JP2010133727A - Cleaning mechanism, cleaning method and analyzer - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cleaning mechanism capable of performing suitably ultrasonic cleaning of the inner circumferential surface of a dispensation nozzle, and to provide a cleaning method and an analyzer. <P>SOLUTION: This cleaning mechanism 10 for cleaning an approximately cylindrical dispensation nozzle 20 having an aperture inside includes: a cleaning tank 40 having at least one opening part into which the dispensation nozzle 20 can be inserted, capable of storing liquid inside; and a vibrator array 41 which is an ultrasonic wave irradiation mechanism for irradiating an ultrasonic wave to be focused on a focusing position P10 inside the dispensation nozzle 20. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a cleaning mechanism, a cleaning method, and an analyzer.

  2. Description of the Related Art Conventionally, a cleaning mechanism that immerses an object to be cleaned in a liquid and irradiates the liquid with ultrasonic waves is known as an apparatus for cleaning foreign matter adhering to the outer surface of the object to be cleaned. In particular, a biochemical analyzer that performs biochemical analysis includes a dispensing nozzle for dispensing a sample and the like, and an ultrasonic cleaning tank for removing the sample adhering to the outer surface of the dispensing nozzle. There are known ones that are intended to suitably clean the dispensing nozzle.

  As an example of such an apparatus, Patent Document 1 describes a biochemical analyzer. The biochemical analyzer described in Patent Document 1 includes a Langevin transducer that is an ultrasonic transducer, a tube shape that has a narrow-diameter portion and a large-diameter portion at both ends, and the cross-sectional area gradually expands. A horn member disposed in contact with the ultrasonic transducer, the horn member being disposed within the narrow diameter portion, a cleaning tank for cleaning the dispensing nozzle, and the dispensing nozzle within the cleaning tank. And a vibration indirect member for transmitting ultrasonic vibration.

According to this biochemical analyzer, sample deposits on the dispensing nozzle are completely removed, so that sample carry-over (carry over) by the dispensing nozzle is prevented and errors in analysis results are reduced. Can do.
Japanese Patent No. 294574

  However, in the biochemical analyzer described in Patent Document 1, since the ultrasonic vibration is transmitted to the cleaning liquid supplied to the cleaning tank by immersing the dispensing nozzle in the cleaning tank, the outer peripheral surface of the dispensing nozzle In comparison, it is difficult to sufficiently generate cavitation and the like on the inner peripheral surface of the dispensing nozzle. For this reason, there was a problem that the sample remained on the inner peripheral surface of the dispensing nozzle.

  The present invention has been made in view of the above-described circumstances, and an object thereof is to provide a cleaning mechanism, a cleaning method, and an analyzer that can suitably ultrasonically clean the inner peripheral surface of a dispensing nozzle.

In order to solve the above problems, the present invention proposes the following means.
The cleaning mechanism of the present invention is a cleaning mechanism for cleaning a substantially cylindrical dispensing nozzle having a gap inside, and has at least one opening into which the dispensing nozzle can be inserted and can store liquid therein. And an ultrasonic irradiation mechanism for irradiating the ultrasonic wave focused toward the gap of the dispensing nozzle set in the cleaning tank.

According to this invention, the ultrasonic wave irradiated by the ultrasonic irradiation mechanism is focused at one point in the gap inside the dispensing nozzle. That is, the intensity of the ultrasonic wave is higher at the position where the ultrasonic wave is focused than at other positions. Therefore, even if the intensity of ultrasonic waves passing through the dispensing nozzle is attenuated, the intensity of the sample attached to the dispensing nozzle should be removable at the position where the ultrasonic waves are focused inside the dispensing nozzle. Can do. As a result, the inner peripheral surface of the dispensing nozzle can be suitably ultrasonically cleaned.
Further, since the intensity is weaker than the intensity at the position where the ultrasonic wave is focused except at the position where the ultrasonic wave is focused, the impact other than the part where ultrasonic cleaning is performed is reduced. Therefore, the aggressiveness with respect to the outer surface of the dispensing nozzle can be reduced.

Moreover, it is preferable that the washing | cleaning mechanism of this invention has a liquid feeding mechanism which distribute | circulates the liquid to the said space | gap inside the said dispensing nozzle.
In this case, the deposits and the like detached from the dispensing nozzle by ultrasonic cleaning can be suitably washed away by the liquid circulated inside the dispensing nozzle.
Furthermore, if the liquid is only circulated inside the dispensing nozzle, the liquid inside the dispensing nozzle becomes a laminar flow and exhibits a parabolic velocity distribution, and the flow velocity is the slowest in the vicinity of the tube wall. By generating ultrasonic vibration inside the injection nozzle, the flow velocity of the liquid in the vicinity of the tube wall inside the dispensing nozzle is increased. Therefore, the inner peripheral surface of the dispensing nozzle can be suitably ultrasonically cleaned.

In the cleaning mechanism of the present invention, it is preferable that the ultrasonic irradiation mechanism has a transducer array including ultrasonic transducers that are fixed to the cleaning tank and arranged in a circumferential direction of the dispensing nozzle.
In this case, it is possible to irradiate ultrasonic waves that are focused toward the gap inside the dispensing nozzle from the ultrasonic transducers arranged side by side in the circumferential direction of the cleaning tank. Here, a plurality of ultrasonic transducers are provided, and the intensity when the ultrasonic waves are focused can be adjusted by operating the operations individually and combining and driving arbitrary ultrasonic transducers. it can.

In the cleaning mechanism of the present invention, it is preferable that a plurality of the vibrator arrays are arranged side by side in the axial direction of the dispensing nozzle set in the cleaning tank.
In this case, it is possible to more suitably ultrasonically clean the inner peripheral surface of the dispensing nozzle by focusing the ultrasonic waves at a plurality of positions spaced in the axial direction with respect to the dispensing nozzle.

Moreover, it is preferable that the cleaning mechanism of the present invention includes an acoustic lens unit in which the ultrasonic irradiation mechanism is fixed to the cleaning tank and focuses the ultrasonic wave toward the gap of the dispensing nozzle.
In this case, the ultrasonic wave is refracted by the acoustic lens unit, so that the ultrasonic wave is focused. Therefore, the focused position of the ultrasonic wave can be adjusted more accurately.
Furthermore, by forming the acoustic lens portion in a cylindrical lens shape, the inner peripheral surface can be suitably ultrasonically cleaned inside the dispensing nozzle by focusing the ultrasonic wave on a line parallel to the generatrix.

