JP2016017221A - Surface preparation agent - Google Patents
Surface preparation agent Download PDFInfo
- Publication number
- JP2016017221A JP2016017221A JP2014142359A JP2014142359A JP2016017221A JP 2016017221 A JP2016017221 A JP 2016017221A JP 2014142359 A JP2014142359 A JP 2014142359A JP 2014142359 A JP2014142359 A JP 2014142359A JP 2016017221 A JP2016017221 A JP 2016017221A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- propyl
- ethyl
- surface treatment
- imidazole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002360 preparation method Methods 0.000 title abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 46
- 239000002184 metal Substances 0.000 claims abstract description 46
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims description 34
- 239000012756 surface treatment agent Substances 0.000 claims description 24
- 150000001875 compounds Chemical class 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 23
- -1 imidazole silane compound Chemical class 0.000 abstract description 22
- 229920005989 resin Polymers 0.000 abstract description 16
- 239000011347 resin Substances 0.000 abstract description 16
- 239000011889 copper foil Substances 0.000 abstract description 13
- 239000003795 chemical substances by application Substances 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 7
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 abstract 1
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 26
- 239000000463 material Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 11
- KDHWOCLBMVSZPG-UHFFFAOYSA-N 3-imidazol-1-ylpropan-1-amine Chemical compound NCCCN1C=CN=C1 KDHWOCLBMVSZPG-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 8
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000002845 discoloration Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000007810 chemical reaction solvent Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
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- 238000004381 surface treatment Methods 0.000 description 4
- QKVROWZQJVDFSO-UHFFFAOYSA-N 2-(2-methylimidazol-1-yl)ethanamine Chemical compound CC1=NC=CN1CCN QKVROWZQJVDFSO-UHFFFAOYSA-N 0.000 description 3
- ZVHZLDXOWVXOEF-UHFFFAOYSA-N 2-(2-phenylimidazol-1-yl)ethanamine Chemical compound NCCN1C=CN=C1C1=CC=CC=C1 ZVHZLDXOWVXOEF-UHFFFAOYSA-N 0.000 description 3
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- RRRFYVICSDBPKH-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propan-1-amine Chemical compound CCC1=NC(C)=CN1CCCN RRRFYVICSDBPKH-UHFFFAOYSA-N 0.000 description 3
- NDUDHWBKFFJGMA-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propan-1-amine Chemical compound CC1=NC=CN1CCCN NDUDHWBKFFJGMA-UHFFFAOYSA-N 0.000 description 3
- WLRMVXCQYGCPLF-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propan-1-amine Chemical compound NCCCN1C=CN=C1C1=CC=CC=C1 WLRMVXCQYGCPLF-UHFFFAOYSA-N 0.000 description 3
- PSMMWJNCWZODLP-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propan-1-amine Chemical compound CCCCCCCCCCCC1=NC=CN1CCCN PSMMWJNCWZODLP-UHFFFAOYSA-N 0.000 description 3
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- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
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- 239000003960 organic solvent Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
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- 239000007864 aqueous solution Substances 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- SKEUQRXIPJNUQX-UHFFFAOYSA-N ethyl n-[2-(2-methylimidazol-1-yl)ethyl]carbamate Chemical compound CCOC(=O)NCCN1C=CN=C1C SKEUQRXIPJNUQX-UHFFFAOYSA-N 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- MIMXHUJTWSGFDR-UHFFFAOYSA-N methyl N-[3-(2-methylimidazol-1-yl)propyl]carbamate Chemical compound COC(NCCCN1C(=NC=C1)C)=O MIMXHUJTWSGFDR-UHFFFAOYSA-N 0.000 description 1
- AJWWIDFAKYMLTK-UHFFFAOYSA-N methyl n-[3-(2-phenylimidazol-1-yl)propyl]carbamate Chemical compound COC(=O)NCCCN1C=CN=C1C1=CC=CC=C1 AJWWIDFAKYMLTK-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- DISPOJHKKXSCLS-UHFFFAOYSA-N n-diaminophosphorylmethanamine Chemical compound CNP(N)(N)=O DISPOJHKKXSCLS-UHFFFAOYSA-N 0.000 description 1
- DVYVMJLSUSGYMH-UHFFFAOYSA-N n-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CNCCC[Si](OC)(OC)OC DVYVMJLSUSGYMH-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
本発明は、金属の表面処理剤に関する。 The present invention relates to a metal surface treatment agent.
近年、プリント配線板は、電子機器・電子部品の小型化、薄型化等に対応すべく多層化が進められており、所謂多層プリント配線板は、片面または両面に銅箔等からなる回路を設けた内層用の回路板に、プリプレグを介して外層用回路板もしくは銅箔を重ね、これを一体化することによって製造されている。
これらの過程では、基材との接着、加熱、酸やアルカリ液への浸漬、レジストインクの塗布等が行われるため、銅箔には耐熱性や耐湿性の他に、樹脂との接着性、耐薬品性等が要求されている。
In recent years, printed wiring boards have been multi-layered to cope with the downsizing and thinning of electronic devices and electronic components. So-called multilayer printed wiring boards are provided with a circuit made of copper foil or the like on one or both sides. In addition, an outer layer circuit board or a copper foil is laminated on an inner layer circuit board via a prepreg, and these are integrated.
In these processes, adhesion to the base material, heating, immersion in acid or alkaline liquid, application of resist ink, etc. are performed, so copper foil has heat resistance and moisture resistance, as well as adhesion to resin, Chemical resistance is required.
特許文献1には、イミダゾール環を有する特定のシラン化合物が金属表面に対し優れた防錆作用を発揮するとともに、金属と樹脂基板との接着性を向上させる点が開示されている。しかしながら、未だ満足すべき接着性が得られていない。 Patent Document 1 discloses that a specific silane compound having an imidazole ring exhibits an excellent rust preventive action on the metal surface and improves the adhesion between the metal and the resin substrate. However, satisfactory adhesiveness has not yet been obtained.
本発明は、金属表面の耐熱性および耐湿性を高め、金属と樹脂との接着性を向上させることができる金属の表面処理剤を提供することを目的とする。 An object of the present invention is to provide a metal surface treatment agent that can improve the heat resistance and moisture resistance of a metal surface and improve the adhesion between the metal and the resin.
本発明者は、前記の課題を解決するために鋭意研究を重ねた結果、ある種のイミダゾールシラン化合物が、金属表面に対し優れた耐熱性および耐湿性を付与するとともに、金属と樹脂との接着性を向上させることを見出し、本発明を完成するに至ったものである。 As a result of intensive studies in order to solve the above-mentioned problems, the present inventor has provided a certain kind of imidazole silane compound with excellent heat resistance and moisture resistance on the metal surface and adhesion between the metal and the resin. The present inventors have found that the property is improved and have completed the present invention.
