JP2016155979A - Polyimide precursor solution composition and method for producing polyimide film using the same - Google Patents
Polyimide precursor solution composition and method for producing polyimide film using the same Download PDFInfo
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 75
- 239000004642 Polyimide Substances 0.000 title claims abstract description 49
- 239000000203 mixture Substances 0.000 title claims abstract description 46
- 239000002243 precursor Substances 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- -1 aromatic tetracarboxylic acid Chemical class 0.000 claims abstract description 47
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 25
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 12
- 150000002460 imidazoles Chemical class 0.000 claims abstract description 11
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 20
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 16
- 239000000178 monomer Substances 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- 239000011521 glass Substances 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 229910001873 dinitrogen Inorganic materials 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 229920005575 poly(amic acid) Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000008065 acid anhydrides Chemical group 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011231 conductive filler Substances 0.000 description 2
- 150000005690 diesters Chemical class 0.000 description 2
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- OJURWUUOVGOHJZ-UHFFFAOYSA-N methyl 2-[(2-acetyloxyphenyl)methyl-[2-[(2-acetyloxyphenyl)methyl-(2-methoxy-2-oxoethyl)amino]ethyl]amino]acetate Chemical compound C=1C=CC=C(OC(C)=O)C=1CN(CC(=O)OC)CCN(CC(=O)OC)CC1=CC=CC=C1OC(C)=O OJURWUUOVGOHJZ-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- HORNXRXVQWOLPJ-UHFFFAOYSA-N 3-chlorophenol Chemical compound OC1=CC=CC(Cl)=C1 HORNXRXVQWOLPJ-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- OMHOXRVODFQGCA-UHFFFAOYSA-N 4-[(4-amino-3,5-dimethylphenyl)methyl]-2,6-dimethylaniline Chemical compound CC1=C(N)C(C)=CC(CC=2C=C(C)C(N)=C(C)C=2)=C1 OMHOXRVODFQGCA-UHFFFAOYSA-N 0.000 description 1
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 1
- QEFLNYXPYKZGEX-UHFFFAOYSA-N 4-ethyl-1-methylimidazole Chemical compound CCC1=CN(C)C=N1 QEFLNYXPYKZGEX-UHFFFAOYSA-N 0.000 description 1
- RIAHASMJDOMQER-UHFFFAOYSA-N 5-ethyl-2-methyl-1h-imidazole Chemical compound CCC1=CN=C(C)N1 RIAHASMJDOMQER-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- QGLBZNZGBLRJGS-UHFFFAOYSA-N Dihydro-3-methyl-2(3H)-furanone Chemical compound CC1CCOC1=O QGLBZNZGBLRJGS-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- ZRXGCJAFQUBZCG-UHFFFAOYSA-N carbonic acid;4-methyl-1,3-dioxolan-2-one Chemical compound OC(O)=O.CC1COC(=O)O1 ZRXGCJAFQUBZCG-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical compound NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 1
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellityc acid Natural products OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
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- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
本発明は、ポリイミド前駆体溶液組成物及びそれを用いたポリイミド膜の製造方法に関する。 The present invention relates to a polyimide precursor solution composition and a method for producing a polyimide film using the same.
一般に、ポリイミド膜は、原料である芳香族テトラカルボン酸二無水物と芳香族ジアミンとを有機溶媒中で重合して得られるポリアミック酸溶液を基材に塗布し、これを加熱して溶媒を除去するとともにイミド化して製造される。しかし、ポリアミック酸は分子量が大きいため、溶液中のポリアミック酸の濃度を高くすると溶液が高粘度になり取り扱いが困難になる。 In general, a polyimide film is coated with a polyamic acid solution obtained by polymerizing aromatic tetracarboxylic dianhydride and aromatic diamine, which are raw materials, in an organic solvent, and this is heated to remove the solvent. And imidized. However, since the polyamic acid has a large molecular weight, if the concentration of the polyamic acid in the solution is increased, the solution becomes highly viscous and difficult to handle.
この問題を解決するために、芳香族テトラカルボン酸ジエステルと芳香族ジアミン成分からなるポリイミド前駆体溶液(ナイロン塩型モノマー溶液)を用いる方法が提案されている(特許文献1、2)。 In order to solve this problem, a method using a polyimide precursor solution (nylon salt type monomer solution) composed of an aromatic tetracarboxylic acid diester and an aromatic diamine component has been proposed (Patent Documents 1 and 2).
芳香族テトラカルボン酸ジエステルと芳香族ジアミンとを溶媒に溶解したポリイミド前駆体溶液(ナイロン塩型モノマー溶液)は、高濃度かつ低溶液粘度とすることができるが、得られるポリイミドが結晶性となるモノマーの組み合わせでは十分な特性を有するポリイミド膜が得られない場合があった。特に、テトラカルボン酸成分として3,3’,4,4’−ビフェニルテトラカルボン酸化合物を、ジアミン成分としてp−フェニレンジアミンをそれぞれ用いると、結晶性のポリイミド樹脂が得られ易く、ナイロン塩型モノマー溶液からは十分な特性を有するポリイミド膜が得られ難いという問題があった。 A polyimide precursor solution (nylon salt type monomer solution) in which an aromatic tetracarboxylic acid diester and an aromatic diamine are dissolved in a solvent can have a high concentration and a low solution viscosity, but the resulting polyimide becomes crystalline. In some cases, a combination of monomers cannot provide a polyimide film having sufficient characteristics. In particular, when a 3,3 ′, 4,4′-biphenyltetracarboxylic acid compound is used as a tetracarboxylic acid component and p-phenylenediamine is used as a diamine component, a crystalline polyimide resin is easily obtained, and a nylon salt monomer There was a problem that it was difficult to obtain a polyimide film having sufficient characteristics from the solution.
