JP2015076232A - Conductive paste, conductive thin film and electric circuit - Google Patents
Conductive paste, conductive thin film and electric circuit Download PDFInfo
- Publication number
- JP2015076232A JP2015076232A JP2013210939A JP2013210939A JP2015076232A JP 2015076232 A JP2015076232 A JP 2015076232A JP 2013210939 A JP2013210939 A JP 2013210939A JP 2013210939 A JP2013210939 A JP 2013210939A JP 2015076232 A JP2015076232 A JP 2015076232A
- Authority
- JP
- Japan
- Prior art keywords
- conductive
- conductive paste
- thin film
- superheated steam
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
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- 150000002576 ketones Chemical class 0.000 description 1
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- 238000000691 measurement method Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
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Landscapes
- Non-Insulated Conductors (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Conductive Materials (AREA)
Abstract
Description
本発明は、良好な導電性を示す導電性薄膜を得ることができる導電性ペーストに関する。更に詳しくは、導電性ペースト及びそれを用いた電子材料、配線、回路形成に関するものである。 The present invention relates to a conductive paste capable of obtaining a conductive thin film exhibiting good conductivity. More specifically, the present invention relates to a conductive paste and an electronic material, wiring, and circuit formation using the same.
印刷による導電層や導電パターンの形成は、導電粒子を用いた導電性ペーストをスクリーン印刷や凸版印刷に適用することでなされている。スクリーン印刷では、使用する導電粒子としては粒径が数μm以上のフレーク状金属粒子等が用いられ、回路の厚みを10μm以上にして導電性を確保している。導電回路は近年、急速に高密度化が進んでいる。より高密度な回路の形成を可能にするため、より微細な金属微粒子の開発がなされている。 Formation of a conductive layer or a conductive pattern by printing is performed by applying a conductive paste using conductive particles to screen printing or letterpress printing. In screen printing, flaky metal particles having a particle size of several μm or more are used as the conductive particles to be used, and the conductivity is ensured by setting the circuit thickness to 10 μm or more. In recent years, the density of conductive circuits has been rapidly increasing. In order to enable the formation of higher density circuits, finer metal fine particles have been developed.
導電粒子としての金属は、銀、銅、ニッケルが一般的に用いられる。銀は高価であるだけでなく、耐マイグレーション性が悪く、回路に対して微細化の要求が大きくなることに対して、用途により重大な欠陥になりうる。ニッケルは導電性が劣る。銅は酸化されやすく、できた酸化物は導電性が悪い。銅ペースト製造時や保存時あるいは銅ペーストから銅薄膜形成時の加熱処理や、銅薄膜保存時に銅表面に形成される酸化層により、導電性が悪くなる。さらに銅の酸化による弊害は銅ペースト回路に酸化防止や絶縁のためにカバーフィルムを張り合わせた場合にも起こる。銅表面の酸化層の形成と進行はカバーフィルム接着剤と銅薄層間に、歪を発生し接着力の低下が起こる場合がある。歪の発生は銅ペースト層と基材との間でも発生する。この接着力の低下は150℃以上の温度で長期間保存すると 起こることが多い。 As the metal as the conductive particles, silver, copper, or nickel is generally used. Silver is not only expensive, but also has poor migration resistance, and it can become a serious defect depending on the application, while the demand for miniaturization of the circuit is increased. Nickel has poor conductivity. Copper is easily oxidized and the resulting oxide has poor conductivity. The conductivity deteriorates due to the heat treatment at the time of copper paste production or storage or at the time of copper thin film formation from the copper paste, or the oxide layer formed on the copper surface at the time of copper thin film storage. Furthermore, the harmful effects of copper oxidation also occur when a cover film is bonded to a copper paste circuit to prevent oxidation or insulation. The formation and progress of the oxide layer on the copper surface may cause distortion between the cover film adhesive and the copper thin layer, resulting in a decrease in adhesion. Strain is also generated between the copper paste layer and the base material. This decrease in adhesion often occurs when stored for a long time at a temperature of 150 ° C. or higher.
銅粒子の酸化による弊害を防止するため、銅ペーストでは種々の検討がなされている。特許文献1では特定の配合比率の金属銅粉、レゾール型フェノール樹脂、アミノ化合物、アミノ基含有カップリング剤および1,2−N−アシル−N−メチレンエチレンジアミン化合物を含有する導電性塗料が開示されており、アミノ化合物が導電性向上剤として働くと共に還元剤としても働き、金属銅粉の酸化を防止して、導電性の維持に寄与するとされている。また特許文献1においては金属銅粉の粒径が1μm未満のものは酸化されやすく、得られる塗膜の導電性が低下するので好ましくないとされている。一方、銅粉の表面を銀で被覆しこれを導電性ペースト用の導電性フィラーとして用いることが試みられており、例えば特許文献2ではキレート化剤溶液に銅粉を分散し、銀イオン溶液、還元剤を順次添加して、銅粉表面に銀被膜を析出させることおよびこれを導電性フィラーとする導電性ペーストが開示されている。 In order to prevent harmful effects caused by oxidation of copper particles, various studies have been made on copper paste. Patent Document 1 discloses a conductive paint containing metal copper powder, a resol type phenol resin, an amino compound, an amino group-containing coupling agent, and a 1,2-N-acyl-N-methyleneethylenediamine compound having a specific blending ratio. It is said that the amino compound functions as a conductivity improver and also as a reducing agent, preventing oxidation of the metal copper powder and contributing to maintaining the conductivity. Moreover, in patent document 1, when the particle size of metal copper powder is less than 1 micrometer, it is easy to be oxidized, and since the electroconductivity of the coating film obtained falls, it is considered unpreferable. On the other hand, it has been attempted to coat the surface of the copper powder with silver and use it as a conductive filler for a conductive paste. For example, in Patent Document 2, copper powder is dispersed in a chelating agent solution, a silver ion solution, A conductive paste is disclosed in which a reducing agent is sequentially added to deposit a silver coating on the surface of copper powder and this is used as a conductive filler.
金属粒子の粒径を小さくすることによって、金属粒子間の焼成温度を金属バルクの融点に比べて大幅に下げることができることが知られている。例えば、特許文献3には、粒径1000Å以下の銅微粒子を特定成分が含有する有機溶媒中に分散した金属ペーストを調製し、金属ペースト塗膜を500℃で焼成して金属薄膜を形成する方法が開示されており、この方法により電気配線を形成できるとされている。しかしながら特許文献3に開示されている金属ペーストは銅粉を除き揮発性成分のみで形成されており、焼成後の基材との密着は弱いものである。また焼成温度が高いので、基材の選択肢が大幅に限定される。特許文献4には、超音波を利用して水酸化銅と還元剤から粒径0.1μm以下の銅超微粉末を作る方法が開示されているが、特許文献4実施例においては電子顕微鏡によって銅超微粉末の平均粒径と形状を確認したにとどまり、実際に導電性ペースト用の導電性フィラーとして有用であったか否かについては開示されていない。銅超微粉末の酸化被膜形成を抑制することについてなんら記載されていないことから、銅超微粉末表面に酸化銅の被膜が形成され、導電性フィラーとしては有用でなかったものと推定される。 It is known that by reducing the particle size of the metal particles, the firing temperature between the metal particles can be significantly reduced compared to the melting point of the metal bulk. For example, Patent Document 3 discloses a method in which a metal paste in which copper fine particles having a particle size of 1000 mm or less are dispersed in an organic solvent containing a specific component is prepared, and a metal paste coating film is baked at 500 ° C. to form a metal thin film. Is disclosed, and electrical wiring can be formed by this method. However, the metal paste disclosed in Patent Document 3 is formed of only volatile components except for copper powder, and the adhesion to the base material after firing is weak. Also, since the firing temperature is high, the choice of base material is greatly limited. Patent Document 4 discloses a method of making an ultrafine copper powder having a particle size of 0.1 μm or less from copper hydroxide and a reducing agent using ultrasonic waves. In Example of Patent Document 4, an electron microscope is used. Only the average particle diameter and shape of the copper ultrafine powder were confirmed, and it was not disclosed whether it was actually useful as a conductive filler for conductive paste. Since there is no description about suppressing the formation of an oxide film of copper ultrafine powder, it is presumed that a copper oxide film was formed on the surface of the copper ultrafine powder and was not useful as a conductive filler.
