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JP2009026500A - Conductive member, terminal, method for producing conductive member, and method for producing terminal - Google Patents

Conductive member, terminal, method for producing conductive member, and method for producing terminal Download PDF

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JP2009026500A
JP2009026500A JP2007186037A JP2007186037A JP2009026500A JP 2009026500 A JP2009026500 A JP 2009026500A JP 2007186037 A JP2007186037 A JP 2007186037A JP 2007186037 A JP2007186037 A JP 2007186037A JP 2009026500 A JP2009026500 A JP 2009026500A
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conductive member
terminal
contact
copper
metal
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JP5033523B2 (en
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Atsushi Shimizu
敦 清水
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Sumitomo Wiring Systems Ltd
AutoNetworks Technologies Ltd
Sumitomo Electric Industries Ltd
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AutoNetworks Technologies Ltd
Sumitomo Electric Industries Ltd
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Abstract

【課題】特に、貴金属のような高価な材料を要することなく、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる導電部材、及びこの導電部材を用いた端子を提供し、さらに、この導電部材及び端子を容易に製造できる製造方法を提供することを目的とする。
【解決手段】他の導体と接触する接触部位を有し、前記他の導体との接触によって、前記他の導体と電気的に接続される導電部材であって、銅系材料からなる基材と、前記基材の表面の少なくとも前記接触部位に配置される導電性皮膜とを備え、前記導電性皮膜が、銅とガリウムとを含む化合物からなることを特徴とする導電部材を用いる。
【選択図】図1
In particular, a conductive member capable of maintaining a low contact resistance for a long period of time without requiring an expensive material such as a precious metal and suppressing fine sliding wear, and a terminal using the conductive member Furthermore, it aims at providing the manufacturing method which can manufacture this electrically-conductive member and a terminal easily.
A conductive member having a contact portion in contact with another conductor, electrically connected to the other conductor by contact with the other conductor, and comprising a base material made of a copper-based material; And a conductive film disposed at least on the contact part of the surface of the base material, wherein the conductive film is made of a compound containing copper and gallium.
[Selection] Figure 1

Description

本発明は、電気接続端子等に用いられる導電部材、この導電部材を用いた端子、及びこれらの製造方法に関する。   The present invention relates to a conductive member used for an electrical connection terminal or the like, a terminal using the conductive member, and a method for manufacturing the same.

電気接続端子等に用いられる導電部材の基材には、導電率が高く、延性に富み、適度な強度を有する銅(Cu)が好ましく用いられている。しかし、銅を含む銅系基材は、その表面に酸化膜や硫化膜等の絶縁性の皮膜が形成されるため、他の導体との接触時における接触抵抗(境界抵抗)を高くしてしまう。その抵抗値は、例えば、材質や使用環境によっても異なるが、数Ωに達することもあり、電気回路の誤作動等を引き起こすこともある。   As the base material of the conductive member used for the electrical connection terminal or the like, copper (Cu) having high conductivity, high ductility, and appropriate strength is preferably used. However, a copper-based substrate containing copper has an insulating film such as an oxide film or a sulfide film formed on its surface, which increases the contact resistance (boundary resistance) at the time of contact with another conductor. . The resistance value varies depending on, for example, the material and the use environment, but may reach several ohms, which may cause malfunction of the electric circuit.

そこで、導電部材としては、銅系基材表面にスズめっきを施したものが用いられている。スズは、他の金属と比較して硬度が低いので、このスズが酸化されて絶縁性皮膜が形成されても、この絶縁性皮膜は比較的弱い力で破壊される。従って、スズめっきを施した導電部材は、絶縁性皮膜を容易に破壊でき、新生面を露出させることによって、良好な電気的な接続を確保できる。   Therefore, as the conductive member, a material obtained by performing tin plating on the surface of the copper base material is used. Since tin has a lower hardness than other metals, even if the tin is oxidized to form an insulating film, the insulating film is broken with a relatively weak force. Therefore, the conductive member subjected to tin plating can easily break the insulating film, and can ensure a good electrical connection by exposing the new surface.

一方、銅系材料を主成分とした他の材料としては、例えば、銅系材料を母材とし、他の導体と接触させる電気接点の表面から0.01〜0.1mmの表層部に、ホウ化物粒子を分散させた電気接点材料等が挙げられる(特許文献1参照)。
特開昭58−128609号公報
On the other hand, as another material mainly composed of a copper-based material, for example, a copper-based material is used as a base material. Examples thereof include electrical contact materials in which compound particles are dispersed (see Patent Document 1).
JP 58-128609 A

スズめっきを施した導電部材は、上記のように、その表面に他の導体を接触させ、荷重をかけることによって、他の導体との接触抵抗を低下できる。しかしながら、スズめっきを施した導電部材は、その表面に他の導体の接触による荷重をかけた状態で、振動や温度変化等による微摺動した場合、導電部材の表面に存在するスズ酸化物の量が増大することによって、他の導体との接触抵抗が高くなる、いわゆる微摺動磨耗(Fretting corrosion)という現象が生じる。微摺動磨耗とは、スズめっき表面の酸化膜が摺動により剥がされてスズ新生面が大気に露出し、その新生面表面のスズを酸化することが繰り返されることによって、他の導体と接触する接触部位付近に大量のスズ酸化物が堆積し、この接触部位がこの大量の酸化物に乗り上げることによって、他の導体との接触抵抗が高くなる現象である(例えば、R.S.Mroczkowski著、「Electronic Connector Handbook」、p3.31−3.38参照)。この微摺動磨耗によって、接触抵抗が1Ωを超えることもある。   As described above, the conductive member subjected to tin plating can be brought into contact with another conductor on the surface and applied with a load to reduce the contact resistance with the other conductor. However, a tin-plated conductive member is subject to the presence of tin oxide present on the surface of the conductive member when it is slightly slid due to vibration or temperature change with a load applied by contact with another conductor on its surface. As the amount increases, a so-called fretting corrosion phenomenon occurs in which the contact resistance with other conductors increases. Fine sliding wear is a contact that comes into contact with other conductors by repeated oxidation of tin on the surface of the new surface, which is caused by peeling the oxide film on the surface of the tin plating by sliding and exposing the tin surface to the atmosphere. This is a phenomenon in which a large amount of tin oxide is deposited in the vicinity of a portion, and the contact portion rides on this large amount of oxide, whereby the contact resistance with other conductors is increased (for example, by R. S. Mroczkowski, “ "Electronic Connector Handbook", p. 3.31-3.38). This fine sliding wear may cause the contact resistance to exceed 1Ω.

また、このようなスズめっきを施した導電部材は、例えば、コネクタの端子等に用いられている。コネクタは、一般的に雄端子と雌端子とが雌雄嵌合するように構成されており、雌端子に雄端子を挿入(挿嵌)させると、雌端子のばね力によって雄端子に荷重をかけて、両端子の金属部分(接触部位)が接触するように構成されている。その際、雌端子のばね力は、スズ表面に形成される絶縁性皮膜が破壊されやすいとはいえ、実際には、不具合が発生しないように、絶縁性皮膜を破壊できる力より強くなるように構成されている。このような強いばね力は、コネクタの設計や製造を困難にするだけではなく、挿入時に接触部位にかかる摩擦力も増大させるので、特に、端子を多数集積させた多極コネクタにおける嵌合作業が困難になる。さらに、高温高湿状態などの過酷な使用環境では、厚い酸化膜等が形成されるため、長期間、接触抵抗を低く維持することは困難である。   Moreover, the conductive member which gave such tin plating is used for the terminal etc. of a connector, for example. A connector is generally configured so that a male terminal and a female terminal are fitted to each other. When the male terminal is inserted into (inserted into) the female terminal, a load is applied to the male terminal by the spring force of the female terminal. Thus, the metal parts (contact parts) of both terminals are configured to contact each other. At that time, the spring force of the female terminal is actually made stronger than the force that can break the insulating film so as not to cause a malfunction, although the insulating film formed on the tin surface is likely to be broken. It is configured. Such a strong spring force not only makes it difficult to design and manufacture the connector, but also increases the frictional force applied to the contact area during insertion, so it is particularly difficult to perform a fitting operation in a multipolar connector in which a large number of terminals are integrated. become. Furthermore, since a thick oxide film or the like is formed in a harsh use environment such as a high temperature and high humidity state, it is difficult to keep the contact resistance low for a long period of time.

