JP2010077469A - Film-thickness-detecting device of vacuum vapor-deposition facility - Google Patents

Abstract

A detection head of a film thickness detector can be replaced quickly and accurately.
A vacuum deposition container 11 is provided with an introduction preliminary container 62 and a discharge preliminary container that are openable and closable via shutters 61 and 71, and a positioning pin and a power supply and measurement terminal are provided in a storage box containing a crystal resonator 31. And a measuring unit 23a having a positioning hole for fitting a positioning pin of the detection head 22 is provided in the detector support member 23 provided in the vacuum deposition container. And a detector introduction device 63 for carrying a new detection head 22 from the introduction preliminary container 62 to the measurement unit 23a, and a female connector for the detection head 22. An operating rod 51 having a male connector that can be connected to is provided.
[Selection] Figure 1

Description

  The present invention relates to a film thickness detection apparatus capable of replacing a detection head of a film thickness detector that measures the film thickness of a vapor deposition material deposited on a vapor deposition material in a vacuum vapor deposition facility.

  In a vacuum deposition container, a deposition facility that forms a thin film with a deposition material on the surface of a welding material such as a substrate uses a film thickness sensor to measure the film thickness formed on the surface of the welding material.

  This film thickness sensor uses, for example, a crystal resonator as a detection element. The principle of operation is that when an AC electric field is applied via electrodes provided on both sides of the crystal resonator, the crystal resonator resonates due to the piezoelectric effect. Utilizing the occurrence of vibration, the resonance frequency fluctuates to a lower frequency side when the deposition material deposited on the surface of the crystal unit increases. Since this fluctuation amount is proportional to the vapor deposition amount (film thickness) of the vapor deposition material, the film thickness formed on the vapor deposition material can be measured by measuring the change in the resonance frequency.

  In such a film thickness sensor, the resonance frequency decreases and the measurement error increases when the thickness of the vapor deposition material deposited on the crystal resonator increases. Need to be replaced.

  When replacing the film thickness sensor, for example, in the vapor deposition of organic EL materials, it is necessary to stop the vapor deposition operation, cool the vapor deposition container heated to about 300 ° C. to room temperature, reheat it and restart it. This is a factor that reduces productivity.

For this reason, for example, Patent Document 1 discloses that a plurality of monitor heads that can be opened and closed in the vapor deposition container and the atmosphere side and that can maintain a degree of vacuum are provided in the vapor deposition container, and a film thickness sensor head is provided in these monitor heads. A replaceable arrangement is disclosed.
Japanese Patent Laid-Open No. 61-64880 (FIG. 2)

  However, Patent Document 1 discloses that a plurality of monitor heads are provided in the vapor deposition container, but does not disclose a sensor head replacement mechanism that is installed at a fixed position with respect to the evaporation source. There is no detailed description of the attachment / detachment mechanism.

  An object of the present invention is to solve the above-mentioned problems and to provide a film thickness detection device for vacuum deposition equipment that can replace the detection head of the film thickness detector quickly and accurately.

  The invention according to claim 1 is a detection head exchange device for a film thickness detector in a vacuum deposition facility, wherein a vacuum deposition container is provided with a spare container that can be opened and closed via a shutter and can hold a vacuum state. Provided with a detection box having a storage box that accommodates the detection element facing the opening, a positioned portion provided in the storage box, and a terminal for feeding the detection element and measuring the film thickness, and vacuum deposition A detector support member is provided in the container to position the positioned portion of the detection head by the positioning portion and to be held by the measurement portion, and the detection head is taken in and out between the spare container and the detector support member. An operation member having a possible detector introducing / extracting device and a terminal connecting portion connectable to a terminal of the detecting head arranged in the measuring portion is provided.

  According to a second aspect of the present invention, in the configuration according to the first aspect, the preliminary container includes an introduction preliminary container for carrying a new detection head into the vacuum vapor deposition container, and a lead preliminary container for carrying out the used detection head from the vacuum vapor deposition container. The detector introducing / extracting device comprises a detector introducing device for carrying a new detection head from the introduction preliminary container to the standby position of the detector support member of the vacuum vapor deposition vessel, and a used detection head for detecting the vacuum vapor deposition vessel. A detector lead-out device that discharges from the standby position of the detector support member to the lead-out preliminary container, and enables the detection head to be transported between the standby position of the detector support member and the measuring unit by the operation member, The container is provided with a preheating heater for preheating a new detection head.

