver brazing is heated Prevents melt diffusion.

また、本発明には、前記基板本体の貫通孔は、平面視で長方形状を呈し、該貫通孔における長辺と短辺とには、幅が互いに相違する前記段部が形成されていると共に、該段部に配置される平面視で長方形状の前記応力緩和リングにおける長辺と短辺との幅も上記段部と同様の関係で相違している、配線基板(請求項4)も含まれる。
これによれば、例えば、平面視が長方形枠状の段部であり、該段部において対向する一対の短辺の幅が大きく且つ当該段部において対向する一対の長辺の幅が小さい場合、かかる幅の大小に応じて、平面視が長方形枠状を呈する前記応力緩和リングを、幅の大きい一対の短辺と幅の小さい一対の長辺とにより構成される。その結果、上記幅の異なる2種類の段部を有する貫通孔を含む配線基板であっても、前記効果(2)を確実に奏することが可能となる。
Further, according to the present invention, the through hole of the substrate body has a rectangular shape in plan view, and the long side and the short side of the through hole are formed with the step portions having different widths. In addition, the wiring board (Claim 4) is also included, in which the widths of the long side and the short side of the stress relief ring that is rectangular in plan view arranged in the step portion are different in the same relationship as the step portion. It is.
According to this, for example, when the plan view is a rectangular frame-shaped step portion, the width of the pair of short sides facing each other at the step portion is large and the width of the pair of long sides facing the step portion is small, The stress relaxation ring having a rectangular frame shape in plan view according to the size of the width is constituted by a pair of short sides having a large width and a pair of long sides having a small width. As a result, even if the wiring board includes a through hole having two types of step portions having different widths, the effect (2) can be reliably achieved.

更に、本発明には、前記基板本体の表面に沿った平面方向と直交する垂直方向の断面において、前記応力緩和リングの前記平面方向の長さは、該応力緩和リングの垂直方向の長さよりも短い、配線基板(請求項5)も含まれる。
これによれば、前記段部と前記接合面との間における上記垂直方向の断面において、断面が縦長の応力緩和リングが前記ロウ材を介して配設されるので、基板本体とヒートシンクとの間の熱膨張差による応力を、当該応力緩和リング自体の変形により吸収し、ロウ付けされたセラミックの接合部付近にクラックや剥離が生じにくくできる(効果(8))。
また、本発明には、前記応力緩和リングの外周には、前記基板本体の貫通孔を形成する内壁面に向かって突出する複数の凸部が形成されている、配線基板(請求項6)も含まれる。
これによれば、前記基板本体の表面に沿った平面方向の断面において、前記応力緩和リングの外周と前記貫通孔を形成する基板本体の内壁面との間に位置する隙間を可級的に狭くすることができるので、前記効果(4)を一層顕著に奏することができる。しかも、応力緩和リングにおいて、前記凸部が形成されている部分を除いた部分は、前記基板本体の表面に沿った平面方向と直交する垂直方向の断面において、上記応力緩和リングの前記平面方向の長さを、該応力緩和リングの垂直方向の長さよりも短くすることができる。従って、前記効果(8)も併せて奏することができる。
加えて、本発明には、前記ヒートシンクの裏面は、前記基板本体の裏面よりも外側に突出している、配線基板(請求項7)も含まれる。
これによれば、前記ヒートシンク内において、前記ヒートシンクの裏面を、他の部材(例えば、マザーボード)に容易に接触させられるので、前記基板本体の表面側から裏面側に伝達された熱を、該基板本体の裏面側から外部に対し、容易に放散することができる(効果(9))。
Furthermore, in the present invention, in the vertical cross section perpendicular to the plane direction along the surface of the substrate body, the length of the stress relaxation ring in the plane direction is longer than the length of the stress relaxation ring in the vertical direction. A short wiring board (Claim 5) is also included.
According to this, in the cross section in the vertical direction between the step portion and the joint surface, the stress relaxation ring having a vertically long cross section is disposed via the brazing material, so that the space between the substrate body and the heat sink is The stress due to the difference in thermal expansion is absorbed by the deformation of the stress relaxation ring itself, so that cracks and peeling can hardly occur near the joint portion of the brazed ceramic (effect (8)).
According to the present invention, there is also provided a wiring board (Claim 6) in which a plurality of convex portions projecting toward an inner wall surface forming a through hole of the substrate body are formed on an outer periphery of the stress relaxation ring. included.
According to this, in the cross section in the planar direction along the surface of the substrate main body, the gap located between the outer periphery of the stress relaxation ring and the inner wall surface of the substrate main body forming the through hole is narrowed by a grade. Therefore, the effect (4) can be remarkably exhibited. In addition, in the stress relaxation ring, the portion excluding the portion where the convex portion is formed has a cross section in the vertical direction perpendicular to the planar direction along the surface of the substrate body, and the stress relaxation ring is in the plane direction. The length can be shorter than the vertical length of the stress relief ring. Therefore, the effect (8) can also be achieved.
In addition, the present invention includes a wiring board (Claim 7) in which the back surface of the heat sink projects outward from the back surface of the substrate body.
According to this, since the back surface of the heat sink can be easily brought into contact with another member (for example, a mother board) in the heat sink, the heat transmitted from the front surface side to the back surface side of the substrate body is transferred to the substrate. It can be easily dissipated from the back side of the main body to the outside (effect (9)).