In the cleaning mechanism of the present invention, it is preferable that the ultrasonic irradiation mechanism has a dynamic focus mechanism that changes a focusing position of the ultrasonic wave in a circumferential direction or an axial direction with respect to the dispensing nozzle.
In this case, the ultrasonic irradiation mechanism can change the focal position of the ultrasonic wave by the dynamic focus mechanism. Therefore, in the cleaning tank in which the dispensing nozzle is arranged, even if the positional relationship between the dispensing nozzle and the ultrasonic irradiation mechanism is fixed, the ultrasonic waves are preferably focused on a plurality of different portions on the inner peripheral surface of the dispensing nozzle. Thus, the inner peripheral surface of the dispensing nozzle can be ultrasonically cleaned.

In the cleaning mechanism of the present invention, it is preferable that the ultrasonic irradiation mechanism causes cavitation in the gap inside the dispensing nozzle.
In order to cause cavitation inside the dispensing nozzle, it is necessary to irradiate ultrasonic waves having a sound pressure exceeding a threshold value inside the dispensing nozzle. Here, the ultrasonic irradiation mechanism irradiates ultrasonic waves that are focused inside the dispensing nozzle, so that cavitation can be generated at a position where the ultrasonic waves are focused inside the dispensing nozzle. A shock wave propagates to the inner peripheral surface of the dispensing nozzle by cavitation generated inside the dispensing nozzle, and the sample and the like attached to the inner peripheral surface of the dispensing nozzle can be peeled off by this shock wave. Therefore, the inner peripheral surface of the dispensing nozzle can be cleaned appropriately.

In the cleaning mechanism of the present invention, it is preferable that the ultrasonic irradiation mechanism generates an acoustic flow in the circumferential direction of the dispensing nozzle in the gap inside the dispensing nozzle.
When the ultrasonic wave propagating in the liquid is blocked by an object such as an object to be cleaned, a pressing force generated in the ultrasonic wave propagation direction is generated by the ultrasonic radiation pressure, and the object to be cleaned and the liquid are pressed. . The acoustic flow is a fluid motion generated in the liquid at this time and substantially perpendicular to the ultrasonic radiation surface.
The liquid is stirred at the position where the ultrasonic waves are focused on the inner peripheral surface of the dispensing nozzle by the acoustic flow generated by the ultrasonic irradiation mechanism. Furthermore, a flow along the inner peripheral surface of the dispensing nozzle in the circumferential direction is generated by the acoustic flow. As a result, the liquid in which dirt such as the sample attached to the inner peripheral surface of the dispensing nozzle is dissolved is suitably transported and replaced with a solution that is not dirty, so the inner peripheral surface of the dispensing nozzle is preferably cleaned. can do.

  The cleaning mechanism of the present invention aligns the relative position between the ultrasonic focusing position and the inner peripheral surface of the dispensing nozzle so that the ultrasonic focusing position is along the inner peripheral surface of the dispensing nozzle. It is preferable to further include a position adjusting mechanism.

  In this case, since the ultrasonic focusing position can be aligned with the inner peripheral surface of the dispensing nozzle, the vibration generated when the ultrasonic waves are focused can be suitably propagated to the inner peripheral surface of the dispensing nozzle. it can. As a result, the inner peripheral surface of the dispensing nozzle can be suitably cleaned.

Further, in the cleaning mechanism of the present invention, the ultrasonic irradiation mechanism may irradiate ultrasonic waves having a predetermined angle in the flow direction of the liquid inside the dispensing nozzle set in the cleaning tank. preferable.
In this case, the ultrasonic waves irradiated by the ultrasonic irradiation mechanism are irradiated with an angle in the liquid flow direction. Therefore, the ultrasonic wave focused at the position where the ultrasonic wave is focused generates a force that further presses the liquid in the flow direction. Therefore, the flow rate of the liquid can be increased, or the decrease in the flow rate of the liquid can be suppressed, and the inner peripheral surface of the dispensing nozzle can be cleaned appropriately.

In the cleaning mechanism of the present invention, it is preferable that the ultrasonic irradiation mechanism moves the focal position of the ultrasonic wave along the flow direction of the liquid.
In this case, the liquid can be further pressed in the flow direction by moving the focused position of the ultrasonic wave along the flow direction of the liquid. Therefore, the flow rate of the liquid can be increased, or the decrease in the flow rate of the liquid can be suppressed, and the inner peripheral surface of the dispensing nozzle can be cleaned appropriately.

  The cleaning method of the present invention includes an immersion step of immersing a dispensing nozzle having a void in the interior thereof in a liquid, and ultrasonic waves that interfere with each other so as to strengthen at least inside the dispensing nozzle from the outside to the inside. It is characterized by comprising an ultrasonic irradiation step of irradiating from two or more positions outside the dispensing nozzle, and a rinsing step of exchanging the liquid inside the dispensing nozzle following the ultrasonic irradiation step.

  According to this invention, the inside of the dispensing nozzle is filled with the liquid by the dipping process. Subsequently, the ultrasonic waves irradiated toward the inside of the dispensing nozzle interfere with each other so as to strengthen the inside of the dispensing nozzle, and an impact is propagated to the inner peripheral surface of the dispensing nozzle. Further, by subsequently replacing the liquid inside the dispensing nozzle, the liquid containing dirt such as a reagent peeled off from the dispensing nozzle by the impact of ultrasonic waves is discharged. As a result, the inner peripheral surface of the dispensing nozzle can be suitably cleaned.

  In the cleaning method of the present invention, the ultrasonic irradiation step includes a first irradiation step of irradiating the ultrasonic wave in advance with respect to a proximal end side of the dispensing nozzle, and a predetermined time from the first irradiation step. It is preferable to include a second irradiation step of irradiating the ultrasonic wave to the dispensing nozzle on the tip side by a predetermined distance from the ultrasonic irradiation portion in the first irradiation step after being delayed by a distance.

