JP2008241658A - Monitoring device of structure and monitoring method therefor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To perform state monitoring, abnormality monitoring, foreign matter monitoring and remote monitoring, having furthermore heightened discrimination capacity than the case wherein observation is performed by an ordinary camera, by changing a photographing condition of a monitoring image flexibly in accordance with a spectrum characteristic, an optical polarization characteristic or a time change characteristic of a monitoring object. <P>SOLUTION: This monitoring device 1 of a structure is a device for monitoring the monitoring object 30 which is a structure. The monitoring device 1 of the structure is equipped with a monitoring part 2 and an operation part 3. The monitoring part 2 is equipped with a light source part 4, a photographing part 5 and a monitoring part support member 6. The operation part 3 is equipped with a photographing part control unit 7, a computer 8 for system control, a light source part driver 9, a display device 10 and an input device 11. The light source part 4 is equipped with a light source 4A. The photographing part 5 is equipped with a camera 5A, and the camera 5A is equipped with a lens optical system 5B and a monochromatic imaging element 5C. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a structure monitoring apparatus and a monitoring method for performing structure monitoring, foreign object monitoring, abnormality monitoring, and remote monitoring.

  Conventionally, state monitoring, abnormality monitoring, and foreign object monitoring of structures existing in places where it is difficult for humans to approach, such as inside a nuclear reactor, are performed by remote monitoring using a camera. The camera used for this work is a monochrome imaging tube camera, a monochrome CCD camera, a color CCD camera or the like for observing wavelengths in the visible range.

  Among these, a color camera monitors a full-color image using red, green, and blue three primary color filters.

  In general, the primary color filters used in this color camera often have a light bandwidth of about 590 to 700 nm for red, 500 to 590 nm for green, and 400 to 520 nm for blue. Bright and dark images separated by these primary color filters can be monitored as full-color images by introducing them into red, green and blue signal inputs such as color television.

  On the other hand, in general, a monochrome camera can recognize only light / dark information in which wavelengths from 400 nm to 700 nm, which is a visible light region, are integratedly monitored.

  Comparing the monitoring of the color camera with the monitoring of the monochrome camera, the color camera has three times the color information as compared with the monochrome camera, so that it can be said that the ability of identifying an object is roughly the third power of a monochrome camera. That is, even if an object or material is monitored in the same way by a monochrome camera, the color looks different when monitored by a color camera, so that it can be recognized as another object or material.

  By the way, the objects and materials constituting the object of structure state monitoring, abnormality monitoring, and foreign object monitoring have reflection spectra, absorption spectra, fluorescence spectra, and phosphorescence spectra corresponding to the respective objects and materials.

  Although these spectral characteristics are recognized as color information during monitoring with a color camera, generally these spectral structures are more complex than the color separation capabilities of a color camera.

  For example, the red region of a color camera is in the range of 590 nm to 700 nm, and even an object having a different spectrum in this range cannot be identified when monitored using a normal color camera. In other words, even if an object or material monitored in the same manner by a color camera is decomposed and monitored in a narrower spectral region, it appears to have completely different brightness, and it becomes easy to identify the object and material.

  Therefore, for example, if this red spectral range is divided into three parts, such as 590 nm to 630 nm, 630 nm to 660 nm, and 660 nm to 700 nm, and assigned to the blue, green, and red signals of a normal camera, respectively, Different colors can be monitored, and objects and materials that cannot be identified by a normal color camera can be identified.

  Similar to this concept, there are cameras (multispectral cameras or hyperspectral cameras) that measure images in about 210 different wavelength regions, and are mounted on satellites for earth observation.

Examples of prior art related to image monitoring technology for ordinary structures are shown below.
JP-A-8-146186 (Reactor internal structure inspection device and inspection method) Japanese Patent Laid-Open No. 11-174192 (Reactor Annulus Inspection Device) Japanese Patent Laid-Open No. 2002-181986 (Reactor containment vessel pressure suppression chamber monitoring device) JP 2002-146377 A (Inspection preventive maintenance device and inspection method for structures in reactor pressure vessel)

  A normal surveillance camera is a color camera. This color camera does not have sufficient information identification capability for monitoring the status of structures, abnormality monitoring, and foreign object monitoring that are difficult to access such as inside a nuclear reactor. There are problems that require a long time, and that objects and materials constituting the monitoring object may not be discriminated unless the object is sampled and analyzed remotely.

  If the structure state monitoring, abnormality monitoring, and foreign object monitoring are performed using the hyperspectral camera, it is possible to obtain much more information about the object than monitoring with a normal camera image. This is particularly effective when monitoring places that are not accessible to humans, such as the inside and outside of the reactor.

  However, the satellite-equipped hyperspectral camera is a very large device of about 50kg to 200kg, and it should be installed in a place where there is not enough installation space, such as inside a nuclear reactor, or in a remote device to observe narrow areas. It is not applicable in such cases.

  A hyperspectral camera mounted on a satellite measures reflected light from the ground surface illuminated by light or sunlight, and does not have a light source. When used for monitoring a structure, there is a problem that some kind of light source is required.

  Furthermore, when using a light source, the influence of the direct reflected light on the object surface is great depending on the irradiation angle of the light source, and the object may not be correctly identified.

  Furthermore, since there is no light source, there is a problem that a method of identifying an object by monitoring fluorescence emission by time resolution cannot be applied.

  On the other hand, in the monitoring of structures with a normal color camera or monochrome camera, the observation wavelength is fixed in the visible light wavelength range, so simply using a wavelength-limited filter does not allow observation at multiple wavelengths. . That is, even if a color camera is provided with an ultraviolet bandpass filter having a wavelength shorter than 400 nm, for example, a central wavelength of 350 nm, it cannot be monitored, and similarly, this wavelength is transmitted for the purpose of observation at a wavelength longer than 700 nm, for example, a wavelength of 900 nm. Even if a bandpass filter is provided, monitoring is not possible.

  By the way, as an application example of the present invention, there is monitoring of a structure in a reactor pressure vessel filled with reactor water, particularly a structure in a reactor filled with water having a strong radiation field. The electrical equipment such as the underwater camera should not be immersed in water.

  Further, unless the monitoring wavelength can be easily changed, there is a problem that a great trouble is caused in order to smoothly perform the state monitoring, abnormality monitoring, and foreign object monitoring with the wavelength changed.

  Furthermore, as often happens when monitoring structures in a reactor pressure vessel under such circumstances, the direct reflection component is strong due to the positional relationship between the target surface, the monitoring camera, and the light source. There are many problems that cause halation.

  Furthermore, for example, when a substance that has the same color as the structure in the reactor pressure vessel or a material that is transparent at visible wavelengths is dropped into the reactor pressure vessel, search for it with a normal camera. Is very difficult.

  On the other hand, the structures in reactor pressure vessels installed in water are often covered with metal oxides, and ordinary color cameras simply look red rust and grasp their actual composition distribution. There are also issues such as being unable to do so.

  In addition, when monitoring the boundaries of structures in the reactor pressure vessel and the minute cracks that have occurred in the structures, it is often difficult to see sharply if the vector distribution of the light flux emitted from the light source is widened. .

  Furthermore, when the color tone of the surface of the structure in the reactor pressure vessel is accurately grasped, if the vector distribution of the light flux emitted from the light source is narrow, the direct reflection component increases and the accurate determination may not be possible.

  The present invention has been made to solve these problems.

  Condition monitoring, abnormality monitoring, which has improved identification ability compared with ordinary color cameras by changing the shooting conditions of the monitoring image flexibly according to the spectral characteristics, light polarization characteristics, and time change characteristics of the monitoring target It is an object of the present invention to provide a structure monitoring apparatus and a monitoring method for performing foreign object monitoring and remote monitoring.

  In order to solve the above problems, the present invention supports a light source unit that outputs a plurality of illumination lights having different wavelengths to a monitoring target, a shooting unit that includes a camera for shooting the monitoring target, and the light source unit and the shooting unit. A monitoring unit having a monitoring unit supporting member, an imaging unit control unit that controls the camera and receives electronic information output from the camera, a light source unit driver, the imaging unit control unit, and the light source unit driver A structure monitoring apparatus comprising: a system control computer for controlling the system; a display device for the system control computer; and an operation unit having an input device for the system control computer. To do.

  In the present invention, the monitoring includes a light source unit that outputs irradiation light to the monitoring target, an imaging unit that includes a camera that images the monitoring target, and an imaging unit support member that supports the light source unit and the imaging unit. An arrangement step of arranging a part on a monitoring target, an output step of outputting irradiation light to the monitoring target, a shooting step of shooting light from the monitoring target by the irradiation light, and a display step of displaying the shot image A structure monitoring method characterized by comprising:

  Furthermore, in the present invention, the monitoring includes a light source unit that outputs irradiation light to the monitoring target, an imaging unit that includes a camera that images the monitoring target, and an imaging unit support member that supports the light source unit and the imaging unit. An arrangement step of arranging a portion on a monitoring target, an output step of outputting irradiation light to the monitoring target, a shooting step of shooting while limiting a transmission wavelength of light from the monitoring target by the irradiation light, and the shooting And a display step for displaying an image. A method for monitoring a structure is provided.