(A)は本発明の配線基板に用いるヒートシンクの裏面側からの視覚による斜視図、(B)は上記ヒートシンク、応力緩和リング、および基板本体の表面側からの視覚による分解斜視図、(C)は本発明の配線基板を示す斜視図。(A) is a perspective view visually from the back side of the heat sink used in the wiring board of the present invention, (B) is an exploded perspective view visually from the surface side of the heat sink, the stress relaxation ring, and the substrate body, (C). FIG. 2 is a perspective view showing a wiring board of the present invention. 図1(C)中のX−X線の矢視に沿った垂直断面図。FIG. 2 is a vertical sectional view taken along the line XX in FIG. 上記配線基板におけるロウ付けによる接合部を示す部分垂直断面図。The partial vertical sectional view which shows the junction part by brazing in the said wiring board. 異なる形態のロウ付けによる接合部を示す部分垂直断面図。The partial vertical sectional view which shows the junction part by brazing of a different form. 更に異なる形態のロウ付けによる接合部を示す部分垂直断面図。Furthermore, the partial vertical sectional view which shows the junction part by brazing of a different form. 異なる形態の応力緩和リングを用いた上記接合部を示す部分垂直断面図。The partial vertical sectional view which shows the said junction part using the stress relaxation ring of a different form. (A)は図6の応力緩和リングを示す斜視図、(B)は更に異なる形態の応力緩和リングを示す斜視図。(A) is a perspective view which shows the stress relaxation ring of FIG. 6, (B) is a perspective view which shows the stress relaxation ring of a further different form. 図6、図7(A)の応力緩和リングを用いた配線基板を示す水平断面図。8 is a horizontal sectional view showing a wiring board using the stress relaxation ring of FIGS. 6 and 7A. FIG. 異なる形態の配線基板を示す斜視図。The perspective view which shows the wiring board of a different form. 別なる形態の接合部付近を示す部分垂直断面図。The partial vertical sectional view which shows the junction part vicinity of another form. 前記の接合部の応用形態である接合部付近を示す部分垂直断面図。The partial vertical sectional view which shows the junction part vicinity which is an application form of the said junction part.

以下において、本発明を実施するための形態について説明する。
図1(A)は、本発明の配線基板1に用いるヒートシンク11の裏面14側からの視覚による斜視図、図1(B)は、上記ヒートシンク11、応力緩和リング16、および基板本体2のそれぞれにおける表面3,13側からの視覚による分解斜視図である。
上記ヒートシンク11は、図1(A),(B)に示すように、平面視が長方形(矩形)の表面13および裏面14と、前記表面13の四辺から外側に水平向きに突出した平面視が矩形枠状のフランジ12とを備えている。該フランジ12の表面13aは、上記表面13と面一であり、該表面13aと反対(裏面14)側は、後述するロウ付けに活用される接合面15である。該ヒートシンク11は、例えば、W−10wt%Cu合金、あるいはMo−30wt%Cu合金からなる。
Hereinafter, modes for carrying out the present invention will be described.
FIG. 1A is a visual perspective view from the back surface 14 side of the heat sink 11 used in the wiring board 1 of the present invention, and FIG. 1B is the heat sink 11, the stress relaxation ring 16, and the substrate body 2, respectively. It is a disassembled perspective view by the vision from the surface 3, 13 side in FIG.
As shown in FIGS. 1A and 1B, the heat sink 11 has a front surface 13 and a rear surface 14 that are rectangular (rectangular) in plan view, and a plan view that protrudes horizontally from the four sides of the front surface 13 in a horizontal direction. And a rectangular frame-shaped flange 12. The surface 13a of the flange 12 is flush with the surface 13 and the side opposite to the surface 13a (back surface 14) is a joint surface 15 used for brazing described later. The heat sink 11 is made of, for example, a W-10 wt% Cu alloy or a Mo-30 wt% Cu alloy.

また、図1(B)の下方に示すように、基板本体2は、平面視の外形が長方形の表面3および裏面4と、これらの間に前記ヒートシンク11が挿入される平面視が長方形状の貫通孔6とを有する。かかる貫通孔6は、基板本体2における表面3側の内壁面8と裏面4側の内壁面9との間に、該貫通孔6の軸方向と直交する方向であり、基板本体2の中央側に向かって突出し且つ平面視が矩形枠状の段部7を形成している。上記表面3と内壁面8との間には、該表面3の一部に含まれ且つ平面視が矩形枠状の浅い段部3aが形成され、該段部3aにおける四辺ごとの中央付近には、複数のパッド10が形成されている。尚、基板本体2は、後述するように複数のセラミック層を一体に積層したセラミックからなる。   As shown in the lower part of FIG. 1B, the substrate body 2 has a front surface 3 and a back surface 4 having a rectangular outer shape in plan view, and a rectangular shape in plan view in which the heat sink 11 is inserted therebetween. And a through hole 6. The through hole 6 is a direction perpendicular to the axial direction of the through hole 6 between the inner wall surface 8 on the front surface 3 side and the inner wall surface 9 on the back surface 4 side of the substrate body 2. A step 7 having a rectangular frame shape in plan view is formed. Between the surface 3 and the inner wall surface 8, there is formed a shallow step portion 3a that is included in a part of the surface 3 and has a rectangular frame shape in plan view, and in the vicinity of the center of every four sides in the step portion 3a. A plurality of pads 10 are formed. The substrate body 2 is made of a ceramic in which a plurality of ceramic layers are integrally laminated as will be described later.

更に、図1(B)の中程に示すように、前記ヒートシンク11のフランジ12の接合面15と、基板本体2の貫通孔6の段部7との間に、平面視が矩形枠状の応力緩和リング16が配置される。該応力緩和リング16は、例えば、純銅(電気銅)あるいは銅合金からなり、平面視で互いに対向する一対の長辺17と、一対の短辺18と、これらに囲まれた平面視が長方形の空間19とを備えている。該長辺17と短辺18との断面は、何れも長方形状あるいは正方形状である。また、前記空間19は、平面視で前記ヒートシンク11のフランジ12を除いた本体部分よりも若干大きめである。尚、該応力緩和リング16の全表面には、予め、後述するニッケル被膜(26)が形成(被覆)されている。   Further, as shown in the middle of FIG. 1B, the planar view is a rectangular frame shape between the joint surface 15 of the flange 12 of the heat sink 11 and the stepped portion 7 of the through hole 6 of the substrate body 2. A stress relief ring 16 is disposed. The stress relaxation ring 16 is made of, for example, pure copper (electrocopper) or a copper alloy, and has a pair of long sides 17 and a pair of short sides 18 that are opposed to each other in a plan view, and a rectangular plan view surrounded by these. And a space 19. The cross sections of the long side 17 and the short side 18 are both rectangular or square. The space 19 is slightly larger than the main body portion excluding the flange 12 of the heat sink 11 in plan view. A nickel coating (26) described later is formed (coated) on the entire surface of the stress relaxation ring 16 in advance.