本発明は、耐熱性や機械的特性などに優れたポリイミド膜を製造することができる、高濃度かつ低溶液粘度のポリイミド前駆体溶液組成物を提供することを目的とする。 An object of this invention is to provide the polyimide precursor solution composition of a high concentration and a low solution viscosity which can manufacture the polyimide film excellent in heat resistance, a mechanical characteristic, etc.
本発明は以下の項に関する。
1. 芳香族テトラカルボン酸ジエステルからなる芳香族テトラカルボン酸成分と芳香族ジアミン成分とを含有するポリイミド前駆体溶液組成物であって、
前記芳香族テトラカルボン酸成分は、50モル%以上が3,3’,4,4’−ビフェニルテトラカルボン酸ジエステルからなり、
前記芳香族ジアミン成分は、p−フェニレンジアミンと4,4’−ジアミノジフェニルエーテルとを含み、芳香族ジアミン成分中のパラフェニレンジアミンの割合が50モル%以上であり、
イミダゾール類を含むことを特徴とする、ポリイミド前駆体溶液組成物。
2. 芳香族テトラカルボン酸成分と芳香族ジアミン成分とからなるポリイミド前駆体の濃度が20質量%であるときの溶液粘度が0.01Pa・s以下である、前記項1に記載のポリイミド前駆体溶液組成物。
3. 前記項1または2のいずれかに記載のポリイミド前駆体溶液組成物を基材に塗布し、加熱によりイミド化する、ポリイミド膜の製造方法。
4. インクジェット法によりポリイミド前駆体溶液組成物を塗布する、前記項3に記載のポリイミド膜の製造方法。
The present invention relates to the following items.
1. A polyimide precursor solution composition comprising an aromatic tetracarboxylic acid component comprising an aromatic tetracarboxylic acid diester and an aromatic diamine component,
The aromatic tetracarboxylic acid component is composed of 3,3 ′, 4,4′-biphenyltetracarboxylic acid diester in an amount of 50 mol% or more,
The aromatic diamine component contains p-phenylenediamine and 4,4′-diaminodiphenyl ether, and the proportion of paraphenylenediamine in the aromatic diamine component is 50 mol% or more,
A polyimide precursor solution composition comprising imidazoles.
2. The polyimide precursor solution composition according to item 1, wherein the solution viscosity is 0.01 Pa · s or less when the concentration of the polyimide precursor composed of the aromatic tetracarboxylic acid component and the aromatic diamine component is 20% by mass. object.
3. The manufacturing method of the polyimide film which apply | coats the polyimide precursor solution composition in any one of said claim | item 1 or 2 to a base material, and imidizes by heating.
4). Item 4. The method for producing a polyimide film according to Item 3, wherein the polyimide precursor solution composition is applied by an inkjet method.
本発明のポリイミド前駆体溶液組成物は、高濃度かつ低溶液粘度であり、得られるポリイミドが結晶性となるモノマーの組み合わせであるにもかかわらず、十分な特性を有するポリイミド膜が得られる。そのため、本発明のポリイミド前駆体溶液組成物は、インクジェット用インクとして好適に用いることができる。 The polyimide precursor solution composition of the present invention has a high concentration and a low solution viscosity, and a polyimide film having sufficient characteristics can be obtained even though the resulting polyimide is a combination of monomers that are crystalline. Therefore, the polyimide precursor solution composition of the present invention can be suitably used as an inkjet ink.
本発明は、有機溶媒中に、芳香族テトラカルボン酸のエステルからなる芳香族テトラカルボン酸成分と、芳香族ジアミン成分と、イミダゾール類とを溶解したポリイミド前駆体溶液組成物である。芳香族テトラカルボン酸のエステルとしては、芳香族テトラカルボン酸ジエステル(ハーフエステルともいう)を挙げることができ、具体的には、芳香族テトラカルボン酸の4個のカルボキシル基のうち2個のカルボキシル基がエステル化されており、かつ芳香環上の隣接する2個のカルボキシル基の一方がエステル化された化合物が挙げられる。芳香族テトラカルボン酸ジエステルにおけるエステルとしては、低級アルキルエステル、好ましくはジメチルエステル、ジエチルエステル、ジプロピルエステル等の炭素数1〜3のアルキルエステルが挙げられる。 The present invention is a polyimide precursor solution composition in which an aromatic tetracarboxylic acid component composed of an ester of an aromatic tetracarboxylic acid, an aromatic diamine component, and imidazoles are dissolved in an organic solvent. Examples of the aromatic tetracarboxylic acid ester include aromatic tetracarboxylic acid diesters (also referred to as half esters). Specifically, two of the four carboxyl groups of the aromatic tetracarboxylic acid are carboxyl groups. Examples thereof include compounds in which a group is esterified and one of two adjacent carboxyl groups on an aromatic ring is esterified. Examples of the ester in the aromatic tetracarboxylic acid diester include lower alkyl esters, preferably alkyl esters having 1 to 3 carbon atoms such as dimethyl ester, diethyl ester and dipropyl ester.
本発明において、芳香族テトラカルボン酸成分は、主として、すなわち、その50モル%以上、好ましくは70モル%以上、特に好ましくは90モル%以上が3,3’,4,4’−ビフェニルテトラカルボン酸ジエステルからなる。エステルとしては、ジメチルエステル、ジエチルエステル、ジプロピルエステル等の炭素数1〜3のアルキルエステルが挙げられる。 In the present invention, the aromatic tetracarboxylic acid component is mainly, ie, 50 mol% or more, preferably 70 mol% or more, particularly preferably 90 mol% or more of 3,3 ′, 4,4′-biphenyltetracarboxylic acid. It consists of an acid diester. Examples of the ester include alkyl esters having 1 to 3 carbon atoms such as dimethyl ester, diethyl ester, and dipropyl ester.