  According to a third aspect of the present invention, in the configuration according to the first aspect, the detector support member is provided with a rotation holding body that is rotatably supported and can hold the detection head in each of the plurality of holding portions on the circuit path, Provided on the rotating path of the rotating holder is a measuring unit for detecting the film thickness by mounting the operation member, and a loading / unloading unit for loading and unloading the detection head between the spare container and the rotating holder. A preheating unit for preheating the detection head by a preheating heater is provided between the carry-in / out unit and the measurement unit along the rotation direction.

  According to the first aspect of the present invention, the detection head is carried in between the preliminary chamber capable of maintaining the vacuum state and the measurement unit of the detector support member disposed in the vacuum deposition chamber by the detector introduction / extraction device, Since it is carried out, the detection head can be replaced in a short time, and the detection head can be accurately positioned on the measurement unit via the positioned portion on the positioning unit provided in the measurement unit, and the film thickness can be detected with high accuracy. be able to.

  According to the second aspect of the present invention, the introduction preliminary container and the discharge preliminary container are provided, and the detector introduction device and the detector lead-out device are provided. Can be sequentially carried in, and the replacement work time of the detection head can be shortened. In addition, in the introduction preliminary container, a new detection head preheated to the measurement temperature by the preheating heater can be carried into the measurement unit, so that the initial film thickness measurement by the new detection head is not affected by the temperature of the detection element. Can be performed with high accuracy.

  According to the third aspect of the present invention, since the detector support member is provided with the rotation holding body that holds the plurality of detection heads, the rotation holding body is rotated and the new detection head is carried from the preheating unit to the measurement unit. At the same time, the used detection head of the measuring unit can be taken out and replaced with a new detection head quickly. In addition, since the new detection head is preheated by the preheating unit, the initial film thickness measurement by the new detection head can be accurately performed without being influenced by the temperature of the detection element.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[Embodiment 1]
A first embodiment of a vacuum deposition facility having a film thickness detecting device according to the present invention will be described with reference to FIGS.

  As shown in FIGS. 1 and 2, a vacuum vapor deposition container 11 capable of maintaining a vacuum state is connected to a vacuum pump 13 connected to a vacuum pump 12 to make the inside of the vacuum vapor deposition container 11 a vacuum atmosphere, and to a front opening. The workpiece loading shutter 18A provided, the workpiece loading shutter 18B provided in the opening on the back, and the workpiece loading shutter 18A are opened, and the substrate (vapor deposition material) P before vapor deposition can be loaded from the opening on the front, and is in a vacuum state. A workpiece carry-in chamber 14B that can hold a vacuum state by opening the workpiece carry-out shutter 18B and carrying out a vapor-deposited substrate (deposition material) P from the opening on the back side. .

  A vapor deposition source 15 is disposed at the bottom of the vacuum vapor deposition container 11 to evaporate the vapor deposition material by heating with a heating device, and a work holding device 16 that holds the substrate P on the ceiling is installed opposite the vapor deposition source 15. Yes. Reference numeral 17 denotes a vapor deposition shutter which is interposed between the vapor deposition source 15 and the work holding device 16 and can pass and block the vapor deposition material on the substrate P.

  The film thickness detection device 21 is disposed in the vicinity of the side portion of the substrate P held by the workpiece holding device 16 and is suspended from the ceiling portion of the vacuum evaporation container 11 and detected as shown in FIGS. A detector support member 23 having a measurement unit 23a for holding the head 22, an operation member 24 that is detachably attached to the detection head 22 and that can transfer the detection head 22 between the standby position and the measurement unit 23a, and an operation member 24. A measurement operating device 29 to be operated, a measurement power supply 25 for supplying an operating power to the detection head 22, a film thickness measurement unit 26 for measuring a film thickness from the detection head 22, and a detection head replacement device 27 for replacing the detection head 22 It is equipped with.