  In this case, by applying ultrasonic waves in the first irradiation step, a pressing force in the axial direction of the dispensing nozzle is generated in the liquid inside the dispensing nozzle. Subsequently, the ultrasonic wave irradiated by the second irradiation process with a delay of a predetermined time from the first irradiation process is focused on the tip side by a predetermined distance from the focusing position in the first irradiation process. Then, the liquid pressed to the tip side in the first irradiation step is further pressed to the tip side by the second irradiation step. As a result, the liquid is pressed and moved from the proximal end to the distal end inside the dispensing nozzle. Accordingly, the liquid is slid relative to the inner peripheral surface of the dispensing nozzle, so that the inner peripheral surface of the dispensing nozzle is suitably cleaned.

  The analyzer according to the present invention includes the above-described cleaning mechanism, a dispensing mechanism having the dispensing nozzle and capable of sucking, discharging, and holding a predetermined amount of sample in the gap, and the dispensing in a tank shape with one end opened. A cuvette in which the sample is dispensed by a mechanism, a transport mechanism that sequentially transports the plurality of cuvettes, and a detection mechanism that detects a reaction state between the specimen and the second liquid in the cuvette. Yes.

  According to this invention, the dispensing nozzle is cleaned by the cleaning mechanism that suitably cleans the inner peripheral surface of the dispensing nozzle, and a predetermined amount of sample is dispensed by the dispensing nozzle, so that the introduction of different samples is suppressed. Thus, the detection error in the detection mechanism can be reduced.

Moreover, it is preferable that the analyzer of this invention has a spectrophotometer in which the said detection mechanism performs the colorimetric analysis method with respect to a biochemical reaction.
In this case, colorimetric analysis can be performed with high accuracy by a spectrophotometer.

  According to the cleaning mechanism, the cleaning method, and the analysis apparatus according to the present invention, the ultrasonic wave focused on the inside of the dispensing nozzle is irradiated by the ultrasonic irradiation mechanism to propagate the impact to the inner peripheral surface of the dispensing nozzle. Thus, it is possible to suitably ultrasonically clean the inner peripheral surface of the dispensing nozzle.

(First embodiment)
Hereinafter, an analyzer equipped with the cleaning mechanism of the first embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a plan view showing a schematic configuration of the analyzer 1 of the present embodiment. As shown in FIG. 1, the analyzer 1 includes a sample container transfer mechanism 3 to which a sample to be analyzed and tested is attached, a reaction table 2 to which a sample is transferred from the sample container transfer mechanism 3, and a reaction table 2. And a reagent table 4 on which reagents for performing the reaction are arranged.

  In the reaction table 2, a plurality of cuvettes 5, which are reaction containers to which specimens and reagents are supplied, are arranged in a ring shape on a concentric circumference. In addition, in the sample container transfer mechanism 3, a sample container 6 that is a container for containing a sample is concentrically arranged in an annular shape. In addition, a reagent container 7 that is a container for containing a reagent is concentrically arranged in an annular shape on the reagent table 4.

  The analyzer 1 also includes a stirring mechanism 12 for stirring the liquid supplied to the inside of the cuvette 5.

  The reaction table 2, the sample container transfer mechanism 3, and the reagent table 4 are each provided with a rotation drive mechanism (not shown), and can be positioned at any position by intermittently or continuously rotating in the circumferential direction.

Furthermore, the analyzer 1 includes an analysis optical system 13 that is arranged adjacent to the reaction table 2 and is a detection mechanism for analyzing and measuring the reaction state inside the cuvette 5. The analysis optical system 13 in this embodiment includes a spectrophotometer that irradiates the cuvette 5 with a light beam having a predetermined wavelength and outputs the transmittance.

  Furthermore, the analyzer 1 includes a sample dispensing mechanism 8 that is a first dispensing mechanism that conveys and dispenses a liquid between the sample container transfer mechanism 3 and the reaction table 2, a reagent table 4, and a reaction table 2. A reagent dispensing mechanism 9 is provided as a second dispensing mechanism for conveying and dispensing the liquid between the two.

  The sample dispensing mechanism 8 and the reagent dispensing mechanism 9 can swing between the reaction table 2 and the sample container transfer mechanism 3 or between the reaction table 2 and the reagent table 4. Cleaning mechanisms 10 and 11 for cleaning the sample dispensing mechanism 8 and the reagent dispensing mechanism 9 are provided on the trajectory of the turning operation of the sample dispensing mechanism 8 and the reagent dispensing mechanism 9.

  The reaction table 2 includes a sample dispensing position P1 which is a position for transporting a sample from the sample container transfer mechanism 3 by the sample dispensing mechanism 8 and a reagent dispensing mechanism 9 for transporting the reagent from the reagent table 4. A reagent dispensing position P3 to be a position, a stirring position P5 to be a position for stirring the sample or reagent supplied to the inside of the cuvette 5 by the stirring mechanism 12, and a reaction result for measuring the reaction result in the cuvette 5 A measurement position P6 that is a position and a tank cleaning position P7 that is a position for discarding the contents of the cuvette 5 that has been measured and cleaning the cuvette 5 are defined.

  Similarly, the sample container transfer mechanism 3 has a sample aspiration position P2 where a sample to be transported to the reaction table 2 is arranged, and the reagent table 4 has a reagent transported to the reaction table 2 disposed therein. The reagent suction position P4 is determined.

  In the specimen container transport mechanism 3, the specimen container 6 has a specimen such as whole blood, serum, plasma, urine, fecal lysate, tissue disruption fluid, cell suspension, and other biological samples, cultured cells, or culture fluids. Samples and the like can be accommodated.

  FIG. 2 is a block diagram illustrating a schematic configuration of the analyzer 1. As shown in FIG. 2, in the analyzer 1, an input unit I is provided for an operator to perform predetermined inputs and specify operating conditions such as analysis items and the number of samples and cleaning operation conditions in the cleaning mechanism 10. It has been.

  The operating condition input in the input unit I is transmitted to the control unit C, and in accordance with this operating condition, the sample dispensing mechanism 8, the reagent dispensing mechanism 9, the sample container transfer mechanism 3, the reagent table 4, the reaction table 2, and the analysis optics The operations of the system 13, the stirring mechanism 12, and the cleaning mechanism 10 are controlled.

  As a mechanism for outputting data detected by the analysis optical system 13, a method of displaying on the display unit D or a configuration of outputting to a recording medium by a storage device (not shown) can be adopted.

  FIG. 3 is a configuration diagram showing a partial configuration of the present embodiment. FIG. 3 shows a configuration related to the specimen dispensing mechanism 8. The sample dispensing mechanism 8 includes a cylindrical dispensing nozzle 20 that can discharge a predetermined amount of the sample 6a from the tip. The dispensing nozzle 20 is fixed to an arm 21, and the arm 21 is capable of turning around a turning shaft 26.

