JP2009216762A - Photomask, and method for manufacturing color filter - Google Patents

Abstract

A photomask used for slit exposure that provides pulsed light exposure, a photomask that has a plurality of types of openings, and does not deteriorate in positional accuracy even when different patterns are formed in different regions, and a color filter using the photomask Manufacturing method.
A pattern mask P-PM provided with a plurality of types of pattern openings K1 and K2, and a light transmitting / shading mask TS-PM provided with light transmitting openings K1 'and K2' larger than the openings. The transparent opening provided on the transparent / light-shielding mask is superimposed on the selected pattern opening, and the opening of the photomask is the selected pattern opening K1 or K2. Is a photomask PM3 functioning as a photomask which is a light shielding portion. Using this photomask, a color filter is manufactured by slit exposure that provides pulsed light exposure.
[Selection] Figure 3

Description

  The present invention relates to a small photomask for forming different patterns in different regions on the same substrate, and a method for manufacturing a color filter using the photomask, and in particular, the position of the photomask in an optical system. The present invention relates to a photomask in which accuracy is maintained and production efficiency of pattern formation is not hindered, and a color filter manufacturing method for inexpensively forming various laminated photo spacers having different color filter shapes on the same substrate.

  FIG. 21 is a cross-sectional view schematically showing an example of a color filter for a liquid crystal display device provided with two types of photo spacers. As shown in FIG. 21, in this color filter for a liquid crystal display device, a black matrix (41), a colored pixel (42), and a transparent conductive film (43) are sequentially formed on a glass substrate (40). A photo spacer is formed on the conductive film (43). This photospacer is composed of a first photospacer (PS-1) and a second photospacer (PS-2).

The first photospacer (PS-1) sets a gap between the substrates. The first photospacer (PS-1) is deformed when a load is applied to the panel, and is restored when the load is removed. Moreover, it has the elasticity which deform | transforms following the thermal expansion and thermal contraction of the liquid crystal with temperature.
The second photospacer (PS-2) is a (ΔH) photospacer having a lower height than the first photospacer (PS-1). The second photospacer (PS-2) is for preventing the plastic deformation and destruction of the first photospacer (PS-1) by dispersing the load when an excessive load is applied to the panel.

  The first photo spacer (PS-1) and the second photo spacer (PS-2) are photo spacers provided in the display portion of the color filter, that is, the region where the colored pixels are formed. Also, the black matrix frame and the glass substrate that surround the display part so that the photo spacer on the peripheral part of the display part is not deformed excessively by the load applied when assembling the panel by attaching the color filter and the counter substrate. Photo spacers are also provided on the peripheral edge of the slab. This photo spacer outside the display portion is called a dummy photo spacer.

  FIG. 22 is an example in which four color filters (40) having a diagonal size of 17 are attached to a large glass substrate, for example, a glass substrate (50) of 650 mm × 850 mm. As shown in FIG. 22, the large-sized glass substrate (50) has a display part (A) of the color filter and regions (B) such as a frame part of the black matrix, an inter-surface part, and a peripheral part of the glass substrate. It is configured. The display unit (A) is provided with the first photospacer (PS-1) and the second photospacer (PS-2). A dummy photospacer (D-PS) is provided in the region (B) such as the peripheral edge.

FIG. 23 is a plan view showing an example of the arrangement of dummy photospacers (D-PS) by enlarging one corner (C) of the large-sized glass substrate (50) in FIG. As shown in FIG. 23, in this example, the same dummy photospacer (D-PS) is provided at an equal pitch (Pi-2) on the entire surface of this region.
Although not shown, in FIG. 23, the display portion (A) includes red, green, and blue colored pixels, and the first photo spacer (PS-1) and the second photo spacer (PS-2). Is provided.

  When manufacturing such a color filter for a liquid crystal display device, after forming a black matrix (41), a colored pixel (42), a transparent conductive film (43), etc. on a glass substrate (40), the color filter In the display part (A), the first photo spacer (PS-1) and the second photo spacer (PS-2) are provided, and in the area (B) such as the peripheral part, a dummy photo spacer (D-PS) is provided. Form. For this reason, one step of forming the photo spacer is added to manufacture a color filter having a desired specification.

  On the other hand, FIGS. 24A and 24B are a cross-sectional view and a plan view of another example of a color filter for a liquid crystal display device provided with a photospacer. The photospacer has a laminated structure. . By forming a plurality of layers constituting the photospacer simultaneously with the formation of the colored pixels, one additional step for forming the photospacer can be reduced, and a color filter provided with the photospacer can be manufactured at low cost. it can.

  As shown in FIG. 24, the laminated photo spacer (PS-11) shown as another example includes a red dot pattern (P1) of the first color on the glass substrate (40) and a green dot pattern of the second color ( P2) and a blue dot pattern (P3) of the third color are stacked. The planar shape of the laminated photospacer (PS-11) is dot-like as with the first photospacer (PS-1) and the second photospacer (PS-2).

  The first color red dot pattern (P1) is not continuous with the first color red colored pixel (42R) but is an independent pattern, but formed simultaneously with the formation of the red colored pixel (42R). It is. The green dot pattern (P2) and the blue dot pattern (P3) are also independent patterns, and are formed simultaneously with the formation of the respective colored pixels. Therefore, the additional step for forming the photospacer is unnecessary.

25A to 25D are cross sections showing another second example of a color filter in which a black matrix (41), a colored pixel (42), and a laminated photo spacer are formed on a glass substrate (40). FIG. The laminated photospacer includes two types of laminated photospacers (FIGS. 25A to 25B) in the display portion (A), a single-layer photospacer (FIG. 25C), and a portion outside the display portion (A). It is composed of four types of photo spacers of laminated photo spacers (FIG. 25 (d)).
As shown to Fig.25 (a), the 1st lamination | stacking photospacer (PS-21) is formed on the glass substrate (40) between the red coloring pixels (42R) in a display part (A). . The first laminated photo spacer (PS-21) has a dot shape in the same manner as the laminated photo spacer (PS-11) shown in FIG.

The second laminated photospacer (PS-22) is formed on the glass substrate (40) between the green colored pixels (42G) in the display section (A) as shown in FIG. 25 (b). And composed of a red dot pattern (P2R) and a green dot pattern (P3G).
Further, as shown in FIG. 25 (c), the photo spacer formed on the glass substrate (40) between the blue colored pixels (42B) in the display portion (A) is a single layer red dot pattern (P3R). It is.
The heights of the second laminated photospacer (PS-22) and the single-layered photospacer (PS-23) are both lower than the height of the first laminated photospacer (Ps-21).

Further, as shown in FIG. 25 (d), the dummy laminated photo spacer (D-PS-2) is provided in a region (B) such as a peripheral portion of the glass substrate, and a red dot pattern (D- P1R), green dot pattern (D-P2G), and blue dot pattern (D-P3B)
) And. The relationship between these four heights is approximately [(PS-21) ≈ (D-PS-2)]>(PS-22)> (PS-23)].

  On the other hand, when a large number of color filters are manufactured, a color filter having a size corresponding to a single liquid crystal display device is often manufactured in a state where the filter is multifaceted on a large glass substrate. For example, a 17-inch diagonal color filter is manufactured by attaching four faces to a large glass substrate of about 650 mm × 850 mm.

The exposure at this time is performed using a photomask in which, for example, a mask pattern for forming a color filter having a diagonal size of 17 inches is provided on a mask substrate having a size approximately equal to the size of the glass substrate. The method is widely adopted. This is a so-called batch exposure method in which the entire four screens of the four-sided mask pattern are collectively performed by one exposure.
When manufacturing such a color filter provided with four types of photo spacers, at least four large-sized photomasks of black matrix and three colored pixels are used, which increases the cost of the photomask. .