  As shown in FIGS. 5 and 6, the detection head 22 is fitted into the bottom case 32 in a cylindrical container shape whose upper surface is opened and formed in a cylindrical container shape and a cylindrical container shape in which the lower surface is opened from above. A storage box 34 including an upper case 33 is provided, and a positioning step for storing the crystal resonator (detection element) 31 and a measurement surface (lower surface) 31 a of the crystal resonator 31 are provided in the storage recess 32 b of the bottom case 32. A measurement opening 32a is formed, and the outer periphery of the crystal unit 31 is pressed and fixed by an upper case 33 fitted into the storage recess 32b from above.

  The crystal unit 31 is disk-shaped, and one electrode 35A is provided on the inner peripheral side of the electrode surface (upper surface) 31b which is the counter-measurement surface, and the other electrode 35B is provided at a predetermined position on the outer peripheral side. A plurality (four in the figure) of positioning pins (positioned portions) 36 project from the lower surface of the bottom case 32. For introduction, which is a connecting portion for attaching a distal end portion of a head introduction tool 63a of a detector introduction device 63, which will be described later, and a distal end portion of a head extraction device 73a of a detector introduction device 73, to a predetermined position on the outer peripheral surface of the bottom case 32 The female screw hole 37A and the lead-out female screw hole 37B are formed 90 degrees apart.

  The upper surface case 33 has an upper surface portion 33a and a cylindrical portion 33b formed of a conductive material, and is provided so that a male connector 38A is penetrated through an insulating member at the center of the upper surface portion 33a and protrudes upward. ing. In the upper surface case 33, a plurality (two in the figure) of spring electrodes 39 that are connected to the core wire terminals (terminals) 38Aa of the male connector 38A and spread on the outer peripheral side of the bottom surface are provided. The electrode 31 is in pressure contact with one electrode 35A. The upper case 33 and the outer cylindrical terminal (terminal) 38Ab of the male connector 38A are electrically connected via a lead wire or the like, and the lower end portion of the cylindrical portion 33b is pressed against the other electrode 35B of the crystal resonator 31. Thus, the outer cylinder terminal 38Ab and the other electrode 35B of the crystal resonator 31 are electrically connected.

  The detector support member 23 is supported by a holding plate 42 that forms a measurement unit 23a via a plurality of support rods 41 suspended from the ceiling of the vacuum evaporation container 11, and the holding plate 42 supports the measurement unit 23a. A positioning hole (positioning portion) 43 into which the positioning pin 36 of the detection head 22 is fitted is formed around, and a measurement window 44 that overlaps the measurement opening 32 a of the detection head 22 is formed.

  The operation member 24 has a hollow operation rod 51 that is detachably disposed through the ceiling of the vacuum vapor deposition container 11, and a male connector 38 </ b> A is fitted to and detached from the distal end of the operation rod 51. Female connector (terminal connection portion) 38B, a cooling head 52 that cools the detection head 22 provided on the outer peripheral portion of the female connector 38B at the lower end of the operating rod 51, and a female type that is built in the hollow portion. Between the core terminal 38Ba and the outer tube terminal 38Bb of the connector 38B, the power supply / measurement cable 53 that connects the measurement power supply 25 and the film thickness measurement unit 26, and the refrigerant supply device 28 and the cooling head 52 that are housed in the hollow portion And a refrigerant supply / exhaust pipe 54 for supplying and discharging a cooling fluid (cooling oil and cooling gas). Further, on the outer surface of the ceiling portion of the vacuum evaporation container 11, a measurement operation device 29 for moving the operation rod 51 out and out is provided.

Note that a male connector (terminal connection portion) 38A may be provided at the distal end portion of the operation rod 51, and a female connector 38B may be provided at the detection head 22.
The detection head exchanging device 27 includes an airtight specification introduction shutter 61 provided in the vacuum vapor deposition container 11 at an opening facing the side of the measurement unit 23 a of the detector support member 23, and a detector support member 23. An airtight head lead-out shutter 71 provided at the opening facing the back of the measuring unit 23a so as to be openable and closable, and installed on the right side surface of the vacuum deposition container 11 in correspondence with the head introduction shutter 61 to maintain a vacuum state. A preliminary introduction container 62, a lead-out preliminary container 72 that is installed on the back surface of the vacuum vapor deposition container 11 in correspondence with the head lead-out shutter 71 and can hold the vacuum state, and waits for the detector support member 23 from within the introduction preliminary container 62. A detector introducing device (detector introducing / extracting device) 63 capable of carrying the detection head 22 into the position 23b and a detection position from the inside of the lead-out preliminary container 72 to the standby position 23b of the detector support member 23. Out possible detector deriving device de 22 and a (detector inlet and outlet device) 73.

