JP2009034568A - Slit coat type coating apparatus and control method thereof - Google Patents

Abstract

A slit coat type coating apparatus capable of quickly and reliably coating a solution having a set film thickness by dynamically changing coating conditions according to the film thickness of a coating solution applied to a substrate. Provide a control method.
[Solution]
A moving unit 110 that moves the substrate 1 and the coating head 30 at a predetermined relative speed, a distance adjusting unit 120 that adjusts a distance between the substrate and the coating head between the substrate and the coating head, and a liquid ( The film thickness measuring means 130 for measuring the film thickness of the coating solution 2) and the coating condition data 141 including the relative speed and the distance between the substrate and the coating head for coating the liquid with a predetermined film thickness are provided for each predetermined film thickness. Based on the stored coating condition database 140 and the film thickness of the liquid measured by the film thickness measuring means, the coating condition data is extracted from the coating condition database so that the liquid film thickness becomes the set film thickness. In addition, a control unit 150 that controls the head moving unit and the head distance adjusting unit based on the extracted application condition data is provided.
[Selection] Figure 1

Description

The present invention relates to a slit coat type coating apparatus that discharges a predetermined solution from the tip of a slit-like nozzle and uniformly coats the surface of a substrate or the like, and a control method thereof.

  Examples of a coating apparatus that applies a predetermined solution (solvent) such as a resist material or an insulating material to a substrate such as a semiconductor wafer or a glass substrate include a spin coater and a slit coater.

  A spin coater is a device in which a solution is dropped from the upper part near the center of a rotating substrate and the solution on the substrate is extended in the outer peripheral direction by centrifugal force to uniformly apply the solution to the surface of the substrate ( For example, see Patent Document 1).

  On the other hand, the slit coat type coating apparatus is a device in which a predetermined solution is discharged from the tip of a slit-like nozzle to uniformly apply the solution onto the surface of a substrate or the like (see, for example, Patent Document 2).

Japanese Patent Laid-Open No. 7-136573 JP-A-6-343908 (pages 2-4, FIGS. 1-2)

  However, in the spin coat apparatus as described above, if the viscosity of the solution is constant, the film thickness of the solution applied onto the substrate can be changed only by controlling the rotation speed of the substrate. Therefore, there is a problem that the solution cannot be applied only to a predetermined region on the substrate, or only the film thickness of the solution applied to the predetermined region on the substrate cannot be changed.

  On the other hand, in the slit coat type coating apparatus, only the film thickness of the solution applied to a predetermined region on the substrate is changed by controlling the coating conditions such as the relative speed between the substrate and the coating head on which the nozzle is formed. However, once the coating conditions are set, the coating treatment is continued with the coating conditions. Therefore, even if a coating condition capable of coating a solution having a predetermined film thickness is set, the coating is applied to the substrate due to a change in viscosity due to deterioration of the solution or a change in environment (particularly atmospheric pressure) in the coating process. The film thickness of the solution changed slightly, and there was a problem that the solution could not be applied with a predetermined film thickness. In particular, as the pattern structure formed on the substrate has become finer and more complicated in recent years, the allowable film thickness error of the solution has been reduced, and the above problem has been increased.

  In addition, when changing the solution to be applied to a new solution having a different viscosity, the same problem occurs. Therefore, the condition must be reset every time the solution is changed, and the setting is complicated. There was a problem that it took time.

  In view of the circumstances described above, the present invention can dynamically apply a solution having a set film thickness by dynamically changing application conditions according to the film thickness of the application solution applied to the substrate. It is an object to provide a slit coat type coating apparatus and a control method thereof.

