JP2007033951A - Laser wavefront synthesis method using nonlinear light wave mixing and apparatus using the same - Google Patents
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Abstract
【課題】
より光エネルギーの損失無く、高い効率で波面合成効率ができるレーザー波面合成方法及びそれを用いた装置を提供すること。
【解決手段】
レーザー光を発生させるレーザー発生装置と、このレーザー発生装置が発生させるレーザー光を複数の回折光を発生させるホログラムと、ホログラムにより発生した複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させる光学系と、光路が重複する位置に配置されるフォトリフラクティブ効果を示す素子と、を有するレーザー波面合成装置とする。
【選択図】 図１【Task】
To provide a laser wavefront synthesis method and an apparatus using the same, which can achieve a wavefront synthesis efficiency with high efficiency without loss of light energy.
[Solution]
A laser generator for generating laser light, a hologram for generating a plurality of diffracted lights from the laser light generated by the laser generator, and reflecting at least one of the plurality of diffracted lights generated by the hologram A laser wavefront synthesizing apparatus having an optical system for overlapping a diffracted light and an optical path and an element exhibiting a photorefractive effect arranged at a position where the optical path overlaps is provided.
[Selection] Figure 1
Description
本発明は、非線形光波混合を用いたレーザー波面合成技術（以下「波面シンセシス」という。）に関する。 The present invention relates to a laser wavefront synthesis technique using nonlinear optical wave mixing (hereinafter referred to as “wavefront synthesis”).
回折光学素子や液晶空間変調器などを利用してレーザー波面の位相、振幅を高度に変調するいわゆる波面シンセシスに対するニーズが急速に高まりつつある。波面シンセシスの従来の技術としては、下記特許文献１に記載の技術がある。 There is a rapidly increasing need for so-called wavefront synthesis that highly modulates the phase and amplitude of a laser wavefront using a diffractive optical element or a liquid crystal spatial modulator. As a conventional technique of wavefront synthesis, there is a technique described in Patent Document 1 below.
しかしながら、１次回折光として取り出される所望の波面を合成すると、１次回折に付随して現れる不要な０次回折光や高次回説光がシステム損失となり、波面合成効率が著しく低下してしまうといった課題がある。 However, when a desired wavefront extracted as the first-order diffracted light is synthesized, unnecessary 0th-order diffracted light and high-order light that appear accompanying the first-order diffraction become system losses, and the wavefront synthesis efficiency is significantly reduced. is there.
そこで、本発明は、より光エネルギーの損失無く、高い効率で波面合成効率ができるレーザー波面合成方法及びそれを用いた装置を提供することを目的とする。 Therefore, an object of the present invention is to provide a laser wavefront synthesis method and apparatus using the same, which can achieve a wavefront synthesis efficiency with high efficiency without loss of light energy.
上記課題につき本発明者が鋭意検討を行った結果、不要な０次回折光や高次回折光のエネルギーを非線形光波結合により、一次回折光へリサイクルして波面合成効率を向上させることに着目し、本発明に想到するに至った。 As a result of intensive studies by the inventor regarding the above-mentioned problems, the present inventors have focused on recycling the energy of unnecessary 0th-order diffracted light and higher-order diffracted light to first-order diffracted light by nonlinear optical wave coupling, thereby improving the wavefront synthesis efficiency. I came up with the invention.
即ち、本発明に係るレーザー波面合成装置は、レーザー光を発生させるレーザー発生装置と、このレーザー発生装置が発生させるレーザー光を複数の回折光を発生させるホログラムと、このホログラムにより発生した複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させる光学系と、この光路が重複する位置に配置されるフォトリフラクティブ効果を示す素子と、を有することとする。 That is, a laser wavefront synthesis device according to the present invention includes a laser generator that generates laser light, a hologram that generates a plurality of diffracted lights from the laser light generated by the laser generator, and a plurality of diffractions generated by the hologram. An optical system that reflects at least one of the light and overlaps the other diffracted light and the optical path, and an element that exhibits a photorefractive effect disposed at a position where the optical path overlaps are provided.
