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JP2016071951A - Crimp terminal - Google Patents

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JP2016071951A
JP2016071951A JP2014197003A JP2014197003A JP2016071951A JP 2016071951 A JP2016071951 A JP 2016071951A JP 2014197003 A JP2014197003 A JP 2014197003A JP 2014197003 A JP2014197003 A JP 2014197003A JP 2016071951 A JP2016071951 A JP 2016071951A
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crimp terminal
thin film
electric wire
conductor
crimped
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義貴 伊藤
Yoshitaka Ito
義貴 伊藤
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Yazaki Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a crimping terminal capable of maintaining high reliability.SOLUTION: In a crimping terminal 20 provided, on the front end side thereof, with an electric connection 22 to be fitted and connected with a mating terminal and provided, on the rear end side thereof, with a conductor crimp part 23 which is crimped to the conductor of an Al wire 100 when it is bent inward and caulked, a FTO thin film 33 doped with an element contributive to conductivity expression is provided in a region of the conductor crimp part 23 in contact with the Al wire 100.SELECTED DRAWING: Figure 2

Description

本発明は、アルミ電線などの電線を圧着する圧着端子に関する。   The present invention relates to a crimp terminal for crimping an electric wire such as an aluminum electric wire.

従来、圧着端子は、端子部の後方に導体加締め部が設けられており、剥き出し加工された電線の端部が導体加締め部に加締められることにより、圧着端子と電線との電気的接続が図られる。   Conventionally, crimp terminals are provided with a conductor crimping part behind the terminal part, and the end of the exposed wire is crimped to the conductor crimping part, so that the electrical connection between the crimping terminal and the cable is achieved. Is planned.

近年、車両の軽量化に対する要求により、車両に配索される電線についても軽量化が要求されている。そこで、電線の素材として従来のCuまたはCu合金に代えて、より軽いAl(アルミニウム)またはAl合金が用いられたAl電線の使用が増えてきている。   In recent years, due to demands for reducing the weight of vehicles, there has been a demand for reducing the weight of electric wires routed in vehicles. Therefore, the use of Al electric wires in which lighter Al (aluminum) or Al alloys are used instead of conventional Cu or Cu alloys as the material of electric wires is increasing.

一方、電線を圧着する圧着端子は、基材としてCu合金を用い、表面にSnめっき層が形成されている。例えば、下記特許文献1には、銅や銅合金を基材とする圧着端子において、母材の金属より硬度が低いSnめっき層を形成し、アルミニウム電線を圧着することが開示されている。   On the other hand, a crimp terminal for crimping an electric wire uses a Cu alloy as a base material, and an Sn plating layer is formed on the surface. For example, Patent Document 1 below discloses that, in a crimp terminal using copper or a copper alloy as a base material, an Sn plating layer having a hardness lower than that of a base metal is formed and an aluminum electric wire is crimped.

特開2009−152052号公報JP 2009-152052 A

しかしながら、上記のような先行技術では、通常の使用状態において、Al電線の表面にはAl酸化膜が形成されるとともに、圧着端子の表面にはSn酸化膜が形成されるが、Al酸化膜およびSn酸化膜は、いずれも体積抵抗率が高い。さらに、Al酸化膜は、比較的厚みが大きくなり、かつ、比較的高い硬度を有している。   However, in the prior art as described above, in a normal use state, an Al oxide film is formed on the surface of the Al electric wire and an Sn oxide film is formed on the surface of the crimp terminal. Each Sn oxide film has a high volume resistivity. Furthermore, the Al oxide film has a relatively large thickness and a relatively high hardness.

そのため、圧着端子にAl電線を配置して加締めた際に、Sn酸化膜がAl酸化膜を十分に破壊することができず、圧着端子の表面と接触すべきAlの新生面が不足し、結果として良好な導通が得られないことがあるという問題があった。   Therefore, when an Al electric wire is placed and crimped on the crimp terminal, the Sn oxide film cannot sufficiently destroy the Al oxide film, and there is a shortage of the new surface of Al to be in contact with the surface of the crimp terminal. As a result, there is a problem that good conduction may not be obtained.

したがって本発明の目的は、電線の材質にかかわらず導通に対する高信頼性を得ることができる圧着端子を提供することにある。   Accordingly, an object of the present invention is to provide a crimp terminal capable of obtaining high reliability for conduction regardless of the material of the electric wire.

