JP2008126283A - Manufacturing method of fine structure, exposure method - Google Patents

Abstract

A technique capable of forming a fine pattern while ensuring high throughput is provided.
A method of manufacturing a fine structure having a fine periodic structure by irradiating a workpiece (2) with a laser beam (LB), comprising: (a) a beam cross-sectional shape that is long in a first direction; (B) moving the laser beam or workpiece in a direction parallel to the first direction at a velocity V, and (c) applying the laser beam at the first irradiation opportunity. The repetition frequency and speed V of the laser beam pulse are set relatively so that the irradiation range (101) and the irradiation range (102) in the second irradiation opportunity after the first irradiation opportunity partially overlap. And irradiating the workpiece with a fine structure manufacturing method.
[Selection] Figure 5

Description

  The present invention relates to a technique for realizing a nano-order fine pattern on uneven surfaces of various materials. Such a fine pattern has, for example, a light wave control function such as polarization separation, phase delay, and antireflection, and can be used for various optical devices and equipment.

  It is known that when a material (workpiece) is irradiated with an ultrashort pulse laser beam, a fine concavo-convex structure on the order of nanometers is formed on the surface (for example, see Non-Patent Document 1). However, the formation mechanism has many unclear points, and has not been widely put into practical use for industrial applications. For example, a fine periodic structure (stripe-shaped unevenness) is not formed by only irradiating one pulse laser beam, and it is necessary to irradiate at least two pulse laser beams to the same place. According to experiments conducted by the present inventor, a fine structure with a period of about 100 nm is formed by irradiating the surface of a liquid crystal polymer substrate (thickness 1 mm) with a condensed ultrashort pulse laser (wavelength 800 nm) multiple times. It was confirmed that In order to express a clear fine periodic structure, it was necessary to irradiate at least several tens to 100 pulses.

  In order to put the above-described technology for forming a laser-induced fine structure into practical use, it is necessary to move the material while irradiating a wide area with a laser beam. However, in order to irradiate a laser beam multiple times to the same place, it is necessary to sufficiently slow the relative moving speed of the material and the laser beam, which is a factor hindering practicality. In other words, there is a demand for a technique for forming a fine periodic structure by laser irradiation while ensuring high processing throughput.

Naoki Yasumaru, 2 others, “Nanostructure formation and control of hard thin film surface by femtosecond laser”, Laser Research, Vol.33, No.8, pp.519-524 (2005)

  A specific aspect of the present invention aims to provide a technique that enables a fine pattern to be formed while ensuring high throughput.

A manufacturing method of a fine structure according to the present invention is a method of manufacturing a fine structure having a fine periodic structure by irradiating a workpiece with a laser beam,
(A) generating a pulsed laser beam having a long beam cross-sectional shape in the first direction;
(B) moving the laser beam or the workpiece at a speed V in a direction parallel to the first direction;
(C) Repetition of the laser beam pulse so that the irradiation range in the first irradiation opportunity and the irradiation range in the second irradiation opportunity after the first irradiation opportunity partially overlap each other. Irradiating the workpiece with the frequency and the velocity V set relatively;
including.

  According to the above method, a laser beam having a beam cross-sectional shape that is long in one direction is used to irradiate the surface of the workpiece multiple times in a superimposed manner while continuously moving the workpiece. As a result, it is possible to manufacture a fine structure having a fine periodic structure with a higher processing throughput than in the prior art.

  Preferably, the method further includes that the spatial intensity distribution of the laser beam in the step (a) is substantially flat.

  Thereby, it is possible to further homogenize the microstructure to be manufactured.

Preferably,
The laser beam is linearly polarized light,
In the step (b), the polarization direction of the laser beam and the moving direction of the laser beam or the workpiece are made parallel or orthogonal to each other.

  Thereby, according to the raw material employ | adopted as a to-be-processed object, the microstructure which a groove | channel direction continues in either a parallel direction or orthogonal direction with the polarization azimuth | direction of a laser beam can be obtained.

