JP2016180071A - White thermosetting epoxy resin composition for led reflector - Google Patents
White thermosetting epoxy resin composition for led reflector Download PDFInfo
- Publication number
- JP2016180071A JP2016180071A JP2015061814A JP2015061814A JP2016180071A JP 2016180071 A JP2016180071 A JP 2016180071A JP 2015061814 A JP2015061814 A JP 2015061814A JP 2015061814 A JP2015061814 A JP 2015061814A JP 2016180071 A JP2016180071 A JP 2016180071A
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- Prior art keywords
- epoxy resin
- resin composition
- component
- group
- thermosetting epoxy
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- 239000000203 mixture Substances 0.000 title claims abstract description 78
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 47
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 27
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- CGRTZESQZZGAAU-UHFFFAOYSA-N [2-[3-[1-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]-2-methylpropan-2-yl]-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]-2-methylpropyl] 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCC(C)(C)C2OCC3(CO2)COC(OC3)C(C)(C)COC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 CGRTZESQZZGAAU-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000005998 bromoethyl group Chemical group 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000019282 butylated hydroxyanisole Nutrition 0.000 description 1
- CZBZUDVBLSSABA-UHFFFAOYSA-N butylated hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1.COC1=CC=C(O)C=C1C(C)(C)C CZBZUDVBLSSABA-UHFFFAOYSA-N 0.000 description 1
- 229940043253 butylated hydroxyanisole Drugs 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- XOSYHSRXLVMOBA-UHFFFAOYSA-N cyclopenta-1,3-diene;phenol Chemical compound C1C=CC=C1.C1C=CC=C1.OC1=CC=CC=C1 XOSYHSRXLVMOBA-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- LSDYBCGXPCFFNM-UHFFFAOYSA-M dimethyl phosphate;tributyl(methyl)phosphanium Chemical compound COP([O-])(=O)OC.CCCC[P+](C)(CCCC)CCCC LSDYBCGXPCFFNM-UHFFFAOYSA-M 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002314 glycerols Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- PMOIAJVKYNVHQE-UHFFFAOYSA-N phosphanium;bromide Chemical group [PH4+].[Br-] PMOIAJVKYNVHQE-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical class S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 1
- WDUXKFKVDQRWJN-UHFFFAOYSA-N triethoxysilylmethyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C=C WDUXKFKVDQRWJN-UHFFFAOYSA-N 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- UOKUUKOEIMCYAI-UHFFFAOYSA-N trimethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C(C)=C UOKUUKOEIMCYAI-UHFFFAOYSA-N 0.000 description 1
- JPPHEZSCZWYTOP-UHFFFAOYSA-N trimethoxysilylmethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C=C JPPHEZSCZWYTOP-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- CNUJLMSKURPSHE-UHFFFAOYSA-N trioctadecyl phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC CNUJLMSKURPSHE-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は、トランスファー成形時の連続成形性に優れ、リードフレーム上に汚染が発生せず、変色を起しにくい白色熱硬化性エポキシ樹脂組成物及び該白色熱硬化性エポキシ樹脂組成物で形成された光半導体素子ケースを備える半導体装置に関する。 The present invention is formed of a white thermosetting epoxy resin composition that is excellent in continuous formability during transfer molding, does not cause contamination on the lead frame, and does not easily cause discoloration, and the white thermosetting epoxy resin composition. The present invention relates to a semiconductor device including an optical semiconductor element case.
LED(Light Emitting Diode)等の光半導体素子は、街頭ディスプレイや自動車ランプ、住宅用照明など種種のインジケーターや光源として利用されるようになっている。中でも、白色LEDは、二酸化炭素削減や省エネルギーをキーワードとして、各分野で応用した製品の開発が急速に進んでいる。 Optical semiconductor elements such as LEDs (Light Emitting Diodes) are used as various indicators and light sources such as street displays, automobile lamps, and residential lighting. Above all, white LEDs are rapidly developing products that are applied in various fields with the keywords of carbon dioxide reduction and energy saving.
LED等の半導体・電子機器装置の材料のひとつとして、光リフレクター材料にポリフタルアミド樹脂(PPA)が現在広く使用されている。PPAを用いたリフレクター材は高い強度、たわみ性を持ち合わせている点から優れている(特許文献1)。しかし、近年、光半導体装置の高出力化及び短波長化が進み、さらに長期信頼性の向上がより望まれるようになり、このような状況下、PPAを光半導体素子の周辺に使用すると容易に変色を起こすなど劣化が激しく、光出力低下等を引き起こすので、PPAをこのような用途に用いることは、好適ではなくなった。 Polyphthalamide resin (PPA) is currently widely used as a light reflector material as one of materials for semiconductor and electronic equipment devices such as LEDs. A reflector material using PPA is excellent in that it has high strength and flexibility (Patent Document 1). However, in recent years, higher output and shorter wavelengths of optical semiconductor devices have progressed, and further improvement in long-term reliability has become more desirable. Under such circumstances, it is easy to use PPA around optical semiconductor elements. It is not suitable to use PPA for such applications because deterioration is severe, such as causing discoloration, causing a decrease in light output.
特許文献2には、エポキシ樹脂、硬化剤及び硬化促進剤を構成成分とするBステージ状の光半導体封止用エポキシ樹脂組成物が記載され、上記構成成分が分子レベルで均一に混合されている樹脂組成物の硬化体を有する光半導体装置が記載されている。ここでは、エポキシ樹脂として、ビスフェノールA型エポキシ樹脂又はビスフェノールF型エポキシ樹脂が主として用いられ、トリグリシジルイソシアネート等を使用し得ることも記載されている。しかし、特許文献2に記載のBステージ状半導体封止用エポキシ樹脂組成物は、特に高温・長時間の放置で黄変するという問題がある。 Patent Document 2 describes an epoxy resin composition for sealing an optical semiconductor having a B-stage, which includes an epoxy resin, a curing agent, and a curing accelerator, and the above components are uniformly mixed at a molecular level. An optical semiconductor device having a cured product of a resin composition is described. Here, it is also described that bisphenol A type epoxy resin or bisphenol F type epoxy resin is mainly used as the epoxy resin, and triglycidyl isocyanate or the like can be used. However, the epoxy resin composition for encapsulating B-stage semiconductors described in Patent Document 2 has a problem that yellowing occurs particularly when left for a long time at a high temperature.
特許文献3には、環状オレフィンを酸化して得られる脂環式エポキシ樹脂を用いて封止したLEDが記載されている。特許文献4には、トリアジン誘導体エポキシ樹脂と酸無水物硬化剤を含む発光素子封止用エポキシ樹脂組成物が記載されている。特許文献5には、(A)水素化エポキシ樹脂、トリアジン環含有エポキシ樹脂、及び脂環式オレフィンをエポキシ化して得られる脂環式エポキシ樹脂を含有するエポキシ樹脂、及び(B)酸無水物硬化剤を含む発光素子封止用エポキシ樹脂組成物が記載されている。しかし特許文献3〜5に記載の発光素子封止用エポキシ樹脂組成物もまた、高温・長時間の放置で黄変するという問題が十分解決されてなかった。 Patent Document 3 describes an LED sealed with an alicyclic epoxy resin obtained by oxidizing a cyclic olefin. Patent Document 4 describes a light-emitting element sealing epoxy resin composition containing a triazine derivative epoxy resin and an acid anhydride curing agent. Patent Document 5 includes (A) a hydrogenated epoxy resin, a triazine ring-containing epoxy resin, and an epoxy resin containing an alicyclic epoxy resin obtained by epoxidizing an alicyclic olefin, and (B) acid anhydride curing. An epoxy resin composition for sealing a light emitting device containing an agent is described. However, the problem that the epoxy resin composition for sealing a light emitting element described in Patent Documents 3 to 5 is yellowed when left at high temperature for a long time has not been sufficiently solved.
特許文献6には、耐熱試験後においても良好な光反射特性を示す光半導体素子搭載用基板が記載されている。特許文献6に代表されるように、基板材料として用いられる従来の白色熱硬化性エポキシ樹脂組成物では、基板製造時に成形金型からの円滑な離型を目的として、樹脂組成物中に離型剤を内部添加していることが多い。しかし、離型剤として使用される化合物は、多くの場合、熱硬化性光反射用樹脂組成物を構成するエポキシ樹脂及び硬化剤等のベース樹脂への分散性が悪いため、離型剤を含む熱硬化性樹脂組成物を用いて基板を成形した場合、離型剤の分散不具合等に起因して外観不良が生じ易く、さらに連続成形を行うことが困難な傾向がある。そのため、離型性を始めとして各種成形特性に優れ、良好に連続成形することが可能な白色熱硬化性エポキシ樹脂組成物の開発が望まれている。 Patent Document 6 describes a substrate for mounting an optical semiconductor element that exhibits good light reflection characteristics even after a heat resistance test. As represented by Patent Document 6, a conventional white thermosetting epoxy resin composition used as a substrate material is released into a resin composition for the purpose of smooth release from a mold during substrate production. The agent is often added internally. However, a compound used as a release agent often includes a release agent because of its poor dispersibility in the base resin such as an epoxy resin and a curing agent constituting the thermosetting light reflecting resin composition. When a substrate is molded using a thermosetting resin composition, poor appearance is likely to occur due to a dispersion failure of a release agent, and further, continuous molding tends to be difficult. Therefore, it is desired to develop a white thermosetting epoxy resin composition that is excellent in various molding characteristics including releasability and can be continuously continuously formed.