微摺動磨耗の発生を防止するためには、大気中で酸化しない金、白金及びパラジウム等の貴金属で端子の接触部位の表面をめっきすることが考えられる。しかしながら、金、白金及びパラジウム等の貴金属は、スズより高価であるため、導電部材自体の価格が高くなってしまう。   In order to prevent the occurrence of fine sliding wear, it is conceivable to plate the surface of the contact portion of the terminal with a noble metal such as gold, platinum and palladium that is not oxidized in the atmosphere. However, since noble metals such as gold, platinum, and palladium are more expensive than tin, the price of the conductive member itself is increased.

また、特許文献1には、酸化に強い等の耐久性が高く磨耗しにくい、銅を主成分とする材料について開示されているにすぎず、特に貴金属を要することなく、微摺動磨耗を抑制する技術については、開示されていない。   Further, Patent Document 1 discloses only a material mainly composed of copper that has high durability such as resistance to oxidation and is difficult to wear, and suppresses fine sliding wear without requiring a precious metal. The technology to do is not disclosed.

本発明は、かかる従来の問題点を解消するためになされたものであり、特に、貴金属のような高価な材料を要することなく、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる導電部材、及びこの導電部材を用いた端子を提供し、さらに、この導電部材及び端子を容易に製造できる製造方法を提供することを目的とする。   The present invention has been made to solve such conventional problems, and in particular, it can maintain a low contact resistance for a long period of time without requiring an expensive material such as a noble metal, It is an object of the present invention to provide a conductive member capable of suppressing sliding wear and a terminal using the conductive member, and to provide a manufacturing method capable of easily manufacturing the conductive member and the terminal.

本発明の導電部材は、他の導体と接触する接触部位を有し、前記他の導体との接触によって、前記他の導体と電気的に接続される導電部材であって、銅系材料からなる基材と、前記基材の表面の少なくとも前記接触部位に配置される導電性皮膜とを備え、前記導電性皮膜が、銅とガリウムとを含む化合物からなることを特徴とする導電部材である。   The conductive member of the present invention is a conductive member that has a contact portion that comes into contact with another conductor and is electrically connected to the other conductor by contact with the other conductor, and is made of a copper-based material. A conductive member comprising: a base material; and a conductive film disposed at least on the contact portion of the surface of the base material, wherein the conductive film is made of a compound containing copper and gallium.

この構成によれば、銅とガリウムとを含む化合物が、化学的に安定であるので、この銅とガリウムとを含む化合物からなる導電性皮膜は、その表面に形成される酸化膜が、スズ表面に形成される酸化膜と比較して非常に薄い。よって、銅とガリウムとを含む化合物からなる導電性皮膜は、その表面に比較的低い荷重をかけるだけで、その表面に形成されている酸化膜が容易に破壊され、この酸化膜の破壊によって、導電性を有する新生面が露出される。従って、この導電性皮膜が接触部位に配置される導電部材は、他の導体と良好な電気的な接続を確保できる。   According to this configuration, since the compound containing copper and gallium is chemically stable, the conductive film made of the compound containing copper and gallium has an oxide film formed on the surface of the tin film. It is very thin compared to the oxide film formed on the surface. Therefore, the conductive film made of a compound containing copper and gallium is easily destroyed by simply applying a relatively low load to the surface, and the destruction of the oxide film A new surface having conductivity is exposed. Therefore, the conductive member in which the conductive film is disposed at the contact site can ensure good electrical connection with other conductors.

さらに、この導電性皮膜は、例えば、導電部材を大気中で高温にさらされる等の過酷な環境下であっても、表面の酸化が抑制され、酸化膜の厚みが、ほとんど変化せず、薄いままである。よって、銅とガリウムとを含む化合物からなる導電性皮膜は、過酷な環境下であっても、その表面に比較的低い荷重をかけるだけで、導電性を有する新生面が露出される。   Furthermore, this conductive film is thin, for example, even when the conductive member is exposed to a high temperature in the atmosphere, such as being exposed to high temperatures, the surface oxidation is suppressed, and the thickness of the oxide film hardly changes. It remains. Therefore, a conductive film made of a compound containing copper and gallium exposes a new conductive surface only by applying a relatively low load to the surface even in a harsh environment.

以上より、前記導電性皮膜にかける荷重が比較的低くても、低い接触抵抗を維持できる。また、この導電部材は、導電部材の振動や温度変化等によって、導電部材が微摺動した場合であっても、導電性皮膜上への酸化物の堆積が抑制される。従って、この導電部材は、特に、貴金属のような高価な材料を要することなく、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる。   From the above, even if the load applied to the conductive film is relatively low, low contact resistance can be maintained. In addition, the conductive member suppresses the deposition of oxide on the conductive film even when the conductive member slides slightly due to vibration or temperature change of the conductive member. Therefore, this conductive member can maintain a low contact resistance for a long time without requiring an expensive material such as a noble metal, and can suppress fine sliding wear.

また、前記導電性皮膜が、CuGa及びCuGaの少なくとも一方からなることが好ましい。 Further, the conductive film is preferably made of at least one of CuGa 2 and Cu 9 Ga 4.

また、前記導電性皮膜が、ガリウムを含む液体状態の金属を、前記基材の表面に塗布することにより形成されたものであることが好ましい。この構成によれば、前記基材の表面に形成される導電性皮膜が、銅とガリウムとを含む化合物からなる皮膜であって、その皮膜が、薄くかつ均一である。   Moreover, it is preferable that the said electroconductive film is formed by apply | coating the metal of the liquid state containing a gallium to the surface of the said base material. According to this configuration, the conductive film formed on the surface of the base material is a film made of a compound containing copper and gallium, and the film is thin and uniform.

また、本発明は、相手方端子と接触する接触部位を有し、前記相手方端子と嵌合することによって、前記相手方端子と接触し、前記相手方端子と電気的に接続される端子であって、少なくとも前記接触部位を含む部分が、前記導電部材からなることを特徴とする端子である。   Further, the present invention is a terminal that has a contact portion that comes into contact with a counterpart terminal, contacts the counterpart terminal by fitting with the counterpart terminal, and is electrically connected to the counterpart terminal, at least A portion including the contact portion is made of the conductive member.

この構成によれば、相手方端子と接触する接触部位に配置される導電性皮膜の表面に、相手方端子を接触させ、比較的低い荷重をかけるだけで、その表面に形成されている酸化膜は容易に破壊されるので、端子を嵌合したときに端子と相手方端子とを圧接させるためのばね力を弱くしても接触抵抗を低く維持できる。また、この端子は、振動や温度変化等によって、端子が微摺動した場合であっても、導電性皮膜上への酸化物の堆積が抑制されるので、特に、貴金属のような高価な材料を要することなく、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる。   According to this configuration, the oxide film formed on the surface of the conductive film disposed on the contact portion in contact with the counterpart terminal can be easily formed by simply contacting the counterpart terminal with a relatively low load. Therefore, the contact resistance can be kept low even if the spring force for press-contacting the terminal and the counterpart terminal is weakened when the terminal is fitted. In addition, since this terminal suppresses the accumulation of oxide on the conductive film even when the terminal slides slightly due to vibration, temperature change, etc., it is particularly expensive material such as noble metal. Therefore, the contact resistance can be kept low for a long period of time and fine sliding wear can be suppressed.