上記課題を解決するために、本発明に係る圧着端子は、下記(1)〜(3)を特徴としている。   In order to solve the above problems, a crimp terminal according to the present invention is characterized by the following (1) to (3).

(1) 前端側に相手端子と嵌合接続するための電気接続部が設けられると共に、後端側に、内側に曲げられて加締められることにより電線の導体に圧着される導体圧着部が設けられた圧着端子において、
前記導体圧着部の前記電線と接触する領域に、導電性発現に寄与する元素をドープした酸化物薄膜が設けられたことを特徴とする圧着端子。
(2) 前記導電性発現に寄与する元素が、F、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種であることを特徴とする上記(1)に記載の圧着端子。
(3) 前記導電性発現に寄与する元素が、少なくともFを含むことを特徴とする上記(2)に記載の圧着端子。
(1) An electrical connection part for fitting and connecting with a mating terminal is provided on the front end side, and a conductor crimping part that is crimped to the conductor of the wire by being bent inward and crimped on the rear end side. In the crimp terminal,
A crimp terminal, wherein an oxide thin film doped with an element contributing to conductivity is provided in a region of the conductor crimping portion that is in contact with the electric wire.
(2) The element contributing to the development of conductivity is at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi, as described in (1) above Crimp terminal.
(3) The crimp terminal according to (2) above, wherein the element contributing to the development of conductivity includes at least F.

本発明の圧着端子は、電線を加締めた際に、圧着端子の表面に形成されている導電性酸化膜を用いて電線の表面に形成される酸化膜を破壊し電線を構成する基材の新生面を生じさせることができる。したがって、圧着端子と電線との導通に対する高信頼性を得ることができる。   The crimp terminal according to the present invention is a base material that forms an electric wire by destroying an oxide film formed on the surface of the electric wire using a conductive oxide film formed on the surface of the crimp terminal when the electric wire is caulked. A new surface can be created. Therefore, high reliability with respect to conduction between the crimp terminal and the electric wire can be obtained.

図1は本発明の実施形態に係る酸化物薄膜を説明するための断面図である。FIG. 1 is a cross-sectional view for explaining an oxide thin film according to an embodiment of the present invention. 図2は本発明の実施形態に係る圧着端子の斜視図である。FIG. 2 is a perspective view of the crimp terminal according to the embodiment of the present invention. 図3は本発明の実施形態に係る圧着端子の導体圧着部側面断面図である。FIG. 3 is a side sectional view of the conductor crimping portion of the crimp terminal according to the embodiment of the present invention. 図4は本発明の実施形態に係る圧着端子の導体圧着部正面断面図である。FIG. 4 is a front sectional view of a conductor crimping portion of the crimp terminal according to the embodiment of the present invention. 図5は本発明の実施形態に係る圧着端子の導体圧着部上面図である。FIG. 5 is a top view of the conductor crimping portion of the crimp terminal according to the embodiment of the present invention. 図6は本発明の実施形態に係る圧着端子と電線との導通を説明するための図である。FIG. 6 is a view for explaining conduction between the crimp terminal and the electric wire according to the embodiment of the present invention.

以下、本発明をさらに詳細に説明する。
図1は、本発明の実施形態に係る酸化物薄膜を説明するための断面図である。図1に示す電気素子1は、基材12上に、元素をドープした酸化物薄膜16を設けてなる。
Hereinafter, the present invention will be described in more detail.
FIG. 1 is a cross-sectional view for explaining an oxide thin film according to an embodiment of the present invention. The electric element 1 shown in FIG. 1 is formed by providing an oxide thin film 16 doped with an element on a base 12.

基材12の材質としては、用途に応じて適宜選択することができるが、圧着端子としては、一般的にCuや黄銅等のCu合金を用いることができる。これとは別に、Al、Feまたはこれらの合金を用いることもできる。基材12の厚さは用途に応じて適宜決定することができ、また基材12の形状は矩形型、円柱型、その他の異形型であることができる。   The material of the substrate 12 can be appropriately selected according to the application, but as a crimp terminal, generally, a Cu alloy such as Cu or brass can be used. Apart from this, Al, Fe or alloys thereof can also be used. The thickness of the base material 12 can be appropriately determined according to the application, and the shape of the base material 12 can be a rectangular shape, a cylindrical shape, or other irregular shapes.

