JP2010131524A - Method and apparatus for stream cleaning - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for stream cleaning which efficiently remove dust, etc. adhered to the surface of a substrate and prevent the dust, etc. from adhering again to the surface of the substrate after cleaning. <P>SOLUTION: The stream cleaning type cleaning method comprises causing a cleaning solution L laterally in the form of a laminar flow within a cleaning vessel 2 and immersing a target article W in the cleaning solution L for cleaning. The flow rate of a part of the cleaning solution L flowing along the bottom surface and both side surfaces within the cleaning vessel 2 is increased with respect to that of the bulk of the cleaning solution L flowing within the cleaning vessel 2. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a flowing water cleaning method and flowing water suitably used for cleaning, for example, a substrate for a magnetic recording medium, a component used in a manufacturing apparatus for a magnetic recording medium, a shield plate of a sputtering apparatus, etc. The present invention relates to a type cleaning device.

  For example, as a substrate for a magnetic recording medium used for a hard disk drive or the like, a disk-shaped aluminum substrate or a glass substrate having a central hole is used. Since such a magnetic recording medium substrate is manufactured through various surface treatment processes such as polishing on the surface, a substrate cleaning process for removing dust and the like adhering to the surface of the substrate after the surface treatment process and the like. Has been done.

  In addition to the demand for higher recording density of magnetic recording media, high flatness of magnetic recording media is required, while other than removing dust and the like adhering to the surface of the magnetic recording medium substrate, There is a need for advanced cleaning techniques for removing dust and the like adhering to parts used in magnetic recording medium manufacturing apparatuses and shield plates of sputtering apparatuses.

  As such a magnetic recording medium substrate cleaning apparatus, for example, a magnetic disk substrate or the like is used as a work, and after the surface treatment such as polishing is performed on the surface, foreign matters adhering to the work surface are removed. In order to do this, an apparatus has been proposed that uses a plurality of cleaning tanks to wash a workpiece using a liquid in each cleaning tank while sequentially transporting a workpiece to a plurality of cleaning tanks by a conveyor (see, for example, Patent Document 1). ).

  However, in the cleaning apparatus described in Patent Document 1, scrub cleaning is performed using a rotating brush while providing a plurality of rotating brushes and showers in the cleaning tank and supplying cleaning liquid to each of the substrates. However, since the rotating brush is in contact with the surface of the substrate, there is a possibility that scratch marks may be generated on the surface of the substrate.

  For this reason, as a cleaning method that does not use a rotating brush, for example, a cleaning liquid is supplied from the bottom of the cleaning tank, and the holder holding the substrate is immersed in the cleaning liquid in the cleaning tank while overflowing the cleaning liquid from the top of the cleaning tank. A method of cleaning the substrate has been proposed.

  However, in the cleaning method in which the cleaning liquid flows from the bottom to the top of the cleaning tank, contaminants including dust that has peeled off the surface of the substrate are not discharged together with the cleaning liquid from the upper part of the cleaning tank, but a part of the contaminant stays in the cleaning tank. In some cases, the cleaning liquid stagnates in the cleaning tank. In this case, when the holder is pulled up from the cleaning tank, contaminants staying in the cleaning liquid may reattach to the surface of the substrate.

  On the other hand, there has been proposed a flowing water type cleaning apparatus that cleans a substrate by immersing a holder holding the substrate in the cleaning liquid in the cleaning tank while flowing the cleaning liquid in a laminar flow in the horizontal direction in the cleaning tank. (For example, see Patent Document 2).

In such a cleaning method in which the cleaning liquid flows in a laminar flow in the lateral direction, the cleaning liquid containing the contaminant can be quickly discharged out of the immersion tank, so that the contaminant reattaches to the surface of the substrate. Can be prevented.
JP 2001-96245 A JP-A-9-206708

  By the way, in the flowing water type cleaning apparatus described in Patent Document 2 described above, a porous rectifier is used in order to prevent contaminants separated from the object to be cleaned from adhering to the object to be cleaned due to the turbulent flow of the cleaning liquid. A plate is installed in the flow path, and the flow of the cleaning liquid is adjusted so that the flow of the cleaning liquid becomes a uniform flow (laminar flow) without disturbance by passing the current plate.