また、本発明に係るレーザー波面合成装置において、フォトリフラクティブ効果を示す素子は、強誘電性結晶又は半絶縁性半導体結晶により構成されていることが望ましく、具体的には上記効果を示す限りこれらに限られることは無いが、例えばＢａＴｉＯ３、ＳＢＮ、ＬｉＮｂＯ３、 ＫＮｂＯ３、Ｓｎ２Ｐ２Ｓ６の少なくともいずれかを含んで構成されていることがより望ましい。 In the laser wavefront synthesis apparatus according to the present invention, the element exhibiting a photorefractive effect is preferably composed of a ferroelectric crystal or a semi-insulating semiconductor crystal, and specifically, as long as the above effect is exhibited. Although it is not limited, for example, it is more preferable that it is configured to include at least one of BaTiO 3 , SBN, LiNbO 3 , KNbO 3 , and Sn 2 P 2 S 6 .
また、本発明にかかるレーザー波面合成装置において、光路が重複する回折光は、０次回折光と１次回折光であることも望ましく、更には、０次回折光のエネルギーを１次回折光のエネルギーに移乗させることがより望ましい。 In the laser wavefront synthesizing apparatus according to the present invention, the diffracted light having overlapping optical paths is preferably 0th-order diffracted light and 1st-order diffracted light, and further, the energy of the 0th-order diffracted light is transferred to the energy of the first-order diffracted light. It is more desirable.
また、本発明に係るレーザー波面合成方法は、レーザー光から複数の回折光を発生させる工程、この複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させてフォトリフラクティブ効果を示す素子に入射させる工程、を有することとする。 The method of synthesizing a laser wavefront according to the present invention includes a step of generating a plurality of diffracted lights from a laser beam, and reflecting at least one of the plurality of diffracted lights to overlap an optical path with other diffracted lights. A step of making it incident on an element exhibiting a refractive effect.
また、本発明に係るレーザー波面合成方法において、フォトリフラクティブ効果を示す素子は、強誘電性結晶又は半絶縁性半導体結晶により構成されていることが望ましく、具体的には上記効果を示す限りこれらに限られることは無いが、例えばＢａＴｉＯ３、ＳＢＮ、ＬｉＮｂＯ３、 ＫＮｂＯ３、Ｓｎ２Ｐ２Ｓ６の少なくともいずれかを含んで構成されていることがより望ましい。 In the laser wavefront synthesizing method according to the present invention, it is desirable that the element exhibiting the photorefractive effect is composed of a ferroelectric crystal or a semi-insulating semiconductor crystal. Although it is not limited, for example, it is more preferable that it is configured to include at least one of BaTiO 3 , SBN, LiNbO 3 , KNbO 3 , and Sn 2 P 2 S 6 .
また、本発明に係るレーザー波面合成方法において、光路を重複させる回折光は、０次回折光と１次回折光であることが望ましく、更には、０次回折光のエネルギーを１次回折光のエネルギーに移乗させることがより望ましい。 In the laser wavefront synthesis method according to the present invention, the diffracted light that overlaps the optical path is preferably 0th-order diffracted light and 1st-order diffracted light, and further, the energy of the 0th-order diffracted light is transferred to the energy of the first-order diffracted light. It is more desirable.
以上により、より光エネルギーの損失無く、高い効率で波面合成効率ができるレーザー波面合成方法及びそれを用いた装置を提供することができる。 As described above, it is possible to provide a laser wavefront synthesizing method and an apparatus using the laser wavefront synthesizing method that can achieve a wavefront synthesizing efficiency with high efficiency without loss of light energy.
図１は、本実施形態に係るレーザー波面合成装置の概略を示す図である。本実施例に係るレーザー波面合成装置１は、レーザーを発生させるレーザー発生装置２、このレーザー発生装置が発生させるレーザー光を複数の回折光を発生させるホログラム３、このホログラムにより発生した複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させる光学系４、この光路が重複する位置に配置されるフォトリフラクティブ効果を示す素子５、を有する。 FIG. 1 is a diagram showing an outline of a laser wavefront synthesis apparatus according to this embodiment. A laser wavefront synthesizing apparatus 1 according to the present embodiment includes a laser generator 2 that generates a laser, a hologram 3 that generates a plurality of diffracted lights from a laser beam generated by the laser generator, and a plurality of diffracted lights generated by the hologram. The optical system 4 that reflects at least one of them and overlaps the other diffracted light and the optical path, and the element 5 that exhibits the photorefractive effect disposed at the position where the optical path overlaps.