酸化物薄膜16の材質としては、用途に応じて適宜選択することができる。酸化物としては、SnO、SnO、NiO、Ni、ZnO、CuO、CuAlO、In、またはこれらの混合物等が挙げられる。中でも本発明の効果が向上するという観点から、酸化物は、SnOおよび/またはSnOであるのが好ましい。 As a material of the oxide thin film 16, it can select suitably according to a use. Examples of the oxide include SnO, SnO 2 , NiO, Ni 2 O 3 , ZnO, CuO 2 , CuAlO 2 , In 2 O 3 , or a mixture thereof. From the viewpoint of inter alia improving the effect of the present invention, the oxide is preferably a SnO and / or SnO 2.

また、酸化物薄膜16にドープされる元素としては、導電性発現に寄与する元素が好ましく、例えばF、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種が挙げられる。中でも導電性、耐摩耗性に優れるという観点から、Fが好ましく、酸化物薄膜16は、フッ素ドープ酸化錫(FTO)であるのがとくに好ましい。   The element doped in the oxide thin film 16 is preferably an element that contributes to the development of conductivity. For example, at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi can be given. It is done. Among these, F is preferable from the viewpoint of excellent conductivity and wear resistance, and the oxide thin film 16 is particularly preferably fluorine-doped tin oxide (FTO).

また、基材12および酸化物薄膜16の厚さやサイズとしては、用途に応じて適宜選択することができるが、酸化物薄膜16の厚さとしては、例えば10nm〜1μmが好適である。   In addition, the thickness and size of the base material 12 and the oxide thin film 16 can be appropriately selected according to the application, but the thickness of the oxide thin film 16 is preferably, for example, 10 nm to 1 μm.

基材12上には、必要に応じて、基材12に含まれる例えばCuまたはCu合金が酸化物薄膜16上に拡散するのを防止するために、Niめっき層を設けてもよい。Niめっき層は、Niのほか、Fe−Ni合金やSn−Ni合金等のNi合金を使用することができる。Niめっき層の厚さは、当該目的を達成できればよく、適宜決定される。   An Ni plating layer may be provided on the base material 12 in order to prevent, for example, Cu or Cu alloy contained in the base material 12 from diffusing on the oxide thin film 16 as necessary. For the Ni plating layer, Ni alloy such as Fe—Ni alloy or Sn—Ni alloy can be used in addition to Ni. The thickness of the Ni plating layer is determined as appropriate as long as the object can be achieved.

以下、本発明に係る圧着端子20について説明する。
図2は、圧着端子20の斜視図である。図3は、圧着端子20の導体圧着部側面断面図である。図4は、圧着端子20の導体圧着部正面断面図である。図5は、圧着端子20の導体圧着部上面図である。
Hereinafter, the crimp terminal 20 according to the present invention will be described.
FIG. 2 is a perspective view of the crimp terminal 20. FIG. 3 is a side sectional view of the conductor crimping portion of the crimp terminal 20. FIG. 4 is a front sectional view of the conductor crimping portion of the crimp terminal 20. FIG. 5 is a top view of the conductor crimping portion of the crimp terminal 20.

圧着端子20は、主に底板部21と、相手側端子が挿入される電気接続部22と、Al電線100の導体露出部100aに加締められる導体圧着部23と、Al電線100の被覆部100bに加締められる被覆加締部24とによって構成される。導体圧着部23には、底板部21の左右方向両側縁に、一対の導体加締片23aがU字状に形成され、その内側には、圧着端子20の左右方向に延びる複数のセレーション23bが形成されている。被覆加締部24には、底板部21の左右方向両側縁に、一対の被覆加締片24aが形成されている。   The crimp terminal 20 mainly includes a bottom plate part 21, an electrical connection part 22 into which a mating terminal is inserted, a conductor crimp part 23 crimped to the conductor exposed part 100a of the Al electric wire 100, and a covering part 100b of the Al electric wire 100. And a covering caulking portion 24 that is caulked. In the conductor crimping portion 23, a pair of conductor crimping pieces 23a are formed in a U-shape on both lateral edges of the bottom plate portion 21, and a plurality of serrations 23b extending in the left-right direction of the crimping terminal 20 are formed on the inside thereof. Is formed. In the covering crimping portion 24, a pair of covering crimping pieces 24 a are formed on both side edges of the bottom plate portion 21 in the left-right direction.