  However, in such a flowing water type cleaning apparatus, the cleaning liquid flowing in the cleaning tank becomes a laminar flow when the object to be cleaned is not immersed in the cleaning tank. On the other hand, when the object to be cleaned is immersed in the cleaning tank, the cleaning liquid flowing in the cleaning tank is disturbed by the object to be cleaned, resulting in a turbulent flow, and the cleaning ability for the object to be cleaned is reduced by this turbulent flow. was there.

  Therefore, the present invention has been proposed in view of such conventional circumstances, and efficiently removes dust and the like adhering to the surface of the object to be cleaned, and these are re-applied to the surface of the object to be cleaned after cleaning. An object is to provide a flowing water cleaning method and a flowing water cleaning device that prevent adhesion.

  As a result of diligent studies to solve the above problems, the present inventors flowed the cleaning liquid in a laminar flow in a laminar flow state in the cleaning tank, and when the object to be cleaned is immersed in this cleaning liquid for cleaning, A turbulent flow is generated by the object to be cleaned immersed in the cleaning tank, and this turbulent flow causes contaminants such as dust and foreign matter separated from the surface of the object to be cleaned to stay on the bottom surface and both sides of the cleaning tank. It has been clarified that the cleaning ability for the object to be cleaned decreases due to the staying contaminants on the object to be reattached.

  Further, the flow of the cleaning liquid flowing along the bottom surface and both side surfaces of the cleaning tank becomes slow due to resistance with these surfaces. In this case, it is considered that the contaminants described above are likely to stay in this portion, and the staying contaminants are wound up by turbulent flow and reattached to the object to be cleaned.

  Therefore, the present inventor has made the above-mentioned contaminants faster by accelerating the partial flow of the cleaning liquid flowing along the bottom surface and both side surfaces in the cleaning tank with respect to the entire flow of the cleaning liquid flowing in the cleaning tank. Was quickly discharged from the immersion tank, and it was found that the contaminants could be wound up by turbulent flow and reattached to the object to be cleaned, and the present invention was completed.

That is, the present invention provides the following means.
(1) A flowing water cleaning method in which a cleaning liquid is caused to flow laterally in a laminar flow in a cleaning tank, and an object to be cleaned is immersed in the cleaning liquid for cleaning.
A flowing water type cleaning method characterized by accelerating a partial flow of the cleaning liquid flowing along the bottom surface and both side surfaces in the cleaning tank with respect to the entire flow of the cleaning liquid flowing in the cleaning tank.
(2) When cleaning the substrate held by the holder as the object to be cleaned, the holder is disposed in the immersion tank so that the main surface of the substrate is parallel to the direction in which the cleaning liquid flows. The running water type washing | cleaning method as described in the preceding clause (1) characterized by these.
(3) The flowing water cleaning method according to (1) or (2) above, wherein cleaning is performed on a plurality of substrates held side by side in parallel to the holder.
(4) The flowing water cleaning method according to any one of (1) to (3), wherein a magnetic recording medium substrate is cleaned as the substrate.
(5) A flowing water type cleaning apparatus for flowing a cleaning liquid in a laminar flow in a laminar flow in a cleaning tank and immersing an object to be cleaned in the cleaning liquid,
On the side of supplying the cleaning liquid in the cleaning layer, a rectifying plate for adjusting the flow of the cleaning liquid flowing in the cleaning tank is disposed,
The rectifying plate is provided with a plurality of holes for supplying the cleaning liquid side by side in the width direction and the height direction, and at least one row of holes arranged along the bottom surface and both side surfaces in the cleaning tank. Is a flowing water type cleaning device characterized in that the diameter is relatively larger than the other holes.
(6) The rectifying plate is disposed so as to partition a space on the side where the cleaning liquid is supplied in the cleaning layer and a space on the side where the object to be cleaned is immersed. The flowing water type washing apparatus according to the preceding item (5).
(7) On the side of discharging the cleaning liquid in the cleaning layer, a rectifying plate having a hole having a shape matching the rectifying plate on the supply side is disposed to face the rectifying plate on the supply side. The flowing water type washing apparatus according to the preceding item (5) or (6), which is characterized.
(8) The discharge-side rectifying plate is disposed so as to partition between a space on the side where the cleaning liquid in the cleaning layer is discharged and a space on which the object to be cleaned is immersed. The flowing water type washing apparatus according to the preceding item (7), characterized in that
(9) The object to be cleaned is a substrate held by a holder, and the holder is arranged in the immersion tank so that a main surface of the substrate is parallel to a direction in which the cleaning liquid flows. The flowing water type washing device according to any one of (5) to (8) above.
(10) The flowing water cleaning apparatus according to any one of (5) to (9), wherein a plurality of the substrates are held in parallel in the holder in a state parallel to each other.
(11) The flowing water cleaning apparatus according to any one of (5) to (10), wherein the substrate is a magnetic recording medium substrate.

