JP2013065462A - Manufacturing method of transparent conductive member and transparent conductive member - Google Patents

Abstract

A method for producing a transparent conductive member capable of producing a transparent conductive member having excellent transparency and conductivity with high productivity is provided.
A method of manufacturing a transparent conductive member 1 according to the present invention includes a step of forming a graphene layer 3 on a metal foil 2 by a vapor deposition method, and a surface of the graphene layer 3 opposite to the metal foil 2 is formed. It includes a step of bonding to a transparent substrate 4 and a step of forming a first conductor layer 5 by performing a patterning process on the metal foil 2.
[Selection] Figure 1

Description

  The present invention relates to a method for producing a transparent conductive member having both transparency and conductivity, and a transparent conductive member produced by this method.

  Members having both transparency and conductivity are applied to transparent electrodes, touch panel components, and the like, and are expected to expand their applications. As such a member, a member constituted by depositing ITO on a transparent base material such as a glass base material can be cited as a representative example.

  However, since indium, which is the main component of ITO, is a rare metal, there are problems regarding cost and resource depletion.

On the other hand, in recent years, a graphene sheet has been attracting attention as a material having both high transparency and conductivity. The graphene sheet is a sheet having a thickness of one atom formed by arranging carbon atoms in a hexagonal lattice structure in a planar shape by sp ² bonds, and the electrical resistance value at room temperature is 2/3 that of copper. It is a material excellent in both conductivity and durability that its current density resistance is 100 times or more that of copper.

  Patent Document 1 relates to a method for producing graphene, including a base member, a hydrophilic oxide layer formed on the base member, a hydrophobic metal catalyst layer formed on the oxide layer, and the metal catalyst layer. Preparing a graphene member including a graphene layer formed thereon, providing water to the graphene member, separating the metal catalyst layer from the oxide layer, and removing the metal catalyst layer using an etching method; Is disclosed.

JP 2011-63506 A

  However, the method disclosed in Patent Document 1 requires a step of forming a metal catalyst layer and then removing it, which causes a disadvantage of increasing the number of steps.

  This invention is made | formed in view of the said reason, and it aims at providing the manufacturing method of the transparent conductive member which can manufacture the transparent conductive member which has the outstanding transparency and electroconductivity with sufficient productivity. To do.

The method for producing a transparent conductive member according to the present invention includes:
Forming a graphene layer on the metal foil by vapor deposition;
Joining a surface of the graphene layer opposite to the metal foil to a transparent substrate and patterning the metal foil to form a first conductor layer.

  In the method for producing a transparent conductive member according to the present invention, the first conductor layer may be formed in a mesh shape by the patterning process.

  The method for manufacturing a transparent conductive member according to the present invention may further include a step of forming a second conductor layer by performing a patterning process on the graphene layer.

The transparent conductive member according to the present invention includes a transparent substrate, a graphene layer laminated on the substrate, and a first layer laminated on the surface of the graphene layer opposite to the substrate. And a conductor layer of
The first conductor layer is formed by performing a patterning process on the metal foil,
The graphene layer is formed on the metal foil by a vapor deposition method.

  In the transparent conductive member according to the present invention, the first conductor layer may have a mesh shape.

The transparent conductive member according to the present invention includes a transparent base material, a second conductor layer laminated on the base material, and a surface of the second conductor layer opposite to the base material. A first conductor layer partially laminated,
The first conductor layer is formed by performing a patterning process on the metal foil,
The second conductor layer is formed by performing a patterning process on a graphene layer formed by vapor deposition on the metal foil,
The portion where the first conductor layer in the second conductor layer is not overlapped constitutes the first electrode,
The second electrode connected to the first electrode may be constituted by the first conductor layer and the portion of the second conductor layer on which the first conductor layer is overlapped.

  According to the present invention, the metal foil necessary for forming the graphene can be actively used to form the first conductor layer, whereby the use of the metal foil increases the number of processes. Therefore, a transparent conductive member having both excellent transparency and conductivity can be manufactured with high productivity.

(A) thru | or (d) are sectional drawings which show the 1st aspect of the manufacturing method of the transparent conductive member in embodiment of this invention. It is a top view which shows an example of a transparent conductive member. (A) thru | or (e) are sectional drawings which show the 2nd aspect of the manufacturing method of the transparent conductive member in embodiment of this invention. It is a top view which shows the other example of a transparent conductive member.