  In order to solve the problem of high cost due to the increase in mask size and the problem of bending due to the mask's own weight, the exposure method is uniaxial from the batch exposure method from the fourth generation with a glass substrate size of, for example, about 730 mm × 920 mm. The step exposure method begins to be adopted, and the glass substrate size shifts from the fifth generation of, for example, about 1000 mm × 1200 mm to the XY (biaxial) step exposure method (so-called step-and-repeat method). ing.

FIG. 26 is a plan view for explaining an example of step exposure when manufacturing a color filter by the XY step exposure method.
The example shown in FIG. 26 is an example in which six exposures of the first exposure to the sixth exposure were performed on the large-sized glass substrate (50). Each exposure after the second exposure is performed every five step movements (Py, Px) counted from the first exposure. Reference numerals (1Ex to 6Ex) represent first to sixth exposure regions, respectively.

By shifting to such a step exposure method, an increase in cost due to an increase in mask size is suppressed, and the problem of bending due to its own weight has been solved.
However, as the size of the glass substrate shifts to, for example, the sixth generation of about 1500 mm × 1800 mm or the eighth generation of, for example, about 2100 mm × 2400 mm, the mask size increases. Accompanying, the high cost and the problem of deflection are rekindling.

  Therefore, in order to avoid the high cost of the accompanying photomask when the size of the glass substrate is further increased, the color filter is made by reducing the mask size rather than increasing the mask size. Various exposure methods have been tried to produce the above.

  FIG. 27 is a plan view for explaining an example of slit exposure when a color filter is manufactured by slit exposure. The example shown in FIG. 27 is an example in which two exposures of a first exposure and a second exposure are performed on a large glass substrate (50). 28A and 28B are cross-sectional views taken along line XX in FIG. FIG. 28A shows a state where the first exposure is started, and FIG. 28B shows a state where the first exposure is finished.

  As shown in FIGS. 27 and 28, a photomask (PM2) is disposed above the glass substrate (50) placed on the exposure stage (60). The photomask (PM2) is fixed in the exposure apparatus and does not move in the X, Y, and Z axis directions. The exposure stage (60) below the photomask (PM2) moves at a constant speed in the X-axis direction to the left in the figure with the glass substrate (50) placed thereon. Further, step movement is performed in the Y-axis direction.

In slit exposure, a slit (opening) that is short in the length direction (X-axis direction) and long in the width direction (Y-axis direction) is provided in the exposure apparatus. In this exposure method, light is transmitted through the slit while moving in the length direction (X-axis direction) to the coating film (54) on the glass substrate (50) to expose the entire surface of the glass substrate.
Since the slit exposure at the time of manufacturing the color filter forms a stripe-shaped colored pixel, the width (Wi) corresponding to the width of the stripe of the colored pixel is used as an opening in the slit portion, and the other portion is a light-shielding portion. A photomask (PM2) is provided.

FIG. 29 is an enlarged plan view showing a slit (S) portion in an example of a photomask (PM2) used for slit exposure. This photomask (PM2) is an example corresponding to a negative photoresist.
As shown in FIG. 29, the longitudinal direction (Ls) of the slit (S) is parallel to the Y axis, and a large number of openings (51) are arranged in the longitudinal direction (Ls). The portion other than the opening (51) is a light shielding portion (52). Below the photomask (PM2), the light transmitted through the opening (51) is moved to the glass substrate (50) while moving the exposure stage (60) in the direction indicated by the white thick arrow in FIG. 29 (X-axis direction). The top coating (54) is irradiated continuously. Reference numeral (Pi) represents the pitch of the opening (51), reference numeral (Wi) represents the width of the opening (51), and reference numeral (Li) represents the length of the opening (51).

FIG. 28A shows a state in which the first exposure through the slit of the photomask (PM2) is started on the photoresist coating film (54) applied on the glass substrate (50). . Further, (b) shows a state in which the first exposure is completed. In FIG. 28, continuous exposure is given through the slits of the photomask (PM2) while moving the exposure stage (60) to the left in the figure (X-axis direction) as shown by the thick arrow in FIG. In (b), the first exposure indicated by oblique lines is terminated. The second exposure is performed after the step movement (Py) shown in FIG. 28 is given to the exposure stage (60).
As described above, the slit exposure is a method that enables exposure of a large area without increasing the mask size, but rather by reducing the mask size and extending in the X-axis direction.

  FIG. 30 is a plan view showing an example of a stripe pattern obtained by development processing after exposure. As shown in FIG. 16, a stripe pattern having a pitch (Pi) and a width (Wi), for example, a stripe-shaped colored pixel (22) is formed on a glass substrate (50).

FIG. 31 is an explanatory view showing an example of a color filter manufactured by such slit exposure. As shown in FIG. 31, this color filter is in a state in which colored pixels (22R, 22G, 22B) of red, green, and blue are formed on a glass substrate on which a black matrix (21) is formed. .
The colored pixels of each color are continuous stripes without interruption between pixels in the X-axis direction in FIG. Further, in the Y-axis direction, each of the stripe-like colored pixel columns is repeatedly arranged in the order of red, green, and blue. That is, this is an example in which the slit exposure method is suitably applied.
Note that FIG. 31 is a diagram obtained by rotating FIG. 30 by 90 degrees for the sake of explanation.

  Compared with the method of manufacturing by the XY step exposure, the method of manufacturing a color filter by slit exposure as described above certainly forms a stripe pattern on the entire surface of a large glass substrate with a small photomask. Is possible. However, the above-described method by slit exposure restricts the pattern to be formed to a stripe shape and cannot be applied to the formation of an arbitrarily shaped pattern such as a rectangular colored pixel or a circular photo spacer. .

  As another example of slit exposure when manufacturing a color filter by slit exposure, there is a pulse light exposure method using a small photomask, that is, exposure using pulsed light (see Patent Document 1). This method makes it possible to form a pattern of an arbitrary shape such as a rectangular colored pixel or a circular photo spacer on a large glass substrate using a small photomask.

  In this type of exposure apparatus, for example, as shown in FIGS. 27 and 28, a photomask (PM2) is disposed above a glass substrate (50) placed on an exposure stage (60). is there. The photomask (PM2) is fixed in the exposure apparatus, and the exposure stage (60) below the photomask (PM2) has a glass substrate (50) placed on its left side in the figure, in the X-axis direction. To move at a constant speed. Further, step movement is performed in the Y-axis direction.

FIG. 29 is an enlarged plan view showing a slit (S) portion in an example of the photomask (PM2) used in this method. This photomask (PM2) is an example corresponding to a negative photoresist.
As shown in FIG. 29, the longitudinal direction (Ls) of the slit (S) is parallel to the Y axis, and a large number of openings (51) are arranged in the longitudinal direction (Ls). The opening has a shape corresponding to a pattern formed on the glass substrate, for example, a rectangular colored pixel or a circular photospacer.
The portion other than the opening (51) is a light shielding portion (52). The sign (Pi) of the opening (51) is the pitch of the opening (51), the sign (Wi) is, for example, the width of the rectangular colored pixel in the Y-axis direction, and the sign (Li) is, for example, rectangular. It represents the length of the colored pixel in the X-axis direction.