  According to the present invention, the ability to discriminate more than observation with a normal color camera has been improved by flexibly changing the shooting conditions of the monitoring image in accordance with the spectral characteristics, light polarization characteristics, and time-varying characteristics of the monitoring object. It is possible to provide a monitoring device and a monitoring method for performing state monitoring, abnormality monitoring, foreign object monitoring, and remote monitoring.

  Embodiments of a structure monitoring apparatus and a monitoring method thereof according to the present invention will be described below with reference to the drawings.

[First Embodiment]
A first embodiment of a structure monitoring apparatus 1 according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1 of the present embodiment shown in FIG. 1 is an apparatus that monitors a monitoring object 30 as a structure.

  The structure monitoring apparatus 1 includes a monitoring unit 2 and an operation unit 3.

  By configuring the structure monitoring device 1 into the monitoring unit 2 and the operation unit 3, the monitoring unit 2 can be structured even if the monitoring object 30, which is a structure, is located away from the operation unit 3. Monitoring can be performed by approaching the monitoring object 30 that is an object.

  The monitoring unit 2 includes a light source unit 4, a photographing unit 5, and a monitoring unit support member 6.

  The light source unit 4 includes a light source 4A.

  The light source 4 </ b> A is a light source that generates illumination light that illuminates the monitoring target 30. The light source 4A can generate continuous light or pulsed light. As the light source 4A, for example, a xenon arc lamp that has a wide emission spectrum from the ultraviolet region to the infrared region and continuously emits light is limited to a required wavelength.

  The photographing unit 5 includes a camera 5A, and the camera 5A includes a lens optical system 5B and a monochrome imaging element 5C.

  The lens optical system 5B converges the light from the monitoring object 30 based on the illumination light, exclusively the reflected light. As the lens optical system 5B, for example, a lens whose aberration is sufficiently corrected in the entire wavelength region to be monitored is used. When a lens optical system with a shallow depth of focus is used as the lens optical system 5B, a motor drive lens that can be focused remotely is used.

  The monochrome imaging element 5C converts the light converged by the lens optical system 5B into electronic information. As the monochrome imaging element 5C, for example, a CCD imaging element, a CMOS imaging element, or an imaging tube is used.

  When it is difficult to correct the chromatic aberration of the lens optical system 5B because the wavelength range to be monitored is wide, for example, an optical axis position correcting drive device (not shown) driven by a piezo element is attached to the monochrome image sensor 5C to correct chromatic aberration. can do.

  The monitoring unit support member 6 holds the light source unit 4 and the imaging unit 5 that constitute the monitoring unit 2. The monitoring unit support member 6 includes a light source unit holding member 6 </ b> A that holds the light source unit 4 and an imaging unit holding member 6 </ b> B that holds the imaging unit 5.

  The operation unit 3 constituting the structure monitoring apparatus 1 includes a photographing unit control unit 7, a system control computer 8, a light source driver 9, a display device 10, and an input device 11.

  The imaging unit control unit 7 is a control unit for the shutter timing and exposure time of the monochrome image pickup device 5C, a receiving unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from the RGB signal and the color video signal, a drive control unit for the lens optical system 5B, and an operation unit for the function of the camera 5A are provided.

  The computer 8 for system control includes a control unit of the photographing unit control unit 7, a receiving unit for the video signal from the photographing unit control unit 7, an image processing function unit, an image recording function unit, and an image output function unit for the received video signal. And a control unit for the light source unit driver 9.

  The light source unit driver 9 includes a control unit for conditions such as the brightness and light emission time of the light source 4 </ b> A according to a command from the system control computer 8.

  The display device 10 includes a display unit for an operation screen of the system control computer 8 and a display unit for a monitoring image of the monitoring target 30 that is a structure.

  The input device 11 includes an operation unit of the system control computer 8.

  Next, the operation of the structure monitoring apparatus 1 will be described.

  In response to a command from the system control computer 8, the structure monitoring apparatus 1 operates the light source driver 9 to cause the light source 4A to emit light.

  The light output from the light source 4A becomes illumination light for the monitoring object 30 that is a structure.

  Since the light wavelength of the light source 4A is limited, it is possible to obtain a monitoring image that emphasizes the property depending on the wavelength of the illumination light according to the monitoring object 30 that is a structure, and is necessary for evaluation of the monitoring result. Effective for shortening the time required.

  Here, the light source unit 4 uses two or more light sources 4A each limited to a different wavelength.

  The light from the monitoring object 30 based on the illumination light output from each light source 4A and the reflected light are converged by the lens optical system 5B and projected onto the monochrome image sensor 5C.

  The monochrome imaging element 5C converts an image projected at an exposure time and a shutter timing according to a command from the photographing unit control unit 7 into electronic information, and sends it to the photographing unit control unit 7 as a video signal.

  The imaging unit control unit 7 is controlled by the system control computer 8 together with the light source unit driver 9. The photographing unit control unit 7 takes in electronic image information from the monochrome image pickup device 5C each time the light sources 4A limited to different wavelengths emit light, and distributes and converts them into, for example, RGB three primary color video signals, thereby calculating a computer for system control. Send to 8.

  The system control computer 8 operates in synchronism with the shutter timing of the monochrome imaging device 5C via the imaging unit control unit 7 and the light emission time of the light source 4A via the light source unit driver 9.

  Then, when different materials are monitored with a normal monochrome camera or color camera, even if the difference that appears in the monitoring image is about bright and dark and difficult to identify, It appears in the monitor image as a difference in color tone, and has the effect of being easily distinguishable.

  Further, since the light emission time of the light source 4A and the monochrome imaging element 5C can be synchronized, there is an effect that the relationship between the monitoring image and the wavelength of the illumination light can be grasped on a one-to-one basis.

For example, when a magnetite powder and a nickel iron oxide powder (NiFe ₂ O ₄ ) are monitored and compared with a normal monochrome camera or a color camera and look the same black, the magnetite powder and the nickel iron oxide powder cannot be distinguished.

  In the structure monitoring apparatus 1 of this embodiment, the wavelength limitation of the light source 4A can be divided into a transmission range of 600 nm to 630 nm and a transmission range of 870 nm to 900 nm. Then, in the transmission range from 600 nm to 630 nm, the magnetite powder and the nickel iron oxide powder look the same black, and in the transmission range from 870 nm to 900 nm, the magnetite powder appears black, whereas the nickel iron oxide powder Since it looks white, there is an effect that magnetite powder and nickel iron oxide powder can be easily distinguished.

  When the monitoring target 30 that is the monitoring target is red rust, monitoring is facilitated by selecting the wavelength from the red to the near infrared region.

  For example, the wavelength limitation of the light source 4A is set to a transmission range of 590 nm to 610 nm, a transmission range of 610 nm to 630 nm, and a transmission range of 630 nm to 650 nm. Then, there is an effect that the monitoring object 30 that can be discriminated only by light and dark with a normal monochrome camera or a color camera can be monitored in detail in three types of wavelength regions.

  In addition, when the monitoring object 30 is a boundary of a metal welded portion or a selection of the type of metal material, monitoring is facilitated by setting the illumination light in the ultraviolet region.

  For example, the wavelength limitation of the light source 4A is set to a transmission range of 200 nm to 230 nm, a transmission range of 230 nm to 270 nm, and a transmission range of 270 nm to 300 nm. As a result, the monitoring object 30 that can be identified only in light and dark by a normal monochrome camera or a color camera can be monitored in detail in three types of wavelength regions.

  In addition, when the object to be detected in the environment is the object to be monitored 30 which is a structure, it can be distinguished even if the wavelength used for the illumination light is one or more and three or less.

  Another method of using the structure monitoring apparatus 1 will be described.

  For example, when an organic substance is irradiated with light having a certain wavelength, fluorescence emission or phosphorescence emission that emits light having a longer wavelength occurs. In order to monitor fluorescence emission or phosphorescence emission with good contrast, it is utilized that fluorescence emission or phosphorescence emission is emitted with a delay from the emission timing of illumination light.

  By controlling the computer 8 for system control, the light source 4A is emitted through the light source unit driver 9 and then turned off. After the light source 4A is turned off through the imaging unit control unit 7, the shutter of the monochrome image sensor 5C is opened. By acquiring a monitoring image, fluorescence emission or phosphorescence emission can be monitored.

