JP2009138116A - Cationic polymerizable resin composition and cured product thereof - Google Patents
Cationic polymerizable resin composition and cured product thereof Download PDFInfo
- Publication number
- JP2009138116A JP2009138116A JP2007316681A JP2007316681A JP2009138116A JP 2009138116 A JP2009138116 A JP 2009138116A JP 2007316681 A JP2007316681 A JP 2007316681A JP 2007316681 A JP2007316681 A JP 2007316681A JP 2009138116 A JP2009138116 A JP 2009138116A
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- Prior art keywords
- group
- resin composition
- polymerizable resin
- vinyl ether
- oligomer
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 97
- 125000002091 cationic group Chemical group 0.000 title claims abstract description 59
- -1 vinyl ether compound Chemical class 0.000 claims abstract description 109
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 48
- 125000003566 oxetanyl group Chemical group 0.000 claims abstract description 48
- 229920000642 polymer Polymers 0.000 claims abstract description 45
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 37
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 25
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 22
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims abstract description 9
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 5
- 230000003287 optical effect Effects 0.000 claims description 56
- 125000004432 carbon atom Chemical group C* 0.000 claims description 43
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 30
- 125000001424 substituent group Chemical group 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000005062 Polybutadiene Substances 0.000 claims description 12
- 229920002857 polybutadiene Polymers 0.000 claims description 12
- 239000000565 sealant Substances 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 229920005862 polyol Polymers 0.000 claims description 4
- 150000003077 polyols Chemical class 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims description 3
- 229960000834 vinyl ether Drugs 0.000 description 64
- 150000002430 hydrocarbons Chemical group 0.000 description 49
- 150000001875 compounds Chemical class 0.000 description 36
- 238000001723 curing Methods 0.000 description 34
- 125000003118 aryl group Chemical group 0.000 description 30
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- 125000000217 alkyl group Chemical group 0.000 description 26
- 238000010438 heat treatment Methods 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 20
- 125000006239 protecting group Chemical group 0.000 description 20
- 238000011156 evaluation Methods 0.000 description 18
- 125000004430 oxygen atom Chemical group O* 0.000 description 17
- 239000003505 polymerization initiator Substances 0.000 description 17
- 238000003786 synthesis reaction Methods 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 14
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 13
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- 238000005452 bending Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- 125000000962 organic group Chemical group 0.000 description 11
- 229910052717 sulfur Inorganic materials 0.000 description 11
- 125000004434 sulfur atom Chemical group 0.000 description 11
- 125000003277 amino group Chemical group 0.000 description 10
- 125000005843 halogen group Chemical group 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 10
- 239000000126 substance Substances 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 125000002947 alkylene group Chemical group 0.000 description 8
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 8
- 239000000976 ink Substances 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 125000000753 cycloalkyl group Chemical group 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 6
- 125000002252 acyl group Chemical group 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 6
- 230000001678 irradiating effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000013307 optical fiber Substances 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 239000003504 photosensitizing agent Substances 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 150000001768 cations Chemical class 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 238000005253 cladding Methods 0.000 description 5
- 125000004093 cyano group Chemical group *C#N 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000000499 gel Substances 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- 150000002440 hydroxy compounds Chemical class 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 125000005647 linker group Chemical group 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 4
- 229920006362 Teflon® Polymers 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 150000001721 carbon Chemical group 0.000 description 4
- 150000004292 cyclic ethers Chemical class 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 125000001188 haloalkyl group Chemical group 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 125000004043 oxo group Chemical group O=* 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 229920001567 vinyl ester resin Polymers 0.000 description 4
- AUXMDDWCULHEKG-UHFFFAOYSA-N (6-methyl-7-oxabicyclo[4.1.0]heptan-3-yl)methanol Chemical compound C1CC(CO)CC2OC21C AUXMDDWCULHEKG-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- HOFHXVDIJXEBAV-UHFFFAOYSA-N 3,3-bis(ethenoxymethyl)oxetane Chemical compound C=COCC1(COC=C)COC1 HOFHXVDIJXEBAV-UHFFFAOYSA-N 0.000 description 3
- CFMIGCNXWJZTQW-UHFFFAOYSA-N 3-[(4-ethenoxycyclohexyl)oxymethyl]-3-ethyloxetane Chemical compound C1CC(OC=C)CCC1OCC1(CC)COC1 CFMIGCNXWJZTQW-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- 206010040880 Skin irritation Diseases 0.000 description 3
- HKONNDAAQRGYFS-UHFFFAOYSA-N [Ir+].[Ir+].C1=CCCC=CCC1 Chemical compound [Ir+].[Ir+].C1=CCCC=CCC1 HKONNDAAQRGYFS-UHFFFAOYSA-N 0.000 description 3
- 238000012663 cationic photopolymerization Methods 0.000 description 3
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 3
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical group C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 125000000466 oxiranyl group Chemical group 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 231100000475 skin irritation Toxicity 0.000 description 3
- 230000036556 skin irritation Effects 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- RQUQHDNLHNHVFQ-UHFFFAOYSA-N (4-methoxynaphthalen-1-yl) prop-2-enoate Chemical compound C1=CC=C2C(OC)=CC=C(OC(=O)C=C)C2=C1 RQUQHDNLHNHVFQ-UHFFFAOYSA-N 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 2
- 125000005838 1,3-cyclopentylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:2])C([H])([H])C1([H])[*:1] 0.000 description 2
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 2
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- XXANACGAALOEBT-UHFFFAOYSA-N 3-ethenoxy-6-methyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC(OC=C)CC2OC21C XXANACGAALOEBT-UHFFFAOYSA-N 0.000 description 2
- USDPMXCXWHHYHG-UHFFFAOYSA-N 4-(cyclohex-3-en-1-ylmethoxy)cyclohexan-1-ol Chemical compound C1CC(O)CCC1OCC1CC=CCC1 USDPMXCXWHHYHG-UHFFFAOYSA-N 0.000 description 2
- USWKGQJGOFQMSU-UHFFFAOYSA-N 4-[(3-ethyloxetan-3-yl)methoxy]cyclohexan-1-ol Chemical compound C1CC(O)CCC1OCC1(CC)COC1 USWKGQJGOFQMSU-UHFFFAOYSA-N 0.000 description 2
- IHWSZXCSEZWRFZ-UHFFFAOYSA-N 4-[(4-ethenoxycyclohexyl)oxymethyl]-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC(OC=C)CCC1OCC1CC2OC2CC1 IHWSZXCSEZWRFZ-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000005529 alkyleneoxy group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical group C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 2
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 125000004980 cyclopropylene group Chemical group 0.000 description 2
- 125000004855 decalinyl group Chemical group C1(CCCC2CCCCC12)* 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 125000003827 glycol group Chemical group 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 2
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 239000012744 reinforcing agent Substances 0.000 description 2
- 230000001846 repelling effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 125000003003 spiro group Chemical group 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000004034 viscosity adjusting agent Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000013585 weight reducing agent Substances 0.000 description 2
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 1
- VLTYTTRXESKBKI-UHFFFAOYSA-N (2,4-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 VLTYTTRXESKBKI-UHFFFAOYSA-N 0.000 description 1
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- TXBCFLDVMGKXEO-UHFFFAOYSA-N (4-methylcyclohex-3-en-1-yl)methanol Chemical compound CC1=CCC(CO)CC1 TXBCFLDVMGKXEO-UHFFFAOYSA-N 0.000 description 1
- 125000006583 (C1-C3) haloalkyl group Chemical group 0.000 description 1
- 125000006647 (C3-C15) cycloalkyl group Chemical group 0.000 description 1
- 125000006034 1,2-dimethyl-1-propenyl group Chemical group 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- QOUXALMWSBWSDJ-UHFFFAOYSA-N 2,2-dimethylpropyl hydrogen carbonate Chemical compound CC(C)(C)COC(O)=O QOUXALMWSBWSDJ-UHFFFAOYSA-N 0.000 description 1
- WVXLLHWEQSZBLW-UHFFFAOYSA-N 2-(4-acetyl-2-methoxyphenoxy)acetic acid Chemical compound COC1=CC(C(C)=O)=CC=C1OCC(O)=O WVXLLHWEQSZBLW-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Polyethers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Optical Integrated Circuits (AREA)
Abstract
【課題】低粘度で加工性に優れ、光を照射することにより、極めて速やかに硬化して、透明性、柔軟性、及び耐熱性に優れた硬化物を得ることができるカチオン重合性樹脂組成物を提供する。
【解決手段】本発明のカチオン重合性樹脂組成物は、オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)と、分子内にオキセタン基、エポキシ基、水酸基、ビニルエーテル基、又は脂肪族又は脂環式不飽和炭化水素基を少なくとも1つ有し、分子量500以上のオリゴマー又はポリマー(C)を含むことを特徴とする。
【選択図】なしThe present invention relates to a cationic polymerizable resin composition having a low viscosity, excellent workability, and can be cured very rapidly by irradiation with light to obtain a cured product excellent in transparency, flexibility and heat resistance. I will provide a.
The cationic polymerizable resin composition of the present invention comprises an oxetane ring-containing vinyl ether compound (A) and / or an alicyclic epoxy group-containing vinyl ether compound (B), and an oxetane group, an epoxy group, a hydroxyl group, a vinyl ether in the molecule. It has at least one group, or an aliphatic or alicyclic unsaturated hydrocarbon group, and includes an oligomer or polymer (C) having a molecular weight of 500 or more.
[Selection figure] None
Description
本発明は、導波路(光導波路、電気光混載配線基板など)、光ファイバー、透明封止剤、インクジェット用インク、カラーフィルター、ナノインプリント、フレキシブル基板などの分野、特にフレキシブル光導波路、透明封止剤、ナノインプリントの分野で有用な、カチオン重合性樹脂組成物及びその硬化物に関する。 The present invention relates to fields such as waveguides (optical waveguides, electro-optical mixed wiring boards, etc.), optical fibers, transparent sealing agents, ink jet inks, color filters, nanoimprints, flexible substrates, etc., especially flexible optical waveguides, transparent sealing agents, The present invention relates to a cationically polymerizable resin composition useful in the field of nanoimprint and a cured product thereof.
電子素子間や配線基板間の高速、高密度信号伝送において、従来の電気配線による伝送では、信号の相互干渉や減衰が障壁となり、高速、高密度化の限界が見え始めている。これを打ち破るため、電子素子間や配線基板間を光で接続する技術、いわゆる光インタコネクションが検討されている。光路としては、素子や基板との結合の容易さ、及び取り扱いやすさの観点から、柔軟性を備えたフレキシブル光導波路が好適であると考えられる。 In high-speed and high-density signal transmission between electronic devices and between wiring boards, signal transmission interference and attenuation become barriers in conventional transmission using electric wiring, and the limits of high speed and high density are beginning to appear. In order to overcome this problem, a technique for optically connecting electronic elements and wiring boards, so-called optical interconnection, has been studied. As the optical path, it is considered that a flexible optical waveguide having flexibility is preferable from the viewpoint of ease of coupling with an element or a substrate and ease of handling.
従来、フレキシブル光導波路には、エポキシ系化合物が用いられている。しかしながら、エポキシ系化合物は、耐薬品性、密着性に優れた硬化物が得られるものの、重合反応性(硬化性)が低く、皮膚刺激性や毒性が高いため、取扱性や安全性に難点がある。また、ポリイミドもフレキシブル光導波路への使用が検討されているが、ポリイミドの調整は高温下で行う必要がある点、ポリマーとして扱う場合には溶剤が著しく限定される点、及び非常に高価である点などから、使用が制限される。 Conventionally, epoxy-based compounds have been used for flexible optical waveguides. However, although epoxy compounds can provide cured products with excellent chemical resistance and adhesion, they have low polymerization reactivity (curability) and high skin irritation and toxicity, so there are difficulties in handling and safety. is there. Polyimide is also being considered for use in flexible optical waveguides, but it is necessary to adjust the polyimide at a high temperature, when using it as a polymer, the solvent is extremely limited, and it is very expensive. Usage is restricted due to the point.
一方、特開平10−25262号公報や特開2003−73321号公報には、重合性化合物としていくつかの脂環式ビニルエーテル化合物が開示されている。これらの化合物は皮膚刺激性が低いため安全性は改善されるものの、耐熱性や透明性が未だ不十分であり、改善が必要であった。 On the other hand, JP-A-10-25262 and JP-A-2003-73321 disclose several alicyclic vinyl ether compounds as polymerizable compounds. Although these compounds have low skin irritation and thus safety is improved, heat resistance and transparency are still insufficient and improvement is required.
特開平10−316670号公報には、分子内にオキセタン環を有するビニルエーテル化合物が開示されている。しかしながら、この化合物はグリコール鎖が長いと、硬化物は柔軟性を有するが耐熱性、透明性の点で問題があり、グリコール鎖が短いと、硬化物の柔軟性が不足するため、必ずしも満足できるものではない。特開平7−233112号公報や特開平11−171967号公報にはシクロヘキサン環とオキシラン環とが接合した脂環エポキシ基を分子内に含むビニルエーテル化合物が開示されている。しかしながら、この化合物は耐熱性、透明性、及び硬化速度の点では優れているが、柔軟性が乏しく、フレキシブル光導波路などの柔軟性を必要とする分野では適用が難しい。 JP-A-10-316670 discloses a vinyl ether compound having an oxetane ring in the molecule. However, if this compound has a long glycol chain, the cured product has flexibility, but there is a problem in terms of heat resistance and transparency, and if the glycol chain is short, the cured product has insufficient flexibility, so it is not always satisfactory. It is not a thing. JP-A-7-233112 and JP-A-11-171967 disclose vinyl ether compounds containing an alicyclic epoxy group in which a cyclohexane ring and an oxirane ring are bonded in the molecule. However, although this compound is excellent in terms of heat resistance, transparency, and curing speed, it has poor flexibility and is difficult to apply in fields requiring flexibility such as flexible optical waveguides.
また、同様に特願2007−078858号公報、特願2007−076219号公報には、それぞれ脂環式エポキシ基含有ビニルエーテル化合物、オキセタン環含有ビニルエーテル化合物が開示されているが、これらの化合物も耐熱性、透明性、及び硬化速度の点では優れているが、柔軟性が乏しく、フレキシブル光導波路などの柔軟性を必要とする分野では適用が難しい。更に、特開2006−232988号公報にはビニルエーテル構造を含む環状エーテル化合物に両末端に水酸基を有するエポキシ化ポリブタジエンを添加する例が示されているが、反応性基としてビニルエーテルのみを含有するため、同一分子内に反応性環状エーテルを含有するビニルエーテルに比べ耐熱性、透明性が劣る。 Similarly, Japanese Patent Application No. 2007-078858 and Japanese Patent Application No. 2007-076219 disclose alicyclic epoxy group-containing vinyl ether compounds and oxetane ring-containing vinyl ether compounds, respectively, but these compounds are also heat resistant. Although it is excellent in terms of transparency and curing speed, it is poor in flexibility and difficult to apply in fields requiring flexibility such as flexible optical waveguides. Furthermore, JP-A-2006-2329298 shows an example of adding an epoxidized polybutadiene having a hydroxyl group at both ends to a cyclic ether compound having a vinyl ether structure, but contains only vinyl ether as a reactive group. Heat resistance and transparency are inferior to vinyl ethers containing reactive cyclic ethers in the same molecule.
従って、本発明の目的は、低粘度で加工しやすく、光を照射することにより、極めて速やかに硬化して、透明性、柔軟性、及び耐熱性に優れた硬化物を得ることができるカチオン重合性樹脂組成物を提供することにある。本発明に係るカチオン重合性樹脂組成物は、光ファイバー、透明封止剤、インクジェット用インク、カラーフィルター、ナノインプリント、フレキシブル基板などの分野、特にフレキシブル光導波路、透明封止剤、ナノインプリントの分野で有用である。 Accordingly, an object of the present invention is to perform cationic polymerization that is easy to process with low viscosity, and can be cured very quickly by irradiation with light to obtain a cured product having excellent transparency, flexibility, and heat resistance. It is in providing a conductive resin composition. The cationically polymerizable resin composition according to the present invention is useful in the fields of optical fibers, transparent sealants, inkjet inks, color filters, nanoimprints, flexible substrates, etc., particularly flexible optical waveguides, transparent sealants, and nanoimprints. is there.
本発明者等は、上記目的を解決するため鋭意検討した結果、カチオン重合性の環状エーテルを有するビニルエーテル化合物と、該ビニルエーテル化合物と反応し得る官能基を有する化合物を含有するカチオン重合性樹脂組成物は、低粘度で作業性に優れ、硬化速度が極めて速く、しかも、硬化することにより透明性、柔軟性、及び耐熱性に優れた硬化物を得ることができることを見出して本発明を完成させた。 As a result of intensive studies to solve the above-mentioned object, the present inventors have found that a cationic polymerizable resin composition containing a vinyl ether compound having a cationic polymerizable cyclic ether and a compound having a functional group capable of reacting with the vinyl ether compound. Has found that it is possible to obtain a cured product having low viscosity, excellent workability, extremely high curing speed, and excellent transparency, flexibility and heat resistance by curing. .
すなわち、本発明は、オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)と、分子内にオキセタン基、エポキシ基、水酸基、ビニルエーテル基、又は脂肪族若しくは脂環式不飽和炭化水素基を少なくとも1つ有し、分子量500以上のオリゴマー又はポリマー(C)を含むカチオン重合性樹脂組成物を提供する。 That is, the present invention includes an oxetane ring-containing vinyl ether compound (A) and / or an alicyclic epoxy group-containing vinyl ether compound (B), and an oxetane group, an epoxy group, a hydroxyl group, a vinyl ether group, or an aliphatic or alicyclic group in the molecule. Provided is a cationically polymerizable resin composition comprising an oligomer or polymer (C) having at least one unsaturated hydrocarbon group and having a molecular weight of 500 or more.
前記オリゴマー又はポリマー(C)としては、下記式(1a)〜(1d)
の構造又はこれらの組み合わせよりなり、末端に水酸基、若しくは水素原子を有する分子量500以上のオリゴマー又はポリマー、又は、下記式(1e)
で表され、末端に水酸基、若しくは水素原子を有する分子量500以上のオリゴマー又はポリマーであることが好ましく、少なくともエポキシ基及び脂肪族若しくは脂環式不飽和炭化水素基を有するオリゴマー又はポリマー、或いは、ポリカーボネートポリオール又は両末端に水酸基を有するエポキシ化ポリブタジエンがより好ましい。
As said oligomer or polymer (C), following formula (1a)-(1d)
Or an oligomer or polymer having a hydroxyl group or a hydrogen atom at the terminal and having a molecular weight of 500 or more, or the following formula (1e)
It is preferably an oligomer or polymer having a molecular weight of 500 or more having a hydroxyl group or a hydrogen atom at the terminal, and an oligomer or polymer having at least an epoxy group and an aliphatic or alicyclic unsaturated hydrocarbon group, or polycarbonate More preferred are polyols or epoxidized polybutadiene having hydroxyl groups at both ends.
本発明は、また、前記カチオン重合性樹脂組成物を重合させて得られる硬化物を提供する。 The present invention also provides a cured product obtained by polymerizing the cationic polymerizable resin composition.
前記硬化物により光導波路のクラッド及び/又はコアを形成することが好ましい。 It is preferable to form a clad and / or a core of the optical waveguide with the cured product.
前記カチオン重合性樹脂組成物は、フレキシブル光導波路の製造、透明封止剤、ナノインプリント用に用いられる。 The cationic polymerizable resin composition is used for the production of flexible optical waveguides, transparent sealants, and nanoimprints.
本発明は、また、フィルム上に、前記カチオン重合性樹脂組成物を塗布してクラッドベースフィルムを作製し、該クラッドベースフィルムでコアを被覆することにより光導波路を作製する光導波路の製造方法を提供する。 The present invention also provides a method for producing an optical waveguide, wherein a coating base film is prepared by applying the cationic polymerizable resin composition on a film, and an optical waveguide is manufactured by coating a core with the cladding base film. provide.
さらに、上記光導波路の製造方法により製造された光導波路を提供する。 Furthermore, the optical waveguide manufactured by the manufacturing method of the said optical waveguide is provided.
