JP2013064085A - Method for polymerizing sulfonic acid group-containing vinyl monomer - Google Patents
Method for polymerizing sulfonic acid group-containing vinyl monomer Download PDFInfo
- Publication number
- JP2013064085A JP2013064085A JP2011204459A JP2011204459A JP2013064085A JP 2013064085 A JP2013064085 A JP 2013064085A JP 2011204459 A JP2011204459 A JP 2011204459A JP 2011204459 A JP2011204459 A JP 2011204459A JP 2013064085 A JP2013064085 A JP 2013064085A
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- JP
- Japan
- Prior art keywords
- butyl
- group
- magnesium
- sulfonic acid
- zincate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000000178 monomer Substances 0.000 title claims abstract description 35
- 125000000542 sulfonic acid group Chemical group 0.000 title claims abstract description 24
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 title claims abstract description 22
- 229920002554 vinyl polymer Polymers 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 15
- 230000000379 polymerizing effect Effects 0.000 title claims abstract description 10
- -1 magnesium halide Chemical group 0.000 claims abstract description 45
- 239000011777 magnesium Chemical group 0.000 claims abstract description 24
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 24
- 239000002904 solvent Substances 0.000 claims abstract description 19
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical group [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 13
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical group [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 10
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims abstract description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 6
- 239000000460 chlorine Substances 0.000 claims abstract description 6
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 6
- 239000011630 iodine Substances 0.000 claims abstract description 6
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 20
- 238000006116 polymerization reaction Methods 0.000 claims description 18
- 229910052725 zinc Inorganic materials 0.000 claims description 15
- 239000011701 zinc Substances 0.000 claims description 14
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910052751 metal Chemical class 0.000 claims description 2
- 239000002184 metal Chemical class 0.000 claims description 2
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical class OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 abstract description 50
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 21
- SMBQBQBNOXIFSF-UHFFFAOYSA-N dilithium Chemical compound [Li][Li] SMBQBQBNOXIFSF-UHFFFAOYSA-N 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 6
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 6
- XFTALRAZSCGSKN-UHFFFAOYSA-M sodium;4-ethenylbenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C(C=C)C=C1 XFTALRAZSCGSKN-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- BKDLGMUIXWPYGD-UHFFFAOYSA-N tert-butyllithium Chemical compound [Li]C(C)(C)C BKDLGMUIXWPYGD-UHFFFAOYSA-N 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- QCIIYXPUMGDEFL-UHFFFAOYSA-N CCCC[Mg]CCCCC(C)(C)C Chemical compound CCCC[Mg]CCCCC(C)(C)C QCIIYXPUMGDEFL-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 3
- 150000002902 organometallic compounds Chemical class 0.000 description 3
- 238000006277 sulfonation reaction Methods 0.000 description 3
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- FJJCJZDUIOLPCD-UHFFFAOYSA-N C(C)(C)(C)C(CC)([Mg]CCC)C(C)(C)C Chemical compound C(C)(C)(C)C(CC)([Mg]CCC)C(C)(C)C FJJCJZDUIOLPCD-UHFFFAOYSA-N 0.000 description 2
- CUFSRALAQVLFON-UHFFFAOYSA-N C(C)(C)(C)C(CC[Zn])(C(C)(C)C)C(C)(C)C.[Mg] Chemical compound C(C)(C)(C)C(CC[Zn])(C(C)(C)C)C(C)(C)C.[Mg] CUFSRALAQVLFON-UHFFFAOYSA-N 0.000 description 2
- CUDNKCCAIYTWFP-UHFFFAOYSA-N C(CCC)C(CCC)([Mg]CCCC)CCCC Chemical compound C(CCC)C(CCC)([Mg]CCCC)CCCC CUDNKCCAIYTWFP-UHFFFAOYSA-N 0.000 description 2
- XUGKCCLUPOXQJM-UHFFFAOYSA-N CC[Mg]C(C)(C)C(C)C Chemical compound CC[Mg]C(C)(C)C(C)C XUGKCCLUPOXQJM-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 235000002597 Solanum melongena Nutrition 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 2
- QNDQILQPPKQROV-UHFFFAOYSA-N dizinc Chemical compound [Zn]=[Zn] QNDQILQPPKQROV-UHFFFAOYSA-N 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 2
- 125000002734 organomagnesium group Chemical group 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- AATHLPHPRXGBAI-UHFFFAOYSA-M sodium;4-ethenylbenzenesulfonate;hydrate Chemical compound O.[Na+].[O-]S(=O)(=O)C1=CC=C(C=C)C=C1 AATHLPHPRXGBAI-UHFFFAOYSA-M 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003752 zinc compounds Chemical class 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- ZRZHXNCATOYMJH-UHFFFAOYSA-N 1-(chloromethyl)-4-ethenylbenzene Chemical compound ClCC1=CC=C(C=C)C=C1 ZRZHXNCATOYMJH-UHFFFAOYSA-N 0.000 description 1
- LQDGDDQWVWZDCS-UHFFFAOYSA-N 1-[(2-methylpropan-2-yl)oxy]-4-prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=C(OC(C)(C)C)C=C1 LQDGDDQWVWZDCS-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- GRFNSWBVXHLTCI-UHFFFAOYSA-N 1-ethenyl-4-[(2-methylpropan-2-yl)oxy]benzene Chemical compound CC(C)(C)OC1=CC=C(C=C)C=C1 GRFNSWBVXHLTCI-UHFFFAOYSA-N 0.000 description 1
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 1
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- PRAMZQXXPOLCIY-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethanesulfonic acid Chemical compound CC(=C)C(=O)OCCS(O)(=O)=O PRAMZQXXPOLCIY-UHFFFAOYSA-N 0.000 description 1
- YQIGLEFUZMIVHU-UHFFFAOYSA-N 2-methyl-n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C(C)=C YQIGLEFUZMIVHU-UHFFFAOYSA-N 0.000 description 1
