JP2008202117A - Nozzle for film deposition system, and film deposition system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a nozzle for a film deposition system improving the density of the particulates to be collided on a substrate, having high mechanical strength, and capable of securing the uniformity of a film and a structure, and to provide a film deposition system. <P>SOLUTION: In the nozzle 1 for a film deposition system comprising: an aerosol discharge nozzle 2 discharging aerosol obtained by dispersing particulates into a gas toward the film deposition part of a base material; and a gas discharge nozzle 3 discharging a gas, the aerosol discharge nozzle 2 and the gas discharge nozzle 3 have discharge openings 2a and 3a at the tip part, respectively, and the tip part of the gas discharge nozzle 3 is adjacently arranged at least at a part of the outer circumference of the tip part of the aerosol discharge nozzle 2. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a nozzle for a film forming apparatus used in an aerosol deposition (hereinafter referred to as AD) method in which an aerosol containing fine particles is sprayed onto a substrate or the like to form a film or a structure on a substrate. The present invention relates to the film forming apparatus used.

  As a method for forming a film on a substrate, there is a method for forming a film or structure of a brittle material called a fine particle beam deposition method or an AD method. In the AD method, an aerosol containing fine particles of a brittle material is discharged from a nozzle toward a substrate, the fine particles collide with the substrate, and a polycrystalline structure of the brittle material is directly applied to the substrate by using the mechanical impact force. (See, for example, Patent Document 1). Normally, only one nozzle is used, and even when a plurality of nozzles are used, all are nozzles for aerosol discharge. Various shapes have been proposed as the opening shape of the nozzle (see Patent Document 2).

  An example of the shape of the nozzle tip in the conventional AD method will be described with reference to FIG. As shown in FIG. 6, the nozzle 2 has a rectangular discharge opening 2a and discharges aerosol containing fine particles from the discharge opening 2a.

However, the aerosol discharged from the nozzle may diffuse before the collision with the substrate, and there is a problem that a part of the aerosol is not discharged perpendicularly to the surface of the base material, resulting in poor film formation efficiency.
In addition, in the AD method, fine particles are sequentially collided with a base material and deposited to grow a film. However, when there is a foreign substance on the substrate or there is fine particles with insufficient adhesion to a part of the surface of the already formed film. In such a case, film growth may be inhibited.
Japanese Patent Laid-Open No. 11-21677 JP 2003-247080 A

  The present invention has been made in order to cope with such a problem, and improves the density of fine particles that collide on a substrate, increases the mechanical strength, and ensures film and structure uniformity. An object is to provide an apparatus nozzle and a film forming apparatus.

  The nozzle for a film forming apparatus of the present invention is for a film forming apparatus comprising an aerosol discharge nozzle that discharges an aerosol in which fine particles are dispersed in a gas toward a film forming portion of a base material, and a gas discharge nozzle that discharges a gas. The aerosol discharge nozzle and the gas discharge nozzle each have a discharge opening at the tip, and the tip of the gas discharge nozzle is disposed adjacent to at least a part of the outer periphery of the tip of the aerosol discharge nozzle. It is characterized by.

The tip of the gas discharge nozzle is disposed so as to surround the outer periphery of the tip of the aerosol discharge nozzle.
Moreover, the discharge direction cross-sectional shape of the tip part of the aerosol discharge nozzle is rectangular, and the tip part of the gas discharge nozzle is disposed so as to be sandwiched from both sides in the long side direction of the tip part.

  The fine particles are ceramic fine particles having an average particle diameter of 0.01 to 2 μm. The ceramic fine particles are alumina fine particles.

  The film forming apparatus of the present invention is characterized in that an aerosol in which fine particles are dispersed in a gas is ejected and collided from the film forming apparatus nozzle in the vacuum chamber onto the substrate.