また、端子は、相手方端子と嵌合させ、相手方端子と接触させた状態のまま、使用することが多いので、端子と相手方端子とが微摺動する可能性が高い。よって、端子に、微摺動磨耗を抑制できる本発明の導電部材を用いることは、特に好ましい。   Further, since the terminal is often used while being fitted to the counterpart terminal and in contact with the counterpart terminal, there is a high possibility that the terminal and the counterpart terminal slide slightly. Therefore, it is particularly preferable to use the conductive member of the present invention capable of suppressing fine sliding wear for the terminal.

さらに、接触部位に配置される導電性皮膜は、その表面に比較的低い荷重をかけるだけで、その表面に形成されている酸化膜が容易に破壊されるため、ばね力を弱くすることができるので、挿入時に端子と相手方端子とにかかる摩擦力を低減でき、挿入しやすくなる。   Furthermore, the conductive film disposed at the contact site can weaken the spring force because the oxide film formed on the surface is easily broken only by applying a relatively low load to the surface. Therefore, the frictional force applied to the terminal and the counterpart terminal during insertion can be reduced, and the insertion becomes easy.

また、本発明の導電部材の製造方法は、他の導体と接触する接触部位を有し、前記他の導体との接触によって、前記他の導体と電気的に接続される導電部材の製造方法であって、銅系材料からなる基材の少なくとも前記接触部位の表面に、ガリウムを含む液体状態の金属を塗布することによって、導電性皮膜を形成する皮膜形成工程を含むことを特徴とする導電部材の製造方法である。   Moreover, the manufacturing method of the electrically-conductive member of this invention is a manufacturing method of the electrically-conductive member which has a contact part which contacts another conductor, and is electrically connected with the said other conductor by contact with the said other conductor. A conductive member comprising a film forming step of forming a conductive film by applying a liquid metal containing gallium to at least the surface of the contact portion of a base material made of a copper-based material. It is a manufacturing method.

この構成によれば、ガリウムを含む液体状態の金属を、基材の表面に塗布することによって、銅とガリウムとの化合物を含む導電性皮膜を基材表面に、薄くかつ均一に形成できるので、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる導電部材を容易に製造できる。   According to this configuration, a conductive film containing a compound of copper and gallium can be thinly and uniformly formed on the surface of the substrate by applying a liquid metal containing gallium to the surface of the substrate. A conductive member that can maintain a low contact resistance for a long period of time and can suppress fine sliding wear can be easily manufactured.

すなわち、ガリウムを含む液体状態の金属を、銅系基材に接触させると、銅とガリウムとの化合物を含む導電性皮膜が形成され、この導電性皮膜が、液体状態の金属と銅系基材との接触を阻害するので、新たな導電性皮膜の形成を阻害するからであると考えられる。   That is, when a metal in a liquid state containing gallium is brought into contact with a copper base material, a conductive film containing a compound of copper and gallium is formed. This is considered to be because the formation of a new conductive film is inhibited.

また、前記皮膜形成工程は、前記液体状態の金属を塗布した後に余剰の金属を除去する金属除去工程を含むことが好ましい。この構成によれば、余剰の金属を除去することによって、基材の表面に塗布する液体状態の金属量を厳密に制御する必要がない。また、余剰の金属が、所定の箇所以外に垂れ落ちたり、流れること等により、所定の箇所以外に、液体状態の金属が接触してしまうことを防止できる。   Moreover, it is preferable that the said film formation process includes the metal removal process of removing an excess metal, after apply | coating the said metal of the liquid state. According to this configuration, it is not necessary to strictly control the amount of liquid metal applied to the surface of the substrate by removing excess metal. Moreover, it can prevent that a metal in a liquid state contacts other than a predetermined | prescribed location by excess metal dripping down or flowing other than a predetermined | prescribed location.

また、前記金属として、25℃以下の融点をもつものを塗布することが好ましい。この構成によれば、前記皮膜形成工程において、ガリウムを含む金属が、室温のままで、液体状態となるので、ガリウムを含む金属を予め加熱しなくてもよいので、より容易に導電部材を製造できる。   Further, it is preferable to apply a metal having a melting point of 25 ° C. or less as the metal. According to this configuration, since the metal containing gallium is in a liquid state at room temperature in the film forming step, the metal containing gallium does not need to be heated in advance, so that a conductive member can be manufactured more easily. it can.

また、ガリウムを含む金属を液体状態にするために、加熱して溶融させる必要がないので、導電部材を製造するための製造装置に、金属を加熱するための加熱装置が必要なく、装置を複雑にしなくてすむ。   Moreover, since it is not necessary to heat and melt the metal containing gallium in the liquid state, the manufacturing apparatus for manufacturing the conductive member does not need a heating apparatus for heating the metal, and the apparatus is complicated. You don't have to.

また、前記金属が、スズ、インジウム、及び亜鉛からなる群から選ばれる少なくとも1種をさらに含むことが好ましい。これらの金属が含有されると、前記金属の融点が低下するので、ガリウムを含む金属を液体状態にするための加熱が不要となり、もしくは、必要であっても、その加熱のための時間が短くてすむ。さらに、スズ、インジウム、及び亜鉛のいずれもが、銅と反応しないので、前記金属として、ガリウム融液を用いた場合と、同様の導電性皮膜が得られ、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる。   Moreover, it is preferable that the metal further includes at least one selected from the group consisting of tin, indium, and zinc. When these metals are contained, the melting point of the metal is lowered, so that heating for bringing the metal containing gallium into a liquid state is unnecessary, or even if necessary, the time for the heating is short. Tesumu. Furthermore, since any of tin, indium, and zinc does not react with copper, the same conductive film as that obtained when gallium melt is used as the metal is obtained, and the contact resistance is kept low for a long time. And fine sliding wear can be suppressed.

また、本発明の端子の製造方法は、相手方端子と接触する接触部位を有し、前記接触部位を含む部分を、前記導電部材の製造方法により製造することを特徴とする端子の製造方法である。この構成によれば、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる端子を容易に製造できる。   Moreover, the manufacturing method of the terminal of this invention is a manufacturing method of the terminal which has a contact part which contacts a counterpart terminal, and manufactures the part containing the said contact part with the manufacturing method of the said electrically-conductive member. . According to this configuration, it is possible to easily manufacture a terminal that can maintain a low contact resistance for a long period of time and can suppress fine sliding wear.

本発明によれば、特に、貴金属のような高価な材料を要することなく、長期間、接触抵抗を低く維持することができ、かつ、微摺動磨耗を抑制できる導電部材、及びこの導電部材を用いた端子を提供することができ、さらに、この導電部材及び端子を容易に製造できる製造方法を提供することができる。   According to the present invention, in particular, without requiring an expensive material such as a noble metal, a conductive member that can maintain a low contact resistance for a long period of time and can suppress fine sliding wear, and this conductive member The used terminal can be provided, and further, a manufacturing method capable of easily manufacturing the conductive member and the terminal can be provided.

本発明の実施形態に係る端子の一例について説明する。ここでは、雄端子と雌端子とが嵌合可能な端子対であって、雄端子と雌端子とのいずれにも、本発明の導電部材を用いた端子である場合の端子対を例に挙げて説明するが、雄端子及び雌端子のいずれかのみに、本発明の導電部材を用いた端子であってもよい。   An example of a terminal according to an embodiment of the present invention will be described. Here, a terminal pair in which a male terminal and a female terminal can be fitted, and the terminal pair in the case where the male member and the female terminal are terminals using the conductive member of the present invention is taken as an example. However, the terminal using the conductive member of the present invention may be used only for either the male terminal or the female terminal.