  The manufacturing method of the transparent conductive member 1 according to the present embodiment is opposite to the step of preparing the metal foil 2, the step of forming the graphene layer 3 on the metal foil 2 by vapor deposition, and the metal foil 2 of the graphene layer 3. The step of joining the side surface to the transparent base material 4 and the step of forming the first conductor layer 5 by subjecting the metal foil 2 to patterning are included.

  In FIG. 1, the 1st aspect of the manufacturing method of the transparent conductive member 1 which concerns on this embodiment is shown.

  In this embodiment, first, a metal foil 2 is prepared as shown in FIG. The metal foil 2 is made of a metal that functions as a catalyst for forming graphene. Such metals include nickel, copper, aluminum, iron, cobalt, tungsten, and the like.

  The thickness of the metal foil 2 is appropriately set according to the thickness required for the first conductor layer 5 formed from the metal foil 2, but is preferably in the range of 1 to 100 μm.

  A graphene layer 3 is formed on the metal foil 2 as shown in FIG. The graphene layer 3 is composed of a graphene sheet. The graphene sheet is formed by an evaporation method such as a thermal CVD method or a plasma CVD method. In this case, for example, the metal foil 2 is disposed in the chamber, a carbon source in a gas phase is supplied into the chamber, and the carbon source is heated or plasma-treated in the chamber. Thereby, the carbon source is decomposed and the carbon atoms are bonded to each other to form a hexagonal planar structure, whereby a graphene sheet is formed on the metal foil 2.

  The carbon source for forming the graphene sheet is not particularly limited, but carbon monoxide, methane, ethane, ethylene, ethanol, acetylene, propane, propylene, butane, butadiene, pentane, pentene, cyclopentadiene, hexane, cyclohexane, Examples include benzene and toluene.

When the graphene layer 3 is formed by the thermal CVD method, the temperature in the chamber, the pressure of the carbon source in the chamber, and the like are appropriately adjusted. The temperature in the chamber is adjusted to a range of 300 to 2000 ° C., for example. The pressure of the carbon source in the chamber is adjusted, for example, in the range of 1.3 × 10 ^{−4 to} 1.0 × 10 ⁵ Pa, and preferably in the range of 1.3 × 10 ^{−1 to} 1.4 × 10 ⁴ Pa. It is adjusted with.

  In the case where the graphene layer 3 is formed by the thermal CVD method, it is also preferable that hydrogen is supplied together with the carbon source into the chamber. The amount of hydrogen in this case is preferably 5% by volume or more and 40% by volume or less, more preferably 10% by volume or more and 30% by volume or less, and more preferably 15% by volume or more and 25% by volume or less. It is particularly preferable if it is present.

  The graphene layer 3 may be composed of a single-layer graphene sheet, but may be composed of a plurality of layers of graphene sheets. The graphene layer 3 is preferably composed of a graphene sheet of 1 to 300 layers, particularly preferably a graphene sheet of 1 to 15 layers.

  Next, as shown in FIG. 1C, the graphene layer 3 and the transparent substrate 4 are joined. Although it does not restrict | limit especially as a material of the base material 4, For example, transparent glass, such as soda-lime glass and an alkali free glass; Polyester resin, polyolefin resin, polyamide resin, epoxy resin, fluorine resin, cellulose resin, polycarbonate resin, acrylic resin For example, a transparent plastic composed of the like. The shape of the substrate 4 may be a film shape or a plate shape.

  When the substrate 4 is formed from a polyester film, as the polyester, for example, an aromatic dicarboxylic acid component such as terephthalic acid, isophthalic acid, 2,6-naphthalene dicarboxylic acid, 4,4′-diphenyldicarboxylic acid, Aromatic polyesters produced by reaction with glycol components such as ethylene glycol, 1,4-butanediol, 1,4-cyclohexanedimethanol, 1,6-hexanediol, etc. are preferred, especially polyethylene terephthalate, polyethylene-2 1,6-naphthalene dicarboxylate is preferred. Further, the polyester may be a copolyester such as the plurality of components exemplified above.

