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JP2007250347A - Semiconductor integrated circuit device and its manufacturing method - Google Patents

Semiconductor integrated circuit device and its manufacturing method Download PDF

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Publication number
JP2007250347A
JP2007250347A JP2006072069A JP2006072069A JP2007250347A JP 2007250347 A JP2007250347 A JP 2007250347A JP 2006072069 A JP2006072069 A JP 2006072069A JP 2006072069 A JP2006072069 A JP 2006072069A JP 2007250347 A JP2007250347 A JP 2007250347A
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fuse
semiconductor device
bonding wire
insulating substrate
bonding
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Hiroshi Ohata
博 大畑
Hideaki Tokunaga
秀昭 徳永
Takayuki Kimoto
貴幸 木本
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Isahaya Electronics Corp
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Isahaya Electronics Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To solve such problems that, when a fuse or its alternative is built in a semiconductor device in order to limit current with a conventional technology, resin used for coating is carbonized by heat at the time of inflow of excessive current and a carbon part of the resin turns into a connecting state in circuit-wise and also, when a bonding wire is used as an alternative of a fuse, a bonding wire volume in the resin and a bonding wire route volume in the resin are unchanged at the time of meltdown by inflow of the excessive current, so that no meltdown takes place. <P>SOLUTION: Since the fuse or a fuse alternative part is covered by a paste material with less content of a carbon component and becoming porous after being dried, carbonizing by heat at inflow of excessive current and unmelting at the time of using of a bonding wire as an alternative for a fuse are prevented by using the porous state after thermal curing. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体装置に関する。   The present invention relates to a semiconductor device.

図5は、電流制限用ヒューズを有する従来の半導体装置を示す。導体パターン1が形成されている絶縁基板2上の導体パターン1へ半導体チップ3、チップ型抵抗あるいはチップ型コンデンサ4等の回路部品が搭載されることにより回路が構成され、この回路の電流制限用部品として表面実装型あるいは挿入実装型ヒューズが組み込まれた半導体装置である。   FIG. 5 shows a conventional semiconductor device having a current limiting fuse. A circuit is configured by mounting circuit components such as a semiconductor chip 3, a chip-type resistor or a chip-type capacitor 4 on the conductor pattern 1 on the insulating substrate 2 on which the conductor pattern 1 is formed. This is a semiconductor device in which a surface mount type or insertion mount type fuse is incorporated as a component.

従来技術では、電流制限を行う為に回路形成が行われている同半導体装置内に市販のヒューズを組み込みことにより、半導体装置の発火を防いでいる。しかし、市販のヒューズを用いた場合材料コストの上昇及び製品の大型化に繋がる。   In the prior art, the semiconductor device is prevented from being ignited by incorporating a commercially available fuse in the semiconductor device in which a circuit is formed for current limiting. However, the use of commercially available fuses leads to an increase in material costs and an increase in product size.

市販のヒューズの代替としてボンディングワイヤを使用した場合、ボンディングワイヤを外力より保護する為に樹脂にてコーティングを行う必要性があるが、この場合ボンディングワイヤに過大電流が流入した際の溶断時の熱により樹脂が炭化してしまい、樹脂の炭化部が回路的に接続状態となってしまいヒューズの機能を果たさない。   When bonding wires are used as an alternative to commercially available fuses, it is necessary to coat with resin in order to protect the bonding wires from external forces. In this case, the heat at the time of fusing when an excessive current flows into the bonding wires As a result, the resin is carbonized, and the carbonized portion of the resin is connected in a circuit, so that the function of the fuse is not achieved.