図1は、本発明の実施形態に係る端子からなる端子対10を示す概略断面図である。端子対10は、雄端子11と雌端子21とから構成される。なお、図1は、端子対10の雄端子11と雌端子21とが嵌合した嵌合状態を示す。   FIG. 1 is a schematic cross-sectional view showing a terminal pair 10 composed of terminals according to an embodiment of the present invention. The terminal pair 10 includes a male terminal 11 and a female terminal 21. FIG. 1 shows a fitting state in which the male terminal 11 and the female terminal 21 of the terminal pair 10 are fitted.

雄端子11は、挿入部12と、被覆電線の端末が接続される図略の電線接続部とを備える。雄端子11は、相手方端子である雌端子21に挿入(挿嵌)する部材である。挿入部12の形状は、雌端子21に挿入(挿嵌)可能であれば、特に限定されず、例えば、板状、棒状、円筒状等の種々の形状から適宜選択できる。   The male terminal 11 includes an insertion portion 12 and an unillustrated wire connection portion to which the end of the covered wire is connected. The male terminal 11 is a member that is inserted (inserted) into the female terminal 21 that is a counterpart terminal. The shape of the insertion portion 12 is not particularly limited as long as it can be inserted (inserted) into the female terminal 21, and can be appropriately selected from various shapes such as a plate shape, a rod shape, and a cylindrical shape.

雌端子21は、挿入部12が挿入(挿嵌)される端子嵌合部22と、雄端子11に接続されている被覆電線とは別の被覆電線の端末が接続される図略の電線接続部とを備える。   The female terminal 21 has an unillustrated wire connection in which a terminal fitting portion 22 into which the insertion portion 12 is inserted (inserted) and a terminal of a covered wire different from the covered wire connected to the male terminal 11 are connected. A part.

端子嵌合部22は、雌型であり、筒状部23とばね片24とを備える。筒状部23は、雌端子21の相手方端子である雄端子11が挿嵌方向に沿って挿入(挿嵌)可能となるように、先端側が開口した角筒状に形成され、天井壁25(図1では上面)、底壁26(図1では下面)及び図略の側壁を備えている。   The terminal fitting portion 22 is a female type and includes a cylindrical portion 23 and a spring piece 24. The cylindrical portion 23 is formed in a rectangular tube shape having an open front end so that the male terminal 11, which is the counterpart terminal of the female terminal 21, can be inserted (inserted) along the insertion direction, and the ceiling wall 25 ( 1 is provided with a bottom wall 26 (a bottom surface in FIG. 1) and a side wall (not shown).

ばね片24は、筒状部23の内側に、天井壁25に近接する方向(図1では斜め上方)に向かって傾斜しつつ、筒状部23の開口先端(底壁26の先端)から後方に向かって片持ち状に延設されている。そして、後方末端で下方にU字状に曲折させる曲折部24aを経て、底壁26に近接する方向(図1では斜め下方)に向かって傾斜しつつ、曲折部24aから前方に向かって延設され、さらに、底壁26の近傍で曲折して天井壁25に近接する方向に向かって傾斜した自由端となっている。さらに、ばね片24は、筒状部23の開口先端と曲折部24aとの間で、天井壁25に近接する方向に凸部24bが形成されている。このように構成されることで、雄端子11の挿入部12が、端子嵌合部22に挿嵌された際、この挿入部12とばね片24の凸部24bとが接触して、ばね片24は、凸部24bが下方に沈むように弾性変形する。このばね片24の弾性変形に基づく弾発力により、挿入部12がばね片24によって上方に押圧される。その結果、天井壁25とばね片24の凸部24bとで挿入部12が狭持され、電気的な接続がなされる。   The spring piece 24 is inclined toward the inner side of the tubular portion 23 toward the direction close to the ceiling wall 25 (obliquely upward in FIG. 1), and rearward from the opening tip (tip of the bottom wall 26) of the tubular portion 23. It extends in a cantilevered direction. And it extends toward the front from the bent part 24a through the bent part 24a bent downward in the U-shape at the rear end, and inclined toward the direction close to the bottom wall 26 (obliquely downward in FIG. 1). Furthermore, it is a free end that bends in the vicinity of the bottom wall 26 and is inclined toward the direction of approaching the ceiling wall 25. Further, the spring piece 24 is formed with a convex portion 24 b between the opening tip of the cylindrical portion 23 and the bent portion 24 a in a direction approaching the ceiling wall 25. With this configuration, when the insertion portion 12 of the male terminal 11 is inserted into the terminal fitting portion 22, the insertion portion 12 and the convex portion 24 b of the spring piece 24 come into contact with each other, and the spring piece 24 is elastically deformed so that the convex portion 24b sinks downward. Due to the elastic force based on the elastic deformation of the spring piece 24, the insertion portion 12 is pressed upward by the spring piece 24. As a result, the insertion portion 12 is held between the ceiling wall 25 and the convex portion 24b of the spring piece 24, and electrical connection is made.

次に、雄端子11及び雌端子21の構成について説明する。   Next, the configuration of the male terminal 11 and the female terminal 21 will be described.

雄端子11及び雌端子21は、銅系基材と、導電性皮膜とを備える。導電性皮膜は、雄端子11の場合、雄端子11と雌端子21とが嵌合したときに、ばね片24の凸部24bと接触する位置及び天井壁25と接触する位置(接触部位)を含む部分に配置されている。また、導電性皮膜は、雌端子21の場合、雄端子11と雌端子21とが嵌合したときに、雄端子11の挿入部12と接触する位置(接触部位)を含む部分に配置されている。従って、雄端子11及び雌端子21は、少なくとも接触部位を含む部分に後述の導電性皮膜が配置されており、図1に示す端子対10は、雄端子11の導電性皮膜と雌端子21の導電性皮膜との接触によって、電気的な接続がなされ、通電可能としている。なお、導電性皮膜は、少なくとも接触部位を含む部分に配置されていればよく、雄端子11と雌端子21との表面全面を被覆していてもよい。   The male terminal 11 and the female terminal 21 include a copper base material and a conductive film. In the case of the male terminal 11, the conductive film has a position that contacts the convex portion 24 b of the spring piece 24 and a position (contact portion) that contacts the ceiling wall 25 when the male terminal 11 and the female terminal 21 are fitted. It is arranged in the part including. Further, in the case of the female terminal 21, the conductive coating is disposed at a portion including a position (contact portion) that contacts the insertion portion 12 of the male terminal 11 when the male terminal 11 and the female terminal 21 are fitted. Yes. Accordingly, the male terminal 11 and the female terminal 21 are provided with a conductive film, which will be described later, at least in a portion including the contact portion. The terminal pair 10 shown in FIG. Electrical contact is made by contact with the conductive film, and electricity can be applied. In addition, the conductive film should just be arrange | positioned in the part containing a contact site | part at least, and may coat | cover the whole surface of the male terminal 11 and the female terminal 21. FIG.

前記銅系基材は、銅を主成分として含む銅系材料からなっていればよく、例えば、銅単体からなっていてもよいし、銅合金からなっていてもよい。銅以外に含有する成分としては、例えば、鉄、珪素、亜鉛、マグネシウム、ニッケル、クロム、コバルト、モリブテン、スズ、リン及びアルミニウム等が挙げられる。また、銅合金としては、例えば、スズ及びリンを含有するリン青銅や亜鉛を含有する黄銅等が挙げられる。   The said copper-type base material should just consist of a copper-type material which contains copper as a main component, for example, may consist of a copper simple substance, and may consist of a copper alloy. Examples of components other than copper include iron, silicon, zinc, magnesium, nickel, chromium, cobalt, molybdenum, tin, phosphorus, and aluminum. Examples of the copper alloy include phosphor bronze containing tin and phosphorus, brass containing zinc, and the like.