ナノ粒子に代表される微粒子は、表面積が非常に大きいため、極めて凝集し易く分散困難である。金属微粒子の分散性は、バインダー樹脂や分散剤を金属微粒子に吸着させることによって改善することができ、微粒子の凝集を防止して保存安定性を高め、分散体の流動性を確保するとの効果が期待できる。しかしながら、金属微粒子が微細化するほど、多量のバインダー樹脂や分散剤が必要になり、バインダー樹脂や分散剤が金属微粒子相互の接触を妨げ、導電性の向上を阻害する傾向となる。このような場合、バインダー樹脂や分散剤を昇華あるいは分解蒸発等により除く操作が必要になることがある。また、焼成によりフィルムやガラス等の基材との接着性が悪化することが起こりやすい。銅粒子ではこれらの金属粒子に特有な問題のうえに、酸化に起因する問題が加わる。銅粒子の酸化による導電性の悪化は粒子径が小さくなるほど顕著になる。 Fine particles typified by nanoparticles are very easy to aggregate and difficult to disperse because of their very large surface area. The dispersibility of the metal fine particles can be improved by adsorbing the binder resin or dispersant to the metal fine particles, and the effect of preventing the aggregation of the fine particles to increase the storage stability and ensuring the fluidity of the dispersion. I can expect. However, as the metal fine particles become finer, a larger amount of binder resin or dispersant is required, and the binder resin or dispersant tends to prevent the metal fine particles from contacting each other and hinder the improvement in conductivity. In such a case, it may be necessary to remove the binder resin or the dispersant by sublimation or decomposition evaporation. In addition, the adhesiveness with a substrate such as a film or glass tends to deteriorate due to firing. In addition to the problems peculiar to these metal particles, problems caused by oxidation are added to copper particles. The deterioration of conductivity due to oxidation of copper particles becomes more prominent as the particle diameter becomes smaller.
特許文献5には銅粒子分散体を含有する塗膜に過熱水蒸気による加熱処理を施す工程と、防錆処理を施す工程、の少なくとも2つの工程を含む、銅薄膜の製造方法が開示されている。特許文献5の実施例において過熱水蒸気処理温度は300℃でなされており、実際には耐熱性を有する基材に限定されてしまう問題点があった。 Patent Document 5 discloses a method for producing a copper thin film, which includes at least two steps: a step of performing a heat treatment with superheated steam on a coating film containing a copper particle dispersion, and a step of applying a rust prevention treatment. . In the example of Patent Document 5, the superheated steam treatment temperature is 300 ° C., and there is a problem that it is actually limited to a base material having heat resistance.
本発明は、かかる従来技術の課題を背景になされたものである。すなわち、本発明の目的は、過熱水蒸気処理による焼成方法で導電性を発現させることができ、かつ低温での焼成で導電性を発現することが可能で、耐熱性を有しない基材にも広く適用することができる導電性ペーストを提供することにある。 The present invention has been made against the background of such prior art problems. That is, the object of the present invention is to develop conductivity by a baking method by superheated steam treatment, and to exhibit conductivity by baking at a low temperature, and is widely applied to substrates having no heat resistance. It is to provide a conductive paste that can be applied.
本発明者は、かかる目的を達成するために鋭意検討した結果、本発明の完成に至った。
すなわち本発明は、
(1)導電性金属粉、樹脂バインダー、溶剤、及び添加剤を含有する導電性ペーストにおいて、該添加剤がヒドロキシカルボン酸であり、該導電性ペーストで印刷又は塗布後に過熱水蒸気処理で導電性を発現することを特徴とする導電性ペースト。
(2)前記添加剤が下記化学式で示されるヒドロキシカルボン酸であることを特徴とする(1)に記載の導電性ペースト。
(3)前記添加剤がリンゴ酸、クエン酸であることを特徴とする(2)に記載の導電性ペースト。
(4)前記導電性金属粉が銅であることを特徴とする(1)〜(3)のいずれかに記載の導電性ペースト。
(5)前記ヒドロキシカルボン酸を導電性金属粉重量に対して1.0〜5.0(重量%)含有することを特徴とする(1)〜(4)のいずれかに記載の導電性ペースト。
(6)過熱水蒸気処理に用いられることを特徴とする、(1)〜(5)のいずれかに記載の導電性ペースト。
(7)180℃以上の過熱水蒸気処理に用いられることを特徴とする(1)〜(6)のいずれかに記載の導電性ペースト。
(8)前記(1)〜(7)のいずれかに記載の導電性ペーストを、印刷又は塗布後に過熱水蒸気処理された導電性薄膜。
(9)前記(1)〜(7)のいずれかに記載の導電性ペーストを、印刷又は塗布後に過熱水蒸気処理された電気回路。
As a result of intensive studies in order to achieve this object, the present inventor has completed the present invention.
That is, the present invention
(1) In a conductive paste containing conductive metal powder, a resin binder, a solvent, and an additive, the additive is hydroxycarboxylic acid, and the conductive paste is made conductive by superheated steam treatment after printing or coating with the conductive paste. A conductive paste characterized by manifestation.
(2) The conductive paste according to (1), wherein the additive is a hydroxycarboxylic acid represented by the following chemical formula.
(3) The conductive paste according to (2), wherein the additive is malic acid or citric acid.
(4) The conductive paste according to any one of (1) to (3), wherein the conductive metal powder is copper.
(5) The conductive paste according to any one of (1) to (4), wherein the hydroxycarboxylic acid is contained in an amount of 1.0 to 5.0 (% by weight) based on the weight of the conductive metal powder. .
(6) The conductive paste according to any one of (1) to (5), which is used for superheated steam treatment.
(7) The conductive paste according to any one of (1) to (6), which is used for a superheated steam treatment at 180 ° C. or higher.
(8) A conductive thin film obtained by subjecting the conductive paste according to any one of (1) to (7) to a superheated steam treatment after printing or coating.
(9) An electric circuit obtained by subjecting the conductive paste according to any one of (1) to (7) to a superheated steam treatment after printing or coating.
本発明の導電性ペーストにより、過熱水蒸気処理による焼成において低温で導電性を発現することができるので、耐熱性を有しない基材にも広く適用することが可能である。 Since the conductive paste of the present invention can exhibit conductivity at low temperatures in baking by superheated steam treatment, it can be widely applied to substrates having no heat resistance.
本発明の導電性ペーストは導電性金属粉、溶剤、樹脂バインダー、添加剤を必須成分として含有する。各成分の割合は導電性金属粉100質量部に対し、溶剤の上限は好ましくは400質量部であり、より好ましくは350質量部であり、さらに好ましくは300質量部である。溶剤の下限は好ましくは20質量部であり、より好ましくは30質量部であり、さらに好ましくは50質量部である。樹脂バインダーの上限は導電性金属粉100質量部に対し、15質量部であり、より好ましくは12質量部であり、さらに好ましくは10質量部である。樹脂バインダーの下限は好ましくは1質量部であり、より好ましくは2質量部であり、さらに好ましくは3質量部である。溶剤、又は樹脂バイダーの含有量がこの範囲より少ないとうまく分散できない、焼成後の基材との密着性が悪くなる、などの不具合がある場合がある。溶剤、又は樹脂バイダーの含有量がこの範囲より多いと樹脂バインダーが熱分解されにくくなり、導電性が発現しない、または電気抵抗が大きくなる、などの不具合がある場合がある。 The conductive paste of the present invention contains conductive metal powder, a solvent, a resin binder, and additives as essential components. The ratio of each component is preferably 400 parts by mass, more preferably 350 parts by mass, and even more preferably 300 parts by mass with respect to 100 parts by mass of the conductive metal powder. Preferably the minimum of a solvent is 20 mass parts, More preferably, it is 30 mass parts, More preferably, it is 50 mass parts. The upper limit of the resin binder is 15 parts by mass with respect to 100 parts by mass of the conductive metal powder, more preferably 12 parts by mass, and still more preferably 10 parts by mass. Preferably the minimum of a resin binder is 1 mass part, More preferably, it is 2 mass parts, More preferably, it is 3 mass parts. If the content of the solvent or the resin binder is less than this range, there may be problems such as inability to disperse well and poor adhesion to the substrate after firing. If the content of the solvent or the resin binder is more than this range, the resin binder may be difficult to be thermally decomposed, and there may be a problem such that the conductivity is not exhibited or the electric resistance is increased.