本発明は、更にまた、前記カチオン重合性樹脂組成物にナノインプリント加工を施して微細構造物を得る微細構造物の製造方法を提供する。 The present invention further provides a method for producing a fine structure, in which the cationic polymerizable resin composition is subjected to nanoimprint processing to obtain a fine structure.
本発明のカチオン重合性樹脂組成物は、カチオン重合性の環状エーテル(具体的には、オキセタン環、又は脂環エポキシ基)とビニルエーテル基とを同一分子内に有するオキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)と、該カチオン重合性の環状エーテルと反応性を有する官能基(具体的にはオキセタン基、エポキシ基、水酸基、ビニルエーテル基、又は脂肪族又は脂環式不飽和炭化水素基)を少なくとも1つ有し、分子量500以上のオリゴマー又はポリマー(C)とを含むため、粘度が低く加工が容易であり、光照射により極めて速やかに硬化することができる。このため、硬化物の生産性を向上させる効果が奏される。また、硬化することにより透明性、柔軟性、及び耐熱性に優れた硬化物を得ることができる本発明に係るカチオン重合性樹脂組成物は、光学材料として優れている。また、柔軟性に優れるため、素子や基板との結合が容易となり、取扱性、作業性に優れている。更に、毒性や皮膚刺激性が少ないため、安全性に優れている。このため、本発明に係るカチオン重合性樹脂組成物は、光ファイバー、透明封止剤、インクジェット用インク、カラーフィルター、ナノインプリント、フレキシブル基板などの分野、特にフレキシブル光導波路、光ファイバー、透明封止剤、ナノインプリントの分野で好適に使用することができる。 The cationically polymerizable resin composition of the present invention comprises an oxetane ring-containing vinyl ether compound (A) having a cationic polymerizable cyclic ether (specifically, an oxetane ring or an alicyclic epoxy group) and a vinyl ether group in the same molecule. And / or an alicyclic epoxy group-containing vinyl ether compound (B) and a functional group reactive with the cationic polymerizable cyclic ether (specifically, an oxetane group, an epoxy group, a hydroxyl group, a vinyl ether group, an aliphatic group or an aliphatic group) Since it contains at least one cyclic unsaturated hydrocarbon group) and an oligomer or polymer (C) having a molecular weight of 500 or more, it has a low viscosity and can be easily processed, and can be cured very rapidly by light irradiation. . For this reason, the effect which improves productivity of hardened | cured material is show | played. Moreover, the cationically polymerizable resin composition according to the present invention, which can obtain a cured product excellent in transparency, flexibility, and heat resistance by curing, is excellent as an optical material. Further, since it is excellent in flexibility, it can be easily combined with an element or a substrate, and is excellent in handling and workability. Furthermore, it has excellent safety because it has little toxicity and skin irritation. For this reason, the cationically polymerizable resin composition according to the present invention is used in fields such as optical fibers, transparent sealants, inkjet inks, color filters, nanoimprints, flexible substrates, particularly flexible optical waveguides, optical fibers, transparent sealants, nanoimprints. It can be suitably used in the field.
[オキセタン環含有ビニルエーテル化合物(A)]
本発明におけるオキセタン環含有ビニルエーテル化合物(A)としては、分子内にオキセタン環とビニルエーテル構造を少なくとも有する化合物であれば特に限定されない。オキセタン環含有ビニルエーテル化合物(A)の代表的な例として、下記式(2)
で表される置換又は無置換ビニル基を示す。Wは置換又は無置換ビニルオキシ基(−OR基)とオキセタン環又は環Zとを連結する連結基であって、単結合又は(g+1)価の有機基を示す。Xはオキセタン環及び環Zの置換基であって、ハロゲン原子、置換基を有していてもよい炭化水素基、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいアミノ基、保護基で保護されていてもよいカルボキシル基、保護基で保護されていてもよいスルホ基、オキソ基、ニトロ基、シアノ基、又は保護基で保護されていてもよいアシル基を示す。gは1或いは2、fは0〜5の整数、hは1或いは2を示す。g、f、hが2以上の場合、括弧内の置換基は同一であってもよく、異なっていてもよい]
で表される化合物が挙げられる。
[Oxetane ring-containing vinyl ether compound (A)]
The oxetane ring-containing vinyl ether compound (A) in the present invention is not particularly limited as long as it is a compound having at least an oxetane ring and a vinyl ether structure in the molecule. As a typical example of the oxetane ring-containing vinyl ether compound (A), the following formula (2)
The substituted or unsubstituted vinyl group represented by these is shown. W is a linking group that connects a substituted or unsubstituted vinyloxy group (—OR group) and an oxetane ring or ring Z, and represents a single bond or a (g + 1) -valent organic group. X is a substituent of the oxetane ring and ring Z, and may be protected by a halogen atom, a hydrocarbon group which may have a substituent, a hydroxyl group which may be protected by a protecting group, or a protecting group. A good amino group, a carboxyl group that may be protected with a protective group, a sulfo group that may be protected with a protective group, an oxo group, a nitro group, a cyano group, or an acyl group that may be protected with a protective group. Show. g is 1 or 2, f is an integer of 0 to 5, and h is 1 or 2. When g, f, and h are 2 or more, the substituents in parentheses may be the same or different.
The compound represented by these is mentioned.
また、前記化合物は、g=h=1の場合は、少なくとも、環Zが存在するか、Xが芳香族性又は非芳香族性の炭素環を含んでいるか、Wが芳香族性又は非芳香族性の炭素環を含んでいることが好ましい。 In addition, when g = h = 1, the compound has at least a ring Z, X contains an aromatic or non-aromatic carbocycle, or W is aromatic or non-aromatic. It preferably contains a family carbon ring.
本発明におけるオキセタン環含有ビニルエーテル化合物(A)としては、分子内にさらに芳香族性又は非芳香族性の炭素環を有するか、又は分子内にビニルエーテル構造を2以上有していることが好ましい。このような、オキセタン環を含み、且つ分子内に炭素環を有するか、又は分子内にビニルエーテル構造を2以上有するビニルエーテル化合物は、硬化速度が極めて速いだけでなく、硬化により透明性、耐熱性等の物性に優れた硬化物が得られるという大きな利点を有する。 The oxetane ring-containing vinyl ether compound (A) in the present invention preferably has an aromatic or non-aromatic carbon ring in the molecule, or has two or more vinyl ether structures in the molecule. Such a vinyl ether compound containing an oxetane ring and having a carbon ring in the molecule or having two or more vinyl ether structures in the molecule not only has an extremely fast curing speed, but also has transparency, heat resistance, etc. due to curing. It has a great advantage that a cured product having excellent physical properties can be obtained.
前記オキセタン環含有ビニルエーテル化合物(A)において、芳香族性の炭素環としては、例えば、ベンゼン環、ナフタレン環などが挙げられる。また、非芳香族性の炭素環としては、シクロプロパン環、シクロブタン環、シクロペンタン環、シクロヘキサン環、シクロオクタン環、シクロドデカン環等のシクロアルカン環(3〜15員程度のシクロアルカン環など);デカリン環、アダマンタン環、ノルボルナン環等の炭素数6〜20程度の有橋脂環式環などが挙げられる。芳香族性又は非芳香族性の炭素環は分子内に2以上あってもよい。芳香族性又は非芳香族性の炭素環は、ビニルエーテル構造とオキセタン環とを連結する連結基部位に存在している場合が多い。また、非芳香族性の炭素環はオキセタン環とともにスピロ構造を形成していてもよい。 In the oxetane ring-containing vinyl ether compound (A), examples of the aromatic carbocycle include a benzene ring and a naphthalene ring. Non-aromatic carbocycles include cyclopropane rings, cyclobutane rings, cyclopentane rings, cyclohexane rings, cyclooctane rings, cyclododecane rings, and other cycloalkane rings (such as about 3 to 15-membered cycloalkane rings). A bridged alicyclic ring having about 6 to 20 carbon atoms such as a decalin ring, an adamantane ring and a norbornane ring; There may be two or more aromatic or non-aromatic carbocycles in the molecule. An aromatic or non-aromatic carbocycle is often present at a linking group site that connects the vinyl ether structure and the oxetane ring. In addition, the non-aromatic carbocycle may form a spiro structure together with the oxetane ring.
本発明におけるオキセタン環含有ビニルエーテル化合物(A)は、芳香族性又は非芳香族性の炭素環を有する場合にはビニルエーテル構造は1つあればよく、ビニルエーテル構造を2以上有する場合には芳香族性又は非芳香族性の炭素環を有していなくてもよいが、芳香族性又は非芳香族性の炭素環を有し且つ分子内に2以上のビニルエーテル構造を有するものであってもよい。 The oxetane ring-containing vinyl ether compound (A) in the present invention may have only one vinyl ether structure when it has an aromatic or non-aromatic carbon ring, and it has aromaticity when it has two or more vinyl ether structures. Alternatively, it may not have a non-aromatic carbocyclic ring, but may have an aromatic or non-aromatic carbocyclic ring and have two or more vinyl ether structures in the molecule.
式(2)中、環Zにおける非芳香族性炭素環としては、前記例示の非芳香族性の炭素環が挙げられる。環Zとしては、シクロペンタン環又はシクロヘキサン環が好ましい。 In the formula (2), examples of the non-aromatic carbocycle in the ring Z include the non-aromatic carbocycles exemplified above. As the ring Z, a cyclopentane ring or a cyclohexane ring is preferable.
式(2)中、Rは前記式(3)で表される置換又は無置換ビニル基を示す。式(3)中、R14、R15及びR16は、同一又は異なって、水素原子又は炭素数1〜4のアルキル基を示す。炭素数1〜4のアルキル基としては、例えば、メチル、エチル、プロピル、ブチルなどの直鎖状C1-4(好ましくはC1-3)アルキル基;イソプロピル、イソブチル、s−ブチル、t−ブチルなどの分岐鎖状のC1-4(好ましくはC1-3)アルキル基などが挙げられる。R1、R2及びR3としては、それぞれ、特に水素原子又はメチル基が好ましい。式(3)で表される基の代表的な例として、ビニル基、イソプロペニル基、1−プロペニル基、2−メチル−1−プロペニル基、1,2−ジメチル−1−プロペニル基などが挙げられる。 In the formula (2), R represents a substituted or unsubstituted vinyl group represented by the formula (3). In the formula (3), R 14 , R 15 and R 16 are the same or different and represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Examples of the alkyl group having 1 to 4 carbon atoms include linear C 1-4 (preferably C 1-3 ) alkyl groups such as methyl, ethyl, propyl and butyl; isopropyl, isobutyl, s-butyl, t- Examples thereof include branched C 1-4 (preferably C 1-3 ) alkyl groups such as butyl. R 1 , R 2 and R 3 are each preferably a hydrogen atom or a methyl group. Representative examples of the group represented by the formula (3) include vinyl group, isopropenyl group, 1-propenyl group, 2-methyl-1-propenyl group, 1,2-dimethyl-1-propenyl group and the like. It is done.
式(2)中、Wは、置換又は無置換ビニルオキシ基(−OR基)とオキセタン環又は環Zとを連結する連結基であって、単結合又は(g+1)価の有機基を示す。該有機基としては、通常、隣接する酸素原子との結合部位に炭素原子を有する基が用いられる。好ましい有機基として、(i)炭化水素基、(ii)1又は2以上の炭化水素基と、酸素原子(−O−)、硫黄原子(−S−)、カルボニル基(−CO−)及びアミノ基(−NH−)から選択された少なくとも1種の基とからなる基などが挙げられる。 In formula (2), W is a linking group that links a substituted or unsubstituted vinyloxy group (—OR group) and an oxetane ring or ring Z, and represents a single bond or a (g + 1) -valent organic group. As the organic group, a group having a carbon atom at a bonding site with an adjacent oxygen atom is usually used. Preferred organic groups include (i) a hydrocarbon group, (ii) one or more hydrocarbon groups, an oxygen atom (—O—), a sulfur atom (—S—), a carbonyl group (—CO—), and amino. And a group consisting of at least one group selected from the group (—NH—).
前記炭化水素基には、脂肪族炭化水素基、脂環式炭化水素基、芳香族炭化水素基、これらが2以上結合した炭化水素基が含まれる。 The hydrocarbon group includes an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a hydrocarbon group in which two or more of these are bonded.
炭化水素基としては、2価の炭化水素基を例にとると、メチレン、メチルメチレン(エチリデン)、エチルメチレン(プロピリデン)、ジメチルメチレン(イソプロピリデン)、エチルメチルメチレン、エチレン、プロピレン、トリメチレン、テトラメチレン、ヘキサメチレン基などの炭素数1〜20(好ましくは1〜10、さらに好ましくは1〜6)程度の直鎖状又は分岐鎖状のアルキレン基;プロペニレン基などの炭素数2〜20(好ましくは2〜10、さらに好ましくは2〜6)程度の直鎖状又は分岐鎖状のアルケニレン基;1,3−シクロペンチレン、1,2−シクロへキシレン、1,3−シクロへキシレン、1,4−シクロへキシレン基などの3〜20員(好ましくは3〜15員、さらに好ましくは5〜8員)程度のシクロアルキレン基;シクロプロピレン、シクロペンチリデン、シクロヘキシリデン基などの3〜20員(好ましくは3〜15員、さらに好ましくは5〜8員)程度のシクロアルキリデン基;1,2−フェニレン、1,3−フェニレン、1,4−フェニレン基などのアリレン基(arylene);ベンジリデン基などが挙げられる。 Examples of the hydrocarbon group include a divalent hydrocarbon group, methylene, methylmethylene (ethylidene), ethylmethylene (propylidene), dimethylmethylene (isopropylidene), ethylmethylmethylene, ethylene, propylene, trimethylene, tetra Linear or branched alkylene group having about 1 to 20 carbon atoms (preferably 1 to 10, more preferably 1 to 6) such as methylene and hexamethylene groups; 2 to 20 carbon atoms such as propenylene group (preferably Is a linear or branched alkenylene group of about 2 to 10, more preferably 2 to 6); 1,3-cyclopentylene, 1,2-cyclohexylene, 1,3-cyclohexylene, 1 , 4-cyclohexylene group and the like of about 3 to 20 members (preferably 3 to 15 members, more preferably 5 to 8 members). A cycloalkylidene group of about 3 to 20 members (preferably 3 to 15 members, more preferably 5 to 8 members) such as cyclopropylene, cyclopentylidene and cyclohexylidene groups; 1,2-phenylene, 1, Examples include arylene groups such as 3-phenylene and 1,4-phenylene groups; benzylidene groups.
前記炭化水素基は置換基を有していてもよい。該置換基としては、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいヒドロキシメチル基、保護基で保護されていてもよいアミノ基、保護基で保護されていてもよいカルボキシル基、保護基で保護されていてもよいスルホ基、ハロゲン原子、オキソ基、シアノ基、ニトロ基、複素環式基、炭化水素基、ハロアルキル基などが挙げられる。保護基としては有機合成の分野で慣用の保護基を使用できる。 The hydrocarbon group may have a substituent. Examples of the substituent include a hydroxyl group which may be protected with a protective group, a hydroxymethyl group which may be protected with a protective group, an amino group which may be protected with a protective group, and a protective group. And a carboxyl group, a sulfo group optionally protected by a protecting group, a halogen atom, an oxo group, a cyano group, a nitro group, a heterocyclic group, a hydrocarbon group, a haloalkyl group, and the like. As the protecting group, a protecting group conventionally used in the field of organic synthesis can be used.
前記置換基としての複素環式基としては、窒素原子、酸素原子及び硫黄原子から選択された少なくとも1種のヘテロ原子を含む3〜15員程度の複素環式基(特に、5〜8員複素環式基)が挙げられる。 The heterocyclic group as the substituent is a heterocyclic group of about 3 to 15 members (in particular, 5 to 8 membered heterocycles) containing at least one heteroatom selected from a nitrogen atom, an oxygen atom and a sulfur atom. Cyclic group).
前記置換基としての炭化水素基には、脂肪族炭化水素基、脂環式炭化水素基、芳香族炭化水素基及びこれらの結合した基が含まれる。脂肪族炭化水素基としては、炭素数1〜20(好ましくは1〜10、さらに好ましくは1〜3)程度のアルキル基;炭素数2〜20(好ましくは2〜10、さらに好ましくは2〜3)程度のアルケニル基;炭素数2〜20(好ましくは2〜10、さらに好ましくは2〜3)程度のアルキニル基などが挙げられる。脂環式炭化水素基としては、3〜20員(好ましくは3〜15員、さらに好ましくは5〜8員)程度のシクロアルキル基;3〜20員(好ましくは3〜15員、さらに好ましくは5〜8員)程度のシクロアルケニル基;パーヒドロナフタレン−1−イル基、ノルボルニル、アダマンチル、テトラシクロ[4.4.0.12,5.17,10]ドデカン−3−イル基などの橋かけ環式炭化水素基などが挙げられる。芳香族炭化水素基としては、炭素数6〜14(好ましくは6〜10)程度の芳香族炭化水素基が挙げられる。脂肪族炭化水素基と脂環式炭化水素基とが結合した炭化水素基には、シクロペンチルメチル、シクロヘキシルメチル、2−シクロヘキシルエチル基などのシクロアルキル−アルキル基(例えば、C3-20シクロアルキル−C1-4アルキル基など)などが含まれる。また、脂肪族炭化水素基と芳香族炭化水素基とが結合した炭化水素基には、アラルキル基(例えば、C7-18アラルキル基など)、アルキル置換アリール基(例えば、1〜4個程度のC1-4アルキル基が置換したフェニル基又はナフチル基など)などが含まれる。 The hydrocarbon group as the substituent includes an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a group in which these are bonded. As an aliphatic hydrocarbon group, it is a C1-C20 (preferably 1-10, more preferably 1-3) alkyl group; C2-C20 (preferably 2-10, more preferably 2-3). Alkenyl group having about 2 to 20 carbon atoms (preferably 2 to 10 and more preferably 2 to 3). The alicyclic hydrocarbon group is a cycloalkyl group of about 3 to 20 members (preferably 3 to 15 members, more preferably 5 to 8 members); 3 to 20 members (preferably 3 to 15 members, more preferably About 5 to 8 membered cycloalkenyl group; perhydronaphthalen-1-yl group, norbornyl, adamantyl, tetracyclo [4.4.0.1 2,5 . 1 7,10 ] bridged cyclic hydrocarbon groups such as dodecan-3-yl groups. Examples of the aromatic hydrocarbon group include aromatic hydrocarbon groups having about 6 to 14 (preferably 6 to 10) carbon atoms. The hydrocarbon group in which an aliphatic hydrocarbon group and an alicyclic hydrocarbon group are bonded includes a cycloalkyl-alkyl group such as cyclopentylmethyl, cyclohexylmethyl, 2-cyclohexylethyl group (for example, C 3-20 cycloalkyl- C 1-4 alkyl group and the like). The hydrocarbon group in which an aliphatic hydrocarbon group and an aromatic hydrocarbon group are bonded to each other includes an aralkyl group (for example, a C 7-18 aralkyl group) and an alkyl-substituted aryl group (for example, about 1 to about 4). A phenyl group substituted with a C 1-4 alkyl group or a naphthyl group).
前記置換基としてのハロアルキル基としては、例えば、クロロメチル、トリフルオロメチル、2,2,2−トリフルオロエチル、ペンタフルオロエチル基などの炭素数1〜10程度のハロアルキル基(特に、C1-3ハロアルキル基)が挙げられる。 Examples of the haloalkyl group as the substituent include haloalkyl groups having about 1 to 10 carbon atoms such as chloromethyl, trifluoromethyl, 2,2,2-trifluoroethyl, and pentafluoroethyl groups (particularly, C 1- 3 haloalkyl group).
Wの好ましい例には、例えば、下記式(4)
で表される基が含まれる。
Preferred examples of W include, for example, the following formula (4)
The group represented by these is included.