前記導電性皮膜は、銅とガリウムとを含む化合物からなる皮膜である。銅とガリウムとを含む化合物は、銅とガリウムとからなる化合物であることが好ましく、好適な具体例としては、例えば、CuGa及びCuGa等が挙げられる。よって、導電性皮膜は、CuGa及びCuGaの少なくとも一方からなることが好ましい。 The conductive film is a film made of a compound containing copper and gallium. The compound containing copper and gallium is preferably a compound composed of copper and gallium, and specific examples include CuGa 2 and Cu 9 Ga 4 . Therefore, the conductive film is preferably made of at least one of CuGa 2 and Cu 9 Ga 4.

また、導電性皮膜は、ガリウムを含む液体状態の金属を、銅系基材の表面に塗布することにより形成されたものであることが好ましい。このように形成された導電性皮膜は、薄くかつ均一に形成できる。また、この導電性皮膜は、銅とガリウムとを含む化合物からなっており、X線回折等により、CuGaが主成分であると推定される。 Moreover, it is preferable that a conductive film is formed by apply | coating the metal of the liquid state containing a gallium to the surface of a copper-type base material. The conductive film thus formed can be formed thin and uniformly. Further, this conductive film is made of a compound containing copper and gallium, and CuGa 2 is estimated to be a main component by X-ray diffraction or the like.

導電性皮膜の厚みは、特に制限されないが、0.1〜5μmであることが好ましい。導電性皮膜が薄すぎると、均一な皮膜となりにくく、銅系基材が露出する部分が形成されてしまう傾向があり、厚すぎると、銅系基材より導電性の低い導電性皮膜により、接触抵抗が高くなってしまう傾向がある。また、導電性皮膜を厚くしようとすると、液体状態の金属を銅系基材に接触させておく時間(処理時間)が長時間化したり、製造時に、液体状の金属が銅系基材から垂れ落ちること等による不具合が発生する傾向がある。   The thickness of the conductive film is not particularly limited, but is preferably 0.1 to 5 μm. If the conductive film is too thin, it is difficult to form a uniform film, and there is a tendency to form a portion where the copper base material is exposed. If it is too thick, the conductive film is less conductive than the copper base material, and contact is caused. There is a tendency for resistance to increase. Also, when trying to increase the thickness of the conductive film, the time during which the liquid metal is brought into contact with the copper-based substrate (processing time) becomes longer, or the liquid metal droops from the copper-based substrate during manufacturing. There is a tendency for problems to occur due to falling.

なお、ガリウムを含む液体状態の金属との接触により形成すると、特別な制御をすることなく、数分間の接触により、約1μmの好適な厚みの薄くて均一な導電性皮膜を形成できる。このことは、ガリウムを含む液体状態の金属を、銅系基材に接触させると、銅とガリウムとの化合物からなる導電性皮膜が形成され、この導電性皮膜が、金属と銅系基材との接触を阻害するので、新たな導電性皮膜の形成を阻害するからであると考えられる。   When formed by contact with a liquid metal containing gallium, a thin and uniform conductive film having a suitable thickness of about 1 μm can be formed by contact for several minutes without special control. This is because when a metal in a liquid state containing gallium is brought into contact with a copper base material, a conductive film made of a compound of copper and gallium is formed. This is considered to be because the formation of a new conductive film is inhibited.

次に、雄端子11及び雌端子21の製造方法について説明する。   Next, the manufacturing method of the male terminal 11 and the female terminal 21 is demonstrated.

まず、銅系基材の表面に形成されている酸化膜等の絶縁性皮膜を研磨や酸洗浄等で除去する。次に、この銅系基材を、プレス加工等によって、所定の形状に加工する。なお、この形状加工は、絶縁性皮膜の除去を行っていない銅系基材に施し、形状加工した後に、絶縁性皮膜の除去を行ってもよい。   First, an insulating film such as an oxide film formed on the surface of the copper base material is removed by polishing or acid cleaning. Next, this copper base material is processed into a predetermined shape by pressing or the like. In addition, this shape processing may be performed on the copper base material from which the insulating film has not been removed, and the insulating film may be removed after the shape processing.

そして、得られた銅系基材の表面に、ガリウムを含む液体状態の金属を塗布する。そうすることによって、銅系基材の表面に、銅とガリウムとを含む化合物からなる導電性皮膜が形成される。この皮膜を形成する形成工程は、銅系基材の表面に前記金属を塗布する工程であることが好ましい。また、上記形状加工を施す前に、導電性皮膜を形成させ、その後、上記形状加工を施してもよい。   And the metal of the liquid state containing a gallium is apply | coated to the surface of the obtained copper-type base material. By doing so, a conductive film made of a compound containing copper and gallium is formed on the surface of the copper-based substrate. It is preferable that the formation process which forms this membrane | film | coat is a process of apply | coating the said metal to the surface of a copper-type base material. Moreover, a conductive film may be formed before the shape processing, and then the shape processing may be performed.

前記金属は、ガリウムを含んでおり、銅系基材の表面に塗布するときに、液体状態であればよく、例えば、ガリウム単体であってもよいし、ガリウム合金であってもよい。なお、前記金属として、ガリウム単体を用いる場合、ガリウムの融点が29.7℃であるので、加熱して得られるガリウム融液にする必要がある。   The metal contains gallium and may be in a liquid state when applied to the surface of the copper-based substrate. For example, the metal may be gallium alone or a gallium alloy. When gallium alone is used as the metal, the melting point of gallium is 29.7 ° C., so it is necessary to obtain a gallium melt obtained by heating.

前記ガリウム合金としては、Ga及びInを含むGa−In系合金が好ましく、Snをさらに含む合金がより好ましい。ガリウム合金の具体例としては、例えば、Ga60〜80質量%、In10〜30質量%、Sn5〜20質量%からなる合金が好ましい。ガリウム合金のより具体的な例示としては、例えば、Ga62.5質量%、In21.5質量%、Sn16質量%からなる合金(融点10.7℃)、Ga62質量%、In25質量%、Sn13質量%からなる合金(融点10.6℃)、Ga62質量%、In23質量%、Sn13質量%、Zn2質量%からなる合金(融点9.8℃)等が挙げられ、これらの中でも、Ga62.5質量%、In21.5質量%、Sn16質量%からなる合金(融点10.7℃)がより好ましい。   As the gallium alloy, a Ga—In alloy containing Ga and In is preferable, and an alloy further containing Sn is more preferable. As a specific example of the gallium alloy, for example, an alloy composed of Ga 60 to 80% by mass, In 10 to 30% by mass, and Sn 5 to 20% by mass is preferable. More specific examples of the gallium alloy include, for example, an alloy composed of 62.5 mass% Ga, 21.5 mass% In, 16 mass% Sn (melting point 10.7 ° C), 62 mass% Ga, 25 mass% In, and 13 mass% Sn. Alloy (melting point 10.6 ° C.), Ga 62 mass%, In 23 mass%, Sn 13 mass%, alloy consisting of Zn 2 mass% (melting point 9.8 ° C.), etc., among these, Ga 62.5 mass% An alloy (melting point: 10.7 ° C.) composed of 21.5 mass% In and 16 mass% Sn is more preferable.

前記金属のガリウム以外に含有する好ましい成分としては、例えば、スズ(Sn)、インジウム(In)及び亜鉛(Zn)等が挙げられる。これらの金属は、銅と反応したり、銅系基材中に進入することがないので、これらの成分を含有していても、前記金属として、ガリウム融液を用いた場合と同様の導電性皮膜を形成できる。また、これらの金属が含有されると、前記金属の融点が低下するので、ガリウムを含む金属を液体状態にするための加熱が不要となり、もしくは、必要であっても、その加熱のための時間が短くてすむ。   Examples of preferable components other than the metal gallium include tin (Sn), indium (In), and zinc (Zn). Since these metals do not react with copper or penetrate into the copper base material, even if these components are contained, the same conductivity as when gallium melt is used as the metal. A film can be formed. In addition, when these metals are contained, the melting point of the metal is lowered, so that heating for bringing the metal containing gallium into a liquid state is unnecessary, or even if necessary, the time for the heating. Is short.

