JP2009046575A - Treating agent composition - Google Patents
Treating agent composition Download PDFInfo
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- JP2009046575A JP2009046575A JP2007213568A JP2007213568A JP2009046575A JP 2009046575 A JP2009046575 A JP 2009046575A JP 2007213568 A JP2007213568 A JP 2007213568A JP 2007213568 A JP2007213568 A JP 2007213568A JP 2009046575 A JP2009046575 A JP 2009046575A
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- Prior art keywords
- group
- agent composition
- unsaturated monomer
- coo
- integer
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 27
- 239000000178 monomer Substances 0.000 claims abstract description 37
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
- 229920001577 copolymer Polymers 0.000 claims abstract description 22
- 239000004575 stone Substances 0.000 claims abstract description 14
- 230000003373 anti-fouling effect Effects 0.000 claims abstract description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 239000010703 silicon Substances 0.000 claims abstract description 9
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims abstract description 8
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 7
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 6
- 239000002904 solvent Substances 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 238000007334 copolymerization reaction Methods 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 8
- 150000001875 compounds Chemical class 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- -1 acryl Chemical group 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- 235000019198 oils Nutrition 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
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- 239000004215 Carbon black (E152) Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
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- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
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- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 235000020289 caffè mocha Nutrition 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000006071 cream Substances 0.000 description 2
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- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 239000010438 granite Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical group ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- KTXWGMUMDPYXNN-UHFFFAOYSA-N 2-ethylhexan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCCC(CC)C[O-].CCCCC(CC)C[O-].CCCCC(CC)C[O-].CCCCC(CC)C[O-] KTXWGMUMDPYXNN-UHFFFAOYSA-N 0.000 description 1
- HEEQKGBUVVGWLI-UHFFFAOYSA-N 3-[benzyl(hydroxy)silyl]propyl prop-2-enoate Chemical compound C(C=C)(=O)OCCC[SiH](O)CC1=CC=CC=C1 HEEQKGBUVVGWLI-UHFFFAOYSA-N 0.000 description 1
- UDWIZRDPCQAYRF-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C=C UDWIZRDPCQAYRF-UHFFFAOYSA-N 0.000 description 1
- RIOVTDYYGZVCSA-UHFFFAOYSA-N 3-[dihydroxy(methyl)silyl]propyl prop-2-enoate Chemical compound C[Si](O)(O)CCCOC(=O)C=C RIOVTDYYGZVCSA-UHFFFAOYSA-N 0.000 description 1
- MCDBEBOBROAQSH-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C=C MCDBEBOBROAQSH-UHFFFAOYSA-N 0.000 description 1
- FVHIPRFQVIAXIZ-UHFFFAOYSA-N 3-[disilanyl(hydroxy)silyl]propyl prop-2-enoate Chemical compound O[SiH](CCCOC(=O)C=C)[SiH2][SiH3] FVHIPRFQVIAXIZ-UHFFFAOYSA-N 0.000 description 1
- DGBFOBNYTYHFPN-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound CCO[Si](C)(C)CCCOC(=O)C=C DGBFOBNYTYHFPN-UHFFFAOYSA-N 0.000 description 1
- MTPUQNANTIHVJG-UHFFFAOYSA-N 3-[hydroxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound C[Si](C)(O)CCCOC(=O)C=C MTPUQNANTIHVJG-UHFFFAOYSA-N 0.000 description 1
- ZCRUJAKCJLCJCP-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound CO[Si](C)(C)CCCOC(=O)C=C ZCRUJAKCJLCJCP-UHFFFAOYSA-N 0.000 description 1
- MYEFGHBUFAPKJO-UHFFFAOYSA-N 3-[methyl(dipropoxy)silyl]propyl prop-2-enoate Chemical compound CCCO[Si](C)(OCCC)CCCOC(=O)C=C MYEFGHBUFAPKJO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical group C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- HGEKXQRHZRDGKO-UHFFFAOYSA-N 3-tripropoxysilylpropyl prop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCOC(=O)C=C HGEKXQRHZRDGKO-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- WVXZWORMZBXJQT-UHFFFAOYSA-N C(C=C)(=O)OCCC[SiH](OC)CC1=CC=CC=C1 Chemical compound C(C=C)(=O)OCCC[SiH](OC)CC1=CC=CC=C1 WVXZWORMZBXJQT-UHFFFAOYSA-N 0.000 description 1
- UJDOETNLAHDHEW-UHFFFAOYSA-N C(CCCCCCCCCCCCCCC)[Si](OC)(OC)OC.C(CCCCCCCCCCCCCC)[Si](OC)(OC)OC Chemical compound C(CCCCCCCCCCCCCCC)[Si](OC)(OC)OC.C(CCCCCCCCCCCCCC)[Si](OC)(OC)OC UJDOETNLAHDHEW-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical group [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
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- 125000003172 aldehyde group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003708 ampul Substances 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
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- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- JEPXSTGVAHHRBD-UHFFFAOYSA-N trimethoxy(nonyl)silane Chemical compound CCCCCCCCC[Si](OC)(OC)OC JEPXSTGVAHHRBD-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- AXNJHBYHBDPTQF-UHFFFAOYSA-N trimethoxy(tetradecyl)silane Chemical compound CCCCCCCCCCCCCC[Si](OC)(OC)OC AXNJHBYHBDPTQF-UHFFFAOYSA-N 0.000 description 1
- QSYYSIXGDAAPNN-UHFFFAOYSA-N trimethoxy(tridecyl)silane Chemical compound CCCCCCCCCCCCC[Si](OC)(OC)OC QSYYSIXGDAAPNN-UHFFFAOYSA-N 0.000 description 1
- LIJFLHYUSJKHKV-UHFFFAOYSA-N trimethoxy(undecyl)silane Chemical compound CCCCCCCCCCC[Si](OC)(OC)OC LIJFLHYUSJKHKV-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
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Abstract
Description
本発明は多孔質基材、特には建築用石材などの多孔質基材に対して防汚性を付与する処理剤組成物に関するものである。 The present invention relates to a treatment agent composition that imparts antifouling properties to a porous substrate, particularly a porous substrate such as a building stone.