導電性金属粉としては加熱処理によって微粒子間が融着するものでも、融着しないものでも使用可能である。金属の種類としては、銅、ニッケル、コバルト、銀、白金、金、モリブデン、チタン等が挙げられ、特に銀、銅が好ましい。これらの金属微粒子は、市販品を用いてもよいし、公知の方法を用いて調製することも可能である。また、異種の金属を積層した構造のもの、有機物あるいは無機物に金属めっきを施したものでもかまわない。 As the conductive metal powder, it is possible to use either a material in which the fine particles are fused by heat treatment or a material that is not fused. Examples of the metal include copper, nickel, cobalt, silver, platinum, gold, molybdenum, and titanium, and silver and copper are particularly preferable. These metal fine particles may be a commercially available product or can be prepared using a known method. In addition, a structure in which different kinds of metals are stacked, or an organic or inorganic material plated with metal may be used.
本発明に用いられる導電性金属粉の平均粒径は0.1〜5μmであることが好ましい。0.1μm未満であるとペーストの作製・保管時に酸化されやすい、またはうまく分散できずに経時変化で沈殿などが生じるなどの問題がある。
ここで、平均粒径は空気透過法によるフィッシャー・サブ・シーブ・サイザー(F.S.S.S)を用いて測定した。
The average particle size of the conductive metal powder used in the present invention is preferably 0.1 to 5 μm. If the thickness is less than 0.1 μm, there is a problem that the paste is easily oxidized during the preparation and storage of the paste, or cannot be dispersed well and precipitation occurs with time.
Here, the average particle diameter was measured using a Fischer sub-sieve sizer (FSSS) by an air permeation method.
導電性金属粉の形状は球状、フレーク状、凝集体、樹枝状、針状や不規則形状などがある。本発明で用いる導電性金属粉の形状は特に限定されず、また異なる形状の金属粉を混合して使用してもかまわない。 The shape of the conductive metal powder includes a spherical shape, a flake shape, an aggregate, a dendritic shape, a needle shape and an irregular shape. The shape of the conductive metal powder used in the present invention is not particularly limited, and metal powders having different shapes may be mixed and used.
導電性金属粉の平均粒径が5μmより大きいと、分散体での金属粒子の沈降を生じたり、微細回路の印刷適性が劣ったりする。平均粒径の下限は特に限定されないが、10nm以上であることが好ましい。10nm未満では導電性金属粉の経済性の制限や、安定な分散物を得るためには多量の分散媒を必要とするため、高導電性の金属薄膜を得ることが困難になる場合がある。本発明で用いる導電性金属粉は、異なる粒径の物を混合して使用してもかまわない。 When the average particle diameter of the conductive metal powder is larger than 5 μm, the metal particles are precipitated in the dispersion, and the printability of the fine circuit is inferior. Although the minimum of an average particle diameter is not specifically limited, It is preferable that it is 10 nm or more. If the thickness is less than 10 nm, it is difficult to obtain a highly conductive metal thin film because a large amount of dispersion medium is required in order to obtain economical restrictions on the conductive metal powder and to obtain a stable dispersion. The conductive metal powder used in the present invention may be used by mixing products having different particle diameters.
本発明の導電性ペーストに使用される樹脂バインダーとしては、ポリエステル、ポリウレタン、ポリカーボネート、ポリエーテル、ポリアミド、ポリアミドイミド、ポリイミドあるいはアクリル等が挙げられる。樹脂中にエステル結合、ウレタン結合、アミド結合、エーテル結合、イミド結合等を有するものが、銅微粒子分散体の安定性から好ましい。ポリエステル、またはポリエステルポリウレタンがさらに好ましい。 Examples of the resin binder used in the conductive paste of the present invention include polyester, polyurethane, polycarbonate, polyether, polyamide, polyamideimide, polyimide, and acrylic. Those having an ester bond, a urethane bond, an amide bond, an ether bond, an imide bond, etc. in the resin are preferred from the viewpoint of the stability of the copper fine particle dispersion. Polyester or polyester polyurethane is more preferable.
ポリエステル、またはポリエステルポリウレタンを重合する際のモノマーの種類としては酸成分としてはテレフタル酸、イソフタル酸、ナフタレンジカルボン酸のごとき芳香族ジカルボン酸又はそのエステル、1,4-シクロヘキサンジカルボン酸(CHDA) 、cis−1,2−シクロヘキサンジカルボン酸無水物(HHPA)、アダマンタンジカルボン酸、トリシクロデカンジカルボン酸等が挙げられる。 As the types of monomers for polymerizing polyester or polyester polyurethane, the acid component includes aromatic dicarboxylic acids or esters such as terephthalic acid, isophthalic acid, naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid (CHDA), cis Examples include -1,2-cyclohexanedicarboxylic acid anhydride (HHPA), adamantane dicarboxylic acid, tricyclodecanedicarboxylic acid, and the like.
共重合可能なグリコール成分としては、エチレングリコール、ジエチレングリコール、1,4−ブタンジオール、ネオペンチルグリコールのごときグリコール、シクロヘキサンジメタノール(CHDM)、トリシクロデカンジメタノール、アダマンタンジメタノール等が挙げられる。 Examples of the copolymerizable glycol component include glycols such as ethylene glycol, diethylene glycol, 1,4-butanediol, neopentyl glycol, cyclohexanedimethanol (CHDM), tricyclodecane dimethanol, adamantane dimethanol and the like.
ポリエステルポリウレタンの重合に使用出来るジイソシアネート成分としてはイソシアネート基を分子中に2個含有する公知の脂肪族、脂環族または芳香族の有機ポリイソシアネートが包含される。具体的には例えば4,4′−ジフエニルメタンジイソシアネート、p−フエニレンジイソシアネート、トルイレンジイソシアネート、1,5−ナフチレンジイソシアネート、キシリレンジイソシアネート、ヘキサメチジンジイソシアネート、イソホロンジイソシアネート(IPDI)、4,4′−ジシクロヘキシルメタンジイソシアネート等が挙げられる。とりわけ、イソホロンジイソシアネート、4,4′−ジフエニルメタンジイソシアネートもしくは2,4−トリレンジイソシアネートまたはそれらを主成分とする混合物が好ましい。 The diisocyanate component that can be used for polymerization of polyester polyurethane includes known aliphatic, alicyclic or aromatic organic polyisocyanates containing two isocyanate groups in the molecule. Specifically, for example, 4,4′-diphenylmethane diisocyanate, p-phenylene diisocyanate, toluylene diisocyanate, 1,5-naphthylene diisocyanate, xylylene diisocyanate, hexamethidine diisocyanate, isophorone diisocyanate (IPDI), 4, Examples include 4'-dicyclohexylmethane diisocyanate. In particular, isophorone diisocyanate, 4,4'-diphenylmethane diisocyanate or 2,4-tolylene diisocyanate or a mixture containing them as a main component is preferable.
化1で示されるヒドロキシカルボン酸としては酒石酸、グリセリン酸、リンゴ酸、クエン酸、イソクエン酸、ヒドロキシクエン酸、キナ酸等が挙げられる。これらヒドロキシカルボン酸を添加して分散することにより、銅粉極表面に存在する酸化銅を溶解させる効果や酸化銅をヒドロキシカルボン酸が持つ還元力で酸化銅を還元する効果がある。ヒドロキシカルボン酸の添加量の下限は導電性金属粉添加量に対して、0.2重量%以上が好ましく、より好ましくは0.5重量%以上、特に好ましくは1.0重量%以上である。添加するヒドロキシカルボン酸重量の上限は5.0重量%で、これ以上添加すると、うまく分散できない場合がある。ヒドロキシカルボン酸はほぼ同量の水で予め溶解させてから混合・分散するとよい。 Examples of the hydroxycarboxylic acid represented by Chemical Formula 1 include tartaric acid, glyceric acid, malic acid, citric acid, isocitric acid, hydroxycitric acid, and quinic acid. By adding and dispersing these hydroxycarboxylic acids, there is an effect of dissolving the copper oxide present on the surface of the copper powder electrode and an effect of reducing the copper oxide with the reducing power of the hydroxycarboxylic acid. The lower limit of the amount of hydroxycarboxylic acid added is preferably 0.2% by weight or more, more preferably 0.5% by weight or more, and particularly preferably 1.0% by weight or more with respect to the amount of conductive metal powder added. The upper limit of the weight of the hydroxycarboxylic acid to be added is 5.0% by weight. Hydroxycarboxylic acid may be mixed and dispersed after dissolving in advance with approximately the same amount of water.
