JP2016069283A - Ester compound and production process for the same - Google Patents
Ester compound and production process for the same Download PDFInfo
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- JP2016069283A JP2016069283A JP2014196850A JP2014196850A JP2016069283A JP 2016069283 A JP2016069283 A JP 2016069283A JP 2014196850 A JP2014196850 A JP 2014196850A JP 2014196850 A JP2014196850 A JP 2014196850A JP 2016069283 A JP2016069283 A JP 2016069283A
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- general formula
- compound represented
- compound
- ester compound
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- -1 Ester compound Chemical class 0.000 title claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 150000001875 compounds Chemical class 0.000 claims abstract description 98
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 34
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000001257 hydrogen Substances 0.000 claims abstract description 26
- 125000003277 amino group Chemical group 0.000 claims abstract description 15
- 239000003054 catalyst Substances 0.000 claims abstract description 14
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 22
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 16
- 239000002994 raw material Substances 0.000 abstract description 10
- 229920001002 functional polymer Polymers 0.000 abstract description 9
- 239000002861 polymer material Substances 0.000 abstract description 9
- 239000002904 solvent Substances 0.000 abstract description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 30
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 16
- 239000003960 organic solvent Substances 0.000 description 16
- 239000007787 solid Substances 0.000 description 15
- 238000004458 analytical method Methods 0.000 description 13
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 10
- 238000004128 high performance liquid chromatography Methods 0.000 description 8
- 229920001721 polyimide Polymers 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 239000004952 Polyamide Substances 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 238000000921 elemental analysis Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000010953 Ames test Methods 0.000 description 4
- 231100000039 Ames test Toxicity 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000002076 thermal analysis method Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000004587 chromatography analysis Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- GWHJZXXIDMPWGX-UHFFFAOYSA-N 1,2,4-trimethylbenzene Chemical compound CC1=CC=C(C)C(C)=C1 GWHJZXXIDMPWGX-UHFFFAOYSA-N 0.000 description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- SKDHHIUENRGTHK-UHFFFAOYSA-N 4-nitrobenzoyl chloride Chemical compound [O-][N+](=O)C1=CC=C(C(Cl)=O)C=C1 SKDHHIUENRGTHK-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000007886 mutagenicity Effects 0.000 description 2
- 231100000299 mutagenicity Toxicity 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- NYCCIHSMVNRABA-UHFFFAOYSA-N 1,3-diethylimidazolidin-2-one Chemical compound CCN1CCN(CC)C1=O NYCCIHSMVNRABA-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- NXTNASSYJUXJDV-UHFFFAOYSA-N 3-nitrobenzoyl chloride Chemical compound [O-][N+](=O)C1=CC=CC(C(Cl)=O)=C1 NXTNASSYJUXJDV-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DQEVGQOSQUGSQJ-UHFFFAOYSA-N CC(CC(C)(C)C1)CC1(c(cc1)ccc1OC(c1cccc(N)c1)=O)c(cc1)ccc1OC(c1cc(N)ccc1)=O Chemical compound CC(CC(C)(C)C1)CC1(c(cc1)ccc1OC(c1cccc(N)c1)=O)c(cc1)ccc1OC(c1cc(N)ccc1)=O DQEVGQOSQUGSQJ-UHFFFAOYSA-N 0.000 description 1
- VQYCCKRSIKSTON-UHFFFAOYSA-N CC(CC(C)(C)C1)CC1(c(cc1)ccc1OC(c1cccc([N+]([O-])=O)c1)=O)c(cc1)ccc1OC(c1cc([N+]([O-])=O)ccc1)=O Chemical compound CC(CC(C)(C)C1)CC1(c(cc1)ccc1OC(c1cccc([N+]([O-])=O)c1)=O)c(cc1)ccc1OC(c1cc([N+]([O-])=O)ccc1)=O VQYCCKRSIKSTON-UHFFFAOYSA-N 0.000 description 1
- SEZBQULFCHGKBF-UHFFFAOYSA-N CCCC(C)CC(CCC)(c(cc1)ccc1OC(c(cc1)ccc1N)=O)c(cc1)ccc1OC(c(cc1)ccc1N)=O Chemical compound CCCC(C)CC(CCC)(c(cc1)ccc1OC(c(cc1)ccc1N)=O)c(cc1)ccc1OC(c(cc1)ccc1N)=O SEZBQULFCHGKBF-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- FGEIRHNUEKEQHF-UHFFFAOYSA-N NC=1C(=C(C(=C(C(=O)C2=CC=CC=C2)C1)OC1=CC=CC=C1)OC1=CC=CC=C1)N Chemical class NC=1C(=C(C(=C(C(=O)C2=CC=CC=C2)C1)OC1=CC=CC=C1)OC1=CC=CC=C1)N FGEIRHNUEKEQHF-UHFFFAOYSA-N 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 150000004074 biphenyls Chemical class 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- JOZNOKCDYARRRE-UHFFFAOYSA-M potassium;2,4,6-tritert-butylphenolate Chemical compound [K+].CC(C)(C)C1=CC(C(C)(C)C)=C([O-])C(C(C)(C)C)=C1 JOZNOKCDYARRRE-UHFFFAOYSA-M 0.000 description 1
- QPBFQVJWJAMRTB-UHFFFAOYSA-M potassium;2,6-ditert-butyl-4-methylphenolate Chemical compound [K+].CC1=CC(C(C)(C)C)=C([O-])C(C(C)(C)C)=C1 QPBFQVJWJAMRTB-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- WYHABHVOLSCIOQ-UHFFFAOYSA-M sodium;2,4,6-tritert-butylphenolate Chemical compound [Na+].CC(C)(C)C1=CC(C(C)(C)C)=C([O-])C(C(C)(C)C)=C1 WYHABHVOLSCIOQ-UHFFFAOYSA-M 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
本発明は、新規なエステル化合物に関する。更に詳しくは、各種の機能性高分子材料、例えば、ポリアミド、ポリイミドおよびエポキシ樹脂の原料、さらにエポキシ化合物の硬化剤などの機能性高分子材料として有用なエステル化合物、およびその該化合物の製造方法に関する。
The present invention relates to a novel ester compound. More specifically, the present invention relates to various functional polymer materials such as polyamide, polyimide and epoxy resin raw materials, ester compounds useful as functional polymer materials such as epoxy compound curing agents, and methods for producing the compounds. .