従来パーフルオロアルキル基(以下Rf基と記す。) を含有する単量体からなる重合体またはこれと他の単量体との共重合体を、有機溶媒溶液または水性分散液としたものを基材へ処理することで撥水撥油性を付与することは良く知られている。この撥水撥油性はRf基の表面配向により、基材表面の表面エネルギーが低くなることに起因している。従来、このRf基には炭素数が8以上のものが使用されているが、Rf基の炭素数が6以下になると基材表面の表面エネルギー低下能が劣るため、撥水撥油性も低下してしまう。そのためこのような炭素数の小さいRf基を含有する単量体からなる重合体を多孔質基材へ処理した場合、撥水撥油性は十分ではなかった。 Conventionally, a polymer comprising a monomer containing a perfluoroalkyl group (hereinafter referred to as Rf group) or a copolymer of this and another monomer is used as an organic solvent solution or aqueous dispersion. It is well known to impart water and oil repellency by treating the material. This water / oil repellency is attributed to the fact that the surface energy of the substrate surface is lowered by the surface orientation of the Rf group. Conventionally, those having 8 or more carbon atoms have been used as the Rf group. However, when the carbon number of the Rf group is 6 or less, the surface energy reduction ability of the substrate surface is inferior, so that the water and oil repellency also decreases. End up. Therefore, when such a polymer composed of a monomer containing an Rf group having a small number of carbon atoms is treated on a porous substrate, the water / oil repellency is not sufficient.
本発明の目的は、炭素数が6以下のRf基を含有する単量体と他の重合体からなる共重合体を用いて、石材など多孔質基材に対して優れた表面の防汚性を付与する処理剤組成物を提供する事に有る。 An object of the present invention is to provide a surface antifouling property excellent for a porous substrate such as a stone using a copolymer comprising a monomer containing an Rf group having 6 or less carbon atoms and another polymer. It is in providing the processing agent composition which provides.
本発明は、(1)下式(I)で表されるフルオロアルキル基含有エチレン性不飽和単量体、(2)イソボニル基含有エチレン性不飽和単量体、および(3)含ケイ素不飽和単量体を共重合してなる共重合体(A)と、溶媒を含有する、処理剤組成物である。
CH2=CR1−COO−(CH2)n1−Rf (I)
ただし、式中の記号は以下の意味を示す。
Rf:炭素数1〜6のパーフルオロアルキル基。
n1:0〜3の整数。
R1:水素原子またはメチル基。
The present invention includes (1) a fluoroalkyl group-containing ethylenically unsaturated monomer represented by the following formula (I), (2) an isobornyl group-containing ethylenically unsaturated monomer, and (3) silicon-containing unsaturated A treating agent composition containing a copolymer (A) obtained by copolymerizing monomers and a solvent.
CH 2 = CR 1 -COO- (CH 2) n 1 -Rf (I)
However, the symbols in the formulas have the following meanings.
Rf: C1-C6 perfluoroalkyl group.
n 1 : An integer of 0 to 3.
R 1 : a hydrogen atom or a methyl group.
前記共重合体(A)において、イソボニル基含有エチレン性不飽和単量体としては、下式(II)で表されるものが好ましい。
CH2=C(R2)−COO−(CH2)n2−IB (II)
ただし、式中の記号は以下の意味を示す。
R2:水素原子またはメチル基。
n2:0〜6の整数。
IB:イソボニル基。
In the copolymer (A), the isobornyl group-containing ethylenically unsaturated monomer is preferably represented by the following formula (II).
CH 2 = C (R 2) -COO- (CH 2) n 2 -IB (II)
However, the symbols in the formulas have the following meanings.
R 2 : a hydrogen atom or a methyl group.
integer of 0~6: n 2.
IB: Isobonyl group.
前記共重合体(A)において、含ケイ素不飽和単量体としては、下式(III)で表されるものが好ましい。
CH2=C(R3)−(COO)n3−(CH2)n4−SiR4R5R6 (III)
ただし、式中の記号は以下の意味を示す。
R3:水素原子またはメチル基。
R4、R5、R6:それぞれ独立して、炭素数1〜3のアルキル基、炭素数1〜3のアルコキシ基、OH基、またはフェニル基。
n3:0または1の整数。
n4:0〜6の整数。
In the copolymer (A), the silicon-containing unsaturated monomer is preferably represented by the following formula (III).
CH 2 = C (R 3) - (COO) n 3 - (CH 2) n 4 -SiR 4 R 5 R 6 (III)
However, the symbols in the formulas have the following meanings.
R 3 : a hydrogen atom or a methyl group.
R 4 , R 5 , R 6 : each independently an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an OH group, or a phenyl group.
n 3 : An integer of 0 or 1.
integer of 0~6: n 4.
前記共重合体(A)において、溶媒としては有機溶媒を用いることが好ましい。 In the copolymer (A), an organic solvent is preferably used as the solvent.
本発明の処理剤組成物は、多孔質基材の防汚用に用いることが好ましい。 The treatment agent composition of the present invention is preferably used for antifouling of a porous substrate.
