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JP2009252858A - Package for storing semiconductor element - Google Patents

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JP2009252858A
JP2009252858A JP2008096793A JP2008096793A JP2009252858A JP 2009252858 A JP2009252858 A JP 2009252858A JP 2008096793 A JP2008096793 A JP 2008096793A JP 2008096793 A JP2008096793 A JP 2008096793A JP 2009252858 A JP2009252858 A JP 2009252858A
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ceramic frame
semiconductor element
base
package
brazing material
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JP5101375B2 (en
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Hiroaki Mori
紘彰 毛利
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To secure excellent bondability between a base and a ceramic frame, and to prevent the ceramic frame from cracking. <P>SOLUTION: The package for storing a semiconductor element includes the base 101 which is provided with a projection portion 103 for mounting a semiconductor element thereon on an upper surface and has at least the upper surface made of metal, the ceramic frame 102 which has its bottom surface 102a and inside side surface 102b covered with a metal layer 109, and a brazing filler metal 112 bonding the upper surface of the base 101 and the metal layer 109 together so that the ceramic frame 102 encloses the projection portion 103 for semiconductor element mounting on the upper surface of the base 101. A surface of the brazing filler metal 112 at a gap portion 111 between the metal layer 109 on the inside side surface 102b of the ceramic frame 102 and the base 101 is below the upper surface of the projection portion 103 for mounting the semiconductor element of the base and above an upper surface of a mounting portion of the base 101 for the ceramic frame 102. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、半導体素子を収納する半導体素子収納用パッケージに関する。特に、金属製の基体とセラミック枠体とをろう材で接合してなる半導体素子収納用パッケージに関する。   The present invention relates to a semiconductor element storage package for storing semiconductor elements. In particular, the present invention relates to a package for housing a semiconductor element formed by joining a metal base and a ceramic frame with a brazing material.

半導体素子を気密に封止して収容する半導体素子収納用パッケージとして、図5に示すような、熱伝導性の良い銅−モリブデン(CuMo)合金、銅−タングステン(CuW)合金等の金属からなり、上面に半導体素子(図示なし)を載置するための凸部1aが設けられた基体1上に、底面2a、内側面2bおよび上面2cが金属層(図示なし)で被覆されているセラミック枠体2を、半導体素子載置用凸部1aを囲繞するように搭載し,両者をろう材3によりろう付けしたものが知られている。セラミック枠体2の底面2aの金属層はろう付けのために設けられたものであり、内側面2bおよび上面2cの金属層は電気特性を向上させるために設けられたものである。   As a semiconductor element housing package for hermetically sealing and housing a semiconductor element, it is made of a metal such as a copper-molybdenum (CuMo) alloy or a copper-tungsten (CuW) alloy having good thermal conductivity as shown in FIG. A ceramic frame in which a bottom surface 2a, an inner surface 2b, and an upper surface 2c are coated with a metal layer (not shown) on a base 1 provided with a convex portion 1a for mounting a semiconductor element (not shown) on the upper surface. It is known that the body 2 is mounted so as to surround the semiconductor element mounting convex portion 1 a and both are brazed with a brazing material 3. The metal layer on the bottom surface 2a of the ceramic frame 2 is provided for brazing, and the metal layers on the inner side surface 2b and the upper surface 2c are provided for improving electrical characteristics.

このような半導体素子収納用パッケージにおいては、セラミック枠体2の底面2aのみならず、内側面2bにも金属層が設けられているため、基体1上面にセラミック枠体2をろう付けした際に、過多となったろう材3がセラミック枠体2の内側面2bと基体1との間の間隙部Gに溜まり、そのろう材3が冷却固化して収縮する際に、セラミック枠体2に応力が加わり、クラックが発生する場合があることが明らかとなってきた。   In such a package for housing a semiconductor element, since the metal layer is provided not only on the bottom surface 2a of the ceramic frame 2 but also on the inner surface 2b, when the ceramic frame 2 is brazed on the upper surface of the substrate 1, The excess brazing material 3 accumulates in the gap G between the inner surface 2b of the ceramic frame 2 and the base 1, and when the brazing material 3 is cooled and solidified, the ceramic frame 2 is stressed. In addition, it has become clear that cracks may occur.