近年、機能性高分子材料は熱的、機械的製法のほか、複合材料としての用途における加工性(溶剤溶解性)、剛直性、耐熱性に代表される諸特性を満足させることが要求されている。このような材料としてポリイミド樹脂が注目されているが、ポリイミド樹脂は高性能である反面、加工性が難しいという欠点があった。例えば、最も典型的な4,4’‐ジアミノジフェニルエーテルとピロメリット酸無水物から成る芳香族ポリイミド(Du’pont社、商品名「Vespel」は不溶、不融であるため、粉末焼結成形という特殊な方法を用いる。このため、この方法では複雑な形状の加工品が得られにくく、満足な成形品を得るには成形品をさらに切削等により仕上げ加工をしなければならないので、加工コストが高くなるという大きな欠点がある。
また機能性高分子材料の原料として有用なジアミン化合物は変異原性陽性の化合物が多く、取り扱う際の安全性が懸念されている。
In recent years, functional polymer materials have been required to satisfy various properties typified by processability (solvent solubility), rigidity, and heat resistance in applications as composite materials in addition to thermal and mechanical manufacturing methods. Yes. Polyimide resin is attracting attention as such a material, but polyimide resin has a drawback that it is difficult to process while having high performance. For example, the most typical aromatic polyimide consisting of 4,4'-diaminodiphenyl ether and pyromellitic anhydride (Du'pont, trade name "Vespel" is insoluble and infusible, so it is specially called powder sintering molding For this reason, it is difficult to obtain a processed product having a complicated shape by this method, and in order to obtain a satisfactory molded product, the molded product must be further processed by cutting or the like. There is a major drawback.
Moreover, many diamine compounds useful as raw materials for functional polymer materials are positive for mutagenicity, and there is concern about safety in handling.
このような欠点を改良する目的で、原料のジアミン成分を種々改良する方法が試みられている。
たとえば、耐熱性、機械特性に優れ、且つ有機溶媒に可溶なポリイミドの製造原料としてパラフェニレンジアミン、ベンジジン、4,4‘-ジアミノベンズアニリド、4,4’-ジアミノジフェニルエーテルのような芳香族のパラ位にアミノ基を有するアミノ化合物が提案されている(特許文献1、特許文献2、特許文献3)。
透明性、耐熱性、機械強度が良好で加工特性に優れたポリアミドの製造原料としてジアミノジフェノキシベンゾフェノン類が提案されている(特許文献4)。
可とう性や成形加工性に優れた樹脂原料のジアミン化合物として、ビス(アミノベンゾイルオキシ)ビフェニル類が提案されている(特許文献5)。
ポリイミド、ポリアミドおよびポリアミドイミド等の重合性モノマー原料、或いはポリウレタン、エポキシ樹脂等の硬化剤として有用な新規芳香族ジアミン化合物が提案されている(特許文献6)。
さらには、分子内にエーテル結合を有するジアミン化合物、例えば、3,4’−ジアミノジフェニルエーテル、1,4−ビス(4−アミノフェノキシ)ベンゼンを用いてなるポリイミド(共重合ポリアミド)が提案されている(特許文献7,8)
しかしながら、近年の機能性高分子材料の高性能化の要請に対応するにはこれまでのジアミン化合物では必ずしも満足すべきものではない。
In order to improve such a defect, various methods for improving the diamine component of the raw material have been tried.
For example, aromatic raw materials such as paraphenylenediamine, benzidine, 4,4′-diaminobenzanilide, and 4,4′-diaminodiphenyl ether are used as raw materials for producing polyimides having excellent heat resistance and mechanical properties and soluble in organic solvents. An amino compound having an amino group at the para position has been proposed (Patent Document 1, Patent Document 2, and Patent Document 3).
Diaminodiphenoxybenzophenones have been proposed as raw materials for producing polyamides having good transparency, heat resistance, mechanical strength and excellent processing characteristics (Patent Document 4).
Bis (aminobenzoyloxy) biphenyls have been proposed as a diamine compound as a resin raw material having excellent flexibility and moldability (Patent Document 5).
A novel aromatic diamine compound useful as a polymerizable monomer material such as polyimide, polyamide and polyamideimide, or a curing agent such as polyurethane and epoxy resin has been proposed (Patent Document 6).
Furthermore, a diamine compound having an ether bond in the molecule, for example, a polyimide (copolymer polyamide) using 3,4′-diaminodiphenyl ether and 1,4-bis (4-aminophenoxy) benzene has been proposed. (Patent Documents 7 and 8)
However, conventional diamine compounds are not always satisfactory in order to meet the recent demand for higher performance of functional polymer materials.
本発明の課題は、加工性(溶剤溶解性)、剛直性、耐熱性に優れ、取扱上の安全性に問題のない機能性高分子材料を提供することである。
An object of the present invention is to provide a functional polymer material that is excellent in processability (solvent solubility), rigidity, and heat resistance and has no problem in handling safety.
本発明者らは、前記課題を解決するために鋭意検討した結果、本発明を完成するに到った。すなわち、本発明は、 As a result of intensive studies to solve the above problems, the present inventors have completed the present invention. That is, the present invention
(i)一般式(1)で表すエステル化合物、
(式中、X1およびX2はそれぞれ独立に、ニトロ基またはアミノ基を表す。)
(i) an ester compound represented by the general formula (1),
(Wherein, X 1 and X 2 each independently represent a nitro group or an amino group)
(ii)塩基の存在下、式(2)で表される化合物と、一般式(3)で表される化合物を作用させることからなる一般式(1A)で表される化合物の製造方法、
(式中、Xはハロゲン原子を表す)
(Ii) A process for producing a compound represented by the general formula (1A) comprising reacting a compound represented by the formula (2) and a compound represented by the general formula (3) in the presence of a base,
(Wherein X represents a halogen atom)
(iii)触媒の存在下、一般式(1A)で表される化合物と、水素源を作用させることからなる一般式(1B)で表される化合物の製造方法、
に関する。
(Iii) a method for producing a compound represented by the general formula (1B) comprising reacting a compound represented by the general formula (1A) and a hydrogen source in the presence of a catalyst;
About.
本発明によれば、各種の機能性高分子材料、例えば、ポリイミド、ポリアミドおよびポリアミドイミド等の重合用モノマー原料、およびエポキシ樹脂等の硬化剤として有用なエステル化合物および該化合物の製造方法を提供することが可能になった。
According to the present invention, there are provided various functional polymer materials, for example, monomer materials for polymerization such as polyimide, polyamide and polyamideimide, and ester compounds useful as curing agents such as epoxy resins, and methods for producing the compounds. It became possible.
以下、本発明に関し詳細に説明する。
本発明は一般式(1)で表されるエステル化合物を提供するものである。
(式中、X1およびX2はそれぞれ独立に、ニトロ基またはアミノ基を表す。)
Hereinafter, the present invention will be described in detail.
The present invention provides an ester compound represented by the general formula (1).
(In the formula, X 1 and X 2 each independently represent a nitro group or an amino group.)