特許文献7には、下記式(I)及び(II) Patent Document 7 includes the following formulas (I) and (II):
(式(I)及び式(II)中、R1は、炭素数1〜12のアルキレン基であり、R2及びR3は、それぞれ独立して、炭素数1〜10のアルキル基、アリール基、アルコキシ基、エポキシ基を有する1価の有機基、炭素数1〜10のカルボキシル基を有する1価の有機基、及び炭素数3〜500のポリアルキレンエーテル基からなる群から選択される)
で示される構造ユニットを有する化合物、特には下記式(III)、
(In Formula (I) and Formula (II), R 1 is an alkylene group having 1 to 12 carbon atoms, and R 2 and R 3 are each independently an alkyl group or aryl group having 1 to 10 carbon atoms. , An alkoxy group, a monovalent organic group having an epoxy group, a monovalent organic group having a carboxyl group having 1 to 10 carbon atoms, and a polyalkylene ether group having 3 to 500 carbon atoms)
A compound having a structural unit represented by the formula (III),
(式(III)中、lは1〜200の整数であり、m1+m2は2〜400の整数であり、R1は炭素数1〜10のアルキレン基であり、R2及びR3は、それぞれ独立して、炭素数1〜10のアルキル基、アリール基、アルコキシ基、エポキシ基を有する1価の有機基、炭素数1〜10のカルボキシル基を有する1価の有機基、及び炭素数3〜500のポリアルキレンエーテル基からなる群から選択され、R4は炭素数1〜10の2価の炭化水素基である)
で示されるトリアルキレンブロック共重合体と離型剤とを併用することによって、光半導体素子搭載用基板に必要とされる光学特性及び耐熱性等の各種特性に優れるとともに、トランスファー成形時の離型性に優れ、連続成形可能な光反射用エポキシ樹脂組成物が開示されている。しかしながら、上記(I)のようなエステル結合を有する化合物を添加した場合、エステル結合部が熱や光に弱いために変色を起こしたり、エポキシ樹脂や硬化剤との反応性が悪く、これらの化合物がブリードしやすくなったりするなどの点で問題があり好ましくない。
(In formula (III), l is an integer of 1 to 200, m 1 + m 2 is an integer of 2 to 400, R 1 is an alkylene group having 1 to 10 carbon atoms, and R 2 and R 3 are , Each independently an alkyl group having 1 to 10 carbon atoms, an aryl group, an alkoxy group, a monovalent organic group having an epoxy group, a monovalent organic group having a carboxyl group having 1 to 10 carbon atoms, and the number of carbon atoms Selected from the group consisting of 3 to 500 polyalkylene ether groups, and R 4 is a divalent hydrocarbon group having 1 to 10 carbon atoms)
In combination with a trialkylene block copolymer represented by the above and a release agent, it is excellent in various properties such as optical properties and heat resistance required for a substrate for mounting an optical semiconductor element, and is released during transfer molding. An epoxy resin composition for light reflection that has excellent properties and can be continuously molded is disclosed. However, when a compound having an ester bond such as the above (I) is added, the ester bond portion is weak against heat and light, causing discoloration or poor reactivity with an epoxy resin or a curing agent. This is not preferable because there is a problem in that it becomes easy to bleed.
そこで、本発明は、トランスファー成形時の連続成形性に優れ、リードフレーム上に汚染が発生せず、変色を起しにくい白色熱硬化性エポキシ樹脂組成物及び該白色熱硬化性エポキシ樹脂組成物で形成された光半導体素子ケースを備える半導体装置を得ることを目的とする。 Therefore, the present invention provides a white thermosetting epoxy resin composition excellent in continuous formability during transfer molding, causing no contamination on the lead frame and hardly causing discoloration, and the white thermosetting epoxy resin composition. An object is to obtain a semiconductor device including the formed optical semiconductor element case.
本発明者らは、上記課題を解決するため鋭意研究を重ねた結果、トリアジン誘導体エポキシ樹脂と酸無水物との混合物又はこれらを反応させて得られるプレポリマーを含む白色熱硬化性エポキシ樹脂組成物に、離型剤とオルガノポリシロキサンのSiH基とアルケニル基含有エポキシ化合物のアルケニル基を付加反応させたブロック共重合体である離型助剤を配合することにより、上記目的を達成できることを見出し、本発明を完成した。 As a result of intensive studies to solve the above problems, the present inventors have obtained a white thermosetting epoxy resin composition comprising a mixture of a triazine derivative epoxy resin and an acid anhydride or a prepolymer obtained by reacting them. In addition, it was found that the above-mentioned object can be achieved by blending a mold release aid, which is a block copolymer obtained by addition reaction of an SiH group of an organopolysiloxane and an alkenyl group of an alkenyl group-containing epoxy compound, The present invention has been completed.
即ち、本発明は、下記の白色熱硬化性エポキシ樹脂組成物及び該白色熱硬化性エポキシ樹脂組成物で形成された光半導体素子ケースを備える半導体装置を提供するものである。 That is, this invention provides a semiconductor device provided with the optical semiconductor element case formed with the following white thermosetting epoxy resin composition and this white thermosetting epoxy resin composition.
<1>
(A)(A−1)トリアジン誘導体エポキシ樹脂と(A−2)酸無水物とを反応させて得られるプレポリマーであって、(A−2)成分中の酸無水物基の合計個数に対する(A−1)成分中のエポキシ基の合計個数の比が0.6〜2.0であるプレポリマー、
(B)白色顔料、
(C)無機充填材、
(D)硬化促進剤、
(E)離型剤、及び、
(F)離型助剤、
を含む白色熱硬化性エポキシ樹脂組成物であって、該(F)成分の離型助剤がアルケニル基含有エポキシ化合物及び/又はアルケニル基含有フェノール化合物のアルケニル基に下記平均組成式(1)で示されるオルガノポリシロキサンのSiH基を付加反応させたブロック共重合体である白色熱硬化性エポキシ樹脂組成物。
<1>
(A) (A-1) A prepolymer obtained by reacting a triazine derivative epoxy resin with (A-2) an acid anhydride, and (A-2) based on the total number of acid anhydride groups in the component (A-1) a prepolymer in which the ratio of the total number of epoxy groups in the component is 0.6 to 2.0,
(B) a white pigment,
(C) inorganic filler,
(D) a curing accelerator,
(E) a release agent, and
(F) mold release aid,
A white thermosetting epoxy resin composition containing the component (F), wherein the release assistant of the component (F) is an alkenyl group-containing epoxy compound and / or an alkenyl group of the alkenyl group-containing phenol compound represented by the following average composition formula (1): A white thermosetting epoxy resin composition which is a block copolymer obtained by addition-reacting SiH groups of the organopolysiloxane shown.
(式(1)中、Rは置換又は非置換の一価炭化水素基であり、a及びbは、0.001≦a≦1、1≦b≦3、1.001≦a+b≦3を満たす正数である。) (In Formula (1), R is a substituted or unsubstituted monovalent hydrocarbon group, and a and b satisfy 0.001 ≦ a ≦ 1, 1 ≦ b ≦ 3, and 1.001 ≦ a + b ≦ 3. (It is a positive number.)
<2>
さらに、(G)成分として酸化防止剤を含む、<1>記載の白色熱硬化性エポキシ樹脂組成物。
<2>
Furthermore, the white thermosetting epoxy resin composition as described in <1> which contains antioxidant as (G) component.
<3>
(B)白色顔料の平均粒径が1μm以下である<1>又は<2>記載の白色熱硬化性エポキシ樹脂組成物。
<3>
(B) The white thermosetting epoxy resin composition according to <1> or <2>, wherein the average particle diameter of the white pigment is 1 μm or less.
<4>
(B)白色顔料が、表面がアルミナで処理された酸化チタンであり、さらにシリカ、アルミナ、ジルコニア、ポリオール、シロキサンからなる群から選択される少なくとも1種で処理されている<1>〜<3>のいずれか1に記載の白色熱硬化性エポキシ樹脂組成物。
<4>
(B) The white pigment is a titanium oxide whose surface is treated with alumina, and is further treated with at least one selected from the group consisting of silica, alumina, zirconia, polyol and siloxane <1> to <3 > The white thermosetting epoxy resin composition of any one of>.
<5>
(A−1)成分のトリアジン誘導体エポキシ樹脂が、1,3,5−トリアジン誘導体エポキシ樹脂である<1>〜<4>のいずれか1に記載の白色熱硬化性エポキシ樹脂組成物。
<5>
The white thermosetting epoxy resin composition according to any one of <1> to <4>, wherein the triazine derivative epoxy resin as the component (A-1) is a 1,3,5-triazine derivative epoxy resin.
<6>
(A)成分のプレポリマーが、下記一般式(2)で示される化合物を含有する<1>〜<5>のいずれか1に記載の白色熱硬化性エポキシ樹脂組成物。
<6>
The white thermosetting epoxy resin composition according to any one of <1> to <5>, wherein the prepolymer of the component (A) contains a compound represented by the following general formula (2).
(式(2)中、R1は酸無水物残基を示し、mは0〜200の数である。) (In formula (2), R 1 represents an acid anhydride residue, and m is a number from 0 to 200.)
<7>
<1>〜<6>のいずれか1に記載の白色熱硬化性エポキシ樹脂組成物で形成された光半導体素子ケースを備える光半導体装置。
<7>
An optical semiconductor device provided with the optical semiconductor element case formed with the white thermosetting epoxy resin composition of any one of <1>-<6>.
本発明は、トランスファー成形時の連続成形性に優れ、リードフレーム上に汚染が発生せず、変色を起しにくい白色熱硬化性エポキシ樹脂組成物を提供することができる。また、本発明は、本発明の組成物の硬化物で光半導体素子を封止する、あるいは該硬化物からなる光反射部材を有することにより、経時劣化の少ない光半導体装置を提供することができる。 The present invention can provide a white thermosetting epoxy resin composition that is excellent in continuous moldability during transfer molding, does not cause contamination on the lead frame, and hardly causes discoloration. In addition, the present invention can provide an optical semiconductor device with little deterioration over time by sealing an optical semiconductor element with a cured product of the composition of the present invention or having a light reflecting member made of the cured product. .
以下、本発明につき更に詳しく説明する。 Hereinafter, the present invention will be described in more detail.
<白色熱硬化性エポキシ樹脂組成物>
(A)プレポリマー
(A)成分は、(A−1)トリアジン誘導体エポキシ樹脂と(A−2)酸無水物とを予め反応させて得られるプレポリマーである。硬化物が(A−1)トリアジン誘導体エポキシ樹脂と(A−2)酸無水物とを反応させて得られる構造を有することにより、高温下に置いたときの硬化物の黄変を抑制することができる。
<White thermosetting epoxy resin composition>
(A) Prepolymer The component (A) is a prepolymer obtained by reacting (A-1) a triazine derivative epoxy resin and (A-2) an acid anhydride in advance. The cured product has a structure obtained by reacting (A-1) a triazine derivative epoxy resin and (A-2) an acid anhydride, thereby suppressing yellowing of the cured product when placed under high temperature. Can do.
