JP2010161109A5 - - Google Patents
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- JP2010161109A5 JP2010161109A5 JP2009000857A JP2009000857A JP2010161109A5 JP 2010161109 A5 JP2010161109 A5 JP 2010161109A5 JP 2009000857 A JP2009000857 A JP 2009000857A JP 2009000857 A JP2009000857 A JP 2009000857A JP 2010161109 A5 JP2010161109 A5 JP 2010161109A5
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- JP
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009000857A JP5186394B2 (en) | 2009-01-06 | 2009-01-06 | Mounting table and plasma etching or ashing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009000857A JP5186394B2 (en) | 2009-01-06 | 2009-01-06 | Mounting table and plasma etching or ashing device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010161109A JP2010161109A (en) | 2010-07-22 |
| JP2010161109A5 true JP2010161109A5 (en) | 2012-02-23 |
| JP5186394B2 JP5186394B2 (en) | 2013-04-17 |
Family
ID=42578103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009000857A Active JP5186394B2 (en) | 2009-01-06 | 2009-01-06 | Mounting table and plasma etching or ashing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5186394B2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103227083B (en) * | 2012-01-31 | 2015-08-12 | 中微半导体设备(上海)有限公司 | A kind of slide holder for plasma processing apparatus |
| US9472410B2 (en) | 2014-03-05 | 2016-10-18 | Applied Materials, Inc. | Pixelated capacitance controlled ESC |
| KR102487342B1 (en) * | 2016-06-14 | 2023-01-13 | 삼성전자주식회사 | Electrostatic chuck and a plasma apparatus for processing substrates having the same |
| US11887877B2 (en) | 2017-09-29 | 2024-01-30 | Sumitomo Osaka Cement Co., Ltd. | Electrostatic chuck device |
| WO2019078126A1 (en) * | 2017-10-16 | 2019-04-25 | 株式会社アルバック | Plasma processing device |
| US20190119815A1 (en) * | 2017-10-24 | 2019-04-25 | Applied Materials, Inc. | Systems and processes for plasma filtering |
| EP3777671A4 (en) * | 2018-03-29 | 2021-12-29 | Creative Technology Corporation | Attachment pad |
| JP6705551B1 (en) | 2019-03-22 | 2020-06-03 | Toto株式会社 | Electrostatic chuck |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000294543A (en) * | 1999-04-08 | 2000-10-20 | Hitachi Ltd | Etching method, etching apparatus, and semiconductor device manufacturing method |
| JP5233092B2 (en) * | 2006-08-10 | 2013-07-10 | 東京エレクトロン株式会社 | Mounting table for plasma processing apparatus and plasma processing apparatus |
| JP5125024B2 (en) * | 2006-08-10 | 2013-01-23 | 東京エレクトロン株式会社 | Mounting table for plasma processing apparatus and plasma processing apparatus |
| JP4855177B2 (en) * | 2006-08-10 | 2012-01-18 | 住友大阪セメント株式会社 | Electrostatic chuck device |
| JP5233093B2 (en) * | 2006-08-10 | 2013-07-10 | 東京エレクトロン株式会社 | Mounting table for plasma processing apparatus and plasma processing apparatus |
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2009
- 2009-01-06 JP JP2009000857A patent/JP5186394B2/en active Active