一般式(1)で表されるエステル化合物において、X1およびX2はそれぞれ独立にニトロ基又はアミノ基を表し、より好ましくはX1およびX2が同時に、ニトロ基又はアミノ基を表す。また、一般式(1)で表されるエステル化合物において、X1およびX2はそれぞれ独立に、エステル結合(−O−CO-)に対して、オルト位、メタ位又はパラ位を表し、より好ましくはメタ位又はパラ位を表し、さらに好ましくはX1およびX2が同時に、メタ位又はパラ位を表す。 In the ester compound represented by the general formula (1), X 1 and X 2 each independently represent a nitro group or an amino group, and more preferably X 1 and X 2 simultaneously represent a nitro group or an amino group. In the ester compound represented by the general formula (1), X 1 and X 2 each independently represent an ortho position, a meta position or a para position with respect to the ester bond (—O—CO—), Preferably it represents a meta position or a para position, more preferably X 1 and X 2 represent a meta position or a para position at the same time.
一般式(1)で表される化合物は、より好ましくは一般式(1A)又は一般式(1B)で表される化合物である。
The compound represented by the general formula (1) is more preferably a compound represented by the general formula (1A) or the general formula (1B).
一般式(1A)で表される化合物において、ニトロ基は、エステル結合(−O−CO-)に対して、オルト位、メタ位またはパラ位を表し、より好ましくは、二つのニトロ基は同時に、メタ位またはパラ位を表す。
一般式(1B)で表される化合物において、アミノ基は、エステル結合(−O−CO-)に対して、オルト位、メタ位またはパラ位を表し、より好ましくは、二つのアミノ基は同時に、メタ位またはパラ位を表す。
In the compound represented by the general formula (1A), the nitro group represents an ortho position, a meta position or a para position with respect to the ester bond (—O—CO—), and more preferably, the two nitro groups are simultaneously formed. , Represents a meta position or a para position.
In the compound represented by the general formula (1B), the amino group represents an ortho position, a meta position, or a para position with respect to the ester bond (—O—CO—), and more preferably, the two amino groups are simultaneously , Represents a meta position or a para position.
一般式(1)において、X1およびX2が同時にニトロ基である一般式(1A)で表される化合物の製造方法としては、特に制限するものでは無いが、好ましくは塩基の存在下、式(2)で表される化合物と、一般式(3)で表される化合物を作用させることにより製造することができる。
(式中、Xはハロゲン原子を表す)
In the general formula (1), the method for producing the compound represented by the general formula (1A) in which X 1 and X 2 are simultaneously nitro groups is not particularly limited, but preferably in the presence of a base, the formula It can be produced by reacting the compound represented by (2) with the compound represented by the general formula (3).
(Wherein X represents a halogen atom)
一般式(3)で表される化合物において、ニトロ基は、カルボニル基に対してオルト位、メタ位またはパラ位を表し、より好ましくはメタ位またはパラ位を表す。
一般式(3)において、Xはハロゲン原子を表し、より好ましくは、フッ素原子、塩素原子、臭素原子を表し、さらに好ましくは、フッ素原子、塩素原子を表し、特に好ましくは塩素原子を表す。
一般式(1A)で表される化合物の製造において使用する一般式(3)で表される化合物の量は、一般には式(2)で表される化合物1モルに対して2.0〜3.0モル程度、より好ましくは2.0〜2.5モル程度、さらに好ましくは2.02〜2.1モル程度使用する。
In the compound represented by the general formula (3), the nitro group represents an ortho position, a meta position or a para position, more preferably a meta position or a para position with respect to the carbonyl group.
In the general formula (3), X represents a halogen atom, more preferably a fluorine atom, a chlorine atom or a bromine atom, still more preferably a fluorine atom or a chlorine atom, and particularly preferably a chlorine atom.
The amount of the compound represented by the general formula (3) used in the production of the compound represented by the general formula (1A) is generally 2.0 to 3 with respect to 1 mol of the compound represented by the formula (2). About 2.0 mol, more preferably about 2.0 to 2.5 mol, and still more preferably about 2.02 to 2.1 mol are used.
一般式(1A)で表される化合物の製造において使用する塩基としては、例えば、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、リン酸ナトリウム、リン酸カリウム、炭酸水素ナトリウム、炭酸水素カリウムなどの無機塩基、
例えば、ナトリウムメトキシド、カリウムメトキシド、ナトリウムエトキシド、カリウムエトキシド、ナトリウム−tert−ブトキシド、カリウム−tert−ブトキシド、ナトリウム(2,4,6−トリ−tert−ブチルフェノラート)、カリウム(2,4,6−トリ−tert−ブチルフェノラート)、カリウム(2,6−ジ−tert−ブチル−4−メチルフェノラート)などの金属アルコキシド、
例えば、酢酸ナトリウム、酢酸カリウム、トリエチルアミン、トリイソプロピルアミン、トリ−n−ブチルアミン、ジイソプロピルエチルアミン、ピリジン、キノリン、ピコリン、テトラ−n−ブチルアンモニウムブロマイド、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)、1,5−ジアザビシクロ[4.3.0]−5−ノネン(DBN)、N,N,N’,N’−テトラメチルエチレンジアミンなどの有機塩基などを挙げることができ、より好ましくは無機塩基である。
係る塩基は、1種を単独で使用してもよく、あるいは複数併用してもよい。
塩基の使用量は、一般式(3)で表される化合物の総量に対して2〜3モルであり、好ましくは2.02〜2.1モル使用する。
Examples of the base used in the production of the compound represented by the general formula (1A) include sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium phosphate, potassium phosphate, Inorganic bases such as sodium bicarbonate and potassium bicarbonate,
For example, sodium methoxide, potassium methoxide, sodium ethoxide, potassium ethoxide, sodium tert-butoxide, potassium tert-butoxide, sodium (2,4,6-tri-tert-butylphenolate), potassium (2 , 4,6-tri-tert-butylphenolate), metal alkoxides such as potassium (2,6-di-tert-butyl-4-methylphenolate),
For example, sodium acetate, potassium acetate, triethylamine, triisopropylamine, tri-n-butylamine, diisopropylethylamine, pyridine, quinoline, picoline, tetra-n-butylammonium bromide, 1,8-diazabicyclo [5.4.0]- And organic bases such as 7-undecene (DBU), 1,5-diazabicyclo [4.3.0] -5-nonene (DBN), N, N, N ′, N′-tetramethylethylenediamine, and the like. More preferably, it is an inorganic base.
Such bases may be used alone or in combination.
The usage-amount of a base is 2-3 mol with respect to the total amount of the compound represented by General formula (3), Preferably 2.02-2.1 mol is used.
