JP2009102674A - Plating method and plating apparatus - Google Patents

Abstract

To provide a plating method and a plating apparatus capable of easily setting a plating film composition to a desired composition.
A semiconductor wafer 23 and an anode 25 are immersed in a plating solution Q containing two or more kinds of metal ions, and a current is applied to the semiconductor wafer 23 to perform plating on a surface 23a of the semiconductor wafer 23. A plating method and a plating apparatus. The current density of the applied current is increased with the lapse of the plating time, or the stirring speed of the plating solution Q by the paddle 29 is decreased with the lapse of the plating time.
[Selection] Figure 1

Description

  The present invention relates to a plating method and a plating apparatus for plating a surface of a member to be plated such as a substrate (surface to be plated), and particularly to a fine wiring pattern provided on the surface of a semiconductor wafer, an electrode of a package, etc. The present invention relates to a plating method and a plating apparatus suitable for forming bumps to be connected.

  When an alloy plating film is formed, the easiness of deposition is determined by the standard electrode potential of each plating metal. Therefore, when the alloy is to be deposited on the plating film, the composition ratio must be controlled by the metal ion concentration and the additive in the plating solution.

  On the other hand, in recent years, in bump plating, the composition is shifting from Sn—Pb (tin-lead) alloy to Pb-free plating in consideration of the environmental impact. In the Sn—Pb alloy, the standard electrode potentials of both were close, and the composition control was relatively easy. However, the alloy composition that has been expected as Pb-free plating is mainly Sn-Cu (tin-copper), Sn-Ag (tin-silver), etc., but the standard electrode potential of each of Sn, Cu or Sn, Ag. Is different. For this reason, in order to control the alloy composition, it was necessary to control the metal ion concentration and the additive in the plating solution as described above.

  However, it is difficult to control the composition of the formed plating film even with a plating solution whose composition is controlled by the metal ion concentration and additives.

  In general, an alloy plating solution (for example, Sn—Ag alloy, Sn—Cu alloy) has a higher concentration of one metal (Ag concentration) in the plating film when the stirring rate of the plating solution is large, and conversely, the stirring rate of the plating solution. Is small, it is known that the other metal concentration (Sn concentration or Cu concentration) in the plating film increases. In particular, in a very small region such as in a wiring, a concentration gradient can be formed in the wiring due to the relationship between the wiring depth and the diffusion of metal ions, so that the target composition is not reached. Therefore, it is necessary to adjust the metal concentration and additive concentration each time in different wiring patterns.

  In addition, when X-rays are used to examine the composition in the plating film after forming the plating film, only a few μm can be detected from the outermost surface layer. For this reason, if the compositions of the outermost layer, the intermediate layer, and the lower layer are different, the original composition of the film cannot be inspected.

Patent Document 1 discloses that by continuously controlling the temperature of the plating solution and the current density of the applied current, the particle content in the film thickness direction of the plating film is varied and at the same time the adhesion is improved. ing. However, Patent Document 1 does not improve the composition uniformity in the plating film.
JP-A-8-311696

  This invention is made | formed in view of the above-mentioned point, The objective is to provide the plating method and plating apparatus which can make the composition of a plating film into a desired composition easily.

  In the invention according to claim 1 of the present application, the surface to be plated of the member to be plated is plated by immersing the member to be plated in a plating solution containing at least two kinds of metal ions and applying an electric current to the member to be plated. In the plating method to be performed, the plating method is characterized in that the plating is performed while changing the current density of the applied current.

  Invention of Claim 2 of this application exists in the plating method of Claim 1 which raises the current density of the said electric current applied with progress of plating time.

  The invention according to claim 3 is a plating method in which a member to be plated is immersed in a plating bath containing at least two or more kinds of metal ions, and plating is performed while stirring the plating solution in the vicinity of the surface to be plated of the member to be plated. In the plating method, the plating is performed while changing the stirring speed of the plating solution with respect to the member to be plated.

  Invention of Claim 4 of this application exists in the plating method of Claim 3 which reduces the stirring speed of the said plating solution with progress of plating time.

  The invention according to claim 5 of the present application is characterized in that the metal ions are tin ions and silver ions, or tin ions and copper ions. It is in the plating method.

  The invention described in claim 6 is a plating tank filled with a plating solution containing metal ions, a member to be plated and an anode immersed in the plating solution, and a current supply for passing a current between the member to be plated and the anode. A plating apparatus for performing metal plating on a surface to be plated of a member to be plated by passing a current between the member to be plated and the anode by means of a current supply device, wherein the current supply device has a current density of an applied current. A plating apparatus is characterized by having current control means for performing plating while changing.