Then, when the monitoring object 30 contains an organic substance, it is possible to selectively monitor the adhesion state of a substance such as an organic substance having a high fluorescence emission or phosphorescence emission efficiency, and to confirm the information on the abnormality or the presence of a foreign substance.

  In addition, monitoring can be performed by arranging a plurality of structure monitoring devices 1 at substantially constant intervals.

  Since images with different parallaxes are obtained simultaneously, a stereoscopic image can be obtained as a monitoring result.

  Then, the scattering angle dependence of the reflection spectrum from the monitoring object 30 based on the illumination light can be measured. The monitoring result is different from a normal stereo image, and the abnormality can be easily monitored due to the dependence of the monitoring target 30 on the spectral scattering angle.

  In addition, the structure monitoring apparatus 1 can acquire an image in which the wavelength of the illumination light is limited, and the reflection spectrum of the monitoring object 30 varies depending on the parallax. Therefore, a plurality of structures obtained by the plurality of structure monitoring apparatuses 1 can be obtained. When each image is monitored, it is possible to grasp the detailed surface condition and composition distribution of the monitoring object 30 that is a structure as compared with the case where the structure monitoring device 1 is used alone.

  Furthermore, an image of a scatterer (not shown) whose reflection spectrum has been acquired in advance prior to monitoring of the monitoring object 30 can be acquired. Then, the sensitivity correction of the monitoring image can be performed.

  A standard target such as a scatterer or a white scatterer is installed in the monitoring range within the monitoring range of the structure monitoring apparatus 1, and a plurality of images subjected to wavelength limitations at the time of photographing using image information from the standard target In this way, it is possible to collect monitoring images with little variation in monitoring conditions for each photographing.

  The standard target may be a broadband white scattering reflector such as a sintered metal oxide powder such as alumina.

  When performing sensitivity correction between a plurality of monitoring images that have been subjected to wavelength limitations at the time of shooting, there is an effect that sensitivity correction can be easily performed without comparing the reflection spectrum of the standard target in each monitoring image.

  The sensitivity area of the CCD image sensor or CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm.

  Then, as the scatterer, for example, a white scatterer that can obtain a constant reflectance in a sensitivity region of the monochrome imaging element 5C, that is, in a wavelength range of about 200 nm to 1100 nm can be used.

  Broadband white scatterers include, for example, magnesium oxide powder, silicon oxide powder, titanium oxide powder, sodium chloride powder, calcium fluoride powder, magnesium fluoride powder, and other powders of transparent substances in the wavelength range of 200 nm to 1100 nm. is there.

[Second Embodiment]
A second embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  A structure monitoring apparatus 1A shown in the present embodiment is an apparatus that monitors a monitoring object 30 as a structure.

  In this structure monitoring apparatus 1A, the same components as those in the structure monitoring apparatus 1 of the first embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1A shown in FIG. 2 includes a photographing unit 5, and the photographing unit 5 includes a lens optical system 5B. The lens optical system 5B is located at an internal aperture position. A liquid crystal type spatial filter 5D that two-dimensionally controls an aperture of light that is held and can pass through the lens optical system 5B is provided.

  The monitoring unit 3 constituting the structure monitoring apparatus 1A includes a photographing unit control unit 7A.

  The photographing unit control unit 7A includes a shutter timing and exposure time control unit for the monochrome image pickup device 5C, a reception unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from the RGB signal and the color video signal, a control unit for driving the lens optical system 5B, an operation unit for the function of the camera 5A, and a liquid crystal spatial filter And a 5D control unit.

  Directly reflected light from the monitoring object 30 based on the illumination light passes through the center in the aperture position portion of the lens optical system 5B, but the liquid crystal type spatial filter 5D can be controlled so that only the central portion is opaque.

  Since the liquid crystal type spatial filter 5D that masks an arbitrary two-dimensional shape so as not to allow light to pass through at the stop position portion of the lens optical system 5B of the photographing unit 5 is provided, the illumination light is directly corrected by the monitoring object 30. The mask portion can be adjusted so that the reflected component does not pass through the lens optical system 5B.

  If it does so, the halation by direct specular reflection light will be suppressed and the image of the abnormal site | part of the monitoring target 30 or a foreign material can be observed with sufficient contrast.

  For example, this effect is remarkable when observing the surface of a large plane or a phase structure.

[Third Embodiment]
A third embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1B shown in the present embodiment is an apparatus that monitors a monitoring object 30 as a structure.

  In this structure monitoring apparatus 1B, the same components as those in the structure monitoring apparatus 1 of the first embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1B shown in FIG. 3 includes a waterproof case 12 that houses the light source unit 4 and the imaging unit 5 in a watertight manner.

  The waterproof case 12 is held by the monitoring unit support member 6, for example.

  When the monitoring unit 2 including the waterproof case 12 is used, the electronic components of the light source unit 4 and the imaging unit 5 are prevented from being immersed in water, and the monitoring object 30 existing in the water is monitored by the structure monitoring device 1B. Can be monitored.

  For example, in a radiation field such as in a nuclear reactor, the monitoring object 30 is often installed in water for the purpose of blocking radiation. Under such a radiation environment, the structure monitoring apparatus 1B of the present embodiment is used. If so, it can be monitored underwater. Moreover, since the monitoring part 2 can be used underwater and by remote operation, the exposure dose at the time of handling can be reduced.

[Fourth Embodiment]
A fourth embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1C shown in the present embodiment is an apparatus that monitors the monitoring object 30 as a structure.

  In this structure monitoring apparatus 1C, the same components as those in the structure monitoring apparatus 1 of the first embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 configuring the structure monitoring apparatus 1C shown in FIG. 4 includes a light source unit 4 that can limit the transmission wavelength of illumination light to the monitoring target 30 that is a structure. A light source 104A and a wavelength tunable bandpass filter 4B are provided.

  The light source 104 </ b> A is a continuous light emission white light source that generates illumination light that illuminates the monitoring target 30. As the light source 104A, for example, a xenon arc lamp that emits light continuously with a wide emission spectrum from ultraviolet to infrared is used.

  The wavelength tunable bandpass filter 4B is held between the light source 104A and the monitoring target 30 that is a structure, and allows the wavelength of illumination light transmitted from the light source 104A to the monitoring target 30 that is a structure to be in an arbitrary wavelength region. Limit to. The wavelength tunable bandpass filter 4B includes, for example, a continuous wavelength tunable bandpass filter that uses a photoacoustic effect, a continuous wavelength tunable bandpass filter that uses a liquid crystal method, and a wavelength tunable band that uses a method of switching a required wavelength fixed bandpass filter onto an optical path. It is a path filter.

  Since the wavelength tunable bandpass filter using the liquid crystal method can continuously change the observation wavelength, it is possible to obtain a monitoring result that emphasizes the property depending on the monitoring object 30.

  A continuous wavelength tunable bandpass filter by a method of switching the required wavelength fixed bandpass filter shown in FIGS. 11A and 11B on the optical path includes a plate-like holder 21 having a plurality of openings, The fixed wavelength band-pass filter 22 held in each of the plurality of openings and the drive unit 23 that drives the holder 21 and switches a certain fixed wavelength band-pass filter to the light transmission position. According to this method, a wavelength tunable bandpass filter can be configured by a bandpass filter having a fixed wavelength.

  The sensitivity area of the CCD image sensor or CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm. Then, the wavelength that can be selected by the wavelength tunable bandpass filter 4B can be limited to a range of 200 nm to 1100 nm.

  Further, the optical bandwidth that can be transmitted by the wavelength tunable bandpass filter 4B is not limited to the case where it is better to make the optical bandwidth finer by the monitoring object 30, and from the ultraviolet region to the infrared region, for example, the ultraviolet region, visible region, There are cases where it is better to observe in three regions of the infrared region.

  However, if the optical bandwidth is smaller than 1 nm, it is not desirable from the viewpoint of ensuring illuminance.

  Further, the sensitivity region of the CCD image sensor or the CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm, so that the entire wavelength band can be covered if the optical bandwidth is larger than 300 nm.

  Then, the wavelength tunable bandpass filter 4B can limit the bandwidth of transmitted light to 1 nm or more and 300 nm or less.

  The operation unit 3 constituting the structure monitoring apparatus 1C includes a light source driver 9A.

  The light source driver 9A includes a control unit for conditions such as brightness and light emission time of the light source 104A and a control unit for the transmission wavelength of the wavelength tunable bandpass filter 4B according to a command from the system control computer 8. The transmission wavelength control unit of the wavelength tunable bandpass filter 4B can be configured by a separate and independent device.

  Next, the operation of the structure monitoring apparatus 1C will be described.

  The structure monitoring apparatus 1 </ b> C operates the light source driver 9 </ b> A in response to a command from the system control computer 8 to limit the wavelength of light transmitted through the wavelength tunable bandpass filter 4 </ b> B.