  The base material 4 may contain organic or inorganic particles. In this case, the winding property and transportability of the base material 4 are improved. Examples of such particles include calcium carbonate particles, calcium oxide particles, aluminum oxide particles, kaolin, silicon oxide particles, zinc oxide particles, crosslinked acrylic resin particles, crosslinked polystyrene resin particles, urea resin particles, melamine resin particles, and crosslinked silicone resin particles. Etc. The substrate 4 may also contain a colorant, an antistatic agent, an ultraviolet absorber, an antioxidant, a lubricant, a catalyst, other resins, and the like as long as the transparency is not impaired.

  The haze of the substrate 4 is preferably 3% or less. In this case, the visibility of an image through the transparent conductive member 1 is improved, and the haze of the substrate 4 is particularly suitable as a film for optical use. More preferably, the haze is 1.5% or less.

  Although the thickness in particular of the base material 4 is not restrict | limited, When the base material 4 is a film form, it is preferable that the thickness is the range of 25 micrometers or more and 200 micrometers or less. In particular, when the thickness of the substrate 4 is 25 μm or more and 100 μm or less, the transparent conductive member 1 can be made thinner and lighter, and the occurrence of interference on the front and back of the transparent conductive member 1 is suppressed. Thermal contraction when the is heated is suppressed, and defects such as deterioration of workability due to thermal contraction of the base material 4 are suppressed.

  The substrate 4 may have a multilayer structure. For example, the substrate 4 may include a plate-like or sheet-like base portion made of transparent glass or plastic as described above, and one or more resin layers laminated on the base portion.

  The resin layer is preferably formed from a reactive curable resin composition. For example, the resin layer is preferably formed from at least one of a thermosetting resin composition and an active energy ray curable resin composition.

  The thermosetting resin composition includes, for example, thermosetting resins such as phenol resin, urea resin, diallyl phthalate resin, melamine resin, unsaturated polyester resin, polyurethane resin, epoxy resin, amino alkyd resin, silicon resin, polysiloxane resin, and the like. contains. A crosslinking agent, a polymerization initiator, a curing agent, a curing accelerator, a solvent and the like may be used together with the thermosetting resin as necessary. A resin layer can be formed by applying such a thermosetting resin composition and subsequently heating and thermosetting the thermosetting resin composition.

  The active energy ray-curable resin composition preferably includes a resin having an acrylate functional group. Examples of the resin having an acrylate functional group include oligomers such as (meth) acrylates of a relatively low molecular weight polyfunctional compound, prepolymers, and the like. Examples of the polyfunctional compound include polyester resins, polyether resins, acrylic resins, epoxy resins, urethane resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiol polyene resins, and polyhydric alcohols. The active energy ray-curable resin composition preferably further contains a reactive diluent. Examples of reactive diluents include monofunctional monomers such as ethyl (meth) acrylate, ethylhexyl (meth) acrylate, styrene, methylstyrene, N-vinylpyrrolidone, trimethylolpropane tri (meth) acrylate, and hexanediol (meth) acrylate. , Tripropylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di The polyfunctional monomer of (meth) acrylate is mentioned.

  When the active energy ray curable resin composition is a photocurable resin composition such as an ultraviolet curable resin composition, the photocurable resin composition preferably contains a photopolymerization initiator. Examples of the photopolymerization initiator include acetophenones, benzophenones, α-amyloxime esters, thioxanthones, and the like. The photocurable resin composition may contain a photosensitizer in addition to the photopolymerization initiator or in place of the photopolymerization initiator. Examples of the photosensitizer include n-butylamine, triethylamine, tri-n-butylphosphine, and thioxanthone. A resin layer can be formed by applying such a photocurable resin composition and subsequently irradiating the photocurable resin composition with light such as ultraviolet rays and photocuring.

  The refractive index of the resin layer can be easily adjusted by the composition of the resin composition for forming the resin layer. Moreover, it is also preferable that the refractive index of a resin layer is adjusted by the resin layer containing the particle for refractive index adjustment, and the ratio being adjusted.