また、圧着端子20には、図3に示すように、導体圧着部23にFTO薄膜33が形成されている。このFTO薄膜33は、図4に示すように、導体圧着部23において、Al電線100が設置される面に積層されている。なお、本実施形態に係る圧着端子20は、上記の電気素子1に対応し、FTO薄膜33は、上記の酸化物薄膜16に対応する。   Further, as shown in FIG. 3, the crimp terminal 20 has an FTO thin film 33 formed on the conductor crimp portion 23. As shown in FIG. 4, the FTO thin film 33 is laminated on the surface where the Al electric wire 100 is installed in the conductor crimping portion 23. The crimp terminal 20 according to the present embodiment corresponds to the electric element 1 described above, and the FTO thin film 33 corresponds to the oxide thin film 16 described above.

本実施形態に係る圧着端子20の製造方法について説明する。
まず、黄銅からなるCu合金により形成された金属板を準備し、必要に応じてNiめっき層を形成する。めっき層は、公知のめっき法により形成できる。例えば、電解めっき法は、慣用的に行なわれている方法であり、装置構成も簡易で、また層厚の制御も比較的容易であることから好ましい。なお、本実施形態では、金属板にSnめっき層36が形成されている。
A method for manufacturing the crimp terminal 20 according to the present embodiment will be described.
First, a metal plate formed of a Cu alloy made of brass is prepared, and a Ni plating layer is formed as necessary. The plating layer can be formed by a known plating method. For example, the electrolytic plating method is a method that is conventionally performed, and is preferable because the apparatus configuration is simple and the control of the layer thickness is relatively easy. In the present embodiment, the Sn plating layer 36 is formed on the metal plate.

次に、金属板上に、元素をドープしたFTO薄膜33を設ける。FTO薄膜33は、例えばスプレー熱分解(SPD:Spray Pyrolysis Deposition)法により設けることができる。SPD法はよく知られているように、基材を成膜温度まで加熱し、そこに向けて霧化器等の噴霧手段を用いて膜の原料となる溶液を噴霧することにより、反応初期には、基材表面に付着した液滴中の溶媒の蒸発と、溶質の熱分解に続く加水分解反応および熱酸化反応することにより結晶を形成させ、反応が進むにつれその結晶上に、液滴が付着し、液滴中の溶媒蒸発と共に、溶質および下部の結晶間で結晶成長を進行させ、薄膜を形成する方法である。SPD法を採用することにより、FTO薄膜33をピンポイントで、および/または、任意の形状で成膜することができる。なおFTO薄膜33は、SPD法以外にも公知の方法を採用し、形成することができる。そして、金属板に対し公知のプレス成形や曲げ加工を施し、図2に示すような圧着端子20が作製される。   Next, an FTO thin film 33 doped with an element is provided on the metal plate. The FTO thin film 33 can be provided by, for example, a spray pyrolysis (SPD) method. As is well known in the SPD method, the substrate is heated to the film formation temperature and sprayed with the solution that is the raw material of the film using a spraying means such as an atomizer toward the initial stage. Forms a crystal by evaporating the solvent in the droplets attached to the substrate surface, followed by the hydrolysis and thermal oxidation reactions following the thermal decomposition of the solute, and as the reaction proceeds, the droplets form on the crystals. This is a method of forming a thin film by adhering and evaporating a solvent between droplets and advancing crystal growth between a solute and a lower crystal. By adopting the SPD method, the FTO thin film 33 can be formed in a pinpoint and / or arbitrary shape. The FTO thin film 33 can be formed by employing a known method other than the SPD method. Then, a known press molding or bending process is performed on the metal plate to produce a crimp terminal 20 as shown in FIG.