即ち、第1の発明は、化学式(I)で示されるイミダゾールシラン化合物を成分とする金属の表面処理剤である。 That is, the first invention is a metal surface treatment agent comprising an imidazolesilane compound represented by the chemical formula (I) as a component.
本発明によれば、金属表面の耐熱性および耐湿性を高め、金属と樹脂との接着性を向上させることができる。 ADVANTAGE OF THE INVENTION According to this invention, the heat resistance of a metal surface and moisture resistance can be improved, and the adhesiveness of a metal and resin can be improved.
以下、本発明について詳細に説明する。
本発明の金属の表面処理剤は、前記化学式(I)で示されるイミダゾールシラン化合物を成分とするものである。
Hereinafter, the present invention will be described in detail.
The metal surface treatment agent of the present invention comprises an imidazole silane compound represented by the above chemical formula (I) as a component.
前記のイミダゾールシラン化合物が合成される工程を、各々反応スキーム(A)および反応スキーム(B)に示す。 The steps for synthesizing the imidazole silane compound are shown in Reaction Scheme (A) and Reaction Scheme (B), respectively.
反応スキーム(A):化学式(IIa)で示されるイミダゾールカーバメート化合物と、化学式(IIIa)で示される3−アミノプロピルシラン化合物を反応させることにより、化学式(I)で示される本発明のイミダゾールシラン化合物が生成する。 Reaction scheme (A): The imidazole silane compound of the present invention represented by the chemical formula (I) by reacting the imidazole carbamate compound represented by the chemical formula (IIa) with the 3-aminopropylsilane compound represented by the chemical formula (IIIa). Produces.
前記のイミダゾールカーバメート化合物と、3−アミノプロピルシラン化合物との反応温度は、50〜250℃とすることが好ましく、同反応時間は、設定した反応温度に応じて適宜決定されるが、30分〜48時間の範囲が好ましい。
この反応は化学量論的に進行するが、反応温度、反応時間、反応溶媒の種類や使用量、反応スケール等の条件に応じて、イミダゾールカーバメート化合物の使用量(仕込量)を、3−アミノプロピルシラン化合物に対して、0.1〜10倍モルの範囲における適宜の割合とすることができる。
The reaction temperature between the imidazole carbamate compound and the 3-aminopropylsilane compound is preferably 50 to 250 ° C., and the reaction time is appropriately determined according to the set reaction temperature, but 30 minutes to A range of 48 hours is preferred.
This reaction proceeds stoichiometrically, but depending on the conditions such as reaction temperature, reaction time, type and amount of reaction solvent used, reaction scale, etc., the amount of imidazole carbamate compound used (amount charged) was changed to 3-amino It can be set as the appropriate ratio in the range of 0.1-10 times mole with respect to a propylsilane compound.
また、この反応においては、反応溶媒として、メタノール、エタノール、プロパノール、テトラヒドロフラン、ジオキサン、酢酸エチル、アセトニトリル、ベンゼン、トルエン、キシレン、ジクロロメタン、クロロホルム、四塩化炭素、ジメチルホルムアミド、ジメチルアセトアミド、ジメチルスルホキシド、ヘキサメチルリン酸トリアミド等から選択される適宜の溶剤を、適宜量使用すればよい。なお、反応溶媒として使用される溶剤は1種類を単独で使用してもよく、必要に応じて、種類の異なる溶剤を組み合わせて使用してもよい。 In this reaction, as a reaction solvent, methanol, ethanol, propanol, tetrahydrofuran, dioxane, ethyl acetate, acetonitrile, benzene, toluene, xylene, dichloromethane, chloroform, carbon tetrachloride, dimethylformamide, dimethylacetamide, dimethylsulfoxide, hexa An appropriate amount of an appropriate solvent selected from methylphosphoric triamide and the like may be used. In addition, the solvent used as a reaction solvent may be used individually by 1 type, and may use it combining a solvent from which a kind differs as needed.
反応スキーム(B):化学式(IIb)で示される1−アミノアルキルイミダゾール化合物と、化学式(IIIb)で示される3−イソシアナトプロピルシラン化合物を反応させることにより、化学式(I´)で示される本発明のイミダゾールシラン化合物が生成する。
なお、化学式(I´)は、R5を水素原子に特定した化学式(I)と等価である。
Reaction scheme (B): A reaction represented by the chemical formula (I ′) by reacting the 1-aminoalkylimidazole compound represented by the chemical formula (IIb) with the 3-isocyanatopropylsilane compound represented by the chemical formula (IIIb). The imidazole silane compound of the invention is formed.
The chemical formula (I ′) is equivalent to the chemical formula (I) in which R 5 is specified as a hydrogen atom.
前記の1−アミノアルキルイミダゾール化合物と、3−イソシアナトプロピルシラン化合物との反応温度は、−20〜80℃とすることが好ましく、同反応時間は、設定した反応温度に応じて適宜決定されるが、15分〜12時間の範囲が好ましい。
この反応も、反応スキーム(A)に示した反応と同様に化学量論的に進行するが、前記と同様の事情により、1−アミノアルキルイミダゾール化合物の使用量(仕込量)を、3−イソシアナトプロピルシラン化合物に対して、0.1〜10倍モルの範囲における適宜の割合とすることができる。
The reaction temperature between the 1-aminoalkylimidazole compound and the 3-isocyanatopropylsilane compound is preferably -20 to 80 ° C., and the reaction time is appropriately determined according to the set reaction temperature. However, the range of 15 minutes to 12 hours is preferable.
This reaction also proceeds stoichiometrically in the same manner as the reaction shown in Reaction Scheme (A). However, for the same reason as described above, the amount of 1-aminoalkylimidazole compound used (charge amount) was changed to 3-isocyanate. It can be set as the appropriate ratio in the range of 0.1-10 times mole with respect to a natopropylsilane compound.
また、この反応は、無溶媒で行われてもよく、反応スキーム(A)に示した反応の場合と同様の溶剤を反応溶媒として使用して行われてもよい。 In addition, this reaction may be performed without a solvent, or may be performed using the same solvent as the reaction solvent shown in the reaction scheme (A) as a reaction solvent.
本願の特許請求の範囲および明細書に現れる化学式中、R1〜R5およびR8が採用し得る炭素数1〜炭素数20のアルキル基とは、
メチル、エチル、プロピル、ブチル、ペンチル、ヘキシル、ヘプチル、オクチル、ノニル、デシル、ウンデシル、ドデシル、トリデシル、テトラデシル、ペンタデシル、ヘキサデシル、ヘプタデシル、オクタデシル、ノナデシル、イコシル等の飽和炭化水素の基を表す。
In the chemical formulas appearing in the claims and specification of the present application, the alkyl group having 1 to 20 carbon atoms that can be adopted by R 1 to R 5 and R 8 is
Represents a saturated hydrocarbon group such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecyl, icosyl.