  The particle diameter of the particles for adjusting the refractive index is preferably sufficiently small, that is, the particles for adjusting the refractive index are preferably so-called ultrafine particles. In this case, the light transmittance of the resin layer is sufficiently maintained. The particle diameter of the particles for adjusting the refractive index is particularly preferably in the range of 0.5 nm to 200 nm. The particle diameter of the particles for adjusting the refractive index is the diameter of a circle (area equivalent circle) having the same area as the projected area calculated from the electron micrograph image of the particles.

  The refractive index adjusting particles are preferably particles having a relatively high refractive index, and particularly preferably particles having a refractive index of 1.6 or more. These particles are preferably metal or metal oxide particles.

  The content of the refractive index adjusting particles in the resin layer is appropriately adjusted so that the refractive index of the resin layer has an appropriate value. In particular, it is preferable to adjust so that the ratio of the refractive index adjusting particles in the resin layer is 5 to 70% by volume.

  Specific examples of the particles for adjusting the refractive index include particles containing one or more oxides selected from titanium, aluminum, cerium, yttrium, zirconium, niobium, and antimony. Specific examples of the oxide include ZnO (refractive index 1.90), TiO2 (refractive index 2.3 to 2.7), CeO2 (refractive index 1.95), Sb2O5 (refractive index 1.71), SnO2, ITO (refractive index 1.95), Y2O3 (refractive index 1.87), La2O3 (refractive index 1.95), ZrO2 (refractive index 2.05), Al2O3 (refractive index 1.63), etc. are mentioned.

  A resin layer may be formed from the composition containing the binder material as shown below, and the particle | grains for refractive index adjustment used as needed. When the binder material and the particles for adjusting the refractive index are used in combination, the refractive index of the resin layer is appropriately adjusted depending on the combination, the mixing ratio, and the like. This resin layer can be formed by curing the composition by subjecting the composition to treatment such as heating, humidification, ultraviolet irradiation, and electron beam irradiation according to the properties of the binder material.

  As the binder material, a polymer having a main chain of at least one of silicon alkoxide resin, saturated hydrocarbon and polyether (for example, UV curable resin composition, thermosetting resin composition, etc.), fluorine atom in the polymer chain And a resin containing a unit containing.

  As a silicon alkoxide resin, partial hydrolysis of a silicon alkoxide represented by RmSi (OR ′) n (R and R ′ are alkyl groups having 1 to 10 carbon atoms, m + n = 4, m and n are integers). Examples include oligomers and polymers that are condensates. Specific examples of the silicon alkoxide include tetramethoxysilane, tetraethoxysilane, tetra-iso-propoxysilane, tetra-n-propoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, and tetra-tert-butoxy. Silane, tetrapentaethoxysilane, tetrapenta-iso-propoxysilane, tetrapenta-n-propoxysilane, tetrapenta-n-butoxysilane, tetrapenta-sec-butoxysilane, tetrapenta-tert-butoxysilane, methyltrimethoxysilane, methyltriethoxy Silane, methyltripropoxysilane, methyltributoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, dimethylethoxysilane, dimethylmethoxysilane, di Chill propoxysilane, dimethyl-butoxy silane, methyl dimethoxy silane, methyl diethoxy silane, hexyl trimethoxy silane, and the like.

  As the binder material, a reactive organosilicon compound having a plurality of groups (polymerizable double bond group or the like) that undergoes reactive crosslinking by heat or active energy rays may be used. The molecular weight of the organosilicon compound is preferably 5000 or less. Such reactive organosilicon compounds are obtained by reacting one terminal vinyl functional polysilane, both terminal vinyl functional polysilane, one terminal vinyl functional polysiloxane, both terminal vinyl functional polysiloxane, and these compounds. Examples include vinyl functional polysilanes and vinyl functional polysiloxanes. In addition to these, examples of the reactive organic silicon compound include (meth) acryloxysilane compounds such as 3- (meth) acryloxypropyltrimethoxysilane and 3- (meth) acryloxypropylmethyldimethoxysilane.

  As the particles for adjusting the refractive index, it is preferable to use particles having a relatively low refractive index. Examples of the material for adjusting the refractive index include silica, magnesium fluoride, lithium fluoride, aluminum fluoride, calcium fluoride, sodium fluoride, and the like. It is preferable that the refractive index adjusting particles include hollow particles. A hollow particle is a particle having a cavity surrounded by an outer shell. The refractive index of the hollow particles is preferably 1.20 to 1.45.