A manufacturing method of a fine structure according to the present invention is a method of manufacturing a fine structure having a fine periodic structure by irradiating a workpiece with a laser beam,
(A) generating a linearly polarized pulsed laser beam;
(B) moving the laser beam or workpiece at a velocity V in a direction parallel to the polarization direction of the laser beam;
(C) Repetition of the laser beam pulse so that the irradiation range in the first irradiation opportunity and the irradiation range in the second irradiation opportunity after the first irradiation opportunity partially overlap each other. Irradiating the workpiece with the frequency and the velocity V set relatively;
including.

A manufacturing method of a fine structure according to the present invention is a method of manufacturing a fine structure having a fine periodic structure by irradiating a workpiece with a laser beam,
(A) generating a linearly polarized pulsed laser beam;
(B) moving the laser beam or workpiece at a velocity V in a direction orthogonal to the polarization direction of the laser beam;
(C) Repetition of the laser beam pulse so that the irradiation range in the first irradiation opportunity and the irradiation range in the second irradiation opportunity after the first irradiation opportunity partially overlap each other. Irradiating the workpiece with the frequency and the velocity V set relatively;
including.

  According to the above method, the polarization direction of the laser beam and the relative movement direction of the laser beam and the workpiece are set to be parallel or orthogonal, and the workpiece or laser beam is moved while being continuously moved. By irradiating the surface of the workpiece with a laser beam several times in a superimposed manner, a fine structure having a fine periodic structure can be manufactured with a high processing throughput.

The laser processing apparatus according to the present invention is
A beam generator for emitting a pulsed laser beam;
A first beam shaping section for shaping a beam cross-sectional shape of the laser beam into a shape elongated in a first direction;
A moving unit that moves the first beam shaping unit or the workpiece at a speed V in a direction parallel to the first direction;
The laser beam of the light source so that the irradiation range of the laser beam at the first irradiation opportunity and the irradiation range of the laser beam at the second irradiation opportunity after the first irradiation opportunity partially overlap. A control unit for relatively setting the repetition frequency of the pulse and the speed V;
including.

  According to this configuration, a laser processing apparatus suitable for carrying out the fine structure manufacturing method according to the present invention can be obtained.

  Preferably, the laser beam further includes a second beam shaping unit that shapes the spatial intensity distribution of the laser beam substantially flat.

  Thereby, it is possible to further homogenize the microstructure to be manufactured.

Preferably,
The laser beam is linearly polarized light,
It further includes a polarization azimuth adjusting unit that adjusts the polarization azimuth of the laser beam in either a direction parallel to or orthogonal to the first direction.

  As a result, depending on the material used as the workpiece, the polarization direction of the laser beam can be easily adjusted so as to obtain a fine structure in which the groove direction is continuous with either the parallel direction or the orthogonal direction to the polarization direction of the laser beam. Can be set.

  As the first beam shaping unit described above, for example, any one of a diffractive optical element, an anamorphic condensing lens, a mask having an aperture, and a coupling lens is preferably employed.

  According to any of these, a laser beam having a beam cross-sectional shape that is long in one direction can be generated with a relatively simple configuration.

The laser processing apparatus according to the present invention is
A beam generator that generates a linearly polarized pulsed laser beam;
A moving unit that moves the beam generating unit or the workpiece at a speed V in either the direction parallel to or orthogonal to the polarization direction of the laser beam;
The laser beam of the light source so that the irradiation range of the laser beam at the first irradiation opportunity and the irradiation range of the laser beam at the second irradiation opportunity after the first irradiation opportunity partially overlap. A control unit that relatively sets the repetition frequency of the pulse and the speed V;
including.