本実施形態に係るレーザー発生装置は、レーザー光を発生させることができる限りにおいて周知のものを種々用いることができるが、例えばＮｄ：ＹＶＯ４、波長１μｍのＣＷレーザー装置（２４０ｍＷ）を好適に用いることができる。 As the laser generator according to the present embodiment, various known devices can be used as long as they can generate laser light. For example, a CW laser device (240 mW) with Nd: YVO 4 and a wavelength of 1 μm is preferably used. be able to.
ホログラム３は、ラゲールガウスビームなどの特異点を有する波面を生成するものであって、レーザー光を回折し、複数の回折光を発生させることができるものである。なお、ホログラム３としては、所望の機能を達成することができる限りにおいて様々な構成を採用することができるが、例えば液晶空間変調器を好適に用いることができる。 The hologram 3 generates a wavefront having a singular point such as a Laguerre Gaussian beam, and can diffract a laser beam to generate a plurality of diffracted beams. As the hologram 3, various configurations can be adopted as long as a desired function can be achieved. For example, a liquid crystal spatial modulator can be preferably used.
液晶空間変調器とは、画素に対応した電極が配置された一対の基板と、この一対の基板の間に挟持されるネマティック液晶などの液晶、を有するものであって、各画素に印加させる電圧を調整することによって液晶分子の配向を調整し、これに応じて入射した光の位相を変調させることができるものである。但し、一般に液晶空間変調器を用いた場合、その位相変調度は可視光に対しては２π、赤外光に対してはπ程度にとどまるため、ラゲールガウスビームなどの特異点を有する波面を生成するには、コンピュータで予めキャリア周波数を有する位相変調された干渉縞に対応するよう計算されたホログラムを液晶空間変調器に表示させておくことが極めて有用である（図２参照）。 A liquid crystal spatial modulator has a pair of substrates on which electrodes corresponding to pixels are arranged, and a liquid crystal such as a nematic liquid crystal sandwiched between the pair of substrates, and a voltage applied to each pixel. By adjusting the orientation of the liquid crystal molecules, the phase of the incident light can be modulated accordingly. However, in general, when a liquid crystal spatial modulator is used, the degree of phase modulation is about 2π for visible light and π for infrared light, so a wavefront having a singular point such as a Laguerre Gaussian beam is generated. For this purpose, it is extremely useful to display on the liquid crystal spatial modulator a hologram that has been calculated by a computer so as to correspond to a phase-modulated interference fringe having a carrier frequency in advance (see FIG. 2).
以上のとおり、入射されるレーザー光はホログラムによって 回折され、１次回折光として所望の変調光を取り出すことができるが、入射されるレーザー光のうちの大部分はホログラムによって回折されない（変調されない）０次回折光となる。また、液晶空間変調器の画素構造そのものも回折格子として働くため、更に損失を増やしてしまうこととなる。従って、入射光から合成波面へのエネルギー変換効率が数十％を超えることは難しい（理論限界は３３％である）。 As described above, the incident laser light is diffracted by the hologram and desired modulated light can be taken out as the first-order diffracted light. However, most of the incident laser light is not diffracted by the hologram (not modulated). Next diffracted light. Further, since the pixel structure itself of the liquid crystal spatial modulator also functions as a diffraction grating, the loss is further increased. Therefore, it is difficult for the energy conversion efficiency from incident light to the combined wavefront to exceed several tens of percent (theoretical limit is 33%).
そこで、本実施形態では、ホログラム３により発生した複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させる光学系４を設け、更に、この光路が重複する位置に配置されるフォトリフラクティブ効果を示す素子５を設けて波面合成効率を高めている。 Therefore, in the present embodiment, an optical system 4 is provided that reflects at least one of the plurality of diffracted lights generated by the hologram 3 to overlap the optical path with other diffracted lights, and further, at the position where the optical paths overlap. The element 5 which shows the photorefractive effect arrange | positioned is provided, and the wave front synthetic | combination efficiency is improved.