  In response to a command from the system control computer 8, the structure monitoring apparatus 1C operates the light source driver 9A to cause the light source 104A to emit light.

  The light output from the light source 104A is limited in wavelength by the wavelength tunable bandpass filter 4B and becomes illumination light for the monitoring target 30.

  For example, the tunable bandpass filter 4B is sequentially switched to three different types of filters, and the monitoring target 30 is sequentially illuminated with the three types of wavelengths of illuminating light.

  The light from the monitoring object 30 based on the illumination light and the reflected light are converged by the lens optical system 5B and projected onto the monochrome image pickup device 5C.

  The monochrome imaging element 5C converts an image projected at an exposure time and a shutter timing according to a command from the photographing unit control unit 7 into electronic information, and sends it to the photographing unit control unit 7 as a video signal.

  The imaging unit control unit 7 is controlled by the system control computer 8 together with the light source unit driver 9A.

  Whenever the wavelength of the illumination light is limited by the wavelength tunable bandpass filter 4B, the imaging unit control unit 7 takes in the image electronic information from the monochrome image pickup device 5C, and distributes and converts it into RGB three primary color video signals for system control. To the computer 8.

  The system control computer 8 sends the shutter timing of the monochrome image pickup device 5C via the photographing unit control unit 7, and the light emission time of the light source 104A and the filter of the wavelength variable bandpass filter 4B via the light source driver 9A. It operates in synchronization with the switching timing.

  Then, similarly to the structure monitoring apparatus 1 of the first embodiment, when different substances are monitored with a normal monochrome camera or color camera, even if the difference appearing in the monitoring image is bright and dark and difficult to identify. When monitoring is performed with light of any three types of wavelength regions, it appears on the monitoring image as a difference in color tone and can be easily identified.

  The structure monitoring apparatus 1C according to the present embodiment uses the wavelength tunable bandpass filter 4B, so that the monitoring unit 2 and the operation unit 3 can be arranged at a distance from each other without approaching the monitoring unit 2. The wavelength of illumination light can be limited.

  Further, when monitoring the abnormality of the structure and the presence of foreign matter, the wavelength of the tunable bandpass filter 4B is switched according to the monitoring object 30 that is the structure, and the wavelength of the illumination light that makes monitoring easy is searched. it can.

[Fifth Embodiment]
5th Embodiment of the monitoring apparatus of the structure which concerns on this invention is described with reference to FIG.

  The structure monitoring apparatus 1D shown in the present embodiment is an apparatus that monitors the monitoring object 30 as a structure.

  In this structure monitoring apparatus 1D, the same components as those in the structure monitoring apparatus 1C of the fourth embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1D shown in FIG. 5 includes a light source unit 4, and the light source unit 4 includes a collimator 4C that converts illumination light into substantially parallel rays.

  The monitoring unit 2 constituting the structure monitoring apparatus 1D includes an imaging unit 5. The imaging unit 5 limits the wavelength of light that enters the lens optical system 5B from the monitoring target 30 to an arbitrary wavelength range. A wavelength tunable bandpass filter 5E is provided.

  The wavelength variable bandpass filter 5E is a wavelength variable bandpass filter similar to the wavelength variable bandpass filter 4B.

  The operation unit 3 constituting the structure monitoring apparatus 1D includes a photographing unit control unit 7B.

  The photographing unit control unit 7B includes a control unit for the shutter timing and exposure time of the monochrome image pickup device 5C, a receiving unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from among RGB signals and color video signals, a control unit for driving the lens optical system 5B, an operation unit for functions of the camera 5A, and a wavelength variable bandpass And a control unit for the transmission wavelength of the filter 5E.

  Next, the operation of the structure monitoring apparatus 1D will be described.

  The imaging unit control unit 7B of the structure monitoring apparatus 1D is controlled by the system control computer 8 together with the light source unit driver 9A.

  The computer 8 for system control performs filter switching of the wavelength tunable bandpass filter 5E via the photographing unit control unit 7B, and performs filter switching of the wavelength tunable bandpass filter 4B via the light source unit driver 9A. .

  The transmission wavelength of the wavelength tunable bandpass filter 5E is selected to be longer than the transmission wavelength of the wavelength tunable bandpass filter 4B. Then, fluorescence emission or phosphorescence emission shifted to a long wavelength that is secondarily emitted from the monitoring object 30 that is a structure based on the illumination light can be observed.

  For example, when an organic substance is irradiated with light having a certain wavelength, fluorescence emission or phosphorescence emission that emits light having a longer wavelength occurs. Then, when the monitoring target 30 contains an organic substance, there is an effect that the adhesion state of a substance such as an organic substance having high fluorescence emission or phosphorescence emission efficiency can be selectively monitored.

  For example, if fluorescence emission or phosphorescence emission can be observed in a place where only inorganic substances normally exist, such as in a nuclear reactor, foreign substances can be found quickly.

  Further, by selecting one to three appropriate wavelengths according to the spectrum of fluorescence emission or phosphorescence emission, there is an effect of further improving the discrimination of the substance of the monitoring object 30.

  The wavelength tunable bandpass filter 4B has the same effect even when a fixed wavelength bandpass filter is used.

[Sixth Embodiment]
6th Embodiment of the monitoring apparatus of the structure which concerns on this invention is described with reference to FIG. 4 and FIG.

  The structure monitoring devices 1 </ b> C and 1 </ b> D shown in the present embodiment are devices that monitor a monitoring object 30 as a structure.

  In the structure monitoring devices 1C and 1D, descriptions overlapping with the structure monitoring devices 1C and 1D of the fourth embodiment or the fifth embodiment are omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1C includes a light source unit 4. The light source unit 4 includes a light source side polarizing filter (not shown) that polarizes light before or after the wavelength is limited. Yes.

  The monitoring unit 2 constituting the structure monitoring device 1C includes an imaging unit 5. The imaging unit 5 is an imaging-side polarizing filter (not shown) that polarizes light incident on the monochrome imaging device 5C from the monitoring object 30. It has.

  The structure monitoring apparatus 1 </ b> C configured as described above selects and monitors the directly reflected light from the monitoring object 30 by adjusting the polarization relationship between the light source side polarizing filter and the photographing side polarizing filter. In addition, it is possible to select and monitor scattered reflected light.

  In particular, in a place where the radiation intensity is strong and the photographing position and the light source position cannot be freely changed, such as monitoring of the reactor internal structure, it is effective as a means for reducing halation due to the direct reflected light from the monitoring object 30. .

  Further, in the structure monitoring apparatus 1D of the fifth embodiment, when the emission intensity of the fluorescence emission or the phosphorescence emission is small, the separation of the fluorescence emission or the phosphorescence emission from the wavelength tunable bandpass filter 5E from the reflected light is insufficient. Therefore, it may be difficult to monitor fluorescence emission or phosphorescence emission with good contrast.

  In the structure monitoring device 1C of the present embodiment, the reflected light is adjusted by adjusting the light source side polarization filter and the imaging side polarization filter so that the polarization component of fluorescence emission or phosphorescence emission orthogonal to the illumination light can be observed. Can be prevented from entering the monochrome image element 5C.

  Since fluorescence emission and phosphorescence emission do not have polarization characteristics, there is an effect that the irradiation light and fluorescence emission or phosphorescence emission can be clearly distinguished and monitored as compared with a method not using polarization characteristics.

  The monitoring unit 2 constituting the structure monitoring device 1C includes an imaging unit 5, and the imaging unit 5 includes a rotation support mechanism (not illustrated) that rotatably supports an imaging-side polarization filter (not illustrated). it can.

  The operation unit 3 constituting the structure monitoring apparatus 1 </ b> C includes a photographing unit control unit 7.

  The imaging unit control unit 7 is a control unit for the shutter timing and exposure time of the monochrome image pickup device 5C, a receiving unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from the RGB signal and the color video signal, a control unit for driving the lens optical system 5B, an operation unit for the function of the camera 5A, and a photographing side polarization filter And a control unit of the rotation support mechanism.

  In the structure monitoring device 1C of the present embodiment, the polarization of the photographing side polarizing filter is observed while viewing the monitoring image without collecting the structure monitoring device 1C by a mechanism that rotates the photographing side polarizing filter. Because adjustments can be made, monitoring can be performed quickly.

  In particular, in a radiation field such as in a nuclear reactor, the structure monitoring apparatus 1C is exposed to radiation. Therefore, if the monitoring can be performed quickly, there is an effect of reducing the exposure dose.

  The same effect can be obtained when the present embodiment is applied to the structure monitoring apparatus 1D.

[Seventh Embodiment]
A seventh embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1C shown in the present embodiment is an apparatus that monitors the monitoring object 30 as a structure.