  The nozzle for a film forming apparatus of the present invention is composed of an aerosol discharge nozzle and a gas discharge nozzle, and has a structure in which the tip of the gas discharge nozzle is disposed adjacent to at least a part of the outer periphery of the tip of the aerosol discharge nozzle. The gas discharged from the nozzle can remove foreign matters before the aerosol discharge on the surface of the substrate and remove fine particles with insufficient adhesion after the aerosol discharge. As a result, the aerosol discharged from the aerosol discharge nozzle can form a coating film having a strong adhesive force made of fine particles on the surface of the substrate.

  Also, an air flow curtain that surrounds the outer periphery of the tip of the aerosol discharge nozzle and arranges the tip of the gas discharge nozzle so that the gas discharged from the gas discharge nozzle blocks the diffusion of the aerosol discharged from the aerosol discharge nozzle And enclose the aerosol. For this reason, the discharged aerosol does not spread in both directions of the discharge direction cross section, and the ratio of the aerosol discharged perpendicularly to the substrate surface is improved as compared with the case of only the aerosol discharge nozzle, and the film formation efficiency is improved. .

  In addition, the discharge direction cross-sectional shape of the tip of the aerosol discharge nozzle is a rectangular shape, and the tip of the gas discharge nozzle is disposed between both sides in the long side direction of the tip so that the aerosol is easily diffused. An airflow curtain is formed in the longitudinal direction. For this reason, the discharged aerosol does not expand in the longitudinal direction of the cross section in the discharge direction, and the ratio of the aerosol discharged vertically to the substrate surface is improved as compared with the case of only the aerosol discharge nozzle, and the film formation efficiency is improved. To do.

  Since the film forming apparatus of the present invention uses the film forming apparatus nozzle, the film forming efficiency can be improved. For example, a film forming apparatus nozzle in which both sides of an aerosol discharge nozzle are sandwiched between gas discharge nozzles and a film is formed by the AD method by moving the nozzle or moving the base material, so that foreign matter is formed on the surface of the base material. A three-stage process of removal-film formation-removal of a film having weak adhesion can be continuously performed, and a dense and uniform film having excellent mechanical strength can be easily formed.

  In the present invention, the AD method is a constituent material of fine particles such as ceramics, in which an aerosol in which fine particles such as ceramics are dispersed in a gas is directed toward the substrate from an aerosol discharge nozzle, and the aerosol collides with the substrate surface at high speed. Is a method of forming a coating film comprising:

A film forming apparatus nozzle according to a first embodiment of the present invention will be described with reference to FIG. FIG. 1 is a front sectional view, a side sectional view, and a bottom view showing a tip portion of a nozzle for a film forming apparatus.
As shown in FIG. 1, a nozzle 1 for a film forming apparatus according to the present invention discharges only a gas and an aerosol discharge nozzle 2 that discharges an aerosol in which fine particles are dispersed in a gas toward a film forming portion of a substrate. It consists of a gas discharge nozzle 3. The aerosol discharge nozzle 2 has a discharge opening 2a at the tip, and the gas discharge nozzle 3 has a discharge opening 3a at the tip. The distal end portion of the gas discharge nozzle 3 is disposed adjacent to the outer periphery of the distal end portion of the aerosol discharge nozzle 2.

In the aerosol discharge nozzle 2, the long side width and the short side width of the discharge direction cross section of the discharge opening 2a are not particularly limited, but in the AD method using fine particles having an average particle diameter of about 0.01 μm to 2 μm, the long side width Is about 5 mm to 20 mm, and the short side width is about 0.5 mm to 5 mm. In this case, the vertical distance between the tip surface of the nozzle 1 for a film forming apparatus and the substrate is about 1 mm to 5 mm.
Further, the width of the discharge opening 3a of the gas discharge nozzle 3 in the case of surrounding the outer periphery as shown in FIG. 1 is not particularly limited, but is preferably about the same as the width in the short side direction.

  The material of the aerosol discharge nozzle 2 and the gas discharge nozzle 3 can be any material that can be shaped into a desired shape, such as ceramics, metal, and plastic, and that does not cause significant wear damage due to aerosol discharge during film formation. . For example, in the case of plastic, this nozzle may be manufactured by a photolithographic method using a photocurable resin.