  As described above, according to the present invention, contaminants such as dust and foreign matter adhering to the surface of the object to be cleaned are efficiently removed, and these contaminants are reattached to the surface of the object to be cleaned after cleaning. It is possible to provide a flowing water type cleaning method and a flowing water type cleaning apparatus with high cleaning ability.

  Hereinafter, a flowing water cleaning method and a flowing water cleaning apparatus to which the present invention is applied will be described in detail with reference to the drawings. In the drawings used in the following description, in order to make the features easy to understand, the portions that become the features may be schematically shown for convenience, and the dimensional ratios of the portions are not always the same as the actual ones.

  In the present embodiment, for example, a substrate (object to be cleaned) W for a magnetic recording medium mounted on a hard disk drive is cleaned using a flowing water type cleaning apparatus 1 to which the present invention is applied as shown in FIGS. A case will be described as an example.

  As the cleaning liquid L for cleaning the substrate W, pure water is basically used, but other than that, treated water subjected to chemical treatment or the like can be used. Specifically, as the cleaning liquid L, for example, in addition to pure water or ultrapure water, it is diluted to a low concentration with an organic solvent such as isopropyl alcohol, a chemical detergent containing a surfactant, anode water, cathode water, or pure water. An acidic solution, an alkaline solution, ozone water, hydrogen water, etc. can be mentioned. These cleaning liquids L can be appropriately selected and used according to the substrate (object to be cleaned) W to be cleaned.

  As shown in FIGS. 1 and 2, the flowing water type cleaning apparatus 1 to which the present invention is applied includes a cleaning tank 2 for cleaning the substrate W by immersing the holder 50 holding the substrate W in the cleaning liquid L.

  The holder 50 holds a plurality of disk-shaped substrates W formed with a center hole in parallel with each other. In addition, each substrate W is supported by a pair of support plates 51 a and 51 b provided on the holder 50 at outer peripheral portions on both sides across a vertical center line passing through the center hole. The pair of support plates 51a and 51b are provided with V-shaped grooves (not shown) with which the outer peripheral portions of the respective substrates W are engaged.

  Each substrate W is supported by the pair of support plates 51a and 51b, and is held by the holder 50 in a vertically placed state (a state where the main surface of the substrate W is parallel to the vertical direction). And this holder 50 is arrange | positioned on the bottom face of the washing tank 2 so that the main surface of each board | substrate W may become parallel to the direction through which the washing | cleaning liquid L flows. In this example, about 50 substrates W having a diameter of 2.5 inches are arranged in a row at intervals of about 5 mm and held in the holder 50.

  The cleaning tank 2 has a rectangular bottom wall 2a, four side walls 2b, 2c, 2d, and 2e that rise from the periphery of the bottom wall 2a, and an opening 2f on the upper surface that faces the bottom wall 2a. Is formed in a substantially rectangular parallelepiped shape.