上記プレポリマーの調製において、反応させる(A−1)トリアジン誘導体エポキシ樹脂と(A−2)酸無水物との比率は[(A−1)成分が有するエポキシ基の合計個数/(A−2)成分が有する酸無水物基の合計個数]が0.6〜2.0となる量であり、好ましくは0.8〜1.9となる量、更に好ましくは1.0〜1.8となる量である。配合比が上記下限値0.6未満では未反応の酸無水物が硬化物中に残り、得られる硬化物の耐湿性を悪化させるおそれがある。また上記上限値2.0超では硬化不良が生じ、信頼性が低下するおそれがある。(A−1)成分と(A−2)成分の反応は、後述する(G)酸化防止剤及び/又は後述する(D)硬化促進剤の存在下にて反応させても良い。(A−1)トリアジン誘導体エポキシ樹脂と(A−2)酸無水物とを上記比率で反応させて得られた固体生成物(すなわち、プレポリマー)を本発明の(A)成分とすることが好ましい。このとき、該固体生成物は粉砕等により微粉末状態にして用いることが好ましい。該微粉末の平均粒子径は5μm〜3mmの範囲が好ましい。なお、該平均粒子径は、レーザー光回折法による粒度分布測定における質量平均値D50(又はメジアン径)として求めたものをいう。 In the preparation of the prepolymer, the ratio of the (A-1) triazine derivative epoxy resin and the (A-2) acid anhydride to be reacted is [total number of epoxy groups of the component (A-1) / (A-2 ) The total number of acid anhydride groups of the component] is 0.6 to 2.0, preferably 0.8 to 1.9, more preferably 1.0 to 1.8. Is the amount. If the blending ratio is less than the above lower limit of 0.6, unreacted acid anhydride remains in the cured product, which may deteriorate the moisture resistance of the resulting cured product. On the other hand, if the upper limit value is more than 2.0, poor curing may occur and reliability may be lowered. You may make reaction of (A-1) component and (A-2) component react in presence of (G) antioxidant mentioned later and / or (D) hardening accelerator mentioned later. (A-1) A solid product (that is, a prepolymer) obtained by reacting a triazine derivative epoxy resin with (A-2) an acid anhydride in the above ratio may be used as the component (A) of the present invention. preferable. At this time, the solid product is preferably used in a fine powder state by pulverization or the like. The average particle diameter of the fine powder is preferably in the range of 5 μm to 3 mm. Incidentally, the average particle diameter refers to those calculated as a mass average value D 50 of the particle size distribution measurement (or median diameter) by a laser diffraction method.
プレポリマーの調製は、より詳細には(A−1)成分と(A−2)成分を、好ましくは60〜120℃、より好ましくは70〜110℃にて、好ましくは4〜20時間、より好ましくは6〜15時間反応させればよい。上記した通り、(A−1)成分と(A−2)成分の混合物に後述する(G)酸化防止剤を予め添加しておいてもよい。あるいは(A−1)成分、(A−2)成分、及び後述する(D)硬化促進剤を、予め30〜80℃、好ましくは40〜70℃にて2〜12時間、好ましくは3〜8時間反応させる。このとき(G)酸化防止剤を上記混合物にあらかじめ添加しておいてもよい。上記反応によりプレポリマーである固体生成物が得られる。固体生成物の軟化点は40〜100℃、好ましくは45〜70℃である。軟化点が40℃未満では固体とはならず、100℃超では組成物として成形の時に必要な流動性が低すぎるおそれがある。該固体生成物は、上記した通り、本発明の組成物に配合する前に粉砕等により微粉末状化しておくことが好ましい。 More specifically, the preparation of the prepolymer comprises the components (A-1) and (A-2), preferably at 60 to 120 ° C., more preferably at 70 to 110 ° C., and preferably for 4 to 20 hours. The reaction may be preferably performed for 6 to 15 hours. As described above, an antioxidant (G) described later may be added in advance to the mixture of the component (A-1) and the component (A-2). Or (A-1) component, (A-2) component, and (D) hardening accelerator mentioned later are 30-80 degreeC beforehand, Preferably it is 2 to 12 hours at 40-70 degreeC, Preferably it is 3-8. Let react for hours. At this time, (G) antioxidant may be added to the mixture in advance. The above reaction yields a solid product that is a prepolymer. The softening point of the solid product is 40-100 ° C, preferably 45-70 ° C. If the softening point is less than 40 ° C., it does not become a solid, and if it exceeds 100 ° C., the fluidity required for molding as a composition may be too low. As described above, the solid product is preferably pulverized by pulverization or the like before blending with the composition of the present invention.
(A−1)トリアジン誘導体エポキシ樹脂
(A−1)トリアジン誘導体エポキシ樹脂は、1,3,5−トリアジン核誘導体エポキシ樹脂が好ましい。イソシアヌレート環を有するエポキシ樹脂は、耐光性や電気絶縁性に優れており、1つのイソシアヌレート環に対して、2価の、より好ましくは3価のエポキシ基を有することが好ましい。具体的には、例えば、トリス(2,3−エポキシプロピル)イソシアヌレート、トリス(α−メチルグリシジル)イソシアヌレート、及びトリス(α−メチルグリシジル)イソシアヌレート等が挙げられる。
(A-1) Triazine derivative epoxy resin (A-1) The triazine derivative epoxy resin is preferably a 1,3,5-triazine nucleus derivative epoxy resin. The epoxy resin having an isocyanurate ring is excellent in light resistance and electrical insulation, and preferably has a divalent, more preferably a trivalent epoxy group with respect to one isocyanurate ring. Specific examples include tris (2,3-epoxypropyl) isocyanurate, tris (α-methylglycidyl) isocyanurate, and tris (α-methylglycidyl) isocyanurate.
本発明で用いられるトリアジン誘導体エポキシ樹脂は軟化点が40〜125℃であるものが好ましい。なお、本発明で用いられる上記トリアジン誘導体エポキシ樹脂はトリアジン環を水素化したものを包含しない。 The triazine derivative epoxy resin used in the present invention preferably has a softening point of 40 to 125 ° C. In addition, the said triazine derivative epoxy resin used by this invention does not include what hydrogenated the triazine ring.
(A−2)酸無水物
(A−2)酸無水物は(A−1)エポキシ樹脂の硬化剤として作用するものである。酸無水物は、硬化物に耐光性を与えるために、非芳香族であり、且つ炭素−炭素二重結合を有さないものが好ましい。例えば、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、トリアルキルテトラヒドロ無水フタル酸、水素化メチルナジック酸無水物などが挙げられる。中でも、ヘキサヒドロ無水フタル酸及び/又はメチルヘキサヒドロ無水フタル酸が好ましい。酸無水物は1種を単独で使用してもよく、また2種以上を併用してもよい。
(A-2) Acid anhydride (A-2) The acid anhydride (A-1) acts as a curing agent for the epoxy resin. The acid anhydride is preferably non-aromatic and has no carbon-carbon double bond in order to impart light resistance to the cured product. For example, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, hydrogenated methylnadic acid anhydride and the like can be mentioned. Of these, hexahydrophthalic anhydride and / or methylhexahydrophthalic anhydride are preferred. An acid anhydride may be used individually by 1 type, and may use 2 or more types together.
上記プレポリマーを合成する際には、必要に応じて、上記(A−1)成分以外のエポキシ樹脂を本発明の効果を損なわない範囲で併用することができる。該エポキシ樹脂としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、3,3’,5,5’−テトラメチル−4,4’−ビフェノール型エポキシ樹脂、及び4,4’−ビフェノール型エポキシ樹脂等のビフェノール型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ナフタレンジオール型エポキシ樹脂、トリスフェニロールメタン型エポキシ樹脂、テトラキスフェニロールエタン型エポキシ樹脂、及びフェノールジシクロペンタジエンノボラック型エポキシ樹脂の芳香環を水素化したエポキシ樹脂、及び脂環式エポキシ樹脂等が挙げられる。これらの中でも、耐熱性や耐紫外線性の点から、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、芳香環を水素化したエポキシ樹脂、脂環式エポキシ樹脂、及びシリコーン変性したエポキシ樹脂が好ましい。上記エポキシ樹脂は、プレポリマー化のしやすさやハンドリング性の向上の点から、軟化点50〜100℃を有するのが好ましい。 When synthesizing the prepolymer, an epoxy resin other than the component (A-1) can be used in combination as long as it does not impair the effects of the present invention. Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, 3,3 ′, 5,5′-tetramethyl-4,4′-biphenol type epoxy resin, and 4,4′-biphenol type epoxy resin. Biphenol type epoxy resin such as resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolak type epoxy resin, naphthalenediol type epoxy resin, trisphenylol methane type epoxy resin, tetrakisphenylol ethane type epoxy resin, and Examples thereof include an epoxy resin obtained by hydrogenating an aromatic ring of a phenol dicyclopentadiene novolac type epoxy resin, and an alicyclic epoxy resin. Among these, bisphenol A type epoxy resin, bisphenol F type epoxy resin, epoxy resin with hydrogenated aromatic ring, alicyclic epoxy resin, and silicone-modified epoxy resin are preferable from the viewpoint of heat resistance and ultraviolet resistance. The epoxy resin preferably has a softening point of 50 to 100 ° C. from the viewpoint of ease of prepolymerization and improvement in handling properties.
上記プレポリマーとしては、例えば下記一般式(2)で表される化合物が挙げられる。 Examples of the prepolymer include compounds represented by the following general formula (2).
(式(2)中、R1は酸無水物の残基であり、例えば、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、トリアルキルテトラヒドロ無水フタル酸、水素化メチルナジック酸無水物などの残基である。mは0〜200の整数である。) (In formula (2), R 1 is a residue of an acid anhydride such as hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, hydrogenated methyl nadic anhydride, etc. M is an integer from 0 to 200.)
(A)成分は、本発明組成物中、5.0〜45.0質量%含有することが好ましく、6.0〜40.0質量%含有することがより好ましく、7.0〜35.0質量%含有することがさらに好ましい。 (A) It is preferable to contain 5.0-45.0 mass% of components in this invention composition, It is more preferable to contain 6.0-40.0 mass%, 7.0-35.0 More preferably, it is contained by mass%.