一般式(1A)で表される化合物の製造においては、有機溶媒の非存在下で実施することも可能であるが、好ましくは、有機溶媒の存在下で実施する。
係る有機溶媒としては例えば、エーテル、ジオキサン、テトラヒドロフラン、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル等のエーテル類、ヘキサン、シクロヘキサン等の脂肪族炭化水素類、ベンゼン、トルエン、キシレン等の芳香族炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、およびN,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン等の非プロトン性極性溶剤が使用できる。
これらの有機溶媒は、1種を単独で使用してもよく、あるいは複数併用してもよい。
有機溶媒の使用量は、通常、原料に対して好ましくは0.1〜30倍重量、より好ましくは0.3〜20倍重量、更に好ましくは0.5〜10倍重量である。
The production of the compound represented by the general formula (1A) can be carried out in the absence of an organic solvent, but is preferably carried out in the presence of an organic solvent.
Examples of the organic solvent include ethers such as ether, dioxane, tetrahydrofuran, ethylene glycol dimethyl ether and diethylene glycol dimethyl ether, aliphatic hydrocarbons such as hexane and cyclohexane, aromatic hydrocarbons such as benzene, toluene and xylene, and ethyl acetate. , Esters such as butyl acetate, and aprotic polar solvents such as N, N-dimethylformamide and 1,3-dimethyl-2-imidazolidinone can be used.
These organic solvents may be used alone or in combination.
The amount of the organic solvent used is usually preferably 0.1 to 30 times the weight, more preferably 0.3 to 20 times the weight, and still more preferably 0.5 to 10 times the weight of the raw material.
一般式(1A)で表される化合物を製造する際の反応温度に関しては、特に制限するものではないが、一般には、0〜200℃程度、好ましくは、30〜150℃程度、より好ましくは、80〜110℃程度で実施する。
一般式(1A)で表される化合物を製造する際の反応時間に関しては、特に制限するものでは無いが、一般には1〜40時間程度、より好ましくは5〜24時間程度で実施することができる。
また、一般式(1A)で表される化合物を製造する際の反応は、大気雰囲気下で実施することができるが、一般には不活性ガス(例えば、窒素、アルゴン、ヘリウム)存在下で実施することが好ましい。
一般式(1A)で表される化合物の製造に際して、反応は、常圧下で実施してもよく、所望により、減圧下または加圧下で実施することも可能である。
The reaction temperature for producing the compound represented by the general formula (1A) is not particularly limited, but is generally about 0 to 200 ° C, preferably about 30 to 150 ° C, more preferably, It implements at about 80-110 degreeC.
The reaction time for producing the compound represented by the general formula (1A) is not particularly limited, but is generally about 1 to 40 hours, more preferably about 5 to 24 hours. .
The reaction for producing the compound represented by the general formula (1A) can be carried out in the atmosphere, but is generally carried out in the presence of an inert gas (for example, nitrogen, argon, helium). It is preferable.
In the production of the compound represented by the general formula (1A), the reaction may be carried out under normal pressure, and may be carried out under reduced pressure or under pressure as desired.
このような方法で製造される一般式(1A )は反応終了後、結晶が析出している場合は濾過、単離することが出来、そうでない場合は反応液を濃縮するか、またはそのまま水に排出して析出した生成物を濾過、単離することができる。
また、一般式(1A)で表される化合物は、所望により、再結晶法、クロマトグラフィー法などの公知の方法により単離、精製することができる。
The general formula (1A) produced by such a method can be filtered and isolated when crystals are precipitated after the reaction is completed, otherwise the reaction solution is concentrated or directly in water. The product precipitated by discharge can be filtered and isolated.
Further, the compound represented by the general formula (1A) can be isolated and purified by a known method such as a recrystallization method or a chromatography method, if desired.
尚、一般式(1)において、X1およびX2が同時にアミノ基である一般式(1B)で表される化合物の製造方法に関しては、特に制限するものではないが、好ましくは、一般式(1A)で表される化合物中のニトロ基を還元し、アミノ基へ変換することにより製造することができる。
水素源としては、例えば、プロトン酸(例えば、塩化水素、臭化水素)と還元剤(例えば、鉄、スズ、塩化第一スズなど)との組み合わせを包含するものであるが、より好ましくは水素源自体が水素供給能力を有するものであり、より好ましくは水素、ヒドラジンを挙げることができ、より好ましくは水素である。
尚、水素源として水素を用いる場合、水素は気体状態で使用してもよく、また有機溶媒に溶解させた溶液状態で使用してもよい。
水素源の使用量は、特に制限するものではないが、一般式(1A)で表される化合物中のニトロ基をアミノ基に変換するに充分な量を使用するものであり、過剰量の水素源の存在下で実施することも可能であるが、一般には、水素源は、水素1モルに換算して、一般式(1A)で表される化合物1モルに対して4〜8モル程度使用し、より好ましくは6モル程度使用する。
Incidentally, in the general formula (1), for the preparation of compounds in which X 1 and X 2 are represented by the general formula (1B) is an amino group at the same time, is not particularly limited, preferably the general formula ( It can be produced by reducing the nitro group in the compound represented by 1A) and converting it to an amino group.
Examples of the hydrogen source include a combination of a protonic acid (for example, hydrogen chloride, hydrogen bromide) and a reducing agent (for example, iron, tin, stannous chloride, etc.). The source itself is capable of supplying hydrogen, more preferably hydrogen or hydrazine, and more preferably hydrogen.
In addition, when using hydrogen as a hydrogen source, hydrogen may be used in a gaseous state and may be used in a solution state dissolved in an organic solvent.
The amount of the hydrogen source used is not particularly limited, but an amount sufficient to convert the nitro group in the compound represented by the general formula (1A) to an amino group is used, and an excess amount of hydrogen Although it can be carried out in the presence of a source, in general, the hydrogen source is used in an amount of about 4 to 8 mol per mol of the compound represented by the general formula (1A) in terms of 1 mol of hydrogen. More preferably, about 6 mol is used.
触媒としては、好ましくは、周期律表の第8〜第10族から選ばれる金属原子を含有して成る金属触媒であり、より好ましくは、鉄、ロジウム、ニッケル、パラジウム、ルテニウム、コバルトまたは白金原子を含有して成る金属触媒であり、さらに好ましくは、パラジウム原子を含有して成るパラジウム触媒である。
尚、触媒としては、該金属原子を、例えば、炭素、アルミナ、シリカ、ゼオライト、硫酸バリウムなどの担体に坦持させた形態で使用することは好ましい。
係る触媒としては、例えば、塩化第二鉄/活性炭、パラジウム/炭素、パラジウム/アルミナ、パラジウム/硫酸バリウム、白金、酸化白金、白金/炭素、白金/シリカ、ロジウム/炭素、ロジウム/アルミナ、ルテニウム/炭素、ラネーニッケル、ラネーコバルトなどを挙げることができ、より好ましくは、パラジウム/炭素、パラジウム/アルミナなどのパラジウム触媒である。
触媒の使用量は、特に制限するものではないが、一般には、一般式(1A)で表される化合物に対して、0.01〜40質量%程度、より好ましくは、0.1〜30質量%程度である。
The catalyst is preferably a metal catalyst containing a metal atom selected from Groups 8 to 10 of the periodic table, more preferably an iron, rhodium, nickel, palladium, ruthenium, cobalt or platinum atom. And more preferably a palladium catalyst containing a palladium atom.