The film forming apparatus of the present invention will be described with reference to FIGS. FIG. 2 is a view showing a film forming apparatus incorporating the nozzle for the film forming apparatus of the present invention shown in FIG. FIG. 3 is an enlarged schematic view showing a portion C of FIG.
As shown in FIG. 2, the film formation apparatus 4 by the AD method has an aerosol generation apparatus 7 and a vacuum chamber 5. The aerosol generation device 7 forms an aerosol composed of fine particles such as ceramics accommodated in advance and a carrier gas supplied from the gas supply facility 6, and supplies the aerosol to the aerosol discharge nozzle 2 via the aerosol supply pipe 7a. . Usable carrier gases include inert gases such as argon, nitrogen and helium.

In the vacuum chamber 5, an outer ring 8 that is a base material on which a film is to be formed and a film forming apparatus nozzle 1 are disposed. The inside of the vacuum chamber 5 is depressurized by the vacuum pump 12. In order to prevent mixing of fine particles, a fine particle filter 11 is provided immediately before the vacuum pump 12.
The outer ring 8 is set in the object rotating motor 10 and rotated in the outer diameter direction (A in the figure) at a predetermined number of revolutions, and is moved in the axial direction by the positioning XY table 9 (B in the figure).
The film forming apparatus nozzle 1 is the nozzle described above, and includes an aerosol discharge nozzle 2 and a gas discharge nozzle 3 as shown in FIG. The number of nozzles 1 for the film forming apparatus may be one or plural, and may be configured to be displaceable in the vacuum chamber 5.

Aerosol is supplied to the aerosol discharge nozzle 2 via an aerosol supply pipe 7a. Gas is supplied to the gas discharge nozzle 3 through a gas supply pipe 6a. Examples of the gas supplied to the gas discharge nozzle 3 include inert gases such as argon, nitrogen, and helium as in the case of the carrier gas.
The carrier gas supplied to the aerosol generator 7 and the gas supplied to the gas discharge nozzle 3 may be the same or different. In FIG. 2, the carrier gas supplied to the aerosol generation device 7 and the gas supplied to the gas discharge nozzle are supplied from a common gas supply facility 6. Equipment may be provided.

A film forming method using the film forming apparatus of the present invention will be described below.
First, the outer ring 8, which is a substrate on which a film is to be formed, is set on the object rotation motor 10 in the vacuum chamber 5. Next, the aerosol generator 7 is charged with a predetermined amount of fine particles such as ceramics, the vacuum pump 12 is started, and the carrier gas is supplied from the gas supply facility 6 to the aerosol generator 7 while maintaining the vacuum chamber 5 at a predetermined degree of reduced pressure. It supplies to the gas supply piping 6a (refer FIG. 2).

  Next, the aerosol generated by the aerosol generator 7 is discharged from the aerosol discharge nozzle 2 via the aerosol supply pipe 7a, and the fine particles in the aerosol are surrounded by the airflow curtain 3b discharged from the gas discharge nozzle 3. Confirm that it is in a state (see FIG. 3).

Thereafter, the outer ring 8 is rotated at a predetermined number of rotations by the object rotating motor 10 (A in the figure) and moved in the axial direction by the positioning XY table 9 (B in the figure) (see FIGS. 2 and 3). If the longitudinal width of the film forming apparatus nozzle 1 is the same as the outer ring width, the axial movement (B in the figure) by the positioning XY table 9 is not necessary.
By this operation, (1) the gas discharged from the gas discharge nozzle 3 becomes an air flow curtain 3b that blocks the diffusion of the aerosol discharged from the aerosol discharge nozzle 2, and surrounds the aerosol, and the aerosol spreads in both directions in the discharge direction cross section. (2) The gas discharged from the gas discharge nozzle 3 can remove foreign substances before the aerosol discharge on the outer ring surface, which is a base material, and (3) the gas discharged from the gas discharge nozzle 3 is an aerosol. Fine particles with insufficient adhesion after ejection can be removed.
For this reason, it is possible to continuously perform a three-step process on the outer peripheral surface of the outer ring, that is, removal of foreign matter, film formation, and removal of a film with weak adhesion, and a ceramic film with strong and uniform adhesion can be easily formed. it can.