According to an aspect of the present invention, a predetermined liquid is projected from a slit-shaped nozzle opening provided in the coating head with respect to the coating surface of the substrate, and the substrate and the coating head are in contact with the liquid. Is a slit coat type coating apparatus that applies the liquid having a set film thickness to the substrate by moving the substrate and the coating head at a predetermined relative speed. Moving means, distance adjusting means for adjusting the distance between the substrate and the coating head between the substrate and the coating head, film thickness measuring means for measuring the film thickness of the liquid applied to the substrate, and the liquid A coating condition database in which coating condition data including the relative speed for coating at a predetermined film thickness and the distance between the substrate and the coating head is stored for each predetermined film thickness; and at least the film thickness measurement Based on the film thickness of the liquid measured by the step, the application condition data for setting the film thickness of the liquid to a set film thickness is extracted from the application condition database, and based on the extracted application condition data And a control unit that controls the head moving unit and the head distance adjusting unit.
In such an aspect, the moving means and the distance adjusting means can be dynamically controlled based on the applied liquid film thickness so that the applied liquid film thickness becomes the set film thickness. A liquid having a set film thickness can be applied quickly and reliably.

  Here, the relative speed of the coating condition data and the distance between the substrate and the coating head are positively correlated with the increase in the film thickness of the liquid applied to the substrate as the relative speed increases. It is preferable that the calculation is based on a negative correlation that the film thickness of the liquid applied to the substrate becomes thinner as the distance between the substrate and the application head increases. According to this, it is possible to obtain the relative speed and the distance between the substrate and the coating head with respect to each film thickness without actually conducting an experiment.

  In addition, a liquid storage unit connected to the coating head and storing the liquid supplied to the coating head is provided with a viscosity measuring unit that measures the viscosity of the liquid and a stirring unit that stirs the liquid. Liquid component supply means for supplying a liquid component constituting the liquid to the liquid storage section, and the control section is configured such that the viscosity of the liquid in the liquid storage section measured by the viscosity measurement means is greater than a predetermined viscosity. It is preferable to control the liquid component to be supplied from the liquid component supply means so that the viscosity becomes the predetermined viscosity when the viscosity is high. According to this, since a liquid having a predetermined viscosity can be supplied to the application head, it is possible to easily apply a liquid having a predetermined film thickness even when the viscosity of the liquid changes.

  In addition, a viscosity measuring means for measuring the viscosity of the liquid is provided, and the relative speed and the distance between the substrate and the coating head in the coating condition data are applied to the substrate as the relative speed increases. The positive correlation that the thickness increases, the negative correlation that the film thickness of the liquid applied to the substrate decreases as the distance between the substrate and the coating head increases, and the viscosity of the liquid increases. Calculated based on the positive correlation that the thickness of the liquid applied to the substrate increases, and the control unit measures the viscosity of the liquid measured by the viscosity measuring means and the thickness measuring means. And extracting the application condition data from the application condition database so that the liquid film thickness becomes a set film thickness based on the liquid film thickness measured by , It is preferred to control the said head distance adjusting means and said head moving means on the basis of the coating condition data thereof extracted. According to this, since the relative speed and the distance between the substrate and the coating head can be controlled based on the coating condition data that also takes into account the viscosity of the liquid, even if the viscosity of the liquid changes, the predetermined film A thick liquid can be applied.

  The application condition data further includes the thickness of the substrate to which the liquid is applied, and has a two-layer structure, the first layer is classified by the thickness of the substrate, and the second layer is the first layer. It is preferable that those classified by hierarchy are further classified by the film thickness of the liquid. According to this, the range of application condition data to be searched and selected according to the film thickness of the liquid can be narrowed, and appropriate application condition data can be easily selected. As a result, the slit coat type coating apparatus can be efficiently controlled.