芳香族テトラカルボン酸ジエステルは、公知の方法により製造することができる。例えば、対応する芳香族テトラカルボン酸二無水物に対して2倍モル量以上、好ましくは2〜3倍モル量のアルコール(低級アルコール、好ましくは炭素数1〜3のアルコール)を反応させて容易に製造することができる。この方法においては、原料の酸無水物環がアルコールと反応して開環し、芳香環上の隣接する炭素上にそれぞれエステル基とカルボキシル基を有するジエステル(ハーフエステル)となる。 The aromatic tetracarboxylic acid diester can be produced by a known method. For example, it is easy to react with the corresponding aromatic tetracarboxylic dianhydride in an amount of 2 times or more, preferably 2 to 3 times the amount of alcohol (lower alcohol, preferably an alcohol having 1 to 3 carbon atoms). Can be manufactured. In this method, the acid anhydride ring of the raw material reacts with alcohol to open a ring, resulting in a diester (half ester) having an ester group and a carboxyl group on adjacent carbons on the aromatic ring.
本発明では、3,3’,4,4’−ビフェニルテトラカルボン酸ジエステル以外の芳香族テトラカルボン酸成分(芳香族テトラカルボン酸ジエステル)を50モル%以下の範囲で用いてもよい。3,3’,4,4’−ビフェニルテトラカルボン酸ジエステルと組み合わせて用いることができるテトラカルボン酸ジエステルとしては、特に限定するものではないが、例えば、ピロメリット酸ジエステル、2,3,3’,4’−ビフェニルテトラカルボン酸ジエステル、3,3’,4,4’−ベンゾフェノンテトラカルボン酸ジエステル、オキシジフタル酸ジエステルなどを好適に挙げることができる。用いる芳香族テトラカルボン酸ジエステルは一種である必要はなく、複数種の混合物であっても構わない。 In the present invention, an aromatic tetracarboxylic acid component (aromatic tetracarboxylic acid diester) other than 3,3 ′, 4,4′-biphenyltetracarboxylic acid diester may be used in an amount of 50 mol% or less. The tetracarboxylic acid diester that can be used in combination with 3,3 ′, 4,4′-biphenyltetracarboxylic acid diester is not particularly limited. For example, pyromellitic acid diester, 2,3,3 ′ , 4′-biphenyltetracarboxylic acid diester, 3,3 ′, 4,4′-benzophenone tetracarboxylic acid diester, oxydiphthalic acid diester, and the like can be preferably exemplified. The aromatic tetracarboxylic acid diester to be used need not be one kind, and may be a mixture of plural kinds.
本発明において、芳香族ジアミン成分は、主として、すなわち、その50モル%以上、好ましくは70モル%以上、特に好ましくは90モル%以上がp−フェニレンジアミンと4,4’−ジアミノジフェニルエーテルとからなる。また、芳香族ジアミン成分中のパラフェニレンジアミンの割合が、50モル%以上、特に、50〜85モル%であることが好ましい。パラフェニレンジアミンの割合が多すぎると良好な特性を有するポリイミド膜が得られない場合がある。 In the present invention, the aromatic diamine component is mainly composed of p-phenylenediamine and 4,4′-diaminodiphenyl ether, ie, 50 mol% or more, preferably 70 mol% or more, particularly preferably 90 mol% or more. . Moreover, it is preferable that the ratio of the paraphenylenediamine in an aromatic diamine component is 50 mol% or more, especially 50-85 mol%. If the proportion of paraphenylenediamine is too large, a polyimide film having good characteristics may not be obtained.
本発明では、p−フェニレンジアミンと4,4’−ジアミノジフェニルエーテル以外の芳香族ジアミン成分を用いてもよい。用いることができる芳香族ジアミンとしては、特に限定するものではないが、例えば、4,4’−ジアミノジフェニルメタン、m−フェニレンジアミン、2,4−ジアミノトルエン、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,4−ビス(4−アミノフェノキシ)ベンゼン、2,2−ビス〔4−(4−アミノフェノキシ)フェニル〕プロパン、m−キシリレンジアミン、p−キシリレンジアミン、2,2−ビス〔4−(4−アミノフェノキシ)フェニル〕プロパン、4,4’−メチレンビス(2,6−キシリジン)、α,α’−ビス(4−アミノフェニル)−1,4−ジイソプロピルベンゼンなどを好適に挙げることができる。用いる芳香族ジアミンは一種である必要はなく、複数種の混合物であっても構わない。 In the present invention, an aromatic diamine component other than p-phenylenediamine and 4,4'-diaminodiphenyl ether may be used. The aromatic diamine that can be used is not particularly limited, and examples thereof include 4,4′-diaminodiphenylmethane, m-phenylenediamine, 2,4-diaminotoluene, 1,3-bis (4-aminophenoxy). ) Benzene, 1,4-bis (4-aminophenoxy) benzene, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, m-xylylenediamine, p-xylylenediamine, 2,2- Bis [4- (4-aminophenoxy) phenyl] propane, 4,4′-methylenebis (2,6-xylidine), α, α′-bis (4-aminophenyl) -1,4-diisopropylbenzene and the like are preferable. Can be listed. The aromatic diamine to be used need not be one kind, and may be a mixture of plural kinds.