The laser processing apparatus according to the present invention is
A beam generator that generates a linearly polarized pulsed laser beam;
A moving unit that moves the beam generating unit or the workpiece in one direction at a speed V;
A polarization azimuth adjusting unit that adjusts the polarization azimuth of the laser beam in either a direction parallel to or orthogonal to the moving direction of the laser beam or the workpiece;
The laser beam of the light source so that the irradiation range of the laser beam at the first irradiation opportunity and the irradiation range of the laser beam at the second irradiation opportunity after the first irradiation opportunity partially overlap. A control unit for relatively setting the repetition frequency of the pulse and the speed V;
including.

  According to these structures, the laser processing apparatus suitable for implementation of the manufacturing method of the microstructure according to the present invention described above can be obtained.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is a block diagram illustrating a configuration of a laser processing apparatus according to an embodiment. The laser processing apparatus 1 includes a light source (laser oscillator) 10, a mirror 12, a half-wave plate 14, a diffractive optical element 16, a stage 18, and a control unit 20. As shown in the figure, the laser processing apparatus 1 is used to irradiate a workpiece 2 (for example, a liquid crystal polymer substrate having a thickness of 1 mm) with a pulsed laser beam, thereby forming a fine periodic structure. The structure can be manufactured on the surface of the workpiece 2.

  The light source 10 emits a pulsed laser beam LB having an extremely short period. The light source 10 of the present embodiment is a laser oscillator that outputs a pulse laser beam having a wavelength of 800 nm, a pulse width of 100 femtoseconds, and a pulse repetition frequency of 1 kHz. The output state of the laser beam is controlled based on a control signal supplied from the control unit 20. In addition, these numerical values are examples and are not limited to these. The laser beam LB emitted from the light source 10 has a circular beam cross-sectional shape, a spatial intensity distribution is a Gaussian distribution, and a polarization state is linearly polarized light. The laser beam LB emitted from the light source 10 is reflected by the mirror 12 disposed on the optical path. In the present embodiment, the light source 10 corresponds to a “beam generating unit” according to the present invention. In the case where the light emitted from the light source is not polarized or the degree of polarization is low, the “beam generator” according to the present invention may be configured by combining the light source and the polarizing element.

  The half-wave plate 14 is disposed on the optical path of the laser beam LB reflected by the mirror 12, and adjusts the polarization direction of the laser beam LB in an arbitrary direction. Specifically, an actuator (drive mechanism) (not shown) is attached to the half-wave plate 14, and this actuator rotates the half-wave plate 14 based on a control signal from the control unit 20. Thereby, the relationship between the optical axis of the half-wave plate 14 and the polarization direction of the laser beam LB is appropriately set, and the polarization direction of the laser beam LB can be freely adjusted. In the present embodiment, the half-wave plate 14 corresponds to a “polarization orientation adjusting unit” according to the present invention.

  The diffractive optical element 16 is disposed on the optical path of the laser beam LB reflected by the mirror 12 and subsequent to the half-wave plate 14, and shapes the beam shape and spatial intensity distribution of the laser beam LB. Specifically, as shown in FIG. 2, the diffractive optical element 16 of the present embodiment shapes the beam cross-sectional shape of the laser beam LB from a circle (FIG. 2 (a)) to a line (FIG. 2 (b)). . That is, by using the diffractive optical element 16, a laser beam having an elliptical beam cross-sectional shape that is long in one direction (first direction) is generated. The beam cross-sectional shape is not limited to an elliptical shape, but may be any shape as long as it is elongated in one direction (line shape), such as a rectangular shape. As shown in FIG. 3, the diffractive optical element 16 of the present embodiment shapes the spatial intensity distribution of the laser beam LB from a Gaussian distribution (FIG. 3A) to a flat distribution (FIG. 3B). The diffractive optical element 16 of the present embodiment is obtained, for example, by subjecting a quartz substrate to fine shape processing by means such as photolithography. Specifically, the structure, shape, and depth of the diffractive optical element are such that when a circular beam having a Gaussian intensity distribution is vertically incident, the spatial intensity distribution is flattened and the shape is shaped into a line shape. Is appropriately designed. Detailed information on such a design technique of the diffractive optical element 16 is disclosed in, for example, a known document “NCRoberts: Beam shaping by holographic filters, Appl. Opt., 28 (1989) 31.” Well known to. In the present embodiment, the diffractive optical element 16 corresponds to a “first beam shaping unit” and a “second beam shaping unit” according to the present invention. Since such a diffractive optical element 16 is used to shape a single laser beam into a line, the apparatus cost is greatly increased compared to the case where a plurality of laser light sources are installed in order to ensure the same processing throughput. Can be reduced. Therefore, practical application to a production line becomes easy.