  The introduction preliminary container 62 includes a vacuum port 64 connected to the vacuum pump 12, a preheating heater 65 for preheating the detection head 22 to a temperature approaching the measurement temperature (deposition temperature), and the detection head 22. An airtight head supply shutter 66 that can be carried in is provided. The lead-out preliminary container 72 is provided with a vacuum port (not shown) connected to the vacuum pump 12 and an airtight head discharge shutter 74 capable of carrying out the detection head 22.

  The detector introduction device 63 has a rod-shaped head introduction tool 63a having a male screw part (connecting part) 63b detachably attached to the female screw hole 37A of the detection head 22 at the tip part, and a male screw part 63b attached to the female screw hole 37A. An introduction operation drive unit 63c for rotating the head introduction tool 63a around the axis for detachment and for moving the detection head 22 out of the introduction preliminary container 62 to the standby position 23b of the detector support member 23; It has.

  The detector lead-out device 73 has a rod-like head lead-out tool 73a having a male screw part (connecting part) 73b detachably attached to the female screw hole 37B of the detection head 22 at the tip part, and a male screw part 73b attached to the female screw hole 37B. A derivation operation drive unit 73c that rotates the head lead-out tool 73a around the axis for detachment and moves the detection head 22 out of the standby position 23b of the detector support member 23 to carry it into the lead-out preliminary container 72. It has.

  In the above configuration, when the vapor deposition operation of the substrate P held by the work holding device 16 is completed, the vapor deposition shutter is closed, and then the work carry-out device (not shown) is used to open the work carry-out shutter 18B to deposit the vapor-deposited substrate P. It is carried out from the container 11 to the work carry-out chamber 14B. After closing the work carry-out shutter 18B, the work carry-in shutter 18A is then opened, and the substrate P before vapor deposition is carried into the vacuum vapor deposition container 11 from the work carry-in chamber 14A by a work carry-in device (not shown) and held by the work holding device 16. Then, the work carry-in shutter 18A is closed, the vapor deposition shutter 17 is opened, and the vapor deposition operation is resumed.

  When a large amount of vapor deposition material is deposited on the measurement surface of the crystal unit 31 by the film thickness measurement unit 26 and the resonance frequency of the crystal unit 31 of the detection head 22 decreases, the measurement error of the film thickness increases. The detection head 22 is exchanged by the head exchange device 27.

  1. In the film thickness detection device 21, power supply from the measurement power supply 25 is stopped, the operation rod 51 is pulled up by the measurement operation device 29, and the used detection head 22 is lifted from the measurement unit 23 a to a standby position 23 b above a predetermined distance, The positioning pin 36 is extracted from the positioning hole 43 of the holding plate 42. At the same time, the head lead-out shutter 71 of the vacuum vapor deposition container 11 is opened to allow the vacuum vapor deposition container 11 and the lead-out preliminary container 72 to communicate with each other. Then, the lead-out operation drive unit 73c is operated to cause the head lead-out tool 73a to protrude to the standby position 23b in the vacuum deposition container 11, and the head lead-out tool 73a is rotated around the axis so that the male screw part 73b is used. It attaches to the female screw hole 37B of the detection head 22, and connects the head lead-out tool 73a and the used detection head 22. Further, the operation rod 51 is pulled up by the measuring operation device 29, the female connector 38B is detached from the male connector 38A of the used detection head 22, and the used detection head 22 and the operation rod 51 are separated. Further, the lead-out operation drive unit 73c moves the head lead-out tool 73a backward to take out the used detection head 22 from the standby position 23b into the lead-out preliminary container 72, and the head lead-out shutter 71 is closed.

  2. The new detection head 22 is carried into the introduction preliminary container 62 in advance, and the male screw portion 63b of the head introduction tool 63a is mounted in the female screw hole 37A of the new detection head 22. The introduction preliminary container 62 is held in a vacuum state, and the new detection head 22 is preheated to a temperature approaching the vapor deposition temperature by the preheating heater 65.