A film forming apparatus nozzle according to a second embodiment of the present invention will be described with reference to FIGS. FIG. 4 is a front sectional view, a side sectional view, and a bottom view showing the tip of the nozzle for a film forming apparatus, and FIG. 5 is an enlarged schematic view of a portion C according to this embodiment of FIG.
As shown in FIGS. 4 and 5, the aerosol discharge nozzle 2 has a discharge opening 2 a at the tip portion whose discharge direction cross-sectional shape is a rectangular shape. Further, the gas discharge nozzle 3 has a discharge opening 3c at the tip. The distal end portion of the gas discharge nozzle 3 is adjacently disposed so as to be sandwiched from both sides in the long side direction of the distal end portion of the aerosol discharge nozzle 2.
The size of the discharge opening in the aerosol discharge nozzle and the gas discharge nozzle and the method for supplying the aerosol or gas are the same as those in the case of the nozzle for the film forming apparatus according to the first embodiment described above.

  Regarding the film forming method in this case, it is confirmed that the aerosol discharged from the aerosol discharge nozzle 2 is in a state where the long side direction is sandwiched from both sides by the airflow curtain 3d discharged from the gas discharge nozzle 2 ( Except for the case of FIG.

The fine particles that can be used in the film forming apparatus nozzle and the film forming apparatus of the present invention may be fine particles that can be formed, and mainly include ceramic fine particles. Examples of the ceramic fine particles include oxides such as alumina, zirconia, and titania, and fine particles such as silicon carbide and silicon nitride. Among these, alumina fine particles are preferred because the higher the specific gravity of each ceramic, the easier it is to aerosolize when the true specific gravity is smaller.
In addition to ceramic fine particles, fine particles of brittle materials with strong cleavage, such as silicon and germanium, can also be used.

The average particle diameter of the fine particles used in the film forming apparatus nozzle and the film forming apparatus of the present invention is preferably 0.01 μm to 2 μm. If it is less than 0.01 μm, it is easy to agglomerate and it is difficult to form an aerosol. In the present invention, the average particle diameter is a value measured by Nikkiso Co., Ltd .: Laser type particle size analyzer Microtrac MT3000.
In addition, for good film formation, it is preferable to form cracks in the fine particles in advance using a pulverizer such as a ball mill or a jet mill so that the fine particles are easily pulverized upon collision with the substrate.

  The following examples further illustrate the present invention. The present invention is not limited to these examples.

Example 1
Using ceramic fine particles (alumina: AKP-50 manufactured by Sumitomo Chemical Co., Ltd., average particle diameter 0.2 μm), a film was formed as follows using the nozzle for a film forming apparatus shown in FIG.
The ceramic fine particles were loaded into the aerosol generator 7 shown in FIG. 2 and the vacuum pump 12 was started. Then, aerosol was generated while flowing nitrogen gas as a carrier gas into the apparatus at a flow rate of 7 L / min. The inside of the vacuum chamber 5 was under a reduced pressure of 100 Pa or less, and the film forming apparatus nozzle 1 was fixed.
The aerosol generated on the outer ring 8 (bearing number NU214, outer diameter 125 mm × inner diameter 108 mm × width 24 mm) as the base material is discharged from the discharge opening 2a (20 mm × 2 mm) of the aerosol discharge nozzle 2 to the nitrogen. Gas is discharged from each discharge opening 3a (1 mm in constant width) of the gas discharge nozzle 3, and at the same time, the outer ring 8 is rotated at a predetermined number of rotations (A in the figure) by the object rotating motor 10 to make ceramics ( Alumina) coating was formed.
The obtained ceramic film was subjected to a film thickness measurement test shown below, and the film formation rate (μm · cm / min) was measured. The measurement results are shown in Table 1.