前記多孔質基材としては石材が好ましい。 The porous substrate is preferably a stone material.
本発明の処理剤組成物で処理する事により、多孔質基材へ優れた防汚性を付与する事ができる。 By treating with the treating agent composition of the present invention, excellent antifouling property can be imparted to the porous substrate.
本発明の処理剤組成物は、共重合体(A)を含有する。共重合体(A)は、(1)式(I)で表されるフルオロアルキル基含有エチレン性不飽和単量体、(2)イソボニル基含有エチレン性不飽和単量体、および(3)含ケイ素不飽和単量体を共重合してなるものである。
CH2=CR1−COO−(CH2)n1−Rf (I)
ただし、式中の記号は以下の意味を示す。
Rf:炭素数1〜6のパーフルオロアルキル基。
n1:0〜3の整数。
R1:水素原子またはメチル基。
The treatment agent composition of the present invention contains a copolymer (A). The copolymer (A) comprises (1) a fluoroalkyl group-containing ethylenically unsaturated monomer represented by formula (I), (2) an isobornyl group-containing ethylenically unsaturated monomer, and (3) It is obtained by copolymerizing a silicon unsaturated monomer.
CH 2 = CR 1 -COO- (CH 2) n 1 -Rf (I)
However, the symbols in the formulas have the following meanings.
Rf: C1-C6 perfluoroalkyl group.
n 1 : An integer of 0 to 3.
R 1 : a hydrogen atom or a methyl group.
式(I)で表されるフルオロアルキル基含有エチレン性不飽和単量体(以下、化合物(I)と記す。他の式においても同様である。)のRfは、炭素数が1〜6のパーフルオロアルキル基である。該パーフルオロアルキル基は直鎖でも分岐していても良い。また場合により、エーテル性酸素原子を基中の炭素−炭素原子間に含んでも良い。 Rf of the fluoroalkyl group-containing ethylenically unsaturated monomer represented by formula (I) (hereinafter referred to as compound (I); the same applies to other formulas) has 1 to 6 carbon atoms. Perfluoroalkyl group. The perfluoroalkyl group may be linear or branched. In some cases, an etheric oxygen atom may be contained between carbon-carbon atoms in the group.
化合物(I)の具体例としては以下のものが挙げられる。
CH2=CH−COO−(CH2)2−CF3
CH2=CH−COO−(CH2)2−C2F5
CH2=CH−COO−(CH2)2−C4F9
CH2=CH−COO−(CH2)2−C6F13
CH2=C(CH3)−COO−(CH2)2−CF3
CH2=C(CH3)−COO−(CH2)2−C2F5
CH2=C(CH3)−COO−(CH2)2−C4F9
CH2=C(CH3)−COO−(CH2)2−C6F13
Specific examples of compound (I) include the following.
CH 2 = CH-COO- (CH 2) 2 -CF 3
CH 2 = CH-COO- (CH 2) 2 -C 2 F 5
CH 2 = CH-COO- (CH 2) 2 -C 4 F 9
CH 2 = CH-COO- (CH 2) 2 -C 6 F 13
CH 2 = C (CH 3) -COO- (CH 2) 2 -CF 3
CH 2 = C (CH 3) -COO- (CH 2) 2 -C 2 F 5
CH 2 = C (CH 3) -COO- (CH 2) 2 -C 4 F 9
CH 2 = C (CH 3) -COO- (CH 2) 2 -C 6 F 13
共重合体(A)における、化合物(I)の比率は、30〜90質量%が好ましく、40〜80質量%がより好ましい。化合物(I)の比率が30質量%未満では充分な撥水撥油性が発揮されない。また、90質量%を超えると、フッ素系有機溶剤への溶解性は向上するものの、より安価な炭化水素系溶媒への溶解性が低下する。化合物(I)は1種類だけでも、2種類以上用いても構わない。2種類以上用いた場合、その合計量が上記範囲に含まれることが好ましい。 30-90 mass% is preferable, and, as for the ratio of compound (I) in a copolymer (A), 40-80 mass% is more preferable. When the ratio of the compound (I) is less than 30% by mass, sufficient water / oil repellency cannot be exhibited. On the other hand, when it exceeds 90% by mass, the solubility in a fluorine-based organic solvent is improved, but the solubility in a cheaper hydrocarbon-based solvent is lowered. Compound (I) may be used alone or in combination of two or more. When using 2 or more types, it is preferable that the total amount is contained in the said range.
本発明において、イソボニル基含有エチレン性不飽和単量体としては、化合物(II)が挙げられる。
CH2=C(R2)−COO−(CH2)n2−IB (II)
ただし、式中の記号は以下の意味を示す。
R2:水素原子またはメチル基。
n2:0〜6の整数。
IB:イソボニル基。
In the present invention, the isobornyl group-containing ethylenically unsaturated monomer includes compound (II).
CH 2 = C (R 2) -COO- (CH 2) n 2 -IB (II)
However, the symbols in the formulas have the following meanings.
R 2 : a hydrogen atom or a methyl group.
integer of 0~6: n 2.
IB: Isobonyl group.
化合物(II)の具体例としては以下のものが挙げられる。
CH2=CH−COO−IB
CH2=CH−COO−(CH2)2−IB
CH2=C(CH3)−COO−IB
CH2=C(CH3)−COO−(CH2)2−IB
Specific examples of compound (II) include the following.