A1における2価の炭化水素基としては、前記例示のものが挙げられる。なかでも、A1としては、メチレン、エチレン、プロピレン、イソピロピリデン、トリメチレン、テトラメチレン基等の炭素数1〜6の直鎖状又は分岐鎖状のアルキレン基が好ましい。 Examples of the divalent hydrocarbon group for A 1 include those exemplified above. Among these, as A 1, methylene, ethylene, propylene, Isopiropiriden, trimethylene, linear or branched alkylene group having 1 to 6 carbon atoms such as a tetramethylene group is preferable.
Y1としては、酸素原子(−O−)、硫黄原子(−S−)、カルボニル基(−CO−)、アミノ基(−NH−)、−COO−、−OCO−、−CONH−、−NHCO−等が好ましい。 As Y 1 , an oxygen atom (—O—), a sulfur atom (—S—), a carbonyl group (—CO—), an amino group (—NH—), —COO—, —OCO—, —CONH—, — NHCO- and the like are preferable.
A2における(g+1)価の炭化水素基としては、前記例示のものが挙げられる。なかでも、A2としては、単結合;メチレン、エチレン、プロピレン、イソピロピリデン、トリメチレン、テトラメチレン基等の炭素数1〜6の直鎖状又は分岐鎖状のアルキレン基、1,3−シクロペンチレン、1,2−シクロへキシレン、1,3−シクロへキシレン、1,4−シクロへキシレン基などの5〜8員のシクロアルキレン基、シクロプロピレン、シクロペンチリデン、シクロヘキシリデン基などの5〜8員のシクロアルキリデン基、1,2−フェニレン、1,3−フェニレン、1,4−フェニレン基などのアリレン基(arylene)、又はこれらが2以上結合した基等が挙げられる。 Examples of the (g + 1) -valent hydrocarbon group for A 2 include those exemplified above. Among them, as A 2 , a single bond; a linear or branched alkylene group having 1 to 6 carbon atoms such as methylene, ethylene, propylene, isopropylpyridene, trimethylene, tetramethylene group, 1,3-cyclopentylene, etc. 5 such as 5- to 8-membered cycloalkylene group such as 1,2-cyclohexylene, 1,3-cyclohexylene, 1,4-cyclohexylene group, cyclopropylene, cyclopentylidene, cyclohexylidene group, etc. And an arylene group such as an ˜8-membered cycloalkylidene group, 1,2-phenylene, 1,3-phenylene, 1,4-phenylene group, or a group in which two or more of these are bonded.
Wとしては、特に、単結合、又は炭素数1〜6の直鎖状又は分岐鎖状のアルキレン基や、該アルキレン基と酸素原子又は硫黄原子とが結合した基が好ましい。 W is particularly preferably a single bond or a linear or branched alkylene group having 1 to 6 carbon atoms, or a group in which the alkylene group is bonded to an oxygen atom or a sulfur atom.
式(2)中、Xはオキセタン環及び環Zの置換基であって、ハロゲン原子、置換基を有していてもよい炭化水素基、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいアミノ基、保護基で保護されていてもよいカルボキシル基、保護基で保護されていてもよいスルホ基、オキソ基、ニトロ基、シアノ基、又は保護基で保護されていてもよいアシル基を示す。前記保護基としては有機合成の分野で慣用の保護基が挙げられる。 In formula (2), X is a substituent of the oxetane ring and ring Z, and is a halogen atom, a hydrocarbon group which may have a substituent, a hydroxyl group which may be protected with a protecting group, or a protecting group Protected with an amino group which may be protected with, a carboxyl group which may be protected with a protective group, a sulfo group which may be protected with a protective group, an oxo group, a nitro group, a cyano group, or a protective group An acyl group that may be present is shown. Examples of the protecting group include protecting groups commonly used in the field of organic synthesis.
Xにおけるハロゲン原子としては、例えば、フッ素、塩素、臭素原子などが挙げられる。Xにおける「置換基を有していてもよい炭化水素基」の炭化水素基としては、例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、s−ブチル、t−ブチル、ヘキシル、オクチル、デシル基などの脂肪族炭化水素基(好ましくはC1-10アルキル基、さらに好ましくはC1-5アルキル基);シクロペンチル、シクロヘキシル基などの脂環式炭化水素基(好ましくは3〜15員のシクロアルキル基);フェニル、ナフチル基などの芳香族炭化水素基;これらが2以上結合した基などが挙げられる。これらの炭化水素基が有していてもよい置換基としては、例えば、フッ素、塩素、臭素原子等のハロゲン原子、メチル基などのC1-4アルキル基、トリフルオロメチル基などC1-5ハロアルキル基、ヒドロキシル基、メトキシ基などのC1-4アルコキシ基、アミノ基、ジアルキルアミノ基、カルボキシル基、メトキシカルボニル基などのアルコキシカルボニル基、ニトロ基、シアノ基、アセチル基などのアシル基等が挙げられる。 As a halogen atom in X, a fluorine, chlorine, a bromine atom etc. are mentioned, for example. Examples of the hydrocarbon group of the “hydrocarbon group which may have a substituent” in X include, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, hexyl, octyl, decyl An aliphatic hydrocarbon group such as a group (preferably a C 1-10 alkyl group, more preferably a C 1-5 alkyl group); an alicyclic hydrocarbon group such as a cyclopentyl, cyclohexyl group (preferably a 3-15 membered cyclohexane). Alkyl groups); aromatic hydrocarbon groups such as phenyl and naphthyl groups; groups in which two or more of these are bonded. Examples of the substituent that these hydrocarbon groups may have include, for example, halogen atoms such as fluorine, chlorine and bromine atoms, C 1-4 alkyl groups such as methyl groups, and C 1-5 such as trifluoromethyl groups. C 1-4 alkoxy groups such as haloalkyl groups, hydroxyl groups, methoxy groups, amino groups, dialkylamino groups, carboxyl groups, alkoxycarbonyl groups such as methoxycarbonyl groups, acyl groups such as nitro groups, cyano groups, acetyl groups, etc. Can be mentioned.
Xにおけるアシル基としては、例えば、ホルミル、アセチル、プロピオニル、ブチリル、イソブチリル、ピバロイル基などのC1-6脂肪族アシル基;アセトアセチル基;ベンゾイル基などの芳香族アシル基などが挙げられる。 Examples of the acyl group in X include C 1-6 aliphatic acyl groups such as formyl, acetyl, propionyl, butyryl, isobutyryl, and pivaloyl groups; acetoacetyl groups; aromatic acyl groups such as benzoyl groups, and the like.
Xが2以上の場合、それらが互いに結合して、式(2)中の環Z又はオキセタン環を構成する炭素原子と共に環を形成していてもよい。このような環としては、例えば、シクロペンタン環、シクロヘキサン環、パーヒドロナフタレン環(デカリン環)などの脂環式炭素環;γ−ブチロラクトン環、δ−バレロラクトン環などのラクトン環などが挙げられる。 When X is 2 or more, they may be bonded to each other to form a ring together with the carbon atom constituting the ring Z or oxetane ring in formula (2). Examples of such rings include alicyclic carbocycles such as cyclopentane ring, cyclohexane ring and perhydronaphthalene ring (decalin ring); lactone rings such as γ-butyrolactone ring and δ-valerolactone ring. .
式(2)において、gは1或いは2であり、好ましくは1である。fは0〜5の整数であり、好ましくは0〜3の整数である。hは1或いは2である。f、g、hが2以上の場合、括弧内の置換基は同一であってもよく、異なっていてもよい。なお、g=h=1の場合は、少なくとも、環Zが存在するか、Xが芳香族性又は非芳香族性の炭素環を含んでいるか、Wが芳香族性又は非芳香族性の炭素環を含んでいることが好ましい。 In the formula (2), g is 1 or 2, preferably 1. f is an integer of 0 to 5, preferably an integer of 0 to 3. h is 1 or 2. When f, g, and h are 2 or more, the substituents in parentheses may be the same or different. In addition, when g = h = 1, at least ring Z is present, X contains an aromatic or non-aromatic carbocycle, or W is an aromatic or non-aromatic carbon. It preferably contains a ring.
式(2)で表される化合物の中でも、下記式(2a)、(2b)、(2c)又は(2d)で表される化合物が好ましい。 Among the compounds represented by the formula (2), compounds represented by the following formula (2a), (2b), (2c) or (2d) are preferable.
[式中、mは0又は1を示す。R、W、Xは前記に同じ。但し、式(2b)においては、W及びXのうち少なくとも一方は芳香族性又は非芳香族性の炭素環を含んでいる] [Wherein m represents 0 or 1; R, W, and X are the same as described above. However, in the formula (2b), at least one of W and X contains an aromatic or non-aromatic carbocycle]
本発明のオキセタン環含有ビニルエーテル化合物(A)の代表的な例として、以下の化合物が挙げられる。式中、nは0〜6の整数を示す。 Typical examples of the oxetane ring-containing vinyl ether compound (A) of the present invention include the following compounds. In formula, n shows the integer of 0-6.
本発明におけるオキセタン環含有ビニルエーテル化合物(A)は、ビニルエーテル化合物の製造法として公知の反応を利用して製造することができる。好ましい態様としては、オキセタン環含有ビニルエーテル化合物(A)に対応するアルコール(ヒドロキシ化合物)とビニルエステル化合物とを遷移元素化合物の存在下で反応させる方法が挙げられる。例えば、前記式(2)で表されるオキセタン環含有ビニルエーテル化合物(A)は、式(2)においてRが水素原子であるアルコール(ヒドロキシ化合物)と、ビニルエステル化合物とを遷移元素化合物の存在下で反応させることにより製造することができる。 The oxetane ring-containing vinyl ether compound (A) in the present invention can be produced by utilizing a known reaction as a method for producing a vinyl ether compound. A preferred embodiment includes a method in which an alcohol (hydroxy compound) corresponding to the oxetane ring-containing vinyl ether compound (A) and a vinyl ester compound are reacted in the presence of a transition element compound. For example, in the oxetane ring-containing vinyl ether compound (A) represented by the formula (2), an alcohol (hydroxy compound) in which R is a hydrogen atom in the formula (2) and a vinyl ester compound are used in the presence of a transition element compound. It can manufacture by making it react.
[脂環エポキシ基含有ビニルエーテル化合物(B)]
本発明における脂環エポキシ基含有ビニルエーテル化合物(B)としては、分子内に脂環式エポキシ基(エポキシ環と脂環とが2つの炭素原子を共有している基)とビニルエーテル構造とを少なくとも有する化合物であれば特に限定されない。脂環エポキシ基含有ビニルエーテル化合物(B)の代表的な例として、下記式(5)
で表される化合物が挙げられる。
[Alicyclic epoxy group-containing vinyl ether compound (B)]
The alicyclic epoxy group-containing vinyl ether compound (B) in the present invention has at least an alicyclic epoxy group (a group in which the epoxy ring and the alicyclic share two carbon atoms) and a vinyl ether structure in the molecule. If it is a compound, it will not specifically limit. As a typical example of the alicyclic epoxy group-containing vinyl ether compound (B), the following formula (5)
The compound represented by these is mentioned.
また、前記化合物は、Ra及びRbがともに水素原子の場合は、少なくとも、環Z2が存在するか、W2が下記式(6)
で表される基であることが好ましい。
In the compound, when both R a and R b are hydrogen atoms, at least ring Z 2 is present or W 2 is represented by the following formula (6):
It is preferable that it is group represented by these.
この化合物は、脂環エポキシ基(1,2−エポキシシクロヘキサン環=7−オキサビシクロ[4.1.0]ヘプタン環からなる基)を含有するビニルエーテル化合物であって、分子内の特定位置にさらに非芳香族性の炭素環を有するか、脂環エポキシ基を構成するシクロヘキサン環とオキシラン環との接合部位にアルキル基を有している。このようなビニルエーテル化合物は、硬化速度が極めて速いだけでなく、硬化により透明性、耐熱性等の物性に優れた硬化物が得られるという大きな利点を有する。 This compound is a vinyl ether compound containing an alicyclic epoxy group (1,2-epoxycyclohexane ring = a group consisting of 7-oxabicyclo [4.1.0] heptane ring), and further at a specific position in the molecule. It has a non-aromatic carbon ring or has an alkyl group at the junction of the cyclohexane ring and oxirane ring constituting the alicyclic epoxy group. Such a vinyl ether compound has not only an extremely high curing rate, but also has a great advantage that a cured product having excellent physical properties such as transparency and heat resistance can be obtained by curing.
式(5)中、環Z2は非芳香族性炭素環を示す。環Z2は分子内に存在していてもよく、存在していなくてもよい。非芳香族性の炭素環としては、前記オキセタン環含有ビニルエーテル化合物(A)の項において挙げられた非芳香族性の炭素環の例と同様の例を挙げることができる。 In formula (5), ring Z 2 represents a non-aromatic carbocycle. Ring Z 2 may or may not be present in the molecule. Examples of the non-aromatic carbocycle include the same examples as those of the non-aromatic carbocycle exemplified in the section of the oxetane ring-containing vinyl ether compound (A).
式(5)中、Rは前記式(3)で表される置換又は無置換ビニル基を示す。式(3)中、R14、R15及びR16は、同一又は異なって、水素原子又は炭素数1〜4のアルキル基を示す。炭素数1〜4のアルキル基としては、前記オキセタン環含有ビニルエーテル化合物(A)の項において挙げられた炭素数1〜4のアルキル基の例と同様の例を挙げることができる。 In the formula (5), R represents a substituted or unsubstituted vinyl group represented by the formula (3). In the formula (3), R 14 , R 15 and R 16 are the same or different and represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. As a C1-C4 alkyl group, the example similar to the example of a C1-C4 alkyl group quoted in the term of the said oxetane ring containing vinyl ether compound (A) can be given.
式(5)中、W2は、置換又は無置換ビニルオキシ基(−OR基)とシクロヘキサン環又は環Zとを連結する連結基であって、単結合又は(m+1)価の有機基を示す。該有機基としては、通常、隣接する酸素原子との結合部位に炭素原子を有する基が用いられる。好ましい有機基として、(i)炭化水素基、(ii)1又は2以上の炭化水素基と、酸素原子(−O−)、硫黄原子(−S−)、カルボニル基(−CO−)及びアミノ基(−NH−)から選択された少なくとも1種の基とからなる基などが挙げられる。 In Formula (5), W 2 is a linking group that links a substituted or unsubstituted vinyloxy group (—OR group) and a cyclohexane ring or ring Z, and represents a single bond or an (m + 1) -valent organic group. As the organic group, a group having a carbon atom at a bonding site with an adjacent oxygen atom is usually used. Preferred organic groups include (i) a hydrocarbon group, (ii) one or more hydrocarbon groups, an oxygen atom (—O—), a sulfur atom (—S—), a carbonyl group (—CO—), and amino. And a group consisting of at least one group selected from the group (—NH—).
前記炭化水素基には、脂肪族炭化水素基、脂環式炭化水素基、芳香族炭化水素基、これらが2以上結合した炭化水素基が含まれる。 The hydrocarbon group includes an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a hydrocarbon group in which two or more of these are bonded.
炭化水素基としては、前記オキセタン環含有ビニルエーテル化合物(A)の項において挙げられた例と同様の例を挙げることができる。また、炭化水素基は置換基を有していてもよい。該置換基としては、前記オキセタン環含有ビニルエーテル化合物(A)の項において挙げられた例と同様の例を挙げることができる。 Examples of the hydrocarbon group include the same examples as those mentioned in the section of the oxetane ring-containing vinyl ether compound (A). Moreover, the hydrocarbon group may have a substituent. Examples of the substituent include the same examples as those mentioned in the section of the oxetane ring-containing vinyl ether compound (A).
W2の好ましい例としては、前記オキセタン環含有ビニルエーテル化合物(A)の項において挙げられた例と同様の例を挙げることができる。Wとしては、特に、単結合、又は炭素数1〜6の直鎖状又は分岐鎖状のアルキレン基、又は該アルキレン基と、酸素原子(−O−)、硫黄原子(−S−)及びカルボニル基(−CO−)から選択された少なくとも1つの基とが結合した基が好ましい。 Preferable examples of W 2 include the same examples as those mentioned in the section of the oxetane ring-containing vinyl ether compound (A). As W, in particular, a single bond or a linear or branched alkylene group having 1 to 6 carbon atoms, or the alkylene group, an oxygen atom (—O—), a sulfur atom (—S—) and a carbonyl group A group in which at least one group selected from the group (—CO—) is bonded is preferable.
W2のシクロヘキサン環又は環Z2における結合位置としては特に制限はないが、環Zが存在しない場合は、シクロヘキサン環におけるオキシラン環との接合位置を1位及び2位としたときの4位及び/又は5位が好ましい。 The bonding position of W 2 on the cyclohexane ring or ring Z 2 is not particularly limited. However, when ring Z is not present, the 4-position and the cyclohexane ring are bonded to the oxirane ring at the 4-position and 2-position. The fifth position is preferred.
式(5)中、Ra、Rbは、同一又は異なって、水素原子又はアルキル基を示す。アルキル基としては、例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、s−ブチル、t−ブチル、ヘキシル、オクチル、デシル基等の炭素数1〜15程度の直鎖状又は分岐鎖状アルキル基が挙げられる。これらの中でも、炭素数1〜6のアルキル基、特に炭素数1〜3のアルキル基(例えばメチル基)が好ましい。 In formula (5), R a and R b are the same or different and each represents a hydrogen atom or an alkyl group. Examples of the alkyl group include linear or branched alkyl having about 1 to 15 carbon atoms such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, hexyl, octyl, and decyl groups. Groups. Among these, an alkyl group having 1 to 6 carbon atoms, particularly an alkyl group having 1 to 3 carbon atoms (for example, a methyl group) is preferable.
式(5)において、fは1或いは2であり、好ましくは1である。hは1或いは2である。g、hが2の場合、括弧内の置換基は同一であってもよく、異なっていてもよい。また、Ra、Rbがともに水素原子である場合は、少なくとも分子内に環Z2が存在するか、W2が前記式(6)で表される基であることが好ましい。 In the formula (5), f is 1 or 2, preferably 1. h is 1 or 2. When g and h are 2, the substituents in parentheses may be the same or different. When both R a and R b are hydrogen atoms, it is preferable that at least a ring Z 2 exists in the molecule or W 2 is a group represented by the above formula (6).
式(6)において、W3は単結合又は2価の有機基を示す。2価の有機基としては、2価の炭化水素基、又は2価の炭化水素基と、酸素原子(−O−)、硫黄原子(−S−)、カルボニル基(−CO−)及びアミノ基(−NH−)から選択された少なくとも1つの基とが結合した基等が挙げられる。2価の炭化水素基としては、前記に例示したものが挙げられる。W3としては、単結合、炭素数1〜6のアルキレンオキシ基(酸素原子が右端)が特に好ましい。 In Formula (6), W 3 represents a single bond or a divalent organic group. Examples of the divalent organic group include a divalent hydrocarbon group or a divalent hydrocarbon group, an oxygen atom (—O—), a sulfur atom (—S—), a carbonyl group (—CO—), and an amino group. And a group in which at least one group selected from (—NH—) is bonded. Examples of the divalent hydrocarbon group include those exemplified above. W 3 is particularly preferably a single bond or an alkyleneoxy group having 1 to 6 carbon atoms (the oxygen atom is at the right end).
式(5)で表される化合物の中でも、下記式(5a)、(5b)又は(5c)で表される化合物が好ましい。 Among the compounds represented by the formula (5), compounds represented by the following formula (5a), (5b) or (5c) are preferable.
