JP2013034916A - Ultrasonic cleaning device - Google Patents
Ultrasonic cleaning device Download PDFInfo
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- JP2013034916A JP2013034916A JP2011170897A JP2011170897A JP2013034916A JP 2013034916 A JP2013034916 A JP 2013034916A JP 2011170897 A JP2011170897 A JP 2011170897A JP 2011170897 A JP2011170897 A JP 2011170897A JP 2013034916 A JP2013034916 A JP 2013034916A
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- 238000004506 ultrasonic cleaning Methods 0.000 title claims abstract description 36
- 238000004140 cleaning Methods 0.000 claims abstract description 162
- 239000007788 liquid Substances 0.000 claims abstract description 142
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 238000005406 washing Methods 0.000 abstract description 9
- 230000002238 attenuated effect Effects 0.000 abstract description 8
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 230000000644 propagated effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000007599 discharging Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002101 nanobubble Substances 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Apparatuses For Generation Of Mechanical Vibrations (AREA)
Abstract
Description
本発明は、超音波洗浄装置に関するものであり、微細気泡を含有する洗浄液を供給して、被洗浄物を洗浄する超音波洗浄装置に用いられる。 The present invention relates to an ultrasonic cleaning apparatus, and is used in an ultrasonic cleaning apparatus that supplies a cleaning liquid containing fine bubbles to clean an object to be cleaned.
従来の超音波洗浄装置は、図４に示されるように、一端に洗浄液２を導入するための導入口を有する導入管２１と、一端にウエット処理後の排出液を外部へ排出するための排出口を有する排出管２２と、導入管２１と排出管２２のそれぞれの他端を連結し、被洗浄物Ｗに対面する連結部２３に、超音波振動子４０を設けたウエット処理用ノズル１を備えている。このことにより、特許文献１に示されるように、超音波振動子４０を設けたウエット処理用ノズル１を備えた超音波洗浄装置では、超音波振動子本体４８から振動板４６へ、そして振動板４６から洗浄液２への超音波振動の放射効率を向上でき、かつ被洗浄物Ｗの上面において、洗浄液２がこぼれたり、洗浄液２が切れたりすることなく、洗浄を行うことができる。 As shown in FIG. 4, the conventional ultrasonic cleaning apparatus has an introduction pipe 21 having an inlet for introducing the cleaning liquid 2 at one end, and a drain for discharging the drained liquid after wet treatment to the outside at one end. The wet processing nozzle 1 provided with the ultrasonic vibrator 40 is connected to the connecting portion 23 that connects the other end of the discharge pipe 22 having the outlet, the introduction pipe 21 and the discharge pipe 22 and faces the object W to be cleaned. I have. As a result, as shown in Patent Document 1, in the ultrasonic cleaning apparatus including the wet processing nozzle 1 provided with the ultrasonic transducer 40, the ultrasonic transducer main body 48 is moved to the diaphragm 46, and the diaphragm The radiation efficiency of the ultrasonic vibration from 46 to the cleaning liquid 2 can be improved, and the cleaning can be performed without spilling the cleaning liquid 2 or cutting the cleaning liquid 2 on the upper surface of the object W to be cleaned.
一方、特許文献２に示されるように、水を主体とした洗浄液に微細気泡を発生させ、そこに被洗浄物を浸漬することにより洗浄する洗浄方法は、特殊な洗浄剤を用いない方法として注目されている。微細気泡を含有する洗浄液に被洗浄物を浸漬すると、微細気泡が被洗浄物表面の細部に到達し表面の汚れを気泡が吸着する。汚れを吸着した微細気泡は浮力によって上昇し、汚れは洗浄水表面に移動する。この汚れを洗浄液と共に洗浄槽からオーバーフローさせ、汚れと洗浄液を分離した後に洗浄液のみを洗浄槽へ戻せば、繰り返し洗浄を行うことができることが知られている。 On the other hand, as shown in Patent Document 2, a cleaning method in which fine bubbles are generated in a cleaning liquid mainly composed of water and an object to be cleaned is immersed therein is noticed as a method that does not use a special cleaning agent. Has been. When the object to be cleaned is immersed in the cleaning liquid containing fine bubbles, the fine bubbles reach the details of the surface of the object to be cleaned, and the bubbles adsorb the dirt on the surface. The fine bubbles adsorbing the dirt rise by buoyancy, and the dirt moves to the surface of the washing water. It is known that repeated cleaning can be carried out by overflowing this dirt together with the cleaning liquid from the cleaning tank, and separating only the cleaning liquid after returning the cleaning liquid to the cleaning tank.