前記配線基板1は、以下のようにして組み立てられる。
前記応力緩和リング16の上面と底面とに、予め平面視が矩形枠状にプリフォームされた後述するシート状のロウ材(27)を添接したものを、図1(B)中の白抜き矢印で示すように、前記貫通孔6を形成する基板本体2の段部7上に載置した後、更に、該基板本体2の表面3側から前記貫通孔6内に、前記ヒートシンク11をその裏面14側を下向きにして挿入する。この際、上記貫通孔6の段部7上には、下層側のロウ材(27)、応力緩和リング16、上層側のロウ材(27)、ヒートシンク11のフランジ12が順次積み重なる。かかる状態で、上記ヒートシンク11、応力緩和リング16、およびロウ材(27)を有する基板本体2を加熱し、該ロウ材(27)を溶融する。更に、応力緩和リング16を間に挟んでロウ付けされたヒートシンク11と基板本体2とを、ニッケルメッキ浴および金メッキ浴に順次浸漬して、外部に露出する前記パッド10、ヒートシンク11、およびロウ材(27)などの導体の表面に、電解ニッケルメッキと電解金メッキとを順次施す。
The wiring board 1 is assembled as follows.
A sheet-shaped brazing material (27), which will be described later, which is preformed in the shape of a rectangular frame in plan view, is attached to the top and bottom surfaces of the stress relaxation ring 16, and is outlined in FIG. 1 (B). As indicated by the arrows, after placing on the stepped portion 7 of the substrate body 2 forming the through hole 6, the heat sink 11 is further inserted into the through hole 6 from the surface 3 side of the substrate body 2. Insert with the back side 14 facing downward. At this time, the lower layer brazing material (27), the stress relaxation ring 16, the upper layer brazing material (27), and the flange 12 of the heat sink 11 are sequentially stacked on the step portion 7 of the through hole 6. In this state, the substrate body 2 having the heat sink 11, the stress relaxation ring 16, and the brazing material (27) is heated to melt the brazing material (27). Further, the heat sink 11 and the substrate body 2 brazed with the stress relaxation ring 16 interposed therebetween are sequentially immersed in a nickel plating bath and a gold plating bath, and the pad 10, the heat sink 11, and the brazing material exposed to the outside are exposed. Electrolytic nickel plating and electrolytic gold plating are sequentially applied to the surface of the conductor such as (27).

その結果、図1(C)、図2の垂直断面図、図3の拡大垂直断面図に示すように、前記基板本体2の貫通孔6には、該貫通孔6を形成する当該基板本体2の内壁面8,9をヒートシンク11の裏面14が貫通し、且つ該基板本体2の裏面4よりも外側(図示で下側)に若干突出すると共に、上記貫通孔6の段部7上には、垂直断面がおおよそ平行四辺形状のロウ材27とこれに囲まれた応力緩和リング16を介して、ヒートシンク11におけるフランジ12の接合面15が接合された配線基板1が得られる。
図2,図3に示すように、前記基板本体2は、例えば、アルミナを主成分とするセラミック層c1〜c4を一体に積層してなり、該セラミック層c1〜c4間には、前記パッド10の配線部分、配線層21,22が個別に形成され、該基板本体2の裏面4には、複数の接続端子20が形成されている。上記パッド10の配線部分、配線層21,22、および接続端子20の相互間は、セラミック層c1〜c4を個別に貫通するビア導体23を介して電気的に接続されている。
尚、前記パッド10、接続端子20、配線層21,22、ビア導体23は、主にタングステン(W)あるいはモリブデン(Mo)からなる。また、前記基板本体2は、公知の方法(グリーンシートの打ち抜き加工、導電性ペーストの充填・印刷工程、複数のグリーンシートの積層・焼成工程)により予め製造されている。
As a result, as shown in FIG. 1C, the vertical cross-sectional view of FIG. 2, and the enlarged vertical cross-sectional view of FIG. 3, the substrate body 2 that forms the through-hole 6 is formed in the through-hole 6 of the substrate body 2. The back surface 14 of the heat sink 11 passes through the inner wall surfaces 8 and 9 and slightly protrudes outward (lower side in the drawing) from the back surface 4 of the substrate body 2, and on the stepped portion 7 of the through hole 6. Thus, the wiring substrate 1 is obtained in which the joining surface 15 of the flange 12 of the heat sink 11 is joined via the brazing material 27 having a substantially parallelogram-shaped vertical section and the stress relaxation ring 16 surrounded by the brazing material 27.
As shown in FIGS. 2 and 3, the substrate body 2 is formed by integrally laminating ceramic layers c1 to c4 mainly composed of alumina, for example, and the pad 10 is interposed between the ceramic layers c1 to c4. Wiring layers 21 and 22 are individually formed, and a plurality of connection terminals 20 are formed on the back surface 4 of the substrate body 2. The wiring portion of the pad 10, the wiring layers 21 and 22, and the connection terminal 20 are electrically connected via via conductors 23 that individually penetrate the ceramic layers c <b> 1 to c <b> 4.
The pad 10, the connection terminal 20, the wiring layers 21, 22 and the via conductor 23 are mainly made of tungsten (W) or molybdenum (Mo). The substrate body 2 is manufactured in advance by a known method (green sheet punching process, conductive paste filling / printing process, laminating / firing process of a plurality of green sheets).

図2に示すように、前記ヒートシンク11の裏面14には、本配線基板1を図示しないプリント基板などのマザーボードにネジ止めして固定するための複数の雌ネジ孔25が形成されている。また、該ヒートシンク11の表面13には、追って扁平な光−電気変換素子24が実装され、該素子24と前記パッド10とは、ボンディングワイヤwを介して電気的に接続される。尚、上記素子24の上方には、該素子24を外部から封止するための図示しない蓋板が取り付けられる。
また、図3に示すように、前記応力緩和リング16の表面全体には、ニッケル皮膜26が被覆されているので、該リング16の銅成分がロウ材27の銀成分に接触して腐蝕する事態が予防されている。更に、上記ロウ材27において外部に露出する表面には、ニッケル皮膜28を介して金皮膜29が所要の厚みで形成されている。該ニッケル皮膜28および金皮膜29は、外部に露出する前記パッド10、ヒートシンク11、接続端子20の表面にも同様に形成されている。
As shown in FIG. 2, the back surface 14 of the heat sink 11 is formed with a plurality of female screw holes 25 for screwing and fixing the wiring board 1 to a mother board such as a printed board (not shown). Further, a flat photoelectric conversion element 24 is mounted on the surface 13 of the heat sink 11, and the element 24 and the pad 10 are electrically connected via a bonding wire w. A lid plate (not shown) for sealing the element 24 from the outside is attached above the element 24.
Further, as shown in FIG. 3, since the entire surface of the stress relaxation ring 16 is coated with a nickel film 26, the copper component of the ring 16 contacts the silver component of the brazing material 27 and corrodes. Has been prevented. Further, a gold film 29 is formed on the surface exposed to the outside in the brazing material 27 with a required thickness through a nickel film 28. The nickel coating 28 and the gold coating 29 are similarly formed on the surfaces of the pad 10, the heat sink 11, and the connection terminal 20 exposed to the outside.

