JP2016077832A - Cleaning tool - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning tool which can be easily used by everyone regardless of a place, because cleaning using a mop has become popular according to influence of westernization of a life style, but someone cannot use a mop easily due to a place to be cleaned, height of a person who cleans, and force of the person who cleans.SOLUTION: A cleaning tool has a simple structure enabling easy cleaning comprising: a cleaning base 10 including resistance bands 11, 12, 13 and a dust cloth engagement part 18 from which a dust cloth hardly comes off, or deviates; and means for detaching and attaching a handle.SELECTED DRAWING: Figure 1

Description

The present invention relates to a cleaning tool.

A cleaning tool with a handle (mop) that can be cleaned while standing with a conventional cleaning cloth attached is a means to fix the cleaning cloth, which is sandwiched by the spring pressure that is constructed before and after the cleaning base. There is one that inserts a rag and fixes the rag with a spring pressure.

Problems to be solved by the invention

However, this technique has a problem in that it requires gripping force to attach and detach the rag and is difficult to attach and detach.

In addition, when using two front and back surfaces of the wiper, it is necessary to remove the wiper sandwiched between the springs and turn over the front and back of the wiper.

In addition, since the handle is attached to the handle, the handle gets in the way and there is a problem that is not suitable for cleaning a narrow shelf.

Accordingly, the present invention provides a cleaning tool that can be used in a posture in which a cloth is easily attached and detached without using a means of spring pressure and can be easily attached and detached, even in a posture in which the handle is attached to the cleaning base or in a posture in which the handle is detached and bent. The purpose is to provide.

Means for solving the problem

In the present invention, a resistance band is provided on the upper surface and the lower surface of the cleaning base, and means for engaging a duster with a part of the resistance band is provided. When a load is applied to the cleaning base, the dust cloth is fixed between the resistance band and the cleaning surface. Furthermore, by providing a means for engaging the cloth, the cloth is fixed, and the cloth can be stably cleaned without being removed or displaced.

The cleaning base is covered with a bag-like cloth, and a handle engaging portion that can be rotated halfway is provided so that the two sides of the bag-like cloth can be used.

The cleaning base is provided with a rag engagement space composed of a resistance band, and in the case of a towel-like single rag, by inserting the rag into the rag engagement space, the cleaning cloth can be prevented from shifting and the cleaning movement is stable. To do.

The cleaning of narrow shelves, etc. has a structure that can easily be removed because the handle gets in the way. If you put your palm over the cleaning cloth so that you can clean the cleaning base after removing the handle, your fingertip will enter the recess of the resistance band, and the cloth will not be affected by the size of your hand. Easy cleaning with little applied force.

The size of the concave portion of the resistance band formed between the resistance band is preferably about 15 mm or more so that an adult fingertip can enter.

The rag engagement space is composed of a rag engagement portion having folding means (referring to 18a, 18b, 18c, etc.), and when the folding means is expanded, the size is about 5 cm wide, 3 cm wide and 3 cm deep or more. Is preferred.

The upper and lower resistance bands are preferably symmetrical with respect to the upper and lower surfaces.

It is preferable that the upper and lower surfaces of the cleaning base are penetrated so that dirt does not adhere to the cleaning base and that dirt can be easily removed when the cleaning base is washed. If it is larger, the upper and lower surfaces of the cleaning base may be partitioned.

The resistance band is preferably 3 mm or less in width of the contact surface with the rag.

The shape of the resistance band is preferably configured so that the dust width does not shift with respect to the cleaning movement, for example, a vertical and horizontal right angle.

The length of the handle is preferably stretchable.

The handle engaging portion is preferably a plug-in type engaging portion.

The thickness of the rag is preferably 3 mm or more.

The length dimension of the handle engaging portion is preferably a length that does not protrude from the cleaning base.

Effect of the invention

By providing a resistance band on the cleaning base, even if there is no fixing means such as a spring pressure, the dust cloth is less likely to be displaced and less likely to be displaced with respect to the back-and-forth and back-and-forth reciprocating motion during cleaning.

Since no fixing means by spring pressure or the like is required, the number of constituent members is small, and the production cost can be suppressed. In addition, the wearability of the rag is good and anyone can use it easily.

When the handle is used in combination with a bag-like cloth, by providing a means for rotating the handle halfway, the front and back surfaces of the cloth can be used without removing the cloth.

By removing the handle from the cleaning base, it becomes easier to work on narrow shelves or bent and cleaned parts.

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a plan view of a cleaning base 10 according to the present invention. A resistance band 11 of an outer frame, a resistance band 12 in a horizontal direction, a resistance band 13 in a vertical direction, a cleaning base shaft 14, and a dust band that can fix a dust band. It is composed of a joint portion 18 and a handle engaging portion 15.

The resistance band 11 has an effect of suppressing the surrounding area of the cloth and prevents the cloth from sagging, the resistance band 12 acts so that the cloth does not move in the front-rear direction, and the resistance band 13 prevents the cloth from moving in the left-right direction. Act on. The cleaning base shaft 14 needs to be a shaft having strength so that a load is applied to the entire surface of the cleaning base.