また、R6およびR7が採用し得る炭素数1〜炭素数3のアルキル基とは、
メチル、エチル、プロピル等の飽和炭化水素の基を表す。
Further, the alkyl group of R 6 and R 7 carbon number 1 to 3 carbon atoms which may be employed,
Represents a saturated hydrocarbon group such as methyl, ethyl, propyl and the like.
化学式(IIa)で示されるイミダゾールカーバメート化合物としては、
1−メトキシカルボニルアミノメチルイミダゾール、
1−(2−メトキシカルボニルアミノエチル)−2−メチルイミダゾール、
1−(2−エトキシカルボニルアミノエチル)−2−メチルイミダゾール、
1−(2−プロポキシカルボニルアミノエチル)−2−メチルイミダゾール、
1−(2−ブトキシカルボニルアミノエチル)−2−メチルイミダゾール、
1−(2−フェノキシカルボニルアミノエチル)−2−メチルイミダゾール、
1−(3−メトキシカルボニルアミノプロピル)−2−メチルイミダゾール、
1−(3−エトキシカルボニルアミノプロピル)−2−メチルイミダゾール、
1−(3−プロポキシカルボニルアミノプロピル)−2−メチルイミダゾール、
1−(3−ブトキシカルボニルアミノプロピル)−2−メチルイミダゾール、
1−(3−フェノキシカルボニルアミノプロピル)−2−メチルイミダゾール、
1−(2−メトキシカルボニルアミノエチル)−2−フェニルイミダゾール、
1−(3−メトキシカルボニルアミノプロピル)−2−フェニルイミダゾール、
1−(3−メトキシカルボニルアミノプロピル)−2−エチル−4−メチルイミダゾール、
1−(3−メトキシカルボニルアミノプロピル)−2−フェニル−4−メチルイミダゾール、
1−(3−メトキシカルボニルアミノプロピル)−2−ウンデシルイミダゾール等が挙げられる。
As an imidazole carbamate compound represented by the chemical formula (IIa),
1-methoxycarbonylaminomethylimidazole,
1- (2-methoxycarbonylaminoethyl) -2-methylimidazole,
1- (2-ethoxycarbonylaminoethyl) -2-methylimidazole,
1- (2-propoxycarbonylaminoethyl) -2-methylimidazole,
1- (2-butoxycarbonylaminoethyl) -2-methylimidazole,
1- (2-phenoxycarbonylaminoethyl) -2-methylimidazole,
1- (3-methoxycarbonylaminopropyl) -2-methylimidazole,
1- (3-ethoxycarbonylaminopropyl) -2-methylimidazole,
1- (3-propoxycarbonylaminopropyl) -2-methylimidazole,
1- (3-butoxycarbonylaminopropyl) -2-methylimidazole,
1- (3-phenoxycarbonylaminopropyl) -2-methylimidazole,
1- (2-methoxycarbonylaminoethyl) -2-phenylimidazole,
1- (3-methoxycarbonylaminopropyl) -2-phenylimidazole,
1- (3-methoxycarbonylaminopropyl) -2-ethyl-4-methylimidazole,
1- (3-methoxycarbonylaminopropyl) -2-phenyl-4-methylimidazole,
1- (3-methoxycarbonylaminopropyl) -2-undecylimidazole and the like can be mentioned.
化学式(IIIa)で示される3−アミノプロピルシラン化合物としては、
3−アミノプロピルトリメトキシシラン、
3−アミノプロピルトリエトキシシラン、
3−アミノプロピルトリプロポキシシラン、
N−メチル−3−アミノプロピルトリメトキシシラン、
N−フェニル−3−アミノプロピルトリメトキシシラン、
3−アミノプロピルジメトキシメチルシラン、
3−アミノプロピルメトキシジメチルシラン等が挙げられる。
As the 3-aminopropylsilane compound represented by the chemical formula (IIIa),
3-aminopropyltrimethoxysilane,
3-aminopropyltriethoxysilane,
3-aminopropyltripropoxysilane,
N-methyl-3-aminopropyltrimethoxysilane,
N-phenyl-3-aminopropyltrimethoxysilane,
3-aminopropyldimethoxymethylsilane,
Examples include 3-aminopropylmethoxydimethylsilane.
化学式(IIb)で示される1−アミノアルキルイミダゾール化合物としては、
1−(2−アミノエチル)イミダゾール、
1−(3−アミノプロピル)イミダゾール、
1−(2−アミノエチル)−2−メチルイミダゾール、
1−(3−アミノプロピル)−2−メチルイミダゾール、
1−(2−アミノエチル)−2−フェニルイミダゾール、
1−(3−アミノプロピル)−2−フェニルイミダゾール、
1−(3−アミノプロピル)−2−ウンデシルイミダゾール、
1−(3−アミノプロピル)−2−エチル−4−メチルイミダゾール、
1−[2−(メチルアミノ)エチル]−2−フェニルイミダゾール等が挙げられる。
As the 1-aminoalkylimidazole compound represented by the chemical formula (IIb),
1- (2-aminoethyl) imidazole,
1- (3-aminopropyl) imidazole,
1- (2-aminoethyl) -2-methylimidazole,
1- (3-aminopropyl) -2-methylimidazole,
1- (2-aminoethyl) -2-phenylimidazole,
1- (3-aminopropyl) -2-phenylimidazole,
1- (3-aminopropyl) -2-undecylimidazole,
1- (3-aminopropyl) -2-ethyl-4-methylimidazole,
Examples include 1- [2- (methylamino) ethyl] -2-phenylimidazole.
化学式(IIIb)で示される3−イソシアナトプロピルシラン化合物としては、
3−イソシアナトプロピルトリメトキシシラン、
3−イソシアナトプロピルトリエトキシシラン、
3−イソシアナトプロピルトリプロポキシシラン、
3−イソシアナトプロピルジメトキシメチルシラン、
3−イソシアナトプロピルメトキシジメチルシラン等が挙げられる。
As the 3-isocyanatopropylsilane compound represented by the chemical formula (IIIb),
3-isocyanatopropyltrimethoxysilane,
3-isocyanatopropyltriethoxysilane,
3-isocyanatopropyl tripropoxysilane,
3-isocyanatopropyldimethoxymethylsilane,
3-isocyanatopropylmethoxydimethylsilane etc. are mentioned.