更に、図3に示すように、前記応力緩和リング16は、平面視におけるヒートシンク11のフランジ12の接合面15と、基板本体2の貫通孔6を形成する段部7との重複部におけるほぼ全体に配置されている。
尚、上記形態に限らず、図4の拡大垂直断面図に示すように、垂直断面の幅が小さく且つ矩形状の応力緩和リング16を、平面視におけるヒートシンク11のフランジ12の接合面15と、基板本体2の貫通孔6の段部7との重複部の外周側に配置した形態としても良い。
また、図5の拡大垂直断面図に示すように、基板本体2の表面3に平行な平面方向に沿った(長さ)幅wが、該平面方向に直交する高さ(長さ)hよりも大きい応力緩和リング16を、平面視におけるヒートシンク11のフランジ12の接合面15と、基板本体2の貫通孔6を形成する段部7との重複部の内周側に配置した形態としても良い。かかる形態によれば、応力緩和リング16を前記段部7と接合面15との間における任意の位置に自在に配設できる。
Further, as shown in FIG. 3, the stress relaxation ring 16 is substantially entirely in an overlapping portion between the joint surface 15 of the flange 12 of the heat sink 11 and the stepped portion 7 forming the through hole 6 of the substrate body 2 in plan view. Is arranged.
In addition, as shown in the enlarged vertical sectional view of FIG. 4 without being limited to the above-described form, the rectangular stress relaxation ring 16 having a small vertical section width and a bonding surface 15 of the flange 12 of the heat sink 11 in plan view, It is good also as a form arrange | positioned in the outer peripheral side of the overlap part with the step part 7 of the through-hole 6 of the board | substrate body 2. As shown in FIG.
Further, as shown in the enlarged vertical sectional view of FIG. 5, the (length) width w along the plane direction parallel to the surface 3 of the substrate body 2 is higher than the height (length) h orthogonal to the plane direction. The larger stress relaxation ring 16 may be arranged on the inner peripheral side of the overlapping portion of the joint surface 15 of the flange 12 of the heat sink 11 and the stepped portion 7 forming the through hole 6 of the substrate body 2 in plan view. . According to such a form, the stress relaxation ring 16 can be freely disposed at an arbitrary position between the stepped portion 7 and the joint surface 15.

更に、図6の部分拡大断面図に示すように、基板本体2の貫通孔6を形成する段部7と、ヒートシンク11におけるフランジ12の接合面15との間に、平面視が正方形状である四辺7の外周ごとに外向きの凸部16uを一対(複数)ずつ設けた応力緩和リング16を配置し、該応力緩和リング16全体を囲むようにロウ材27を配設した形態としても良い。上記応力緩和リング16は、図7(A)に示すように、四つの辺17の外周ごとに一対の凸部16uを垂直方向に沿って突設したもので、前記電気銅などの素材をエッチング加工あるいは打ち抜き加工することにより得られる。尚、図7(B)に示すように、四つの辺17の外周ごとに円錐形(コーン)状の凸部16vを一対ずつ突設した形態としても良い。かかる凸部16vを有する応力緩和リング16は、例えば、前記素材を精密鋳造することにより製作される。   Furthermore, as shown in the partially enlarged cross-sectional view of FIG. 6, the plan view has a square shape between the step portion 7 that forms the through hole 6 of the substrate body 2 and the joint surface 15 of the flange 12 in the heat sink 11. The stress relaxation ring 16 provided with a pair (plurality) of outwardly protruding portions 16u for each outer periphery of the four sides 7 may be disposed, and the brazing material 27 may be disposed so as to surround the stress relaxation ring 16 as a whole. As shown in FIG. 7A, the stress relaxation ring 16 is formed by projecting a pair of protrusions 16u along the vertical direction for each outer periphery of the four sides 17, and etching the material such as electrolytic copper. It can be obtained by processing or punching. As shown in FIG. 7B, a pair of conical convex portions 16v may be provided so as to protrude from the outer periphery of the four sides 17 one by one. The stress relaxation ring 16 having the convex portion 16v is manufactured by, for example, precision casting the material.

図8の水平断面図に示すように、図6,図7(A)の応力緩和リング16を、平面視が正方形状の表面3および裏面4を有する基板本体2の貫通孔6に挿入した際、該応力緩和リング16の各辺17の外周ごとに突設され一対の凸部16uの先端部は、貫通孔6を形成する基板保体2の内壁面8に接近する。その結果、前記段部7と接合面との間における上記内壁面8側に上記応力緩和リング16を精度良く配置可能となる。
尚、上記応力緩和リング16の凸部16uは、各辺17の上面側あるいは下面側にのみ突設しても良い。
As shown in the horizontal sectional view of FIG. 8, when the stress relaxation ring 16 of FIGS. 6 and 7A is inserted into the through hole 6 of the substrate body 2 having the front surface 3 and the rear surface 4 that are square in plan view. The tip portions of the pair of convex portions 16 u that protrude from the outer periphery of each side 17 of the stress relaxation ring 16 approach the inner wall surface 8 of the substrate holder 2 that forms the through hole 6. As a result, the stress relaxation ring 16 can be accurately arranged on the inner wall surface 8 side between the stepped portion 7 and the joint surface.
The convex portion 16u of the stress relaxation ring 16 may protrude only on the upper surface side or the lower surface side of each side 17.