しかし、特許文献１に示したような超音波洗浄装置において、特許文献２に示したような微細気泡を含有する洗浄液を供給して被洗浄物を洗浄する場合、洗浄液の微細気泡によって、超音波が減衰して被洗浄物の表面に超音波が伝達せず、洗浄力が落ちてしまうという課題があった。 However, in the ultrasonic cleaning apparatus as shown in Patent Document 1, when cleaning an object to be cleaned by supplying a cleaning liquid containing fine bubbles as shown in Patent Document 2, ultrasonic waves are generated by the fine bubbles in the cleaning liquid. As a result, the ultrasonic wave is attenuated and ultrasonic waves are not transmitted to the surface of the object to be cleaned, and the cleaning power is reduced.
本発明の超音波洗浄装置は、被洗浄物の一面に微細気泡を含有する第一の洗浄液を供給する第一の洗浄液供給経路と、前記被洗浄物の他面に微細気泡を含有しない第二の洗浄液を供給する第二の洗浄液供給経路と、前記被洗浄物の他面側から前記被洗浄物を通して前記第一の洗浄液と接する前記被洗浄物の一面に超音波を付与する超音波振動子とを有することを特徴とする。このことにより、微細気泡を含有する第一の洗浄液と被洗浄物との接触面に、第一の洗浄液の気泡による超音波の減衰をおこすことなく超音波を付与できるため、洗浄力を高めることができる。 The ultrasonic cleaning apparatus of the present invention includes a first cleaning liquid supply path for supplying a first cleaning liquid containing fine bubbles to one surface of an object to be cleaned, and a second that does not contain fine bubbles on the other surface of the object to be cleaned. A second cleaning liquid supply path for supplying the cleaning liquid, and an ultrasonic transducer for applying ultrasonic waves to the one surface of the object to be cleaned that contacts the first cleaning liquid through the object to be cleaned from the other surface side of the object to be cleaned It is characterized by having. As a result, ultrasonic waves can be applied to the contact surface between the first cleaning liquid containing fine bubbles and the object to be cleaned without attenuation of the ultrasonic waves due to the bubbles of the first cleaning liquid, thereby increasing the cleaning power. Can do.
また、本発明の超音波洗浄装置は、前記第二の洗浄液が脱気水であることを特徴とする。このことにより、第二の洗浄液における超音波のロスが少なく、超音波を被洗浄面に確実に伝搬させることができる。 In the ultrasonic cleaning apparatus of the present invention, the second cleaning liquid is deaerated water. Accordingly, there is little loss of ultrasonic waves in the second cleaning liquid, and the ultrasonic waves can be reliably transmitted to the surface to be cleaned.
また、本発明の超音波洗浄装置は、前記第一の洗浄液供給経路と前記第二の洗浄液供給経路とが前記被洗浄物によって分離されていて、超音波照射領域において、第一の洗浄液と第二の洗浄液とが混合しないことを特徴とする。このことにより、超音波を被洗浄面に確実に伝搬させて、かつ洗浄力を高めることができる。 In the ultrasonic cleaning apparatus of the present invention, the first cleaning liquid supply path and the second cleaning liquid supply path are separated by the object to be cleaned, and the first cleaning liquid and the second cleaning liquid are separated in the ultrasonic irradiation region. The second cleaning liquid is not mixed. As a result, the ultrasonic wave can be reliably propagated to the surface to be cleaned and the cleaning power can be enhanced.
さらに、本発明の超音波洗浄装置は、前記第一の洗浄液供給経路および第二の洗浄液供給経路に、それぞれの洗浄液の供給口および排出口が設けられて、それぞれの洗浄液供給経路内の圧力調整機構を有することを特徴とする。このことにより、少ない第一の洗浄液および第二の洗浄液で確実に洗浄できる。 Furthermore, in the ultrasonic cleaning apparatus of the present invention, the first cleaning liquid supply path and the second cleaning liquid supply path are provided with a supply port and a discharge port for each cleaning liquid, respectively, and pressure adjustment in each cleaning liquid supply path It has a mechanism. As a result, the cleaning can be reliably performed with a small amount of the first cleaning liquid and the second cleaning liquid.