本発明の化学式(I)で示されるイミダゾールシラン化合物としては、
1−[3−(イミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[2−(2−メチルイミダゾール−1−イル)エチル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[3−(2−メチルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[2−(2−メチルイミダゾール−1−イル)エチル]−3−[3−(トリエトキシシリル)プロピル]ウレア、
1−[3−(2−メチルイミダゾール−1−イル)プロピル]−3−[3−(トリエトキシシリル)プロピル]ウレア、
1−[2−(2−メチルイミダゾール−1−イル)エチル]−3−[3−(ジメトキシメチルシリル)プロピル]ウレア、
1−[2−(2−メチルイミダゾール−1−イル)エチル]−1−メチル−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[2−(2−メチルイミダゾール−1−イル)エチル]−3−フェニル−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[2−(2−エチル−4−メチルイミダゾール−1−イル)エチル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[3−(2−エチル−4−メチルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[2−(2−ウンデシルイミダゾール−1−イル)エチル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[3−(2−ウンデシルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[2−(2−フェニルイミダゾール−1−イル)エチル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[3−(2−フェニルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア、
1−[2−(2−フェニルイミダゾール−1−イル)エチル]−1−メチル−3−[3−(トリメトキシシリル)プロピル]ウレア等が挙げられる。
As the imidazolesilane compound represented by the chemical formula (I) of the present invention,
1- [3- (imidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [2- (2-methylimidazol-1-yl) ethyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [3- (2-methylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [2- (2-methylimidazol-1-yl) ethyl] -3- [3- (triethoxysilyl) propyl] urea,
1- [3- (2-methylimidazol-1-yl) propyl] -3- [3- (triethoxysilyl) propyl] urea,
1- [2- (2-methylimidazol-1-yl) ethyl] -3- [3- (dimethoxymethylsilyl) propyl] urea,
1- [2- (2-methylimidazol-1-yl) ethyl] -1-methyl-3- [3- (trimethoxysilyl) propyl] urea,
1- [2- (2-methylimidazol-1-yl) ethyl] -3-phenyl-3- [3- (trimethoxysilyl) propyl] urea,
1- [2- (2-ethyl-4-methylimidazol-1-yl) ethyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [3- (2-ethyl-4-methylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [2- (2-undecylimidazol-1-yl) ethyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [3- (2-undecylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [2- (2-phenylimidazol-1-yl) ethyl] -3- [3- (trimethoxysilyl) propyl] urea,
1- [3- (2-phenylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea,
Examples include 1- [2- (2-phenylimidazol-1-yl) ethyl] -1-methyl-3- [3- (trimethoxysilyl) propyl] urea.
本発明の金属の表面処理剤は、前述のイミダゾールシラン化合物と、水を混合することにより調製されるが、水と有機溶剤の混合液と混合してもよい。
また、当該イミダゾールシラン化合物を水と混合した後、水を留去し、続いて、有機溶剤と混合して表面処理剤を調製してもよい。
当該イミダゾールシラン化合物は、1種または2種以上を組み合わせて使用することができる。
The metal surface treatment agent of the present invention is prepared by mixing the above-mentioned imidazolesilane compound and water, but may be mixed with a mixed solution of water and an organic solvent.
Moreover, after mixing the said imidazolesilane compound with water, water may be distilled off and it may mix with an organic solvent and may prepare a surface treating agent.
The said imidazole silane compound can be used 1 type or in combination of 2 or more types.
この表面処理剤の調製に使用される有機溶剤としては、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、プロピレングリコール、グリセリン、ジエチレングリコール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、アセトン、テトラヒドロフラン、ジオキサンの他、アセトニトリル、ジメチルホルムアミド、ジメチルアセトアミド、ジメチルスルホキシド等を例示することができ、これらから選択される1種または2種以上を使用することができる。 Organic solvents used for the preparation of this surface treatment agent include methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, glycerin, diethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene Examples include glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, acetone, tetrahydrofuran, dioxane, acetonitrile, dimethylformamide, dimethylacetamide, dimethyl sulfoxide, etc. It is possible, it is possible to use one or two or more selected from these.
本発明の表面処理剤中におけるイミダゾールシラン化合物の濃度は、0.001〜20重量%の範囲であることが好ましい。
該イミダゾールシラン化合物の濃度が0.001重量%未満の場合、金属の耐熱性、耐湿性および接着性の向上効果が十分に得られない虞があり、20重量%を超える場合には、金属の耐熱性、耐湿性および接着性の向上効果がほぼ頭打ちとなり、イミダゾールシラン化合物の使用量が増えるばかりで経済的ではない。
The concentration of the imidazole silane compound in the surface treatment agent of the present invention is preferably in the range of 0.001 to 20% by weight.
When the concentration of the imidazole silane compound is less than 0.001% by weight, the effect of improving the heat resistance, moisture resistance and adhesion of the metal may not be sufficiently obtained. When the concentration exceeds 20% by weight, The effect of improving heat resistance, moisture resistance and adhesiveness has almost reached its peak, and only the amount of imidazolesilane compound used is increased, which is not economical.
当該表面処理剤には、本発明の効果を損なわない限りにおいて、必要により公知の防錆剤あるいはカップリング剤等を加えてもよい。 As long as the effect of the present invention is not impaired, a known rust preventive or coupling agent may be added to the surface treatment agent as necessary.
当該表面処理剤を金属の表面に接触させる方法としては、特に制限はなく、浸漬、塗布、スプレー等の手段を採用することができる。
当該表面処理剤と金属を接触させる時間(処理時間)については、1秒〜10分とすることが好ましい。処理時間が1秒未満の場合には、金属の表面に形成される化成皮膜の膜厚が薄くなり、金属の耐熱性、耐湿性および金属と樹脂との接着力が十分に得られない虞がある。一方、処理時間が10分を超えた場合には、金属の表面に形成される化成皮膜の膜厚に大差はなく、金属の耐熱性、耐湿性および金属と樹脂との接着性の向上効果もほぼ頭打ちとなる。
また、表面処理剤を金属の表面に接触させる際の表面処理剤の温度については、5〜50℃とすることが好ましいが、前記の処理時間との関係において、適宜設定すればよい。
There is no restriction | limiting in particular as a method of making the said surface treating agent contact the surface of a metal, Means, such as immersion, application | coating, a spray, are employable.
The time (treatment time) for bringing the surface treatment agent into contact with the metal is preferably 1 second to 10 minutes. When the treatment time is less than 1 second, the film thickness of the chemical conversion film formed on the surface of the metal becomes thin, and there is a possibility that the heat resistance and moisture resistance of the metal and the adhesive force between the metal and the resin cannot be obtained sufficiently. is there. On the other hand, when the treatment time exceeds 10 minutes, there is no great difference in the film thickness of the chemical conversion film formed on the surface of the metal, and the effect of improving the heat resistance, moisture resistance and adhesion between the metal and the resin is also achieved. Almost reaches the peak.
Moreover, about the temperature of the surface treating agent at the time of making a surface treating agent contact the metal surface, it is preferable to set it as 5-50 degreeC, However, What is necessary is just to set suitably in relation to the said processing time.