  The particles for adjusting the refractive index are preferably subjected to a surface treatment for improving the wettability with the binder material, if necessary.

  The particle diameter of the refractive index adjusting particles is preferably sufficiently small, that is, the refractive index adjusting particles are preferably so-called ultrafine particles. In this case, the light transmittance of the low refractive index layer is sufficiently maintained. become. The particle diameter of the particles for adjusting the refractive index is particularly preferably in the range of 0.5 nm to 200 nm. The particle diameter of the particles for adjusting the refractive index is the diameter of a circle (area equivalent circle) having the same area as the projected area calculated from the electron micrograph image of the particles.

  The content of the refractive index adjusting particles in the resin layer is adjusted as appropriate so that the refractive index value of the resin layer becomes an appropriate value, but in particular the ratio of the refractive index adjusting particles in the resin layer is It is preferable to adjust so that it may become 20-99 volume%.

  The composition may further contain a water and oil repellent material. As the water and oil repellent material, a general wax-based material or the like can be used.

  In joining the surface of the graphene layer 3 opposite to the metal foil 2 to the transparent base material 4, an appropriate method can be adopted. For example, when formed from a material that melts when at least the surface layer of the substrate 4 is heated, the graphene layer 3 and the substrate 4 can be heat-sealed.

  When the substrate 4 has a multilayer structure, the graphene layer 3 is overlaid on the resin layer while the resin layer disposed in the outermost layer of the substrate 4 is in an uncured state or a semi-cured state. The resin layer may be cured in a state, and thereby the surface of the graphene layer 3 opposite to the metal foil 2 may be bonded to the transparent substrate 4. In this case, the resin layer in an uncured state or a semi-cured state is cured by being subjected to a treatment such as heating, humidification, ultraviolet irradiation, or electron beam irradiation according to the composition of the composition constituting the resin layer. Is done.

  After the graphene layer 3 and the base material 4 are joined in this manner, the metal foil 2 is subjected to patterning treatment, whereby the first portion consisting of the remaining portion of the metal foil 2 as shown in FIG. The conductor layer 5 is formed. In the patterning process of the metal foil 2, a known appropriate method is adopted. For example, an appropriate photosensitive resin composition is applied onto the metal foil 2 and exposed and developed by a photolithography process using a glass mask or the like to form an etching resist, and then wet etching is performed on the metal foil 2. By performing the treatment, the metal foil 2 can be patterned.

  Thus, the transparent base material 4, the graphene layer 3 laminated on the base material 4, and the first laminated on the surface of the graphene layer 3 opposite to the base material 4 A transparent conductive member 1 including the conductor layer 5 is obtained. Thus, when the transparent conductive member 1 is manufactured, the metal foil 2 used for forming the graphene layer 3 by vapor deposition is used as the first conductor layer 5 which is a member constituting the transparent conductive member 1. Can be applied to form For this reason, the metal foil 2 is not wasted. Moreover, since the process of removing a part of the metal foil 2 by the patterning process is a process for forming the first conductor layer 5 as it is, there is no disadvantage of increasing the number of processes.

  The transparent conductive member 1 thus obtained has both high transparency and high conductivity. Therefore, application to various uses such as transparent electrodes, touch panel components, display components and the like is expected.

  For example, when the first conductor layer 5 having a mesh shape is formed by patterning the metal foil 2, the transparent conductive member 1 can be applied to an electromagnetic wave shielding member in a display or the like. In FIG. 2, the example of the electromagnetic wave shielding member which consists of the transparent conductive member 1 is shown. The electromagnetic wave shielding member includes a base material 4, a graphene layer 3 formed over one surface in the thickness direction of the base material 4, and a surface of the graphene layer 3 opposite to the base material 4. The network-like first conductor layer 5 is formed. This electromagnetic wave seal has less frequency dependency compared to a conventional electromagnetic wave shielding member (for example, an electromagnetic wave shielding member having a structure in which an ITO film and a net-like conductor are overlapped). That is, an electromagnetic wave shielding member that exhibits high shielding performance in a wide wavelength region can be obtained. It is preferable that the line width of the 1st conductor layer 5 in the electromagnetic wave shielding member comprised from such a transparent conductive member 1 is the range of 5-20 micrometers, and a line interval is the range of 50-500 micrometers.