この問題を解決する方法として、例えば、使用するろう材の量を減らしたり、間隙部Gの幅や高さを大きくすることが考えられるが、ろう材の量を減らした場合には、セラミック枠体2の底面2aと基体1との間のろう材3にボイドが発生し、接合性が損なわれるおそれがある。一方、間隙部Gの幅や高さを変えると、設計の変更が必要になるという問題がある。   As a method for solving this problem, for example, it is conceivable to reduce the amount of brazing material to be used or increase the width or height of the gap portion G. There is a possibility that voids are generated in the brazing material 3 between the bottom surface 2a of the body 2 and the base 1, and the bonding property is impaired. On the other hand, if the width or height of the gap G is changed, there is a problem that a design change is required.

なお、半導体素子収納用パッケージのこの種の問題の解決を図ったものとして、過剰なろう材を溜める溝あるいは窪みを設けたものが提案されている(例えば、特許文献1参照。)。   In order to solve this type of problem in the package for housing a semiconductor element, there has been proposed a package provided with a groove or a recess for storing excessive brazing material (see, for example, Patent Document 1).

しかしながら、特許文献1に開示の半導体素子収納用パッケージは、いずれも上記半導体素子収納用パッケージとは、基体と枠体との接合部分の形状が異なるものであり、その従来技術を上記問題の解決に適用することはできない。
特開2002−198454号公報
However, all of the semiconductor element storage packages disclosed in Patent Document 1 are different from the semiconductor element storage package in the shape of the joint portion between the base and the frame. It cannot be applied to.
JP 2002-198454 A

本発明は、上記従来技術の課題に対処してなされたものであり、上面に半導体素子を載置するための凸部が設けられた基体上に、底面および内側面が金属層で被覆されているセラミック枠体を、半導体素子載置用凸部を囲繞するように搭載し、ろう付けしてなるような半導体素子収納用パッケージにおいて、基体とセラミック枠体との良好な接合性を確保することができ、かつセラミック枠体におけるクラックの発生を防止することができる半導体素子収納用パッケージを提供することを目的とする。   The present invention has been made in response to the above-described problems of the prior art, and a bottom surface and an inner surface are coated with a metal layer on a base provided with a convex portion for placing a semiconductor element on the upper surface. A ceramic frame body is mounted so as to surround the semiconductor element mounting convex portion, and in a semiconductor element storage package formed by brazing, a good bonding property between the substrate and the ceramic frame body is ensured. An object of the present invention is to provide a package for housing a semiconductor element that can prevent cracks from occurring in a ceramic frame.

(1)請求項1の発明(半導体素子収納用パッケージ)は、上面に半導体素子を載置するための凸部が設けられた、少なくとも表面が金属からなる基体と、底面および内側面が金属層で被覆されているセラミック枠体と、前記セラミック枠体が前記基体上面に前記半導体素子載置用凸部を囲繞するように前記基体上面と前記金属層とを接合するろう材と、を備える半導体素子収納用パッケージであって、前記セラミック枠体の内側面の金属層と前記基体との間隙部のろう材表面が、前記基体の前記半導体素子載置用凸部の上面より下方で、かつ、前記基体のセラミック枠体の搭載部分の上面より上方に位置するように構成したことを特徴とする。   (1) The invention of claim 1 (semiconductor element storage package) is provided with a base having at least a surface made of metal provided with a convex part for placing a semiconductor element on the upper surface, and a bottom surface and an inner surface being a metal layer. And a brazing material that joins the upper surface of the base body and the metal layer so that the ceramic frame body surrounds the semiconductor element mounting convex portion on the upper surface of the base body. A package for element storage, wherein the brazing material surface of the gap between the metal layer on the inner surface of the ceramic frame and the base is below the upper surface of the convex part for mounting the semiconductor element on the base; and It is configured to be positioned above the upper surface of the ceramic frame mounting portion of the base.

本発明では、セラミック枠体の内側面の金属層と基体との間隙部のろう材表面が、基体の半導体素子載置用凸部の上面より下方で、かつ、基体のセラミック枠体の搭載部分の上面より上方に位置するように構成されているので、間隙部のろう材が固化し収縮する際にセラミック枠体に加わる応力を低減でき、かかる応力に起因するセラミック枠体のクラックの発生を防止することができる。また、基体とセラミック枠体との良好な接合性も確保することができる。   In the present invention, the surface of the brazing material in the gap between the metal layer on the inner side surface of the ceramic frame and the substrate is below the upper surface of the semiconductor element mounting convex portion of the substrate, and the ceramic frame mounting portion of the substrate Therefore, the stress applied to the ceramic frame when the brazing filler metal in the gap is solidified and contracted can be reduced, and cracks in the ceramic frame due to the stress can be reduced. Can be prevented. Also, good bondability between the substrate and the ceramic frame can be ensured.