  Further, the swivel shaft 26 can move back and forth in the axial direction, and the swivel shaft 26 is connected to a dispensing nozzle transfer unit 27 and is driven to turn and retreat by the dispensing nozzle transfer unit 27. Accordingly, the dispensing nozzle 20 can rotate around the turning shaft 26 and can move back and forth in the direction of the turning shaft 26. For this reason, the dispensing nozzle transfer unit 27 moves the tip 20a of the dispensing nozzle 20 close to or away from each of the cuvette 5, the sample container 6 and the cleaning mechanism 10 on the trajectory of the swiveling operation of the dispensing nozzle 20. Can be made.

  The dispensing nozzle transfer unit 27 is electrically connected to the dispensing nozzle transfer unit 33 in the control unit C. The dispensing nozzle transfer unit 33 transmits a drive signal to the dispensing nozzle transfer unit 27 in accordance with the operation condition input in the input unit I described above.

  As further shown in FIG. 3, the dispensing nozzle 20 is in communication with a flow conduit 23, and a discharge mechanism 24 that discharges the sample 6 a to the dispensing nozzle 20 is provided. In the present embodiment, the discharge mechanism 24 includes a pressure adjustment mechanism 24 a that can arbitrarily switch the inside of the dispensing nozzle 20 to any one of a positive pressure, a negative pressure, and a pressure maintenance via the flow pipe 23. Yes.

  For example, a syringe, a roller tube pump, or the like can be employed as the pressure adjustment mechanism 24a. Although not shown, it is preferable that the conduit from the discharge mechanism 24 to the dispensing nozzle 20 is filled with liquid. In this case, since the pressure loss due to the elasticity of the gas can be reduced, the dispensing accuracy can be increased.

  The discharge mechanism 24 is electrically connected to the suction / discharge control unit 31 in the control unit C. The suction / discharge control unit 31 includes a suction operation control unit 36 and a discharge operation control unit 37, and transmits a drive signal to the pressure adjustment mechanism 24a.

  In addition, the discharge mechanism 24 is electrically connected to the cleaning control unit 34 in the control unit C, and causes the cleaning liquid W1 (described later) to flow through a series of pipes extending from the discharge mechanism 24 to the dispensing nozzle 20. And an air supply control unit 39 that transmits a drive signal for replacing the liquid inside the pipe with air as one of the end processes of the analyzer 1. ing.

  FIG. 4 is a side sectional view showing the cleaning mechanism of the present embodiment. As shown in FIG. 4, the cleaning mechanism 10 is provided with a cleaning liquid supply mechanism 10 a so as to supply the cleaning liquid W <b> 1 to the cleaning tank 40. The cleaning liquid W1 of this embodiment is pure water.

  One end of pipes 40a and 40b for supplying the cleaning liquid W1 to the inside is opened in the cleaning tank 40. Further, an outflow passage 47 having an electromagnetic valve 48 that can be opened and closed is provided at the bottom of the cleaning tank 40. The flow of the cleaning liquid W1 in the pipe lines 40a and 40b and the outflow path 47 is controlled by the outer cleaning control unit 35 (see FIG. 3) in the control unit C. Further, the cleaning tank 40 is provided with a plurality of ultrasonic transducers capable of irradiating ultrasonic waves toward the inside of the cleaning tank 40, and the transducer arrays 41 to 46 are arranged in the longitudinal direction (dispensing) of the cleaning tank 40. The nozzle 20 is configured at predetermined intervals in the axial direction of the nozzle 20.

  FIG. 5 is a plan sectional view of the cleaning mechanism 10. As shown in FIG. 5, the transducer array 41 provided in the cleaning tank 40 is configured by arranging a plurality of ultrasonic transducers at predetermined intervals in the circumferential direction. The vibrator array 41 is exposed from the inner wall of the cleaning tank 40 so as to be in contact with the cleaning liquid W1.

  In the cleaning mechanism 11, the same configuration as that of the cleaning mechanism 10 can be adopted.

  The operation of the cleaning mechanism 10 in the analyzer 1 of the present embodiment configured as described above will be described with reference to FIGS. First, the flow of operations in the specimen dispensing mechanism 8 and the cleaning mechanism 10 in the analyzer of the present embodiment will be described with reference to FIG.

  FIG. 6 is a flowchart showing a flow of operation of the specimen dispensing mechanism 8. In the analyzer 1, the dispensing nozzle 20 is first moved to the sample suction position P2, which is a position for sucking the sample 6a, and the sample 6a is sucked into the dispensing nozzle 20 (aspiration step S1). Subsequently, the dispensing nozzle 20 is swung by the dispensing nozzle transfer unit 27 and the sample 6a is discharged to the cuvette 5 at the sample dispensing position P1, which is the position where the sample 6a is discharged (discharge step S2). Subsequently, the dispensing nozzle 20 is swung again, transferred to the cleaning mechanism 10, and immersed in the cleaning liquid W1 in the cleaning tank 40 (immersion step S3).

  In the cleaning mechanism 10, the dispensing nozzle 20 is inserted into the cleaning tank 40 (see FIGS. 4 and 6). Subsequently, the dispensing nozzle transfer unit 33 (see FIG. 3) detects the relative position of the dispensing nozzle 20 with respect to the cleaning tank 40 (position detection step S4), and the position of the dispensing nozzle 20 is adjusted (position adjustment step). S5).

  When the dispensing nozzle 20 is inserted into the cleaning tank 40, the transducer array 41 of this embodiment emits ultrasonic waves toward the focusing position P10 on the central axis of the cleaning tank 40 as shown in FIG. It comes to irradiate. In the position adjustment step S5, the position of the dispensing nozzle 20 is moved by the dispensing nozzle transfer unit 33 as shown in FIG. 7B so that the inner peripheral surface of the dispensing nozzle 20 is positioned at the convergence position P10. Adjusted.

  Subsequently, a cleaning operation for the dispensing nozzle 20 is started (cleaning start step S6). First, the cleaning liquid W <b> 1 is supplied into the cleaning tank 40 by the outer cleaning control unit 35, and the cleaning liquid W <b> 1 is also sent from the pressure adjustment mechanism 24 a toward the tip 20 a of the dispensing nozzle 20 in the dispensing nozzle 20. Is done.