In another aspect of the present invention, a predetermined liquid is projected from a slit-like nozzle opening provided in the coating head with respect to the coating surface of the substrate, and the liquid is brought into contact with the substrate and the substrate. A control method of a slit coat type coating apparatus that coats the liquid with a set film thickness on the substrate by moving the coating head relative to the surface direction, and at least the liquid coated on the substrate On the basis of the film thickness of the substrate, including a relative speed between the substrate and the coating head for coating the liquid with a predetermined film thickness, and a distance between the substrate and the coating head between the substrate and the coating head. Extracting the coating condition data including the relative speed and the distance between the substrate and the coating head for coating the liquid at a set film thickness from the coating condition data obtained for each film thickness of A slit coat type coating characterized in that the liquid is applied with a predetermined film thickness by adjusting the relative speed and the distance between the substrate and the coating head based on the extracted coating condition data. It is in the control method of the apparatus.
According to this aspect, the moving means and the distance adjusting means can be dynamically controlled based on the film thickness of the applied liquid so that the film thickness of the applied liquid becomes the set film thickness. Therefore, the liquid having the set film thickness can be applied quickly and reliably.

Hereinafter, the present invention will be described in detail based on embodiments.
(Embodiment 1)
FIG. 1 is a perspective view showing a schematic configuration of a slit coat type coating apparatus as an example of a liquid ejection apparatus according to Embodiment 1 of the present invention, and FIG. 2 is a cross-sectional view of a main part of the slit coat type coating apparatus. 3 is a partially enlarged sectional view of the slit coat type coating apparatus. As shown in the figure, a slit coat type coating apparatus 10 includes a holding table 20 on which a substrate 1 such as a silicon wafer or a semiconductor substrate is held downward, and a coating head 30 provided on the substrate 1 side of the holding table 20. It has.

  The holding table 20 is supported by the moving means 110 so as to be linearly movable along the surface direction of the substrate 1 so that the substrate 1 can be moved with respect to the coating head 30 at a predetermined moving speed. The moving unit 110 is not particularly limited as long as it can move the holding table 20 in the horizontal direction, and may be configured using, for example, a drive motor. In addition, the holding method of the board | substrate 1 by this holding table 20 is not specifically limited, For example, the method by suction | attraction, such as a vacuum pump, is mentioned.

  The coating head 30 has a slit-like nozzle opening 31 that opens upward in the vertical direction and flows out the coating solution 2 supplied from the liquid storage unit 40, and a liquid channel 32 that communicates with the nozzle opening 31. It is fixed to the liquid reservoir 40 via the liquid supply pipe 50.

  The liquid storage part 40 is composed of a storage tank provided with an opening 41 at the center of the bottom surface, and the coating solution 2 is stored therein. And this liquid storage part 40 is supported by the distance adjustment means 120 arrange | positioned at the side so that a movement to a perpendicular direction is possible.

  The distance adjusting means 120 includes a rod-like member 121 provided from the bottom surface of the apparatus main body (not shown) toward the upper side in the vertical direction, and a movable portion 122 attached to the rod-like member 121 so as to be movable in the vertical direction along the rod-like member 121. Thus, the position (height) of the liquid storage section 40 can be changed by changing the position of the movable section 122 relative to the rod-shaped member 121. That is, the distance adjusting unit 120 can adjust the distance between the substrate 1 and the coating head 30 between the substrate 1 and the coating head 30 by changing the position of the liquid storage unit 40 by a driving unit such as a driving motor (not shown). . The distance adjusting unit 120 is not particularly limited as long as it can move the liquid supply pipe 50 and the application head 30 together with the liquid storage unit 40 in the vertical direction.

  On the other hand, a film thickness measuring means 130 for measuring the film thickness of the coating solution 2 applied to the substrate 1 is provided on the side of the substrate 1 held below the holding table 20. An example of the film thickness measuring unit 130 is a non-contact film thickness sensor. Such a film thickness measuring unit 130 is connected to the control unit 150 together with the moving unit 110 and the distance adjusting unit 120 described above.