当該表面処理剤により処理される金属に特に制限はなく、例えば、銅、亜鉛、錫、アルミニウム、チタン、ニッケル、鉄、銀、金等の金属やそれらの合金を挙げることができるが、該表面処理剤は銅または銅合金の表面処理に好適である。 There are no particular limitations on the metal to be treated with the surface treatment agent, and examples thereof include metals such as copper, zinc, tin, aluminum, titanium, nickel, iron, silver, and gold, and alloys thereof. The treating agent is suitable for surface treatment of copper or copper alloy.
以下、本発明を実施例および比較例によって具体的に説明するが、本発明はこれらに限定されるものではない。なお、実施例に使用したイミダゾールシラン化合物の合成例を参考例1〜8に示す。また、これらの合成に使用した主な原料は以下のとおりである。
[主原料]
・1−(3−アミノプロピル)イミダゾール:東京化成工業社製
・1−(2−アミノエチル)−2−メチルイミダゾール:「Organic Syntheses, Vol 27, 18(1947)」に記載の方法に準拠して合成した。
・1−(3−アミノプロピル)−2−メチルイミダゾール:「特開2010−126464号公報」に記載の方法に準拠して合成した。
・1−(3−アミノプロピル)−2−エチル−4−メチルイミダゾール:同上
・1−(3−アミノプロピル)−2−ウンデシルイミダゾール:同上
・1−(2−アミノエチル)−2−フェニルイミダゾール:同上
・1−(3−アミノプロピル)−2−フェニルイミダゾール:同上
・1−[2−(メチルアミノ)エチル]−2−フェニルイミダゾール:「国際公開第2005/123066号パンフレット」に記載の方法に準拠して合成した。
・3−イソシアナトプロピルトリメトキシシラン:モメンティブ社製
EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention concretely, this invention is not limited to these. In addition, the synthesis example of the imidazole silane compound used for the Example is shown in Reference Examples 1-8. The main raw materials used for these syntheses are as follows.
[Main ingredients]
1- (3-aminopropyl) imidazole: manufactured by Tokyo Chemical Industry Co., Ltd. 1- (2-aminoethyl) -2-methylimidazole: conforms to the method described in “Organic Syntheses, Vol 27, 18 (1947)”. And synthesized.
1- (3-aminopropyl) -2-methylimidazole: synthesized according to the method described in “JP 2010-126464 A”.
1- (3-aminopropyl) -2-ethyl-4-methylimidazole: same as above 1- (3-aminopropyl) -2-undecylimidazole: same as above 1- (2-aminoethyl) -2-phenyl Imidazole: Same as above. 1- (3-Aminopropyl) -2-phenylimidazole: Same as above. 1- [2- (Methylamino) ethyl] -2-phenylimidazole: As described in “International Publication No. 2005/123066 pamphlet” Synthesized according to the method.
・ 3-isocyanatopropyltrimethoxysilane: manufactured by Momentive
[参考例1]
<1−[3−(イミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−1」と略記する)の合成>
1−(3−アミノプロピル)イミダゾール1.26g(10.0mmol)をトルエン20mlに溶解させ、40℃以下に保ちながら、3−イソシアナトプロピルトリメトキシシラン2.06g(10.0mmol)を滴下した。
次いで、反応液を室温にて1時間撹拌し、続いて、揮発分を留去して、淡黄色粘性液体として、化学式(I−1)で示される標題のイミダゾールシラン化合物3.31g(10.0mmol、収率:100%)を得た。
[Reference Example 1]
<Synthesis of 1- [3- (imidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-1”)>
1.26 g (10.0 mmol) of 1- (3-aminopropyl) imidazole was dissolved in 20 ml of toluene, and 2.06 g (10.0 mmol) of 3-isocyanatopropyltrimethoxysilane was added dropwise while keeping the temperature at 40 ° C. or lower. .
Then, the reaction solution was stirred at room temperature for 1 hour, and then volatile components were distilled off to obtain 3.31 g (10.10 g) of the title imidazolesilane compound represented by the chemical formula (I-1) as a pale yellow viscous liquid. 0 mmol, yield: 100%).
[参考例2]
<1−[2−(2−メチルイミダゾール−1−イル)エチル]−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−2」と略記する)の合成>
1−(3−アミノプロピル)イミダゾールの代わりに、1−(2−アミノエチル)−2−メチルイミダゾール1.26g(10.0mmol)を使用した以外は、参考例1と同様の操作を行って、淡黄色粘性液体として、化学式(I−2)で示される標題のイミダゾールシラン化合物3.31g(10.0mmol、収率:100%)を得た。
[Reference Example 2]
<Synthesis of 1- [2- (2-methylimidazol-1-yl) ethyl] -3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-2”)>
The same operation as in Reference Example 1 was performed except that 1.26 g (10.0 mmol) of 1- (2-aminoethyl) -2-methylimidazole was used instead of 1- (3-aminopropyl) imidazole. As a pale yellow viscous liquid, 3.31 g (10.0 mmol, yield: 100%) of the title imidazolesilane compound represented by the chemical formula (I-2) was obtained.
[参考例3]
<1−[3−(2−メチルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−3」と略記する)の合成>
1−(3−アミノプロピル)イミダゾールの代わりに、1−(3−アミノプロピル)−2−メチルイミダゾール1.40g(10.0mmol)を使用した以外は、参考例1と同様の操作を行って、淡黄色粘性液体として、化学式(I−3)で示される標題のイミダゾールシラン化合物3.45g(10.0mmol、収率:100%)を得た。
[Reference Example 3]
<Synthesis of 1- [3- (2-methylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-3”)>
The same operation as in Reference Example 1 was performed except that 1.40 g (10.0 mmol) of 1- (3-aminopropyl) -2-methylimidazole was used instead of 1- (3-aminopropyl) imidazole. As a pale yellow viscous liquid, 3.45 g (10.0 mmol, yield: 100%) of the title imidazolesilane compound represented by the chemical formula (I-3) was obtained.
[参考例4]
<1−[3−(2−エチル−4−メチルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−4」と略記する)の合成>
1−(3−アミノプロピル)イミダゾールの代わりに、1−(3−アミノプロピル)−2−エチル−4−メチルイミダゾール1.68g(10.0mmol)を使用した以外は、参考例1と同様の操作を行って、淡黄色粘性液体として、化学式(I−4)で示される標題のイミダゾールシラン化合物3.73g(10.0mmol、収率:100%)を得た。
[Reference Example 4]
<Synthesis of 1- [3- (2-ethyl-4-methylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-4”)>
The same as Reference Example 1 except that 1.68 g (10.0 mmol) of 1- (3-aminopropyl) -2-ethyl-4-methylimidazole was used instead of 1- (3-aminopropyl) imidazole. The operation was performed to obtain 3.73 g (10.0 mmol, yield: 100%) of the title imidazolesilane compound represented by the chemical formula (I-4) as a pale yellow viscous liquid.