図6は、本発明の実施形態に係る圧着端子と電線との導通を説明するための図である。図6(a)に示すように、Al電線100と圧着端子20との圧着前においては、Al電線100の表面にAl酸化膜38が形成されており、圧着端子20の上述した領域にはFTO薄膜33が積層されている。
そして、図6(b)に示すように、圧着端子20にAl電線100が圧着され始めると、FTO薄膜33の一部が破壊され断片となる。この破壊されたFTO薄膜33の断片は、導電性を有しているため、Al電線100と圧着端子20との導通を妨げることはない。一方、Al電線100は、圧着により変形するため、表面に形成されているAl酸化膜38の一部が破壊され、Alの新生面が発生する。さらに、破壊されたFTO薄膜33の断片が、砥石としての機能を果たすので、Al酸化膜38の破壊された箇所に入り込み、Al酸化膜38の破壊がさらに進み、新たなAlの新生面が発生する。
FIG. 6 is a view for explaining conduction between the crimp terminal and the electric wire according to the embodiment of the present invention. As shown in FIG. 6A, an Al oxide film 38 is formed on the surface of the Al wire 100 before the Al wire 100 and the crimp terminal 20 are crimped. A thin film 33 is laminated.
Then, as shown in FIG. 6B, when the Al electric wire 100 starts to be crimped to the crimp terminal 20, a part of the FTO thin film 33 is broken and becomes a fragment. Since the broken piece of the FTO thin film 33 has conductivity, conduction between the Al electric wire 100 and the crimp terminal 20 is not hindered. On the other hand, since the Al electric wire 100 is deformed by pressure bonding, a part of the Al oxide film 38 formed on the surface is destroyed, and a new surface of Al is generated. Further, since the broken piece of the FTO thin film 33 functions as a grindstone, it enters into the broken portion of the Al oxide film 38, the destruction of the Al oxide film 38 further proceeds, and a new Al new surface is generated. .

なお、金属板の上に電解めっき法によりAgめっき層等の貴金属めっき層を形成し、その上にFTO薄膜33をSPD法により設けてもよい。この場合、FTO薄膜33を積層する分だけ貴金属めっき層の厚みを薄くできるので、従来よりもコストを低減できる。   Note that a noble metal plating layer such as an Ag plating layer may be formed on the metal plate by an electrolytic plating method, and the FTO thin film 33 may be provided thereon by the SPD method. In this case, since the thickness of the noble metal plating layer can be reduced by the amount of the FTO thin film 33 laminated, the cost can be reduced as compared with the conventional case.

このようにして形成されたFTO薄膜33は、導電性(例えば比抵抗値が1×10Ω・cm以下)を有し、さらに、SPD法を用いることにより、FTO薄膜33の成膜位置や厚みを自在に制御することができる。
以上のように、本発明の実施形態に係る圧着端子は、電線を加締めた際に、圧着端子の表面に形成されている導電性酸化膜を用いて電線の表面に形成される酸化膜を破壊し電線を構成する基材の新生面を生じさせることができる。したがって、圧着端子と電線との導通に対する高信頼性を得ることができる。また、圧着端子が、Al電線の表面に形成されるAl酸化膜を破壊して新生面を生じさせるための特別な構造を有する必要がないため、コストの低減や小型化を実現できる。
The FTO thin film 33 formed in this way has conductivity (for example, a specific resistance value of 1 × 10 7 Ω · cm or less), and further, by using the SPD method, The thickness can be freely controlled.
As described above, the crimp terminal according to the embodiment of the present invention has an oxide film formed on the surface of the electric wire using the conductive oxide film formed on the surface of the crimp terminal when the electric wire is caulked. The new surface of the base material which destroys and comprises an electric wire can be produced. Therefore, high reliability with respect to conduction between the crimp terminal and the electric wire can be obtained. Further, since the crimp terminal does not need to have a special structure for breaking the Al oxide film formed on the surface of the Al electric wire and generating a new surface, cost reduction and downsizing can be realized.

なお、上記では本発明の電気素子1として、圧着端子20を例にとり本発明を説明したが、この用途以外にも、当業界で公知の電気素子としての各種用途に利用することができる。   In the above description, the present invention has been described by taking the crimp terminal 20 as an example of the electric element 1 of the present invention. However, in addition to this application, the present invention can be used for various applications as an electric element known in the art.

ここで、上述した本発明に係る電気素子の実施形態の特徴をそれぞれ以下[1]〜[3]に簡潔に纏めて列記する。
[1] 前端側に相手端子と嵌合接続するための電気接続部(22)が設けられると共に、後端側に、内側に曲げられて加締められることにより電線(Al電線100)の導体(導体露出部100a)に圧着される導体圧着部(23)が設けられた圧着端子(20)において、
前記導体圧着部(23)の前記電線(Al電線100)と接触する領域に、導電性発現に寄与する元素をドープした酸化物薄膜(FTO薄膜33)が設けられたことを特徴とする圧着端子(20)。
[2] 前記導電性発現に寄与する元素が、F、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種であることを特徴とする上記[1]に記載の圧着端子。
[3] 前記導電性発現に寄与する元素が、少なくともFを含むことを特徴とする上記[2]に記載の圧着端子(20)。
Here, the features of the embodiment of the electric element according to the present invention described above are briefly summarized and listed in the following [1] to [3], respectively.
[1] An electrical connection portion (22) for fitting and connecting to a mating terminal is provided on the front end side, and the conductor (Al wire 100) of the electric wire (Al electric wire 100) is bent and crimped on the rear end side. In the crimp terminal (20) provided with the conductor crimping part (23) to be crimped to the conductor exposed part 100a),
A crimp terminal characterized in that an oxide thin film (FTO thin film 33) doped with an element contributing to conductivity is provided in a region of the conductor crimping portion (23) that is in contact with the electric wire (Al electric wire 100). (20).
[2] The element according to [1], wherein the element contributing to the development of conductivity is at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi. Crimp terminal.
[3] The crimp terminal (20) according to the above [2], wherein the element contributing to the development of conductivity includes at least F.