本発明のポリイミド前駆体溶液組成物は、さらにイミダゾール類を含有する。イミダゾール類としては、特に限定するものではないが、下記化学式(1)の化合物を好適に挙げることができる。
前記化学式(1)のイミダゾール類においては、X1〜X4が、それぞれ独立に、水素原子、又は炭素数が1〜5のアルキル基であって、X1〜X4のうち少なくとも2個が、炭素数が1〜5のアルキル基であるイミダゾール類、すなわち置換基として2個以上のアルキル基を有するイミダゾール類がより好ましい。置換基として2個以上のアルキル基を有するイミダゾール類としては、1,2−ジメチルイミダゾール、2−エチル−4−メチルイミダゾール、4−エチル−2−メチルイミダゾール、及び1−メチル−4−エチルイミダゾールなどが好適である。 In the imidazoles of the chemical formula (1), X 1 to X 4 are each independently a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and at least two of X 1 to X 4 are More preferred are imidazoles that are alkyl groups having 1 to 5 carbon atoms, that is, imidazoles having two or more alkyl groups as substituents. Examples of imidazoles having two or more alkyl groups as a substituent include 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 4-ethyl-2-methylimidazole, and 1-methyl-4-ethylimidazole. Etc. are suitable.
イミダゾール類の使用量は、特に限定するものではないが、芳香族テトラカルボン酸ジエステルと芳香族ジアミンとの合計量に対して1〜50質量%が好ましく、5〜20質量%がより好ましい。 Although the usage-amount of imidazoles is not specifically limited, 1-50 mass% is preferable with respect to the total amount of aromatic tetracarboxylic-acid diester and aromatic diamine, and 5-20 mass% is more preferable.
本発明のポリイミド前駆体溶液組成物は、前記の芳香族テトラカルボン酸ジエステルと芳香族ジアミンとを略等モル量用い、前記のイミダゾール類と共に有機極性溶媒中に均一に溶解することによって調製することができる。これらの成分を溶解させる場合は必要に応じて加熱してもよい。なお、有機極性溶媒中においては、芳香族テトラカルボン酸ジエステルのカルボン酸イオンと芳香族ジアミンのアンモニウムイオンとがイオン対を形成しており、実質的にはモノマーの混合物の状態であると考えられる。 The polyimide precursor solution composition of the present invention is prepared by using the above-mentioned aromatic tetracarboxylic acid diester and aromatic diamine in substantially equimolar amounts and uniformly dissolving in an organic polar solvent together with the above-mentioned imidazoles. Can do. When these components are dissolved, they may be heated as necessary. In the organic polar solvent, the carboxylate ion of the aromatic tetracarboxylic acid diester and the ammonium ion of the aromatic diamine form an ion pair, which is considered to be substantially a mixture of monomers. .
本発明のポリイミド前駆体溶液組成物を用いるポリイミド膜の形成は、基板上にポリイミド前駆体溶液組成物を塗布後、連続的にまたは段階的に昇温してイミド化することにより行う。一般的に、芳香族カルボキシル基と芳香族アミノ基の縮合反応は、強力な脱水触媒の非存在下では進行しないとされる。そのため、本発明のポリイミド前駆体溶液組成物を用いる場合、反応機構的には芳香族テトラカルボン酸ジエステルが加熱により脱アルコールして酸無水物となり、この酸無水物基とアミノ基とが反応してアミック酸基(アミド酸基)を形成した後、脱水閉環してイミド基となる、という三段階の反応を経由していると推定される。 Formation of the polyimide film using the polyimide precursor solution composition of the present invention is performed by applying the polyimide precursor solution composition onto the substrate and then imidizing it by raising the temperature continuously or stepwise. In general, it is said that the condensation reaction of an aromatic carboxyl group and an aromatic amino group does not proceed in the absence of a strong dehydration catalyst. Therefore, when using the polyimide precursor solution composition of the present invention, the aromatic tetracarboxylic acid diester is dealcoholized by heating to become an acid anhydride, and this acid anhydride group reacts with an amino group. It is presumed that the reaction proceeds through a three-step reaction in which an amic acid group (amidic acid group) is formed and then dehydrated and closed to form an imide group.
用いる有機極性溶媒は、芳香族テトラカルボン酸ジエステルと芳香族ジアミンとを溶解することができればよく、さらに、イミド化の途中で生成すると考えられるポリアミック酸を溶解できることが好ましい。特に限定するものではないが、例えば、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N,N−ジエチルアセトアミド、N−メチル−2−ピロリドン、N−エチル−2−ピロリドン、N−ビニル−2−ピロリドン等のアミド系溶媒、γ−ブチロラクトン、γ−バレロラクトン、δ−バレロラクトン、γ−カプロラクトン、ε−カプロラクトン、α−メチル−γ−ブチロラクトン等の環状エステル溶媒、エチレンカーボネート、プロピレンカーボネート等のカーボネート溶媒、ジエチレングリコール、プロピレングリコール、トリエチレングリコール等のグリコール系溶媒、m−クレゾール、p−クレゾール、3−クロロフェノール、4−クロロフェノール等のフェノール系溶媒、アセトフェノン、1,3−ジメチル−2−イミダゾリジノン、スルホラン、ジメチルスルホキシドなどが挙げられる。使用する有機溶剤は、1種類であっても、2種類以上であってもよい。本発明においてはアミド系溶媒を用いることが好ましく、また、必要に応じてグリコール系溶媒と混合して用いることも好ましい。 The organic polar solvent to be used is only required to dissolve the aromatic tetracarboxylic acid diester and the aromatic diamine, and it is preferable that the polyamic acid considered to be generated during imidization can be dissolved. Although not particularly limited, for example, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-vinyl Amide solvents such as 2-pyrrolidone, cyclic ester solvents such as γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone, α-methyl-γ-butyrolactone, ethylene carbonate, propylene carbonate Carbonate solvents such as diethylene glycol, propylene glycol, triethylene glycol, etc., phenol solvents such as m-cresol, p-cresol, 3-chlorophenol, 4-chlorophenol, acetophenone, 1,3-dimethyl- 2-Imi Zorijinon, sulfolane, and dimethyl sulfoxide. The organic solvent to be used may be one type or two or more types. In the present invention, it is preferable to use an amide solvent, and it is also preferable to use a mixture with a glycol solvent if necessary.