[式中、Rb'は炭素数1〜6のアルキル基を示す。環Z2、R、Ra、Rb、W2、W3、g、hは前記に同じ。但し、式(5a)において、W2は−OR基と環Z2とを連結している] [Wherein, R b ′ represents an alkyl group having 1 to 6 carbon atoms. Rings Z 2 , R, R a , R b , W 2 , W 3 , g and h are the same as described above. However, in the formula (5a), W 2 connects the —OR group and the ring Z 2 ]
式(5a)において、Ra、Rbは、それぞれ、好ましくは水素原子又は炭素数1〜6のアルキル基であり、特に水素原子又は炭素数1〜3のアルキル基(例えばメチル基)が好ましい。Ra、Rbのうち少なくとも一方が水素原子であるのも好ましい。環Zとしては、特に、シクロペンタン環、シクロヘキサン環、シクロオクタン環等の5〜12員程度のシクロアルカン環;デカリン環、ノルボルナン環等の炭素数8〜15程度の有橋脂環式環が好ましい。Wとしては、単結合、炭素数1〜15の炭化水素基、又は1又は2以上の炭素数1〜15の炭化水素基と、酸素原子(−O−)、硫黄原子(−S−)、カルボニル基(−CO−)及びアミノ基(−NH−)から選択された少なくとも1種の基とが結合した基が特に好ましい。 In the formula (5a), R a and R b are each preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, particularly preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms (for example, a methyl group). . It is also preferred that at least one of R a and R b is a hydrogen atom. As the ring Z, in particular, a cycloalkane ring having about 5 to 12 members such as a cyclopentane ring, a cyclohexane ring and a cyclooctane ring; a bridged alicyclic ring having about 8 to 15 carbon atoms such as a decalin ring and a norbornane ring. preferable. As W, a single bond, a hydrocarbon group having 1 to 15 carbon atoms, or one or more hydrocarbon groups having 1 to 15 carbon atoms, an oxygen atom (—O—), a sulfur atom (—S—), A group in which at least one group selected from a carbonyl group (—CO—) and an amino group (—NH—) is bonded is particularly preferable.
式(5b)において、Ra、Rbは、それぞれ、好ましくは水素原子又は炭素数1〜6のアルキル基であり、特に水素原子又は炭素数1〜3のアルキル基(例えばメチル基)が好ましい。Ra、Rbのうち少なくとも一方が水素原子であるのも好ましい。W1としては、単結合、炭素数1〜6のアルキレンオキシ基(酸素原子が右端)が特に好ましい。 In the formula (5b), R a and R b are each preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, particularly preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms (for example, a methyl group). . It is also preferred that at least one of R a and R b is a hydrogen atom. W 1 is particularly preferably a single bond or an alkyleneoxy group having 1 to 6 carbon atoms (the oxygen atom is at the right end).
式(5c)において、Raは、好ましくは水素原子又は炭素数1〜6のアルキル基、より好ましくは水素原子又は炭素数1〜3のアルキル基であり、特に水素原子が好ましい。Rb'は、好ましくは炭素数1〜3のアルキル基であり、特にメチル基が好ましい。Wとしては、単結合、炭素数1〜15の炭化水素基、又は1又は2以上の炭素数1〜15の炭化水素基と、酸素原子(−O−)、硫黄原子(−S−)、カルボニル基(−CO−)及びアミノ基(−NH−)から選択された少なくとも1種の基とが結合した基が特に好ましい。 In the formula (5c), R a is preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and particularly preferably a hydrogen atom. R b ′ is preferably an alkyl group having 1 to 3 carbon atoms, and particularly preferably a methyl group. As W, a single bond, a hydrocarbon group having 1 to 15 carbon atoms, or one or more hydrocarbon groups having 1 to 15 carbon atoms, an oxygen atom (—O—), a sulfur atom (—S—), A group in which at least one group selected from a carbonyl group (—CO—) and an amino group (—NH—) is bonded is particularly preferable.
本発明の脂環エポキシ基含有ビニルエーテル化合物(B)の代表的な例として、以下の化合物が挙げられる。式中、p、qは0又は1である。A3は炭素数2〜10(好ましくは2〜6)の直鎖状又は分岐鎖状アルキレン基を示す。 Typical examples of the alicyclic epoxy group-containing vinyl ether compound (B) of the present invention include the following compounds. In the formula, p and q are 0 or 1. A 3 represents a linear or branched alkylene group having 2 to 10 carbon atoms (preferably 2 to 6 carbon atoms).
本発明の脂環エポキシ基含有ビニルエーテル化合物(B)は、ビニルエーテル化合物の製造法として公知の反応を利用して製造することができる。好ましい態様としては、脂環エポキシ基含有ビニルエーテル化合物(B)に対応するアルコール(ヒドロキシ化合物)とビニルエステル化合物とを遷移元素化合物の存在下で反応させる方法が挙げられる。すなわち、前記式(5)で表される脂環エポキシ基含有ビニルエーテル化合物(B)は、式(5)においてRが水素原子であるアルコール(ヒドロキシ化合物)と、ビニルエステル化合物とを遷移元素化合物の存在下で反応させることにより製造することができる。なお、脂環エポキシ基含有ビニルエーテル化合物(B)に対応するアルコール(ヒドロキシ化合物)は公知の化合物から公知の反応を利用することにより合成できる。 The alicyclic epoxy group-containing vinyl ether compound (B) of the present invention can be produced by utilizing a known reaction as a method for producing a vinyl ether compound. A preferred embodiment includes a method in which an alcohol (hydroxy compound) corresponding to the alicyclic epoxy group-containing vinyl ether compound (B) and a vinyl ester compound are reacted in the presence of a transition element compound. That is, the alicyclic epoxy group-containing vinyl ether compound (B) represented by the formula (5) is obtained by combining an alcohol (hydroxy compound) in which R is a hydrogen atom in the formula (5) and a vinyl ester compound as a transition element compound. It can manufacture by making it react in presence. The alcohol (hydroxy compound) corresponding to the alicyclic epoxy group-containing vinyl ether compound (B) can be synthesized from a known compound by using a known reaction.
[オリゴマー又はポリマー(C)]
本発明におけるオリゴマー又はポリマー(C)は、分子内にオキセタン基、エポキシ基、水酸基、ビニルエーテル基、又は脂肪族又は脂環式不飽和炭化水素基を少なくとも1つ有し、分子量500以上(具体的には分子量500〜10万、好ましくは3000〜3万)であることを特徴とする。
[Oligomer or polymer (C)]
The oligomer or polymer (C) in the present invention has at least one oxetane group, epoxy group, hydroxyl group, vinyl ether group, or aliphatic or alicyclic unsaturated hydrocarbon group in the molecule, and has a molecular weight of 500 or more (specifically The molecular weight is 500 to 100,000, preferably 3000 to 30,000.
本発明におけるオリゴマー又はポリマー(C)としては、前記式(1a)〜(1d)
の組み合わせよりなり、末端に水酸基、若しくは水素原子を有する分子量500以上のオリゴマー又はポリマー、又は、前記式(1e)で表され、末端に水酸基、若しくは水素原子を有する分子量500以上のオリゴマー又はポリマーであることが好ましい。
As the oligomer or polymer (C) in the present invention, the above formulas (1a) to (1d)
An oligomer or polymer having a molecular weight of 500 or more having a hydroxyl group or a hydrogen atom at the terminal, or an oligomer or polymer having a molecular weight of 500 or more represented by the formula (1e) and having a hydroxyl group or a hydrogen atom at the terminal. Preferably there is.
オリゴマー又はポリマー(C)の分子量が500を下回ると、カチオン重合性樹脂組成物を硬化して得られる硬化物の柔軟性が得られにくくなる傾向がある。一方、分子量が10万を上回ると、粘度が高くなりすぎて取り扱いが困難となる傾向があるため好ましくない。 When the molecular weight of the oligomer or polymer (C) is less than 500, the flexibility of a cured product obtained by curing the cationic polymerizable resin composition tends to be difficult to obtain. On the other hand, if the molecular weight exceeds 100,000, the viscosity tends to be too high and handling tends to be difficult.
前記式(1a)〜(1d)中、R1〜R12としての置換基を有していてもよい炭素数1〜20の炭化水素基には、脂肪族炭化水素基、脂環式炭化水素基、芳香族炭化水素基及びこれらの結合した基が含まれる。脂肪族炭化水素基としては、例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、s−ブチル、t−ブチル、ペンチル、ヘキシル、デシル、ドデシル基などの炭素数1〜20(好ましくは1〜10、さらに好ましくは1〜3)程度のアルキル基;ビニル、アリル、1−ブテニル基などの炭素数2〜20(好ましくは2〜10、さらに好ましくは2〜3)程度のアルケニル基;エチニル、プロピニル基などの炭素数2〜20(好ましくは2〜10、さらに好ましくは2〜3)程度のアルキニル基などが挙げられる。 In the formulas (1a) to (1d), the hydrocarbon group having 1 to 20 carbon atoms which may have a substituent as R 1 to R 12 includes an aliphatic hydrocarbon group and an alicyclic hydrocarbon. Groups, aromatic hydrocarbon groups and their combined groups. Examples of the aliphatic hydrocarbon group include 1 to 20 carbon atoms (preferably 1 to 1) such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, pentyl, hexyl, decyl, and dodecyl groups. 10, more preferably an alkyl group of about 1 to 3); an alkenyl group of about 2 to 20 carbon atoms (preferably 2 to 10, more preferably 2 to 3) such as vinyl, allyl, 1-butenyl group; Examples thereof include alkynyl groups having about 2 to 20 carbon atoms (preferably 2 to 10, more preferably 2 to 3) such as propynyl groups.
脂環式炭化水素基としては、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、シクロオクチル基などの3〜20員(好ましくは3〜15員、さらに好ましくは5〜8員)程度のシクロアルキル基;シクロペンテニル、シクロへキセニル基などの3〜20員(好ましくは3〜15員、さらに好ましくは5〜8員)程度のシクロアルケニル基;パーヒドロナフタレン−1−イル基、ノルボルニル、アダマンチル、テトラシクロ[4.4.0.12,5.17,10]ドデカン−3−イル基などの橋かけ環式炭化水素基などが挙げられる。芳香族炭化水素基としては、フェニル、ナフチル基などの炭素数6〜14(好ましくは6〜10)程度の芳香族炭化水素基が挙げられる。 As the alicyclic hydrocarbon group, a cycloalkyl group having about 3 to 20 members (preferably 3 to 15 members, more preferably 5 to 8 members) such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl and cyclooctyl groups; Cycloalkenyl groups of about 3 to 20 members (preferably 3 to 15 members, more preferably 5 to 8 members) such as pentenyl and cyclohexenyl groups; perhydronaphthalen-1-yl group, norbornyl, adamantyl, tetracyclo [4 4.0.1, 2,5 . 1 7,10 ] bridged cyclic hydrocarbon groups such as dodecan-3-yl groups. Examples of the aromatic hydrocarbon group include aromatic hydrocarbon groups having about 6 to 14 (preferably 6 to 10) carbon atoms such as phenyl and naphthyl groups.
脂肪族炭化水素基と脂環式炭化水素基とが結合した炭化水素基には、シクロペンチルメチル、シクロヘキシルメチル、2−シクロヘキシルエチル基などのシクロアルキル−アルキル基(例えば、C3-20シクロアルキル−C1-4アルキル基など)などが含まれる。また、脂肪族炭化水素基と芳香族炭化水素基とが結合した炭化水素基には、アラルキル基(例えば、C7-18アラルキル基など)、アルキル置換アリール基(例えば、1〜4個程度のC1-4アルキル基が置換したフェニル基又はナフチル基など)などが含まれる。 The hydrocarbon group in which an aliphatic hydrocarbon group and an alicyclic hydrocarbon group are bonded includes a cycloalkyl-alkyl group such as cyclopentylmethyl, cyclohexylmethyl, 2-cyclohexylethyl group (for example, C 3-20 cycloalkyl- C 1-4 alkyl group and the like). The hydrocarbon group in which an aliphatic hydrocarbon group and an aromatic hydrocarbon group are bonded to each other includes an aralkyl group (for example, a C 7-18 aralkyl group) and an alkyl-substituted aryl group (for example, about 1 to about 4). A phenyl group substituted with a C 1-4 alkyl group or a naphthyl group).
好ましい炭化水素基には、C1-10アルキル基、C2-10アルケニル基、C2-10アルキニル基、C3-15シクロアルキル基、C6-10芳香族炭化水素基、C3-15シクロアルキル−C1-4アルキル基、C7-14アラルキル基等が含まれる。 Preferred hydrocarbon groups include C 1-10 alkyl groups, C 2-10 alkenyl groups, C 2-10 alkynyl groups, C 3-15 cycloalkyl groups, C 6-10 aromatic hydrocarbon groups, C 3-15 A cycloalkyl-C 1-4 alkyl group, a C 7-14 aralkyl group and the like are included.
上記炭化水素基は、種々の置換基、例えば、ハロゲン原子、オキソ基、ヒドロキシル基、置換オキシ基(例えば、アルコキシ基、アリールオキシ基、アラルキルオキシ基、アシルオキシ基など)、カルボキシル基、置換オキシカルボニル基(アルコキシカルボニル基、アリールオキシカルボニル基、アラルキルオキシカルボニル基など)、置換又は無置換カルバモイル基、シアノ基、ニトロ基、置換又は無置換アミノ基、スルホ基、複素環式基などを有していてもよい。前記ヒドロキシル基やカルボキシル基は有機合成の分野で慣用の保護基で保護されていてもよい。また、脂環式炭化水素基や芳香族炭化水素基の環には芳香族性又は非芳香属性の複素環が縮合していてもよい。 The hydrocarbon group includes various substituents such as halogen atoms, oxo groups, hydroxyl groups, substituted oxy groups (for example, alkoxy groups, aryloxy groups, aralkyloxy groups, acyloxy groups, etc.), carboxyl groups, substituted oxycarbonyls. Group (alkoxycarbonyl group, aryloxycarbonyl group, aralkyloxycarbonyl group, etc.), substituted or unsubstituted carbamoyl group, cyano group, nitro group, substituted or unsubstituted amino group, sulfo group, heterocyclic group, etc. May be. The hydroxyl group and carboxyl group may be protected with a protective group commonly used in the field of organic synthesis. In addition, an aromatic or non-aromatic heterocycle may be condensed with the ring of the alicyclic hydrocarbon group or aromatic hydrocarbon group.
前記式(1e)中、R13としての置換基を有していてもよい2価の炭化水素基、及び炭化水素基に有していてもよい置換基の例としては、前記式(2)中のWにおける2価の炭化水素基、及び有していてもよい置換基の例と同様の例を挙げることができる。 Examples of the divalent hydrocarbon group which may have a substituent as R 13 in the formula (1e) and the substituent which may be present in the hydrocarbon group include those represented by the formula (2) The example similar to the example of the bivalent hydrocarbon group in W in the inside, and the substituent which you may have can be given.
本発明におけるオリゴマー又はポリマー(C)としては、下記式(7)で表されるポリカーボネートポリオール[特に、下記式(8)で表されるポリカーボネートポリオール]、又は少なくともエポキシ基及び脂肪族又は脂環式不飽和炭化水素基を有するカチオン重合性樹脂組成物[特に、下記式(9)で表される両末端に水酸基を有するエポキシ化ポリブタジエン]が好ましい。 As the oligomer or polymer (C) in the present invention, a polycarbonate polyol represented by the following formula (7) [in particular, a polycarbonate polyol represented by the following formula (8)], or at least an epoxy group and an aliphatic or alicyclic group Cationic polymerizable resin compositions having an unsaturated hydrocarbon group [in particular, epoxidized polybutadiene having hydroxyl groups at both ends represented by the following formula (9)] are preferred.
本発明においては、オリゴマー又はポリマー(C)として、商品名「PB3600」(ダイセル化学工業社製)、商品名「CD220PL」(ダイセル化学工業社製)等を好適に使用することができ、特に、商品名「PB3600」(ダイセル化学工業社製)を好適に使用することができる。 In the present invention, as the oligomer or polymer (C), the trade name “PB3600” (manufactured by Daicel Chemical Industries, Ltd.), the trade name “CD220PL” (manufactured by Daicel Chemical Industries, Ltd.) and the like can be suitably used. The trade name “PB3600” (manufactured by Daicel Chemical Industries, Ltd.) can be preferably used.
[カチオン重合性樹脂組成物]
本発明に係るカチオン重合性樹脂組成物は、前記オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)と、分子内にオキセタン基、エポキシ基、水酸基、ビニルエーテル基、又は脂肪族又は脂環式不飽和炭化水素基を少なくとも1つ有し、分子量500以上のオリゴマー又はポリマー(C)を含むことを特徴とする。
[Cationically polymerizable resin composition]
The cationically polymerizable resin composition according to the present invention includes the oxetane ring-containing vinyl ether compound (A) and / or an alicyclic epoxy group-containing vinyl ether compound (B), and an oxetane group, an epoxy group, a hydroxyl group, a vinyl ether group in the molecule, Or an oligomer or polymer (C) having at least one aliphatic or alicyclic unsaturated hydrocarbon group and having a molecular weight of 500 or more.
本発明に係るカチオン重合性樹脂組成物中のオキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)の含有量としては、カチオン重合性樹脂組成物全体の6〜85重量%が好ましく、なかでも20〜80%重量がより好ましい。オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)の含有量が6重量%未満であると、硬化速度が非常に遅く実用に耐えない。一方、同85重量%を越える場合には、硬化物に十分な柔軟性が得られない。本発明のカチオン重合性樹脂組成物は、オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)を上記範囲の量で用いるため、優れた硬化性と十分な柔軟性を兼ね備えた硬化物を得ることができる。このため、高い耐熱性、透明性、柔軟性、及び硬化性が要求される分野、特に光導波路等の光学分野の材料として極めて有利である。なお、本発明において、耐熱性は、加熱による重量の減少率及び加熱後光損失で評価する。 The content of the oxetane ring-containing vinyl ether compound (A) and / or the alicyclic epoxy group-containing vinyl ether compound (B) in the cationic polymerizable resin composition according to the present invention is 6 to 85 of the entire cationic polymerizable resin composition. % By weight is preferable, and 20 to 80% by weight is more preferable. When the content of the oxetane ring-containing vinyl ether compound (A) and / or the alicyclic epoxy group-containing vinyl ether compound (B) is less than 6% by weight, the curing rate is very slow and unusable for practical use. On the other hand, when it exceeds 85% by weight, sufficient flexibility cannot be obtained in the cured product. The cationically polymerizable resin composition of the present invention uses the oxetane ring-containing vinyl ether compound (A) and / or the alicyclic epoxy group-containing vinyl ether compound (B) in an amount within the above range, and therefore has excellent curability and sufficient flexibility. Can be obtained. For this reason, it is extremely advantageous as a material in a field where high heat resistance, transparency, flexibility and curability are required, particularly in an optical field such as an optical waveguide. In the present invention, the heat resistance is evaluated by the weight reduction rate due to heating and the light loss after heating.
本発明に係るカチオン重合性樹脂組成物中のオリゴマー又はポリマー(C)の含有量としては、カチオン重合性樹脂組成物全体の5〜94重量%が好ましく、なかでも10〜80重量%がより好ましい。オリゴマー又はポリマー(C)の含有量が5重量%未満であると、カチオン重合性樹脂組成物を硬化して得られる硬化物の柔軟性が得られにくくなる傾向があり、フレキシブル光導波路等として使用することが困難となる傾向がある。一方、オリゴマー又はポリマー(C)の含有量が94重量%を上回ると、カチオン重合性樹脂組成物の粘度が高くなりすぎて使用が困難となる傾向がある。 The content of the oligomer or polymer (C) in the cationic polymerizable resin composition according to the present invention is preferably 5 to 94% by weight, more preferably 10 to 80% by weight, based on the whole cationic polymerizable resin composition. . When the content of the oligomer or polymer (C) is less than 5% by weight, the flexibility of the cured product obtained by curing the cationic polymerizable resin composition tends to be difficult to obtain, and it is used as a flexible optical waveguide or the like. Tend to be difficult to do. On the other hand, when the content of the oligomer or polymer (C) exceeds 94% by weight, the viscosity of the cationically polymerizable resin composition tends to be too high, making it difficult to use.
本発明に係るカチオン重合性樹脂組成物には、必要に応じて他の添加物を添加してもよく、例えば重合開始剤を含有していてもよい。前記重合開始剤としては、例えば、光カチオン重合開始剤等のイオン(カチオン)重合を起こしうるものであれば特に限定されず、公知の重合開始剤、光酸発生剤等を使用することができる。 If necessary, other additives may be added to the cationic polymerizable resin composition according to the present invention, for example, a polymerization initiator may be contained. The polymerization initiator is not particularly limited as long as it can cause ionic polymerization such as a photocationic polymerization initiator, and a known polymerization initiator, a photoacid generator, or the like can be used. .