- XEEYSDHEOQHCDA-UHFFFAOYSA-N 2-methylprop-2-ene-1-sulfonic acid Chemical compound CC(=C)CS(O)(=O)=O XEEYSDHEOQHCDA-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 1
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
- IRQWEODKXLDORP-UHFFFAOYSA-N 4-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1 IRQWEODKXLDORP-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- BZZBCSGYVAXVRU-UHFFFAOYSA-N C(C)(C)(C)[Zn](C(C)(C)C)(C(C)(C)C)C(C)(C)C Chemical compound C(C)(C)(C)[Zn](C(C)(C)C)(C(C)(C)C)C(C)(C)C BZZBCSGYVAXVRU-UHFFFAOYSA-N 0.000 description 1
- KMDTYRWKRABXPP-UHFFFAOYSA-N C(C)(C)(C)[Zn](C(C)(C)C)C(C)(C)C Chemical compound C(C)(C)(C)[Zn](C(C)(C)C)C(C)(C)C KMDTYRWKRABXPP-UHFFFAOYSA-N 0.000 description 1
- UUBINBISUBBWCU-UHFFFAOYSA-N C(C)(C)(C)[Zn](CC)CC Chemical compound C(C)(C)(C)[Zn](CC)CC UUBINBISUBBWCU-UHFFFAOYSA-N 0.000 description 1
- ZVKZIDXWZPIDCD-UHFFFAOYSA-M CC(C)(C(C1=CC=CC=C1)C1=CC=CC=C1)[Mg+].[Br-] Chemical compound CC(C)(C(C1=CC=CC=C1)C1=CC=CC=C1)[Mg+].[Br-] ZVKZIDXWZPIDCD-UHFFFAOYSA-M 0.000 description 1
- CJPULZXWQAUNCZ-UHFFFAOYSA-M CC(C)(C(C1=CC=CC=C1)C1=CC=CC=C1)[Mg+].[Cl-] Chemical compound CC(C)(C(C1=CC=CC=C1)C1=CC=CC=C1)[Mg+].[Cl-] CJPULZXWQAUNCZ-UHFFFAOYSA-M 0.000 description 1
- PKHACAAFLSGCHH-UHFFFAOYSA-M CC(C)(C)C(C(C)(C)C)[Mg+].[Br-] Chemical compound CC(C)(C)C(C(C)(C)C)[Mg+].[Br-] PKHACAAFLSGCHH-UHFFFAOYSA-M 0.000 description 1
- FIGQUDWTDMGPCH-UHFFFAOYSA-N CC(C)(C)C(C(C)(C)C)[Mg] Chemical compound CC(C)(C)C(C(C)(C)C)[Mg] FIGQUDWTDMGPCH-UHFFFAOYSA-N 0.000 description 1
- OLIBVNMJDNNSKI-UHFFFAOYSA-N CC(C)(C)[Mg] Chemical compound CC(C)(C)[Mg] OLIBVNMJDNNSKI-UHFFFAOYSA-N 0.000 description 1
- CXHLFRUWYZSTPG-UHFFFAOYSA-N CC(C)(C)[Zn](C(C)(C)C)C1=CC=CC=C1 Chemical compound CC(C)(C)[Zn](C(C)(C)C)C1=CC=CC=C1 CXHLFRUWYZSTPG-UHFFFAOYSA-N 0.000 description 1
- CHAZEULCTPVCOS-UHFFFAOYSA-N CCC(C)C(C)C(C)(C)[Mg]C(C)(C)C Chemical compound CCC(C)C(C)C(C)(C)[Mg]C(C)(C)C CHAZEULCTPVCOS-UHFFFAOYSA-N 0.000 description 1
- FHGIZTAJPYNAGX-UHFFFAOYSA-N CCC(C)C(CC)C(C)(C)[Mg]C(C)(C)C Chemical compound CCC(C)C(CC)C(C)(C)[Mg]C(C)(C)C FHGIZTAJPYNAGX-UHFFFAOYSA-N 0.000 description 1
- SCDZSEGHWRWVOX-UHFFFAOYSA-N CCC(C)C(CC)C(C)(C)[Zn]C(C)(C)C Chemical compound CCC(C)C(CC)C(C)(C)[Zn]C(C)(C)C SCDZSEGHWRWVOX-UHFFFAOYSA-N 0.000 description 1
- YLFUNNFVOJYLAM-UHFFFAOYSA-N CCC(C)[Zn]C(C)(C)C(CC)CC Chemical compound CCC(C)[Zn]C(C)(C)C(CC)CC YLFUNNFVOJYLAM-UHFFFAOYSA-N 0.000 description 1
- MEWRAQILEMOCRX-UHFFFAOYSA-N CCC(CC)C(C)(C)[Mg] Chemical compound CCC(CC)C(C)(C)[Mg] MEWRAQILEMOCRX-UHFFFAOYSA-N 0.000 description 1
- MSJUFPRBSBGSDM-UHFFFAOYSA-N CCC(CC)C(C)(C)[Mg]C Chemical compound CCC(CC)C(C)(C)[Mg]C MSJUFPRBSBGSDM-UHFFFAOYSA-N 0.000 description 1
- LZMUFHVLRCMFIC-UHFFFAOYSA-N CCC(CC)C(C)(C)[Mg]C(C)(C)C Chemical compound CCC(CC)C(C)(C)[Mg]C(C)(C)C LZMUFHVLRCMFIC-UHFFFAOYSA-N 0.000 description 1
- JMEHYQKZMJWYDI-UHFFFAOYSA-N CCCC(C)(C)[Mg]C(C)(C)C Chemical compound CCCC(C)(C)[Mg]C(C)(C)C JMEHYQKZMJWYDI-UHFFFAOYSA-N 0.000 description 1
- NBXLIPBAEQEXMG-UHFFFAOYSA-N CCCCC(C)C(C)(C)[Mg]C(C)(C)C Chemical compound CCCCC(C)C(C)(C)[Mg]C(C)(C)C NBXLIPBAEQEXMG-UHFFFAOYSA-N 0.000 description 1
- UWKKBEQZACDEBT-UHFFFAOYSA-N CCCC[Mg] Chemical compound CCCC[Mg] UWKKBEQZACDEBT-UHFFFAOYSA-N 0.000 description 1
- YULNSLGBKILBOE-UHFFFAOYSA-N CCCC[Mg]C(C)(C)C(C)C Chemical compound CCCC[Mg]C(C)(C)C(C)C YULNSLGBKILBOE-UHFFFAOYSA-N 0.000 description 1
- WLTNHFIKQWFZGE-UHFFFAOYSA-N CCCC[Mg]C(C)(C)C(CC)CC Chemical compound CCCC[Mg]C(C)(C)C(CC)CC WLTNHFIKQWFZGE-UHFFFAOYSA-N 0.000 description 1
- ZUGXOWCBDASWEF-UHFFFAOYSA-N C[Zn]CC(C)(C)C Chemical compound C[Zn]CC(C)(C)C ZUGXOWCBDASWEF-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- JFYKAKLATAAMBV-UHFFFAOYSA-L [Cl-].[Mg+2].C(C)(C)(C)[Zn](C(C)(C)C)C(C)(C)C.[Cl-] Chemical compound [Cl-].[Mg+2].C(C)(C)(C)[Zn](C(C)(C)C)C(C)(C)C.[Cl-] JFYKAKLATAAMBV-UHFFFAOYSA-L 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- UOCJDOLVGGIYIQ-PBFPGSCMSA-N cefatrizine Chemical group S([C@@H]1[C@@H](C(N1C=1C(O)=O)=O)NC(=O)[C@H](N)C=2C=CC(O)=CC=2)CC=1CSC=1C=NNN=1 UOCJDOLVGGIYIQ-PBFPGSCMSA-N 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- VVSUWBLWFYUYMY-UHFFFAOYSA-J dimagnesium;tetrabromide Chemical compound [Mg+2].[Mg+2].[Br-].[Br-].[Br-].[Br-] VVSUWBLWFYUYMY-UHFFFAOYSA-J 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000010550 living polymerization reaction Methods 0.000 description 1
- HZZOEADXZLYIHG-UHFFFAOYSA-N magnesiomagnesium Chemical compound [Mg][Mg] HZZOEADXZLYIHG-UHFFFAOYSA-N 0.000 description 1
- 229910001623 magnesium bromide Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- PNHVEGMHOXTHMW-UHFFFAOYSA-N magnesium;zinc;oxygen(2-) Chemical compound [O-2].[O-2].[Mg+2].[Zn+2] PNHVEGMHOXTHMW-UHFFFAOYSA-N 0.000 description 1
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XFHJDMUEHUHAJW-UHFFFAOYSA-N n-tert-butylprop-2-enamide Chemical compound CC(C)(C)NC(=O)C=C XFHJDMUEHUHAJW-UHFFFAOYSA-N 0.000 description 1
- 150000002900 organolithium compounds Chemical class 0.000 description 1
- 125000001979 organolithium group Chemical group 0.000 description 1
- 150000002901 organomagnesium compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- MMSLOZQEMPDGPI-UHFFFAOYSA-N p-Mentha-1,3,5,8-tetraene Chemical compound CC(=C)C1=CC=C(C)C=C1 MMSLOZQEMPDGPI-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000008363 phosphate buffer Substances 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- BYYXHWABFVUKLO-UHFFFAOYSA-N zinc;2-methylpropane Chemical compound [Zn+2].C[C-](C)C.C[C-](C)C BYYXHWABFVUKLO-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本発明は特定の亜鉛アート錯体を重合開始剤として用いるスルホン酸基含有ビニルモノマーの重合方法に関する。 The present invention relates to a method for polymerizing a sulfonic acid group-containing vinyl monomer using a specific zinc art complex as a polymerization initiator.