(2)請求項2の発明は、対向する前記セラミック枠体の底面と前記基体のセラミック枠体の搭載部分の上面との間に、それらの離間距離を10〜30μmに規定するスペーサ部材を介在させたことを特徴とする。   (2) In the invention of claim 2, a spacer member is provided between the bottom surface of the opposing ceramic frame body and the upper surface of the mounting portion of the ceramic frame body of the base so that the distance between them is 10 to 30 μm. It was made to be characterized.

本発明では、対向するセラミック枠体の底面と記基体のセラミック枠体の搭載部分の上面との間に、それらの離間距離を10〜30μmに規定するスペーサ部材を介在させているので、間隙部に侵入するろう材の量を容易にコントロールすることができ、これにより、間隙部のろう材表面の位置を上述したような適正な位置に容易に調節することができる。   In the present invention, a spacer member is provided between the bottom surface of the opposing ceramic frame body and the top surface of the mounting portion of the ceramic frame body of the substrate, so that the gap between them is 10-30 μm. It is possible to easily control the amount of the brazing material penetrating into the gap, thereby easily adjusting the position of the brazing filler metal surface in the gap to the appropriate position as described above.

なお、対向するセラミック枠体の底面と記基体のセラミック枠体の搭載部分の上面との間の離間距離が10μm未満では、間隙部のろう材表面が、基体の半導体素子載置用凸部の上面より下方にすることが困難になる。また、逆に同離間距離が30μmを超えると、ろう材部分が厚くなり過ぎて、冷却収縮による応力がセラミック枠体に加わる恐れがある。   If the distance between the bottom surface of the opposing ceramic frame body and the top surface of the mounting portion of the ceramic frame body of the base is less than 10 μm, the brazing filler metal surface of the gap portion is the semiconductor element mounting convex portion of the base body. It becomes difficult to make it below the upper surface. On the other hand, if the separation distance exceeds 30 μm, the brazing material portion becomes too thick, and stress due to cooling shrinkage may be applied to the ceramic frame.

(3)請求項3の発明は、前記スペーサ部材が、前記セラミック枠体の底面および/または前記基体のセラミック枠体の搭載部分の上面に設けられた突起部からなることを特徴とする。   (3) The invention of claim 3 is characterized in that the spacer member comprises a protrusion provided on the bottom surface of the ceramic frame and / or the upper surface of the mounting portion of the ceramic frame of the base.

本発明は、好ましいスペーサ部材を例示したものであり、形成が容易である上に、対向するセラミック枠体の底面と記基体のセラミック枠体の搭載部分の上面との間の離間距離を安定に制御することができる。   The present invention exemplifies a preferable spacer member, which is easy to form and can stably form a separation distance between the bottom surface of the opposing ceramic frame body and the upper surface of the mounting portion of the ceramic frame body of the substrate. Can be controlled.

(4)請求項4の発明は、前記セラミック枠体の内側面と前記基体との間隙の下方の基体に、溶融したろう材を溜める凹部を設けたことを特徴とする。   (4) The invention of claim 4 is characterized in that a recess is provided in the base below the gap between the inner surface of the ceramic frame and the base to store the molten brazing material.

本発明では、セラミック枠体の内側面と基体との間隙の下方の基体に、溶融したろう材を溜める凹部が設けられているので、間隙部のろう材表面の位置を上述したような適正な位置に容易に調節することができる。   In the present invention, the base below the gap between the inner surface of the ceramic frame and the base is provided with a recess for storing the melted brazing filler metal. Can be easily adjusted to position.

(5)請求項5の発明は、前記セラミック枠体の内側面と前記基体との間隙の幅dが、50〜200μmであることを特徴とする。   (5) The invention of claim 5 is characterized in that the width d of the gap between the inner surface of the ceramic frame and the substrate is 50 to 200 μm.

本発明では、セラミック枠体の内側面と基体との間隙の幅dが、50〜200μmであるので、半導体素子収納用パッケージの設計上の変更を不要とすることができる。   In the present invention, since the width d of the gap between the inner surface of the ceramic frame and the substrate is 50 to 200 μm, it is not necessary to change the design of the package for housing semiconductor elements.

(6)請求項6の発明は、前記半導体素子載置用凸部の高さhが、100〜350μmであることを特徴とする。   (6) The invention of claim 6 is characterized in that a height h of the semiconductor element mounting convex portion is 100 to 350 μm.

本発明では、半導体素子載置用凸部の高さhが、100〜350μmであるので、半導体素子収納用パッケージの設計上の変更を不要とすることができる。   In the present invention, since the height h of the semiconductor element mounting convex portion is 100 to 350 μm, it is not necessary to change the design of the semiconductor element storage package.