本発明のポリイミド前駆体溶液組成物は、芳香族テトラカルボン酸ジエステルと芳香族ジアミンとの合計の濃度であるモノマー濃度が、好ましくは10質量%〜75質量%、より好ましくは20質量%〜50質量%である。また、モノマー濃度が20質量%であるときの、30℃における溶液粘度は、好ましくは0.1Pa・s以下、より好ましくは0.05Pa・s以下、特に好ましくは0.01Pa・s以下であることが取り扱い上好適である。 In the polyimide precursor solution composition of the present invention, the monomer concentration which is the total concentration of the aromatic tetracarboxylic acid diester and the aromatic diamine is preferably 10% by mass to 75% by mass, more preferably 20% by mass to 50%. % By mass. The solution viscosity at 30 ° C. when the monomer concentration is 20% by mass is preferably 0.1 Pa · s or less, more preferably 0.05 Pa · s or less, and particularly preferably 0.01 Pa · s or less. Is preferable in handling.
本発明のポリイミド前駆体溶液組成物は、必要に応じて、さらに、化学イミド化剤(例えば、無水酢酸などの酸無水物や、ピリジン、イソキノリンなどのアミン化合物、イミダゾール化合物)、フィラー(例えば、シリカ、アルミナなどの絶縁性フィラー、カーボン、金属粒子などの導電性フィラー、アルミナ、窒化ホウ素、窒化ケイ素などの高熱伝導性フィラー、チタン酸バリウムなどの誘電体フィラー、)、染料、顔料、シランカップリング剤などを添加することができる。 If necessary, the polyimide precursor solution composition of the present invention may further include a chemical imidizing agent (for example, acid anhydrides such as acetic anhydride, amine compounds such as pyridine and isoquinoline, imidazole compounds), fillers (for example, Insulating fillers such as silica and alumina, conductive fillers such as carbon and metal particles, high thermal conductive fillers such as alumina, boron nitride and silicon nitride, dielectric fillers such as barium titanate)), dyes, pigments, silane cups A ring agent or the like can be added.
本発明においては、基材に前記ポリイミド前駆体溶液組成物を塗布し、加熱することによりポリイミド膜を形成する。基材への塗布は、公知の方法を用いることができるが、インクジェット法が好適である。インクジェット法を用いることにより、特定のパターンを有するポリイミド膜を基板上に形成することができる。 In the present invention, the polyimide precursor solution composition is applied to a substrate and heated to form a polyimide film. A known method can be used for application to the substrate, but an inkjet method is preferred. By using the inkjet method, a polyimide film having a specific pattern can be formed on the substrate.
ポリイミド膜は、ポリイミド前駆体溶液組成物を塗布した基板を加熱処理し、溶媒を除去するとともにイミド化(脱水閉環)することによって得られる。加熱処理条件は、特に限定されないが、概ね100℃以上、好ましくは120℃〜600℃、より好ましくは150℃〜500℃で、更に好ましくは150℃〜400℃で、好ましくは段階的に温度を上げながら、0.01時間〜30時間、好ましくは0.01〜10時間加熱処理することが好ましい。 The polyimide film is obtained by heat-treating a substrate coated with the polyimide precursor solution composition to remove the solvent and imidize (dehydrate ring closure). The heat treatment conditions are not particularly limited, but are generally 100 ° C. or higher, preferably 120 ° C. to 600 ° C., more preferably 150 ° C. to 500 ° C., still more preferably 150 ° C. to 400 ° C., preferably in steps. It is preferable to perform heat treatment for 0.01 to 30 hours, preferably 0.01 to 10 hours while increasing the temperature.
以下、本発明を実施例により更に具体的に説明するが、本発明はこれらの実施例により制限されるものではない。 EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples.
以下の例で用いた特性の測定方法を以下に示す。
<溶液粘度(回転粘度)>
トキメック社製E型粘度計を用いて30℃で測定した。
<被膜の状態観察>
得られた被覆層について目視により状態観察を行った。濁りや割れが見られないもの、折り曲げても容易に割れないものを良好、割れが見られ、折り曲げると容易に割れるものを不良とした。
<熱線膨張係数(CTE)>
長さ15mm/幅4mmにサンプリングしたサンプルを、セイコーインスツルメンツ製SS6100を用い、引張りモード、荷重4gf、昇温速度20℃/分で熱機械分析を行い、50℃から200℃、50℃から350℃のTMAカーブより算出した。
<粘度の経時変化観察>
初期粘度を測定後、25℃で30日保存し再度粘度測定を行った。
A method for measuring the characteristics used in the following examples is shown below.
<Solution viscosity (rotational viscosity)>
It measured at 30 degreeC using the Tokimec E-type viscosity meter.
<Observation of coating state>
The state of the obtained coating layer was visually observed. Those that did not show turbidity and cracking, those that did not easily break even when folded, were good, and those that cracked and easily cracked when folded were considered bad.