スルホン酸基を含有するポリマーは、酸触媒、洗浄剤、イオン交換膜あるいは電解質膜として有用である。
スルホン酸基を含有するポリマーの製造方法としては、スルホン酸基を含有しないポリマーをスルホン化剤によりスルホン化する方法および、スルホン酸基含有モノマーを用い重合により合成させる方法の2通りが挙げられる。
Polymers containing sulfonic acid groups are useful as acid catalysts, cleaning agents, ion exchange membranes or electrolyte membranes.
As a method for producing a polymer containing a sulfonic acid group, there are two methods: a method of sulfonating a polymer not containing a sulfonic acid group with a sulfonating agent, and a method of synthesizing by polymerization using a sulfonic acid group-containing monomer.
ポリマーのスルホン化により製造する方法は、スルホン化の位置選択性の制御の問題や、スルホン化に用いる反応剤の残存、架橋等の副反応抑制などの問題がある。 The method of production by sulfonation of a polymer has problems such as control of the regioselectivity of sulfonation, residual of a reactant used for sulfonation, and suppression of side reactions such as crosslinking.
一方、スルホン酸基含有モノマーを用いた重合、特にスルホン酸基含有ビニルモノマーの重合は一般には開始剤としてラジカル開始剤が使用される(例えば特許文献1、2参照)。しかしながら、ラジカル重合を行うに当たっては微量不純物により重合速度や生成ポリマーの分子量が影響を受けるため、重合に際しては、モノマー、溶媒などの精製、および溶媒の溶存酸素の除去などに留意する必要があった。 On the other hand, a polymerization using a sulfonic acid group-containing monomer, particularly a polymerization of a sulfonic acid group-containing vinyl monomer, generally uses a radical initiator as an initiator (see, for example, Patent Documents 1 and 2). However, in carrying out radical polymerization, since the polymerization rate and the molecular weight of the produced polymer are affected by a small amount of impurities, it was necessary to pay attention to purification of monomers, solvents, etc., and removal of dissolved oxygen in the solvent during polymerization. .
有機金属化合物を開始剤に用いたアニオン重合では、溶媒やモノマー中に活性プロトンが存在する場合、開始剤の失活が起こるため、ポリマーを得ることはできない。
ところが内山らは、テトラt−ブチル亜鉛酸ジリチウムがN−イソプロピルアクリルアミド、N,N−ジメチルアクリルアミド、ヒドロキシエチルメタクリル酸エステル等の重合触媒として有用であり、さらにこの触媒は、含水THF(テトラヒドロフラン)等の水を含む溶液中でもリビング重合的アニオン重合を進行させることができる画期的な方法として提案した(例えば特許文献3参照)。
In anionic polymerization using an organometallic compound as an initiator, when an active proton is present in a solvent or monomer, the initiator is deactivated, so that a polymer cannot be obtained.
However, Uchiyama et al., Di-lithium tetra-t-butylzincate is useful as a polymerization catalyst for N-isopropylacrylamide, N, N-dimethylacrylamide, hydroxyethyl methacrylate, and the like, and this catalyst includes hydrous THF (tetrahydrofuran) and the like. It was proposed as an epoch-making method capable of allowing living polymerization anionic polymerization to proceed even in a solution containing water (see, for example, Patent Document 3).
またt−ブチル基を少なくとも1つ含有する亜鉛アート錯体でも、同様にアクリレート系モノマーの水系での重合が進行することが報告されている(例えば特許文献4,5参照)。
これらの亜鉛アート錯体を使用することで、モノマーや溶媒の厳密な精製を必要とすることなくアクリレート系のモノマーの重合を行う事が可能であることが示された。
Further, it has been reported that polymerization of an acrylate monomer in an aqueous system similarly proceeds even with a zinc ate complex containing at least one t-butyl group (see, for example, Patent Documents 4 and 5).
It was shown that by using these zinc ate complexes, it is possible to polymerize acrylate monomers without requiring strict purification of the monomers and solvents.
しかしながら、これらの亜鉛アート錯体が、スルホン酸基を含有するビニルモノマーの重合に使用可能であることは示されていなかった。 However, it has not been shown that these zinc art complexes can be used for the polymerization of vinyl monomers containing sulfonic acid groups.
本発明の目的は、上記問題点を解決するためになされたものであり、スルホン酸基含有ビニルモノマーの重合体を、活性プロトンを有するモノマー、溶媒、あるいは両者を用いても、高収率で重合体を得ることができるスルホン酸基含有ビニルモノマーの重合方法を提供することにある。
即ち、いずれの先行技術もスルホン酸基含有ビニルモノマーの重合開始剤として、最適な物質を示唆するものではない。
An object of the present invention is to solve the above-mentioned problems, and a polymer of a sulfonic acid group-containing vinyl monomer can be produced in a high yield even when a monomer having an active proton, a solvent, or both are used. It is an object of the present invention to provide a method for polymerizing a sulfonic acid group-containing vinyl monomer capable of obtaining a polymer.
That is, none of the prior art suggests an optimum substance as a polymerization initiator for a sulfonic acid group-containing vinyl monomer.