1 電気素子
12 基材
16 酸化物薄膜
20 圧着端子
21 底板部
22 電気接続部
23 導体圧着部
23a 導体加締片
23b セレーション
24 被覆加締部
24a 被覆加締片
33 FTO薄膜
36 Snめっき層
100 Al電線
100a 導体露出部
100b 被覆部
DESCRIPTION OF SYMBOLS 1 Electric element 12 Base material 16 Oxide thin film 20 Crimp terminal 21 Bottom plate part 22 Electrical connection part 23 Conductor crimping part 23a Conductor crimping piece 23b Serration 24 Covering crimping part 24a Covering crimping piece 33 FTO thin film 36 Sn plating layer 100 Al Electric wire 100a Conductor exposed part 100b Covering part

Claims (3)

前端側に相手端子と嵌合接続するための電気接続部が設けられると共に、後端側に、内側に曲げられて加締められることにより電線の導体に圧着される導体圧着部が設けられた圧着端子において、
前記導体圧着部の前記電線と接触する領域に、導電性発現に寄与する元素をドープした酸化物薄膜が設けられたことを特徴とする圧着端子。
Crimping with an electrical connection part for fitting and connecting to the mating terminal on the front end side, and a conductor crimping part that is crimped to the conductor of the wire by being bent inward and crimped on the rear end side At the terminal,
A crimp terminal, wherein an oxide thin film doped with an element contributing to conductivity is provided in a region of the conductor crimping portion that is in contact with the electric wire.
前記導電性発現に寄与する元素が、F、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種であることを特徴とする請求項1に記載の圧着端子。   2. The crimp terminal according to claim 1, wherein the element contributing to the electrical conductivity is at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi. 前記導電性発現に寄与する元素が、少なくともFを含むことを特徴とする請求項2に記載の圧着端子。   The crimp terminal according to claim 2, wherein the element contributing to the development of conductivity includes at least F.
JP2014197003A 2014-09-26 2014-09-26 Crimp terminal Pending JP2016071951A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021029299A1 (en) * 2019-08-09 2021-02-18 株式会社オートネットワーク技術研究所 Terminal-equipped wire

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008235046A (en) * 2007-03-22 2008-10-02 Sony Corp Electronic device and electronic component
JP2013122866A (en) * 2011-12-12 2013-06-20 Auto Network Gijutsu Kenkyusho:Kk Relay terminal
JP2014022211A (en) * 2012-07-19 2014-02-03 Swcc Showa Cable Systems Co Ltd Terminal metal fitting and covered wire with terminal metal fitting

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008235046A (en) * 2007-03-22 2008-10-02 Sony Corp Electronic device and electronic component
JP2013122866A (en) * 2011-12-12 2013-06-20 Auto Network Gijutsu Kenkyusho:Kk Relay terminal
JP2014022211A (en) * 2012-07-19 2014-02-03 Swcc Showa Cable Systems Co Ltd Terminal metal fitting and covered wire with terminal metal fitting

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021029299A1 (en) * 2019-08-09 2021-02-18 株式会社オートネットワーク技術研究所 Terminal-equipped wire
JP2021028882A (en) * 2019-08-09 2021-02-25 株式会社オートネットワーク技術研究所 Electric wire with terminal
CN114190109A (en) * 2019-08-09 2022-03-15 株式会社自动网络技术研究所 wire with terminal
US11888250B2 (en) 2019-08-09 2024-01-30 Autonetworks Technologies Terminal-equipped wire
CN114190109B (en) * 2019-08-09 2024-04-12 株式会社自动网络技术研究所 Wire with terminal

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