  Note that the arrangement order of the half-wave plate 14 and the diffractive optical element 16 in the above configuration may be changed, and the half-wave plate 14 may be arranged at the subsequent stage of the diffractive optical element 16. In that case, the entire laser beam stretched in one direction by the diffractive optical element 16 is made to fall within the effective area of the half-wave plate 14.

  The stage 18 supports the workpiece 2 and moves the workpiece 2 in an arbitrary direction at an arbitrary speed V based on a control signal supplied from the control unit 20. The stage 18 has a flat surface orthogonal to the optical path of the laser beam LB, for example, and is configured such that the workpiece 2 can be placed on the flat surface. At that time, the workpiece 2 is fixed on the flat surface by means such as vacuum suction. When the shaped laser beam LB is irradiated onto the workpiece 2 on the stage 18 under appropriate conditions (polarized light and intensity), a fine periodic structure is formed on the surface thereof. Regarding the irradiation condition of the laser beam LB, the irradiation intensity is preferably slightly higher than the processing threshold. By flattening the spatial intensity distribution of the laser beam LB as described above, it is possible to stably form a fine periodic structure in almost the entire beam irradiation region. The period of this fine periodic structure is generally shorter than the laser wavelength (800 nm), for example, about 100 nm, although it depends on what material is used as the workpiece 2. In the present embodiment, the stage 18 corresponds to a “moving unit” according to the present invention.

  Here, the relationship between the groove direction of the fine periodic structure appearing on the surface of the workpiece 2 and the polarization direction of the laser beam LB will be described with reference to FIG. FIG. 4 is a schematic diagram illustrating the workpiece 2 in a plan view. When a polymer material such as liquid crystal polymer or polystyrene is selected as the workpiece 2, the groove direction of the fine periodic structure that appears on the surface of the workpiece 2 when irradiated with the laser beam is orthogonal to the polarization direction of the laser beam. Is known empirically. Therefore, in order to connect the fine structures in the adjacent processing marks to each other, the polarization direction of the laser beam irradiated to the workpiece 2 is set to be orthogonal to the relative movement direction of the workpiece 2. It is necessary to determine (FIG. 4A). When the groove direction of the fine periodic structure that appears on the surface of the workpiece 2 is parallel to the polarization direction of the laser beam, the polarization direction of the pulse beam is determined to be parallel to the movement direction (FIG. 4B). As such a workpiece 2, for example, a metal such as nickel is empirically known. As described above, the control of the polarization direction of the laser beam is realized by controlling the arrangement of the half-wave plate 14. In the case of paying attention to the relationship between the polarization direction of the laser beam and the groove direction of the fine periodic structure, the above-described beam cross-sectional shape (long shape in one direction) and / or the spatial intensity of the laser beam. Distribution (almost flat distribution) is not an essential requirement.

  Next, a method for irradiating the workpiece 2 with a laser beam (shaped beam) having a long beam cross-sectional shape in the first direction generated as described above will be described in detail. In the present embodiment, a plurality of pulsed laser beams are irradiated while the workpiece 2 is continuously moved in one direction (a direction parallel to the first direction) at a constant speed V by the stage 18. Since the positional relationship between the workpiece 2 and the laser beam is relative, the workpiece 2 may be fixed and the laser beam may be moved continuously.