なお、前記金属のガリウム以外に含有する成分としては、上記成分に限られず、銅と反応したり、銅系基材中に進入することがなく、ガリウム融液を用いた場合と同様の導電性皮膜を形成できるものであればよい。   In addition, the component contained in addition to the metal gallium is not limited to the above component, and does not react with copper or enter the copper-based substrate, and has the same conductivity as when gallium melt is used. Any film that can form a film may be used.

また、前記金属の融点は、25℃以下であることが好ましく、10℃以下がより好ましい。融点が室温より高いと、製造時に、ガリウムを含む金属を加熱して、液体状態にする必要があり、また、融点が高すぎると、その加熱のための時間が長くなってしまう等、端子の製造に手間がかかってしまう。   Further, the melting point of the metal is preferably 25 ° C. or less, and more preferably 10 ° C. or less. If the melting point is higher than room temperature, it is necessary to heat the metal containing gallium to a liquid state at the time of manufacture, and if the melting point is too high, the time for the heating becomes longer. It takes time to manufacture.

液体状態の金属の塗布方法は、特に限定されず、どのような塗布方法であっても採用できる。例えば、ディッピング法、スピンコーティング法、スプレー法、ローラー法、スクリーン印刷等の印刷法、ロールコーター法、カーテンフローコーター法、刷毛塗り法等が挙げられる。また、前記金属は、銅系基材の表面全面に塗布してもよいが、少なくとも接触部位に部分的に塗布すればよい。   The method for applying the metal in the liquid state is not particularly limited, and any application method can be adopted. For example, a dipping method, a spin coating method, a spray method, a roller method, a printing method such as screen printing, a roll coater method, a curtain flow coater method, a brush coating method, and the like can be given. Moreover, although the said metal may be apply | coated to the whole surface of a copper-type base material, what is necessary is just to apply | coat partially to a contact location at least.

銅系基材と液体状態の金属との接触時間(処理時間)は、1分間〜1時間と広い範囲のいずれの処理時間であっても、形成される導電性皮膜の厚みがほとんど変わらないので、処理時間を厳密に制御する必要は特にないが、1〜15分間であることが好ましい。そうすることによって、導電性皮膜が確実に形成されており、さらに、製造効率が高い。また、銅系基材と液体状態の金属との接触させているときの処理温度は、特に制限されず、10〜130℃であることが好ましい。   Since the contact time (treatment time) between the copper base material and the metal in the liquid state is 1 minute to 1 hour in any of a wide range, the thickness of the conductive film to be formed hardly changes. Although it is not necessary to strictly control the treatment time, it is preferably 1 to 15 minutes. By doing so, the conductive film is reliably formed, and the manufacturing efficiency is high. In addition, the treatment temperature when the copper base material and the liquid metal are in contact with each other is not particularly limited, and is preferably 10 to 130 ° C.

また、前記皮膜形成工程は、液体状態の金属を塗布した後に余剰の金属を除去する金属除去工程を含むことが好ましい。金属除去工程としては、例えば、綿棒、紙ウエス及び不織布等で余剰の金属を拭き取る工程や、高圧ガス又は液剤を吹き付ける工程等が挙げられる。   Moreover, it is preferable that the said film formation process includes the metal removal process of removing an excessive metal, after apply | coating the metal of a liquid state. As a metal removal process, the process of wiping off excess metal with a cotton swab, paper waste, a nonwoven fabric, etc., the process of spraying a high pressure gas or a liquid agent, etc. are mentioned, for example.

以上、本発明の実施形態に係る端子について説明したが、本発明の導電部材は、端子に用いられる場合に限られず、他の導体と接触する接触部位を有し、前記他の導体との接触によって、前記他の導体と電気的に接続される導電部材であればよい。例えば、常閉スイッチの接点部分等に適用可能である。ただし、端子は、相手方端子と嵌合させ、相手方端子と接触させた状態のまま、使用することが多いので、端子と相手方端子とが微摺動する可能性が高い。よって、端子に、微摺動磨耗を抑制できる本発明の導電部材を用いることは、特に好ましい。   As mentioned above, although the terminal which concerns on embodiment of this invention was demonstrated, the electrically-conductive member of this invention is not restricted to the case where it is used for a terminal, has a contact part which contacts another conductor, and contacts with the said other conductor As long as the conductive member is electrically connected to the other conductor. For example, it can be applied to a contact portion of a normally closed switch. However, since the terminal is often used in a state in which the terminal is fitted to the counterpart terminal and is in contact with the counterpart terminal, there is a high possibility that the terminal and the counterpart terminal slide slightly. Therefore, it is particularly preferable to use the conductive member of the present invention capable of suppressing fine sliding wear for the terminal.

以下に、本発明について、実施例を挙げて説明する。   Hereinafter, the present invention will be described with reference to examples.

(実施例1)
実施例1では、図2に示すような電気接続構造30を製造し、後述の評価を行った。図2は、実施例に係る導電部材を用いた電気接続構造30の概略断面図を示す。図2に示す電気接続構造30は、第1導電部材31と第2導電部材32との一対の導電部材から構成されている。第1導電部材31及び第2導電部材32は、以下のように製造した。
Example 1
In Example 1, an electrical connection structure 30 as shown in FIG. 2 was manufactured and evaluated as described later. FIG. 2 is a schematic cross-sectional view of the electrical connection structure 30 using the conductive member according to the embodiment. The electrical connection structure 30 shown in FIG. 2 is composed of a pair of conductive members of a first conductive member 31 and a second conductive member 32. The first conductive member 31 and the second conductive member 32 were manufactured as follows.

まず、表面に酸化膜等の絶縁性皮膜が形成されていないリン青銅板(銅系基材)35を用意した。このリン青銅板35を、プレス加工により、直径1mmの半球状の凸部33を形成した。そして、プレス加工を施したりん青銅板を、50℃に加熱して溶融したガリウム融液中に、約1分間浸漬させた後に、ガリウム融液から取り出した。そして、表面に付着している未反応のガリウム融液を、不織布で拭き取り、さらに、希塩酸で表面を洗浄して、リン青銅板の表面上のガリウム融液を除去した。そうすることによって、銅系基材35の表面上に導電性皮膜36が形成された第1導電部材31が得られた。   First, a phosphor bronze plate (copper base material) 35 on which an insulating film such as an oxide film was not formed was prepared. The phosphor bronze plate 35 was pressed to form a hemispherical convex portion 33 having a diameter of 1 mm. The phosphor bronze plate subjected to press working was immersed in a gallium melt melted by heating to 50 ° C. for about 1 minute, and then taken out from the gallium melt. Then, the unreacted gallium melt adhering to the surface was wiped off with a nonwoven fabric, and the surface was washed with dilute hydrochloric acid to remove the gallium melt on the surface of the phosphor bronze plate. By doing so, the 1st electroconductive member 31 in which the electroconductive film | membrane 36 was formed on the surface of the copper-type base material 35 was obtained.

また、別途用意したプレス加工を施していないリン青銅板35を、上記と同様の処理により、銅系基材35の表面上に導電性皮膜36が形成された第2導電部材32が得られた。   Moreover, the 2nd electroconductive member 32 by which the electroconductive film | membrane 36 was formed on the surface of the copper-type base material 35 was obtained by the process similar to the above using the phosphor bronze board 35 which did not perform the press work prepared separately. .

そして、得られた2枚の導電部材(第1導電部材31及び第2導電部材32)を、図2に示すように対向させ、荷重を加えた。そうすることによって、電気接続構造30が得られた。   Then, the two obtained conductive members (the first conductive member 31 and the second conductive member 32) were opposed to each other as shown in FIG. By doing so, the electrical connection structure 30 was obtained.