本発明の導電性ペーストに使用される溶媒は、分散安定化の働きをするバインダー樹脂を用いる場合には、その樹脂を溶解するものから選ばれ、有機化合物であっても水であってもよい。分散媒は、分散体中で銅微粒子を分散させる役割に加えて、分散体の粘度を調整する役割がある。溶媒として好適に用いられる有機溶媒の例として、アルコール、エーテル、ケトン、エステル、芳香族炭化水素、アミド等が挙げられる。 The solvent used in the conductive paste of the present invention is selected from those that dissolve the resin when a binder resin that functions to stabilize dispersion is used, and may be an organic compound or water. . The dispersion medium has a role of adjusting the viscosity of the dispersion in addition to the role of dispersing the copper fine particles in the dispersion. Examples of the organic solvent suitably used as the solvent include alcohol, ether, ketone, ester, aromatic hydrocarbon, amide and the like.
本発明の導電性ペーストには、必要に応じ、硬化剤を配合しても良い。本発明に使用できる硬化剤としてはフェノール樹脂、アミノ樹脂、イソシアネート化合物、エポキシ樹脂等が挙げられる。硬化剤の使用量はバインダー樹脂の1〜100重量%の範囲が好ましい。 You may mix | blend a hardening | curing agent with the electrically conductive paste of this invention as needed. Examples of the curing agent that can be used in the present invention include phenol resins, amino resins, isocyanate compounds, and epoxy resins. The amount of the curing agent used is preferably in the range of 1 to 100% by weight of the binder resin.
本発明の導電性ペーストで導電性金属粉に銅粉を使用する場合、銅粉表面は空気中で酸化されやすいので、還元剤を含有させてもかまわない。還元剤は金属の酸化物、水酸化物、または塩等の金属化合物から金属に還元する能力を有するものを言う。還元剤としては、例えば、水素化ホウ素ナトリウム、水素化ホウ素リチウム、ヒドラジン類、ホルマリンやアセトアルデヒド等のアルデヒド類、亜硫酸塩類、蟻酸、蓚酸、コハク酸、アスコルビン酸等のカルボン酸類あるいはラクトン類、エタノール、ブタノール、オクタノール等の脂肪族モノアルコール類、ターピネオール等の脂環族モノアルコール類、等のモノアルコール類、エチレングリコール、プロピレングリコール、ジエチレングリコール、ジプロピレングリコール等の脂肪族ジオール類、グリセリン、トリメチロールプロパン等の多価アルコール類、ポリエチレングリコール、ポリプロピレングリコール等のポリエーテル類、ジエタノールアミンやモノエタノールアミン等のアルカノールアミン類、ハイドロキノン、レゾルシノール、アミノフェノール、ブドウ糖、あるいはクエン酸ナトリウム等が挙げられる。還元剤あるいは還元剤分解物の銅薄膜への残留は、得られた銅薄膜の特性の悪化を生じさせることがある。そのため、還元剤は過熱水蒸気処理により蒸発揮散するものが望ましい。還元剤としては、アルコール類や多価アルコール類が特に望ましい。還元剤の具体的な好ましい例としては、ターピネオール、エチレングリコール、プロピレングリコール、ジエチレングリコール、ジプロピレングリコール、アスコルビン酸、レゾルシノールを挙げることができる。 When copper powder is used as the conductive metal powder in the conductive paste of the present invention, the surface of the copper powder is easily oxidized in the air, so a reducing agent may be included. A reducing agent refers to an agent capable of reducing a metal compound such as a metal oxide, hydroxide, or salt to a metal. Examples of the reducing agent include sodium borohydride, lithium borohydride, hydrazines, aldehydes such as formalin and acetaldehyde, sulfites, carboxylic acids such as formic acid, succinic acid, succinic acid and ascorbic acid, or lactones, ethanol, Aliphatic monoalcohols such as butanol and octanol, monoalcohols such as alicyclic monoalcohols such as terpineol, aliphatic diols such as ethylene glycol, propylene glycol, diethylene glycol and dipropylene glycol, glycerin and trimethylolpropane Polyhydric alcohols such as polyethylene glycol and polypropylene glycol, alkanolamines such as diethanolamine and monoethanolamine, hydroquinone, resorcino Le, aminophenol, glucose, or sodium citrate, and the like. Residue of the reducing agent or reducing agent decomposition product on the copper thin film may cause deterioration of the properties of the obtained copper thin film. Therefore, it is desirable that the reducing agent is evaporated by superheated steam treatment. As the reducing agent, alcohols and polyhydric alcohols are particularly desirable. Specific preferred examples of the reducing agent include terpineol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, ascorbic acid, and resorcinol.
導電性金属粉をペースト中に分散させる方法としては、粉体を液体に分散させる一般的な方法を用いることができる。例えば、導電性金属粉とバインダー樹脂溶液、必要により追加の溶媒からなる混合物を混合した後、超音波法、ミキサー法、3本ロール法、ボールミル法等で分散を施せばよい。これらの分散手段のうち、複数を組み合わせて分散を行うことも可能である。これらの分散処理は室温で行ってもよく、分散体の粘度を下げるために、加熱して行ってもよい。必要により使用する還元剤は導電性金属粉の分散前、分散中、分散後の任意の段階で添加しても良い。 As a method for dispersing the conductive metal powder in the paste, a general method for dispersing the powder in a liquid can be used. For example, after mixing a conductive metal powder and a binder resin solution and, if necessary, a mixture of an additional solvent, dispersion may be performed by an ultrasonic method, a mixer method, a three-roll method, a ball mill method, or the like. Of these dispersing means, a plurality of dispersing means can be combined for dispersion. These dispersion treatments may be performed at room temperature, or may be performed by heating in order to reduce the viscosity of the dispersion. If necessary, the reducing agent used may be added at any stage before, during, or after dispersion of the conductive metal powder.
導電性ペーストから塗膜を形成するには、分散体を絶縁性基材に塗布あるいは印刷する場合に用いられる一般的な方法を用いることができる。例えばスクリーン印刷法、ディップコーティング法、スプレー塗布法、スピンコーティング法、ロールコート法、ダイコート法、インクジェット法、凸版印刷法、凹版印刷法等の方法によって導電性ペーストを塗布または印刷し、次いで風乾、加熱あるいは減圧等により分散媒の少なくとも一部を蒸発させることにより、塗膜を形成することができる。塗膜は絶縁性基材上に全面に設けられたものでも部分的に設けられたものでもよく、また導電回路等のパターン形成物でもかまわない。 In order to form a coating film from a conductive paste, a general method used when applying or printing a dispersion on an insulating substrate can be used. For example, a conductive paste is applied or printed by a method such as a screen printing method, a dip coating method, a spray coating method, a spin coating method, a roll coating method, a die coating method, an ink jet method, a relief printing method, an intaglio printing method, and then air-dried. A coating film can be formed by evaporating at least a part of the dispersion medium by heating or decompression. The coating film may be provided on the entire surface of the insulating base material or may be provided partially, or may be a pattern formed product such as a conductive circuit.
本発明の導電性薄膜の厚みは、電気抵抗や接着性等の必要特性にあわせて適宜設定することができ、特に限定されない。分散体組成や塗布または印刷の方法により、形成可能な導電性薄膜の厚みの範囲は異なるが、0.05〜40μmが好ましく、より好ましくは0.1〜20μm、さらに好ましくは0.2〜10μmである。厚い金属薄膜を得るためには塗膜を厚くする必要があり、溶剤の残留による弊害や塗膜形成速度を低速化する必要が生じる等の経済性の悪化が起こりやすい。一方、塗膜が薄すぎると、ピンホールの発生が顕著になる傾向がある。 The thickness of the conductive thin film of the present invention can be appropriately set according to necessary characteristics such as electric resistance and adhesiveness, and is not particularly limited. The range of the thickness of the conductive thin film that can be formed varies depending on the dispersion composition and the method of coating or printing, but is preferably 0.05 to 40 μm, more preferably 0.1 to 20 μm, and still more preferably 0.2 to 10 μm. It is. In order to obtain a thick metal thin film, it is necessary to increase the thickness of the coating film, which is likely to cause economic deterioration such as an adverse effect due to residual solvent and a need to reduce the coating film forming speed. On the other hand, if the coating film is too thin, the occurrence of pinholes tends to be significant.