  The bottom wall 2 a of the cleaning tank 2 is provided with a supply pipe 3 that supplies the cleaning liquid L and a discharge port 4 that discharges the cleaning liquid L. Among these, the supply pipe | tube 3 is provided in multiple numbers along the vicinity of the side wall 2b of the upstream of the longitudinal direction where the washing | cleaning liquid L flows. Further, the supply pipe 3 can generate a laminar flow more stably by supplying the cleaning liquid L with the supply port at the tip thereof toward the side wall 2b. On the other hand, a plurality of discharge ports 4 are provided side by side along the vicinity of the side wall 2d on the downstream side in the longitudinal direction in which the cleaning liquid L flows.

  Further, on the upstream side of the cleaning tank 2, a rectifying plate 5 for adjusting the flow of the cleaning liquid L flowing in the cleaning tank 2 is provided with a storage space S1 in which the cleaning liquid L supplied from the supply port 3 is stored, and It is provided so as to partition the immersion space S2 in which the holder 50 is immersed. On the other hand, on the downstream side of the cleaning tank 2, a rectifying plate 6 is provided so as to partition the immersion space S2 and the discharge space S3 from which the cleaning liquid L is discharged from the discharge port 4.

  Among these, the supply-side rectifying plate 5 rectifies the flow of the cleaning liquid L flowing from the storage space S1 toward the immersion space S2, and the cleaning liquid L in the immersion space S2 is laterally (horizontal) in a laminar state. It is for flowing, and is composed of a perforated plate in which a plurality of holes 5a and 5b for supplying the cleaning liquid L are provided side by side in the width direction and the height direction.

  Of the plurality of holes 5a and 5b provided in the rectifying plate 5, at least one or more rows of holes 5b arranged along the bottom wall 2a and the side walls 2c and 2e of the cleaning tank 2 have other holes. The diameter is relatively larger than the part 5a.

  Specifically, in this flowing water type cleaning apparatus 1, as shown in FIG. 3, the diameter of the hole 5b arranged along the bottom wall 2a and the side walls 2c and 2e in the cleaning tank 2 is larger than that of the other holes 5a. As a result, as shown in FIGS. 1 and 2, a part of the cleaning liquid L flowing along the bottom surface and both side surfaces in the cleaning tank 2 with respect to the entire flow F1 of the cleaning liquid L flowing in the cleaning tank 2. The flow F2 (flow velocity) is adjusted to be faster.

  In addition, a laminar flow means the state in which the flow line of a flow flows orderly. In this example, the laminar cleaning liquid L is flowed in the lateral direction (horizontal direction) at a constant flow rate (for example, about 10 mm / sec). On the other hand, the flow rate of the cleaning liquid L flowing along the bottom surface and both side surfaces in the cleaning tank 2 is preferably 2 to 4 times (for example, 20 times) the entire flow of the cleaning liquid L flowing in the cleaning tank 2. About 40 mm / sec).

  On the other hand, the discharge-side rectifying plate 6 is for stabilizing the flow of the cleaning liquid L flowing in the laminar flow in the cleaning tank 2, and the holes 6a and 6b for discharging the cleaning liquid L are formed in the width direction. It consists of a plurality of perforated plates provided side by side in the height direction.

  Further, the discharge-side rectifying plate 6 has holes 6a and 6b having a shape coincident with the supply-side rectifying plate 5 shown in FIG. 3, and is disposed to face the supply-side rectifying plate 5. Yes. That is, among the plurality of holes 6a and 6b provided in the discharge-side rectifying plate 6, at least one or more rows of holes 6b arranged along the bottom wall 2a and the side walls 2c and 2e of the cleaning tank 2 The diameter is relatively larger than the other holes 6a.

  In this example, when a magnetic recording medium substrate having a size of about 10 cm is washed as the substrate W, a plurality of holes 5a, 5b, 6a, 6b provided in the rectifying plates 5, 6 are used. Among them, the diameter of the normal holes 5a, 6a is, for example, φ0.5 cm, whereas the diameter of the holes 5b, 6b arranged along the bottom wall 2a and the side walls 2d, 2e in the cleaning tank 2 is, for example, φ1 cm. It is. The center-to-center distances in the width direction and the height direction of the holes 5a, 5b, 6a, 6b are each 2 cm, for example.