  In this structure monitoring apparatus 1C, the description overlapping with the structure monitoring apparatus 1C of the fourth embodiment is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1C includes a light source unit 4, and the light source unit 4 includes a diffusion plate (not shown) that diffuses illumination light.

  When there is a step in the monitoring object 30, a shadow is formed by the illumination light.

  The structure monitoring apparatus 1 </ b> C according to the present embodiment includes a diffusion plate, so that the light beam vector of the illumination light can be made random. Then, since the shadow by illumination light can be made thin, the monitoring image with a poor shadow can be obtained.

  When estimating the composition of the surface of the monitoring object 30 from the monitoring image obtained with the illumination light limited at different wavelengths, there is an effect that the distribution of components can be accurately grasped.

[Eighth Embodiment]
An eighth embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1E shown in the present embodiment is an apparatus that monitors a monitoring object 30 as a structure.

  In this structure monitoring apparatus 1E, the same components as those in the structure monitoring apparatus 1 of the first embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1E shown in FIG. 6 includes a light source unit 4 that can select the emission wavelength of illumination light to the monitoring target 30 that is a structure. A light source 204A is provided.

  The light source 204A uses, as a light source, a laser oscillator array in which a plurality of laser oscillators each generating illumination light having different wavelengths are collected on the monitoring target 30.

  The operation unit 3 constituting the structure monitoring apparatus 1E includes a light source driver 9B.

  The light source driver 9B selects one to three types of laser oscillators each having a different wavelength from the light source 204A according to a command from the system control computer 8, sequentially emits light, and controls conditions such as brightness and light emission time. A control unit is provided.

  Next, the operation of the structure monitoring apparatus 1E will be described.

  The structure monitoring apparatus 1C of the fourth embodiment uses the light source 104A and the wavelength tunable bandpass filter 4B to limit the wavelength of the illumination light, whereas the structure monitoring apparatus 1E of the present embodiment. Uses a plurality of laser oscillators having different wavelengths as the light source, thereby obtaining the same effect as that of the fourth embodiment without using the wavelength tunable bandpass filter 4B.

  Furthermore, the structure monitoring apparatus 1C of the fourth embodiment switches the wavelength variable bandpass filter 4B, and the structure monitoring apparatus 1E of the present embodiment switches the light source 204A to a laser oscillator having a different wavelength. Since the time required for switching the laser oscillator can be shortened, the time required for monitoring can be shortened.

  The light source 204A can use a wavelength tunable laser (not shown) or a plurality of LEDs (not shown) that emit light having different wavelengths. The same effect can be obtained by making the wavelength tunable laser and the LED emit light sequentially at 1 to 3 different wavelengths.

  Semiconductor light sources such as semiconductor lasers and LEDs emit light at many wavelengths, and are small in size, so that there is an effect that the structure monitoring device 1E can be downsized.

  In addition, the semiconductor light source has a quick response to blinking light, and has an effect of capturing moving images and still images having different wavelengths of illumination light.

  Furthermore, since the semiconductor light source has high electro-optical conversion efficiency and a thin wire connected to the semiconductor light source can be used, it is effective in improving the wearability of the structure monitoring apparatus 1E.

  Also, the light from the semiconductor light source has good linearity, and it is easy to propagate the light into the optical fiber. The semiconductor light source is placed away from the camera 5A, and the illumination light is directed to a very narrow part. There is an effect to send.

  Furthermore, in the case of monitoring in a radiation field such as in a nuclear reactor, the light source 204A can be separated from the radiation field.

  As the light source 204A, it is possible to use a plasma light source or a light source capable of selecting and outputting only a specific wavelength by converting the wavelength of the light.

  The structure monitoring apparatus 1E of the present embodiment can be configured so that the bandwidth of light emitted from the light source 204A is 1 nm or more and 300 nm or less.

  The light bandwidth of the light source 204 </ b> A is not limited from the ultraviolet region to the infrared region, for example, in the three regions of the ultraviolet region, the visible region, and the infrared region. Sometimes it is better to observe.

  However, if the optical bandwidth is smaller than 1 nm, it is not desirable from the viewpoint of ensuring illuminance.

  Further, the sensitivity region of the CCD image sensor or the CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm, so that the entire wavelength band can be covered if the optical bandwidth is larger than 300 nm.

  Then, the optical bandwidth of the light source 204A can be limited to 1 nm or more and 300 nm or less.

[Ninth Embodiment]
A ninth embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1F shown in the present embodiment is an apparatus that monitors the monitoring object 30 as a structure.

  In this structure monitoring apparatus 1F, the same components as those in the structure monitoring apparatus 1E of the eighth embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1F shown in FIG. 7 includes an imaging unit 5, which captures light incident on the lens optical system 5B from the monitoring object 30 that is a structure. A wavelength tunable bandpass filter 5E that limits the wavelength to be transmitted to an arbitrary wavelength region is provided.

  The wavelength tunable bandpass filter 5E includes, for example, a continuous wavelength tunable bandpass filter that uses a photoacoustic effect, a continuous wavelength tunable bandpass filter that uses a liquid crystal method, and a wavelength tunable band that uses a method that switches a required wavelength fixed bandpass filter onto an optical path. It is a path filter.

  Since the wavelength tunable bandpass filter using the liquid crystal method can continuously change the observation wavelength, it is possible to obtain a monitoring result that emphasizes the property depending on the monitoring object 30.

  A continuous wavelength tunable bandpass filter by a method of switching the required wavelength fixed bandpass filter shown in FIGS. 11A and 11B on the optical path includes a plate-like holder 21 having a plurality of openings, The fixed wavelength band-pass filter 22 held in each of the plurality of openings and the drive unit 23 that drives the holder 21 and switches a certain fixed wavelength band-pass filter to the light transmission position. According to this method, a wavelength tunable bandpass filter can be configured by a bandpass filter having a fixed wavelength.

  The sensitivity area of the CCD image sensor or CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm. Then, the wavelength that can be selected by the wavelength tunable bandpass filter 5E can be limited to a range of 200 nm to 1100 nm.

  Further, the optical bandwidth that can be transmitted by the wavelength tunable bandpass filter 5E is not limited to the case where it is better to make the optical bandwidth finer by the monitoring object 30, and from the ultraviolet region to the infrared region, for example, the ultraviolet region, the visible region, There are cases where it is better to observe in three regions of the infrared region.

  However, if the optical bandwidth is smaller than 1 nm, it is not desirable from the viewpoint of ensuring illuminance.

  Further, the sensitivity region of the CCD image sensor or the CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm, so that the entire wavelength band can be covered if the optical bandwidth is larger than 300 nm.

  Then, the wavelength tunable bandpass filter 5E can limit the bandwidth of transmitted light to 1 nm or more and 300 nm or less.

  The operation unit 3 constituting the structure monitoring apparatus 1F includes a photographing unit control unit 7B.

  The photographing unit control unit 7B includes a control unit for the shutter timing and exposure time of the monochrome image pickup device 5C, a receiving unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from among RGB signals and color video signals, a control unit for driving the lens optical system 5B, an operation unit for functions of the camera 5A, and a wavelength variable bandpass And a control unit for the transmission wavelength of the filter 5E.

  Next, the operation of the structure monitoring apparatus 1F will be described.

  The imaging unit control unit 7B of the structure monitoring device 1F is controlled by the system control computer 8 together with the light source unit driver 9B.

  The system control computer 8 performs filter switching of the wavelength tunable bandpass filter 5E via the imaging unit control unit 7B.

  The transmission wavelength of the wavelength tunable bandpass filter 5E is selected to be longer than the transmission wavelength of the wavelength tunable bandpass filter 4B. Then, fluorescence emission or phosphorescence emission shifted to a long wavelength that is secondarily emitted from the monitoring object 30 based on the illumination light can be observed.

  While the structure monitoring apparatus 1D of the fifth embodiment uses the light source 104A and the wavelength variable bandpass filter 4B to limit the wavelength of the illumination light, the structure monitoring apparatus 1F of the present embodiment By using the light source 204A having a plurality of laser oscillators having different wavelengths as the light source, the same effect as that of the fifth embodiment can be obtained without using the wavelength tunable bandpass filter 4B and the collimator 4C.

  Compared with the structure monitoring apparatus 1D of the fifth embodiment, the structure monitoring apparatus 1F of the present embodiment can simplify the configuration of the light source unit 204A, and thus the structure monitoring apparatus 1F can ensure reliability. .

[Tenth embodiment]
A tenth embodiment of a structure monitoring apparatus according to the present invention will be described with reference to FIGS.

  The structure monitoring devices 1E and 1F shown in the present embodiment are devices that monitor the monitoring object 30 as a structure.