  The control unit 150 is further connected to the coating condition database 140, which will be described in detail later. The moving unit 110 and the distance adjusting unit 120 are controlled according to the film thickness of the coating solution 2 measured by the film thickness measuring unit 130. As a result, the moving speed V between the substrate 1 and the coating head 30 and the distance G between the substrate 1 and the coating head 30 between the substrate 1 and the coating head 30 can be controlled. The control unit 150 is not particularly limited as long as it has such a function, and may be a general personal computer or a dedicated computer. Here, as shown in FIG. 3, the moving speed V indicates the relative speed between the substrate 1 and the coating head 30 in the A direction, and the distance G between the substrate and the coating head is the lower surface of the substrate 1 and the nozzle opening 31 of the coating head 30. The vertical distance between is shown.

  In the coating condition database 140, coating condition data 141 including the thickness T of the substrate 1, the moving speed V, and the distance G between the substrate and the coating head for coating the coating solution 2 with a predetermined film thickness is the film thickness of the coating solution 2. Stored for each. That is, in the coating condition database 140, for each film thickness of the coating solution 2, the substrate 1 necessary for controlling the slit coat type coating apparatus 10 so that the coating solution 2 having the thickness can be coated on the substrate 1. Application condition data 141 including a thickness T, a moving speed V, and a substrate-application head distance G is stored. Here, as shown in FIG. 3, the thickness T of the substrate 1 indicates the width of the substrate 1 in the thickness direction.

  In the present embodiment, the application condition data 141 is stored in the application condition database 140 in a format hierarchized into two layers, the first hierarchy is classified by the substrate thickness T, and the second hierarchy is the first hierarchy. Those classified are further classified by the film thickness of the coating solution 2. That is, the coating condition data 141 is first classified by the thickness T of the substrate 1 and then sorted and arranged by the film thickness of the coating solution 2. By storing the application condition data 141 in the application condition database 140 in a format hierarchized in such two layers, the appropriate application condition data 141 can be easily selected. That is, since the thickness T of the substrate 1 does not normally change, when the substrate thickness T is determined, appropriate coating condition data 141 corresponding to the film thickness of the coating solution 2 applied to the substrate 1 is obtained up to the first layer. It is only necessary to search and select appropriate application condition data 141 only in the second hierarchy corresponding to the thickness T of the substrate 1 without returning to the search and selection. In other words, by applying the application condition data 141 in the above-described format, the range of the application condition data 141 to be searched and selected according to the film thickness of the application solution 2 can be narrowed, and appropriate application condition data 141 can be easily obtained. You will be able to choose. As a result, the slit coat type coating apparatus 10 can be controlled efficiently. As described above, since the thickness of the substrate 1 does not normally change, it is only necessary to measure the thickness once, and it is not always necessary to measure during the coating process.

  The moving speed V and the substrate / coating head distance G with respect to each film thickness of the coating solution 2 may be obtained by actually conducting experiments, or an experience relating the film thickness of the coating solution 2 and these values. An equation may be obtained and calculated using the equation. Specifically, as shown in FIGS. 4 and 5, there is a positive correlation between the moving speed V and the film thickness of the coating solution 2, and the distance G between the substrate and the coating head and the film of the coating solution 2. Since there is a negative correlation with the thickness, an empirical equation that relates the film thickness of the coating solution 2 to the moving speed V and the distance G between the substrate and the coating head is obtained by combining these relationships. The moving speed V and the distance G between the substrate and the coating head are obtained for each film thickness. Here, when determining the moving speed V and the substrate-coating head distance G for each film thickness, the moving speed V has a greater influence on the film thickness than the substrate-coating head distance G. After determining the distance, it is preferable to determine the distance G between the substrate and the coating head.