The position where the exposure stage (60) is continuously moved at a constant speed (in the X-axis direction) in the direction indicated by the white thick arrow in FIG. 29 below the photomask (PM2) to form a pattern on the glass substrate. Emits one pulse at the moment of passing under the photomask (PM2) to give exposure through the opening (51).
Since this light emission time is, for example, about several tens of microseconds, the exposure deviation remains within an allowable range.

  FIG. 32 is an explanatory diagram showing an example of a color filter manufactured by this method. FIG. 32 is a diagram for explaining in comparison with FIG. FIG. 31 shows a state in which stripe-like colored pixels obtained by slit exposure that gives continuous exposure using the small photomask are formed. FIG. 32 shows a state in which rectangular colored pixels obtained by slit exposure that gives exposure to pulsed light are formed using a small photomask provided with openings corresponding to rectangular colored pixels. It is shown.

As shown in FIG. 32, this color filter has red, green, and blue rectangular colored pixels (22R ′, 22G ′, 22B ′) formed on a glass substrate on which a black matrix (21) is formed. It is a thing of the state.
Each of the rectangular colored pixels of each color is formed at an equal pitch (Pi-4) with each pixel being cut off in the X-axis direction in FIG. Further, in the Y-axis direction, the respective rows of rectangular colored pixels are repeatedly arranged at equal pitches (Pi-5) in the order of red, green, and blue. That is, this is an example in which pulsed light dew using this small photomask is suitably applied.

Since this method repeatedly exposes the pattern provided on the photomask, it can be said to be a preferable method when a large number of the same colored pixels are formed as shown in FIG.

  Now, by this method, as shown in FIG. 23 or FIG. 25, a laminated photo spacer (and colored pixels) is formed in the display portion (A) on the glass substrate, and the region (B) such as the peripheral portion is formed. When forming two types of photo spacers (for example, W1 ≠ W2 in FIG. 25) having different shapes such as forming a dummy laminated photo spacer, as a first method, for example, a display unit ( It is conceivable to adopt a technique of two photomasks and two exposures of exposure using a photomask corresponding to A) and exposure using a photomask corresponding to a region (B) such as a peripheral portion. It is done. However, this technique is not an inexpensive technique for producing color filters.

  Alternatively, as a second method, a pattern corresponding to the display portion (A) and a pattern corresponding to the region (B) such as the peripheral portion are provided on one photomask, and a) display on the glass substrate The part (A) is exposed through a pattern corresponding to the display part (A). B) The region (B) such as the peripheral part on the glass substrate is moved by moving the position of the photomask in the optical system. C) exposure through a pattern corresponding to the region (B) such as a portion, c) again, the display portion (A) on the glass substrate is moved back to the display portion (A) by moving the position of the photomask in the optical system. Exposure through a pattern corresponding to d), e)... That is, it is conceivable to adopt a method of moving the position of the photomask in the optical system each time during one photomask and one slit exposure.

  However, if the second method is adopted, the position accuracy of the photomask in the optical system may be lowered, and each time the position of the photomask is adjusted based on the reference mark on the glass substrate. It takes a considerable amount of time to adjust this position, which has the problem of hindering production efficiency.

As described above, the manufacturing method of the color filter using the slit exposure that provides the exposure of the pulsed light using the small photomask, the size of the photomask is further increased when the size of the glass substrate is further increased. Rather, it can be said that the color filter can be manufactured by reducing the size of the photomask. However, in the method of applying pulsed light exposure, there is a problem that a pattern having a different shape cannot be provided as shown in FIG.
JP-A-11-186160 JP 2006-292955 A JP 2006-17895 A

The present invention has been made to solve the above problems, and is a small photo used for slit exposure that provides pulsed light exposure in which openings corresponding to a pattern to be formed are provided in a slit shape in the width direction of the substrate. Even if a mask is provided with openings corresponding to a plurality of types of patterns on a photomask and different patterns are formed in different regions on the same substrate, the positional accuracy of the photomask in the optical system is lowered. It is an object of the present invention to provide a photomask that can be maintained without hindering the production efficiency of pattern formation.
Further, for example, when manufacturing a color filter in which a laminated photo spacer and colored pixels are provided in the display portion (A) of the color filter and a dummy laminated photo spacer is provided in the region (B) such as the peripheral portion, pattern formation is performed. It is an object of the present invention to provide a method for manufacturing a color filter in which production efficiency is not hindered.

The present invention is a photomask that forms different patterns in different regions on the same substrate by slit exposure that provides pulsed light exposure,
1) The photomask includes a pattern mask provided with a plurality of types of pattern openings corresponding to different patterns formed on a substrate, and the plurality of types of pattern openings corresponding to each of the plurality of types of pattern openings. A translucent / light-shielding mask provided with at least one translucent opening having a shape larger than the shape of the part,
2) A transparent / shading mask is movably overlaid on the pattern mask,
3) Move the translucent and light-shielding mask on the pattern mask, and correspond to the selected pattern opening on the pattern opening arbitrarily selected from a plurality of types of pattern openings provided on the pattern mask. By superimposing the translucent openings provided in the translucent / light-shielding mask,
An opening of the photomask is the selected pattern opening, and the other part functions as a photomask which is a light shielding part.

  The present invention also provides the photomask according to the invention, wherein the different pattern is a pattern constituting a color filter.

  Further, the present invention is the photomask according to the above invention, wherein any one of the pattern openings corresponding to the dot pattern constituting the laminated photospacer or the single-layer photospacer is used as the light-transmitting opening in the light-transmitting / shading mask. One type of light-transmitting opening having a shape larger than the shape of the light-transmitting / shading mask is provided, and the light-transmitting / shading mask is a light-transmitting / shading mask common to each color.

In addition, the present invention provides a color filter manufacturing method in which different patterns are formed in different regions on the same substrate by slit exposure that provides pulsed light exposure.
1) As a photomask used when forming the different patterns, the photomask according to claim 2 or 3 is used,
2) When forming the first type pattern constituting the color filter in the first region on the substrate, the photomask is a pattern opening corresponding to the first type pattern. The other part functions as a first-type photomask which is a light-shielding part, and gives first-type exposure of pulsed light,
3) When forming the second type pattern constituting the color filter in the second region on the substrate, the photomask is an opening portion of the photomask corresponding to the second type pattern, The other part functions as a second-type photomask that is a light-shielding portion, and gives second-type exposure of pulsed light,
4) Similarly, when the (3-n) type pattern constituting the color filter is formed in the (3-n) region, the photomask is used for each of the photomasks and the opening of the photomask is (3). -N) A pattern opening corresponding to the seed pattern, and the other part functions as a (3-n) type photomask which is a light-shielding part to give the (3-n) type exposure of the pulsed light. It is a manufacturing method of the color filter characterized.

  In the color filter manufacturing method according to the present invention, the first region is a display portion of the color filter, the second region is a region such as a peripheral portion, and the first type pattern is a laminated photo spacer and coloring. A method for producing a color filter, wherein the pixel and the second type pattern are dummy laminated photo spacers.

  The present invention includes a pattern mask provided with a plurality of types of pattern openings corresponding to different patterns formed on a substrate, and one or more types of light-transmitting openings having a shape larger than the shape of the plurality of types of pattern openings. The light-transmitting / light-shielding mask provided on the pattern opening selected from the pattern mask by moving the light-transmitting / light-shielding mask on the pattern mask. By overlapping the portions, the opening of the photomask is the selected pattern opening, and the other portion is a photomask that functions as a photomask that is a light-shielding portion, so it is used for slit exposure that gives exposure to pulsed light This is a small-sized photomask, and the photomask can be maintained without deteriorating the positional accuracy of the photomask in the optical system.