市販のヒューズの代替としてボンディングワイヤを使用した場合、ボンディングワイヤを外力より保護する為に樹脂にてコーティングを行う必要性があるが、この場合ボンディングワイヤに過大電流が流入した際の溶断時、樹脂内のボンディングワイヤ体積と樹脂内のボンディングワイヤ経路体積に変化が無い為溶断せずヒューズの機能を果たさない。   When a bonding wire is used as an alternative to a commercially available fuse, it is necessary to coat with resin to protect the bonding wire from external force. In this case, the resin must be melted when an excessive current flows into the bonding wire. Since there is no change in the bonding wire volume in the resin and the bonding wire path volume in the resin, it does not melt and does not function as a fuse.

市販のヒューズの代替としてチップ抵抗を使用した場合、樹脂にてコーティングを行う場合があるが、この場合チップ抵抗へ過大電流が流入した際の熱により樹脂が炭化してしまい、樹脂の炭化部が回路的に接続状態となってしまいヒューズの機能を果たさない。   When a chip resistor is used as an alternative to a commercially available fuse, coating may be performed with resin. In this case, the resin is carbonized due to heat generated when an excessive current flows into the chip resistor, and the carbonized portion of the resin is The circuit is connected and does not function as a fuse.

チップ型ヒューズ、パターンヒューズを使用した場合、樹脂にてコーティングを行う場合があるが、この場合ヒューズへ過大電流が流入した際の熱により樹脂が炭化してしまい、樹脂の炭化部が回路的に接続状態となってしまいヒューズの機能を果たさない。   When chip-type fuses and pattern fuses are used, coating may be performed with resin, but in this case, the resin will carbonize due to the heat generated when an excessive current flows into the fuse, and the carbonized part of the resin is It becomes connected and does not function as a fuse.

上記問題の解決として一般的にヒューズにて使用される消弧材を保護材として使用したいが消弧材を保護材としてアセンブリすることが困難である。   As a solution to the above problem, it is desired to use an arc extinguishing material generally used in a fuse as a protective material, but it is difficult to assemble the arc extinguishing material as a protective material.

本発明は、このような従来の技術が有していた問題を解決しようとするものであり、過大電流流入時の熱による樹脂の炭化防止、ボンディングワイヤ使用時の過大電流による確実な溶断を実現することを目的とするものである。   The present invention is intended to solve such problems of the prior art, and prevents carbonization of the resin due to heat when an excessive current flows in, and realizes reliable fusing due to an excessive current when using a bonding wire. It is intended to do.

本発明は、上記課題を解決するためにヒューズの代替部を一般的にヒューズにて使用される消弧材の代わりに炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料を使用することにより保護材としてアセンブリが可能となるものである。   In order to solve the above-mentioned problems, the present invention uses a paste material that has a low carbon content and is in a porous state after drying instead of an arc extinguishing material that is generally used in a fuse as an alternative part of a fuse. As a result, assembly is possible as a protective material.

上記課題解決手段による作用の1つ目としては次の通りである。炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料は炭素が非常に少ない為、ヒューズ代替部を炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料にて保護することにより過大電流が流入した際の熱により炭化することなく延焼がない。   The first action of the above problem solving means is as follows. Paste material that has a low carbon content and is in a porous state after drying has very little carbon. Therefore, the fuse replacement part is protected by a paste material that has a low carbon content and is in a porous state after drying. There is no spread of fire without carbonization due to the heat generated when inflow.

また、作用の2つ目として炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料については、熱乾燥後内部がポーラス状態となっている為、ヒューズの代替としてボンディングワイヤを使用した場合の未溶断についてもボンディングワイヤ部を炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料にてコーティングを行うことにより外力保護及び確実な溶断が得られる。   In addition, as a second action, the paste material that has a low carbon content and becomes porous after drying is porous after heat drying. Therefore, when a bonding wire is used as an alternative to the fuse, As for unmelted cutting, external force protection and reliable fusing can be obtained by coating the bonding wire portion with a paste material that has a low carbon component content and becomes porous after drying.

炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料については、消弧材のような粉体ではなく樹脂と同等な取り扱いが可能となり、アセンブリが可能である。   The paste material that has a low carbon component content and is in a porous state after drying can be handled in the same manner as a resin rather than a powder such as an arc extinguishing material, and can be assembled.

炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料を使用することにより、絶縁基板上へ消弧材を有するヒューズと同等の機能を有することが可能となり、半導体装置の材料コストを下げることが可能となる。   By using a paste material that has a low carbon content and becomes porous after drying, it can have the same function as a fuse having an arc extinguishing material on an insulating substrate, and the material cost of a semiconductor device can be reduced. Is possible.

以下、本発明の実施の形態を図1〜図4に基づいて説明する。   Hereinafter, embodiments of the present invention will be described with reference to FIGS.

図においては、2は絶縁基板でその上に1の導体パターンが形成されている。その導体パターン上には、半導体チップ3、半導体チップ3と絶縁基板2上の導体パターン1を接続するボンディングワイヤ8、またこれを保護するコーティング樹脂7、表面実装部品・挿入実装部品4などが実装されている。以下同一の構成については、同一の符号で示し説明を省略する。   In the figure, reference numeral 2 denotes an insulating substrate on which a conductor pattern 1 is formed. On the conductor pattern, a semiconductor chip 3, a bonding wire 8 for connecting the semiconductor chip 3 and the conductor pattern 1 on the insulating substrate 2, a coating resin 7 for protecting the semiconductor chip 3, a surface mounting component / insertion mounting component 4, etc. are mounted. Has been. Hereinafter, the same components are denoted by the same reference numerals and description thereof is omitted.

図1は、上記半導体装置内にボンディングワイヤにて電流制限機能を追加したものである。絶縁基板2上に形成されたワイヤボンディング可能な導体パターン1上へ回路を閉路するべく導体パターン間へワイヤボンディングにてボンディングワイヤ5aが接続される。ボンディングワイヤをボンディング部も含め全体またはボンディング接続部を炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料6にてコーティングし、熱処理にて硬化を行い、ボンディングワイヤの保護を行う。 FIG. 1 shows a semiconductor device in which a current limiting function is added by a bonding wire. Bonding wires 5a are connected between the conductor patterns by wire bonding so as to close the circuit on the conductor pattern 1 that can be wire-bonded formed on the insulating substrate 2. The entire bonding wire including the bonding portion or the bonding connection portion is coated with the paste material 6 that has a low carbon component content and becomes dry after drying, and is cured by heat treatment to protect the bonding wire.

図1に使用されるボンディングワイヤ材質については、アルミにて構成されるもの、金にて構成されるものなどがある。   The bonding wire materials used in FIG. 1 include those made of aluminum and those made of gold.

図1に使用されるボンディングワイヤ本数については、電流制限のレベルに合わせて本数を変えることが可能である。   The number of bonding wires used in FIG. 1 can be changed according to the current limit level.

図1に使用されるボンディングワイヤ径については、電流制限のレベルに合わせて径サイズを変えることが可能である。   As for the bonding wire diameter used in FIG. 1, the diameter size can be changed in accordance with the level of current limitation.

図2は、上記半導体装置内にチップ型ヒューズにて電流制限機能を追加したものである。絶縁基板2上に形成された導体パターン1上へ回路を閉路するべく導体パターン間へチップ型ヒューズ5bが実装され接続される。チップ型ヒューズ5bを接続部も含め全体を炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料6にてコーティングし、熱処理にて硬化を行い保護を行う。 FIG. 2 is a diagram in which a current limiting function is added by a chip-type fuse in the semiconductor device. Chip-type fuses 5b are mounted and connected between the conductor patterns to close the circuit on the conductor pattern 1 formed on the insulating substrate 2. The entire chip fuse 5b including the connecting portion is coated with a paste material 6 that has a low carbon component content and is in a porous state after being dried, and is cured by heat treatment for protection.