CH 2 = CH-COO-IB
CH 2 = CH-COO- (CH 2) 2 -IB
CH 2 = C (CH 3) -COO-IB
CH 2 = C (CH 3) -COO- (CH 2) 2 -IB
共重合体(A)における、化合物(II)の比率は、5〜60質量%が好ましく、20〜45質量%がより好ましい。5質量%未満では炭化水素系有機溶媒への溶解性が低くなり、60質量%を超えると充分な撥水撥油性が発揮されない。化合物(II)は1種類だけでも、2種類以上用いても構わない。2種類以上用いた場合、その合計量が上記範囲に含まれることが好ましい。 5-60 mass% is preferable and, as for the ratio of compound (II) in a copolymer (A), 20-45 mass% is more preferable. If it is less than 5% by mass, the solubility in a hydrocarbon-based organic solvent is low, and if it exceeds 60% by mass, sufficient water / oil repellency cannot be exhibited. Compound (II) may be used alone or in combination of two or more. When using 2 or more types, it is preferable that the total amount is contained in the said range.
本発明において、含ケイ素不飽和単量体としては、化合物(III)が挙げられる。
CH2=C(R3)−(COO) n3−(CH2)n4−SiR4R5R6 (III)
ただし、式中の記号は以下の意味を示す。
R3:水素原子またはメチル基。
R4、R5、R6:それぞれ独立して、炭素数1〜3のアルキル基、炭素数1〜3のアルコキシ基、OH基、またはフェニル基。
n3:0〜1の整数。
n4:0〜6の整数。
In the present invention, examples of the silicon-containing unsaturated monomer include compound (III).
CH 2 = C (R 3) - (COO) n 3 - (CH 2) n 4 -SiR 4 R 5 R 6 (III)
However, the symbols in the formulas have the following meanings.
R 3 : a hydrogen atom or a methyl group.
R 4 , R 5 , R 6 : each independently an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an OH group, or a phenyl group.
n 3: 0~1 integer.
integer of 0~6: n 4.
化合物(III)の具体例としては、γ-(メタ)アクリロキシプロピルトリメトキシシラン、γ-(メタ)アクリロキシプロピルトリエトキシシラン、γ-(メタ)アクリロキシプロピルトリプロポキシシラン、γ-(メタ)アクリロキシプロピルメチルジメトキシシラン、γ-(メタ)アクリロキシプロピルメチルジエトキシシラン、γ-(メタ)アクリロキシプロピルメチルジプロポキシシラン、γ-(メタ)アクリロキシプロピルジメチルメトキシシラン、γ-(メタ)アクリロキシプロピルジメチルエトキシシラン、γ-(メタ)アクリロキシプロピルフェニルメチルメトキシシラン、γ-(メタ)アクリロキシプロピルトリシラノール、γ-(メタ)アクリロキシプロピルメチルジヒドロキシシラン、γ-(メタ)アクリロキシプロピルフェニルジヒドロキシシラン、γ-(メタ)アクリロキシプロピルジメチルヒドロキシシラン、γ-(メタ)アクリロキシプロピルフェニルメチルヒドロキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルメチルジメトキシシラン、ビニルメチルジエトキシシラン、ビニルジメチルメトキシシラン、ビニルジメチルエトキシシラン、等が挙げられる。 Specific examples of the compound (III) include γ- (meth) acryloxypropyltrimethoxysilane, γ- (meth) acryloxypropyltriethoxysilane, γ- (meth) acryloxypropyltripropoxysilane, γ- (meta ) Acryloxypropylmethyldimethoxysilane, γ- (meth) acryloxypropylmethyldiethoxysilane, γ- (meth) acryloxypropylmethyldipropoxysilane, γ- (meth) acryloxypropyldimethylmethoxysilane, γ- (meta ) Acryloxypropyldimethylethoxysilane, γ- (meth) acryloxypropylphenylmethylmethoxysilane, γ- (meth) acryloxypropyltrisilanol, γ- (meth) acryloxypropylmethyldihydroxysilane, γ- (meth) acryl Roxypropylphenyl dihydro Sisilane, γ- (meth) acryloxypropyldimethylhydroxysilane, γ- (meth) acryloxypropylphenylmethylhydroxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinylmethyldimethoxysilane, vinylmethyldiethoxysilane, vinyldimethyl Examples include methoxysilane and vinyldimethylethoxysilane.
共重合体(A)における、化合物(III)の比率は、0.1〜10質量%が好ましく、1.0〜8.0質量%がより好ましい。0.1質量%未満では耐久性が低くなり、10質量%を超えると撥油性に悪影響を及ぼす。化合物(III)は1種類だけでも、2種類以上用いても構わない。2種類以上用いた場合、その合計量が上記範囲に含まれることが好ましい。 0.1-10 mass% is preferable and, as for the ratio of compound (III) in a copolymer (A), 1.0-8.0 mass% is more preferable. If it is less than 0.1% by mass, the durability is low, and if it exceeds 10% by mass, the oil repellency is adversely affected. Only one type of compound (III) may be used, or two or more types may be used. When using 2 or more types, it is preferable that the total amount is contained in the said range.
本発明の共重合体(A)において、(1)式(I)で表されるフルオロアルキル基含有エチレン性不飽和単量体、(2)イソボニル基含有エチレン性不飽和単量体、および(3)含ケイ素不飽和単量体に加えて、その他の不飽和単量体を用いることも可能である。共重合体(A)におけるその他の単量体の比率は、0〜50質量%が好ましく、0〜30質量%がより好ましい。 In the copolymer (A) of the present invention, (1) a fluoroalkyl group-containing ethylenically unsaturated monomer represented by the formula (I), (2) an isobornyl group-containing ethylenically unsaturated monomer, and ( 3) In addition to the silicon-containing unsaturated monomer, other unsaturated monomers can be used. 0-50 mass% is preferable and, as for the ratio of the other monomer in a copolymer (A), 0-30 mass% is more preferable.