前記光カチオン重合開始剤としては、カチオン部位とアニオン部位とで構成され、前記アニオン部位が、PF6 -と同じ又はそれより高い電荷密度で構成されていることが好ましい。溶解性が極めて良好であり、優れたカチオン硬化性を発揮して硬化速度を著しく向上しうると共に、透明性に極めて優れた硬化物を提供できるという効果を奏するためである。PF6 -より電荷密度が低いアニオン部位で構成されると、反応性、光カチオン重合開始剤の溶解性は向上するが、耐着色性が低下してしまうため、透明性が要求される分野には好ましくない。ここで、本発明における「電荷密度」とは、J.V.Crivello and J.H.W. Lam, Macromolecules, 1307, Vol.10, 1997に記載の意味に用いる。前記「PF6 -と同じ又はそれより高い電荷密度」であるアニオン部分としては、フッ素原子を含み求核性の高いアニオンを利用でき、具体的には、PF6 -、BF4 -、及びCF3SO4 -などが挙げられる。 As the cationic photopolymerization initiator, is composed of a cation portion and an anion portion, the anion site, PF 6 - is preferably formed of the same or higher charge density than that. This is because the solubility is extremely good, and excellent cationic curability can be exerted to significantly improve the curing speed, and a cured product having excellent transparency can be provided. PF 6 - and composed than the charge density is low anionic sites, reactivity, although the solubility of the cationic photopolymerization initiator is improved, since the coloring resistance is reduced, the areas where transparency is required Is not preferred. Here, “charge density” in the present invention is used in the meaning described in JVCrivello and JHW Lam, Macromolecules, 1307, Vol. 10, 1997. As the anion moiety having the “charge density equal to or higher than PF 6 − ”, an anion having a fluorine atom and high nucleophilicity can be used. Specifically, PF 6 − , BF 4 − and CF 3 SO 4- and the like.
本発明における光重合開始剤としては、トリアリルスルホニウムヘキサフルオロホスフェート、トリアリールスルホニウムヘキサフウルオロアンチモネート等のスルホニウム塩;ジアリールヨードニウムヘキサフルオロホスフェート、ジフェニルヨードニウムヘキサフルオロアンチモネート、ビス(ドデシルフェニル)ヨードニウムテトラキス(ペンタフルオロフェニル)ボレート、ヨードニウム[4−(4−メチルフェニル−2−メチルプロピル)フェニル]ヘキサフルオロホスフェート等のヨードニウム塩;テトラフルオロホスホニウムヘキサフウルオロホスフェート等のホスホニウム塩;ピリジウム塩等が使用できる。本発明におけるオキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)は、このような重合開始剤を溶解しやすいので、重合性組成物の調製が容易である。 Examples of the photopolymerization initiator in the present invention include sulfonium salts such as triallylsulfonium hexafluorophosphate and triarylsulfonium hexafururoantimonate; diaryliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, bis (dodecylphenyl) iodonium Tetrakis (pentafluorophenyl) borate, iodonium salts such as iodonium [4- (4-methylphenyl-2-methylpropyl) phenyl] hexafluorophosphate; phosphonium salts such as tetrafluorophosphonium hexafurophosphate; Can be used. Since the oxetane ring-containing vinyl ether compound (A) and / or the alicyclic epoxy group-containing vinyl ether compound (B) in the present invention easily dissolves such a polymerization initiator, the preparation of the polymerizable composition is easy.
光カチオン重合開始剤の市販品としては、例えば、「Irgacure 250」(チバ・ジャパン株式会社製)、「Uvacure 1591」(ダイセル・サイテック社製)等が入手可能である。 As a commercial item of a photocationic polymerization initiator, for example, “Irgacure 250” (manufactured by Ciba Japan Co., Ltd.), “Uvacure 1591” (manufactured by Daicel Cytec Co., Ltd.) and the like are available.
重合開始剤の使用量としては、カチオン重合性樹脂組成物に対して、通常0.01〜50重量%程度、好ましくは0.1〜20重量%程度である。重合開始剤を上記範囲内で添加すると、重合速度と保存安定性のバランスに優れたカチオン重合性樹脂組成物を得ることができる。 The amount of the polymerization initiator used is usually about 0.01 to 50% by weight, preferably about 0.1 to 20% by weight, based on the cationic polymerizable resin composition. When the polymerization initiator is added within the above range, a cationic polymerizable resin composition having an excellent balance between polymerization rate and storage stability can be obtained.
また、本発明に係るカチオン重合性樹脂組成物には、必要に応じて前記オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)以外の硬化性化合物(例えば、エポキシ化合物、オキセタン化合物、ビニルエーテル化合物等)を含有していてもよく、例えば、商品名「セロキサイド2021P」(ダイセル化学工業社製)を有していてもよい。商品名「セロキサイド2021P」(ダイセル化学工業社製)は、被着体との結合を形成しやすいため、例えばカチオン重合性樹脂組成物中1〜30重量%を添加することにより、カチオン重合性樹脂組成物の硬化物の、被着体に対する密着性を向上させることができる。 In addition, the cationically polymerizable resin composition according to the present invention includes a curable compound (for example, epoxy) other than the oxetane ring-containing vinyl ether compound (A) and / or the alicyclic epoxy group-containing vinyl ether compound (B) as necessary. Compounds, oxetane compounds, vinyl ether compounds, etc.), for example, may have the trade name “Celoxide 2021P” (manufactured by Daicel Chemical Industries). Since the trade name “Celoxide 2021P” (manufactured by Daicel Chemical Industries, Ltd.) is easy to form a bond with the adherend, for example, by adding 1 to 30% by weight in the cationic polymerizable resin composition, the cationic polymerizable resin is added. The adhesion of the cured product of the composition to the adherend can be improved.
更に、必要に応じて、硬化膨張性モノマー(スピロオルソカーボネート、ジチオカーボネート類等)、光増感剤(アントラセン系増感剤等)、樹脂、密着性向上剤、補強剤、軟化剤、可塑剤、粘度調整剤、溶剤、無機又は有機粒子(ナノスケール粒子等)、フルオロシラン等の従来公知の各種添加剤を含有してもよい。 Further, if necessary, curing-expandable monomers (spiroorthocarbonates, dithiocarbonates, etc.), photosensitizers (anthracene sensitizers, etc.), resins, adhesion improvers, reinforcing agents, softeners, plasticizers Viscosity modifiers, solvents, inorganic or organic particles (such as nanoscale particles), and various conventionally known additives such as fluorosilane may be contained.
前記硬化膨張性モノマーは、添加することで硬化収縮率を低減することができるため、残留応力の低減、密着性の向上等の効果が期待できる。硬化膨張性モノマーは下記式(10)
で表されるビシクロエポキシ化合物、又は、下記式(11)
で表されるカーボネート系化合物等が挙げられる。
Addition of the curable expansive monomer can reduce the curing shrinkage rate, so that effects such as reduction in residual stress and improvement in adhesion can be expected. The cure-expandable monomer is represented by the following formula (10)
Or a bicycloepoxy compound represented by the following formula (11)
The carbonate type compound etc. which are represented by these are mentioned.
前記光増感剤は、上記光カチオン重合開始剤の作用をより向上させて、カチオン重合性樹脂組成物の光カチオン重合をより促進させるものである。このような光増感剤としては特に限定されないが、例えば、カルボニル化合物、有機硫黄化合物、過硫化物、レドックス系化合物、アゾ化合物、ジアゾ化合物、ハロゲン化合物、光還元性色素等が利用できる。光増感剤の具体例としては、例えば、ベンゾインメチルエーテル、ベンゾインイソプロピルエーテル等のベンゾイン誘導体;ベンゾフェノン、2,4−ジクロルベンゾフェノン、o−ベンゾイル安息香酸メチル、4,4’−ビス(ジメチルアミノ)ベンゾフェノン等のベンゾフェノン誘導体;2−クロルチオキサントン、2−イソプロピルチオキサントン等のチオキサントン誘導体;2−クロルアントラキノン、2−メチルアントラキノン等のアントラキノン誘導体;ジプロポキシアントラセン、ジブトキシアントラセン等のアントラセン誘導体等が挙げられる。これらの光増感剤は、単独で用いられてもよいし、2種類以上が併用されてもよい。 The said photosensitizer improves the effect | action of the said photocationic polymerization initiator more, and accelerates | stimulates the photocationic polymerization of a cationically polymerizable resin composition more. Although it does not specifically limit as such a photosensitizer, For example, a carbonyl compound, an organic sulfur compound, a persulfide, a redox type compound, an azo compound, a diazo compound, a halogen compound, a photoreducible dye, etc. can be utilized. Specific examples of the photosensitizer include, for example, benzoin derivatives such as benzoin methyl ether and benzoin isopropyl ether; benzophenone, 2,4-dichlorobenzophenone, methyl o-benzoylbenzoate, 4,4′-bis (dimethylamino). Benzophenone derivatives such as benzophenone; thioxanthone derivatives such as 2-chlorothioxanthone and 2-isopropylthioxanthone; anthraquinone derivatives such as 2-chloroanthraquinone and 2-methylanthraquinone; anthracene derivatives such as dipropoxyanthracene and dibutoxyanthracene . These photosensitizers may be used independently and 2 or more types may be used together.
本発明のカチオン重合性樹脂組成物は、オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)、オリゴマー又はポリマー(C)、及び必要に応じて添加剤を、従来公知の装置を用いて攪拌、混合することにより製造することができる。また、本発明のカチオン重合性樹脂組成物の製造は、紫外線を遮断した状態で行われることが好ましく、得られたカチオン重合性樹脂組成物は遮光した容器に入れて冷暗所に保存されることが好ましい。 The cationically polymerizable resin composition of the present invention is a conventional oxetane ring-containing vinyl ether compound (A) and / or alicyclic epoxy group-containing vinyl ether compound (B), oligomer or polymer (C), and, if necessary, conventional additives. It can manufacture by stirring and mixing using a well-known apparatus. In addition, the production of the cationic polymerizable resin composition of the present invention is preferably performed in a state where ultraviolet rays are blocked, and the obtained cationic polymerizable resin composition can be stored in a cool and dark place in a light-shielded container. preferable.
本発明に係るカチオン重合性樹脂組成物は、オキセタン環含有ビニルエーテル化合物(A)及び/又は脂環エポキシ基含有ビニルエーテル化合物(B)、及びオリゴマー又はポリマー(C)を含むため、低粘度で加工しやすいという特性を有し、硬化速度が極めて速いという特性を有する。その上、硬化することにより、透明性、耐熱性、柔軟性に優れた硬化物が得られるという大きな利点を有する。それにより、本発明に係るカチオン重合性樹脂組成物は、塗料、コーティング材料、インクジェット用インクなどのインキ、接着剤、レジスト、製版材、成形材料、カラーフィルター、フレキシブル基板、封止材料等の他、導波路(光導波路、混載基板など)、光ファイバー等の光学分野など、広範な分野に利用できる。特に、フレキシブル光導波路等の光学用途として極めて有用である。また、透明封止剤、ナノインプリント技術に用いる樹脂組成物として好ましく用いることができる。 Since the cation polymerizable resin composition according to the present invention contains an oxetane ring-containing vinyl ether compound (A) and / or an alicyclic epoxy group-containing vinyl ether compound (B), and an oligomer or polymer (C), it is processed with low viscosity. It has the characteristic that it is easy, and has the characteristic that the curing rate is extremely fast. In addition, by curing, there is a great advantage that a cured product having excellent transparency, heat resistance and flexibility can be obtained. As a result, the cationic polymerizable resin composition according to the present invention can be used for paints, coating materials, inks such as inkjet inks, adhesives, resists, plate making materials, molding materials, color filters, flexible substrates, sealing materials, etc. It can be used in a wide range of fields such as optical fields such as waveguides (optical waveguides, mixed substrates, etc.) and optical fibers. In particular, it is extremely useful for optical applications such as flexible optical waveguides. Moreover, it can use preferably as a resin composition used for a transparent sealing agent and nanoimprint technology.
[硬化物]
本発明の硬化物は、本発明に係るカチオン重合性樹脂組成物に光を照射して重合することにより得ることができ、例えば、上記本発明のカチオン重合性樹脂組成物を用いて、インクジェット法、リソグラフィー法等の慣用の方法により所望の画像や形状を形成後、露光することにより製造することができる。
[Cured product]
The cured product of the present invention can be obtained by irradiating and polymerizing the cationic polymerizable resin composition according to the present invention. For example, an ink jet method using the cationic polymerizable resin composition of the present invention is used. It can be manufactured by forming a desired image or shape by a conventional method such as a lithography method, and then exposing.
露光には、水銀ランプ、キセノンランプ、カーボンアークランプ、メタルハライドランプ、太陽光、電子線、レーザー光等を照射源として使用することができる。硬化制御は、露光に用いる光の強度、温度、照射時間等を適宜設定することにより、また、カチオン重合性樹脂組成物の構成成分(硬化制御剤の添加等)を選択することにより行うことができる。なかでも、露光時及び露光後(ポストベイク)の温度制御により硬化制御する手段が好ましく用いられる。 For the exposure, a mercury lamp, a xenon lamp, a carbon arc lamp, a metal halide lamp, sunlight, an electron beam, a laser beam, or the like can be used as an irradiation source. Curing control can be performed by appropriately setting the intensity of light used for exposure, temperature, irradiation time, etc., and by selecting the constituent components of the cationic polymerizable resin composition (addition of a curing control agent, etc.). it can. Of these, means for controlling the curing by controlling the temperature during and after exposure (post-baking) is preferably used.
本発明のカチオン重合性樹脂組成物は、露光後、例えば50〜180℃程度の温度で熱処理を施して硬化を進行させることも可能である。このような露光後の熱処理は、厚膜硬化や光未照射部分の硬化、又は、充填剤若しくは顔料等を含むカチオン重合性樹脂組成物の硬化に有効である。 The cationic polymerizable resin composition of the present invention can be cured by performing a heat treatment at a temperature of, for example, about 50 to 180 ° C. after exposure. Such heat treatment after the exposure is effective for curing a thick film, curing an unirradiated portion, or curing a cationic polymerizable resin composition containing a filler or a pigment.
本発明の硬化物は透明性、耐熱性、及び柔軟性等に優れる。そのため、導波路(光導波路、電気光混載配線基板など)、光ファイバー、透明封止剤、インクジェット用インク、カラーフィルター、ナノインプリント、フレキシブル基板などの分野、特にフレキシブル光導波路、透明封止剤、ナノインプリントの分野で極めて有用である。 The cured product of the present invention is excellent in transparency, heat resistance, flexibility and the like. Therefore, in the fields of waveguides (optical waveguides, electric / light mixed wiring boards, etc.), optical fibers, transparent sealants, inkjet inks, color filters, nanoimprints, flexible substrates, etc., especially flexible optical waveguides, transparent sealants, nanoimprints Very useful in the field.
本発明における透明性は、波長400〜850nmの光の透過率により評価することができる。本発明によれば、前記透過率が、例えば70%以上、好ましくは80%以上、特に85%以上である透明性に優れた硬化物を得ることができる。 The transparency in the present invention can be evaluated by the transmittance of light having a wavelength of 400 to 850 nm. According to the present invention, it is possible to obtain a cured product having excellent transparency with the transmittance of, for example, 70% or more, preferably 80% or more, particularly 85% or more.
本発明における柔軟性は、屈曲性により評価することができ、例えば、200μm厚さのフィルム状硬化物を半径2mmの棒に巻き付けて、クラック(ひび割れ)の発生の有無によって判断することができる。本発明によれば、クラック(ひび割れ)を発生することなく屈曲することができる、柔軟性を有する硬化物を得ることができる。 The flexibility in the present invention can be evaluated based on flexibility, and can be determined, for example, by determining whether or not a crack (crack) is generated by winding a 200 μm thick film-like cured product around a rod having a radius of 2 mm. ADVANTAGE OF THE INVENTION According to this invention, the hardened | cured material which has the softness | flexibility which can be bent without generating a crack (crack) can be obtained.
本発明における耐熱性は、カチオン重合性樹脂組成物に光照射することにより得られる硬化物に熱処理を施した場合にも硬化物の重量が維持されていることを意味している。本発明におけるカチオン重合性樹脂組成物の硬化物は、耐熱性に優れるため、硬化後に熱に曝される分野に極めて有用である。 The heat resistance in the present invention means that the weight of the cured product is maintained even when the cured product obtained by irradiating the cationic polymerizable resin composition with light is subjected to a heat treatment. Since the cured product of the cationic polymerizable resin composition in the present invention is excellent in heat resistance, it is extremely useful in the field exposed to heat after curing.
[光導波路]
光導波路は、コアと呼ばれる屈折率の高い部分と、クラッドと呼ばれる屈折率の低い部分とで構成される光回路である。本発明に係るカチオン重合性樹脂組成物は、低粘度のため加工が容易であり、硬化速度が極めて速いため高い生産性で硬化物が得られることに加え、得られた硬化物は、柔軟性を有し、半田等の作業が可能な程度の耐熱性を備える。しかも本発明に係るカチオン重合性樹脂組成物の硬化物は、硬化直後だけでなく加熱後も優れた透明性を保持できため、光損失が極めて抑制されるという優れた光学特性を発揮することができる点で、光導波路のクラッド及びコアの形成素材として極めて有用である。例えば、本発明に係るカチオン重合性樹脂組成物をクラッドの形成素材として使用した場合、本発明に係るカチオン重合性樹脂組成物に高屈折率材料(例えば、1−アクリロキシ−4−メトキシナフタレンなど)を添加したものを、コアの形成素材として使用することができる。また、逆に、本発明に係るカチオン重合性樹脂組成物をコアの形成素材として使用した場合、本発明に係るカチオン重合性樹脂組成物に低屈折率材料を添加したものを、クラッドの形成素材として使用することができる。
[Optical waveguide]
The optical waveguide is an optical circuit composed of a high refractive index portion called a core and a low refractive index portion called a clad. The cationic polymerizable resin composition according to the present invention is easy to process because of its low viscosity, and in addition to being able to obtain a cured product with high productivity because of its extremely high curing rate, the obtained cured product is flexible. It has heat resistance to the extent that it can work with solder or the like. In addition, the cured product of the cationically polymerizable resin composition according to the present invention can maintain excellent transparency not only immediately after curing but also after heating, and thus exhibits excellent optical properties such that light loss is extremely suppressed. In that respect, it is extremely useful as a material for forming the cladding and core of an optical waveguide. For example, when the cationic polymerizable resin composition according to the present invention is used as a cladding forming material, the cationic polymerizable resin composition according to the present invention has a high refractive index material (for example, 1-acryloxy-4-methoxynaphthalene). Can be used as a material for forming the core. Conversely, when the cation polymerizable resin composition according to the present invention is used as a core forming material, a material obtained by adding a low refractive index material to the cation polymerizable resin composition according to the present invention is used as a cladding forming material. Can be used as
本発明に係る光導波路は、例えば、フィルム上に、本発明に係るカチオン重合性樹脂組成物を塗布してクラッドベースフィルムを作製し、該クラッドベースフィルムでコアを被覆することにより作製することができる。 The optical waveguide according to the present invention can be prepared, for example, by coating the cationic polymerizable resin composition according to the present invention on a film to produce a clad base film, and covering the core with the clad base film. it can.
より具体的には、例えば、基板上に本発明に係るカチオン重合性樹脂組成物を塗布してクラッド層を形成し、クラッド層上にコア層を積層し、さらにレジスト塗布後、マスクを介して露光、現像、エッチングを施し、次いでレジストを除去してコアを形成し、当該コアを被覆するように上部クラッド層を形成することにより光導波路を作製するRIE(Reactive Ion Etching)法等により光導波路を作製することができる。 More specifically, for example, a cation polymerizable resin composition according to the present invention is applied on a substrate to form a clad layer, a core layer is laminated on the clad layer, and after applying a resist, through a mask. An optical waveguide is formed by RIE (Reactive Ion Etching) method, etc., in which an optical waveguide is formed by exposing, developing and etching, then removing the resist to form a core, and forming an upper cladding layer so as to cover the core Can be produced.