The catalyst is preferably used in a form in which the metal atom is supported on a carrier such as carbon, alumina, silica, zeolite, or barium sulfate.
Such catalysts include, for example, ferric chloride / activated carbon, palladium / carbon, palladium / alumina, palladium / barium sulfate, platinum, platinum oxide, platinum / carbon, platinum / silica, rhodium / carbon, rhodium / alumina, ruthenium / Carbon, Raney nickel, Raney cobalt and the like can be mentioned, and palladium catalysts such as palladium / carbon and palladium / alumina are more preferable.
The amount of the catalyst used is not particularly limited, but is generally about 0.01 to 40% by mass, more preferably 0.1 to 30% by mass with respect to the compound represented by the general formula (1A). %.
触媒の存在下、一般式(1A)で表される化合物と、水素源を作用させる際には、好ましくは、有機溶媒の存在下で実施する。
係る有機溶媒としては、反応に不活性なものであれば、特に限定されるものではなく、例えば、ペンタン、ヘキサン、オクタン、シクロヘキサンなどの脂肪族炭化水素溶媒、
例えば、ベンゼン、トルエン、o−キシレン、m−キシレン、p−キシレン、混合キシレン、メシチレン、クメン、プソイドクメン、テトラリンなどの芳香族炭化水素溶媒、
例えば、メタノール、エタノール、イソプロピルアルコール、ブタノール、シクロヘキサノール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールなどのアルコール系溶媒、
例えば、酢酸エチル、酢酸ブチル、酢酸アミルなどのエステル系溶媒、
例えば、1,4−ジオキサン、テトラヒドロフラン、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジイソプロピルエーテル、ジイソブチルエーテル、シクロペンチルメチルエーテル、アニソール、ジフェニルエーテルなどのエーテル系溶媒、
例えば、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドン、1,3−ジメチル−2−イミダゾリジノン、1,3−ジエチル−2−イミダゾリジノン、1,3−ジ−n−ブチル−2−イミダゾリジノン、ヘキサメチルホスホルアミドなどの非プロトン性極性溶媒などの有機溶媒を挙げることができる。
これらの有機溶媒は、1種を単独で使用してもよく、あるいは複数併用してもよい。
尚、有機溶媒の使用量は、特に制限するものではないが、一般には、一般式(1A)で表される化合物の濃度が、0.05〜6M程度、より好ましくは、0.08〜5M程度となる量に調製する。
When the compound represented by the general formula (1A) and a hydrogen source are allowed to act in the presence of a catalyst, the reaction is preferably performed in the presence of an organic solvent.
The organic solvent is not particularly limited as long as it is inert to the reaction. For example, an aliphatic hydrocarbon solvent such as pentane, hexane, octane, cyclohexane,
For example, aromatic hydrocarbon solvents such as benzene, toluene, o-xylene, m-xylene, p-xylene, mixed xylene, mesitylene, cumene, pseudocumene, tetralin,
For example, alcohol solvents such as methanol, ethanol, isopropyl alcohol, butanol, cyclohexanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol,
For example, ester solvents such as ethyl acetate, butyl acetate, amyl acetate,
For example, ether solvents such as 1,4-dioxane, tetrahydrofuran, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diisopropyl ether, diisobutyl ether, cyclopentyl methyl ether, anisole, diphenyl ether,
For example, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, 1,3-diethyl-2-imidazolidinone, 1, An organic solvent such as an aprotic polar solvent such as 3-di-n-butyl-2-imidazolidinone and hexamethylphosphoramide can be used.
These organic solvents may be used alone or in combination.
The amount of the organic solvent used is not particularly limited, but generally, the concentration of the compound represented by the general formula (1A) is about 0.05 to 6M, more preferably 0.08 to 5M. Prepare to an appropriate amount.
一般式(1B)で表される化合物の製造において、一般式(1A)で表される化合物、触媒、有機溶媒および水素源の供給方法に関しては特に制限するものではないが、例えば、
(ア)有機溶媒の存在下、一般式(1A)で表される化合物および触媒の混合物に、水素源を供給する方法、
(イ)有機溶媒の存在下、予め触媒を存在させて、一般式(1A)で表される化合物の供給と共に、水素源を供給する方法、などを挙げることができる。
In the production of the compound represented by the general formula (1B), the method for supplying the compound represented by the general formula (1A), the catalyst, the organic solvent and the hydrogen source is not particularly limited.
(A) A method of supplying a hydrogen source to a mixture of a compound represented by the general formula (1A) and a catalyst in the presence of an organic solvent,
(A) A method in which a catalyst is previously present in the presence of an organic solvent and a hydrogen source is supplied together with the supply of the compound represented by the general formula (1A) can be exemplified.
一般式(1A)で表される化合物と、水素源を作用させる際の反応温度に関しては、特に制限するものではないが、一般には、0〜200℃程度、好ましくは、10〜150℃程度、より好ましくは、20〜120℃程度で実施する。
また反応圧力は、通常、常圧〜50atm程度である。
また、一般式(1A)で表される化合物と、水素源を作用させる際の反応時間に関しては、特に制限するものではないが、一般には1〜100時間程度、より好ましくは2〜60時間程度で実施することができる。
また、一般式(1A)で表される化合物と水素源との反応は、水素源と共に、例えば、不活性ガス(例えば、窒素、アルゴン、ヘリウム)の共存下で実施することができる。
一般式(1A)で表される化合物と、水素源を作用させる際、該反応は、常圧下で実施してもよく、所望に応じ、減圧下または加圧下で実施することも可能である。
The reaction temperature when the compound represented by the general formula (1A) and the hydrogen source are allowed to act is not particularly limited, but is generally about 0 to 200 ° C, preferably about 10 to 150 ° C. More preferably, it implements at about 20-120 degreeC.
The reaction pressure is usually about normal pressure to 50 atm.
Further, the reaction time when the compound represented by the general formula (1A) and the hydrogen source are allowed to act is not particularly limited, but is generally about 1 to 100 hours, more preferably about 2 to 60 hours. Can be implemented.
In addition, the reaction between the compound represented by the general formula (1A) and the hydrogen source can be carried out together with the hydrogen source, for example, in the presence of an inert gas (for example, nitrogen, argon, helium).