  The invention according to claim 7 is a plating tank filled with a plating solution containing metal ions, a member to be plated and an anode immersed in the plating solution, and a plating solution in the vicinity of a surface to be plated of the member to be plated. A plating solution agitating means for agitating the current and a current supply device for passing a current between the member to be plated and the anode. A current is passed between the member to be plated and the anode by the current supply device to the surface to be plated of the member to be plated. In the plating apparatus for performing metal plating, the plating solution stirring means includes a stirring control means for performing plating while changing the stirring speed of the plating solution with respect to the member to be plated.

  According to the first aspect of the present invention, the composition of the plating film can be easily controlled without changing the concentration of the plating solution by changing the current density of the applied current. Become.

  According to the second aspect of the present invention, even when bump plating (straight plating or mushroom plating) is performed, the composition of the plating film can be easily made uniform.

  According to the third aspect of the present invention, the composition of the plating film can be easily controlled without changing the concentration of the plating solution by changing the stirring speed of the plating solution with respect to the member to be plated. Is possible.

  According to the fourth aspect of the present invention, even when bump plating (straight plating or mushroom plating) is performed, the composition of the plating film can be easily made uniform.

  According to the invention described in claim 5 of the present application, the composition of the plating film can be easily set to a desired composition even in the case of tin-silver plating or tin-copper plating having a difference in standard electrode potential.

  According to the sixth aspect of the present invention, the composition of the plating film can be easily set to a desired composition by the current control means.

  According to the invention described in claim 7 of the present application, the composition of the plating film can be easily set to a desired composition by the stirring control means.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a schematic configuration diagram showing a plating apparatus 20 to which an embodiment of the present invention is applied. The plating apparatus 20 shown in the figure includes a plating tank (hereinafter referred to as “inner tank”) 21 filled with a plating solution Q containing at least two or more types of metal ions, and a member to be plated (hereinafter referred to as “inner bath”). A “semiconductor wafer” 23, an anode 25, a wafer jig 27 for holding the semiconductor wafer 23, and a plating solution stirring means (hereinafter “paddle”) for stirring the plating solution Q in the vicinity of the plating surface 23 a of the semiconductor wafer 23. 29), a current supply device 31 for passing a current between the semiconductor wafer 23 and the anode 25, an outer tank 33 for housing the inner tank 21, a pump 35 and a filter 37, and plating in the outer tank 33. A pipe 39 for circulating the liquid Q to the inner tank 21 is provided. Each component will be described below.

  In this embodiment, the plating solution Q contains tin ions and silver ions. The anode 25 is a metal anode and is made of the same soluble metal as the metal ions dissolved in the plating solution Q or an insoluble metal. As the insoluble metal, for example, platinum or titanium is used. The paddle 29 is substantially rod-shaped in this embodiment, and is installed in front of the surface to be plated 23 a of the semiconductor wafer 23 so as to be parallel to the surface to be plated 23 a and facing up and down. The paddle 29 is left and right (in the front and back direction in FIG. 1) while maintaining a certain distance from the surface 23a to be plated by means of stirring control means (hereinafter referred to as "paddle drive mechanism") 41 composed of a motor and its control device. The plating solution is stirred by moving (parallel movement in this embodiment), and a fresh plating solution is supplied to the surface 23 a to be plated of the semiconductor wafer 23.

  The current supply device 31 is electrically connected between the semiconductor wafer 23 and the anode 25 by a conductive wire, and thereby a current is passed between the semiconductor wafer 23 and the anode 25 through the plating solution Q. The current supply device 31 includes a current control unit that can program the supplied current value and the current supply time in a plurality of combinations. That is, for example, in the current control means, a pattern in which the supplied current value is gradually increased, a pattern in which the supplied current value is gradually increased after a predetermined time, or a supplied current value is gradually increased. It is possible to program a decreasing pattern. The current control unit includes a calculation unit, a storage unit, and the like.

  The size of the semiconductor wafer 23 provided to the plating apparatus 20 of the present invention is not particularly limited, and the diameter may be any diameter such as 200 mm or 300 mm. The surface of the semiconductor wafer 23 used in this embodiment is formed by opening a resist (photoresist) according to a pattern after forming a barrier layer and a seed layer. The seed layer is mainly made of metal such as gold, silver, copper, and aluminum, and is formed by sputtering, CVD, ALD, or the like.