その他の不飽和単量体としては、炭素数1〜18の(メタ)アクリル酸エステルや、反応性を有する官能基を含む単量体、例えば、マレイン酸、無水イタコン酸、無水コハク酸等のエチレン性不飽和カルボン酸類、(メタ)アクリルアミド、N−メチル(メタ)アクリルアミド、N−メチロール(メタ)アクリルアミド、N−ブトキシ(メタ)アクリルアミド等のアミド化合物、(メタ)アクリル酸ヒドロキシエチル、(メタ)アクリル酸ヒドロキシプロピル等の水酸基含有単量体、(メタ)アクリル酸グリシジル等のエポキシ基含有単量体、アクロレイン等のアルデヒド基含有単量体、カプロラクトン変性ヒドロキシ(メタ)アクリレート等が挙げられる。 Examples of other unsaturated monomers include (meth) acrylic acid esters having 1 to 18 carbon atoms and monomers containing reactive functional groups such as maleic acid, itaconic anhydride, succinic anhydride, and the like. Amide compounds such as ethylenically unsaturated carboxylic acids, (meth) acrylamide, N-methyl (meth) acrylamide, N-methylol (meth) acrylamide, N-butoxy (meth) acrylamide, hydroxyethyl (meth) acrylate, (meth ) Hydroxyl group-containing monomers such as hydroxypropyl acrylate, epoxy group-containing monomers such as glycidyl (meth) acrylate, aldehyde group-containing monomers such as acrolein, caprolactone-modified hydroxy (meth) acrylate, and the like.
本発明の処理剤組成物における、共重合体(A)の濃度は、0.5〜15質量%が好ましく、1.0〜5.0質量%がより好ましい。 0.5-15 mass% is preferable and, as for the density | concentration of the copolymer (A) in the processing agent composition of this invention, 1.0-5.0 mass% is more preferable.
本発明において、上記処理剤組成物の他に下式(IV)で表されるアルキルアルコキシシランを加えることで、石材内部に吸水防止層を形成させることも可能である。
R7n4−Si−X4−n4 (IV)
ただし、式中の記号は以下の意味を示す。
R7:炭素数1〜18のアルキル基。
X:加水分解性基。
n4:1〜3の整数。
In this invention, it is also possible to form a water absorption prevention layer inside a stone material by adding the alkyl alkoxysilane represented by the following Formula (IV) in addition to the said processing agent composition.
R 7 n 4 -Si-X4- n 4 (IV)
However, the symbols in the formulas have the following meanings.
R 7 : an alkyl group having 1 to 18 carbon atoms.
X: Hydrolyzable group.
n 4: 1~3 of integer.
式(IV)で表されるアルキルアルコキシシランとしては、メチルトリエトキシシラン、エチルトリエトキシシラン、ブチルトリエトキシシラン、ペンチルトリエトキシシラン、ヘキシルトリエトキシシラン、ヘプチルトリエトキシシラン、オクチルトリエトキシシラン、ノニルトリエトキシシラン、デシルトリエトキシシラン、ウンデシルトリエトキシシラン、ドデシルトリエトキシシラン、トリデシルトリエトキシシラン、テトラデシルトリエトキシシラン、ペンタデシルトリエトキシシラン、ヘキサデシルトリエトキシシラン、ヘプタデシルトリエトキシシラン、オクタデシルトリエトキシシラン、メチルトリメトキシシラン、エチルトリメトキシシラン、ブチルトリメトキシシラン、ペンチルトリメトキシシラン、ヘキシルトリメトキシシラン、ヘプチルトリメトキシシラン、オクチルトリメトキシシラン、ノニルトリメトキシシラン、デシルトリメトキシシラン、ウンデシルトリメトキシシラン、ドデシルトリメトキシシラン、トリデシルトリメトキシシラン、テトラデシルトリメトキシシラン、ペンタデシルトリメトキシシラン、ヘキサデシルトリメトキシシラン、ヘプタデシルトリメトキシシラン、オクタデシルトリメトキシシラン等が挙げられる。 Examples of the alkyl alkoxysilane represented by the formula (IV) include methyltriethoxysilane, ethyltriethoxysilane, butyltriethoxysilane, pentyltriethoxysilane, hexyltriethoxysilane, heptyltriethoxysilane, octyltriethoxysilane, and nonyl. Triethoxysilane, decyltriethoxysilane, undecyltriethoxysilane, dodecyltriethoxysilane, tridecyltriethoxysilane, tetradecyltriethoxysilane, pentadecyltriethoxysilane, hexadecyltriethoxysilane, heptadecyltriethoxysilane, Octadecyltriethoxysilane, methyltrimethoxysilane, ethyltrimethoxysilane, butyltrimethoxysilane, pentyltrimethoxysilane, hexyltrimeth Sisilane, heptyltrimethoxysilane, octyltrimethoxysilane, nonyltrimethoxysilane, decyltrimethoxysilane, undecyltrimethoxysilane, dodecyltrimethoxysilane, tridecyltrimethoxysilane, tetradecyltrimethoxysilane, pentadecyltrimethoxysilane Hexadecyltrimethoxysilane, heptadecyltrimethoxysilane, octadecyltrimethoxysilane and the like.