本発明者らは、本課題を解決するために鋭意努力を行った結果、亜鉛原子上にt−ブチル基を少なくとも1つもつ有機亜鉛アート錯体がアニオン重合性モノマーの重合開始剤として好適であることを見出し、本発明を完成するに至った。
すなわち本発明は、下記一般式(1)または(2)で示される亜鉛アート錯体を重合開始剤として用いることを特徴とするスルホン酸基含有ビニルモノマーの重合方法である。
t−BunR3−nZnM (1)
(式中、nは1〜3の整数であり、Mはリチウム、マグネシウムあるいはMgX(Xは塩素、臭素、ヨウ素のいずれかを表す。)で示されるハロゲン化マグネシウムを表し、Rは炭素数1〜12のアルキル基、アルケニル基、アリール基、またはアリールアルキル基を示す。)
t−BumR’4−mZnMl (2)
(式中、mは1〜4の整数であり、lは1〜2の実数であり、R’は式(1)のRと同一でも異なっていてもよく、炭素数1〜12のアルキル基、アルケニル基、アリール基、またはアリールアルキル基を示し、Mはリチウム、マグネシウムあるいはMgX(Xは塩素、臭素、ヨウ素のいずれかを表す)で示されるハロゲン化マグネシウムを表す。)
As a result of intensive efforts to solve this problem, the present inventors have found that an organozinc ate complex having at least one t-butyl group on a zinc atom is suitable as a polymerization initiator for an anion polymerizable monomer. As a result, the present invention has been completed.
That is, the present invention is a method for polymerizing a sulfonic acid group-containing vinyl monomer, characterized in that a zinc art complex represented by the following general formula (1) or (2) is used as a polymerization initiator.
t-Bu n R 3-n ZnM (1)
(In the formula, n is an integer of 1 to 3, M represents a magnesium halide represented by lithium, magnesium, or MgX (X represents any one of chlorine, bromine, and iodine), and R represents one carbon atom. Represents an alkyl group, an alkenyl group, an aryl group, or an arylalkyl group of ˜12.)
t-Bu m R ′ 4-m ZnM l (2)
(In the formula, m is an integer of 1 to 4, l is a real number of 1 to 2, R 'may be the same as or different from R of formula (1), and an alkyl group having 1 to 12 carbon atoms. , An alkenyl group, an aryl group, or an arylalkyl group, and M represents a magnesium halide represented by lithium, magnesium, or MgX (X represents any one of chlorine, bromine, and iodine).
本発明の重合開始剤は下記一般式(1)または(2)で示される少なくとも1つのt−ブチル基を有する有機亜鉛アート錯体である。
t−BunR3−nZnM (1)
t−BumR’4−mZnMl (2)
ここで、nは1〜3から選ばれる整数であり、mは1〜4の整数を示し、lは1ないし2の実数である。
RとR’は、各々同一でも異なっていてもよく、炭素数1〜12のアルキル基、アルケニル基、アリール基またはアリールアルキル基である。具体的にはメチル基、エチル基、i−プロピル基、n−プロピル基、n−ブチル基、i−ブチル基、s−ブチル基、n−ペンチル基、t−アミル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基、ビニル基、シクロペンタジエニル基、フェニル基、ベンジル基のいずれかを示す。
Mはリチウム、マグネシウムあるいはMgX(Xは塩素、臭素、ヨウ素のいずれかを表す)で示されるハロゲン化マグネシウムを表す。
The polymerization initiator of the present invention is an organozinc ate complex having at least one t-butyl group represented by the following general formula (1) or (2).
t-Bu n R 3-n ZnM (1)
t-Bu m R ′ 4-m ZnM l (2)
Here, n is an integer selected from 1 to 3, m is an integer of 1 to 4, and l is a real number of 1 to 2.
R and R ′ may be the same or different and each represents an alkyl group, alkenyl group, aryl group or arylalkyl group having 1 to 12 carbon atoms. Specifically, methyl group, ethyl group, i-propyl group, n-propyl group, n-butyl group, i-butyl group, s-butyl group, n-pentyl group, t-amyl group, n-hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, vinyl group, cyclopentadienyl group, phenyl group, and benzyl group are shown.
M represents a magnesium halide represented by lithium, magnesium, or MgX (X represents any one of chlorine, bromine, and iodine).
本発明に用いられる有機亜鉛アート錯体のより具体的な例としては、一般式(1)
t−BunR3−nZnM (1)
で示される化合物として、(t−ブチル)ジメチル亜鉛酸リチウム、(t−ブチル)ジエチル亜鉛酸リチウム、(t−ブチル)ジブチル亜鉛酸リチウム、(t−ブチル)ジビニル亜鉛酸リチウム、(n−ブチル)ジt−ブチル亜鉛酸リチウム、ビス(t−ブチル)フェニル亜鉛酸リチウム、トリt−ブチル亜鉛酸リチウム等の有機亜鉛酸リチウムや、(t−ブチル)ジメチル亜鉛酸マグネシウムクロライド、(t−ブチル)ジメチル亜鉛酸マグネシウムブロマイド、(t−ブチル)ジメチル亜鉛酸マグネシウムアイオダイド、ジ(t−ブチル)メチル亜鉛酸マグネシウムクロライド、ジ(t−ブチル)メチル亜鉛酸マグネシウムブロマイド、ジ(t−ブチル)メチル亜鉛酸マグネシウムアイオダイド、ジエチル(t−ブチル)亜鉛酸マグネシウムクロライド、ジエチル(t−ブチル)亜鉛酸マグネシウムブロマイド、ジエチル(t−ブチル)亜鉛酸マグネシウムアイオダイド、エチルジ(t−ブチル)亜鉛酸マグネシウムクロライド、エチルジ(t−ブチル)亜鉛酸マグネシウムブロマイド、エチルジ(t−ブチル)亜鉛酸マグネシウムアイオダイド、(t−ブチル)ジブチル亜鉛酸マグネシウムクロライド、(t−ブチル)ジブチル亜鉛酸マグネシウムブロマイド、(t−ブチル)ジブチル亜鉛酸マグネシウムアイオダイド、ジ(t−ブチル)ブチル亜鉛酸マグネシウムクロライド、ジ(t−ブチル)ブチル亜鉛酸マグネシウムブロマイド、ジ(t−ブチル)ブチル亜鉛酸マグネシウムアイオダイド、(t−ブチル)ジビニル亜鉛酸マグネシウムクロライド、(t−ブチル)ジビニル亜鉛酸マグネシウムブロマイド、(t−ブチル)ジビニル亜鉛酸マグネシウムアイオダイド、ジフェニル(t−ブチル)亜鉛酸マグネシウムクロライド、ジフェニル(t−ブチル)亜鉛酸マグネシウムブロマイド、ジフェニル(t−ブチル)亜鉛酸マグネシウムアイオダイド、フェニルジ(t−ブチル)亜鉛酸マグネシウムクロライド、フェニルジ(t−ブチル)亜鉛酸マグネシウムブロマイド、フェニルジ(t−ブチル)亜鉛酸マグネシウムアイオダイド、トリt−ブチル亜鉛酸マグネシウムクロライド、トリt−ブチル亜鉛酸マグネシウムブロマイド、トリt−ブチル亜鉛酸マグネシウムアイオダイド等の有機亜鉛酸マグネシウムハロゲン化物が例示される。
More specific examples of the organozinc ate complex used in the present invention include those represented by the general formula (1)