  3. The head introduction shutter 61 of the vacuum deposition container 11 is opened, and the vacuum deposition container 11 and the introduction preliminary container 62 are communicated. Next, the introduction operation drive unit 63 c is operated to project the introduction tool 63 a, and the new detection head 22 is carried from the introduction preliminary container 62 to the standby position 23 b of the vacuum evaporation container 11. Further, the operation rod 51 is pushed downward by the measuring operation device 29 so that the female connector 38B is fitted into the male connector 38A of the detection head 22, and the operation rod 51 and the detection head 22 are connected. Then, by reversing the head introduction tool 63a around the axis, the male screw portion 73b is detached from the female screw hole 37B of the new detection head 22, and the head introduction tool 63a and the detection head 22 are separated. Thereafter, the head introduction tool 63a is retracted into the introduction preliminary container 62 and the head introduction shutter 61 is closed.

  Next, the operation rod 51 is pushed by the measuring operation device 29 to move the new detection head 22 from the standby position 23b to the measurement unit 23a, and the positioning pin 36 is fitted into the positioning hole 43 so that the new detection head 22 is moved. Positioning and fixing to the measuring unit 23a.

As described above, the detection head 22 can be replaced.
According to the first embodiment, the detector lead-out device 72 carries out the used detection head 22 from the vacuum vapor deposition vessel 11 to the lead-out preliminary chamber 72, and the detector introduction device 63 performs vacuum from the introduction preliminary chamber 62. Since the new detection head 22 can be carried into the detector support member 23 of the vapor deposition chamber 11, the detection head 22 can be replaced in a short time. Further, by fitting the positioning pins 36 provided on the detection head 22 into the positioning holes 43 provided on the measuring unit 23a, the detection head 22 can be accurately positioned, and the film thickness can be detected with high accuracy. it can.

  In addition, since the preheating heater 65 for preheating the detection head 22 is provided in the introduction preliminary container 62, the crystal unit 31 is heated to the measurement temperature, and the film thickness immediately after the replacement can be detected with high accuracy. .

As shown in FIG. 9, an introduction / extraction preliminary container 77 in which the introduction preliminary container 62 and the extraction preliminary container 72 in the first embodiment are integrated is provided, and the inside of the introduction / extraction preliminary container 77 and the measurement unit 23a are provided. The detector head 22 can be exchanged by providing a detector introduction / extraction device 78 that allows the detector head 22 to be taken in and out. Reference numeral 76 denotes a head introduction / extraction shutter provided between the vacuum evaporation container 11 and the introduction / extraction reserve container 77, and 79 denotes a head supply / discharge shutter for taking the detection head 22 into and out of the introduction / extraction reserve container 77.
[Embodiment 2]
Next, a second embodiment of the detection head exchanging device according to the present invention will be described with reference to FIGS. Note that the same members as those in the first embodiment are denoted by the same reference numerals and description thereof is omitted.

  In this detection head exchanging device 80, a revolver-type rotary holding body 81 that holds a plurality of detection heads 22 is rotatable on a detector support member 82 around a rotation axis O in a direction perpendicular to the vapor deposition surface of the substrate P. Is provided.

  That is, a circular holding case 83 is supported via a plurality of support rods 84 suspended from the ceiling portion of the vacuum evaporation container 11, and a disc-shaped rotating holding body 81 is placed in the vertical direction (substrate P (A direction perpendicular to the vapor deposition surface) is rotatably supported around the rotation axis O. A plurality (four in the figure) of detector holding parts (holding parts) 87 are formed at fixed angles (90 degrees in the figure) on the circulation path R of the rotating holder 81. Measurement openings 83e are formed in the portions 87, respectively. Then, the rotary shaft 85 penetrating through the ceiling portion of the vacuum evaporation container 11 is connected to the central portion of the rotary holder 81, and the replacement rotary device 86 provided on the outside of the ceiling portion via the rotary shaft 85. Then, the rotation holder 81 is intermittently rotated by a certain angle (90 ° in the figure) corresponding to the detector holder 87. Each detector holding portion 87 is formed with guide grooves 88 which are opened in the outer peripheral end surface and are parallel to each other along the radial direction, and the positioning pins 36 are slidably engaged with the guide grooves 88 to detect the detection head 22. Is retained.