  On the other hand, for example, when cleaning a shield plate of a sputtering apparatus having a size of about 30 cm to 1 m, a normal hole among the plurality of holes 5a, 5b, 6a, 6b provided in the rectifying plates 5, 6 is used. Whereas the diameter of the portions 5a and 6a is, for example, φ5 cm, the diameter of the holes 5b and 6b arranged along the bottom wall 2a and the side walls 2d and 2e in the cleaning tank 2 is, for example, φ10 cm. The center-to-center distances in the width direction and the height direction of the holes 5a, 5b, 6a, 6b are each 20 cm, for example.

  The height of the discharge-side rectifying plate 6 is set lower than the four side walls 2b, 2c, 2d, and 2e so that a part of the cleaning liquid L overflows from above.

  Further, in this flowing water type cleaning apparatus 1, since the cleaning liquid L flowing in the cleaning tank 2 is reused cyclically, a reservoir tank 7 storing the cleaning liquid L discharged from the discharge port 4 and a reservoir tank 7 are provided. A pump 8 for pumping the stored cleaning liquid L to the supply port 3 and a filter 9 for purifying the cleaning liquid L pumped by the pump 8 are provided.

  In the flowing water cleaning method to which the present invention is applied, the plurality of substrates W held by the holder 50 are cleaned using the flowing water cleaning apparatus 1 having the above structure. Specifically, in the flowing water cleaning method using the flowing water cleaning device 1, the cleaning liquid L in the immersion space S2 is flowed in the horizontal direction in a laminar flow in the immersion space S2 of the cleaning tank 2, while the cleaning liquid L in the immersion space S2 is flowed in the horizontal direction. The holder 50 holding the plurality of substrates W is immersed in the substrate.

  At this time, in the cleaning tank 2, the main surface of each substrate W held by the holder 50 is parallel to the direction in which the cleaning liquid L flows, and the laminar cleaning liquid L flows between these substrates W. Become. As a result, the surface of each substrate W is cleaned with the cleaning liquid L, and contaminants such as dust and foreign matter adhering to the surface of each substrate W are removed.

  Moreover, in this flowing water type | formula washing | cleaning apparatus 1, with respect to the whole flow F1 of the washing | cleaning liquid L which flows through the inside of the washing tank 2, the partial flow F2 of the washing | cleaning liquid L which flows along the bottom face and both side surfaces in this washing tank 2 is. It's getting faster. Thereby, the contaminants mentioned above can be quickly discharged to the outside of the cleaning tank 2 without staying in the cleaning tank 2. Therefore, according to this invention, it can reduce that the contaminant mentioned above is wound up by the turbulent flow, and it adheres to the board | substrate W again.

  As described above, according to the present invention, it is possible to efficiently remove dust and the like adhering to the surface of the substrate, and to perform advanced substrate cleaning that prevents them from reattaching to the surface of the substrate after cleaning. is there.

  In addition, this invention is not necessarily limited to the thing of the said embodiment, A various change can be added in the range which does not deviate from the meaning of this invention.

  For example, the rectifying plates 5 and 6 shown in FIG. 3 have hole portions 5b and 6b having diameters larger than those of the normal hole portions 5a and 6a, respectively, from the bottom surface and both side surfaces in the cleaning tank 2, respectively. The number of rows in which the diameters of the holes 5b and 6b are arranged is at least one, and the upper limit of the number of rows 5b, 6b is set to the above-described holder 50. The number of portions of the flow whose flow rate is increased by the cleaning liquid L supplied from the hole 3b when passing on the bottom surface of the substrate does not pass directly between the substrates W held by the holder 50. Is preferred.

  That is, the laminar flow cleaning liquid L supplied from the normal hole 3a flows between the substrates W held by the holder 50, and the cleaning liquid L with an increased flow velocity flows outside thereof. It is preferable to do. In the present invention, based on such reasons, the arrangement, number, diameter, and the like of the hole 3b whose diameter with respect to the normal hole 3a is enlarged are set.