  When a current is supplied between the semiconductor wafer 23 and the anode 25 by the current supply device 31, metal plating (tin-silver alloy plating in this embodiment) is performed on the plated surface 23a of the semiconductor wafer 23. At this time, the paddle 29 is driven by the paddle drive mechanism 41 to stir the plating solution Q just before the surface 23a to be plated of the semiconductor wafer 23 and supply the fresh plating solution Q to the surface 23a to be plated. Further, by driving the pump 35, the plating solution Q in the outer tub 33 is supplied to the inner tub 21, and the plating solution Q overflowed from the inner tub 21 is returned to the outer tub 33 and circulated again.

  And in this invention, when performing the said plating, changing the stirring speed of the plating solution Q with respect to the semiconductor wafer 23, or changing the current density of the electric current to apply, the thickness direction of the plating film formed is changed. The composition was made uniform. Hereinafter, the plating method in the case of the straight bump and the case of the mushroom bump will be specifically described.

[For straight bumps]
FIG. 2 is an enlarged schematic cross-sectional view of a main part showing a straight bump. The straight bump is formed by embedding the plating metal 1 in the opening 2a provided in the resist 2 made of an organic material. Under the resist 2 are formed a seed layer 3 made of a conductive metal and a barrier layer 4 made of a metal that prevents the plating metal 1 and the seed layer 3 from diffusing into the lower layer.

  If the current density at the time of forming the straight bump and the stirring speed of the plating solution Q by the paddle 29 are constant during the plating time, the alloy compositions of the upper layer 5, the intermediate layer 6 and the lower layer 7 of the plated metal 1 are different. End up. This is because the exchange efficiency of the plating solution Q accompanying the liquid stirring varies depending on the depth of the opening 2a.

  For example, in the case of a tin-silver alloy plating solution, when the plating solution exchange efficiency is increased, the silver concentration in the plating solution Q is always high, so the silver concentration in the film is also increased. That is, when the plating solution exchange efficiency is increased, noble metal is likely to be deposited. And in a straight bump, since the plating solution exchange efficiency is low in the lower layer 7, the silver concentration in the film becomes low. Since the plating solution exchange efficiency is higher in the intermediate layer 6 and the upper layer 5 than in the lower layer 7, the silver concentration in the film gradually increases. However, in the lower layer 7, the surface closest to the seed layer 3 is plated when the plating solution Q is still fresh, so the silver concentration in the film becomes high.

  That is, since the silver concentration in the plating solution Q is high in the lowermost portion of the lower layer 7, the silver concentration in the film is also increased, but thereafter, the silver concentration in the plating solution Q is reduced from the beginning in the upper portion of the lower layer 7 and the intermediate layer 6. Further, since the plating solution exchange efficiency is low, the concentration of silver in the film also decreases, and thereafter, in the upper layer 5, the influence of stirring of the plating solution Q increases, so that the plating solution exchange efficiency increases and the concentration of silver in the film increases.

Therefore, in the present invention, the following methods (1) and (2) are performed during plating in order to make the dispersion of the film composition in these straight bumps uniform.
(1) Method by controlling the stirring speed of the plating solution Q As shown in FIG. 3, the stirring speed of the plating solution Q by the paddle 29 (in this embodiment, the reciprocating speed (number of reciprocating movements / min) of the paddle 29) is determined as the plating time. It is a method of decreasing with the passage of time. That is, regarding the agitation of the plating solution, if the agitation is small, the exchange efficiency of the plating solution Q in the upper part of the opening 2a is lowered and the silver concentration in the film is lowered. As shown in FIG. 3, if the number of reciprocating movements of the paddle 29 is gradually reduced from the beginning of plating, the plating solution exchange efficiency is reduced to the lower layer 7 in the intermediate layer 6 and the upper layer 5 of the plating metal 1. Compared with it, it is made uniform without becoming higher, and the silver concentration (film composition) in the film is made uniform.

(2) Method by control of current density As shown in FIG. 4, this is a method of increasing the current density of the applied current as the plating time elapses. That is, regarding the current value (current density) applied to the plating solution Q, the silver concentration in the film decreases as the current value (current density) increases. FIG. 5 is a graph showing the relationship between the silver and tin deposition current density and the actual current density with respect to the potential, and the relationship between the deposited silver concentration and the potential. As shown in the figure, since the silver deposition (limit) current density is lower than the tin deposition (limit) current density, the silver concentration is low at a high current density. As shown in FIG. 4, if the current density is gradually increased from the beginning of plating as shown in FIG. 4, the plating solution exchange efficiency is increased in the intermediate layer 6 and the upper layer 5 of the plating metal 1, and the silver concentration in the deposited film is reduced. By increasing the current density, the concentration of silver in the deposited film is lowered and the film composition in the thickness direction of the straight bump is made uniform.