<Thickness measurement test>
The thickness of the produced ceramic film was measured using a stylus type surface shape measuring device (Nippon Vacuum Technology Co., Ltd., Decak3030) to calculate the film formation rate (μm · cm / min) of the ceramic film. The film formation speed (μm · cm / min) means the thickness (μm) of the film formed per 1 cm of scanning distance per minute.

Example 2
A film was formed in the same manner as in Example 1 using the nozzle for the film forming apparatus shown in FIG. In addition, as for the nozzle for film-forming apparatuses, the discharge opening 2a of the aerosol discharge nozzle 2 was 20 mm × 2 mm, and the discharge openings 3c of the gas discharge nozzles 3 on both sides in the longitudinal direction were 20 mm × 1 mm. The measurement results are also shown in Table 1.

Comparative Example 1
The same operation as in Example 1 was performed except that a conventional aerosol discharge nozzle having a discharge opening 2a (20 mm × 2 mm) used in Example 1 was used. The measurement results are also shown in Table 1.

  The film forming apparatus provided with the nozzle for the film forming apparatus of the present invention can form a ceramic film having a strong adhesion to the surface of the base material, and is therefore suitable for forming a ceramic film on various industrial parts. Available.

It is a figure which shows the front-end | tip part of the nozzle for film-forming apparatuses which concerns on 1st embodiment of this invention. It is a figure which shows one Example of the film formation apparatus of this invention. It is the schematic diagram which expanded the C section of FIG. It is a figure which shows the front-end | tip part of the nozzle for film-forming apparatuses which concerns on 2nd embodiment of this invention. It is the schematic diagram which expanded C part which concerns on 2nd embodiment of FIG. It is a figure which shows the front-end | tip part of the conventional aerosol discharge nozzle.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Nozzle for film forming apparatus 2 Aerosol discharge nozzle 2a Discharge opening 3 Gas discharge nozzle 3a, 3c Discharge opening 3b, 3d Airflow curtain 4 Film forming apparatus 5 Vacuum chamber 6 Gas supply equipment 6a Gas supply pipe 7 Aerosol generator 7a Aerosol supply pipe 8 Outer ring 9 XY table 10 Object rotation motor 11 Particulate filter 12 Vacuum pump

Claims (6)

A film forming apparatus nozzle comprising an aerosol discharge nozzle for discharging an aerosol in which fine particles are dispersed in a gas toward a film forming portion of a substrate, and a gas discharge nozzle for discharging a gas,
Each of the aerosol discharge nozzle and the gas discharge nozzle has a discharge opening at the tip, and the tip of the gas discharge nozzle is disposed adjacent to at least a part of the outer periphery of the tip of the aerosol discharge nozzle. Nozzle for membrane device.   2. The nozzle for a film forming apparatus according to claim 1, wherein the tip of the gas discharge nozzle is disposed so as to surround the outer periphery of the tip of the aerosol discharge nozzle.   2. The film formation according to claim 1, wherein the tip portion of the aerosol discharge nozzle has a rectangular shape in the discharge direction, and the tip portion of the gas discharge nozzle is disposed so as to be sandwiched from both sides in the long side direction of the tip portion. Equipment nozzle.   4. The nozzle for a film forming apparatus according to claim 1, wherein the fine particles are ceramic fine particles having an average particle diameter of 0.01 to 2 [mu] m.   The film forming apparatus nozzle according to any one of claims 1 to 4, wherein the ceramic fine particles are alumina fine particles. A film forming apparatus for forming a film by discharging and colliding an aerosol in which fine particles are dispersed in a gas from a nozzle for a film forming apparatus onto a substrate in a vacuum chamber,
The film forming apparatus nozzle according to claim 1, wherein the film forming apparatus nozzle is a nozzle for a film forming apparatus according to claim 1.

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