  According to another aspect of the present invention, there is provided a color filter manufacturing method in which different patterns are formed in different regions on the same substrate by slit exposure that provides pulsed light exposure, and the color filter is configured in the first region using the photomask. When forming the first type pattern, the photomask functions as the first type photomask to give the first type exposure of the pulsed light, and form the second type pattern constituting the color filter in the second region. In this case, since it is a method of manufacturing a color filter that is manufactured by applying a second type exposure of pulsed light by causing the photomask to function as a second type photomask, for example, the display portion of the color filter has a laminated photospacer and Pattern formation when manufacturing color filters with dummy laminated photo spacers in areas such as colored pixels and peripheral edges Production efficiency is the method for producing a color filter that is not inhibited.

Hereinafter, embodiments of the present invention will be described in detail.
1 to 4 are explanatory views showing the configuration and principle of a photomask according to the present invention.
FIG. 1 is a plan view showing patterns when two types of patterns are formed as a plurality of types of patterns formed on a substrate. FIG. 1A shows a first type pattern (round pattern) (P11) formed in a certain area (first area) on the substrate, and FIG. 1B shows formation in another area (second area). The second type pattern (corner pattern) (P12) is illustrated. The widths of the first type and second type patterns (P11, P12) have W11 and W12, respectively, and are different.

  2A to 2C are plan views showing the configuration of the photomask according to the present invention, and FIG. 2D is a cross-sectional view taken along line XX in FIG. As shown in FIGS. 2A to 2D, the photomask (PM3) according to the present invention includes a pattern mask (P-PM) and a translucent / light-shielding mask (TS-PM). As shown in (c), the light transmitting / shading mask (TS-PM) is superimposed on the pattern mask (P-PM) so that it can move smoothly.

As shown in FIG. 2A, the photomask (PM3) includes a first type pattern opening (K1) corresponding to the first type pattern (round pattern) (P11) formed on the substrate, and a second type. A second type pattern opening (K2) corresponding to the seed pattern (corner pattern) (P12) is provided.
Further, as shown in FIG. 2B, the translucent / light-shielding mask (TS-PM) has the first type pattern opening (K1) corresponding to the first type pattern opening (K1). The first-type translucent opening (K1 ′) having a shape larger than the shape and the second-type pattern opening (K2) corresponding to the second-type pattern opening (K2) have a shape larger than the shape. A second-type light-transmitting opening (K2 ′) is provided.

In FIG. 2, the shape of the first type translucent opening (K1 ′) is similar to that of the first type pattern opening (K1), and the shape of the second type translucent opening (K2 ′) is Although it is similar to the second type pattern opening (K2), the shapes of the first type translucent opening (K1 ′) and the second type translucent opening (K2 ′) are each the first type pattern opening. If it is larger than (K1) and the second type pattern opening (K2), it is not limited to being similar.
The size of the shape of the first-type translucent opening (K1 ′) and the second-type translucent opening (K2 ′) is expressed as W11 <W11 ′, W12 as represented by the respective widths, W11 ′, W12 ′. <W12 '. Further, in FIG. 2B, two light-transmitting openings are provided, but one may be used.

FIG. 2C is a diagram in which a translucent / light-shielding mask (TS-PM) is superimposed on a pattern mask (P-PM) with reference to the alternate long and short dash line and XX line. FIG. 2C is a plan view of the photomask (PM3) of the present invention, and FIG. 2D is a cross-sectional view.
As shown in FIGS. 2C and 2D, in this state, the photomask (PM3) of the present invention has the first type pattern opening (K1) and the second type pattern of the pattern mask (P-PM). The opening (K2) is covered with a light-shielding portion of a light-transmitting / shading mask (TS-PM), and the first-type light-transmitting opening (K1 ′) and the first light-transmitting / shading mask (TS-PM) The two-type translucent opening (K2 ′) is covered with a light shielding part of the pattern mask (P-PM), and the whole functions as a light shielding part.

3 (a) and 3 (b) show a photomask (PM3) according to the present invention whose opening is a first type pattern opening (K1) corresponding to the first type pattern (round pattern) (P11). The other parts are a plan view and a cross-sectional view showing a state in which the other part functions as a first type photomask which is a light shielding part.
From the state shown in FIGS. 2 (c) and 2 (d), as shown in FIGS. 3 (a) and 3 (b), the pattern mask (P-PM) is fixed, and the light transmitting / shading mask (TS-PM) 3), as indicated by the arrow in FIG. 3, when the center of the first type translucent opening (K1 ′) is superimposed on the center of the first type pattern opening (K1), The photomask (PM3) according to the present invention is a first type photomask in which only the first type pattern opening (K1) is an opening and the other part is a light shielding part.

4A and 4B show a photomask (PM3) according to the present invention, and the opening is a second type pattern opening (K2) corresponding to the second type pattern (corner pattern) (P12). The other parts are a plan view and a cross-sectional view showing a state in which the other part functions as a second type photomask which is a light shielding part.
From the state shown in FIGS. 2 (c) and 2 (d), as shown in FIGS. 4 (a) and 4 (b), the pattern mask (P-PM) is fixed, and the translucent / light-shielding mask (TS-PM). ) Only as shown by the arrow in FIG. 4, and when the center of the second type transparent opening (K2 ′) is superimposed on the center of the second type pattern opening (K2), The photomask (PM3) according to the present invention is a second type photomask in which only the second type pattern opening (K2) is an opening, and the other part is a light shielding part.

  As described above, the photomask (PM3) according to the present invention is provided with the pattern openings (K1, K2) corresponding to the pattern to be formed on the substrate, and the pattern mask (P-PM) is kept in a fixed state. A photomask having a function of a first type photomask having a seed pattern opening (K1) and a function of a second type photomask having a second type pattern opening (K2), and the function can be arbitrarily selected. Become.

The fact that the pattern mask (P-PM) is in a fixed state means that the photo in the optical system mentioned as the problem of the second method in the slit exposure that gives pulsed light exposure in the conventional technique. The deterioration of the mask position accuracy is eliminated, and the position accuracy is always maintained.
In other words, the alignment of the photomask based on the reference mark on the glass substrate may be performed once by aligning the reference mark and the pattern mask (P-PM) during the initial adjustment of the exposure operation.

  As a result, in slit exposure that provides pulsed light exposure, even if different patterns are formed in different regions on the same substrate, the position accuracy of the photomask in the optical system is maintained without deterioration, and pattern formation Production efficiency will not be hindered.

Hereinafter, specific examples will be described.
<Example 1>
FIG. 5 is a plan view showing a configuration of a part of the color filter in the present embodiment formed on the glass substrate. In FIG. 5, red, green, and blue rectangular colored pixels (42 </ b> R, 42 </ b> G, and 42 </ b> B) are disposed in the display portion (A) above the dotted line.
In FIG. 5, the rectangular colored pixels of the respective colors are arranged at regular pitches (Pi-11) repeatedly between the pixels in the X-axis direction. Further, in the Y-axis direction, the respective rectangular colored pixels are repeatedly arranged at equal pitches (Pi-10) in the order of red, green, and blue.

The arrangement of these colored pixels (42R, 42G, 42B) is similar to the colored pixels (22R ′, 22G ′, 22B ′) in the color filter shown in FIG.
In FIG. 5, between the colored pixels of the same color in the X-axis direction, different laminated photo spacers [first laminated photo spacer (PS-21), second laminated photo spacer (PS-22), third laminated photo]. Spacers (single layer) (PS-23)] are disposed.
The positional relationship between the three colored pixels (42R, 42G, 42B) and the three types of laminated photo spacers is constant, and in the display section (A), these group patterns are arranged at the same pitch in the Y-axis direction. And arranged in the X-axis direction. That is, in the present embodiment, the group pattern is arranged as the first type pattern in the display section (A) (first region).