  Subsequently, the transducer arrays 41 to 46 are simultaneously driven to irradiate ultrasonic waves focused on the central axis of the cleaning tank 40 (ultrasonic irradiation step S7). As shown in FIG. 7B, for example, the intensity of the ultrasonic wave focused at the focal position P10 by the transducer array 41 is attenuated by reflection or absorption when passing through the dispensing nozzle 20. However, the ultrasonic waves irradiated from a plurality of positions in the circumferential direction by the transducer array 41 including a plurality of ultrasonic transducers are synthesized at the focusing position P10 and oscillated with the sound pressure equal to or higher than the threshold for the cleaning liquid W1. Therefore, cavitation is generated by repeating pressurization and pressure reduction in the cleaning liquid W1.

  It is also possible to irradiate ultrasonic waves toward the focusing position P10 using only a part of the ultrasonic transducers mounted on the transducer array 41, and all the ultrasonic transducers in the transducer array 41 Can be used at the same time, and the output such as sound pressure can be changed depending on the number of ultrasonic transducers used.

  By cavitation, a shock wave is propagated to the inner peripheral surface of the dispensing nozzle 20 in the vicinity of the converging position P10, and the sample such as the specimen 6a attached to the inner peripheral surface of the dispensing nozzle 20 is decomposed or separated.

  Subsequently, the ultrasonic wave irradiation conditions are changed as shown in FIG. 6 (change step S8). In the present embodiment, the dispensing nozzle 20 is moved relative to the cleaning tank 40 in the changing step S8. That is, the ultrasonic focusing position P10 is moved to another position on the inner peripheral surface of the dispensing nozzle 20, and the ultrasonic waves are irradiated toward the focusing position P10 as described above.

When the irradiation with the ultrasonic waves is completed, the operations of the transducer arrays 41 to 46 are stopped (irradiation end step S9). Thereafter, the cleaning liquid W1 is fed for a predetermined time as required (rinsing step S91). Subsequently, the feeding of the cleaning liquid W1 is stopped and the cleaning operation is ended (cleaning end step S10).
The dispensing nozzle 20 that has been cleaned is swung from the cleaning mechanism 10 to the specimen container transfer mechanism 3 side and shifts to the next dispensing operation (transition step S11).

  As described above, according to the cleaning mechanism, the cleaning method, and the analyzer of the present embodiment, the transducer array 41 is configured by arranging the ultrasonic transducers at predetermined intervals in the circumferential direction of the cleaning tank 40. . For this reason, ultrasonic waves focused on the focusing position P10 from a plurality of positions in the circumferential direction of the dispensing nozzle 20 are irradiated toward the inside of the dispensing nozzle 20 immersed in the cleaning liquid W1 in the cleaning tank 40, and the dispensing nozzle 20 Shock waves due to cavitation can be generated in the interior.

  Furthermore, since the dispensing nozzle transfer unit 27 is driven so that the focusing position P10 is positioned on the inner peripheral surface of the dispensing nozzle 20, the inner peripheral surface of the dispensing nozzle 20 and the converging position P10 are brought close to each other, so that a shock wave is generated. It can be suitably propagated to the inner peripheral surface of the dispensing nozzle 20, and the inner peripheral surface of the dispensing nozzle 20 can be suitably cleaned.

(Second embodiment)
Next, the cleaning mechanism of the second embodiment of the present invention will be described with reference to FIG. In each embodiment described below, portions having the same configuration as the cleaning mechanism 10 according to the first embodiment described above are denoted by the same reference numerals and description thereof is omitted.
This embodiment is different from the first embodiment in that it further includes a support tank 50 into which the cleaning tank 40 is inserted.

  The support tank 50 is connected by a position adjusting mechanism 52 for adjusting the relative position between the cleaning tank 40 and the support tank 50. The position adjustment mechanism 52 is a mechanism for adjusting the radial position of the cleaning tank 40, and is, for example, a biaxial advance / retreat drive by two pairs of ball screws and nuts orthogonal to each other in a plane parallel to the radial section of the cleaning tank 40. A mechanism, an advancing / retreating drive mechanism using an air cylinder or a piezo element, or the like can be employed.

  In addition, the support tank 50 is provided with a through hole in the lower portion so that the cleaning liquid W1 discharged from the discharge path 47 flows out.

  Even in such a configuration, as in the first embodiment, the ultrasonic waves are focused on the focusing position (for example, the focusing position P10) on the central axis of the cleaning tank 40 on the inner peripheral surface of the dispensing nozzle 20, and are distributed. The inner peripheral surface of the injection nozzle 20 can be suitably cleaned.

  Further, since the position adjustment mechanism 52 can adjust the relative position between the inner peripheral surface of the dispensing nozzle 20 and the cleaning tank 40 to adjust the ultrasonic focusing position to the inner peripheral surface of the dispensing nozzle 20, it can be performed at high speed. It is not necessary to mount a driving mechanism for positioning the cleaning tank 40 on the pivoting dispensing mechanism (specimen dispensing mechanism 8 or reagent dispensing mechanism 9), thus reducing the weight of the dispensing mechanism. Speed up the operation.

(Third embodiment)
Next, a cleaning mechanism according to a third embodiment of the present invention will be described with reference to FIG. This embodiment is different from the above-described embodiments in that a cleaning mechanism 210 (211) is provided instead of the cleaning mechanisms 10 (11) and 110 (111).

The cleaning mechanism 210 (211) has a support tank 250 instead of the support tank 50. The support tank 250 has a discharge path 251 that opens downward in the lower part.
Further, a cleaning tank 240 is provided instead of the cleaning tank 40. The cleaning tank 240 has a discharge path 247 having substantially the same diameter as the inner diameter of the cleaning tank 240 in place of the discharge path 47, and does not have an opening / closing mechanism such as an electromagnetic valve.

  A position adjusting mechanism 252 provided instead of the position adjusting mechanism 52 is connected to each of the support tank 250 and the cleaning tank 240 to adjust the relative position between the support tank 250 and the cleaning tank 240. .

  In this embodiment, the cleaning liquid W1 is not provided with a valve or the like for storing the cleaning liquid W1 in the cleaning tank 240, but supplied by being discharged from the pipes 240a and 240b and the dispensing nozzle 20 for supplying the cleaning liquid W1. By adjusting the amount of the cleaning liquid W1 to be adjusted, an equilibrium state with the amount of the cleaning liquid W1 discharged from the discharge path 247 is maintained.