  In the structure monitoring devices 1E and 1F, the same components as those in the structure monitoring devices 1E and 1F of the eighth embodiment or the ninth embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring device 1E includes an imaging unit 5. The imaging unit 5 is an imaging-side polarization filter (not shown) that polarizes light incident on the monochrome imaging element 5C from the monitoring object 30. It has.

  The structure monitoring apparatus 1E configured as described above can select and monitor the directly reflected light from the monitoring object 30 by adjusting the polarization relationship between the light source 204A and the imaging-side polarization filter. It is possible to select and monitor the scattered reflected light.

  The structure monitoring devices 1C and 1D of the sixth embodiment use the light source side polarizing filter to polarize the illumination light, whereas the structure monitoring device 1E of the present embodiment has a plurality of different wavelengths. By using the light source 204A having the laser oscillator as the light source, the same effect as that of the sixth embodiment can be obtained without using the light source side polarizing filter.

  Compared to the structure monitoring devices 1C and 1D of the sixth embodiment, the structure monitoring device 1F of the present embodiment can simplify the configuration of the light source unit 204A, and thus the structure monitoring device 1F has high reliability. It can be secured.

  The monitoring unit 2 constituting the structure monitoring apparatus 1E includes an imaging unit 5, and the imaging unit 5 includes a rotation support mechanism (not illustrated) that rotatably supports an imaging-side polarizing filter (not illustrated). Yes.

  The operation unit 3 constituting the structure monitoring apparatus 1 </ b> C includes a photographing unit control unit 7.

  The imaging unit control unit 7 is a control unit for the shutter timing and exposure time of the monochrome image pickup device 5C, a receiving unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from the RGB signal and the color video signal, a control unit for driving the lens optical system 5B, an operation unit for the function of the camera 5A, and a photographing side polarization filter And a control unit of the rotation support mechanism.

  With the structure monitoring apparatus 1E of the present embodiment, the polarization can be adjusted remotely while looking at the monitoring image without collecting the structure monitoring apparatus 1E at hand by a mechanism that rotates the photographing side polarization filter. Therefore, monitoring can be performed quickly.

  In particular, in a radiation field such as in a nuclear reactor, the structure monitoring apparatus 1E is exposed to radiation, so if it can be monitored quickly, there is an effect of reducing the exposure dose.

  Similar effects can be obtained when the present embodiment is applied to the structure monitoring apparatus 1F.

[Eleventh embodiment]
An eleventh embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1G shown in the present embodiment is an apparatus that monitors the in-reactor structure 31 as a structure. The reactor is filled with water to block radiation, and the monitoring unit 2 is used in water.

  In this structure monitoring apparatus 1G, the same components as those in the structure monitoring apparatus 1B of the third embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1G includes a light source unit 4, and the light source unit 4 includes a light source 304A. The light source 304A generates a light source that illuminates the reactor internal structure 31. It is.

  The light source 304 </ b> A is a white light source that generates illumination light that illuminates the reactor internal structure 31. For example, a xenon flash lamp is used as the light source 304A. A xenon flash lamp is a pulse light source having a broad spectrum from the ultraviolet region to the infrared region.

  The monitoring unit 2 constituting the structure monitoring apparatus 1E includes a photographing unit 5. The photographing unit 5 includes a camera 5A. The camera 5A includes a lens optical system 5B, a monochrome imaging element 5C, and a distribution optical device. An element 5F and a wavelength tunable bandpass filter 5G are provided.

  The distribution optical element 5F distributes the light converged by the lens optical system 5B in two or more directions. The distribution optical element 5F distributes light in three directions by combining, for example, a semi-transmission mirror or a semi-transmission prism.

  The wavelength variable bandpass filter 5G limits the wavelength of the light distributed by the distribution optical element 5F to an arbitrary wavelength region.

  The wavelength tunable bandpass filter 5G is, for example, a wavelength tunable band by a continuous wavelength tunable bandpass filter using a photoacoustic effect, a continuous wavelength tunable bandpass filter by a liquid crystal method, a method of switching a required wavelength fixed bandpass filter on an optical path, or the like. It is a path filter.

  Since the wavelength tunable bandpass filter using the liquid crystal method can continuously change the observation wavelength, it is possible to obtain a monitoring result that emphasizes the properties depending on the reactor internal structure 31.

  A continuous wavelength tunable bandpass filter by a method of switching the required wavelength fixed bandpass filter shown in FIGS. 11A and 11B on the optical path includes a plate-like holder 21 having a plurality of openings, The fixed wavelength band-pass filter 22 held in each of the plurality of openings and the drive unit 23 that drives the holder 21 and switches a certain fixed wavelength band-pass filter to the light transmission position. According to this method, a wavelength tunable bandpass filter can be configured by a bandpass filter having a fixed wavelength. Further, when the wavelength range of light to be monitored by the reactor internal structure 31 is wide and it is difficult to correct the chromatic aberration of the lens optical system 5B, each of the fixed wavelength bandpass filters 22 held in the tunable bandpass filter 20 is provided. Chromatic aberration can be corrected by designing the thickness appropriately.

  The sensitivity area of the CCD image sensor or CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm. Then, the wavelength that can be selected by the wavelength tunable bandpass filter 5G can be limited to a range of 200 nm to 1100 nm.

  Further, the optical bandwidth that can be transmitted through the wavelength tunable bandpass filter 5G is not limited to the case where it is better to make the optical bandwidth finer by the monitoring object 30, and from the ultraviolet region to the infrared region, for example, the ultraviolet region, the visible region, There are cases where it is better to observe in three regions of the infrared region.

  However, if the optical bandwidth is smaller than 1 nm, it is not desirable from the viewpoint of ensuring illuminance.

  Further, the sensitivity region of the CCD image sensor or the CMOS image sensor used for the monochrome image sensor 5C is usually in the range of 200 nm to 1100 nm, so that the entire wavelength band can be covered if the optical bandwidth is larger than 300 nm.

  Then, the wavelength tunable bandpass filter 5G can limit the bandwidth of transmitted light to 1 nm or more and 300 nm or less.

  The operation unit 3 constituting the structure monitoring apparatus 1G includes a photographing unit control unit 7C and a light source driver 9C.

  The imaging unit control unit 7C includes a control unit for the shutter timing and exposure time of the monochrome image pickup device 5C, a receiving unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from among RGB signals and color video signals, a control unit for driving the lens optical system 5B, an operation unit for functions of the camera 5A, and a wavelength variable bandpass And a control unit for the transmission wavelength of the filter 5G.

  The light source driver 9 </ b> C includes a control unit for conditions such as the brightness and light emission time of the light source 304 </ b> A according to a command from the system control computer 8.

  Next, the operation of the structure monitoring apparatus 1G will be described.

  The structure monitoring apparatus 1G operates the imaging unit control unit 7C in response to a command from the system control computer 8 to limit the wavelength of light transmitted through the wavelength tunable bandpass filter 5G.

  In response to a command from the system control computer 8, the structure monitoring apparatus 1G operates the light source driver 9C to cause the light source 304A to emit light.

  The light output from the light source 304A becomes illumination light for the reactor internal structure 31, which is a structure.

  The light from the in-reactor structure 31, which is a structure based on the illumination light output from the light source 304A, and the reflected light are converged by the lens optical system 5B and distributed in two or more directions by the distribution optical element 5F. Is done.

  The wavelength of the distributed light is limited by the wavelength variable bandpass filter 5G and projected onto the monochrome image pickup device 5C.

  Each distributed light is limited to a different wavelength by, for example, the wavelength tunable bandpass filter 5G. That is, the wavelength of the image of the in-reactor structure 31 that is a structure projected onto the monochrome imaging element 5C is limited for each distributed light.

  The monochrome image pickup device 5C converts an image projected at an exposure time and a shutter timing according to a command from the photographing unit control unit 7C into electronic information, and sends it to the photographing unit control unit 7C as a video signal.

  The imaging unit control unit 7C is controlled by the system control computer 8 together with the light source unit driver 9C.

  The photographing unit control unit 7C takes image electronic information from the monochrome image pickup device 5C, distributes and converts it into RGB three primary color video signals, and sends them to the system control computer 8.

  The computer 8 for system control operates in synchronization with the exposure time and shutter timing of the monochrome image sensor 5C via the photographing unit control unit 7C, and the light emission time and light emission timing of the light source 304A via the light source driver 9C. is doing.

  Since the light source 304A of the light source unit 4 of the structure monitoring apparatus 1G of the present embodiment uses a pulse light source, the relative positional relationship between the reactor internal structure 31 and the monitoring unit 2 changes. In addition, it is possible to obtain image information without flickering, or to suppress the influence of an external light source other than light emission from the light source 304A, thereby enabling monitoring with little flickering.