  In FIG. 5, a dummy laminated photospacer (D-PS-2) is disposed as a second type pattern in a region (B) (second region) such as a peripheral portion below the dotted line. The dummy laminated photospacer (D-PS-2) has a pitch in the Y-axis direction of (Pi-10) × 2 and a pitch in the X-axis direction of (Pi-13). This is different from the pitch of 1 type pattern), Y: (Pi-10), and X: (Pi-11).

  That is, the pattern constituting the color filter of the present example is the above-described group consisting of three colored pixels (42R, 42G, 42B) and three kinds of laminated photo spacers in the first region (display section (A)). The pattern is arranged as a first type pattern at a pitch, Y: (Pi-10), X: (Pi-11), and in the second region (region (B) such as a peripheral portion), the above group The dummy laminated photo spacer (D-PS-2) different from the pattern is the second type pattern, with a pitch different from the above pitch, Y: (Pi-10) × 2, X: (Pi-13) This is an example of arrangement.

The group pattern formed in the first region (display portion (A)) in FIG. 5 is a specific example corresponding to the colored pixels and photo spacers of the display portion (A) in FIG. 23, and FIG. The dummy laminated photospacer (D-PS-2) formed in the second region (region (B) such as the peripheral portion) is formed as a dummy photospacer (D-PS-2) in the region (B) such as the peripheral portion in FIG. D-PS) is a specific example.
Further, in FIG. 5, the cross section taken along line Y0-Y0 corresponds to FIG. 25A, and similarly, the cross section taken along line GG is shown in FIG. 25B and taken along line BB. 25 corresponds to FIG. 25C, and the cross section taken along line Y2-Y2 corresponds to FIG. Therefore, in FIG. 5, reference numerals (PS-21), (PS-22), and (PS-23) are laminated photospacers shown in FIG.

In FIG. 5, the center in the Y-axis direction of the red colored pixel (42R) at the upper left end is Y0, the center in the X-axis direction of the red colored pixel (42R) is X0, and this intersection is the origin (O). In the following, description will be made on the positions, pitches, overlays, movements, and the like of colored pixels and laminated photo spacers in this embodiment.

In FIG. 5, odd-numbered Y codes such as Y1, Y3, and Y5 are Y-axis directions in which colored pixels are repeatedly arranged at equal pitches in the order of red, green, and blue in the first region (display section (A)). The center of the red colored pixel in the Y-axis direction is represented in the arrangement order. Further, reference numeral X1
, X3, X5, etc., the odd-numbered X code is the center in the X-axis direction of the same-color colored pixel in the X-axis direction in which the same-colored colored pixel is repeatedly arranged at the same pitch in the first region (display section (A)). They are shown in the order of arrangement.

  Further, even Y codes such as Y2 and Y4 are in the Y-axis direction in which the dummy laminated photo spacers (D-PS-2) are repeatedly arranged at the same pitch in the second region (display unit (B)). The center of the dummy laminated photo spacer in the Y-axis direction is shown in the order of arrangement. Further, even X codes such as X2 and X4 represent the center in the X axis direction of the dummy laminated photo spacer in the X axis direction in the arrangement order.

  In this embodiment, when the color filter shown in FIG. 5 is manufactured, the red photomask (PM4-R), the green photomask (PM4-G), the blue photomask (PM4-B) according to the present invention, A total of three photomasks are used. The red photomask (PM4-R) is a red pattern of this color filter, that is, a red colored pixel (42R), and a red dot pattern (P1R, P2R, P3R, D) constituting a laminated photospacer and a dummy laminated photospacer. -P1R).

  The green photomask (PM4-G) is a green pattern of this color filter, that is, a green colored pixel (42G), and a green dot pattern (P2G, P3G, D) that constitutes a laminated photospacer and a dummy laminated photospacer. -P2G). Further, the blue photomask (PM4-B) is a blue pattern of this color filter, that is, a blue colored pixel (42B), and a blue dot pattern (P3B, D-P3B) that constitutes a laminated photospacer and a dummy laminated photospacer. ).

  The color patterns are formed in the order of red, green, and blue. When the red pattern is formed, a red photomask (PM4-R) is used to form the first region (display unit (A)). In the above, the red photomask (PM4-R) is made to function as a first type photomask to give pulsed light exposure, and the red colored pixels (42R) in the group pattern and the red constituting the laminated photospacer. Dot patterns (P1R, P2R, P3R) are formed. Further, in the second region (region (B) such as a peripheral portion), the red photomask (PM4-R) is made to function as the second type photomask to form a red dot pattern ( D-P1R).

  Similarly, when forming the green and blue patterns, each of the first regions (display unit (A)) functions as the first type photomask to form the first type pattern. In the second region (region (B) such as the peripheral portion), the second type pattern is formed by functioning as a second type photomask.

FIGS. 6A and 6B show a red pattern mask (P-PM-R) and a red light transmitting / shading mask (PM) constituting a red photomask (PM4-R) used for forming a red pattern. It is a top view of TS-PM-R). A red light-transmitting / shading mask (TS-PM-R) is superimposed on the red pattern mask (P-PM-R) to form a red photomask (PM4-R).
As shown in FIG. 6A, the red pattern mask (P-PM-R) includes a first type pattern opening corresponding to the first type pattern formed on the glass substrate and a second type pattern. A corresponding second type pattern opening is provided.

The first type pattern is the red colored pixel (42R) and the red dot pattern (P1R, P2R, P3R) constituting the laminated photo spacer, and corresponds to the above pattern shown in FIG. 5 on the basis of Y0 and X0. In the position on the red pattern mask (P-PM-R), as the first type pattern opening, [red colored pixel opening (K1-aR), red dot pattern opening ((K1-bR), ( K1-cR), (K1-dR))].
The second type pattern is a red dot pattern (D-P1R) constituting the dummy laminated photo spacer, and is located at an intermediate position between two adjacent red colored pixel openings (K1-aR), for example, Y0. A red dot pattern opening (K2-R) is provided at a position (Y2) to the right of 1/2 pitch ((Pi-10) / 2).

  FIG. 6B is a plan view of a red light transmitting / shading mask (TS-PM-R). In the red light transmitting / shading mask (TS-PM-R), the first type pattern opening [red colored pixel opening (K1-aR), red dot pattern opening ((K1-bR), (K1 -CR), (K1-dR))] corresponding to the first type pattern opening [red colored pixel opening (K1-aR), red dot pattern opening ((K1-bR), (K1-cR) ), (K1-dR))] type 1 transparent apertures [red colored pixel transparent apertures (K1-aR ′), red dot pattern transparent apertures ((K1-bR ′) ), (K1-cR ′), (K1-dR ′))].

  The red light transmitting / shading mask (TS-PM-R) is not provided with a red dot pattern light transmitting opening (K2-R ′) corresponding to the red dot pattern opening (K2-R). The red colored pixel transparent opening (K1-aR ′) also serves as the red dot pattern transparent opening (K2-R ′).

FIG. 7A shows a red photo in which a red light transmitting / shading mask (TS-PM-R) is superimposed on a red pattern mask (P-PM-R) shown in FIG. It is a top view which shows the state which functioned the mask (PM4-R) as a 1st type photomask. This is a photomask in which only the first type pattern opening ((K1-aR), (K1-bR), (K1-cR), (K1-dR)) is an opening, and the other part is a light-shielding part.
FIG. 7A shows Y0 − of the red light transmitting / shading mask (TS-PM-R) on Y0 and X0 of the red pattern mask (P-PM-R) shown in FIG. TS and X0 are superimposed.