t-Bu n R 3-n ZnM (1)
(T-butyl) lithium dimethyl zincate, (t-butyl) lithium diethyl zincate, (t-butyl) lithium dibutyl zincate, (t-butyl) lithium divinyl zincate, (n-butyl) ) Lithium organic zincate such as lithium dit-butylzincate, lithium bis (t-butyl) phenylzincate, lithium trit-butylzinclate, (t-butyl) dimethylzinc zincate chloride, (t-butyl) ) Magnesium dimethylzinc acid bromide, (t-butyl) magnesium dimethylzincate iodide, di (t-butyl) methylmagnesium zinc chloride, di (t-butyl) methylmagnesium bromide, di (t-butyl) methyl Magnesium zincate iodide, diethyl (t-butyl) zincate magnesium Muchloride, diethyl (t-butyl) zinc acid magnesium bromide, diethyl (t-butyl) magnesium zincate iodide, ethyl di (t-butyl) zinc zinc chloride, ethyl di (t-butyl) zinc magnesium bromide, ethyl di (t -Butyl) magnesium zincate iodide, (t-butyl) dibutylmagnesium chloride, (t-butyl) dibutylmagnesium bromide, (t-butyl) dibutylmagnesium iodide, di (t-butyl) butyl Magnesium zinc chloride, di (t-butyl) butyl magnesium zinc bromide, di (t-butyl) butyl magnesium zinc iodide, (t-butyl) divinyl magnesium zinc chloride, (t-butyl) dibi Magnesium bromide bromide, (t-butyl) divinylmagnesium zinc iodide, diphenyl (t-butyl) magnesium chloride, diphenyl (t-butyl) magnesium bromide, diphenyl (t-butyl) magnesium zinc iodide Dide, Phenyldi (t-butyl) zinc acid magnesium chloride, Phenyldi (t-butyl) zinc magnesium bromide, Phenyldi (t-butyl) zinc magnesium iodide, Tri-t-butylzinc magnesium chloride, Tri-t-butylzinc Examples thereof include organic magnesium zinc halides such as magnesium magnesium bromide and magnesium tri-t-butylzincate iodide.
また、一般式(2)
t−BumR4−mZnMl (2)
で示される有機亜鉛アート錯体の具体例としては、テトラキス−t−ブチル亜鉛酸ジリチウム、トリ−t−ブチルメチル亜鉛酸ジリチウム、トリ−t−ブチルエチル亜鉛酸ジリチウム、トリ−t−ブチル−n−プロピル亜鉛酸ジリチウム、トリ−t−ブチル−i−プロピル亜鉛酸ジリチウム、トリ−t−ブチル−n−ブチル亜鉛酸ジリチウム、トリ−t−ブチル−i−ブチル亜鉛酸ジリチウム、トリ−t−ブチル−s−ブチル亜鉛酸ジリチウム、ジメチルジ−t−ブチル亜鉛酸ジリチウム、ジエチルジ−t−ブチル亜鉛酸ジリチウム、ジ−t−ブチルジ−n−プロピル亜鉛酸ジリチウム、ジ−t−ブチルジ−i−プロピル亜鉛酸ジリチウム、ジ−n−ブチルジ−n−ブチル亜鉛酸ジリチウム、ジ−n−ブチルジ−i−ブチル亜鉛酸ジリチウム、ジ−n−ブチルジ−s−ブチル亜鉛酸ジリチウム、メチルエチルジ−t−ブチル亜鉛酸ジリチウム、メチル−n−ブチル−ジ−t−ブチル亜鉛酸ジリチウム、メチル−s−ブチル−ジ−t−ブチル亜鉛酸ジリチウム、エチル−n−ブチル−ジ−t−ブチル亜鉛酸ジリチウム、エチル−s−ブチル−ジ−t−ブチル亜鉛酸ジリチウム、ジメチルエチル−t−ブチル亜鉛酸ジリチウム、ジメチル−n−ブチル−t−ブチル亜鉛酸ジリチウム、ジメチル−s−ブチル−t−ブチル亜鉛酸ジリチウム、ジメチルエチル−t−ブチル亜鉛酸ジリチウム、ジエチルメチル−t−ブチル亜鉛酸ジリチウム、ジエチル−n−ブチル−t−ブチル亜鉛酸ジリチウム、ジエチル−s−ブチル−t−ブチル亜鉛酸ジリチウム等の有機亜鉛酸ジリチウムや、テトラキス−t−ブチル亜鉛酸マグネシウム、トリ−t−ブチルメチル亜鉛酸マグネシウム、トリ−t−ブチルエチル亜鉛酸マグネシウム、トリ−t−ブチル−n−プロピル亜鉛酸マグネシウム、トリ−t−ブチル−i−プロピル亜鉛酸マグネシウム、トリ−t−ブチル−n−ブチル亜鉛酸マグネシウム、トリ−t−ブチル−i−ブチル亜鉛酸マグネシウム、トリ−t−ブチル−s−ブチル亜鉛酸マグネシウム、ジメチルジ−t−ブチル亜鉛酸マグネシウム、ジエチルジ−t−ブチル亜鉛酸マグネシウム、ジ−t−ブチルジ−n−プロピル亜鉛酸マグネシウム、ジ−t−ブチルジ−i−プロピル亜鉛酸マグネシウム、ジ−n−ブチルジ−n−ブチル亜鉛酸マグネシウム、ジ−n−ブチルジ−i−ブチル亜鉛酸マグネシウム、ジ−n−ブチルジ−s−ブチル亜鉛酸マグネシウム、メチルエチルジ−t−ブチル亜鉛酸マグネシウム、メチル−n−ブチル−ジ−t−ブチル亜鉛酸マグネシウム、メチル−s−ブチル−ジ−t−ブチル亜鉛酸マグネシウム、エチル−n−ブチル−ジ−t−ブチル亜鉛酸マグネシウム、エチル−s−ブチル−ジ−t−ブチル亜鉛酸マグネシウム、ジメチルエチル−t−ブチル亜鉛酸マグネシウム、ジメチル−n−ブチル−t−ブチル亜鉛酸マグネシウム、ジメチル−s−ブチル−t−ブチル亜鉛酸マグネシウム、ジメチルエチル−t−ブチル亜鉛酸マグネシウム、ジエチルメチル−t−ブチル亜鉛酸マグネシウム、ジエチル−n−ブチル−t−ブチル亜鉛酸マグネシウム、ジエチル−s−ブチル−t−ブチル亜鉛酸マグネシウム等の有機亜鉛酸マグネシウムを挙げる事ができる。
In addition, the general formula (2)
t-Bu m R 4-m ZnM l (2)
Specific examples of the organic zinc ate complex represented by the formula: Dikis tetrakis-t-butylzinc zincate, dilithium tri-t-butylmethylzincate, dilithium tri-t-butylethylzincate, tri-t-butyl-n-propylzinc Dilithium acid, tri-t-butyl-i-propyl zincate dilithium, tri-t-butyl-n-butyl dizinc zincate, tri-t-butyl-i-butyl dizinc zincate, tri-t-butyl-s- Dilithium butyl zincate, dilithium dimethyldi-t-butylzincate, dilithium diethyldi-t-butylzincnate, dilithium di-t-butyldi-n-propylzinclate, dilithium di-t-butyldi-i-propylzincnate, di -Di-n-butyl di-n-butyl zincate, di-n-butyl di-i-butyl zincate Di-n-butyl di-s-butyl zincate dilithium, methylethyl di-t-butyl zincate dilithium, methyl-n-butyl-di-t-butylzinc zincate, methyl-s-butyl-di-t-butylzinc acid Dilithium, ethyl-n-butyl-di-t-butylzinc zincate, ethyl-s-butyl-di-t-butylzinc zincate, dimethylethyl-t-butylzinclate, dimethyl-n-butyl-t- Dilithium butyl zincate, dilithium dimethyl-s-butyl-t-butyl zincate, dilithium dimethylethyl-t-butyl zincate, dilithium diethylmethyl-t-butylzincate, dilithium