本発明の導電性薄膜の形成に際し、重ね刷りや多層印刷を行なうことが可能である。ここで、重ね刷りとは、同じパターンを多数回重ねて印刷することを指し、これにより導電性薄膜の厚さを増すことができ、あるいはアスペクト比(膜厚と線幅の比)の高い導電性薄膜を得ることができる。また、多層印刷とは、異なるパターンを重ねて印刷することを指し、これにより層ごとに異なる機能を発揮させることができる。部分的に重ね刷りおよび/または多層印刷を行なうこと、また重ね刷りと多層印刷を複合的に行うことも差し支えない。また、本発明の導電性薄膜とは異なる薄膜、例えば絶縁層との多層印刷を行うことも可能である。 In forming the conductive thin film of the present invention, it is possible to perform overprinting or multilayer printing. Here, overprinting refers to printing the same pattern a number of times, thereby increasing the thickness of the conductive thin film, or conducting with a high aspect ratio (ratio of film thickness to line width). Can be obtained. Multi-layer printing refers to printing different patterns in a superimposed manner, whereby different functions can be exhibited for each layer. Partial overprinting and / or multilayer printing may be performed, and overprinting and multilayer printing may be performed in combination. It is also possible to perform multilayer printing with a thin film different from the conductive thin film of the present invention, for example, an insulating layer.
絶縁性基材がポリイミド系樹脂からなるものである場合には、ポリイミド前駆体溶液の一次乾燥品やポリイミド溶液やポリアミドイミド溶液の一次乾燥品に導電性ペーストの塗膜を形成し、次いで過熱水蒸気による加熱処理を行う方法をとることが好ましい。ポリイミド系前駆体溶液やポリイミド系溶液の一次乾燥品に10〜30重量%の溶剤を残留させた状態のままで、引き続いてその上に、導電性ペーストを塗布・乾燥して塗膜を形成し、引き続いて過熱水蒸気による加熱処理を行うことにより、ポリイミド系樹脂層と塗膜との接着が強固になる傾向にある。 When the insulating substrate is made of a polyimide resin, a conductive paste film is formed on the primary dried product of the polyimide precursor solution or the primary dried product of the polyimide solution or the polyamideimide solution, and then superheated steam It is preferable to adopt a method of performing the heat treatment by the method. With the 10% to 30% by weight solvent remaining in the polyimide precursor solution or the primary dry product of the polyimide solution, a conductive paste is subsequently applied and dried to form a coating film. Subsequently, by performing a heat treatment with superheated steam, the adhesion between the polyimide resin layer and the coating film tends to be strong.
導電性ペーストの塗膜を形成した後、塗膜が破壊しない範囲で加圧処理(カレンダー処理)をすることもできる。カレンダー処理により導電性が向上する傾向がある。カレンダー処理は一般的には金属ロールと弾性ロールの間で材料に応じた線圧、たとえば1〜250kg/cm、より好ましくは50〜200kg/cmの加圧処理を行うことである。カレンダー処理は、導電性ペーストのバインダー樹脂のガラス転移温度以上の温度に加熱して行うことが特に好ましい。カレンダー処理は導電性ペーストの塗膜に他の層を積層した状態で行っても良い。 After forming the coating film of the conductive paste, pressure treatment (calendar treatment) can be performed within a range where the coating film is not destroyed. There exists a tendency for electroconductivity to improve by a calendar process. The calendar treatment is generally a pressure treatment between a metal roll and an elastic roll depending on the material, for example, a pressure treatment of 1 to 250 kg / cm, more preferably 50 to 200 kg / cm. The calendar treatment is particularly preferably performed by heating to a temperature equal to or higher than the glass transition temperature of the binder resin of the conductive paste. You may perform a calendar process in the state which laminated | stacked the other layer on the coating film of the electrically conductive paste.
過熱水蒸気とは100℃の飽和水蒸気の気体に二次的なエネルギーを加えることによって、沸点を超えて例えば数百℃のエネルギーを得た高温蒸気のことである。過熱水蒸気は高温空気と比べて約4倍の熱容量を持っていることから短時間で乾燥、焼結ができる。無酸素状態で酸化されることなく乾燥、焼成ができることから食品加熱、焙煎、殺菌などの食品・医薬用途によく使用されている。 Superheated steam is high-temperature steam that has obtained energy of, for example, several hundred degrees Celsius beyond its boiling point by adding secondary energy to a saturated steam gas at 100 degrees Celsius. Superheated steam has a heat capacity about four times that of high-temperature air, and can be dried and sintered in a short time. Since it can be dried and baked without being oxidized in an oxygen-free state, it is often used for food and pharmaceutical applications such as food heating, roasting, and sterilization.
導電性ペーストの塗膜を乾燥処理、次いで必要によりカレンダー処理を施した後、過熱水蒸気による加熱処理を行うことができる。乾燥処理と過熱水蒸気処理は連続して行っても、他の工程を介して行ってもよい。塗布後、乾燥工程無しで、過熱水蒸気処理を行うと突沸が起こりやすく好ましくない。 After the coating film of the conductive paste is subjected to a drying process and then, if necessary, a calendar process, a heating process with superheated steam can be performed. The drying treatment and the superheated steam treatment may be performed continuously or may be performed through other steps. If the superheated steam treatment is performed without applying a drying step after coating, bumping is likely to occur, which is not preferable.
過熱水蒸気にメタノール、エタノール、エチレングリコール、プロピレングリコールを含有させると、導電性の向上が見られる場合がある。アルコール化合物を含有する過熱水蒸気を作る方法は、水にアルコール化合物を溶解させた溶液の飽和蒸気を加熱する方法、アルコール化合物と水、夫々の飽和蒸気を混合加熱する方法が挙げられる。過熱水蒸気中のアルコール化合物の含有率は化合物の種類により最適範囲は異なるが、0.01〜20重量%の範囲で用いる。アルコール化合物の含有率が0.01重量%未満では導電性改善効果が見られず、20重量%を超えるとバインダー樹脂の溶解や分解が顕著に起こることがある。好ましい範囲は0.1〜5重量%である。 When methanol, ethanol, ethylene glycol, or propylene glycol is contained in superheated steam, conductivity may be improved. Examples of the method for producing superheated steam containing an alcohol compound include a method of heating a saturated vapor of a solution in which an alcohol compound is dissolved in water, and a method of mixing and heating an alcohol compound and water, and each saturated vapor. The optimum range of the alcohol compound content in the superheated steam varies depending on the type of the compound, but is used in the range of 0.01 to 20% by weight. When the content of the alcohol compound is less than 0.01% by weight, the effect of improving the conductivity is not observed, and when it exceeds 20% by weight, the binder resin may be significantly dissolved or decomposed. A preferred range is from 0.1 to 5% by weight.
過熱水蒸気処理は導電性ペーストの塗膜の焼成処理として施されることが好ましい。過熱水蒸気処理による焼成処理は金属微粒子の平均粒径が0.1μm〜5μmの範囲にある場合に特に高い効果を発揮する傾向にある。導電性金属粉の結晶化度や酸化度等の表面状態により異なるが、いわゆるナノ粒子では表面活性が大きく、一般に知られているバルクの融点よりもはるかに低い温度で融着を始める。なお、本発明において焼成処理とは、金属微粒子の少なくとも一部に融着を生じる加熱処理を指し、バインダー樹脂および分散剤の分解や飛散は必ずしも要しないものとする。 The superheated steam treatment is preferably performed as a baking treatment for the coating film of the conductive paste. The baking treatment by the superheated steam treatment tends to exhibit a particularly high effect when the average particle diameter of the metal fine particles is in the range of 0.1 μm to 5 μm. Although it varies depending on the surface state of the conductive metal powder such as crystallinity and degree of oxidation, so-called nanoparticles have a large surface activity and start to be fused at a temperature much lower than the generally known melting point of the bulk. In the present invention, the firing treatment refers to a heat treatment in which at least a part of the metal fine particles are fused, and it is not necessarily required to decompose or scatter the binder resin and the dispersant.