以上のような各形態を含む配線基板1によれば、少なくとも前記効果(1)〜(3)、(7)を奏することができる。また、図4で示した形態では、更に前記効果(4)を奏し得る。しかも、前記図3〜図6で示したように、ヒートシンク11の裏面14を、基板本体2の裏面4よりも外側に突出させることで、前記効果(9)を奏し得る。
更に、図5で示した形態では、更に前記効果(5)、(8)を奏することができる。しかも、かかる形態では、応力緩和リング16の内周側のロウ材27とヒートシンク11と段部7とに囲まれる空間がなく、前記金皮膜29を電解メッキにて形成する際に、メッキ液の液溜まりの発生を防ぎ健全な金皮膜29を確実に形成することができる(前記効果(6))。
加えて、前記図6〜図8で示した形態によっても、前記効果(1)〜(9)を奏することが可能である。
According to the wiring board 1 including the above embodiments, at least the effects (1) to (3) and (7) can be achieved. Moreover, in the form shown in FIG. 4, the said effect (4) can be show | played further. Moreover, as shown in FIGS. 3 to 6, the effect (9) can be achieved by causing the back surface 14 of the heat sink 11 to protrude outward from the back surface 4 of the substrate body 2.
Furthermore, in the embodiment shown in FIG. 5, the effects (5) and (8) can be further achieved. In addition, in this embodiment, there is no space surrounded by the brazing material 27, the heat sink 11, and the stepped portion 7 on the inner peripheral side of the stress relaxation ring 16, and when the gold film 29 is formed by electrolytic plating, A sound gold film 29 can be reliably formed by preventing generation of a liquid pool (the effect (6)).
In addition, the effects (1) to (9) can be achieved by the modes shown in FIGS.

尚、前記基板本体2やヒートシンク11の表面3,13および裏面4,14は、前記図6〜図8で示したように、平面視で正方形状を呈する形態としても良い。
また、前記基板本体2の裏面4に設ける前記平板状の接続端子20に替えて、細長い棒状の導体ピンからなる接続端子を用いても良い。
更に、前記基板本体2の段部7が平面視の長辺と短辺との幅が相違していても良い。かかる形態の場合、前記応力緩和リング16における長辺17および短辺18の幅も、対向する上記段部7ごとの幅に対応して相違したものとされる。
Note that the front surfaces 3 and 13 and the rear surfaces 4 and 14 of the substrate main body 2 and the heat sink 11 may have a square shape in plan view as shown in FIGS.
Further, instead of the flat plate-like connection terminal 20 provided on the back surface 4 of the substrate body 2, a connection terminal formed of a long and thin bar-shaped conductor pin may be used.
Further, the width of the long side and the short side of the stepped portion 7 of the substrate body 2 in plan view may be different. In the case of this form, the widths of the long side 17 and the short side 18 in the stress relaxation ring 16 are also different corresponding to the widths of the opposing stepped portions 7.

図9は、前記配線基板1とは異なる形態の配線基板30を示す斜視図である。
かかる配線基板30は、図9に示すように、前記同様の基板本体2の表面3と裏面4との間を、平面視が円形の貫通孔36が貫通し、該貫通孔36の内壁面には平面視が円環形状の段部(図示せず)が形成されている。尚、基板本体2の表面3と貫通孔36の内壁面との間には、平面視が円環形状の浅い段部33が位置し、該段部33の適所には、前記同様の複数のパッド10が形成されている。
上記貫通孔36内には、平面視が円形のヒートシンク31が前記同様に挿入され、そのフランジ32と前記貫通孔36内の段部との間には、前記図3〜図8で示した各形態の応力緩和リング16を介してロウ材27が配設されることによって、前記基板本体2とヒートシンク31とを接合している。
以上のような配線基板30によっても、前記配線基板1の各接合形態と同様な効果(1)〜(9)を個々の形態ごとに応じて奏することが可能である。
尚、前記貫通孔36やヒートシンク31などは、平面視で楕円形状、あるいは長円形状を呈する形態のものとしても良い。
FIG. 9 is a perspective view showing a wiring board 30 having a form different from that of the wiring board 1.
As shown in FIG. 9, the wiring board 30 has a through hole 36 that is circular in plan view passing between the front surface 3 and the back surface 4 of the substrate body 2 similar to the above, and is formed on the inner wall surface of the through hole 36. Is formed with a step portion (not shown) having an annular shape in plan view. A shallow step portion 33 having an annular shape in plan view is located between the surface 3 of the substrate body 2 and the inner wall surface of the through hole 36. A pad 10 is formed.
A heat sink 31 having a circular plan view is inserted into the through hole 36 in the same manner as described above. Between the flange 32 and the step portion in the through hole 36, each of the heat sinks 31 shown in FIGS. By arranging the brazing material 27 via the stress relaxation ring 16 having the form, the substrate body 2 and the heat sink 31 are joined.
Also with the wiring board 30 as described above, the effects (1) to (9) similar to the bonding forms of the wiring board 1 can be obtained according to the individual forms.
The through hole 36, the heat sink 31 and the like may have an elliptical shape or an elliptical shape in plan view.

図10は、前記配線基板1,30において、前記と異なる形態の基板本体2a、ヒートシンク11a、および応力緩和リング16aを用いた接合部付近を示す前記同様の部分拡大断面図である。
上記基板本体2aは、図10に示すように、前記同様の表面3と裏面4との間を貫通する貫通孔6aを有し、該貫通孔6aの内周面8,9間には、平面視で外周側よりも中央側が上記裏面4に近付くように傾斜した段部7aが形成されている。該段部7aは、上記貫通孔6aの軸方向と直交する方向よりも若干傾斜する方向に沿っており、且つ基板本体2aの中央側に向かって突出しているものである。
尚、上記段部7aを形成するには、例えば、追ってセラミック層c2となるグリーンシートを打ち抜き加工して平面視が矩形または円形の貫通孔を形成した後、該貫通孔の周縁に対し先端面の四辺が傾斜した四角錐状のポンチ、あるいは先端面の周縁が傾斜した円錐状のポンチを押し付けて塑性変形させる方法が用いられる。
FIG. 10 is a partially enlarged cross-sectional view similar to the above, showing the vicinity of the joint using the substrate main body 2a, the heat sink 11a, and the stress relaxation ring 16a of the wiring boards 1 and 30 different from the above.
As shown in FIG. 10, the substrate body 2a has a through hole 6a penetrating between the same front surface 3 and back surface 4, and a flat surface between the inner peripheral surfaces 8 and 9 of the through hole 6a. A stepped portion 7 a is formed so that the center side is closer to the back surface 4 than the outer peripheral side as viewed. The stepped portion 7a is along a direction slightly inclined from the direction perpendicular to the axial direction of the through hole 6a and protrudes toward the center side of the substrate body 2a.
In order to form the stepped portion 7a, for example, a green sheet to be the ceramic layer c2 is punched to form a through hole having a rectangular or circular shape in plan view, and then the front end surface with respect to the periphery of the through hole. A method in which a four-sided pyramid-shaped punch or a conical punch whose tip end surface is inclined is pressed and plastically deformed is used.