なお、第2導電部材32と接触する第1導電部材31の凸部33の部位が、第1導電部材31の接触部位(接点)であり、第1導電部材31の凸部33と接触する第2導電部材32の部位が、第2導電部材32の接触部位(接点)である。導電性皮膜36は、図2に示すように、少なくとも接触部位には配置されている。また、第1導電部材31は、第2導電部材32にとっての、他の導体に相当し、第2導電部材32は、第1導電部材31にとっての、他の導体に相当する。つまり、第1導電部材31及び第2導電部材32は、それぞれ導電部材に相当し、それぞれ相手方部材の他の導体に相当する。   Note that the portion of the convex portion 33 of the first conductive member 31 that contacts the second conductive member 32 is the contact portion (contact point) of the first conductive member 31, and the first portion that contacts the convex portion 33 of the first conductive member 31. The part of the second conductive member 32 is a contact part (contact point) of the second conductive member 32. As shown in FIG. 2, the conductive film 36 is disposed at least at the contact site. The first conductive member 31 corresponds to another conductor for the second conductive member 32, and the second conductive member 32 corresponds to another conductor for the first conductive member 31. That is, the first conductive member 31 and the second conductive member 32 correspond to conductive members, respectively, and correspond to other conductors of the counterpart member.

実施例1の導電部材(第1導電部材31及び第2導電部材32)を垂直方向にスライスし、走査型電子顕微鏡で観察したところ、導電性皮膜16の厚みは約0.6μmの厚みであり、平坦であった。   When the conductive members (first conductive member 31 and second conductive member 32) of Example 1 were sliced in the vertical direction and observed with a scanning electron microscope, the thickness of the conductive film 16 was about 0.6 μm. It was flat.

(実施例2)
実施例2は、ガリウム融液中にリン青銅板を約1分間浸漬させる代わりに、Ga62.5質量%、In21.5質量%、Sn16質量%からなる合金を、室温で、リン青銅板に塗布し、1分間保持すること以外、実施例1と同様である。
(Example 2)
In Example 2, instead of immersing the phosphor bronze plate in the gallium melt for about 1 minute, an alloy composed of 62.5% by mass of Ga, 21.5% by mass of In and 16% by mass of Sn was applied to the phosphor bronze plate at room temperature. And it is the same as that of Example 1 except hold | maintaining for 1 minute.

実施例2の導電部材を垂直方向にスライスし、走査型電子顕微鏡で観察したところ、導電性皮膜の厚みは0.2〜0.4μmの厚みであり、平坦であった。また、実施例2の導電部材の表面を、エネルギー分散型蛍光X線分析装置(EDX)を用いて測定すると、InとSnは検出されず、導電性皮膜は、銅とガリウムとの化合物層であることがわかった。   When the conductive member of Example 2 was sliced in the vertical direction and observed with a scanning electron microscope, the conductive film had a thickness of 0.2 to 0.4 μm and was flat. In addition, when the surface of the conductive member of Example 2 was measured using an energy dispersive X-ray fluorescence spectrometer (EDX), In and Sn were not detected, and the conductive film was a compound layer of copper and gallium. I found out.

(比較例1)
比較例1は、リン青銅板の表面に、厚み1μmのスズめっきを形成した、従来の導電材料を用いたこと以外、実施例1と同様である。
(Comparative Example 1)
Comparative Example 1 is the same as Example 1 except that a conventional conductive material in which tin plating with a thickness of 1 μm is formed on the surface of a phosphor bronze plate is used.

(比較例2)
比較例2は、未処理のリン青銅板を用いたこと以外、実施例1と同様である。
(Comparative Example 2)
Comparative Example 2 is the same as Example 1 except that an untreated phosphor bronze plate was used.

上記実施例1,2及び比較例1,2は、以下の評価を実施した。   The above Examples 1 and 2 and Comparative Examples 1 and 2 were evaluated as follows.

(微摺動磨耗)
実施例1で得られた2枚の導電部材を、図2に示すように対向させ、荷重を加えた状態で、接触抵抗を測定しながら、一方の導電部材を水平方向に摺動させた。また、比較例1の導電部材も、同様に測定した。その結果を図3に示す。
(Slight sliding wear)
The two conductive members obtained in Example 1 were opposed to each other as shown in FIG. 2, and one of the conductive members was slid in the horizontal direction while measuring the contact resistance with a load applied. The conductive member of Comparative Example 1 was measured in the same manner. The result is shown in FIG.

図3は、微摺動磨耗の評価結果を示すグラフである。縦軸は、接触抵抗(mΩ)を示し、横軸は、摺動回数を示す。また、折れ線41は、実施例1を示し、折れ線42は、比較例1を示す。   FIG. 3 is a graph showing evaluation results of fine sliding wear. The vertical axis represents contact resistance (mΩ), and the horizontal axis represents the number of sliding times. Further, the broken line 41 indicates Example 1, and the broken line 42 indicates Comparative Example 1.

図3に示すように、実施例1は、摺動回数にかかわらず、接触抵抗がほとんど増加せず、10mΩ以下に維持されているのに対し、比較例1は、摺動回数100回付近から接触抵抗が上昇し、1Ω近くまで上昇した。   As shown in FIG. 3, in Example 1, the contact resistance hardly increases regardless of the number of sliding times and is maintained at 10 mΩ or less, whereas in Comparative Example 1, the sliding number is around 100 times. The contact resistance increased and increased to near 1Ω.

このことから、スズめっきを施した従来の導電部材は、微摺動磨耗が発生したが、銅とガリウムとの化合物からなる導電性皮膜とを備えた実施例では、微摺動磨耗が抑制されたことがわかる。   As a result, the conventional conductive member plated with tin was subjected to fine sliding wear, but in the example provided with the conductive film made of a compound of copper and gallium, the fine sliding wear was suppressed. I understand that.

(高温放置後の抵抗上昇1)
実施例1で得られた2枚の導電部材を、図2に示すように対向させ、荷重を加えた状態で、接触抵抗を測定し、その後、導電部材を160℃で300時間熱処理した後に、再び、接触抵抗を測定した。また、比較例1も、同様に測定した。
(Resistance increase after leaving at high temperature 1)
The two conductive members obtained in Example 1 were made to face each other as shown in FIG. 2, and the contact resistance was measured in a state where a load was applied. After that, the conductive members were heat-treated at 160 ° C. for 300 hours. Again, contact resistance was measured. Further, Comparative Example 1 was measured in the same manner.

その結果、実施例1では、熱処理後であっても、接触抵抗がほとんど変わらなかったのに対して、比較例1では、熱処理後の接触抵抗値は、熱処理前の約10倍となった。   As a result, in Example 1, the contact resistance hardly changed even after the heat treatment, whereas in Comparative Example 1, the contact resistance value after the heat treatment was about 10 times that before the heat treatment.

(高温放置後の抵抗上昇2)
実施例2で得られた2枚の導電部材を、180℃で4時間熱処理した後に、図2に示すように対向させ、荷重を加えた状態で、接触抵抗を測定した。また、比較例2も、同様に測定した。
(Resistance increase after standing at high temperature 2)
The two conductive members obtained in Example 2 were heat-treated at 180 ° C. for 4 hours, then faced as shown in FIG. 2, and the contact resistance was measured with a load applied. Further, Comparative Example 2 was measured in the same manner.

その結果、実施例1の接触抵抗値は、約10mΩと低かったのに対し、比較例2の接触抵抗値は、1Ωを超えており、非常に高かった。   As a result, the contact resistance value of Example 1 was as low as about 10 mΩ, whereas the contact resistance value of Comparative Example 2 exceeded 1Ω and was very high.

上記、高温放置後の抵抗上昇1及び高温放置後の抵抗上昇2の結果から、銅とガリウムとの化合物からなる導電性皮膜とを備えた実施例は、微摺動磨耗が抑制されるだけではなく、高温保存性の高い導電部材であることがわかる。   From the results of the resistance increase 1 after standing at high temperature and the resistance increase 2 after standing at high temperature, the embodiment provided with the conductive film made of a compound of copper and gallium is not limited to fine sliding wear. It can be seen that the conductive member has high temperature storage stability.