(B)白色顔料
本発明の白色熱硬化性エポキシ樹脂組成物は、光半導体装置のリフレクター(反射板)等の用途のために、白色顔料を配合する。すなわち、該白色顔料は、硬化物の白色度を高め、硬化物表面における光反射性を高めるために配合される。白色顔料としては、二酸化チタン、酸化イットリウムを代表とする希土類酸化物、硫酸亜鉛、酸化亜鉛、酸化マグネシウム等が挙げられる。これらは1種単独でも又は2種以上を組み合わせて使用してもよい。白色顔料の平均粒径や形状は特に制限されず、従来公知の白色顔料を用いることができる。通常、白色顔料の平均粒径は0.05〜5μmであるが、隠ぺい性の観点から1μm以下であることが好ましい。該平均粒径は、レーザー光回折法による粒度分布測定における質量平均値D50(又はメジアン径)として求めたものである。
(B) White pigment The white thermosetting epoxy resin composition of the present invention contains a white pigment for applications such as a reflector (reflecting plate) of an optical semiconductor device. That is, the white pigment is blended in order to increase the whiteness of the cured product and increase the light reflectivity on the surface of the cured product. Examples of white pigments include titanium dioxide, rare earth oxides such as yttrium oxide, zinc sulfate, zinc oxide, and magnesium oxide. These may be used alone or in combination of two or more. The average particle diameter and shape of the white pigment are not particularly limited, and a conventionally known white pigment can be used. Usually, the average particle diameter of the white pigment is 0.05 to 5 μm, but is preferably 1 μm or less from the viewpoint of concealment. The average particle diameter is obtained as a mass average value D 50 (or median diameter) in particle size distribution measurement by a laser light diffraction method.
白色顔料としては、白色度の観点から二酸化チタンを用いることが好ましい。また、二酸化チタンの製造方法としても硫酸法、塩素法などいずれの方法により製造されたものも使用できるが、白色度の観点から塩素法で得られたものが好ましい。 As the white pigment, titanium dioxide is preferably used from the viewpoint of whiteness. Further, as a method for producing titanium dioxide, those produced by any method such as sulfuric acid method and chlorine method can be used, but those obtained by chlorine method are preferred from the viewpoint of whiteness.
上記二酸化チタンは、酸化チタン粒子自体の凝集を防ぐために少なくとも1回アルミナで表面処理したものが好ましい。さらに、二酸化チタンの光触媒能を抑えたり、樹脂や無機充填材との相溶性、分散性を高めたりするため、Al、Si、Zrなどの含水酸化物、ポリオール、有機ケイ素化合物等でさらに表面処理することもできる。ここで用いられる有機ケイ素化合物の例としては種々のものが挙げられる。例えば、ポリジメチルシロキサン、ポリメチルフェニルシロキサン、ポリメチルハイドロジェンシロキサン、あるいはそれらの共重合体などのポリシロキサン類、ヘキサメチルシクロトリシロキサン、ヘプタメチルシクロテトラシロキサン、1,3,5,7−テトラメチルシクロテトラシロキサン、などのシクロシロキサン類、トリメチルクロロシラン、ジメチルジクロロシラン、メチルトリクロロシランなどのクロロシラン類、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン等のエポキシ官能基を有するシラン類、3−メタクリロキシプロピルトリメトキシシラン、3−メタクリロキシプロピルトリエトキシシラン、3−アクリロキシプロピルトリメトキシシラン、3−アクリロキシプロピルトリエトキシシラン、メタクリロキシメチルトリメトキシシラン、メタクリロキシメチルトリエトキシシラン、アクリロキシメチルトリメトキシシラン、アクリロキシメチルトリエトキシシラン等のメタクリル基あるいはアクリル基を有するシラン類、ビニルトリクロロシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス(β−メトキシエトキシ)シラン、ビニルトリアセトキシシラン等のビニル基を有するシラン類、γ−メルカプトプロピルトリメトキシシラン、γ−メルカプトプロピルメチルジメトキシシラン等のメルカプトシラン類、メチルトリメトキシシラン、メチルトリエトキシシラン、ヘキシルトリメトキシシラン、ヘキシルトリエトキシシラン、オクチルトリメトキシシラン、オクチルトリエトキシシラン等のアルキル基を有するシラン類、γ−クロロプロピルトリメトキシシラン、γ−アニリノプロピルトリメトキシシラン等のその他のシラン類等の各種シラン類で例示されるシランカップリング剤や、これらシラン類からなる群から選択される1種又は2種以上の部分加水分解物、ヘキサメチルジシロキサン、ヘキサメチルジシラザンなどを挙げることができる。中でもポリシロキサン類が好ましく、ポリジメチルシロキサンがより好ましい。 The titanium dioxide is preferably one that has been surface-treated with alumina at least once in order to prevent aggregation of the titanium oxide particles themselves. Furthermore, in order to suppress the photocatalytic ability of titanium dioxide, and to improve compatibility and dispersibility with resins and inorganic fillers, surface treatment is further carried out with hydrous oxides such as Al, Si, Zr, polyols, organosilicon compounds, etc. You can also Examples of the organosilicon compound used here include various types. For example, polysiloxanes such as polydimethylsiloxane, polymethylphenylsiloxane, polymethylhydrogensiloxane, or copolymers thereof, hexamethylcyclotrisiloxane, heptamethylcyclotetrasiloxane, 1,3,5,7-tetra Cyclosiloxanes such as methylcyclotetrasiloxane, chlorosilanes such as trimethylchlorosilane, dimethyldichlorosilane, methyltrichlorosilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 2- (3 , 4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane and other silanes having an epoxy functional group, 3-methacryloxypropyltri Toxisilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, methacryloxymethyltrimethoxysilane, methacryloxymethyltriethoxysilane, acryloxymethyltrimethoxysilane, Silanes having a methacrylic group or an acrylic group such as acryloxymethyltriethoxysilane, vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, vinyltriacetoxysilane, etc. Silanes having, mercaptosilanes such as γ-mercaptopropyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, methyltrimethoxysilane, Silanes having an alkyl group such as tiltriethoxysilane, hexyltrimethoxysilane, hexyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, γ-chloropropyltrimethoxysilane, γ-anilinopropyltrimethoxysilane, etc. Silane coupling agents exemplified by various silanes such as other silanes, one or more partial hydrolysates selected from the group consisting of these silanes, hexamethyldisiloxane, hexamethyldi Silazane and the like can be mentioned. Of these, polysiloxanes are preferable, and polydimethylsiloxane is more preferable.
白色顔料の表面を処理する方法は特に制限されない。例えば、有機ケイ素化合物による表面処理は、白色顔料と有機ケイ素化合物とを混合する乾式法にて行うことができる。アルミナやシリカなどによる表面処理は、アルミン酸ナトリウムやケイ酸ナトリウムの水溶液中にて硫酸で中和しながら白色顔料の表面に層を形成する湿式法にて行うことができる。 The method for treating the surface of the white pigment is not particularly limited. For example, the surface treatment with the organosilicon compound can be performed by a dry method in which a white pigment and an organosilicon compound are mixed. The surface treatment with alumina or silica can be performed by a wet method in which a layer is formed on the surface of the white pigment while neutralizing with sulfuric acid in an aqueous solution of sodium aluminate or sodium silicate.
白色顔料の配合量は、(A)成分100質量部に対し、3〜300質量部が好ましく、特に5〜250質量部が好ましい。3質量部未満では十分な白色度が得られない場合がある。また、300質量部を超えると機械的強度向上の目的で添加する他成分の割合が少なくなるだけでなく、成形性が著しく低下することがある。なお、この白色顔料の配合量は、白色熱硬化性エポキシ樹脂組成物全体(質量)に対して1〜50質量%が好ましく、特に3〜40質量%の範囲が好ましい。 The blending amount of the white pigment is preferably 3 to 300 parts by mass, particularly preferably 5 to 250 parts by mass, with respect to 100 parts by mass of the component (A). If the amount is less than 3 parts by mass, sufficient whiteness may not be obtained. On the other hand, when the amount exceeds 300 parts by mass, not only the ratio of other components added for the purpose of improving the mechanical strength is decreased, but also the moldability may be significantly lowered. In addition, 1-50 mass% is preferable with respect to the whole white thermosetting epoxy resin composition (mass), and, as for the compounding quantity of this white pigment, the range of 3-40 mass% is especially preferable.
(C)無機充填材
本発明の白色熱硬化性エポキシ樹脂組成物には、更に(C)成分として上記(B)成分以外の無機充填材を配合する。このような無機充填材としては、通常エポキシ樹脂組成物に配合されるものを使用することができる。例えば、溶融シリカ、結晶性シリカ等のシリカ類、アルミナ、窒化ケイ素、窒化アルミニウム、ボロンナイトライド、三酸化アンチモン、ガラス繊維やチタン酸カリウム等が挙げられるが、上記した(B)成分の白色顔料(白色着色剤)は除かれる。これら無機充填材の平均粒径や形状は特に限定されないが、平均粒径は通常3μm以上50μm以下、特には5μm以上45μm以下である。アルミナやシリカは白色顔料としても使用できるが、平均粒径1μm以上であるものを無機充填材として使用し、平均粒径1μm未満であるものを上記白色顔料とする。なお、平均粒径は、レーザー光回折法による粒度分布測定における質量平均値D50(又はメジアン径)として求めたものである。
(C) Inorganic filler In the white thermosetting epoxy resin composition of the present invention, an inorganic filler other than the component (B) is further blended as the component (C). As such an inorganic filler, what is normally mix | blended with an epoxy resin composition can be used. Examples thereof include silicas such as fused silica and crystalline silica, alumina, silicon nitride, aluminum nitride, boron nitride, antimony trioxide, glass fiber, potassium titanate, and the like. (White colorant) is excluded. The average particle size and shape of these inorganic fillers are not particularly limited, but the average particle size is usually 3 μm or more and 50 μm or less, particularly 5 μm or more and 45 μm or less. Alumina and silica can be used as a white pigment, but those having an average particle diameter of 1 μm or more are used as inorganic fillers, and those having an average particle diameter of less than 1 μm are used as the white pigment. The average particle size is one calculated as a weight average value D 50 of the particle size distribution measurement (or median diameter) by a laser diffraction method.