本発明で用いる過熱水蒸気の温度は150℃以上、特に200℃以上が好ましく、さらに300℃以上が好ましい。温度の上限は用いる絶縁性基材やバインダー樹脂の耐熱特性等から決まるが、400℃以下が好ましい。加熱時間も被処理物の量や特性から選ばれるが、10秒〜30分間が好ましい。過熱水蒸気の温度が低すぎると、低体積抵抗率の導電層を得ることができない。過熱水蒸気の温度が高すぎると、バインダー樹脂の大半または全てが除去され、導電性薄膜と絶縁性基材の密着性が損なわれることがあり、また、絶縁性基材の劣化が生じる場合があり、特に有機材料からなる絶縁性基材を用いる場合には注意が必要である。 The temperature of the superheated steam used in the present invention is 150 ° C. or higher, particularly preferably 200 ° C. or higher, and more preferably 300 ° C. or higher. The upper limit of the temperature is determined by the insulating base material used and the heat resistance characteristics of the binder resin, but is preferably 400 ° C. or lower. The heating time is also selected from the amount and characteristics of the object to be processed, but is preferably 10 seconds to 30 minutes. When the temperature of the superheated steam is too low, a conductive layer having a low volume resistivity cannot be obtained. If the temperature of the superheated steam is too high, most or all of the binder resin is removed, the adhesion between the conductive thin film and the insulating substrate may be impaired, and the insulating substrate may be deteriorated. In particular, care must be taken when using an insulating substrate made of an organic material.
本発明の導電性ペーストで導電性金属粉に銅粉を使用する場合、銅粉表面は空気中で酸化されやすいので、薄膜層には、防錆処理が施すことができる。好ましい防錆処理方法としては、導電性薄膜層の表面に銅に対して吸着能力のある有機化合物あるいは無機化合物の吸着層を設ける方法を挙げることができる。ここで、導電性薄膜層に含まれる導電性金属粉が相互に融着していない導電性金属粉を含有する場合には、前記吸着層は個々の導電性金属粉の表面に形成されることが好ましい。また別の好ましい防錆処理方法としては、防水性のある絶縁樹脂層を導電性薄膜層上に設ける方法を挙げることができる。導電性薄膜層の表面に有機化合物あるいは無機化合物の吸着層を設け、さらに絶縁樹脂層で被覆する方法は、本発明の好ましい実施態様の一例である。 When copper powder is used as the conductive metal powder in the conductive paste of the present invention, the surface of the copper powder is easily oxidized in the air, so that the thin film layer can be subjected to rust prevention treatment. As a preferable rust prevention treatment method, a method of providing an adsorption layer of an organic compound or an inorganic compound capable of adsorbing copper on the surface of the conductive thin film layer can be exemplified. Here, when the conductive metal powder contained in the conductive thin film layer contains conductive metal powders that are not fused to each other, the adsorption layer is formed on the surface of each conductive metal powder. Is preferred. Another preferred rust prevention treatment method includes a method of providing a waterproof insulating resin layer on the conductive thin film layer. A method of providing an organic compound or inorganic compound adsorption layer on the surface of the conductive thin film layer and further covering with an insulating resin layer is an example of a preferred embodiment of the present invention.
本発明における導電性薄膜層の表面に吸着層を形成できる有機化合物あるいは無機化合物(以下、表面処理剤と称する場合がある)としては、ベンゾトリアゾール、トリルトリアゾール、テトラゾール等の含窒素複素環化合物、メルカプトプロピオン酸、メルカプト酢酸、チオフェノール、トリアジンジチオール等の含硫黄化合物、オクチルアミン、イソブチルアミン等のアミノ化合物、シランカップリング剤、チタンカップリング剤、クロメート処理剤等が挙げられる。表面処理剤を溶解した処理剤に導電性薄膜を浸漬する、あるいは処理剤を導電性薄膜に塗布することで、吸着層の形成がなされる。表面処理剤層の厚みが増すと導電性の低下や接着加工性の悪化を起こす場合があるので、表面処理層の厚みは0.05μm以下の薄層とすることが望ましい。表面処理剤層を薄層にする方法としては、処理液の濃度を下げる、表面処理剤を溶解する溶剤で余分の表面処理剤を除去する等が挙げられる。 Examples of the organic compound or inorganic compound (hereinafter sometimes referred to as a surface treatment agent) that can form an adsorption layer on the surface of the conductive thin film layer in the present invention include nitrogen-containing heterocyclic compounds such as benzotriazole, tolyltriazole, and tetrazole, Examples thereof include sulfur-containing compounds such as mercaptopropionic acid, mercaptoacetic acid, thiophenol and triazinedithiol, amino compounds such as octylamine and isobutylamine, silane coupling agents, titanium coupling agents and chromate treatment agents. The adsorption layer is formed by immersing the conductive thin film in the treatment agent in which the surface treatment agent is dissolved, or by applying the treatment agent to the conductive thin film. When the thickness of the surface treatment agent layer is increased, the conductivity may be lowered or the adhesive processability may be deteriorated. Therefore, the thickness of the surface treatment layer is preferably a thin layer of 0.05 μm or less. Examples of the method for thinning the surface treatment agent layer include reducing the concentration of the treatment liquid and removing excess surface treatment agent with a solvent that dissolves the surface treatment agent.
本発明における導電性薄膜層上に設ける防水性のある絶縁樹脂としては、ポリエステル樹脂、アクリル樹脂、ポリウレタン樹脂、ブチラール樹脂等が挙げられる。これらの樹脂の一種以上で銅薄膜層を被覆することにより防錆効果が発揮できる。防水性のある絶縁樹脂で導電性薄膜層を被覆する方法は特に限定されないが、樹脂溶液を銅薄膜層に塗布または印刷し次いで溶媒を揮散させる方法、樹脂フィルムに接着剤を塗布して導電性薄膜層に貼り合わせる方法を、好ましい方法として例示することができる。接着剤付きのポリイミドフィルムあるいはポリエステルフィルムを貼り合わせることは、特に好ましい実施態様の例である。絶縁樹脂層の厚みは1〜30μmが望ましい。 Examples of the waterproof insulating resin provided on the conductive thin film layer in the present invention include a polyester resin, an acrylic resin, a polyurethane resin, and a butyral resin. By coating the copper thin film layer with one or more of these resins, the rust prevention effect can be exhibited. The method for coating the conductive thin film layer with a waterproof insulating resin is not particularly limited, but the method is a method in which a resin solution is applied or printed on a copper thin film layer, and then the solvent is stripped off. A method of bonding to the thin film layer can be exemplified as a preferable method. Bonding a polyimide film or a polyester film with an adhesive is an example of a particularly preferred embodiment. The thickness of the insulating resin layer is desirably 1 to 30 μm.
本発明をさらに詳細に説明するために以下に実施例を挙げるが、本発明は実施例になんら限定されるものではない。なお、実施例に記載された測定値は以下の方法によって測定したものである。 In order to describe the present invention in more detail, examples are given below, but the present invention is not limited to the examples. In addition, the measured value described in the Example is measured by the following method.
1.分子量
GPC(ゲルパーミネーションクロマトグラフィー)によりポリスチレン換算の数平均分子量を測定した。
1. Molecular weight The number average molecular weight in terms of polystyrene was measured by GPC (gel permeation chromatography).
2 . ガラス転移点温度(Tg)
示差走査熱量計(DSC)を用いて、20℃/分の昇温速度で測定した。サンプルは試料5mgをアルミニウム押え蓋型容器に入れ、クリンプした。
2. Glass transition temperature (Tg)
It measured with the temperature increase rate of 20 degree-C / min using the differential scanning calorimeter (DSC). As a sample, 5 mg of a sample was placed in an aluminum press-lid container and crimped.
(1) 電気抵抗の測定方法
電気抵抗率は、抵抗率計(商品名:ロレスタ−GP MCP−T610型、三菱化学製)および四探針プローブ(ASPプローブ)を用いた四端子法で測定した。
(1) Electrical resistance measurement method The electrical resistivity was measured by a four-terminal method using a resistivity meter (trade name: Loresta-GP MCP-T610, manufactured by Mitsubishi Chemical) and a four-probe probe (ASP probe). .