  In a radiation field such as in a nuclear reactor, since the reactor internal structure 31 exists exclusively in water for the purpose of blocking radiation, by using the monitoring unit 2 provided with the waterproof case 12, the light source unit 4 and It is possible to prevent the electronic components and the like with the imaging unit 5 from being immersed in water, and to monitor the in-reactor structure 31 that is a structure existing in the water.

  Moreover, the structure monitoring apparatus 1G of the present embodiment can be used remotely in a radiation environment such as in a nuclear reactor. Moreover, since the monitoring part 2 can be used in water, the exposure dose at the time of handling can be reduced.

  On the surface of the reactor internal structure 31, a part of a corrosion product generated by corrosion of a metal material such as a pipe is attached as a metal oxide, and may appear red rust color. When observing this surface, if an ordinary monochrome camera or color camera is used, the in-reactor structure 31 can be monitored only in a single color of light and dark. In this case, the wavelength variable bandpass filter 5G makes it easy to monitor by selecting the wavelength from red to the near infrared region.

  For example, for the light distributed by the distribution optical element 5F, the wavelength limitation of the wavelength tunable bandpass filter 5G is set to a transmission range of 590 nm to 610 nm, a transmission range of 610 nm to 630 nm, and a transmission range of 630 nm to 650 nm. Then, there is an effect that a monitoring target that can be identified only in light and dark by a normal monochrome camera or a color camera can be divided into three types of wavelength regions and monitored in detail.

[Twelfth embodiment]
A twelfth embodiment of a structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1H shown in the present embodiment is an apparatus that monitors the in-reactor structure 31 as a structure. The reactor is filled with water to block radiation, and the monitoring unit 2 is used in water.

  In this structure monitoring apparatus 1H, the same components as those in the structure monitoring apparatus 1G of the eleventh embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1H shown in FIG. 9 includes a light source unit 4, and the light source unit 4 includes a collimator 4C that converts the illumination light into a substantially parallel light beam.

  According to the structure monitoring apparatus 1H of the present embodiment, since regular reflection light from the reactor internal structure 31 incident on the lens optical system 5B can be reduced, there is an effect of suppressing halation.

  Further, when observing an edge portion or a crack of the reactor internal structure 31, the boundary image such as the edge portion or the crack can be monitored with good contrast because it is illuminated with substantially parallel light rays.

[Thirteenth embodiment]
A thirteenth embodiment of the structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1I shown in the present embodiment is an apparatus that monitors the in-reactor structure 31 as a structure. The reactor is filled with water to block radiation, and the monitoring unit 2 is used in water.

  In this structure monitoring apparatus 1I, the same components as those in the structure monitoring apparatuses 1G and 1H of the eleventh embodiment and the twelfth embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1I shown in FIG. 10 includes a light source unit 4. The light source unit 4 rotates the polarizing filter 4D that polarizes the illumination light of the light source 304A and the polarizing filter 4D. A light source side polarization filter rotation support mechanism (not shown) that supports the light source.

  The monitoring unit 2 constituting the structure monitoring device 1I includes an imaging unit 5. The imaging unit 5 includes a polarizing filter 5H that polarizes light from the in-reactor structure 31 based on illumination light, and a polarizing filter 5H. And a light source side polarization filter rotation support mechanism (not shown).

  As the polarizing filters 4D and 5G, linearly polarized light, circularly polarized light, and elliptically polarized light are used.

  The operation unit 3 constituting the structure monitoring apparatus 1I includes a photographing unit control unit 7D and a light source unit driver 9D.

  The photographing unit control unit 7D is a control unit for the shutter timing and exposure time of the monochrome image pickup device 5C, a receiving unit for image electronic information output from the monochrome image pickup device 5C, and the received image electronic information for a normal color camera. An output unit that converts and outputs at least one video signal selected from among RGB signals and color video signals, a control unit for driving the lens optical system 5B, an operation unit for functions of the camera 5A, and a wavelength variable bandpass A control unit for the transmission wavelength of the filter 5G and a control unit for the photographing side polarization filter rotation support mechanism are provided.

  The light source unit driver 9D includes a control unit for conditions such as the brightness and light emission time of the light source 304A and a control unit for the light source side polarization filter rotation support mechanism according to a command from the system control computer 8.

  According to the structure monitoring apparatus 1I of this embodiment, the polarization filter 4D uses, for example, linearly polarized light to polarize illumination light, and the in-reactor structure 31 that is a structure with respect to the lens optical system 5B. It is possible to adjust the illumination light such that direct reflection from the surface of the light hardly occurs. Then, since the component of the directly reflected light that is photographed brightest by the camera is reduced, there is an effect of suppressing the halation and facilitating the detection of the microcrack.

  Furthermore, according to the structure monitoring apparatus 1I of this embodiment, linearly polarized light can be used for the polarizing filter 5H, for example. By mutually adjusting the polarization of the polarizing filter 4D and the polarizing filter 5H, the direct reflected light component from the in-reactor structure 31 that is a structure for the lens optical system 5B can be prevented, and halation and the like can be prevented. There is an effect to suppress.

[Fourteenth embodiment]
A fourteenth embodiment of a structure monitoring apparatus according to the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1G shown in the present embodiment is an apparatus that monitors the in-reactor structure 31 as a structure. The reactor is filled with water to block radiation, and the monitoring unit 2 is used in water.

  In this structure monitoring apparatus 1G, the description overlapping with the structure monitoring apparatus 1G of the eleventh embodiment is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1G includes a light source unit 4, and the light source unit 4 includes a diffusion plate (not shown) that diffuses illumination light.

  If there is a step in the reactor internal structure 31, it can be shaded by illumination light.

  The structure monitoring apparatus 1G according to the present embodiment includes a diffusion plate, so that the light beam vector of the illumination light can be made random. Then, since the shadow by illumination light can be made thin, the monitoring image with a poor shadow can be obtained.

  When estimating the composition of the surface of the reactor internal structure 31, which is a structure, from the monitoring images obtained with illumination light limited at different wavelengths, there is an effect that the distribution of components can be accurately grasped.

[Fifteenth embodiment]
A fifteenth embodiment of the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1 shown in this embodiment is an apparatus that monitors a monitoring object 30 as a structure.

  In the present embodiment, the same components as those in the first embodiment to the fourteenth embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring unit 2 constituting the structure monitoring apparatus 1 includes a photographing unit 5, and the photographing unit 5 includes a lens optical system 5B.

  The structure monitoring apparatus 1 according to the present embodiment is configured using an optical material in which the transparent material of the portion through which the light of the lens optical system 5B is transmitted is not easily colored by radiation.

  As the optical material, for example, an optical material such as quartz that is difficult to be colored by radiation can be used. Coloring is suppressed even in places where the radiation field is strong, such as inside a nuclear reactor, and it has the effect of maintaining good monitoring conditions.

  Further, the present invention is characterized in that the difference in the reflection spectrum of the monitoring object 30 is monitored, and it is desirable that the spectral sensitivity characteristic of the monitoring unit 2 changes due to coloring in the radiation field as seen with a plastic lens or the like. Absent.

  Optical materials that are difficult to be colored by radiation include sapphire, diamond, calcium fluoride, magnesium fluoride, sodium chloride, flint glass, heavy flint glass, lead glass, optical crown glass, borosilicate glass, etc. in addition to quartz Can be used.

  In addition, since it may color depending on the intensity | strength of a radiation, it is desirable to select the material according to a radiation intensity.

  Further, the light source 4A, 104A, 204A, 304A, wavelength tunable bandpass filter 4B provided in the monitoring unit 2 constituting the structure monitoring device 1A, 1B, 1C, 1D, 1E, 1F, 1G, 1H, 1I. 5E, 5G, collimator 4C, polarizing filter 4D, 5G, distribution optical element 5F, liquid crystal type spatial filter 5D, and waterproof case 12, light sources 4A, 104A, 204A, 304A, wavelength variable bandpass The same applies to the filters 4B, 5E, 5G, the collimator 4C, the polarizing filters 4D, 5G, the distribution optical element 5F, the liquid crystal spatial filter 5D, and the transparent material in the portion through which the light of the waterproof case 12 is transmitted.

[Sixteenth Embodiment]
A sixteenth embodiment of the present invention will be described with reference to FIG.

  The structure monitoring apparatus 1 shown in this embodiment is an apparatus that monitors a monitoring object 30 as a structure.

  In the present embodiment, the same components as those in the first embodiment to the fifteenth embodiment are denoted by the same reference numerals, and redundant description is omitted.

  The monitoring part 2 which comprises the structure monitoring apparatus 1 shown by FIG. 1 is provided with the some light source part 4 (illustration omitted).

  The operation unit 3 constituting the structure monitoring apparatus 1 includes a light source unit driver 9, and the light source driver 9 has brightness of the light source 4 </ b> A for each of the plurality of light source units 4 according to a command from the system control computer 8. And a control unit for conditions such as light emission time.