  In this state, that is, in a state of functioning as the first type photomask, a red pattern is formed on the display portion (A). That is, pulsed light is applied through the first type photomask to form red colored pixels (42R) and red dot patterns (P1R, P2R, P3R) constituting the laminated photospacer on the display portion (A).

FIG. 7B is a plan view showing a state in which the red photomask (PM4-R) functions as the second type photomask. The second type pattern is a red dot pattern (D-P1R) that constitutes the dummy laminated photospacer, and only the second type pattern opening (red dot pattern opening (K2-R)) is used as an opening. This is a photomask having the light shielding portion as a light shielding portion.
FIG. 7B shows a state in which the red pattern mask (P-PM-R) is fixed from the state shown in FIG. 7A, and only the red light transmitting / shading mask (TS-PM-R) is used. As indicated by the arrow, move to the right and overlay Y0-TS and X0 of the red light transmitting / shading mask (TS-PM-R) on Y2 and X0 of the red photomask (PM4-R). It is a thing.

  In this state, that is, in a state of functioning as the second type photomask, a red pattern is formed in the region (B) such as the peripheral portion. That is, pulsed light is applied through the second type photomask to form a red dot pattern (D-P1R) that constitutes a dummy laminated photospacer in a region (B) such as a peripheral portion.

  FIG. 8 is a plan view of the red pattern constituting the color filter of the present embodiment obtained as described above. As shown in FIG. 8, in the first region (display section (A)) on the glass substrate, red colored pixels (42R), which are red patterns of the first type pattern, and red dots constituting the laminated photo spacers. A pattern (P1R, P2R, P3R) is formed, and a red dot pattern (D-P1R), which is a red pattern of the second type pattern, is formed in the second region (region (B) such as a peripheral portion). Is formed (see FIG. 5).

  The above description is about the formation of the red pattern of the color filter in the present embodiment. However, as is clear from the above description, the photomask according to the present invention provides not only the red pattern but also exposure of pulsed light. Even if a small photomask used for slit exposure is provided with openings corresponding to a plurality of patterns on the photomask, and different patterns are formed on different regions on the same substrate, the photomask in the optical system The photomask is maintained without deteriorating the positional accuracy and the production efficiency of pattern formation is not hindered.

FIGS. 9A and 9B show a green pattern mask (P-PM-G) and a green light transmitting / shading mask (PM) constituting a green photomask (PM4-G) used for forming a green pattern. It is a top view of TS-PM-G). On this green pattern mask (P-PM-G), a green light transmitting / shading mask (TS-PM-G) is overlaid to form a green photomask (PM4-G).
The first type pattern is the green colored pixel (42G) and the green dot pattern (P2G, P3G) constituting the laminated photospacer, and the green color corresponding to the above pattern shown in FIG. 5 with reference to Y0 and X0. At the position on the pattern mask (P-PM-G), as the first type pattern opening, [green colored pixel opening (K1-aG), green dot pattern opening ((K1-cG), (K1- dG))].
The second type pattern is a green dot pattern (D-P2G) that constitutes the dummy laminated photo spacer, and the green dot pattern is located at an intermediate position between two adjacent green colored pixel openings (K1-aG). An opening (K2-G) is provided.

FIG. 9B is a plan view of the green light transmitting / shading mask (TS-PM-G). In the green light transmitting / shading mask (TS-PM-G), the first type light transmitting opening corresponding to the first type pattern opening and having a shape larger than the first type pattern opening [green Colored pixel translucent openings (K1-aG ′), green dot pattern translucent openings ((K1-cG ′), (K1-dG ′))] are provided.
FIG. 10A is a plan view showing a state in which the green photomask (PM4-G) functions as the first type photomask. This is a photomask in which only the first type pattern opening [(K1-aG), (K1-cG), (K1-dG)] is an opening and the other part is a light-shielding part.

In this state, that is, in a state of functioning as the first type photomask, a green pattern is formed on the display portion (A). That is, pulse light is applied through the first type photomask to form green colored pixels (42G) and green dot patterns (P2G, P3G) constituting the laminated photospacer on the display portion (A).
FIG. 10B is a plan view showing a state in which the green photomask (PM4-G) functions as the second type photomask. This is a photomask in which only the second type pattern opening (green dot pattern opening (K2-G)) is an opening and the other part is a light shielding part.

In this state, that is, in a state of functioning as the second type photomask, Y2-G (Y0-G-TS) of the green photomask (PM4-G) is moved to Y2 as indicated by the white arrow. Then, a green pattern is formed in the region (B) such as the peripheral edge.
That is, pulsed light is applied through the second type photomask to form a green dot pattern (D-P2G) that constitutes a dummy laminated photospacer in a region (B) such as a peripheral portion.

  FIG. 11 is a plan view of a green pattern constituting the color filter of the present embodiment obtained as described above. As shown in FIG. 11, in the first region (display unit (A)) on the glass substrate, a green colored pixel (42G), which is a green pattern of the first type pattern, and a green dot constituting the laminated photo spacer A pattern (P2G, P3G) is formed, and a green dot pattern (D-P2G), which is a green pattern of the second type pattern, is formed in the second region (region (B) such as a peripheral portion). (See FIG. 5).

FIGS. 12A and 12B show a blue pattern mask (P-PM-B) and a blue light transmitting / shading mask (PM) constituting a blue photomask (PM4-B) used for forming a blue pattern. It is a top view of TS-PM-B). The first type pattern is the blue colored pixel (42B) and the blue dot pattern (P3B) constituting the laminated photo spacer, and the blue pattern corresponding to the above pattern shown in FIG. 5 with reference to Y0 and X0. [Blue colored pixel opening (K1-aB), blue dot pattern opening (K1-dB)] is provided as a first type pattern opening at a position on the mask (P-PM-B).
The second type pattern is a blue dot pattern (D-P3B) that constitutes the dummy laminated photospacer, and a blue dot pattern at a middle position between two adjacent blue colored pixel openings (K1-aB). An opening (K2-B) is provided.

FIG. 12B is a plan view of a blue light transmitting / shading mask (TS-PM-B). In the blue light transmitting / shading mask (TS-PM-B), a first type transparent opening corresponding to the first type pattern opening and having a shape larger than the first type pattern opening [blue Colored pixel transparent opening (K1-aB ′), blue dot pattern transparent opening (K1-dB ′)] is provided.
FIG. 13A is a plan view showing a state in which the blue photomask (PM4-B) functions as the first type photomask. This is a photomask in which only the first type pattern opening [(K1-aB), (K1-dB)] is an opening and the other part is a light-shielding part.

In this state, that is, in a state of functioning as the first type photomask, a blue pattern is formed on the display portion (A). That is, pulse light is applied through the first type photomask to form blue colored pixels (42B) and a blue dot pattern (P3B) constituting the laminated photospacer on the display portion (A).
FIG. 13B is a plan view showing a state in which the blue photomask (PM4-B) functions as the second type photomask. This is a photomask in which only the second type pattern opening (blue dot pattern opening (K2-B)) is an opening and the other part is a light shielding part.

In this state, that is, in a state of functioning as the second type photomask, Y2-B (Y0-B-TS) of the blue photomask (PM4-B) is moved to Y2 as indicated by a white arrow. Then, a blue pattern is formed in the region (B) such as the peripheral edge.
In other words, pulsed light is applied through the second type photomask to form a blue dot pattern (D-P3B) that constitutes a dummy laminated photospacer in a region (B) such as a peripheral portion.