  In the slit coat type coating apparatus 10 configured as described above, when the coating solution 2 is supplied from the liquid storage unit 40 to the coating head 30 via the liquid supply pipe 50, the coating solution 2 in the liquid channel 32. Rises to the tip of the nozzle opening 31 by capillary action. Thereby, the coating solution 2 is uniformly filled in the slit-shaped nozzle openings 31. In this state, the coating head 30 is raised using the distance adjusting unit 120 to bring the coating solution 2 protruding from the nozzle opening 31 into contact with the surface of the substrate 1. In this state, the holding table 20 is used using the moving unit 110. And the coating head 30 are relatively moved in the surface direction of the substrate 1. For example, in this embodiment, the coating head 30 is fixed and the holding table 20 is linearly moved in the surface direction (A direction) of the substrate 1, so that the coating head 30 and the holding table 20 are relatively moved. Yes. As a result, the coating solution 2 continuously flows out from the nozzle opening 31, and the coating solution 2 is applied to the surface of the substrate 1 with a uniform thickness.

  Next, the operation of the slit coat type coating apparatus 10 will be described. FIG. 6 is a flowchart showing the operation of the slit coat type coating apparatus according to the present embodiment.

  First, the thickness T of the substrate 1 is input, and it is determined which of the application condition data 141 belonging to the second layer described above is used (S1).

  When the coating solution 2 is applied to the substrate 1, the film thickness d of the coating solution 2 is measured by the film thickness measuring unit 130 (S 2) and transmitted to the control unit 150.

  Next, the control unit 150 determines whether or not the film thickness d is equal to the set film thickness D of the coating solution 2 (S3). When the film thickness d is equal to the predetermined film thickness D, the coating process is continued as it is (S6).

  On the other hand, when the film thickness d is different from the film thickness D, the application condition data 141 corresponding to the film thickness D is extracted from the application condition database 140 (S4). Specifically, for example, the coating solution 2 is applied with the film thickness D from the relationship between the moving speed V and the distance G between the substrate and the coating head used when the liquid having the film thickness d and the film thickness d is applied. The new moving speed V and the substrate-coating head distance G can be extracted. Thereafter, the moving means 110 and the distance adjusting means 120 are controlled dynamically (real time) according to the application condition data 141 (S5), and the application process is continued (S6). These operations are repeated until the coating process is completed.

  As described above, according to the slit coat type coating apparatus 10 according to the present embodiment, the moving means 110 and the distance adjusting means 120 are dynamically (depending on the film thickness of the coating solution 2 applied to the substrate 1 ( The coating solution 2 having a predetermined film thickness can be applied to the substrate 1 in a controlled manner in real time.

(Embodiment 2)
In the present embodiment, a liquid component supply unit that supplies a liquid component (such as a solvent) of the coating solution 2 to the liquid storage unit 40, a viscosity measurement unit that measures the viscosity of the coating solution in the liquid storage unit 40, and a liquid storage A stirrer such as a magnetic stirrer or a stirring blade for stirring the coating solution 2 in the unit 40 is attached, and the liquid component in the coating solution 2 in the liquid storage unit 40 is volatilized and the viscosity is higher than a predetermined value. In this case, the liquid component is supplied from the liquid component supply unit, and the coating solution 2 in the liquid storage unit 40 is forcibly stirred so that the viscosity of the coating solution 2 becomes a predetermined viscosity. Adjust the viscosity.

  For example, as shown in FIG. 7, a liquid component reservoir 80 in which the stirring blade 45 and the viscosity sensor 46 are attached to the liquid reservoir 40 and the liquid component 3 of the coating solution 2 is stored via the supply path 81. Install. A control valve 85 is provided in the supply path 81. The stirring blade 45, the viscosity sensor 46, and the control valve 85 are respectively connected to the control unit 150 described above. When the viscosity of the coating solution 2 in the liquid storage unit 40 becomes higher than a predetermined viscosity, the control is performed. The unit 150 is controlled to supply the liquid component 3 so that the viscosity of the coating solution 2 becomes a predetermined viscosity while stirring the coating solution 2 in the liquid storage unit 40. Since other components and their operations are the same as those of the first embodiment, the same reference numerals are given and description thereof is omitted.

  By configuring and driving the slit coat type coating apparatus in this way, the coating solution 2 having a predetermined viscosity can be supplied to the coating head 30, so even if the viscosity of the coating solution 2 changes, The coating solution 2 having a predetermined film thickness can be easily applied.