<Heat expansion coefficient (CTE)>
Samples sampled to a length of 15 mm and a width of 4 mm were subjected to thermomechanical analysis at a tensile mode, a load of 4 gf, and a heating rate of 20 ° C./min using a Seiko Instruments SS6100. It was calculated from the TMA curve.
<Observation of change in viscosity over time>
After measuring the initial viscosity, it was stored at 25 ° C. for 30 days, and the viscosity was measured again.
以下の例で使用した化合物の略号について説明する。
s−BPDA:3,3’,4,4’−ビフェニルテトラカルボン酸二無水物
ODA:4,4’−ジアミノジフェニルエーテル
PPD:p−フェニレンジアミン
NMP:N−メチル−2−ピロリドン
PGL:プロピレングリコール
EtOH:エタノール
1,2−DMZ:1,2−ジメチルイミダゾ−ル
The abbreviations of the compounds used in the following examples are described.
s-BPDA: 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride ODA: 4,4′-diaminodiphenyl ether PPD: p-phenylenediamine NMP: N-methyl-2-pyrrolidone PGL: propylene glycol EtOH : Ethanol 1,2-DMZ: 1,2-dimethylimidazole
〔実施例1〕
攪拌機、窒素ガス導入・排出管を備えた内容積500mLのガラス製の反応容器に、溶媒としてNMP213gを加え、これにs−BPDA147.11g(0.50モル)、エタノール55.28g(1.2モル)を加え、80℃で10時間攪拌し、溶解させた。この溶液にODA40.05g(0.20モル)、PPD32.44g(0.30モル)を加え、50℃で3時間撹拌し溶解させた。この溶液に1,2−DMZ48.8g(溶液の10wt%分)を加え、モノマー濃度40.9質量%、溶液粘度1.1Pa・sのポリイミド前駆体組成物を得た。
このポリイミド前駆体組成物を、基材のガラス板上に塗布し、120℃にて30分間、150℃にて10分間、200℃にて10分間、250℃にて10分間、400℃にて10分間加熱処理を行い、厚み20μmのポリイミド被膜を得た。得られたポリイミド被膜について、被膜の状態観察と熱膨張係数(CTE)を測定した。評価結果を表1に示した。
[Example 1]
To a 500 mL glass reaction vessel equipped with a stirrer and a nitrogen gas introduction / discharge tube, 213 g of NMP was added as a solvent, and 147.11 g (0.50 mol) of s-BPDA and 55.28 g (1.2 mol) of ethanol were added thereto. Mol) and stirred at 80 ° C. for 10 hours to dissolve. To this solution, 40.05 g (0.20 mol) of ODA and 32.44 g (0.30 mol) of PPD were added and stirred at 50 ° C. for 3 hours to dissolve. To this solution, 48.8 g of 1,2-DMZ (10 wt% of the solution) was added to obtain a polyimide precursor composition having a monomer concentration of 40.9 mass% and a solution viscosity of 1.1 Pa · s.
This polyimide precursor composition was applied on a glass plate of a base material, and the temperature was 120 ° C. for 30 minutes, 150 ° C. for 10 minutes, 200 ° C. for 10 minutes, 250 ° C. for 10 minutes, and 400 ° C. A heat treatment was performed for 10 minutes to obtain a polyimide film having a thickness of 20 μm. About the obtained polyimide film, the state observation and thermal expansion coefficient (CTE) of the film were measured. The evaluation results are shown in Table 1.
〔実施例2〕
攪拌機、窒素ガス導入・排出管を備えた内容積500mLのガラス製の反応容器に、溶媒としてNMP82g、PGL82gを加え、これにs−BPDA147.11g(0.50モル)、エタノール55.28g(1.2モル)を加え、80℃で10時間攪拌し、溶解させた。この溶液にODA40.05g(0.20モル)、PPD32.44g(0.30モル)を加え、50℃で3時間撹拌し溶解させた。この溶液に1,2−DMZ43.9g(溶液の10wt%分)を加え、モノマー濃度45.5質量%、溶液粘度2.1Pa・sのポリイミド前駆体組成物を得た。
このポリイミド前駆体組成物を、基材のガラス板上に塗布し、120℃にて30分間、150℃にて10分間、200℃にて10分間、250℃にて10分間、400℃にて10分間加熱処理を行い、厚み20μmのポリイミド被膜を得た。得られたポリイミド被膜について、被膜の状態観察と熱膨張係数を測定した。評価結果を表1に示した。
[Example 2]
To a 500 mL glass reaction vessel equipped with a stirrer and a nitrogen gas introduction / discharge tube, 82 g of NMP and 82 g of PGL were added as solvents, and 147.11 g (0.50 mol) of s-BPDA and 55.28 g of ethanol (1 mol) .2 mol) was added and stirred at 80 ° C. for 10 hours to dissolve. To this solution, 40.05 g (0.20 mol) of ODA and 32.44 g (0.30 mol) of PPD were added and stirred at 50 ° C. for 3 hours to dissolve. To this solution, 43.9 g of 1,2-DMZ (10 wt% of the solution) was added to obtain a polyimide precursor composition having a monomer concentration of 45.5% by mass and a solution viscosity of 2.1 Pa · s.
This polyimide precursor composition was applied on a glass plate of a base material, and the temperature was 120 ° C. for 30 minutes, 150 ° C. for 10 minutes, 200 ° C. for 10 minutes, 250 ° C. for 10 minutes, and 400 ° C. A heat treatment was performed for 10 minutes to obtain a polyimide film having a thickness of 20 μm. With respect to the obtained polyimide coating, the state observation of the coating and the thermal expansion coefficient were measured. The evaluation results are shown in Table 1.