As shown in FIG. 5, when the beam length of the laser beam in the moving direction of the workpiece 2 (parallel to the first direction) is L and the repetition frequency of the laser beam pulse is f, the workpiece 2 is The moving speed V at the time of moving relatively is defined as the following formula (1).
V ≦ L × f / N (1)
Here, N is the number of pulse irradiations required for forming a fine periodic structure, and is a value of about N = 50 to 200, for example. The repetition frequency f and the velocity V are relatively set so as to satisfy the expression (1), and the workpiece 2 is continuously moved while the pulsed laser beam is sequentially irradiated. Thereby, the workpiece 2 is sequentially irradiated with the pulsed laser beam so that the irradiation range 101 in the first irradiation opportunity and the irradiation range 102 in the second irradiation opportunity after that partially overlap each other. can do. Each of the repetition frequency f and the speed V is set by the control unit 20 supplying a control signal to each of the light source 10 and the stage 18.

When the surface of the workpiece 2 is irradiated with a line-shaped laser beam while moving the workpiece 2 at the speed V determined by the above equation (1), the number n of pulses corresponding to one point on the surface is expressed by the following equation: Given.
n = L · f / V (2)
However, the characters represented in the formula are the same as those in the formula (1). For example, when f = 1000 Hz and V = 100 mm / second, n = 100 for L = 10 mm and n = 50 for L = 5 mm. This numerical value is an example, and the number of pulses required for the appearance of the fine periodic structure depends on the material of the workpiece 2 and the laser conditions (pulse width, pulse repetition frequency). The length L can be determined.

  FIG. 6 is a graph showing the relationship of the above equation (1). The beam length L in the moving direction (that is, the first direction) of the workpiece 2 is 100 μm in the case of a circular beam cross-sectional shape as a comparative example, and is 10 mm in the case of the line-shaped beam cross-sectional shape according to the present embodiment. It is. The required number of pulses is N = 100. For example, when the pulse repetition frequency f is 1000 Hz (see the arrow in FIG. 6), the moving speed in the case of the laser beam having a circular cross section in the comparative example is V ≦ 100 mm / sec, and the line cross section according to the present embodiment. In the case of the laser beam, the moving speed is V ≦ 1 mm / second. That is, the moving speed of the workpiece 2 can be increased by 100 times by shaping the beam cross-sectional shape of the laser beam into a line. Therefore, the throughput during processing can be increased 100 times.

  By irradiating the workpiece 2 with the laser beam as described above, a periodic fine uneven structure can be expressed on the surface of the workpiece 2. That is, a fine structure having a fine uneven structure on the surface can be obtained. Such a so-called nano pattern can be applied as a retardation plate, for example. It can also be applied as a substrate for aligning liquid crystal molecules. Further, as shown in FIG. 7, a microstructure manufactured by laser beam irradiation is used as a molding die 200 (FIG. 7A), and nanopatterns 201 made of a transparent resin (FIG. b)) can also be produced. Such a nanopattern made of a transparent resin can be applied as a retardation plate, for example. It can also be applied as a substrate for aligning liquid crystal molecules.

  Next, another configuration example of the laser processing apparatus will be described.

  FIG. 8 is a block diagram illustrating another configuration example of the laser processing apparatus. The laser processing apparatus 1a shown in FIG. 8 basically has the same configuration as the laser processing apparatus 1 of the aspect shown in FIG. The same reference numerals are used for configurations common to both, and description thereof is omitted. The laser processing apparatus 1a of the configuration example shown in FIG. 8 differs from the laser processing apparatus 1 described above in that the diffractive optical element 16 as a means for beam shaping is replaced with an anamorphic condenser lens 22. . This anamorphic condensing lens 22 has a significantly different condensing distance in two orthogonal directions. By this action, the laser beam can be shaped into a linear beam cross-sectional shape that is long in one direction. By selecting the condensing distance in the two orthogonal directions of the anamorphic condensing lens 22 as appropriate, a linear laser beam having a required length L can be generated. In the embodiment shown in FIG. 8, the anamorphic condenser lens 22 corresponds to a “first beam shaping unit” according to the present invention.