本発明の処理剤組成物における、アルキルアルコキシシランの濃度は、0.1〜20質量%が好ましく、1.0〜10質量%がより好ましい。 0.1-20 mass% is preferable and, as for the density | concentration of the alkyl alkoxysilane in the processing agent composition of this invention, 1.0-10 mass% is more preferable.
式(IV)で表されるアルキルアルコキシシランに加えて、式(V)で表されるアルキルシリケート及び、これらのオリゴマーを併用しても石材内部へ吸水防止層を形成させることができる。
Si−(OR8)4 (V)
ただし、式中のR8は炭素数1〜18のアルキル基を表す。
In addition to the alkylalkoxysilane represented by the formula (IV), the water absorption preventing layer can be formed inside the stone material even when the alkylsilicate represented by the formula (V) and these oligomers are used in combination.
Si- (OR 8 ) 4 (V)
However, R 8 in the formula represents an alkyl group having 1 to 18 carbon atoms.
式(V)で表されるアルキルシリケートとしては、メチルシリケート、エチルシリケート、プロピルシリケート、ブチルシリケート、またはこれらのオリゴマー等が挙げられる。 Examples of the alkyl silicate represented by the formula (V) include methyl silicate, ethyl silicate, propyl silicate, butyl silicate, and oligomers thereof.
本発明の処理剤組成物における、アルキルシリケート及び、これらのオリゴマーの濃度は、0.1〜20質量%が好ましく、1.0〜10質量%がより好ましい。 0.1-20 mass% is preferable and, as for the density | concentration of the alkyl silicate and these oligomers in the processing agent composition of this invention, 1.0-10 mass% is more preferable.
上記シラン成分の加水分解を促進する触媒として、例えば、ジブチル錫ジラウレート、ジブチル錫ジアセテート、ブチル錫トリ−2−エチルヘキソエートなどの有機錫化合物や、テトラブチルチタネート、テトラ−2−エチルヘキシルチタネート、オルガノシロキサンチタンなどの有機チタン化合物や、塩酸、リン酸、硫酸などの無機酸や、ギ酸、酢酸、クロロ酢酸等の有機酸などの酸性触媒、これら無機酸及び有機酸の第4級アンモニウム塩及びアミン塩が単独もしくは複数にて使用される。 Examples of the catalyst for promoting hydrolysis of the silane component include organic tin compounds such as dibutyltin dilaurate, dibutyltin diacetate, and butyltin tri-2-ethylhexoate, tetrabutyl titanate, and tetra-2-ethylhexyl titanate. Organic catalysts such as organosiloxane titanium, inorganic catalysts such as hydrochloric acid, phosphoric acid and sulfuric acid, acidic catalysts such as organic acids such as formic acid, acetic acid and chloroacetic acid, quaternary ammonium salts of these inorganic acids and organic acids And amine salts are used alone or in combination.
本発明の処理剤組成物における、触媒の濃度は、0.01〜5.0質量%が好ましく、0.1〜1.0質量%がより好ましい。 The concentration of the catalyst in the treatment agent composition of the present invention is preferably 0.01 to 5.0 mass%, more preferably 0.1 to 1.0 mass%.
本発明において、上記処理剤組成物は溶媒を含有するものであり、適当な溶媒に任意の割合に溶解して用いることができる。使用できる溶媒は特に制限はないが、これらの処理剤組成物を安定に溶解できるものが望ましい。そのような溶媒としては炭化水素系溶媒、アルコール系溶媒、エステル系溶媒、エーテル系溶媒、シリコーン系溶媒、フッ素系溶媒等を用いることができる。具体的には、2,2,4−トリメチルペンタン(以下、イソオクタンと記す。)などが挙げられる。またこれらの溶媒と相溶性のあるものとの混合溶媒も用いることができる。
本発明の塗布方法としては特に限定されず、例えばスプレー、刷毛塗装、ローラーコーター等による塗装、浸漬法等を適宜採用することができる。処理基材における本発明の組成物の膜厚は特に限定されるものではない。
In the present invention, the treating agent composition contains a solvent, and can be used by dissolving it in an appropriate solvent at an arbitrary ratio. The solvent that can be used is not particularly limited, but a solvent that can stably dissolve these treatment agent compositions is desirable. As such a solvent, a hydrocarbon solvent, an alcohol solvent, an ester solvent, an ether solvent, a silicone solvent, a fluorine solvent, or the like can be used. Specific examples include 2,2,4-trimethylpentane (hereinafter referred to as isooctane). Moreover, a mixed solvent with those compatible with these solvents can also be used.
The coating method of the present invention is not particularly limited, and for example, spraying, brush coating, coating with a roller coater, a dipping method, or the like can be appropriately employed. The film thickness of the composition of this invention in a process base material is not specifically limited.
本発明の組成物を調製するにあたっては、上記の他、更に、添加剤を含有させる事ができる。このような添加剤としては特に限定されず、例えば、顔料、防腐剤、抗菌剤、難燃剤、表面調整剤、硬化触媒、粘度調整剤、レベリング剤、紫外線吸収剤、消泡剤等のような通常用いられる公知の添加剤等を挙げることができる、またこれらの添加量も特に限定されず、通常の添加量を採用する事ができる。 In preparing the composition of the present invention, an additive can be further contained in addition to the above. Such additives are not particularly limited, and examples thereof include pigments, preservatives, antibacterial agents, flame retardants, surface modifiers, curing catalysts, viscosity modifiers, leveling agents, ultraviolet absorbers, antifoaming agents, and the like. Known additives and the like that are usually used can be mentioned, and the addition amount thereof is not particularly limited, and the usual addition amount can be adopted.