  FIG. 14 is a plan view of a blue pattern constituting the color filter of the present example obtained as described above. As shown in FIG. 14, in the first region (display portion (A)) on the glass substrate, blue colored pixels (42B), which are blue patterns of the first type pattern, and blue dots constituting the laminated photo spacer A pattern (P3B) is formed, and a blue dot pattern (D-P3B), which is a blue pattern of the second type pattern, is formed in the second region (region (B) such as a peripheral portion). (See FIG. 5).

  As described above, the color filter manufacturing method according to the present invention uses the red photomask (PM4-R), the green photomask (PM4-G), and the blue photomask (PM4-B) according to the present invention. In each exposure, in the first region (display portion (A)), the first region (display portion (A)) functions as a first-type photomask and is exposed to pulsed light, and the second region (region (B) such as a peripheral portion). ) Is used as a second type photomask to provide pulsed light exposure. For example, in the display portion (A) of the color filter, in the region (B) such as the laminated photo spacer, the colored pixels, and the peripheral portion. Is a method of manufacturing a color filter that does not hinder the production efficiency of pattern formation when manufacturing a color filter provided with a dummy laminated photo spacer.

<Example 2>
Example 2 is an example of a photomask according to claim 3. In Example 1, when producing the color filter shown in FIG. 5, a red photomask (PM4-R), a green photomask (PM4-G), and a blue photomask (PM4-B), three in total. This photomask is used. The red photomask (PM4-R) is composed of a red pattern mask (P-PM-R) and a red light transmitting / shading mask (TS-PM-R), and a green photomask (PM4-G). Is composed of a green pattern mask (P-PM-G) and a green light transmitting / shading mask (TS-PM-G), and a blue photomask (PM4-B) is a blue pattern mask (PM P-PM-B) and a blue light transmitting / shading mask (TS-PM-B). That is, three pattern masks and three light-transmitting / light-shielding masks that are paired with each pattern mask are used.

In the present invention, the pattern mask is three pattern masks corresponding to each color, but the light transmitting / shading mask is replaced with three pattern masks [(P-PM-R), (P-PM) corresponding to each color. -G), (P-PM-B)] is a common light-transmitting / shading mask that can be paired in common.
In this common translucent / shading mask (TS-PM-ALL), as a translucent opening, one type of common use having a shape larger than the shape of the opening corresponding to each color-colored pixel having the same size of a rectangular shape is used. A plurality of colored pixel transparent openings (K1-aALL) are provided.

In addition, in this common light-transmitting / shading mask (TS-PM-ALL), the shape of any pattern opening corresponding to the dot pattern constituting the laminated photo-spacer or the single-layer photo-spacer as the light-transmitting opening A plurality of common dot pattern transparent openings (K1-bALL) having a larger shape are provided.
By using the photomask (PM5) of the present invention, the number of translucent / light-shielding masks is reduced from three to one.

FIG. 15 is a plan view showing a configuration of a red photomask (PM5-R) in the photomask (PM5) according to the present invention. The red pattern mask (P-PM-R) shown in FIG. 15A is the same as the red pattern mask (P-PM-R) of the first embodiment. FIG. 15B is a plan view of a common light-transmitting / shading mask (TS-PM-ALL). As shown in FIG. 15B, one kind of common colored pixel transparent opening (K1-aALL) having a shape larger than the shape of the opening corresponding to each color pixel is provided. The size of the common colored pixel transparent opening (K1-aALL) is substantially the same as the size of the red colored pixel transparent opening (K1-aR ′).

  Further, the common dot pattern transparent opening ((K1) having a shape larger than any of the red dot pattern openings ((K1-bR), (K1-cR), (K1-dR)). The common dot pattern transparent opening ((K1-bALL)) is approximately the same size as the red dot pattern transparent opening (K1-bR ′). is there.

  FIG. 16A shows a state where the red photomask (PM5-R) functions as the first type photomask, and FIG. 16B shows a state where the red photomask functions as the second type photomask. Is. The method of superimposing and moving the common light-transmitting / shading mask (TS-PM-ALL) on the red pattern mask (P-PM-R) is the same as in the first embodiment.

  A red pattern is formed on the display portion (A) in a state where it functions as a first type photomask, and a region (B) such as a peripheral portion is formed in a state where it functions as a second type photomask. A red pattern is formed. As a result, the red colored pixels (42R) and the red dot patterns (P1R, P2R, P3R) constituting the laminated photo spacer are formed on the display portion (A), and the dummy laminated photo spacer is formed on the region (B) such as the peripheral portion. A red dot pattern (D-P1R) that forms a red pattern shown in FIG. 8 is obtained.

  FIG. 17 is a plan view showing the configuration of the green photomask (PM5-G) in the photomask (PM5) according to the present invention. The green pattern mask (P-PM-G) shown in FIG. 17A is the same as the green pattern mask (P-PM-G) of the first embodiment. FIG. 17B is the same as the common light transmitting / shading mask (TS-PM-ALL) shown in FIG.

  FIG. 18A shows a state in which the green photomask (PM5-G) functions as the first type photomask, and the common light transmission to the green pattern mask (P-PM-G). The light shielding mask (TS-PM-ALL) is overlaid with [(Y0-TS), X0] over [(Y0-G), X0]. Further, (b) shows a state of functioning as a second type photomask, which is a common light transmitting / shading mask (TS-PM-ALL) to the green pattern mask (P-PM-G). Is overlapped with [(Y0-TS), X0] on [(Y2-G), X0].

  A green pattern is formed on the display portion (A) in a state where it functions as a first type photomask, and a region (B) such as a peripheral portion is formed in a state where it functions as a second type photomask. A green pattern is formed. Thereby, the green colored pixel (42G) and the green dot pattern (P2G, P3G) constituting the laminated photo spacer are formed on the display portion (A), and the dummy laminated photo spacer is constituted on the region (B) such as the peripheral portion. The green dot pattern (D-P2G) to be formed is formed, and the green pattern shown in FIG. 11 is obtained.

  FIG. 19 is a plan view showing a configuration of a blue photomask (PM5-B) in the photomask (PM5) according to the present invention. The blue pattern mask (P-PM-B) shown in FIG. 19A is the same as the blue pattern mask (P-PM-B) of the first embodiment. FIG. 19B is the same as the common light transmitting / shading mask (TS-PM-ALL) shown in FIG.

FIG. 20A shows a state where the blue photomask (PM5-B) functions as the first type photomask, and the common light transmission to the blue pattern mask (P-PM-B). The light shielding mask (TS-PM-ALL) is overlaid with [(Y0-TS), X0] over [(Y0-B), X0]. Further, (b) shows a state of functioning as a second type photomask, which is a common light transmitting / shading mask (TS-PM-ALL) to the green pattern mask (P-PM-G). The overlay of [(Y2
-B), X0] is overlaid with [(Y0-TS), X0].

  A blue pattern is formed on the display portion (A) in a state of functioning as a first type photomask, and a region (B) such as a peripheral portion is formed in a state of functioning as a second type photomask. A blue pattern is formed. Thus, the blue colored pixels (42B) and the blue dot pattern (P3B) constituting the laminated photo spacer are formed on the display portion (A), and the blue constituting the dummy laminated photo spacer is formed in the region (B) such as the peripheral portion. A dot pattern (D-P3B) is formed, and the blue pattern shown in FIG. 14 is obtained.