  FIG. 9 is a block diagram illustrating another configuration example of the laser processing apparatus. A laser processing apparatus 1b shown in FIG. 9 basically has the same configuration as the laser processing apparatus 1 of the embodiment shown in FIG. The same reference numerals are used for configurations common to both, and description thereof is omitted. In the laser processing apparatus 1b of the configuration example shown in FIG. 9, the diffractive optical element 16 as a beam shaping means is replaced with a mask 24 and an imaging optical system (imaging lens) 26, as compared with the laser processing apparatus 1 described above. The point is different. The mask 24 has a slit-shaped opening, and the beam intensity distribution in the opening is imaged on the surface of the workpiece 2 by the imaging optical system 26. Thereby, the laser beam can be shaped into a linear beam cross-sectional shape that is long in one direction. By appropriately selecting the length of the opening of the mask 24 and the magnification of the imaging optical system 26, a laser beam having a linear beam cross-sectional shape having a required length L can be generated. Further, by sufficiently expanding the diameter of the laser beam incident on the mask 24 and cutting out the vicinity of the center of the expanded laser beam with the mask 24, a laser beam having a substantially flat intensity distribution can be obtained. For example, if the slit length of the opening is 2 mm and the imaging magnification is 5 times, a linear laser beam having a length L = 10 mm can be obtained. In the embodiment shown in FIG. 9, the mask 24 and the imaging optical system 26 correspond to a “first beam shaping unit” and a “second beam shaping unit” according to the present invention.

  As described above, according to the present embodiment, since the workpiece 2 can be exposed while being continuously moved, a fine structure having a fine periodic structure can be manufactured with a high processing throughput. Thereby, it becomes possible to directly form a fine periodic structure in a short time in a wide area on the surface of the workpiece 2.

  The present invention is not limited to the contents of the above-described embodiment, and various modifications can be made within the scope of the gist of the present invention. For example, in the above embodiment, the case where the length L of the laser beam is 10 mm has been specifically described. However, the processing throughput can be further improved by extending the length L of the laser beam longer. . In the above embodiment, an example in which a liquid crystal polymer is used as a workpiece has been described. However, for example, a metal film or a silicon semiconductor can be used if the application is different.

It is a block diagram which shows the structure of the laser processing apparatus of one Embodiment. It is a figure explaining the beam cross-sectional shape of a laser beam. It is a figure explaining spatial intensity distribution of a laser beam. It is a figure which shows a to-be-processed object planarly and demonstrates the relationship between the groove | channel direction of a fine periodic structure, and the polarization direction of a laser beam. It is a figure explaining the moving speed V at the time of moving a workpiece relatively. It is a graph which shows the relationship of Formula (1). It is the schematic explaining the method to produce a nano pattern using a microstructure as a shaping | molding die. It is a block diagram explaining the other structural example of a laser processing apparatus. It is a block diagram explaining the other structural example of a laser processing apparatus.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1, 1a, 1b ... Laser processing apparatus, 2 ... Workpiece, 10 ... Light source, 12 ... Mirror, 14 ... Wave plate, 16 ... Diffractive optical element, 18 ... Stage, 20 ... Control part, 22 ... Anamorphic collection Optical lens, 24 ... Mask, 26 ... Imaging optical system, 101, 102 ... Irradiation range, 200 ... Mold, 201 ... Nano pattern

Claims (14)