diethyl-n-butyl-t-butylzincate , Dilithium organic zincate such as diethyl-s-butyl-t-butylzinc zincate, tetrakis -T-butyl magnesium zincate, magnesium tri-t-butylmethylzincate, magnesium tri-t-butylethylzincate, magnesium tri-t-butyl-n-propylzinc, tri-t-butyl-i-propylzinc Magnesium, magnesium tri-t-butyl-n-butyl zincate, magnesium tri-t-butyl-i-butyl zincate, magnesium magnesium tri-t-butyl-s-butylzincate, magnesium dimethyldi-t-butylzincate Diethyldi-t-butylmagnesium zincate, di-t-butyldi-n-propylmagnesium zincate, di-t-butyldi-i-propylmagnesium zincate, di-n-butyldi-n-butylmagnesium zincate, di- n-Butyldi-i-butylmagnesium zincate, di-n-butyldi-s-buty Magnesium zinc oxide, methyl ethyl di-t-butyl magnesium zincate, methyl-n-butyl-di-t-butyl magnesium zincate, methyl-s-butyl-di-t-butyl magnesium zincate, ethyl n-butyl- Di-t-butylmagnesium zincate, ethyl-s-butyl-di-t-butylmagnesium zincate, dimethylethyl-t-butylmagnesium zincate, dimethyl-n-butyl-t-butylmagnesium zincate, dimethyl-s -Butyl-t-butylmagnesium zincate, dimethylethyl-t-butylmagnesium zincate, diethylmethyl-t-butylmagnesium zincate, diethyl-n-butyl-t-butylmagnesium zincate, diethyl-s-butyl-t -Mentioning organic magnesium zincate such as butyl magnesium zincate Kill.
これらの亜鉛アート錯体は、単品でもあるいは混合物でも重合開始剤として用いることができる。 These zinc art complexes can be used alone or in a mixture as a polymerization initiator.
本発明のt−ブチル基を有する亜鉛アート錯体は、不活性ガス雰囲気下、亜鉛化合物と、有機リチウム化合物あるいは有機マグネシウム化合物との反応により合成することができる。
例えば、ジアルキル亜鉛やジアリール亜鉛、ジアルケニル亜鉛などの有機亜鉛化合物に対して1〜2当量のt−ブチルリチウムあるいはt−ブチル基を有する有機マグネシウム試薬とを反応させることで合成することができる。
The zinc art complex having a t-butyl group of the present invention can be synthesized by a reaction between a zinc compound and an organolithium compound or an organomagnesium compound in an inert gas atmosphere.
For example, it can be synthesized by reacting an organic zinc compound such as dialkyl zinc, diaryl zinc or dialkenyl zinc with an organic magnesium reagent having 1 to 2 equivalents of t-butyllithium or t-butyl group.
また、ジt−ブチル亜鉛に対して1〜2当量の有機リチウム試薬または有機マグネシウム試薬を反応させたものを用いることもできる。 Moreover, what reacted 1 to 2 equivalent organolithium reagent or organomagnesium reagent with respect to di-t-butyl zinc can also be used.
あるいは、塩化亜鉛などのハロゲン化亜鉛を出発源とし、亜鉛に対し3〜4当量の有機リチウム試薬あるいは有機マグネシウム試薬を反応させることで合成することができる。この際、少なくとも1当量のt−ブチルリチウムあるいはt−ブチル基を有する有機マグネシウム試薬を使用することで、本発明における亜鉛アート錯体を合成することができる。 Or it can synthesize | combine by making zinc halides, such as zinc chloride, into a starting source, and making 3-4 equivalent of an organic lithium reagent or an organic magnesium reagent react with zinc. At this time, the zinc art complex in the present invention can be synthesized by using an organomagnesium reagent having at least one equivalent of t-butyllithium or t-butyl group.
これらの合成には、反応溶媒として、テトラヒドロフラン、ジエチルエーテル、ジブチルエーテル、シクロペンチルメチルエーテルなどのエーテル系溶媒あるいはペンタン、ヘキサン、ヘプタン、トルエンなどの炭化水素系溶媒およびそれらの混合液を用いることができる。なかでも、反応時の温度の制御あるいは均一性の保持の観点から、エーテル系溶媒を用いるのが好ましい。 For these syntheses, ether solvents such as tetrahydrofuran, diethyl ether, dibutyl ether, cyclopentyl methyl ether, or hydrocarbon solvents such as pentane, hexane, heptane, toluene, and mixtures thereof can be used as reaction solvents. . Among these, an ether solvent is preferably used from the viewpoint of controlling the temperature during the reaction or maintaining uniformity.
本発明において、合成した亜鉛アート錯体の溶液はそのまま重合に使用することができる。 In the present invention, the synthesized zinc art complex solution can be used as it is for polymerization.
重合に用いられるスルホン酸基含有ビニルモノマーとしては、ビニルスルホン酸、アリルスルホン酸、4−スチレンスルホン酸、メタリルスルホン酸、2−(メタクリロイルオキシ)エタンスルホン酸、2−アクリルアミド−2−メチルプロパンスルホン酸及びこれらのリチウム、ナトリウム、カリウムなどのアルカリ金属塩、マグネシウム、カルシウム等のアルカリ土類金属塩およびアンモニウム塩等が挙げられる。これらは、一種単独で用いても良いし、二種以上を併用しても良い。 Examples of the sulfonic acid group-containing vinyl monomer used for polymerization include vinyl sulfonic acid, allyl sulfonic acid, 4-styrene sulfonic acid, methallyl sulfonic acid, 2- (methacryloyloxy) ethane sulfonic acid, and 2-acrylamido-2-methylpropane. Examples thereof include sulfonic acids and alkali metal salts such as lithium, sodium and potassium, alkaline earth metal salts such as magnesium and calcium, and ammonium salts. These may be used alone or in combination of two or more.