  If it does so, there exists an effect which acquires the monitoring image which gave illumination light from various angles of the monitoring target object 30 which is a structure, without moving the monitoring part 2. FIG.

  Depending on the angle of the illumination light, a shadow difference occurs in the image of the monitoring object 30, so that it is easy to monitor an abnormality of the monitoring object 30.

  The same effect can be obtained by applying the present embodiment to the structure monitoring devices 1A, 1B, 1C, 1D, 1E, 1F, 1G, 1H, and 1I.

  Furthermore, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit of the present invention by combining the configurations of the embodiments.

The figure which shows the structure of 1st Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 2nd Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 3rd Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 4th Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 5th Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 8th Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 9th Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 11th Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 12th Embodiment of the monitoring apparatus which concerns on this invention. The figure which shows the structure of 13th Embodiment of the monitoring apparatus which concerns on this invention. (A) And (b) is a figure which shows the structure of the wavelength variable band pass filter in 16th Embodiment of the monitoring apparatus which concerns on this invention.

Explanation of symbols

1, 1A, 1B, 1C, 1D, 1E, 1F, 1G, 1H, 1I Monitoring device 2 Monitoring unit 3 Operation unit 4 Light source unit 4A, 104A, 204A, 304A Light source 4B Tunable bandpass filter 4C Collimator 4D Polarizing filter 5 Imaging unit 5A Camera 5B Lens optical system 5C Monochrome imaging device 5D Liquid crystal type spatial filter 5E Wavelength variable bandpass filter 5F Distribution optical element 5G Wavelength variable bandpass filter 5H Polarizing filter 6 Monitoring unit support member 6A Light source unit holding member 6B Members 7, 7A, 7B, 7C, 7D Imaging unit control unit 8 System control computers 9, 9A, 9B, 9C, 9D Light source unit driver 10 Display device 11 Input device 12 Waterproof case 20 Wavelength variable bandpass filter 21 Holder 22 Fixed wavelength bandpass filter 23 Drive unit 30 Monitoring Object 31 Reactor structure

Claims (25)

A light source unit that outputs a plurality of illumination lights having different wavelengths to the monitoring target;
An imaging unit including a camera for imaging the monitoring target;
A monitoring unit support member that supports the light source unit and the imaging unit;
A monitoring unit having
An imaging unit control unit for controlling the camera and receiving electronic information output from the camera;
A light source driver,
A computer for controlling the system that controls the imaging unit control unit and the light source unit driver;
A display device for the system control computer;
An input device of the computer for system control;
An operation unit having
A structure monitoring device characterized by comprising: The camera is provided with a lens optical system, and the lens optical system includes a liquid crystal type spatial filter that is held at a stop position and restricts an aperture of light transmitted through the lens optical system to an arbitrary shape. The structure monitoring apparatus according to claim 1, wherein the structure monitoring apparatus is a structure monitoring device. The structure monitoring apparatus according to claim 1, wherein the monitoring unit 2 further includes a case for housing the light source unit and the photographing unit in a watertight manner. The said light source part is provided with the light source and the light source side band pass filter which restrict | transmits the transmission wavelength of the illumination light which this light source outputs, The structure of any one of Claim 1 to 3 characterized by the above-mentioned. Monitoring device. The light source unit includes a collimator that converts illumination light into a substantially parallel light beam,
The imaging unit includes a camera-side bandpass filter that limits a transmission wavelength of light incident on the camera of the imaging unit
The structure monitoring apparatus according to claim 4, wherein the structure monitoring apparatus is configured. The light source unit includes a light source side polarizing filter that polarizes illumination light,
The photographing unit is a photographing side polarizing filter that polarizes light incident on the camera of the photographing unit,
A photographing side polarizing filter rotation support mechanism that rotatably supports the photographing side polarizing filter;
6. The structure monitoring apparatus according to claim 4, wherein the structure monitoring apparatus is configured. The structure monitoring device according to claim 3, wherein the light source unit includes a diffusion plate that diffuses illumination light. The said light source is comprised by the at least 1 light source selected from the light source which consists of several laser transmitters which each emit the light of a different wavelength, a wavelength variable laser, and several light emitting diode. 4. The structure monitoring apparatus according to any one of 3 above. The structure monitoring apparatus according to claim 8, wherein the imaging unit includes a camera-side bandpass filter that limits a transmission wavelength of light incident on a camera of the imaging unit. The light source is composed of a light source comprising a plurality of laser transmitters that emit light of different wavelengths, or a wavelength tunable laser,
The photographing unit is a photographing side polarizing filter that polarizes light incident on the camera of the photographing unit,
A rotation support mechanism that rotatably supports the photographing side polarizing filter;
The structure monitoring apparatus according to claim 1, wherein the structure monitoring apparatus is configured. The camera
A distribution optical element for distributing the light converged by the optical system in a plurality of directions;
The structure monitoring apparatus according to claim 3, further comprising a camera-side bandpass filter that limits a transmission wavelength of light distributed by the distribution optical element.   The structure monitoring device according to claim 11, wherein the light source unit includes a collimator that changes the illumination light into a substantially parallel light beam. The light source unit includes a light source side polarizing filter that polarizes illumination light, and
A light source side polarization filter rotation support mechanism that rotatably supports the light source side polarization filter,
The imaging unit includes an imaging-side polarizing filter that polarizes light incident from the monitoring target;
A photographing side polarizing filter rotation support mechanism that rotatably supports the photographing side polarizing filter;
The structure monitoring apparatus according to claim 11, wherein the structure monitoring apparatus is configured. The structure monitoring device according to claim 11, wherein the light source unit includes a diffusion plate that diffuses illumination light. The structure monitoring device according to any one of claims 4 to 6, and 9 to 14, wherein the band-pass filter is configured by a band-pass filter capable of continuously changing a wavelength to be transmitted. The bandpass filter is
A plate-like holder having a plurality of openings;
A wavelength-fixed bandpass filter held in each of the plurality of apertures;
A drive unit that drives the holder and switches a fixed wavelength bandpass filter to a light transmission position;
The structure monitoring device according to any one of claims 4 to 6 and 9 to 14, wherein the structure monitoring device is configured. The structure monitoring device according to any one of claims 4 to 6 and 9 to 16, wherein the bandpass filter is configured so that a center wavelength of transmitted light is 200 nm or more and 1100 nm or less. The structure monitoring device according to any one of claims 4 to 6 and 9 to 17, wherein the band-pass filter is configured so that a bandwidth of transmitted light is 1 nm or more and 300 nm or less. At least one selected from the light source unit, the optical system, the liquid crystal type spatial filter, the band pass filter, the collimator, the polarizing filter, the distribution optical element, and the case. The light source unit, the optical system, the liquid crystal type spatial filter, the band pass filter, the collimator, the polarizing filter, the distribution optical element, and the case are configured such that a path through which light passes is caused by radiation. The structure monitoring apparatus according to any one of claims 1 to 18, wherein the structure monitoring apparatus is made of an optical material that is difficult to be colored. The said monitoring part was provided with the several light source part, The monitoring apparatus of the structure of any one of Claim 1 to 19 characterized by the above-mentioned. A monitoring unit having a light source unit that outputs irradiation light to the monitoring target, an imaging unit including a camera that captures the monitoring target, and an imaging unit support member that supports the light source unit and the imaging unit is disposed on the monitoring target. A placement step to
An output step of outputting irradiation light to the monitoring target;
A photographing step of photographing light from the monitoring target by the irradiation light;
A display step for displaying the captured image;
A structure monitoring method characterized by comprising: A monitoring unit having a light source unit that outputs irradiation light to the monitoring target, an imaging unit including a camera that captures the monitoring target, and an imaging unit support member that supports the light source unit and the imaging unit is disposed on the monitoring target. A placement step to
An output step of outputting irradiation light to the monitoring target;
An imaging step of imaging by limiting the transmission wavelength of light from the monitoring target by the irradiation light;
A display step for displaying the captured image;
A structure monitoring method characterized by comprising: 24. In the photographing step, the shutter timing of the photographing unit and the light emission time of the light source unit are controlled so that the photographing unit starts photographing after the light emission of the light source unit is completed. The method for monitoring a structure according to claim 22. In the imaging step, a scatterer having a known reflection spectrum is arranged in the range of the monitoring target, an image is acquired simultaneously or in advance with the imaging of the monitoring target, and sensitivity correction of the captured image is performed. The method for monitoring a structure according to any one of claims 21 to 23. In preparing the monitoring device according to any one of claims 3 to 20,
Preparing the monitoring unit of the structure monitoring device according to any one of claims 3 to 20 in water;
The method for monitoring a structure according to any one of claims 21 to 24, wherein:

Images