光学系４は、ホログラム３により発生した複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させるものであって、例えば１次回折光をフォトリフラクティブ効果を示す素子５に導くレンズ４１、０次回折光を反射させてフォトリフラクティブ効果を示す素子５において１次回折光と光路を重複させるための反射板４２と、を有して構成されている。なおレンズ４１や反射板４２の構成としては、これらの機能を奏する限りにおいて特段に制限されない。 The optical system 4 reflects at least one of the plurality of diffracted lights generated by the hologram 3 to overlap the optical path with other diffracted lights. For example, the optical system 4 converts the first-order diffracted light into a photorefractive effect 5. And a reflecting plate 42 for reflecting the first-order diffracted light and the optical path in the element 5 that reflects the 0th-order diffracted light and exhibits the photorefractive effect. The configuration of the lens 41 and the reflecting plate 42 is not particularly limited as long as these functions are exhibited.
フォトリフラクティブ効果を示す素子５は、ある回折光から他の回折光にエネルギーを移乗させることができる素子である。フォトリフラクティブ効果を示す素子としては、例えば強誘電性結晶、半絶縁性半導体結晶が挙げられる。この材料からなる素子は、互いにコヒーレントな微弱な信号光（以下「シグナル光」という。）と強い励起光（以下「ポンプ光」という。）を入射させた場合、両者が作る干渉縞を介してエネルギーの交換を起こし、ポンプ光のエネルギーをシグナル光へ移乗させることができる（これを二光波混合という。図３参照）。上記フォト利不落ティ部素子を示す阻止としては上記効果を示す限りこれらに限られることは無いことはもちろんであるが、ＢａＴｉＯ３、ＳＢＮ、ＬｉＮｂＯ３、 ＫＮｂＯ３、Ｓｎ２Ｐ２Ｓ６の結晶を好適に用いることができ、これらのうち少なくともいずれかを含んで構成されていることが好ましい。なお、本実施形態の例において、フォトリフラクティブ効果を示す素子５を透過する前後における１次回折光の強さについて確認した結果を図４に示す。 The element 5 that exhibits the photorefractive effect is an element that can transfer energy from one diffracted light to another diffracted light. Examples of the element exhibiting the photorefractive effect include a ferroelectric crystal and a semi-insulating semiconductor crystal. When an element made of this material receives weak signal light (hereinafter referred to as “signal light”) and strong excitation light (hereinafter referred to as “pump light”) that are coherent with each other, an interference fringe formed by both of them is used. It is possible to exchange energy and transfer the energy of the pump light to the signal light (this is called two-wave mixing, see FIG. 3). Of course, the prevention of the photo-refractory tee element is not limited to these as long as the above-described effect is exhibited, but it is not limited to BaTiO 3 , SBN, LiNbO 3 , KNbO 3 , Sn 2 P 2 S 6 . Crystals can be suitably used, and it is preferable that at least one of them is included. In addition, in the example of this embodiment, the result confirmed about the intensity | strength of the 1st-order diffracted light before and behind permeate | transmitting the element 5 which shows a photorefractive effect is shown in FIG.
以上、本実施形態に係るレーザー波面合成装置は、フォトリフラクティブ効果を示す素子のニ波混合に注目し、ホログラムが発生する０次回折光と１次回折光を結合させ、０次回折光のエネルギーを１次回折光へ移乗させることで合成波面へのエネルギー変換効率を向上させることができるようになる。この方法によると原理的には１００％近くまで波面合成効率を向上させることができ、極めて有用である。なお、本実施形態では０次回折光と１次回折光の二波の場合を説明として用いているが、上記に限定されず、２次回折光をもフォトリフラクティブ効果を示す素子に入射させ、エネルギーを移乗させることが可能であって、有用であることはいうまでもない。 As described above, the laser wavefront synthesizing apparatus according to the present embodiment pays attention to the two-wave mixing of the element exhibiting the photorefractive effect, and combines the zero-order diffracted light and the first-order diffracted light generated by the hologram, By transferring to the folded light, the energy conversion efficiency to the composite wavefront can be improved. According to this method, in principle, the wavefront synthesis efficiency can be improved to nearly 100%, which is extremely useful. In this embodiment, the case of two waves of 0th-order diffracted light and 1st-order diffracted light is used as an explanation. However, the present invention is not limited to the above, and second-order diffracted light is also incident on an element exhibiting a photorefractive effect and energy is transferred. Needless to say, it can be used.