本発明によれば、上面に半導体素子を載置するための凸部が設けられた基体上に、底面および内側面が金属層で被覆されているセラミック枠体を、半導体素子載置用凸部を囲繞するように搭載しろう付けしてなるような半導体素子収納用パッケージにおいて、基体とセラミック枠体との良好な接合性を確保することができ、かつセラミック枠体におけるクラックの発生を防止することができ、ひいては、半導体素子を気密に封止して収容する半導体素子収納用パッケージを提供できる。   According to the present invention, a ceramic frame having a bottom surface and an inner surface coated with a metal layer on a base provided with a convex portion for placing a semiconductor element on an upper surface is provided with a convex portion for placing a semiconductor element. In a package for housing a semiconductor element, which is mounted and brazed so as to surround the substrate, it is possible to ensure good bondability between the base and the ceramic frame and to prevent cracks in the ceramic frame. As a result, it is possible to provide a package for housing a semiconductor element in which the semiconductor element is hermetically sealed.

以下、本発明に係る実施の形態について説明する。なお、説明は図面に基づいて行うが、それらの図面は単に図解のために提供されるものであって、本発明はそれらの図面により何ら限定されるものではない。また、図面は模式的なものであり、厚みと平面寸法との関係、各層の厚みの比率等は実際のものとは異なることに留意すべきである。さらに、以下の説明において、同一もしくは略同一の機能及び構成を有する構成要素については、同一符号を付し、重複する説明は省略する。   Embodiments according to the present invention will be described below. Although the description will be made based on the drawings, the drawings are provided for illustration only, and the present invention is not limited to the drawings. It should be noted that the drawings are schematic, and the relationship between the thickness and the planar dimensions, the ratio of the thickness of each layer, and the like are different from the actual ones. Furthermore, in the following description, components having the same or substantially the same function and configuration are denoted by the same reference numerals, and redundant description is omitted.

(第1の実施形態)
図1は本発明の第1の実施形態に係る半導体素子収納用パッケージを示す斜視図であり、また、図2は、その要部を拡大して示す断面図である。
(First embodiment)
FIG. 1 is a perspective view showing a package for housing a semiconductor element according to the first embodiment of the present invention, and FIG. 2 is a cross-sectional view showing an enlarged main part thereof.

これらの図1および図2に示すように、本実施形態の半導体素子収納用パッケージは、基体101と、この基体101上にろう材112を介して接合されたセラミック枠体102とを備えている。   As shown in FIG. 1 and FIG. 2, the package for housing a semiconductor element of this embodiment includes a base 101 and a ceramic frame body 102 joined to the base 101 via a brazing material 112. .

基体101は、熱伝導性の良い銅−モリブデン(CuMo)合金からなり、その上面に半導体素子(図示なし)を載置するための凸部103を有している。なお、基体101は、銅−タングステン(CuW)合金、コバール(Kovar)と称する鉄−ニッケル−コバルト(FeNiCo)合金等の金属や、セラミックス等で形成されていてもよい。セラミックスの場合は、少なくとも表面が金属で覆われている。   The base 101 is made of a copper-molybdenum (CuMo) alloy having good thermal conductivity, and has a convex portion 103 on which the semiconductor element (not shown) is placed. The substrate 101 may be made of a metal such as a copper-tungsten (CuW) alloy or an iron-nickel-cobalt (FeNiCo) alloy called Kovar, ceramics, or the like. In the case of ceramics, at least the surface is covered with metal.

本実施形態では、基体101は、平面形状が矩形であり、凸部103の高さhは、例えば100〜350μm程度である。また、基体101には、外部の実装基板にネジ止めするためのネジ止め孔が設けられた固定部104を備えている。   In the present embodiment, the base body 101 has a rectangular planar shape, and the height h of the convex portion 103 is, for example, about 100 to 350 μm. Further, the base 101 is provided with a fixing portion 104 provided with a screwing hole for screwing to an external mounting substrate.

基体101は、半導体素子(図示なし)を支持する支持部材としての機能と、半導体素子の作動時の熱を放熱する放熱部材としての機能を併せ有する。   The base 101 has both a function as a support member that supports a semiconductor element (not shown) and a function as a heat dissipation member that dissipates heat during operation of the semiconductor element.