(Embodiment 3)
In the first embodiment, it is not possible to consider the case where the viscosity of the coating solution 2 in the liquid storage unit 40 changes, but in this embodiment, as described in the second embodiment, a viscosity sensor is provided in the liquid storage unit 40. Even when the viscosity of the coating solution 2 in the liquid storage unit 40 is changed by using the coating condition data 141 that also takes into account the viscosity of the coating solution 2, the coating solution 2 having a predetermined film thickness can be obtained. It can be applied to the substrate 1.

  When the viscosity of the coating solution 2 changes, the moving speed V and the substrate-coating head distance G with respect to each film thickness of the coating solution 2 may be obtained by actually conducting experiments, or depending on the viscosity of the coating solution 2. Further, an empirical formula relating each film thickness and these values may be obtained and calculated using the formula. Specifically, as shown in FIG. 8, there is a positive correlation between the viscosity of the coating solution 2 and the film thickness of the coating solution 2. By combining the relationship between the film thickness and the relationship between the distance G between the substrate and the coating head and the film thickness of the coating solution 2, each film thickness according to the viscosity of the coating solution 2, the moving speed V, and the distance between the substrate and the coating head. Empirical expressions relating the distance G may be obtained, and the movement speed V and the substrate-coating head distance G for each film thickness corresponding to the viscosity of the coating solution 2 may be obtained using these expressions.

  This is a case where the viscosity of the coating solution 2 in the liquid storage unit 40 is changed by controlling the moving speed V and the distance G between the substrate and the coating head based on the coating condition data 141 thus obtained. However, the coating solution 2 having a predetermined film thickness can be applied to the substrate 1.

(Other embodiments)
In the above-described embodiment, the moving speed V and the substrate / coating head distance G of the coating condition data 141 are the relationship between the moving speed V and the film thickness of the coating solution 2, and the distance between the substrate / coating head distance G and the coating solution 2. The calculation is performed in consideration of the relationship with the film thickness, and further the relationship between the viscosity of the coating solution 2 and the film thickness of the coating solution 2, but in addition to these relationships, for example, the relationship between the atmospheric pressure and the film thickness, etc. May be calculated in consideration of the above. By calculating the moving speed V and the substrate-coating head distance G in consideration of other relationships, the coating solution 2 having a predetermined film thickness can be more accurately applied to the substrate 1. In such a case, for example, a barometer is provided and the barometer is connected to the control unit 150, and the slit coat type coating apparatus 10 is configured so that it can operate in consideration of the barometric pressure measured by the barometer. There is a need to.

It is a perspective view which shows schematic structure of the coating device which concerns on Embodiment 1 of this invention. It is principal part sectional drawing of the coating device which concerns on Embodiment 1 of this invention. It is a partial expanded sectional view of the coating device which concerns on Embodiment 1 of this invention. It is a graph which shows the relationship between the moving speed V and a film thickness. It is a graph which shows the relationship between the distance G between a board | substrate and a coating head, and a film thickness. It is a flowchart which shows operation | movement of the coating device which concerns on Embodiment 1 of this invention. It is principal part sectional drawing of the coating device which concerns on Embodiment 2 of this invention. It is a graph which shows the relationship between the viscosity of a coating solution, and a film thickness.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Board | substrate, 10 Slit coat type coating device, 20 Holding table, 30 Coating head, 31 Nozzle opening, 32 Liquid flow path, 40 Liquid storage part, 45 Stirring blade, 46 Viscosity sensor, 50 Liquid supply pipe, 80 Liquid component storage part , 81 supply path 85 control valve, 110 moving means, 120 distance adjusting means, 121 rod-shaped member, 122 movable part, 130 film thickness measuring means, 140 application condition database, 141 application condition data, 150 control part

Claims (6)