[参考例5]
<1−[3−(2−ウンデシルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−5」と略記する)の合成>
1−(3−アミノプロピル)イミダゾールの代わりに、1−(3−アミノプロピル)−2−ウンデシルイミダゾール2.80g(10.0mmol)を使用した以外は、参考例1と同様の操作を行って、淡黄色粘性液体として、化学式(I−5)で示される標題のイミダゾールシラン化合物4.85g(10.0mmol、収率:100%)を得た。
[Reference Example 5]
<Synthesis of 1- [3- (2-undecylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-5”)>
The same operation as in Reference Example 1 was performed except that 2.80 g (10.0 mmol) of 1- (3-aminopropyl) -2-undecylimidazole was used instead of 1- (3-aminopropyl) imidazole. Thus, 4.85 g (10.0 mmol, yield: 100%) of the title imidazolesilane compound represented by the chemical formula (I-5) was obtained as a pale yellow viscous liquid.
[参考例6]
<1−[2−(2−フェニルイミダゾール−1−イル)エチル]−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−6」と略記する)の合成>
1−(3−アミノプロピル)イミダゾールの代わりに、1−(2−アミノエチル)−2−フェニルイミダゾール1.88g(10.0mmol)を使用した以外は、参考例1と同様の操作を行って、淡黄色粘性液体として、化学式(I−6)で示される標題のイミダゾールシラン化合物3.93g(10.0mmol、収率:100%)を得た。
[Reference Example 6]
<Synthesis of 1- [2- (2-phenylimidazol-1-yl) ethyl] -3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-6”)>
The same operation as in Reference Example 1 was performed except that 1.88 g (10.0 mmol) of 1- (2-aminoethyl) -2-phenylimidazole was used instead of 1- (3-aminopropyl) imidazole. As a pale yellow viscous liquid, 3.93 g (10.0 mmol, yield: 100%) of the title imidazolesilane compound represented by the chemical formula (I-6) was obtained.
[参考例7]
<1−[3−(2−フェニルイミダゾール−1−イル)プロピル]−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−7」と略記する)の合成>
1−(3−アミノプロピル)イミダゾールの代わりに、1−(3−アミノプロピル)−2−フェニルイミダゾール2.02g(10.0mmol)を使用した以外は、参考例1と同様の操作を行って、淡黄色粘性液体として、化学式(I−7)で示される標題のイミダゾールシラン化合物4.07g(10.0mmol、収率:100%)を得た。
[Reference Example 7]
<Synthesis of 1- [3- (2-phenylimidazol-1-yl) propyl] -3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-7”)>
The same operation as in Reference Example 1 was performed except that 2.02 g (10.0 mmol) of 1- (3-aminopropyl) -2-phenylimidazole was used instead of 1- (3-aminopropyl) imidazole. As a pale yellow viscous liquid, 4.07 g (10.0 mmol, yield: 100%) of the title imidazolesilane compound represented by the chemical formula (I-7) was obtained.
[参考例8]
<1−[2−(2−フェニルイミダゾール−1−イル)エチル]−1−メチル−3−[3−(トリメトキシシリル)プロピル]ウレア(「IMZS−8」と略記する)の合成>
1−(3−アミノプロピル)イミダゾールの代わりに、1−[2−(メチルアミノ)エチル]−2−フェニルイミダゾール2.01g(10.0mmol)を使用した以外は、参考例1と同様の操作を行って、淡黄色粘性液体として、化学式(I−8)で示される標題のイミダゾールシラン化合物4.07g(10.0mmol、収率:100%)を得た。
[Reference Example 8]
<Synthesis of 1- [2- (2-phenylimidazol-1-yl) ethyl] -1-methyl-3- [3- (trimethoxysilyl) propyl] urea (abbreviated as “IMZS-8”)>
The same operation as in Reference Example 1 except that 2.01 g (10.0 mmol) of 1- [2- (methylamino) ethyl] -2-phenylimidazole was used instead of 1- (3-aminopropyl) imidazole. To obtain 4.07 g (10.0 mmol, yield: 100%) of the title imidazolesilane compound represented by the chemical formula (I-8) as a pale yellow viscous liquid.
比較例で使用したシラン化合物は、以下のとおりである。
・3−グリシドキシプロピルトリメトキシシラン:信越化学工業社製、商品名「KBM−403」、以下、「エポキシシラン」と略記する。
・3−アミノプロピルトリメトキシシラン:信越化学工業社製、商品名「KBM−903」、以下、「アミノシラン」と略記する。
The silane compounds used in the comparative examples are as follows.
3-glycidoxypropyltrimethoxysilane: manufactured by Shin-Etsu Chemical Co., Ltd., trade name “KBM-403”, hereinafter abbreviated as “epoxysilane”.
3-Aminopropyltrimethoxysilane: manufactured by Shin-Etsu Chemical Co., Ltd., trade name “KBM-903”, hereinafter abbreviated as “aminosilane”.
また、実施例および比較例で採用した評価試験方法は、以下のとおりである。 Moreover, the evaluation test methods employed in the examples and comparative examples are as follows.
[試験片]
45mm×45mmの電解銅箔(厚さ75μm)をアセトンで脱脂し、3%の硫酸水溶液で洗浄した。この銅箔のシャイニー面に、金属の表面処理剤をスピンコーターで塗布し、厚さ0.3μmの化成皮膜を形成し、これを耐熱性試験および耐湿性試験の試験片とした。
[Test pieces]
A 45 mm × 45 mm electrolytic copper foil (thickness 75 μm) was degreased with acetone and washed with a 3% sulfuric acid aqueous solution. A metal surface treatment agent was applied to the shiny surface of the copper foil with a spin coater to form a chemical conversion film having a thickness of 0.3 μm, which was used as a test piece for a heat resistance test and a moisture resistance test.
[耐熱性試験]
試験片をそれぞれ、180℃、200℃、220℃、240℃の温度の恒温槽内に30分間放置した後、銅表面の変色度合を目視観察した。
銅表面の耐熱性を下記評価基準により評価した。変色の度合が低い程、化成皮膜の耐熱性、即ち銅表面の耐熱性が優れていると判定される。
<評価基準>
5:変色がない
4:わずかに変色している
3:少し変色している
2:橙色または黄色に変色している
1:黒褐色に変色している
[Heat resistance test]
The test pieces were left in a thermostatic bath at temperatures of 180 ° C., 200 ° C., 220 ° C., and 240 ° C. for 30 minutes, respectively, and the degree of discoloration on the copper surface was visually observed.
The heat resistance of the copper surface was evaluated according to the following evaluation criteria. The lower the degree of discoloration, the better the heat resistance of the chemical conversion film, that is, the heat resistance of the copper surface.