光導波路用途のカチオン重合性樹脂組成物には、屈折率の調整を目的として、ナノサイズの金属酸化物等を添加することができる。前記金属酸化物には、例えば、酸化ジルコニウム、酸化チタンなどが含まれ、そのサイズは、例えば1〜100nm程度である。また、硬化収縮を抑える目的で、硬化膨張性の化合物、例えばビシクロへキセンオキサイド及び/または2,2−ジメチルプロピルカーボネートを添加することが好ましい。 For the purpose of adjusting the refractive index, a nano-sized metal oxide or the like can be added to the cationic polymerizable resin composition for use in an optical waveguide. Examples of the metal oxide include zirconium oxide and titanium oxide, and the size is, for example, about 1 to 100 nm. Further, for the purpose of suppressing curing shrinkage, it is preferable to add a curing expandable compound such as bicyclohexene oxide and / or 2,2-dimethylpropyl carbonate.
光導波路としての適性は、公知の導波路特性評価により判定することができる。このような導波路特性評価としては、特に限定されないが、例えば、カチオン重合性樹脂組成物の硬化物で形成された簡易導波路について公知の方法で光損失を測定する方法を用いることができる。本発明に係るカチオン重合性樹脂組成物の硬化物は、例えばカットバック法による光損失が、波長850nmで0.3dB/cm以下(好ましくは0.2dB/cm以下)であり、優れた光導波路特性を備えている。また、本発明に係るカチオン重合性樹脂組成物の硬化物により形成された光導波路は耐熱性を有するため、加熱しても光損失の上昇を著しく抑制することができる。 Suitability as an optical waveguide can be determined by known waveguide characteristic evaluation. Such waveguide property evaluation is not particularly limited, and for example, a method of measuring light loss by a known method for a simple waveguide formed from a cured product of a cationic polymerizable resin composition can be used. The cured product of the cationic polymerizable resin composition according to the present invention has, for example, an optical waveguide having an optical loss of 0.3 dB / cm or less (preferably 0.2 dB / cm or less) at a wavelength of 850 nm by a cutback method. It has characteristics. Moreover, since the optical waveguide formed with the hardened | cured material of the cationic polymerizable resin composition which concerns on this invention has heat resistance, even if it heats, the raise of a light loss can be suppressed remarkably.
本発明に係る光導波路は、本発明に係るカチオン重合性樹脂組成物により形成するため、柔軟性を有し、自由に屈曲させることが可能となり、屈曲させることによりクラック(ひび割れ)が発生することがなく、光損失値が上昇することがない。そのため、光導波路設置部位の形状に応じて適宜変形させて使用することができる。また、耐熱性が高いため、半田等の作業が可能であり、また、加熱しても光損失値の上昇を抑制することができるため、高熱環境下での使用も可能である。また、透明性が高く、加熱しても透明性が損なわれることがない。 Since the optical waveguide according to the present invention is formed by the cationic polymerizable resin composition according to the present invention, the optical waveguide has flexibility and can be bent freely, and a crack (crack) is generated by bending. The optical loss value does not increase. Therefore, it can be used by being appropriately deformed according to the shape of the optical waveguide installation site. In addition, since the heat resistance is high, it is possible to perform operations such as soldering, and even if heated, an increase in the light loss value can be suppressed, so that it can be used in a high heat environment. Moreover, transparency is high and transparency is not impaired even if it heats.
[透明封止剤]
光半導体素子の封止には透明性、耐熱性、耐湿性、密着性及び耐クラック性に優れた透明封止剤が求められる。本発明に係るカチオン重合性樹脂組成物は上記特性を兼ね備えるため、透明封止剤として光半導体素子の封止に好適に使用することができる。
[Transparent sealant]
For sealing an optical semiconductor element, a transparent sealant excellent in transparency, heat resistance, moisture resistance, adhesion and crack resistance is required. Since the cationically polymerizable resin composition according to the present invention has the above properties, it can be suitably used as a transparent sealing agent for sealing an optical semiconductor element.
[ナノインプリント加工]
ナノインプリント技術を用いる加工方法は、nmオーダーのパターンを有する微細構造物を高速且つ安価に作製できる技術であって、工程が短く生産性に優れるため好ましく用いられる。
[Nanoimprint processing]
The processing method using the nanoimprint technique is a technique capable of producing a fine structure having a pattern on the order of nm at high speed and at low cost, and is preferably used because of its short process and excellent productivity.
より詳細には、ナノインプリント加工は、基材上に塗布した光硬化性組成物に、微細パターンを持つインプリントスタンプ(モールド、版等とも称する)を押圧した後、露光・硬化させることによりパターンを転写する技術であり、具体的には、次のステップで構成される。
ステップ1:基材上に光硬化性樹脂組成物を塗布して未硬化被膜を作製する
ステップ2:未硬化被膜(被膜材料)を、樹脂組成物のガラス転移温度(Tg)〜軟化点程度に加温して樹脂を柔らかくしたところで、微細パターンを持つインプリントスタンプを押圧してパターンを転写させる
ステップ3:微細パターンが転写された被膜材料を冷やし又は光硬化させる
ステップ4:インプリントスタンプを取り除いて、インプリントされた微細構造物を得る
More specifically, nanoimprint processing is performed by pressing an imprint stamp (also referred to as a mold or a plate) having a fine pattern on a photocurable composition applied on a substrate, and then exposing and curing the pattern. This is a transfer technique, and specifically comprises the following steps.
Step 1: Applying a photocurable resin composition on a substrate to produce an uncured film Step 2: Uncured film (film material) from the glass transition temperature (Tg) to the softening point of the resin composition When the resin is softened by heating, the imprint stamp having a fine pattern is pressed to transfer the pattern. Step 3: The coating material to which the fine pattern is transferred is cooled or photocured. Step 4: The imprint stamp is removed. To obtain an imprinted microstructure
本発明に係るカチオン重合性樹脂組成物は、ナノインプリント加工を施すことにより、微細構造物を得ることができる。ナノインプリント加工用途のカチオン重合性樹脂組成物は、必要に応じて、光増感剤、樹脂、密着性向上剤、補強剤、軟化剤、可塑剤、粘度調整剤、溶剤等の従来公知の各種添加剤を添加してもよい。 The cationically polymerizable resin composition according to the present invention can obtain a fine structure by performing nanoimprint processing. The cationically polymerizable resin composition for nanoimprint processing uses various known additives such as photosensitizers, resins, adhesion improvers, reinforcing agents, softeners, plasticizers, viscosity modifiers, and solvents as necessary. An agent may be added.
本発明に係るカチオン重合性樹脂組成物は、光照射により速やかに硬化するため、生産性が高い。また、硬化物が柔軟性を有するため、インプリントスタンプを取り除く際に硬化物がしなるため取り除くことが容易である。また、インプリントスタンプを取り除くと、再び元の形状を取り戻すため、nmオーダーのパターンを忠実に再現した微細構造物を得ることができる。更に、得られた微細構造物は、透明性、及び耐熱性に優れた性質を有する。 Since the cationic polymerizable resin composition according to the present invention is rapidly cured by light irradiation, the productivity is high. In addition, since the cured product has flexibility, the cured product is easily removed when the imprint stamp is removed. Further, when the imprint stamp is removed, the original shape is restored again, so that a fine structure that faithfully reproduces the nm order pattern can be obtained. Furthermore, the obtained fine structure has properties excellent in transparency and heat resistance.
以下、実施例により本発明をより具体的に説明するが、本発明はこれらの実施例により限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention more concretely, this invention is not limited by these Examples.
合成例1
炭酸ナトリウム24.9g(0.23mol)、とトルエンの混合液280mLを95℃まで昇温し、プロピオン酸1.4gを加え、95℃を維持しながら、酢酸ビニル16gを滴下し、15分後、ジ−μ−クロロビス(1,5-シクロオクタジエン)二イリジウム(I)[Ir(cod)Cl]2を1.27g(1.9mmol)添加した。次いで、オキセタン−3,3−ジメタノール40g(0.19mol)を3時間かけて滴下して加え、窒素雰囲気下、反応温度95℃を維持しながら酢酸ビニル79.8gを滴下して加え、反応を行った。滴下終了後、1時間攪拌し、反応液をガクスロマトグラフィーで分析したところ、下記式(12)で表される3,3−ビス(ビニロキシメチル)オキセタンが90%の収率で、(3−ビニロキシメチルオキセタン−3−イル)メタノールが2%の収率で生成していた。反応液を蒸溜精製して、純度99%の3,3-ビス(ビニロキシメチル)オキセタンを31g得た。
1H-NMR(CDCl3) δ:6.5(2H,dd), 4.53(4H,s), 4.2(2H,d), 4.05(2H,d), 3.93(4H,s)
280 mL of a mixed solution of 24.9 g (0.23 mol) of sodium carbonate and toluene was heated to 95 ° C., 1.4 g of propionic acid was added, and 16 g of vinyl acetate was added dropwise while maintaining 95 ° C., and 15 minutes later Di-μ-chlorobis (1,5-cyclooctadiene) diiridium (I) [Ir (cod) Cl] 2 was added in an amount of 1.27 g (1.9 mmol). Next, 40 g (0.19 mol) of oxetane-3,3-dimethanol was added dropwise over 3 hours, and 79.8 g of vinyl acetate was added dropwise while maintaining a reaction temperature of 95 ° C. under a nitrogen atmosphere. Went. After completion of the dropwise addition, the mixture was stirred for 1 hour, and the reaction solution was analyzed by gaxromatography. As a result, 3,3-bis (vinyloxymethyl) oxetane represented by the following formula (12) was obtained at a yield of 90% ( 3-vinyloxymethyloxetane-3-yl) methanol was produced in 2% yield. The reaction solution was purified by distillation to obtain 31 g of 3,3-bis (vinyloxymethyl) oxetane having a purity of 99%.
1 H-NMR (CDCl 3 ) δ: 6.5 (2H, dd), 4.53 (4H, s), 4.2 (2H, d), 4.05 (2H, d), 3.93 (4H, s)
合成例2
3−クロロメチル−3−エチルオキセタン(0.1mol)と1,4−シクロヘキサンジオール(0.5mol)、テトラブチルアンモニウムブロミド(0.01mol)をトルエン(500g)に加え、90℃まで昇温した後に、5N−NaOH水溶液(100g)を滴下して加え、5時間撹拌した。トルエン溶液(トルエン層)を水洗した後、濃縮し、シリカゲルクロマトグラフィーにて精製し、純度99%の4−(3−エチルオキセタン−3−イル−メトキシ)シクロヘキサノールを得た。
炭酸ナトリウム(0.06mol)とトルエンの混合液100mLを95℃まで昇温した。95℃を維持しながら、酢酸ビニル4.2gを滴下し、15分後、ジ−μ−クロロビス(1,5−シクロオクタジエン)二イリジウム(I)[Ir(cod)Cl]2(0.5mmol)を添加した。次いで、4−(3−エチルオキセタン−3−イル−メトキシ)シクロヘキサノール(0.05mol)を2時間かけて滴下して加え、窒素雰囲気下、反応温度95℃を維持しながら、酢酸ビニル12.6gを滴下して加えながら反応を行った。滴下終了後、1時間撹拌し、反応液をガスクロマトグラフィーで分析したところ、下記式(13)で表される3−エチル−3−(4−ビニロキシシクロヘキシルオキシメチル)オキセタンが92%の収率で生成していた。1H-NMR(CDCl3)を測定したところ、合成例1と同様に、6.5ppmと4.2ppm、4.04ppmにビニル基特有のシグナルが観測された。
3-Chloromethyl-3-ethyloxetane (0.1 mol), 1,4-cyclohexanediol (0.5 mol) and tetrabutylammonium bromide (0.01 mol) were added to toluene (500 g), and the temperature was raised to 90 ° C. Later, 5N-NaOH aqueous solution (100 g) was added dropwise and stirred for 5 hours. The toluene solution (toluene layer) was washed with water, concentrated, and purified by silica gel chromatography to obtain 99% pure 4- (3-ethyloxetane-3-yl-methoxy) cyclohexanol.
100 mL of a mixed solution of sodium carbonate (0.06 mol) and toluene was heated to 95 ° C. While maintaining 95 ° C., 4.2 g of vinyl acetate was added dropwise, and 15 minutes later, di-μ-chlorobis (1,5-cyclooctadiene) diiridium (I) [Ir (cod) Cl] 2 (0. 5 mmol) was added. Then, 4- (3-ethyloxetane-3-yl-methoxy) cyclohexanol (0.05 mol) was added dropwise over 2 hours, and vinyl acetate 12.2 was maintained under a nitrogen atmosphere while maintaining the reaction temperature 95 ° C. The reaction was carried out while adding 6 g dropwise. After completion of the dropwise addition, the mixture was stirred for 1 hour and analyzed by gas chromatography. As a result, 3-ethyl-3- (4-vinyloxycyclohexyloxymethyl) oxetane represented by the following formula (13) was found to be 92%. Was generated at a rate. When 1 H-NMR (CDCl 3 ) was measured, as in Synthesis Example 1, signals specific to the vinyl group were observed at 6.5 ppm, 4.2 ppm, and 4.04 ppm.
合成例3
(4−メチルシクロヘキサ−3−エニル)メタノール12.6g(0.1mol)を5重量%過酢酸−酢酸エチル溶液を用いて、65℃でエポキシ化した。蒸留精製することで、純度98%の(6−メチル−7−オキサビシクロ[4.1.0]ヘプタ−3−イル)メタノールを12g得た。
炭酸ナトリウム(0.06mol)とトルエンの混合液100mLを95℃まで昇温した。95℃を維持しながら、酢酸ビニル4.2gを滴下し、15分後、ジ−μ−クロロビス(1,5−シクロオクタジエン)二イリジウム(I)[Ir(cod)Cl]2(0.5mmol)を添加した。次いで、(6−メチル−7−オキサビシクロ[4.1.0]ヘプタ−3−イル)メタノール(0.05mol)を2時間かけて滴下して加え、窒素雰囲気下、反応温度95℃を維持しながら、酢酸ビニル12.6gを滴下して加えながら反応を行った。滴下終了後、1時間撹拌し、反応液をガスクロマトグラフィーで分析したところ、下記式(14)で表される1−メチル−4−ビニロキシ−7−オキサビシクロ[4.1.0]ヘプタンが95%の収率で生成していた。1H-NMR(CDCl3)を測定したところ、合成例1と同様に、6.5ppmと4.2ppm、4.05ppmにビニル基特有のシグナルが観測された。
12.6 g (0.1 mol) of (4-methylcyclohex-3-enyl) methanol was epoxidized at 65 ° C. using a 5 wt% peracetic acid-ethyl acetate solution. By purification by distillation, 12 g of 98% pure (6-methyl-7-oxabicyclo [4.1.0] hept-3-yl) methanol was obtained.
100 mL of a mixed solution of sodium carbonate (0.06 mol) and toluene was heated to 95 ° C. While maintaining 95 ° C., 4.2 g of vinyl acetate was added dropwise, and 15 minutes later, di-μ-chlorobis (1,5-cyclooctadiene) diiridium (I) [Ir (cod) Cl] 2 (0. 5 mmol) was added. Subsequently, (6-methyl-7-oxabicyclo [4.1.0] hept-3-yl) methanol (0.05 mol) was added dropwise over 2 hours, and the reaction temperature was maintained at 95 ° C. under a nitrogen atmosphere. The reaction was performed while adding dropwise 12.6 g of vinyl acetate. After the completion of the dropwise addition, the mixture was stirred for 1 hour, and the reaction solution was analyzed by gas chromatography. As a result, 1-methyl-4-vinyloxy-7-oxabicyclo [4.1.0] heptane represented by the following formula (14) was obtained. It was produced in a yield of 95%. When 1 H-NMR (CDCl 3 ) was measured, as in Synthesis Example 1, signals specific to the vinyl group were observed at 6.5 ppm, 4.2 ppm, and 4.05 ppm.
合成例4
4−クロロメチルシクロヘキセン(0.1mol)と1,4−シクロヘキサンジオール(0.5mol)、テトラブチルアンモニウムブロミド(0.01mol)をトルエン(500g)に加え、90℃まで昇温した後に、5N−NaOH水溶液(100g)を滴下し、5時間撹拌した。トルエン溶液(トルエン層)を水洗した後、濃縮し、シリカゲルクロマトグラフィーにて精製し、純度99%の4−(シクロヘキサ−3−エニルメトキシ)シクロヘキサノールを13g得た。
4−(シクロヘキサ−3−エニルメトキシ)シクロヘキサノールを用い、合成例3と同様にエポキシ化して、4−(7−オキサビシクロ[4.1.0]ヘプタ−3−イルメトキシ)シクロヘキサノールを8g得た。
また、(6−メチル−7−オキサビシクロ[4.1.0]ヘプタ−3−イル)メタノールの代わりに上記4−(7−オキサビシクロ[4.1.0]ヘプタ−3−イルメトキシ)シクロヘキサノールを用い、合成例3と同様にビニルエーテル化して、下記式(15)で表される3−(4−ビニロキシシクロヘキシロキシメチル)−7−オキサビシクロ[4.1.0]ヘプタンを合成した。1H-NMR(CDCl3)を測定したところ、合成例1と同様に、6.5ppmと4.2ppm、4.04ppmにビニル基特有のシグナルが観測された。
4-Chloromethylcyclohexene (0.1 mol), 1,4-cyclohexanediol (0.5 mol) and tetrabutylammonium bromide (0.01 mol) were added to toluene (500 g), and the temperature was raised to 90 ° C. Aqueous NaOH (100 g) was added dropwise and stirred for 5 hours. The toluene solution (toluene layer) was washed with water, concentrated and purified by silica gel chromatography to obtain 13 g of 99% pure 4- (cyclohex-3-enylmethoxy) cyclohexanol.
4- (Cyclohex-3-enylmethoxy) cyclohexanol was epoxidized in the same manner as in Synthesis Example 3 to obtain 8 g of 4- (7-oxabicyclo [4.1.0] hept-3-ylmethoxy) cyclohexanol. It was.
Further, in place of (6-methyl-7-oxabicyclo [4.1.0] hept-3-yl) methanol, the above 4- (7-oxabicyclo [4.1.0] hept-3-ylmethoxy) cyclo Using hexanol, vinyl etherification was performed in the same manner as in Synthesis Example 3 to synthesize 3- (4-vinyloxycyclohexyloxymethyl) -7-oxabicyclo [4.1.0] heptane represented by the following formula (15). . When 1 H-NMR (CDCl 3 ) was measured, as in Synthesis Example 1, signals specific to the vinyl group were observed at 6.5 ppm, 4.2 ppm, and 4.04 ppm.
[カチオン重合性樹脂組成物の硬化物]
実施例1〜9及び比較例1〜5
Examples 1-9 and Comparative Examples 1-5
表1に示される種類及び量のビニルエーテル化合物、オリゴマー又はポリマー及び光カチオン重合開始剤を混合溶解してカチオン重合性樹脂組成物を調製した。
厚み1mm又は200μmのテフロン(登録商標)板をサンプル形状(15mm×60mm)に切り抜き、その片面をテフロン(登録商標)コートしたPETフィルム、続いてガラス板で上下に挟んで積層体(ガラス板/PET/テフロン(登録商標)/PET/ガラス板)を形成した。
上記調製したカチオン重合性樹脂組成物を、サンプル形状の切り抜き部分に注射器で注入し、次いでコンベアー式紫外線照射装置を用いて下記条件下で紫外線(UV)を照射することにより、用いたテフロン(登録商標)板に対応する厚み1mm又は200μmの硬化物を形成した。
得られたカチオン重合性樹脂組成物の硬化速度、及び得られた硬化物のゲル分率、硬化速度、初期光損失、加熱後光損失、屈曲性、耐熱性、熱分解温度を下記の方法で測定、評価した。
A cationically polymerizable resin composition was prepared by mixing and dissolving the vinyl ether compound, oligomer or polymer and photocationic polymerization initiator in the types and amounts shown in Table 1.