  By comprising in this way, since the valve | bulb for storing the washing | cleaning liquid W1 in the washing tank 240 becomes unnecessary, a structure can be simplified. In addition, since the valve is not used, it is possible to prevent a gap in which the cleaning liquid W1 is retained, and dirt such as a reagent peeled from the dispensing nozzle 20 is accumulated in the cleaning tank 240. Can be suppressed.

(Fourth embodiment)
Next, a cleaning mechanism according to a fourth embodiment of the present invention will be described with reference to FIGS. The present embodiment is different from the above-described embodiments in that a cleaning mechanism 310 (311) is provided instead of the cleaning mechanism of each of the above-described embodiments.

  As shown in FIG. 10, the cleaning mechanism 310 (311) of this embodiment includes an acoustic lens unit 341 instead of the transducer array 41. Although not shown, a plurality of acoustic lens portions 341 can be arranged in the axial direction of the cleaning tank 40 as in the arrangement of the transducer arrays 41 to 46 in the first embodiment.

  The acoustic lens unit 341 has an ultrasonic transducer (not shown) that refracts ultrasonic waves so as to be focused toward the center of the cleaning tank 40 while having an ultrasonic transducer inside. Accordingly, as shown in FIG. 11A, the acoustic lens unit 341 focuses the ultrasonic wave at the same focusing position P10 as in the first embodiment.

  In addition, as shown in FIG. 11B, in the present embodiment, the dispensing nozzle 20 is moved relative to the cleaning tank 40 to align the inner peripheral surface of the dispensing nozzle 20 and the cleaning tank 40. Can do. Thus, also in the present embodiment, the inner peripheral surface of the dispensing nozzle 20 can be suitably cleaned as in the above-described embodiment.

  Further, since the ultrasonic lens is focused by the acoustic lens, the focal position of the ultrasonic wave is determined by the shape of the acoustic lens. Therefore, it is possible to focus the ultrasonic wave at one point more easily than positioning and arranging a plurality of ultrasonic transducers.

(Fifth embodiment)
Next, a cleaning mechanism according to a fifth embodiment of the present invention will be described with reference to FIG. The present embodiment is different from the above-described embodiments in that a cleaning mechanism 410 (411) is provided instead of the cleaning mechanism of each of the above-described embodiments.

  As shown in FIG. 12, the cleaning mechanism 410 (411) includes a dynamic focus mechanism (not shown) that focuses the ultrasonic wave at a point other than the central axis of the cleaning tank 40, for example, a focusing position P20.

  The dynamic focus mechanism includes a transducer array 411 capable of irradiating ultrasonic waves whose phases are shifted instead of the transducer array 41 in order to move the focal position of the ultrasonic waves to an arbitrary position. In this embodiment, a plurality of transducer arrays 411 may be arranged in the axial direction of the cleaning tank 40.

In the dynamic focus mechanism, when the phase of irradiation from each of the ultrasonic transducers is shifted, the ultrasonic waves irradiated from a plurality of positions separated in the circumferential direction of the cleaning tank 40 are centered on the cleaning tank 40. It interferes so as to strengthen at a position apart from the central axis, not on the axis.
For this reason, the transducer array 411 causes cavitation at a position along the inner peripheral surface of the dispensing nozzle 20 in a state where the dispensing nozzle 20 is disposed inside the cleaning tank 40.

  Thus, also in the present embodiment, the inner peripheral surface of the dispensing nozzle 20 can be suitably cleaned as in the above-described embodiment. Furthermore, since the structure for aligning the inner peripheral surface of the dispensing nozzle 20 and the cleaning tank 40 can be omitted, the structure can be simplified.

(Modification)
Below, the modification of this embodiment is demonstrated with reference to FIG.
In this modification, an ultrasonic irradiation mechanism 541 including both the above-described dynamic focus mechanism and the above-described acoustic lens unit is provided for the cleaning tank 40.
By combining the dynamic focus mechanism and the acoustic lens unit, it is possible to easily focus the ultrasonic wave at a desired position inside the cleaning tank 40 and clean the inner peripheral surface of the dispensing nozzle 20.

(Sixth embodiment)
Next, a cleaning mechanism according to a sixth embodiment of the present invention will be described with reference to FIG. This embodiment is different from the above-described embodiments in that a cleaning mechanism 610 (611) is provided instead of the cleaning mechanism of each of the above-described embodiments.

  In the present embodiment, as shown in FIG. 14A, a transducer array 41 having ultrasonic transducers arranged in the circumferential direction of the cleaning tank 40 is provided as in the first embodiment. The frequency and sound pressure of the generated ultrasonic waves are different.

  In the present embodiment, the ultrasonic wave irradiated from the transducer array 41 is set to a frequency higher than that of the ultrasonic wave of the first embodiment, and the focusing position in a state where the dispensing nozzle 20 is inserted into the cleaning tank 40. Even when focused on P10, the strength threshold for causing cavitation in the cleaning liquid W1 is not exceeded. Such a frequency is preferably in the range of several tens of kHz to several tens of MHz.

  Moreover, it is preferable that the radiation pressure of the ultrasonic wave irradiated by the transducer array 41 is (if there is a suitable sound pressure range in this embodiment, it would be appreciated).

  For this reason, the ultrasonic wave irradiated by the transducer array 41 generates an acoustic flow that is a fluid motion in the ultrasonic wave propagation direction with respect to the cleaning liquid W1 at the focusing position P10.

  As shown in FIGS. 14A to 14C, in the present embodiment, in the transducer array 41, ultrasonic transducers in which the radiation directions of ultrasonic waves are relatively close, that is, two adjacent ultrasonic transducers are included. By being driven at the same time, ultrasonic waves focused at the focusing position P10 are emitted. Furthermore, the relative position between the dispensing nozzle 20 and the cleaning tank 40 is adjusted so that the propagation direction of the ultrasonic wave substantially coincides with the tangential direction on the inner periphery of the dispensing nozzle 20.