基体101の表面には、必要に応じて、ろう材との濡れ性に優れる金属、例えば厚さ1.0〜2.5μm程度のニッケル(Ni)層がめっき法により形成される。ニッケル(Ni)層上にさらに厚さ2〜3μm程度の金(Au)層をめっき法により形成してもよい。   A metal having excellent wettability with the brazing material, for example, a nickel (Ni) layer having a thickness of about 1.0 to 2.5 μm is formed on the surface of the base 101 by plating as necessary. A gold (Au) layer having a thickness of about 2 to 3 μm may be further formed on the nickel (Ni) layer by a plating method.

セラミック枠体102は、所定形状のアルミナ(Al)等からなるセラミックグリーンシートを複数枚積層し焼成して形成される。セラミック枠体102の内側および外側には、段部105,106が形成されており、これらの段部105,106の上面には、セラミック枠体102の内部で接続される、タングステン(W)等のメタライズからなる複数本の線路導体107やグランドとなる金属層109が設けられている。これらの各線路導体107には、さらに外部電気回路と電気的に接続するためのリード端子108が接合されている。 The ceramic frame 102 is formed by laminating and firing a plurality of ceramic green sheets made of alumina (Al 2 O 3 ) or the like having a predetermined shape. Step portions 105 and 106 are formed inside and outside the ceramic frame 102, and tungsten (W) or the like is connected to the upper surface of the step portions 105 and 106 inside the ceramic frame 102. A plurality of line conductors 107 made of metallization and a metal layer 109 serving as a ground are provided. Each line conductor 107 is further joined with a lead terminal 108 for electrical connection with an external electric circuit.

また、セラミック枠体102の底面102aと下部内側面102bには、タングステン(W)等のメタライズからならなる金属層109が設けられ、底面102aには、さらに、タングステン(W)等の再度のメタライズにより高さが5〜25μmのスペーサ部材としてのバンプ110が複数個、形成されている。セラミック枠体102の下部内側面102bの金属層109と、底面102aのバンプ110が形成された金属層109の表面には、必要に応じて、ろう材との濡れ性に優れる金属、例えば厚さ1.0〜2.5μm程度のニッケル(Ni)層がめっき法により形成される。ニッケル(Ni)層上にさらに厚さ2〜3μm程度の金(Au)層をめっき法により形成してもよい。なお、タングステン(W)等のメタライズからならなる金属層109や、ニッケル(Ni)層、金(Au)層は、線路導体107の形成部分を除くセラミック枠体102の外表面全体に設けられていてもよい。   Further, a metal layer 109 made of metallization such as tungsten (W) is provided on the bottom surface 102a and the lower inner side surface 102b of the ceramic frame 102, and further metallization such as tungsten (W) is performed again on the bottom surface 102a. Thus, a plurality of bumps 110 as spacer members having a height of 5 to 25 μm are formed. On the surface of the metal layer 109 on the lower inner side surface 102b of the ceramic frame 102 and the surface of the metal layer 109 on which the bumps 110 on the bottom surface 102a are formed, a metal having excellent wettability with the brazing material, for example, thickness A nickel (Ni) layer of about 1.0 to 2.5 μm is formed by a plating method. A gold (Au) layer having a thickness of about 2 to 3 μm may be further formed on the nickel (Ni) layer by a plating method. A metal layer 109 made of metallization such as tungsten (W), a nickel (Ni) layer, and a gold (Au) layer is provided on the entire outer surface of the ceramic frame 102 excluding a portion where the line conductor 107 is formed. May be.

セラミック枠体102は、基体101の上面に半導体素子載置用凸部103を囲繞するとともに、セラミック枠体102の下部内側面102bの金属層109の表面と基体101との間に、幅dが50〜200μm程度の間隙(間隙部111)を備え、銀ろう等のろう材112により接合されている。   The ceramic frame 102 surrounds the semiconductor element mounting convex portion 103 on the upper surface of the base body 101, and has a width d between the surface of the metal layer 109 on the lower inner side surface 102 b of the ceramic frame 102 and the base body 101. It has a gap (gap portion 111) of about 50 to 200 μm and is joined by a brazing material 112 such as silver brazing.

このような半導体素子収納用パッケージにおいては、セラミック枠体102の底面102aに高さ5〜25μm程度のバンプ110が形成されているため、セラミック枠体102の底面102aと基体101のセラミック枠体102の搭載部分の上面との間に10〜30μmの離間距離aが確保される。   In such a package for housing semiconductor elements, the bumps 110 having a height of about 5 to 25 μm are formed on the bottom surface 102 a of the ceramic frame body 102, so that the bottom surface 102 a of the ceramic frame body 102 and the ceramic frame body 102 of the base body 101 are formed. A separation distance “a” of 10 to 30 μm is ensured between the upper surface of the mounting portion.