また、スルホン酸基含有ビニルモノマーと、その他のビニルモノマーとの共重合を行っても良い。
その他のビニルモノマーとしては具体的にはアクリル酸、メタクリル酸およびアクリル酸メチル、メタクリル酸メチル、アクリル酸エチル、メタクリル酸エチル、ヒドロキシエチルメタクリレート、N−イソプロピルアクリルアミド、アクリルアミド、N−イソプロピルメタクリルアミドなどのアクリル系モノマーや、スチレン、α−メチルスチレン、α−メチル−p−メチルスチレン、2−メチルスチレン、3−メチルスチレン、4−メチルスチレン、4−t−ブチルスチレン、4−t−ブトキシスチレン、4−t−ブトキシ−α−メチルスチレン、4−クロロスチレン、4−(クロロメチル)スチレン、4−メトキシスチレン、4−アミノスチレン、4−ビニル安息香酸、ブタジエン、イソプレンなどの炭化水素系ビニルモノマーが例示できる。
Moreover, you may copolymerize a sulfonic acid group containing vinyl monomer and another vinyl monomer.
Specific examples of other vinyl monomers include acrylic acid, methacrylic acid and methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, hydroxyethyl methacrylate, N-isopropylacrylamide, acrylamide, and N-isopropylmethacrylamide. Acrylic monomers, styrene, α-methylstyrene, α-methyl-p-methylstyrene, 2-methylstyrene, 3-methylstyrene, 4-methylstyrene, 4-t-butylstyrene, 4-t-butoxystyrene, Hydrocarbon vinyl monomers such as 4-t-butoxy-α-methylstyrene, 4-chlorostyrene, 4- (chloromethyl) styrene, 4-methoxystyrene, 4-aminostyrene, 4-vinylbenzoic acid, butadiene, and isoprene Is an example That.
重合に用いられる溶媒としては、通常用いられる溶媒であればよく、例えばトルエン、キシレン、ヘキサン、シクロヘキサン、ヘプタンなどの炭化水素系溶媒、THF、ジエチルエーテルなどのエーテル溶媒系、メタノール、エタノール、イソプロパノールなどのアルコール類および水等が挙げられる。一般に、水やアルコール類は、有機金属化合物と容易に反応を起こすため、それらを溶媒に用いた場合、有機金属化合物は重合開始機能を失う。しかしながら、本発明の亜鉛アート錯体は、水やアルコール系溶媒といったプロトン性溶媒系を重合溶媒として使用しても、重合開始機能を失うことがなく、高収率で重合体を得ることが出来る。 The solvent used for the polymerization may be a commonly used solvent, for example, a hydrocarbon solvent such as toluene, xylene, hexane, cyclohexane, heptane, an ether solvent system such as THF, diethyl ether, methanol, ethanol, isopropanol, etc. Alcohols and water. In general, water and alcohols easily react with an organometallic compound, so that when they are used as a solvent, the organometallic compound loses the polymerization initiation function. However, the zinc art complex of the present invention can obtain a polymer in a high yield without losing the polymerization initiation function even when a protic solvent system such as water or an alcohol solvent is used as a polymerization solvent.
本発明における重合において使用される亜鉛アート錯体の量は特に制限はないが、(モノマー100モルに対して0.001〜10モルの範囲で用いることが好ましい。この範囲より少ない場合には十分な重合活性が出ないことがあり、この範囲を超えた場合には、得られたポリマー中に多量の金属残渣が含まれることがあり、それを除去する工程が必要となることがある。 The amount of the zinc ate complex used in the polymerization in the present invention is not particularly limited, but it is preferably used in the range of 0.001 to 10 mol with respect to 100 mol of the monomer. In some cases, the polymerization activity does not occur, and when this range is exceeded, a large amount of metal residue may be contained in the obtained polymer, and a step for removing it may be necessary.
本発明に記載の有機亜鉛アート錯体を重合開始剤として用いることで、スルホン酸基含有ビニルモノマーの重合体を、活性プロトンを有するモノマーおよび/または溶媒を用いても、高収率で重合体を得ることができる。 By using the organozinc art complex described in the present invention as a polymerization initiator, a polymer of a sulfonic acid group-containing vinyl monomer can be obtained in a high yield even when a monomer and / or solvent having an active proton is used. Can be obtained.
以下に本発明を実施例により説明するが、本発明はこれら実施例に限定されるものではない。
[測定機器]
1H−NMR測定はVarian社製 Gemini−300を用いて行った。
数平均分子量及び重量平均分子量はゲルパーミエーションクロマトグラフィー(GPC)にて下記条件で測定を行った。
分離カラム:TSK gel α−6000 +α−3000
カラム温度:40℃
移動相:リン酸緩衝液(pH=7)/アセトニトリル=9/1
移動速度:0.6ml/分
検出器:UV検出器、230nm
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples.
[measuring equipment]
1 H-NMR measurement was performed using Gemini-300 manufactured by Varian.
The number average molecular weight and the weight average molecular weight were measured by gel permeation chromatography (GPC) under the following conditions.
Separation column: TSK gel α-6000 + α-3000
Column temperature: 40 ° C
Mobile phase: phosphate buffer (pH = 7) / acetonitrile = 9/1
Movement speed: 0.6 ml / min Detector: UV detector, 230 nm
(実施例1) t−Bu4ZnLi2によるp−スチレンスルホン酸ナトリウムの重合
窒素雰囲気下、0℃にてp−スチレンスルホン酸ナトリウム水和物5.0gの水溶液(50mL)に、15.0wt%(重量%)のt−Bu4ZnLi2のTHF溶液(関東化学社より購入)0.6gを加え、常温で1時間間攪拌した。
得られた水溶液の1H−NMR測定したところ、ポリ(p−スチレンスルホン酸ナトリウム)が96%の転化率で得られていることを確認した。
GPC測定にて、ポリ(p−スチレンスルホン酸ナトリウム)の数平均分子量は45,000、重量平均分子量は100,000であった。
(Example 1) Polymerization of sodium p-styrene sulfonate with t-Bu 4 ZnLi 2 15.0 wt.% Of an aqueous solution (50 mL) of sodium p-styrene sulfonate hydrate at 0 ° C. in a nitrogen atmosphere at 0 ° C. 0.6 g (% by weight) of a THF solution of t-Bu 4 ZnLi 2 (purchased from Kanto Chemical Co., Inc.) was added and stirred at room temperature for 1 hour.
1 H-NMR measurement of the obtained aqueous solution confirmed that poly (sodium p-styrenesulfonate) was obtained at a conversion rate of 96%.
As a result of GPC measurement, the number average molecular weight of poly (sodium p-styrenesulfonate) was 45,000, and the weight average molecular weight was 100,000.