〔実施例3〕
攪拌機、窒素ガス導入・排出管を備えた内容積500mLのガラス製の反応容器に、溶媒としてNMP80g、PGL80gを加え、これにs−BPDA147.11g(0.50モル)、エタノール55.28g(1.2モル)を加え、80℃で10時間攪拌し、溶解させた。この溶液にODA30.04g(0.15モル)、PPD37.85g(0.35モル)を加え、50℃で3時間撹拌し溶解させた。この溶液に1,2−DMZ43.0g(溶液の10wt%分)を加え、モノマー濃度45.5質量%、溶液粘度3.0Pa・sのポリイミド前駆体組成物を得た。
このポリイミド前駆体組成物を、基材のガラス板上に塗布し、120℃にて30分間、150℃にて10分間、200℃にて10分間、250℃にて10分間、400℃にて10分間加熱処理を行い、厚み20μmのポリイミド被膜を得た。得られたポリイミド被膜について、被膜の状態観察と熱膨張係数を測定した。評価結果を表1に示した。
Example 3
NMP80g and PGL80g are added as a solvent to a glass reaction vessel having an internal volume of 500 mL equipped with a stirrer and a nitrogen gas introduction / discharge tube, and s-BPDA 147.11 g (0.50 mol), ethanol 55.28 g (1 .2 mol) was added and stirred at 80 ° C. for 10 hours to dissolve. To this solution, 30.04 g (0.15 mol) of ODA and 37.85 g (0.35 mol) of PPD were added and dissolved by stirring at 50 ° C. for 3 hours. To this solution, 43.0 g of 1,2-DMZ (for 10 wt% of the solution) was added to obtain a polyimide precursor composition having a monomer concentration of 45.5% by mass and a solution viscosity of 3.0 Pa · s.
This polyimide precursor composition was applied on a glass plate of a base material, and the temperature was 120 ° C. for 30 minutes, 150 ° C. for 10 minutes, 200 ° C. for 10 minutes, 250 ° C. for 10 minutes, and 400 ° C. A heat treatment was performed for 10 minutes to obtain a polyimide film having a thickness of 20 μm. With respect to the obtained polyimide coating, the state observation of the coating and the thermal expansion coefficient were measured. The evaluation results are shown in Table 1.
〔比較例1〕
攪拌機、窒素ガス導入・排出管を備えた内容積500mLのガラス製の反応容器に、溶媒としてNMP192gを加え、これにs−BPDA132.40g(0.45モル)、エタノール49.76g(1.08モル)を加え、80℃で10時間攪拌し、溶解させた。この溶液にODA36.04g(0.18モル)、PPD29.20g(0.27モル)を加え、50℃で3時間撹拌し溶解させ、モノマー濃度45.0質量%、溶液粘度1.7Pa・sのポリイミド前駆体組成物を得た。
このポリイミド前駆体組成物を、基材のガラス板上に塗布し、120℃にて30分間、150℃にて10分間、200℃にて10分間、250℃にて10分間、400℃にて10分間加熱処理を行い、厚み20μmのポリイミド被膜を得た。得られたポリイミド被膜について、被膜の状態観察を行った。評価結果を表1に示した。
[Comparative Example 1]
192 g of NMP was added as a solvent to a glass reaction vessel having an internal volume of 500 mL equipped with a stirrer and a nitrogen gas introduction / discharge tube, and s-BPDA 132.40 g (0.45 mol), ethanol 49.76 g (1.08) were added thereto. Mol) and stirred at 80 ° C. for 10 hours to dissolve. To this solution, 36.04 g (0.18 mol) of ODA and 29.20 g (0.27 mol) of PPD were added, and the mixture was stirred and dissolved at 50 ° C. for 3 hours. The monomer concentration was 45.0 mass% and the solution viscosity was 1.7 Pa · s. The polyimide precursor composition was obtained.
This polyimide precursor composition was applied on a glass plate of a base material, and the temperature was 120 ° C. for 30 minutes, 150 ° C. for 10 minutes, 200 ° C. for 10 minutes, 250 ° C. for 10 minutes, and 400 ° C. A heat treatment was performed for 10 minutes to obtain a polyimide film having a thickness of 20 μm. About the obtained polyimide film, the state of the film was observed. The evaluation results are shown in Table 1.
〔参考例1〕
攪拌機、窒素ガス導入・排出管を備えた内容積500mLのガラス製の反応容器に、溶媒としてNMP198gを加え、これにs−BPDA117.70g(0.40モル)、エタノール44.23g(0.96モル)を加え、80℃で10時間攪拌し、溶解させた。この溶液にODA48.06g(0.24モル)、PPD17.30g(0.16モル)を加え、50℃で3時間撹拌し溶解させ、モノマー濃度43.0質量%、溶液粘度0.7Pa・sのポリイミド前駆体組成物を得た。
このポリイミド前駆体組成物を、基材のガラス板上に塗布し、120℃にて30分間、150℃にて10分間、200℃にて10分間、250℃にて10分間、400℃にて10分間加熱処理を行い、厚み20μmのポリイミド被膜を得た。得られたポリイミド被膜について、被膜の状態観察と熱膨張係数を測定した。評価結果を表1に示した。
[Reference Example 1]
To a 500 mL glass reaction vessel equipped with a stirrer and a nitrogen gas introduction / discharge tube, 198 g of NMP was added as a solvent, and 117.70 g (0.40 mol) of s-BPDA and 44.23 g (0.96) of ethanol were added thereto. Mol) and stirred at 80 ° C. for 10 hours to dissolve. To this solution, 48.06 g (0.24 mol) of ODA and 17.30 g (0.16 mol) of PPD were added, and the mixture was stirred and dissolved at 50 ° C. for 3 hours. The monomer concentration was 43.0% by mass, and the solution viscosity was 0.7 Pa · s. The polyimide precursor composition was obtained.