図3は、上記半導体装置内にチップ型抵抗にて電流制限機能を追加したものである。絶縁基板2上に形成された導体パターン1上へ回路を閉路するべく導体パターン間へチップ型抵抗5cが実装され接続される。チップ型抵抗5cを接続部も含め全体を炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料6にてコーティングし、熱処理にて硬化を行い保護を行う。 FIG. 3 shows a semiconductor device in which a current limiting function is added by a chip resistor. A chip resistor 5c is mounted and connected between the conductor patterns to close the circuit on the conductor pattern 1 formed on the insulating substrate 2. The entire chip resistor 5c including the connecting portion is coated with a paste material 6 that has a low carbon component content and becomes porous after drying, and is cured by heat treatment for protection.

図4は、上記半導体装置内にパターンヒューズにて電流制限機能を追加したものである。絶縁基板2上に形成された導体パターン1上へ回路を閉路するべく導体パターン間へパターンヒューズdが形成される。パターンヒューズ5d全体を炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料6にてコーティングし、熱処理にて硬化を行い保護を行う。 FIG. 4 is a diagram in which a current limiting function is added by a pattern fuse in the semiconductor device. A pattern fuse d is formed between the conductor patterns so as to close the circuit on the conductor pattern 1 formed on the insulating substrate 2. The entire pattern fuse 5d is coated with a paste material 6 that has a low carbon component content and becomes porous after drying, and is cured by heat treatment for protection.

図1〜4の半導体装置については、最終形態として樹脂などにより外装をコーティングしてもよい。   1-4 may be coated with a resin or the like as a final form.

図1〜4の半導体装置については、最終形態として炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料6全体を樹脂などによりコーティングしてもよい。   In the semiconductor device of FIGS. 1 to 4, as a final form, the entire paste material 6 that has a low carbon component content and becomes porous after drying may be coated with a resin or the like.

炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料6の代表的な材料としては厚膜基板形成用ペースト状保護ガラス材料や厚膜基板作製時焼成前のアルミナぺーストなどである。
Typical materials for the paste material 6 having a low carbon component content and becoming porous after drying include a paste-like protective glass material for forming a thick film substrate, and an alumina paste before firing at the time of manufacturing the thick film substrate.

本発明のワイヤボンディングの実施例を示す図。The figure which shows the Example of the wire bonding of this invention. 本発明のチップ型ヒューズの実施例を示す図。The figure which shows the Example of the chip-type fuse of this invention. 本発明のチップ型抵抗の実施例を示す図。The figure which shows the Example of the chip type resistor of this invention. 本発明のパターンヒューズの実施例を示す図。The figure which shows the Example of the pattern fuse of this invention. 従来の代表的な半導体装置。Conventional typical semiconductor device.

符号の説明Explanation of symbols

1.絶縁基板上の導体パターン、
2.絶縁基板、
3.半導体チップ、
4.表面実装部品、挿入実装部品
5.a.ボンディングワイヤ、
b.チップ型ヒューズ、
c.チップ型抵抗、
d.パターンヒューズ、
6.炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料、
7.半導体チップコーティング樹脂
8.半導体チップ−絶縁基板上導体パターン接続ボンディングワイヤ
1. A conductor pattern on an insulating substrate,
2. Insulating substrate,
3. Semiconductor chip,
4). 4. Surface mount component, insertion mount component a. Bonding wire,
b. Chip type fuse,
c. Chip type resistor,
d. pattern fuse,
6). Paste material that has a low carbon content and becomes porous after drying,
7). Semiconductor chip coating resin8. Semiconductor chip-Conductor pattern connection bonding wire on insulating substrate

Claims (8)