  The holding case 83 includes a circular bottom plate 83a, a peripheral plate 83b bent upward from the outer peripheral edge of the bottom plate 83a, and a flange plate 83c bent from the upper end of the peripheral plate 83b to the center side. The holding case 83 is supported by being connected to the flange plate 83c. A measuring portion 92C having a measurement window 89 in which the measurement opening 83e overlaps is provided on the bottom plate 83a at a position closest to the substrate P, and an introduction preliminary container is provided at a symmetrical position of the rotation shaft 85 of the measuring portion 92C. A loading / unloading unit 92A for loading a new detection head 22 from 63 is provided. Further, a preheating unit 92B is provided at an intermediate position on the circulation path R rotated from the measurement unit 92C to the carry-in / out unit 92A along the rotation direction indicated by the arrow, and the preheating heater 91 preheats the detection head 22 to the preheating unit 92B. Is provided in the holding case 83. Further, a standby unit 92D for holding the used detection head 22 is provided at a symmetrical position of the rotating shaft 85 of the preheating unit 92B. Corresponding to the carry-in / out part 92A, an introduction / outlet notch 83d into which the detection head 22 can be inserted is formed in the peripheral plate 83b and the flange plate 83c.

  Corresponding to the carry-in / out part 92 A of the holding case 83, a head introduction / extraction shutter 95 is provided at the opening on the right side surface of the vacuum evaporation container 11, and the introduction communicates with the vacuum evaporation container 11 via the head introduction / extraction shutter 95. An outgoing preliminary container (preliminary container) 94 is arranged. A detector introduction / extraction device for carrying out a used detection head between the carry-in / out section 92A of the holding case 83 and the introduction / extraction preliminary container 94 and carrying a new detection head 22 into the introduction / extraction preliminary container 94. 93 is provided.

  This detector introducing / extracting device 93 has a rod-shaped head introducing / extracting device 93 a having a male screw portion (connecting portion) 93 b detachably attached to the female screw hole 37 of the detection head 22 at the tip, and a male screw portion 93 b mounted in the female screw hole 37. The head introduction / extraction tool 93a is rotated about its axis to be detached, and the head introduction / extraction tool 93a is withdrawn / retracted, and the detection head 22 is carried in / out between the introduction / extraction preliminary container 94 and the carry-in / out part 92A. An introduction / extraction operation driving unit 93c is provided.

  In the above configuration, the new detection head 22 is held in each detector holding portion 87 corresponding to the carry-in / out portion 92A, the preheating portion 92B, and the measurement portion 92C of the holding case 83, and the detector holding portion corresponding to the standby portion 92D. A used detection head 22 is held at 87. In the measurement unit 92C, the operation member 24 and the detection head 22 are connected via the connectors 38A and 38B, and the crystal oscillator 31 is supplied with power from the measurement power supply 25, and the film thickness measurement unit 26 measures the film thickness. The

  When a large amount of vapor deposition material is deposited on the measurement surface 31a of the crystal unit 31 of the measurement unit 92C by the film thickness measurement unit 26 and the resonance frequency of the crystal unit 31 is lowered, the measurement error of the film thickness increases. The quartz vibrator 31 is exchanged together with the detection head 22 by the detection head exchange device 80.

  1. The power supply from the measurement power supply 25 is stopped, the operation rod 51 is pulled up by the measurement operation device 29, the female connector 38B is extracted from the male connector 38A of the used detection head 22, and the operation with the used detection head 22 is performed. The rod 51 is separated.

  2. The rotation holding body 81 is rotated 90 ° in the direction of the arrow through the rotating shaft 85 by the replacement rotating device 86, and the used detection head 22 is swung from the measuring unit 92C to the standby unit 92D, and preheated by the preheating unit 92B. The new detection head 22 preheated by the heater 91 is swung to the measuring unit 92C. Further, the new detection head 22 carried into the carry-in / out unit 92A is swung to the preheating unit 92B. Further, the used detection head 22 of the standby unit 92D is swung to the carry-in / out unit 92A. Then, the operation rod 51 is pushed downward by the measurement operation device 29 so that the female connector 38B is fitted into the male connector 38A of the new detection head 22, and the operation rod 51 is connected to the new detection head 22.