(2) 接着力の評価方法
ニチバン株式会社製セロテープ(登録商標)「CT405AP−15」の1cm幅のものを使用し、金属薄膜面にその接着テープを5cm長貼り付け、剥がした際に金属薄膜面が損傷を受けているかどうか、目視観察により判断した。金属薄膜に剥がれ、浮き、亀裂等の何らかの損傷が認められた場合には×、損傷が認められなかった場合には○と判定した。
(2) Adhesive strength evaluation method Nichiban Co., Ltd. cello tape (registered trademark) “CT405AP-15” having a width of 1 cm is used. Whether or not the surface was damaged was judged by visual observation. When some damage such as peeling, floating and cracking was observed on the metal thin film, it was judged as x, and when no damage was found, it was judged as ○.
実施例1
下記の配合割合の組成物を、撹拌機を付けた4つ口フラスコに入れて撹拌・加熱を行い、常法に従い、共重合ポリエステル1を得た。
テレフタル酸ジメチル 50部
イソフタル酸ジメチル 20部
セバシン酸ジメチル 30部
ネオペンチルグリコール 45部
エチレングリコール 55部
得られた共重合ポリエステルの組成は、テレフタル酸/イソフタル酸//エチレングリコール/ネオペンチルグリコール=50/50//55/45(モル比)で、数平均分子量15000、ガラス転移温度は65℃であった。
Example 1
A composition having the following blending ratio was put into a four-necked flask equipped with a stirrer and stirred and heated to obtain a copolymerized polyester 1 according to a conventional method.
Dimethyl terephthalate 50 parts Dimethyl isophthalate 20 parts Dimethyl sebacate 30 parts Neopentyl glycol 45 parts Ethylene glycol 55 parts The composition of the copolymerized polyester is terephthalic acid / isophthalic acid // ethylene glycol / neopentyl glycol = 50 / The number average molecular weight was 15000 and the glass transition temperature was 65 ° C. at 50 // 55/45 (molar ratio).
続いて、下記割合の組成物を3本ロールミルで分散し、分散ペースト1を得た。さらに、スクリーン印刷法でポリイミドフィルム上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体1Aを得た。
バインダー樹脂の溶液 1.8部
(共重合ポリエステル1をn-ブチルカルビトールアセテートに溶解させた35質量%溶液)
銅微粒子 20部
(RCA−16[球状銅粉、平均粒径0.8μm、DOWAエレクトロニクス株式会社製)
ヒドロキシカルボン酸(クエン酸) 1部
水 1部
エチルカルビトールアセテート 3部
Then, the composition of the following ratio was disperse | distributed with the 3 roll mill, and the dispersion paste 1 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on a polyimide film with the screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 1A.
Binder resin solution 1.8 parts (35% by weight solution in which copolymer polyester 1 is dissolved in n-butyl carbitol acetate)
20 parts of copper fine particles (RCA-16 [spherical copper powder, average particle size 0.8 μm, manufactured by DOWA Electronics Co., Ltd.)
Hydroxycarboxylic acid (citric acid) 1 part Water 1 part Ethyl carbitol acetate 3 parts
基材への接着性を付与するために、ポリアミドイミド樹脂を含有するコート液を作製した。下記配合割合の組成物を、撹拌機を付けた4つ口フラスコに入れて撹拌・加熱を行い、常法に従い、ポリアミドイミド樹脂1を得た。
バイロン220[東洋紡株式会社製] 100部
ベンゾフェノンテトラカルボン酸二無水物([BTDA]、株式会社ダイセル製) 20部
MDI[イソシアネート、日本ポリウレタン株式会社製] 5部
In order to impart adhesiveness to the substrate, a coating solution containing a polyamideimide resin was prepared. A composition having the following blending ratio was put into a four-necked flask equipped with a stirrer and stirred and heated to obtain a polyamideimide resin 1 according to a conventional method.
Byron 220 [Toyobo Co., Ltd.] 100 parts Benzophenone tetracarboxylic dianhydride ([BTDA], Daicel Corporation) 20 parts
MDI [Isocyanate, manufactured by Nippon Polyurethane Co., Ltd.] 5 parts
コート組成液は下記(1)〜(6)を混合・撹拌して使用した。
(1)ポリアミドイミド樹脂1 1.0部
(2)エポキシ604 (エポキシ樹脂、三菱化学製) 0.2部
(3)トリフェニルホスフィン 0.05部
(4)ベンゾフェノンテトラカルボン酸二無水物(BTDA) 0.05部
(5)トルエン 1.0部
(6)メチルエチルケトン 1.0部
The coating composition liquid was used by mixing and stirring the following (1) to (6).
(1) Polyamideimide resin 1 1.0 part
(2) Epoxy 604 (epoxy resin, manufactured by Mitsubishi Chemical) 0.2 parts
(3) Triphenylphosphine 0.05 part
(4) Benzophenone tetracarboxylic dianhydride (BTDA) 0.05 parts
(5) Toluene 1.0 part
(6) 1.0 part of methyl ethyl ketone
得られたコート液組成液を使って、ポリイミドフィルム(商品名アピカルNPI、株式会社カネカ製、厚み25μm)に、ワイヤーバー(#4)でコートし、80℃5分乾燥後、220℃90秒熱風乾燥機で熱処理して、接着層付きポリイミドフィルム1を作製した。 Using the obtained coating liquid composition liquid, a polyimide film (trade name Apical NPI, manufactured by Kaneka Corporation, thickness 25 μm) is coated with a wire bar (# 4), dried at 80 ° C. for 5 minutes, and then 220 ° C. for 90 seconds. It heat-processed with the hot air dryer, and produced the polyimide film 1 with an adhesive layer.
実施例2
実施例1記載のヒドロキシカルボン酸をリンゴ酸にして分散ペーストを作製し、分散ペースト2を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体2Aを得た。
Example 2
Dispersion paste was prepared by using hydroxycarboxylic acid described in Example 1 as malic acid to obtain dispersion paste 2. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 2A.
実施例3
実施例1記載のヒドロキシカルボン酸をグリセリン酸にして分散ペーストを作製し、分散ペースト3を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体3Aを得た。
Example 3
Dispersion paste was prepared by using hydroxycarboxylic acid described in Example 1 as glyceric acid to obtain dispersion paste 3. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 3A.
実施例4
実施例1記載のヒドロキシカルボン酸をヒドロキシクエン酸にして分散ペーストを作製し、分散ペースト4を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体4Aを得た。
Example 4
Dispersion paste was prepared using hydroxycarboxylic acid described in Example 1 as hydroxycitric acid to obtain dispersion paste 4. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer by the screen-printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 4A.
実施例5
実施例1記載のヒドロキシカルボン酸を酒石酸にして分散ペーストを作製し、分散ペースト5を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体5Aを得た。
Example 5
Dispersion paste was prepared by using hydroxycarboxylic acid described in Example 1 as tartaric acid to obtain Dispersion Paste 5. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 5A.
比較例1
実施例1記載のヒドロキシカルボン酸を添加せず、分散ペーストを作製し、分散ペースト6を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体6Aを得た。
Comparative Example 1
A dispersion paste was prepared without adding the hydroxycarboxylic acid described in Example 1, and a dispersion paste 6 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 6A.
比較例2
実施例1記載のヒドロキシカルボン酸をギ酸にして分散ペーストを作製し、分散ペースト7を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体7Aを得た。
Comparative Example 2
A dispersion paste was prepared by using hydroxycarboxylic acid described in Example 1 as formic acid to obtain dispersion paste 7. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with the screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 7A.
続いて、金属薄膜積層体1A〜7Aを150、180、200、230、250℃で10分間の過熱水蒸気による焼成処理を行い、金属薄膜積層体1B〜7Bを得た。過熱水蒸気の発生装置として蒸気過熱装置(第一高周波工業株式会社製「DHF Super−Hi 10」)を用い、10kg/時間の過熱水蒸気を供給する熱処理炉で行った。金属薄膜積層体1B〜7Bについて、各処理温度での比抵抗をプロットし、比抵抗50μ(Ω×cm)を発現する温度(導電性発現温度)および接着力を評価した。評価結果を表1に示した。 Subsequently, the metal thin film laminates 1A to 7A were baked with superheated steam at 150, 180, 200, 230, and 250 ° C. for 10 minutes to obtain metal thin film laminates 1B to 7B. A steam superheater (“DHF Super-Hi 10” manufactured by Daiichi High Frequency Industrial Co., Ltd.) was used as a superheated steam generator, and was performed in a heat treatment furnace that supplied superheated steam at 10 kg / hour. About the metal thin film laminated bodies 1B-7B, the specific resistance in each process temperature was plotted, and the temperature (conductivity expression temperature) and adhesive force which express specific resistance 50micrometer (ohm * cm) were evaluated. The evaluation results are shown in Table 1.