無機充填材としては、特に、破砕シリカ、溶融球状シリカ等のシリカ系無機充填材が好適に用いられ、これは特に限定されるものではないが、成形性、流動性からみて、溶融球状シリカが好ましく、平均粒径が4〜40μmのものが好ましく、特に7〜35μmのものが好ましい。また、高流動性を得るには、0.1〜3μmの微細領域、4〜8μmの中粒径領域、10〜50μmの粗領域のものを組み合わせて使用することが好ましい。 As the inorganic filler, silica-based inorganic fillers such as crushed silica and fused spherical silica are particularly preferably used, and this is not particularly limited, but in view of moldability and fluidity, fused spherical silica is preferably used. The average particle diameter is preferably 4 to 40 μm, and particularly preferably 7 to 35 μm. In order to obtain high fluidity, it is preferable to use a combination of a fine region of 0.1 to 3 μm, a medium particle size region of 4 to 8 μm, and a coarse region of 10 to 50 μm.
上記(B)成分以外の無機充填材は、(A)成分の樹脂成分や、(B)成分の白色顔料との結合強度を強くするため、シランカップリング剤、チタネートカップリング剤等のカップリング剤で予め表面処理したものを用いてもよい。このようなカップリング剤としては、例えば、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン等のエポキシ官能性アルコキシシラン、N−β(アミノエチル)−γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、N−フェニル−γ−アミノプロピルトリメトキシシラン等のアミノ官能性アルコキシシラン、γ−メルカプトプロピルトリメトキシシラン等のメルカプト官能性アルコキシシランなどが挙げられる。なお、表面処理に用いるカップリング剤の配合量及び表面処理方法については特に制限されるものではないが、150℃以上に放置した場合に処理フィラーが変色しないものが好ましい。 Inorganic fillers other than the above component (B) are used for coupling such as a silane coupling agent and a titanate coupling agent in order to increase the bonding strength with the resin component of component (A) and the white pigment of component (B). You may use what was surface-treated beforehand with the agent. Examples of such a coupling agent include epoxy functions such as γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, and β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. Functional alkoxysilanes such as N-β (aminoethyl) -γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, and γ-mercapto And mercapto-functional alkoxysilanes such as propyltrimethoxysilane. The amount of the coupling agent used for the surface treatment and the surface treatment method are not particularly limited, but those that do not discolor the treated filler when left at 150 ° C. or higher are preferred.
(C)成分の無機充填材の配合量は、(A)成分100質量部に対し、50〜850質量部が好ましく、特に100〜600質量部が好ましい。50質量部未満では、十分な強度を得ることができないおそれがあり、850質量部を超えると、増粘による未充填不良や柔軟性が失われることで、素子内の剥離等の不良が発生する場合がある。なお、この(C)成分の無機充填材の配合量は、組成物全体(質量)の10〜90質量%が好ましく、特に、20〜80質量%の範囲が好ましい。 (C) As for the compounding quantity of the inorganic filler of a component, 50-850 mass parts is preferable with respect to 100 mass parts of (A) component, and 100-600 mass parts is especially preferable. If the amount is less than 50 parts by mass, sufficient strength may not be obtained. If the amount exceeds 850 parts by mass, unfilled defects due to thickening and flexibility are lost, resulting in defects such as peeling in the element. There is a case. In addition, 10-90 mass% of the whole composition (mass) is preferable, and the compounding quantity of the inorganic filler of this (C) component has the preferable range of 20-80 mass% especially.
(D)硬化促進剤
(D)成分の硬化促進剤は白色熱硬化性エポキシ樹脂を硬化させるために配合するものである。硬化促進剤の種類としては、エポキシ樹脂組成物の硬化促進剤として公知のものが使用でき、特に限定されないが、第三級アミン類、イミダゾール類、それらの有機カルボン酸塩、有機カルボン酸金属塩、金属−有機キレート化合物、芳香族スルホニウム塩、有機ホスフィン化合物類、ホスホニウム化合物類等のリン系硬化触媒、これらの塩類等の1種又は2種以上を挙げることができる。これらの中でも、イミダゾール類、リン系硬化促進剤、例えば2−エチル−4−メチルイミダゾール又はメチルトリブチルホスホニウムジメチルホスフェイト、第三級アミンのオクチル酸塩が更に好ましい。また、第四級ホスホニウムブロマイドとアミンの有機酸塩を併用して用いることもできる。
(D) Curing accelerator The curing accelerator of component (D) is blended to cure the white thermosetting epoxy resin. As the type of curing accelerator, those known as curing accelerators for epoxy resin compositions can be used, and are not particularly limited. Tertiary amines, imidazoles, their organic carboxylates, organic carboxylate metal salts , Metal-organic chelate compounds, aromatic sulfonium salts, phosphorus-based curing catalysts such as organic phosphine compounds and phosphonium compounds, and one or more of these salts. Among these, imidazoles, phosphorus curing accelerators such as 2-ethyl-4-methylimidazole or methyltributylphosphonium dimethyl phosphate, and tertiary amine octylates are more preferable. A quaternary phosphonium bromide and an organic acid salt of amine can also be used in combination.
硬化促進剤の配合量は、(A)成分の総和(質量)に対して0.05〜5質量%が好ましく、特に0.1〜2質量%が好ましい。上記範囲を外れると、エポキシ樹脂組成物の硬化物の耐熱性及び耐湿性のバランスが悪くなったり、成形時の硬化が非常に遅く又は速くなったりするおそれがある。 0.05-5 mass% is preferable with respect to the sum total (mass) of (A) component, and, as for the compounding quantity of a hardening accelerator, 0.1-2 mass% is especially preferable. If it is out of the above range, the balance of heat resistance and moisture resistance of the cured product of the epoxy resin composition may be deteriorated, or curing at the time of molding may be very slow or fast.
(E)離型剤
本発明の白色熱硬化性エポキシ樹脂組成物には、(E)成分として離型剤を配合する。(E)成分の離型剤は、成形時の離型性を高めるために配合するものである。
(E) Release agent A release agent is mix | blended with the white thermosetting epoxy resin composition of this invention as (E) component. (E) The mold release agent of a component is mix | blended in order to improve the mold release property at the time of shaping | molding.
離型剤としては、カルナバワックスをはじめとする天然ワックス、酸ワックス、ポリエチレンワックス、脂肪酸エステルをはじめとする合成ワックスがあるが、一般的に高温条件下や光照射下では、容易に黄変したり、経時劣化したりして、離型性を有しなくなるものが多いため、変色の少ないグリセリン誘導体や脂肪酸エステルや初期にて着色があるものの経時での変色の少ないカルナバワックスが好ましい。これらの離型剤は単独で用いてもよく、また併用であっても構わない。 Mold release agents include natural waxes such as carnauba wax, synthetic waxes such as acid wax, polyethylene wax, and fatty acid ester. Generally, yellowing easily occurs under high temperature conditions or under light irradiation. In many cases, glycerin derivatives and fatty acid esters with little discoloration or carnauba wax with little discoloration over time, although having little color change, are preferred. These release agents may be used alone or in combination.
本発明による白色熱硬化性エポキシ樹脂組成物において使用する(E)成分である離型剤は、特定限定されるものではないが、(F)成分である離型助剤として使用する化合物との相性を考慮して選択することが好ましい。 The release agent which is the component (E) used in the white thermosetting epoxy resin composition according to the present invention is not particularly limited, but the compound used as a release aid which is the component (F). It is preferable to select in consideration of compatibility.
離型剤(E)の添加量は、(A)成分の総和(質量)に対して、0.05〜7.0質量%、好ましくは0.1〜5.0質量%である。添加量が0.05質量%未満では、十分な離型性を得られない場合があり、7.0質量%を超えると、沁み出し不良や接着性不良等が起こる場合がある。 The amount of release agent (E) added is 0.05 to 7.0% by mass, preferably 0.1 to 5.0% by mass, based on the total (mass) of component (A). When the addition amount is less than 0.05% by mass, sufficient releasability may not be obtained. When the addition amount exceeds 7.0% by mass, a squeeze out defect or poor adhesion may occur.
(F)離型助剤
本発明の白色熱硬化性エポキシ樹脂組成物には、(F)成分として離型助剤を配合し、これはアルケニル基含有エポキシ化合物及び/又はアルケニル基含有フェノール化合物のアルケニル基に下記平均組成式(1)で示されるオルガノポリシロキサンのSiH基を付加反応させたブロック共重合体である。
(F) Mold release aid The white thermosetting epoxy resin composition of the present invention contains a mold release aid as the component (F), which is an alkenyl group-containing epoxy compound and / or an alkenyl group-containing phenol compound. It is a block copolymer obtained by addition-reacting an SiH group of an organopolysiloxane represented by the following average composition formula (1) to an alkenyl group.
このような特定のブロック共重合体は、(E)成分である離型剤の乳化分散を補助することにより、離型性を高め、離型剤由来のリードフレームの汚染を低減する役割を果たす。上記エポキシ化合物由来の共重合体と上記フェノール化合物由来の共重合体は、それぞれ単独で用いてもよく、両方を併用してもよい。中でも、アルケニル基含有エポキシ化合物と上記式(1)で示されるオルガノポリシロキサンとの付加共重合体を用いると耐熱変色性がより優れるため好ましい。なお、熱や光による変色の観点から、本発明の(F)成分は、多価の官能基(例えば、メチレン基、カルボニル基、イミノ基など)を有しないブロック共重合体であることが好ましい。 Such a specific block copolymer plays a role of enhancing the releasability and reducing the contamination of the lead frame derived from the release agent by assisting the emulsification and dispersion of the release agent as the component (E). . The copolymer derived from the epoxy compound and the copolymer derived from the phenol compound may be used alone or in combination. Among them, it is preferable to use an addition copolymer of an alkenyl group-containing epoxy compound and an organopolysiloxane represented by the above formula (1) because the heat discoloration is more excellent. From the viewpoint of discoloration due to heat or light, the component (F) of the present invention is preferably a block copolymer that does not have a polyvalent functional group (for example, a methylene group, a carbonyl group, an imino group, etc.). .