A method of manufacturing a fine structure having a fine periodic structure by irradiating a workpiece with a laser beam,
(A) generating a pulsed laser beam having a long beam cross-sectional shape in the first direction;
(B) moving the laser beam or the workpiece at a speed V in a direction parallel to the first direction;
(C) Repeating the laser beam pulse so that the irradiation range at the first irradiation opportunity and the irradiation range at the second irradiation opportunity after the first irradiation opportunity partially overlap each other. Irradiating the workpiece by setting the frequency and the speed V relatively;
A method for producing a fine structure, including: In claim 1,
The spatial intensity distribution of the laser beam in the step (a) is substantially flat;
The manufacturing method of the fine structure further containing these. In claim 1,
The laser beam is linearly polarized light;
The step (b) makes the polarization direction of the laser beam parallel to the moving direction of the laser beam or the workpiece,
A manufacturing method of a fine structure. In claim 1,
The laser beam is linearly polarized light;
In the step (b), the polarization direction of the laser beam is orthogonal to the moving direction of the laser beam or the workpiece.
A manufacturing method of a fine structure. A method of manufacturing a fine structure having a fine periodic structure by irradiating a workpiece with a laser beam,
(A) generating a linearly polarized pulsed laser beam;
(B) moving the laser beam or workpiece at a velocity V in a direction parallel to the polarization direction of the laser beam;
(C) Repeating the laser beam pulse so that the irradiation range at the first irradiation opportunity and the irradiation range at the second irradiation opportunity after the first irradiation opportunity partially overlap each other. Irradiating the workpiece by setting a frequency and the speed V relatively;
A method for producing a fine structure, including: A method of manufacturing a fine structure having a fine periodic structure by irradiating a workpiece with a laser beam,
(A) generating a linearly polarized pulsed laser beam;
(B) moving the laser beam or workpiece at a velocity V in a direction orthogonal to the polarization direction of the laser beam;
(C) Repeating the laser beam pulse so that the irradiation range at the first irradiation opportunity and the irradiation range at the second irradiation opportunity after the first irradiation opportunity partially overlap each other. Irradiating the workpiece by setting the frequency and the speed V relatively;
A method for producing a fine structure, including: A beam generator for emitting a pulsed laser beam;
A first beam shaping unit that shapes a beam cross-sectional shape of the laser beam into a shape elongated in a first direction;
A moving unit that moves the first beam shaping unit or the workpiece at a speed V in a direction parallel to the first direction;
The laser beam of the light source is partially overlapped with an irradiation range of the laser beam at a first irradiation opportunity and an irradiation range of the laser beam at a second irradiation opportunity after the first irradiation opportunity. A control unit for relatively setting the repetition frequency of the pulse and the speed V;
Including laser processing equipment. In claim 7,
A second beam shaping unit for shaping the spatial intensity distribution of the laser beam substantially flat;
Laser processing equipment. In claim 7,
The laser beam is linearly polarized light;
A polarization azimuth adjusting unit for adjusting the polarization azimuth of the laser beam to either the parallel direction or the orthogonal direction to the first direction;
Laser processing equipment. In claim 7,
The first beam shaping unit includes a diffractive optical element,
Laser processing equipment. In claim 7,
The first beam shaping unit includes an anamorphic condenser lens,
Laser processing equipment. In claim 7,
The first beam shaping unit includes a mask having an aperture and an imaging lens.
Laser processing equipment. A beam generator that generates a linearly polarized pulsed laser beam;
A moving unit that moves the beam generation unit or the workpiece at a speed V in either a direction parallel to or orthogonal to a polarization direction of the laser beam;
The laser beam of the light source is partially overlapped with an irradiation range of the laser beam at a first irradiation opportunity and an irradiation range of the laser beam at a second irradiation opportunity after the first irradiation opportunity. A control unit for relatively setting the repetition frequency of the pulse and the speed V;
Including laser processing equipment. A beam generator that generates a linearly polarized pulsed laser beam;
A moving unit that continuously moves the beam generating unit or the workpiece in one direction at a speed V;
A polarization azimuth adjusting unit that adjusts the polarization azimuth of the laser beam either in a direction parallel to or orthogonal to the moving direction of the laser beam or the workpiece;
The laser beam of the light source is partially overlapped with an irradiation range of the laser beam at a first irradiation opportunity and an irradiation range of the laser beam at a second irradiation opportunity after the first irradiation opportunity. A control unit for relatively setting the repetition frequency of the pulse and the speed V;
Including laser processing equipment.

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