本発明の処理剤組成物は、多孔質基材に用いることが好ましい。特に、防汚処理剤として用いることが好ましい。 The treating agent composition of the present invention is preferably used for a porous substrate. In particular, it is preferably used as an antifouling treatment agent.
本発明の組成物を適用することができる多孔質基材としては、石材、コンクリート、木材等が挙げられる。中でも石材が好ましく、花崗岩、御影石、大理石等に代表される天然石が特に好ましい。 Examples of the porous substrate to which the composition of the present invention can be applied include stone, concrete, and wood. Of these, stones are preferable, and natural stones such as granite, granite, and marble are particularly preferable.
本発明の共重合体(A)は、塊状重合、溶液重合等の通常の重合方法であれば何れの製造方法でも良い。また反応条件も任意に選択可能である。重合方法としては、溶液重合が好ましい。 The copolymer (A) of the present invention may be any production method as long as it is a normal polymerization method such as bulk polymerization or solution polymerization. The reaction conditions can be arbitrarily selected. As the polymerization method, solution polymerization is preferred.
次に具体的実施例を用いて本発明を説明するが、これは本発明を限定するものではない。 Next, the present invention will be described with reference to specific examples, but this is not intended to limit the present invention.
(参考例1)
共重合体(A)の製造
パーフルオロ基含有エチレン性不飽和単量としてCH2=C(CH3)−COO−(CH2)2−C6F13を124.01g、イソボニル基含有エチレン性不飽和単量体としてイソボニルメタクリレート(共栄社化学社製「ライトエステル」IB−X)を72.27g、含ケイ素不飽和単量体としてγ−メタクリロキシプロピルトリメトキシシラン(信越化学製KBM−503)を13.69g、イソオクタン(和光純薬社製)を387.99g、2,2’−アゾビス(2,4−ジメチルバレロニトリル)(和光純薬社製)を2.10g、を1Lオートクレーブに入れて、窒素雰囲気下で攪拌し、65℃で、15時間重合反応を行った。ガスクロマトグラフィーによると反応率は90%以上を示した。得られた共重合体(A)溶液は固形分濃度35質量%であった。
(Reference Example 1)
Production of copolymer (A) 124.01 g of CH 2 ═C (CH 3 ) —COO— (CH 2 ) 2 —C 6 F 13 as perfluoro group-containing ethylenically unsaturated monomer, isobonyl group-containing ethylenic 72.27 g of isobornyl methacrylate (“Eye ester” IB-X manufactured by Kyoeisha Chemical Co., Ltd.) as the unsaturated monomer, and γ-methacryloxypropyltrimethoxysilane (KBM-503 manufactured by Shin-Etsu Chemical) as the silicon-containing unsaturated monomer ) 13.69 g, isooctane (manufactured by Wako Pure Chemical Industries, Ltd.) 387.999 g, 2,2′-azobis (2,4-dimethylvaleronitrile) (manufactured by Wako Pure Chemical Industries, Ltd.) 2.10 g, and 1 L autoclave. The mixture was stirred under a nitrogen atmosphere and polymerized at 65 ° C. for 15 hours. According to gas chromatography, the reaction rate was 90% or more. The obtained copolymer (A) solution had a solid content concentration of 35% by mass.
(実施例1)
参考例1で得られた共重合体(A)溶液を固形分濃度が2.5質量%となるようにイソオクタンで希釈して処理液を得た。続いて前記処理液を、天然石(モカクリーム)に処理し、室温で24時間以上放置をした後に表面を布で拭取り、防汚性試験を行った。なお、前記処理は、前記処理液をスポンジに染み込ませ、石材表面に塗り伸ばす方法で行った。
Example 1
The copolymer (A) solution obtained in Reference Example 1 was diluted with isooctane so that the solid content concentration was 2.5% by mass to obtain a treatment liquid. Subsequently, the treatment liquid was treated with natural stone (mocha cream), allowed to stand at room temperature for 24 hours or more, and then the surface was wiped with a cloth to conduct an antifouling test. The treatment was carried out by a method in which the treatment solution was soaked in a sponge and spread on the surface of a stone material.
(比較参考例1)
重合体の製造方法
パーフルオロ基含有エチレン性不飽和単量体CH2=C(CH3)−COO−(CH2)2−C6F13を10.51g、ステアリルメタクリレート(共栄社化学製「ライトエステル」S)を6.12g、γ−メタクリロキシプロピルトリメトキシシラン(信越化学製KBM−503)を0.87g、イソオクタン(和光純薬製)を32.35g、2,2’−アゾビス(2,4−ジメチルバレロニトリル)(和光純薬製)を0.1750g、を100mlアンプルに入れて、窒素雰囲気下で攪拌し、65℃で、15時間重合反応を行った。ガスクロマトグラフィーによると反応率は90%以上を示した。得られた共重合体溶液は固形分濃度34質量%であった。
(Comparative Reference Example 1)
Production method of polymer 10.51 g of perfluoro group-containing ethylenically unsaturated monomer CH 2 ═C (CH 3 ) —COO— (CH 2 ) 2 —C 6 F 13 , stearyl methacrylate (Kyoeisha Chemical “Light” 6.12 g of ester “S), 0.87 g of γ-methacryloxypropyltrimethoxysilane (KBM-503 manufactured by Shin-Etsu Chemical), 32.35 g of isooctane (manufactured by Wako Pure Chemical Industries), 2,2′-azobis (2 , 4-dimethylvaleronitrile) (manufactured by Wako Pure Chemical Industries, Ltd.) was placed in a 100 ml ampoule, stirred in a nitrogen atmosphere, and polymerized at 65 ° C. for 15 hours. According to gas chromatography, the reaction rate was 90% or more. The obtained copolymer solution had a solid content concentration of 34% by mass.