ここで、式(1)におけるRは、好ましくは炭素数1〜10、特に好ましくは炭素数1〜8の一価炭化水素基であり、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ヘキシル基、シクロヘキシル基、オクチル基、デシル基等のアルキル基、ビニル基、アリル基、プロペニル基、ブテニル基、ヘキセニル基等のアルケニル基、フェニル基、キシリル基、トリル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基などや、これら炭化水素基の水素原子の一部又は全部を塩素、フッ素、臭素等のハロゲン原子で置換したクロロメチル基、トリフルオロプロピル基、ブロモエチル基等のハロゲン置換一価炭化水素基などを挙げることができる。 Here, R in Formula (1) is preferably a monovalent hydrocarbon group having 1 to 10 carbon atoms, particularly preferably 1 to 8 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an isopropyl group, Alkyl groups such as butyl group, isobutyl group, tert-butyl group, hexyl group, cyclohexyl group, octyl group, decyl group, alkenyl group such as vinyl group, allyl group, propenyl group, butenyl group, hexenyl group, phenyl group, xylyl group Group, aryl group such as tolyl group, aralkyl group such as benzyl group, phenylethyl group, phenylpropyl group, etc., and some or all of hydrogen atoms of these hydrocarbon groups are replaced by halogen atoms such as chlorine, fluorine, bromine, etc. And halogen-substituted monovalent hydrocarbon groups such as chloromethyl group, trifluoropropyl group, and bromoethyl group.
また、式(1)において、a及びbの範囲は、0.001≦a≦1、1≦b≦3、1.001≦a+b≦3を満たす正数、好ましい範囲は、0.01≦a≦0.5、1.5≦b≦2.5、1.51≦a+b≦3.0であり、式(1)のオルガノポリシロキサンの一分子中におけるケイ素原子数は2〜1000、10〜200であるものが好ましく、ケイ素原子に直結した水素原子(SiH基)の数は1〜10、1〜5であるものが好ましい。また、ブロック共重合体中のオルガノポリシロキサン含有量は5〜50質量%、好ましくは10〜20質量%である。 In the formula (1), the ranges of a and b are positive numbers satisfying 0.001 ≦ a ≦ 1, 1 ≦ b ≦ 3, and 1.001 ≦ a + b ≦ 3, and the preferable range is 0.01 ≦ a ≦ 0.5, 1.5 ≦ b ≦ 2.5, 1.51 ≦ a + b ≦ 3.0, and the number of silicon atoms in one molecule of the organopolysiloxane of formula (1) is 2 to 1000, 10 The number is preferably 200, and the number of hydrogen atoms (SiH groups) directly bonded to silicon atoms is preferably 1 to 10 and 1 to 5. The organopolysiloxane content in the block copolymer is 5 to 50% by mass, preferably 10 to 20% by mass.
本発明の共重合体の製造方法は、すでに公知であり(特公昭63−60069号公報、特公昭63−60070号公報等)、アルケニル基含有エポキシ化合物又はアルケニル基含有フェノール化合物のアルケニル基と、上記式(1)で示されるオルガノポリシロキサンのSiH基との付加反応によって得ることができる。 The method for producing the copolymer of the present invention is already known (Japanese Patent Publication No. 63-60069, Japanese Patent Publication No. 63-60070, etc.), an alkenyl group of an alkenyl group-containing epoxy compound or an alkenyl group-containing phenol compound, It can be obtained by addition reaction with the SiH group of the organopolysiloxane represented by the above formula (1).
ブロック共重合体として、より具体的には下記式(3)及び(4)で示される構造のものを例示することができる。 More specifically, examples of the block copolymer include structures represented by the following formulas (3) and (4).
(式(3)中、R1は環状エーテルを有する有機基であり、R2は二重結合を有する有機基とその二重結合と反応可能なSi−H基を有するポリオルガノシロキサンとを付加反応させたものであって、直鎖状であっても分岐状であっても構わない。) (In Formula (3), R 1 is an organic group having a cyclic ether, and R 2 is an addition of an organic group having a double bond and a polyorganosiloxane having a Si—H group capable of reacting with the double bond. (The reaction may be linear or branched.)
(式(4)中、R3は二重結合を有する有機基であり、R4は二重結合を有する有機基とその二重結合と反応可能なSi−H基を有するポリオルガノシロキサンとを付加反応させたものであって、直鎖状であっても分岐状であっても構わない。) (In Formula (4), R 3 is an organic group having a double bond, and R 4 is an organic group having a double bond and a polyorganosiloxane having a Si—H group capable of reacting with the double bond. It is an addition-reaction product and may be linear or branched.)
ブロック共重合体として、さらに具体的には下記式(5)及び(6)で示される構造のものを例示することができる。 More specifically, examples of the block copolymer include structures represented by the following formulas (5) and (6).
(式(5)中、Rは上記と同じ、nは1〜200、好ましくは10〜100の整数、s及びtは1〜100、好ましくは1〜20の整数である。) (In Formula (5), R is the same as the above, n is an integer of 1 to 200, preferably 10 to 100, and s and t are integers of 1 to 100, preferably 1 to 20.)
(式(6)中、Rは上記と同じ、nは1〜200、好ましくは10〜100の整数、s及びtは1〜100、好ましくは1〜20の整数である。) (In Formula (6), R is the same as the above, n is an integer of 1 to 200, preferably 10 to 100, and s and t are integers of 1 to 100, preferably 1 to 20.)
本発明において、(F)成分である離型助剤中のオルガノポリシロキサン含有量は5〜50質量%、好ましくは10〜20質量%である。 In the present invention, the content of organopolysiloxane in the mold release aid as component (F) is 5 to 50% by mass, preferably 10 to 20% by mass.
(F)成分であるブロック共重合体を使用する場合の含有量としては、(A)成分100質量部に対して0.01〜5質量部が好ましく、より好ましくは0.03〜3質量部である。 As content when using the block copolymer which is (F) component, 0.01-5 mass parts is preferable with respect to 100 mass parts of (A) component, More preferably, it is 0.03-3 mass parts. It is.
本発明においては、必要により、以下に示す成分を添加してもよい。 In the present invention, the following components may be added as necessary.
(G)酸化防止剤
本発明の白色熱硬化性エポキシ樹脂組成物は、初期反射率向上及び長期での反射率維持のために(G)成分として酸化防止剤を配合することができる。(G)成分の酸化防止剤としては、フェノール系、リン系、硫黄系酸化防止剤を使用でき、酸化防止剤の具体例としては、以下のようなものが挙げられる。
(G) Antioxidant The white thermosetting epoxy resin composition of the present invention can contain an antioxidant as the component (G) for improving the initial reflectance and maintaining the reflectance over a long period of time. (G) As an antioxidant of a component, a phenol type, phosphorus type, and sulfur type antioxidant can be used, and the following are mentioned as a specific example of antioxidant.
フェノール系酸化防止剤としては、2,6−ジ−t−ブチル−p−クレゾール、ブチル化ヒドロキシアニソール、2,6−ジ−t−ブチル−p−エチルフェノール、ステアリル−β−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)、4,4’−ブチリデンビス(3−メチル−6−t−ブチルフェノール)、3,9−ビス[1,1−ジメチル−2−{β−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ}エチル]2,4,8,10−テトラオキサスピロ[5,5]ウンデカン、1,1,3−トリス(2−メチル−4−ヒドロキシ−5−t−ブチルフェニル)ブタン、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン等が挙げられる。 Examples of phenolic antioxidants include 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,6-di-t-butyl-p-ethylphenol, stearyl-β- (3,5 -Di-t-butyl-4-hydroxyphenyl) propionate, 2,2'-methylenebis (4-methyl-6-t-butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 3,9-bis [1,1-dimethyl-2- {β- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy} ethyl] 2,4,8,10-tetraoxaspiro [ 5,5] undecane, 1,1,3-tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, 1,3,5-trimethyl-2,4,6-tris (3 , 5-di-t-butyl-4-hydroxybenzyl) benzene and the like.
リン系酸化防止剤としては、亜リン酸ジフェニルアルキル、亜リン酸フェニルジアルキル、亜リン酸トリラウリル、亜リン酸トリオクタデシル、トリフェニルホスファイト、トリスノニルフェニルホスファイト、ジステアリルペンタエリトリトールジホスファイト、トリス(2,4−ジ−tert−ブチルフェニル)ホスファイト、ジイソデシルペンタエリトリトールジホスファイト、ジ(2,4−ジ−tert−ブチルフェニル)ペンタエリトリトールジホスファイト、トリステアリルソルビトールトリホスファイト及びテトラキス(2,4−ジ−tert−ブチルフェニル)−4,4’−ビフェニルジホスホネート等が挙げられる。 Phosphorus antioxidants include diphenyl alkyl phosphite, phenyl dialkyl phosphite, trilauryl phosphite, trioctadecyl phosphite, triphenyl phosphite, trisnonyl phenyl phosphite, distearyl pentaerythritol diphosphite, Tris (2,4-di-tert-butylphenyl) phosphite, diisodecylpentaerythritol diphosphite, di (2,4-di-tert-butylphenyl) pentaerythritol diphosphite, tristearyl sorbitol triphosphite and tetrakis ( 2,4-di-tert-butylphenyl) -4,4′-biphenyl diphosphonate and the like.
硫黄系酸化防止剤としては、ジウラリルチオプロピオネート、ジステアリルチオプロピオネート、ジベンジルジサルフィド、4,4’−チオビス(6−tert−ブチル−o−クレゾール)、4,4’−チオビス(6−tert−ブチル−m−クレゾール)等が挙げられる。 Examples of sulfur-based antioxidants include diuraryl thiopropionate, distearyl thiopropionate, dibenzyl disulfide, 4,4′-thiobis (6-tert-butyl-o-cresol), 4,4 ′. -Thiobis (6-tert-butyl-m-cresol) and the like.
これらの酸化防止剤は、それぞれ単独で又は2種以上を組み合わせて使用できる。酸化防止剤の配合量は、(A)成分の総和(質量)に対して0.01〜10質量%が好ましく、特に0.03〜8質量%が好ましい。配合量が少なすぎると十分な耐熱性が得られず、変色する場合があり、多すぎると硬化阻害を起こし、十分な硬化性、強度を得ることができない場合があるだけでなく、(G)成分自体の変色により白色熱硬化性エポキシ樹脂組成物の硬化物の白色度を保てない場合がある。 These antioxidants can be used alone or in combination of two or more. 0.01-10 mass% is preferable with respect to the sum total (mass) of (A) component, and, as for the compounding quantity of antioxidant, 0.03-8 mass% is especially preferable. If the blending amount is too small, sufficient heat resistance may not be obtained and discoloration may occur, and if it is too large, curing may be inhibited and sufficient curability and strength may not be obtained. The whiteness of the cured product of the white thermosetting epoxy resin composition may not be maintained due to discoloration of the component itself.