  In any of the methods (1) and (2), the stirring speed (reciprocating speed of the paddle 29) or the current density is changed linearly, but various other change states such as a stepped shape and a curved shape are used. May be reduced or increased.

[In case of mushroom bump]
FIG. 6 is an enlarged schematic cross-sectional view of a main part showing a mushroom bump. The mushroom bump is also formed by embedding the plating metal 11 in the opening 12a provided in the resist 12 made of an organic material. Under the resist 12, a seed layer 13 made of a conductive metal and a barrier layer 14 made of a metal that prevents diffusion of the plating metal 11 and the seed layer 13 into the lower layer are formed. Further, the plated metal 11 has mushroom portions 15 that grow radially after exceeding the upper surface of the resist 12.

  If the current density at the time of forming the mushroom bump and the stirring speed of the plating solution Q by the paddle 29 are constant during the plating time, the mushroom portion 15, the upper layer 16, the intermediate layer 17, and the lower layer of the plating metal 11 as described above. 18 is different in alloy composition. That is, the mushroom part 15 is most affected by the stirring of the plating solution, and the replacement efficiency of the plating solution Q is the highest. Therefore, the silver concentration in the film is also highest in the mushroom portion 15, and thereafter gradually decreases with the upper layer 16, the intermediate layer 17, and the lower layer 18.

Therefore, in the present invention, the following methods (a) and (b) are performed during plating in order to make the dispersion of the film composition in these mushroom bumps uniform.
(A) Method by controlling the stirring speed of the plating solution Q As shown in FIG. 7, the stirring speed of the plating solution Q by the paddle 29 (in this embodiment, the reciprocating speed (number of reciprocating movements / minute) of the paddle 29) is set to a predetermined value. In this method, the time is decreased to the plating time t1 with the passage of time and then further rapidly with the passage of time to the predetermined plating time. The predetermined plating time t1 is a time when the plated metal 11 exceeds the resist 12 (that is, a time when the mushroom portion 15 starts to be formed). That is, as described above, when the agitation of the plating solution is small, the exchange efficiency of the plating solution Q in the upper portion of the opening 12a is lowered, and the silver concentration in the film is lowered. As shown in FIG. 7, if the number of reciprocating movements of the paddle 29 is gradually reduced from the beginning of plating as shown in FIG. 7, the plating solution exchange efficiency is reduced to the lower layer 18 in the intermediate layer 17 and the upper layer 16 of the plating metal 11. Compared with it, it is made uniform without becoming higher, and the silver concentration (film composition) in the film is made uniform. Further, when the plating metal 11 exceeds the resist 12, the efficiency of replacing the plating solution Q is further increased. Therefore, the stirring rate of the plating solution is decreased more rapidly, and thereby the silver concentration in the film of the mushroom portion 15 is also increased. The silver concentration in the film of the lower layer 18, the middle layer 17 and the upper layer 16 was made uniform.

(B) Method by Controlling Current Density As shown in FIG. 8, the current density of the applied current is increased over time until a predetermined plating time t2, and then further rapidly with the passage of time until the predetermined plating time. To rise. The predetermined plating time t2 is a time when the plated metal 11 exceeds the resist 12 (that is, a time when the mushroom portion 15 starts to be formed). That is, as described above, the silver concentration in the film decreases as the current value (current density) applied to the plating solution Q increases. As shown in FIG. 8, if the current density is gradually increased from the beginning of plating as shown in FIG. 8, the plating solution exchange efficiency becomes higher in the intermediate layer 17 and the upper layer 16 of the plating metal 11 and the silver concentration in the film will increase. Therefore, the current density is increased to lower the silver concentration in the film, and the film composition in the thickness direction is made uniform. Further, when the plating metal 11 exceeds the resist 12, the plating solution exchange efficiency is further increased and the silver concentration in the film is further increased. Therefore, the current density is further increased, and the silver concentration in the film is further decreased. Make the composition uniform.

  In any of the methods (a) and (b), the stirring speed (reciprocating speed of the paddle 29) or the current density is changed linearly, but various other change states such as a stepped shape and a curved shape are used. May be reduced or increased.