This polyimide precursor composition was applied on a glass plate of a base material, and the temperature was 120 ° C. for 30 minutes, 150 ° C. for 10 minutes, 200 ° C. for 10 minutes, 250 ° C. for 10 minutes, and 400 ° C. A heat treatment was performed for 10 minutes to obtain a polyimide film having a thickness of 20 μm. With respect to the obtained polyimide coating, the state observation of the coating and the thermal expansion coefficient were measured. The evaluation results are shown in Table 1.
〔参考例2〕
攪拌機、窒素ガス導入・排出管を備えた内容積500mLのガラス製の反応容器に、溶媒としてNMP198gを加え、これにs−BPDA117.70g(0.40モル)、エタノール44.23g(0.96モル)を加え、80℃で10時間攪拌し、溶解させた。この溶液にODA48.06g(0.24モル)、PPD17.30g(0.16モル)を加え、50℃で3時間撹拌し溶解させた。この溶液に1,2−DMZ42.6g(溶液の10wt%分)を加え、モノマー濃度39.1質量%、溶液粘度0.6Pa・sのポリイミド前駆体組成物を得た。
このポリイミド前駆体組成物を、基材のガラス板上に塗布し、120℃にて30分間、150℃にて10分間、200℃にて10分間、250℃にて10分間、400℃にて10分間加熱処理を行い、厚み20μmのポリイミド被膜を得た。得られたポリイミド被膜について、被膜の状態観察と熱膨張係数を測定した。評価結果を表1に示した。
[Reference Example 2]
To a 500 mL glass reaction vessel equipped with a stirrer and a nitrogen gas introduction / discharge tube, 198 g of NMP was added as a solvent, and 117.70 g (0.40 mol) of s-BPDA and 44.23 g (0.96) of ethanol were added thereto. Mol) and stirred at 80 ° C. for 10 hours to dissolve. ODA48.06g (0.24mol) and PPD17.30g (0.16mol) were added to this solution, and it stirred for 3 hours and was made to melt | dissolve at 50 degreeC. To this solution, 42.6 g of 1,2-DMZ (10 wt% of the solution) was added to obtain a polyimide precursor composition having a monomer concentration of 39.1% by mass and a solution viscosity of 0.6 Pa · s.
This polyimide precursor composition was applied on a glass plate of a base material, and the temperature was 120 ° C. for 30 minutes, 150 ° C. for 10 minutes, 200 ° C. for 10 minutes, 250 ° C. for 10 minutes, and 400 ° C. A heat treatment was performed for 10 minutes to obtain a polyimide film having a thickness of 20 μm. With respect to the obtained polyimide coating, the state observation of the coating and the thermal expansion coefficient were measured. The evaluation results are shown in Table 1.
Claims (4)
前記芳香族テトラカルボン酸成分は、50モル%以上が3,3’,4,4’−ビフェニルテトラカルボン酸ジエステルからなり、
前記芳香族ジアミン成分は、p−フェニレンジアミンと4,4’−ジアミノジフェニルエーテルとを含み、芳香族ジアミン成分中のパラフェニレンジアミンの割合が50モル%以上であり、
イミダゾール類を含むことを特徴とする、ポリイミド前駆体溶液組成物。 A polyimide precursor solution composition comprising an aromatic tetracarboxylic acid component comprising an aromatic tetracarboxylic acid diester and an aromatic diamine component,
The aromatic tetracarboxylic acid component is composed of 3,3 ′, 4,4′-biphenyltetracarboxylic acid diester in an amount of 50 mol% or more,
The aromatic diamine component contains p-phenylenediamine and 4,4′-diaminodiphenyl ether, and the proportion of paraphenylenediamine in the aromatic diamine component is 50 mol% or more,
A polyimide precursor solution composition comprising imidazoles.
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JPH10182820A (en) * | 1996-10-29 | 1998-07-07 | Ube Ind Ltd | Polyimide precursor composition and polyimide film |
JP2002128893A (en) * | 2000-10-31 | 2002-05-09 | Ube Ind Ltd | Method for producing polyimide powder, polyimide powder, molded product of polyimide powder and method for producing the same |
WO2011021639A1 (en) * | 2009-08-20 | 2011-02-24 | 宇部興産株式会社 | Polyimide film and process for producing polyimide film |
JP2011046852A (en) * | 2009-08-28 | 2011-03-10 | Ube Industries Ltd | Polyimide precursor solution composition containing fine carbon fiber and polyimide film using the same |
WO2012008543A1 (en) * | 2010-07-14 | 2012-01-19 | 宇部興産株式会社 | Aqueous polyimide precursor solution composition and method for producing aqueous polyimide precursor solution composition |
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JPH10182820A (en) * | 1996-10-29 | 1998-07-07 | Ube Ind Ltd | Polyimide precursor composition and polyimide film |
JP2002128893A (en) * | 2000-10-31 | 2002-05-09 | Ube Ind Ltd | Method for producing polyimide powder, polyimide powder, molded product of polyimide powder and method for producing the same |
WO2011021639A1 (en) * | 2009-08-20 | 2011-02-24 | 宇部興産株式会社 | Polyimide film and process for producing polyimide film |
JP2011046852A (en) * | 2009-08-28 | 2011-03-10 | Ube Industries Ltd | Polyimide precursor solution composition containing fine carbon fiber and polyimide film using the same |
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