本発明の組成物には、更に下記の成分を配合してもよい。 You may mix | blend the following component with the composition of this invention further.
(H)カップリング剤
本発明の白色熱硬化性エポキシ樹脂組成物には、樹脂と無機充填剤との結合強度を強くしたり、リードフレームとの接着力を向上させたりするために、シランカップリング剤、チタネートカップリング剤などのカップリング剤を配合することができる。このようなカップリング剤としては、例えば、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン等のエポキシ官能性アルコキシシラン、γ−メルカプトプロピルトリメトキシシラン等のメルカプト官能性アルコキシシランなどが挙げられる。なお、表面処理に用いるカップリング剤の配合量及び表面処理方法については特に制限されるものではないが、アミン系のシランカップリング剤のように150℃以上に放置した場合に樹脂が変色するものはあまり好ましくない。
(H) Coupling agent The white thermosetting epoxy resin composition of the present invention includes a silane cup in order to increase the bonding strength between the resin and the inorganic filler or to improve the adhesion to the lead frame. Coupling agents such as a ring agent and a titanate coupling agent can be blended. Examples of such a coupling agent include epoxy functions such as γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, and β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. Mercapto-functional alkoxysilanes such as functional alkoxysilane and γ-mercaptopropyltrimethoxysilane. The amount of the coupling agent used for the surface treatment and the surface treatment method are not particularly limited, but the resin discolors when left at 150 ° C. or more like an amine-based silane coupling agent. Is less preferred.
(H)成分の配合量は、(A)成分の質量に対して、0.1〜8.0質量%、好ましくは0.5〜6.0質量%添加することができる。0.1質量%未満であると、基材への接着効果が十分でなく、また8.0質量%を超えると、粘度が極端に低下して、ボイドの原因になる可能性がある。 Component (H) can be added in an amount of 0.1 to 8.0 mass%, preferably 0.5 to 6.0 mass%, based on the mass of component (A). If the content is less than 0.1% by mass, the effect of adhesion to the substrate is not sufficient, and if it exceeds 8.0% by mass, the viscosity is extremely lowered, which may cause voids.
その他の添加剤
本発明の白色熱硬化性エポキシ樹脂組成物には、更に必要に応じて各種の添加剤を配合することができる。例えば、樹脂の性質を改善する目的で、シリコーンパウダー、シリコーンオイル、熱可塑性樹脂、熱可塑性エラストマー、有機合成ゴム等の添加剤を本発明の効果を損なわない範囲で添加配合することができる。
Other Additives Various additives can be further blended into the white thermosetting epoxy resin composition of the present invention as necessary. For example, for the purpose of improving the properties of the resin, additives such as silicone powder, silicone oil, thermoplastic resin, thermoplastic elastomer, and organic synthetic rubber can be added and blended within a range that does not impair the effects of the present invention.
本発明の白色熱硬化性エポキシ組成物の製造方法は特に限定されないが、例えば次の方法が挙げられる。エポキシ樹脂、硬化剤、白色顔料、無機充填材、硬化触媒、その他の添加物を所定の組成比で配合し、これをミキサー等によって十分均一に混合した後、熱ロール、ニーダー、エクストルーダー等による溶融混合処理を行い、次いで冷却固化させ、適当な大きさに粉砕して白色熱硬化性エポキシ樹脂組成物の成形材料とすることができる。この際、エポキシ樹脂及び硬化剤は取り扱いの面からして、固体生成物としてプレポリマー化して用いることが好ましい。固形物(反応物)の調製に用いない場合は(D)成分の硬化促進剤や必要によりその他の添加物を所定の組成比で配合し、これをミキサー等によって十分均一に混合した後、熱ロール、ニーダー、エクストルーダー等による溶融混合処理を行い、次いで冷却固化させ、適当な大きさに粉砕してエポキシ樹脂組成物の成形材料とすることができる。 Although the manufacturing method of the white thermosetting epoxy composition of this invention is not specifically limited, For example, the following method is mentioned. An epoxy resin, a curing agent, a white pigment, an inorganic filler, a curing catalyst, and other additives are blended at a predetermined composition ratio, and mixed sufficiently uniformly by a mixer or the like, and then heated rolls, kneaders, extruders, etc. It can be melt-mixed, then cooled and solidified, and pulverized to an appropriate size to form a molding material for a white thermosetting epoxy resin composition. At this time, the epoxy resin and the curing agent are preferably used after being prepolymerized as a solid product from the viewpoint of handling. When not used for the preparation of the solid (reactant), the curing accelerator of component (D) and other additives as necessary are blended in a predetermined composition ratio, and after mixing this sufficiently uniformly with a mixer, etc., heat It can be melt-mixed with a roll, kneader, extruder, etc., then cooled and solidified, and pulverized to an appropriate size to form a molding material for the epoxy resin composition.
該リフレクターの最も一般的な成形方法としては、トランスファー成形法や圧縮成形法が挙げられる。トランスファー成形法では、トランスファー成形機を用い、成形圧力5〜20N/mm2、成形温度120〜190℃で成形時間30〜500秒、好ましくは成形温度150〜185℃で成形時間30〜180秒で行う。また、圧縮成形法では、コンプレッション成形機を用い、成形温度は120〜190℃で成形時間30〜600秒、好ましくは成形温度130〜160℃で成形時間120〜300秒で行う。更に、いずれの成形法においても、後硬化を150〜185℃で0.5〜20時間行ってもよい。 The most common molding method for the reflector includes a transfer molding method and a compression molding method. In the transfer molding method, using a transfer molding machine, a molding pressure of 5 to 20 N / mm 2 , a molding temperature of 120 to 190 ° C. and a molding time of 30 to 500 seconds, preferably a molding temperature of 150 to 185 ° C. and a molding time of 30 to 180 seconds. Do. In the compression molding method, a compression molding machine is used, and the molding temperature is 120 to 190 ° C., the molding time is 30 to 600 seconds, preferably the molding temperature is 130 to 160 ° C. and the molding time is 120 to 300 seconds. Further, in any molding method, post-curing may be performed at 150 to 185 ° C. for 0.5 to 20 hours.
本発明の白色熱硬化性エポキシ樹脂組成物を通常の半導体用封止材や車載用各種モジュールなどの封止に使用することもできる。その際は、着色剤としてカーボンブラックなどを用いる。カーボンブラックとしては市販されているものであればどのようなものも使用できるが、アルカリ金属やハロゲンを多く含まない高純度のものが好ましい。 The white thermosetting epoxy resin composition of the present invention can also be used for sealing a normal semiconductor sealing material and various on-vehicle modules. In that case, carbon black or the like is used as a colorant. Any carbon black may be used as long as it is commercially available, but a high-purity one that does not contain a large amount of alkali metal or halogen is preferred.
以下、実施例及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。なお、平均粒子径は、レーザー光回折法による粒度分布測定における質量平均値D50(又はメジアン径)として求めたものである。 EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example. The average particle size is one calculated as a weight average value D 50 of the particle size distribution measurement (or median diameter) by a laser diffraction method.
実施例及び比較例で使用した原料を以下に示す。 The raw materials used in Examples and Comparative Examples are shown below.
(A)プレポリマー
(A−1)トリアジン誘導体エポキシ樹脂
(A−1−1)トリス(2,3−エポキシプロピル)イソシアヌレート(TEPIC−S:日産化学(株)製商品名)
(A−2)酸無水物
(A−2−1)メチルヘキサヒドロ無水フタル酸(リカシッドMH:新日本理化(株)製商品名)
(A) Prepolymer (A-1) Triazine derivative epoxy resin (A-1-1) Tris (2,3-epoxypropyl) isocyanurate (TEPIC-S: trade name, manufactured by Nissan Chemical Co., Ltd.)
(A-2) Acid anhydride (A-2-1) Methylhexahydrophthalic anhydride (Ricacid MH: trade name, manufactured by Shin Nippon Rika Co., Ltd.)
(B)白色顔料
(B−1)アルミナ/シリカ/ポリオール処理、平均粒径0.21μmの二酸化チタン(CR−63:石原産業(株)製商品名)
(B) White pigment (B-1) Alumina / silica / polyol treatment, titanium dioxide having an average particle size of 0.21 μm (CR-63: trade name manufactured by Ishihara Sangyo Co., Ltd.)
(C)無機充填剤
(C−1)平均粒径10μmの球状溶融シリカ(RS−8225/53C(株)龍森製商品名)
(C) Inorganic filler (C-1) Spherical fused silica having an average particle size of 10 μm (RS-8225 / 53C, trade name, manufactured by Tatsumori)
(D)硬化促進剤
(D−1)1−ベンジル−2−フェニルイミダゾール(1B2PZ:四国化成工業(株)製商品名)
(D) Curing accelerator (D-1) 1-benzyl-2-phenylimidazole (1B2PZ: trade name, manufactured by Shikoku Kasei Kogyo Co., Ltd.)
(E)離型剤
(E−1)モンタン酸ワックス(LICOWAX E:クリアラントジャパン(株)製商品名)
(E−2)カルナバワックス(TOWAX−131:東亜化成(株)製商品名)
(E) Release agent (E-1) Montanic acid wax (LICOWAX E: trade name manufactured by Clearant Japan Co., Ltd.)
(E-2) Carnauba wax (TOWAX-131: trade name manufactured by Toa Kasei Co., Ltd.)
(F)離型助剤
(F−1)下記式(7)で表わされるブロック共重合体(自製)
(F) Mold release aid (F-1) Block copolymer represented by the following formula (7) (manufactured)
(F−2)下記式(8)で表わされるブロック共重合体(自製) (F-2) Block copolymer represented by the following formula (8) (manufactured)
(F−3)両末端エポキシシリコーンオイル(KF−105:信越化学工業(株)製商品名)
(F−4)シリコーンオイル(KF−96−1000:信越化学工業(株)製商品名)
(F-3) Both-end epoxy silicone oil (KF-105: trade name, manufactured by Shin-Etsu Chemical Co., Ltd.)
(F-4) Silicone oil (KF-96-1000: trade name, manufactured by Shin-Etsu Chemical Co., Ltd.)
(G)酸化防止剤
(G−1)フェノール系酸化防止剤(AO−60:ADEKA(株)製商品名)
(G) Antioxidant (G-1) Phenol type antioxidant (AO-60: ADEKA Corporation product name)
(H)カップリング剤
(H−1)3−メルカプトプロピルトリメトキシシラン(KBM−803:信越化学工業(株)製商品名)
(H) Coupling agent (H-1) 3-Mercaptopropyltrimethoxysilane (KBM-803: trade name, manufactured by Shin-Etsu Chemical Co., Ltd.)