(比較例1)
比較参考例1で得られた共重合体溶液を固形分濃度が2.5質量%となるようにイソオクタンで希釈して処理液を得た。続いて前記処理液を、実施例1と同様に天然石(モカクリーム)に処理し、室温で24時間以上放置をした後に表面を布で拭取り、防汚性試験を行った。
(Comparative Example 1)
The copolymer solution obtained in Comparative Reference Example 1 was diluted with isooctane so that the solid content concentration was 2.5% by mass to obtain a treatment liquid. Subsequently, the treatment liquid was treated with natural stone (mocha cream) in the same manner as in Example 1, and allowed to stand at room temperature for 24 hours or more, and then the surface was wiped with a cloth to conduct an antifouling test.
(防汚性試験)
処理後の石材表面に水道水、醤油、ソース、オレンジジュース、オリーブオイル、コーヒーを1ml滴下し、24時間後の様子を目視で確認し、以下の方法により評価を行った。評価結果を表1に記載した。
0=染みが濃くて大きい
1=染みが濃くて、小さい
2=染みが薄い
3=染みがない
(Anti-fouling test)
1 ml of tap water, soy sauce, sauce, orange juice, olive oil, and coffee was dropped on the treated stone surface, and the state after 24 hours was visually confirmed and evaluated by the following methods. The evaluation results are shown in Table 1.
0 = Dense and large 1 = Dense and small 2 = Light stain 3 = No stain
Claims (6)
CH2=CR1−COO−(CH2)n1−Rf (I)
ただし、式中の記号は以下の意味を示す。
Rf:炭素数1〜6のパーフルオロアルキル基。
n1:0〜3の整数。
R1:水素原子またはメチル基。 (1) a fluoroalkyl group-containing ethylenically unsaturated monomer represented by the following formula (I), (2) an isobornyl group-containing ethylenically unsaturated monomer, and (3) a silicon-containing unsaturated monomer. A treating agent composition comprising a copolymer (A) obtained by copolymerization and a solvent.
CH 2 = CR 1 -COO- (CH 2) n 1 -Rf (I)
However, the symbols in the formulas have the following meanings.
Rf: C1-C6 perfluoroalkyl group.
n 1 : An integer of 0 to 3.
R 1 : a hydrogen atom or a methyl group.
CH2=C(R2)−COO−(CH2)n2−IB (II)
ただし、式中の記号は以下の意味を示す。
R2:水素原子またはメチル基。
n2:0〜6の整数。
IB:イソボニル基。 The treating agent composition according to claim 1, wherein the isobornyl group-containing ethylenically unsaturated monomer is represented by the following formula (II).
CH 2 = C (R 2) -COO- (CH 2) n 2 -IB (II)
However, the symbols in the formulas have the following meanings.
R 2 : a hydrogen atom or a methyl group.
integer of 0~6: n 2.
IB: Isobonyl group.
CH2=C(R3)−(COO)n3−(CH2)n4−SiR4R5R6 (III)
ただし、式中の記号は以下の意味を示す。
R3:水素原子またはメチル基。
R4、R5、R6:それぞれ独立して、炭素数1〜3のアルキル基、炭素数1〜3のアルコキシ基、OH基、またはフェニル基。
n3:0または1の整数。
n4:0〜6の整数。 The treatment agent composition according to claim 1 or 2, wherein the silicon-containing unsaturated monomer is represented by the following formula (III).
CH 2 = C (R 3) - (COO) n 3 - (CH 2) n 4 -SiR 4 R 5 R 6 (III)
However, the symbols in the formulas have the following meanings.
R 3 : a hydrogen atom or a methyl group.
R 4 , R 5 , R 6 : each independently an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an OH group, or a phenyl group.
n 3 : An integer of 0 or 1.
an integer of 0~6: n 4.
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011161812A1 (en) * | 2010-06-25 | 2011-12-29 | リケンテクノス株式会社 | Coating material and laminate body |
JP2012214664A (en) * | 2011-03-31 | 2012-11-08 | Agc Seimi Chemical Co Ltd | Surface-treating agent |
WO2013151003A1 (en) * | 2012-04-02 | 2013-10-10 | ダイキン工業株式会社 | Durable water- and moisture-proof coating composition |
WO2020066149A1 (en) * | 2018-09-27 | 2020-04-02 | 第一工業製薬株式会社 | Copolymer and water- and oil-repellent agent |
-
2007
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011161812A1 (en) * | 2010-06-25 | 2011-12-29 | リケンテクノス株式会社 | Coating material and laminate body |
JP2012214664A (en) * | 2011-03-31 | 2012-11-08 | Agc Seimi Chemical Co Ltd | Surface-treating agent |
WO2013151003A1 (en) * | 2012-04-02 | 2013-10-10 | ダイキン工業株式会社 | Durable water- and moisture-proof coating composition |
JP2013231168A (en) * | 2012-04-02 | 2013-11-14 | Daikin Industries Ltd | Durable water-proof and moisture-proof coating composition |
WO2020066149A1 (en) * | 2018-09-27 | 2020-04-02 | 第一工業製薬株式会社 | Copolymer and water- and oil-repellent agent |
JP2020050757A (en) * | 2018-09-27 | 2020-04-02 | 第一工業製薬株式会社 | Copolymer and water / oil repellent |
JP7207922B2 (en) | 2018-09-27 | 2023-01-18 | 第一工業製薬株式会社 | Copolymers and water and oil repellents |
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