  According to the above methods (1), (2), (a), and (b), plating films such as straight bumps and mushroom bumps having a uniform plating film composition can be obtained. Therefore, it is possible to accurately grasp the plating film composition by inspecting the composition in the vicinity of the plating film surface. Further, the plating film composition after reflowing the plating film can be made uniform.

  Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications can be made within the scope of the technical idea described in the claims and the specification and drawings. Is possible. Note that any shape, structure, or material not directly described in the specification and drawings is within the scope of the technical idea of the present invention as long as the effects and advantages of the present invention are exhibited. For example, in the above embodiment, tin-silver ions are used as the two types of metal ions contained in the plating solution, but other various metal ions such as tin-copper (Sn-Cu) ions having a difference in standard electrode potential. A combination of these may also be used. Further, the number of metal ions to be combined is not limited to two, and may be three or more.

  In the above embodiment, a paddle is used as the plating solution stirring means. However, the plating solution stirring means may be any means as long as it can stir the plating solution. For example, the plating solution is removed from the member to be plated by a rotary blade or a nozzle. Various other means such as means for spraying the surface to be plated and means for vibrating and stirring the plating solution near the surface to be plated by ultrasonic vibration may be used.

  In each of the above embodiments, an example of controlling the plating so that the plating film composition of the plating film is made uniform in each part has been shown. However, in some cases, plating with a desired change is made without making the plating film composition uniform in the thickness direction. The film composition can also be controlled.

  Further, if the plating method based on the change in current density and the plating method based on the change in the stirring speed of the plating solution according to the above two embodiments are simultaneously combined, a plating film having a desired composition can be obtained with higher accuracy. .

1 is a schematic configuration diagram showing a plating apparatus 20. It is a principal part expansion schematic sectional drawing which shows a straight bump. It is a figure which shows the relationship between plating time and the plating solution stirring speed by the paddle 29. FIG. It is a figure which shows the relationship between the plating time and the current density of the electric current to apply. It is a figure which shows the relationship between the precipitation current density of silver and tin with an electric potential, and an actual current density, and the relationship of the silver concentration with respect to an electric potential. It is a principal part expansion schematic sectional drawing which shows a mushroom bump. It is a figure which shows the relationship between plating time and the plating solution stirring speed by the paddle 29. FIG. It is a figure which shows the relationship between the plating time and the current density of the electric current to apply.

Explanation of symbols

20 Plating equipment 21 Plating tank 23 Semiconductor wafer (member to be plated)
23a Surface to be plated 25 Anode 27 Wafer jig 29 Paddle (Plating solution stirring means)
31 Current supply device 41 Paddle drive mechanism (stirring control means)
Q plating solution

Claims (7)

In a plating method for plating a plated surface of a member to be plated by immersing the member to be plated in a plating solution containing at least two or more kinds of metal ions and applying a current to the member to be plated.
A plating method comprising performing plating while changing a current density of an applied current.   The plating method according to claim 1, wherein the current density of the applied current is increased as the plating time elapses. In a plating method in which a member to be plated is immersed in a plating bath containing at least two types of metal ions, and plating is performed while stirring a plating solution in the vicinity of the surface to be plated of the member to be plated.
A plating method comprising performing plating while changing the stirring speed of a plating solution for a member to be plated.   The plating method according to claim 3, wherein the stirring speed of the plating solution is decreased as the plating time elapses.   The plating method according to any one of claims 1 to 4, wherein the metal ions are tin ions and silver ions, or tin ions and copper ions. A plating tank filled with a plating solution containing metal ions;
A member to be plated and an anode immersed in the plating solution;
A current supply device for passing a current between the member to be plated and the anode;
In a plating apparatus for performing metal plating on a surface to be plated of a member to be plated by passing a current between the member to be plated and an anode by a current supply device,
The current supply device has a current control means for performing plating while changing a current density of an applied current. A plating tank filled with a plating solution containing metal ions;
A member to be plated and an anode immersed in the plating solution;
A plating solution stirring means for stirring the plating solution in the vicinity of the surface to be plated of the member to be plated;
A current supply device for passing a current between the member to be plated and the anode;
In a plating apparatus for performing metal plating on a surface to be plated of a member to be plated by passing a current between the member to be plated and an anode by a current supply device,
The plating apparatus is characterized in that the plating solution stirring means has stirring control means for performing plating while changing the stirring speed of the plating solution with respect to the member to be plated.

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