  The manufacturing method of the transparent conductive member 1 according to the present embodiment may further include a step of forming the second conductor layer 6 by performing a patterning process on the graphene layer 3. In other words, the first conductor layer 5 may be formed by patterning the metal foil 2 and then the second conductor layer 6 may be formed by patterning the graphene layer 3.

  In FIG. 3, the 2nd aspect of the manufacturing method of the transparent conductive member 1 which concerns on this embodiment is shown. In this aspect, the method for manufacturing the transparent conductive member 1 includes a step of forming the second conductor layer 6.

  In this embodiment, first, as in the case of the first embodiment, the metal foil 2 is prepared as shown in FIG. 3A, and then the graphene layer 3 is formed on the metal foil 2 as shown in FIG. Then, as shown in FIG. 3 (c), the transparent substrate 4 is bonded to the surface opposite to the metal foil 2 of the graphene layer 3, and subsequently, the metal as shown in FIG. 3 (d). The first conductor layer 5 is formed by patterning the foil 2.

  Subsequently, as shown in FIG. 3E, the graphene layer 3 is subjected to a patterning process, whereby the second conductor layer 6 is formed. In the patterning process of the graphene layer 3, a known appropriate method is adopted. For example, the graphene layer 3 is partially removed by subjecting the graphene layer 3 to a dry etching process such as partial electron beam irradiation, laser beam irradiation, or O 2 plasma treatment. The conductor layer 6 can be formed.

  Thereby, the transparent base material 4, the second conductor layer 6 laminated on the base material 4, and the second conductor layer 6 partially on the surface of the second conductor layer 6 opposite to the base material 4. The transparent conductive member 1 provided with the first conductor layer 5 laminated on is obtained. In this case, as shown in FIG. 3 (e), a first electrode 7 constituted by a portion of the second conductor layer 6 where the first conductor layer 5 is not overlapped, the first conductor layer 5, The 2nd electrode 8 comprised by the part on which the 1st conductor layer 5 in the 2nd conductor layer 6 is piled up may be formed. Further, in this case, the first electrode 7 and the second electrode 8 can be formed to be conductive. Such a transparent conductive member 1 can be given various functions. For example, the first electrode 7 can be formed in a portion where high transparency is required in the transparent conductive member 1, and the second electrode 8 can be formed in a portion where high conduction reliability is required.

  An example of the use of such a transparent conductive member 1 is application to a touch panel component. In FIG. 4, the example of the components for touchscreens which consist of the transparent conductive member 1 is shown. In this touch panel component, sensing electrodes including the first electrodes 7 are formed in a grid pattern in a region where an image is displayed on the transparent substrate 4. Further, a lead line composed of the second electrode 8 connected to the first electrode 7 is formed outside the region where the image is displayed on the base material 4. In such a touch panel component, the first electrode 7 forms a very transparent sensing electrode, and the second electrode 8 draws more reliable than that formed from silver paste or the like. A line may be formed.

  The transparent conductive member according to the present invention is not limited to the first aspect and the second aspect, and various changes can be made without departing from the spirit of the invention. For example, the transparent conductive member may include both the first conductor layer formed in a mesh shape as in the first aspect and the second conductor layer as in the second aspect. .

[Example 1]
A copper foil having a thickness of 10 μm was prepared, and a graphene layer was formed on the copper foil by a thermal CVD method. At this time, the copper foil was placed in the chamber, and the acetylene gas was charged into the chamber at a constant rate of 200 sccm (3.38 × 10 ⁻² Pa · m ³ / sec), while the copper foil was heated at 400 ° C. for 20 hours. The graphene was produced | generated on copper foil by heat-processing for minutes. Subsequently, the copper foil was naturally cooled to grow graphene in a uniformly arranged state. The cooling rate was 600 ° C./min. As a result, a graphene layer was formed on the copper foil.

  A PET film (product number A4300, manufactured by Toyobo Co., Ltd., thickness 100 μm) is stacked on the graphene layer on the copper foil, and these are heated with a flat plate press under conditions of a pressing force of 0.5 MPa, a heating temperature of 120 ° C., and a processing time of 30 minutes. By applying pressure, the graphene layer and the PET film were joined.