  3. The head inlet / outlet shutter 95 is opened, and the vacuum evaporation container 11 and the inlet / outlet preliminary container 94 are communicated with each other. Then, the head introduction / extraction tool 93a is projected to the carry-in / out part 92A by the introduction / extraction operation driving part 93c, the head introduction / extraction tool 93a is rotated around the axis, and the male screw part 93b is attached to the female screw hole 37 of the used detection head 22. Then, the head introduction / extraction tool 93a and the used detection head 22 are connected. Next, the head introduction / extraction tool 93a is moved backward to take out the used detection head 22 from the carry-in / out part 92A into the introduction / extraction preliminary container 94, and the head introduction / extraction shutter 95 is closed.

  4). The head introduction / extraction tool 93a is rotated around the axis to separate from the used detection head 22, and the head supply / discharge shutter 96 is opened to remove the used detection head 22 from the introduction / extraction preliminary container 94. Then, the new detection head 22 is carried into the introduction / extraction reserve container 94, and the head introduction / extraction tool 93 a is rotated around the axis to be connected to the new detection head 22.

  5. After the head supply / discharge shutter 96 is closed and the introduction / extraction preliminary container 94 is evacuated, the head introduction / extraction shutter 95 is opened to allow the introduction / extraction preliminary container 94 and the vacuum deposition container 11 to communicate with each other. Then, the introduction / extraction operation driving unit 93c causes the head introduction / extraction tool 93a to protrude to the carry-in / out unit 92A, the new detection head 22 is inserted into the holding case 83 via the case notch 83d, and the positioning pins 36 are respectively guided. It engages with the groove 88 and feeds it and positions it at the carry-in / out part 92A. Thereafter, the operation rod 51 is pushed by the measuring operation device 29 to fit the connectors 38A and 38B, and the head introduction / extraction tool 93a is rotated around the axis to be separated from the new detection head 22, and the head introduction / extraction tool 93a is separated. The head introduction / extraction shutter 95 is closed by retracting into the introduction / extraction preliminary container 94.

  According to the second embodiment, since the rotation support body 81 having the plurality of detector holding portions 87 that can respectively hold the plurality of detection heads 22 is provided on the detector support member 23, the operation rod 51 is moved in and out. Then, the connectors 38A and 38B are fitted and detached, and the rotation holding body 81 is rotated by a predetermined angle, whereby the used detection head 22 is discharged to the standby unit 92D and the new detection head 22 of the preheating unit 92B is measured. The detection head 22 can be quickly replaced by supplying it to the section 92C. Moreover, since this new detection head 22 is preheated by the preheating unit 92B, it can prevent a decrease in measurement accuracy due to the temperature difference between the vapor deposition temperature at the start of measurement and the crystal resonator 31, and at the start of measurement. Even if it exists, the film thickness can be detected with high accuracy.

  As shown in FIG. 15, in the second embodiment, the carry-in / out unit 92 </ b> A, the preheating unit 92 </ b> B, and the measurement unit 92 </ b> C are arranged on the rotation holding body 81 at 120 ° apart from each other about the rotation shaft 85. 92D can also be deleted. Thereby, the rotation holding body 81 and the holding case 83 can be reduced in size, and the same operation effect as Embodiment 2 can be produced.

  Furthermore, in the second embodiment, the rotary holder 82 is rotatable around the axis perpendicular to the vapor deposition surface of the substrate P. However, the detection head exchanging device 100 shown in FIG. 101 can also be rotatably supported around a rotation axis 103 parallel to the vapor deposition surface of the substrate P, and the same effect as in the second embodiment can be obtained. In FIG. 16, the same members as those in the second embodiment are denoted by the same reference numerals.

It is a longitudinal cross-sectional view of the vacuum evaporation container which shows Embodiment 1 of the film thickness detection apparatus of the vacuum evaporation equipment concerning this invention. It is AA sectional drawing shown in FIG. It is a longitudinal cross-sectional view which shows a detection head exchange apparatus. It is BB sectional drawing shown in FIG. It is a longitudinal cross-sectional view which shows a detection head. It is a decomposition | disassembly longitudinal cross-sectional view which shows a detection head. It is a longitudinal cross-sectional view which shows an introduction preliminary container. It is a plane sectional view showing an introduction preliminary container. It is plane sectional drawing of the vacuum evaporation container which shows the modification of a film thickness detection apparatus. It is a longitudinal cross-sectional view of the vacuum evaporation container which shows Embodiment 2 of the film thickness detection apparatus of the vacuum evaporation equipment concerning this invention. It is CC sectional drawing shown in FIG. It is an enlarged plan view which shows a rotation holding body. It is DD sectional drawing shown in FIG. It is EE sectional drawing shown in FIG. It is plane sectional drawing of the vacuum evaporation container which shows the modification of a film thickness detection apparatus. It is a longitudinal cross-sectional view of the vacuum evaporation container which shows other embodiment of Embodiment 2. FIG.