When the compound represented by the general formula (1A) and a hydrogen source are allowed to act, the reaction may be carried out under normal pressure, or under reduced pressure or under pressure as desired.
このような方法で製造される一般式(1B)で表される化合物は、分子中にアミノ基を有していることから、例えば、酸(例えば、塩化水素、臭化水素、硫酸)を作用させて、塩(例えば、塩酸塩、臭酸塩、硫酸塩)として単離することもできる。
その一般式(1B)で表される化合物の塩は、塩基(例えば、アンモニア、水酸化ナトリウム、水酸化カリウム)を作用させることにより、一般式(1B)で表される化合物へと変換することができる。
また、一般式(1B)で表される化合物は、所望により、再結晶法、クロマトグラフィー法などの公知の方法により単離、精製することができる。
また、一般式(1B)で表される化合物および該化合物の塩は、有機溶媒および/または水の存在下、例えば、活性炭、ゼオライトなどを作用させて、精製することもできる。
尚、一般式(1A)および一般式(1B)で表される化合物の構造は、元素分析、MS(FD−MS)分析、IR分析、1H−NMR、13C−NMRなどの各種分析方法により同定することができる。
Since the compound represented by the general formula (1B) produced by such a method has an amino group in the molecule, for example, an acid (for example, hydrogen chloride, hydrogen bromide, sulfuric acid) acts on the compound. And can be isolated as a salt (eg, hydrochloride, odorate, sulfate).
The salt of the compound represented by the general formula (1B) is converted into the compound represented by the general formula (1B) by the action of a base (for example, ammonia, sodium hydroxide, potassium hydroxide). Can do.
Moreover, the compound represented by general formula (1B) can be isolated and refine | purified by well-known methods, such as a recrystallization method and a chromatography method, as needed.
In addition, the compound represented by the general formula (1B) and a salt of the compound can be purified by the action of, for example, activated carbon or zeolite in the presence of an organic solvent and / or water.
In addition, the structure of the compound represented by general formula (1A) and general formula (1B) is various analysis methods, such as elemental analysis, MS (FD-MS) analysis, IR analysis, < 1 > H-NMR, < 13 > C-NMR. Can be identified.
一般式(1A)および一般式(1B)で表される化合物を製造するに際して、使用する反応装置の種類、形態に関しては特に制限するものではないが、一般には、槽型、管型、塔型の反応装置を用いることができる。また、各製造工程を、回分式(バッチ式)で実施することができ、さらには、連続的に実施することも可能である。
また、一般式(1A)および一般式(1B)で表される化合物を製造するに際して、使用する反応装置は、様々な撹拌装置を備えることができる。係る撹拌装置としては、例えば、パドル型撹拌機、プロペラ型撹拌機、タービン型撹拌機、ホモジナイザー、ホモミキサー、ラインミキサー、ラインホモミキサーなどの高速撹拌機、さらにはスタティックミキサー、コロイドミル、オリフィスミキサー、フロージェットミキサーなどを挙げることができる。
尚、各製造工程における反応の進行は、例えば、薄層クロマトグラフィー、高速液体クロマトグラフィー、ガスクロマトグラフィーなどの方法で追跡することができる。
一般式(1)においてX1及びX2が異なる場合、例えばX1がニトロ基、X2がアミノ基である一般式(1C)で表される化合物は一般式(1A)で表される化合物より一般式(1B)で表される化合物と同様な方法で製造することができる。一般式(1B)で表される化合物を製造する過程で生成し、所望によりクロマトグラフィー法等で単離できる。
一般式(1B)で表される化合物と同様な方法で反応の進行を例えば、薄層クロマトグラフィー、高速液体クロマトグラフィー、ガスクロマトグラフィーなどの方法で追跡しながら水素源の使用量を調整することで比較的高純度で得ることができる。
When producing the compounds represented by the general formula (1A) and the general formula (1B), the type and form of the reaction apparatus to be used are not particularly limited, but generally, a tank type, a tube type, a column type These reactors can be used. Moreover, each manufacturing process can be implemented by a batch type (batch type), and also can be implemented continuously.
Moreover, when manufacturing the compound represented by General formula (1A) and General formula (1B), the reaction apparatus to be used can be equipped with various stirring apparatuses. Such stirrers include, for example, paddle type stirrers, propeller type stirrers, turbine type stirrers, homogenizers, homomixers, line mixers, line homomixers, and other high speed stirrers, as well as static mixers, colloid mills, and orifice mixers. And a flow jet mixer.
The progress of the reaction in each production process can be traced by a method such as thin layer chromatography, high performance liquid chromatography, or gas chromatography.
In the general formula (1), when X 1 and X 2 are different, for example, the compound represented by the general formula (1C) in which X 1 is a nitro group and X 2 is an amino group is a compound represented by the general formula (1A) It can be produced by the same method as that for the compound represented by the general formula (1B). It is produced in the process of producing the compound represented by the general formula (1B), and can be isolated by chromatography or the like if desired.
Adjusting the amount of hydrogen source used while following the progress of the reaction in the same manner as the compound represented by the general formula (1B), for example, by thin layer chromatography, high performance liquid chromatography, gas chromatography, etc. Can be obtained with relatively high purity.
(実施例1) 下記式(1A-1)で表される化合物の製造
窒素雰囲気下、式(2)の化合物40.6g(0.13 mol)をメチルイソブチルケトン(461.2g)に溶解し、さらに、ピリジン22.8g(0.29 mol)を加え105 ℃に加熱した。この溶液に4−ニトロベンゾイルクロライド53.4g(0.29 mol)のメチルイソブチルケトン(80g)溶液を1時間要して滴下した。この反応混合物を110 ℃にて4時間撹拌した。この反応混合物から、メチルイソブチルケトンを減圧下で留去し、残渣に50 ℃でメタノールを滴下した後、室温まで冷却後、析出している固体を濾別し、メタノール洗浄を行った。この固体を60 ℃で14時間乾燥して化合物(1A―1)77.1gを白色の固体として得た(収率96.9%)。
この化合物の純度は、高速液体クロマトグラフィーの分析の結果、99%以上(面積比)であった。この化合物について熱分析測定を行ったところ、ガラス転移温度は264.9℃であった。
得られた化合物は、下記の分析結果より目的の化合物であることを確認した。
・MS:(EI)m/z 608M+)
・元素分析値:実測値(C:69.01%、H:5.25%、N:4.62%)
;理論値(C:69.07%、H:5.30%、N:4.60%)
・Ames試験:陰性
Example 1 Production of a compound represented by the following formula (1A-1)
Under a nitrogen atmosphere, 40.6 g (0.13 mol) of the compound of formula (2) is dissolved in methyl isobutyl ketone (461.2 g), and further 22.8 g (0.29 mol) of pyridine is added and heated to 105 ° C. did. To this solution, a solution of 53.4 g (0.29 mol) of 4-nitrobenzoyl chloride in methyl isobutyl ketone (80 g) was added dropwise over 1 hour. The reaction mixture was stirred at 110 ° C. for 4 hours. From this reaction mixture, methyl isobutyl ketone was distilled off under reduced pressure. Methanol was added dropwise to the residue at 50 ° C., and after cooling to room temperature, the precipitated solid was separated by filtration and washed with methanol. This solid was dried at 60 ° C. for 14 hours to obtain 77.1 g of Compound (1A-1) as a white solid (yield 96.9%).