  Further, in the transducer array 41, the ultrasonic wave propagation direction is obtained by sequentially switching and driving the ultrasonic transducers along any one of the circumferential directions of the cleaning tank 40 (clockwise direction in the present embodiment). Are sequentially driven, and the positional relationship is adjusted and driven so that the propagation direction of the ultrasonic wave follows the tangential direction on the inner periphery of the dispensing nozzle 20 at the same time. Adjustment of the positional relationship between the dispensing nozzle 20 and the cleaning tank 40 is performed by a position adjustment mechanism (not shown) similar to the position adjustment mechanism 52 of the second embodiment.

  Therefore, an acoustic flow that flows clockwise in the circumferential direction on the inner peripheral surface is generated inside the dispensing nozzle 20. For this reason, since the flow rate of the cleaning liquid W1 on the inner peripheral surface of the dispensing nozzle 20 is increased, the sample such as the specimen 6a attached to the inner peripheral surface of the dispensing nozzle 20 is easily peeled off. The peripheral surface is preferably cleaned.

(Modification)
Below, the modification of this embodiment is demonstrated with reference to FIG.
The cleaning mechanism 710 (711) of this modification includes an ultrasonic irradiation mechanism 341 for the cleaning tank 40, and is configured to irradiate ultrasonic waves that generate the same acoustic flow as described above.
In this modification, the dispensing nozzle 20 and the cleaning tank 40 are positioned and supported, and the ultrasonic wave is focused on the focusing position P10 on the central axis of the cleaning tank 40. Even with such a configuration, since an acoustic flow is generated along the inner peripheral surface of the dispensing nozzle 20, the inner peripheral surface of the dispensing nozzle 20 can be cleaned appropriately.

(Seventh embodiment)
Next, a cleaning mechanism according to a seventh embodiment of the present invention will be described with reference to FIG. The present embodiment is different from the above-described embodiments in that a cleaning mechanism 710 (711) is provided instead of the cleaning mechanism of each of the above-described embodiments.
The cleaning mechanism 710 (711) includes transducer arrays 641 to 645 arranged side by side in the central axis direction of the cleaning tank 40 as in the transducer arrays 41 to 46 of the first embodiment. Each transducer array is disposed so as to be inclined toward the tip 20a of the dispensing nozzle 20 when the dispensing nozzle 20 is inserted into the cleaning tank 40.

  Further, the inclination direction of the transducer arrays 641 to 645 is, as shown in FIG. 17, the upper limit of the angle irradiated perpendicularly to the outer peripheral surface of the dispensing nozzle 20, and the inclination is not inclined toward the base end side beyond that. Is preferred.

  Furthermore, in this embodiment, it drives so that an ultrasonic wave may be irradiated by switching to the transducer arrays 641 to 645 sequentially along the central axis of the cleaning tank 40. For example, the ultrasonic array 641 is driven to irradiate ultrasonic waves toward the focusing position P61 (first irradiation step S601, not shown). Thereafter, the transducer array 642 is driven with a delay of a predetermined time, and ultrasonic waves are irradiated toward the focusing position P62 (second irradiation step S602, not shown). Similarly, the ultrasonic waves are successively focused and irradiated from the focusing positions P63 to P65.

  In the converging positions P61 to P65, cavitation occurs in the cleaning liquid W1 at any position. Therefore, a shock wave is sequentially generated toward the tip 20 a side with respect to the inner peripheral surface of the dispensing nozzle 20.

  FIG. 18 is an explanatory diagram for explaining the flow rate of the cleaning liquid W1 in the dispensing nozzle 20. The fluid such as the cleaning liquid W <b> 1 flowing inside the cylindrical dispensing nozzle 20 becomes a laminar flow due to friction with the inner peripheral surface of the dispensing nozzle 20. Therefore, the flow rate of the cleaning liquid W1 is a parabolic flow rate distribution as shown in FIG. 18 particularly on the tip 20a side. Therefore, the flow velocity is fastest on the central axis of the dispensing nozzle 20, and the flow velocity is slowest on the inner peripheral surface of the dispensing nozzle 20.

  Here, for example, when an ultrasonic wave focused on the focusing position P81 is irradiated, cavitation occurs inside the dispensing nozzle 20, and this shock wave propagates in the radial direction of the dispensing nozzle 20 and is near the focusing position P81. The cleaning liquid W1 locally changes from laminar flow to turbulent flow. Accordingly, since the cleaning liquid W1 is agitated on the inner peripheral surface of the dispensing nozzle 20, dirt and the like attached to the inner peripheral surface of the dispensing nozzle 20 is peeled off and pushed away by the action of the shock wave and the agitation caused by cavitation.

Further, since the transducer arrays 641 to 645 are arranged to be inclined, the cleaning liquid W1 is pressed toward the tip 20a side of the dispensing nozzle 20 to the sound pressure of the ultrasonic waves irradiated by the transducer arrays 641 to 654. It has a directional component. Accordingly, inside the dispensing nozzle 20, the cleaning liquid W1 is intermittently pressed against the tip 20a by ultrasonic waves.
In this way, the flow rate of the cleaning liquid W1 is increased with respect to the inner peripheral surface of the dispensing nozzle and is moved to the tip 20a side of the dispensing nozzle 20, so in this embodiment as well as the above-described embodiments, There is an effect that the inner peripheral surface can be suitably cleaned.

As mentioned above, although embodiment of this invention was explained in full detail with reference to drawings, the concrete structure is not restricted to this embodiment, The design change etc. of the range which does not deviate from the summary of this invention are included.
For example, instead of a configuration in which a plurality of transducer arrays 41 and the like are arranged in the central axis direction of the cleaning tank 40 and the like, an ultrasonic irradiation mechanism 841 is arranged extending in the central axis direction of the cleaning tank 40 as shown in FIG. A configuration can be employed.

  In the above-described configuration, a configuration in which an acoustic lens and a dynamic focus mechanism are combined and cavitation or acoustic flow is appropriately combined may be employed.

  Further, by forming the acoustic lens into a cylindrical lens shape in the ultrasonic irradiation mechanism 841 extending in the axial direction of the cleaning tank 40, it is possible to focus the ultrasonic wave on a line parallel to the generatrix direction of the cylindrical lens. The ultrasonic cleaning can be simultaneously performed on a region extending and extending in the direction of the central axis on the inner peripheral surface of the dispensing nozzle 20 with respect to the inner peripheral surface of 20.