  In addition, in this flowing water type | formula washing | cleaning apparatus 1, if it is the structure which can wash | clean the washing | cleaning liquid L in the state of a laminar flow, in addition to the current plate 5 mentioned above, as a laminar flow generation means, for example, a porous plate It is also possible to use a buffer material having water resistance such as a nonwoven fabric or the like, and to adjust the flow of the cleaning liquid L flowing in the cleaning tank 2 as appropriate by combining them.

  Furthermore, in the present invention, in order to enhance the cleaning ability for the substrate W, it is also possible to apply ultrasonic vibration (for example, about 500 W at 200 kHz) to the cleaning liquid L in the immersion space S2.

  Further, the holder 50 is configured to support the outer peripheral portion of each substrate W at two points by the pair of support plates 51a and 51b. However, the configuration is not limited to this configuration, and the outer peripheral portion supporting each substrate W. The position, the number of points, and the like can be appropriately changed and implemented. For example, the outer peripheral portion of each substrate W can be supported at three points or supported at four points.

  Further, the members that support the outer peripheral portion of each substrate W are not limited to the support plates 51a and 51b as long as they do not disturb the flow of the cleaning liquid L flowing in the cleaning tank 2. The shape and the like can be changed as appropriate.

  Further, the present invention, for the above-described magnetic recording medium substrate W, apart from the step of removing dust or foreign matter adhering to the surface after the surface treatment step or the like, for example, after forming a magnetic film or the like, The present invention can also be applied to cleaning of a magnetic recording medium before applying a lubricant.

  Furthermore, the present invention is not limited to the case of cleaning the substrate W for a magnetic recording medium described above, but can be suitably used for cleaning a flat object to be cleaned. The object to be cleaned is not particularly limited as long as it can be cleaned using the.

  Hereinafter, the effects of the present invention will be made clearer by examples. In addition, this invention is not limited to a following example, In the range which does not change the summary, it can change suitably and can implement.

Example 1
In Example 1, the substrate W was actually cleaned using the flowing water cleaning apparatus 1 shown in FIGS. Specifically, a cleaning tank 2 made of SUS304 having a length of 200 cm, a width of 100 cm, and a depth of 200 cm is used, and a width of 100 cm so as to partition the storage space S1 and the immersion space S2 on the upstream side of the cleaning tank 2, A rectifying plate 5 having a height of 200 cm was disposed. The supply-side rectifying plate 5 is provided with a plurality of holes 5a and 5b arranged in four rows in the width direction and nine rows in the height direction. Of these, the diameter of the normal hole 5a is φ5 cm. On the other hand, the diameter of the holes 5b in one row arranged along the bottom wall 2a and the side walls 2d and 2e in the cleaning tank 2 was set to φ10 cm. The center-to-center distances in the width direction and the height direction of the holes 5a and 5b are 20 cm, respectively. On the other hand, on the downstream side of the cleaning tank 2, a rectifying plate 6 having holes 6a and 6b having a shape corresponding to the rectifying plate 5 on the supply side is arranged so as to partition the immersion space S2 and the discharge space S3. . An ultrasonic transmitter having a frequency of 38 kHz and an output of 1200 W was disposed outside the bottom surface of the cleaning tank 2.

  In this cleaning tank 2, 50 test pieces (disc-shaped substrate having an outer diameter of 50 mm and a thickness of 3 mm) W to which a powder of 1 to 50 microns adheres are prepared and cleaned. It was immersed in the cleaning liquid L flowing in the tank 2 and cleaned for 10 minutes.

  Note that pure water was used as the cleaning liquid L, and the water temperature was 45 ° C. ± 5 ° C. The average flow rate of the cleaning liquid L flowing in a laminar state in the cleaning tank 2 (the flow rate when the object to be cleaned is not immersed) was 3 m / min. As the filter 9, a 3 micron filter and a 1 micron filter were used in two stages, and the cleaning liquid L flowing in the cleaning tank 2 was reused cyclically.