実施例6
実施例1記載のヒドロキシカルボン酸(クエン酸)添加量を0.8部にした分散ペーストを作製し、分散ペースト8を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体8Aを得た。
Example 6
A dispersion paste was prepared in which the amount of hydroxycarboxylic acid (citric acid) added in Example 1 was 0.8 part, and dispersion paste 8 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 8A.
実施例7
実施例1記載のヒドロキシカルボン酸(クエン酸)添加量を0.5部にした分散ペーストを作製し、分散ペースト9を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体9Aを得た。
Example 7
A dispersion paste was prepared in which the amount of hydroxycarboxylic acid (citric acid) added in Example 1 was 0.5 part, and a dispersion paste 9 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 9A.
実施例8
実施例1記載のヒドロキシカルボン酸(クエン酸)添加量を0.2部にした分散ペーストを作製し、分散ペースト10を得た。さらにスクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体10Aを得た。
Example 8
A dispersion paste was prepared in which the amount of hydroxycarboxylic acid (citric acid) added in Example 1 was 0.2 part, and dispersion paste 10 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 10A.
続いて、金属薄膜積層体8A〜10Aを150、180、200、230、250℃で10分間の過熱水蒸気による焼成処理を行い、金属薄膜積層体8B〜10Bを得た。過熱水蒸気の発生装置として蒸気過熱装置(第一高周波工業株式会社製「DHF Super−Hi 10」)を用い、10kg/時間の過熱水蒸気を供給する熱処理炉で行った。金属薄膜積層体8B〜10Bについて、各処理温度での比抵抗をプロットし、比抵抗50μ(Ω×cm)を発現する温度(導電性発現温度)および接着力を評価した。評価結果を表2に示した Subsequently, the metal thin film laminates 8A to 10A were subjected to baking treatment with superheated steam at 150, 180, 200, 230, and 250 ° C. for 10 minutes to obtain metal thin film laminates 8B to 10B. A steam superheater (“DHF Super-Hi 10” manufactured by Daiichi High Frequency Industrial Co., Ltd.) was used as a superheated steam generator, and was performed in a heat treatment furnace that supplied superheated steam at 10 kg / hour. For the metal thin film laminates 8B to 10B, the specific resistance at each treatment temperature was plotted, and the temperature (conductivity development temperature) and the adhesive strength at which the specific resistance was 50 μ (Ω × cm) were evaluated. The evaluation results are shown in Table 2.
実施例9
下記の配合割合の組成物を、撹拌機を付けた4つ口フラスコに入れて撹拌・加熱を行い、常法に従い、共重合ポリエステルポリウレタン1を得た。
cis-1,2-シクロヘキサンジカルボン酸無水物(HHPA) 40部
1,4-シクロヘキサンジカルボン酸(CHDA) 60部
ネオペンチルグリコール 40部
エチレングリコール 50部
3−メチルプロパンジオール 10部
イソホロンジイソシアネート 100部
得られた共重合ポリエステルポリウレタンの数平均分子量は31555、ガラス転移温度は13℃であった。
Example 9
A composition having the following blending ratio was placed in a four-necked flask equipped with a stirrer and stirred and heated to obtain a copolymer polyester polyurethane 1 according to a conventional method.
40 parts of cis-1,2-cyclohexanedicarboxylic anhydride (HHPA)
1,4-cyclohexanedicarboxylic acid (CHDA) 60 parts Neopentyl glycol 40 parts Ethylene glycol 50 parts
3-methylpropanediol 10 parts Isophorone diisocyanate 100 parts The resulting copolymer polyester polyurethane had a number average molecular weight of 31555 and a glass transition temperature of 13 ° C.
続いて、下記割合の組成物を3本ロールミルで分散し、分散ペースト2を得た。さらに、スクリーン印刷法で接着層付きポリイミドフィルム1上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体11Aを得た。
バインダー樹脂の溶液 1.8部
(共重合ポリエステルポリウレタン1をn-ブチルカルビトールアセテートに溶解させた35質量%溶液)
銅微粒子 20部
(RCA−16[球状銅粉、平均粒径0.8μm、DOWAエレクトロニクス株式会社製)
ヒドロキシカルボン酸(クエン酸) 1部
水 1部
エチルカルビトールアセテート 3部
Then, the composition of the following ratio was disperse | distributed with the 3 roll mill, and the dispersion paste 2 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on the polyimide film 1 with an adhesive layer with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained 11 A of metal thin film laminated bodies.
Binder resin solution 1.8 parts (35% by mass solution of copolyester polyurethane 1 dissolved in n-butyl carbitol acetate)
20 parts of copper fine particles (RCA-16 [spherical copper powder, average particle size 0.8 μm, manufactured by DOWA Electronics Co., Ltd.)
Hydroxycarboxylic acid (citric acid) 1 part Water 1 part Ethyl carbitol acetate 3 parts
続いて、金属薄膜積層体11Aを150、180、200、230、250℃で10分間の過熱水蒸気による焼成処理を行い、金属薄膜積層体11Bを得た。過熱水蒸気の発生装置として蒸気過熱装置(第一高周波工業株式会社製「DHF Super−Hi 10」)を用い、10kg/時間の過熱水蒸気を供給する熱処理炉で行った。金属薄膜積層体11Bについて、各処理温度での比抵抗をプロットし、比抵抗50μ(Ω×cm)を発現する温度(導電性発現温度)および接着力を評価した。評価結果を表3に示した。 Subsequently, the metal thin film laminate 11A was baked with superheated steam at 150, 180, 200, 230, and 250 ° C. for 10 minutes to obtain a metal thin film laminate 11B. A steam superheater (“DHF Super-Hi 10” manufactured by Daiichi High Frequency Industrial Co., Ltd.) was used as a superheated steam generator, and was performed in a heat treatment furnace that supplied superheated steam at 10 kg / hour. About the metal thin film laminated body 11B, the specific resistance in each process temperature was plotted, and the temperature (conductivity expression temperature) and adhesive force which express specific resistance 50micro (ohm * cm) were evaluated. The evaluation results are shown in Table 3.
本発明により、過熱水蒸気処理で導電性銅薄膜を作製する方法において、従来よりも低温で焼成することができ、所定の体積抵抗値を有する銅薄膜を形成することができる。また、絶縁性基材との接着力も有することから、フレキシブルな絶縁性基材に使用しても、経時変化で絶縁性基材からの剥がれや浮きなどの問題が発生しにくい。本発明の金属薄膜は、金属/樹脂積層体、電磁シールド金属薄膜等の金属薄膜形成材料、めっき用導電層、金属配線材料、導電材料等として有用であり、導電性回路、アンテナ、電磁波シールド体、電極等に応用することができる。 According to the present invention, in a method for producing a conductive copper thin film by superheated steam treatment, the copper thin film can be fired at a lower temperature than conventional and a copper thin film having a predetermined volume resistance value can be formed. Moreover, since it has adhesive force with an insulating base material, even if it uses it for a flexible insulating base material, it is hard to generate | occur | produce problems, such as peeling from an insulating base material and a float, with a time-dependent change. The metal thin film of the present invention is useful as a metal thin film forming material such as a metal / resin laminate, an electromagnetic shielding metal thin film, a plating conductive layer, a metal wiring material, a conductive material, and the like. It can be applied to electrodes and the like.
Claims (9)
化1中で、R1は-Hまたは-COOHを、R2は-Hまたは-CH2COOH、R3は-Hまたは-OHを表す。 The conductive paste according to claim 1, wherein the additive is a hydroxycarboxylic acid represented by the following chemical formula.
In Chemical Formula 1, R1 represents —H or —COOH, R2 represents —H or —CH2COOH, and R3 represents —H or —OH.
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