その結果、セラミック枠体102の底面102aと基体101のセラミック枠体102の搭載部分の上面との間のろう材112におけるボイドの発生が防止されるとともに、セラミック枠体102の内側面108の金属層109と基体102との間隙部111のろう材112表面が、基体101の半導体素子載置用凸部103の上面より下方で、かつ、基体101のセラミック枠体102の搭載部分の上面より上方に位置するように構成することができ、セラミック枠体102におけるクラックの発生を防止することができる。   As a result, generation of voids in the brazing material 112 between the bottom surface 102a of the ceramic frame 102 and the upper surface of the mounting portion of the ceramic frame 102 of the base 101 is prevented, and the metal on the inner side surface 108 of the ceramic frame 102 is prevented. The surface of the brazing material 112 in the gap portion 111 between the layer 109 and the substrate 102 is below the upper surface of the semiconductor element mounting convex portion 103 of the substrate 101 and above the upper surface of the mounting portion of the ceramic frame 102 of the substrate 101. Therefore, the generation of cracks in the ceramic frame 102 can be prevented.

一方、バンプ110が形成されていない場合は、セラミック枠体102の底面102aと基体101のセラミック枠体102の搭載部分の上面との間の離間距離aは5μm程度となる。上記実施形態と同量のろう材にて、セラミック枠体102と基体101とを接合した場合、間隙部111に多量のろう材溜まりが発生し、図3に示すようにろう材112表面は、基体101の半導体素子載置用凸部103の上面より上方に位置することになる。また、ろう材量を減らすと、間隙部111のろう材112表面が、基体101の半導体素子載置用凸部103の上面より下方で、かつ、基体101のセラミック枠体102の搭載部分の上面より上方に位置するようになるが、セラミック枠体102の底面102aと基体101のセラミック枠体102の搭載部分の上面との間のろう材112にボイドが発生し、セラミック枠体102と基体101との接合が十分とならない場合があった。   On the other hand, when the bump 110 is not formed, the distance a between the bottom surface 102a of the ceramic frame 102 and the top surface of the mounting portion of the ceramic frame 102 of the base 101 is about 5 μm. When the ceramic frame body 102 and the base body 101 are joined with the same amount of brazing material as in the above embodiment, a large amount of brazing material pool is generated in the gap portion 111, and the surface of the brazing material 112 as shown in FIG. It is located above the upper surface of the semiconductor element mounting convex portion 103 of the base 101. Further, when the amount of the brazing material is reduced, the surface of the brazing material 112 in the gap portion 111 is below the upper surface of the semiconductor element mounting convex portion 103 of the base 101 and the top surface of the mounting portion of the ceramic frame 102 of the base 101. Although it comes to be positioned further upward, a void is generated in the brazing material 112 between the bottom surface 102a of the ceramic frame 102 and the upper surface of the mounting portion of the ceramic frame 102 of the base 101, and the ceramic frame 102 and the base 101 In some cases, the bonding with was not sufficient.

このように、セラミック枠体102の底面102aと基体101のセラミック枠体102の搭載部分の上面との間に10〜30μmの離間距離aを確保しない場合は、ろう材112内のボイドの防止とセラミック枠体102のクラックの防止を両立させることができないのに対し、本実施形態では、これらを両立させることができ、基体101とセラミック枠体102との接合性に優れ、かつセラミック枠体102におけるクラックの発生のない高品質、高信頼性の半導体素子収納用パッケージが得られる。   As described above, in the case where the separation distance a of 10 to 30 μm is not ensured between the bottom surface 102a of the ceramic frame 102 and the upper surface of the mounting portion of the ceramic frame 102 of the base body 101, voids in the brazing material 112 can be prevented. While it is impossible to achieve both prevention of cracks in the ceramic frame 102, in the present embodiment, it is possible to achieve both of them, and excellent bonding properties between the base body 101 and the ceramic frame 102, and the ceramic frame 102. Thus, a high-quality and high-reliability package for housing a semiconductor element without cracks can be obtained.