また、前記ヒートシンク11aは、図10に示すように、前記同様の表面13および裏面14を有し、前記表面13の外周側には、該表面13と面一の表面13aと、前記基板本体2の段部7aと対向し且つ該段部7aと平行状になるように傾斜した接合面15aとを有するフランジ12aが外側に延びている。
更に、図10に示すように、平面視における上記基板本体2aの段部7aとフランジ12aの接合面15aとの重複部の外周側には、垂直断面で上片および下片がほぼ平行で且つ全体が平行四辺形状を呈する応力緩和リング16aを囲んで前記同様のロウ材27が配設されている。該ロウ材27における内外一対の露出面には、前記同様のニッケル皮膜28および金皮膜29が形成されている。
Further, as shown in FIG. 10, the heat sink 11 a has the same front surface 13 and rear surface 14, and on the outer peripheral side of the front surface 13, the front surface 13 a flush with the front surface 13 and the substrate body 2. A flange 12a having a joint surface 15a that faces the step 7a and is inclined so as to be parallel to the step 7a extends outward.
Further, as shown in FIG. 10, the upper piece and the lower piece are substantially parallel in a vertical section on the outer peripheral side of the overlapping portion between the step portion 7a of the substrate body 2a and the joint surface 15a of the flange 12a in plan view. A brazing material 27 similar to that described above is disposed so as to surround the stress relaxation ring 16a which has a parallelogram shape as a whole. A nickel coating 28 and a gold coating 29 similar to those described above are formed on the inner and outer exposed surfaces of the brazing material 27.

以上のような基板本体2a、ヒートシンク11a、および応力緩和リング16aを用いた接合部を有する形態の配線基板1,30によれば、ロウ付け後においてヒートシンク11aが熱収縮した際に生じる応力に対し、基板本体2aの段部7aの外周端(基端部)付近におけるクラックや剥離の発生を更に抑制することができるので、前記効果(2)をより一層奏することが可能となる。
尚、前記応力緩和リング16aは、平面視における前記基板本体2の段部7aとフランジ12aの接合面15aとの重複部のほぼ全体、あるいは該重複部の内周側に配置された形態としても良い。
また、前記応力緩和リング16aの外周に前記複数の凸部16u,16vを突設した形態としても良い。
更に、前記接合面15aは、単一の傾斜面に限らず、複数の傾斜面が隣接する形態、あるいは垂直断面で上向きの凸の緩い湾曲面にした形態としても良い。
According to the wiring boards 1 and 30 having the joint portion using the substrate body 2a, the heat sink 11a, and the stress relaxation ring 16a as described above, the stress generated when the heat sink 11a is thermally contracted after brazing. Since the occurrence of cracks and peeling near the outer peripheral end (base end portion) of the stepped portion 7a of the substrate body 2a can be further suppressed, the effect (2) can be further exhibited.
Note that the stress relaxation ring 16a may be arranged on substantially the entire overlapping portion of the stepped portion 7a of the substrate body 2 and the joint surface 15a of the flange 12a in the plan view or on the inner peripheral side of the overlapping portion. good.
Moreover, it is good also as a form which protruded the said some convex parts 16u and 16v on the outer periphery of the said stress relaxation ring 16a.
Furthermore, the joint surface 15a is not limited to a single inclined surface, and may be a form in which a plurality of inclined surfaces are adjacent to each other, or a form in which the convex surface is a gently curved surface with a convex upward in a vertical section.

図11は、前記配線基板1,30において、前記とは更に異なる形態の基板本体2bとヒートシンク11bとを用いた接合部付近を示す前記同様の部分拡大垂直断面図である。
上記基板本体2bは、図11に示すように、前記同様の表面3と裏面4との間を貫通する貫通孔6bを有し、該貫通孔6bは、その軸方向に沿って幅(内径)が相違する3つの内壁面8,9b,9を有し且つこれらの間に内外(上下)2つの段部7,7bを有している。該段部7,7bを形成するため、上記基板本体2bは、グリーンシートの際に打ち抜き加工される貫通孔の幅あるいは内径が異なる5層のセラミック層c1〜c5を積層することにより形成されている。
FIG. 11 is a similar partially enlarged vertical sectional view showing the vicinity of the joint portion using the substrate main body 2b and the heat sink 11b in a form different from the above in the wiring boards 1 and 30. FIG.
As shown in FIG. 11, the substrate body 2b has a through hole 6b penetrating between the same front surface 3 and back surface 4, and the through hole 6b has a width (inner diameter) along the axial direction thereof. Have three inner wall surfaces 8, 9b, 9 different from each other, and two step portions 7, 7b inside and outside (upper and lower) between them. In order to form the stepped portions 7 and 7b, the substrate body 2b is formed by laminating five ceramic layers c1 to c5 having different widths or inner diameters of through holes punched when green sheets are formed. Yes.

また、前記ヒートシンク11bは、図11に示すように、前記同様の表面13および裏面14を有し、前記表面13の外周側には、該表面13と面一の表面13aと、前記基板本体2の段部7,7bと個別に対向し且つ該段部7,7bと平行な上下一対の接合面15,15bとを有するフランジ12bが外側に延びている。
更に、図9に示すように、前記基板本体2bの段部7,7bと上記ヒートシンク11bの接合面15,15bとの間には、前記よりも断面積がやや小さく矩形状である2つの応力緩和リング16を個別に囲んで前記同様のロウ材27が異形断面(角形メガネ形状、あるいは段違い二連矩形状)にして配設されている。該ロウ材27における内外一対の露出面には、前記同様のニッケル皮膜28および金皮膜29が形成されている。
Further, as shown in FIG. 11, the heat sink 11b has a surface 13 and a back surface 14 similar to the above. On the outer peripheral side of the surface 13, the surface 13a flush with the surface 13 and the substrate body 2 are provided. A flange 12b having a pair of upper and lower joining surfaces 15 and 15b that individually face the step portions 7 and 7b and are parallel to the step portions 7 and 7b extends outward.
Furthermore, as shown in FIG. 9, between the stepped portions 7 and 7b of the substrate main body 2b and the joint surfaces 15 and 15b of the heat sink 11b, two stresses having a slightly smaller cross-sectional area than the above and a rectangular shape. A brazing material 27 similar to the above is disposed in a deformed cross section (square glasses shape or stepped double rectangular shape) so as to individually surround the relaxation ring 16. A nickel coating 28 and a gold coating 29 similar to those described above are formed on the inner and outer exposed surfaces of the brazing material 27.