本発明の超音波洗浄装置は、微細気泡を含有する第一の洗浄液で、被洗浄物を洗浄しても、第一の洗浄液の気泡によって、超音波が減衰しないため、洗浄力を高めることができる。 The ultrasonic cleaning apparatus of the present invention can increase the cleaning power because the ultrasonic wave is not attenuated by the bubbles of the first cleaning liquid even when the object to be cleaned is cleaned with the first cleaning liquid containing fine bubbles. it can.
次に、本発明の実施形態の例について図を参照しながら詳細に説明をする。 Next, an example of an embodiment of the present invention will be described in detail with reference to the drawings.
［第１実施形態］
図１は、本発明の第１の実施形態の超音波洗浄装置を説明する図であり、図２は、第１の実施形態の超音波洗浄装置の変形例を説明する図である。
[First Embodiment]
FIG. 1 is a diagram illustrating an ultrasonic cleaning apparatus according to the first embodiment of the present invention, and FIG. 2 is a diagram illustrating a modification of the ultrasonic cleaning apparatus according to the first embodiment.
図１は、第１の実施形態の超音波洗浄装置を説明する図である。図１に示されるように、超音波洗浄装置１３は、被洗浄物３の上面に微細気泡を含有する第一の洗浄液を供給する第一の洗浄液供給経路１０と、被洗浄物３の下面に微細気泡を含有しない第二の洗浄液を供給する第二の洗浄液供給経路１１と、被洗浄物３の下面側から被洗浄物３を通して第一の洗浄液と接する被洗浄物３の上面に超音波を付与する超音波振動子７とを有している。第一の洗浄液供給経路１０は、被洗浄物３の上面から３ｍｍ程度離して設けられた筐体６と第一の洗浄液を供給する第一の供給口４と第一の洗浄液を排出する第一の排出口５によって形成されている。また、第二の洗浄液供給経路１１は、被洗浄物３の下面から３ｍｍ程度離して設けられた筐体６と第二の洗浄液を供給する第二の供給口８と第二の洗浄液を排出する第二の排出口９によって、形成されている。尚、超音波振動子７は、第二の洗浄液供給経路１１を形成する筐体６に設置されている。 FIG. 1 is a diagram illustrating an ultrasonic cleaning apparatus according to the first embodiment. As shown in FIG. 1, the ultrasonic cleaning device 13 is provided on a first cleaning liquid supply path 10 for supplying a first cleaning liquid containing fine bubbles to the upper surface of the object to be cleaned 3, and on the lower surface of the object to be cleaned 3. Ultrasound is applied to the second cleaning liquid supply path 11 for supplying the second cleaning liquid that does not contain fine bubbles, and the upper surface of the object to be cleaned 3 that contacts the first cleaning liquid from the lower surface side of the object to be cleaned 3 through the object to be cleaned 3. And an ultrasonic transducer 7 to be applied. The first cleaning liquid supply path 10 is a case 6 provided at a distance of about 3 mm from the upper surface of the article 3 to be cleaned, a first supply port 4 for supplying the first cleaning liquid, and a first for discharging the first cleaning liquid. The discharge port 5 is formed. The second cleaning liquid supply path 11 discharges the housing 6 provided at a distance of about 3 mm from the lower surface of the article 3 to be cleaned, the second supply port 8 for supplying the second cleaning liquid, and the second cleaning liquid. It is formed by the second discharge port 9. The ultrasonic transducer 7 is installed in the housing 6 that forms the second cleaning liquid supply path 11.