The wiper engagement space 19 has an upper surface and a lower surface penetrated, and a portion of the wiper can be inserted. The duster engagement portion 18 is sandwiched and fixed.

FIG. 2 is a front view of the cleaning base FIG. The handle engaging portion 15 is fixed by the handle attaching shaft 16 and has a structure that can be rotated halfway.

FIG. 3 shows a handle 20 dedicated to the cleaning base. The handle 20 can expand and contract and is connected to the handle engaging portion 15 of the cleaning base. For the connection, the engaging portion protrusion 22 and the engaging portion recess 17 are fitted. The engaging portion 23 is made of a synthetic resin, and examples thereof include a screw type and a plug type. The embodiment is a plug-in type, and the engaging portion protrusion 22 and the engaging portion recess 17 are fitted and both are connected. Since the handle engaging portion 15 has a structure in which the handle attaching shaft 16 is penetrated and can be rotated halfway, the cleaning base 10 can be used with the upper surface and the lower surface reversed.

The cleaning base 20 is formed of ABS resin or the like, and the handle 20 is made of, for example, an aluminum alloy and includes a gripping portion 21 and an engaging portion 23.

FIG. 4 is a simplified diagram when the bag-shaped cloth 30 and the cleaning base 10 are used in combination. By installing the cleaning base 10 in the bag of the dust cloth, the dust cloth does not shift with respect to the movement of the front, rear, left and right during cleaning, and smooth cleaning can be performed. In addition, by reversing the upper and lower surfaces of the cleaning base, it is possible to use the front and back surfaces of the dust cloth.

FIG. 5 is a simplified view when a towel-like cloth 40 is used, and FIG. 6 shows a side view thereof. The mounting method will be described with reference to FIG. 6. A towel is laid on the floor, and the cleaning base 10 is placed so that the towel is almost evenly wound on the cleaning base 10. When the tip of the towel on the upper surface of the cleaning base is put into the dust cloth engaging space 19, the towel is sandwiched between the dust cloth engaging portions 18, and the misalignment of the dust cloth can be prevented.

Result of resistance band effect experiment
Weight of cleaning base (g) 120
The size of the cleaning base (mm) ... 190 width 170 width
Size of the dust cloth (mm) .. Dry cloth 300 * 300 Wet cloth 280 (w) * 250 (d)
Wet rag weight (g) ... 300 (100 when dry)
Floor material ・ ・ Polyvinyl chloride cleaning base ・ ・ Polyethylene ◆ Measuring method: Spread a dust cloth on the floor of the flooring, place the cleaning base on it, place a heavy object on the center of the cleaning base, and spring at the tip of the handle Attach a scale and measure the pulling force of the rag at this time and the pulling force that the cleaning base slides with and without a resistance band.
See Fig. 7 for the experimental system.

Description of Table 1 In the case of the dry cloth, the dry cloth can be moved by applying a load of 100 g to the cleaning base due to the presence of the resistance band. Therefore, cleaning is possible. However, with a cleaning base composed of a flat surface without a resistance band, even if a load of 6 kg is applied to the cleaning base, the cleaning base slips from the dust cloth and cannot be cleaned.

Description of Table 2 In the case of a wet cloth, the cloth cannot be moved without a resistance band, but if there is a resistance band, the cloth should be moved by applying a load of 2.5 kg or more to the cleaning base. Can be cleaned.

The top view of the cleaning base which concerns on this invention Front view of FIG. Simplified illustration of handle and handle engaging part Simplified diagram when using bag-shaped cloth Simplified diagram when using a towel cloth Simplified side view when using a towel cloth Resistance band effect experiment diagram Cleaning base diagram used for resistance band effect experiment

DESCRIPTION OF SYMBOLS 10 Cleaning base 11 Resistance band frame 12 Lateral resistance band 13 Vertical resistance band 14 Cleaning base axis | shaft 15 Handle | engagement part 16 Handle | attachment axis | shaft 17 Engagement part recessed part 18 Cloth engagement part 18a Bending means 1
18b Bending means 2
18c Bending means 3
19 Cloth engagement space 20 Handle 21 Handle grip 22 Engagement projection 23 Engagement portion 30 Bag-like dust 40 Towel-like dust

Claims (4)

A cleaning mop using a spring pressure means for holding a dust cloth on a cleaning base, and having a resistance band means for holding the dust cloth without using a spring pressure means. A cleaning tool which can be provided with a recess or a hole penetrating the upper and lower surfaces on the upper and lower surfaces of the cleaning base according to claim 1 and can insert one end of a cloth. The cleaning tool according to claim 1, wherein the cleaning tool comprises a cloth engaging portion for fixing the cloth using a part of the resistance band. A cleaning tool characterized by being used in combination with the cleaning base according to claim 1 and a bag-like dust cloth.