A Teflon (registered trademark) plate having a thickness of 1 mm or 200 μm is cut into a sample shape (15 mm × 60 mm), a PET film coated with Teflon (registered trademark) on one side, and then sandwiched vertically by a glass plate (glass plate / PET / Teflon (registered trademark) / PET / glass plate).
The prepared Teflon (registered) was prepared by injecting the prepared cationic polymerizable resin composition into the cut-out portion of the sample shape with a syringe, and then irradiating ultraviolet rays (UV) under the following conditions using a conveyor type ultraviolet irradiation device. A cured product having a thickness of 1 mm or 200 μm corresponding to the (trademark) plate was formed.
The curing rate of the obtained cationic polymerizable resin composition, and the gel fraction, curing rate, initial light loss, light loss after heating, flexibility, heat resistance, and thermal decomposition temperature of the obtained cured product are as follows. Measurement and evaluation.
UV硬化条件:
UV照射装置:商品名「UVC−02516S1AA02」(ウシオ電機製)
メタルハライドランプ
照射条件:160W
コンベアー速度:2m/min
照射回数:1回
UV curing conditions:
UV irradiation device: trade name “UVC-02516S1AA02” (manufactured by USHIO)
Metal halide lamp Irradiation conditions: 160W
Conveyor speed: 2m / min
Number of irradiation: 1 time
なお、表1のビニルエーテル化合物、オリゴマー又はポリマー、及び光カチオン重合開始剤における各符号は下記の通りである。
[ビニルエーテル化合物]
(A1):合成例1で得られた3,3-ビス(ビニロキシメチル)オキセタン
(A2):合成例2で得られた3−エチル−3−(4−ビニロキシシクロヘキシルオキシメチル)オキセタン
(B1):合成例3で得られた1−メチル−4−ビニロキシ−7−オキサビシクロ[4.1.0]ヘプタン
(B2):合成例4で得られた3−(4−ビニロキシシクロヘキシロキシメチル)−7−オキサビシクロ[4.1.0]ヘプタン
(X):1,4−シクロヘキサンジメタノールジビニルエーテル(アルドリッチ社製)
[オリゴマー又はポリマー]
(PB3600):両末端に水酸基を有するエポキシ化ポリブタジエン(商品名「PB3600」、ダイセル化学工業社製)
(CD220PL):ポリカーボネートジオール(商品名「CD220PL」、ダイセル化学工業社製)
(セロキサイド 2021P):環状エーテル化合物(商品名「セロキサイド 2021P」、ダイセル化学工業社製)
[光カチオン重合開始剤]
(Irgacure 250):商品名「Irgacure 250」(チバ・ジャパン株式会社製)
(PI 2074):商品名「PI 2074」(ローディア社製)
In addition, each code | symbol in the vinyl ether compound of Table 1, an oligomer or a polymer, and a photocationic polymerization initiator is as follows.
[Vinyl ether compounds]
(A1): 3,3-bis (vinyloxymethyl) oxetane obtained in Synthesis Example 1
(A2): 3-ethyl-3- (4-vinyloxycyclohexyloxymethyl) oxetane obtained in Synthesis Example 2
(B1): 1-methyl-4-vinyloxy-7-oxabicyclo [4.1.0] heptane obtained in Synthesis Example 3
(B2): 3- (4-vinyloxycyclohexyloxymethyl) -7-oxabicyclo [4.1.0] heptane obtained in Synthesis Example 4
(X): 1,4-cyclohexanedimethanol divinyl ether (manufactured by Aldrich)
[Oligomer or polymer]
(PB3600): Epoxidized polybutadiene having hydroxyl groups at both ends (trade name “PB3600”, manufactured by Daicel Chemical Industries, Ltd.)
(CD220PL): Polycarbonate diol (trade name “CD220PL”, manufactured by Daicel Chemical Industries, Ltd.)
(Celoxide 2021P): Cyclic ether compound (trade name “Celoxide 2021P”, manufactured by Daicel Chemical Industries, Ltd.)
[Photocationic polymerization initiator]
(Irgacure 250): Trade name “Irgacure 250” (manufactured by Ciba Japan Co., Ltd.)
(PI 2074): Product name “PI 2074” (manufactured by Rhodia)
評価試験
(ゲル分率)
実施例及び比較例で得られた厚さ200μmの硬化物をメチルエチルケトン溶剤に入れ、抽出前の初期重量と、抽出乾燥後の重量とを測定し、下記式によりゲル分率を算出した。
ゲル分率(%)=(抽出乾燥後の重量)/(抽出前の初期重量)×100
Evaluation test (gel fraction)
The 200 μm thick cured products obtained in the examples and comparative examples were put in a methyl ethyl ketone solvent, the initial weight before extraction and the weight after extraction drying were measured, and the gel fraction was calculated by the following formula.
Gel fraction (%) = (weight after extraction drying) / (initial weight before extraction) × 100
(硬化速度)
実施例及び比較例で得られたカチオン重合性樹脂組成物を上記ベルトコンベアーを使用して紫外線を照射して、下記基準に従って評価した。
評価基準
硬化物を得ることができた:○
増粘状態で、固化していなかった:×
(Curing speed)
The cationic polymerizable resin compositions obtained in the examples and comparative examples were irradiated with ultraviolet rays using the belt conveyor and evaluated according to the following criteria.
Evaluation criteria A cured product was obtained: ○
Thickened and not solidified: ×
(初期光損失及び加熱後光損失)
実施例及び比較例で得られた厚さ1mmの硬化物をダイシングにより幅1mmに切断し、光損失測定用サンプルとした。硬化直後(初期)及び200℃で1時間加熱処理後(加熱後)のサンプルについて、カットバック法により、波長850nmの光源をポリマクラッドファイバ(PCF)用いて入射し、5mmφの検出部を有するディテクターで受光して光損失(dB/cm)を測定した。
(Initial light loss and light loss after heating)
The cured product having a thickness of 1 mm obtained in Examples and Comparative Examples was cut into a width of 1 mm by dicing to obtain a sample for measuring optical loss. A detector having a detection section of 5 mmφ that is incident on a light source having a wavelength of 850 nm using a polymer clad fiber (PCF) by a cut-back method for samples immediately after curing (initial stage) and after heat treatment at 200 ° C. for 1 hour (after heating). The light loss (dB / cm) was measured.
(屈曲性)
実施例及び比較例で得られた厚さ200μmの硬化物を半径2mmの棒に巻き付けてクラック(ひび割れ)の有無を目視で観察し、下記基準に従って評価した。
評価基準
クラック(ひび割れ)が見られなかった:○
クラック(ひび割れ)がみられた:×
(Flexibility)
The cured product having a thickness of 200 μm obtained in Examples and Comparative Examples was wound around a rod having a radius of 2 mm, and the presence or absence of cracks (cracks) was visually observed and evaluated according to the following criteria.
Evaluation criteria No cracks were observed: ○
Cracks were observed: ×
(耐熱性)
実施例及び比較例で得られた厚さ200μmの硬化物を200℃のオーブンで2時間加熱処理を施し、加熱処理前後での重量変化(重量減少度合)を測定し、下記基準に従って評価した。
評価基準
重量変化が5%以下であった:○
重量変化が5%より大きく、10%以下であった:△
重量変化が10%より大きかった:×
(Heat-resistant)
The cured products having a thickness of 200 μm obtained in Examples and Comparative Examples were subjected to heat treatment in an oven at 200 ° C. for 2 hours, and the change in weight (weight reduction degree) before and after the heat treatment was measured and evaluated according to the following criteria.
Evaluation criteria The weight change was 5% or less:
The weight change was greater than 5% and less than 10%:
Weight change was greater than 10%: ×
(熱分解温度)
実施例及び比較例で得られた厚さ200μmの硬化物をサンプルとして、サンプルの熱分解温度トップピークをDSC(Differential Scanning Calorimetry)により測定し、下記基準に従って評価した。
評価基準
分解温度トップピークが300℃以上であった:○
分解温度トップピークが300℃を下回った:×
(Pyrolysis temperature)
Using the cured product having a thickness of 200 μm obtained in Examples and Comparative Examples as samples, the thermal decomposition temperature top peak of the samples was measured by DSC (Differential Scanning Calorimetry) and evaluated according to the following criteria.
Evaluation Criteria Decomposition temperature top peak was 300 ° C. or higher: ○
Decomposition temperature top peak was below 300 ° C: x
上記表1より、本発明に係るカチオン重合性樹脂組成物は、ゲル分率が94%以上の値を示すことより、高反応性を有することがわかった。また、耐熱性、及び柔軟性に優れ、加熱することによる光損失の上昇を抑制することができることがわかった。一方、オリゴマー又はポリマーとして本発明におけるオリゴマー又はポリマー(C)を使用しない場合、柔軟性に乏しいことがわかった。また、ビニルエーテル化合物としてオキセタン環含有ビニルエーテル化合物(A)又は脂環エポキシ基含有ビニルエーテル化合物(B)以外を使用した場合、透明性が低いため初期光損失が大きく、その上、耐熱性を有しないため加熱することにより更に光損失の上昇がみられた。 From the said Table 1, it turned out that the cationically polymerizable resin composition which concerns on this invention has high reactivity from a gel fraction showing the value of 94% or more. It was also found that heat resistance and flexibility were excellent, and an increase in light loss due to heating could be suppressed. On the other hand, when not using the oligomer or polymer (C) in this invention as an oligomer or a polymer, it turned out that it is lacking in a softness | flexibility. Moreover, when other than the oxetane ring-containing vinyl ether compound (A) or the alicyclic epoxy group-containing vinyl ether compound (B) is used as the vinyl ether compound, the initial light loss is large due to low transparency, and furthermore, it does not have heat resistance. Further increase in light loss was observed by heating.
[導波路特性]
実施例10〜19及び比較例6〜10
Examples 10 to 19 and Comparative Examples 6 to 10
表2、3に示される種類及び量のビニルエーテル化合物、オリゴマー又はポリマー及び光カチオン重合開始剤を混合溶解してカチオン重合性樹脂組成物を調製した。
フィルム基剤上に、実施例及び比較例で得られたカチオン重合性樹脂組成物を硬化物の厚みが60μmになるように塗布し、次いでコンベアー式紫外線照射装置を用いて下記条件下で紫外線を照射することにより、導波路クラッド用ベースフィルムを作製した。
A cationically polymerizable resin composition was prepared by mixing and dissolving the vinyl ether compound, oligomer or polymer and photocationic polymerization initiator in the types and amounts shown in Tables 2 and 3.
On the film base, the cationic polymerizable resin compositions obtained in Examples and Comparative Examples were applied so that the cured product had a thickness of 60 μm, and then ultraviolet rays were applied under the following conditions using a conveyor type ultraviolet irradiation device. By irradiating, a waveguide clad base film was produced.
次に、ビニルエーテル化合物(A1)70重量部、両末端に水酸基を有するエポキシ化ポリブタジエン(PB3600)30重量部、光カチオン重合開始剤(Irgacure 250)5重量部、高屈折率材料(1−アクリロキシ−4−メトキシナフタレン、川崎化成社製)40重量部を混合溶解し、得られた化合物を上記導波路クラッド用ベースフィルム上に硬化物の厚みが60μmになるように塗布した後、通常のフォトソリグラフィー法を用いて幅60μmのコアを作製した。 Next, 70 parts by weight of vinyl ether compound (A1), 30 parts by weight of epoxidized polybutadiene (PB3600) having hydroxyl groups at both ends, 5 parts by weight of a cationic photopolymerization initiator (Irgacure 250), a high refractive index material (1-acryloxy- 4-methoxynaphthalene (manufactured by Kawasaki Kasei Co., Ltd.) 40 parts by weight was mixed and dissolved, and the obtained compound was applied onto the above-mentioned waveguide clad base film so that the thickness of the cured product was 60 μm, A core having a width of 60 μm was prepared by using a graphic method.
その後、導波路クラッド用ベースフィルムの作製に使用したカチオン重合性樹脂組成物を硬化物の厚みが60μmになるように塗布し、コンベアー式紫外線照射装置を使用して下記条件下で紫外線を照射することにより導波路を作製した。なお、コンベアー式紫外線照射装置は、上記と同様のものを同様の条件で使用した。
得られた導波路について、初期光損失、屈曲性、屈曲耐久性を下記の方法で測定、評価した。結果を表2、3に示す。
Thereafter, the cationic polymerizable resin composition used for the production of the waveguide clad base film is applied so that the thickness of the cured product is 60 μm, and ultraviolet light is irradiated under the following conditions using a conveyor type ultraviolet irradiation device. This produced a waveguide. In addition, the conveyor type ultraviolet irradiation device used the same thing as the above on the same conditions.
The obtained waveguide was measured and evaluated for the initial light loss, flexibility, and bending durability by the following methods. The results are shown in Tables 2 and 3.
なお、表2、3のビニルエーテル化合物、オリゴマー又はポリマー、及び光カチオン重合開始剤における各符号は上記と同様である。 In addition, each code | symbol in the vinyl ether compound of Table 2, 3, an oligomer or a polymer, and a photocationic polymerization initiator is the same as that of the above.
評価試験
(初期光損失)
実施例及び比較例で得られた導波路について、波長850nmのレーザーダイオード(LD)光源からの光を、コア径が50μmのグレーデッドインデックス型(GI)マルチファイバを用いて入射させ、伝搬光を200μmのポリマークラッドファイバ(PCF)で受光して、光損失(dB/cm)を測定した。
Evaluation test (initial light loss)
For the waveguides obtained in the examples and comparative examples, light from a laser diode (LD) light source having a wavelength of 850 nm is incident using a graded index type (GI) multi-fiber having a core diameter of 50 μm, and propagating light is incident. Light loss (dB / cm) was measured by receiving light with a 200 μm polymer clad fiber (PCF).
(屈曲性)
実施例及び比較例で得られた導波路(導波路長さ:5cm)を波長850nmの光源を用いてカットバック法により光損失(dB/cm)を測定した。続いて、半径2mmの棒に1周巻き付け(360°曲げ)、波長850nmの光源を用いてカットバック法により光損失(dB/cm)を測定し、巻き付けない場合と比較した巻き付けた場合の光損失の増加分から、屈曲性を評価した。
(Flexibility)
The optical loss (dB / cm) of the waveguides obtained in the examples and comparative examples (waveguide length: 5 cm) was measured by a cut-back method using a light source having a wavelength of 850 nm. Subsequently, light is wound around a rod with a radius of 2 mm (bending at 360 °), light loss (dB / cm) is measured by a cutback method using a light source with a wavelength of 850 nm, and light in the case of winding compared to the case without winding. Flexibility was evaluated from the increase in loss.
(屈曲耐久性)
実施例及び比較例で得られた導波路(導波路長さ:5cm)を、屈曲耐久試験器を用い、曲率半径5mm、屈曲速度約1秒の条件で100万回折り曲げ実施後、波長850nmの光源を用いてカットバック法により光損失(dB/cm)を測定し、屈曲を実施する前と比較した光損失の増加分から、屈曲耐久性を評価した。
(Bending durability)
The waveguides obtained in the examples and comparative examples (waveguide length: 5 cm) were bent 1 million times with a bending endurance tester under conditions of a radius of curvature of 5 mm and a bending speed of about 1 second, and then a wavelength of 850 nm. Light loss (dB / cm) was measured by a cut-back method using a light source, and bending durability was evaluated from the increase in light loss compared to before bending.
上記表2、3より、本発明に係る光導波路は、柔軟性を有し、360°に曲げることによる光損失の上昇を抑制することができることがわかった。また、繰り返し曲げることによる光損失の上昇も抑制することができることがわかった。一方、オリゴマー又はポリマーとして本発明におけるオリゴマー又はポリマー(C)を使用しない場合、柔軟性に乏しく、360°に曲げることにより、また、繰り返し曲げることにより、導波路にひび割れを発生したり、ひび割れの発生がなくとも光損失の上昇がみられた。 From Tables 2 and 3, it was found that the optical waveguide according to the present invention has flexibility and can suppress an increase in optical loss due to bending at 360 °. It was also found that an increase in optical loss due to repeated bending can be suppressed. On the other hand, when the oligomer or polymer (C) in the present invention is not used as the oligomer or polymer, the flexibility is poor, and the waveguide is cracked by bending to 360 ° or by bending repeatedly, There was an increase in optical loss even without any occurrence.
[透明封止剤]
実施例20〜25、比較例11〜13
Examples 20-25, Comparative Examples 11-13
表4に示される種類及び量のビニルエーテル化合物、オリゴマー又はポリマー及び光カチオン重合開始剤を混合溶解してカチオン重合性樹脂組成物を調製した。
得られたカチオン重合性樹脂組成物の透明性、熱及び湿度が透明性に及ぼす影響、密着性、熱及び湿度が密着性に及ぼす影響、耐クラック性を下記の方法で測定し、評価した。
A cationically polymerizable resin composition was prepared by mixing and dissolving the kinds and amounts of vinyl ether compounds, oligomers or polymers and photocationic polymerization initiators shown in Table 4.
The transparency, the influence of heat and humidity on transparency, the adhesion, the influence of heat and humidity on adhesion, and the crack resistance of the obtained cationic polymerizable resin composition were measured and evaluated by the following methods.
評価試験
(透明性)
実施例及び比較例で得られたカチオン重合性樹脂組成物を、アプリケーターを用いて剥離可能な基板(離型コートを施したガラス板)上に、100μmの厚みで塗布し、コンベアー式紫外線照射装置を用いて紫外線を照射することにより硬化させ、基板より剥離してサンプルを作製した。なお、コンベアー式紫外線照射装置は、上記と同様のものを同様の条件で使用した。
得られたサンプルについて、分光光度計(商品名「UV−2450」、島津製作所製)を用いて、波長400nmにおける光線透過率(T%)を測定し、下記基準に従って評価した。
評価基準
透明性良好(光線透過率が85T%以上):○
使用可能範囲(光線透過率が75T%以上、85T%未満):△
透明性不良(光線透過率が75T%未満):×
Evaluation test (transparency)
The cationic polymerizable resin compositions obtained in Examples and Comparative Examples were applied to a substrate (glass plate coated with a release coating) that can be removed using an applicator with a thickness of 100 μm, and a conveyor type ultraviolet irradiation device. Was cured by irradiating with ultraviolet rays, and peeled off from the substrate to prepare a sample. In addition, the conveyor type ultraviolet irradiation device used the same thing as the above on the same conditions.
About the obtained sample, the light transmittance (T%) in wavelength 400nm was measured using the spectrophotometer (brand name "UV-2450", Shimadzu Corporation make), and it evaluated according to the following reference | standard.
Evaluation criteria Excellent transparency (light transmittance is 85 T% or more): ○
Usable range (light transmittance is 75 T% or more and less than 85 T%): Δ
Poor transparency (light transmittance is less than 75T%): ×
(加熱、加湿後の透明性)
上記透明性試験で作製したサンプルについて、熱風オーブン中で260℃、1分間加熱した後、85℃、85%RH環境下で1週間放置した。その後、上記透明性試験と同様にして波長400nmにおける光線透過率(T%)を測定し、同様の基準で評価した。
(Transparency after heating and humidification)
About the sample produced by the said transparency test, after heating at 260 degreeC for 1 minute in a hot air oven, it was left to stand in 85 degreeC and 85% RH environment for 1 week. Thereafter, the light transmittance (T%) at a wavelength of 400 nm was measured in the same manner as in the transparency test, and evaluated according to the same criteria.
(密着性)
実施例及び比較例で得られたカチオン重合性樹脂組成物を、鋼板(縦150mm×横25mm×厚さ1.5mm)に50μmの厚みで塗布した後、コンベアー式紫外線照射装置を用いて紫外線を照射することにより硬化させてサンプルとした。なお、コンベアー式紫外線照射装置は、上記と同様のものを同様の条件で使用した。碁盤目試験により剥がれの有無を目視で観察し、下記基準に従って評価した。
評価基準
密着性良好[剥がれなし(100マスのうち剥がれゼロマス)]:○
使用可能範囲[一部剥がれあり(100マスのうち剥がれが1〜5マス)]:△
密着性不良[剥がれが著しい(100マスのうち6マス以上)]:×
(Adhesion)
After applying the cationic polymerizable resin composition obtained in Examples and Comparative Examples to a steel plate (length: 150 mm × width: 25 mm × thickness: 1.5 mm) at a thickness of 50 μm, ultraviolet rays were applied using a conveyor type ultraviolet irradiation device. A sample was cured by irradiation. In addition, the conveyor type ultraviolet irradiation device used the same thing as the above on the same conditions. The presence or absence of peeling was visually observed by a cross cut test and evaluated according to the following criteria.