  In Example 1, when the ratio of the powder remaining on the test piece W after the cleaning was evaluated, the average removal rate of the powder was about 99.8%.

(Comparative Example 1)
In Comparative Example 1, 50 test pieces W were formed in the same manner as in Example 1 except that the diameters of the holes 5a and 6a provided in the rectifying plates 5 and 6 on the supply side and the discharge side were all φ5 cm. Washing was performed. And when the ratio of the powder remaining on the test piece W after the cleaning was evaluated, the average removal rate of the powder was about 97.8%, and it was found that the cleaning ability was inferior to that in the case of Example 1. .

FIG. 1 is a plan view showing a configuration of a flowing water type cleaning apparatus to which the present invention is applied. FIG. 2 is a cross-sectional view showing a configuration of a flowing water type cleaning apparatus to which the present invention is applied. FIG. 3 is a plan view showing the configuration of the current plate.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Flowing-water-type washing apparatus 2 ... Cleaning tank 3 ... Supply port 4 ... Discharge port 5 ... Supply side baffle plate 5a ... Normal hole part 5b ... Hole through which passage was expanded 6 ... Discharge side baffle plate 6a ... Normal Hole 6b ... Hole with enlarged diameter 7 ... Reservoir tank 8 ... Pump 9 ... Filter

Claims (11)

A flowing water cleaning method in which a cleaning liquid is caused to flow laterally in a laminar flow in a cleaning tank, and an object to be cleaned is immersed in the cleaning liquid for cleaning.
A flowing water type cleaning method characterized by accelerating a partial flow of the cleaning liquid flowing along the bottom surface and both side surfaces in the cleaning tank with respect to the entire flow of the cleaning liquid flowing in the cleaning tank.   When cleaning the substrate held by the holder as the object to be cleaned, the holder is disposed in the immersion tank so that the main surface of the substrate is parallel to the direction in which the cleaning liquid flows. The flowing water type cleaning method according to claim 1.   The flowing water type cleaning method according to claim 1 or 2, wherein a plurality of substrates held side by side in parallel with the holder are cleaned.   The flowing water cleaning method according to claim 1, wherein a magnetic recording medium substrate is cleaned as the substrate. It is a flowing water type cleaning device for flowing a cleaning solution in a laminar flow in a laminar flow in a cleaning tank and immersing an object to be cleaned in this cleaning solution for cleaning.
On the side of supplying the cleaning liquid in the cleaning layer, a rectifying plate for adjusting the flow of the cleaning liquid flowing in the cleaning tank is disposed,
The rectifying plate is provided with a plurality of holes for supplying the cleaning liquid side by side in the width direction and the height direction, and at least one row of holes arranged along the bottom surface and both side surfaces in the cleaning tank. Is a flowing water type cleaning device characterized in that the diameter is relatively larger than the other holes.   The said baffle plate is arrange | positioned so that the space by the side to which the said washing | cleaning liquid in the said washing | cleaning layer may be supplied, and the space by which the said to-be-cleaned material is immersed may be partitioned off. The flowing water type cleaning device described in 1.   A rectifying plate having a hole having a shape that coincides with the rectifying plate on the supply side is disposed opposite to the rectifying plate on the supply side on the side of discharging the cleaning liquid in the cleaning layer. Item 7. The flowing water cleaning device according to Item 5 or 6.   The discharge-side rectifying plate is disposed so as to partition between a space on the cleaning layer where the cleaning liquid is discharged and a space on which the object to be cleaned is immersed. The flowing water type washing apparatus according to claim 7.   The object to be cleaned is a substrate held by a holder, and the holder is arranged in the immersion tank so that a main surface of the substrate is parallel to a direction in which the cleaning liquid flows. The flowing water type | mold washing apparatus as described in any one of 5-8.   The flowing water cleaning apparatus according to any one of claims 5 to 9, wherein a plurality of the substrates are held side by side in the holder in parallel with each other.   The flowing water type cleaning apparatus according to claim 5, wherein the substrate is a magnetic recording medium substrate.

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