導体パターンが形成されている絶縁基板上の導体パターンにワイヤボンディング用のワイヤを張り、ワイヤ上及び1stボンディング側、2ndボンディング側を消弧用として炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料で覆うことを特徴とする絶縁基板上の電流制限用ヒューズを有する半導体装置。 A wire for wire bonding is stretched over the conductor pattern on the insulating substrate on which the conductor pattern is formed, and the porous state is reduced after drying with a low carbon component content on the wire and the first bonding side and the second bonding side for arc extinction. A semiconductor device having a current limiting fuse on an insulating substrate, which is covered with a paste material. 導体パターンが形成されている絶縁基板上の導体パターンにチップ型ヒューズが表面実装されそのチップ型ヒューズの接続部を含め全体を消弧用として炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料で覆うことを特徴とする絶縁基板上の電流制限用ヒューズを有する半導体装置。 A paste in which a chip-type fuse is surface-mounted on a conductor pattern on an insulating substrate on which a conductor pattern is formed, and the entire content including the connection portion of the chip-type fuse is used for arc extinction, and the content of carbon component is low and it becomes a porous state after drying. A semiconductor device having a current limiting fuse on an insulating substrate, characterized by being covered with a material. 導体パターンが形成されている絶縁基板上の導体パターンにチップ型抵抗が表面実装されそのチップ型抵抗の接続部を含め全体を消弧用として炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料で覆うことを特徴とする絶縁基板上の電流制限用ヒューズを有する半導体装置。 A paste on which a chip-type resistor is surface-mounted on the conductor pattern on the insulating substrate on which the conductor pattern is formed, and the entire content including the connection part of the chip-type resistor is used for arc extinction and has a low carbon content and becomes a porous state after drying. A semiconductor device having a current limiting fuse on an insulating substrate, characterized by being covered with a material. 絶縁基板上に形成されたパターンヒューズ上面を消弧用として炭素成分の含有量が少なく乾燥後ポーラス状態となるペースト材料で覆うことを特徴とする絶縁基板上の電流制限用ヒューズを有する半導体装置。 A semiconductor device having a current limiting fuse on an insulating substrate, wherein the upper surface of the pattern fuse formed on the insulating substrate is covered with a paste material having a low carbon component content and being in a porous state after being dried for arc extinction. 請求項1のボンディングワイヤの材質はアルミより構成されることを特徴とする半導体装置。 2. The semiconductor device according to claim 1, wherein the bonding wire is made of aluminum. 請求項1のボンディングワイヤの材質は金より構成されることを特徴とする半導体装置。 2. The semiconductor device according to claim 1, wherein the bonding wire is made of gold. 請求項1のボンディングワイヤは請求項5、6の材質別にボンディングワイヤ径を変えることにより制限される電流値を変えることが可能な半導体装置。 The bonding wire according to claim 1 is a semiconductor device capable of changing a current value limited by changing a bonding wire diameter for each material of claims 5 and 6. 請求項1のボンディングワイヤは請求項5、6の材質別に並列に複数本のボンディングワイヤを接続することにより制限される電流値を変えることが可能な半導体装置。


The bonding wire according to claim 1 is a semiconductor device capable of changing a current value limited by connecting a plurality of bonding wires in parallel according to the materials of claims 5 and 6.


JP2006072069A 2006-03-16 2006-03-16 Semiconductor integrated circuit device and its manufacturing method Pending JP2007250347A (en)

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WO2012144578A1 (en) * 2011-04-22 2012-10-26 双信電機株式会社 Electric power fuse
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WO2016027563A1 (en) * 2014-08-22 2016-02-25 トヨタ自動車株式会社 Current interrupting device
WO2021195871A1 (en) * 2020-03-30 2021-10-07 华为技术有限公司 Embedded substrate, circuit board assembly, and electronic device

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US8614898B2 (en) 2010-06-10 2013-12-24 Ibiden Co., Ltd. Printed wiring board, electronic device, and printed wiring board manufacturing method
WO2012144578A1 (en) * 2011-04-22 2012-10-26 双信電機株式会社 Electric power fuse
JP2012227077A (en) * 2011-04-22 2012-11-15 Soshin Electric Co Ltd Power fuse
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