超音波振動子７は図示しない超音波発振器と接続されて筐体６を通して第二の洗浄液供給経路１１内の洗浄液に超音波を付与する。超音波振動子７は、２０ｋHｚから１０ＭＨzの範囲の超音波振動の周波数であることが、好ましい。筐体６は、超音波振動を伝達可能なステレンス鋼などの材質で構成されているが、石英、サファイア、アルミナ等のセラミックの材質であってもかまわない。第一の供給口４が設けられた第一の供給部５４と第一の排出口５が設けられた第一の排出部５５および第二の供給口８が設けられた第二の供給部５８と第二の排出口９が設けられた第二の排出部５９は、ＰＦＡやＰＴＦＥなどの材質から構成されているが、材質は、これにかぎられるものではない。被洗浄物３は、ガラスや樹脂フィルムなどの材質から構成される薄板であり、第一の洗浄液供給経路１０と第二の洗浄液供給経路１１との間を左右に移動し、被洗浄物３の上面が洗浄される。 The ultrasonic vibrator 7 is connected to an ultrasonic oscillator (not shown) and applies ultrasonic waves to the cleaning liquid in the second cleaning liquid supply path 11 through the housing 6. The ultrasonic vibrator 7 preferably has an ultrasonic vibration frequency in the range of 20 kHz to 10 MHz. The casing 6 is made of a material such as stainless steel that can transmit ultrasonic vibrations, but may be made of a ceramic material such as quartz, sapphire, or alumina. A first supply unit 54 provided with the first supply port 4, a first discharge unit 55 provided with the first discharge port 5, and a second supply unit 58 provided with the second supply port 8. The second discharge part 59 provided with the second discharge port 9 is made of a material such as PFA or PTFE, but the material is not limited to this. The object to be cleaned 3 is a thin plate made of a material such as glass or a resin film, moves to the left and right between the first cleaning liquid supply path 10 and the second cleaning liquid supply path 11, and The top surface is cleaned.
尚、第一の洗浄液は、市販の超微細気泡発生装置にて生成されたナノバブル水であり、微細気泡を含有する洗浄液である。また第二の洗浄液は、脱気された超純水である。第一の洗浄液は、第一の供給口４から供給され、筐体６と被洗浄物３の間の第一の洗浄液供給経路１０を通り、第一の排出口５から排出される。それぞれの洗浄液の供給圧力、排出圧力を調整する圧力調整機構（図示しない）を有して第一の洗浄液供給経路１０の開口部と大気圧とのバランスを調整することによって、被洗浄物３の上面において、第一の洗浄液がこぼれたり、洗浄液が切れたりすることなく洗浄を行うことができる。一方、第二の洗浄液は、第二の供給口８から供給され、筐体６と被洗浄物３の間の第二の洗浄液供給経路１１を通り、第二の排出口９から排出される。それぞれの洗浄液の供給圧力、排出圧力を調整する圧力調整機構を有して第二の洗浄液供給経路１１の開口部と大気圧とのバランスを調整することによって、被洗浄物３の下面において、第二の洗浄液がこぼれたり、洗浄液が切れたりすることなく洗浄を行うことができる。このことにより、少ない第一の洗浄液および第二の洗浄液で確実に洗浄できる。 The first cleaning liquid is nanobubble water generated by a commercially available ultrafine bubble generator, and is a cleaning liquid containing fine bubbles. The second cleaning liquid is degassed ultrapure water. The first cleaning liquid is supplied from the first supply port 4, passes through the first cleaning liquid supply path 10 between the housing 6 and the object to be cleaned 3, and is discharged from the first discharge port 5. By having a pressure adjusting mechanism (not shown) for adjusting the supply pressure and discharge pressure of each cleaning liquid and adjusting the balance between the opening of the first cleaning liquid supply path 10 and the atmospheric pressure, On the upper surface, the cleaning can be performed without spilling the first cleaning liquid or running out of the cleaning liquid. On the other hand, the second cleaning liquid is supplied from the second supply port 8, passes through the second cleaning liquid supply path 11 between the housing 6 and the article 3 to be cleaned, and is discharged from the second discharge port 9. By adjusting the balance between the opening of the second cleaning liquid supply path 11 and the atmospheric pressure by adjusting the supply pressure and the discharge pressure of each cleaning liquid, Cleaning can be performed without spilling the second cleaning liquid or running out of the cleaning liquid. As a result, the cleaning can be reliably performed with a small amount of the first cleaning liquid and the second cleaning liquid.