<Evaluation criteria>
5: No discoloration 4: Slightly discolored 3: Discolored slightly 2: Discolored orange or yellow 1: Discolored blackish brown
[耐湿性試験]
試験片を温度80℃、相対湿度95%の恒温槽内に24時間放置した後、銅表面の変色度合を目視観察した。
銅表面の耐湿性を下記評価基準により評価した。変色の度合が低い程、化成皮膜の耐湿性、即ち銅表面の耐湿性が優れていると判定される。
<評価基準>
5:変色がない
4:わずかに変色している
3:少し変色している
2:橙色または黄色に変色している
1:黒褐色に変色している
[Moisture resistance test]
The test piece was left in a constant temperature bath at a temperature of 80 ° C. and a relative humidity of 95% for 24 hours, and then the degree of discoloration on the copper surface was visually observed.
The moisture resistance of the copper surface was evaluated according to the following evaluation criteria. It is determined that the lower the degree of discoloration, the better the moisture resistance of the chemical conversion film, that is, the moisture resistance of the copper surface.
<Evaluation criteria>
5: No discoloration 4: Slightly discolored 3: Discolored slightly 2: Discolored orange or yellow 1: Discolored blackish brown
[接着性試験(イ)]
25cm×25cmの電解銅箔(厚み:33μm)のマット面に、黄銅をめっき被覆した後、亜鉛または酸化亜鉛と、クロム酸化物との混合物をめっき被覆し、これを試験片とした。次いで、この試験片を、金属の表面処理剤に浸漬した後、取り出して液切りした後、100℃の乾燥器内で、5分間乾燥した。そして、この試験片のマット面を、ガラス繊維クロスにエポキシ樹脂を含浸させた基材に接着し、「JIS C6481」に準拠して、常態ピール強度を測定した。
[Adhesion test (I)]
Brass was plated on a mat surface of a 25 cm × 25 cm electrolytic copper foil (thickness: 33 μm), and then zinc or a mixture of zinc oxide and chromium oxide was plated and used as a test piece. Next, this test piece was immersed in a metal surface treatment agent, taken out, drained, and then dried in a dryer at 100 ° C. for 5 minutes. And the mat | matte surface of this test piece was adhere | attached on the base material which impregnated the epoxy resin to the glass fiber cloth, and the normal peel strength was measured based on "JIS C6481".
[接着性試験(ロ)]
(1)試験片の基材
試験片の基材として、電解銅箔(厚み:18μm)を使用した。
(2)基材の処理
以下の工程a〜cに従って行った。
a.酸清浄/1分間(室温)、水洗
b.酸清浄/1分間(室温)、水洗、乾燥/1分(100℃)
c.金属の表面処理剤に浸漬/1分(室温)、水洗、乾燥/1分(100℃)
(3)基材と樹脂の接着
処理した基材のシャイニー面に、ガラス布エポキシ樹脂含浸プリプレグ(FR−4グレード)を積層プレスし、基材と樹脂を接着してプリント配線板を作成した。
(4)接着性の評価
このプリント配線板から、「JIS C6481」に準拠して、幅10mmの試験片を作成し、プレッシャークッカー処理(121℃/湿度100%/100時間)した後、銅箔の引き剥がし強さを測定した。
[Adhesion test (b)]
(1) Base material of test piece As a base material of the test piece, an electrolytic copper foil (thickness: 18 μm) was used.
(2) Processing of base material It carried out according to the following processes ac.
a. Acid clean / 1 minute (room temperature), water wash b. Acid cleaning / 1 minute (room temperature), water washing, drying / 1 minute (100 ° C)
c. Immersion in metal surface treatment agent / 1 minute (room temperature), water washing, drying / 1 minute (100 ° C.)
(3) Adhesion of base material and resin A glass cloth epoxy resin-impregnated prepreg (FR-4 grade) was laminated and pressed on the shiny surface of the treated base material, and the base material and the resin were adhered to create a printed wiring board.
(4) Evaluation of adhesiveness From this printed wiring board, a test piece having a width of 10 mm was prepared in accordance with “JIS C6481” and subjected to pressure cooker treatment (121 ° C./humidity 100% / 100 hours). The peel strength was measured.
[接着性試験(ハ)]
基材のシャイニー面に、「ガラス布エポキシ樹脂含浸プリプレグ(FR−4グレード)を積層プレス」する代わりに、「ビルドアップ配線板用樹脂(味の素ファインテクノ社製、商品名「GX−13」)をラミネート」した以外は、評価試験(ロ)と同様の手順で、銅箔の引き剥がし強さを測定した。
[Adhesion test (C)]
Instead of “laminate press of glass cloth epoxy resin impregnated prepreg (FR-4 grade)” on the shiny surface of the base material, “resin for build-up wiring board (trade name“ GX-13 ”manufactured by Ajinomoto Fine Techno Co., Ltd.) Except for laminating, the peel strength of the copper foil was measured in the same procedure as in the evaluation test (b).
[接着性試験(ニ)]
(1)試験片の基材
試験片の基材として、電解銅メッキ(メッキ厚:20μm)を施した両面銅張積層板(基板:FR4,板厚:1.0mm,銅箔厚:18μm,縦120mm×横110mm)を使用した。
(2)基材の処理
以下の工程a〜dに従って行った。
a.酸清浄/1分間(室温)、水洗
b.過酸化水素・硫酸によるマイクロエッチング/1分(室温)、水洗
c.酸清浄/1分間(室温)、水洗、乾燥/1分(100℃)
d.金属の表面処理剤に浸漬/1分(室温)、水洗、乾燥/1分(100℃)
(3)基材への樹脂層の形成
処理した基材に、ソルダーレジスト(太陽インキ製造社製、商品名「PSR−4000AUS308」)を塗布した後、乾燥(80℃/30分)、ポストキュア(150℃/60分)を行って、13μm厚の樹脂層(塗膜)を形成させ、プリント配線板の試験片を作成した。
(4)接着性の評価
「JIS K5400−8.5」に従って、試験片の表面に形成した塗膜を1mm×1mmの碁盤目にクロスカット(100マス)し、プレッシャークッカー処理(121℃/湿度100%/100時間)した後、テープピールテストを行い、塗膜が剥離しないマス目の数を計測した。また、塗膜の傷み具合を目視にて観察した。
なお、接着性の判定基準は、表1に示したとおりである。
[Adhesion test (d)]
(1) Base material of test piece As a base material of test piece, double-sided copper-clad laminate (substrate: FR4, plate thickness: 1.0 mm, copper foil thickness: 18 μm) subjected to electrolytic copper plating (plating thickness: 20 μm), 120 mm long × 110 mm wide) was used.
(2) Treatment of base material It was performed according to the following steps a to d.
a. Acid clean / 1 minute (room temperature), water wash b. Micro etching with hydrogen peroxide / sulfuric acid / 1 minute (room temperature), water washing c. Acid cleaning / 1 minute (room temperature), water washing, drying / 1 minute (100 ° C)
d. Immersion in metal surface treatment agent / 1 minute (room temperature), water washing, drying / 1 minute (100 ° C.)