As a result of analysis by high performance liquid chromatography, the purity of this compound was 99% or more (area ratio). When thermal analysis measurement was performed on this compound, the glass transition temperature was 264.9 ° C.
The obtained compound was confirmed to be the target compound from the following analysis results.
MS: (EI) m / z 608M +)
Elemental analysis values: measured values (C: 69.01%, H: 5.25%, N: 4.62%)
; Theoretical value (C: 69.07%, H: 5.30%, N: 4.60%)
Ames test: negative
(実施例2)
窒素雰囲気下、式(2)の化合物7.5g(0.02mol)をN,N-ジメチルホルムアミド(10g)に溶解し、さらにピリジン4.0g(0.05mol)を加え80℃に加熱した。この溶液に4−ニトロベンゾイルクロライド9.5g(0.05 mol)のN,N-ジメチルホルムアミド(14g)溶液を1時間要して滴下した。この反応混合物を120 ℃にて4時間撹拌した。この反応混合物に50℃で炭酸水素ナトリウム水溶液を滴下した後、室温まで冷却後、析出している固体を濾別し、水洗およびメタノール洗浄を行った。
この固体を60 ℃で14時間乾燥して化合物(1A―1)11.6gを白色の固体として得た(収率79.2%)。この化合物の純度は高速液体クロマトグラフィーの分析の結果、98.9%(面積比)であった。
(Example 2)
Under a nitrogen atmosphere, 7.5 g (0.02 mol) of the compound of formula (2) was dissolved in N, N-dimethylformamide (10 g), and 4.0 g (0.05 mol) of pyridine was further added and heated to 80 ° C. To this solution, a solution of 9.5 g (0.05 mol) of 4-nitrobenzoyl chloride in N, N-dimethylformamide (14 g) was added dropwise over 1 hour. The reaction mixture was stirred at 120 ° C. for 4 hours. To this reaction mixture, an aqueous sodium hydrogen carbonate solution was added dropwise at 50 ° C., and after cooling to room temperature, the precipitated solid was separated by filtration, washed with water and washed with methanol.
This solid was dried at 60 ° C. for 14 hours to obtain 11.6 g of Compound (1A-1) as a white solid (yield 79.2%). The purity of this compound was 98.9% (area ratio) as a result of analysis by high performance liquid chromatography.
(実施例3)
実施例1において、ピリジンを使用する代わりに、トリエチルアミン29.3g(0.29mol)を使用した以外は、実施例1に記載の操作に従い、化合物(1A―1)71.6gを得た(収率90.0%)。
この化合物の純度は、高速液体クロマトグラフィーの分析の結果、99%以上(面積比)であった。
(Example 3)
In Example 1, 71.6 g of Compound (1A-1) was obtained according to the procedure described in Example 1 except that 29.3 g (0.29 mol) of triethylamine was used instead of pyridine. (Rate 90.0%).
As a result of analysis by high performance liquid chromatography, the purity of this compound was 99% or more (area ratio).
(実施例4) 下記式(1B−1)で表される化合物の製造
実施例1で製造した化合物(1A−1)18.3g(0.03 mol)を90℃で加熱溶解させたN,N-ジメチルホルムアミド(260 ml)溶液を常圧下、水素ガス雰囲気下で5質量%パラジウム/アルミナを含むN,N-ジメチルホルムアミド(70 ml)溶液に撹拌下、75 ℃で2時間を要して加えた。さらに常圧下、水素ガス雰囲気下、75℃で1時間撹拌し、水素化を行った(この間に、反応混合物は、水素0.18 molを吸収した)。室温に冷却後反応混合物を濾過し、5質量%パラジウム/アルミナを濾別した後、濾液からN,N-ジメチルホルムアミドを減圧下で留去した。残渣に80 ℃で水を滴下した後、室温に冷却後、析出している固体を濾別し、水洗を行った。
この固体を60℃で14時間減圧乾燥して化合物(1B-1)16.2gを白色の固体として得た(収率98.0%)。この化合物の純度は高速液体クロマトグラフィーの分析の結果、99%以上(面積比)であった。この化合物について熱分析測定を行ったところ、ガラス転移温度は265.3℃であった。
得られた化合物は、下記の分析結果より目的の化合物であることを確認した。
・MS:(EI)m/z 548M+)
・元素分析値:実測値(C:76.58%、H:6.59%、N:5.14%)
;理論値(C:76.62%、H:6.61%、N:5.11%)
・Ames試験:陰性
(Example 4) Production of a compound represented by the following formula (1B-1)
An N, N-dimethylformamide (260 ml) solution in which 18.3 g (0.03 mol) of the compound (1A-1) produced in Example 1 was dissolved by heating at 90 ° C. was added under atmospheric pressure and a hydrogen gas atmosphere. The mixture was added to a N, N-dimethylformamide (70 ml) solution containing mass% palladium / alumina at 75 ° C. over 2 hours with stirring. Furthermore, hydrogenation was performed by stirring at 75 ° C. for 1 hour under normal pressure and hydrogen gas atmosphere (during this time, the reaction mixture absorbed 0.18 mol of hydrogen). After cooling to room temperature, the reaction mixture was filtered and 5 mass% palladium / alumina was filtered off, and then N, N-dimethylformamide was distilled off from the filtrate under reduced pressure. Water was added dropwise to the residue at 80 ° C., and after cooling to room temperature, the precipitated solid was separated by filtration and washed with water.
This solid was dried under reduced pressure at 60 ° C. for 14 hours to obtain 16.2 g of compound (1B-1) as a white solid (yield 98.0%). As a result of analysis by high performance liquid chromatography, the purity of this compound was 99% or more (area ratio). When this compound was subjected to thermal analysis measurement, the glass transition temperature was 265.3 ° C.
The obtained compound was confirmed to be the target compound from the following analysis results.