A predetermined liquid is projected from a slit-shaped nozzle opening provided in the coating head with respect to the coating surface of the substrate, and the substrate and the coating head are relatively relative to each other in a surface direction while the liquid is in contact with the substrate. A slit coat type coating apparatus that coats the substrate with the liquid having a set film thickness by moving the substrate and the coating head at a predetermined relative speed; Distance adjusting means for adjusting the distance between the substrate and the coating head between the substrate and the coating head, film thickness measuring means for measuring the film thickness of the liquid applied to the substrate, and coating the liquid with a predetermined film thickness Coating condition data including the relative speed and the distance between the substrate and the coating head are stored for each predetermined film thickness, and at least measured by the film thickness measuring means. Based on the film thickness of the liquid, the application condition data for setting the film thickness of the liquid to a set film thickness is extracted from the application condition database, and based on the extracted application condition data, the head A slit coat type coating apparatus comprising a control unit that controls a moving unit and the head distance adjusting unit. The relative speed and the distance between the substrate and the coating head in the coating condition data are positively correlated with the increase in the film thickness of the liquid applied to the substrate as the relative speed increases, and the substrate / coating 2. The slit coat type coating apparatus according to claim 1, wherein the slit coating type coating apparatus is calculated based on a negative correlation that a film thickness of the liquid applied to the substrate becomes thinner as a head-to-head distance increases. . A liquid storage unit connected to the coating head and storing the liquid supplied to the coating head is provided with a viscosity measuring unit for measuring the viscosity of the liquid and a stirring unit for stirring the liquid, and A liquid component supply unit configured to supply a liquid component constituting the liquid to the liquid storage unit, and the control unit has a viscosity of the liquid in the liquid storage unit measured by the viscosity measurement unit higher than a predetermined viscosity 3. The slit coat type coating apparatus according to claim 1, wherein the liquid component is controlled to be supplied from the liquid component supply unit so that the viscosity becomes the predetermined viscosity. Viscosity measuring means for measuring the viscosity of the liquid is provided, and the relative speed of the coating condition data and the distance between the substrate and the coating head are such that the film thickness of the liquid applied to the substrate increases as the relative speed increases. The positive correlation that the thickness increases, the negative correlation that the film thickness of the liquid applied to the substrate decreases as the distance between the substrate and the coating head increases, and the viscosity that increases as the liquid viscosity increases. Calculated based on a positive correlation that the film thickness of the liquid applied to the substrate is increased, and the control unit measures the viscosity of the liquid measured by the viscosity measuring unit and the film thickness measuring unit. The coating condition data for setting the film thickness of the liquid to a set film thickness is extracted from the coating condition database based on the liquid film thickness and Been slit coating type coating apparatus according to claim 1, characterized in that for controlling said head distance adjusting means and said head moving means on the basis of the coating condition data. The application condition data further includes the thickness of the substrate to which the liquid is applied, and has a two-layer structure, the first layer is classified by the thickness of the substrate, and the second layer is the first layer. What was classified is further classified according to the film thickness of the liquid, The slit coat type coating device according to any one of claims 1 to 4. A predetermined liquid is projected from a slit-shaped nozzle opening provided in the coating head with respect to the coating surface of the substrate, and the substrate and the coating head are relatively relative to each other in a surface direction while the liquid is in contact with the substrate. A slit coat type coating apparatus that applies the liquid having a set film thickness to the substrate by moving the liquid at least based on the film thickness of the liquid applied to the substrate. It is determined for each predetermined film thickness including the relative speed between the substrate and the coating head for applying the liquid with a predetermined film thickness and the distance between the substrate and the coating head between the substrate and the coating head. The application condition data including the relative speed and the distance between the substrate and the application head for applying the liquid with a set film thickness is extracted from the application condition data. Based on the data, by adjusting the distance between said relative velocity the substrate-coating heads, the control method of the slit coating type coating apparatus characterized by so applying said liquid at a predetermined thickness.