なお、本実施形態においては、セラミック枠体102の底面102aと基体101のセラミック枠体102の搭載部分の上面との間の離間距離aを確保するためのスペーサ部材として、セラミック枠体102の底面102aにメタライズにより設けたバンプ110を用いているが、バンプ110は、基体101側に設けてもよく、あるいは、セラミック枠体102の底面102aと基体101の上面の両方にも設けてもよい。また、基体101を成形加工する際に、上面に突起を設けるようにしてもよく、さらに、セラミック枠体102の底面102aと基体101の上面との間にセラミックボールや金属ボールを介在させるようにしてもよい。   In the present embodiment, the bottom surface of the ceramic frame 102 is used as a spacer member for securing a separation distance a between the bottom surface 102a of the ceramic frame 102 and the top surface of the mounting portion of the ceramic frame 102 of the base 101. Although bumps 110 provided by metallization on 102 a are used, the bumps 110 may be provided on the base 101 side, or may be provided on both the bottom surface 102 a of the ceramic frame 102 and the top surface of the base 101. Further, when the base body 101 is molded, a protrusion may be provided on the upper surface, and a ceramic ball or a metal ball is interposed between the bottom surface 102a of the ceramic frame 102 and the upper surface of the base body 101. May be.

(第2の実施の形態)
図4は本発明の第2の実施形態に係る半導体素子収納用パッケージの要部を拡大して示す断面図である。なお、重複する説明を避けるため、第1の実施の形態と共通する点については説明を省略し、相違点のみ説明する。
(Second Embodiment)
FIG. 4 is an enlarged sectional view showing a main part of a package for housing a semiconductor element according to the second embodiment of the present invention. In addition, in order to avoid overlapping description, description is abbreviate | omitted about the point which is common in 1st Embodiment, and only a different point is demonstrated.

図4に示すように、第2の実施形態に係る半導体素子収納用パッケージにおいては、バンプを形成せず、セラミック枠体102の内側面102bと基体101との間隙部111の下方の基体101に、溶融したろう材107を溜める凹部113を設けている。図4の例では、断面矩形状の凹部113が形成されているが、特にこのような形状に限定されるものではない。また。深さについても特に限定されるものではないが、通常、50〜200μmである。   As shown in FIG. 4, in the package for housing a semiconductor device according to the second embodiment, bumps are not formed, and the base body 101 below the gap 111 between the inner side surface 102 b of the ceramic frame 102 and the base body 101 is formed. A recess 113 for storing the molten brazing material 107 is provided. In the example of FIG. 4, the concave portion 113 having a rectangular cross section is formed, but the shape is not particularly limited to such a shape. Also. The depth is not particularly limited, but is usually 50 to 200 μm.

本実施形態においては、溶融したろう材112の少なくとも一部は凹部113に流入するため、第1の実施形態と同様、セラミック枠体102の内側面108の金属層109と基体102との間隙部111のろう材112表面が、基体101の半導体素子載置用凸部103の上面より下方で、かつ、基体101のセラミック枠体102の搭載部分の上面より上方に位置するように構成することができ、セラミック枠体102におけるクラックの発生を防止することができる。また、セラミック枠体102の底面102aと基体101のセラミック枠体102の搭載部分の上面との間のろう材112におけるボイドの発生も防止することができる。   In the present embodiment, since at least a part of the molten brazing material 112 flows into the recess 113, the gap between the metal layer 109 on the inner surface 108 of the ceramic frame 102 and the base body 102, as in the first embodiment. 111 is configured such that the surface of the brazing material 112 is positioned below the upper surface of the semiconductor element mounting convex portion 103 of the base 101 and above the upper surface of the mounting portion of the ceramic frame 102 of the base 101. And the generation of cracks in the ceramic frame 102 can be prevented. In addition, it is possible to prevent the occurrence of voids in the brazing material 112 between the bottom surface 102a of the ceramic frame 102 and the top surface of the mounting portion of the ceramic frame 102 of the base 101.

なお、本発明は以上説明した実施の形態に記載内容に限定されるものではなく、本発明の要旨を逸脱しない範囲で種々の態様で実施し得ることはいうまでもない。   The present invention is not limited to the contents described in the embodiment described above, and it goes without saying that the present invention can be implemented in various modes without departing from the gist of the present invention.

本発明の第1の実施形態に係る半導体素子収納用パッケージを示す斜視図である。1 is a perspective view showing a package for housing a semiconductor element according to a first embodiment of the present invention. 図1の要部を拡大して示す断面図である。It is sectional drawing which expands and shows the principal part of FIG. 第1の実施の形態との比較のための半導体素子収納用パッケージの要部構成を示す断面図である。It is sectional drawing which shows the principal part structure of the package for semiconductor element accommodation for a comparison with 1st Embodiment. 本発明の第2の実施形態に係る半導体素子収納用パッケージの要部を拡大して示す断面図である。It is sectional drawing which expands and shows the principal part of the package for semiconductor element accommodation which concerns on the 2nd Embodiment of this invention. 従来の半導体素子収納用パッケージの構成を概略的に示す断面図である。It is sectional drawing which shows schematically the structure of the conventional semiconductor element accommodation package.