以上のような基板本体2b、ヒートシンク11b、および2つの応力緩和リング16を用いた接合部を有する形態の配線基板1,30によれば、ロウ付け後においてヒートシンク11bが熱収縮した際に生じる応力に対し、該応力を2つの応力緩和リング16により一層低減できる。その結果、ロウ材27に接合された基板本体2bにおける段部7,7bや内壁面9b付近におけるセラミックにクラックや剥離の発生を更に抑制することができるので、前記効果(2)を更に一層奏することが可能となる。
尚、前記貫通孔6bの段部7,7bと、ヒートシンク11bにおけるフランジ12bの接合面15,15bとは、前記図8に示した形態の傾斜面としても良い。
また、前記貫通孔6bの段部7n、およびヒートシンク11bにおけるフランジ12bの接合面15nは、それぞれ同数で且つ3つ以上としても良い。
更に、前記2つの応力緩和リング16は、段違いに連設された一体物としても良し、それぞれの外周ごとに複数の前記凸部16u,16vを突設しても良い。
According to the wiring boards 1 and 30 having the joint portion using the substrate body 2b, the heat sink 11b, and the two stress relaxation rings 16 as described above, the stress generated when the heat sink 11b is thermally contracted after brazing. On the other hand, the stress can be further reduced by the two stress relaxation rings 16. As a result, it is possible to further suppress the occurrence of cracks and delamination in the ceramics in the vicinity of the stepped portions 7 and 7b and the inner wall surface 9b of the substrate body 2b bonded to the brazing material 27, so that the effect (2) is further exhibited. It becomes possible.
The stepped portions 7 and 7b of the through hole 6b and the joint surfaces 15 and 15b of the flange 12b of the heat sink 11b may be inclined surfaces of the form shown in FIG.
Further, the stepped portion 7n of the through hole 6b and the joint surface 15n of the flange 12b of the heat sink 11b may be the same number and three or more.
Further, the two stress relaxation rings 16 may be integrated as a single step, or a plurality of the convex portions 16u and 16v may be provided on each outer periphery.

本発明は、以上において説明した各形態に限定されるものではない。
例えば、前記基板本体2,2a,2bを構成するセラミックは、ムライトや窒化アルミニウムのような高温焼成セラミックとしたり、あるいはガラス−セラミックなどの低温焼成セラミックとしても良い。後者の場合、前記パッド10、接続端子20、配線層21,22、ビア導体23などの導体には、銀または銅が適用される。
また、前記基板本体2などの表面3と裏面4との間を貫通する貫通孔は、平面視で五角形以上の正多角形あるいは変形多角形を呈する形態としても良い。これらの貫通孔の内壁面に形成する段部は、平面視で五角形以上の正多角形の枠状あるいは変形多角形の枠状を呈する形態となる。
The present invention is not limited to the embodiments described above.
For example, the ceramic constituting the substrate bodies 2, 2a, 2b may be a high-temperature fired ceramic such as mullite or aluminum nitride, or a low-temperature fired ceramic such as glass-ceramic. In the latter case, silver or copper is applied to conductors such as the pads 10, connection terminals 20, wiring layers 21 and 22, and via conductors 23.
Further, the through hole penetrating between the front surface 3 and the back surface 4 of the substrate body 2 or the like may be a regular polygon or a deformed polygon that is a pentagon or more in a plan view. The step portions formed on the inner wall surfaces of these through holes are in the form of a regular polygon frame shape or a deformed polygon frame shape of a pentagon or more in plan view.

更に、前記基板本体2などの表面3は、前記貫通孔6などの開口部よりも厚み方向で高い位置とし、該貫通孔6などに挿入されるヒートシンク11などの表面13の上方には、上記表面3に開口するキャビティを有する形態としても良い。
また、前記パッド10は、前記基板本体2などの表面3に直に形成されていても良い。
加えて、前記基板本体2などは、その表面3と裏面4との間を貫通する前記貫通孔6などを複数形成し、且つかかる貫通孔6などごとに前記ヒートシンク11などが挿入され、前記応力緩和リング16などを介して、あるいはロウ材27のみにより直に、上記ヒートシンク11などとロウ付けした形態としても良い。
Furthermore, the surface 3 of the substrate body 2 or the like is positioned higher in the thickness direction than the opening of the through hole 6 or the like, and above the surface 13 of the heat sink 11 or the like inserted into the through hole 6 or the like, It is good also as a form which has the cavity opened on the surface 3. FIG.
The pad 10 may be formed directly on the surface 3 of the substrate body 2 or the like.
In addition, the substrate body 2 or the like has a plurality of through holes 6 or the like penetrating between the front surface 3 and the back surface 4, and the heat sink 11 or the like is inserted into each of the through holes 6 or the like. A configuration may be employed in which the heat sink 11 or the like is brazed directly through the relaxation ring 16 or the like or only by the brazing material 27.

本発明によれば、セラミックからなる基板本体の表面と裏面との間を貫通する貫通孔内に挿入する金属製のヒートシンクの表面が、追って実装すべき素子のサイズや総数の制約になりにくく、且つ上記ヒートシンクをロウ付けした際において上記基板本体のセラミック部分にクラックや剥離が生じ難い配線基板を確実に提供できる。   According to the present invention, the surface of the metal heat sink inserted into the through-hole penetrating between the front surface and the back surface of the substrate body made of ceramic is less likely to limit the size and total number of elements to be mounted later. In addition, when the heat sink is brazed, it is possible to reliably provide a wiring board in which cracks and peeling do not easily occur in the ceramic portion of the substrate body.