以上、本発明に係るレーザー波面合成方法及びそれを用いた装置によると、波面合成技術の光ピンセット、顕微鏡光学、超微細光造形など光によるナノテクノロジー（ナノフォトニクス）に用いることができ、産業上の利用可能性がある。 As described above, according to the laser wavefront synthesis method and the apparatus using the laser wavefront synthesis method according to the present invention, it can be used for light nanotechnology (nanophotonics) such as optical tweezers, microscope optics, and ultrafine optical modeling of wavefront synthesis technology. There is a possibility of use.
１…レーザー波面合成装置、２…レーザー発生装置、３…ホログラム、４…光学系、４１…レンズ、４２…反射板、５…フォトリフラクティブ効果を示す素子
DESCRIPTION OF SYMBOLS 1 ... Laser wavefront synthesis apparatus, 2 ... Laser generator, 3 ... Hologram, 4 ... Optical system, 41 ... Lens, 42 ... Reflecting plate, 5 ... Element which shows photorefractive effect
Claims (10)
該レーザー発生装置が発生させるレーザー光を複数の回折光を発生させるホログラムと、
前記ホログラムにより発生した複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させる光学系と、
前記光路が重複する位置に配置されるフォトリフラクティブ効果を示す素子と、を有するレーザー波面合成装置。 A laser generator for generating laser light;
A hologram for generating a plurality of diffracted lights from the laser light generated by the laser generator;
An optical system that reflects at least one of a plurality of diffracted lights generated by the hologram and overlaps an optical path with other diffracted lights;
A laser wavefront synthesizing device having a photorefractive effect arranged at a position where the optical paths overlap.
該複数の回折光のうち、少なくともいずれかを反射させて他の回折光と光路を重複させてフォトリフラクティブ効果を示す素子に入射させる工程、を有するレーザー波面合成方法。 A step of generating a plurality of diffracted lights from a laser beam,
A method of synthesizing a laser wavefront, comprising a step of reflecting at least one of the plurality of diffracted lights and making an optical path overlap with another diffracted light to enter an element exhibiting a photorefractive effect.
10. The laser wavefront synthesis method according to claim 9, wherein the energy of the 0th-order diffracted light is transferred to the energy of the 1st-order diffracted light.
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| WO2015178338A1 (en) * | 2014-05-21 | 2015-11-26 | 浜松ホトニクス株式会社 | Microscope device and image acquisition method |
| JP2019012270A (en) * | 2018-07-30 | 2019-01-24 | 浜松ホトニクス株式会社 | Microscope device and image acquisition method |
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| JPH0310230A (en) * | 1989-06-07 | 1991-01-17 | Ricoh Co Ltd | Parallel optical information processor |
| WO2003063559A1 (en) * | 2002-01-16 | 2003-07-31 | The University Of Chicago | Use of multiple optical vortices for pumping, mixing and sorting |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH0310230A (en) * | 1989-06-07 | 1991-01-17 | Ricoh Co Ltd | Parallel optical information processor |
| WO2003063559A1 (en) * | 2002-01-16 | 2003-07-31 | The University Of Chicago | Use of multiple optical vortices for pumping, mixing and sorting |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2015178338A1 (en) * | 2014-05-21 | 2015-11-26 | 浜松ホトニクス株式会社 | Microscope device and image acquisition method |
| JP2015219501A (en) * | 2014-05-21 | 2015-12-07 | 浜松ホトニクス株式会社 | Microscope device and image acquisition method |
| CN106415354A (en) * | 2014-05-21 | 2017-02-15 | 浜松光子学株式会社 | Microscope device and image acquisition method |
| US9891172B2 (en) | 2014-05-21 | 2018-02-13 | Hamamatsu Photonics K.K. | Microscope device and image acquisition method |
| US10302569B2 (en) | 2014-05-21 | 2019-05-28 | Hamamatsu Photonics K.K. | Microscope device and image acquisition method |
| JP2019012270A (en) * | 2018-07-30 | 2019-01-24 | 浜松ホトニクス株式会社 | Microscope device and image acquisition method |
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