(3) Formation of resin layer on substrate After applying a solder resist (trade name “PSR-4000AUS308”, manufactured by Taiyo Ink Manufacturing Co., Ltd.) to the treated substrate, drying (80 ° C./30 minutes), post-cure (150 ° C./60 minutes) was performed to form a 13 μm thick resin layer (coating film), and a printed wiring board test piece was prepared.
(4) Evaluation of adhesiveness According to “JIS K5400-8.5”, the coating film formed on the surface of the test piece was cross-cut (100 squares) on a 1 mm × 1 mm grid, and pressure cooker treatment (121 ° C./humidity) 100% / 100 hours), a tape peel test was performed, and the number of squares where the coating film was not peeled was measured. Moreover, the damage condition of the coating film was observed visually.
The criteria for determining adhesiveness are as shown in Table 1.
〔実施例1〕
メタノールに、IMZS−1を6重量%の濃度となるように溶解して金属の表面処理剤を調製した。次いで、この表面処理剤を用いて、耐熱性試験および耐湿性試験を行った。これらの試験結果は表2に示したとおりであった。
[Example 1]
A metal surface treatment agent was prepared by dissolving IMZS-1 in methanol to a concentration of 6% by weight. Next, a heat resistance test and a moisture resistance test were performed using this surface treatment agent. These test results were as shown in Table 2.
〔実施例2〜8、比較例1〕
実施例1と同様にして、表2記載の組成を有する金属の表面処理剤を調製し、耐熱性試験および耐湿性試験を行った。これらの試験結果は表2に示したとおりであった。
[Examples 2 to 8, Comparative Example 1]
In the same manner as in Example 1, metal surface treatment agents having the compositions shown in Table 2 were prepared and subjected to a heat resistance test and a moisture resistance test. These test results were as shown in Table 2.
〔比較例2〕
銅箔に表面処理を施さずに、耐熱性試験および耐湿性試験を行った。この試験結果は表2に示したとおりであった。
[Comparative Example 2]
A heat resistance test and a moisture resistance test were performed without subjecting the copper foil to a surface treatment. The test results were as shown in Table 2.
〔実施例9〜16、比較例3〕
実施例1と同様にして、表3記載の組成を有する金属の表面処理剤を調製した。次いで、これらの表面処理剤を用いて、接着性試験(イ)を行ったところ、得られた試験結果は表3に示したとおりであった。
[Examples 9 to 16, Comparative Example 3]
In the same manner as in Example 1, metal surface treatment agents having the compositions shown in Table 3 were prepared. Subsequently, when these surface-treating agents were used to conduct an adhesion test (A), the test results obtained were as shown in Table 3.
〔比較例4〕
試験片に表面処理を施さずに、接着性試験(イ)を行った。この試験結果は表3に示したとおりであった。
[Comparative Example 4]
An adhesion test (I) was performed without subjecting the test piece to surface treatment. The test results were as shown in Table 3.
〔実施例17〕
10gのIMZS−1に、200gのエチレングリコールモノブチルエーテル(以下、「EGBE」と略記する)を加え、続いて、790gの水を加えて、室温にて2時間撹拌し、金属の表面処理剤を調製した。
この表面処理剤を用いて、接着性試験(ロ)〜(ニ)を行ったところ、得られた試験結果は、表4に示したとおりであった。
Example 17
To 10 g of IMZS-1, 200 g of ethylene glycol monobutyl ether (hereinafter abbreviated as “EGBE”) is added, and then 790 g of water is added and stirred at room temperature for 2 hours. Prepared.
When this surface treating agent was used to perform adhesion tests (b) to (d), the test results obtained were as shown in Table 4.
〔実施例18〜24、比較例5〜6〕
実施例17と同様にして、表4記載の組成を有する金属の表面処理剤を調製した。次いで、これらの表面処理剤を用いて、接着性試験(ロ)〜(ニ)を行ったところ、得られた試験結果は、表4に示したとおりであった。
[Examples 18 to 24, Comparative Examples 5 to 6]
In the same manner as in Example 17, a metal surface treatment agent having the composition shown in Table 4 was prepared. Subsequently, when the adhesion tests (b) to (d) were performed using these surface treatment agents, the test results obtained were as shown in Table 4.
〔比較例7〕
銅箔に表面処理を施さずに、接着性試験(ロ)〜(ニ)を行ったところ、得られた試験結果は、表4に示したとおりであった。
[Comparative Example 7]
When the adhesion tests (b) to (d) were performed without subjecting the copper foil to surface treatment, the test results obtained were as shown in Table 4.
表2に示した試験結果によれば、本発明の金属の表面処理剤を用いることにより、銅の表面に耐熱性および耐湿性に優れた化成皮膜を形成させることができる。
また、表3および表4に示した試験結果によれば、本発明の金属の表面処理剤を用いることにより、金属と樹脂との接着性を向上させることができる。
According to the test results shown in Table 2, a chemical conversion film having excellent heat resistance and moisture resistance can be formed on the surface of copper by using the metal surface treatment agent of the present invention.
Further, according to the test results shown in Table 3 and Table 4, the adhesion between the metal and the resin can be improved by using the metal surface treatment agent of the present invention.
本発明の金属の表面処理剤は、金属の表面に耐熱性と耐湿性に優れた化成皮膜を形成させることが可能であり、また金属と樹脂との接着性を向上させることが可能であるため、プリント配線板や電子部品、金属箔(銅箔)、電線など、金属表面の酸化および腐食からの保護や、金属と樹脂との接着性が必要とされる様々な部材への利用が期待される。 The metal surface treatment agent of the present invention can form a chemical conversion film having excellent heat resistance and moisture resistance on the metal surface, and can improve the adhesion between the metal and the resin. It is expected to be used for various parts that require protection from metal surface oxidation and corrosion, and adhesion between metal and resin, such as printed wiring boards, electronic parts, metal foil (copper foil), and electric wires. The
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US12091430B2 (en) | 2019-09-06 | 2024-09-17 | Shikoku Chemicals Corporation | Metal surface treatment liquid and liquid concentrate thereof, metal surface treatment liquid set, metal surface treatment method, and method for manufacturing printed wiring board |
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US12091430B2 (en) | 2019-09-06 | 2024-09-17 | Shikoku Chemicals Corporation | Metal surface treatment liquid and liquid concentrate thereof, metal surface treatment liquid set, metal surface treatment method, and method for manufacturing printed wiring board |
US11230644B1 (en) | 2020-07-20 | 2022-01-25 | Mec Company Ltd. | Coating film-forming composition, method for producing surface-treated metal member, and method for producing metal-resin composite |
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