符号の説明Explanation of symbols

101…基体、102…セラミック枠体、102a…底面、102b…内側面、103…半導体素子載置凸部、109…金属層、110…バンプ、111…間隙部、112…ろう材、113…凹部。   DESCRIPTION OF SYMBOLS 101 ... Base | substrate, 102 ... Ceramic frame, 102a ... Bottom, 102b ... Inner side surface, 103 ... Semiconductor element mounting convex part, 109 ... Metal layer, 110 ... Bump, 111 ... Gap part, 112 ... Brazing material, 113 ... Concave part .

Claims (6)

上面に半導体素子を載置するための凸部が設けられた、少なくとも表面が金属からなる基体と、
底面および内側面が金属層で被覆されているセラミック枠体と、
前記セラミック枠体が前記基体上面に前記半導体素子載置用凸部を囲繞するように前記基体上面と前記金属層とを接合するろう材と、
を備える半導体素子収納用パッケージであって、
前記セラミック枠体の内側面の金属層と前記基体との間隙部のろう材表面が、前記基体の前記半導体素子載置用凸部の上面より下方で、かつ、前記基体のセラミック枠体の搭載部分の上面より上方に位置するように構成したことを特徴とする半導体素子収納用パッケージ。
A base having at least a surface made of metal provided with a convex portion for placing a semiconductor element on the upper surface;
A ceramic frame whose bottom and inner surfaces are coated with a metal layer;
A brazing material that joins the upper surface of the base body and the metal layer so that the ceramic frame body surrounds the semiconductor element mounting convex portion on the upper surface of the base body;
A package for housing a semiconductor element comprising:
The brazing material surface in the gap between the metal layer on the inner surface of the ceramic frame and the base is below the upper surface of the semiconductor element mounting convex portion of the base, and the ceramic frame is mounted on the base A package for housing a semiconductor element, wherein the package is located above the upper surface of the portion.
対向する前記セラミック枠体の底面と前記基体のセラミック枠体の搭載部分の上面との間に、それらの離間距離を10〜30μmに規定するスペーサ部材を介在させたことを特徴とする請求項1記載の半導体素子収納用パッケージ。   2. A spacer member defining a distance of 10 to 30 [mu] m between the bottom surface of the ceramic frame body and the upper surface of the mounting portion of the ceramic frame body of the base is interposed. A package for housing a semiconductor element as described. 前記スペーサ部材が、前記セラミック枠体の底面および/または前記基体のセラミック枠体の搭載部分の上面に設けられた突起部からなることを特徴とする請求項2記載の半導体素子収納用パッケージ。   3. The package for housing a semiconductor element according to claim 2, wherein the spacer member comprises a protrusion provided on a bottom surface of the ceramic frame body and / or an upper surface of a mounting portion of the ceramic frame body of the base body. 前記セラミック枠体の内側面と前記基体との間隙の下方の基体に、溶融したろう材を溜める凹部を設けたことを特徴とする請求項1乃至3のいずれか1項記載の半導体素子収納用パッケージ。   4. The semiconductor element storage device according to claim 1, wherein a recess is provided in a base below a gap between the inner surface of the ceramic frame and the base to store a molten brazing material. 5. package. 前記セラミック枠体の内側面と前記基体との間隙の幅dが、50〜200μmであることを特徴とする請求項1乃至4のいずれか1項記載の半導体素子収納用パッケージ。   5. The package for housing a semiconductor element according to claim 1, wherein a width d of a gap between the inner surface of the ceramic frame and the base is 50 to 200 μm. 前記半導体素子載置用凸部の高さhが、100〜350μmであることを特徴とする請求項1乃至5のいずれか1項記載の半導体素子収納用パッケージ。   6. The semiconductor element storage package according to claim 1, wherein a height h of the semiconductor element mounting convex portion is 100 to 350 [mu] m.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9018755B2 (en) 2013-04-09 2015-04-28 Ngk Spark Plug Co., Ltd. Joint structure and semiconductor device storage package
JP2015159243A (en) * 2014-02-25 2015-09-03 京セラ株式会社 Wiring board

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09148468A (en) * 1995-11-24 1997-06-06 Nec Corp Semiconductor container

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09148468A (en) * 1995-11-24 1997-06-06 Nec Corp Semiconductor container

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9018755B2 (en) 2013-04-09 2015-04-28 Ngk Spark Plug Co., Ltd. Joint structure and semiconductor device storage package
JP2015159243A (en) * 2014-02-25 2015-09-03 京セラ株式会社 Wiring board

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