被洗浄物３の洗浄中は、超音波振動子７から超音波振動の伝達を行う。超音波振動子７の振動を発生させても、第二の洗浄液は、微細気泡を含有しない洗浄液であるため、超音波振動子７から超音波振動は、減衰することなく、第一の洗浄液と被洗浄物３の界面に伝わる。このことにより、微細気泡を含有する第一の洗浄液で、被洗浄物３を洗浄しても、第一の洗浄液の気泡によって、超音波が減衰しないため、洗浄力を高めることができる。また、本実施形態では、第一の洗浄液供給経路１０と第二の洗浄液供給経路１１とが被洗浄物３によって分離されていて、超音波照射領域において、第一の洗浄液と第二の洗浄液とが混合しない。このことにより、超音波を被洗浄面に確実に伝搬させて、かつ洗浄力を高めることができる。第二の洗浄液は超音波振動を減衰させない微細気泡を含有しない洗浄液であれば、同様な洗浄効果がえられるが、本実施形態において行ったように脱気水を用いることにより、より強い超音波でも気泡が発生することなく超音波を伝播させることができるため好ましい。 During the cleaning of the article 3 to be cleaned, ultrasonic vibration is transmitted from the ultrasonic vibrator 7. Even if the vibration of the ultrasonic vibrator 7 is generated, the second cleaning liquid is a cleaning liquid that does not contain fine bubbles. Therefore, the ultrasonic vibration from the ultrasonic vibrator 7 is not attenuated and the first cleaning liquid. It is transmitted to the interface of the object 3 to be cleaned. As a result, even if the article 3 is cleaned with the first cleaning liquid containing fine bubbles, the ultrasonic waves are not attenuated by the bubbles of the first cleaning liquid, so that the cleaning power can be increased. In the present embodiment, the first cleaning liquid supply path 10 and the second cleaning liquid supply path 11 are separated by the article to be cleaned 3, and the first cleaning liquid and the second cleaning liquid are separated in the ultrasonic irradiation region. Does not mix. As a result, the ultrasonic wave can be reliably propagated to the surface to be cleaned and the cleaning power can be enhanced. If the second cleaning liquid is a cleaning liquid not containing fine bubbles that does not attenuate ultrasonic vibration, the same cleaning effect can be obtained, but by using deaerated water as in the present embodiment, stronger ultrasonic waves can be obtained. However, it is preferable because ultrasonic waves can be propagated without generating bubbles.
図２には、第１の実施形態の超音波洗浄装置の変形例を示す。図１に示した超音波洗浄装置１３は、被洗浄物３の上面を洗浄するものであったが、図２に示す超音波洗浄装置１４は、被洗浄物３の上面および下面の両面を洗浄するものである。図２に示されるように、超音波洗浄装置１４の左側は、図１に示した超音波洗浄装置１３と同様の構造で、被洗浄物３の上面を洗浄するものであるが、超音波洗浄装置１４の右側は、被洗浄物３の下面を洗浄するものである。 In FIG. 2, the modification of the ultrasonic cleaning apparatus of 1st Embodiment is shown. The ultrasonic cleaning device 13 shown in FIG. 1 cleans the upper surface of the object 3 to be cleaned. The ultrasonic cleaning device 14 shown in FIG. 2 cleans both the upper surface and the lower surface of the object 3 to be cleaned. To do. As shown in FIG. 2, the left side of the ultrasonic cleaning device 14 has the same structure as the ultrasonic cleaning device 13 shown in FIG. 1, and cleans the upper surface of the article 3 to be cleaned. The right side of the apparatus 14 is for cleaning the lower surface of the article 3 to be cleaned.