Explanation of symbols

P substrate (vapor deposition material)
R Circulation path 11 Vacuum deposition container 12 Vacuum pump 13 Vacuum port 15 Evaporation source 16 Work holding device 17 Deposition shutter 21 Film thickness detection device 22 Detection head 23 Detector support member 23a Measurement unit 23b Standby position 24 Operation member 25 Measurement power supply 27 Detection Head changer 29 Measuring operation unit 31 Crystal resonator (detection element)
32a Measurement opening 34 Storage box 36 Positioning pin (positioned part)
37, 37A, 37B Female threaded hole (connecting part)
38A Male connector (connector)
38B Female connector (connector)
39 Spring electrode 43 Positioning hole (positioning part)
51 Operation rod (operation member)
52 Cooling head 61 Head introduction shutter 62 Introduction preliminary container (preliminary container)
63 Detector introduction device (detector introduction / extraction device)
63a Head introduction tool (head introduction tool)
63b Male thread part (connection part)
63c Introduction operation drive unit 65 Preheating heater 71 Head lead-out shutter 72 Lead-out spare container (spare container)
73 Detector derivation device (detector introduction / extraction device)
73a Head lead-out tool (head introduction tool)
73b Male thread (connecting part)
73c Deriving operation driving unit 80 Detection head exchanging device 81 Rotating holder 82 Detector support member 83 Holding case 83e Measuring opening 85 Rotating shaft 86 Replacement rotating device 87 Detector holding unit 88 Guide groove 89 Measuring window 91 Preheating heater 92A Carrying in Exit part 92B Preheating part 92C Measurement part 92D Standby part 93 Detector introduction / extraction device 93a Head introduction / extraction tool 93b Male thread part (connection part)
94 Inlet / exit reserve container (spare container)
95 Head-in / out shutter

Claims (3)

A film thickness detecting device for a vacuum deposition facility comprising a preliminary container that can be opened and closed via a shutter and capable of maintaining a vacuum state in a vacuum deposition container,
A detection box having a storage box that accommodates the detection element facing the measurement opening, a positioned portion provided in the storage box, and a terminal for feeding the detection element to measure the film thickness is provided,
In the vacuum evaporation container, a detector support member is provided that positions the positioning portion of the detection head by the positioning portion and holds it in the measurement portion,
A detector introducing / extracting device capable of withdrawing / extracting the detection head between the inside of the preliminary container and the detector support member;
An operation member having a terminal connection portion connectable to a terminal of the detection head arranged in the measurement unit is provided. The spare container is composed of an introduction spare container for carrying a new detection head into the vacuum deposition container and a lead-out spare container for carrying out the used detection head from the vacuum deposition container.
The detector introducing / extracting device includes a detector introducing device for carrying a new detection head from the introduction preliminary container to a standby position of a detector supporting member of the vacuum deposition container, and a detector supporting member of the vacuum deposition container for the used detecting head. Comprising a detector lead-out device that discharges from the standby position to the lead-out preliminary container,
With the operation member, the detection head can be transferred between the standby position of the detector support member and the measurement unit,
The apparatus for detecting a film thickness of vacuum deposition equipment according to claim 1, wherein a preheating heater for preheating a new detection head is provided in the introduction preliminary container. The detector support member is provided with a rotation holding body that is rotatably supported and can hold a detection head in each of a plurality of holding portions on the circulation path,
On the circuit path of the rotating holder, a measuring unit that is equipped with an operation member to detect the film thickness and a loading / unloading unit for loading and unloading the detection head between the spare container are provided,
The vacuum vapor deposition equipment according to claim 1, wherein a preheating unit for preheating the detection head by a preheating heater is provided between the loading / unloading unit and the measurement unit along a rotation direction of the rotating holder. Film thickness detector.

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