実施例1〜5及び比較例1〜5
(A−1)エポキシ樹脂、(A−2)酸無水物を予め反応釜により、80℃にて6時間溶融混合し、冷却して固化させた後(軟化点50℃)、平均粒径1.5μmの微粉末状に粉砕し、他成分と所定の組成比にて配合し、熱二本ロールにて均一に溶融混合し、冷却、粉砕して、白色熱硬化性エポキシ樹脂組成物を得た。これらの組成につき、以下の諸特性を測定した。その結果を表1(実施例)及び表2(比較例)に示す。
Examples 1-5 and Comparative Examples 1-5
(A-1) Epoxy resin and (A-2) acid anhydride were previously melt-mixed in a reaction kettle at 80 ° C. for 6 hours, cooled and solidified (softening point 50 ° C.), then average particle size 1 Crushed into a fine powder of 5 μm, blended with other components at a predetermined composition ratio, melted and mixed uniformly with two hot rolls, cooled and crushed to obtain a white thermosetting epoxy resin composition It was. The following properties were measured for these compositions. The results are shown in Table 1 (Examples) and Table 2 (Comparative Examples).
スパイラルフロー値
EMMI規格に準じた金型を使用して、成形温度175℃、成形圧力6.9N/mm2、成形時間90秒の条件で行った。
Spiral flow value A mold conforming to the EMMI standard was used under the conditions of a molding temperature of 175 ° C., a molding pressure of 6.9 N / mm 2 , and a molding time of 90 seconds.
室温での曲げ強度、曲げ弾性率
JIS K 6911:2006規格に準じた金型を使用して、成形温度175℃、成形圧力6.9N/mm2、成形時間90秒の条件で成形し、180℃、1時間ポストキュアーした。ポストキュアーした試験片を室温(25℃)にて、曲げ強度及び曲げ弾性率を測定した。
Bending strength at room temperature, flexural modulus Using a mold conforming to JIS K 6911: 2006 standard, molding is performed under conditions of a molding temperature of 175 ° C., a molding pressure of 6.9 N / mm 2 and a molding time of 90 seconds. Post-curing at 1 ° C. for 1 hour. The post-cured test piece was measured for bending strength and bending elastic modulus at room temperature (25 ° C.).
連続成形性試験及びリードフレーム汚染確認
銀メッキされたリードフレーム上に外寸10×10×1mmの枠体パッケージを5個成形することができ、かつイジェクターピンで離型できる金型を用いて、各例で調製した樹脂組成物のトランスファー成形の連続成形性及びリードフレーム上の汚染状態を確認した。上限を150ショットとし、離型時にゲートブレーク、ランナー折れ等の成形品の破壊が発生せず、金型への張り付きも発生しない場合を連続成形可能と判断した。リードフレーム汚染に関しては、リードフレーム上に白いモヤが全く発生しないものを「○」、一度でも白いモヤが発生したものを「×」とした。なお、成形温度175℃、成形圧力6.9N/mm2、成形時間90秒の条件で成形した。
Continuous moldability test and lead frame contamination confirmation Using a mold that can mold five frame packages with outer dimensions of 10 x 10 x 1 mm on a silver-plated lead frame and that can be released with an ejector pin, The continuous moldability of transfer molding of the resin composition prepared in each example and the contamination state on the lead frame were confirmed. The upper limit was set to 150 shots, and it was determined that continuous molding was possible when the molded product did not break, such as gate break or runner breakage, and did not stick to the mold. Regarding lead frame contamination, “○” indicates that no white haze occurs on the lead frame, and “x” indicates that white haze has occurred even once. The molding was performed under conditions of a molding temperature of 175 ° C., a molding pressure of 6.9 N / mm 2 , and a molding time of 90 seconds.
光反射率
成形温度175℃、成形圧力6.9N/mm2、成形時間90秒の条件で、直径50mm×厚さ3mmの円板型硬化物を作成し、エス・デイ・ジー(株)製X−rite8200を使用して450nmの初期光反射率を測定した。その後、150℃2時間又は175℃1時間の二次硬化を行い、同様にエス・デイ・ジー(株)製X−rite8200を使用して450nmの初期光反射率を測定した。
Light reflectivity A disk-shaped cured product having a diameter of 50 mm and a thickness of 3 mm was prepared under the conditions of a molding temperature of 175 ° C., a molding pressure of 6.9 N / mm 2 , and a molding time of 90 seconds, and manufactured by SDG Co., Ltd. The initial light reflectance at 450 nm was measured using X-rite 8200. Thereafter, secondary curing at 150 ° C. for 2 hours or 175 ° C. for 1 hour was performed, and an initial light reflectance at 450 nm was measured using X-lite 8200 manufactured by SDG Co., Ltd. in the same manner.
表1及び2に示すように、(F)成分である所定のブロック共重合体(例えばF−1、F−2)を使用した場合には、連続成形性が向上した。連続成形におけるショット数は比較例では90ショット以下であったが、実施例では約140ショット以上であった。また、(F)成分を添加してもエポキシ樹脂や硬化剤との反応性に問題はなく、リードフレームの汚染もなく、流動性、機械強度、光反射率などの特性にも影響が無いことを確認できた。さらに、本発明で用いた(F)成分は、多価の官能基(例えば、メチレン基、カルボニル基、イミノ基など)を有しないブロック共重合体であり、多価の官能基を有するブロック共重合体を使用した場合に生じる熱や光による変色を起しにくい。以上の結果から、該組成の硬化物でLEDリフレクターが封止された半導体装置が有効であることが確認できた。 As shown in Tables 1 and 2, when a predetermined block copolymer (for example, F-1, F-2) as the component (F) was used, continuous moldability was improved. The number of shots in continuous molding was 90 shots or less in the comparative example, but about 140 shots or more in the examples. In addition, the addition of component (F) has no problem with reactivity with epoxy resin or curing agent, no contamination of lead frame, and no influence on characteristics such as fluidity, mechanical strength, and light reflectance. Was confirmed. Furthermore, the component (F) used in the present invention is a block copolymer having no polyvalent functional group (for example, a methylene group, a carbonyl group, an imino group, etc.), and the block copolymer having a polyvalent functional group. It is difficult to cause discoloration due to heat or light that occurs when a polymer is used. From the above results, it was confirmed that the semiconductor device in which the LED reflector was sealed with the cured product having the composition was effective.
Claims (7)
(B)白色顔料、
(C)無機充填材、
(D)硬化促進剤、
(E)離型剤、及び、
(F)離型助剤、
を含む白色熱硬化性エポキシ樹脂組成物であって、該(F)成分の離型助剤がアルケニル基含有エポキシ化合物及び/又はアルケニル基含有フェノール化合物のアルケニル基に下記平均組成式(1)で示されるオルガノポリシロキサンのSiH基を付加反応させたブロック共重合体である白色熱硬化性エポキシ樹脂組成物。
(式(1)中、Rは置換又は非置換の一価炭化水素基であり、a及びbは、0.001≦a≦1、1≦b≦3、1.001≦a+b≦3を満たす正数である。) (A) (A-1) A prepolymer obtained by reacting a triazine derivative epoxy resin with (A-2) an acid anhydride, and (A-2) based on the total number of acid anhydride groups in the component (A-1) a prepolymer in which the ratio of the total number of epoxy groups in the component is 0.6 to 2.0,
(B) a white pigment,
(C) inorganic filler,
(D) a curing accelerator,
(E) a release agent, and
(F) mold release aid,
A white thermosetting epoxy resin composition containing the component (F), wherein the release assistant of the component (F) is an alkenyl group-containing epoxy compound and / or an alkenyl group of the alkenyl group-containing phenol compound represented by the following average composition formula (1): A white thermosetting epoxy resin composition which is a block copolymer obtained by addition-reacting SiH groups of the organopolysiloxane shown.
(In Formula (1), R is a substituted or unsubstituted monovalent hydrocarbon group, and a and b satisfy 0.001 ≦ a ≦ 1, 1 ≦ b ≦ 3, and 1.001 ≦ a + b ≦ 3. (It is a positive number.)
(式(2)中、R1は酸無水物残基を示し、mは0〜200の数である。) The white thermosetting epoxy resin composition according to any one of claims 1 to 5, wherein the prepolymer of the component (A) contains a compound represented by the following general formula (2).
(In formula (2), R 1 represents an acid anhydride residue, and m is a number from 0 to 200.)
An optical semiconductor device provided with the optical semiconductor element case formed with the white thermosetting epoxy resin composition of any one of Claims 1-6.
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CN108192283A (en) * | 2017-11-24 | 2018-06-22 | 木林森股份有限公司 | Production method of organic silicon modified epoxy resin composition for L ED bracket |
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JP2021080470A (en) * | 2021-02-12 | 2021-05-27 | 信越化学工業株式会社 | High strength cured product of white thermosetting epoxy resin, reflector substrate for optical semiconductor element, production method for them, and high strengthening method of the cured product |
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Cited By (7)
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WO2018216524A1 (en) * | 2017-05-24 | 2018-11-29 | 三菱ケミカル株式会社 | Molding material and fiber-reinforced composite material |
JPWO2018216524A1 (en) * | 2017-05-24 | 2019-06-27 | 三菱ケミカル株式会社 | Molding material, and fiber reinforced composite material |
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WO2018220934A1 (en) * | 2017-05-29 | 2018-12-06 | 京セラ株式会社 | Epoxy resin composition, semiconductor device, and method for producing semiconductor device |
CN108192283A (en) * | 2017-11-24 | 2018-06-22 | 木林森股份有限公司 | Production method of organic silicon modified epoxy resin composition for L ED bracket |
JP2021015284A (en) * | 2020-10-15 | 2021-02-12 | 昭和電工マテリアルズ株式会社 | Wavelength conversion member, backlight unit, image display device, resin composition for wavelength conversion, and cured resin product for wavelength conversion |
JP2021080470A (en) * | 2021-02-12 | 2021-05-27 | 信越化学工業株式会社 | High strength cured product of white thermosetting epoxy resin, reflector substrate for optical semiconductor element, production method for them, and high strengthening method of the cured product |
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