It is a top view which shows the pattern at the time of forming two types of patterns. (A)-(c) is a top view which shows the structure of the photomask by this invention. (D) is sectional drawing in the XX line of FIG.2 (c). (A), (b) is the top view and sectional drawing which show the state which functioned the photomask by this invention as a 1st type photomask. (A), (b) is the top view and sectional drawing which show the state which functioned the photomask by this invention as a 2nd type photomask. It is a top view which shows the structure of a part of color filter in a present Example. (A), (b) is a top view of a red pattern mask and a red light transmitting / shading mask. (A) is a top view which shows the state which functioned the photomask for red as a 1st type photomask. (B) is a top view which shows the state which functioned the photomask for red as a 2nd type photomask. It is a top view of the red pattern which comprises the color filter of a present Example. (A), (b) is a top view of the green pattern mask and the green translucent and light shielding mask. (A) is a top view which shows the state which functioned the green photomask as a 1st type photomask. (B) is a top view which shows the state which functioned the green photomask as a 2nd type photomask. It is a top view of the green pattern which comprises the color filter of a present Example. (A), (b) is a top view of a blue pattern mask and a blue translucent / light-shielding mask. (A) is a top view which shows the state which functioned the photomask for blue as a 1st type photomask. (B) is a top view which shows the state which functioned the photomask for blue as a 2nd type photomask. It is a top view of the blue pattern which comprises the color filter of a present Example. It is a top view which shows the structure of the photomask for red in the photomask by this invention. (A) shows a state in which the red photomask functions as the first type photomask. (B) shows the state which functions as a second type photomask. It is a top view which shows the structure of the photomask for green in the photomask by this invention. (A) shows a state in which the green photomask functions as the first type photomask. (B) shows the state which functions as a second type photomask. It is a top view which shows the structure of the photomask for blue by this invention. (A) shows a state in which the blue photomask functions as the first type photomask. (B) shows the state which functions as a second type photomask. It is sectional drawing which showed typically an example of the color filter for liquid crystal display devices which provided two types of photo spacers. In this example, four color filters having a diagonal size of 17 are attached to a large glass substrate. It is a top view which expands the corner of the large sized glass substrate in FIG. 22, and shows an example of the arrangement | sequence of a dummy photo spacer. (A), (b) is sectional drawing and the top view of the other example of the color filter for liquid crystal display devices which provided the photo spacer. (A)-(d) is sectional drawing which shows the other 2nd example of the color filter in which the lamination | stacking photospacer was formed. It is a top view explaining an example of step exposure. It is a top view explaining an example of slit exposure. (A), (b) is sectional drawing in the XX of FIG. It is a top view which expands and shows the part of the slit in an example of the photomask used for slit exposure. It is a top view which shows an example of the obtained stripe pattern. It is explanatory drawing which shows an example of the color filter manufactured by slit exposure. It is explanatory drawing which shows an example of the color filter in which the rectangular colored pixel was formed by slit exposure.

Explanation of symbols

21, 41 ... Black matrix 22, 42 ... Colored pixel 40 ... Glass substrate 43 ... Transparent conductive film 50 ... Large glass substrate A ... Color filter display B ... A region D-PS such as a peripheral portion Dummy photo spacer D-PS-2 Dummy laminated photo spacer K1 First type pattern opening K2 Second type pattern opening K1 ′ ..First-type translucent openings K2 ′... Second-type translucent openings K1-aR, K1-aG, K1-aB... Red, green, and blue colored pixel openings K1-aR ′, K1 -AG ', K1-aB' ... red, green, blue colored pixel transparent openings K1-bR, K1-cR, K1-dR, K2-R ... red dot pattern openings K1-bR ', K1-cR ′, K1-dR ′, K2-R ′... Red dot pattern Translucent openings K1-cG, K1-dG, K2-G... Green dot pattern openings K1-cG ′, K1-dG ′, K2-G ′... Green dot pattern translucent openings K1-dB , K2-B ... Blue dot pattern opening K1-dB ', K2-B' ... Blue dot pattern light-transmitting opening TS-PM-ALL ... Common light-transmitting / shading mask K1-aALL- .. Common colored pixel transparent openings K1-bALL ... Common dot pattern transparent openings P1, P2, P3 ... Dot patterns P1R, P2R, P3R, D-P1R ... Red dot pattern P2G , P3G, D-P2G ... green dot patterns P3B, D-P3B ... blue dot patterns P11, P12 ... first type, second type pattern PM, PM2 ... photomasks PM3, PM4, PM5 ... Photomasks PM4-R, PM4-G, PM4-B according to the present invention Photomasks for red, green, and blue according to the present invention PM5-R, PM5-G, PM5-B ... this Photomasks P-PM for red, green and blue according to the invention: pattern masks P-PM-R, P-PM-G, P-PM-GB: pattern masks for red, green and blue PS-1, PS-2 ... 1st, 2nd photo spacer PS-11 ... Laminated photo spacer PS-21 ... 1st laminated photo spacer PS-22 ... 2nd laminated photo spacer PS- 23 ... Third laminated photo spacer (single layer)
TS-PM: Translucent / shield mask TS-PM-R, TS-PM-G, TS-PM-B ... Red, green, blue translucent / shield mask

Claims (5)

A photomask that forms different patterns in different regions on the same substrate by slit exposure that provides pulsed light exposure,
1) The photomask includes a pattern mask provided with a plurality of types of pattern openings corresponding to different patterns formed on a substrate, and the plurality of types of pattern openings corresponding to each of the plurality of types of pattern openings. A translucent / light-shielding mask provided with at least one translucent opening having a shape larger than the shape of the part,
2) A transparent / shading mask is movably overlaid on the pattern mask,
3) Move the translucent and light-shielding mask on the pattern mask, and correspond to the selected pattern opening on the pattern opening arbitrarily selected from a plurality of types of pattern openings provided on the pattern mask. By superimposing the translucent openings provided in the translucent / light-shielding mask,
An opening of the photomask is the selected pattern opening, and the other portion functions as a photomask which is a light shielding portion.   The photomask according to claim 1, wherein the different pattern is a pattern constituting a color filter.   In the translucent / light-shielding mask, one kind of translucent opening having a shape larger than any of the pattern opening portions corresponding to the dot pattern constituting the laminated photo spacer or the single layer photo spacer as the translucent opening portion. The photomask according to claim 2, further comprising a light transmitting / shading mask common to each color. In a manufacturing method of a color filter that forms different patterns in different regions on the same substrate by slit exposure that gives pulsed light exposure,
1) As a photomask used when forming the different patterns, the photomask according to claim 2 or 3 is used,
2) When forming the first type pattern constituting the color filter in the first region on the substrate, the photomask is a pattern opening corresponding to the first type pattern. The other part functions as a first-type photomask which is a light-shielding part, and gives first-type exposure of pulsed light,
3) When forming the second type pattern constituting the color filter in the second region on the substrate, the photomask is an opening portion of the photomask corresponding to the second type pattern, The other part functions as a second-type photomask that is a light-shielding portion, and gives second-type exposure of pulsed light,
4) Similarly, when the (3-n) type pattern constituting the color filter is formed in the (3-n) region, the photomask is used for each of the photomasks and the opening of the photomask is (3). -N) A pattern opening corresponding to the seed pattern, and the other part functions as a (3-n) type photomask which is a light-shielding part to give the (3-n) type exposure of the pulsed light. A method for producing a color filter.   The first region is a display portion of a color filter, the second region is a region such as a peripheral portion, the first type pattern is a laminated photo spacer and a colored pixel, and the second type pattern is a dummy laminated photo spacer. The method for producing a color filter according to claim 3.

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