  Subsequently, an etching resist was formed on the metal foil by a photolithography process. Subsequently, the metal foil was wet-etched at room temperature using an aqueous ferric chloride solution, and then the etching resist was removed. As a result, a first conductor layer having a mesh pattern with a line width of 10 μm and a line interval of 300 μm was formed.

  Thereby, the transparent conductive member which can be applied as an electromagnetic wave shielding member was obtained. This transparent conductive member had a visible light transmittance of 88%, a haze of 2.5%, and an electromagnetic wave shielding property of 60 dB (KEC method, 1 GHz).

[Example 2]
A copper foil having a thickness of 10 μm was prepared, and a graphene layer was formed on the copper foil by a thermal CVD method. At this time, the copper foil was placed in the chamber, and the acetylene gas was charged into the chamber at a constant rate of 200 sccm (3.38 × 10 ⁻² Pa · m ³ / sec), while the copper foil was heated at 400 ° C. for 20 hours. The graphene was produced | generated on copper foil by heat-processing for minutes. Subsequently, the copper foil was naturally cooled to grow graphene in a uniformly arranged state. The cooling rate was 600 ° C./min. As a result, a graphene layer was formed on the copper foil.

  A PET film (product number A4300, manufactured by Toyobo Co., Ltd., thickness 100 μm) is stacked on the graphene layer on the copper foil, and these are heated with a flat plate press under conditions of a pressing force of 0.5 MPa, a heating temperature of 120 ° C., and a processing time of 30 minutes. By applying pressure, the graphene layer and the PET film were joined.

Subsequently, an etching resist is formed on the metal foil by a photolithography process, followed by a wet etching process at room temperature using a ferric chloride aqueous solution on the metal foil, and then removing the etching resist. A first conductor layer was formed. Subsequently, the graphene layer was dry-etched by performing O ₂ plasma treatment under conditions of 100 W for 1 minute, thereby forming a second conductor layer. As a result, the first electrode constituted by the portion where the first conductor layer in the second conductor layer is not overlapped, and the first conductor layer in the first conductor layer and the second conductor layer are overlapped. And a second electrode constituted by a portion.

  The first electrode is a sensing electrode composed of a plurality of pad-shaped electrodes having a size of 1.4 mm × 1.4 mm in plan view and a thin line connecting only pad-shaped electrodes adjacent in the vertical direction. The second electrode is a lead line having a line width of 50 μm connected to the sensing electrode.

  Thereby, the transparent conductive member which can be applied as components for touch panels was obtained.

DESCRIPTION OF SYMBOLS 1 Transparent conductive member 2 Metal foil 3 Graphene layer 4 Base material 5 1st conductor layer 6 2nd conductor layer 7 1st electrode 8 2nd electrode

Claims (6)

Forming a graphene layer on the metal foil by vapor deposition;
A transparent conductive member including a step of bonding a surface of the graphene layer opposite to the metal foil to a transparent substrate, and a step of forming a first conductor layer by patterning the metal foil. Production method. The method for producing a transparent conductive member according to claim 1, wherein the first conductor layer is formed in a mesh shape by the patterning process. The manufacturing method of the transparent conductive member of Claim 1 or 2 which further includes the step of forming a 2nd conductor layer by performing a patterning process to the said graphene layer. A transparent base material, a graphene layer laminated on the base material, and a first conductor layer laminated on the surface of the graphene layer opposite to the base material,
The first conductor layer is formed by performing a patterning process on the metal foil,
A transparent conductive member, wherein the graphene layer is formed on the metal foil by a vapor deposition method. The transparent conductive member according to claim 4, wherein the first conductor layer has a mesh shape. A transparent substrate, a second conductor layer laminated on the substrate, and a first laminate partially laminated on a surface of the second conductor layer opposite to the substrate. A conductor layer,
The first conductor layer is formed by performing a patterning process on the metal foil,
The second conductor layer is formed by performing a patterning process on a graphene layer formed by vapor deposition on the metal foil,
The portion where the first conductor layer in the second conductor layer is not overlapped constitutes the first electrode,
A transparent conductive member in which a second electrode connected to the first electrode is constituted by the first conductor layer and a portion of the second conductor layer on which the first conductor layer is overlapped. .

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