(酸化膜の膜厚)
実施例1で得られた導電部材を160℃で300時間熱処理した後に、酸化膜の厚みを、X線光電子分光法(XPS)によって測定した。また、比較例2も、同様に測定した。
(Oxide film thickness)
After the conductive member obtained in Example 1 was heat-treated at 160 ° C. for 300 hours, the thickness of the oxide film was measured by X-ray photoelectron spectroscopy (XPS). Further, Comparative Example 2 was measured in the same manner.

その結果、実施例1の酸化膜の厚みは、熱処理前とあまり変化なく6nm以下であるのに対して、比較例2の酸化膜の厚みは、150nm程度であった。   As a result, the thickness of the oxide film of Example 1 was 6 nm or less without much change from that before the heat treatment, whereas the thickness of the oxide film of Comparative Example 2 was about 150 nm.

このことから、銅とガリウムとの化合物からなる導電性皮膜を備えた実施例は、熱処理しても、酸化膜が薄いので、接触抵抗が低く維持され、また、摺動によっても酸化膜が厚くならず抵抗が上がらないと考えられる。   Therefore, in the example provided with the conductive film made of a compound of copper and gallium, the oxide film is thin even when heat-treated, so that the contact resistance is kept low, and the oxide film is thick even by sliding. It is thought that resistance does not increase.

本発明の実施形態に係る端子からなる端子対10を示す概略断面図である。It is a schematic sectional drawing which shows the terminal pair 10 which consists of a terminal which concerns on embodiment of this invention. 実施例に係る導電部材を用いた電気接続構造30の概略断面図を示す。The schematic sectional drawing of the electrical connection structure 30 using the electrically-conductive member which concerns on an Example is shown. 微摺動磨耗の評価結果を示すグラフである。It is a graph which shows the evaluation result of fine sliding wear.

符号の説明Explanation of symbols

10 端子対
11 雄端子
12 挿入部
21 雌端子
22 端子嵌合部
23 筒状部
24 ばね片
24a 曲折部
24b 凸部
25 天井壁
26 底壁
30 電気接続構造
31 第1導電部材
32 第2導電部材
33 凸部
35 銅系基材
36 導電性皮膜
DESCRIPTION OF SYMBOLS 10 Terminal pair 11 Male terminal 12 Insertion part 21 Female terminal 22 Terminal fitting part 23 Cylindrical part 24 Spring piece 24a Bending part 24b Protrusion part 25 Ceiling wall 26 Bottom wall 30 Electrical connection structure 31 1st conductive member 32 2nd conductive member 33 Convex part 35 Copper base material 36 Conductive film

Claims (9)

他の導体と接触する接触部位を有し、前記他の導体との接触によって、前記他の導体と電気的に接続される導電部材であって、
銅系材料からなる基材と、
前記基材の表面の少なくとも前記接触部位に配置される導電性皮膜とを備え、
前記導電性皮膜が、銅とガリウムとを含む化合物からなることを特徴とする導電部材。
A conductive member having a contact portion that contacts another conductor, and electrically connected to the other conductor by contact with the other conductor;
A base material made of a copper-based material;
A conductive film disposed at least on the contact portion of the surface of the substrate;
The conductive member is made of a compound containing copper and gallium.
前記導電性皮膜が、CuGa及びCuGaの少なくとも一方からなる請求項1に記載の導電部材。 The conductive member according to claim 1, wherein the conductive film is made of at least one of CuGa 2 and Cu 9 Ga 4 . 前記導電性皮膜が、ガリウムを含む液体状態の金属を、前記基材の表面に塗布することにより形成されたものである請求項1又は請求項2に記載の導電部材。   The conductive member according to claim 1, wherein the conductive film is formed by applying a liquid metal containing gallium to the surface of the base material. 相手方端子と接触する接触部位を有し、前記相手方端子と嵌合することによって、前記相手方端子と接触し、前記相手方端子と電気的に接続される端子であって、
少なくとも前記接触部位を含む部分が、請求項1〜3のいずれか1項に記載の導電部材からなることを特徴とする端子。
It has a contact portion that comes into contact with a counterpart terminal, and is a terminal that comes into contact with the counterpart terminal by fitting with the counterpart terminal and is electrically connected to the counterpart terminal,
The terminal including at least the portion including the contact portion is made of the conductive member according to claim 1.
他の導体と接触する接触部位を有し、前記他の導体との接触によって、前記他の導体と電気的に接続される導電部材の製造方法であって、
銅系材料からなる基材の少なくとも前記接触部位の表面に、ガリウムを含む液体状態の金属を塗布することによって、導電性皮膜を形成する皮膜形成工程を含むことを特徴とする導電部材の製造方法。
A method for producing a conductive member having a contact portion that contacts another conductor, and being electrically connected to the other conductor by contact with the other conductor,
A method for producing a conductive member comprising a film forming step of forming a conductive film by applying a liquid metal containing gallium to at least the surface of the contact portion of a base material made of a copper-based material .
前記皮膜形成工程は、前記液体状態の金属を塗布した後に余剰の金属を除去する金属除去工程を含む請求項5に記載の導電部材の製造方法。   The said film formation process is a manufacturing method of the electrically-conductive member of Claim 5 including the metal removal process of removing an excessive metal, after apply | coating the said metal of the liquid state. 前記金属として、25℃以下の融点をもつものを塗布する請求項5又は請求項6に記載の導電部材の製造方法。   The manufacturing method of the electrically-conductive member of Claim 5 or Claim 6 which apply | coats what has melting | fusing point of 25 degrees C or less as said metal. 前記金属が、スズ、インジウム、及び亜鉛からなる群から選ばれる少なくとも1種をさらに含む請求項7に記載の導電部材の製造方法。   The method for producing a conductive member according to claim 7, wherein the metal further includes at least one selected from the group consisting of tin, indium, and zinc. 相手方端子と接触する接触部位を有し、前記相手方端子と嵌合することによって、前記相手方端子と接触し、前記相手方端子と電気的に接続される端子の製造方法であって、
少なくとも前記接触部位を含む部分を、請求項5〜8のいずれか1項に記載の導電部材の製造方法により製造することを特徴とする端子の製造方法。
A method of manufacturing a terminal that has a contact portion that contacts a counterpart terminal, contacts the counterpart terminal by fitting with the counterpart terminal, and is electrically connected to the counterpart terminal,
A method for manufacturing a terminal, wherein a portion including at least the contact part is manufactured by the method for manufacturing a conductive member according to any one of claims 5 to 8.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013515340A (en) * 2009-12-22 2013-05-02 サン−ゴバン グラス フランス Window glass with electrical connection
JP2021118095A (en) * 2020-01-27 2021-08-10 国立研究開発法人産業技術総合研究所 Connector and connector pair

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123171A (en) * 1982-12-28 1984-07-16 株式会社徳力本店 Connector

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123171A (en) * 1982-12-28 1984-07-16 株式会社徳力本店 Connector

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013515340A (en) * 2009-12-22 2013-05-02 サン−ゴバン グラス フランス Window glass with electrical connection
US9370048B2 (en) 2009-12-22 2016-06-14 Saint-Gobain Glass France Pane having electrical connecting element
JP2021118095A (en) * 2020-01-27 2021-08-10 国立研究開発法人産業技術総合研究所 Connector and connector pair
CN113258380A (en) * 2020-01-27 2021-08-13 矢崎总业株式会社 Connector and connector pair
US11764506B2 (en) 2020-01-27 2023-09-19 Yazaki Corporation Connector and connector pair
JP7364481B2 (en) 2020-01-27 2023-10-18 矢崎総業株式会社 Connectors and connector pairs

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