(実施例2) t−BuEt2ZnLiの調整
窒素雰囲気下、100mLナスフラスコにTHF20mL,ジエチル亜鉛1.78g(14.4ミリモル)を加え、−70℃に冷却した。攪拌条件下、16.0wt%のt−ブチルリチウムのペンタン溶液5.76g(14.4ミリモル)を滴下した。滴下後、−70℃にて30分攪拌した後、室温まで昇温した。溶媒を減圧濃縮後、THF希釈し9.3wt%のt−BuEt2ZnLiのTHF溶液を得た。
(Example 2) Preparation of t-BuEt 2 ZnLi Under a nitrogen atmosphere, 20 mL of THF and 1.78 g (14.4 mmol) of diethyl zinc were added to a 100 mL eggplant flask and cooled to -70 ° C. Under stirring conditions, 5.76 g (14.4 mmol) of a 16.0 wt% t-butyllithium pentane solution was added dropwise. After dropping, the mixture was stirred at -70 ° C for 30 minutes and then warmed to room temperature. The solvent was concentrated under reduced pressure, and diluted with THF to obtain a 9.3 wt% THF solution of t-BuEt 2 ZnLi.
t−BuEt2ZnLiによるp−スチレンスルホン酸ナトリウムの重合
窒素雰囲気下、0℃にてp−スチレンスルホン酸ナトリウム水和物5.0gの水溶液(50mL)に、9.3wt%のt−BuEt2ZnLiのTHF溶液0.6gを加え、常温で1時間間攪拌した。
得られた水溶液の1H−NMR測定したところ、ポリ(p−スチレンスルホン酸ナトリウム)が79.6%の転化率で得られていることを確認した。
t-BuEt 2 ZnLi in accordance polymerization Under a nitrogen atmosphere sodium p- styrenesulfonate, in at 0 ° C. p- styrene solution of sodium sulfonate hydrate 5.0g (50mL), 9.3wt% of t-BUET 2 0.6 g of ZnLi in THF was added and stirred at room temperature for 1 hour.
1 H-NMR measurement of the obtained aqueous solution confirmed that poly (sodium p-styrenesulfonate) was obtained at a conversion of 79.6%.
(比較例1) n−Bu2Et2ZnLi2の調製
窒素雰囲気下、100mLナスフラスコにTHF30mL,ジエチル亜鉛2.75g(22.2ミリモル)を加え、−70℃に冷却。攪拌下、15.3wt%−n−ブチルリチウムのヘキサン溶液19.0g(45.5ミリモル)を滴下した。滴下後、−70℃にて30分攪拌した後、室温まで昇温した。溶媒を減圧除去し、38.1wt%のn−Bu2Et2ZnLi2のTHF溶液を得た。
(Comparative Example 1) Preparation of n-Bu 2 Et 2 ZnLi 2 Under a nitrogen atmosphere, 30 mL of THF and 2.75 g (22.2 mmol) of diethyl zinc were added to a 100 mL eggplant flask and cooled to -70 ° C. Under stirring, 19.0 g (45.5 mmol) of a hexane solution of 15.3 wt% -n-butyllithium was added dropwise. After dropping, the mixture was stirred at -70 ° C for 30 minutes and then warmed to room temperature. The solvent was removed under reduced pressure to obtain 38.1 wt% of a THF solution of n-Bu 2 Et 2 ZnLi 2 .
n−Bu2Et2ZnLi2によるp−スチレンスルホン酸ナトリウムの重合
窒素雰囲気下、0℃にてp−スチレンスルホン酸ナトリウム水和物5.0gの水溶液(50mL)に、38.1wt%のn−Bu2Et2ZnLi2のTHF溶液0.2gを加え、常温で1時間間攪拌した。
得られた水溶液の1H−NMR測定したところ、p−スチレンスルホン酸ナトリウムのピークのみで、ポリマーの生成は認められなかった。
Polymerization of p-sodium styrenesulfonate with n-Bu 2 Et 2 ZnLi 2 In an aqueous solution (50 mL) of 5.0 g of sodium p-styrenesulfonate hydrate at 0 ° C. in a nitrogen atmosphere, 38.1 wt% n 0.2 g of a THF solution of -Bu 2 Et 2 ZnLi 2 was added and stirred at room temperature for 1 hour.
As a result of 1 H-NMR measurement of the obtained aqueous solution, only the p-sodium styrenesulfonate peak was observed, and no polymer was observed.
以上の結果よりより、t−ブチル基を有さない亜鉛アート錯体では、p−スチレンスルホン酸ナトリウムのようなスルホン酸基含有ビニルモノマーの重合開始剤として機能しないことを確認した。 From the above results, it was confirmed that a zinc ate complex having no t-butyl group does not function as a polymerization initiator for a sulfonic acid group-containing vinyl monomer such as sodium p-styrenesulfonate.
本発明に係るスルホン酸基含有ビニルモノマーの重合方法は、酸触媒、洗浄剤、イオン交換膜あるいは電解質膜を得るのに有用である。
The method for polymerizing a sulfonic acid group-containing vinyl monomer according to the present invention is useful for obtaining an acid catalyst, a cleaning agent, an ion exchange membrane or an electrolyte membrane.
Claims (3)
t−BunR3−nZnM (1)
(式中、nは1〜3の整数であり、Mはリチウム、マグネシウムあるいはMgX(Xは塩素、臭素、ヨウ素のいずれかを表す。)で示されるハロゲン化マグネシウムを表し、Rは炭素数1〜12のアルキル基、アルケニル基、アリール基、またはアリールアルキル基を示す。)
t−BumR’4−mZnMl (2)
(式中、mは1〜4の整数であり、lは1〜2の実数であり、R’は式(1)のRと同一でも異なっていてもよく、炭素数1〜12のアルキル基、アルケニル基、アリール基、またはアリールアルキル基を示し、Mはリチウム、マグネシウムあるいはMgX(Xは塩素、臭素、ヨウ素のいずれかを表す)で示されるハロゲン化マグネシウムを表す。) A method for polymerizing a sulfonic acid group-containing vinyl monomer, wherein a zinc art complex represented by the following general formula (1) or (2) is used as a polymerization initiator.
t-Bu n R 3-n ZnM (1)
(In the formula, n is an integer of 1 to 3, M represents a magnesium halide represented by lithium, magnesium, or MgX (X represents any one of chlorine, bromine, and iodine), and R represents one carbon atom. Represents an alkyl group, an alkenyl group, an aryl group, or an arylalkyl group of ˜12)
t-Bu m R ′ 4-m ZnM l (2)
(In the formula, m is an integer of 1 to 4, l is a real number of 1 to 2, R 'may be the same as or different from R of formula (1), and an alkyl group having 1 to 12 carbon atoms. , An alkenyl group, an aryl group, or an arylalkyl group, and M represents a magnesium halide represented by lithium, magnesium, or MgX (X represents any one of chlorine, bromine, and iodine).
The method for polymerizing a sulfonic acid group-containing vinyl monomer according to claim 1 or 2, wherein the sulfonic acid group-containing vinyl monomer is styrenesulfonic acid or a metal salt of styrenesulfonic acid.
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