図２に示されるように、超音波洗浄装置１４の右側は、被洗浄物３の下面に微細気泡を含有する第一の洗浄液を供給する第一の洗浄液供給経路１０と、被洗浄物３の上面に微細気泡を含有しない第二の洗浄液を供給する第二の洗浄液供給経路１１と、被洗浄物３の上面側から被洗浄物３を通して第一の洗浄液と接する被洗浄物３の下面に超音波を付与する超音波振動子７とを有している。このことにより、図１に示した超音波洗浄装置１３と同様に、第一の洗浄液の気泡によって、超音波が減衰しないため、洗浄力を高めることができ、かつ被洗浄物３の上面および下面の両面を洗浄することができる。 As shown in FIG. 2, the right side of the ultrasonic cleaning device 14 includes a first cleaning liquid supply path 10 for supplying a first cleaning liquid containing fine bubbles to the lower surface of the object 3 to be cleaned, and the object 3 to be cleaned. A second cleaning liquid supply path 11 that supplies a second cleaning liquid that does not contain fine bubbles on the upper surface, and a lower surface of the object to be cleaned 3 that contacts the first cleaning liquid from the upper surface side of the object to be cleaned 3 through the object to be cleaned 3. And an ultrasonic transducer 7 for applying sound waves. Thus, as in the ultrasonic cleaning device 13 shown in FIG. 1, the ultrasonic wave is not attenuated by the bubbles of the first cleaning liquid, so that the cleaning power can be increased and the upper and lower surfaces of the object 3 to be cleaned Can be cleaned on both sides.
尚、本実施形態の変形例では、第一の洗浄液供給経路１０と第二の洗浄液供給経路１１を左右に２個持つ場合を例示したが、被洗浄物３の下面を洗浄する場合、図１の超音波洗浄装置１３において、被洗浄物３の上面の筐体６にも超音波振動子７を追加し、第一の洗浄液供給経路１０に第二の洗浄液、第二の洗浄液供給経路１１に第一の洗浄液を切り替えて供給排出し、被洗浄物３の上面の超音波振動子７を振動させて、被洗浄物３の下面を洗浄してもかまわない。 In the modification of the present embodiment, the case where the first cleaning liquid supply path 10 and the second cleaning liquid supply path 11 are provided on the left and right sides is illustrated. However, when the lower surface of the object to be cleaned 3 is cleaned, FIG. In the ultrasonic cleaning apparatus 13, an ultrasonic vibrator 7 is also added to the housing 6 on the upper surface of the object 3 to be cleaned, and the second cleaning liquid is supplied to the first cleaning liquid supply path 10, and the second cleaning liquid supply path 11 is set. The first cleaning liquid may be switched and supplied and discharged, and the ultrasonic vibrator 7 on the upper surface of the object to be cleaned 3 may be vibrated to clean the lower surface of the object to be cleaned 3.
［第２実施形態］
図３は、本発明の第２の実施形態の超音波洗浄装置を説明する図である。
[Second Embodiment]
FIG. 3 is a diagram illustrating an ultrasonic cleaning apparatus according to the second embodiment of the present invention.
図３に示される超音波洗浄装置１５は、被洗浄物３を回転しながら、洗浄するものである。図３に示されるに、被洗浄物３は、基板ホルダー１８に設置されており、基板ホルダー１８および被洗浄物３は、５００ＲＰＭ程度の回転速度で、回転可能となっている。被洗浄物３の上部には、第一の洗浄液１９を供給する第一の洗浄液供給ノズル１６が設置され、洗浄中は、被洗浄物３が回転され、遠心力によって、第一の洗浄液供給経路１０が形成される。一方、被洗浄物３の下部には、第二の洗浄液２０を供給する第二の洗浄液供給ノズル１７が設置され、洗浄中は、被洗浄物３が回転され、遠心力によって、第二の洗浄液供給経路１１が形成される。第二の洗浄液供給ノズル１７は、超音波振動子７を有しており、第二の洗浄液２０に、超音波を重畳可能となっており、第二の洗浄液供給ノズル１７から第二の洗浄液２０を供給すると、第二の洗浄液供給経路１１に超音波が伝達し、さらに被洗浄物３の上面に超音波を伝達することが可能となっている。 The ultrasonic cleaning device 15 shown in FIG. 3 cleans the object to be cleaned 3 while rotating it. As shown in FIG. 3, the object to be cleaned 3 is installed on the substrate holder 18, and the substrate holder 18 and the object to be cleaned 3 can rotate at a rotation speed of about 500 RPM. A first cleaning liquid supply nozzle 16 for supplying a first cleaning liquid 19 is installed above the object to be cleaned 3. During the cleaning, the object to be cleaned 3 is rotated, and a first cleaning liquid supply path is provided by centrifugal force. 10 is formed. On the other hand, a second cleaning liquid supply nozzle 17 for supplying the second cleaning liquid 20 is installed below the object to be cleaned 3, and the object to be cleaned 3 is rotated during the cleaning, and the second cleaning liquid is caused by centrifugal force. A supply path 11 is formed. The second cleaning liquid supply nozzle 17 includes the ultrasonic vibrator 7 and can superimpose ultrasonic waves on the second cleaning liquid 20. The second cleaning liquid 20 is supplied from the second cleaning liquid supply nozzle 17. When ultrasonic waves are supplied, ultrasonic waves are transmitted to the second cleaning liquid supply path 11 and further ultrasonic waves can be transmitted to the upper surface of the object to be cleaned 3.