It is a top view which shows schematic structure of the analyzer of embodiment of this invention. It is a block diagram which shows schematic structure of the analyzer. It is a block diagram which shows a part of structure in the analyzer. It is side surface sectional drawing which shows the structure of the washing | cleaning mechanism of this embodiment. It is a plane sectional view of the washing mechanism. It is a flowchart for demonstrating a part of operation | movement in the analyzer. (A) (B) is a plane sectional view showing operation of a washing mechanism in the analyzer. It is side surface sectional drawing which shows the washing | cleaning mechanism of 2nd embodiment of this invention. It is side surface sectional drawing which shows the washing | cleaning mechanism of 2nd embodiment of this invention. It is side surface sectional drawing which shows the washing | cleaning mechanism of 4th embodiment of this invention. (A) (B) is a plane sectional view showing operation of the washing mechanism. . It is a plane sectional view showing the cleaning mechanism of a fifth embodiment of the present invention. It is a plane sectional view showing a modification of the cleaning mechanism. (A), (B) and (C) are plan sectional views showing a cleaning mechanism of a sixth embodiment of the present invention. It is a plane sectional view showing a modification of the cleaning mechanism. It is side surface sectional drawing which shows the washing | cleaning mechanism of 7th embodiment of this invention. It is side surface sectional drawing which shows the other structure of the same washing | cleaning mechanism. It is a figure for demonstrating the operation | movement at the time of use of the same washing | cleaning mechanism. It is side surface sectional drawing which shows the example of the other structure of the ultrasonic irradiation mechanism concerning the washing | cleaning mechanism of this invention.

Explanation of symbols

1 Analyzer 3 Sample container transfer mechanism (conveyance mechanism)
5 Cuvette 8 Sample dispensing mechanism (dispensing mechanism)
9 Reagent dispensing mechanism (second dispensing mechanism)
10, 11, 110, 111, 210, 211, 310, 311, 410, 411, 510, 511, 610, 611, 710, 711 Cleaning mechanism 13 Analysis optical system (detection mechanism)
20 Dispensing nozzle 20a Tip 24 Discharge mechanism 24a Pressure adjustment mechanism 26 Rotating shaft 31 Suction / discharge control unit 40, 240 Cleaning tank 41-46, 641-645, 741-745 Vibrator array (ultrasonic irradiation mechanism)
52, 252 Position adjustment mechanism 341 Acoustic lens unit (ultrasonic irradiation mechanism)
541, 841 Ultrasonic irradiation mechanism W1 Cleaning liquid (liquid)
S3 Immersion process S7 Ultrasonic irradiation process S91 Rinse process S601 First irradiation process S602 Second irradiation process

Claims (15)

A cleaning mechanism for cleaning a substantially cylindrical dispensing nozzle having a gap inside,
A washing tank having at least one opening into which the dispensing nozzle can be inserted and capable of storing a liquid therein;
A cleaning mechanism comprising: an ultrasonic irradiation mechanism that irradiates an ultrasonic wave focused toward the gap of the dispensing nozzle set in the cleaning tank.   The cleaning mechanism according to claim 1, further comprising a liquid feeding mechanism that circulates a liquid in the gap inside the dispensing nozzle. The ultrasonic irradiation mechanism is
The cleaning mechanism according to claim 1, further comprising a transducer array including ultrasonic transducers fixed to the cleaning tank and arranged side by side in the circumferential direction of the dispensing nozzle.   The cleaning mechanism according to claim 3, wherein a plurality of the transducer arrays are arranged side by side in the axial direction of the dispensing nozzle set in the cleaning tank.   The cleaning mechanism according to claim 1, wherein the ultrasonic irradiation mechanism includes an acoustic lens unit that is fixed to the cleaning tank and focuses the ultrasonic wave toward the gap of the dispensing nozzle. The ultrasonic irradiation mechanism is
The cleaning mechanism according to any one of claims 1 to 5, further comprising a dynamic focus mechanism that changes a focusing position of the ultrasonic wave in a circumferential direction or an axial direction with respect to the dispensing nozzle.   The cleaning mechanism according to any one of claims 1 to 6, wherein the ultrasonic irradiation mechanism causes cavitation in the gap inside the dispensing nozzle.   The cleaning mechanism according to claim 1, wherein the ultrasonic irradiation mechanism generates an acoustic flow in a circumferential direction of the dispensing nozzle in the gap inside the dispensing nozzle.   The position adjustment mechanism which aligns the relative position of the focal position of the ultrasonic wave and the inner peripheral surface of the dispensing nozzle so that the focal position of the ultrasonic wave is along the inner peripheral surface of the dispensing nozzle. The cleaning mechanism according to any one of 1 to 8.   10. The ultrasonic irradiation mechanism according to claim 1, wherein the ultrasonic irradiation mechanism irradiates an ultrasonic wave having a predetermined angle in a flow direction of the liquid inside the dispensing nozzle set in the cleaning tank. The cleaning mechanism described.   The cleaning mechanism according to any one of claims 1 to 10, wherein the ultrasonic irradiation mechanism moves a focus position of the ultrasonic wave along a flow direction of the liquid. An immersion step of immersing a dispensing nozzle having a void inside in a liquid;
Ultrasonic irradiation step of irradiating ultrasonic waves that interfere so as to reinforce at least inside the dispensing nozzle from the outside to the inside of the dispensing nozzle from two or more positions outside the dispensing nozzle;
A rinsing step of exchanging the liquid inside the dispensing nozzle following the ultrasonic irradiation step. The ultrasonic irradiation step includes
A first irradiation step of irradiating the ultrasonic wave ahead of the proximal end side of the dispensing nozzle;
A second irradiation step of irradiating the ultrasonic wave to the dispensing nozzle at a distal end side by a predetermined distance from the ultrasonic irradiation portion in the first irradiation step after being delayed by a predetermined time from the first irradiation step; The washing | cleaning method of Claim 12 which has these. A cleaning mechanism according to claims 1 to 11,
A dispensing mechanism having the dispensing nozzle and capable of sucking, discharging, and holding a predetermined amount of sample in the gap;
A cuvette in which the sample is dispensed by the dispensing mechanism in a tank shape with one end open;
A transport mechanism for sequentially transporting the plurality of cuvettes;
An analyzer comprising: a detection mechanism for detecting a reaction state between the specimen and the second liquid in the cuvette.   The analyzer according to claim 14, wherein the detection mechanism includes a spectrophotometer that performs a colorimetric analysis method for a biochemical reaction.

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