MS: (EI) m / z 548M +)
Elemental analysis values: measured values (C: 76.58%, H: 6.59%, N: 5.14%)
Theoretical value (C: 76.62%, H: 6.61%, N: 5.11%)
Ames test: negative
(実施例5) 下記式(1A−2)で表される化合物の製造
窒素雰囲気下、式(2)の化合物20.3g(0.065 mol)をメチルイソブチルケトン(230g)に溶解し、さらに、ピリジン11.4(0.145mol)を加え、105 ℃に加熱した。この溶液に3−ニトロベンゾイルクロライド26.7g(0.145 mol)のメチルイソブチルケトン(40g)溶液を1時間要して滴下した。この反応混合物を110℃4時間撹拌した。この反応混合物から、メチルイソブチルケトンを減圧下で留去し、残渣に50℃でメタノールを滴下した後、室温まで冷却後、析出している固体を濾別し、メタノール洗浄を行った。この固体を60℃で14時間乾燥して化合物(1A−2)38.6gを白色の固体として得た(収率96.9%)。
この化合物の純度は高速液体クロマトグラフィーの分析の結果、99%以上(面積比)であった。この化合物について熱分析測定を行ったところ、ガラス転移温度は212.2℃であった。得られた化合物は下記の分析結果より目的の化合物であることを確認した。
・MS:(EI)m/z 608M+)
・元素分析値:実測値(C:69.03%、H:5.27%、N:4.63%)
;理論値(C:69.07%、H:5.30%、N:4.60%)
・Ames試験:陰性
(Example 5) Production of a compound represented by the following formula (1A-2)
Under a nitrogen atmosphere, 20.3 g (0.065 mol) of the compound of formula (2) was dissolved in methyl isobutyl ketone (230 g), pyridine 11.4 (0.145 mol) was further added, and the mixture was heated to 105 ° C. To this solution, a solution of 26.7 g (0.145 mol) of 3-nitrobenzoyl chloride in methyl isobutyl ketone (40 g) was added dropwise over 1 hour. The reaction mixture was stirred at 110 ° C. for 4 hours. From this reaction mixture, methyl isobutyl ketone was distilled off under reduced pressure, methanol was added dropwise to the residue at 50 ° C., and the mixture was cooled to room temperature. The precipitated solid was filtered off and washed with methanol. This solid was dried at 60 ° C. for 14 hours to obtain 38.6 g of Compound (1A-2) as a white solid (yield 96.9%).
As a result of analysis by high performance liquid chromatography, the purity of this compound was 99% or more (area ratio). When this compound was subjected to thermal analysis measurement, the glass transition temperature was 212.2 ° C. The obtained compound was confirmed to be the target compound from the following analysis results.
MS: (EI) m / z 608M +)
Elemental analysis value: Actual measurement value (C: 69.03%, H: 5.27%, N: 4.63%)
; Theoretical value (C: 69.07%, H: 5.30%, N: 4.60%)
Ames test: negative
(実施例6) 下記式(1B−2)で表される化合物の製造
実施例5で製造した化合物(1A−2)18.3g(0.03 mol)を90 ℃で加熱溶解させたN,N-ジメチルホルムアミド(260ml)溶液を常圧下、水素ガス雰囲気下で5質量%パラジウム/アルミナを含むN,N-ジメチルホルムアミド(70 ml)溶液に撹拌下、75℃で2時間を要して加えた。さらに常圧下、水素ガス雰囲気下、75℃で1時間撹拌し、水素化を行った(この間に、反応混合物は、水素0.18 molを吸収した)。
室温に冷却後反応混合物を濾過し、5質量%パラジウム/アルミナを濾別した後、濾液からN,N-ジメチルホルムアミドを減圧下で留去した。残渣に80 ℃で水を滴下した後、室温に冷却後、析出している固体を濾別し、水洗を行った。この固体を60℃で14時間減圧乾燥して化合物(1B−2)15.9g を白色の固体として得た(収率96.0%)。
この化合物の純度は高速液体クロマトグラフィーの分析の結果、99%以上(面積比)であった。
この化合物について熱分析測定を行ったところ、ガラス転移温度は235.3℃であった。得られた化合物は、下記の分析結果より目的の化合物であることを確認した。
・MS:(EI)m/z 548M+)
・元素分析値:実測値(C:76.57%、H:6.57%、N:5.13%)
;理論値(C:76.62%、H:6.61%、N:5.11%)
Ames試験:陰性
(Example 6) Production of a compound represented by the following formula (1B-2)
5 mass of N, N-dimethylformamide (260 ml) solution obtained by dissolving 18.3 g (0.03 mol) of the compound (1A-2) produced in Example 5 with heating at 90 ° C. under normal pressure and hydrogen gas atmosphere. It was added to N, N-dimethylformamide (70 ml) solution containing% palladium / alumina at 75 ° C. over 2 hours with stirring. Further, hydrogenation was performed by stirring at 75 ° C. for 1 hour under a normal pressure and hydrogen gas atmosphere (during this time, the reaction mixture absorbed 0.18 mol of hydrogen).
After cooling to room temperature, the reaction mixture was filtered and 5 mass% palladium / alumina was filtered off, and then N, N-dimethylformamide was distilled off from the filtrate under reduced pressure. Water was added dropwise to the residue at 80 ° C., and after cooling to room temperature, the precipitated solid was separated by filtration and washed with water. This solid was dried under reduced pressure at 60 ° C. for 14 hours to obtain 15.9 g of Compound (1B-2) as a white solid (yield 96.0%).
The purity of this compound was 99% or more (area ratio) as a result of analysis by high performance liquid chromatography.
When this compound was subjected to thermal analysis measurement, the glass transition temperature was 235.3 ° C. The obtained compound was confirmed to be the target compound from the following analysis results.
MS: (EI) m / z 548M +)
Elemental analysis values: measured values (C: 76.57%, H: 6.57%, N: 5.13%)
Theoretical value (C: 76.62%, H: 6.61%, N: 5.11%)
Ames test: negative
本発明の化合物は、加工性(溶剤溶解性)、剛直性、耐熱性に優れた各種の機能性高分子材料の原料として有用であり、かつ変異原性陽性の面から安全性が高い。 The compound of the present invention is useful as a raw material for various functional polymer materials excellent in processability (solvent solubility), rigidity and heat resistance, and is highly safe from the viewpoint of positive mutagenicity.
Claims (3)
(式中、X1およびX2はそれぞれ独立に、ニトロ基またはアミノ基を表す。)
An ester compound represented by the general formula (1).
(In the formula, X 1 and X 2 each independently represent a nitro group or an amino group.)
(式中、Xはハロゲン原子を表す)
A method for producing a compound represented by the general formula (1A), comprising reacting a compound represented by the formula (2) and a compound represented by the general formula (3) in the presence of a base.
(Wherein X represents a halogen atom)
A process for producing a compound represented by the general formula (1B) comprising reacting a compound represented by the general formula (1A) and a hydrogen source in the presence of a catalyst.
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