本実施形態の第一の洗浄液１９および第二の洗浄液２０は、第１の実施形態で示したものと同じであり、第一の洗浄液１９は、微細気泡を含有する洗浄液であり、第二の洗浄液２０は、微細気泡を含有しない洗浄液である。第１の実施形態と同様に、第二の洗浄液２０は、微細気泡を含有しない洗浄液であるため、超音波振動は、減衰することなく、第一の洗浄液１９と被洗浄物３の界面に伝わる。このことにより、微細気泡を含有する第一の洗浄液１９で、被洗浄物３を洗浄しても、第一の洗浄液１９の気泡によって、超音波が減衰しないため、洗浄力を高めることができる。本実施形態では、被洗浄物３の上面を洗浄する場合を例示したが、被洗浄物３の下面を洗浄する場合は、第一の洗浄液供給ノズル１６を被洗浄物３の下面に、第二の洗浄液供給ノズル１７を被洗浄物３の上面に、それぞれ追加して設置するなどの工夫をしてもかまわない。 The first cleaning liquid 19 and the second cleaning liquid 20 of the present embodiment are the same as those shown in the first embodiment, and the first cleaning liquid 19 is a cleaning liquid containing fine bubbles, The cleaning liquid 20 is a cleaning liquid that does not contain fine bubbles. Similar to the first embodiment, since the second cleaning liquid 20 is a cleaning liquid that does not contain fine bubbles, the ultrasonic vibration is transmitted to the interface between the first cleaning liquid 19 and the object to be cleaned 3 without being attenuated. . Accordingly, even if the cleaning object 3 is cleaned with the first cleaning liquid 19 containing fine bubbles, the ultrasonic waves are not attenuated by the bubbles of the first cleaning liquid 19, so that the cleaning power can be increased. In the present embodiment, the case of cleaning the upper surface of the object to be cleaned 3 is illustrated, but when the lower surface of the object to be cleaned 3 is cleaned, the first cleaning liquid supply nozzle 16 is placed on the lower surface of the object to be cleaned 3. The cleaning liquid supply nozzle 17 may be additionally provided on the upper surface of the object 3 to be cleaned.
３ 被洗浄物
４ 第一の供給口
５ 第一の排出口
６ 筐体
７ 超音波振動子
８ 第二の供給口
９ 第二の排出口
１０ 第一の洗浄液供給経路
１１ 第二の洗浄液供給経路
１３、１４、１５ 超音波洗浄装置
１６ 第一の洗浄液供給ノズル
１７ 第二の洗浄液供給ノズル
１８ 基板ホルダー
１９ 第一の洗浄液
２０ 第二の洗浄液
５４ 第一の供給部
５５ 第一の排出部
５８ 第二の供給部
５９ 第二の排出部
3 Object 4 First supply port 5 First discharge port 6 Housing 7 Ultrasonic vibrator 8 Second supply port 9 Second discharge port 10 First cleaning liquid supply path 11 Second cleaning liquid supply path 13, 14, 15 Ultrasonic cleaning device 16 First cleaning liquid supply nozzle 17 Second cleaning liquid supply nozzle 18 Substrate holder 19 First cleaning liquid 20 Second cleaning liquid 54 First supply section 55 First discharge section 58 First Second supply section 59 Second discharge section
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| JPH09187603A (en) * | 1996-01-09 | 1997-07-22 | Sato Tatsuhiko | Deaerator and deaerator for ultrasonic washer |
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