Evaluation criteria Adhesiveness good [no peeling (zero peeling of 100 squares)]: ○
Usable range [with partial peeling (1-5 squares peeled out of 100 squares)]: Δ
Adhesiveness failure [peeling off is remarkable (more than 6 squares out of 100 squares)]: ×
(加熱、加湿後の密着性)
上記密着性試験で作製したサンプルについて、熱風オーブン中で260℃、1分間加熱した後、85℃、85%RH環境下で1週間放置した。その後、上記密着性試験と同様にして密着性を測定し、同様の基準で評価した。
(Adhesion after heating and humidification)
About the sample produced by the said adhesive test, after heating at 260 degreeC for 1 minute in a hot air oven, it was left to stand under 85 degreeC and 85% RH environment for 1 week. Thereafter, the adhesion was measured in the same manner as in the above-described adhesion test, and evaluated according to the same criteria.
(耐クラック性)
実施例及び比較例で得られたカチオン重合性樹脂組成物を、アプリケーターを用いて鋼板上に20μmの厚みで塗布した。コンベアー式紫外線照射装置を用いて紫外線を照射することにより硬化させてサンプルとした。この方法で各実施例及び比較例についてそれぞれ5個ずつサンプルを作製した。なお、コンベアー式紫外線照射装置は、上記と同様のものを同様の条件で使用した。
(Crack resistance)
The cationically polymerizable resin compositions obtained in Examples and Comparative Examples were applied to a steel plate with a thickness of 20 μm using an applicator. The sample was cured by irradiating with ultraviolet rays using a conveyor type ultraviolet irradiation device. By this method, five samples were prepared for each of the examples and comparative examples. In addition, the conveyor type ultraviolet irradiation device used the same thing as the above on the same conditions.
得られたサンプルを恒温恒湿槽(商品名「TSE−11−A」、エスペック(株)製)中に、−40℃(条件1)で30分間放置した後、85℃(条件2)で30分間放置するサイクルを連続で500サイクル繰り返した。なお、条件1から条件2、条件2から条件1への条件変更は昇温又は降温速度5℃/分で行った。
500サイクル繰り返した後、サンプルの接着界面に染色浸透探傷液(商品名「KD−CHECK RDP−1」、日本マテック(株)製)を塗布し、割れや剥離の有無を目視で観察し、下記基準に従って評価した。
評価基準
5つのサンプルにおいて、一切、割れ、剥離がみられなかった:○
5つのサンプルのうち、割れ、剥離が1つでもみられた:×
The obtained sample was allowed to stand at −40 ° C. (Condition 1) for 30 minutes in a constant temperature and humidity chamber (trade name “TSE-11-A”, manufactured by ESPEC Corporation), and then at 85 ° C. (Condition 2). The cycle of leaving for 30 minutes was repeated 500 cycles continuously. In addition, the condition change from Condition 1 to Condition 2 and from Condition 2 to Condition 1 was performed at a temperature increase or temperature decrease rate of 5 ° C./min.
After repeating 500 cycles, a dye penetrant flaw detection solution (trade name “KD-CHECK RDP-1”, manufactured by Nippon Matec Co., Ltd.) was applied to the adhesion interface of the sample, and the presence or absence of cracks or peeling was visually observed. Evaluation was made according to criteria.
Evaluation criteria No cracking or peeling was observed in any of the five samples:
Of the five samples, even one crack or peeling was observed: ×
表4より、本発明に係るカチオン重合性樹脂組成物は、透明性、密着性に優れ、加熱、加湿によって、透明性及び密着性を損なうことがない。また、耐熱性を有するため、耐クラック性に優れる。一方、オリゴマー又はポリマー(C)を使用しない場合、密着性、及び耐クラック性の点で劣ることがわかった。また、オキセタン環含有ビニルエーテル化合物(A)及び脂環エポキシ基含有ビニルエーテル化合物(B)を使用しない場合、加熱、加湿することにより透明性、密着性が著しく低下し、耐クラック性の点で劣ることがわかった。 From Table 4, the cationically polymerizable resin composition according to the present invention is excellent in transparency and adhesion, and does not impair transparency and adhesion by heating and humidification. Moreover, since it has heat resistance, it is excellent in crack resistance. On the other hand, when not using an oligomer or a polymer (C), it turned out that it is inferior in the point of adhesiveness and crack resistance. In addition, when not using the oxetane ring-containing vinyl ether compound (A) and the alicyclic epoxy group-containing vinyl ether compound (B), transparency and adhesion are remarkably lowered by heating and humidification, and crack resistance is poor. I understood.
[ナノインプリント試験]
実施例26〜32、比較例14〜17
Examples 26-32, Comparative Examples 14-17
表5に示される種類及び量のビニルエーテル化合物、オリゴマー又はポリマー及び光カチオン重合開始剤を混合溶解してカチオン重合性樹脂組成物を調製した。
得られたカチオン重合性樹脂組成物をヘキサメチルジシラザンで前処理した4インチシリコンウェハに3000〜6000回転、60秒の条件でスピンコーティングして、厚さ0.1μmの皮膜を形成し、カチオン重合性樹脂組成物を塗布した皮膜の表面の状態について、塗布性を評価した。なお、溶剤を含むカチオン重合性樹脂組成物を用いた場合は、皮膜形成後に溶媒を除去するため、室温で5分間乾燥処理を施した。乾燥後の皮膜の厚さは約100nmであった。
A cationically polymerizable resin composition was prepared by mixing and dissolving the types and amounts of vinyl ether compounds, oligomers or polymers and photocationic polymerization initiator shown in Table 5.
The obtained cationic polymerizable resin composition was spin-coated on a 4-inch silicon wafer pretreated with hexamethyldisilazane at 3000 to 6000 rpm for 60 seconds to form a 0.1 μm thick film. The coatability was evaluated for the state of the surface of the film to which the polymerizable resin composition was applied. When a cationic polymerizable resin composition containing a solvent was used, a drying treatment was performed at room temperature for 5 minutes in order to remove the solvent after film formation. The film thickness after drying was about 100 nm.
インプリンティング装置には、コンピューターで制御された試験器(商品名「NM−0401」、明昌機工(株)社製)を用いた。これは、装荷、緩和速度、加熱温度等をプログラムすることで規定された圧力を特定の時間維持することが可能である。実施例及び比較例として、200nmのライン&スペースのパターンを有するナノスタンパを用いて、ナノインプリントを行った。なお、ナノスタンパは表面をフッ素処理剤(商品名「オプツール」、ダイキン化学社製)でフッ素処理を施したものを使用した。 As the imprinting apparatus, a computer-controlled tester (trade name “NM-0401”, manufactured by Myeongchang Kiko Co., Ltd.) was used. It is possible to maintain the specified pressure for a specific time by programming the loading, relaxation rate, heating temperature, etc. As an example and a comparative example, nanoimprinting was performed using a nano stamper having a 200 nm line and space pattern. In addition, the nano stamper used what gave the surface the fluorine processing with the fluorine processing agent (brand name "OPTOOL", Daikin Chemical Co., Ltd. make).
次いで、ナノスタンパと皮膜を接触させた状態で、付属の高圧水銀灯を用いて紫外線を照射(1200J/cm2)して硬化処理を施し、微細パターンを有する硬化物を得、ナノスタンパに対するカチオン重合性樹脂組成物の硬化物の剥離性、パターン精度、及び残存膜厚の評価を行った。 Next, in a state where the nano stamper and the film are in contact with each other, ultraviolet rays are irradiated (1200 J / cm 2 ) using the attached high-pressure mercury lamp to obtain a cured product having a fine pattern, and a cationic polymerizable resin for the nano stamper. The peelability of the cured product, the pattern accuracy, and the remaining film thickness were evaluated.
なお、表5のビニルエーテル化合物、オリゴマー又はポリマーにおける各符号は上記と同様である。
その他、溶剤として、プロピレングリコールモノメチルエーテルアセテート(PGMEA)を使用した。また、光カチオン重合開始剤として、商品名「PI 2074」(ローディア社製)を使用した。
In addition, each code | symbol in the vinyl ether compound of Table 5, an oligomer, or a polymer is the same as that of the above.
In addition, propylene glycol monomethyl ether acetate (PGMEA) was used as a solvent. Further, as a photocationic polymerization initiator, a trade name “PI 2074” (manufactured by Rhodia) was used.
(塗布性)
実施例及び比較例で得られたカチオン重合性樹脂組成物をシリコンウェハ上にスピンコーティングした後、表面の状態を目視で観察し、下記基準に従って評価した。
評価基準
均一な塗膜が得られた:○
スピンコート後塗膜のはじきが観察された:×
(Applicability)
After the cationic polymerizable resin compositions obtained in Examples and Comparative Examples were spin-coated on a silicon wafer, the surface state was visually observed and evaluated according to the following criteria.
Evaluation criteria A uniform coating film was obtained:
The film repelling was observed after spin coating: x
(剥離性)
紫外線照射により硬化させた後、カチオン重合性樹脂組成物の硬化物からナノスタンパを剥離したときの剥離性を下記基準に従って評価した。
評価基準
インプリントスタンプに力を加えることにより容易に剥離できた:○
容易に剥離することができなかった:×
(Peelability)
After curing by ultraviolet irradiation, the releasability when the nanostamper was peeled from the cured product of the cationic polymerizable resin composition was evaluated according to the following criteria.
Evaluation criteria It was easily peeled off by applying force to the imprint stamp: ○
Could not peel easily: ×
(パターン精度)
インプリント後、シリコンウェハ上に形成された1mm角のパターンを下記基準に従って評価した。
評価基準
シリコンウェハ上のパターン変形及びパターン抜けが1カ所以下であった:○
シリコンウェハ上のパターン変形及びパターン抜けが2〜10カ所であった:△
シリコンウェハ上のパターン変形及びパターン抜けが10カ所以上であった:×
(Pattern accuracy)
After imprinting, the 1 mm square pattern formed on the silicon wafer was evaluated according to the following criteria.
Evaluation criteria Pattern deformation and pattern omission on the silicon wafer were 1 or less: ○
There were 2 to 10 pattern deformations and pattern omissions on the silicon wafer: Δ
There were 10 or more pattern deformations and pattern omissions on the silicon wafer: x
(残存膜厚)
インプリント後、ナノスタンパを剥離し、シリコンウェハ上に形成されたパターン形状を走査型電子顕微鏡(SEM)を用いて残存膜厚の評価を行った。
評価基準
残存膜厚が10nm以下であった:○
残存膜厚が10nmより厚く、50nm未満であった:△
残存膜厚が50nm以上であった:×
(Remaining film thickness)
After imprinting, the nano stamper was peeled off, and the residual film thickness was evaluated using a scanning electron microscope (SEM) for the pattern shape formed on the silicon wafer.
Evaluation criteria The remaining film thickness was 10 nm or less:
The remaining film thickness was greater than 10 nm and less than 50 nm: Δ
The remaining film thickness was 50 nm or more: x
上記表5より、本発明に係るカチオン重合性樹脂組成物は、低粘度であるため塗布性に優れ、また、本発明に係るカチオン重合性樹脂組成物の硬化物は、柔軟性を有するため、ナノインプリント後、ナノスタンパからの剥離が容易であり、剥離後のナノスタンパに付着する残存膜厚を抑制することができることがわかった。また、高い精度でパターンを再現することができることがわかった。一方、オリゴマー又はポリマーとして本発明におけるオリゴマー又はポリマー(C)を使用しない場合、基材であるシリコンウェハ上にスピンコートしたところ、一部はじきが観察され、塗布性の点で問題があることがわかった。また、ナノスタンパからの剥離が困難となり、残存膜が厚くなった。 From Table 5 above, the cationic polymerizable resin composition according to the present invention is excellent in applicability because of its low viscosity, and the cured product of the cationic polymerizable resin composition according to the present invention has flexibility, It was found that after nanoimprinting, peeling from the nano stamper is easy, and the remaining film thickness attached to the nano stamper after peeling can be suppressed. It was also found that the pattern can be reproduced with high accuracy. On the other hand, when the oligomer or polymer (C) in the present invention is not used as the oligomer or polymer, when the spin coating is performed on the silicon wafer as the base material, a part of the repelling is observed and there is a problem in the coating property. all right. Further, peeling from the nano stamper became difficult and the remaining film became thick.
Claims (12)
の構造又はこれらの組み合わせよりなり、末端に水酸基、若しくは水素原子を有する分子量500以上のオリゴマー又はポリマー、又は、下記式(1e)
で表され、末端に水酸基、若しくは水素原子を有する分子量500以上のオリゴマー又はポリマーである請求項1に記載のカチオン重合性樹脂組成物。 The oligomer or polymer (C) is represented by the following formulas (1a) to (1d)
Or an oligomer or polymer having a hydroxyl group or a hydrogen atom at the terminal and having a molecular weight of 500 or more, or the following formula (1e)
The cationically polymerizable resin composition according to claim 1, which is an oligomer or polymer having a molecular weight of 500 or more having a hydroxyl group or a hydrogen atom at a terminal.
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010140481A1 (en) * | 2009-06-05 | 2010-12-09 | ダイセル化学工業株式会社 | Cationically polymerizable resin composition and cured object obtained therefrom |
JP2011107196A (en) * | 2009-11-12 | 2011-06-02 | Sumitomo Bakelite Co Ltd | Optical waveguide and method for manufacturing the same |
US20110207378A1 (en) * | 2008-08-28 | 2011-08-25 | Astrium Sas | Use of polymerisable resins with low vacuum outgassing for the manufacture of composite materials for use in space |
US20120009393A1 (en) * | 2009-03-20 | 2012-01-12 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Polymers made from mixtures comprising vinyl ether monomers |
WO2012124693A1 (en) | 2011-03-14 | 2012-09-20 | 旭化成ケミカルズ株式会社 | Organic/inorganic composite, manufacturing method therefor, organic/inorganic composite film, manufacturing method therefor, photonic crystal, coating material, thermoplastic composition, microstructure, optical material, antireflection member, and optical lens |
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WO2019082717A1 (en) * | 2017-10-23 | 2019-05-02 | 四国化成工業株式会社 | Epoxy-oxetane compound, method for synthesizing same, and use of said compound |
JP2019077674A (en) * | 2017-10-23 | 2019-05-23 | 四国化成工業株式会社 | Epoxy oxetane compound, synthetic method thereof, and application of the compound |
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04173883A (en) * | 1990-11-07 | 1992-06-22 | Tonen Corp | Polyester resin-based coating composition |
JPH07233112A (en) * | 1993-09-16 | 1995-09-05 | Ciba Geigy Ag | Vinyl ether compounds having additional functional groups in addition to vinyl ether groups and their use in the production of curable compositions |
JPH10316670A (en) * | 1997-05-16 | 1998-12-02 | Nippon Kayaku Co Ltd | New oxetane vinyl ether, polymerizable composition and its hardened product |
JPH11171967A (en) * | 1997-12-16 | 1999-06-29 | Nippon Kayaku Co Ltd | New alicyclic epoxyvinyl ether, polymerizable composition and its cured product |
JP2006152016A (en) * | 2004-11-25 | 2006-06-15 | Matsushita Electric Works Ltd | Epoxy resin composition, its manufacturing method, optical waveguide and electronic part |
JP2007031555A (en) * | 2005-07-26 | 2007-02-08 | Matsushita Electric Works Ltd | Epoxy resin composition, epoxy resin film, optical waveguide and photo/electric hybrid wiring board and electronic device |
JP2007051217A (en) * | 2005-08-18 | 2007-03-01 | Daicel Chem Ind Ltd | Curable resin composition and optical waveguide |
JP2007302808A (en) * | 2006-05-12 | 2007-11-22 | Daicel Chem Ind Ltd | Active energy ray-curable ink and printed matter |
-
2007
- 2007-12-07 JP JP2007316681A patent/JP2009138116A/en not_active Ceased
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04173883A (en) * | 1990-11-07 | 1992-06-22 | Tonen Corp | Polyester resin-based coating composition |
JPH07233112A (en) * | 1993-09-16 | 1995-09-05 | Ciba Geigy Ag | Vinyl ether compounds having additional functional groups in addition to vinyl ether groups and their use in the production of curable compositions |
JPH10316670A (en) * | 1997-05-16 | 1998-12-02 | Nippon Kayaku Co Ltd | New oxetane vinyl ether, polymerizable composition and its hardened product |
JPH11171967A (en) * | 1997-12-16 | 1999-06-29 | Nippon Kayaku Co Ltd | New alicyclic epoxyvinyl ether, polymerizable composition and its cured product |
JP2006152016A (en) * | 2004-11-25 | 2006-06-15 | Matsushita Electric Works Ltd | Epoxy resin composition, its manufacturing method, optical waveguide and electronic part |
JP2007031555A (en) * | 2005-07-26 | 2007-02-08 | Matsushita Electric Works Ltd | Epoxy resin composition, epoxy resin film, optical waveguide and photo/electric hybrid wiring board and electronic device |
JP2007051217A (en) * | 2005-08-18 | 2007-03-01 | Daicel Chem Ind Ltd | Curable resin composition and optical waveguide |
JP2007302808A (en) * | 2006-05-12 | 2007-11-22 | Daicel Chem Ind Ltd | Active energy ray-curable ink and printed matter |
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110207378A1 (en) * | 2008-08-28 | 2011-08-25 | Astrium Sas | Use of polymerisable resins with low vacuum outgassing for the manufacture of composite materials for use in space |
US20120009393A1 (en) * | 2009-03-20 | 2012-01-12 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Polymers made from mixtures comprising vinyl ether monomers |
JP2012520904A (en) * | 2009-03-20 | 2012-09-10 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | Polymers made from mixtures containing vinyl ether monomers |
US9212244B2 (en) | 2009-03-20 | 2015-12-15 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Polymers made from mixtures comprising vinyl ether monomers |
WO2010140481A1 (en) * | 2009-06-05 | 2010-12-09 | ダイセル化学工業株式会社 | Cationically polymerizable resin composition and cured object obtained therefrom |
JP2010280844A (en) * | 2009-06-05 | 2010-12-16 | Daicel Chem Ind Ltd | Cationic polymerizable resin composition and cured product thereof |
US20120077946A1 (en) * | 2009-06-05 | 2012-03-29 | Yoshinori Funaki | Cationically polymerizable resin composition and cured object obtained therefrom |
US8975349B2 (en) | 2009-06-05 | 2015-03-10 | Daicel Corporation | Cationically polymerizable resin composition and cured object obtained therefrom |
JP2011107196A (en) * | 2009-11-12 | 2011-06-02 | Sumitomo Bakelite Co Ltd | Optical waveguide and method for manufacturing the same |
WO2012124693A1 (en) | 2011-03-14 | 2012-09-20 | 旭化成ケミカルズ株式会社 | Organic/inorganic composite, manufacturing method therefor, organic/inorganic composite film, manufacturing method therefor, photonic crystal, coating material, thermoplastic composition, microstructure, optical material, antireflection member, and optical lens |
JP2016027120A (en) * | 2014-06-27 | 2016-02-18 | 株式会社ダイセル | Monomer composition, and curable composition comprising the same |
CN111093978A (en) * | 2017-07-28 | 2020-05-01 | 株式会社大赛璐 | Laminate and flexible device provided with same |
WO2019082717A1 (en) * | 2017-10-23 | 2019-05-02 | 四国化成工業株式会社 | Epoxy-oxetane compound, method for synthesizing same, and use of said compound |
JP2019077674A (en) * | 2017-10-23 | 2019-05-23 | 四国化成工業株式会社 | Epoxy oxetane compound, synthetic method thereof, and application of the compound |
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US10913731B2 (en) | 2017-10-23 | 2021-02-09 | Shikoku Chemicals Corporation | Epoxy-oxetane compound, method for synthesizing same, and use of said compound |
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