1,30…………………………配線基板
2,2a,2b…………………基板本体
3…………………………………表面
4…………………………………裏面
6,6a,6b,36…………貫通孔
7,7a,7b…………………段部
8,9,9b……………………内壁面
11,11a,11b,31…ヒートシンク
12,12a,12b,32…フランジ
15,15a,15b…………接合面
16,16a……………………応力緩和リング
16u,16v……………………凸部
27………………………………ロウ材
c1〜c5………………………セラミック層(セラミック)
h…………………………………応力緩和リングの断面の高さ(長さ)
w…………………………………応力緩和リングの断面の幅(長さ)
1, 30 ………………………… Wiring board 2, 2a, 2b ………………… Board body 3 …………………………………… Surface 4 …………… …………………… Back 6, 6 a, 6 b, 36 ………… Through hole 7, 7 a, 7 b …………………… Step 8, 9, 9 b ……………… Inside Wall surface 11, 11a, 11b, 31 ... Heat sink 12, 12a, 12b, 32 ... Flange 15, 15a, 15b ………… Joint surface 16, 16a ……………… Stress relaxation ring 16u, 16v ……… …………… Protrusions 27 ……………………………… Brazing materials c1 to c5 ……………………… Ceramic layer (ceramic)
h ………………………………… Section relief height (length)
w ………………………………… Stress relief ring cross-section width (length)

Claims (7)

セラミックからなり、表面および裏面を有し、且つ該表面と裏面との間を貫通する貫通孔を有する基板本体と、かかる基板本体の前記貫通孔に挿入されたヒートシンクと、を備えた配線基板であって、
上記基板本体の貫通孔を形成する内壁面の全周には、該貫通孔の軸方向と直交する方向に突出する段部、あるいは平面視で周辺側よりも中央側が上記裏面に近付くように傾斜した段部が形成され、上記ヒートシンクの側面の全周には、前記段部に対向するフランジが突設されていると共に、
上記段部と上記フランジにおいて該段部と対向する接合面との間の全周には、応力緩和リングが配置され、少なくとも、かかる応力緩和リングと上記フランジの接合面との間、および応力緩和リングと上記段部との間に前記ロウ材が配設されている、
ことを特徴とする配線基板。
A wiring board comprising a substrate body made of ceramic, having a front surface and a back surface, and having a through hole penetrating between the front surface and the back surface, and a heat sink inserted into the through hole of the substrate body. There,
The entire circumference of the inner wall surface forming the through hole of the substrate body is inclined such that a stepped portion projecting in a direction perpendicular to the axial direction of the through hole, or the central side is closer to the back side than the peripheral side in plan view. A stepped portion is formed, and a flange facing the stepped portion is provided on the entire circumference of the side surface of the heat sink,
A stress relaxation ring is disposed on the entire circumference between the step portion and the joint surface facing the step portion in the flange, and at least between the stress relaxation ring and the joint surface of the flange and the stress relaxation. The brazing material is disposed between the ring and the stepped portion,
A wiring board characterized by that.
前記応力緩和リングは、平面視における前記ヒートシンクのフランジの接合面と前記基板本体の段部との重複部の全体、または、該重複部の外周側、あるいは、該重複部の内周側の何れかに配置されている、
ことを特徴とする請求項1に記載の配線基板。
The stress relieving ring may be either the entire overlapping portion of the joint surface of the flange of the heat sink and the stepped portion of the substrate body in a plan view, the outer peripheral side of the overlapping portion, or the inner peripheral side of the overlapping portion. Arranged in the
The wiring board according to claim 1.
平面視において、前記応力緩和リングの内周側と、前記ヒートシンクにおけるフランジの接合面の内周側との間に前記ロウ材が配設されていると共に、該ロウ材および上記ヒートシンクにおいて外部に露出する表面には、少なくとも金皮膜が被覆されている、
ことを特徴とする請求項1または2に記載の配線基板。
In plan view, the brazing material is disposed between the inner peripheral side of the stress relaxation ring and the inner peripheral side of the joint surface of the flange in the heat sink, and the brazing material and the heat sink are exposed to the outside. The surface to be coated is at least a gold film,
The wiring board according to claim 1 or 2, wherein
前記基板本体の貫通孔は、平面視で長方形状を呈し、該貫通孔における長辺と短辺とには、幅が互いに相違する前記段部が形成されていると共に、該段部に配置される平面視で長方形状の前記応力緩和リングにおける長辺と短辺との幅も上記段部と同様の関係で相違している、
ことを特徴とする請求項1乃至3の何れか一項に記載の配線基板。
The through hole of the substrate body has a rectangular shape in plan view, and the long side and the short side of the through hole are formed with the stepped portions having different widths and are arranged in the stepped portion. The width of the long side and the short side of the rectangular stress relaxation ring in plan view is different in the same relationship as the stepped portion,
The wiring board according to any one of claims 1 to 3, wherein
前記基板本体の表面に沿った平面方向と直交する垂直方向の断面において、前記応力緩和リングの前記平面方向の長さは、該応力緩和リングの垂直方向の長さよりも短い、
ことを特徴とする請求項1乃至4の何れか一項に記載の配線基板。
In the vertical cross section perpendicular to the plane direction along the surface of the substrate body, the length of the stress relaxation ring in the plane direction is shorter than the length of the stress relaxation ring in the vertical direction.
The wiring board according to any one of claims 1 to 4, wherein the wiring board is provided.
前記応力緩和リングの外周には、前記基板本体の貫通孔を形成する内壁面に向かって突出する複数の凸部が形成されている、
ことを特徴とする請求項1乃至5の何れか一項に記載の配線基板。
On the outer periphery of the stress relaxation ring, a plurality of convex portions projecting toward the inner wall surface forming the through hole of the substrate body are formed.
The wiring board according to any one of claims 1 to 5, wherein
前記ヒートシンクの裏面は、前記基板本体の裏面よりも外側に突出している、
ことを特徴とする請求項1乃至6の何れか一項に記載の配線基板。
The back surface of the heat sink protrudes outward from the back surface of the substrate body.
The wiring board according to any one of claims 1 to 6, wherein
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US15/350,262 US10039179B2 (en) 2015-11-17 2016-11-14 Wiring substrate
CN201611012462.0A CN106879163B (en) 2015-11-17 2016-11-17 Circuit board
EP16199390.2A EP3171402B1 (en) 2015-11-17 2016-11-17 Wiring substrate

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